Compound, composition, surface treatment agent, article, and method for producing article

Abstract

To provide a novel compound useful as a surface treatment agent capable of forming a surface treatment layer excellent in water repellency and abrasion resistance on a substrate.SOLUTION: A compound comprising the following group 1, a partial structure that is an alkylene chain or a polyalkylene oxide chain, and the following group 2. Group 1: -SiR13. Group 2: -Si(R2)nL3-n. Each R1 independently represents a hydrocarbon group or a trialkylsilyloxy group; each R2 independently represents a hydrocarbon group; each L independently represents a hydrolyzable group or a hydroxyl group; and n represents an integer of 0 to 2.SELECTED DRAWING: None

Description

[Technical Field]

[0001] The present disclosure relates to compounds, compositions, surface treatments, articles, and methods for making articles. [Background technology]

[0002] In recent years, there has been a demand for technologies that make surfaces of articles less susceptible to fingerprints and that make them easier to remove stains, in order to improve performance such as appearance and visibility. As a specific method, a method of performing a surface treatment on the surface of an article using a surface treatment agent is known.

[0003] For example, Patent Document 1 describes a composition containing an organosilicon compound having at least one trialkylsilyl group and two or more hydrolyzable silicon groups, and a metal compound in which at least one hydrolyzable group is bonded to a metal atom. Patent Document 2 describes a method for producing an organic thin film on a substrate surface, which includes at least a step of contacting the substrate with an organic solvent solution containing a metal surfactant having at least one hydrolyzable group or hydroxyl group and a catalyst capable of interacting with the metal surfactant. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Laid-Open No. 2017-119849 [Patent Document 2] International Publication No. 2008 / 016029 Summary of the Invention [Problem to be solved by the invention]

[0005] On the other hand, compositions used as surface treatment agents and the like are required to be further improved in terms of water repellency and abrasion resistance.

[0006] The present disclosure has been made in view of the above circumstances, and an object of one embodiment of the present invention is to provide a novel compound and composition that are useful as a surface treatment agent capable of forming a surface treatment layer that is excellent in water repellency and abrasion resistance on a substrate. An object of one embodiment of the present invention is to provide a surface treatment agent capable of forming a surface treatment layer having excellent water repellency and abrasion resistance on a substrate. An object of one embodiment of the present invention is to provide an article having a surface treatment layer with excellent water repellency and abrasion resistance, and a method for producing the article. [Means for solving the problem]

[0007] The present disclosure includes the following aspects. <1> A compound comprising the following group 1, a partial structure which is an alkylene chain or a polyalkylene oxide chain, and the following group 2: Group 1:-M 1 R 1 3 Group 2:-Si(R 2 ) n L 3-n M 1 is Si, Sn, or Ge, R 1 are each independently a hydrocarbon group or a trialkylsilyloxy group, and R 2 are each independently a hydrocarbon group; L is each independently a hydrolyzable group or a hydroxyl group; and n is an integer of 0 to 2. <2> Represented by the following formula 1: <1> The compound described in [R 1 3Si-(O) r -Z] p A(Si(R 2 ) n L 3-n ) q … (1) In formula 1, R 1are each independently a hydrocarbon group or a trialkylsilyloxy group, r is 0 or 1, Z is each independently an alkylene chain or a polyalkylene oxide chain, or a combination of an alkylene chain and a divalent polysiloxane residue, A is a single bond or a p+q valent linking group, R 2 are each independently a hydrocarbon group, L is each independently a hydrolyzable group or a hydroxyl group, n is each independently an integer of 0 to 2, and p and q are each independently an integer of 1 or greater. <3> In Formula 1, Z is an alkylene chain having 10 or more carbon atoms. <2> The compound described in <4> In Formula 1, Z is a polyalkylene oxide chain having a repeating number of 3 or more. <2> The compound described in <5> In formula 1, R 1 are each independently a trialkylsilyloxy group; <2> ~ <4> 1. The compound according to any one of claims 1 to 9. <6> In formula 1, R 1 are each independently a trimethylsilyloxy group or a triethylsilyloxy group; <2> ~ <5> 1. The compound according to any one of claims 1 to 9. <7> In Formula 1, p is 2 to 4. <2> ~ <6> 1. The compound according to any one of claims 1 to 9. <8> In formula 1, q is 2 to 4. <2> ~ <7> 1. The compound according to any one of claims 1 to 9. <9> <1> ~ <8> A composition comprising the compound according to any one of the above and a liquid medium. <10> <1> ~ <8> A surface treatment agent comprising the compound according to any one of the above items. <11> <1> ~ <8> 10. A surface treatment agent comprising the compound according to any one of the above items and a liquid medium. <12> For the substrate, <10> or <11> 1. A method for producing an article, comprising: performing a surface treatment using the surface treatment agent according to claim 1, and producing an article having a surface treatment layer formed on a substrate. <13> a substrate; and a substrate disposed on the substrate; <10> and a surface treatment layer that has been surface-treated with the surface treatment agent according to claim 1. <14> An optical element, <13> The article described in <15> a display or a touch panel; <13> The article described in <16> A compound comprising the following group 1, a partial structure which is an alkylene chain or polyalkylene oxide chain having 3 or more carbon atoms, and the following group 2: Group 1:-M 1 R 1 3 Group 2:-Si(R 2 ) n L 3-n M 1 is Si, Sn, or Ge, R 1 are each independently a hydrocarbon group or a trialkylsilyloxy group, and R 2 are each independently a hydrocarbon group; L is each independently a hydrolyzable group or a hydroxyl group; and n is an integer of 0 to 2. [Effects of the Invention]

[0008] According to one embodiment of the present invention, there are provided novel compounds and compositions useful as surface treatment agents capable of forming a surface treatment layer on a substrate that has excellent water repellency and abrasion resistance. According to one embodiment of the present invention, there is provided a surface treatment agent capable of forming a surface treatment layer having excellent water repellency and abrasion resistance on a substrate. According to one embodiment of the present invention, there are provided an article having a surface treatment layer with excellent water repellency and abrasion resistance, and a method for manufacturing the article. DETAILED DESCRIPTION OF THE INVENTION

[0009] In this specification, numerical ranges indicated using "to" include the numerical values ​​before and after "to" as the minimum and maximum values, respectively. In the present specification, the upper or lower limit of one numerical range may be replaced with the upper or lower limit of another numerical range. In addition, in the present specification, the upper or lower limit of a numerical range may be replaced with a value shown in the examples. In this specification, the term "surface treatment layer" refers to a layer formed on the surface of a substrate by surface treatment. In this specification, when a compound or group is represented by a specific formula (X), the compound or group represented by the formula (X) may be referred to as compound (X) or compound X, and group (X) or group X, respectively.

[0010] [Compound] The compound of the present disclosure includes Group 1 below, a partial structure which is an alkylene chain or a polyalkylene oxide chain, and Group 2 below. Group 1:-M 1 R 1 3 Group 2:-Si(R 2 ) n L 3-n M 1 is Si, Sn, or Ge, and R 1 are each independently a hydrocarbon group or a trialkylsilyloxy group, and R 2 are each independently a hydrocarbon group; L is each independently a hydrolyzable group or a hydroxyl group; and n is an integer of 0 to 2.

[0011] When the compound of the present disclosure is used as a surface treatment agent, the surface treatment agent can be formed to have excellent water repellency and abrasion resistance. The reason for this is not clear, but is presumed to be as follows. The compound of the present disclosure has high adhesion to a substrate and can form a surface treatment layer on the substrate due to the inclusion of Group 2. Furthermore, the compound can impart water repellency due to the inclusion of Group 1, and the compound can impart abrasion resistance by forming a packing structure due to the intermolecular interaction due to the inclusion of a partial structure that is an alkylene chain or a polyalkylene oxide chain.

[0012] The compound described in Patent Document 1 does not contain a partial structure that is an alkylene chain or a polyalkylene oxide chain, and therefore, when used as a surface treatment agent, it is thought that the abrasion resistance of the surface treatment layer is insufficient.The compound described in Patent Document 2 does not contain Group 1, and therefore, when used as a surface treatment agent, it is thought that the water repellency of the surface treatment layer is insufficient.

[0013] The compounds of the present disclosure will be described in detail below.

[0014] The compound of the present disclosure contains Group 1, a partial structure that is an alkylene chain or a polyalkylene oxide chain, and the following Group 2, and may also contain a structure other than Group 1, Group 2, and the partial structure described above. For example, the compound of the present disclosure may or may not contain an organosiloxane residue.

[0015] (Group 1) The compound of the present disclosure contains the above-mentioned Group 1. The compound may contain only one Group 1 or may contain two or more Groups 1. Since Group 1 is a monovalent group, it is located at the terminal of the compound. Group 1:-M 1 R 1 3 M 1 is Si, Sn, or Ge. R 1 are each independently a hydrocarbon group or a trialkylsilyloxy group.

[0016] When a molecule contains a plurality of groups 1, the groups 1 may be the same or different from each other. From the viewpoint of availability of raw materials and ease of production of the compound, it is preferable that the groups 1 are the same.

[0017] Si, Sn, and Ge are all group 14 elements and therefore have similar effects. 1 is preferably Si from the viewpoint of easy availability of raw materials.

[0018] R 1Examples of the hydrocarbon group represented by the formula (I) include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred, and a methyl group, an ethyl group, an n-propyl group, or an n-butyl group is more preferred, and a methyl group is even more preferred.

[0019] R 1 The alkyl group contained in the trialkylsilyloxy group represented by the formula (R) may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but is preferably a linear alkyl group, more preferably a methyl group, an ethyl group, an n-propyl group, or an n-butyl group, and even more preferably a methyl group. 1 When is a trialkylsilyloxy group, the three alkylsilyloxy groups may be the same or different from one another, but from the viewpoint of ease of production, they are preferably the same.

[0020] Examples of Group 1 include a methyldiethylsilyl group, a methylethylpropylsilyl group, a methylethylbutylsilyl group, a methyldipropylsilyl group, a methylpropylbutylsilyl group, a methyldibutylsilyl group, a dimethylethylsilyl group, a dimethylpropylsilyl group, a dimethylbutylsilyl group, a trimethylsilyl group, a triethylsilyl group, a tri-n-propylsilyl group, a tri-isopropylsilyl group, and trialkylsilyloxy groups having these groups.

[0021] Among these, from the viewpoint of improving the water repellency of the surface treatment layer, R 1 is preferably a trialkylsilyloxy group, more preferably a trimethylsilyloxy group or a triethylsilyloxy group.

[0022] (Group 2) The compound of the present disclosure contains the above-mentioned group 2. The compound may contain only one group 2, or two or more groups 2. For example, the number of groups 2 may be 1 to 18, 2 to 12, or 2 to 8. Since group 2 is a monovalent group, it is located at the terminal of the compound. Group 2:-Si(R 2 ) n L 3-n R 2 are each independently a hydrocarbon group; L is each independently a hydrolyzable group or a hydroxyl group; and n is an integer of 0 to 2.

[0023] When a molecule contains a plurality of groups 2, the groups 2 may be the same or different from each other. From the viewpoint of availability of raw materials and ease of production of the compound, it is preferable that the groups 2 are the same.

[0024] R 2 is a hydrocarbon group, preferably a saturated hydrocarbon group. 2 The number of carbon atoms is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2.

[0025] Each L is independently a hydrolyzable group or a hydroxyl group. A hydrolyzable group is a group that becomes a hydroxyl group upon hydrolysis. That is, a hydrolyzable silyl group represented by Si-L becomes a silanol group represented by Si-OH upon hydrolysis. The silanol groups further react with each other to form Si-O-Si bonds. Furthermore, the silanol groups can undergo a dehydration condensation reaction with silanol groups derived from oxides present on the surface of the substrate to form Si-O-Si bonds.

[0026] Examples of hydrolyzable groups include an alkoxy group, an aryloxy group, a halogen atom, an acyl group, an acyloxy group, and an isocyanato group (-NCO). The alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms. The aryloxy group is preferably an aryloxy group having 3 to 10 carbon atoms. However, the aryl group of the aryloxy group includes a heteroaryl group. The halogen atom is preferably a chlorine atom. The acyl group is preferably an acyl group having 1 to 6 carbon atoms. The acyloxy group is preferably an acyloxy group having 1 to 6 carbon atoms.

[0027] Among these, from the viewpoint of ease of production of the compound, L is preferably an alkoxy group having 1 to 4 carbon atoms or a halogen atom. L is preferably an alkoxy group having 1 to 4 carbon atoms, more preferably an ethoxy group or a methoxy group, from the viewpoint of less outgassing during coating and better storage stability of the compound.

[0028] n is an integer of 0 to 2, preferably 0 or 1, and more preferably 0. When a plurality of Ls are present, the adhesion of the surface treatment layer to the substrate becomes stronger. When n is 1 or less, the plurality of L's present in one molecule may be the same or different from each other. From the viewpoint of availability of raw materials and ease of production of the compound, it is preferable that the plurality of L's are the same. When n is 2, the plurality of R's present in one molecule may be the same or different from each other. 2 may be the same or different from each other. From the viewpoint of availability of raw materials and ease of production of the compound, it is preferable to use a plurality of R 2 are preferably the same.

[0029] (Partial structure that is an alkylene chain or a polyalkylene oxide chain) The compounds of the present disclosure include a partial structure that is an alkylene chain or a polyalkylene oxide chain. The partial structure is preferably present between Group 1 and Group 2. Group 1 and the partial structure, and Group 2 and the partial structure, may be bonded directly or via another structure.

[0030] From the viewpoint of improving the water repellency and abrasion resistance of the surface treatment layer, the number of carbon atoms in the alkylene chain is preferably 2 or more, more preferably 3 or more, and even more preferably 10 or more. The upper limit of the number of carbon atoms in the alkylene chain is not particularly limited, but is, for example, 80, and preferably 30. Specifically, the number of carbon atoms in the alkylene chain is preferably 1 to 30, more preferably 3 to 30, even more preferably 4 to 20, and particularly preferably 5 to 15. The alkylene chain may be straight, branched or cyclic.

[0031] In particular, from the viewpoint of improving the water repellency and abrasion resistance of the surface treatment layer, the alkylene chain is preferably linear.

[0032] Group 1 and the alkylene chain may be bonded directly or via another structure. For example, an organopolysiloxane residue (e.g., a divalent organopolysiloxane residue) may or may not be included between Group 1 and the alkylene chain.

[0033] For example, Group 1 and the alkylene chain may be bonded via a divalent organopolysiloxane residue. When Group 1, the divalent organopolysiloxane residue, and the alkylene chain are arranged in this order, another structure may be present between Group 1 and the divalent organopolysiloxane residue. For example, an oxygen atom or an alkylene chain may be arranged between Group 1 and the divalent organopolysiloxane residue.

[0034] The divalent organopolysiloxane residue is preferably represented by the following formula B: In formula B, R 5 are each independently a hydrocarbon group, and k is an integer of 1 or greater.

[0035] [ka]

[0036] R 5Examples of the hydrocarbon group represented by the formula (I) include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred, and a methyl group, an ethyl group, an n-propyl group, or an n-butyl group is more preferred, and a methyl group is even more preferred.

[0037] k is an integer of 1 or more, and is preferably 2 to 500, more preferably 8 to 300, and even more preferably 15 to 60. In terms of excellent abrasion resistance, k is preferably 9 to 50, more preferably 11 to 30, and particularly preferably 11 to 25.

[0038] The combination of the alkylene chain and the divalent organopolysiloxane residue is preferably represented by the following formula C1, C2, or C3. In formula C1, Ak 1 and Ak 2 Each independently represents an alkylene chain. 5 is R in formula B 5 where k1 is an integer equal to or greater than 1. In formula C2, Ak 3 means an alkylene chain. 5 is R in formula B 5 k2 and k3 are each independently an integer of 1 or more. In formula C3, Ak 4 means an alkylene chain. 5 is R in formula B 5 k4 is an integer equal to or greater than 1. In formulae C1, C2, and C3, *1 connects to the group 1 side, and *2 connects to the group 2 side.

[0039] [ka] JPEG2025146888000003.jpg19102 JPEG2025146888000004.jpg1993

[0040] In formula C1, Ak 1 From the viewpoint of improving the water repellency and abrasion resistance of the surface treatment layer, the number of carbon atoms in the alkylene chain represented by the formula (I) is preferably 2 or more, and more preferably 4 or more. The upper limit of the number of carbon atoms in the alkylene chain is not particularly limited, but is, for example, 30. Ak 2 The number of carbon atoms in the alkylene chain represented by the following formula is preferably 1 to 30, more preferably 3 to 30, even more preferably 4 to 20, and particularly preferably 5 to 15, from the viewpoint of improving the water repellency and abrasion resistance of the surface treatment layer. The alkylene chain may be straight, branched or cyclic.

[0041] In particular, from the viewpoint of improving the water repellency and abrasion resistance of the surface treatment layer, the alkylene chain is preferably linear.

[0042] k1 is an integer of 1 or more, and is preferably 2 to 500, more preferably 8 to 300, and even more preferably 15 to 60. In terms of excellent abrasion resistance, k1 is preferably 9 to 50, more preferably 11 to 30, and particularly preferably 11 to 25.

[0043] k11 is 0 or 1.

[0044] In formula C2, Ak 3 The number of carbon atoms in the alkylene chain represented by the following formula is preferably 1 or more, more preferably 2 to 10, and even more preferably 2 to 6, from the viewpoint of improving the water repellency and abrasion resistance of the surface treatment layer. The alkylene chain may be straight, branched or cyclic.

[0045] In particular, from the viewpoint of improving the water repellency and abrasion resistance of the surface treatment layer, the alkylene chain is preferably linear.

