laminate

Abstract

To provide a laminate which can suppress incidence of near-infrared rays and radiation of far-infrared rays.SOLUTION: A laminate includes a transparent substrate, a first film, and a second film which is provided between the transparent substrate and the first film. The second film is composed of a second-2 film, and a second-1 film and a second-3 film sandwiching the second-2 film from both sides. The first film is a film containing a metal oxide, or a film containing a metal oxide and a fluorine resin. The second-1 film and the second-3 film are (a) a film containing a metal oxide, or (b) a film containing a fluorine resin, In and a meal oxide, respectively. The second-2 film is a film containing metal or ITO.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present disclosure relates to laminates. [Background technology]

[0002] Near-infrared light contained in sunlight enters a room through window glass, raising the temperature inside the room. The wavelength of near-infrared light is 0.75 to 1.5 μm. If there is a lot of near-infrared light entering, more energy is required to cool the room. Also, when heating a room in winter, the heat from the heating inside the room radiates outside through the window glass. The radiation of the heating heat is caused by the emission of far-infrared light with a wavelength of 9 to 10 μm.

[0003] Window glass and the like are provided with the function of suppressing the incidence of near-infrared rays and the function of suppressing the radiation of far-infrared rays (Patent Documents 1 to 4, Non-Patent Document 1). [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Laid-Open No. 2000-246831 [Patent Document 2] Patent No. 5846203 [Patent Document 3] Special Publication No. 2017-530074 [Patent Document 4] Special Publication No. 2009-538815 [Non-patent literature]

[0005] [Non-Patent Document 1] M. Safari, Nazir P, Kherani, and GV Eleftheriades, Advanced Optical Materials, 9, 2011176-210087, 2021 Summary of the Invention [Problem to be solved by the invention]

[0006] In conventional techniques, it has been difficult to sufficiently suppress the incidence of near-infrared rays and the radiation of far-infrared rays. In one aspect of the present disclosure, it is preferable to provide a laminate that can suppress the incidence of near-infrared rays and the radiation of far-infrared rays. [Means for solving the problem]

[0007] One aspect of the present disclosure is a laminate including a transparent substrate, a first film, and a second film disposed between the transparent substrate and the first film. The second film is composed of a 2-2 film and a 2-1 film and a 2-3 film sandwiching the 2-2 film from both sides. The first film is a film containing a metal oxide, or a film containing a metal oxide and a fluororesin. The 2-1 film and the 2-3 film are each (a) a film containing a metal oxide, or (b) a film containing a fluororesin, In, and a metal oxide. The 2-2 film is a film containing a metal or ITO.

[0008] The laminate that is one aspect of the present disclosure can suppress the incidence of near-infrared light and the emission of far-infrared light. [Brief explanation of the drawings]

[0009] [Figure 1] 1 is a cross-sectional view illustrating a configuration of a laminate according to a first embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0010] Exemplary embodiments of the present disclosure will now be described with reference to the drawings. First Embodiment 1. Structure of laminate 1 1, the laminate 1 includes, for example, a transparent substrate 3, a first film 5, and a second film 7. The second film 7 is provided between the transparent substrate 3 and the first film 5.

[0011] (1-1) Transparent substrate 3 The transparent substrate 3 is, for example, a sheet made of a transparent resin. The transparent substrate 3 can be, for example, a biaxially stretched polyester film. A commercially available biaxially stretched polyester film is, for example, Lumirror (registered trademark) manufactured by Toray Advanced Film Co., Ltd.

[0012] Other examples of the transparent substrate 3 include a PC (Poly Carbonate) film, a PMMA (Poly Methyl Meth Acrylate) film, and an EP (Epoxy resin) film. There are no particular limitations on the film thickness of the transparent substrate 3, but it is preferably 10 μm or more and 300 μm or less, and more preferably 20 μm or more and 100 μm or less.

[0013] When the film thickness of the transparent substrate 3 is 10 μm or more and 300 μm or less, it becomes easy to form the first film 5 and the second film 7 by roll / roll sputtering. In this specification, the film thickness is measured using a shape analysis laser microscope (VK-X1100) manufactured by Keyence Corporation.

[0014] The visible light transmittance VIS-T of the transparent substrate 3 is preferably 20% or more, more preferably 40% or more, and particularly preferably 80% or more. The visible light transmittance VIS-T is the spectral transmittance at a wavelength of 550 nm. The unit of the visible light transmittance VIS-T is %. The visible light transmittance VIS-T is measured using a magnetic spectrophotometer U-4100 manufactured by Hitachi, Ltd.

