Coil component

Abstract

To improve process conditions when forming the coil pattern of an upper layer without using a dummy pattern.SOLUTION: A coil component 1 includes a coil pattern 110 having the innermost peripheral turn 112 and a turn 113b adjacent thereto and a coil pattern 210 having the innermost peripheral turn 212 and a turn 213b adjacent thereto. The innermost peripheral turn 212 includes a section 212A extended so as to overlap with the section 112A of the innermost peripheral turn 112; a section 212B extended so as to overlap with the section 112B of the innermost peripheral turn 112 and expanding a space with the turns 213b as progressing in the circumferential direction toward an inner peripheral end from an outer peripheral end; and a section 212C reducing a space with the turns 213b as progressing in the circumferential direction toward the inner circumferential end from the outer peripheral end without overlapping with the innermost peripheral turn 112.SELECTED DRAWING: Figure 9

Description

[Technical Field]

[0001] The present disclosure relates to a coil component, and more particularly to a coil component having a plurality of coil patterns stacked with insulating layers interposed therebetween. [Background technology]

[0002] Patent Document 1 discloses a chip-type coil component having two coil patterns stacked with an insulating layer between them. The coil component described in Patent Document 1 adds a dummy pattern to the coil pattern in the lower layer so that unevenness in the insulating layer caused by the coil pattern in the lower layer does not worsen the process conditions when forming the coil pattern in the upper layer. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Publication No. 2020-202392 Summary of the Invention [Problem to be solved by the invention]

[0004] However, adding a dummy pattern to a coil pattern has the problem of affecting high frequency characteristics, such as causing signals to be reflected by the dummy pattern.

[0005] This disclosure describes a technique for improving process conditions when forming upper layer coil patterns in a coil component having multiple coil patterns stacked with insulating layers interposed therebetween, without using dummy patterns. [Means for solving the problem]

[0006] A coil component according to one aspect of the present disclosure includes a first coil pattern that wraps around in a spiral shape over multiple turns, and a second coil pattern that is laminated on the first coil pattern via an insulating layer and wraps around in a spiral shape over multiple turns, wherein the first coil pattern includes a first turn located at the innermost circumference and a second turn adjacent to the first turn, and the second coil pattern includes a third turn located at the innermost circumference and a fourth turn adjacent to the third turn, and the first turn has a first section in which a space between the first turn and the second turn is a first distance, and a second section that is located closer to the inner circumferential end than the first section, a space between the first turn and the second turn is larger than the first distance, and the space between the first turn and the second turn increases as the first coil pattern wraps around in a spiral shape over multiple turns. The third turn includes: a third section, the space between which is a first distance between the third turn and the fourth turn, extending along the first section of the first turn so as to overlap with the first section of the first turn when viewed from the stacking direction; a fourth section, located closer to the inner circumferential end than the third section, extending along the second section of the first turn so as to overlap with the second section of the first turn when viewed from the stacking direction, the space between which is a first distance between the third turn and the fourth turn being greater than the first distance, and the space between which is a first distance between the fourth turn and the fourth turn increasing as the second coil pattern advances in the circumferential direction from the outer circumferential end to the inner circumferential end; and a fifth section, located closer to the inner circumferential end than the fourth section, not overlapping with the first turn when viewed from the stacking direction, and the space between which is a first distance between the fourth turn and the fourth turn decreasing as the second coil pattern advances in the circumferential direction from the outer circumferential end to the inner circumferential end.

