Method for measuring temperature or thermal resistance and monitoring thermal resistance
By providing individual control in semiconductor switches, and using temperature measurement and thermally sensitive electrical parameters of the switch in an on state, the problem of difficulty in monitoring the thermal impedance changes of multi-chip power modules online in the prior art is solved, and accurate monitoring and detection of thermal impedance between the connection layer and the cooling system is achieved, extending the service life of the module.
Patent Information
- Application Number
- JP2025503211
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2022-07-07
- Filing Date
- 2022-12-27
- Publication Date
- 2025-04-16
- Estimated Expiration
- 2042-12-27
AI Technical Summary
The prior art is difficult to monitor the thermal impedance changes of multi-chip power modules online, especially in the case of high data acquisition rates and complex heat flow distribution, and it is difficult to accurately detect which layers or interfaces are the most degraded.
By providing individual control in the semiconductor switch of the power module, temperature measurement is performed in the on state using the switch, combined with the thermally sensitive electrical parameter (TSEP), in order to obtain the temperature of the connection layer and calculate the thermal impedance. This method requires no additional temperature sensors, and only uses existing semiconductor switches as temperature sensors.
The thermal impedance between the power module connection layer and the cooling system is realized, and the degradation of the layer or interface can be detected in a timely manner, extend the service life of the module, and reduce maintenance costs.
Smart Images

Figure 2025512127000001_ABST
Abstract
Description
[Technical field]
[0001] The present disclosure relates to the field of power electronic systems having power semiconductors, more precisely power switching semiconductors, and to a method for monitoring thermal resistance in such power electronic systems. [Background technology]
[0002] To achieve higher current densities in power modules, instead of increasing the die area of such modules, multi-die power module architectures are increasingly being adopted, where multiple semiconductor dies are electrically connected in parallel to perform the same function as a single switch. In the prior art, the life span of a power module is limited by the swing in semiconductor junction temperature during the mission profile. Traditional wear mechanisms are caused by a combination of thermal cycling and mismatch in coefficient of thermal expansion (CTE) that creates mechanical stress between different layers of the power module. These mechanical deformations and excessive strains applied to the interfaces of different materials cause degradation or even failure of the power module due to the formation of cracks and / or voids. In addition, degradation of the layers between the semiconductor and the cooling system, such as a heat sink, leads to an increase in thermal resistance, which in turn increases the amplitude of the temperature swing at a given load condition. The most critical failure mechanism is associated with the electrical interconnection package closest to the semiconductor die, specifically bond wire lift-off and die attach degradation with delamination between layers of Sn-based solder or Ag-based sintered layers. References that discuss such issues include, for example, Non-Patent Document 1, Non-Patent Document 2, and Non-Patent Document 3.
[0003] In this context, there is a high technological interest in monitoring the health status of these layers and assessing the remaining life span of the power module before an actual failure of the module occurs. In particular, online condition monitoring of the die attach layer is a key technique for monitoring the degradation level, avoiding failures, planning maintenance, and developing strategies to extend the life span of the power module based on this monitoring.
[0004] There are several test methods: US Pat. No. 5,399,433 discloses a junction-case thermal resistance test method; US Pat. No. 5,499,433 relates to a method for measuring the thermal resistance of a semiconductor device; US Pat. No. 5,499,433 relates to a method and apparatus for evaluating the thermal impedance of a packaged semiconductor component; US Pat. No. 5,499,433 relates to a method and apparatus for predicting junction temperature for use in power conversion modules; and US Pat. No. 5,499,433 provides a method and system for calculating IGBT module transient state junction temperature.
[0005] Thermal impedance is Zth j-ref =(T(t)-T ref ) / Pdiss, where Pdiss is the change in dissipated power, T(t) is the temperature response of the device to this power change, and Tref is a reference temperature, for example the heat sink temperature THS, or the cooling fluid temperature TCF, or the cooling means temperature TCM. The thermal resistance is Rth j-ref =lim(Zth)(t->∞).
[0006] In the prior art, the degradation level of the package layers is measured and monitored using various techniques based on thermal impedance measurements: Thermistors are calibrated temperature-sensitive electrical resistors typically built into conventional power modules, thermally connected to the ceramic insulating plate of the semiconductor die and electrically connected to the terminals of the power module. These devices allow the temperature of the ceramic plate to be monitored over the life of the module. By monitoring the temperature progression at the device's location, the change in thermal impedance between the heat sink and the module can be monitored. The temperature of the semiconductor die is measured during operation of such semiconductors using multiple thermal sensitive electrical parameters (TSEPs). TSEPs are electrical parameters of the semiconductor that are sensitive to temperature, can be calibrated, and can provide information about the temperature of the semiconductor. Thus, if the power dissipated in the semiconductor, Pdiss, is known, the thermal resistance information between the semiconductor and the heat sink during the lifetime of the module can be extracted. Thermal impedance measurement, a transient thermal response technique, can provide information about the degradation of different interfaces in a power module. This technique typically consists of: First, a starting steady-state thermal condition is applied to the power module using semiconductor switches as active devices, which can be either a zero power condition or a condition where a recorded constant power is dissipated in the semiconductors. Second, a controlled power step increase (if the starting condition is a zero power condition) or power step decrease (if the starting condition is a constant power condition) is applied and the power change is recorded, followed by the progression of the semiconductor temperature until a new steady state thermal condition is reached. Finally, the recorded temperature transient behavior is represented by using an equivalent Foster or Cauer network that represents the thermal structure of the power module with multiple RC elements. By fitting the temperature transient with the Foster equation, the resistance and capacitance of different parts of the power module can be extracted, and information on the evolution of the thermal resistance and capacitance is obtained.
[0007] These techniques are particularly sensitive to solder adhesion and degradation of the different layers that make up the power module.Typically, thermal impedance measurements are mainly performed in off-line conditions by mounting the device on a measurement test bench, controlling the load, measuring the power dissipated in the device and measuring the temperature transients with dedicated sensors.
[0008] Several experiments have been reported in the literature demonstrating a clear correlation of the degradation of the solder layer with the evolution of the thermal transient behavior after power cycling of the power module.
[0009] Available transient thermal techniques (e.g., thermal impedance, ZTH) are difficult to implement in the on-line operation of power modules because it remains difficult to measure the cooling / heating transient temperature during the operation of the power devices with a sufficiently high data acquisition rate, especially for multi-chip power modules where the current is shared between different parallel interconnected dies, and because it remains difficult to measure the dissipated power of each device, which needs to be controlled and known in order to measure the thermal impedance.
[0010] Available online TSEP monitoring technology allows the temperature of the semiconductor die to be monitored in real time, and if similar power dissipation conditions can be reproduced during the measurement, the semiconductor and heat sink Rth j-HS However, the increase in thermal resistance between Rth j-HS Knowing the ΔT cannot distinguish which layer or interface is most degraded in the package stack.
