Display device
The display device improves display quality by using a two-layer color filter structure to enhance color reproducibility and prevent manufacturing defects, achieving a wider color reproduction range and reliable coverage.
Patent Information
- Application Number
- JP2024084220
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2024-05-23
- Publication Date
- 2025-12-05
AI Technical Summary
Existing display devices face challenges in improving display quality, particularly in achieving a wider color reproduction range and preventing manufacturing defects related to color filter thickness and exposure processes.
The display device incorporates a color filter structure with a first layer and a second layer of the same color, which are designed to suppress undercut formation during manufacturing and allow for increased thickness, ensuring reliable coverage by an insulating layer and preventing pixel electrode disconnection.
This configuration enhances color reproducibility and display quality by expanding the color discrimination region and preventing lighting defects, while maintaining manufacturing integrity.
Smart Images

Figure 2025177410000001_ABST
Abstract
Description
[Technical Field]
[0001] FIELD An embodiment of the present invention relates to a display device. [Background technology]
[0002] As an example of a display device capable of color display, a COA (Color Filter On Array) liquid crystal display device has been proposed, in which an array substrate is provided with switching elements, pixel electrodes, and color filters. In response to demands for a wider color reproduction range, the color of the color filter may be made darker or the color filter thickness may be increased. [Prior art documents] [Patent documents]
[0003] [Patent Document 1] Patent No. 4335158 [Patent Document 2] Japanese Patent Publication No. 2022-180090 Summary of the Invention [Problem to be solved by the invention]
[0004] An object of the present invention is to provide a display device that can improve display quality. [Means for solving the problem]
[0005] According to one embodiment, a display device includes a substrate, a semiconductor disposed above the substrate, a pixel electrode electrically connected to the semiconductor, and a first color filter disposed between the semiconductor and the pixel electrode, the first color filter having a first layer and a second layer disposed on the first layer and having the same color as the first layer. [Brief explanation of the drawings]
[0006] [Figure 1]FIG. 1 is a schematic exploded perspective view of a display device according to an embodiment. [Figure 2] FIG. 2 is a schematic plan view of the display panel shown in FIG. [Figure 3] FIG. 3 is a schematic plan view showing an example of the structure of a sub-pixel. [Figure 4] FIG. 4 is a diagram illustrating the arrangement of color filters provided on the first substrate. [Figure 5] FIG. 5 is a schematic cross-sectional view of the display panel taken along line VV shown in FIG. [Figure 6] FIG. 6 is a partially enlarged view showing a part of the color filter and insulating layer shown in FIG. [Figure 7] FIG. 7 is a schematic cross-sectional view showing a color filter according to a comparative example. [Figure 8] FIG. 8 is a schematic plan view showing another example of the configuration of the color filter. DETAILED DESCRIPTION OF THE INVENTION
[0007] Hereinafter, embodiments will be described with reference to the drawings. The disclosure is merely an example, and appropriate modifications that a person skilled in the art can easily conceive while maintaining the gist of the invention are naturally included within the scope of the present invention. Furthermore, the drawings may be schematic in terms of the width, thickness, shape, etc. of each part compared to the actual embodiment for clarity of explanation, but these are merely examples and are not intended to limit the interpretation of the present invention. Furthermore, in this specification and each drawing, components that perform the same or similar functions as those described above with reference to the previous drawings are designated by the same reference numerals, and redundant detailed descriptions may be omitted as appropriate.
[0008] In the drawings, mutually perpendicular X, Y, and Z axes are shown as necessary to facilitate understanding. The direction along the X axis is referred to as the first direction X, the direction along the Y axis is referred to as the second direction Y, and the direction along the Z axis is referred to as the third direction Z. Viewing various elements parallel to the third direction Z is referred to as a planar view.
[0009] In this embodiment, a liquid crystal display device is disclosed as an example of a display device. However, the technical idea disclosed in this embodiment can be applied to other display devices, such as display devices equipped with other types of display elements, such as organic electroluminescence display elements, micro LEDs, or mini LEDs. In addition, the technical idea disclosed in this embodiment can be applied to array substrates and electronic devices having sensor elements, such as capacitive sensors and optical sensors.
[0010] The display device according to this embodiment can be used in various devices such as in-vehicle devices, smartphones, tablet terminals, mobile phone terminals, personal computers, television receivers, game devices, and head-mounted displays.
