Fluid system, sample processing instrument, and method for delivering fluid within a sample processing instrument

Abstract

This application relates to a fluid system of a sample processing instrument, a sample processing instrument, and a method for delivering fluid within a sample processing instrument. The sample processing instrument includes a flow cell for the passage and processing of a sample. The fluid system includes a sheath supply pipeline connecting a sheath container to the flow cell, the sheath supply pipeline being provided with a sheath pump for pumping the sheath and a flow sensor for sensing the flow rate of the sheath supplied to the flow cell, a sample supply pipeline connecting a sample container to the flow cell, and a control device configured to control or adjust the flow rate of the sheath to a predetermined value based on the measurement value of the flow sensor.

Description

Technical Field

[0001] The present application relates to a fluid system of a sample processing instrument (e.g., a flow cytometer or analyzer), a sample processing instrument including the fluid system, and a method of delivering fluid within the sample processing instrument.

Background Art

[0002] This section merely provides background information related to the present disclosure, which is not necessarily prior art.

[0003] Sample processing instruments are typically used to analyze a liquid sample containing suspended particles (e.g., biological particles, non-biological particles) or cells and / or to sort particles or cells in the liquid sample. The stability of fluid (e.g., sample or sheath) delivery can affect the accuracy of the sample processing instrument. If the rate of fluid delivery is substantially constant or stable, the accuracy of the sample processing instrument can be improved. If the rate of fluid delivery varies significantly or is unstable, the accuracy of the sample processing instrument can be reduced. For example, within a sample processing instrument designed for full spectrum, signals can be mixed when the fluid delivery rate changes, thereby reducing accuracy.

[0004] Various factors can cause changes in the fluid delivery rate. For example, when the height of the container in which the fluid is stored changes, the gravitational potential energy can change. For example, a peristaltic pump is used to deliver fluid, but it can cause large fluctuations in the fluid. For example, a change in pressure within the fluid can cause a change in the velocity of the fluid.

Summary of the Invention

Means for Solving the Problems

[0005] This section provides a general overview of the present disclosure and is not an exhaustive disclosure of its full scope or all of its features.

[0006] An object of the present application is to provide a fluid system, a sample processing instrument, and a method capable of stably delivering a fluid (for example, a sample or a sheath) to a flow cell of the sample processing instrument.

[0007] According to an aspect of the present application, a fluid system of a sample processing instrument is provided. The sample processing instrument includes a flow cell for passage and processing of a sample. The fluid system includes a sheath supply pipeline connecting a sheath container to the flow cell, the sheath supply pipeline being provided with a sheath pump for pumping the sheath and a flow sensor for sensing the flow rate of the sheath supplied to the flow cell, a sample supply pipeline connecting a sample container to the flow cell, and a control device configured to control or adjust the flow rate of the sheath to a predetermined value based on the measurement value of the flow sensor.

[0008] In some examples according to the present disclosure, the control device is configured to control the sheath pump based on the measurement value of the flow sensor so that the flow rate of the sheath reaches a predetermined value.

[0009] In some examples according to the present disclosure, the control device is configured to feed the measurement value of the flow sensor to the sheath pump.

[0010] In some examples according to the present disclosure, the control device is configured to control the sheath pump by controlling a duty cycle.

[0011] In some examples according to the present disclosure, a damping device is provided on the sheath supply pipeline and is configured to reduce or eliminate fluctuations in the sheath within the sheath supply pipeline.

[0012] In some examples according to the present disclosure, the flow sensor is positioned downstream of the damping device.

[0013] In some examples according to the present disclosure, the fluid system further comprises an expansion pipeline for introducing gas into the damping device.

[0014] In some examples according to the present disclosure, the expansion pipeline is provided with a pump and an on-off valve for controlling the connection or disconnection of the expansion pipeline.

[0015] In some examples according to the present disclosure, the expansion line includes a first pipeline open to the ambient atmosphere and a second pipeline communicating with the sample supply pipeline. The on-off valve is disposed within the first pipeline and the pump is disposed within the second pipeline.

[0016] In some examples according to the present disclosure, the fluid system further includes a plunger pump and a reversing valve disposed on the sample supply pipeline. The reversing valve is configured to switch between a first state in which the sample container is communicated with the plunger valve and a second state in which the plunger pump is communicated with the flow cell.

[0017] In some examples according to the present disclosure, a degassing device is provided on the sheath supply pipeline and is configured to remove or discharge air bubbles in the sheath.

