Laminate and display device

Abstract

To provide a laminate capable of achieving both suppression of reflected appearance caused by light reflection inside and outside a panel during black display and improvement in luminance during white display in a display device employing a quantum dot organic EL panel.SOLUTION: The present invention relates to a laminate including a low-reflection film and a functional layer, the low-reflection film having a visually averaged reflectance of at least 0.05% and 5% or less and a total light transmittance of 93% or more, and the functional layer containing at least one dye and satisfies the following expression (I): (I) (Tt50° / Tt0°)×100≥60 where Tt50°represents the transmittance of light having a wavelength of 550 nm incident on the functional layer at an incident angle of 50°, and Tt0°represents the transmittance of light having a wavelength of 550 nm incident on the functional layer at an incident angle of 0°.SELECTED DRAWING: None

Description

[Technical Field]

[0001] The present invention relates to a laminate and a display device including the laminate. [Background technology]

[0002] Organic EL display devices using organic electroluminescence (organic EL or OLED) elements can be made lighter and thinner than liquid crystal display devices and the like, and can also achieve high image quality such as a wide viewing angle, fast response speed, and high contrast, and are therefore used in a variety of fields such as smartphones, televisions, and digital cameras. In organic EL display devices, in order to suppress deterioration of visibility due to light reflection from electrodes constituting the device and reflection of external light, a circular polarizing plate, which is an optical component formed by laminating a polarizing film and a retardation film, as disclosed in Patent Document 1, for example, is used. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Publication No. 2020-095255 Summary of the Invention [Problem to be solved by the invention]

[0004] In recent years, development of quantum dot (QD) organic electroluminescent (EL) panels has progressed. Compared to conventional EL panels, quantum dot EL panels have attracted attention for their sharper emission spectrum, superior color reproducibility, and wide color gamut. Similar to conventional EL displays, display devices using such QD EL panels must suppress external light reflection during black display and light reflection at the electrodes to ensure high visibility. Conventional EL display panels address the issue of light reflection by using circular polarizers. However, quantum dot EL panels have lower emission intensity than conventional EL panels, making it difficult to achieve sufficient brightness using circular polarizers, which absorb light. Therefore, it is difficult to achieve anti-reflection in QD EL panels using circular polarizers. Therefore, an anti-reflection film (AR (anti-reflection) film or LR (low-reflection) film), which utilizes light interference to reduce reflected light, is typically laminated on the viewing side of the emitting layer to suppress external light reflection on the display screen and improve visibility.

[0005] However, a phenomenon unique to quantum dot OLED panels—external light taken into the display reflects off the electrodes when the display is in black, and the reflected light is scattered by the light diffusing agents contained in the QD filter, causing the reflected light to appear whitish on the panel—cannot be resolved by anti-reflection films, which are intended to prevent light reflection from outside the screen. For this reason, there is a demand for technology to suppress the decrease in visibility caused by light reflection inside and outside the panel when the display is in black, without using circular polarizers, which, due to their structure, lead to a decrease in brightness when the display is in white, for display devices using quantum dot OLED panels.

[0006] The present invention aims to provide a laminate that can suppress the reflective appearance caused by light reflection inside and outside the panel during black display and improve the brightness during white display in a display device using a quantum dot organic EL panel. In the following description, the term "reflective appearance" refers to both external light reflection, such as the reflection of external light on a display screen, and the phenomenon in which reflected light appears whitish on a panel due to light reflection at the electrodes. Expressions such as suppressing reflective appearance, improving reflective appearance, or (high or excellent) reflective appearance effect refer to the effect of suppressing or preventing the reflective appearance phenomenon. [Means for solving the problem]

[0007] The present inventors have conducted extensive research to solve the above problems and have completed the present invention. That is, the present invention includes the following preferred embodiments. [1] A laminate including a low-reflection film and a functional layer, The low-reflection film has an average luminous reflectance of 0.05% or more and 5% or less, and a total light transmittance of 93% or more, The functional layer contains at least one dye and is represented by the following formula (I): (Tt50° / Tt0°)×100≧60 Formula (I) [wherein Tt50° is the transmittance of light having a wavelength of 550 nm incident on the functional layer at an incident angle of 50°, and Tt0° is the transmittance of light having a wavelength of 550 nm incident on the functional layer at an incident angle of 0°] fulfill, Laminate. [2] The laminate according to [1] above, wherein the low-reflection film comprises a low-reflection layer and a substrate. [3] The laminate according to [2] above, which comprises a low-reflection layer, a substrate, and a functional layer in this order. [4] The laminate according to [1] above, wherein the low-reflection film includes a low-reflection layer, and no substrate is laminated between the low-reflection layer and the functional layer. [5] The laminate according to any one of the above [1] to [4], wherein the dye is at least one selected from the group consisting of black dyes and dichroic dyes. [6] The functional layer comprises a compound represented by the following formula (II): (Tt50° / Tt0°)×100≧80 Formula (II) The laminate according to any one of the above [1] to [5], which satisfies the above. [7] The laminate according to any one of [1] to [6], wherein the laminate from the low-reflection film to the functional layer has an average luminous reflectance of 0.01% or more and 1% or less, and a total light transmittance of 75% or more. [8] The laminate according to any one of [1] to [7] above, for use in a quantum dot organic EL display device. [9] A display device comprising the laminate according to any one of [1] to [8] above and a quantum dot organic EL light-emitting panel.

[10] The display device according to [9] above, wherein the low-reflection film is located on the viewing side of the functional layer. [Effects of the Invention]

[0008] According to the present invention, a laminate can be provided that can suppress the reflective appearance caused by light reflection inside and outside the panel when displaying black, and can also improve the brightness when displaying white, in a display device using a quantum dot organic EL panel. DETAILED DESCRIPTION OF THE INVENTION

[0009] Hereinafter, embodiments of the present invention will be described in detail. Note that the scope of the present invention is not limited to the embodiments described here, and various modifications can be made without departing from the spirit of the present invention.

[0010] [Laminate] The laminate of the present invention includes a low-reflection film and a functional layer. The low-reflection film has an average luminous reflectance of 0.05% or more and 5% or less and a total light transmittance of 93% or more. The functional layer includes at least one dye and is represented by the following formula (I): (Tt50° / Tt0°)×100≧60 Formula (I) [wherein Tt50° is the transmittance of light having a wavelength of 550 nm incident on the functional layer at an incident angle of 50°, and Tt0° is the transmittance of light having a wavelength of 550 nm incident on the functional layer at an incident angle of 0°] Meet the following.

[0011] The laminate having the above-described structure can be used in a quantum dot organic EL display (QD-OLED) to reduce reflection of external light, as well as reduce reflected light caused by external light being reflected by the OLED electrode and scattered light caused by scattering of the reflected light, without reducing the brightness (or luminance) during white display. This reduces the whitish blur seen in conventional QD-OLEDs, while still achieving a sufficient brightness level equivalent to or higher than that of conventional organic EL displays.

[0012] <Low-reflection film> The low-reflection film, commonly referred to as an AR film or LR film, is a film that prevents or reduces reflection through the light interference effect. When the laminate is used in combination with a QD-OLED panel for a display device, the low-reflection film can suppress the deterioration of visibility caused by external light being reflected on the display screen during black display, thereby improving the reflective appearance. The low-reflection film may have a single-layer structure or a multi-layer structure, but the low-reflection film includes at least one low-reflection layer. That is, when the low-reflection film has a single-layer structure, the layer is a low-reflection layer. When the low-reflection film has a multi-layer structure, the multi-layer structure includes at least one low-reflection layer at any position, and when it includes multiple low-reflection layers, the low-reflection layers may be the same or different from each other. The low-reflection film or the layers that make up the low-reflection film do not contain dyes.

[0013] The low-reflection film has a luminous average reflectance of 0.05 to 5%. If the luminous average reflectance is less than 0.05%, it will be necessary to laminate an additional high-reflection layer and / or low-reflection layer to achieve high anti-reflection performance, resulting in poor cost and thinness. If the luminous average reflectance is greater than 5%, the anti-reflection performance will be reduced and the resulting reflection of external light may occur. The luminous average reflectance is preferably 0.05 to 2%, more preferably 0.05 to 1%, and particularly preferably 0.05 to 0.5%. If the luminous average reflectance is within the above range, desired or higher anti-reflection performance can be achieved while ensuring acceptable cost and good thinness. The average luminous reflectance can be adjusted within the above range by adjusting the composition of the materials constituting the layers or films contained in the low-reflection film and / or the thickness of the low-reflection film and / or the layer structure of the low-reflection film. The average luminous reflectance of the low reflection film and the laminate described later can be calculated according to the method described in JIS Z 8722. In detail, it can be measured by the method described in the examples described later.

[0014] The low-reflection film has a total light transmittance of 93% or more. If the total light transmittance is less than 93%, the film is not suitable for application to the surface of a display device. The low-reflection film has a total light transmittance of preferably 94% or more, more preferably 95% or more, and particularly preferably 96% or more, but 100% or less. If the total light transmittance is equal to or greater than the lower limit, a laminate having high transparency and excellent optical properties can be formed, and when incorporated into a display device, a sufficient amount of light can be taken into the display device. The total light transmittance can be adjusted to be equal to or greater than the lower limit by adjusting the composition of the materials constituting the layers or films contained in the low-reflection film and / or the thickness of the low-reflection film and / or the layer structure of the low-reflection film. The total light transmittance of the low reflection film and the laminate described later can be measured, for example, according to the method described in JIS K 7361. Specifically, it can be measured by the method described in the examples described later.

[0015] (Low reflective layer) The low-reflection layer is a layer having a function of reducing or preventing light reflection by the light interference effect. Examples of the low-reflection layer include a cured layer of a curable composition containing low-refractive-index particles having a low-reflection function and a curable material, an inorganic layer having a low-reflection function, and an organic low-reflection layer such as a fluorine-based or silicone-based organic compound, a thermoplastic resin, a thermosetting resin, or an ultraviolet-curable resin.

[0016] First, a cured layer of a curable composition containing low refractive index particles having a low reflection function and a curable material will be described. The cured layer of the curable composition containing low refractive index particles having a low reflection function and a curable material can preferably be formed by a method including the steps of applying a composition containing an active energy ray-curable material, low refractive index particles, and a solvent (hereinafter also referred to as a "low reflection layer-forming composition") to an adjacent layer or film (for example, a substrate or a hard coat layer) or a release film in the low reflection film to be produced to form a coating film, a drying step of drying the coating film, and an active energy ray irradiation step of irradiating the coating film with active energy rays.