[0011] The thermistor is typically thermally connected to an intermediate layer of the power module package stack, typically a ceramic insulating plate, and can in principle measure the thermal resistance Rth of the junction by monitoring its evolution along with that of the semiconductor die thermally connected to the same ceramic insulating plate, i.e., along with that of the direct bonded copper (DBC) ceramic substrate, which corresponds to the direct mating of copper and ceramic. j-DBC is the most degraded, or the thermal resistance Rth between the junction and the heat sink DBC-HSHowever, integrating a thermistor means additional manufacturing costs, requires additional external leads, additional ceramic insulating plate area, and generally increases the cost, volume, and weight of the power module. Therefore, typically, only one thermistor is integrated on a power module, and the temperature measured by it represents only the temperature of the nearest semiconductor chip. [Prior art documents] [Patent documents]
[0012] [Patent Document 1] China Patent Publication No. 103175861 [Patent Document 2] China Patent Publication No. 103792476 [Patent Document 3] European Patent No. 0708327 [Patent Document 4] U.S. Patent No. 7,356,441 [Patent Document 5] China Patent Publication No. 107219016 [Non-patent literature]
[0013] [Non-Patent Document 1] N. Degrenne, J. Ewanchuk, E. David, R. Boldyrjew and S. Mollov, “A Review of Prognostics and Health Management for Power,” Annual Conference of the Prognostics and Health Management Society, (2015) 1-11 [Non-Patent Document 2] Mauro Ciappa, “Selected failure mechanisms of modern power modules,” Microelectronics Reliability, 42 (2002) 653-667 [Non-Patent Document 3] PY. Pichon and J. Brandelero, “Relative importance of solder and wire bond defects on the maxi-mum junction temperature of IGBT devices,” Microelectronics Reliability, 126 (2021) 114250 Summary of the Invention [Problem to be solved by the invention]
[0014] In view of this prior art, the present disclosure proposes to use individual control of semiconductor switches in a power module to provide an open configuration of such switches where TSEP measurements are taken to obtain temperature measurements. This is done for modules with one or more semiconductor switches and each die in a multi-chip power module to detect degraded layer portions of the power module. This allows determining which parts of equipment using such modules are in a degraded state and managing a better maintenance plan. [Means for solving the problem]
[0015] More precisely, the present disclosure relates to a method for measuring a temperature or a thermal resistance in a power electronic system comprising at least a first power unit and a heat source thermally connected to a cooling means via a connection layer, the method comprising providing a limited current to the first power unit while the first power unit is in an open state such that it does not dissipate heat, the limited current not allowing the first power unit to be in a power conducting state, measuring a temperature T1 of the first power unit using a thermal sensitive electrical parameter TSEP of the first power unit, and since the first power unit in an open state does not generate heat, measuring a temperature T2 of the connection layer. CL as equal to such first temperature T1.
[0016] This method provides a simple way to obtain a measurement of the connection layer temperature without the need for a thermistor.
[0017] The heat source can be a second power unit or any heating element.
[0018] The method further comprises the step of: CM and measuring the temperature difference T1-T between the connection layer and the cooling means. CM and calculating:
[0019] This makes it possible to obtain information about the thermal resistance between the connection layer and the cooling means.
[0020] If the heat source is a second power unit, the method includes measuring a temperature T2 of the second power unit using a TSEP of the second power unit; Difference T1-T CM The difference T2-T CM Compare with Thermal resistance R between the second power unit and the connection layer 2-CL The thermal resistance R between the connection layer and the cooling means is calculated as follows: CL-CM and comparing it with T1=T CLTherefore, R 2-CL / R CL-CM =(T CL -T CM ) / (T2-T CL )=(T1-T CM ) / (T2-T1), such calculation being independent of Q, Q being the value of the heat flow applied between the second power unit and the connection layer; It may further include.
[0021] This provides information about the thermal resistance of the layer without the need for any other sensors than those on the cooling means.
[0022] The first power unit and the second power unit may be semiconductor switches thermally connected to the connection layer via a first stack of material layers, and the cooling means may be a heat sink, the connection layer being thermally connected to the heat sink via a second stack of material layers.
[0023] The first power unit and the second power unit may be semiconductor switches, and the connection layer is a ceramic layer, such as a direct bonded copper ceramic layer or an active metal brazing layer, attached directly to the heat sink or attached to the heat sink via a base plate BP.
[0024] The first power unit may be a first half-bridge power unit including a first upper switch and a first lower switch, the first upper switch and the first lower switch having a die attached to a first ceramic layer, such as a direct bonded copper ceramic layer or an active metal braze layer, via a first die attach layer; the second electronic unit is a second half-bridge power unit including a second upper switch and a second lower switch, the first upper switch and the lower switch having a die attached to a second direct bonded copper ceramic layer via a second die attach layer, the first direct bonded copper ceramic layer and the second direct bonded copper ceramic layer being attached to a common heat sink via a solder layer and a base plate layer; and the method includes turning off both the first upper switch and the first lower switch of the first half-bridge power unit while the second upper switch and the second lower switch of the second half-bridge power unit are active; Measuring a temperature T2 of a second upper switch by a TSEP of the second upper switch; measuring a temperature T1 of a first upper switch or a first lower switch by a TSEP of the first upper switch or the first lower switch by providing a limited current to the first upper switch or the first lower switch, the limited current not allowing the first upper switch unit to be in a power conducting state; and determining a temperature difference R between the second upper switch and a base plate, assuming that a temperature of a base plate is equal to the temperature T1. 2-BP =T2-T BP =T2-T1, and Heat sink temperature T HS Then, the ratio r2 = (T2 - T BP ) / (T BP -T HS ) to compare the thermal resistance of the second die attach layer, the second DBC layer, and the solder layer to the thermal resistance between the base plate and the heat sink; Includes.
[0025] Measurements on all power units can be completed by turning off each power unit in turn while the other power units are active.
[0026] The power electronics system may include two or more half-bridge power units, where one of the half-bridges may be turned off to provide baseplate temperature measurements while thermal resistance and thermal resistance ratio measurements are made on the other of the half-bridges, each of which is turned off in turn while the other is active to provide a complete test of the half-bridges of the power electronics system.
[0027] The power electronics system may include a first power module having a first pair of half bridges, each having an upper switch and a lower switch and a DBC layer connected to a first base plate, and a second power module having a second pair of half bridges, each having an upper switch and a lower switch and a DBC layer connected to a second base plate, the first base plate and the second base plate being attached to a heat sink in contact with a cooling fluid via a thermal contact material, the power electronics system further comprising an independent gate driver circuit for each of the switches, the method comprising: determining a thermal resistance R between an upper switch or a lower switch of the first power module and the heat sink; PU1-HS and the thermal resistance between the heat sink and the cooling fluid R HS-CF and measuring the thermal resistance by: All devices in the second power module are left open and the TSEP temperature measurements of one or a combination of the switches in the second power module are used to measure the heat sink interface temperature T HS , while the switching function of the power electronics system is performed by the switches of the first power module, and at the same time, the temperature T2 of at least one of the devices of the first power module is measured through its TSEP, and the temperature T CFand measuring Ratio r3=(T2-T HS ) / (T HS -T CF ) to compare the thermal resistance of the first power module, the first base plate, and the first thermal contact material with the thermal resistance between the heat sink interface and the cooling fluid, the method further comprising performing the same step with the switch of the first power module open while the switching function of the power electronics system is performed by the switch of the second power module; and comparing by
[0028] By combining switch-level, power unit-level and module-level methods, thermal resistance ratio measurements can be obtained at multiple levels in the stack of modules on heat sinks and cooling fluids.
[0029] The first power unit may be in the open state during temperature or thermal resistance measurements.
[0030] This allows the measurement sequence to be scheduled.
[0031] The present disclosure also relates to a method for monitoring a thermal resistance of a power unit of a power electronic system, comprising obtaining an initial thermal resistance of such power unit by the disclosed method, storing said initial thermal resistance and a ratio between said initial thermal resistance between said power unit and a connection layer of such power unit and a thermal resistance between the connection layer and a cooling means, repeating the method during the life of the power electronic system to obtain further thermal resistances and further ratios, and comparing said further thermal resistances and said further ratios with said initial thermal resistance and said initial ratio to detect changes in the thermal resistances and ratios.