[0018] In some examples according to the present disclosure, the degassing device has a polymer film and is connected to a vacuum pump.

[0019] In some examples according to the present disclosure, the degassing device is positioned downstream of the damping device and upstream of the flow sensor.

[0020] In some examples according to the present disclosure, the fluid system further includes a sheath return pipeline for returning a portion of the sheath drawn from the sheath container by the sheath pump to the sheath container.

[0021] According to another aspect of the present disclosure, a sample processing instrument including the above fluid system is provided.

[0022] According to yet another aspect of the present disclosure, a method for delivering fluid within a sample processing instrument is provided. The method includes transporting a sheath within a sheath container to a flow cell of the sample processing instrument via a sheath supply pipeline; delivering a sample within a sample container to the flow cell via a sample supply pipeline; sensing, by a flow sensor, a flow rate of the sheath within the sheath supply pipeline; and controlling or adjusting the flow rate of the sheath supplied to the flow cell to a predetermined value based on a measurement value of the flow sensor.

[0023] In some examples according to the present disclosure, controlling or adjusting the flow rate of the sheath to a predetermined value includes controlling a sheath pump such that the flow rate of the sheath reaches the predetermined value.

[0024] In some examples according to the present disclosure, controlling or adjusting the flow rate of the sheath to a predetermined value includes feeding a measurement value of the flow sensor to the sheath pump.

[0025] In some examples according to the present disclosure, the sheath pump is controlled by controlling a duty cycle.

[0026] In some examples according to the present disclosure, the method further includes transporting the sheath within the sheath supply line to flow through a damping device.

[0027] In some examples according to the present disclosure, the method further includes introducing a gas into the damping device.

[0028] In some examples according to the present disclosure, introducing gas into the attenuation device includes opening an on-off valve in an expansion pipeline connected to the attenuation device, sucking the sheath out of the attenuation device by a pump, and sucking the gas into the attenuation device through the on-off valve.

[0029] In some examples according to the present disclosure, the method further includes passing the attenuation device through a sample supply pipeline via a pump.

[0030] According to another aspect of the present disclosure, the method further includes enabling the sheath in the sheath supply pipeline to flow through a degassing device.

[0031] In some examples according to the present disclosure, the method further includes enabling the degassing device to be under vacuum by a vacuum pump.

[0032] In some examples according to the present disclosure, before supplying the sample to the flow cell, the method further includes repeatedly pulling the sample from the sample container by a plunger pump provided in the sample supply pipeline and returning the sample into the sample container.

[0033] In some examples according to the present disclosure, the method further includes returning a part of the sheath drawn from the sheath container into the sheath container through a sheath return pipeline by a sheath pump.

[0034] The above and other objects, features, and advantages of the present disclosure will be more fully understood from the detailed description and the accompanying drawings given below, which are given by way of illustration only and thus should not be regarded as limiting the present disclosure.

Brief Description of the Drawings

[0035] The features and advantages of one or more embodiments of the present disclosure will become more readily apparent from the following description when taken in conjunction with the accompanying drawings.

[0036]

Figure 1

[0037]

Figure 2

[0038]

Figure 3

[0039]

Figure 4

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Figure 5

[0041]

Figure 6

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Figure 7

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Figure 9

DETAILED DESCRIPTION OF THE INVENTION

[0045] (Detailed Description of the Embodiment) Hereinafter, the present disclosure will be described in detail through exemplary embodiments with reference to the accompanying drawings. In some of the drawings, like reference numerals refer to like parts and components. The following detailed description of the present disclosure is for illustrative purposes only and is not intended to limit the present disclosure, its use, or its application in any way. The implementations described herein are not comprehensive and are merely some of many possible implementations. Exemplary embodiments can be embodied in many different forms and should not be construed as limiting the scope of the present disclosure. In some exemplary embodiments, well-known processes, well-known device structures, and well-known technologies may not be described in detail.

[0046] Before detailing at least one embodiment of the present application, it should be understood that the present application is not necessarily limited to the details of the structures and arrangements of the components described in the following description or illustrated in the accompanying drawings in its application. The present application is also applicable to other embodiments and combinations of the disclosed embodiments that can be practiced or implemented in various ways. In addition, it should be understood that the syntax and terminology employed herein are for illustrative purposes only and should not be regarded as limiting.