[0046] k2 and k3 each independently represent an integer of 1 or greater, and are preferably from 2 to 500, more preferably from 8 to 300, and even more preferably from 15 to 60. In terms of excellent abrasion resistance, they are preferably from 9 to 50, more preferably from 11 to 30, and particularly preferably from 11 to 25. In formula C3, Ak 4 The number of carbon atoms in the alkylene chain represented by the following formula is preferably 1 to 30, more preferably 3 to 30, even more preferably 4 to 20, and particularly preferably 5 to 15, from the viewpoint of improving the water repellency and abrasion resistance of the surface treatment layer. The alkylene chain may be straight, branched or cyclic.

[0047] In particular, from the viewpoint of improving the water repellency and abrasion resistance of the surface treatment layer, the alkylene chain is preferably linear.

[0048] k4 is an integer of 1 or more, and is preferably 2 to 500, more preferably 8 to 300, and even more preferably 15 to 60. In terms of excellent abrasion resistance, k4 is preferably 9 to 50, more preferably 11 to 30, and particularly preferably 11 to 25.

[0049] Among these, from the viewpoint of improving the water repellency and abrasion resistance of the surface treatment layer, the combination of an alkylene chain and a divalent organopolysiloxane residue is preferably represented by formula C3.

[0050] The polyalkylene oxide chain is represented by the following formula A: (XO) m …(A)

[0051] In formula A, each X is independently an alkylene group.

[0052] The number of carbon atoms in the alkylene group is preferably 1 to 20, and more preferably 2 to 6, from the viewpoint of improving the water repellency and abrasion resistance of the surface treatment layer. The alkylene group may be linear, branched, or cyclic.

[0053] Specific examples of (XO) include -CH2O-, -C2H4O-, -C3H6O-, -C4H8O-, and -CH 10 O-, -CH 12 O-, -CH(CH3)CH2O-, -CH(CH3)CH2CH2O-, -cycloC4H6-O-, -cycloC5H8-O-, and -cycloC6H 10 -O- is an example. Here, -cycloC4H6- means a cyclobutanediyl group. Examples of the cyclobutanediyl group include a cyclobutane-1,2-diyl group and a cyclobutane-1,3-diyl group. -cycloC5H8- means a cyclopentanediyl group. Examples of the cyclopentanediyl group include a cyclopentane-1,2-diyl group and a cyclopentane-1,3-diyl group. -cycloC6H 10 - means a cyclohexanediyl group, including cyclohexane-1,2-diyl, cyclohexane-1,3-diyl, and cyclohexane-1,4-diyl groups.

[0054] The repeat number m of (XO) is an integer of 2 or more, more preferably an integer of 3 to 200, even more preferably an integer of 5 to 150, particularly preferably an integer of 5 to 100, and most preferably an integer of 10 to 50.

[0055] (XO) m may contain two or more types of (XO). The bonding order of the two or more types of (XO) is not limited, and they may be arranged randomly, alternately, or in blocks. Containing two or more types of (XO) means that there are two or more types of (XO) with different numbers of carbon atoms in the compound, and that there are two or more types of (XO) with the same number of carbon atoms but different in the presence or absence of side chains or the type of side chain (for example, the number of side chains, the number of carbon atoms in the side chain, etc.). For two or more (XO) configurations, for example, {(CHO) m21 (C2H4O) m22The structure represented by} represents that m21 (CH2O) and m22 (C2H4O) are randomly arranged. m25 The structure represented by the formula indicates that m25 (C2H4O) and m25 (C3H6O) are arranged alternately.

[0056] Among them, (XO) m is [(CH2O) m11 (C2H4O) m12 (OC3H6) m13 (OC4H8) m14 (C5H 10 O) m15 ·(C6H 12 O) m16 (cycloC4H6-O) m17 (cycloC5H8-O) m18 (cycloCH 10 -O) m19 ] is preferred. m11, m12, m13, m14, m15, m16, m17, m18, and m19 each independently represent an integer of 0 or more, and preferably 100 or less. m11+m12+m13+m14+m15+m16+m17+m18+m19 is an integer of 2 or more, preferably an integer of 2 to 200, more preferably an integer of 5 to 150, still more preferably an integer of 5 to 100, and particularly preferably an integer of 10 to 50.

[0057] Among these, m12 is preferably an integer of 2 or more, and an integer of 2 to 200 is particularly preferred. Also, C3H6, C4H8, C5H 10 , and CH 12 The may be a straight chain or a branched chain, but is preferably a straight chain from the viewpoint of improving the abrasion resistance of the surface treatment layer.

[0058] The above formula represents the type and number of units, but does not represent the arrangement of the units. That is, m11 to m19 represent the number of units, for example, (CHO) m11does not represent a block of m11 consecutive (CHO) units. Similarly, (CHO)~(cycloCH 10 -O) does not represent that they are arranged in that order. In the above formula, if 2 or more of m11 to m19 are not 0 (i.e., (XO) m is composed of two or more types of units), the arrangement of the different units may be any of a random arrangement, an alternating arrangement, a block arrangement, and a combination of these arrangements.

[0059] (XO) m Preferably, has the following structure: (C2H4O) m21 , (C3H6O) m22 , (C2H4O) m23 (C3H6O) m24 , (C2H4O-C3H6O) m25 . Here, m21 is an integer of 2 or greater, m22 is an integer of 2 or greater, m23 and m24 are each independently an integer of 1 or greater, m25 is an integer of 1 or greater, and m26 and m27 are each independently an integer of 1 or greater.

[0060] The number average molecular weight (Mn) of the partial structure is preferably from 400 to 18,000, more preferably from 500 to 15,000, and particularly preferably from 600 to 10,000. If Mn is 1,000 or more, the fluidity of the molecular chains of the compound is increased, and the surface treatment layer has better abrasion resistance.

[0061] The compound of the present disclosure is preferably represented by the following formula 1, in that the water repellency and abrasion resistance of the surface treatment layer are more excellent. [R 1 3M 1 -(O) r -Z] p A(Si(R 2 ) n L 3-n ) q … (1) In formula 1, M 1 is Si, Sn, or Ge, and R 1 are each independently a hydrocarbon group or a trialkylsilyloxy group, r is 0 or 1, Z is each independently an alkylene chain or a polyalkylene oxide chain, or a combination of an alkylene chain and a divalent polysiloxane residue, A is a single bond or a p+q valent linking group, R 2 are each independently a hydrocarbon group, L is each independently a hydrolyzable group or a hydroxyl group, n is each independently an integer of 0 to 2, and p and q are each independently an integer of 1 or greater.

[0062] R in Equation 1 1 and M 1 is R in Group 1 above 1 and M 1 Since it is the same as the above, the explanation will be omitted. In formula 1, M 1 is preferably Si. In formula 1, R 1 is preferably a trialkylsilyloxy group, more preferably a trimethylsilyloxy group or a triethylsilyloxy group. R in Equation 1 2 , L, and n are R in Group 2 above. 2 , L, and n, so the explanation will be omitted.

[0063] The polyalkylene oxide chain represented by Z is the same as the polyalkylene oxide chain that is a partial structure, and therefore a description thereof will be omitted. Z is preferably an alkylene chain. From the viewpoint of improving the water repellency and abrasion resistance of the surface treatment layer, the number of carbon atoms in the alkylene chain is preferably 2 or more, more preferably 3 or more, and even more preferably 10 or more. The upper limit of the number of carbon atoms in the alkylene chain is not particularly limited, but is, for example, 80, and preferably 30. Specifically, the number of carbon atoms in the alkylene chain is preferably 1 to 30, more preferably 3 to 30, even more preferably 4 to 20, and particularly preferably 5 to 15.

[0064] When Z is a combination of an alkylene chain and a divalent polysiloxane residue, "R 1 3M 1 -(O) r The side bonded to "-" may be an alkylene chain or a divalent polysiloxane residue.

[0065] Also, Z is -Z 11 -Z 12 - and Z 11 is a divalent organopolysiloxane residue, and Z 12 is preferably an alkylene chain. Z 11 The divalent organopolysiloxane residue represented by the formula: is preferably represented by the formula B above. Z 12 The number of carbon atoms in the alkylene chain represented by the following formula is preferably 1 to 30, more preferably 3 to 30, even more preferably 4 to 20, and particularly preferably 5 to 15, from the viewpoint of improving the water repellency and abrasion resistance of the surface treatment layer.

[0066] In formula 1, A is a single bond or a p+q valent linking group. However, when the end of Z that is bonded to A is an alkylene chain, the end of A that is bonded to Z is not an alkylene group. When Z is a polyalkylene oxide chain, the end of A on the side bonding to Z is not an alkylene oxide group.

[0067] A may be any group as long as it does not impair the effects of the present disclosure, and examples thereof include alkylene groups which may have an etheric oxygen atom or a divalent organopolysiloxane residue, carbon atoms, nitrogen atoms, silicon atoms, divalent to octavalent organopolysiloxane residues, and Si(R 2 ) n L 3-n Examples of the groups include those excluding

[0068] Furthermore, A may be any of the groups (g2-1) to (g2-14) described below.

[0069] p is an integer of 1 or more. p is preferably 1 to 6, and more preferably 2 to 4, in order to provide a surface treatment layer with better water repellency.

[0070] If p is 2 or more, multiple [R 1 3Si-(O) r -Z] may be the same or different from each other.

[0071] q is an integer of 1 or greater. In order to provide a surface treatment layer with better abrasion resistance, q is preferably 1 to 15, more preferably 1 to 6, even more preferably 2 to 4, and particularly preferably 2 or 3.

[0072] When q is 2 or more, multiple [Si(R 2 ) n L 3-n ] may be the same or different from each other.

[0073] A(Si(R 2 ) n L 3-n ) q The group represented by the formula (3-1A) is preferably the group (3-1A) or the group (3-1B), and more preferably the group (3-1A).

[0074] -Q a -X 31 (-Q b -Si(R 2 ) n L 3-n ) h (-R 31 ) i …(3-1A) -Q c -[CH2C(R 32 )(-Q d -Si(R 2 ) n L 3-n )] y -R 33 …(3-1B) In addition, in formula (3-1A) and formula (3-1B), R 2 , L, and n are defined as above.

[0075] In formula (3-1A), Q a is a single bond or a divalent linking group. However, if the end of Z that is bonded to A is an alkylene chain, Q a The end of the group bonded to Z is not an alkylene group. When Z is a polyalkylene oxide chain, Q a The terminal bonded to Z is not an alkylene oxide group. Examples of the divalent linking group include a divalent hydrocarbon group, a divalent heterocyclic group, -O-, -S-, -SO2-, and -N(R d )-, -C(O)-, -Si(R a )2- and groups formed by combining two or more of these. The divalent hydrocarbon group may be a divalent saturated hydrocarbon group, a divalent aromatic hydrocarbon group, an alkenylene group, or an alkynylene group. The divalent saturated hydrocarbon group may be linear, branched, or cyclic, and examples thereof include alkylene groups. The alkylene group preferably has 1 to 30 carbon atoms, more preferably 1 to 20, even more preferably 4 to 20, and particularly preferably 5 to 15. The divalent aromatic hydrocarbon group preferably has 5 to 20 carbon atoms, and examples thereof include a phenylene group. Alternatively, the group may be an alkenylene group having 2 to 20 carbon atoms or an alkynylene group having 2 to 20 carbon atoms. Above R a is an alkyl group (preferably having 1 to 10 carbon atoms) or a phenyl group. d is a hydrogen atom or an alkyl group (preferably having 1 to 10 carbon atoms). Examples of groups combining two or more of these groups include -OC(O)-, -C(O)O-, -C(O)S-, and -C(O)N(R d )-, -N(R d )C(O)-, -N(R d )C(O)N(R d )-, -N(R d )C(O)O-, -OC(O)N(R d )-, -SO2N(R d )-, -N(R d)SO2-, -C(O)N(R d )-, an alkylene group having -N(R d )C(O)-, an alkylene group having -OC(O)N(R d )-, an alkylene group having an etheric oxygen atom, an alkylene group having -S-, an alkylene group having -OC(O)-, an alkylene group having -C(O)O-, an alkylene group having -C(O)S-, an alkylene group having -N(R d )-, an alkylene group having -N(R d )C(O)N(R d )-, an alkylene group having -SON(R d )-, alkylene group -Si(R a )2-phenylene group -Si(R a )2 are listed. Among them, when the terminal of Z that is bonded to A is an alkylene chain, Q a represents a divalent hydrocarbon group other than an alkylene group, a divalent heterocyclic group, -O-, -S-, -SO2-, -N(R d )-, -C(O)-, -Si(R a )2-, -OC(O)-, -C(O)O-, -C(O)S-, -C(O)N(R d )-, -N(R d )C(O)-, -N(R d )C(O)N(R d )-, -N(R d )C(O)O-, -OC(O)N(R d )-, -SO2N(R d )-, -N(R d )SO2-, -C(O)N(R d )-, an alkylene group having -N(R d )C(O)-, an alkylene group having -OC(O)N(R d )-, an alkylene group having an etheric oxygen atom, an alkylene group having -S-, an alkylene group having -OC(O)-, an alkylene group having -C(O)O-, an alkylene group having -C(O)S-, an alkylene group having -N(R d )-, an alkylene group having -N(R d )C(O)N(R d)- or -SO2N(R d )- is preferred, and an alkylene group having —OC(O)—, —C(O)N(R d )-, an alkylene group having -OC(O)N(R d )-, an alkylene group having an etheric oxygen atom, an alkylene group having -S-, an alkylene group having -C(O)O-, an alkylene group having -C(O)S-, an alkylene group having -N(R d an alkylene group having —N(R d )C(O)N(R d An alkylene group having —C(O)O— or —C(O)N(R d Alkylene groups having the formula - are more preferred. When Z is a polyalkylene oxide chain, Q a represents a divalent hydrocarbon group, a divalent heterocyclic group, -SO2-, -C(O)-, -Si(R a )2-, -C(O)O-, -C(O)S-, -C(O)N(R d )-, -SO2N(R d )-, -C(O)N(R d )-, an alkylene group having -C(O)O-, an alkylene group having -SON(R d )-, alkylene group -Si(R a )2-phenylene group -Si(R a )2 is preferred, with —C(O)— being more preferred.

[0076] In formula (3-1A), X 31 represents a single bond, an alkylene group, a carbon atom, a nitrogen atom, a silicon atom, a divalent to octavalent organopolysiloxane residue, or a group having a (h+i+1)-valent ring. However, the end of Z that bonds to A is an alkylene chain, and Q a If is a single bond, X 31 The end of the group bonded to Z is not an alkylene group. Also, Z is a polyalkylene oxide chain, and Q a If is a single bond, X 31The terminal of the side bonded to Z is not a polyalkylene oxide group. 31 The terminal of the alkylene group may be an alkylene group or an alkylene oxide group. The alkylene group may have -O-, a silphenylene skeleton group, a divalent organopolysiloxane residue, or a dialkylsilylene group. The alkylene group may have a plurality of groups selected from the group consisting of -O-, a silphenylene skeleton group, a divalent organopolysiloxane residue, and a dialkylsilylene group. X 31 The alkylene group represented by the following formula (I) preferably has 1 to 20 carbon atoms, and more preferably has 1 to 10 carbon atoms. Examples of the divalent to octavalent organopolysiloxane residue include a divalent organopolysiloxane residue and a (w+1)-valent organopolysiloxane residue described below.

[0077] In formula (3-1A), X 31 When Q is a group having a (h+i+1)-valent ring, a , (-Q b -Si(R 2 ) n L 3-n ) and R 31 is directly bonded to an atom constituting the ring, provided that the ring is a ring other than an organopolysiloxane ring. X 31 The ring in may be any of a monocycle, a fused polycycle, a bridged ring, a spiro ring, and an aggregate polycycle, and the atoms constituting the ring may be a carbocycle consisting of only carbon atoms, or a heterocycle consisting of carbon atoms and a heteroatom having a valence of two or more. In addition, the bond between the atoms constituting the ring may be a single bond or a multiple bond. Furthermore, the ring may be an aromatic ring or a non-aromatic ring. The monocycle is preferably a 4- to 8-membered ring, more preferably a 5- or 6-membered ring. The fused polycycle is preferably a fused polycycle in which two or more 4- to 8-membered rings are fused, more preferably a fused polycycle in which two or three rings selected from 5- and 6-membered rings are bonded, and more preferably a fused polycycle in which one or two rings selected from 5- and 6-membered rings are bonded to one 4-membered ring. The bridged ring is preferably a bridged ring in which the longest ring is a 5- or 6-membered ring, and the spiro ring is preferably a spiro ring consisting of two 4- to 6-membered rings. The assembled polycycle is preferably an assembled polycycle in which two or three rings selected from 5- and 6-membered rings are bonded via a single bond, 1 to 3 carbon atoms, or one heteroatom with a valence of 2 or 3. In the assembled polycycle, each ring may contain Q. a , (-Q b -Si(R 2 ) n L 3-n ) and R 31 (when i=1 or more) is preferably bonded. The heteroatoms constituting the ring are preferably nitrogen, oxygen, and sulfur atoms, and more preferably nitrogen and oxygen atoms. The number of heteroatoms constituting the ring is preferably 3 or less. When the number of heteroatoms constituting the ring is 2 or more, the heteroatoms may be different.