[0032] The method of monitoring may include comparing the change in thermal resistance to a predetermined threshold and issuing an alarm if the value of the thermal resistance or the ratio exceeds the threshold.
[0033] The method comprises: The temperature Tj of at least one semiconductor device j of a power electronics system, such as a power converter, is measured over a time interval t sampling and storing the data in memory; integration time t averaging is at least a significant portion of the thermal constants of the power converter, over a time interval t eval At least the average temperature T mean,j and standard deviation σ mean,j periodically calculating At least, condition T mean,j >C1×T HS and σ mean,j <C2×(T mean,j -T HS ) is observed, where C1 is a constant greater than 1 and C2 is a constant less than 1; may include. C1 can be within the range of 1.1-5. C2 is a constant between 0.2 and 0.05, and the condition σmean,j <C2*(Tmean,j-T HS ) is a condition that detects the steady-state nature of operation by comparing the standard deviation of the temperature samples to the average temperature differential between the semiconductor and the heat sink during the sampling period.
[0034] Time interval t sampling is a multiple of the inverse of the switching frequency of the power converter, i.e., t sampling =n / f PWM It could be.
[0035] temperature T mean,j can be calculated using the arithmetic mean or median of the data samples Tnj,...,Tjm.
[0036] integration time t averaging may be larger than the thermal constants of the power electronics system.
[0037] Time interval t eval t averaging The time interval may be longer than
[0038] The switches of the power unit PUx may be controlled independently of each other, x=1 to n, n being a total number of switches, and the method includes measuring a coupling impedance between the power unit PUi and the power unit PUj (i≠j), the measurement being: 1 / switching off all switches of power unit PUj and keeping the switches of power unit PUi active; 2 / Measuring the temperatures Tx of all power units PUx; 3 / Heat sink temperature T HS and measuring 4 / Temperature difference ΔTx=Tx-T HS Calculating 5 / Comparing ΔTi with ΔTx, such as to detect changes in thermal resistance of the coupling;
[0046] The method may include performing the method according to a sequence including:
[0039] The sequence may be repeated multiple times during the life of the product.
[0040] The method may include measuring the power dissipated in a power unit PUi using an electrical model Pi (IL, Vbus, fPWM, Ti, α...) of such power unit, where IL is the measured load power, Ti is the measured temperature of such power unit PUi, Vbus is the known or measured bus voltage of power unit PUi, fPWM is the switching frequency of such power unit, and α is the duty cycle of such power unit, and calculating a coupling resistance as ΔTx / Pi.
[0041] The present disclosure also relates to software including instructions that, when executed in a controller of the power system, implement the method, and to a computer readable non-volatile medium having the software recorded thereon.
[0042] A detailed description of exemplary embodiments of the present invention is discussed below with reference to the accompanying drawings. [Brief description of the drawings]
[0043] [Figure 1] FIG. 1 is a schematic diagram of one embodiment of a power electronics system having a power unit with one semiconductor die adapted to the process of the present disclosure. [Diagram 2] FIG. 1 is a schematic diagram of one embodiment of a power electronics system having one power unit with two semiconductor dies adapted for the process of the present disclosure. [Diagram 3] FIG. 1 is a schematic diagram of one embodiment of a power electronics system having two power units, each unit having a pair of semiconductor switch dies on a single DBC substrate, adapted for the process of the present disclosure. [Figure 4] FIG. 4 is a diagram showing an electrical circuit of the power electronics system of FIG. [Diagram 5] FIG. 1 is a schematic diagram of one embodiment of a power electronics system having three power units, each having a pair of semiconductor switch dies on a single DBC substrate, adapted for the process of the present disclosure. [Figure 6] FIG. 6 shows an electrical circuit diagram of the power electronics system of FIG. 5. [Figure 7] FIG. 1 is a schematic diagram of one embodiment of a power electronics system having two power units, each having four semiconductor dies, adapted for the process of the present disclosure. [Figure 8] FIG. 8 shows an electrical circuit diagram of the power electronics system of FIG. [Figure 9A] 1 is a flow chart of an example embodiment of method steps. [Figure 9B]1 is a flow chart of an example embodiment of method steps. [Figure 9C] 1 is a flow chart of an example embodiment of method steps. [Figure 9D] 1 is a flow chart of an example embodiment of method steps. [Figure 10] 1 is an exemplary general flow chart. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0044] The disclosed method for measuring temperature in a power electronic system allows several measurements depending on the type of system. In Fig. 1, the power unit PU comprises a semiconductor switch having a die 1a connected to a heat sink HS 5 via a stack of m material layers Mi (i = 1, 2, ..., m). In this stack, layers M1 to Mj-1 are arranged between the die 1a and a layer Mj, which may be a DBC layer. The semiconductor switch senses the temperature T SRC The heat source 10 is thermally connected in parallel to the heat source 10.
[0045] Below the layer Mj there is a further stack 4 of layers Mj+1 to Mm, the layer Mm being connected to a heat sink HS 5.
[0046] The method includes providing a limiting current to the at least one semiconductor switch 1a in the open state, the limiting current being adapted to measure a first temperature T1 of the at least one semiconductor switch using a thermal sensitive parameter (TSEP) of the at least one semiconductor switch in the open state.
[0047] In such a situation, the temperature of the semiconductor switch that does not dissipate heat is close to or equal to the temperature of the DBC layer Mj 3. Then, the temperature T Mj can be calculated as being equal to the first temperature T1 obtained by the TSEP measurement.
[0048] The TSEP measurement can use parameters such as gate resistance or other parameters that can be measured using the existing electrical measurement features of the power unit.
[0049] Conventional semiconductor switches typically have a V of about -8V. GE Voltage is cut off and V is about +15V GE They can conduct voltage and drive currents of tens or hundreds of amperes.
[0050] In the present application, the measurement of T1 by the TSEP parameter is performed using a current source to inject a small current, e.g., a pulse, of tens of milliamps, e.g., 25 mA, at the gate-emitter junction for a duration of less than tens of microseconds, thereby allowing the gate / emitter resistance of the semiconductor to be measured. With such a small current injection, the VGE voltage of the semiconductor does not rise sufficiently to allow the switch to conduct.
[0051] By using the measurement of the internal gate resistance Rg1 of at least one semiconductor of the switch of PU1, any additional external sensor measuring the junction temperature T1 can be avoided. Thus, the temperature of the layer Mj can be determined using only the control terminals of the power electronic system PS.
[0052] The temperature T1 of S1 is measured using a calibration curve with the gate resistance Rg1 of S1. For example, the calibration curve relates T1 to the gate resistance of switch S1 as follows: T1 = δR1 * Rg1 + R01
[0053] The semiconductor switch may be a semiconductor switch such as a silicon, silicon carbide, or GaAs semiconductor in a silicon insulated gate bipolar transistor (IGBT) or MOSFET configuration.
[0054] A general principle of the present disclosure is that the switch of the power unit PU is intentionally left open and its temperature can be measured, so that it can be advantageously used as a temperature sensor to measure the temperature of the layer Mj. The semiconductor switch thus performs the additional function of being a temperature sensor for the layer Mj.