[0015] (1-2) First film 5 The first film 5 is one of a plurality of films formed on the transparent substrate 3. The first film 5 is a film containing a metal oxide, or a film containing a metal oxide and a fluororesin. The first film 5 has the effect of improving the visible light transmittance VIST of the laminate 1.

[0016] The visible light transmittance VIST of the laminate 1 is preferably 20% or more, more preferably 40% or more, and particularly preferably 80% or more. The first film 5 is, for example, a dielectric film. The first film 5 is, for example, a film having a refractive index higher than that of the second film 7.

[0017] The metal oxide in the first film 5 is preferably one or more selected from the group consisting of CeO2, ZrO2, Nb2O5, SiO2, Al2O3, SiON, TiO2, Ce2O3, Ta2O5, ITO, and WO3.

[0018] When the metal oxide in the first film 5 is one of the above, it is more effective in improving the visible light transmittance VIS-T of the laminate 1. CeO2 is particularly preferable as the metal oxide in the first film 5. When the metal oxide in the first film 5 is CeO2, it is particularly effective in improving the visible light transmittance VIS-T of the laminate 1.

[0019] The fluororesin in the first film 5 has the effect of improving the mechanical strength of the sputtering target when the first film 5 is formed by sputtering. The fluororesin in the first film 5 is preferably at least one selected from the group consisting of polytetrafluoroethylene (PTFE), tetrafluoroethylene-hexafluoropropylene copolymer, tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer, tetrafluoroethylene-ethylene copolymer, and polyvinylidene fluoride.

[0020] When the fluororesin in the first film 5 is one of the above, the effect of improving the mechanical strength of the sputtering target is even greater. PTFE is particularly preferred as the fluororesin in the first film 5. When the fluororesin is PTFE, the effect of improving the mechanical strength of the sputtering target is especially great.

[0021] The first film 5 may be a film containing a metal oxide, a fluororesin, and one or more metals selected from the group consisting of In, Sn, and Bi, which further improves the mechanical strength of the sputtering target.

[0022] The first film 5 is preferably a film containing CeO2, PTFE, and In. In this case, the effect of improving the visible light transmittance VIST of the laminate 1 is particularly high. The weight ratio of components other than metal oxides in the first film 5 is preferably 20% by weight or less, and more preferably 15% by weight or less. The component other than metal oxides is, for example, a fluororesin. Alternatively, the component other than metal oxides is a fluororesin and one or more metals selected from the group consisting of In, Sn, and Bi.

[0023] The thickness of the first film 5 is preferably 5 nm or more and 100 nm or less, and more preferably 10 nm or more and 50 nm or less. The thickness of the first film 5 is measured using a shape analysis laser microscope (VK-X1100) manufactured by Keyence Corporation. When the thickness of the first film 5 is 5 nm or more and 100 nm or less, the effect of improving the visible light transmittance VIS-T of the laminate 1 is even greater.

[0024] (1-3) Second membrane 7 The second film 7 is formed on the transparent substrate 3. The second film 7 is composed of a 2-1 film 7A, a 2-2 film 7B, and a 2-3 film 7C. The 2-1 film 7A and the 2-3 film 7C sandwich the 2-2 film 7B from both sides in the thickness direction of the laminate 1. The 2-3 film 7C is located closer to the transparent substrate 3 than the 2-2 film 7B.

[0025] The 2-1 film 7A and the 2-3 film 7C are each (a) a film containing a metal oxide, or (b) a film containing a fluororesin, In, and a metal oxide. The 2-1 film 7A and the 2-3 film 7C each have the effect of improving the visible light transmittance VIST of the laminate 1.

[0026] The metal oxide in the 2-1 film 7A and the 2-3 film 7C is preferably one or more selected from the group consisting of CeO2, ZrO2, Nb2O5, SiO2, Al2O3, SiON, TiO2, Ta2O5, ITO, and WO3. The 2-1 film 7A and the 2-3 film 7C are particularly preferably Al2O3 films.

[0027] When the metal oxides in the 2-1 film 7A and the 2-3 film 7C are the above, the effect of improving the visible light transmittance VIST-T of the laminate 1 is even greater. When the 2-1 film 7A and the 2-3 film 7C are formed by sputtering, the fluororesin in (b) has the effect of improving the mechanical strength of the sputtering target.