[0078] X 31 As the ring in the formula (I), from the viewpoints of ease of production of the compound and further superior abrasion resistance of the surface treatment layer, it is preferable to use one type selected from the group consisting of a 3- to 8-membered aliphatic ring, a benzene ring, a 3- to 8-membered heterocycle, a fused ring formed by condensing two or three of these rings, a bridged ring having a 5- or 6-membered ring as the largest ring, and an assembled polycycle having two or more of these rings and in which the linking group is a single bond, an alkylene group having 3 or less carbon atoms, an oxygen atom, or a sulfur atom. Preferred rings are a benzene ring, a 5- or 6-membered aliphatic ring, a 5- or 6-membered heterocycle having a nitrogen atom or an oxygen atom, and a condensed ring of a 5- or 6-membered carbocycle with a 4- to 6-membered heterocycle. Specific examples of the ring include the rings shown below, a 1,3-cyclohexadiene ring, a 1,4-cyclohexadiene ring, an anthracene ring, a cyclopropane ring, a decahydronaphthalene ring, a norbornene ring, a norbornadiene ring, a furan ring, a pyrrole ring, a thiophene ring, a pyrazine ring, a morpholine ring, an aziridine ring, an isoquinoline ring, an oxazole ring, an isoxazole ring, a thiazole ring, an imidazole ring, a pyrazole ring, a pyran ring, a pyridazine ring, a pyrimidine ring, and an indene ring. Rings having an oxo group (=O) are also shown below.

[0079] [ka]

[0080] X 31 The bond that does not constitute the ring of the atom that constitutes the ring in a , (-Q b -Si(R 2 ) n L 3-n ) or R 31 The bond bonded to the carbon atom is a bond bonded to the alkyl group. If there are any remaining bonds, the remaining bonds are bonded to a hydrogen atom or a substituent. Examples of the substituent include a halogen atom, an alkyl group (which may contain an ethereal oxygen atom between carbon atoms), a cycloalkyl group, an alkenyl group, an allyl group, an alkoxy group, and an oxo group (=O). In addition, one of the carbon atoms constituting the ring is Q a , (-Q b -Si(R 2 ) n L 3-n ) or R 31 If there are two bonds to one of the carbon atoms, a and (-Q b -Si(R 2 ) n L 3-n ) may be bonded, and two (-Q b -Si(R 2 ) n L 3-n ) may be bonded. Q a and (-Q b-Si(R 2 ) n L 3-n ) or R 31 It is preferable that the h (-Q b -Si(R 2 ) n L 3-n ) may be bonded to different ring atoms, two of which may be bonded to one ring carbon atom, and two (-Q b -Si(R 2 ) n L 3-n There may be two or more ring-constituting carbon atoms to which i R 31 may be bonded to different ring carbon atoms, two of which may be bonded to one ring carbon atom, and two R 31 There may be two or more ring-constituting carbon atoms to which is bonded.

[0081] Among them, X 31 From the viewpoint of improving the abrasion resistance of the surface treatment layer, is preferably a carbon atom, a nitrogen atom, a silicon atom, a tetravalent to octavalent organopolysiloxane residue, or a group having a (h+i+1)-valent ring, and more preferably a carbon atom.

[0082] In formula (3-1A), Q b is a single bond or a divalent linking group. The definition of a divalent linking group is the same as that of Q a This is the same as the definition explained in However, the end of Z that bonds to A is an alkylene chain, and Q a and X 31 If is a single bond, Q b The end of the group bonded to Z is not an alkylene group. Also, Z is a polyalkylene oxide chain, and Q a and X 31 If is a single bond, Q b The terminal of Q that is bonded to Z is not an alkylene oxide group. b The terminal of the alkylene group may be an alkylene group or an alkylene oxide group.

[0083] Among them, Q b is preferably an alkylene group which may have an etheric oxygen atom. The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10, 2 to 6, or 2 to 5. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10.

[0084] In formula (3-1A), R 31 is a hydrogen atom, a hydroxyl group, or an alkyl group. The alkyl group preferably has 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms, and even more preferably 1 carbon atom.

[0085] X 31 is a single bond or an alkylene group, h is 1 and i is 0; X 31 is a nitrogen atom, h is an integer of 1 to 2, i is an integer of 0 to 1, and h+i=2 is satisfied; X 31 is a carbon atom or a silicon atom, h is an integer of 1 to 3, i is an integer of 0 to 2, and h+i=3 is satisfied; X 31 When is a divalent to octavalent organopolysiloxane residue, h is an integer of 1 to 7, i is an integer of 0 to 6, and h+i=1 to 7 is satisfied. X 31 is a group having a (h+i+1)-valent ring, h is an integer of 1 to 7, i is an integer of 0 to 6, and h+i=1 to 7 is satisfied. (-Q b -Si(R) n L 3-n If there are two or more (-Q b -Si(R) n L 3-n ) may be the same or different. 31 If there are two or more, two or more (-R 31 ) may be the same or different.

[0086] In particular, it is preferable that i is 0 from the viewpoint of improving the abrasion resistance of the surface treatment layer.

[0087] In formula (3-1A), Q a , X 31 , and Q b If is a single bond, [Si(R 2 ) n L 3-n ] is directly bonded to Z, and Z is an alkylene chain.

[0088] In formula (3-1B), Q c is a single bond or a divalent linking group. However, if the end of Z that is bonded to A is an alkylene chain, Q c The end of the group bonded to Z is not an alkylene group. When Z is a polyalkylene oxide chain, Q c The terminal bonded to Z is not an alkylene oxide group. The definition of a divalent linking group is the same as that of Q a This is the same as the definition explained in

[0089] In formula (3-1B), R 32 is a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and is preferably a hydrogen atom in view of ease of producing the compound. The alkyl group is preferably a methyl group.

[0090] In formula (3-1B), Q d is a single bond or an alkylene group. The number of carbon atoms in the alkylene group is preferably 1 to 10, more preferably 1 to 6. From the viewpoint of ease of production of the compound, Q d is preferably a single bond or CH2-.

[0091] In formula (3-1B), R 33 is a hydrogen atom or a halogen atom, and is preferably a hydrogen atom in view of ease of producing the compound.

[0092] y is an integer of 1 to 10, and preferably an integer of 1 to 6. Two or more [CH2C(R 32 )(-Q d -Si(R 2 ) n L 3-n )] may be the same or different.

[0093] As the group (3-1A), the groups (3-1A-1) to (3-1A-7) are preferred.

[0094] -(X 32 ) s1 -Q b1 -Si(R 2 ) n L 3-n …(3-1A-1) -(X 33 ) s2 -Q a2 -N[-Q b2 -Si(R 2 ) n L 3-n ]2…(3-1A-2) -Q a3 -Si(R g )[-Q b3 -Si(R 2 ) n L 3-n ]2…(3-1A-3) -[Q e ] s4 -Q a4 -(O) t4 -C[-(O) u4 -Q b4 -Si(R 2 ) n L 3-n ] 3-w1 (-R 31 ) w1 …(3-1A-4) -Q a5 -Si[-Q b5 -Si(R 2 ) n L 3-n ]3…(3-1A-5) -[Q e ] v -Q a6 -Z a [-Q b6 -Si(R 2 )n L 3-n ] w2 …(3-1A-6) -[Q e ] s4 -Q a4 -(O) t4 -Z c [-(OQ b4 ) u4 -Si(R 2 ) n L 3-n ] w3 (-OH) w4 …(3-1A-7) In addition, in formulas (3-1A-1) to (3-1A-7), R 2 , L, and n are defined as above. However, when the end of Z that is bonded to A is an alkylene chain, the end of each of the groups (3-1A-1) to (3-1A-7) that is bonded to Z is not an alkylene group. When Z is a polyalkylene oxide chain, the end of the groups (3-1A-1) to (3-1A-7) that is bonded to Z is not an alkylene oxide group.

[0095] Among these, the group (3-1A) is preferably the group (3-1A-4).

[0096] In the group (3-1A-1), X 32 -O-, -S-, -N(R d )-, -C(O)-, -C(O)O-, -C(O)S-, -SO2N(R d )-, -N(R d )SO2-, -N(R d )C(O)-, -N(R d )C(O)N(R d )-, -OC(O)N(R d )- or -C(O)N(R d )- (where N in the formula is Q b1 (join to). R d The definition of is as described above. s1 is 0 or 1.

[0097] Among these, when the terminal of Z that is bonded to A is an alkylene chain, X 32 -O-, -S-, -N(R d )-, -C(O)-, -C(O)O-, -C(O)S-, -SO2N(R d )-, -N(R d )SO2-, -N(R d )C(O)-, -N(R d )C(O)N(R d )-, -OC(O)N(R d )- or -C(O)N(R d )- is preferred, and -O-, -S-, -N(R d )-, -C(O)O-, -C(O)S-, -N(R d )C(O)N(R d )-, -OC(O)N(R d )- or -C(O)N(R d )- is more preferred, and -C(O)O- or -C(O)N(R d )- is more preferred. When Z is a polyalkylene oxide chain, X 32 are -C(O)O-, -C(O)S-, -SO2N(R d )- or -C(O)N(R d )- is preferred, and -C(O)- is more preferred.

[0098] Q b1 is a single bond or an alkylene group. The alkylene group may have -O-, a silphenylene skeleton group, or a dialkylsilylene group. The alkylene group may have a plurality of groups selected from the group consisting of -O-, a silphenylene skeleton group, a divalent organopolysiloxane residue, and a dialkylsilylene group. When the alkylene group has -O-, a silphenylene skeleton group, a divalent organopolysiloxane residue, or a dialkylsilylene group, it is preferable that these groups be present between carbon atoms. Q b1 The alkylene group represented by the following formula (I) preferably has 1 to 30 carbon atoms, more preferably 1 to 20, still more preferably 2 to 20, and particularly preferably 2 to 6. The number of carbon atoms may also be 1 to 10.

[0099] In particular, when the terminal of Z that is bonded to A is an alkylene chain, s1 is preferably 1, and Q b1 is preferably an alkylene group having 2 to 6 carbon atoms. When Z is a polyalkylene oxide chain, s1 is preferably 0, and Q b1 is preferably an alkylene group having 2 to 6 carbon atoms.

[0100] When the terminal of Z that bonds to A is an alkylene chain, specific examples of the group (3-1A-1) include the following groups: In the following formula, * represents the bonding position to Z. [ka]

[0101] When Z is a polyalkylene oxide chain, specific examples of the group (3-1A-1) include the following groups: In the following formula, * represents the bonding position with Z. [ka]

[0102] In the group (3-1A-2), X 33 -O-, -S-, -N(R d )-, -C(O)-, -C(O)O-, -C(O)S-, -SO2N(R d )-, -N(R d )SO2-, -N(R d )C(O)-, -N(R d )C(O)N(R d )-, -OC(O)N(R d )- or -C(O)N(R d )-. R d The definition of is as described above. s2 is 0 or 1. s2 is preferably 0 in view of ease of production of the compound.

[0103] Among these, when the terminal of Z that is bonded to A is an alkylene chain, X 33 -O-, -S-, -N(R d )-, -C(O)-, -C(O)O-, -C(O)S-, -SO2N(R d )-, -N(R d )SO2-, -N(R d )C(O)-, -N(R d )C(O)N(R d )-, -OC(O)N(R d )- or -C(O)N(R d )- is preferred. When Z is a polyalkylene oxide chain, X 33 are -C(O)O-, -C(O)S-, -SO2N(R d )- or -C(O)N(R d )- is preferred.

[0104] Q a2 represents a single bond, an alkylene group, -C(O)-, or an etheric oxygen atom between carbon atoms of an alkylene group having two or more carbon atoms, -C(O)-, -C(O)O-, -OC(O)-, -C(O)N(R d )-, -N(R d )C(O)-, -N(R d )C(O)N(R d )-, -N(R d )C(O)O-, -OC(O)N(R d )-, -SO2N(R d )-, -N(R d )SO2-, -C(O)N(R d )- or -NH-. Q a2 The alkylene group represented by the following formula (I) preferably has 1 to 20 carbon atoms, more preferably 1 to 10 carbon atoms, further preferably 1 to 6 carbon atoms, and particularly preferably 1 to 3 carbon atoms. Q a2 An etheric oxygen atom is not present between carbon atoms of an alkylene group having two or more carbon atoms, and the alkylene group is represented by -C(O)-, -C(O)O-, -OC(O)-, -C(O)N(R d )-, -N(R d )C(O)-, -N(R d )C(O)N(Rd )-, -N(R d )C(O)O-, -OC(O)N(R d )-, -SO2N(R d )-, -N(R d )SO2-, -C(O)N(R d The group having — or —NH— preferably has 2 to 10 carbon atoms, more preferably 2 to 6 carbon atoms.

[0105] Q a2 is preferably a single bond in terms of ease of production of the compound.

[0106] Q b2 is an alkylene group or a group having a divalent organopolysiloxane residue, an etheric oxygen atom, or an -NH- group between carbon atoms of an alkylene group having two or more carbon atoms. Q b2 The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. Q b2 The number of carbon atoms in the group having a divalent organopolysiloxane residue, an etheric oxygen atom or an -NH- between carbon atoms of the alkylene group having 2 or more carbon atoms represented by the following formula is preferably 2 to 10, and more preferably 2 to 6.

[0107] Q b2 As the bond, -CH2CH2CH2- and -CH2CH2OCH2CH2CH2- are preferred in terms of ease of compound production (however, the right side bonds to Si).

[0108] Two [-Q b2 -Si(R 2 ) n L 3-n ] may be the same or different.

[0109] When the terminal of Z that is bonded to A is an alkylene chain, specific examples of the group (3-1A-2) include the following groups. In the following formula, * represents the bonding position to Z. In addition, in the formula, (CH2) that bonds to a reactive silyl group α In the formula, α is an integer representing the number of methylene groups, and is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20. It may be 2 to 10, or may be 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may be 1 to 10. Multiple α groups contained in the same compound may be the same or different, but are preferably the same. For example, multiple α groups contained in the same compound are all 2, 3, 8, 9, and 11. The same applies hereinafter. [ka]

[0110] When Z is a polyalkylene oxide chain, specific examples of the group (3-1A-2) include the following groups: In the following formula, * represents the bonding position with Z. [ka]

[0111] In the group (3-1A-3), Q a3 is a single bond or an alkylene group which may have an etheric oxygen atom. a3 is preferably a single bond. The alkylene group which may have an etheric oxygen atom preferably has 1 to 10 carbon atoms, and particularly preferably has 2 to 6 carbon atoms.

[0112] R g is a hydrogen atom, a hydroxyl group, or an alkyl group. R g From the viewpoint of ease of production of the compound, a hydrogen atom or an alkyl group is preferred. The alkyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 4 carbon atoms, and further preferably a methyl group.

[0113] Qb3 is an alkylene group or a group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms in an alkylene group having two or more carbon atoms. Q b3 The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. Q b3 The group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms of the alkylene group having 2 or more carbon atoms, represented by the following formula (I), preferably has 2 to 20 carbon atoms, more preferably 2 to 10 carbon atoms, and even more preferably 2 to 6 carbon atoms. Q b3 is preferably -CH2CH2-, -CH2CH2CH2-, or -CH2CH2CH2CH2CH2CH2CH2CH2CH2- from the viewpoint of ease of production of the compound.

[0114] Two [-Q b3 -Si(R 2 ) n L 3-n ] may be the same or different.

[0115] When the terminal of Z on the side bonding to A is an alkylene chain, specific examples of the group (3-1A-3) include the following groups: In the following formula, * represents the bonding position to Z. [ka]

[0116] When Z is a polyalkylene oxide chain, specific examples of the group (3-1A-3) include the following groups: In the following formula, * represents the bonding position with Z. [ka]

[0117] In the group (3-1A-4), Q eis -C(O)O-, -SO2N(R d )-, -N(R d )SO2-, -N(R d )C(O)- or -C(O)N(R d )-. R 31 The definition of is as described above. When w1 is 1 or 2, R 31 is preferably a hydrogen atom. s4 is 0 or 1. Q a4 is a single bond or an alkylene group which may have an etheric oxygen atom. The alkylene group which may have an etheric oxygen atom preferably has 1 to 20 carbon atoms, more preferably 1 to 10 carbon atoms, further preferably 1 to 6 carbon atoms, and particularly preferably 1 to 3 carbon atoms. t4 is 0 or 1 (however, Q a4 is a single bond, the value is 0. -Q a4 -(O) t4 When s4 is 0, - is preferably a single bond, -CH2O-, -CH2OCH2-, -CH2OCH2CH2O-, -CH2OCH2CH2OCH2-, or -CH2OCH2CH2CH2CH2OCH2- (however, when the left side is (XO) m When s4 is 1, a single bond, -CH2-, or -CH2CH2- is preferred.

[0118] Q b4 is an alkylene group, and the alkylene group is —O—, —C(O)N(R d )-(R d The definition of is as described above.) may have a silphenylene skeleton group, a divalent organopolysiloxane residue or a dialkylsilylene group. When the alkylene group has an -O- or silphenylene skeleton group, it is preferable that the -O- or silphenylene skeleton group is present between carbon atoms. d )-, dialkylsilylene group or divalent organopolysiloxane residue, carbon atom-carbon atom or (O)u4 It is preferable that the group is present at the terminal on the side that bonds to the hydroxyl group. Q b4 The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10.

[0119] u4 is 0 or 1. -(O) u4 -Q b4 As -, -CH2CH2-, -CH2CH2CH2-, -CH2OCH2CH2CH2-, -CH2OCH2CH2CH2CH2CH2-, -OCH2CH2CH2-, -OSi(CH3)2CH2CH2CH2-, -OSi(CH3)2OSi(CH3)2CH2CH2CH2-, -CH2CH2CH2Si(CH3)2PhSi(CH3)2CH2CH2- are preferred in terms of ease of production of the compounds (however, the right side is bonded to Si).

[0120] w1 is an integer of 0 to 2, preferably 0 or 1, and particularly preferably 0. [-(O) u4 -Q b4 -Si(R 2 ) n L 3-n If there are two or more [-(O) u4 -Q b4 -Si(R 2 ) n L 3-n ] may be the same or different. R 31 If there are two or more, two or more (-R 31 ) may be the same or different.