[0047] Unless explicitly indicated otherwise in the following discussion, throughout the specification, discussions using terms such as "control", "process", "calculate", "determine / judge", and "acquire" refer to actions and / or processes of a computer or a computing system or a similar electronic computing device, and the above actions and / or processes operate on data represented as physical quantities such as electronic in the registers or memories of the computing system, and are similarly represented as physical quantities in the memories, registers, or other such information storage, transmission, or display devices of the computing system, and it should be understood that they convert to other data.

[0048] The sample processing apparatus 1 will be described below with reference to FIG. 1. FIG. 1 is a functional block diagram of the sample processing apparatus 1. As shown in FIG. 1, the sample processing apparatus 1 includes a fluid system 10, a flow cell 20, a sample detection or processing unit 30, and a control device 40. The sample processing apparatus 1 is configured to deliver a sample into the flow cell 20, detect or process the sample in the flow cell 20, acquire information about the sample, or sort the sample, analyze or process the sample, and then clean the flow cell 20.

[0049] The fluid system 10 includes fluid pipelines for delivering various fluids and various control, adjustment, reversal, or sensing components (such as pumps, valves, pressure adjustment devices, sensors, etc.) arranged in the fluid pipelines. The fluids described in this specification may include samples to be analyzed, sorted, or otherwise processed, sheath fluids, cleaning agents, waste fluids, etc. The cleaning agent may vary according to the sample. For example, one or more different cleaning agents may be included according to the cleaning requirements. The waste fluid refers to a fluid that has been treated or cleaned.

[0050] The sheath fluid and the sample can be supplied into the flow cell 20 via the fluid system 10. Inside the flow cell 20, the sample is surrounded by the sheath fluid, whereby the particles or cells in the sample flow linearly one by one through the detection or processing area.

[0051] In the detection or processing area of the flow cell 20, the sample is detected or processed by the sample detection or processing unit 30. For example, the sample detection or processing unit 30 can measure the characteristics of the particles / cells in the sample, quantify the particles / cells with specific characteristics, and / or the sample detection or processing unit 30 can sort the particles / cells in the sample based on those characteristics. The sample detection or processing unit 30 can include various optical devices, electrical devices, and / or mechanical devices, etc., depending on the purpose of sample processing.

[0052] The control device 40 controls the operation of the sample processing instrument 1. Various functions, actions, or steps of the various systems, devices, components, or methods of the sample processing instrument according to the present disclosure are realized under the control of the control device 40. The control device 40 can be a separate control device or an integrated control device for each system, device, component, or method.

[0053] The fluid system of the sample processing instrument will be described below with reference to FIG. 2. FIG. 2 is a functional block diagram of the fluid system 10 of the sample processing instrument. The fluid system 10 connects various components, systems, or units of the sample processing instrument 1 and realizes the delivery and control of fluids. The fluid system 10 can include fluid pipelines for various fluids and components such as pumps, valves, sensors, etc. arranged in the fluid pipelines.

[0054] As shown in FIG. 2, the fluid pipeline of the fluid system 10 includes a sample supply pipeline T1 that connects the sample container C1 to the flow cell 20 to supply the sample in the sample container C1 into the flow cell 20; a sheath supply pipeline T2 that connects the sheath container C2 to the flow cell 20 to supply the sheath fluid in the sheath container C2 into the flow cell 20; a sample container cleaning pipeline T3 that connects the cleaning agent container C3 to the sample container C1 to clean the sample container C1 with a cleaning agent; a sheath cleaning pipeline T4 that connects the sheath container C2 to the sample container C1 to clean the sample container C1 with a sheath; a flow cell cleaning pipeline T5 that connects the cleaning agent container C3 to the flow cell 20 to clean the flow cell 20; a sample waste pipeline T6 that connects the sample container C1 to the waste fluid container C4 to discharge the waste fluid (e.g., the fluid after cleaning the sample container C1, etc.) from the sample container C1 to the outside; and a flow cell waste pipeline T7 that connects the flow cell 20 to the waste fluid container C4 to discharge the waste fluid (e.g., the sample after detection or treatment, the fluid after cleaning the flow cell, etc.) from the flow cell 20 to the outside. It should be understood that the fluid pipelines T1 - T7 can be completely independent of each other or can have a common pipeline section. Further, it should be understood that the fluid pipeline of the fluid system 10 can be varied as desired, for example, by adding additional fluid pipelines or omitting certain fluid pipelines.

[0055] The term "container" as described herein refers to a device used to contain a fluid, such as a glass bottle, well plate, test tube, plastic can, etc.