[0007] A coil component according to another aspect of the present disclosure includes a first coil pattern that wraps around in a spiral shape over a plurality of turns, and a second coil pattern that is laminated on the first coil pattern via an insulating layer and wraps around in a spiral shape over a plurality of turns, wherein the first coil pattern includes a first turn located at the outermost periphery and a second turn adjacent to the first turn, and the second coil pattern includes a third turn located at the outermost periphery and a fourth turn adjacent to the third turn, and the first turn has a first section in which a space between the first turn and the second turn is a first distance, and a second section that is located closer to the outer peripheral end than the first section, a space between the first turn and the second turn is larger than the first distance, and the space between the first turn and the second turn increases as the first coil pattern advances in a wrapping direction from the inner peripheral end to the outer peripheral end. The third turn includes: a third section, the space between which the third turn is the fourth turn is a first distance, extending along the first section of the first turn so as to overlap with the first section of the first turn when viewed from the stacking direction; a fourth section, located closer to the outer circumferential end than the third section, extending along the second section of the first turn so as to overlap with the second section of the first turn when viewed from the stacking direction, the space between which the fourth turn is greater than the first distance, and the space between which the fourth turn increases as the second turn advances in the circumferential direction from the inner circumferential end to the outer circumferential end of the second coil pattern; and a fifth section, located closer to the outer circumferential end than the fourth section, not overlapping with the first turn when viewed from the stacking direction, and the space between which the fourth turn decreases as the second turn advances in the circumferential direction from the inner circumferential end to the outer circumferential end of the second coil pattern. [Effects of the Invention]

[0008] According to the present disclosure, a technique is provided for improving process conditions when forming upper layer coil patterns in a coil component having multiple coil patterns stacked via insulating layers, without using dummy patterns. [Brief explanation of the drawings]

[0009] [Figure 1]FIG. 1 is a schematic perspective view showing the appearance of a coil component 1 according to an embodiment of the technology disclosed herein. [Figure 2] FIG. 2 is a schematic plan view for explaining the pattern shape of the conductor layer 100. As shown in FIG. [Figure 3] FIG. 3 is a schematic plan view of the insulating layer 10. As shown in FIG. [Figure 4] FIG. 4 is a schematic plan view for explaining the pattern shape of the conductor layer 200. As shown in FIG. [Figure 5] FIG. 5 is a schematic plan view of the insulating layer 20. As shown in FIG. [Figure 6] FIG. 6 is a schematic plan view for explaining the pattern shape of the conductor layer 300. As shown in FIG. [Figure 7] FIG. 7 is a schematic plan view of the insulating layer 30. As shown in FIG. [Figure 8] FIG. 8 is an equivalent circuit diagram of the coil device 1. As shown in FIG. [Figure 9] FIG. 9 is a schematic enlarged view showing the coil pattern 110 and the coil pattern 210 overlapping each other. [Figure 10] FIG. 10 is a diagram for explaining a pattern shape according to a comparative example. [Figure 11] FIG. 11 is a schematic cross-sectional view for explaining the problem of the comparative example shown in FIG. [Figure 12] FIG. 12 is a schematic cross-sectional view for explaining the problem of the comparative example shown in FIG. [Figure 13] FIG. 13 is a schematic plan view illustrating the pattern shape of a conductor layer 200A according to a modified example. DETAILED DESCRIPTION OF THE INVENTION

[0010] Hereinafter, embodiments of the technology according to the present disclosure will be described in detail with reference to the accompanying drawings.

[0011] FIG. 1 is a schematic perspective view showing the appearance of a coil component 1 according to an embodiment of the technology disclosed herein.

[0012] 1, the coil component 1 according to the first embodiment is a surface-mounted chip component that functions as a common mode filter, and includes an element body 2 and four terminal electrodes E1 to E4 embedded in the element body 2. As will be described later, three conductor layers 100, 200, and 300 that are stacked with insulating layers interposed between them are embedded in the element body 2.

[0013] FIG. 2 is a schematic plan view for explaining the pattern shape of the conductor layer 100. As shown in FIG.

[0014] The conductor layer 100 is the bottommost conductor layer and has a spiral coil pattern 110 and connection patterns 121 to 125. In the example shown in FIG. 2, the coil pattern 110 has approximately 12 turns, including an outermost turn 111, an innermost turn 112, and an intermediate turn 113 located between a turn 113a adjacent to the outermost turn 111 and counting from the outermost periphery, and a turn 113b adjacent to the innermost turn 112 and counting from the innermost periphery. The intermediate turn 113 has approximately 10 turns. The outer peripheral end of the coil pattern 110 is connected to the connection pattern 121 via an extraction portion 114. The inner peripheral end of the coil pattern 110 is connected to the connection pattern 125. The coil pattern 110 winds clockwise from the outer circumferential edge to the inner circumferential edge, whereas the lead-out portion 114 extends linearly in the −X direction from the outer circumferential edge to the inner circumferential edge without winding clockwise. The connection patterns 122 to 124 are provided independently within the conductor layer 100 without being connected to other conductor patterns.