[0017] As the active energy ray-curable material contained in the composition for forming a low-reflection layer, curable resins, active energy ray-curable compounds, etc. commonly used in the technical field can be used as long as they can form a low-reflection layer having the desired properties upon curing. Among them, from the viewpoints of transparency, handling, etc., active energy ray-curable compounds that have the property of being cured by irradiation with active energy rays such as ultraviolet rays, electron beams, visible light, or X-rays are preferred. Examples of active energy ray-curable compounds include cationically polymerizable compounds and radically polymerizable compounds.

[0018] In one embodiment of the present invention, a radically polymerizable compound is preferably used as the active energy ray-curable compound forming the low-reflection layer. The radically polymerizable compound refers to a compound that undergoes a radical polymerization reaction and hardens when irradiated with active energy rays or heated. Specific examples include (meth)acrylic materials, such as polyfunctional (meth)acrylate compounds such as (meth)acrylic acid esters of polyhydric alcohols, and monofunctional or polyfunctional urethane (meth)acrylate compounds synthesized from polyisocyanates, polyhydric alcohols, and hydroxyl group-containing (meth)acrylates (e.g., hydroxy esters of (meth)acrylic acid). In addition to acrylic materials, polyether resins, polyester resins, epoxy resins, alkyd resins, spiroacetal resins, polybutadiene resins, polythiolpolyene resins, and the like, each having an acrylate functional group, can also be used. Among these, (meth)acrylic compounds and compounds having an ethylenically unsaturated bond such as vinyl compounds such as styrene, styrene sulfonic acid, vinyl acetate, vinyl propionate, and N-vinyl-2-pyrrolidone are preferred, and (meth)acrylic compounds are more preferred. These materials can be used alone or in combination of two or more. In this specification, (meth)acrylic means both acrylic and methacrylic, and (meth)acrylate means both acrylate and methacrylate.

[0019] The (meth)acrylic compound is a compound having at least one (meth)acryloyloxy group in the molecule, and may be a monomer, oligomer, or polymer. Examples of the (meth)acrylic compound include (meth)acrylate compounds such as monofunctional (meth)acrylate compounds and polyfunctional (meth)acrylate compounds; urethane (meth)acrylate compounds such as polyfunctional urethane (meth)acrylate compounds; epoxy (meth)acrylate compounds such as polyfunctional epoxy (meth)acrylate compounds; carboxyl group-modified epoxy (meth)acrylate compounds, polyester (meth)acrylate compounds, etc. The (meth)acrylic compound may be used alone or in combination of two or more.

[0020] Examples of the (meth)acrylate compound include a monofunctional (meth)acrylate compound having one (meth)acryloyloxy group in the molecule, and a polyfunctional (meth)acrylate compound having two or more (meth)acryloyloxy groups in the molecule. From the viewpoint of increasing the crosslink density of the cured resin layer, the polyfunctional (meth)acrylate compound may be more suitable.

[0021] Examples of the monofunctional (meth)acrylate compound include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate, t-butyl (meth)acrylate, glycidyl (meth)acrylate, acryloylmorpholine, N-vinylpyrrolidone, tetrahydrofurfuryl acrylate, cyclohexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, and isobornyl (meth)acrylate. acrylate, isodecyl (meth)acrylate, lauryl (meth)acrylate, tridecyl (meth)acrylate, cetyl (meth)acrylate, stearyl (meth)acrylate, benzyl (meth)acrylate, 2-ethoxyethyl (meth)acrylate, 3-methoxybutyl (meth)acrylate, ethyl carbitol (meth)acrylate, phosphate (meth)acrylate, ethylene oxide-modified phosphate (meth)acrylate, phenoxy (meth)acrylate, ethylene oxide-modified phenoxy (meth)acrylate, propylene oxide-modified propylene oxide Phenoxy (meth)acrylate, nonylphenol (meth)acrylate, ethylene oxide modified nonylphenol (meth)acrylate, propylene oxide modified nonylphenol (meth)acrylate, methoxydiethylene glycol (meth)acrylate, methoxypolyethylene glycol (meth)acrylate, methoxypropylene glycol (meth)acrylate, 2-(meth)acryloyloxyethyl-2-hydroxypropyl phthalate, 2-hydroxy-3-phenoxypropyl (meth)acrylate, 2-(meth)acryloyloxyethyl diethyl hydrogen phthalate, 2-(meth)acryloyloxypropyl hydrogen phthalate, 2-(meth)acryloyloxypropyl hexahydrohydrogen phthalate, 2-(meth)acryloyloxypropyl tetrahydrohydrogen phthalate, dimethylaminoethyl (meth)acrylate, trifluoroethyl (meth)acrylate, tetrafluoropropyl (meth)acrylate, hexafluoropropyl (meth)acrylate, octafluoropropyl (meth)acrylate, octafluoropropyl (meth)acrylate,Examples of the mono(meth)acrylate include adamantane derivative mono(meth)acrylates such as adamantyl acrylate having a monovalent mono(meth)acrylate derived from 2-adamantane and adamantanediol.

[0022] Examples of the polyfunctional (meth)acrylate compound include ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, butanediol di(meth)acrylate, hexanediol di(meth)acrylate, nonanediol di(meth)acrylate, ethoxylated hexanediol di(meth)acrylate, propoxylated hexanediol di(meth)acrylate, diethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate, tripropylene glycol di(meth)acrylate, Bifunctional (meth)acrylate compounds such as di(meth)acrylates such as ricol di(meth)acrylate, polypropylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, ethoxylated neopentyl glycol di(meth)acrylate, tripropylene glycol di(meth)acrylate, and hydroxypivalic acid neopentyl glycol di(meth)acrylate; and, for example, trimethylolpropane tri(meth)acrylate, ethoxylated trimethylolpropane tri(meth)acrylate, tri(meth)acrylates such as propoxylated trimethylolpropane tri(meth)acrylate, tris(2-hydroxyethyl isocyanurate tri(meth)acrylate, glycerin tri(meth)acrylate, trifunctional (meth)acrylate compounds such as pentaerythritol tri(meth)acrylate, dipentaerythritol tri(meth)acrylate, ditrimethylolpropane tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, ditrimethylol Examples of the polyfunctional (meth)acrylate compound include trifunctional or higher polyfunctional (meth)acrylate compounds such as propane tetra(meth)acrylate, dipentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, ditrimethylolpropane penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, and ditrimethylolpropane hexa(meth)acrylate, as well as polyfunctional (meth)acrylate compounds in which a portion of these (meth)acrylates is substituted with an alkyl group or ε-caprolactone.

[0023] The urethane (meth)acrylate compound generally refers to a reaction product of an isocyanate compound, a polyol compound, and a (meth)acrylate compound, and is preferably a polyfunctional urethane (meth)acrylate compound having two or more (meth)acryloyloxy groups in the molecule. As the polyfunctional urethane (meth)acrylate compound, a polyfunctional urethane acrylate obtained by reacting a polyhydric alcohol, a polyisocyanate, and a hydroxyl group-containing acrylate can be suitably used.

[0024] Commercially available polyfunctional urethane acrylates may be used. Specific examples of commercially available polyfunctional urethane acrylates include UA-306H, UA-306T, and UA-3061 manufactured by Kyoeisha Chemical Co., Ltd., UV-1700B, UV-6300B, UV-7600B, UV-7605B, UV-7640B, and UV-7650B manufactured by Nippon Synthetic Chemical Industry Co., Ltd., U-4HA, U-6HA, UA-100H, U-6LPA, U-15HA, UA-32P, and U-324A manufactured by Shin-Nakamura Chemical Co., Ltd., Ebecryl-1290, Ebecryl-1290K, and Ebecryl-5129 manufactured by Daicel-Allnex Corporation, and UN-3220HA, UN-3220HB, UN-3220HC, and UN-3220HS manufactured by Negami Chemical Industrial Co., Ltd.

[0025] The content of the curable material in the composition for forming a low-reflection layer can be appropriately determined depending on the type and combination of the curable materials used, and is, for example, preferably 10 to 80 mass%, more preferably 20 to 75 mass%, and even more preferably 30 to 70 mass% relative to the solid content of the composition for forming a low-reflection layer. In this specification, the solid content of the composition for forming a low-reflection layer refers to the total amount of components excluding volatile substances such as solvents from the composition. Hereinafter, the solid content of other compositions, etc., also refers to the total amount of components excluding volatile substances such as solvents from the target composition, etc.

[0026] The composition for forming a low-reflection layer usually contains low-refractive-index particles as one component for controlling the refractive index of the low-reflection layer. The low-refractive-index particles can generally be nanoparticles having a refractive index lower than that of the optical resin. Specifically, low-refractive-index particles made of a low-refractive-index material such as LiF, MgF, 3NaF·AlF, or AlF (all of which have a refractive index of 1.4), or NaAlF (cryolite, refractive index of 1.33) can be used.

[0027] In addition, low refractive index particles having voids inside the particles can also be used. In these low refractive index particles, the voids can be made to have the refractive index of air (≒1), so the low refractive index particles can have a very low refractive index. Specific examples of such low refractive index particles include low refractive index silica particles having voids inside, such as porous silica particles and silica particles having a shell structure. Low refractive index silica particles having voids inside are preferably used in terms of the low refractive index particles' sufficient scratch resistance and sufficiently low refractive index. The low refractive index particles can be used alone or in combination of two or more.

[0028] The particle size of the low-refractive-index particles is preferably 1 to 100 nm, more preferably 10 to 90 nm, and particularly preferably 20 to 80 nm. When the particle size is equal to or less than the upper limit, light reflection due to Rayleigh scattering can be sufficiently reduced, and whitening of the low-refractive-index layer and a decrease in the transparency of the low-refractive-index film can be suppressed. When the particle size is equal to or greater than the lower limit, problems such as non-uniformity of the low-refractive-index particles in the low-refractive-index layer due to aggregation of the low-refractive-index particles are less likely to occur. Furthermore, using low-refractive-index silica particles having internal voids is advantageous in terms of sufficient scratch resistance and a sufficiently low refractive index of the low-refractive-index particles.

[0029] The voids in the low refractive index particles having voids therein are preferably 20 to 80 nm from the viewpoint of sufficient scratch resistance and a sufficiently low refractive index of the low refractive index particles.

[0030] The amount of low refractive index particles contained in the composition for forming a low reflection layer can be appropriately determined depending on the type of low refractive index particles used, etc. From the viewpoint of obtaining sufficient anti-reflection or anti-reflection function while ensuring the transparency of the low reflection film, the content of the low refractive index particles is, for example, 50 to 300 parts by mass, preferably 80 to 250 parts by mass, more preferably 100 to 200 parts by mass, and even more preferably 120 to 180 parts by mass relative to 100 parts by mass of the active energy ray-curable material contained in the composition for forming a low reflection layer.