[0056] Furthermore, components such as pumps, valves, or sensors (not shown in FIG. 2) can be provided on the fluid pipelines T1 - T7. It should be understood that the components provided on each fluid pipeline can be selected, designed, or changed according to requirements.

[0057] A fluid system 100 according to an embodiment of the present application will be described in detail below with reference to FIG. 3. FIG. 3 is a schematic diagram of a fluid system 100 according to an embodiment of the present disclosure. The fluid system 100 is used to connect various fluid sources (fluid containers) to the flow cell 20 and to connect various fluid sources (fluid containers) to each other so as to realize or control the flow of fluid through the sample processing instrument. In the example of FIG. 3, in addition to the sample container C1, the sheath container C2, and the waste fluid container C4, the sample processing instrument further includes detergent containers C31, C32, and C33 for holding three detergents, respectively.

[0058] As shown in FIG. 3, the fluid system 100 includes a sample supply pipeline T1, a sheath supply pipeline T2, detergent cleaning pipelines T31 and T32, a sheath cleaning pipeline T4, a sample waste pipeline T6, and a flow cell waste pipeline T7, as described above with reference to FIG. 2.

[0059] The sample supply pipeline T1 connects the sample container C1 to the flow cell 20. A reversing valve VL1 and a plunger pump PP1 are provided on the sample supply pipeline T1. The reversing valve VL1 is configured to be switched between a first state in which the sample container C1 is communicated with the plunger valve PP1 and a second state in which the plunger pump PP1 is communicated with the flow cell 20.

[0060] When the reversing valve VL1 is in the first state in which the sample container C1 is communicated with the plunger pump PP1, the plunger pump PP1 can suck the sample in the sample container C1 into the sample supply pipeline T1. When the reversing valve VL1 is in the second state in which the plunger pump PP1 is communicated with the flow cell 20, the plunger pump PP1 can pump the sample in the sample supply pipeline T1 into the flow cell 20. In this way, the sample can be supplied from the sample container C1 into the flow cell 20 by switching the reversing valve VL1.

[0061] In addition, when the check valve VL1 is in the first state where it connects the sample container C1 to the plunger pump PP1, as shown in FIGS. 3 and 5, the plunger pump PP1 can suck the sample in the sample container C1 into the sample supply pipeline T1 and then push the sample in the sample supply pipeline T1 back into the sample container C1. The suction and push actions of the plunger pump PP1 can be repeated several times so that the sample in the sample container C1 is sufficiently mixed. For example, it is advantageous to uniformly mix the sample before sample detection.

[0062] In the example of FIG. 3, the check valve VL1 is in the form of a rotary valve. It should be understood that the check valve VL1 can be a means in any other form as long as it can perform the functions described herein.

[0063] In the example of FIG. 3, the plunger pump PP1 is used. It should be understood that any other suitable type of pump, such as a peristaltic pump, can be used instead of the plunger pump.

[0064] Referring to FIGS. 3 and 6, the sheath supply pipeline T2 connects the sheath container C2 to the flow cell 20. The sheath pump P1 and the flow sensor S1 are provided on the sheath supply pipeline T2. The sheath pump P1 is used to pump the sheath fluid out from the sheath container C2. The pumped sheath fluid can be transported into the flow cell 20 or the sample supply pipeline T1 for sample processing or cleaning. The sheath pump P1 can be any suitable type of pump, such as a peristaltic pump, as long as it can perform the functions described herein. The flow sensor S1 is configured to sense the flow rate of the sheath fluid supplied into the flow cell 20. The flow sensor S1 can be arranged adjacent to the flow cell 20, for example. The measured value of the flow sensor S1 (i.e., the measured flow rate of the sheath fluid) can be fed back to a control device (e.g., the control device 40 as described above). The control device controls or adjusts the flow rate of the sheath fluid based on the measured value of the flow sensor S1 so that the flow rate of the sheath is substantially constant, for example, at a predetermined value.

[0065] The sheath pump P1 can be a variable displacement pump. The control device can control or adjust the sheath pump P1 based on the measured value of the flow sensor S1. For example, when the measured flow rate of the sheath fluid is lower or higher than a predetermined value, it is possible to increase or decrease the rotational speed, voltage, etc. of the sheath pump P1.

[0066] As shown in FIGS. 3 and 6, the control device can feed back the measured value of the flow sensor S1 to the sheath pump P1. The sheath pump P1 can be configured to be automatically adjusted in response to the received measured value. The sheath pump P1 can be adjusted or controlled by controlling the duty cycle. For example, the rotational speed of the sheath pump P1 can be adjusted by the duty ratio.