[0015] The outermost turn 111 of the coil pattern 110 includes sections 111A and 111B. Section 111A extends along the second turn 113a counting from the outermost periphery, and the space S1 between section 111A and the second turn 113a counting from the outermost periphery is approximately constant. Section 111B is located closer to the outer peripheral edge than section 111A, and the space between section 111B and the second turn 113a counting from the outermost periphery increases as the coil pattern 110 moves in the winding direction from the inner peripheral edge to the outer peripheral edge. The space S2 between section 111B and the second turn 113a counting from the outermost periphery is larger than the space S1 between section 111A and the second turn 113a counting from the outermost periphery.

[0016] The innermost turn 112 of the coil pattern 110 includes sections 112A and 112B. Section 112A extends along the second turn 113b counting from the innermost circumference, and the space S3 between section 112A and the second turn 113b counting from the innermost circumference is approximately constant. Section 112B is located closer to the inner circumferential edge than section 112A, and the space between section 112B and the second turn 113b counting from the innermost circumference increases as the coil pattern 110 moves around from the outer circumferential edge to the inner circumferential edge. The space S4 between section 112B and the second turn 113b counting from the innermost circumference is larger than the space S3 between section 112A and the second turn 113b counting from the innermost circumference. The sizes of spaces S1 and S3 may be the same.

[0017] FIG. 3 is a schematic plan view of the insulating layer 10. As shown in FIG.

[0018] The insulating layer 10 is located between the conductor layer 100 and the conductor layer 200, and has openings 11 to 15. The openings 11 to 15 are provided at positions that expose the connection patterns 121 to 125, respectively.

[0019] FIG. 4 is a schematic plan view for explaining the pattern shape of the conductor layer 200. As shown in FIG.

[0020] The conductor layer 200 has a spiral coil pattern 210 and connection patterns 221 to 226. In the example shown in FIG. 4 , the coil pattern 210 has approximately 12 turns, including an outermost turn 211, an innermost turn 212, and an intermediate turn 213 located between the second turn 213a counting from the outermost circumference and the second turn 213b counting from the innermost circumference. The intermediate turn 213 has approximately 10 turns. That is, the number of turns of the coil pattern 110 and the number of turns of the coil pattern 210 are approximately the same. Even if there is a difference in the number of turns between the coil pattern 110 and the coil pattern 210 due to the position of the lead-out portion or the like, it is preferable that the difference in the number of turns between the coil pattern 110 and the coil pattern 210 be ½ turn or less in order to ensure the function as a common mode filter.

[0021] The outer peripheral end of coil pattern 210 is connected to connection pattern 222 via lead-out portion 214. The inner peripheral end of coil pattern 210 is connected to connection pattern 226. Coil pattern 210 winds clockwise from the outer peripheral end to the inner peripheral end, while lead-out portion 214 extends linearly in the +X direction from the outer peripheral end to the inner peripheral end. Connection patterns 221, 223, 224, and 225 are provided independently without being connected to other conductor patterns within conductor layer 200. Connection patterns 221 to 225 are connected to connection patterns 121 to 125 via openings 11 to 15 provided in insulating layer 10, respectively.

[0022] The outermost turn 211 of the coil pattern 210 includes sections 211A, 211B, 211C, and 211D. In section 211A, the space S1 between the second turn 213a counting from the outermost periphery is substantially constant, and section 211A extends along section 111A of the coil pattern 110 so as to overlap with section 111A of the coil pattern 110 as viewed in the Z direction, which is the stacking direction. Section 211B is located closer to the outer peripheral end than section 211A, and extends along section 111B of the coil pattern 110 so as to overlap with section 111B of the coil pattern 110 as viewed in the Z direction, which is the stacking direction. Furthermore, the space S2 between section 211B and the second turn 213a counting from the outermost periphery increases as section 211B advances in the winding direction from the inner peripheral end to the outer peripheral end of the coil pattern 210. Section 211C is located closer to the outer periphery than section 211B, does not overlap with the outermost turn 111 of coil pattern 110 when viewed from the Z direction, which is the stacking direction, and is a section in which the space between section 211C and the second turn 213a counting from the outermost periphery decreases as the coil pattern moves in the winding direction from the inner periphery to the outer periphery of coil pattern 210. Section 211D is located closer to the outer periphery than section 211C, does not overlap with the outermost turn 111 of coil pattern 110 when viewed from the Z direction, which is the stacking direction, and is a section in which the space S1 between section 211D and the second turn 213a counting from the outermost periphery is approximately constant.