[0031] The solvent contained in the composition for forming a low-reflection layer can be selected from known solvents commonly used in the field depending on the type of curable material and low refractive index particles used, the thickness of the low-reflection layer, the configuration of the layer on which the low-reflection layer is formed, and the like. Specific examples of the solvent include alcohol solvents such as methanol, ethanol, ethylene glycol, isopropyl alcohol, propylene glycol, ethylene glycol methyl ether, ethylene glycol butyl ether, and propylene glycol monomethyl ether; ester solvents such as ethyl acetate, butyl acetate, ethylene glycol methyl ether acetate, γ-butyrolactone or propylene glycol methyl ether acetate, and ethyl lactate; ketone solvents such as acetone, methyl ethyl ketone, cyclopentanone, cyclohexanone, 2-heptanone, and methyl isobutyl ketone; aliphatic hydrocarbon solvents such as pentane, hexane, and heptane; aromatic hydrocarbon solvents such as toluene and xylene; nitrile solvents such as acetonitrile; ether solvents such as tetrahydrofuran and dimethoxyethane; chlorine-containing solvents such as chloroform and chlorobenzene; amide solvents such as N,N-dimethylacetamide and N,N-dimethylformamide; sulfur-containing solvents such as dimethyl sulfone, dimethyl sulfoxide, and sulfolane; carbonate solvents such as ethylene carbonate and propylene carbonate; and pyrrolidone solvents such as N-methylpyrrolidone. These solvents may be used alone or in combination of two or more.

[0032] The amount of solvent contained in the composition for forming a low reflection layer may be appropriately selected depending on the coatability of the composition for forming a low reflection layer. From the viewpoints of handleability, coatability, etc., the amount is preferably 50 to 99 mass %, more preferably 70 to 98 mass %, and particularly preferably 80 to 97 mass %, relative to the total mass of the composition for forming a low reflection layer. Therefore, the solid content per 100 parts by mass of the composition for forming a low reflection layer is preferably 1 to 50 parts by mass.

[0033] The composition for forming a low-reflection layer may contain, in addition to the curable material, low-refractive-index particles, and solvent, other components commonly used to form a low-reflection layer, such as a silicone-based material, a polymerization initiator, a leveling agent, a colorant, an antioxidant, and a dispersant.

[0034] When a silicone-based material is added to the composition for forming a low-reflection layer, the low-reflection layer can also have antifouling properties. As such a silicone-based material, silicone oil or modified silicone oil can be used, and preferably alkylaralkyl-modified silicone oil, alkyl-modified silicone oil, polyether-modified silicone oil, or alkylpolyether-modified silicone oil is used. The silicone-based material may also be an organosilicon compound that does not contain fluorine and has no (meth)acrylic group, specific examples of which include alkylalkoxysilane compounds, silane siloxane compounds, silane compounds containing polyester groups, silane compounds having polyether groups, and siloxane compounds. The silicone-based materials can be used alone or in combination of two or more.

[0035] When the above silicone-based material is used, the amount thereof is preferably 1 to 20 parts by mass, more preferably 5 to 20 parts by mass, and even more preferably 10 to 15 parts by mass, relative to 100 parts by mass of the active energy ray-curable material contained in the composition for forming a low-reflection layer.

[0036] The composition for forming a low reflection layer may contain a polymerization initiator depending on the type of curable material used, the type of active energy ray, etc. When ultraviolet light or visible light is used as the active energy ray, a photopolymerization initiator is usually used as the polymerization initiator. As the photopolymerization initiator, for example, acetophenones, benzoins, benzophenones, phosphine oxides, ketals, anthraquinones, and thioxanthones can be used alone or in combination of two or more. The photopolymerization initiator may be used in combination with a dye sensitizer. Examples of the dye sensitizer include xanthene, thioxanthene, coumarin, ketocoumarin, and combinations of two or more thereof. On the other hand, when electron beams or gamma rays are used as the active energy rays, it is not necessary to include a polymerization initiator.

[0037] When a photopolymerization initiator is used, the amount thereof is preferably 1 to 20 parts by mass, more preferably 3 to 15 parts by mass, relative to 100 parts by mass of the active energy ray-curable material.

[0038] The composition for forming a low-reflection layer may contain a leveling agent depending on the type of curable material used, the type of active energy ray, etc. Preferred examples of the leveling agent include organically modified polysiloxanes, which can be used alone or in combination of two or more. Specific examples of organically modified polysiloxanes include polydimethylsiloxanes having polyether-modified acrylic groups, polydimethylsiloxanes having polyester-modified acrylic groups, polydimethylsiloxanes having polyether-modified hydroxyl groups, and aralkyl-modified polymethylalkylsiloxanes.

[0039] By adding an organically modified polysiloxane to the composition for forming a low-reflection layer, the surface tension of the composition for forming a low-reflection layer can be reduced during the drying process. When an organically modified polysiloxane is used, the amount thereof is, for example, 0.1 to 2.0 mass % relative to the total mass of the composition for forming a low-reflection layer.

[0040] The composition for forming a low reflection layer can be applied using a known tool such as a roll coater, reverse roll coater, gravure coater, microgravure coater, knife coater, bar coater, wire bar coater, die coater or dip coater. When the composition for forming a low reflection layer is applied to a release film, a known release film that is generally used in this technical field can be used, and such release films are commercially available.

[0041] The thickness of the applied low-reflection layer-forming composition may be adjusted so that a cured resin layer having a thickness (thickness of one layer) of preferably 0.01 to 10 μm, more preferably 0.05 to 8 μm, and particularly preferably 0.1 to 5 μm is obtained after drying and curing of the low-reflection layer-forming composition. The thicknesses of the cured resin layer, the applied low-reflection layer-forming composition, and the functional layer described below can be measured using a laser microscope, an ellipsometer, or the like.

[0042] Methods for drying and removing the solvent contained in the composition for forming a low-reflection layer include natural drying, ventilation drying, heat drying, and reduced-pressure drying. The temperature when drying the coating film obtained by applying the composition for forming a low-reflection layer is preferably ±30°C, more preferably ±20°C, of ​​the boiling point of the solvent contained in the composition for forming a low-reflection layer. When the drying temperature is within the above range, the solvent is less likely to remain in the obtained low-reflection layer.

[0043] By irradiating the coating film with active energy rays, such as electron beams or ultraviolet rays, a cured resin layer having a low reflection function can be obtained as a low reflection layer. As a device for generating an electron beam, various electron beam accelerators such as Cockcroft-Wald type, Van de Graaff type, resonant transformer type, insulating core transformer type, linear type, dynamitron type, and high frequency type can be used. Examples of light sources that can be used to generate ultraviolet light include low-pressure mercury lamps, medium-pressure mercury lamps, high-pressure mercury lamps, carbon arc lamps, metal halide lamps, xenon lamps, and electrodeless discharge tubes. The cumulative light amount of the active energy rays to be irradiated may be appropriately determined depending on the composition of the low reflection layer-forming composition. 2 is.

[0044] Next, the inorganic layer having a low reflection function will be described. The inorganic layer having a low reflection function can be preferably formed by a method including a step of sputtering or chemical vapor deposition of one or more metal materials selected from the group consisting of aluminum, silver, copper, rhodium, titanium, platinum, cobalt, copper aluminum (AlCu), and magnesium fluoride (MgF2).

[0045] Since the thickness of a low-reflection layer that is effective in reducing the reflection of light of a certain wavelength is preferably equal to or greater than that wavelength, the thickness of the inorganic layer having a low-reflection function can be appropriately determined depending on the wavelength of light whose reflection is to be reduced. On the other hand, a certain level of low-reflection effect can be obtained if the low-reflection layer is as thick as 10 nm. It is also preferable that the refractive index of the low-reflection layer gradually changes in the thickness direction. Specifically, when a laminate including the low-reflection layer is disposed in a display device, the refractive index of the side opposite to the front side is preferably larger than the refractive index of the side corresponding to the viewing side (hereinafter sometimes referred to as the "front side").

[0046] The refractive index of the low-reflection layer in the thickness direction can be changed, for example, by using the metal material as a sputtering target and gradually changing the flow rate of oxygen or nitrogen introduced into the chamber during layering; by using a multi-target sputtering device to simultaneously form layers using multiple targets and gradually changing the ratio of the targets during layering; by gradually changing the flow rate of gas introduced into the chamber in CVD (chemical vapor deposition); or by changing the concentration (content) of the metal material in the thickness direction of the low-reflection layer by heat treatment in a diffusion furnace after layering by CVD or the like. Alternatively, the refractive index of the low-reflection layer can be varied in the thickness direction by forming layers of the metal material multiple times under different conditions using sputtering or CVD. In the case of sputtering, the target may be changed for each layering condition. Alternatively, the refractive index of the low-reflection layer in the thickness direction can be changed by varying the amount of inert gas (such as Ar or N) introduced or the degree of vacuum during layer formation by sputtering or the like, thereby gradually changing the density of the layer.

[0047] When the substrate and the low-reflection layer are laminated adjacent to each other, the low-reflection layer can be formed on the substrate surface by ion implantation of an inert gas instead of lamination. The density of the low-reflection layer is preferably in the range of 59 to 100% of the true density of the substrate. The low-reflection layer may also have a porous structure having pores.

[0048] Whether the low-reflection layer is a cured layer of a curable composition containing low-refractive-index particles having a low-reflection function and a curable material, an inorganic layer having a low-reflection function, or an organic low-reflection layer made of a fluorine-based or silicone-based organic compound, a thermoplastic resin, a thermosetting resin, an ultraviolet-curable resin, or the like, the refractive index thereof is preferably 1.0 to 1.5, more preferably 1.0 to 1.45, and particularly preferably 1.0 to 1.4. When the refractive index is within the above range, the low-reflection layer can exhibit higher anti-reflection performance. The refractive index of the low-reflection layer can be adjusted within the above range by adjusting the composition of the composition constituting the low-reflection layer and / or the thickness of the low-reflection layer.

[0049] The low-reflection film may have a multi-layer structure. In this case, the low-reflection film may include, in addition to at least one low-reflection layer, one or more layers selected from the group consisting of a substrate, a hard coat layer, an adhesive layer, and an antifouling layer. When the low-reflection film has a multilayer structure, the refractive index thereof is preferably 1.0 to 1.5, more preferably 1.0 to 1.3, and particularly preferably 1.0 to 1.2. When the refractive index is within the above range, the low-reflection film can exhibit higher anti-reflection performance. The refractive index of the low-reflection film can be adjusted within the above range by adjusting the composition of the materials constituting the layers contained in the low-reflection film and / or the thickness of the low-reflection film and / or the layer structure of the low-reflection film.