[0011] 1 is a schematic exploded perspective view of a display device 1 according to this embodiment. The display device 1 includes a display panel 2 and an illumination device 3. The display panel 2 includes a first substrate SUB1, a second substrate SUB2 facing the first substrate SUB1, and a liquid crystal layer LC.
[0012] 1, the lighting device 3 is a side edge type. Specifically, the lighting device 3 includes a light guide LG facing the display panel 2 and a plurality of light emitting elements LS facing the side surface of the light guide LG. However, the lighting device 3 is not limited to the example shown in FIG. 1, and may have other configurations such as a direct type.
[0013] 1, the display panel 2 and the light guide LG both have a rectangular shape that is elongated in the second direction Y. However, the shapes of the display panel 2 and the light guide LG are not limited to a rectangular shape and may be other shapes.
[0014] The display device 1 further includes an optical sheet group 4, a first polarizing plate 5, and a second polarizing plate 6. The optical sheet group 4 is disposed between the light guide LG and the display panel 2. The optical sheet group 4 includes, for example, a diffusion sheet DF, a first prism sheet PR1, and a second prism sheet PR2. The diffusion sheet DF diffuses the light emitted from the light guide LG. A large number of prisms are formed on the first prism sheet PR1 and the second prism sheet PR2.
[0015] The first polarizing plate 5 is disposed between the optical sheet group 4 and the first substrate SUB1. The second polarizing plate 6 is disposed above the second substrate SUB2. The polarization axes of the first polarizing plate 5 and the second polarizing plate 6 are, for example, in a crossed Nicol relationship, in which they are orthogonal to each other.
[0016] Fig. 2 is a schematic plan view of the display panel 2 shown in Fig. 1. The display panel 2 has a display area DA that displays an image and a frame-shaped peripheral area SA that surrounds the display area DA. In the example shown in Fig. 2, the first substrate SUB1 has a mounting area MA that is formed in a portion that protrudes further in the second direction Y than the second substrate SUB2. The mounting area MA is part of the peripheral area SA.
[0017] The display area DA has a plurality of pixels PX arranged in a matrix in the first direction X and the second direction Y. Each pixel PX includes a plurality of subpixels. In this embodiment, as an example, each pixel PX includes a red subpixel SPR, a green subpixel SPG, and a blue subpixel SPB. However, each pixel PX may also include subpixels of other colors, such as white.
[0018] The display panel 2 includes a plurality of scanning lines G, a plurality of signal lines S, scanning drivers GD1 and GD2, and a selector circuit ST. The plurality of scanning lines G extend in a first direction X and are aligned in a second direction Y. The plurality of signal lines S extend in the second direction Y and are aligned in the first direction X.
[0019] Each scanning line G is connected to at least one of a scanning driver GD1 and a scanning driver GD2. Each signal line S is connected to a selector circuit ST. The first substrate SUB1 has a terminal portion T provided in the mounting area MA.
[0020] The display panel 2 further includes a flexible printed circuit board F and a controller CT. The flexible printed circuit board F is connected to the terminal portion T. In the example shown in FIG. 2, the controller CT is mounted in the mounting area MA. The controller CT can be configured by an IC chip or various circuit elements. The controller CT may also be mounted on the flexible printed circuit board F.
[0021] The controller CT controls the scan drivers GD1 and GD2 and also controls the selector circuit ST. The scan drivers GD1 and GD2 sequentially supply scan signals to the scan lines G. The selector circuit ST sequentially supplies video signals to the signal lines S.
[0022] Each of the sub-pixels SPR, SPG, and SPB includes a pixel electrode PE, a switching element SW (thin-film transistor), and a common electrode CE to which a common voltage is applied. The switching element SW is electrically connected to the pixel electrode PE, the scanning line G, and the signal line S. The common electrode CE is formed across multiple sub-pixels. When a potential difference is generated between the pixel electrode PE and the common electrode CE, an electric field corresponding to this potential difference is generated in the liquid crystal layer LC.
[0023] In this embodiment, the scanning lines G, signal lines S, scanning drivers GD1 and GD2, selector circuits ST, switching elements SW, pixel electrodes PE, and common electrode CE are all formed on the first substrate SUB1.