[0023] The innermost turn 212 of the coil pattern 210 includes sections 212A, 212B, 212C, and 212D. Section 212A has a substantially constant space S1 between it and the second turn 213b counting from the innermost periphery, and extends along section 112A of the coil pattern 110 so as to overlap with section 112A of the coil pattern 110 when viewed from the Z direction, which is the stacking direction. Section 212B is located closer to the inner periphery than section 212A, and extends along section 112B of the coil pattern 110 so as to overlap with section 112B of the coil pattern 110 when viewed from the Z direction, which is the stacking direction. Furthermore, the space S4 between section 212B and the second turn 213b counting from the innermost periphery increases as section 212B advances in the winding direction from the outer periphery to the inner periphery of the coil pattern 210. Section 212C is located closer to the inner circumferential edge than section 212B, does not overlap with the innermost turn 112 of coil pattern 110 when viewed from the Z direction, which is the stacking direction, and is a section in which the space between section 212C and the second turn 213b counting from the innermost periphery decreases as one moves in the circumferential direction from the outer circumferential edge to the inner circumferential edge of coil pattern 210. Section 212D is located closer to the inner circumferential edge than section 212C, does not overlap with the innermost turn 112 of coil pattern 110 when viewed from the Z direction, which is the stacking direction, and is a section in which the space S1 between section 212D and the second turn 213b counting from the innermost periphery is approximately constant.

[0024] FIG. 5 is a schematic plan view of the insulating layer 20. As shown in FIG.

[0025] The insulating layer 20 is located between the conductor layer 200 and the conductor layer 300, and has openings 21 to 26. The openings 21 to 26 are provided at positions that expose the connection patterns 221 to 226, respectively.

[0026] FIG. 6 is a schematic plan view for explaining the pattern shape of the conductor layer 300. As shown in FIG.

[0027] The conductor layer 300 has connection patterns 321 to 326. The connection patterns 321 to 326 are connected to the connection patterns 221 to 226 via openings 21 to 26 provided in the insulating layer 20, respectively. The connection pattern 325 is connected to the connection pattern 323 via an extension portion 325a. The connection pattern 326 is connected to the connection pattern 324 via an extension portion 326a.

[0028] FIG. 7 is a schematic plan view of the insulating layer 30. As shown in FIG.

[0029] The insulating layer 30 is the uppermost insulating layer and has openings 31 to 34. The openings 31 to 34 are provided at positions that expose the connection patterns 321 to 324, respectively. The terminal electrodes E1 to E4 shown in FIG. 1 are connected to the connection patterns 321 to 324 via the openings 31 to 34, respectively.

[0030] With this configuration, the outer peripheral end of coil pattern 110 is connected to terminal electrode E1, the outer peripheral end of coil pattern 210 is connected to terminal electrode E2, the inner peripheral end of coil pattern 110 is connected to terminal electrode E3, and the inner peripheral end of coil pattern 210 is connected to terminal electrode E4. As a result, as shown in Fig. 8, coil pattern 110 connected between terminal electrode E1 and terminal electrode E3 and coil pattern 210 connected between terminal electrode E2 and terminal electrode E4 are coupled.

[0031] FIG. 9 is a schematic enlarged view showing the coil pattern 110 and the coil pattern 210 overlapping each other.