[0050] (base material) The low-reflection film may include one or more substrates at any position. Substrates that can constitute a low-reflection film include, for example, resin films conventionally known in the field of optical films. Specific examples of resins contained in the substrate include polyolefins such as polyethylene, polypropylene, and norbornene-based polymers; cyclic olefin-based resins; polyvinyl alcohol; polyesters such as polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate; polymethacrylic acid esters; polyacrylic acid esters; cellulose-based resins such as triacetyl cellulose, diacetyl cellulose, and cellulose acetate propionate; polycarbonates; polysulfones; polyethersulfones; polyetherketones; polyurethanes; fluorine-based resins such as polytetrafluoroethylene; vinyl compounds such as polyvinyl chloride; vinylidene compounds such as polyvinylidene chloride; copolymers of vinyl compounds or fluorine-based compounds such as vinylidene fluoride / trifluoroethylene copolymers and ethylene / vinyl acetate copolymers; and resins such as polyphenylene sulfide and polyphenylene oxide. Among them, from the viewpoint of smoothness and quality as a substrate, at least one selected from cellulose-based resins, cyclic olefin-based resins, and polyethylene terephthalate resins is preferred, and cellulose-based resins and cyclic olefin-based resins are more preferred. These may be used alone or in combination of two or more. Such resins can be formed into a resin film by known means such as solvent casting or melt extrusion. When the low-reflection film includes multiple substrates, the substrates may be the same or different.

[0051] The thickness of the substrate is not particularly limited, but from the viewpoint of suitability as a low reflection film, the thickness of one substrate is preferably 10 to 200 μm, more preferably 15 to 100 μm.

[0052] Such substrates are known in the art and are commercially available, and such commercially available products can be used as substrates in the present invention.

[0053] (Hard coat layer) The low-reflection film may include a hard coat layer at any position. The hard coat layer mainly improves the surface hardness of the adjacent layer or film, imparts scratch resistance or chemical resistance to the surface of the layer or film, and improves the mechanical strength of the layer or film and the low-reflection film. When the low-reflection film includes a hard coat layer, it is preferable that the low-reflection layer is included adjacent to the hard coat layer. When the low-reflection film includes a substrate and a hard coat layer, it is preferable that the hard coat layer is laminated adjacent to the substrate, and it is also preferable that the hard coat layer is laminated adjacent to the substrate and the low-reflection layer is laminated adjacent to the hard coat layer. The hard coat layer may be laminated at a position that is not adjacent to the substrate. The low reflection film may include one or more hard coat layers, and when two or more hard coat layers are included, they may be the same as or different from each other.

[0054] The hard coat layer can be preferably formed by a method including a step of applying a hard coat layer-forming composition containing an active energy ray-curable material and a solvent to an adjacent layer or film (e.g., substrate) or release film in the reflective film to form a coating film, a drying step of drying the coating film, and an active energy ray irradiation step of irradiating the coating film with active energy rays.

[0055] As the active energy ray-curable material, the same material as the active energy ray-curable material contained in the composition for forming a low reflection layer can be used.

[0056] As the solvent, the same material as the solvent contained in the composition for forming a low reflection layer can be used. The amount of the solvent contained in the hard coat layer-forming composition may be appropriately selected depending on the coatability of the hard coat layer-forming composition, and is preferably 50 to 200 parts by mass, more preferably 70 to 150 parts by mass, and particularly preferably 80 to 120 parts by mass relative to 100 parts by mass of the active energy ray-curable material contained in the hard coat layer-forming composition.

[0057] The hard coat layer-forming composition may contain one or more polymerization initiators and / or various additives, if necessary.

[0058] The polymerization initiator can be the same as the polymerization initiator contained in the composition for forming a low-reflection layer. When a photopolymerization initiator is used as the polymerization initiator, the amount thereof is preferably 0.1 to 10 parts by mass, more preferably 1 to 7 parts by mass, relative to 100 parts by mass of the active energy ray-curable material.

[0059] Examples of various additives include surface conditioners (for example, leveling agents that may be included in the composition for forming a low-reflection layer), refractive index adjusters, adhesion improvers, curing agents, and antistatic agents (for example, fine particles of metal oxides such as antimony-doped tin oxide, indium oxide tin oxide, tin oxide, titanium oxide, and antimony pentoxide, quaternary ammonium salts, and conductive polymers).

[0060] The thickness of the hard coat layer (thickness of one layer) is not particularly limited, but is preferably 0.1 to 50 μm, more preferably 0.5 to 20 μm, and even more preferably 1 to 10 μm.

[0061] (Adhesive layer) The low reflection film may include an adhesive layer at any position other than the outermost layer. The adhesive layer is formed of an adhesive or a pressure-sensitive adhesive. In this specification, the adhesive for forming the adhesive layer is, for example, an adhesive having a storage modulus of 1.0×10 at 25° C. measured under the following conditions using a dynamic viscoelasticity measuring device. 7Pa or more, and 8 The pressure-sensitive adhesive preferably has a storage modulus of 1.0 × 10 Pa or more at 25°C as measured under the following conditions using a dynamic viscoelasticity measuring device. 3 Pa~1.0×10 6 Examples of such agents include those having a viscosity of 100 Pa or higher. Sample dimensions: width 10mm, length 30mm Clamp distance: 20mm, Measurement mode: Tensile Frequency: 1Hz Heating rate: 5°C / min

[0062] The thickness of the adhesive layer formed by the adhesive is not particularly limited, but is preferably 0.01 to 3 μm, more preferably 0.05 to 2 μm. The thickness of the adhesive layer formed by the pressure-sensitive adhesive is not particularly limited, but is preferably 5 to 100 μm, more preferably 5 to 25 μm.

[0063] The adhesive or pressure-sensitive adhesive may be any adhesive or pressure-sensitive adhesive commonly used in the art, and such adhesives or pressure-sensitive adhesives are commercially available. For example, an adhesive or pressure-sensitive adhesive that is a thermosetting resin composition or a photocurable resin composition can be applied to an adjacent layer or film by a conventionally known method (for example, a method using a known tool such as a roll coater as described above), and then another adjacent layer or film is placed on top of it, and the coating film is then cured by heat or light, thereby forming a pressure-sensitive adhesive layer between the two adjacent layers or films. The adhesive layer may also be a layer called a pressure-sensitive adhesive (PSA), which is attached to an object by pressing. The pressure-sensitive adhesive may be a pressure-sensitive adhesive, which is "a substance that is adhesive at room temperature and adheres to an adherend with light pressure" (JIS K 6800), or may be a capsule-type adhesive, which is "an adhesive in which a specific component is encapsulated in a protective film (microcapsules) and which maintains stability until the film is destroyed by an appropriate means (pressure, heat, etc.)" (JIS K 6800).

[0064] (Anti-fouling layer) The low-reflection film may include an antifouling layer. The antifouling layer is a layer that exhibits a function of preventing contamination from the surroundings, such as water repellency, oil repellency, sweat resistance, antifouling, or fingerprint resistance. The antifouling layer can also improve the slipperiness of the surface.

[0065] The antifouling layer may be any layer commonly used in the art. Specifically, the material for forming the antifouling layer may be either an organic compound or an inorganic compound. Examples of materials that provide high water and oil repellency include fluorine-containing organic compounds and organosilicon compounds. Examples of fluorine-containing organic compounds include fluorocarbons, perfluorosilanes, and polymeric compounds thereof. From the perspective of easily enhancing the effect of preventing stain adhesion, a material that provides a contact angle of the antifouling layer surface with pure water of 90° or more, and even 100° or more, is preferred. Depending on the material to be formed, the antifouling layer may be formed using physical vapor deposition, typically vapor deposition or sputtering, chemical vapor deposition, wet coating, or the like. The average thickness of the antifouling layer is not particularly limited, and is usually about 1 to 50 nm, preferably 3 to 35 nm.

[0066] The layer structure of the low-reflection film is not particularly limited as long as it satisfies the average luminous reflectance and total light transmittance required for the low-reflection film of the present invention. For example, it may consist of a single low-reflection layer, or may have a multilayer structure including a low-reflection layer and other layers such as a substrate.

[0067] When the low-reflection film has a multilayer structure, for example, in the low-reflection film, a hard coat layer and / or an antifouling layer may be laminated adjacent to the low-reflection layer, optionally via an adhesive layer.

[0068] In a preferred embodiment, the low-reflection film includes a low-reflection layer and a substrate. In this embodiment, the low-reflection layer and the substrate may be adjacent to each other, or an adhesive layer and / or a hard coat layer may be optionally disposed between the low-reflection layer and the substrate. In addition, an antifouling layer may be laminated on the surface of the layer or film constituting the low-reflection film, for example, on the surface of the low-reflection layer. In a preferred embodiment, the low-reflection film comprises a low-reflection layer, a hard coat layer, and a substrate, in this order, preferably adjacent to each other. In another preferred embodiment, the low-reflection film comprises a low-reflection layer, a hard coat layer, and a substrate, laminated in the above order. An antifouling layer may be laminated on the surface of the low-reflection layer. In one embodiment of the present invention, the low-reflection film is made of a low-reflection layer. In this embodiment, an antifouling layer may be laminated on the surface of the low-reflection film. In one of these embodiments, when the stack is used in a QD-OLED, the stack can achieve an improved reflective appearance while still providing suitable luminous brightness.

[0069] The thickness of the low-reflection film may be appropriately determined depending on the layer structure of the low-reflection film, the form of the QD-OLED panel display device to be incorporated, etc. The thickness of the low-reflection film may be, for example, 0.05 to 500 μm, preferably 0.1 to 300 μm, more preferably 0.1 to 200 μm, and even more preferably 0.1 to 100 μm. The thickness of the low reflection film and the substrate described below can be measured using a known instrument such as a contact type film thickness meter. In the laminate of the present invention, layers necessary for ensuring, maintaining, and / or reinforcing the function of the low-reflection layer, as well as layers formed integrally with the low-reflection layer, specifically, for example, a substrate for forming and supporting the low-reflection layer, a hard coat layer adjacent to or close to the low-reflection layer, an antifouling layer, and adhesive layers for bonding these layers, are considered to be components constituting the low-reflection film. On the other hand, in the present invention, adhesive layers for bonding the low-reflection film to other layers such as functional layers are not usually considered to be components of the low-reflection film. Therefore, for example, when a low-reflection layer is formed on a substrate and includes a hard coat layer, an antifouling layer, etc., the average luminous reflectance, total light transmittance, and thickness of the low-reflection film mean values ​​measured for a multilayer film including the substrate, low-reflection layer, hard coat layer, and antifouling layer.