[0055] In the case of Fig. 1, the heat source 10 can be any system that generates heat losses and has a thermal connection to the layer Mj, such that the temperature of Mj differs from the temperature of the heat sink, even if the power unit PU does not generate losses. For example, the heat source can be a resistance exposed to an electric current, a mechanical system that generates losses through friction, an inductance exposed to a magnetic flux, a thermal radiation source that changes the temperature of Mj, or any source that has a radiative, convective, inductive or conductive thermal connection to the layer Mj.
[0056] To enable such measurements, the method may include maintaining the semiconductor switch 1a in an open state that does not dissipate heat or detecting that such semiconductor switch is in the open state. In one example, the power unit may be thermally connected to the motor body, does not transfer energy, and is used to monitor the temperature of the motor body.
[0057] If the measurement is made when the switch is open, the primary electrical function of the semiconductor switch is not affected since the switch is not active and does not transfer energy. The additional function of measuring temperature is only performed when the switch is not delivering power.
[0058] The disclosed method is adapted to power modules in which the material structure above the semiconductor die 1a does not dissipate as much heat as the stack of layers between the semiconductor switch die and the connection layer Mj 3. Thus, advantageously, even if the thermal contact between the semiconductor switch die 1a and the layer Mj is poor (e.g. due to degraded thermal contact), the temperature T of the material Mj at a location below such die 1a can be reduced. Mjis sufficiently close to the temperature of semiconductor die 1a, so that these temperatures can be approximated as being the same. For example, the thermal resistance between the top of semiconductor die 1a and the heat sink is more than 5 times, usually more than 10 times, and often more than 20 times, of the thermal resistance between semiconductor die 1a and Mj. In one example, only a small surface area of the top surface of semiconductor die 1a is connected to the heat sink via metal, e.g., this contact area is less than 10%, or less than 5%, and this area is minimized to provide only sufficient electrical connection of the top surface, e.g., wire connection to a terminal. In another example, a large portion of the top surface area of the semiconductor die 1a, typically 90% to 95%, is covered by a thermally insulating material, such as an epoxy-based potting compound of a silicone gel compound, having a thermal conductivity of less than 2 W / (mK) [most thermally conductive epoxies have a thermal conductivity in the range of 1 W / (mK) to 1.6 W / (mK)], or preferably less than 1 W / (mK), which provides very limited losses in terms of transfer of heat between the die and layer Mj.
[0059] In such a case, the temperature T SRC Assuming that a heat source having a temperature of 10 is in contact with the layer Mj, a semiconductor switch can be used as a temperature sensor for said heat source 10. T1=T Mj =T src or T src Close to.
[0060] In Fig. 2 the power electronic system is a power unit PU1 comprising two semiconductor switches each having a die 1a, 2a connected to a heat sink HS 5 via a similar stack of m material layers Mi (i = 1, 2, ..., m). The two semiconductor switches are thermally connected in parallel via a connecting layer Mj 3 of the stack.
[0061] In such a case, each of the two semiconductor switches can form a respective heat source and can be used alternately to measure temperature using the methods disclosed herein.
[0062] In such a situation, the method shown in FIG. maintaining a first one of the two semiconductor switches, for example, switch S1 on die 1a, in an open state such that it does not dissipate heat, or detecting that the first one of the two semiconductor switches is in the open state while at least a second switch S2 on die 2a is in a conducting state to form the heat source 100, then injecting a gate current into the gate of the semiconductor switch S1 and measuring a first temperature T1 of the die 1a of the first switch S1 using a thermal sensitive parameter of the first semiconductor switch (110); Since the first switch S1 does not generate heat, the temperature T CL as equal to such first temperature T1; In step 120, the temperature T of the heat sink of the power electronics system is HS and measuring Difference T1-T HS The difference T2-T HS and comparing it with In such a condition, the method may include measuring the temperature T2 of the die 2a of the second switch S2 in a conducting state, preferably also using the TSEP parameter of the second switch S2 (130); A thermal resistance R between the die of the second semiconductor switch S2 of the at least two semiconductor switches and the layer Mj S2,Mj The thermal resistance R between Mj and the heat sink is calculated in step 140 below. Mj,HS and comparing it with R S2,Mj =Q / (T2-T Mj,S2 ) R Mj,HS =Q / (T Mj,S2 -T HS ) R S2,Mj / R Mj,HS =(T Mj,S2 -T HS ) / (T2-T Mj,S2), the calculation being independent of Q, which is the value of the heat flow applied between the second semiconductor of the at least two semiconductors and the connecting layer Mj; Includes.
[0063] This measurement has the following advantages: The semiconductor S1 is at a temperature T Mj’ Temperature T of Mj is close to Mj is positioned on layer Mj so as to measure T Mj’, S2 ≒ T Mj, For example, the thermal impedance between point Mj' under semiconductor S2 and point Mj under semiconductor S1 is a small fraction of the thermal impedance between Mj and the heat sink HS, for example less than 20%, typically less than 10%.
[0064] Temperature T under semiconductor S1 Mj If is close enough to the temperature of semiconductor S1, then these temperatures are the same and T Mj =T1.
[0065] In this example, T Mj =T Mj’ =T1. The semiconductor S1 is used as a sensor to measure the temperature of Mj at a location under the semiconductor S1, and it can be approximated that the temperature of Mj' under the semiconductor S2 and the temperature of the semiconductor of S1 are the same.
[0066] Under these conditions, it follows that the ratio of the thermal resistance between the semiconductor of S2 and the layer Mj to the thermal resistance between the layer Mj and the heat sink HS can be expressed as: r=R S2-Mj / R Mj-HS =(T1-T HS ) / (T2-T1).
[0067] Thus, advantageously, the relative thermal resistance R S2,Mj and R Mj-HSBy reversing the measurement, i.e. leaving S2 open, the relative thermal resistance R S1,Mj / R Mj-HS can be measured.
[0068] Using the disclosed method, the thermal resistance R between the die of the second semiconductor S2 and the layer Mj is S2,Mj can be calculated by the resistance R between Mj and the heat sink without needing to know the dissipated power in such a semiconductor. Mj,HS can be compared to:
[0069] As a result, the method Thermal resistance R Mj,HS Assuming that the thermal resistance R does not change during the life of the power electronics system PS, S2,Mj Monitor changes in, or Thermal resistance R S2-Mj Assuming that the thermal resistance R does not change during the life of the power electronics system PS, Mj,HS Changes in the
[0070] Temperatures T1, T2, and T HS The measurements are preferably taken under steady-state or near-steady-state thermal conditions and are repeated by alternating between switches S1 and S2 to monitor possible degradation of one of the resistances of the intermediate layers between S1 and Mj or between S2 and Mj.
[0071] As described above, a similar measurement process can be performed when switch S2 is open and switch S1 is conducting to measure the thermal resistance R between the die of the first semiconductor S1 and layer Mj. S1,Mj and the resistance R between Mj and the heat sink Mj,HS A comparison can be obtained to obtain thermal data for the complete unit.
[0072] Here, the temperatures T1 and T2 of the switches S1 and S2 are both measured using the gate resistances of S1 and S2 using respective calibration curves, for example, the calibration curves linearly relating T1 or T2 to Rg1 or Rg2 as follows: T1 = δR1 * Rg1 + R01 T2 = δR2 * Rg2 + R02
[0073] There are two situations in which the method can be used. In a first type of circuit, the semiconductors with dies 1a, 2a are not electrically connected in parallel, have separate gate commands and do not perform the function of a single switch. In such cases, where each switch owns its gate driver, the method is implemented when one of the switches is in an open state during operation of the module. In a second type of circuit, the two semiconductor switches are connected in parallel but driven by separate gate driver commands, in such cases one of the switches is kept in an open state while the other is conducting for a period sufficient to implement the method. This can be done periodically over a limited time, such as hundreds of milliseconds to a second, to provide thermal data about the module. The method requires that the gate commands of the switches are separated or include different control lines.