[0032] 9, the planar position of section 111A of outermost turn 111 of coil pattern 110 and the planar position of section 211A of outermost turn 211 of coil pattern 210 are approximately the same when viewed from the Z direction, which is the stacking direction, and the two almost completely overlap. Similarly, the planar position of section 111B of outermost turn 111 of coil pattern 110 and the planar position of section 211B of outermost turn 211 of coil pattern 210 are approximately the same when viewed from the Z direction, which is the stacking direction, and the two almost completely overlap. The outermost turn 111 of coil pattern 110 is located closer to the outer edge than section 111B, and is connected to lead-out portion 114 via section 111C, which extends directly from section 111B in the extension direction of section 111B.

[0033] On the other hand, the outermost turn 211 of the coil pattern 210 is bent radially outward at a substantially right angle between sections 211B and 211C, so that section 111C of the outermost turn 111 of the coil pattern 110 does not overlap with the coil pattern 210. Sections 211C and 211D of the coil pattern 210 also do not overlap with the coil pattern 110.

[0034] 9, the planar position of section 112A of the innermost turn 112 of coil pattern 110 and the planar position of section 212A of the innermost turn 212 of coil pattern 210 are approximately the same when viewed from the Z direction, which is the stacking direction, and the two almost completely overlap. Similarly, the planar position of section 112B of the innermost turn 112 of coil pattern 110 and the planar position of section 212B of the innermost turn 212 of coil pattern 210 are approximately the same when viewed from the Z direction, which is the stacking direction, and the two almost completely overlap. The innermost turn 112 of coil pattern 110 is located closer to the inner circumferential end than section 112B, and is connected to connection pattern 125 via section 112C, which extends directly from section 112B in the extension direction of section 112B.

[0035] On the other hand, the innermost turn 212 of the coil pattern 210 is bent radially inward at a substantially right angle between sections 212B and 212C, so that section 112C of the innermost turn 112 of the coil pattern 110 does not overlap with the coil pattern 210. Sections 212C and 212D of the coil pattern 210 also do not overlap with the coil pattern 110.

[0036] 10 is a diagram for explaining a pattern shape according to a comparative example, and shows a case in which the outermost turn 211 of the coil pattern 210 does not have sections 211B and 211C, and the innermost turn 212 of the coil pattern 210 does not have sections 212B and 212C. In other words, in the comparative example shown in FIG. 10, the coil pattern 210 located in the upper layer has a simple spiral shape.

[0037] As shown in Figure 10, when the coil pattern 210 has a simple spiral shape and the innermost turn 212 of the coil pattern 210 does not have sections 212B and 212C, a region P is formed in which, when viewed in a plane from the Z direction, the planar position of the innermost turn 112 of the coil pattern 110 and the planar position of the innermost turn 212 of the coil pattern 210 gradually separate as one moves in the circumferential direction from the outer peripheral end to the inner peripheral end.

[0038] 11 and 12 are schematic cross-sectional views for explaining the problems of the comparative example shown in FIG. 10, and are process diagrams of the cross-sectional position taken along line AA shown in FIG.

[0039] 11, when forming the coil pattern 210 on the surface of the insulating layer 10 that covers the coil pattern 110, a photoresist 41 is formed on the surface of the insulating layer 10, and then the photoresist 41 is irradiated with exposure light 43 through a photomask 42. However, in the cross section taken along line AA shown in FIG. 10, the space S12 between the second turn 113b counting from the innermost circumference and the innermost turn 112 is slightly wider than the space S11 between the turns that make up the intermediate turn 113. In contrast, the openings in the photomask 42 are such that the space S21 between the openings for forming the turns that make up the intermediate turn 213 is substantially the same as the space S22 between the opening for forming the second turn 213b counting from the innermost circumference and the opening for forming the innermost turn 212.

[0040] When exposure is performed through photomask 42 under these conditions, light 43 is irradiated directly upward onto turn 113b, which is the second turn counting from the innermost circumference, and turn 113c, which is the third turn counting from the innermost circumference, whereas light 43 is irradiated onto a position slightly offset radially outward from directly above onto innermost turn 112. Here, the surface of insulating layer 10 is not completely flat, and the position overlapping with coil pattern 110 has a slightly convex surface shape. Therefore, light 43 irradiated onto a position offset radially outward from directly above onto innermost turn 112 is reflected radially outward by the convex surface of insulating layer 10.