[0024] 3 is a schematic plan view showing an example of the structure of the subpixels SPR, SPB, and SPG. In the example shown in Fig. 3, the scanning lines G extend linearly in the first direction X, and the signal lines S extend linearly in the second direction Y.
[0025] The width of the scanning lines G in the second direction Y is greater than the width of the signal lines S in the first direction X. Note that the scanning lines G and the signal lines S do not necessarily have to be straight and may include curved portions.
[0026] The multiple scanning lines G and the multiple signal lines S intersect with each other. The area surrounded by two adjacent scanning lines G and two adjacent signal lines S corresponds to the apertures AP of the sub-pixels SPR, SPG, and SPB. Each of the sub-pixels SPR, SPG, and SPB has an aperture AP.
[0027] The contact hole CH1 overlaps the signal line S. The contact hole CH2 (first contact hole) overlaps the opening AP. The contact hole CH3 (second contact hole) overlaps the scanning line G.
[0028] Each of the subpixels SPR, SPG, and SPB further includes a connection electrode CN and a semiconductor SC. Here, we will focus on the subpixel SPG and mainly explain the connection electrode CN, semiconductor SC, and pixel electrode PE, but the other subpixels SPR and SPB are configured in a similar manner.
[0029] The connection electrodes CN have, for example, a shape that is elongated in the second direction Y. The connection electrodes CN are arranged between adjacent signal lines S in the first direction X. The connection electrodes CN overlap the scanning lines G in the second direction Y and extend toward the aperture AP. As shown in FIG. 3, the connection electrodes CN overlap a part of the aperture AP.
[0030] The semiconductor SC has, for example, a substantially L-shape. The semiconductor SC intersects with the signal line S in the first direction X. The semiconductor SC intersects with the scanning line G in the second direction Y and extends toward the opening AP.
[0031] The semiconductor SC is electrically connected to the signal line S through a contact hole CH1. The semiconductor SC is electrically connected to the connection electrode CN through a contact hole CH2.
[0032] The pixel electrode PE has, for example, a shape that is elongated in the second direction Y. The pixel electrode PE is disposed between adjacent signal lines S in the first direction X. The pixel electrode PE overlaps the scanning line G in the second direction Y and extends toward the aperture AP. As shown in FIG. 3, the pixel electrode PE overlaps the aperture AP. The pixel electrode PE is electrically connected to the connection electrode CN through a contact hole CH3.
[0033] The common electrode CE is disposed across the subpixels SPR, SPG, and SPB. The common electrode CE has a slit (not shown) in each of the subpixels SPR, SPG, and SPB. A common voltage is applied to the common electrode CE.
[0034] When a scanning signal is supplied to the scanning line G, the switching element SW is turned on, and the video signal supplied to the signal line S is applied to the pixel electrode PE via the connection electrode CN. At this time, an electric field is generated between the pixel electrode PE and the common electrode CE in the vicinity of the slit.
[0035] Fig. 4 is a diagram illustrating the arrangement of color filters CFR, CFG, and CFB provided on the first substrate SUB1. In the example shown in Fig. 4, the subpixels SPR, SPG, and SPB are arranged in this order in the first direction X, and the subpixels SPR, SPB, and SPG are arranged in this order in the second direction Y. Note that the arrangement of the subpixels SPR, SPG, and SPB is not limited to the example shown in the figure.
[0036] The first substrate SUB1 further includes color filters CFR, CFG, and CFB. The color filter CFG corresponds to an example of a first color filter, the color filter CFR corresponds to an example of a second color filter, and the color filter CFB corresponds to an example of a third color filter.
[0037] These color filters CFR, CFG, and CFB have different colors, for example, color filter CFG has green color, color filter CFR has red color, and color filter CFB has blue color.
[0038] When illumination light from the illumination device 3 (shown in FIG. 1) passes through color filter CFR, red display light is generated. When illumination light passes through color filter CFG, green display light is generated. When illumination light passes through color filter CFB, blue display light is generated.
[0039] In each of the subpixels SPR, the color filter CFR overlaps the aperture AP, in each of the subpixels SPG, the color filter CFG overlaps the aperture AP, and in each of the subpixels SPB, the color filter CFB overlaps the aperture AP.