[0121] When the terminal of Z that is bonded to A is an alkylene chain, specific examples of the group (3-1A-4) include the following groups: In the following formula, * represents the bonding position to Z. [ka]

[0122] When Z is a polyalkylene oxide chain, specific examples of the group (3-1A-4) include the following groups: In the following formula, * represents the bonding position with Z. [ka]

[0123] In the group (3-1A-5), Q a5 is an alkylene group which may have an etheric oxygen atom. The alkylene group which may have an etheric oxygen atom preferably has 1 to 10 carbon atoms, and particularly preferably has 2 to 6 carbon atoms. Q a5 As the group, -OCH2CH2CH2-, -OCH2CH2OCH2CH2CH2-, -CH2CH2-, and -CH2CH2CH2- are preferred in terms of ease of production of the compound (where the right side bonds to Si).

[0124] Q b5 is an alkylene group or a group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms in an alkylene group having two or more carbon atoms. Q b5 The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. Q b5 The group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms of the alkylene group having 2 or more carbon atoms, represented by the following formula (I), preferably has 2 to 20 carbon atoms, more preferably 2 to 10 carbon atoms, and even more preferably 2 to 6 carbon atoms. Q b5 As the aryl group, -CH2CH2CH2- and -CH2CH2OCH2CH2CH2- are preferred in terms of ease of compound production (however, if the right side is Si(R 2 ) n L3-n Binds to.

[0125] Three [-Q b5 -Si(R 2 ) n L 3-n ] may be the same or different.

[0126] When the terminal of Z that is bonded to A is an alkylene chain, specific examples of the group (3-1A-5) include the following groups: In the following formula, * represents the bonding position to Z. [ka]

[0127] When Z is a polyalkylene oxide chain, specific examples of the group (3-1A-5) include the following groups: In the following formula, * represents the bonding position with Z. [ka]

[0128] Q in group (3-1A-6) e is as defined above in the group (3-1A-4). v is 0 or 1.

[0129] Q a6 is an alkylene group which may have an etheric oxygen atom. The alkylene group which may have an etheric oxygen atom preferably has 1 to 10 carbon atoms, and particularly preferably has 2 to 6 carbon atoms. Q a6 As the alkyl group, -CH2OCH2CH2CH2-, -CH2OCH2CH2OCH2CH2CH2-, -CH2CH2-, and -CH2CH2CH2- are preferred in terms of ease of production of the compound (however, when the right side is Z, a Binds to.

[0130] Z ais a (w2+1)-valent organopolysiloxane residue, or a (w2+1)-valent group having an alkylene group between the organopolysiloxane residues. w2 is an integer from 2 to 7. Examples of the (w2+1)-valent organopolysiloxane residue and the (w2+1)-valent group having an alkylene group between the organopolysiloxane residues include the following groups, where R a * denotes a binding site. [ka]

[0131] Q b6 is an alkylene group or a group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms in an alkylene group having two or more carbon atoms. Q b6 The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. Q b6 The group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms of the alkylene group having 2 or more carbon atoms, represented by the following formula (I), preferably has 2 to 20 carbon atoms, more preferably 2 to 10 carbon atoms, and even more preferably 2 to 6 carbon atoms. Q b6 As the alkyl group, -CH2CH2- and -CH2CH2CH2- are preferred in terms of ease of production of the compound. w2 [-Q b6 -Si(R 2 ) n L 3-n ] may be the same or different.

[0132] Specific examples of the group (3-1A-6) include the following groups: In the following formula, * represents the bonding position to Z. [ka]

[0133] In the group (3-1A-7), Z c is a (w3+w4+1) valent hydrocarbon group. w3 is an integer equal to or greater than 4. w4 is an integer equal to or greater than 0. Q e , s4, Q a4 , t4, Q b4 The definitions and preferred ranges of u4 and u5 are the same as those of each symbol in the group (3-1A-4).

[0134] Z c may be composed of a hydrocarbon chain, and may have an etheric oxygen atom between carbon atoms of the hydrocarbon chain, and is preferably composed of a hydrocarbon chain. Z c The valence of the alkyl group is preferably from 5 to 20, more preferably from 5 to 10, further preferably from 5 to 8, and particularly preferably from 5 to 6. Z c The number of carbon atoms is preferably 3 to 50, more preferably 4 to 40, and even more preferably 5 to 30. w3 is preferably 4 to 20, more preferably 4 to 16, further preferably 4 to 8, and particularly preferably 4 or 5. w4 is preferably 0 to 10, more preferably 0 to 8, still more preferably 0 to 6, particularly preferably 0 to 3, and most preferably 0 to 1. [-(OQ b4 ) u4 -Si(R 2 ) n L 3-n If there are two or more ], there are two or more [-(OQ b4 ) u4 -Si(R 2 ) n L 3-n ] may be the same or different.

[0135] When the A-side terminal of Z is an alkylene chain, specific examples of the group (3-1A-7) include the following groups: In the following formula, * represents the bonding position with Z. [ka]

[0136] When the A-side terminal of Z is a polyalkylene oxide chain, specific examples of the group (3-1A-7) include the following groups: In the following formula, * represents the bonding position with Z. [ka]

[0137] A in formula 1 may be a group (g2-1) (where j1=d1+d3, g1=d2+d4), a group (g2-2) (where j1=e1, g1=e2), a group (g2-3) (where j1=1, g1=2), a group (g2-4) (where j1=h1, g1=h2), a group (g2-5) (where j1=i1, g1=i2), a group (g2-6) (where j1=1, g1=1), or a group (g2-7) (where j1=1, g1=i3).

[0138] [ka]

[0139] (-A 1 -Q 12 -) e1 C(R e2 ) 4-e1-e2 (-Q 22 -) e2 …(g2-2) -A 1 -Q 13 -N(-Q 23 -)2…(g2-3) (-A 1 -Q 14 -) h1 Z 1 (-Q 24 -) h2…(g2-4) (-A 1 -Q 15 -) i1 Si(R e3 ) 4-i1-i2 (-Q 25 -) i2 …(g2-5) -A 1 -Q 26 - (g2-6) -A 1 -Q 12 -CH(-Q 22 -)-Si(R e3 ) 3-i3 (-Q 25 -) i3 …(g2-7)

[0140] However, in formulas (g2-1) to (g2-7), A 1 The side bonds to Z, and Q 22 , Q 23 , Q 24 , Q 25 or Q 26 The side is [-Si(R 2 ) n L 3-n ] is combined with If the end of Z that is bonded to A is an alkylene chain, 1 The end of the group bonded to Z is not an alkylene group. When Z is a polyalkylene oxide chain, A 1 The terminal bonded to Z is not an alkylene oxide group. A 1 is a single bond, -C(O)NR 6 -, -C(O)-, -OC(O)O-, -NHC(O)O-, -NHC(O)NR 6 -, -O- or SO2NR 6 -It is. Q 11 represents a single bond, -O-, an alkylene group, or -C(O)NR between carbon atoms of an alkylene group having two or more carbon atoms. 6 -, -C(O)-, -NR 6 - or a group having O-. Q 12represents a single bond, an alkylene group, or an alkylene group having two or more carbon atoms with -C(O)NR between carbon atoms. 6 -, -C(O)-, -NR 6 - or O-, and A is Q 12 If there are two or more, there are two or more Q 12 may be the same or different. Q 13 is a single bond (where A 1 is -C(O)-.) An alkylene group, an alkylene group having 2 or more carbon atoms, with -C(O)NR between carbon atoms. 6 -, -C(O)-, -NR 6 It is a group having - or O-, or a group having -C(O)- at the N-terminal of the alkylene group. Q 14 Q 14 Z bonded to 1 If the atom in is a carbon atom, Q 12 and Q 14 Z bonded to 1 If the atom in is a nitrogen atom, Q 13 and A 2 Q 14 If there are two or more, there are two or more Q 14 may be the same or different. Q 15 represents an alkylene group or an alkylene group having two or more carbon atoms with -C(O)NR between carbon atoms. 6 -, -C(O)-, -NR 6 - or O-, and A is Q 15 If there are two or more, there are two or more Q 15 may be the same or different. Q 22 is an alkylene group, an alkylene group with two or more carbon atoms that has -C(O)NR between carbon atoms. 6 -, -C(O)-, -NR 6 a group having - or O-, and -C(O)NR at the end of the alkylene group not connected to Si; 6 -, -C(O)-, -NR 6 A group having - or O-, or an alkylene group having 2 or more carbon atoms having -C(O)NR between carbon atoms. 6-, -C(O)-, -NR 6 - or -C(O)NR at the end that has O- and is not connected to Si 6 -, -C(O)-, -NR 6 - or O-, and A is Q 22 If there are two or more, there are two or more Q 22 may be the same or different. Q 23 represents an alkylene group or an alkylene group having two or more carbon atoms with -C(O)NR between carbon atoms. 6 -, -C(O)-, -NR 6 - or O-, and two Q 23 may be the same or different. Q 24 Q 24 Z bonded to 1 If the atom in is a carbon atom, Q 22 and Q 24 Z bonded to 1 If the atom in is a nitrogen atom, Q 23 and A is Q 24 If there are two or more, there are two or more Q 24 may be the same or different. Q 25 represents an alkylene group or an alkylene group having two or more carbon atoms with -C(O)NR between carbon atoms. 6 -, -C(O)-, -NR 6 - or O-, and A is Q 25 If there are two or more, there are two or more Q 25 may be the same or different. Q 26 represents an alkylene group or an alkylene group having two or more carbon atoms with -C(O)NR between carbon atoms. 6 -, -C(O)-, -NR 6 - or a group having O-. Q 22 , Q 23 , Q 24 , Q 25 , Q 26 When is an alkylene group, it preferably has 1 to 20 carbon atoms, more preferably 1 to 10 carbon atoms, and even more preferably 1 to 6 carbon atoms. Z1 Q 14 has a carbon atom or nitrogen atom to which Q is directly bonded, 24 is a group having an h1+h2 valent ring structure having a carbon atom or nitrogen atom to which is directly bonded. R e1 is a hydrogen atom or an alkyl group, and A is R e1 If there are two or more, there are two or more R e1 may be the same or different. R e2 is a hydrogen atom, a hydroxyl group, an alkyl group, or an acyloxy group. R e3 is an alkyl group. 6 is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group.

[0141] d1 is an integer of 0 to 3, and is preferably 1 or 2. d2 is an integer of 0 to 3, and is preferably 1 or 2. d1+d2 is an integer of 1 to 3. d3 is an integer of 0 to 3, and is preferably 0 or 1. d4 is an integer of 0 to 3, and is preferably 2 or 3. d3+d4 is an integer between 1 and 3. d1+d3 is an integer of 1 to 5, and is preferably 1 or 2. d2+d4 is an integer of 1 to 5, and is preferably 4 or 5. e1+e2 is 3 or 4. e1 is an integer of 1 to 3, and is preferably 1 or 2. e2 is an integer of 1 to 3, and is preferably 2 or 3. h1 is an integer of 1 or more, and is preferably 1 or 2. h2 is an integer of 1 or more, and is preferably 2 or 3. i1+i2 is 3 or 4. i1 is an integer of 1 to 3, and is preferably 1 or 2. i2 is an integer of 1 to 3, and is preferably 2 or 3. i3 is 2 or 3.

[0142] Q 11 , Q 12 , Q 13 , Q 14 , Q 15 , Q 22 , Q 23 , Q 24 , Q 25 and Q 26 The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, from the viewpoints of ease of production of the compound and further improving the abrasion resistance of the surface treatment layer, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10, 1 to 6, or 1 to 4. However, when a specific bond is present between carbon atoms, the lower limit of the number of carbon atoms in the alkylene group is 2.

[0143] Z 1 The ring structure in Z includes the ring structures described above, and the preferred embodiments are also the same. 1 The ring structure in 14 YaQ 24 is directly bonded to the ring structure, for example, an alkylene group is connected to the ring structure, and Q is 14 YaQ 24 are never connected.

[0144] R e1 , R e2 or R e3 The number of carbon atoms in the alkyl group is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 or 2, from the viewpoint of ease of production of the compound. R e2 The number of carbon atoms in the alkyl group portion of the acyloxy group is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 or 2, from the viewpoint of ease of production of the compound. h1 is preferably 1 to 6, more preferably 1 to 4, still more preferably 1 or 2, and particularly preferably 1, in terms of ease of production of the compound and further superior abrasion resistance of the surface treatment layer. h2 is preferably 2 to 6, more preferably 2 to 4, and particularly preferably 2 or 3, in terms of ease of production of the compound and further superior abrasion resistance of the surface treatment layer.

[0145] Other forms of A include a group (g2-8) (where j1=d1+d3, g1=d2×k3+d4×k3), a group (g2-9) (where j1=e1, g1=e2×k3), a group (g2-10) (where j1=1, g1=2×k3), a group (g2-11) (where j1=h1, g1=h2×k3), a group (g2-12) (where j1=i1, g1=i2×k3), a group (g2-13) (where j1=1, g1=k3), or a group (g2-14) (where j1=1, g1=i3×k3).

[0146] [ka]

[0147] (-A 1 -Q 12 -) e1 C(R e2 ) 4-e1-e2 (-Q 22 -G 1 ) e2 …(g2-9) -A 1 -Q 13 -N(-Q 23 -G 1 )2…(g2-10) (-A 1 -Q 14 -) h1 Z 1 (-Q 24 -G 1 ) h2 …(g2-11) (-A 1 -Q 15 -) i1 Si(R e3 ) 4-i1-i2 (-Q 25 -G 1 ) i2 …(g2-12) -A1 -Q 26 -G 1 …(g2-13) -A 1 -Q 12 -CH(-Q 22 -G 1 )-Si(R e3 ) 3-i3 (-Q 25 -G 1 ) i3 …(g2-14)

[0148] However, in formulas (g2-8) to (g2-14), A 1 The side bonds with Z, and G 1 The side is [-Si(R 2 ) n L 3-n ] is combined with If the end of Z that is bonded to A is an alkylene chain, 1 The end of the group bonded to Z is not an alkylene group. When Z is a polyalkylene oxide chain, A 1 The terminal bonded to Z is not an alkylene oxide group.

[0149] G 1 is the following group (g3), and A has two or more G 1 may be the same or different. 1 The symbols other than are the same as those in formulas (g2-1) to (g2-7). -Si(R 8 ) 3-k3 (-Q 3 -) k3 …(g3) However, in the group (g3), the Si side is Q 22 , Q 23 , Q 24 , Q 25 and Q 26 Connect to Q 3 The side is [-Si(R 2 ) n L 3-n ]. R 8 is an alkyl group. 3is an alkylene group, an alkylene group with two or more carbon atoms that has -C(O)NR between carbon atoms. 6 -, -C(O)-, -NR 6 - or -O-, or (OSi(R 9 )2) p -O- and 2 or more Q 3 may be the same or different. k3 is 2 or 3. R 6 is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group. 9 is an alkyl group, a phenyl group, or an alkoxy group, and two R 9 may be the same or different. p is an integer of 0 to 5, and when p is 2 or more, 2 or more (OSi(R 9 )2) may be the same or different.

[0150] Q 3 The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, from the viewpoint of ease of production of the compound and further improved abrasion resistance of the surface treatment layer, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may be 1 to 10, 1 to 6, or 1 to 4. However, when a specific bond is present between carbon atoms, the lower limit of the number of carbon atoms in the alkylene group is 2. R 8 The number of carbon atoms in the alkyl group is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2, from the viewpoint of ease of production of the compound. R 9 The number of carbon atoms in the alkyl group is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2, from the viewpoint of ease of production of the compound. R 9 The number of carbon atoms in the alkoxy group is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 or 2, in terms of excellent storage stability of the compound. p is preferably 0 or 1.

[0151] Examples of the compound of the present disclosure include compounds of the following formula: The compound of the following formula is preferred because it is easy to produce industrially, easy to handle, and provides a surface treatment layer with even better water repellency and abrasion resistance. t is the [R 1 3Si-(O) r -Z] and preferred forms are also the same.

[0152] When the terminal of Z on the side bonding to A is an alkylene chain, examples of compounds in which A in formula 1 is group (g2-1) include compounds of the following formula. [ka]

[0153] When Z is a polyalkylene oxide chain, examples of compounds in which A in formula 1 is group (g2-1) include compounds of the following formula. [ka]

[0154] When the terminal of Z that bonds to A is an alkylene chain, examples of compounds in which A in formula 1 is group (g2-2) include compounds of the following formula: In the following formula, Ak represents an alkyl group (for example, an alkyl group having 1 to 15 carbon atoms). [ka] [ka]

[0155] When Z is a polyalkylene oxide chain, examples of the compound in which A in formula 1 is group (g2-2) include compounds of the following formula. [ka] [ka]

[0156] When the terminal of Z on the side bonding to A is an alkylene chain, examples of compounds in which A in formula 1 is group (g2-3) include compounds of the following formula.

[0157] [ka]

[0158] When Z is a polyalkylene oxide chain, examples of the compound in which A in formula 1 is group (g2-3) include compounds of the following formula.