[0074] For an expert in the field of power electronics module design, it is easy to see that the conditions in the examples presented here are generally met. For example, in such a module, the layers Mj are direct bonded copper (DBC) ceramic substrates made mainly of alumina (Al2O3) substrates several mm thick with a thermal conductivity of 20 W / (mK) to 30 W / (mK), and the semiconductor chips S1 and S2 are, for example, T Mj,S2 ≒T Mj,S1 The power electronics modules are spaced less than 5 mm apart so that the power electronics modules are sealed with a low thermal conductivity composite material.
[0075] In Figures 3 and 4, the first power unit PU1 comprises two semiconductor switches S11, S12, each having a freewheeling diode and driven by gate drivers 61a, 62a, where switch S11 is the upper switch of a half-bridge and switch S12 is the lower switch of such a half-bridge. Such switches are made of dies 1a, 2a bonded to a single ceramic substrate 3a. The second power unit PU2 comprises two semiconductor switches S21, S22, each having a freewheeling diode and driven by gate drivers 61b, 62b, where switch S21 is the upper switch of a half-bridge and switch S22 is the lower switch of such a half-bridge. Such switches are made of dies 1b, 2b bonded to a single ceramic substrate 3b.
[0076] Each of said power units is connected to a single heat sink 5 via a layer 3' forming a base plate and one or more sub-layers 4'.
[0077] In such designs, the direct bond copper ceramic layers 3a, 3b are often the most critical layers and may limit the life span of the power module, so it is important to measure the temperature of such DBC layers. To obtain information of the die attach thermal resistance degradation, a method similar to that of Figure 9A includes the following steps: A - Leave open one adjacent semiconductor sharing the same DBC layer of the target die whose gate driver is being used to evaluate thermal resistance or damage metrics. This open semiconductor is electrically connected in parallel with another die as shown in Figure 4, so that the power converter can still perform its role, albeit with a reduced maximum current rating. As an example, the semiconductor switch S11 is kept open during the TSEP measurement to avoid heat dissipation. For example, the semiconductor S11 can be a silicon-based IGBT with a gate voltage maintained at -8V, while the other semiconductors electrically connected in parallel with S11 are electrically active and perform the normal operation of the switch. B - Temperature of the target die T die , the temperature T of the DBC layer with the adjacent die deactivated DBC , and the temperature of the heat sink T HS Measure. In one example, leaving switch S11 on die 1a open allows measurements to be made on die 2a, which shares DBC layer Mj1 with die 1a, while the conversion device would still have switch S21 on die 1b to carry the current.
[0078] Repeat such steps at regular time intervals during the product's life to reduce the temperature difference T between the target die and the DBC layer. die -T DBC and the temperature difference between the DBC layer and the heat sink, T DBC -T HS The ratio between r1=(T die -T DBC ) / (T DBC -T HS ) the change in the thermal resistance of the die attach layer can be monitored. In the example, if the thermal coupling between the parallel dies is weak, and referring to the previous example, if the thermal coupling between the parallel dies S11 and S21 is negligible, an increase in this ratio means that the thermal resistance of the die attach layer increases by the same percentage.
[0079] Using this method, it can be determined, within a reasonable approximation, that under steady-state thermal conditions, typically after a few seconds of operation at regulated power, that the above ratio r1 corresponds to the thermal resistance R between the die and the DBC layer. die,DBC and the thermal resistance R between the DBC layer and the heat sink. DBC,HS It can be demonstrated that this corresponds to the ratio between
[0080] Therefore, the method is preferably applied during a steady state thermal event of the power converter, where steady state operation is either intentionally created during a diagnostic procedure of the power converter or detected during operation of the converter.
[0081] However, the ratio r1 = (T die -T DBC) / (T DBC -T HS It is still possible to use the method to generate a damage indicator in thermal transient situations, since under some circumstances, r1 may still be independent of the dissipated power and thus the method is not limited to the steady state thermal case. In that case, the ratio r1 can be interpreted as a damage indicator rather than as a thermal resistance ratio, and its trend can still be monitored to assess the state of health of the power module.
[0082] For example, step B may be performed less than 100 ms after step A, and this sequence may be repeated at regular time intervals during the life of the product to reduce the temperature differential T between the target die and the DBC layer. die -T DBC and the temperature difference between the DBC layer and the heat sink, T DBC -T HS The ratio between r1=(T die -T DBC ) / (T DBC -T HS ) is calculated and the change in the damage parameter R of the die-attach layer can be monitored.
[0083] Here again, the method starts with the measurement of the temperature of the switch that is left open by the TSEP method, and the temperature of the heat sink T HS and measure the first temperature T1 and the heat sink temperature T HS The temperature difference between HS to obtain the value of the thermal resistance between the semiconductor switch and the heat sink in the OFF state.
[0084] Using the same principle of keeping any of the switches open while other switches on the same die are functional, measurements can be made for all the dies and layers beneath such dies.
[0085] 5 and 6 show an embodiment in which three half-bridges are connected in parallel to the output terminals.
[0086] The power electronics system comprises three upper switches S11, S21, S31 arranged on dies 1a, 1b, 1c, respectively, and three lower switches S12, S22, S32 arranged on dies 2a, 2b, 2c, respectively.
[0087] Each upper and lower switch has a gate driver circuit 61a for switch S11, a gate driver circuit 61b for switch S21, a gate driver circuit 61c for switch S31, a gate driver circuit 62a for switch S12, a gate driver circuit 62b for switch S22 and a gate driver circuit 62c for switch S32. The three half-bridges 1a, 2a, 1b, 2b and 1c, 2c have their own DBC layers 3a, 3b, 3c mounted on a common base plate 4', which is attached to a heat sink 5.
[0088] This embodiment, corresponding to FIG. 9B, is used to disclose another measurement to obtain the thermal resistance between the die and the baseplate.
[0089] When S11 and S12 of the first power unit PU1 are kept open in step 200, the thermal resistance between the switch S11 and the base plate keeps the upper switch S11 and the lower switch S12 of the half bridge open, and since these switches are off, T B Temperature T is equal to S11 =T S12 The temperature measurements of the switches S11 and S12 are used to provide the base plate temperature T B can be compared with the thermal resistance between the base plate 4′ and the heat sink 5, the switching function being performed only by the upper switches S21, S31 on the one hand and only by the lower switches S22, S32 on the other hand, while measuring the temperature of at least the upper switch S21 (T2=T PU2 , the temperature of the heat sink is measured in step 225, and then the thermal resistance of the second power unit is calculated as R in step 230.PU2 =(T S21 -T B ) / (T B -T HS ) or R PU2 =(T S22 -T B ) / (T B -T HS ) the thermal resistance between the die and the base plate is compared with that between the base plate and the heat sink. The same measurements made on the other switches allow perfect knowledge of all ratios between the die attachment layers 3a, 3b, 3c and the base plate, and between the base plate and the heat sink. In this configuration with three half bridges, the maximum current carrying capacity of the converter is reduced by about a factor of three.
[0090] Such measurements can be made on the designs of Figures 3 and 4 having two half-bridges, but the current capability of the unit in such a case is reduced by 50%, which can limit the conditions of operation of the unit during the measurements.