[0041] 12, the bottom of the opening pattern for forming the innermost turn 212 in the developed pattern of the photoresist 41 expands radially outward as indicated by reference numeral 41a, and when the innermost turn 212 is formed using such a developed pattern, the pattern width of the innermost turn 212 locally expands radially outward. This local expansion of the pattern width of the innermost turn 212 may cause a short circuit with the second turn 213b counting from the innermost circumference.

[0042] 9, there is no region where the planar position of the innermost turn 112 of the coil pattern 110 and the planar position of the innermost turn 212 of the coil pattern 210 gradually separate, and the innermost turn 212 of the coil pattern 210 bends at a substantially right angle between sections 212B and 212C, and in this portion the innermost turn 112 of the coil pattern 110 and the innermost turn 212 of the coil pattern 210 are significantly separated in plan view, making it less likely that the poor exposure described with reference to Figures 11 and 12 will occur. This eases the process conditions when forming the coil pattern 210.

[0043] Even if some degree of exposure failure occurs in the region near sections 212B and 212C that bend at a substantially right angle, a short circuit is unlikely to occur in this region because a sufficient space is secured between this region and the second turn 213b counting from the innermost circumference. The same is true for the region near sections 211B and 211C that bend at a substantially right angle in the outermost turn 211; even if some degree of exposure failure occurs in this region, a short circuit is unlikely to occur in this region because a sufficient space is secured between this region and the second turn 213a counting from the outermost circumference.

[0044] As described above, in the coil component 1 according to this embodiment, the coil pattern 210 located on the upper layer does not have a simple spiral shape, but includes sections 211B and 212B where the distance from the adjacent turn increases toward the outer or inner circumferential edge, and sections 211C and 212C where the distance from the adjacent turn decreases toward the outer or inner circumferential edge. This makes it difficult for exposure defects due to unevenness on the surface of the insulating layer 10 to occur. This makes it possible to provide highly reliable products. Moreover, since there is no need to use dummy patterns, there is no deterioration in high-frequency characteristics.

[0045] FIG. 13 is a schematic plan view illustrating the pattern shape of a conductor layer 200A according to a modified example.

[0046] Conductor layer 200A according to a modified example shown in Fig. 13 differs from the pattern shape of conductor layer 200 shown in Fig. 4 in that innermost turn 212 transitions smoothly between section 212B and section 212C without bending at a right angle, and in that outermost turn 211 does not include section 211B and section 211C, and space S1 between it and the second turn 213a counting from the outermost periphery is substantially constant. Since the other basic configuration is the same as the pattern shape of conductor layer 200 shown in Fig. 4, the same elements are designated by the same reference numerals and redundant explanations will be omitted.

[0047] 13, a portion of the planar position of the innermost turn 112 of the coil pattern 110 is indicated by a dashed line. In the example shown in Fig. 13, because the transition between section 212B and section 212C is gradual, a region Q is formed in which the planar positions of the innermost turn 112 of the coil pattern 110 and the innermost turn 212 of the coil pattern 210 gradually separate as one moves around from the outer circumferential edge to the inner circumferential edge. For this reason, although exposure defects are likely to occur in region Q, a sufficient space is secured between region Q and the second turn 213b counting from the innermost periphery, so that even if some exposure defects occur, short-circuit defects will not occur.

[0048] 13, it is not essential that the innermost turn 212 bends at a substantially right angle between sections 212B and 212C, but a gradual transition may be made.Furthermore, it is not essential that the outermost turn 211 has sections 211B and 211C, and the space S1 between the outermost turn 211 and the second turn 213a counting from the outermost periphery may be substantially constant.

[0049] The above describes embodiments of the technology according to the present disclosure, but the technology according to the present disclosure is not limited to the above embodiments, and various modifications are possible within the scope of the gist of the technology, and it goes without saying that these modifications are also included within the scope of the technology according to the present disclosure.

[0050] The technology according to the present disclosure includes, but is not limited to, the following configuration examples.