[0159] [ka]

[0160] When the terminal of Z on the side bonding to A is an alkylene chain, examples of compounds in which A in formula 1 is group (g2-4) include compounds of the following formulae. [ka]

[0161] When Z is a polyalkylene oxide chain, examples of compounds in which A in formula 1 is group (g2-4) include compounds of the following formula. [ka]

[0162] When the terminal of Z on the side bonding to A is an alkylene chain, examples of compounds in which A in formula 1 is group (g2-5) include compounds of the following formulae. [ka]

[0163] When Z is a polyalkylene oxide chain, examples of compounds in which A in formula 1 is group (g2-5) include compounds of the following formulae. [ka]

[0164] When the terminal of Z on the side bonding to A is an alkylene chain, examples of compounds in which A in formula 1 is group (g2-6) include compounds of the following formulae. [ka]

[0165] When Z is a polyalkylene oxide chain, examples of compounds in which A in formula 1 is group (g2-6) include compounds of the following formula. [ka]

[0166] When the terminal of Z on the side bonding to A is an alkylene chain, examples of compounds in which A in formula 1 is group (g2-7) include compounds of the following formulae. [ka]

[0167] When Z is a polyalkylene oxide chain, examples of compounds in which A in formula 1 is group (g2-7) include compounds of the following formulae. [ka]

[0168] When the terminal of Z on the side bonding to A is an alkylene chain, examples of compounds in which A in formula 1 is group (g2-8) include compounds of the following formulae. [ka]

[0169] When Z is a polyalkylene oxide chain, examples of compounds in which A in formula 1 is group (g2-8) include compounds of the following formulae. [ka]

[0170] Examples of compounds in which A in formula 1 is group (g2-9) include compounds of the following formulae. [ka]

[0171] When the terminal of Z on the side bonding to A is an alkylene chain, examples of compounds in which A in formula 1 is group (g2-10) include compounds of the following formulae. [ka]

[0172] When Z is a polyalkylene oxide chain, examples of compounds in which A in formula 1 is group (g2-10) include compounds of the following formulae. [ka]

[0173] When the terminal of Z on the side bonding to A is an alkylene chain, examples of compounds in which A in formula 1 is group (g2-11) include compounds of the following formulae. [ka]

[0174] When Z is a polyalkylene oxide chain, examples of compounds in which A in formula 1 is group (g2-11) include compounds of the following formula. [ka]

[0175] When the terminal of Z on the side bonding to A is an alkylene chain, examples of compounds in which A in formula 1 is group (g2-12) include compounds of the following formulae. [ka]

[0176] When Z is a polyalkylene oxide chain, examples of compounds in which A in formula 1 is group (g2-12) include compounds of the following formulae. [ka]

[0177] When the terminal of Z on the side bonding to A is an alkylene chain, examples of compounds in which A in formula 1 is group (g2-13) include compounds of the following formulae. [ka]

[0178] When Z is a polyalkylene oxide chain, examples of compounds in which A in formula 1 is group (g2-13) include compounds of the following formulae. [ka]

[0179] Examples of compounds in which A in formula 1 is group (g2-14) include compounds of the following formulae. [ka]

[0180] The compound of the present disclosure is preferably a compound represented by the following formula 4: [ka]

[0181] In formula 4, R 1 is R in group 1 1 It's the same. R 5 is R in formula B 5 k4 is the same as k4 in formula C3. A(Si(R 2 ) n L 3-n ) q is a group represented by A(Si(R 2 ) n L 3-n ) q is the same as the group represented by Ak 4 is Ak in Equation C3 4 is the same as

[0182] The compound of the present disclosure is preferably a compound represented by formula 4A or 4B below.

[0183] [ka]

[0184] [ka]

[0185] In Formula 4A and Formula 4B, R 5 is R in formula B 5 k4 is the same as k4 in formula C3. A(Si(R 2 ) n L 3-n ) q is a group represented by A(Si(R 2 ) n L 3-n ) q is the same as the group represented by Ak 4 is Ak in Equation C3 4 is the same as

[0186] Compounds of the present disclosure include, for example, the following compounds:

[0187] [ka]

[0188] [ka]

[0189] In the following formula, n is preferably 9 to 50, more preferably 11 to 30, and particularly preferably 11 to 25.

[0190] [ka]

[0191] In the following formula, k is preferably 1 to 80, more preferably 3 to 50, and even more preferably 3 to 30. m is preferably 1 to 30, more preferably 3 to 20, and even more preferably 3 to 10. t is preferably 1 to 30, more preferably 3 to 20, and even more preferably 3 to 10. In the following formula, n is preferably 9 to 50, more preferably 11 to 30, and particularly preferably 11 to 25.

[0192] [ka]

[0193] In the following formula, n is preferably 9 to 50, more preferably 11 to 30, and particularly preferably 11 to 25.

[0194] [ka]

[0195] In the following formula, s is preferably 1 to 30, more preferably 4 to 20, and even more preferably 5 to 15.

[0196] [ka]

[0197] The number average molecular weight (Mn) of the compound of the present disclosure is preferably 500 to 20,000, more preferably 600 to 18,000, and even more preferably 700 to 15,000. If Mn is 500 or more, the abrasion resistance of the surface treatment layer is superior. If Mn is 20,000 or less, the viscosity can be easily adjusted within an appropriate range and the solubility is improved, resulting in excellent handling properties during film formation.

[0198] [Composition] The composition of the present disclosure may contain the compound of the present disclosure, and the components other than the compound of the present disclosure are not particularly limited.The composition of the present disclosure preferably contains the compound of the present disclosure and a liquid medium.When containing a liquid medium, the composition of the present disclosure may be liquid, and may be a solution or a dispersion. The composition of the present disclosure may contain the compound of the present disclosure, and may contain impurities such as by-products produced in the manufacturing process of the compound of the present disclosure.

[0199] The content of the compound of the present disclosure is preferably 0.001 to 40 mass%, more preferably 0.01 to 20 mass%, and even more preferably 0.1 to 10 mass%, relative to the total amount of the composition of the present disclosure. In the case of a composition of the present disclosure used in a wet coating method, the content of the compound of the present disclosure may be 0.01 to 10 mass%, 0.02 to 5 mass%, 0.03 to 3 mass%, or 0.05 to 2 mass%, relative to the total amount of the composition of the present disclosure. The composition of the present disclosure may contain only one type of liquid medium, or two or more types.

[0200] The liquid medium is preferably an organic solvent.

[0201] Examples of organic solvents include compounds consisting only of hydrogen atoms and carbon atoms, and compounds consisting only of hydrogen atoms, carbon atoms, and oxygen atoms. Specific examples include hydrocarbon organic solvents, ketone organic solvents, ether organic solvents, ester organic solvents, glycol organic solvents, and alcohol organic solvents. Specific examples of hydrocarbon organic solvents include pentane, hexane, heptane, octane, hexadecane, isohexane, isooctane, isononane, cycloheptane, cyclohexane, bicyclohexyl, benzene, toluene, ethylbenzene, o-xylene, m-xylene, p-xylene, o-diethylbenzene, m-diethylbenzene, p-diethylbenzene, n-butylbenzene, sec-butylbenzene, and tert-butylbenzene. Specific examples of the ketone organic solvent include acetone, methyl ethyl ketone, methyl isobutyl ketone, diisobutyl ketone, cyclohexanone, 2-heptanone, 4-heptanone, 3,5,5-trimethyl-2-cyclohexen-1-one, and 3,3,5-trimethylcyclohexanone, and isophorone. Specific examples of the ether-based organic solvent include diethyl ether, cyclopentyl methyl ether, tetrahydrofuran, and 1,4-dioxane. Specific examples of ester-based organic solvents include methyl acetate, ethyl acetate, propyl acetate, isopropyl acetate, butyl acetate, isobutyl acetate, tert-butyl acetate, amyl acetate, isoamyl acetate, ethyl 3-ethoxypropionate, ethyl lactate, ethylene glycol monobutyl ether acetate, diethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, dipropylene glycol methyl ether acetate, 3-methoxy-3-methylbutyl acetate, 3-methoxybutyl acetate, propylene glycol monomethyl acetate, propylene glycol dimethyl acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monomethyl ether acetate, and diethylene glycol monoethyl ether acetate, cyclohexanol acetate, propylene glycol diacetate, propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether propionate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, propylene glycol monopropyl ether acetate, propylene glycol diacetate, dipropylene glycol methyl ether acetate, 1,3-butylene glycol diacetate, 1,4-butanediol diacetate, 1,3-butylene glycol diacetate, 1,6-hexanediol diacetate, γ-butyrolactone, triacetin, 2,2,4-trimethyl-1,3-pentanediol monoisobutyrate. Specific examples of glycol-based organic solvents include ethylene glycol, ethylene glycol monobutyl ether, diethylene glycol monobutyl ether, triethylene glycol monobutyl ether, tetraethylene glycol monobutyl ether, ethylene glycol monohexyl ether, diethylene glycol monohexyl ether, ethylene glycol mono-2-ethylhexyl ether, diethylene glycol mono-2-ethylhexyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monopropyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-tert-butyl ether, ethylene glycol monopropyl ether, ethylene glycol monomethyl ether, diethylene glycol monoisopropyl ether, diethylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monobutyl ether, and dipropylene glycol monomethyl ether. glycol monopropyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monobutyl ether, tripropylene glycol monomethyl ether, propylene glycol monophenyl ether, 1,3-butylene glycol, propylene glycol n-propyl ether, propylene glycol n-butyl ether, diethylene glycol monoethyl ether, dipropylene glycol n-propyl ether, dipropylene glycol n-butyl ether, tripropylene glycol methyl ether, tripropylene glycol n-butyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, dipropylene glycol dimethyl ether, diethylene glycol dibutyl ether, tetraethylene glycol dimethyl ether, dipropylene glycol dimethyl ether pentane, triethylene glycol dimethyl ether, and polyethylene glycol dimethyl ether. Specific examples of the alcohol-based organic solvent include methanol, ethanol, 1-propanol, isopropyl alcohol, n-butanol, diacetone alcohol, isobutanol, sec-butanol, tert-butanol, pentanol, 3-methyl-1,3-butanediol, 1,3-butanediol, 1,3-butylene glycol, octanediol, 2,4-diethylpentanediol, butylethylpropanediol, 2-methyl-1,3-propanediol, 4-hydroxy-4-methyl-2-pentanone, 2-ethyl-1-hexanol, 3,5,5-trimethyl-1-hexanol, isodecanol, isotridecanol, 3-methoxy-3-methyl-1-butanol, 2-methoxybutanol, 3-methoxybutanol, cyclohexanol, furfuryl alcohol, tetrahydrofurfuryl alcohol, benzyl alcohol, and methylcyclohexanol.

[0202] Examples of the organic solvent include halogen-based organic solvents, nitrogen-containing compounds, sulfur-containing compounds, and siloxane compounds.

[0203] Specific examples of halogen-based organic solvents include dichloromethane, chloroform, carbon tetrachloride, dichloroethane, chlorobenzene, o-chlorotoluene, m-chlorotoluene, p-chlorotoluene, m-dichlorobenzene, and 1,2,3-trichloropropane.

[0204] Examples of the nitrogen-containing compound include nitrobenzene, acetonitrile, benzonitrile, N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, and 1,3-dimethyl-2-imidazolidinone.

[0205] Examples of sulfur-containing compounds include carbon disulfide and dimethyl sulfoxide. Examples of the siloxane compound include hexamethyldisiloxane, octamethyltrisiloxane, and decamethyltetrasiloxane.

[0206] The content of the liquid medium is preferably 60 to 99.999 mass%, more preferably 80 to 99.99 mass%, and even more preferably 90 to 99.9 mass%, relative to the total amount of the composition of the present disclosure. In the case of a composition of the present disclosure used in a wet coating method, the content of the liquid medium may be 90 to 99.99 mass%, 95 to 99.98 mass%, 97 to 99.97 mass%, or 98 to 99.95 mass%, relative to the total amount of the composition of the present disclosure.

[0207] The composition of the present disclosure may contain other components in addition to the compound and liquid medium of the present disclosure, as long as the effects of the present disclosure are not impaired. Examples of other components include known additives such as acid catalysts and basic catalysts that promote the hydrolysis and condensation reaction of reactive silyl groups.

[0208] Other components also include metal compounds having a hydrolyzable group (hereinafter, metal compounds having a hydrolyzable group are also referred to as "specific metal compounds"). When the composition of the present disclosure contains a specific metal compound, the slip properties and antifouling properties of the surface treatment layer can be further improved. Examples of the specific metal compounds include those represented by the following formulas (M1) to (M3).

[0209] M(X b1 ) m1 (X b2 ) m2 (X b3 ) m3 …(M1) Si(X b4 )(X b5 )3…(M2) (X b6 )3Si-(Y b1 )-Si(X b7 )3…(M3)

[0210] In formula (M1), M represents a trivalent or tetravalent metal atom. X b1 each independently represents a hydrolyzable group. X b2 each independently represents a siloxane skeleton-containing group. X b3 each independently represents a hydrocarbon chain-containing group. m1 is an integer from 2 to 4, m2 and m3 each independently represent an integer of 0 to 2, When M is a trivalent metal atom, m1+m2+m3 is 3, and when M is a tetravalent metal atom, m1+m2+m3 is 4.

[0211] In formula (M2), X b4 represents a hydrolyzable silane oligomer residue. X b5 each independently represents a hydrolyzable group or an alkyl group having 1 to 4 carbon atoms.

[0212] In formula (M3), X b6 and X b7 each independently represents a hydrolyzable group or a hydroxyl group. Y b1 represents a divalent organic group.

[0213] In formula (M1), the metal represented by M also includes metalloids such as Si and Ge. M is preferably a trivalent metal or a tetravalent metal, more preferably Al, Fe, In, Hf, Si, Ti, Sn, or Zr, still more preferably Al, Si, Ti, or Zr, and particularly preferably Si.

[0214] In formula (M1), X b1 The hydrolyzable group represented by the formula [—Si(R 2 ) n L 3-n Examples of the hydrolyzable group include the same as the hydrolyzable group represented by L in the above formula (1).

[0215] X b2The siloxane skeleton-containing group represented by the formula (I) has a siloxane unit (-Si-O-) and may be linear or branched. The siloxane unit is preferably a dialkylsilyloxy group, such as a dimethylsilyloxy group or a diethylsilyloxy group. The number of repetitions of the siloxane unit in the siloxane skeleton-containing group is 1 or more, preferably 1 to 5, more preferably 1 to 4, and even more preferably 1 to 3. The siloxane skeleton-containing group may contain a divalent hydrocarbon group as part of the siloxane skeleton. Specifically, some oxygen atoms in the siloxane skeleton may be replaced with a divalent hydrocarbon group. Examples of the divalent hydrocarbon group include alkylene groups such as methylene, ethylene, propylene, and butylene. The terminal silicon atom of the siloxane skeleton-containing group may have a hydrolyzable group, a hydrocarbon group (preferably an alkyl group) or the like bonded thereto. The number of elements in the siloxane skeleton-containing group is preferably 100 or less, more preferably 50 or less, and even more preferably 30 or less. The number of elements is preferably 10 or more. Examples of the siloxane skeleton-containing group include: * -(O-Si(CH3)2) n A group represented by CH3 is preferred, where n is an integer of 1 to 5, and * represents a bonding site to an adjacent atom.

[0216] X b3 The hydrocarbon chain-containing group represented by the formula (I) may be a group consisting of only a hydrocarbon chain, or may be a group having an etheric oxygen atom between carbon atoms in the hydrocarbon chain. The hydrocarbon chain may be a straight chain or a branched chain, with a straight chain being preferred. The hydrocarbon chain may be a saturated hydrocarbon chain or an unsaturated hydrocarbon chain, with a saturated hydrocarbon chain being preferred. The number of carbon atoms in the hydrocarbon chain-containing group is preferably 1 to 3, more preferably 1 to 2, and even more preferably 1. The hydrocarbon chain-containing group is preferably an alkyl group, more preferably a methyl group, an ethyl group, or a propyl group.

[0217] Preferably, m1 is 3 or 4.

[0218] The compound represented by formula (M1) is preferably a compound represented by the following formulas (M1-1) to (M1-5) in which M is Si, and more preferably a compound represented by formula (M1-1). The compound represented by formula (M1-1) is preferably tetraethoxysilane, tetramethoxysilane, or triethoxymethylsilane.

[0219] Si(X b1 )4…(M1-1) CH3-Si(X b1 )3 …(M1-2) C2H5-Si(X b1 )3…(M1-3) n-C3H7-Si(X b1 )3…(M1-4) (CH3)2CH-Si(X b1 )3…(M1-5)

[0220] In formula (M2), X b4 The number of silicon atoms contained in the hydrolyzable silane oligomer residue represented by the formula (I) is preferably 3 or more, more preferably 5 or more, and even more preferably 7 or more. The number of silicon atoms is preferably 15 or less, more preferably 13 or less, and even more preferably 10 or less. The hydrolyzable silane oligomer residue may have an alkoxy group bonded to a silicon atom. Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, and a butoxy group, with a methoxy group and an ethoxy group being preferred. The hydrolyzable silane oligomer residue may have one or more of these alkoxy groups, and preferably has one. The hydrolyzable silane oligomer residue is (C2H5O)3Si-(OSi(OC2H5)2)4O- * Here, * represents the bonding site with the adjacent atom.

[0221] In formula (M2), X b5 The hydrolyzable group represented by the formula [—Si(R 2 ) n L 3-nExamples of the hydrolyzable group include the same as the hydrolyzable group represented by L in the formula (1), a cyano group, a hydrogen atom, and an allyl group, and an alkoxy group or an isocyanato group is preferred. The alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms. X b5 As the group, a hydrolyzable group is preferred.

[0222] Examples of the compound represented by formula (M2) include (H5C2O)3-Si-(OSi(OC2H5)2)4OC2H5.

[0223] The compound represented by formula (M3) is a compound having reactive silyl groups at both ends of a divalent organic group, that is, a bissilane. In formula (M3), X b6 and X b7 Examples of the hydrolyzable group represented by the formula (I) include an alkoxy group, an acyloxy group, a ketoxime group, an alkenyloxy group, an amino group, an aminoxy group, an amide group, an isocyanato group, and a halogen atom, and the alkoxy group and the isocyanato group are preferred. The alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms, and a methoxy group and an ethoxy group are more preferred. In formula (M3), X b6 and X b7 may be the same group or different groups. b6 and X b7 are preferably the same group.