[0091] To characterize unit degradation, the method includes storing, for each switch, an initial ratio between a first thermal resistance between the die of the switch and a common layer with other switches and a second thermal resistance between the common layer and a common heat sink using the disclosed method, and repeating the method over the life of the power electronics system to store additional ratios between the first and second thermal resistances; monitoring the change in said second thermal resistance over the life of the power electronics system assuming that the first thermal resistance does not change; or monitoring a change in the first thermal resistance over a lifetime of the power electronics system, assuming that the second thermal resistance does not change; Includes.
[0092] In this disclosure, the temperature of the heat sink T HS is obtained using one or more state-of-the-art temperature sensors, such as thermocouples, thermistors, or infrared detectors.
[0093] According to the present disclosure, the thermal resistance between all switches Sx (x=1 to n) and the connection layers, such as DBC layers Mj, thermally connecting them to the heat sink of the module can be measured or at least evaluated initially and during the lifetime of the module, together with the resistance between such connection layers and the heat sink, to monitor the evolution of such thermal resistance and the aging of the device. If a base plate is present to receive multiple connection layers or DBC layers, the resistance between the switches and the base plate can also be monitored.
[0094] The different measurement methods and steps may be realised by software implemented in a processor of a controller of the power electronics system, the processor being further configured to provide a command to the one or more power units to bring the at least one semiconductor switch to the open state and to provide a command to generate the limited current in the at least one semiconductor switch in the open state.
[0095] Such software may be embodied in a computer readable non-volatile medium, such as a ROM or other medium.
[0096] One of the technical applications of the method, in which the semiconductor switches are temporarily deactivated, is to monitor the temperature of a layer Mj of interest in a power electronic system consisting of one or more power units or modules. The thermal resistance of a particular layer of a power module can be estimated by comparing the temperature difference between the semiconductor die and the layer Mj of interest with the temperature difference between the layer Mj and the heat sink. This measurement can be performed online during the nominal operation of the power electronic module, when each gate of the parallel die is individually controlled by its own gate driver (multi-chip configuration). By repeating such measurements periodically during the life of the power module, the local degradation state of the power module can be monitored. This allows a better knowledge of the degradation state of such modules and therefore a better maintenance plan to be managed. Furthermore, by applying the method of the invention, the need to incorporate thermistors in the power module is eliminated, since the semiconductor die itself can play that role. Finally, the invention also does not require the knowledge or measurement of the power dissipated by the semiconductor die, which is a strong limitation in other thermal impedance approaches.
[0097] Further types of measurements can be performed on a power electronic system PS5 as described in FIGS.
[0098] In this design, the four power units PU1, PU2, PU3, and PU4 include an upper switch S11 on die 1a, an upper switch S21 on die 1b, an upper switch S31 on die 1c, an upper switch S41 on die 1d, a lower switch S12 on die 2a, a lower switch S22 on die 2b, a lower switch S32 on die 2c, and a lower switch S42 on die 2d, where the upper switches are connected in parallel and the lower switches are connected in parallel.
[0099] The upper and lower switch dies of each power unit are attached to a common DBC layer 3a, 3b, 3'a, 3'b, and two power units PU1, PU2 are regrouped into a first power module MO1 on a first base plate 41, while two other power units PU3, PU4 are regrouped into a second power module MO2 on a second base plate 42. Furthermore, the base plates 41, 42 are attached to a heat sink 5 via connecting layers 81, 82, such as thermal paste. The heat sink is in contact with a cooling fluid 7.
[0100] FIG. 8 shows independent gate driver circuits 61a, 62a, 61b, 62b, 61'a, 62'a, 61'b, and 62'b for each device.
[0101] In this configuration, the thermal resistance R between S21 and / or S11 and / or S22 or S12 and the heat sink 5 PU1-HS keep all devices of the power module MO2 open, including PU3 and PU4, and use the temperature measurements of one or a combination of the devices of the power module MO2 to determine the temperature T of the heat sink interface. HS , and a switching function is performed by the devices of module MO1, and at the same time, the temperature T2 of at least one of the devices of module 1 (for example, temperature T S21 ) and the temperature of the cooling fluid T CF Then, R = (T2 - T HS ) / (T HS -T CF ) and comparing the thermal resistance of the module MO1 and its connection layer 41 with the thermal resistance between the heat sink contact surface and the cooling fluid, the thermal resistance R HS-CF can be compared to:
[0102] The same measurements are carried out with all switches of power module MO1 kept open, and the switching function is performed by the devices of module MO2 to compare the thermal resistance of module MO2 and its connection layer 42 with the thermal resistance between the heat sink contact surface and the cooling fluid.
[0103] This configuration therefore makes it possible to monitor the degradation of the material of the connection layers 41, 42 if measurements are made repeatedly during the life of the power electronic system. Alternatively, the degradation of the mechanical contact between the module MO1 and the heat sink contact surface can be monitored for a loss of contact pressure due to unfastening of the fastening system or due to degradation of the thermal interface material 81, e.g. pumping out of thermal paste.
[0104] FIG. 9D provides a generalized flow chart in which measurements are repeated after an initialization phase in steps 375, 380, and in step 400, the MOi module is turned off, the MOj module is turned off, j≠i, and T HS is measured, in step 410, T2 of the module MOj is measured, and in step 420, T CF is measured, and in step 430, the ratio r3=(T2-T HS ) / (T HS -T CF ) is measured, in step 450 the ratio r3 of the module is stored, the test is repeated until all j modules have been tested, and in step 365 the values of the ratio r3 are compared to detect any differences in such ratios.
[0105] The material of the connection layers 41, 42 can be a thermally conductive paste, a carbon-based foil, or any material disposed between the power module and the heat sink contact surface.
[0106] By combining measurements at the die level, power unit level, and module level, the thermal resistance from the die to the DBC, the DBC to the baseplate, and the baseplate to the heat sink can be monitored.
[0107] Beneficially, measurements are taken at steady state operation of the power electronics system, and to detect such steady state operation and then monitor the thermal resistance ratio, the process includes: The temperature Tj of at least one semiconductor device j of a power electronics system such as a power converter is measured over a time interval t sampling and storing the data in memory; The integration time t, which is at least a significant portion of the thermal constants of the power converter. averaging Then, using data samples Tnj,...,Tmj, we eval At least the temperature T of semiconductor j mean,j and standard deviation σ mean,j periodically calculating At least, condition T mean,j >C1×T HS and σ mean,j <C2×(T mean,j -T HS ) is observed, carry out the measurement process, may include.
[0108] C1 is a constant greater than 1 such that, for example, a large temperature differential exists between the heat sink and the semiconductor die of the power converter and an acceptable measurement accuracy can be reached. HS = 30°C, then C1 = 3, so that the measurement can be applied only if Tmean,j > 90°C, ensuring that sufficient thermal gradients exist within the power converter. Alternatively, C1 may have a different value, such as C1 = 1.1, or preferably C1 = 2, or preferably C1 = 5.
[0109] Condition σmean,j <C2*(Tmean,j-T HS ) is a condition that detects the steady-state nature of operation by comparing the standard deviation of the temperature samples to the average temperature difference between the semiconductor and the heat sink during the sampling time. C2 is preferably minimized, Tmean,jT HSis a constant limited by the measurement error. For example, C2=0.2, preferably C2=0.1, preferably C2=0.05.