[0067] It should be understood that the method for controlling or adjusting the flow rate of the sheath fluid is not limited to the specific examples shown.

[0068] For example, in one example shown in FIG. 7, the throttle device 15 can be provided within the sheath fluid supply line T2. The control device can adjust the opening degree of the throttle device 15 according to the measured value of the flow sensor S1, thereby adjusting the flow rate of the sheath fluid.

[0069] For example, in one example shown in FIG. 8, the control device can vary the flow rate of the sheath fluid by adjusting the pressure within the sheath fluid supply line T2. In this example, a pressure sensor S2 can be provided to sense the pressure of the gas within the damping device D1. The sheath pump P1 can be adjusted in terms of the speed of rotation by a duty cycle, thereby adjusting the pressure of the gas within the damping device D1 such that the feedback pressure reaches a predetermined constant flow valve.

[0070] The flow sensor S1 can provide real-time feedback on the flow rate of the sheath fluid, and the control device can automatically and quickly adjust the flow of the sheath fluid according to the feedback flow rate. The closed-loop control of the flow rate of the sheath fluid can ensure that the sheath fluid is stably supplied to the flow cell 20 at a predetermined flow rate, and the accuracy of the sample processing instrument can be improved.

[0071] The damping device D1 can be further provided on the sheath supply pipeline T2. The damping device D1 is configured to reduce or eliminate fluctuations in the sheath fluid through the sheath supply pipeline T2. The damping device D1 can be arranged upstream of the flow sensor S1. That is, the flow sensor S1 is closer to the flow cell 20 in the fluid flow direction than the damping device D1. In this way, the flow rate of the sheath fluid can be controlled more accurately.

[0072] In the example of FIG. 3, the damping device D1 is a gas damping device, and its damping medium is gas. The damping device D1 has a sheath inlet 11 and a sheath outlet 12. The sheath inlet 11 and the sheath outlet 12 are connected to the sheath supply pipeline T2 such that the sheath fluid from the sheath container C1 enters the damping device D1 through the sheath inlet 11 and flows out of the damping device D1 through the sheath outlet 12. The sheath fluid flowing out of the damping device D1 can flow into the flow cell 20 through the flow sensor S1. The damping device D1 is filled with gas (e.g., air). The flow fluctuations of the sheath fluid can be eliminated or reduced under the pressure of the gas.

[0073] The fluid system 100 may further include an expansion pipeline T8 for introducing gas into the damping device D1. The gas can be added to the damping device D1 through the expansion pipeline T8 when it is necessary to ensure the damping effect on the sheath fluid, that is, to eliminate or reduce the flow fluctuations of the sheath fluid.

[0074] In the examples shown in FIGS. 3 and 9, a pump PP3 is provided. The pump PP3 is configured to draw a part of the sheath fluid out of the damping device D1, thereby drawing gas into the damping device D1. The expansion pipeline T8 may include a first pipeline communicating the ambient atmosphere and the damping device D1, and a second pipeline connecting the damping device D1 and the pump PP3. An on-off valve VL2 and a filter F1 are provided in the first pipeline. When gas needs to be supplied to the damping device D1, the on-off valve VL2 is opened to allow the gas to pass through the first pipeline and enter the damping device D1. When it is not necessary to supply gas to the damping device D1, the on-off valve VL2 is closed to prevent the gas from passing through the first pipeline into the damping device D1. The filter F1 is used to filter impurities in the gas so as not to contaminate the sheath fluid.

[0075] In the example shown in FIG. 3, the expansion pipeline T8 and the sheath cleaning pipeline T4 share the pump PP3 and have a common pipeline section. The pump PP3 can be connected to the sample supply pipeline T1. As shown in FIG. 3, the pump PP3 can be connected to the sample supply pipeline T1 via the pump PP1. In this way, the pump PP3 can deliver the sheath fluid into the sample container C1 or the flow cell 20 via the sample supply pipeline T1 in order to clean not only the sample supply pipeline T1 but also the sample container C1 or the flow cell 20. In the example of FIG. 3, the pump PP3 is in the form of a plunger pump. It should be understood that the pump PP3 can be any other suitable type of pump as long as it can perform the functions described herein.

[0076] It should be understood that the fluid system according to the present application is not necessarily limited to the specific examples shown. For example, the expansion pipeline T8 and the sheath cleaning pipeline T4 can have their own separate pumps and pipeline sections.