[0224] In formula (M3), Y b1 is a divalent organic group that connects the reactive silyl groups at both ends. b1 The number of carbon atoms is preferably 1 to 8, and more preferably 1 to 3. Y b1Examples of the alkylene group include an alkylene group, a phenylene group, and an alkylene group having an etheric oxygen atom between carbon atoms, such as -CH2CH2-, -CH2CH2CH2-, -CH2CH2CH2CH2-, -CH2CH2CH2CH2CH2-, -CH2CH2CH2CH2CH2-, -CH2C(CH3)2CH2-, -C(CH3)2CH2CH2C(CH3)2-, -CH2CH2OCH2CH2-, -CH2CH2CH2OCH2CH2CH2-, -CH(CH3)CHOCH2CH(CH3)-, and -CH4-.

[0225] Compounds represented by formula (M3) include (CH3O)3Si(CH2)2Si(OCH3)3, (C2H5O)3Si(CH2)2Si(OC2H5)3, (OCN)3Si(CH2)2Si(NCO)3, Cl3Si(CH2)2SiCl3, (CH3O)3Si(CH2)6Si(OCH3)3, and (C2H5O)3Si(CH2)6Si(OC2H5)3.

[0226] The content of other components that may be included in the composition of the present disclosure is preferably 10% by mass or less, and more preferably 1% by mass or less, relative to the total amount of the composition of the present disclosure. When the composition of the present disclosure contains a specific metal compound, the content of the specific metal compound is preferably 0.01 to 30% by mass, more preferably 0.01 to 10% by mass, and even more preferably 0.05 to 5% by mass, relative to the total amount of the composition of the present disclosure.

[0227] The total content of the compound of the present disclosure and other components (hereinafter also referred to as "solid content concentration") is preferably 0.001 to 40 mass%, more preferably 0.01 to 20 mass%, and even more preferably 0.1 to 10 mass%, relative to the total amount of the composition of the present disclosure. The solid content concentration of the composition of the present disclosure is a value calculated from the mass of the composition before heating and the mass after heating in a convection dryer at 120°C for 4 hours.

[0228] The composition of the present disclosure contains a liquid medium, and is therefore useful for coating applications and can be used as a coating liquid.

[0229] [Surface treatment agent] In one embodiment, the surface treatment agent of the present disclosure includes the compound of the present disclosure. Alternatively, the surface treatment agent of the present disclosure may include the compound of the present disclosure and a liquid medium. The surface treatment agent of the present disclosure may be the composition of the present disclosure. A preferred embodiment of the liquid medium contained in the surface treatment agent of the present disclosure is the same as a preferred embodiment of the liquid medium contained in the composition of the present disclosure.

[0230] The compound of the present disclosure contains the above-mentioned Group 1, a partial structure which is an alkylene chain or polyalkylene oxide chain having 3 or more carbon atoms, and the above-mentioned Group 2. Therefore, by using a surface treatment agent containing the compound of the present disclosure, a surface treatment layer having excellent water repellency and abrasion resistance can be formed.

[0231] [Goods] In one embodiment, the article of the present disclosure includes a substrate and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent of the present disclosure.

[0232] The surface treatment layer may be formed on a part of the surface of the substrate or on the entire surface of the substrate. The surface treatment layer may be spread over the surface of the substrate in the form of a film or may be scattered in the form of dots. In the surface treatment layer, the compound of the present disclosure is contained in a state in which the hydrolysis of some or all of the reactive silyl groups has progressed and the dehydration condensation reaction of the silanol groups has progressed.

[0233] The thickness of the surface treatment layer is preferably 1 to 100 nm, more preferably 1 to 50 nm. If the thickness of the surface treatment layer is 1 nm or more, the effect of the surface treatment is likely to be sufficient. If the thickness of the surface treatment layer is 100 nm or less, the utilization efficiency is high. The thickness of the surface treatment layer can be calculated from the oscillation period of the interference pattern obtained by X-ray reflectivity using a thin film analysis X-ray diffractometer (product name "ATX-G", manufactured by RIGAKU Corporation).

[0234] The type of substrate is not particularly limited, and examples thereof include substrates that are required to be water-repellent. Examples of substrates include substrates that may be used by coming into contact with other articles (e.g., a stylus) or human fingers; substrates that may be held by human fingers during operation; and substrates that may be placed on other articles (e.g., a mounting table). Examples of the substrate material include metal, resin, glass, sapphire, ceramic, stone, fiber, nonwoven fabric, paper, wood, natural leather, artificial leather, and composite materials thereof. Glass may be chemically strengthened.

[0235] Examples of the substrate include glass or resin used for building materials, decorative building materials, interior goods, transportation equipment (e.g., automobiles), signs, bulletin boards, drinking vessels, tableware, aquariums, ornamental equipment (e.g., frames, boxes), laboratory equipment, furniture, textile products, and packaging containers; glass or resin used for art, sports, games, etc.; and glass or resin used for the exterior parts (excluding display parts) of devices such as mobile phones (e.g., smartphones), personal digital assistants, game consoles, and remote controls. The substrate may be in the form of a plate or a film.

[0236] The substrate is preferably a substrate for a touch panel, a substrate for a display, or a lens for glasses, and is particularly preferably a substrate for a touch panel.The material of the substrate for a touch panel is preferably glass or a transparent resin.

[0237] The substrate may be a substrate whose one or both surfaces have been subjected to a surface treatment such as corona discharge treatment, plasma treatment, or plasma graft polymerization treatment. A surface-treated substrate has better adhesion to the surface treatment layer and further improved abrasion resistance of the surface treatment layer. Therefore, it is preferable to perform the surface treatment on the surface of the substrate that comes into contact with the surface treatment layer. Furthermore, when a base layer described below is provided on the surface-treated substrate, it has better adhesion to the base layer and further improved abrasion resistance of the surface treatment layer. Therefore, when a base layer is provided, it is preferable to perform the surface treatment on the surface of the substrate that comes into contact with the base layer.

[0238] The surface treatment layer may be provided directly on the surface of the substrate, or a primer layer may be provided between the substrate and the surface treatment layer. From the viewpoint of further improving the water repellency and abrasion resistance of the surface treatment layer, the article of the present disclosure preferably includes a substrate, a primer layer disposed on the substrate, and a surface treatment layer surface-treated with the surface treatment agent of the present disclosure, disposed on the primer layer.

[0239] The underlayer is preferably a layer containing an oxide containing silicon and at least one specific element selected from the group consisting of Group 1 elements, Group 2 elements, Group 4 elements, Group 5 elements, Group 13 elements, and Group 15 elements of the periodic table.

[0240] Group 1 elements of the periodic table (hereinafter also referred to as "Group 1 elements") refer to lithium, sodium, potassium, rubidium, and cesium. As Group 1 elements, lithium, sodium, and potassium are preferred, and sodium and potassium are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more types of Group 1 elements.

[0241] Group 2 elements of the periodic table (hereinafter also referred to as "Group 2 elements") refer to beryllium, magnesium, calcium, strontium, and barium. As the Group 2 elements, magnesium, calcium, and barium are preferred, and magnesium and calcium are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more types of Group 2 elements.

[0242] The Group 4 elements of the periodic table (hereinafter also referred to as "Group 4 elements") refer to titanium, zirconium, and hafnium. As the Group 4 elements, titanium and zirconium are preferred, and titanium is more preferred, from the viewpoint of being able to form a surface treatment layer on the underlayer more uniformly without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more types of Group 4 elements.

[0243] The Group 5 elements of the periodic table (hereinafter also referred to as "Group 5 elements") refer to vanadium, niobium, and tantalum. As the Group 5 elements, vanadium is particularly preferred from the viewpoint of providing a surface treatment layer with superior abrasion resistance. The underlayer may contain two or more Group 5 elements.

[0244] The Group 13 elements of the periodic table (hereinafter also referred to as "Group 13 elements") refer to boron, aluminum, gallium, and indium. As the Group 13 elements, boron, aluminum, and gallium are preferred, and boron and aluminum are more preferred, from the viewpoint of enabling the surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 13 elements.

[0245] The Group 15 elements of the periodic table (hereinafter also referred to as "Group 15 elements") refer to nitrogen, phosphorus, arsenic, antimony, and bismuth. As the Group 15 elements, phosphorus, antimony, and bismuth are preferred, and phosphorus and bismuth are more preferred, from the viewpoint of being able to form a surface treatment layer on the underlayer more uniformly without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more types of Group 15 elements.

[0246] As the specific elements contained in the underlayer, Group 1 elements, Group 2 elements, and Group 13 elements are preferred because they provide the surface treatment layer with better abrasion resistance, Group 1 elements and Group 2 elements are more preferred, and Group 1 elements are even more preferred. The specific element may be one kind of element or two or more kinds of elements.

[0247] The oxide contained in the underlayer may be a mixture of oxides of the above elements (silicon and the specific element) alone (for example, a mixture of silicon oxide and an oxide of the specific element), a composite oxide containing two or more of the above elements, or a mixture of an oxide of the above elements alone and a composite oxide.

[0248] The ratio of the total molar concentration of the specific elements in the underlayer to the molar concentration of silicon in the underlayer (specific elements / silicon) is preferably 0.02 to 2.90, more preferably 0.10 to 2.00, and even more preferably 0.20 to 1.80, from the viewpoint of achieving better abrasion resistance of the surface treatment layer. The molar concentration (mol %) of each element in the underlayer can be measured, for example, by depth direction analysis by X-ray photoelectron spectroscopy (XPS) using ion sputtering.

[0249] The underlayer may be a single layer or multiple layers. The underlayer may have an uneven surface. The thickness of the underlayer is preferably 1 to 100 nm, more preferably 1 to 50 nm, and even more preferably 2 to 20 nm. When the thickness of the underlayer is equal to or greater than the lower limit, the adhesion of the underlayer to the surface treatment layer is improved, and the abrasion resistance of the surface treatment layer is superior. When the thickness of the underlayer is equal to or less than the upper limit, the abrasion resistance of the underlayer itself is superior. The thickness of the underlayer is measured by observing the cross section of the underlayer with a transmission electron microscope (TEM).

[0250] The underlayer can be formed by, for example, a vapor deposition method using a vapor deposition material or a wet coating method.

[0251] The deposition material used in the deposition method preferably contains an oxide containing silicon and a specific element. Specific examples of the form of the deposition material include powder, melt, sintered body, granulated body, and crushed body, and from the viewpoint of handleability, melt, sintered body, and granulated body are preferred. Here, the term "molten body" refers to a solid obtained by melting a powder of a deposition material at a high temperature and then cooling and solidifying it. The term "sintered body" refers to a solid obtained by firing a powder of a deposition material, and if necessary, a molded body obtained by pressing the powder may be used instead of the powder of the deposition material. The term "granulated body" refers to a solid obtained by kneading a powder of a deposition material with a liquid medium (e.g., water, an organic solvent) to obtain particles, and then drying the particles.

[0252] The deposition material can be produced, for example, by the following method. A method of obtaining a powder of deposition material by mixing silicon oxide powder with a powder of an oxide of a specific element. A method in which the powder of the deposition material and water are kneaded to obtain particles, and then the particles are dried to obtain granules of the deposition material. A method of mixing powder containing silicon (e.g., powder made of silicon oxide, silica sand, silica gel), powder containing a specific element (e.g., powder of an oxide of a specific element, carbonate, sulfate, nitrate, oxalate, hydroxide), and water, drying the mixture, and then firing the dried mixture or a compact obtained by pressing it to form a sintered body. A method in which a powder containing silicon (e.g., powder made of silicon oxide, silica sand, silica gel) and a powder containing a specific element (e.g., powder of an oxide of a specific element, carbonate, sulfate, nitrate, oxalate, hydroxide) are melted at high temperature, and then the melt is cooled and solidified to obtain a molten material.

[0253] A specific example of a vapor deposition method using a vapor deposition material is a vacuum vapor deposition method, in which a vapor deposition material is evaporated in a vacuum chamber and attached to the surface of a substrate. The temperature during vapor deposition (for example, the temperature of the boat on which the vapor deposition material is placed when a vacuum vapor deposition device is used) is preferably 100 to 3,000°C, and more preferably 500 to 3,000°C. The pressure during vapor deposition (for example, the pressure in a tank in which the vapor deposition material is placed when a vacuum vapor deposition device is used) is preferably 1 Pa or less, more preferably 0.1 Pa or less. When the underlayer is formed using a deposition material, one deposition material may be used, or two or more deposition materials containing different elements may be used.

[0254] Specific examples of methods for evaporating the deposition material include a resistance heating method in which the deposition material is melted and evaporated on a resistance heating boat made of a high-melting-point metal, and an electron gun method in which the deposition material is irradiated with an electron beam to directly heat the deposition material, thereby melting and evaporating the surface. The electron gun method is preferred as a method for evaporating the deposition material because it can evaporate high-melting-point substances due to its ability to heat locally, and because areas not irradiated by the electron beam are at low temperatures, there is no risk of reaction with the container or contamination with impurities. The evaporation method for the evaporation materials may use multiple boats, or all of the evaporation materials may be placed in a single boat. The evaporation method may be co-evaporation or alternating evaporation. Specific examples include a method in which silica and a specific source are mixed in the same boat, a method in which silica and a specific element source are placed in separate boats and co-evaporated, and a method in which they are placed in separate boats and alternately evaporated. The evaporation conditions, order, etc. are appropriately selected depending on the configuration of the underlayer.

[0255] In the wet coating method, it is preferable to form an undercoat layer on a substrate by a wet coating method using a coating liquid containing a silicon-containing compound, a compound containing a specific element, and a liquid medium.

[0256] Specific examples of the silicon compound include silicon oxide, silicic acid, partial condensates of silicic acid, alkoxysilanes, and partial hydrolysis condensates of alkoxysilanes.

[0257] Specific examples of compounds containing a specific element include oxides of the specific element, alkoxides of the specific element, carbonates of the specific element, sulfates of the specific element, nitrates of the specific element, oxalates of the specific element, and hydroxides of the specific element.

[0258] Examples of the liquid medium include the same liquid medium as that contained in the composition of the present disclosure.

[0259] The content of the liquid medium is preferably 0.01 to 20 mass %, more preferably 0.1 to 10 mass %, based on the total amount of the coating liquid used to form the underlayer.

[0260] Specific examples of wet coating methods for forming the underlayer include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet coating, flow coating, roll coating, casting, Langmuir-Blodgett coating, and gravure coating.

[0261] After wet-coating the coating liquid, it is preferable to dry the coating film. The drying temperature for the coating film is preferably 20 to 200°C, more preferably 80 to 160°C.

[0262] The article of the present disclosure is preferably an optical component. Examples of optical components include car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio equipment, game consoles, eyeglass lenses, camera lenses, lens filters, sunglasses, medical devices such as gastroscopes, copiers, PCs, displays (e.g., liquid crystal displays, organic EL displays, plasma displays, touch panel displays), touch panels, protective films, and anti-reflection films. In particular, the article is preferably a display or a touch panel.

[0263] [Production method] The method for producing an article according to the present disclosure is, for example, a method for producing an article having a surface-treated layer formed on a substrate by performing a surface treatment on a substrate using the surface treatment agent according to the present disclosure. Examples of the surface treatment include a dry coating method and a wet coating method.

[0264] Dry coating methods include vacuum deposition, CVD, sputtering, and the like. Vacuum deposition is preferred as a dry coating method from the viewpoints of suppressing decomposition of the compound and simplicity of the equipment. For vacuum deposition, a pellet-shaped substance obtained by impregnating a metal porous body such as iron or steel with the compound of the present disclosure may be used. A composition containing the compound of the present disclosure and a liquid medium may be impregnated into a metal porous body such as iron or steel, and the liquid medium may be dried to obtain a pellet-shaped substance impregnated with the compound of the present disclosure.

[0265] Examples of wet coating methods include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet coating, flow coating, roll coating, casting, Langmuir-Blodgett coating, and gravure coating.

[0266] In order to improve the abrasion resistance of the surface treatment layer, if necessary, an operation for promoting the reaction between the compound of the present disclosure and the substrate may be carried out, such as heating, humidification, or light irradiation. For example, by heating a substrate on which a surface treatment layer has been formed in a moist atmosphere, reactions such as the hydrolysis reaction of hydrolyzable groups, the reaction between hydroxyl groups and the like on the surface of the substrate and silanol groups, and the formation of siloxane bonds through condensation reactions of silanol groups can be promoted. After the surface treatment, compounds in the surface treatment layer that are not chemically bonded to other compounds or the substrate may be removed as needed. Examples of methods for removing the compounds include pouring a solvent over the surface treatment layer and wiping the compounds with a cloth soaked in the solvent. [Example]

[0267] The present invention will be explained in more detail below using examples, but the present invention is not limited to these examples.

[0268] [Synthesis of Compound 1C] 22-tricosenoic acid (2.0 g), tris(trimethylsilyloxy)silane (1.7 g), and 1,3-bistrifluoromethylbenzene (10 g) were added and stirred. Subsequently, a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (0.1 g, platinum content 3%) and aniline (0.1 g) were added and stirred at 85°C for 24 hours. After cooling to 25°C, the solvent was distilled off, and the resulting mixture was subjected to flash column chromatography using silica gel (eluent: ethyl acetate / hexane) to obtain 3.0 g of compound 1A. The structure of compound 1A was confirmed by the following NMR data.

[0269] 1 H-NMR(500MHz, CDCl3):δ 2.31 (t, J= 7.1 Hz, 2H), 1.60 (p, J = 7.1 Hz, 2H), 1.40 (pd, J = 7.0, 0.8 Hz, 2H), 1.33-1.20 (m, 36H), 0.36 (t, J = 7.0 Hz, 2H), 0.10 (s, 27H).

[0270] [ka]

[0271] Allyl alcohol (30 g) was added to compound 1A (3.0 g) and stirred, followed by the addition of N-methylmorpholine (1.0 g) and 4-(4,6-dimethoxy-1,3,5-triazin-2-yl)-4-methylmorpholinium chloride (3.0 g). The mixture was heated to 50°C and stirred for 24 hours. After cooling to 25°C, the solvent was distilled off, and flash column chromatography using silica gel (developing solvent: ethyl acetate / hexane) was performed to obtain 2.1 g of compound 1B. The structure of compound 1B was confirmed by the following NMR data.