[0070] The low-reflection film can be produced by laminating layers or films that constitute the low-reflection film. For example, when the low-reflection film includes a substrate, the low-reflection film can be produced by a method comprising applying, drying, and curing a composition for forming a layer other than the substrate (e.g., a low-reflection layer-forming composition, a hard-coat layer-forming composition, and an antifouling layer-forming composition) to the substrate in one layer, or successively in the case of multiple layers; a method comprising applying, drying, and curing each of the compositions to a release film to individually produce layers other than the substrate, and laminating the produced layers and the substrate via a pressure-sensitive adhesive layer; or a method comprising a combination of the steps of the above two methods (e.g., a method comprising applying, drying, and curing a hard-coat layer-forming composition to the substrate, applying, drying, and curing a low-reflection layer-forming composition to a release film, adhering the hard-coat layer side of a laminate consisting of substrate / hard-coat layer to the low-reflection layer side of a laminate consisting of release film / low-reflection layer via a pressure-sensitive adhesive layer, and removing the release film). For example, when the low-reflection film does not include a substrate, the low-reflection film can be produced by a method comprising applying, drying, and curing a composition for forming a layer constituting the low-reflection film (e.g., a low-reflection layer-forming composition, a hard coat layer-forming composition, and an antifouling layer-forming composition) to a release film in one layer, or successively in the case of multiple layers; a method comprising applying, drying, and curing each of the compositions to a release film to individually produce the layers constituting the low-reflection film, and laminating the produced layers via an adhesive layer; or a method combining the steps of the above two methods (e.g., applying, drying, and curing a hard coat layer-forming composition to a release film, and then applying, drying, and curing a low-reflection layer-forming composition thereon; applying, drying, and curing a antifouling layer-forming composition to another release film; attaching the low-reflection layer side of a laminate consisting of release film / hard coat layer / low-reflection layer to the antifouling layer side of a laminate consisting of release film / antifouling layer via an adhesive layer, and removing the release film). In another embodiment of the present invention, a single-layer low-reflection layer (low-reflection film) can be obtained by forming a low-reflection layer directly on the surface where the low-reflection layer is to be provided (for example, on the functional layer in the present invention). A multilayer low-reflection film can also be obtained by applying, drying, and curing a single layer, or in the case of multiple layers, compositions for forming layers constituting the low-reflection film other than the low-reflection layer (for example, a composition for forming a hard coat layer, a composition for forming an antifouling layer) on the single-layer low-reflection layer obtained in this way. Furthermore, as the low-reflection film, a commercially available product generally used in the field of optical films may be used. In order to improve adhesion between adjacent layers or films, the substrate or each of the above layers may be subjected to a known pretreatment such as a corona treatment or a low-temperature plasma treatment before lamination.

[0071] <Functional layer> The laminate of the present invention includes a functional layer in addition to the low-reflection film. The functional layer in the present invention includes at least one dye and is represented by the following formula (I): (Tt50° / Tt0°)×100≧60 Formula (I) [wherein Tt50° is the transmittance of light having a wavelength of 550 nm incident on the functional layer at an incident angle of 50°, and Tt0° is the transmittance of light having a wavelength of 550 nm incident on the functional layer at an incident angle of 0°] This is a layer that satisfies the above. In display devices that use QD-OLED panels containing quantum dots, which are nanoparticles, there is a phenomenon that occurs specifically when using quantum dot organic EL panels: external light taken into the display device is reflected by the OLED electrode during black display, and the reflected light is scattered by the diffusing agent in the QD filter, causing the reflected light to appear whitish on the panel. When the laminate of the present invention is placed on the viewing side of the OLED electrode in a QD-OLED, the functional layer contained in the low-reflection film can prevent or reduce the appearance of whitishness on the QD-OLED panel during black display, which is caused by the external light reflected by the OLED electrode and the scattered light generated when the reflected external light is scattered by the diffusing agent in the QD filter.

[0072] To more effectively prevent or reduce the occurrence of the external light and scattered light on the QD-OLED panel, the functional layer preferably effectively absorbs light near the emission spectrum (reflection spectrum) of the light-emitting panel. For example, when the light-emitting panel is a QD-OLED panel, the functional layer preferably effectively absorbs light near wavelengths of 440-460 nm, 530-550 nm, and 640-660 nm. By incorporating a dye having a maximum absorption wavelength (λmax) in these wavelength ranges, a laminate can be obtained that suppresses or reduces the whitish appearance of the display screen during black display and neutralizes the display screen during white display. In this specification, reducing the yellowish or blueish appearance of the display screen during white display is also referred to as "neutral graying." This refers to the appearance of a gray color with no hue or brightness when the laminate of the present invention is laminated on a QD-OLED display device and viewed obliquely during white display.

[0073] The functional layer contains one or more dyes, preferably selected from the group consisting of black dyes and dichroic dyes. While containing one or more dyes in the functional layer can prevent or reduce the above-mentioned external light and scattered light from appearing on the QD-OLED panel, it was surprising that this prevention or reduction could not be achieved when the functional layer contains one or more pigments instead of dyes. While not intending to be bound by the following reasons, it is believed that the presence of particles such as pigments in the functional layer can cause scattering of reflected light, which can hinder the effect of reducing reflected light measured by the SCE (specularly reflected light excluded) method. Therefore, in a preferred embodiment of the present invention, the functional layer does not contain an amount of pigment that would reduce the anti-reflection performance of the present invention, and particularly preferably does not contain any pigment.

[0074] The functional layer can be preferably formed by a method including the steps of: applying a functional layer-forming composition containing an active energy ray-curable material, a dye, and a solvent to an adjacent layer or film in the laminate to be produced, or to a release film, to form a coating film; drying the coating film; and irradiating the coating film with active energy rays. Since the black pigment contained in the functional layer is a dye, the black pigment can be dissolved in the functional layer-forming composition, allowing the low-reflection film to exhibit the desired anti-reflection performance.

[0075] The functional layer-forming composition may be prepared by mixing an active energy ray-curable material, a dye, a solvent, and optional materials (initiators and various additives) using a known mixer. The order in which the materials are added to the mixer is not particularly limited. For example, all materials may be added to the mixer all at once or in any order and mixed. Alternatively, a mixture of the active energy ray-curable material, a solvent, and optional materials as needed may be prepared, and a mixture of the dye, a solvent, and optional materials as needed may be prepared, and then these mixtures may be mixed.

[0076] The black dye may be a dye that exhibits black color alone (black dye in the narrow sense), or a mixed dye that does not exhibit black color alone but exhibits black color when combined with two or more other dyes. The mixed dye may be a mixture of a black dye in the narrow sense with a dye of another color. Black dyes, whether alone, as a mixture, or as a mixture with a dichroic dye, preferably have an absorption maximum wavelength in the range of 300 to 700 nm. Examples of dyes that constitute such black dyes include azo dyes, anthraquinone dyes, perinone dyes, perylene dyes, methine dyes, quinoline dyes, azine dyes, metal complexes, metal salts, amine compounds, organic acids, and mixtures thereof. Among these, azo dyes and mixtures of azo dyes and amine compounds are preferred. When a black dye and a dichroic dye are used in combination as dyes contained in the functional layer, the ratio of the black dye to the dichroic dye is preferably selected so that the absorption maximum wavelength of the mixture is in the range of 300 to 700 nm. Such a ratio, expressed as the mass ratio of the black dye to the dichroic dye (mass of black dye:mass of dichroic dye), is, for example, 1:10 to 10:1, preferably 1:5 to 5:1, and more preferably 1:1 to 4:1. The absorbance of the dye can be measured using a spectrophotometer after dissolving it in a solvent that dissolves dyes, such as methyl ethyl ketone.

[0077] A dichroic dye is a dye that has different absorbance in the long axis direction of the molecule and in the short axis direction. Dichroic dyes, whether used alone, as a mixture, or as a mixture with a black dye, preferably have a maximum absorption wavelength in the range of 300 to 700 nm. Examples of such dichroic dyes include acridine dyes, oxazine dyes, cyanine dyes, naphthalene dyes, azo dyes, anthraquinone dyes, phthalocyanine dyes, and nitro dyes. Among these, azo dyes are preferred.

[0078] Examples of azo dyes include monoazo dyes, bisazo dyes, trisazo dyes, tetrakis azo dyes, and stilbene azo dyes. Among them, bisazo dyes and trisazo dyes are preferred, and examples thereof include those represented by the following formula (I): K1 (-N=NK 2 ) p -N=NK 3 (I) [In the formula, K 1 and K. 3 represent, independently of each other, an optionally substituted phenyl group, an optionally substituted naphthyl group, an optionally substituted benzoic acid phenyl ester group, or an optionally substituted monovalent heterocyclic group; K 2 represents a p-phenylene group which may have a substituent, a naphthalene-1,4-diyl group which may have a substituent, a 4,4'-stilbenylene group which may have a substituent, or a divalent heterocyclic group which may have a substituent, p represents an integer of 0 to 4, and when p is an integer of 2 or more, multiple K2s may be the same or different, and an -N=N- bond may be replaced by a -C=C-, -COO-, -NHCO-, or -N=CH- bond within the range of showing absorption in the visible region. Examples of compounds include a compound represented by the formula (hereinafter also referred to as "compound (I)").

[0079] Examples of monovalent heterocyclic groups include groups in which one hydrogen atom has been removed from a heterocyclic compound such as quinoline, thiazole, benzothiazole, thienothiazole, imidazole, benzimidazole, oxazole, benzoxazole, etc. Examples of divalent heterocyclic groups include groups in which two hydrogen atoms have been removed from the above heterocyclic compounds.

[0080] K 1 and K. 3 Phenyl group, naphthyl group, benzoic acid phenyl ester group and monovalent heterocyclic group in 2In the formula (I), examples of the substituent that the p-phenylene group, naphthalene-1,4-diyl group, 4,4'-stilbenylene group, and divalent heterocyclic group may optionally have include an alkyl group having 1 to 20 carbon atoms, an alkyl group having 1 to 20 carbon atoms and having a polymerizable group, an alkenyl group having 1 to 4 carbon atoms, an alkoxycarbonyl group having 1 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms such as a methoxy group, an ethoxy group, or a butoxy group, an alkoxy group having 1 to 20 carbon atoms and having a polymerizable group, or an alkoxy group having 1 to 20 carbon atoms such as a trifluoromethyl group. fluorinated alkyl groups; cyano group; nitro group; halogen atoms; substituted or unsubstituted amino groups such as amino group, diethylamino group, pyrrolidino group, etc. (The substituted amino group means an amino group having one or two alkyl groups of 1 to 6 carbon atoms, an amino group having one or two alkyl groups of 1 to 6 carbon atoms and a polymerizable group, or an amino group in which two substituted alkyl groups are bonded to form an alkanediyl group of 2 to 8 carbon atoms. An unsubstituted amino group is -NH2). Examples of the polymerizable group include a (meth)acryloyl group and a (meth)acryloyloxy group.