[0028] When the 2-1 film 7A and the 2-3 film 7C are of the type (b) and are formed by sputtering, the fluororesin in the type (b) is preferably at least one selected from the group consisting of PTFE, tetrafluoroethylene-hexafluoropropylene copolymer, tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer, tetrafluoroethylene-ethylene copolymer, and polyvinylidene fluoride.

[0029] When the fluororesin in (b) is one of the above, the effect of improving the mechanical strength of the sputtering target is even greater. PTFE is particularly preferred as the fluororesin in (b). When the fluororesin is PTFE, the effect of improving the mechanical strength of the sputtering target is especially great.

[0030] The (b) may contain Sn or Bi instead of or in addition to In. In this case as well, the mechanical strength of the sputtering target is further improved. The weight ratio of components other than metal oxides in the 2-1 film 7A and the 2-3 film 7C is preferably 20 wt % or less, and more preferably 15 wt % or less. The components other than metal oxides are, for example, fluororesin or one or more metals selected from the group consisting of In, Sn, and Bi.

[0031] The thickness of the second film 7 is preferably 5 nm or more and 300 nm or less, and more preferably 10 nm or more and 100 nm or less. The thickness of the second film 7 is measured using a shape analysis laser microscope (VK-X1100) manufactured by Keyence Corporation. When the thickness of the second film 7 is 10 nm or more and 100 nm or less, the effect of improving the visible light transmittance VIS-T of the laminate 1 is even greater.

[0032] The 2-2 film 7B is a film containing metal or ITO. The 2-2 film 7B has the effect of blocking near-infrared rays and suppressing far-infrared thermal radiation. The metal in the 2-2 film 7B is preferably one or more selected from the group consisting of Ag, Pd, Au, Al, Bi, Cr, W, Ni, Ti, and Fe.

[0033] When the metal in the 2-2 film 7B is one of the above, the effect of blocking near-infrared rays and the effect of suppressing far-infrared thermal radiation are even greater. Ag or an alloy mainly composed of Ag is particularly preferred as the metal in the 2-2 film 7B. When the metal in the 2-2 film 7B is Ag or an alloy mainly composed of Ag, the effect of blocking near-infrared rays and the effect of suppressing far-infrared thermal radiation are especially great.

[0034] An example of an alloy containing Ag as a main component is an alloy of Ag and Pd. The weight ratio of metals other than Ag in an alloy containing Ag as a main component is, for example, more than 0 wt % and 10 wt % or less.

[0035] The thickness of the 2-2 film 7B is preferably 1 nm or more and 50 nm or less, and more preferably 1 nm or more and 30 nm or less. The thickness of the 2-2 film 7B is measured using a Keyence shape analysis laser microscope (VK-X1100). When the thickness of the 2-2 film 7B is 5 nm or more, the effect of blocking near-infrared rays and the effect of suppressing far-infrared thermal radiation are further enhanced.

[0036] 2. Manufacturing method of laminate 1 The laminate 1 can be manufactured by sequentially forming the 2-3 film 7C, the 2-2 film 7B, the 2-1 film 7A, and the first film 5 on the transparent substrate 3. Examples of methods for forming the 2-3 film 7C, the 2-2 film 7B, the 2-1 film 7A, and the first film 5 include sputtering, electron beam evaporation, and ion plating. In order to ensure the productivity and uniformity of the laminate 1, sputtering is preferred.

[0037] As a sputtering method, for example, there is a method in which sputtering is performed while transporting the transparent substrate 3 in an apparatus in which a sputtering target for forming the 2-3 film 7C, a sputtering target for forming the 2-2 film 7B, a sputtering target for forming the 2-1 film 7A, and a sputtering target for forming the 1st film 5 are installed.

[0038] The device contains a vacuum chamber where film formation takes place. The atmospheric gas used during sputtering is introduced into the vacuum chamber. Sputtering is performed by generating plasma within the device by applying a negative potential to the sputtering target.

[0039] In the case of the sputtering method, there is no particular limitation on the method for adjusting the film thickness of the 2-3 film 7C, the 2-2 film 7B, the 2-1 film 7A, and the first film 5. Examples of the method for adjusting the film thickness include known methods such as a method for adjusting the film thickness by adjusting the power input to the target or the atmospheric gas conditions to change the film formation speed, and a method for adjusting the film thickness by adjusting the transport speed of the transparent substrate 3.