[0040] The color filters CFR, CFG, and CFB are arranged in the shape of islands, for example, at the apertures AP. The color filters CFR, CFG, and CFB are spaced apart from one another in the regions overlapping the scanning lines G and the signal lines S. The contact hole CH3 does not overlap the color filters CFR, CFG, and CFB.
[0041] Fig. 5 is a schematic cross-sectional view of the display panel 2 taken along line VV shown in Fig. 3. Fig. 5 mainly shows a cross section including the subpixel SPG. The structure of the display panel 2 shown in Fig. 5 is one example, and is not limited to this example.
[0042] As described above, the first substrate SUB1 includes a plurality of scanning lines G, a plurality of signal lines S (shown in FIG. 3), a semiconductor SC, pixel electrodes PE, connection electrodes CN, and color filters CFG. The first substrate SUB1 also includes a substrate 10, insulating layers 11 to 15, a filling layer 16, and an alignment film AL1.
[0043] The substrate 10 is a transparent insulating substrate such as a glass substrate or a resin substrate. The insulating layer 11 is disposed on the substrate 10. The scanning lines G are disposed on the insulating layer 11. The openings AP are formed between adjacent scanning lines G.
[0044] The insulating layer 12 is disposed on the plurality of scanning lines G and the insulating layer 11. The semiconductor SC of the switching element SW is disposed on the insulating layer 12. In other words, the semiconductor SC is disposed above the substrate 10.
[0045] The insulating layer 13 (inorganic insulating layer) is disposed on the semiconductor SC and the insulating layer 12. The insulating layer 13 has a contact hole CH2. The contact hole CH2 penetrates the insulating layer 13. The contact hole CH2 overlaps the semiconductor SC.
[0046] The connection electrodes CN are disposed on the insulating layer 13. The connection electrodes CN are located on a different layer from the scanning lines G. The connection electrodes CN are disposed between the insulating layer 13 and the color filters CFG. The connection electrodes CN are in contact with the semiconductor SC via contact holes CH2.
[0047] The color filter CFG is disposed on the connection electrode CN and the insulating layer 13. From another perspective, the insulating layer 13 is disposed between the semiconductor SC and the color filter CFG. The color filter CFG overlaps the opening AP. The contact hole CH2 overlaps the color filter CFG.
[0048] The color filter CFG has a first layer CF1 and a second layer CF2. The first layer CF1 is disposed on the connection electrode CN and the insulating layer 13. A portion of the first layer CF1 fills the contact hole CH2. In other words, the first layer contacts the connection electrode CN at the contact hole CH2.
[0049] The first layer CF1 has a green color. The first layer CF1 has an upper surface U1. As shown in FIG. 4, the upper surface U1 is larger than the aperture AP in plan view. In other words, as shown in FIG. 4, the peripheral edge E1 of the first layer CF1 overlaps with the two scanning lines and the two signal lines.
[0050] The second layer CF2 has the same color (green) as the first layer CF1. The second layer CF2 is disposed on the upper surface U1 of the first layer CF1. The second layer CF2 overlaps, for example, the contact hole CH2.
[0051] The second layer CF2 has an upper surface U2. In the example shown in Fig. 5, the width W2 of the second layer CF2 in the second direction Y is smaller than the width W1 of the first layer CF1 in the second direction Y (W1>W2). Also, as shown in Fig. 4, the width of the second layer CF2 in the first direction X is smaller than the width of the first layer CF1 in the first direction X.
[0052] 5, the width W1 is larger than the width WY of the aperture AP in the second direction Y. The width WY of the aperture AP in the second direction Y corresponds to the interval between adjacent scanning lines G. The width of the first layer CF1 in the first direction X is larger than the width WX (shown in FIG. 4) of the aperture AP in the first direction X. The width WX of the aperture AP in the first direction X corresponds to the interval between adjacent signal lines S.
[0053] Furthermore, the upper surface U2 may be larger than the opening AP in a plan view. Specifically, in the example shown in Fig. 5, the width W2 may be larger than the width WY of the opening AP in the second direction Y. Furthermore, the width of the second layer CF2 in the first direction X may be larger than the width WX of the opening AP in the first direction X.
[0054] In the color filter CFG, it is sufficient that the first layer CF1 is larger than the aperture AP, and the second layer CF2 may be smaller than the aperture AP.