[0081] Among the compounds (I), compounds represented by any one of the following formulae (I-1) to (I-8) are preferred. [ka] In formulas (I-1) to (I-8), B 1 ~B 30 are each independently a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 1 to 6 carbon atoms, an alkoxycarbonyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a cyano group, a nitro group, a substituted or unsubstituted amino group (the definitions of a substituted amino group and an unsubstituted amino group are as defined above), a chlorine atom, or a trifluoromethyl group. n1 to n4 each independently represent an integer of 0 to 3. If n1 is 2 or more, multiple B 2 may be the same or different from each other, If n2 is 2 or more, multiple B 6 may be the same or different from each other, If n3 is 2 or more, multiple B 9 may be the same or different from each other, If n4 is 2 or more, multiple B 14 may be the same or different from each other.

[0082] When the functional layer contains one or more dyes selected from the group consisting of black dyes and dichroic pigments, it may further contain one or more dyes that do not have dichroism or orientation properties. When a dye selected from the group consisting of black dyes and dichroic dyes is used in combination with a dye that is neither dichroic nor orientable as the dye contained in the functional layer, the ratio of the dye selected from the group consisting of black dyes and dichroic dyes to the dye that is neither dichroic nor orientable is preferably selected so that the absorption maximum wavelength of the mixture is in the range of 300 to 700 nm. Such a ratio, in terms of the mass ratio of the dye selected from the group consisting of black dyes and dichroic dyes to the dye that is neither dichroic nor orientable (mass of the dye selected from the group consisting of black dyes and dichroic dyes:mass of the dye that is neither dichroic nor orientable), is, for example, 10:1 to 1:10, preferably 5:1 to 1:5.

[0083] In one embodiment, it is preferable to select a dye so that the functional layer exhibits a black (neutral gray) color. This can be achieved by using a black dye, a dichroic dye, a combination of a black dye and a dichroic dye, a combination of a black dye and a dye that is neither dichroic nor orientable, a combination of a dichroic dye and a dye that is neither dichroic nor orientable, or a combination of a black dye, a dichroic dye, and a dye that is neither dichroic nor orientable. The black (neutral gray) color of the functional layer can be confirmed using, for example, a spectrophotometer, a colorimeter, or the like.

[0084] From the viewpoint of good antireflection performance, the total amount of dyes contained in the functional layer is usually 0.1 to 8 parts by mass, preferably 0.5 to 5 parts by mass, and more preferably 1 to 3 parts by mass, per 100 parts by mass of the active energy ray-curable material.

[0085] The functional layer has the following formula (I): (Tt50° / Tt0°)×100≧60 Formula (I) and preferably satisfies the following formula (II): (Tt50° / Tt0°)×100≧80 Formula (II) Meet the following. In the above formula, Tt50° is the transmittance of light with a wavelength of 550 nm that is incident on the functional layer at an incident angle of 50°, and Tt0° is the transmittance of light with a wavelength of 550 nm that is incident on the functional layer at an incident angle of 0°. A transmittance ratio of 60 or more or 80 or more indicates that the angle relative to the laminate has little effect on the transmittance, which means that the angle relative to the laminate has little effect on the anti-reflection performance of the laminate, and is therefore preferable. The transmittance ratio is more preferably 85 or more, even more preferably 90 or more, and particularly preferably 95 or more, with an upper limit of 100. The transmittance ratio can be adjusted to be equal to or greater than the lower limit by adjusting the type and / or amount of dye contained in the functional layer, the thickness of the functional layer, and / or the surface shape. The transmittance ratio can be measured by the method described in the Examples below.

[0086] The functional layer has an average luminous reflectance of more than 5% and a total light transmittance of less than 93%.

[0087] From the viewpoint of good thinness and good anti-reflection performance, the thickness of the functional layer is preferably 0.01 to 5 μm, more preferably 0.01 to 3 μm, and particularly preferably 0.01 to 2 μm.

[0088] As the active energy ray-curable material preferably used for forming the functional layer, the same material as the active energy ray-curable material contained in the composition for forming the low reflection layer can be used. The solvent preferably used for forming the functional layer may be the same as the solvent contained in the composition for forming a low-reflection layer. The amount of the solvent used in the composition for forming a functional layer may be appropriately selected depending on the coatability of the composition for forming a functional layer, and is preferably 30 to 100 parts by mass, more preferably 40 to 90 parts by mass, and particularly preferably 50 to 80 parts by mass, relative to 100 parts by mass of the active energy ray-curable material contained in the composition for forming a functional layer. The functional layer-forming composition preferably used for forming the functional layer may contain a polymerization initiator and / or various additives as needed. The polymerization initiator and various additives may be the same as those usable in the hard coat layer-forming composition. When a photopolymerization initiator is used as the polymerization initiator, the amount thereof is preferably 0.1 to 10 parts by mass, more preferably 1 to 7 parts by mass, per 100 parts by mass of the active energy ray-curable material.

[0089] When forming a functional layer using a composition for forming a functional layer, the coating process of the composition for forming a functional layer, the drying process of the resulting coating film, and the irradiation process of irradiating the coating film with active energy rays may be carried out in the same manner as the coating process, drying process, and irradiation process when forming a low-reflection layer using a composition for forming a low-reflection layer.

[0090] [Method of manufacturing laminate] The laminate can be produced by a known method. Examples of such methods include a method comprising producing a low-reflection film by the method exemplified in the previous paragraph, and applying, drying, and irradiating a composition for forming a functional layer onto the produced low-reflection film by the method exemplified in the previous paragraph; and a method comprising producing a low-reflection film by the method exemplified in the previous paragraph, applying, drying, and irradiating a composition for forming a functional layer onto a release film by the method exemplified in the previous paragraph, and bonding the obtained low-reflection film and functional layer via an adhesive layer.

[0091] In a preferred embodiment, the outermost layer of the laminate, particularly the layer located on the most visible side when the laminate is used in a display device, is an anti-fouling layer. In this embodiment, the anti-fouling layer is, for example, included as part of a low-reflection film or laminated adjacent to a functional layer, preferably included as part of a low-reflection film, and more preferably laminated adjacent to a low-reflection layer.

[0092] The adhesive layer that can be used to bond the low-reflection film and the functional layer can be the same as the adhesive layer that may be included in the low-reflection film. The thickness of the adhesive layer formed by the adhesive is not particularly limited, but is preferably 0.01 to 3 μm, more preferably 0.05 to 2 μm. The thickness of the adhesive layer formed by the pressure-sensitive adhesive is not particularly limited, but is preferably 5 to 100 μm, more preferably 5 to 25 μm.

[0093] In one embodiment in which the low-reflection film includes a low-reflection layer and a substrate, the laminate including the low-reflection film and the functional layer preferably includes the low-reflection layer, the substrate, and the functional layer in this order.

[0094] In one embodiment of the present invention, the low-reflection film includes a low-reflection layer, and in a laminate including the low-reflection film and the functional layer, no substrate is laminated between the low-reflection layer and the functional layer. In this embodiment, an adhesive layer and / or a hard coat layer may be optionally disposed between the low-reflection layer and the functional layer.

[0095] Examples of specific layer configurations of the laminate of the present invention include the following. The configurations below are listed starting from the layer that will be visible when incorporated into a QD-OLED: low-reflection layer / hard-coat layer / substrate / functional layer, low-reflection layer / hard-coat layer / substrate / adhesive layer / functional layer, anti-fouling layer / low-reflection layer / hard-coat layer / substrate / functional layer, anti-fouling layer / low-reflection layer / hard-coat layer / substrate / adhesive layer / functional layer, functional layer / substrate / hard-coat layer / low-reflection layer, anti-fouling layer / functional layer / substrate / hard-coat layer / low-reflection layer, low-reflection layer / functional layer, anti-fouling layer / low-reflection layer / functional layer, low-reflection layer / adhesive layer / functional layer, anti-fouling layer / low-reflection layer / functional layer, low-reflection layer / adhesive layer / functional layer, anti-fouling layer / low-reflection layer / adhesive layer / functional layer, low-reflection layer / substrate ....

[0096] In a preferred embodiment, the laminate from the low reflection film to the functional layer has an average luminous reflectance of 0.01% or more and 1% or less, and a total light transmittance of 75% or more. The average luminous reflectance is preferably 0.01 to 1%, more preferably 0.01 to 0.5%, and particularly preferably 0.01 to 0.4%. When the average luminous reflectance is within this range, higher anti-reflection performance can be achieved while ensuring acceptable cost and good thinness. The average luminous reflectance can be adjusted to within this range by adjusting the composition of the composition constituting the film or layer included in the laminate and / or the thickness of the film or layer. The total light transmittance is preferably 75% or more, more preferably 78% or more, and particularly preferably 80% or more and 100% or less. When the total light transmittance is equal to or greater than the lower limit, higher transparency can be achieved. The total light transmittance can be adjusted to equal to or greater than the lower limit by adjusting the composition of the composition constituting the layer contained in the low-reflection film and the functional layer and / or the thickness of the layer.

[0097] In this preferred embodiment, the laminate to be measured for average luminous reflectance and total light transmittance refers to the laminate incorporated into the QD-OLED. That is, for example, in Example 1, the laminate to be measured ranges from the low-reflection layer located on the viewing side to the functional layer located on the panel side when incorporated into a display device sample, but does not include a pressure-sensitive adhesive layer or the like for attaching the laminate to the panel.

[0098] The laminate includes the low-reflection film and functional layer as described above, and thus can suppress the reflective appearance caused by light reflection inside and outside the panel during black display and improve the brightness during white display in a display device using a quantum dot organic EL panel. Therefore, the present invention also covers the laminate for use in a quantum dot organic EL display device (QD-OLED).

[0099] [Display device] The laminate of the present invention can improve the reflective appearance while maintaining a suitable luminance even when used in a QD-OLED, and therefore can be suitably used as an anti-reflection layer in the QD-OLED. Therefore, the present invention also relates to a display device including the laminate and a quantum dot organic EL light-emitting panel. A display device such as a quantum dot organic EL display device generally includes a light-emitting panel, a phosphor layer disposed on the light-emitting surface side of the light-emitting panel and having a reflective film on its side, an anti-reflection layer disposed on the phosphor layer, and a sealing member containing the phosphor layer and the anti-reflection layer. Adhesives or pressure-sensitive adhesives may be used to bond the components together, and examples of such adhesives or pressure-sensitive adhesives include those that can be used for the adhesive layer described above. The light-emitting panel, phosphor layer, and sealing member included in the display device of the present invention may be any light-emitting panel, phosphor layer, and sealing member that are commonly used in this technical field.