[0110] During near thermal steady state operation of the power converter, the ratio (T HS ) / (T2-T1) is The temperature T1 of the off-state element, i.e., T HS Or T CF Temperature T is equal to CM and the thermal resistance between the layer Mj, the connection layer and the cooling means in is the ratio between the thermal resistance of the active semiconductor (temperature T2) and the thermal resistance of the layer Mj (temperature T1), Since there are no errors introduced by delays in obtaining thermal balance, the measurements can be performed on-line without significantly affecting the performance of the converter or interrupting its operation.
[0111] The advantage of steady state detection is therefore that it is not necessary to subject the converter to an electrical steady state condition in order to achieve a thermal steady state condition, in which the thermal steady state condition is detected during normal operation of the converter and, when detected, the measurement method proceeds.
[0112] Time interval t sampling is a multiple of the inverse of the switching frequency of the power converter, i.e., t sampling =n / f PWM For example, n=100, preferably n=10. For example, f PWM = 10 kHz, and t sampling is 10 μs, preferably 1 μs. In another example, n is the number of active semiconductor dies in the converter, and the temperature of each die is measured in turn every switching period.
[0113] In another example, the temperature T mean,j can be calculated using the arithmetic mean, median of the data samples Tnj,...,Tjm. The definition of standard deviation is an arbitrary definition of standard deviation commonly accepted in the field of statistical analysis.
[0114] Time interval t averaging is a time that is sufficiently long compared to the thermal constant of the power converter or area being investigated. It can be chosen a priori by performing thermal impedance measurements, measuring the time to reach a quasi-steady-state thermal condition, and taking a safety margin to account for possible thermal resistance degradation. For example, if the thermal constant of the power converter is 3 minutes, then t averaging t may be 1 minute for layers close to the die, and the time to reach metastable state is faster than the thermal constant of the power converter, about 3 minutes or even 9 minutes for a complete converter measurement. In another example, the thermal constant of the power converter is 30 seconds, and t averaging The time can be 15 to 30 seconds for the inner layer and less than 270 seconds for the complete conversion device.
[0115] Time interval t eval For example, t averaging For example, t eval =t averaging , or t eval =1.5*t averaging , or t eval =10*t averaging It is.
[0116] In a design in which the switches of the power units PU can be controlled independently of each other, in addition to measuring the thermal impedance between the power units and the heat sink, the coupling impedance between the power units PUi and the power units PUj (i ≠ j) can be measured by the sequence shown in FIG. 9C, which is: 1 / In step 300, turning off all PUj and keeping PUi active; 2 / In step 310, measuring the temperatures Ti of all PUi; 3 / In step 320, the temperature of the heat sink T HS and measuring 4 / At step 330, the temperature difference ΔTi = Ti - T HS Calculating 5 / In step 340, comparing ΔTi between the power units to detect changes in the coupling thermal resistance; Includes.
[0117] Optionally, the power dissipated in PU1 can be estimated.
[0118] This sequence may be repeated multiple times during the life of the product according to step 350 and may be applied successively to multiple PUi of all PUi of the PS.
[0119] Therefore, advantageously, one can measure the change in the thermal impedance of PUi and / or the coupling term with PUj (i≠j).
[0120] When a measurement sequence is applied successively to all PUi, the power Pi dissipated in PUi is measured or estimated, and a thermal steady state is obtained before starting the sequence, the data representation is constructed by arranging the temperature measurements in n matrices n×n, where if power is dissipated only in PU1:
number
number
number
[0121] A thermal resistance matrix including coupling terms (off-diagonal terms) is generated. Thus, by applying the method multiple times during the product's life, the thermal resistance R ii or coupling resistance R ij Changes in (i≠j) can be monitored.
[0122] An example of measuring the power dissipated in a PUi of a converter is to use an electrical model Pi of the PU(IL, Vbus, fPWM, Ti, α...), where IL is the measured load power, Ti is the measured temperature of PUi, Vbus is the known or measured bus voltage of PUi or the converter, fPWM is the switching frequency and α is the duty cycle.
[0123] Alternatively, without measuring the dissipated power, the ratio between the thermal resistance of PU1 and the coupling resistance with PUi is measured, and by placing the temperature measurements ΔTi into a vector gives:
number
[0124] Temperature ΔT for ΔT1 i By normalizing, we obtain a state vector D that represents the state of the thermal resistance coupling between PUi at the measurement instant t.
number
[0125] Thus, the disclosed method can provide a simple way to measure temperature parameters in power electronic systems where a semiconductor switch can be used in the off state to measure the temperature of a connection layer between such a semiconductor switch and a heat source or between such a semiconductor switch and another semiconductor switch in operation. The method can measure the contact degradation between a die and a common connection layer when probing the temperature of the last temperature dissipation layer underneath the opposite side of the die to such connection layer. The method is directed to power electronic conversion devices where individual semiconductor devices are independently driven, so that the temperature can be measured sequentially on each semiconductor with independently controllable gates, and where multiple dies share a thermal connection via layer Mj. This is typically the case in multi-chip configurations where multiple semiconductors are electrically connected in parallel to perform the function of a single switch and share current.
[0126] FIG. 10 provides a general flow chart of an online measurement method that provides for measurement 500 during the lifetime of the system, storage 510, comparison with previous measurements 530, providing a warning when a value such as thermal resistance or thermal resistance ratio exceeds a threshold 540, and repeating the measurement after a determined time delay 520.
[0127] With such a method, the temperature of individual switch devices in a multi-chip power module with different configurations can be measured to estimate the thermal resistance of the layer between one cold device and one hot device. Changes in thermal resistance with aging of the power module are correlated with the degradation of the layer.
[0128] The disclosed methods can be used in DC / DC power converters, AC / AC power converters, and DC / AC power inverters, especially those with parallel current conducting switches having switches with separate gate inputs, such as converters used in wind systems, photovoltaic inverters, electric vehicles, and traction applications.
Claims
1. A method for measuring temperature or thermal resistance in a power electronic system comprising at least a first power unit and a heat source thermally connected to a cooling means via a connection layer, the method comprising: providing a limited current to the first power unit while the first power unit is in an open state such that it does not dissipate heat, the limited current not allowing the first power unit to be in a power conducting state; measuring a temperature T1 of the first power unit using a thermal sensitive electrical parameter Tsep of the first power unit; and since the first power unit in an open state does not generate heat, the temperature T2 of the connection layer is measured. CL as equal to such first temperature T1.
2. The method of claim 1 , wherein the heat source is a second power unit.
3. The temperature T of the cooling means CM and measuring the temperature difference T1-T CM The method of claim 2 , further comprising:
4. Measuring a temperature T2 of the second power unit using TSEP of the second electronic unit; Said difference T1-T CM The difference T2-T CM Compare with The thermal resistance R between the second power unit and the connection layer 2-CL The thermal resistance R between the connection layer and the cooling means is calculated by the following calculation: CL-CM and comparing it with T1=T CL Therefore, R 2-CL / R CL-CM = (T CL -T CM ) / (T2-T CL )=(T1-T CM ) / (T2-T1), such calculation being independent of Q, Q being the heat flow value applied between the second power unit and the connection layer; The method of claim 3 further comprising:
5. The first power unit and the second power unit are semiconductor switches thermally connected to the connection layer Mj through a first stack of material layers M1, . . . , Mj-1, the cooling means being a heat sink, the connection layer being a material layer Mj+1 5. The method of claim 4, wherein the first stack is thermally connected to the heat sink via a second stack of Mn, . . . , Mn.