[0040] The sputtering target may be a composite target made of a metal oxide, PTFE, and In, or a target made of a metal, PTFE, and In. The atmospheric gas conditions are not particularly limited. The atmospheric gas may be, for example, Ar gas, O2 gas, or N2 gas, and the gas species and gas mixture ratio may be appropriately selected depending on the desired film. Furthermore, the gas introduced into the vacuum chamber may contain any component in addition to Ar gas, O2 gas, and N2 gas.

[0041] 3. Effects of the laminate 1 (3-1) The laminate 1 includes the 2-2 film 7B, which provides the effect of blocking near-infrared rays and the effect of suppressing far-infrared heat radiation.

[0042] For example, when the laminate 1 is applied to windowpanes of houses, buildings, mobile objects, etc., it can prevent near-infrared rays contained in sunlight from entering the room. Also, when the room temperature is high due to heating, it can prevent the heat inside the room from flowing outside due to far-infrared thermal radiation.

[0043] (3-2) The laminate 1 has a high visible light transmittance VIST-T due to the inclusion of the 2-1 film 7A and the 2-3 film 7C, and can therefore be used for window glass in houses, buildings, mobile objects, etc.

[0044] (3-3) Ag and Ag alloys easily react with water, water vapor, sulfides, corrosive solvents, gases, etc. from the environment to form compounds. When compounds are formed, the number of free electrons decreases dramatically, and they lose their electrical conductivity. When electrical conductivity is lost, they lose their ability to block near-infrared rays and suppress far-infrared thermal radiation.

[0045] Even when the 2-2 film 7B contains Ag or an Ag alloy, the laminate 1 is provided with the 2-1 film 7A and the 2-3 film 7C, thereby preventing the Ag or the Ag alloy from reacting with water, water vapor, sulfides, corrosive solvents, gases, etc. As a result, the laminate 1 can maintain the effect of blocking near-infrared rays and the effect of suppressing far-infrared thermal radiation.

[0046] 4. Usage of the laminate 1 For example, the laminate 1 can be attached to the surface of a windowpane of a house, a building, a mobile object, etc. Examples of the mobile object include a vehicle, a ship, an airplane, etc.

[0047] <Example> 1. Production of Laminate 1 of Examples 1 to 21 The laminates 1 of Examples 1 to 21 were produced by the following method. Lumirror manufactured by Toray Advanced Film Co., Ltd. was prepared as the transparent substrate 3. Lumirror is a biaxially stretched polyester film. The film thickness of the transparent substrate 3 was 100 μm. The 2-3 film 7C, the 2-2 film 7B, the 2-1 film 7A, and the 1st film 5 were sequentially formed on the transparent substrate 3 by a sputtering method, thereby producing the laminate 1 having the configuration shown in FIG. 1. The sputtering method was an RF magnetron sputtering method. The sputtering conditions were as follows:

[0048] Sputtering gas pressure: 1 Pa Sputtering gas: Ar (argon) Sputtering power: 4.4 W / cm 2 Distance between target and board: 8cm The composition of the sputtering target used to deposit the 2-2 film 7B in each example and the film thickness of the 2-2 film 7B in each example are shown in Tables 1 and 2. "Composition" in Tables 1 and 2 refers to the composition of the sputtering target.

[0049] [Table 1]

[0050] [Table 2]

[0051] The compositions of the sputtering targets used to form the 2-3 films 7C in Examples 1 to 12 and the film thicknesses of the 2-3 films 7C in Examples 1 to 12 are shown in Table 1. The compositions of the sputtering targets used to form the 2-1 films 7A in Examples 1 to 12 and the film thicknesses of the 2-1 films 7A in Examples 1 to 12 are shown in Table 1.

[0052] The composition of the sputtering target used to form the first film 5 in Example 1 was a composition in which the weight ratio of Al2O3 was 100% by weight. The composition of the sputtering target used to form the first film 5 in Example 3 was a composition in which the weight ratio of CeO2 was 100% by weight. The composition of the sputtering target used to form the first film 5 in Examples 2 and 4 to 12 was a composition in which the weight ratio of PTFE was 12.3% by weight, the weight ratio of In was 1.3% by weight, and the remainder was Al2O3. The thickness of the first film 5 in Examples 1 to 12 was all 30 nm. The compositions of the 2-2 film 7B, the 2-3 film 7C, the 2-1 film 7A, and the first film 5 were the same as the compositions of the sputtering targets used to form those films.