[0272] 1H-NMR(500 MHz, CDCl3) δ 6.03-5.82 (m, 1H), 5.31 (dt, J = 13.3,1.0 Hz, 2H), 4.57 (dt, J = 6.2, 1.0 Hz, 2H), 1.69-1.62 (m, 2H), 1.62-1.53 ​​(m,2H), 1.40 (pd, J = 7.0, 0.8 Hz, 2H), 1.36-1.14 (m, 36H), 0.36 (t, J = 7.0 Hz, 2H), 0.10 (s, 27H).

[0273] [ka]

[0274] 1,3-bistrifluoromethylbenzene (10 g) was added to compound 1B (2.1 g) and stirred. Then, a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content 3%, 0.1 g), aniline (0.1 g), and trimethoxysilane (0.5 g) were added and stirred at 40°C. The solvent was removed by distillation under reduced pressure to obtain 2.4 g of compound 1C. The structure of compound 1C was confirmed by the following NMR data.

[0275] 1 H-NMR(500 MHz, CDCl3) δ 4.09 (t, J = 7.1 Hz, 2H), 3.58 (s, 9H),2.31 (t, J = 7.1 Hz, 2H), 1.80 (p, J = 7.1 Hz, 2H), 1.58 (p, J = 7.1 Hz, 2H), 1.40 (pd, J = 7.0, 0.8 Hz, 2H), 1.35‐1.14 (m, 36H), 0.66 (t, J = 7.1 Hz, 2H), 0.36 (t, J = 7.0 Hz, 2H), 0.10 (s, 27H).

[0276] [ka]

[0277] [Synthesis of compound 2C] Compound 2A was obtained according to the methods described in Synthesis Examples 3 to 5 of WO 2021 / 054413.

[0278] [ka]

[0279] Compound 2A (5.0 g) was added to compound 1A (3.0 g) and stirred, followed by the addition of N-methylmorpholine (1.0 g) and 4-(4,6-dimethoxy-1,3,5-triazin-2-yl)-4-methylmorpholinium chloride (3.0 g). The mixture was heated to 50°C and stirred for 24 hours. After cooling to 25°C, flash column chromatography using silica gel (developing solvent: ethyl acetate / hexane) was performed to obtain 2.4 g of compound 2B. The structure of compound 2B was confirmed by the following NMR data.

[0280] 1 H-NMR(500 MHz, CDCl3) δ 5.66 (ddt, J = 13.7, 12.6, 6.2 Hz, 3H),5.13 (dt, J = 13.4, 1.1 Hz, 6H), 3.98 (s, 2H), 2.37 (t, J= 7.1 Hz, 2H), 1.91 (dt, J = 6.2, 1.0 Hz, 6H), 1.58 (p, J = 7.1 Hz, 2H), 1.40 (pd, J = 7.0, 0.8 Hz, 2H), 1.35-1.14 (m, 36H), 0.36 (t, J = 7.0 Hz, 2H), 0.10 (s, 27H).

[0281] [ka]

[0282] 1,3-bistrifluoromethylbenzene (10 g) was added to compound 2B (2.4 g) and stirred. Then, a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content 3%, 0.1 g), aniline (0.1 g), and trimethoxysilane (1.5 g) were added and stirred at 40°C. The solvent was removed by distillation under reduced pressure to obtain 2.9 g of compound 2C. The structure of compound 2C was confirmed by the following NMR data.

[0283] 1 H-NMR(500 MHz, CDCl3) δ 4.02 (s, 2H), 3.58 (s, 27H), 2.37 (t, J= 7.1 Hz, 2H), 1.58 (p, J = 7.1 Hz, 2H), 1.42 (dpd, J= 17.4, 7.0, 0.8 Hz, 8H), 1.34-1.18 (m, 42H), 0.69 (t, J= 7.0 Hz, 6H), 0.36 (t, J = 7.0 Hz, 2H), 0.10 (s,27H).

[0284] [ka]

[0285] [Synthesis of Compound 3B] To compound 1A (3.0 g), H2N-CH2-C(CH2CH=CH2)3 (1.5 g) and methanol (10 g) were added and stirred. Then, N-methylmorpholine (1.0 g) and 4-(4,6-dimethoxy-1,3,5-triazin-2-yl)-4-methylmorpholinium chloride (3.0 g) were added. The mixture was heated to 50 °C and stirred for 24 hours. After cooling to 25 °C, the solvent was distilled off, and the mixture was subjected to flash column chromatography using silica gel (eluent: ethyl acetate / hexane) to obtain 2.2 g of compound 3A. The structure of compound 3A was confirmed by the following NMR data.

[0286] 1H-NMR(500 MHz, CDCl3) δ 6.67 (t, J = 8.0 Hz, 1H), 5.74‐5.52 (m, 3H), 5.13 (dt, J = 13.4, 1.1 Hz, 6H), 3.25 (d, J = 8.1 Hz, 2H), 2.20 (t, J = 7.1 Hz, 2H), 1.86 (dt, J = 6.1, 0.9 Hz, 6H), 1.63 (p, J = 7.1 Hz, 2H), 1.40 (pd, J= 7.0, 0.8 Hz, 2H), 1.35-1.17 (m, 36H), 0.36 (t, J= 7.0 Hz, 2H), 0.10 (s, 27H).

[0287] [ka]

[0288] 1,3-bistrifluoromethylbenzene (10 g) was added to compound 3A (2.2 g) and stirred. Then, a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content 3%, 0.1 g), aniline (0.1 g), and trimethoxysilane (1.5 g) were added and stirred at 40°C. The solvent was removed by distillation under reduced pressure to obtain 2.7 g of compound 3B. The structure of compound 3B was confirmed by the following NMR data.

[0289] 1 H-NMR(500 MHz, CDCl3) δ 6.81 (t, J = 7.2 Hz, 1H), 3.58 (s, 27H), 3.29 (d, J = 7.1 Hz, 2H), 2.20 (t, J = 7.1 Hz, 2H), 1.63 (p, J = 7.1 Hz, 2H), 1.41 (pdd, J = 7.0, 4.7, 0.8 Hz, 8H), 1.34‐1.17 (m, 35H), 0.69 (t, J = 7.0 Hz, 6H), 0.36 (t, J = 7.0 Hz, 2H), 0.10 (s, 27H).

[0290] [ka]

[0291] [Synthesis of compound 4F] Polyethylene glycol (8.0 g) with an average molecular weight of 400 was dissolved in tetrahydrofuran (hereinafter also referred to as "THF", 20 mL), cesium carbonate (8.0 g) and allyl bromide (2.4 g) were added, and the mixture was stirred at 50°C for 24 hours. The solvent was then distilled off, and flash column chromatography using silica gel (developing solvent: methanol / dichloromethane) was performed to obtain 3.1 g of compound 4A. The structure of compound 4A was confirmed by the following NMR data.

[0292] 1 H-NMR(500 MHz, CDCl3) δ 5.85 (tt, J = 13.7, 6.2 Hz, 1H), 5.22 (dt, J = 13.5, 1.1 Hz, 2H), 4.02‐3.80 (m, 4H), 3.80‐3.46 (m, 34H).

[0293] [ka]

[0294] Compound 4A (3.0 g), tris(trimethylsilyloxy)silane (2.2 g), and 1,3-bistrifluoromethylbenzene (10 g) were added and stirred. Then, a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content 3%, 0.1 g) and aniline (0.1 g) were added and stirred at 85°C for 24 hours. After cooling to 25°C, the solvent was distilled off, and the residue was subjected to flash column chromatography using silica gel (eluent: ethyl acetate / hexane) to obtain 4.1 g of compound 4B. The structure of compound 4B was confirmed by the following NMR data.

[0295] 1H-NMR(500 MHz, CDCl3) δ 3.79-3.53 (m, 36H), 3.42 (t, J = 7.1 Hz, 2H), 1.68 (p, J = 7.1 Hz, 2H), 0.43 (t, J = 7.1 Hz, 2H), 0.10 (s, 27H).

[0296] [ka]

[0297] Compound 4C was obtained according to the methods described in Synthesis Examples 3 and 4 of WO 2021 / 054413.

[0298] [ka]

[0299] Methanol (50 g) and potassium hydroxide (5 g) were added to compound 4C (10 g) and heated under reflux for 24 hours. After cooling to 25°C, hydrochloric acid and dichloromethane were added for extraction. The solvent was distilled off, and then flash column chromatography using silica gel (developing solvent: methanol / dichloromethane) was performed to obtain 8.3 g of compound 4D. The structure of compound 4D was confirmed by the following NMR data.

[0300] 1 H-NMR(500 MHz, CDCl3) δ 5.71 (ddt, J = 13.7, 12.6, 6.2 Hz, 3H),5.16 (dt, J = 13.4, 1.1 Hz, 6H), 2.20 (dt, J = 6.2, 0.9 Hz, 6H).

[0301] [ka]

[0302] Compound 4D (1.5 g) and THF (10 mL) were added to compound 4B (4.0 g) and stirred. Then, N-methylmorpholine (1.0 g) and 4-(4,6-dimethoxy-1,3,5-triazin-2-yl)-4-methylmorpholinium chloride (3.0 g) were added. The mixture was heated to 50°C and stirred at 50°C for 24 hours. After cooling to 25°C, flash column chromatography using silica gel (developing solvent: ethyl acetate / hexane) was performed to obtain 3.5 g of compound 4E. The structure of compound 4E was confirmed by the following NMR data.

[0303] 1 H-NMR(500 MHz, CDCl3) δ 5.71 (ddt, J = 13.6, 12.6, 6.2 Hz, 3H),5.16 (dt, J = 13.4, 1.1 Hz, 6H), 4.36 (t, J = 7.0 Hz, 2H), 3.84‐3.59 (m, 34H),3.42 (t, J = 7.1 Hz, 2H), 2.22 (dt, J = 6.2, 1.0 Hz, 6H), 1.68 (p, J = 7.1 Hz, 2H), 0.43 (t, J = 7.1 Hz, 2H), 0.10 (s, 27H).

[0304] [ka]

[0305] 1,3-bistrifluoromethylbenzene (10 g) was added to compound 4E (3.0 g) and stirred. Then, a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content 3%, 0.1 g), aniline (0.1 g), and trimethoxysilane (1.5 g) were added and stirred at 40°C. The solvent was then removed under reduced pressure to obtain 3.3 g of compound 4F. The structure of compound 4F was confirmed by the following NMR data.

[0306] 1H-NMR(500 MHz, CDCl3) δ 4.36 (t, J = 7.0 Hz, 2H), 3.85-3.53 (m, 61H), 3.42 (t, J = 7.1 Hz, 2H), 1.74-1.59 (m, 8H), 1.59-1.43 (m, 6H), 0.72 (t, J = 7.0 Hz, 6H), 0.43 (t, J = 7.1 Hz, 2H), 0.10 (s, 27H).

[0307] [ka]

[0308] [Synthesis of Compound 5A] Compound 5A was obtained according to the method described in Example 1 of JP 2017-119849 A.

[0309] [ka]

[0310] [Preparation of compound 6A] Octadecyltrimethoxysilane (manufactured by Tokyo Chemical Industry Co., Ltd.) was prepared as Compound 6A.

[0311] Next, the substrate was surface-treated using the compounds 1C, 2C, 3B, 4F, 5A, and 6A. The surface treatment was performed by dry coating. Chemically strengthened glass was used as the substrate.

[0312] <Dry coating method> Dry coating was performed using a vacuum deposition apparatus (product name "VTR-350M", manufactured by ULVAC). A 20 mass % ethyl acetate solution (0.5 g) of each compound was filled into a molybdenum boat in the vacuum deposition apparatus, and the pressure inside the vacuum deposition apparatus was increased to 1 × 10 -3The boat was evacuated to a pressure of 10 Pa or less. The boat was heated at a rate of 10°C / min or less, and when the deposition rate measured by a quartz crystal oscillator film thickness meter exceeded 1 nm / sec, the shutter was opened to start film formation on the surface of the substrate. When the film thickness reached approximately 50 nm, the shutter was closed to terminate film formation on the surface of the substrate. The substrate on which the compound had been deposited was heat-treated at 200°C for 30 minutes, yielding an article having a surface-treated layer on the surface of the substrate.

[0313] The articles obtained by the dry coating method were evaluated for water repellency and abrasion resistance by the following methods.

[0314] <Water repellency> Approximately 2 μL of distilled water was dropped onto the surface treatment layer of the article, and the initial water contact angle was measured using a contact angle measuring device (product name "DM-500" manufactured by Kyowa Interface Science Co., Ltd.). Measurements were taken at five points on the surface treatment layer, and the average value was calculated. The 2θ method was used to calculate the water contact angle. The evaluation criteria are as follows: A is a level that is not problematic for practical use. A: The water contact angle is 108° or more. B: The water contact angle is less than 108°.

[0315] <Wear resistance> The surface treatment layer of the article was subjected to a friction test using a reciprocating traverse tester (manufactured by KNT Corporation) in accordance with JIS L0849:2013 (corresponding to ISO:105-X12:2001), in which steel wool Bonstar (#0000) was reciprocated 10,000 times at a pressure of 98.07 kPa and a speed of 320 cm / min, and the water contact angle after the friction test was measured. The method for measuring the water contact angle after the friction test was the same as the method for measuring the initial water contact angle in the water repellency evaluation method described above. Abrasion resistance was evaluated based on the degree of decrease in water contact angle after the friction test. The smaller the decrease in water contact angle, the better the abrasion resistance. The evaluation criteria were as follows: A and B are levels that are acceptable for practical use. Decrease in water contact angle = (initial water contact angle) - (water contact angle after friction test) A: The decrease in the water contact angle was 5° or less. B: The decrease in the water contact angle was more than 5° and 10° or less. C: The decrease in the water contact angle was more than 10°.

[0316] The evaluation results are shown in Table 1. In Table 1, when a compound contains Group 1, a partial structure which is an alkylene chain or polyalkylene oxide chain having 3 or more carbon atoms, or Group 2, it is indicated as "Y," and when it does not contain Group 2, it is indicated as "N."

[0317] Examples 1 to 4 are working examples, and Examples 5 and 6 are comparative examples.

[0318] [Table 1]

[0319] As shown in Table 1, the compounds of Examples 1 to 4 contain Group 1, a partial structure which is an alkylene chain or polyalkylene oxide chain having 3 or more carbon atoms, and Group 2, and therefore it was found that they can form a surface treatment layer which is excellent in water repellency and abrasion resistance. On the other hand, the compound of Example 5 did not contain a partial structure that was an alkylene chain or polyalkylene oxide chain having 3 or more carbon atoms, and was found to have poor abrasion resistance. The compound of Example 6 did not contain Group 1, and was found to have poor water repellency.

[0320] [Synthesis of compound 11F] Compound 11A was obtained according to the method described in WO 2021 / 054413.

[0321] [ka]

[0322] Compound 11B was obtained according to the method described in JP 2017-119849 A.

[0323] [ka]

[0324] Under a nitrogen atmosphere, 2,3,4,5,6-pentafluorophenol (6.8 g), THF (42 mL), and triethylamine (5.1 g) were added to a 100 mL flask and stirred at 25°C. 10-Undecenoyl chloride (5.0 g) was added dropwise to the reaction mixture and stirred for 1 hour. The reaction solution was filtered, and the solvent and low-boiling components were removed by distillation under reduced pressure. 7.9 g of compound 11C was obtained by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate). The structure of compound 11C was confirmed by the following NMR data.

[0325] 1 H-NMR(400 MHz,CDCl3) δ5.74(ddt, J = 16.9, 10.2, 6.6 Hz, 1H), 5.05 - 4.77(m, 2H), 2.59(t, J = 7.4 Hz, 2H), 1.97(q, J = 7.1 Hz, 2H), 1.70(p, J = 7.4 Hz, 2H), 1.42 - 1.08(m, 10H).

[0326] [ka]

[0327] Under a nitrogen atmosphere, a xylene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 0.10 mL) was added to a mixture of compound 11C (5.6 g), THF (5.0 mL), and chlorodimethylsilane (2.3 g) in a 200 mL flask and stirred for 2 hours. The solvent and low-boiling components were removed by distillation under reduced pressure to obtain 7.2 g of compound 11D. The structure of compound 11D was confirmed by the following NMR data.

[0328] 1 H-NMR(400 MHz,CDCl3) δ 2.63 (t,J = 7.4 Hz, 2H), 1.74(p, J = 7.4 Hz,2H), 1.46 - 1.17(m, 14H), 0.90 - 0.69(m, 2H), 0.37(s, 6H).

[0329] [ka]

[0330] Under a nitrogen atmosphere, tris(trimethylsiloxy)silanol (2.5 g) and THF (20 mL) were added to a three-neck flask and stirred. The mixture was cooled to 0°C, and a hexane solution of n-BuLi (1.6 M, 5.0 mL) was added dropwise. A THF solution of hexamethylcyclotrisiloxane (1.0 M, 8.8 mL) was added dropwise, followed by a THF solution of hexamethylcyclotrisiloxane (1.0 M, 24 mL) and stirred for 2 hours. Compound 11D (3.6 g) was then added and stirred for 1 hour. Compound 11A (3.2 g) was then added and stirred for 1 hour. Hexane and ion-exchanged water were added sequentially to the reaction solution, and the mixture was separated. The organic layer was then isolated. The solvent and low-boiling components were removed under reduced pressure, followed by flash column chromatography using silica gel (eluent: hexane / ethyl acetate) to obtain 0.19 g of compound 11E. The structure of Compound 11E was confirmed by the following NMR data: In Compound 11E, the average value of n was 8.