6. 6. The method of claim 5, wherein the first power unit and the second power unit are semiconductor switches, and the connection layer is a ceramic layer, such as a direct bond copper ceramic layer or an active metal brazing layer, attached directly to the heat sink or attached to the heat sink via a base plate BP.
7. the first power unit is a first half-bridge power unit comprising a first upper switch and a first lower switch, the first upper switch and the first lower switch having a die attached to a first ceramic layer, such as a direct bonded copper ceramic layer or an active metal braze layer DBC1, via a first die attach layer; the second electronic unit is a second half-bridge power unit comprising a second upper switch and a second lower switch, the first upper switch and the lower switch having a die attached to a second direct bonded copper ceramic layer DBC2 via a second die attach layer, the first direct bonded copper ceramic layer DBC1 and the second direct bonded copper ceramic layer DBC2 being attached to a common heat sink HS via a solder layer and a base plate layer BP; the method includes turning off both the first upper switch and the first lower switch of the first half-bridge power unit while the second upper switch and the second lower switch of the second half-bridge power unit are active; Measuring a temperature T2 of the second upper switch by the TSEP of the second upper switch; and measuring a temperature T1 of the first upper switch or the first lower switch by the TSEP of the first upper switch or the first lower switch by providing a limited current to the first upper switch or the first lower switch, the limited current not allowing the first upper switch unit to be in a power conducting state; and determining the temperature difference R between the second upper switch and the base plate by considering the temperature of the base plate to be equal to the temperature T1. 2-BP = T2 - T BP = T2 - T1; The temperature of the heat sink T HS Then, the ratio r2 = (T2 - T BP ) / (T BP -T HS ) to compare the thermal resistance of the second die attach layer, the second DBC layer, and the solder layer to the thermal resistance between the base plate and the heat sink; The method of claim 4 , comprising:
8. A method according to any one of claims 4 to 7, wherein each power unit is switched off in turn while the other power units are active.
9. 8. The method of claim 7, wherein the power electronics system comprises two or more half-bridge power units, and one of the half-bridges is turned off to provide a temperature measurement of the base plate while thermal resistance and thermal resistance ratio measurements are made on other of the half-bridges, each of the half-bridges being turned off in turn while the other half-bridge is active to provide a complete test of the half-bridge of the power electronics system.
10. The power electronics system comprises a first power module having a first pair of half-bridge power units, each having an upper switch and a lower switch and a DBC layer connected to a first base plate, and a second power module having a second pair of half-bridge power units, each having an upper switch and a lower switch and a DBC layer connected to a second base plate, the first base plate and the second base plate being attached via a thermal contact material to a heat sink HS in contact with a cooling fluid CF, the power electronics system further comprising an independent gate driver circuit for each of the switches, the method further comprising: determining the thermal resistance R between an upper switch or a lower switch of the first power module and the heat sink. PU1-HS and the thermal resistance R between the heat sink and the cooling fluid. HS-CF and measuring the thermal resistance by: All of the devices of the second power module are left open and the temperature T of the heat sink interface is calculated using the TSEP temperature measurement of one or a combination of the switches of the second power module. HS While the switching function of the power electronics system is performed by the switch of the first power module, the temperature T2 of at least one of the devices of the first power module is measured through its TSEP, and the temperature T CF and measuring Ratio r3=(T2-T HS ) / (T HS -T CF ) and comparing the thermal resistance of the first power module, the first base plate, and the first thermal contact material to the thermal resistance between the heat sink contact surface and the cooling fluid, the method further comprising performing the same step with the switch of the first power module open while the switching function of the power electronics system is performed by the switch of the second power module; and comparing by The method according to claim 4.
11. The method according to any one of claims 1 to 10, wherein the first power unit is brought into the open state during the measurement of temperature or thermal resistance.
12. A method for monitoring the thermal resistance of an electric power unit of a power electronic system, comprising obtaining an initial thermal resistance of such power unit by the method of any one of claims 4 to 11, storing said initial thermal resistance and a ratio between an initial thermal resistance between said power unit and said connection layer of such power unit and the thermal resistance between said connection layer and said cooling means, repeating the method during the life of the power electronic system to obtain further thermal resistances and further ratios, and comparing said further thermal resistances and said further ratios with said initial thermal resistance and said initial ratio to detect changes in thermal resistance and ratio.
13. The method of claim 12 , comprising comparing the change in thermal resistance to a predetermined threshold and issuing an alert if the value of the thermal resistance or the ratio exceeds the threshold.
14. The temperature Tj of at least one semiconductor device j of the power electronic system is sampling and storing said temperature Tj in memory; An integration time t of at least half of the thermal constant of the power converter averaging Then, using the data samples Tnj, . . . , Tmj, we calculate the time interval t eval At least the average temperature T mean,j and standard deviation σ mean,j periodically calculating At least the condition T mean,j > C1 x T HS , and σ mean,j <C2 × (T mean,j -T HS 11. Carrying out the measurement process according to any one of claims 4 to 10, when C1 is a constant greater than 1 and C2 is a constant less than 1, The method according to any one of claims 1 to 13, comprising:
15. 15. The method of claim 14, wherein C1 is a constant in the range of 1.1 to 5.
16. C2 is a constant between 0.2 and 0.05, and the condition σmean,j<C2*(Tmean,j-T HS 16. The method of claim 14 or 15, wherein: a condition is detected for detecting the steady state nature of the operation by comparing a standard deviation of the temperature samples to an average temperature differential between the semiconductor and the heat sink during the sampling time.
17. The time interval t sampling is a multiple of the reciprocal of the switching frequency of the power converter, i.e., t sampling = n / f PWM 17. The method of any one of claims 14, 15 or 16, wherein
18. The temperature T mean,j A method according to any one of claims 14 to 17, wherein Tnj,...,Tjm is calculated using the arithmetic mean or median of the data samples Tnj,...,Tjm.
19. The integration time t averaging The method according to any one of claims 14 to 18, wherein is greater than a thermal constant of the power electronics system.
20. The time interval t eval is, t averaging The method according to any one of claims 14 to 19, wherein the time interval is longer than
21. The switches of a power unit PUx are controlled independently of each other, x=1 to n, n being the total number of switches, and the method comprises measuring the coupling impedance between a power unit PUi and a power unit PUj (i≠j), the measurement comprising: 1 / switching off all the switches of the module PUj and keeping the switches of the module PUi active; 2 / Measuring said temperatures Tx of all modules PUx; 3 / the temperature T of the heat sink HS and measuring 4 / Temperature difference ΔTx=Tx−T HS Calculating 5 / Comparing said ΔTi with ΔTx, such as to detect changes in the coupling thermal resistance between modules; [0023] including performing the steps by a sequence including 11. The method of any one of claims 7, 9 or 10.
22. 22. The method of claim 21, wherein the sequence is repeated multiple times during the life of the product.
23. 23. A method according to claim 21 or 22, comprising measuring the power dissipated in the power unit PUi using an electrical model Pi (IL, Vbus, fPWM, Ti, α...) of such power unit, where IL is the measured load power, Ti is the measured temperature of PUi, Vbus is the known or measured bus voltage of the power unit PUi, fPWM is the switching frequency of such power unit and α is the duty cycle of such power unit, and calculating a coupling resistance as ΔTk / Pi.
24. Software comprising instructions which, when executed in a controller of the power system, implements the method of any one of claims 1 to 23.
25. 25. A computer readable non-volatile medium having recorded thereon the software of claim 24.
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