[0077] A degassing device 14 can be further provided on the sheath supply pipeline T2. The degassing device 14 can be located downstream of the damping device D1. In this way, the degassing device 14 can effectively remove or degas the sheath fluid (especially the sheath fluid discharged from the damping device D1) so as to avoid any air bubbles generated in the fluid pipeline. The degassing device 14 can be located upstream of the flow sensor S1. In this way, the measurement accuracy of the flow sensor S1 can be ensured.

[0078] In one example, the degassing device 14 can have a polymer membrane for separating gas and can be connected to a vacuum pump P2. The vacuum pump P2 generates a vacuum inside the degassing device 14, thereby promoting the discharge of gas. In one example, the operation of the vacuum pump P2 can be automatically controlled in a closed-loop manner.

[0079] The fluid system 100 may further include a sheath return pipeline T9. The sheath return pipeline T9 connects the sheath supply pipeline T2 to the sheath container C2 such that a portion of the sheath fluid flowing within the sheath supply pipeline T2 returns to the sheath container C2. The sheath return pipeline T9 may be connected to the sheath supply pipeline T2 downstream of the sheath pump P1. In this way, the fluctuations caused by the sheath pump P1 that pumps the sheath fluid can be eliminated or reduced.

[0080] The detergent cleaning pipeline T31 connects the detergent containers C31 and C32 to the sample supply pipeline T1. The detergents within the detergent containers C31 and C32 can be selectively selected as needed. The detergent within the detergent container C31 or C32 can be selectively supplied to the sample supply pipeline T1 through the first sample container cleaning pipeline T31 by means of the reversing valve VL3.

[0081] When the reversing valve VL1 is in the first state that connects the sample container C1 to the plunger pump PP1, the detergent within the sample supply pipeline T1 is supplied to the sample container C1 and can clean the sample supply pipeline T1 and the sample container C1. At this point, the detergent cleaning pipeline T31 is used as the sample container cleaning pipeline T3 described with reference to FIG. 2.

[0082] When the reversing valve VL1 is in the second state that connects the flow cell 20 to the plunger pump PP1, the detergent within the sample supply pipeline T1 is supplied to the flow cell 20 and can clean the sample supply pipeline T1 and the flow cell 20. At this point, the detergent cleaning pipeline T31 is used as the flow cell cleaning pipeline T5 described with reference to FIG. 2.

[0083] The cleaning agent cleaning pipeline T32 connects the cleaning agent container C33 to the flow cell 20. The cleaning agent in the cleaning agent container C33 is directly supplied into the flow cell 20 via the second sample container cleaning pipeline T32 and can clean the flow cell 20. Therefore, the cleaning agent cleaning pipeline T32 is also used as the flow cell cleaning pipeline T5 described with reference to FIG. 2.

[0084] The pump PP2 can be provided on the first sample container cleaning pipeline T31. The pump P3 can be provided on the second sample container cleaning pipeline T32. It should be understood that the pump PP2 and the pump P3 can be of any other suitable type, can be the same, or can be different.

[0085] It should be understood that the fluid system according to the present application should not be limited to the specific examples shown in the drawings. For example, various components such as filters, switching devices, and direction-changing devices can be further provided on the various fluid pipelines described above according to requirements. For example, the type, number, location, etc. of the various components on the fluid pipeline can be varied as desired. For example, the fluid system can, as needed, add additional fluid pipelines (e.g., a bypass pipeline T11 as shown in FIG. 3, a discharge pipeline T12 for discharging the fluid in the sample supply pipeline into the waste container, or a cleaning pipeline T13 for cleaning the outside of the sample pin with sheath fluid), or omit fluid pipelines.

[0086] The method of delivering fluid within a sample processing instrument according to the present application will be described below with reference to FIG. 4. FIG. 4 is a schematic flowchart of a method of delivering fluid within a sample processing instrument according to an embodiment of the present application.

[0087] As shown in FIG. 4, when the sample processing instrument is in operation, the sheath fluid and the sample are delivered into the flow cell 20 (step S12). As described above, the sheath fluid in the sheath container C2 is transported to the flow cell 20 of the sample processing instrument 1 via the sheath supply pipeline T2, and the sample in the sample container C1 is transported to the flow cell 20 via the sample supply pipeline T1. Next, the process proceeds to step S16, where the flow rate of the sheath fluid in the sheath supply pipeline T2, i.e., the flow rate of the sheath fluid supplied to the flow cell 20, is sensed by the flow sensor S1. The sheath flow rate sensed by the flow sensor S1 can be transmitted to the control device (step S17). The control device controls or adjusts the flow rate of the sheath fluid supplied to the flow cell 20 to a predetermined value based on the measured value of the flow sensor S1 (step S18). In this way, the fluid system 100 always delivers the sheath fluid into the flow cell 20 at a predetermined flow rate.