[0053] The manufacturing methods of Examples 13 to 21 were basically the same as the manufacturing method of Example 1. However, in Examples 13 to 21, the compositions of the sputtering targets used to form the first film 5 were as shown in Table 2. Furthermore, the film thicknesses of the first film 5 in Examples 13 to 21 were as shown in Table 2.

[0054] In addition, when a single substance is listed in the composition column in Tables 1 and 2, the weight ratio of that single substance in the sputtering target is 100 wt %. For example, when "Ag" is listed in the composition column in Tables 1 and 2, the weight ratio of Ag in the sputtering target is 100 wt %.

[0055] Furthermore, "Ag-5wt%Pd" in Table 1 means that the weight ratio of Pd in ​​the sputtering target is 5 wt%, with the remainder being Ag. Furthermore, when "X-αwt%Y-βwt%Z" is written in the composition column in Tables 1 and 2, the weight ratio of Y in the sputtering target is α wt%, the weight ratio of Z is β wt%, and the remainder is X. X, Y, and Z are substance names. α and β are numerical values ​​in %.

[0056] In Table 2, "In2O3-5 wt%SnO2-12.3 wt%PTFE-1.3 wt%In" means that in the sputtering target, the weight ratio of SnO2 is 5 wt%, the weight ratio of PTFE is 12.3 wt%, the weight ratio of In is 1.3 wt%, and the remainder is In2O3.

[0057] A sputtering target made of CeO2 was manufactured as follows: CeO2 powder (manufactured by Nikki Co., Ltd., average particle size 5 μm) was prepared. The CeO2 powder was pressed under a molding pressure of 1 ton / cm 2 The mixture was pressed under pressure and molded into a 3 inch diameter and 5 mm thick molded product. The molded product was sintered at normal pressure under heating conditions of 200 to 300°C for 3 hours to obtain a sputtering target that was a low-temperature sintered body. Other sputtering targets were manufactured in the same manner.

[0058] 2. Evaluation of Laminate 1 The laminate 1 of each example was measured for the visible light transmittance VIS-T, near-infrared light shielding factor IR-S, and surface temperature TS. The near-infrared light shielding factor IR-S is the shielding factor for near-infrared light with a wavelength of 1000 nm. The near-infrared light shielding factor IR-S was measured using a magnetic spectrophotometer U-4100 manufactured by Hitachi, Ltd.

[0059] The surface temperature TS is a value measured as follows. The temperature of an Al heat sink is maintained at 50°C. The size of the heat sink is 4cm x 4cm x 1cm. The laminate 1 is attached to the heat sink without any gaps. The laminate 1 is oriented so that the transparent substrate 3 is in contact with the heat sink. The surface temperature of the laminate 1 on the side of the first film 5 is taken as TS (°C). The surface temperature TS is measured using a radiation thermometer IT 550L manufactured by HORIBA. The surface temperature TS is an index of the heat retention properties of the laminate 1. The lower the surface temperature TS, the better the heat retention properties. The more difficult the laminate 1 is to radiate heat, the better the heat retention properties and the lower the surface temperature TS.

[0060] The measurement results of visible light transmittance VIS-T, near-infrared light shielding rate IR-S, and surface temperature TS are shown in Tables 1 and 2. The laminate 1 of each example had a high visible light transmittance VIS-T, a high near-infrared light shielding rate IR-S, and a low surface temperature TS.

[0061] As shown in Table 2, the visible light transmittance VIS-T, near-infrared light shielding factor IR-S, and surface temperature TS changed depending on the composition of the first film 5. The composition of the first film 5 can be set depending on the environment in which the laminate 1 is used.

[0062] <Other embodiments> Although the embodiments of the present disclosure have been described above, the present disclosure is not limited to the above-described embodiments and can be implemented in various modified forms. (1) In the first embodiment, a third film may be present between the transparent substrate 3 and the second film 7. The third film is, for example, a film containing a metal oxide, or a film containing a metal oxide and a fluororesin. The metal oxide in the third film is, for example, one or more selected from the group consisting of CeO2, ZrO2, Nb2O5, SiO2, Al2O3, SiON, TiO2, Ta2O5, ITO, and WO3. In addition, another film may be present between the first film 5 and the second film 7. (2) The function of one component in each of the above embodiments may be shared among multiple components, or the functions of multiple components may be performed by one component. Also, part of the configuration of each of the above embodiments may be omitted. Furthermore, at least part of the configuration of each of the above embodiments may be added to or substituted for the configuration of another of the above embodiments.