[0055] Focusing on the thickness, the thickness T1 of the first layer CF1 is, for example, smaller than the thickness T2 of the second layer CF2 (T1 < T2). Here, the thickness corresponds to the distance along the third direction Z. The thickness T1 corresponds to the distance from the upper surface of the insulating layer 13 to the upper surface U1 of the first layer CF1.
[0056] The insulating layer 14 (organic insulating layer) is disposed on the color filter CFG and the connection electrode CN. In other words, the insulating layer 14 covers the first layer CF1 and the second layer CF2.
[0057] Here, the thickness of the color filter CFG is defined as the thickness TC, and the sum of the thickness TC of the color filter CFG and the thickness of the insulating layer 14 is defined as the thickness T14. The thickness TC corresponds to the sum of the thickness T1 of the first layer CF1 and the thickness of the second layer CF2, and the thickness T14 corresponds to the distance from the upper surface of the insulating layer 13 to the upper surface of the insulating layer 14.
[0058] The thickness T1 of the first layer CF1 is, for example, 2 μm or less. The thickness TC of the color filter CFG is, for example, 2 - 5 μm. The thickness T14 of the color filter CFG and the insulating layer 14 is, for example, 5 μm or more.
[0059] A contact hole CH3 is formed in the insulating layer 14. In other words, the contact hole CH3 penetrates the insulating layer 14. The contact hole CH3 overlaps the scanning line G but does not overlap the color filter CFG. The width of the contact hole CH3 is, for example, about 2 μm. [[ID= (17]]
[0060] Focusing on the contact holes CH(2), CH3, in the example shown in FIG. 5, the peripheral portions E1, E2 of the first layer CF1 and the second layer CF2 are located between the contact hole CH2 and the contact hole CH3 in the second direction Y. < (21]]
[0061] In the color filter CFG, it is sufficient that the peripheral portion E1 of the first layer CF1 is located between the contact holes CH2 and CH3, and the peripheral portion E2 of the second layer CF2 does not have to be located between the contact holes CH2 and CH3.
[0062] The pixel electrode PE is disposed on the insulating layer 14. The pixel electrode PE is in contact with the connection electrode CN through the contact hole CH3. That is, the pixel electrode PE is electrically connected to the semiconductor SC through the connection electrode CN. The insulating layer 15 is disposed on the insulating layer 14 and the pixel electrode PE. The insulating layer 15 has the function of flattening unevenness caused by the color filter CFG and the like.
[0063] 5, the recess formed by the contact hole CH3 is filled with a filling layer 16. The filling layer 16 is made of, for example, an organic insulating material. The alignment film AL1 is disposed on the insulating layer 15 and the filling layer 16.
[0064] The common electrode CE (shown in FIG. 3) is disposed on the insulating layer 15. In each of the subpixels SPR, SPG, and SPB, the pixel electrode PE and the common electrode CE face each other with the insulating layer 15 interposed therebetween.
[0065] The insulating layers 11 to 13 and 15 are inorganic insulating layers, and the insulating layer 14 is an organic insulating layer. For example, the insulating layers 11 to 13 and 15 are made of an inorganic insulating material such as silicon nitride or silicon oxide. The insulating layer 14 is made of an organic insulating material such as acrylic resin. The insulating layer 14 is made of a positive photosensitive resin.
[0066] The alignment film AL1 is made of, for example, polyimide, and is a horizontal alignment film having an alignment control force along the XY plane. The color filter CFG is made of, for example, a negative photosensitive resin.
[0067] The signal lines S (shown in FIG. 2) and the scanning lines G are formed of a metal material such as titanium, aluminum, molybdenum, tungsten, etc. The signal lines S and the scanning lines G may be formed as a single layer, or may be formed as a laminate in which different types of metal layers are stacked.
[0068] The pixel electrode PE, the connection electrode CN, and the common electrode CE (shown in FIG. 3) are made of a transparent conductive material such as indium tin oxide (ITO). The semiconductor SC is a transparent oxide semiconductor containing, for example, indium, gallium, etc.
[0069] The second substrate SUB2 faces the first substrate SUB1 in the third direction Z. The second substrate SUB2 includes a substrate 20 and an alignment film AL2. The substrate 20 is, for example, a transparent insulating substrate such as a glass substrate or a resin substrate.