[0051] A coil component according to one aspect of the present disclosure includes a first coil pattern that wraps around in a spiral shape over multiple turns, and a second coil pattern that is laminated on the first coil pattern via an insulating layer and wraps around in a spiral shape over multiple turns, wherein the first coil pattern includes a first turn located at the innermost circumference and a second turn adjacent to the first turn, and the second coil pattern includes a third turn located at the innermost circumference and a fourth turn adjacent to the third turn, and the first turn has a first section in which a space between the first turn and the second turn is a first distance, and a second section that is located closer to the inner circumferential end than the first section, a space between the first turn and the second turn is larger than the first distance, and the space between the first turn and the second turn increases as the first coil pattern wraps around in a spiral shape over multiple turns. The third turn includes: a third section that is spaced from the fourth turn by a first distance and extends along the first section of the first turn so as to overlap with the first section of the first turn as viewed from the stacking direction; a fourth section that is located closer to the inner circumferential end than the third section and extends along the second section of the first turn so as to overlap with the second section of the first turn as viewed from the stacking direction, the fourth section having a space between the fourth turn that is greater than the first distance and the space between the fourth turn that increases as the second coil pattern advances from the outer circumferential end to the inner circumferential end; and a fifth section that is located closer to the inner circumferential end than the fourth section, does not overlap with the first turn as viewed from the stacking direction, and the space between the fourth turn that decreases as the second coil pattern advances in the circumferential direction. This reduces the likelihood of short-circuit defects occurring in the innermost turn of the second coil pattern.

[0052] In the above coil component, the third turn may further include a sixth section that is located closer to the inner circumferential end than the fifth section and that is spaced from the fourth turn by the first distance, thereby increasing inductance due to the sixth section.

[0053] A coil component according to another aspect of the present disclosure includes a first coil pattern that wraps around in a spiral shape over a plurality of turns, and a second coil pattern that is laminated on the first coil pattern via an insulating layer and wraps around in a spiral shape over a plurality of turns, wherein the first coil pattern includes a first turn located at the outermost periphery and a second turn adjacent to the first turn, and the second coil pattern includes a third turn located at the outermost periphery and a fourth turn adjacent to the third turn, and the first turn has a first section in which a space between the first turn and the second turn is a first distance, and a second section that is located closer to the outer peripheral end than the first section, a space between the first turn and the second turn is larger than the first distance, and the space between the first turn and the second turn increases as the first coil pattern advances in a wrapping direction from the inner peripheral end to the outer peripheral end. The third turn includes: a third section that is spaced from the fourth turn by a first distance and extends along the first section of the first turn so as to overlap with the first section of the first turn as viewed from the stacking direction; a fourth section that is located closer to the outer periphery than the third section and extends along the second section of the first turn so as to overlap with the second section of the first turn as viewed from the stacking direction, the fourth section being spaced from the fourth turn by a greater distance than the first distance and the space between the fourth turn and the fourth turn increasing as the second coil pattern advances in the winding direction from the inner periphery to the outer periphery; and a fifth section that is located closer to the outer periphery than the fourth section, does not overlap with the first turn as viewed from the stacking direction, and the space between the fourth turn and the fourth turn decreasing as the second coil pattern advances in the winding direction from the inner periphery to the outer periphery. This reduces the likelihood of short-circuit defects occurring in the outer and inner periphery turns of the second coil pattern.

[0054] In the above coil component, the third turn may further include a sixth section that is located closer to the outer circumferential edge than the fifth section and has a space between it and the fourth turn that is the first distance, thereby increasing inductance due to the sixth section.

[0055] In the above coil component, the first turn of the first coil pattern further includes a seventh section extending in the extension direction of the second section, and the seventh section does not have to overlap with the second coil pattern when viewed from the stacking direction. This allows the pattern shape of the first coil pattern to be simple.