[0063] (3) The present disclosure can also be realized in various forms, such as a system including the above-described laminate 1 as a component, a method for manufacturing the laminate 1, and the like.

[0064] [Technical idea disclosed in this specification] [Item 1] A transparent substrate; A first membrane; a second film provided between the transparent substrate and the first film; A laminate comprising: The second film is composed of a 2-2 film, and a 2-1 film and a 2-3 film sandwiching the 2-2 film from both sides, the first film is a film containing a metal oxide or a film containing a metal oxide and a fluororesin, the 2-1 film and the 2-3 film are each (a) a film containing a metal oxide, or (b) a film containing a fluororesin, In, and a metal oxide, The 2-2 film is a film containing metal or ITO. Laminate. [Item 2] Item 1, a laminate according to item 1, The metal in the 2-2 film is one or more selected from the group consisting of Ag, Pd, Au, Al, Bi, Cr, W, Ni, Ti, and Fe. Laminate. [Item 3] Item 3. The laminate according to item 1 or 2, the metal oxide in the first film is one or more selected from the group consisting of CeO2, ZrO2, Nb2O5, SiO2, Al2O3, SiON, TiO2, Ta2O5, ITO, and WO3; Laminate. [Item 4] The laminate according to any one of items 1 to 3, the 2-1 film and the 2-3 film are films containing Al2O3, The first film is a film containing CeO2, PTFE, and In, Laminate. [Item 5] The laminate according to any one of items 1 to 4, the fluororesin is at least one selected from the group consisting of polytetrafluoroethylene, tetrafluoroethylene-hexafluoropropylene copolymer, tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer, tetrafluoroethylene-ethylene copolymer, and polyvinylidene fluoride; Laminate. [Item 6] The laminate according to any one of items 1 to 5, a third film is further provided between the transparent substrate and the second film; the third film is a film containing a metal oxide or a film containing a metal oxide and a fluororesin; Laminate.

[0065] [Item 7] Item 7. The laminate according to item 6, the metal oxide in the third film is one or more selected from the group consisting of CeO2, ZrO2, Nb2O5, SiO2, Al2O3, SiON, TiO2, Ce2O3, Ta2O5, ITO, and WO3; Laminate. [Explanation of symbols]

[0066] 1...Laminated body, 3...Transparent substrate, 5...First film, 7...Second film, 7A...2-1 film, 7B...2-2 film, 7C...2-3 film

Claims

1. A transparent substrate; A first membrane; a second film provided between the transparent substrate and the first film; A laminate comprising: The second film is composed of a 2-2 film, and a 2-1 film and a 2-3 film sandwiching the 2-2 film from both sides, the first film is a film containing a metal oxide or a film containing a metal oxide and a fluororesin, the 2-1 film and the 2-3 film are each (a) a film containing a metal oxide, or (b) a film containing a fluororesin, In, and a metal oxide, The 2-2 film is a film containing metal or ITO. Laminate.

2. The laminate according to claim 1, The metal in the 2-2 film is at least one selected from the group consisting of Ag, Pd, Au, Al, Bi, Cr, W, Ni, Ti, and Fe. Laminate.

3. The laminate according to claim 1 or 2, The metal oxide in the first film is CeO ２ , ZrO ２ , Nb ２ O ５ , SiO ２ , Al ２ O ３ , SiON, TiO ２ , Ta ２ O ５ , ITO, and WO ３ is one or more selected from the group consisting of Laminate.

4. The laminate according to claim 1 or 2, The 2-1 film and the 2-3 film are each made of Al ２ O ３ a membrane comprising The first film is made of CeO ２ , PTFE, and In; Laminate.

5. The laminate according to claim 1 or 2, the fluororesin is at least one selected from the group consisting of polytetrafluoroethylene, tetrafluoroethylene-hexafluoropropylene copolymer, tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer, tetrafluoroethylene-ethylene copolymer, and polyvinylidene fluoride; Laminate.

6. The laminate according to claim 1 or 2, a third film is further provided between the transparent substrate and the second film; the third film is a film containing a metal oxide or a film containing a metal oxide and a fluororesin; Laminate.

7. The laminate according to claim 6, The metal oxide in the third film is CeO ２ , ZrO ２ , Nb ２ O ５ , SiO ２ , Al ２ O ３ , SiON, TiO ２ , Ce ２ O ３ , Ta ２ O ５ , ITO, and WO ３ is one or more selected from the group consisting of Laminate.

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