[0088] In one example, as described above, the measured value of the flow sensor S1 can be fed back to the sheath pump P1, and the sheath pump P1 can be controlled or adjusted so that the flow rate of the sheath fluid reaches a predetermined value or a desired value. In one example, the sheath pump P1 can be controlled by controlling the duty cycle. In this case, the control device can be integrated into the sheath pump P1.

[0089] Optionally, before delivering the sample, the sample can be repeatedly drawn from the sample container C1 and returned to the sample container C1 by the plunger pump PP1 and the reversing valve VL1 (step S11). In this way, the sample can be properly mixed prior to detection, thereby improving the efficiency and accuracy of the sample processing instrument.

[0090] Optionally, a portion of the sheath fluid drawn from the sheath container C2 by the sheath pump P1 can be returned to the sheath container C2 via the sheath return pipeline T9 (step S13). In this way, the fluid fluctuations caused by the pumping action of the sheath pump can be eliminated or reduced.

[0091] Optionally, the sheath fluid in the sheath supply pipeline T2 can flow through the damping device D1 (step S14). Through the damping effect of the damping device D1, the fluctuations of the sheath fluid can be eliminated or reduced. In one example, as described above, the damping device D1 can be a gas damping device. In this example, gas can be introduced into the damping device (step S21) to ensure the damping effect of the damping device D1. Referring to FIG. 3, when the damping device D1 needs to be expanded, the on-off valve VL2 in the expansion pipeline T8 is opened. The sheath fluid can be pumped by the pump PP3 from the damping device D1 through the second pipeline of the expansion pipeline T8, and the gas can be sucked into the damping device D1 through the first pipeline of the expansion pipeline T8.

[0092] Optionally, the sheath fluid in the sheath supply pipeline T2 can flow through the degassing device 14 (step S15). In one example, the degassing device 14 can be placed under vacuum by the vacuum pump P2 to promote the discharge of gas. In one example, the vacuum pump P2 can be controlled in a closed-loop manner. That is, it is possible to detect the degassing device 14 or the pipeline from the degassing device 14 to the vacuum pump P2, feedback the detection result, and control or adjust the vacuum pump P2 based on the feedback detection result.

[0093] Optionally, the attenuation device D1 can be connected to the sample supply pipeline T1 via a pump (step S19). As described above, the sheath can be drawn from the attenuation device D1 by the pump PP3. When the attenuation device D1 is connected to the sample supply pipeline T1, the extracted sheath fluid can be supplied, for example, for cleaning, through the sample supply pipeline T1 to the sample container C1 or the flow cell 20.

[0094] It should be understood that the method according to the present application should not be limited to the examples described above and shown in the accompanying drawings, and can be varied according to requirements. For example, the various steps of the method are not necessarily implemented in the order described, and can be adjusted as necessary without contradiction. For example, the method shown can have additional steps added or steps omitted as desired.

[0095] The above system or method can be implemented by a control device (e.g., the control device 40 shown in FIG. 1). The control device can include, in the present application, a processor implemented as a computer or a computing system. The method of operating and cleaning the sample processing instrument described herein, and the method of monitoring the cleaning of the sample processing instrument, can be implemented by one or more computer programs executed by a processor of a computer. The computer program includes processor-executable instructions stored on a non-transitory tangible computer-readable medium. The computer program can further include stored data. Non-limiting examples of non-transitory tangible computer-readable media are non-volatile memory, magnetic storage devices, and optical storage devices.

[0096] The term "computer-readable medium" does not include transient electrical or electromagnetic signals propagated through a medium, such as on a carrier wave; that is, the term "computer-readable medium" can thus be considered tangible and non-transitory. Non-limiting examples of non-transitory tangible computer-readable media are non-volatile memory (such as flash memory, erasable programmable read-only memory, or mask read-only memory), volatile memory (such as static random access memory circuits or dynamic random access memory), magnetic storage media (such as analog or digital magnetic tape or hard drive), and optical storage media (such as CD, DVD, or Blu-ray Disc).

[0097] This application is described with reference to exemplary embodiments, but it should be understood that the application is not limited to the specific embodiments described and illustrated herein. Without departing from the scope defined by the claims, those skilled in the art can make various changes to the exemplary embodiments. Assuming no contradiction, the features in various embodiments can be combined with each other. Alternatively, a certain feature in an embodiment can also be omitted.