[0100] Quantum dot organic EL light-emitting panels typically include a blue organic EL light-emitting layer on a TFT substrate and a quantum dot filter (also referred to as a QD filter or quantum dot light-emitting layer) containing red and green quantum dots. These panels feature a top-emission device structure. The QD filter contains quantum dots, semiconductor nanoparticles made from semiconductor materials such as zinc, cadmium, and sulfur. The use of multiple quantum dots of different sizes enables displays to emit (or emit) light of multiple wavelengths. However, when the quantum dots, which are nanoparticles, are exposed to light reflected from the electrodes, the reflected light can be scattered within the QD filter, resulting in a deterioration of the reflective appearance. By laminating the laminate of the present invention to the viewing side of such a QD-OLED panel, the scattered light generated by the QD filter can be effectively absorbed, improving the reflective appearance caused by light reflections inside and outside the panel during black display. Furthermore, the laminate of the present invention is less likely to cause a decrease in luminance during white display compared to circular polarizers used in conventional OLED panels, and therefore can achieve both suppression of the reflective appearance caused by light reflection inside and outside the panel during black display and improvement of luminance during white display without using a circular polarizer.

[0101] In a preferred embodiment, in the laminate included in a display device, the low-reflection film is located closer to the viewer than the functional layer. In this embodiment, the low-reflection layer is located on the outermost surface or close to the outermost surface, which further suppresses interfacial reflection at the outermost surface, and the functional layer is located on the light-emitting panel side, which efficiently removes reflected light from the light-emitting panel and scattered light caused by a light diffusing agent or the like contained in the QD filter. Specific examples of the laminate configuration include a laminate in which, from the viewing side, a low-reflection layer, a hard coat layer, a substrate, and a functional layer are laminated in this order, optionally with an adhesive layer interposed therebetween, or a laminate in which a low-reflection layer and a functional layer are laminated in this order, optionally with an adhesive layer interposed therebetween. The laminate may have an antifouling layer on the most visible side, that is, adjacent to the low reflection layer.

[0102] In one embodiment, the laminate included in the display device may have a functional layer, a substrate, a hard coat layer, and a low-reflection layer laminated in this order from the viewing side, optionally with an adhesive layer interposed therebetween. The laminate may also have an antifouling layer on the viewing side, i.e., adjacent to the functional layer.

[0103] [Display device manufacturing method] The display device of the present invention can be produced by a method commonly used in the art, except that the laminate of the present invention is used as the antireflection layer. [Example]

[0104] The present invention will be described in more detail below with reference to examples. Measurement methods for the physical properties of the low-reflection film, functional layer, and laminate will be described below, and the physical property values ​​described in this specification, including the examples, are based on values ​​determined by the following methods.

[0105] <Visual average reflectance> Measurement samples were prepared by bonding the side corresponding to the visible side and the opposite side of the low-reflection films and laminates in the examples and comparative examples (the substrate side for the low-reflection films of Examples 1 to 4 and Comparative Examples 1 and 3, the low-reflection layer side for the low-reflection film of Example 5, the low-reflection layer side for the low-reflection films of Examples 6 and 7 (the low-reflection layer side for the low-reflection films obtained by removing the one-side release-treated PET film from laminate 6A), the functional layer side for the laminates of Examples 1 to 4, 6 and 7, and Comparative Example 4, the low-reflection layer side for the laminate of Example 5, the substrate side for the laminate of Comparative Example 1, the polymerizable liquid crystal compound cured layer side for the laminate of Comparative Example 2, and the cyclic olefin resin film side for the laminate of Comparative Example 3) to a black acrylic plate (Sumipex, manufactured by Sumitomo Chemical Co., Ltd.) via a 25 μm-thick pressure-sensitive adhesive layer (manufactured by Lintec Corporation). Measurements were performed using a spectrophotometer (CM-3700A, manufactured by Konica Minolta, Inc.) in specular reflection excluded mode (SCE mode) with D65 light incident from a direction of 8° from the surface of the low-reflection film side or laminate side of the measurement sample. The luminosity-corrected reflectance Y value calculated from the reflection spectrum obtained by the measurement according to the method described in JIS Z 8722 was used as the luminous average reflectance of the measurement sample.

[0106] <Total light transmittance> The total light transmittance of the low-reflection films and laminates in the examples and comparative examples was measured using a haze meter (HZ-2, manufactured by Suga Test Instruments Co., Ltd.) In this case, the measurement was performed by irradiating light perpendicularly to the surface of the low-reflection film or laminate from the side corresponding to the viewing side of the low-reflection film or laminate.

[0107] <Transmittance ratio> Measurement samples were prepared by bonding the functional layer side of the laminate in each of the examples and comparative examples (except the polymerizable liquid crystal compound cured layer side in Comparative Example 2) to a 4 cm x 4 cm x 0.7 mm thick glass sheet via a 25 μm thick pressure-sensitive adhesive layer (manufactured by Lintec Corporation). The measurement sample was set in an ultraviolet-visible spectrophotometer (UV-2700i, manufactured by Shimadzu Corporation) so that light was irradiated onto the glass side of the measurement sample. The transmittance (Tt50°) of light with a wavelength of 550 nm incident on the functional layer (except for Comparative Example 2, which was a circular polarizer) at an incident angle of 50° and the transmittance (Tt0°) of light with a wavelength of 550 nm incident on the functional layer at an incident angle of 0° were measured, and the ratio (Tt50° / Tt0°) x 100 (transmittance ratio) was calculated. In the measurement sample, when the x-axis is an arbitrary direction within the plane of the functional layer, the y-axis is a direction perpendicular to the x-axis within the plane, and the z-axis is the thickness direction of the functional layer, Tt50° and Tt0° both represent the transmittance at the absorption maximum wavelength of 550 nm of the functional layer, where Tt0° represents the transmittance when light is incident perpendicular to the x-axis direction (i.e., at z=0), and Tt50° represents the transmittance when light is incident after rotating the functional layer 50° around the y-axis as the rotation axis (i.e., at Z=50). Furthermore, the transmittance measurements were carried out after confirming that the layers or films other than the functional layer, the pressure-sensitive adhesive layer, and the glass contained in the laminates in the examples and comparative examples did not have significant absorption in the range of 400 to 750 nm. Therefore, the Tt50° and Tt0° of the functional layer in the laminates can be measured by the above method.

[0108] In the examples and comparative examples, the following dyes were used. Dichroic dye B1 (cyan dye 1) It has a maximum absorption wavelength in the range of 600 to 650 nm. TIFF2025153997000002.tif1287·Dichroic dye B2 (cyan dye 2) It has a maximum absorption wavelength in the range of 600 to 650 nm. TIFF2025153997000003.tif1289 · Dichroic dye B3 (magenta dye) It has a maximum absorption wavelength in the range of 500 to 550 nm. TIFF2025153997000004.tif1489·Dichroic dye B4 (orange dye) It has a maximum absorption wavelength in the range of 440 to 490 nm. TIFF2025153997000005.tif1694 · Dichroic dye B5 (yellow dye) It has a maximum absorption wavelength in the range of 380 to 430 nm. TIFF2025153997000006.tif1088·Black dye 1 OIL BLACK860 manufactured by Orient Chemical Industries Co., Ltd. It has a maximum absorption wavelength in the range of 550 to 680 nm. ·Black dye 2 VARIFAST BLACK3830 manufactured by Orient Chemical Industries Co., Ltd. It has a maximum absorption wavelength in the range of 550 to 680 nm. Carbon black Aqua-Black (registered trademark) 001 manufactured by Tokai Carbon Co., Ltd. It has absorption in the range of 400 to 700 nm.

[0109] [Example 1] <Preparation of low-reflection film containing low-reflection layer (LR) and substrate (TAC)> As a substrate, a triacetyl cellulose film (KC4UY-TAC, manufactured by Konica Minolta, Inc.) having a thickness of 40 μm was prepared. Next, a composition for forming a hard coat layer was prepared by mixing 100 parts by weight of UV-7605B (manufactured by Nippon Synthetic Chemical Industry Co., Ltd.), 4 parts by weight of Irgacure 184 (manufactured by Ciba-Geigy Japan Ltd.), 50 parts by weight of methyl acetate, and 50 parts by weight of methyl ethyl ketone. The composition for forming a hard coat layer was applied onto a triacetyl cellulose film substrate, followed by drying and ultraviolet irradiation to form a hard coat layer having a thickness of 10 μm. Next, a composition for forming a low-reflection layer was prepared by mixing 2.4 parts by mass of low-refractive index silica particles (average particle diameter 30 nm), 1.6 parts by mass of dipentaerythritol hexaacrylate (active energy ray-curable material), 0.2 parts by mass of TSF44 (silicone-based material, manufactured by Momentive Performance Materials Japan LLC), 0.2 parts by mass of Irgacure 184 (photopolymerization initiator, manufactured by Ciba-Geigy Japan Ltd.), 72.2 parts by mass of isopropyl alcohol (solvent), and 13.8 parts by mass of methyl isobutyl ketone (solvent). A composition for forming a low-reflection layer was applied onto the hard coat layer using a die coater, and dried in an oven set at 80°C, with an integrated light dose of 384 mJ / cm 2 A low reflection layer having a thickness of 125 nm was formed by irradiating the film with ultraviolet light at 1000 kJ / cm. In this way, a low-reflection film (LR-TAC) was prepared, which had a hard coat layer and a low-reflection layer (LR) on one side of a triacetyl cellulose film (TAC). The low reflection film had an average luminous reflectance of 0.45% and a total light curing rate of 96.3%.

[0110] <Preparation of composition for forming functional layer and production of laminate> The following components were stirred at 25°C for 5 hours to obtain a binder composition. TIFF2025153997000007.tif39159 The following components were stirred at 90°C for 2 hours to obtain dye solution 1. TIFF2025153997000008.tif39154 The binder composition and the dye solution 1 were mixed and stirred at 25° C. for 30 minutes, thereby obtaining a composition 1 for forming a functional layer. The functional layer-forming composition 1 was applied to the TAC side of the LR-TAC using a bar coater, and then dried at 25° C. for 3 minutes. Next, a UV irradiation device (SPOT CURE SP-7, manufactured by Ushio Inc.) was used to apply the composition to the TAC side of the LR-TAC at an exposure dose of 500 mJ / cm . 2 Functional layer 1 was formed by irradiating ultraviolet light (365 nm standard) to obtain laminate 1 consisting of low-reflection layer / hard coat layer / substrate / functional layer 1. The thickness of functional layer 1 was measured using a laser microscope (OLS3000 manufactured by Olympus Corporation) and was found to be 2.0 μm. The measurement results for functional layer 1 and laminate 1 are shown in Table 1.