[0070] The alignment film AL2 is made of, for example, polyimide, and is a horizontal alignment film having an alignment restriction force along the XY plane. The second substrate SUB2 may further include a light-shielding layer such as a so-called black matrix.
[0071] The liquid crystal layer LC is disposed between the first substrate SUB1 and the second substrate SUB2. The display panel 2 may further include spacers PS. The spacers PS are disposed between the first substrate SUB1 and the second substrate SUB2.
[0072] The spacers PS are arranged to regulate the distance between the first substrate SUB1 and the second substrate SUB2. The spacers PS are arranged above the scanning lines G and the contact holes CH3 in the third direction Z, for example. The width of the spacers PS is, for example, about 1 μm.
[0073] Here, a description will be given of the relationship between the color filter CFG and the insulating layer 14. Fig. 6 is a partially enlarged view showing a part of the color filter CFG and the insulating layer 14 shown in Fig. 5. Fig. 6 shows the vicinity of the contact hole CH3.
[0074] The first layer CF1 has a side surface S1. The side surface S1 is, for example, a surface that is substantially parallel to the XZ plane defined by the first direction X and the third direction Z. Here, substantially parallel includes a case where the side surface S1 is slightly tilted with respect to the XZ plane.
[0075] The second layer CF2 has a side surface S2. The side surface S2 is, for example, a surface substantially parallel to the XZ plane. The side surface S1 is closer to the contact hole CH3 than the side surface S2 in the second direction Y. The side surfaces S1 and S2 are included in the peripheral portions E1 and E2.
[0076] The angle EG1 formed by the upper surface U1 and side surface S1 of the first layer CF1 is approximately 90 degrees as shown in Fig. 6. The angle EG2 formed by the upper surface U2 and side surface S2 of the second layer CF2 is approximately 90 degrees as shown in Fig. 6.
[0077] The side surfaces S1, S2 and the corners EG1, EG2 are covered with the insulating layer 14. The corners EG1, EG2 are not exposed to the contact hole CH3, in other words, the corners EG1, EG2 are not in contact with the pixel electrode PE.
[0078] The insulating layer 14 has a surface S14. In this embodiment, the surface S14 corresponds to the inner surface of the contact hole CH3. The contact hole CH3 is defined by the surface S14. The surface S14 is an inclined surface. In FIG. 6, the inclination of the surface S14 is constant, but this is not limited to this example.
[0079] Here, a plane (reference plane) parallel to the main surface of the substrate 10 is defined as plane 100. Plane 100 is, for example, a plane parallel to the XY plane. In Fig. 6, plane 100 is indicated by a dashed line. The angle between plane 100 and plane S14 is defined as angle θ1, and the angle between plane 100 and side surface S1 is defined as angle θ2.
[0080] In one example, angle θ1 is the angle at the center of surface S14 in the third direction Z, and angle θ2 is the angle at the center of side surface S1 in the third direction Z, but this example is not limited to this. As shown in FIG. 6, angles θ1 and θ2 are angles counterclockwise from the reference plane when viewed in the first direction X. In the example shown in FIG. 6, angle θ1 is smaller than angle θ2 (θ1<θ2). Specifically, angle θ1 is 72 degrees or less, and angle θ2 is 90 degrees or less. In one example, angle θ1 is approximately 72 degrees, and angle θ2 is approximately 90 degrees.
[0081] Here, we have explained the color filter CFG, but the red color filter CFR of the subpixel SPR and the blue color filter CFB of the subpixel SPB are also composed of two layers (a first layer CF1 and a second layer CF2) like the color filter CFG, as shown in Figure 5.
[0082] 7 is a schematic cross-sectional view showing a color filter CFG10 according to a comparative example. The color filter CFG10 is formed, for example, by applying a filter material, exposing the filter material to light (e.g., ultraviolet light) through a mask having openings of a predetermined shape, and then developing and baking the filter material.
[0083] As described above, color filter CFG10 is formed from a negative photosensitive resin, so the areas exposed to light remain and the areas shielded by the mask are removed. If the thickness of color filter CFG10 is increased, there is a risk that insufficient exposure will occur in a position far from the light source (the bottom of color filter CFG10) in the exposure process described above.