[0056] In the above coil component, the second coil pattern may be bent at a substantially right angle between the fourth and fifth sections, which reduces the likelihood of poor formation of the second coil pattern in the region between the fourth and fifth sections. [Explanation of symbols]

[0057] 1 Coil parts 2 Base 10, 20, 30 insulating layers 11~15, 21~26, 31~34 Openings 41 Photoresist 41a Poorly exposed area 42 Photomask 43 light 100, 200, 200A, 300 conductor layer 110,210 coil pattern 111,211 Outermost turn 111A~111C, 112A~112C, 211A~211D, 212A~212D sections 112,212 Innermost turn 113,213 Middle Turn 113a, 213a The second turn from the outermost perimeter 113b, 213b The second turn from the innermost perimeter 113c Third turn from the innermost perimeter 114,214,325a,326a Drawer section 121~125, 221~226, 321~326 connection patterns E1~E4 terminal electrode P,Q area S1~S4, S11, S12, S21, S22 Space

Claims

1. a first coil pattern that is spirally wound over a plurality of turns; a second coil pattern that is laminated on the first coil pattern via an insulating layer and that winds around in a spiral shape over a plurality of turns; Equipped with the first coil pattern includes a first turn located on the innermost periphery and a second turn adjacent to the first turn, the second coil pattern includes a third turn located on the innermost periphery and a fourth turn adjacent to the third turn, The first turn comprises: a first section having a space between the first section and the second turn of a first distance; a second section located closer to the inner circumferential end than the first section, the space between the second turn being larger than the first distance, and the space between the second turn being larger as the first section advances in a winding direction from the outer circumferential end toward the inner circumferential end of the first coil pattern; Including, The third turn comprises: a third section extending along the first section of the first turn so as to overlap the first section of the first turn when viewed from the stacking direction, the third section being spaced from the fourth turn by the first distance; a fourth section that is located closer to the inner circumferential end than the third section, extends along the second section of the first turn so as to overlap with the second section of the first turn when viewed from the stacking direction, has a space between the fourth turn and the fourth section that is larger than the first distance, and the space between the fourth turn and the fourth section increases as the fourth section advances in a winding direction from the outer circumferential end toward the inner circumferential end of the second coil pattern; a fifth section located closer to the inner circumferential end than the fourth section, not overlapping with the first turn as viewed from the stacking direction, and in which the space between the fifth section and the fourth turn decreases as the fifth section advances in a winding direction from the outer circumferential end toward the inner circumferential end of the second coil pattern; Including, Coil parts.

2. the third turn further includes a sixth section located closer to the inner circumferential end than the fifth section, and a space between the third turn and the fourth turn is the first distance; The coil component according to claim 1 .

3. a first coil pattern that is spirally wound over a plurality of turns; a second coil pattern that is laminated on the first coil pattern via an insulating layer and that winds around in a spiral shape over a plurality of turns; Equipped with the first coil pattern includes a first turn located at the outermost periphery and a second turn adjacent to the first turn, the second coil pattern includes a third turn located at the outermost periphery and a fourth turn adjacent to the third turn, The first turn comprises: a first section having a space between the first section and the second turn of a first distance; a second section located closer to the outer circumferential end than the first section, the space between the second turn being larger than the first distance, and the space between the second turn being larger as the first section advances in a winding direction from the inner circumferential end toward the outer circumferential end of the first coil pattern; Including, The third turn comprises: a third section extending along the first section of the first turn so as to overlap the first section of the first turn when viewed from the stacking direction, the third section being spaced from the fourth turn by the first distance; a fourth section that is located closer to the outer circumferential end than the third section, extends along the second section of the first turn so as to overlap with the second section of the first turn when viewed from the stacking direction, has a space between itself and the fourth turn that is larger than the first distance, and has a space between itself and the fourth turn that increases as it advances in a winding direction from the inner circumferential end toward the outer circumferential end of the second coil pattern; a fifth section located closer to the outer circumferential end than the fourth section, not overlapping with the first turn as viewed from the stacking direction, and in which the space between the fifth section and the fourth turn decreases as the fifth section advances in a winding direction from the inner circumferential end toward the outer circumferential end of the second coil pattern; Including, Coil parts.

4. the third turn further includes a sixth section located closer to the outer circumferential end than the fifth section, and a space between the third turn and the fourth turn is the first distance; The coil component according to claim 3 .

5. the first turn of the first coil pattern further includes a seventh section extending in an extension direction of the second section, the seventh section does not overlap the second coil pattern when viewed from the stacking direction; The coil component according to claim 1 .

6. the second coil pattern is bent at a substantially right angle between the fourth section and the fifth section; The coil component according to claim 5 .

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