[0111] <Evaluation of reflective appearance, luminance, and oblique hue> The LR-TAC and adhesive layer on the outermost surface of a 4K OLED television (A95K, manufactured by Sony Corporation) were removed to obtain a panel (hereinafter abbreviated as "QD-OLED panel"), and the functional layer side of the laminate 1 measuring 10 cm × 10 cm was attached to the panel via a 25 μm thick pressure-sensitive adhesive layer (manufactured by Lintec Corporation). This resulted in a display device sample for evaluating reflective appearance and luminance, consisting of, from the viewing side, low-reflection layer / hard coat layer / substrate / functional layer 1 / pressure-sensitive adhesive layer / QD-OLED panel. (i) Reflective appearance Under fluorescent lighting, a penlight was placed 5 cm away from the low-reflection layer of the sample, and the reflective appearance was visually checked with the television off. The evaluation criteria for reflective appearance were as follows: (Evaluation criteria for reflective appearance) AA: Best, no blur A: Good, no blur B: Normal, generally no blurring C: Poor, blurry (ii) Luminous brightness Next, the luminance of the light emitted was visually checked under fluorescent lighting with the television on. The evaluation criteria for the luminance of the light emitted were as follows: (Evaluation criteria for luminous brightness) A: Good, bright B: Slightly bad, slightly dark C: Bad, dark (iii) Oblique hue The hue of the above sample was checked visually from an oblique direction under fluorescent lighting with the television on, and evaluated according to the following evaluation criteria. (Evaluation criteria for oblique hue) A: It looked like a gray color with no hue but only brightness. B: Coloring other than gray was confirmed. The evaluation results of the reflective appearance, luminance, and oblique hue of the above samples are shown in Table 1.

[0112] [Example 2] The following components were stirred at 60°C for 2 hours to obtain dye solution 2. TIFF2025153997000009.tif17154 Functional layer-forming composition 2 was prepared in the same manner as in Example 1, except that dye solution 2 was used instead of dye solution 1. Functional layer 2 was formed, and laminate 2 consisting of low-reflection layer / hard coat layer / substrate / functional layer 2 was obtained. A sample for evaluating reflective appearance and luminance was prepared, consisting of low-reflection layer / hard coat layer / substrate / functional layer 2 / pressure-sensitive adhesive layer / QD-OLED panel from the viewing side. The thickness of functional layer 2 was measured using a laser microscope (OLS3000, manufactured by Olympus Corporation) and found to be 2.0 μm. Table 1 shows the measurement results of the functional layer 2 and the laminate 2, as well as the evaluation results of the reflective appearance and luminous brightness of the above samples.

[0113] [Example 3] The following components were stirred at 60° C. for 2 hours to obtain dye solution 3. TIFF2025153997000010.tif17154 Functional layer-forming composition 3 was prepared in the same manner as in Example 1, except that dye solution 3 was used instead of dye solution 1. Functional layer 3 was formed, and laminate 3 consisting of low-reflection layer / hard coat layer / substrate / functional layer 3 was obtained. A sample for evaluating reflective appearance and luminance was prepared, consisting of low-reflection layer / hard coat layer / substrate / functional layer 3 / pressure-sensitive adhesive layer / QD-OLED panel from the visible side. The thickness of functional layer 3 was measured using a laser microscope (OLS3000, manufactured by Olympus Corporation) and found to be 2.0 μm. Table 1 shows the measurement results of the functional layer 3 and the laminate 3, as well as the evaluation results of the reflective appearance and luminous brightness of the above samples.

[0114] [Example 4] The following components were stirred at 60° C. for 2 hours to obtain dye solution 4. TIFF2025153997000011.tif28154 A functional layer-forming composition 4 was prepared in the same manner as in Example 1, except that dye solution 4 was used instead of dye solution 1. A functional layer 4 was formed, resulting in a laminate 4 consisting of a low-reflection layer / hard coat layer / substrate / functional layer 4. A sample for evaluating the reflective appearance and luminance was prepared, consisting of, from the viewing side, a low-reflection layer / hard coat layer / substrate / functional layer 4 / pressure-sensitive adhesive layer / QD-OLED panel. The thickness of functional layer 4 was measured using a laser microscope (OLS3000 manufactured by Olympus Corporation) and found to be 2.0 μm. Table 1 shows the measurement results of the functional layer 4 and the laminate 4, as well as the evaluation results of the reflective appearance and luminous brightness of the above samples.

[0115] [Example 5] A laminate 1 (hereinafter referred to as "laminate 5") consisting of a low-reflection layer / hard coat layer / substrate / functional layer 1 was obtained in the same manner as in Example 1. The thickness of functional layer 5 was measured using a laser microscope (OLS3000 manufactured by Olympus Corporation) and was found to be 2.0 μm. Next, a sample for evaluating the reflective appearance and luminance was obtained in the same manner as in Example 1, except that the visible side was treated as the functional layer 1 side rather than the low-reflection layer side (i.e., by bonding the low-reflection layer side of the laminate 5 and the QD-OLED panel via a 25 μm-thick pressure-sensitive adhesive layer (manufactured by Lintec Corporation)). The sample consisted of functional layer 1 / substrate / hard coat layer / low-reflection layer / pressure-sensitive adhesive layer / QD-OLED panel from the visible side. Table 1 shows the measurement results of Functional Layer 1 and Laminate 5, as well as the evaluation results of the reflective appearance and luminous brightness of the above samples.

[0116] [Comparative Example 1] A low-reflection film having a hard coat layer and a low-reflection layer on one surface of a substrate (TAC) was produced in the same manner as in Example 1. Next, a sample for evaluating the reflective appearance and luminance was obtained, consisting of the low-reflection layer / hard coat layer / substrate / pressure-sensitive adhesive layer / QD-OLED panel from the viewing side, in the same manner as in Example 1, except that the low-reflection film was used instead of Laminate 1. Table 1 shows the measurement results of the low reflection film, as well as the evaluation results of the reflective appearance and luminous brightness of the above samples.

[0117] Comparative Example 2 With reference to Example 1 of JP 2020-095255 A, a circularly polarizing plate having a polarizer in which iodine was adsorbed and oriented in a polyvinyl alcohol resin film was obtained. Next, the polymerizable liquid crystal compound cured layer side of the circular polarizer and the QD-OLED panel were bonded together via a 25 μm thick pressure-sensitive adhesive layer (manufactured by Lintec Corporation) to obtain a sample consisting of a circular polarizer / pressure-sensitive adhesive layer / QD-OLED panel for evaluating the reflective appearance and luminance. The evaluation results of the reflective appearance and luminous brightness of the above samples are shown in Table 1.

[0118] Comparative Example 3 The following components were stirred at room temperature for 5 hours to obtain composition 5 for forming a functional layer. TIFF2025153997000012.tif28153 In the same manner as in Example 1, a hard coat layer and a low-reflection layer were formed on the substrate to obtain a low-reflection film consisting of a low-reflection layer / hard coat layer / substrate. Next, a cyclic olefin resin (COP) film was subjected to plasma treatment, and the prepared functional layer-forming resin compound 5 was applied to the plasma-treated surface using a bar coater, followed by drying at 70 ° C for 3 minutes to obtain a laminate 8A consisting of a cyclic olefin resin (COP) film / functional layer 5. Next, the substrate side of the low-reflection film and the functional layer 5 side of the laminate 8A were bonded via a 25 μm-thick pressure-sensitive adhesive layer (manufactured by Lintec Corporation) to obtain a laminate 8B consisting of a low-reflection layer / hard coat layer / substrate / pressure-sensitive adhesive layer / functional layer 5 / COP film. Next, the COP film side of the laminate 8B was bonded to the QD-OLED panel via a 25 μm thick pressure-sensitive adhesive layer (manufactured by Lintec Corporation) to obtain a sample for evaluating the reflective appearance and luminance, which consisted of low-reflection layer / hard coat layer / substrate / pressure-sensitive adhesive layer / functional layer 5 / COP film / pressure-sensitive adhesive layer / QD-OLED panel. Table 1 shows the measurement results of the functional layer 5 and the laminate 8B, as well as the evaluation results of the reflective appearance and luminous brightness of the above samples.

[0119] Comparative Example 4 Laminate 9 was obtained in the same manner as in Example 4, except that TAC was used instead of LR-TAC. Next, the functional layer side of laminate 9 was bonded to a QD-OLED panel via a 25 μm-thick pressure-sensitive adhesive layer (manufactured by Lintec Corporation) to obtain a sample for evaluating reflective appearance and luminance, consisting of substrate / functional layer 4 / pressure-sensitive adhesive layer / QD-OLED panel. Table 1 shows the measurement results of the functional layer 4 and the laminate 9, as well as the evaluation results of the reflective appearance and luminous brightness of the above samples.

[0120] [Table 1] [Industrial Applicability]

[0121] The laminate of the present invention can suppress the reflective appearance caused by light reflection inside and outside the panel during black display and improve the brightness during white display in a QD-OLED. Therefore, it can be suitably used as a laminate included in a QD-OLED and located on the viewing side of the QD filter.

Claims

1. A laminate including a low-reflection film and a functional layer, The low-reflection film has an average luminous reflectance of 0.05% or more and 5% or less, and a total light transmittance of 93% or more, The functional layer contains at least one dye and is represented by the following formula (I): (Tt50° / Tt0°)×100≧60 Formula (I) [wherein Tt50° is the transmittance of light having a wavelength of 550 nm that is incident on the functional layer at an incident angle of 50°, and Tt0° is the transmittance of light having a wavelength of 550 nm that is incident on the functional layer at an incident angle of 0°] fulfill, Laminate.

2. The laminate of claim 1 , wherein the low-reflection film comprises a low-reflection layer and a substrate.

3. The laminate according to claim 2 , comprising a low-reflection layer, a substrate, and a functional layer in this order.

4. The laminate according to claim 1 , wherein the low-reflection film includes a low-reflection layer, and no substrate is laminated between the low-reflection layer and the functional layer.

5. The laminate according to claim 1 , wherein the dye is at least one selected from the group consisting of a black dye and a dichroic dye.

6. The functional layer has the following formula (II): (Tt50° / Tt0°)×100≧80 Formula (II) The laminate according to claim 1 , wherein

7. 2. The laminate according to claim 1, wherein the laminate from the low-reflection film to the functional layer has an average luminous reflectance of 0.01% or more and 1% or less, and a total light transmittance of 75% or more.

8. The laminate according to claim 1 for use in a quantum dot organic EL display device.

9. A display device comprising the laminate according to claim 1 and a quantum dot organic EL light-emitting panel.

10. The display device according to claim 9 , wherein the low-reflection film is located on the viewing side of the functional layer.

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