[0084] In particular, the green color filter CFG10 has a lower transmittance for the wavelength of ultraviolet light used for exposure compared to color filters of other colors, so ultraviolet light is less likely to reach the bottom of the color filter CFG10.
[0085] If development is performed in such an underexposed state, an undercut C may occur at the bottom of color filter CFG10, as shown in Figure 7. In other words, the width of the top of color filter CFG10 becomes larger than the width of the bottom.
[0086] When such undercut C occurs, it becomes difficult for the insulating layer 14 to cover the region including the undercut C. In other words, part of the color filter CFG10 becomes more likely to be exposed from the insulating layer 14.
[0087] For example, the pixel electrode PE disposed on the insulating layer 14 may be disconnected by the corner EG3 of the color filter CFG10, which may cause the display device 1 to malfunction.
[0088] In this embodiment, the color filter CFG has a first layer CF1 and a second layer CF2 disposed on the first layer CF1. By forming the color filter CFG in two layers, it is possible to suppress the occurrence of undercut C due to insufficient exposure and to increase the thickness of the color filter CFG.
[0089] Specifically, the first layer CF1 has a thickness that allows light to reach the bottom during the manufacturing process, which makes it difficult for the above-mentioned undercut C to occur in the first layer CF1 during the manufacturing process.
[0090] In particular, by forming the green color filter CFG in two layers, it is possible to suppress the occurrence of undercut C. Furthermore, by forming a second layer CF2 of the same color on the first layer CF1, it is possible to increase the thickness of the color filter CFG.
[0091] This improves the color reproducibility of the display device 1. In other words, by forming a desired display light, the color discrimination region can be expanded. As a result, it is possible to provide a display device 1 that can improve display quality.
[0092] Furthermore, by suppressing the occurrence of undercut C, it becomes easier for the insulating layer 14 to cover the bottom of the color filter CFG. This makes it possible to prevent the side surfaces S1, S2 and corners EG1, EG2 of the color filter CFG from being exposed through the insulating layer 14. As a result, it is possible to prevent disconnection of the pixel electrode PE due to the color filter CFG and to prevent lighting defects from occurring.
[0093] Furthermore, by reliably covering the color filter CFG with the insulating layer 14, it is possible to prevent impurities from flowing out from the color filter CFG into the contact hole CH3, and to prevent contamination of the manufacturing equipment (for example, a film formation chamber) by impurities.
[0094] Furthermore, even if the colorant content in the color filter increases or the color filter becomes thicker in response to demands for an expanded color reproduction range, a color filter CFG formed of multiple layers can be adjusted to the desired thickness or colorant content.
[0095] Furthermore, in this embodiment, the first layer CF1 overlaps the entire aperture AP. In other words, the aperture AP does not have any area that does not overlap with the color filter CFG. This allows all light passing through the aperture AP to pass through the color filter CFG. As a result, the display quality of the display device 1 can be improved.
[0096] The COA system having color filters CFR, CFG, and CFB as in this embodiment is particularly suitable for a display device 1 that requires high definition. Such a display device 1 can be used in, for example, VR (Virtual Reality).
[0097] The display device 1 configured as above can improve the display quality. In addition, various other advantageous effects can be obtained from this embodiment.
[0098] In the present embodiment, an example in which the color filters CFR, CFG, and CFB are each configured with two layers has been described, but the present invention is not limited to this example. Fig. 8 is a schematic plan view showing another example of the configuration of the color filters CFR, CFG, and CFB. In the example shown in Fig. 8, the color filters CFR and CFB are configured with a single layer.
[0099] As yet another example, color filters CFR and CFG may be configured as two layers, and color filter CFB may be configured as a single layer.As yet another example, color filters CFG and CFB may be configured as two layers, and color filter CFR may be configured as a single layer.
[0100] All display devices that can be implemented by a person skilled in the art through appropriate design modifications based on the display devices described above as embodiments of the present invention are within the scope of the present invention as long as they incorporate the gist of the present invention. Within the scope of the concept of the present invention, a person skilled in the art can conceive of various modifications, and these modifications are also considered to be within the scope of the present invention. For example, displays in which a person skilled in the art appropriately adds or deletes components or modifies the design, or adds or omits processes or modifies conditions, to the above-described embodiments are also within the scope of the present invention as long as they incorporate the gist of the present invention.