Claims

1. 1. A fluidic system of a sample processing device comprising a flow cell for the passage and processing of a sample, the fluidic system comprising: a sheath supply pipeline connecting a sheath container to the flow cell, the sheath supply pipeline being provided with a sheath pump for pumping sheath and a flow sensor for sensing a flow rate of the sheath supplied to the flow cell; a sample supply pipeline connecting a sample container to the flow cell; a control device configured to control or adjust the flow rate of the sheath to a predetermined value based on measurements from the flow sensor; Equipped with an attenuation device is provided on the sheath supply pipeline, the attenuation device configured to reduce or eliminate fluctuations of the sheath within the sheath supply pipeline; The fluid system further comprises an expansion pipeline for introducing gas into the attenuation device, the expansion line comprising a first pipeline open to the ambient atmosphere and a second pipeline communicating with the sample supply pipeline.

2. The fluid system of claim 1 , wherein the control device is configured to control the sheath pump based on the measurement value of the flow sensor so that the flow rate of the sheath reaches the predetermined value.

3. the control device is configured to feed the measurements of the flow sensor to the sheath pump; and / or The fluid system of claim 2 , wherein the control device is configured to control the sheath pump by controlling a duty cycle.

4. the flow sensor is positioned downstream of the attenuation device; and / or The expansion pipeline is provided with a pump and an on-off valve for controlling the connection or disconnection of the expansion pipeline, in particular The on-off valve is arranged in the first pipeline and the pump is arranged in the second pipeline, in particular 4. The fluid system of claim 1, further comprising a plunger pump and a reversing valve disposed on the sample supply pipeline, the reversing valve being configured to be switched between a first state in which the sample container is connected to the plunger valve and a second state in which the plunger pump is connected to the flow cell.

5. 4. The fluid system according to claim 1, wherein a degassing device is provided on the sheath supply pipeline and configured to eliminate or expel air bubbles in the sheath.

6. the degassing device comprises a polymer film and is connected to a vacuum pump; or The fluid system of claim 5 , wherein the degassing device is positioned downstream of the damping device and upstream of the flow sensor.

7. The fluid system of any one of claims 1 to 3, further comprising a sheath return pipeline for returning a portion of the sheath drawn from the sheath container by the sheath pump to the sheath container.

8. A sample processing device comprising a fluid system according to any one of claims 1 to 3 and a flow cell, wherein a sample and a sheath are supplied into the flow cell through the fluid system.

9. 1. A method of delivering a fluid in a sample processing device, the method comprising: transporting the sheath in a sheath container via a sheath supply pipeline to a flow cell of the sample processing instrument; delivering a sample in a sample container to the flow cell via a sample supply pipeline; sensing a flow rate of sheath in the sheath supply pipeline with a flow sensor; controlling or adjusting the flow rate of the sheath supplied to the flow cell to a predetermined value based on measurements of the flow sensor; transporting the sheath within the sheath supply line so as to flow through an attenuation device; introducing a gas into the attenuation device; passing the attenuation device through the sample supply pipeline via a pump; A method comprising:

10. 10. The method of claim 9, wherein controlling or regulating the flow rate of the sheath to the predetermined value comprises controlling the sheath pump such that the flow rate of the sheath reaches the predetermined value.

11. controlling or regulating the flow rate of the sheath to the predetermined value includes feeding the measurement of the flow sensor to the sheath pump; and / or The method of claim 10 , wherein the sheath pump is controlled by controlling a duty cycle.

12. Introducing a gas into the attenuation device comprises: opening an on-off valve in an expansion pipeline connected to the attenuation device; aspirating a sheath out of the attenuation device with the pump; drawing gas into the attenuation device through the on-off valve; The method according to any one of claims 9 to 11, comprising:

13. The method of any one of claims 9 to 11, further comprising allowing the sheath in the sheath supply pipeline to flow through a degassing device.

14. 14. The method of claim 13, further comprising: enabling the degassing device to be under vacuum with a vacuum pump.

15. and / or, before supplying the sample to the flow cell, repeatedly drawing the sample from the sample container and returning the sample to the sample container by a plunger pump provided in the sample supply pipeline. The method of any one of claims 9 to 11, further comprising returning a portion of the sheath drawn from the sheath container by the sheath pump back into the sheath container via a sheath return pipeline.

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