[0331] 1 H-NMR (400 MHz, CDCl3) δ 5.71(ddt, J = 16.9, 10.2, 6.7 Hz, 2H), 5.24(t, J = 5.7 Hz, 1H), 4.95 - 4.78(m, 4H), 3.08(t, J = 5.9 Hz, 2H), 2.06(t, J = 7.6 Hz, 2H), 1.94(q, J = 6.9 Hz, 4H), 1.46 - 0.98(m, 49H), 0.42(t, J = 7.6 Hz, 2H), -0.06(s, 79H)

[0332] [ka]

[0333] Using compound 11E (0.19 g), 0.21 g of compound 11F was obtained by the same method as in the synthesis of compound 13B described below. The structure of compound 1F was confirmed by the following NMR data. In compound 11F, the average value of n was 8.

[0334] 1 H-NMR(400 MHz, CDCl3) δ 5.26 - 5.17(m, 1H), 3.47(s, 18H), 3.08(t, J = 6.0 Hz, 2H), 2.12 - 1.98(m, 2H), 1.46 - 0.98(m, 57H), 0.63 - 0.46(m, 4H), 0.45(t, J = 7.6 Hz, 2H), -0.06(s, 81H).

[0335] [ka]

[0336] [Synthesis of Compound 12B] The reaction was carried out in the same manner as in the synthesis of compound 11E, and 0.86 g of compound 12A was obtained by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate). The structure of compound 12A was confirmed by the following NMR data. In compound 12A, the average value of n was 14.

[0337] 1 H-NMR(400 MHz,CDCl3) δ 5.74 (ddt, J = 16.9, 10.1, 6.7 Hz, 2H), 5.25(q, J = 5.5 Hz, 1H), 5.13 - 4.75(m, 4H), 3.11(t, J = 5.9 Hz, 2H), 2.09(t, J = 7.6 Hz, 2H), 1.96(q, J = 7.0 Hz, 4H), 1.46 - 0.98(m, 49H), 0.45(t, J = 7.6 Hz, 2H), 0.05(s, 117H).

[0338] [ka]

[0339] Using compound 12A (0.86 g), 0.88 g of compound 12B was obtained in the same manner as compound 13B described below. The structure of compound 12B was confirmed by the following NMR data. In compound 12B, the average value of n was 14.

[0340] 1 H-NMR(400 MHz,CDCl3) δ 5.25(t, J = 8.2 Hz, 1H), 3.11(t, J = 6.0 Hz, 2H), 2.09(t, J = 7.6 Hz, 2H), 1.46 - 0.99(m, 57H), 0.64 - 0.53(m, 4H), 0.45(t, J = 7.6 Hz, 2H), 0.05(s, 117H).

[0341] [ka]

[0342] [Synthesis of Compound 13B] Under a nitrogen atmosphere, tris(trimethylsiloxy)silanol (1.3 g) and THF (20 mL) were added to a three-neck flask and stirred. The mixture was cooled to 0°C, and a hexane solution of n-BuLi (1.6 M, 2.4 mL) was added dropwise. A THF solution of hexamethylcyclotrisiloxane (1.1 M, 4.0 mL) was added dropwise, followed by a THF solution of hexamethylcyclotrisiloxane (1.1 M, 22 mL) and stirred for 7 hours. Compound 11D (3.6 g) was then added and stirred for 1 hour. Compound 11A (3.2 g) was then added and stirred for 1 hour. Hexane and ion-exchanged water were added sequentially to the reaction solution, and the mixture was separated. The organic layer was separated. The solvent and low-boiling components were removed under reduced pressure, followed by flash column chromatography using silica gel (eluent: hexane / ethyl acetate) to obtain 0.98 g of compound 13A. The structure of Compound 13A was confirmed by the following NMR data: In Compound 13A, the average value of n was 21.

[0343] 1H-NMR(400 MHz,CDCl3) δ 5.81(ddt, J = 16.9, 10.2, 6.7 Hz, 2H), 5.31(d, J = 4.8 Hz, 1H),5.08 - 4.84(m, 4H), 3.19(t, J = 6.0 Hz, 2H), 2.31 - 2.11(m, 2H), 2.08 - 1.92(m, 4H), 1.63(t, J = 7.3 Hz, 2H), 1.28(d, J = 9.6 Hz, 47H), 0.53(t, J = 7.7 Hz, 2H), 0.09(s, 159H).

[0344] [ka]

[0345] To a solution of compound 13A (0.80 g) in dichloromethane (10 g), a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 4.1 mg), aniline (2.6 mg), and trimethoxysilane (0.40 g) were added, and the mixture was stirred at 25°C for 2 hours. The solvent was distilled off under reduced pressure to obtain 0.69 g of compound 13B. The structure of compound 13B was confirmed by the following NMR data. The average value of n in compound 13B was 21.

[0346] 1 H-NMR (400 MHz, CDCl3) δ 5.31 (d, J = 4.8 Hz, 1H), 3.57(s, 18H), 3.18(t, J = 6.0Hz, 2H), 2.31 - 2.11(m, 2H), 1.64 - 1.25(m, 57H), 0.64(m, 4H), 0.52(t, J = 7.7 Hz, 2H), 0.09(s, 159H).

[0347] [ka]

[0348] [Synthesis of compound 14C] Under a nitrogen atmosphere, tris(trimethylsiloxy)silanol (1.3 g) and THF (20 mL) were added to a three-neck flask and stirred. The mixture was cooled to 0°C, and a hexane solution of n-BuLi (1.6 M, 2.4 mL) was added dropwise. A THF solution of hexamethylcyclotrisiloxane (1.0 M, 4.4 mL) was added dropwise, followed by a THF solution of hexamethylcyclotrisiloxane (1.0 M, 22 mL) and stirred for 6 hours. Compound 11D (3.6 g) was then added and stirred for 24 hours. Hexane and ion-exchanged water were added sequentially to the reaction solution, and the mixture was separated. The organic layer was separated. The solvent and low-boiling components were removed under reduced pressure, followed by flash column chromatography using silica gel (eluent: hexane / ethyl acetate) to obtain 5.5 g of compound 14A. The structure of compound 14A was confirmed by the following NMR data. In compound 14A, the average value of n was 23.

[0349] 1 H-NMR(400 MHz,CDCl3) δ 2.58(t, J = 7.4 Hz, 2H), 1.70(p, J = 7.4 Hz, 2H), 1.41 - 1.07(m, 14H), 0.45(t, J = 7.4 Hz, 2H), 0.10(s, 171H).

[0350] [ka]

[0351] 2,2-Diallylpent-4-en-1-amine (0.25 g) was added to a mixture of compound 14A (1.0 g) and 1,3-bis(trifluoromethyl)benzene (1.5 g) in a 200 mL flask and stirred for 3 hours. Hexane and ion-exchanged water were added sequentially to the reaction mixture, and the mixture was separated. The organic layer was separated. The solvent and low-boiling components were removed by distillation under reduced pressure, followed by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) to obtain 0.35 g of compound 14B. The structure of compound 14B was confirmed by the following NMR data. The average value of n in compound 14B was 23.

[0352] 1 H-NMR(400 MHz,CDCl3) δ 5.80(ddt, J = 17.7, 10.6, 7.4 Hz, 3H), 5.15 - 4.90(m, 6H), 3.12(d, J = 6.3 Hz, 2H), 2.09(t, J = 7.5 Hz, 2H), 1.96(dd, J = 7.6, 1.3 Hz, 6H), 1.34 - 1.07(m, 16H), 0.45(t, J = 7.6 Hz, 2H), 0.06 - -0.10(m, 171H).

[0353] [ka]

[0354] From compound 14B (0.33 g), 0.38 g of compound 14C was obtained by the same method as in the synthesis of compound 13B. The structure of compound 14C was confirmed by the following NMR data. In compound 14C, the average value of n was 23.

[0355] 1 H-NMR(400 MHz,CDCl3) δ 5.66(d, J = 6.4 Hz, 1H), 3.46(d, J = 29.0 Hz, 2H), 2.12(t, J = 7.5 Hz, 2H),1.61 - 1.42(m, 2H), 1.32 - 1.02(m, 26H), 0.53(t, J = 7.7 Hz, 6H), 0.45(t, J = 7.0 Hz, 2H),0.22 - -0.24(m, 171H).

[0356] [ka]

[0357] [Synthesis of Compound 15B] Under a nitrogen atmosphere, trimethylsilanol (0.15 g) and tetrahydrofuran (10 mL) were added to a three-neck flask and stirred. The mixture was cooled to 0°C, and a hexane solution of n-BuLi (1.6 M, 0.95 mL) was added dropwise. A THF solution of hexamethylcyclotrisiloxane (1.0 M, 11 mL) was added dropwise and stirred for 18 hours. Compound 11D (1.5 g) was then added, and the mixture was stirred for 6 hours. Compound 11A (2.7 g) was then added, and the mixture was stirred for 24 hours. Hexane and ion-exchanged water were added sequentially to the reaction mixture, and the mixture was separated. The organic layer was separated. The solvent and low-boiling components were removed under reduced pressure. The mixture was then subjected to flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) to obtain 1.4 g of compound 15A. The structure of compound 15A was confirmed by the following NMR data. The average value of n in compound 15A was 22.

[0358] 1 H-NMR (400 MHz,CDCl3) δ 5.74(ddt, J = 16.9, 10.2, 6.7 Hz, 2H), 5.28(s,1H), 5.01 - 4.71(m, 4H), 3.11(t, J = 5.8 Hz, 2H), 2.10(t, J = 7.6 Hz, 2H), 1.97(q, J = 6.9 Hz, 4H), 1.69 - 0.97(m, 48H), 0.45(t, J = 7.6 Hz, 2H), 0.07(s, 147H).

[0359] [ka]

[0360] To a solution of compound 15A (0.51 g) in dichloromethane (0.63 g), a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 6.8 mg), aniline (1.0 mg), and trimethoxysilane (0.091 g) were added, and the mixture was stirred at 25°C for 2 hours. The solvent was removed by distillation under reduced pressure to obtain 0.56 g of compound 15B. The structure of compound 15B was confirmed by the following NMR data. The average value of n in compound 15B was 22.

[0361] 1 H-NMR(400 MHz,CDCl3) δ 5.31(m, 1H), 3.57(s, 18H), 3.18(t, J = 6.0 Hz, 2H), 2.16(t, J = 7.5 Hz, 2H), 1.64 - 1.25(m, 57H), 0.64(m, 4H), 0.52(t, J = 7.7 Hz, 2H), 0.07(m, 147H).

[0362] [ka]

[0363] Next, the substrate was subjected to a surface treatment using the above-mentioned compounds 11F, 12B, 13B, 14C, and 15B, and compounds 5A and 6A. As the surface treatment method, a wet coating method was used.

[0364] <Wet coating method> 30 g of silicon oxide was placed as a deposition source in a copper hearth in a vacuum deposition apparatus (VTR-350M manufactured by ULVAC Kiko Co., Ltd.). A glass substrate was placed in the vacuum deposition apparatus, and the inside of the vacuum deposition apparatus was heated to 5 × 10 -3 The hearth was evacuated to a pressure of 100 Pa or less. The hearth was heated to approximately 2,000°C, and silicon oxide was vacuum-deposited onto the surface of the substrate. As a result, a silicon oxide layer with a thickness of approximately 20 nm was formed on the substrate.

[0365] The substrate with the silicon oxide layer formed was placed on the sample stage of a spray coater (API-90RS, manufactured by Apiros Co., Ltd.) so that the silicon oxide layer was on the surface. Next, 13 g of a 0.2 mass % heptane solution of each compound was placed in a syringe inside the spray coater and spray-coated at an atomization pressure of 130 kPa, a nozzle-to-sample surface distance of 50 mm, and a scanning speed of 300 mm / sec. The coated substrate was then heat-treated at 140°C for 30 minutes. This resulted in an article having a surface-treated layer on the surface of the silicon oxide layer.

[0366] The articles obtained by the wet coating method were evaluated for water repellency, abrasion resistance, and fingerprint resistance. The evaluation methods for water repellency and abrasion resistance were as described above. The evaluation method for fingerprint resistance was as follows.

[0367] <Fingerprint resistance> A 1 kg weight equipped with a 2 cm diameter red rubber stopper was prepared to serve as the fingerprint stamp. Next, 70 μL of artificial fingerprint fluid (manufactured by Isekyu Co., Ltd.) was dropped onto a waste cloth, and the fingerprint stamp was left to adhere to the artificial fingerprint fluid for 1 minute. To remove excess artificial fingerprint fluid from the fingerprint stamp, the fingerprint stamp was left to adhere to a new waste cloth for 20 seconds. The product with the surface treatment layer was then placed on a hot plate adjusted to 23°C. The fingerprint stamp was then stamped onto the surface treatment layer.

[0368] The article with the artificial fingerprint liquid attached was placed in a sliding device (product name "HHS-2000", manufactured by Shinto Scientific Co., Ltd.). A wiping cloth (Savina Minimax, manufactured by KB Seiren Co., Ltd.) was attached to a flat indenter with an area of ​​1 cm square using double-sided tape, and then placed in the sliding device. The artificial fingerprint liquid attached was wiped off in one direction with the wiping cloth against the surface treatment layer under a load of 100 g. The haze of the wiped area was measured using a haze meter (product name "NDH7000SP", manufactured by Nippon Denshoku Co., Ltd.). The evaluation criteria are as follows: A: The haze value is less than 0.1%. B: The haze value is 0.1% or more and less than 1%. C: The haze value is 1% or more.

[0369] The evaluation results are shown in Table 2. In Table 2, if the compound contains a partial structure that is an alkylene chain or polyalkylene oxide chain having 3 or more carbon atoms, or Group 2, it is marked with "Y," and if it does not, it is marked with "N." For Group 1, a specific structure is shown. Furthermore, n means the number of repeating units of the organopolysiloxane residue.

[0370] Examples 11 to 15 are working examples, and Examples 16 and 17 are comparative examples.

[0371] [Table 2]

[0372] As shown in Table 2, it was found that the compounds of Examples 11 to 15 can form a surface treatment layer having excellent water repellency and abrasion resistance because they contain Group 1, a partial structure which is an alkylene chain or polyalkylene oxide chain having 3 or more carbon atoms, and Group 2. It was also found that the compounds of Examples 11 to 15 also have excellent fingerprint resistance. [Industrial Applicability]

[0373] The compounds of the present disclosure are useful as surface treatment agents. The surface treatment agents can be used, for example, for display devices such as touch panel displays, optical elements, semiconductor elements, building materials, automotive parts, and substrates used in nanoimprint technology. The surface treatment agents can also be used for the bodies, window glass (windshields, side glass, and rear glass), mirrors, bumpers, and the like of transportation equipment such as trains, automobiles, ships, and aircraft. Furthermore, the surface treatment agents can be used for outdoor items such as building exterior walls, tents, solar power generation modules, soundproofing panels, and concrete; fishing nets, insect nets, and aquariums. The surface treatment agents can also be used for various indoor facilities such as kitchens, bathrooms, sinks, mirrors, and toilet peripherals; ceramics such as chandeliers and tiles; artificial marble, and air conditioners. The surface treatment agents can also be used for antifouling treatment of jigs, interior walls, piping, and the like in factories. The surface treatment agents can also be used for goggles, eyeglasses, helmets, pachinko machines, textiles, umbrellas, playground equipment, and soccer balls. The surface treatment agents can also be used as anti-adhesion agents for various packaging materials such as food packaging, cosmetic packaging, and the inside of pots. The surface treatment agent can also be used for optical components such as car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio equipment, game machines, eyeglass lenses, camera lenses, lens filters, sunglasses, medical devices such as gastroscopes, copiers, PCs, displays (e.g., liquid crystal displays, organic EL displays, plasma displays, touch panel displays), touch panels, protective films, and anti-reflection films.

[0374] The disclosure of Japanese Patent Application No. 2022-049060, filed on March 24, 2022, is incorporated herein by reference in its entirety. In addition, all documents, patent applications, and technical standards described herein are incorporated herein by reference to the same extent as if each individual document, patent application, and technical standard were specifically and individually indicated to be incorporated by reference.

Claims

1. A compound represented by the following formula 1: [R １ ３ Si-(O) ｒ -Z] ｐ A (Si (R) ２ ) ｎ L ３－ｎ ) ｑ … (1) In formula 1, R １ are each independently a hydrocarbon group or a trialkylsilyloxy group, r is 0 or 1, Z is a combination of an alkylene chain and a divalent polysiloxane residue, A is a single bond or a p+q valent linking group, R ２ are each independently a hydrocarbon group, each L is independently a hydrolyzable group or a hydroxyl group, each n is independently an integer of 0 to 2, p is an integer of 1 or more, and q is 1; The alkylene chain contained in Z is an alkylene chain having 10 or more carbon atoms.

2. In the formula 1, R １ The compound of claim 1 , wherein each is independently a trialkylsilyloxy group.

3. In the formula 1, R １ and each independently represent a trimethylsilyloxy group or a triethylsilyloxy group.

4. The compound according to any one of claims 1 to 3, wherein in formula 1, p is 2 to 4.

5. The compound according to any one of claims 1 to 4, wherein in formula 1, q is 2 to 4.

6. A composition comprising the compound according to any one of claims 1 to 5 and a liquid medium.

7. A surface treatment agent comprising the compound according to any one of claims 1 to 5.

8. A surface treatment agent comprising the compound according to any one of claims 1 to 5 and a liquid medium.

9. A method for producing an article, comprising: performing a surface treatment on a substrate using the surface treatment agent according to claim 7 or 8; and producing an article having a surface treatment layer formed on the substrate.

10. An article comprising a substrate and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent according to claim 7.

11. The article of claim 10 which is an optical element.

12. The article according to claim 10, which is a display or a touch panel.