[0101] Furthermore, with regard to other effects brought about by the aspects described in the above embodiments, those that are clear from the description in this specification or that can be appropriately thought of by a person skilled in the art are naturally understood to be brought about by the present invention. [Explanation of symbols]
[0102] 1...display device, 2...display panel, 3...illumination device, 10...substrate, 11-15...insulating layer, 20...substrate, AP...opening, CE...common electrode, CF1...first layer, CF2...second layer, CFB, CFG, CFR...color filters, CH1, CH2, CH3...contact hole, G...scanning line, LC...liquid crystal layer, PE...pixel electrode, PX...pixel, S...signal line, S1, S2...side surface, S14...surface, SC...semiconductor, SPB, SPG, SPR...subpixel, SUB1...first substrate, SUB2...second substrate, SW...switching element.
Claims
1. A substrate; a semiconductor disposed above the substrate; a pixel electrode electrically connected to the semiconductor; a first color filter disposed between the semiconductor and the pixel electrode; The first color filter has a first layer and a second layer disposed on the first layer and having the same color as the first layer. Display device.
2. the first color filter is a color filter having a green color; The display device according to claim 1 .
3. further comprising an organic insulating layer covering the first layer and the second layer; the organic insulating layer is formed of a positive photosensitive resin, the first color filter is formed of a negative photosensitive resin; The display device according to claim 1 .
4. two adjacent scan lines disposed above the substrate; two adjacent signal lines intersecting the two scanning lines; the first color filter overlaps an opening surrounded by the two scanning lines and the two signal lines, The width of the first layer is greater than the width of the opening. The display device according to claim 1 .
5. The width of the second layer is smaller than the width of the first layer. The display device according to claim 4 .
6. The width of the second layer is greater than the width of the opening. The display device according to claim 5 .
7. two adjacent scan lines disposed above the substrate; two adjacent signal lines intersecting the two scanning lines; a peripheral portion of the first layer overlapping the two scanning lines and the two signal lines, respectively; The display device according to claim 1 .
8. an inorganic insulating layer disposed between the semiconductor and the first color filter; a connection electrode disposed on the inorganic insulating layer, the inorganic insulating layer has a first contact hole overlapping the opening, the connection electrode is electrically connected to the semiconductor through the first contact hole; a portion of the first layer filling the first contact hole; The display device according to claim 4 .
9. the second layer overlaps the first contact hole; The display device according to claim 8 .
10. further comprising an organic insulating layer covering the first layer and the second layer; the organic insulating layer has a second contact hole overlapping the scan line; the pixel electrode is electrically connected to the connection electrode through the second contact hole; an angle formed between an inner surface of the second contact hole and a plane parallel to the main surface of the substrate is smaller than an angle formed between a side surface of the first layer and a plane parallel to the main surface of the substrate; The display device according to claim 8 .
11. an angle formed between an inner surface of the second contact hole and a plane parallel to the main surface of the substrate is 72 degrees or less; The display device according to claim 10.
12. a side surface of the first layer is covered with the organic insulating layer; The display device according to claim 10.
13. The thickness of the first layer is smaller than the thickness of the second layer. The display device according to claim 1 .
14. The thickness of the first layer is 2 μm or less. The display device according to claim 1 .
15. further comprising an organic insulating layer covering the first layer and the second layer; the sum of the thickness of the first layer, the thickness of the second layer, and the thickness of the organic insulating layer is 5 μm or more; The display device according to claim 14.
16. a second color filter having a color different from that of the first color filter, and a third color filter having a color different from that of the first color filter and the second color filter; At least one of the second color filter and the third color filter is formed of two layers. The display device according to claim 2 .
17. a second color filter having a color different from that of the first color filter, and a third color filter having a color different from that of the first color filter and the second color filter; the second color filter and the third color filter are each formed as a single layer; The display device according to claim 2 .
18. a first substrate including the substrate, the semiconductor, the first color filter, and the pixel electrode; a second substrate facing the first substrate; a liquid crystal layer disposed between the first substrate and the second substrate, The display device according to claim 1 .
Citation Information
Patent Citations
Display device
JP2022180090A
Color filter substrate, manufacturing method thereof, liquid crystal display panel and electronic device
JP4335158B2