Multi-piece slit valve gate
The multi-piece slit valve gate design addresses seal replacement and coating challenges by enabling individual seal replacement and coating, enhancing sealing and reducing downtime and costs in vacuum processing systems.
Patent Information
- Application Number
- JP2025500820
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2022-07-28
- Filing Date
- 2023-07-26
- Publication Date
- 2025-08-01
AI Technical Summary
Conventional slit valve gates in vacuum processing systems face challenges with seal replacement complexity, difficulty in applying protective coatings, and increased downtime due to integrated seals that cannot be easily replaced or coated, leading to inefficiencies and higher costs.
A multi-piece slit valve gate design comprising a base portion, seal portion, and clamp portion, where the seal is individually replaceable and can be coated separately, allowing for improved sealing and reduced downtime by enabling protective coatings without masking, and enhancing resistance to contaminants.
The multi-piece design allows for easier seal replacement and application of protective coatings, reducing equipment downtime and costs while improving sealing ability and environmental protection in substrate processing.
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Figure 2025524790000001_ABST
Abstract
Description
Technical Field
[0001] Embodiments of the present disclosure generally relate to the field of substrate processing systems, and more particularly, to multi-piece slit valve gates.
Background Art
[0002] Substrates are generally processed in a vacuum processing system. These systems include one or more chambers, each chamber capable of performing substrate processing operations such as etching, chemical vapor deposition, or physical vapor deposition, which can include heating or cooling the substrate and plasma to assist the process. Typically, the environment within such a process chamber is maintained at a low sub-atmospheric pressure. Each chamber includes an inlet and an outlet for evacuation and intake of process gases, and an aperture controlled by a slit valve for inserting the substrate. Such a processing chamber may communicate with a substrate transfer chamber, which may also have a valve-controlled aperture through which a substrate can be inserted from outside the system.
[0003] The slit valve that opens and closes the aperture is generally housed within a port disposed between adjacent chambers. The port generally houses at least one gate coupled to an actuator used to operate it. The actuator can be a pneumatic actuator that includes one or more pistons for moving the gate from an open position (where the gate does not separate one chamber from an adjacent chamber and the aperture is open) to a closed position (where the gate separates one chamber from an adjacent chamber and the aperture is closed), and vice versa.
Summary of the Invention
[0004] In some embodiments, the present disclosure is directed to a slit valve gate that includes a base portion configured to couple to a slit valve actuator. The slit valve gate further includes a seal portion coupled to the base portion. The seal portion is configured to create an airtight seal between the slit valve gate and a sealing surface of the slit valve opening. The slit valve gate further includes a clamp portion coupled to the base portion. The clamp portion at least partially holds the seal portion between the clamp portion and the base portion.
[0005] In some embodiments, the present disclosure is directed to a slit valve that includes a slit valve opening and a slit valve actuator. The slit valve further includes a slit valve gate coupled to the slit valve actuator. The slit valve gate is configured to seal the slit valve opening in response to the slit valve actuator moving the slit valve gate to a closed position. The slit valve gate includes a base portion. The slit valve gate is coupled to the slit valve actuator via the base portion. The slit valve gate further includes a seal portion coupled to the base portion. The seal portion is configured to create an airtight seal between the slit valve gate and a sealing surface of the slit valve opening in response to the slit valve actuator moving the slit valve gate to a closed position. The slit valve gate further includes a clamp portion coupled to the base portion. The clamp portion at least partially holds the seal portion between the clamp portion and the base portion.
[0006] In some embodiments, the present disclosure is directed to a method. The method includes coupling a seal portion of a slit valve gate to a base portion of the slit valve gate. The seal portion is configured to create an airtight seal between the slit valve gate and a sealing surface of a slit valve opening. The method further includes coupling a clamp portion of the slit valve gate to the base portion. The coupling of the clamp portion to the base portion causes the clamp portion to at least partially hold the seal portion between the clamp portion and the base portion.
[0007] The present disclosure is shown by way of example and not limitation in the figures of the accompanying drawings in which like reference numerals indicate like elements. It should be noted that references to "an" embodiment or "one" embodiment in the present disclosure are not necessarily references to the same embodiment, and such references mean at least one.
Brief Description of the Drawings
[0008]
Figure 1
Figure 2
Figure 3A
Figure 3B
Figures 4A-4B
Figure 5
Modes for Carrying Out the Invention
[0009] Semiconductor substrates and other substrates are generally processed in a vacuum processing system and transferred between one or more chambers through apertures controlled by a slit valve assembly. These slit valve assemblies generally include at least one gate coupled to an actuator used to operate the gate. The actuator can be a full-stroke pneumatic actuator that includes one or more pistons for moving the gate from an open position (where the gate does not separate one chamber from an adjacent chamber) to a closed position (where the gate separates one chamber from an adjacent chamber) and vice versa. Other types of actuators can also be used.
[0010] The slit valve assembly generally includes a seal adhered to the base portion of the gate. Conventionally, the seal is overmolded onto the base portion. Thus, the seal of a conventional slit valve gate cannot be easily replaced. When the seal of a conventional slit valve gate fails, the entire gate assembly is replaced. Further, due to the overmolded nature of the conventional slit valve gate seal, it is difficult to add a protective coating to the slit valve gate. For example, to apply a protective coating to a conventional slit valve gate, the sealing surface of the adhered seal is masked. Masking the adhered seal adds complexity and cost to the process of manufacturing the slit valve gate.
[0011] The present disclosure relates to a multi-piece slit valve gate including a base portion, a seal portion, and a clamp portion. In some embodiments, the slit valve gate is configured to couple to a slit valve actuator via the base portion. A seal portion (e.g., a seal, an elastomeric seal, etc.) of the slit valve gate is coupled to the base portion. When the actuator moves the slit valve gate to a closed position (e.g., moves the slit valve gate to cover and seal the slit valve opening), the seal is configured to create an airtight seal between the slit valve gate and the slit valve opening. Thus, the seal is for sealing the slit valve opening. The seal is held in the base portion by the clamp portion. The clamp portion is coupled to the base portion (e.g., by one or more mechanical fasteners). The seal is held between the clamp portion and the base portion. In some embodiments, the clamp portion includes a flange that holds the seal in a groove formed by the clamp portion and the base portion.
[0012] By providing the multi-piece slit valve gate of the present disclosure, many improvements can be realized. For example, the plurality of components of the slit valve gate described herein (e.g., the base portion, the clamp portion, etc.) can be individually coated with a protective coating, unlike conventional slit valve gates. This enables the application of a protective coating to the components of the slit valve gate that can optimize the resistance of the slit valve gate to harmful gases or the environment to which it is exposed. The protective coating can be applied without masking, which is used to coat conventional slit valve gates. Further, the seal portion (e.g., the seal) of the slit valve gate described herein is individually replaceable, unlike the seal of a conventional slit valve gate (e.g., the seal can be replaced without replacing the rest of the slit valve gate). This results in less equipment downtime and lower costs when compared to conventional slit valve gates. Further, the slit valve gate described herein can have improved sealing ability when compared to conventional slit valve gates. As an example, the multi-piece slit valve gate can better protect against the entry or discharge of contaminants, at least partially, since the seal portion can be replaced as soon as it begins to degrade, thereby improving the environment for substrate processing and reducing material consumption (e.g., gases, etc.) when compared to conventional slit valve gates.
[0013] FIG. 1 shows a top schematic view of a substrate processing system 100 according to an embodiment of the present disclosure. The substrate processing system 100 may include a factory interface 162 (also referred to as an “equipment front end module (EFEM)”) according to the embodiments described herein, a main frame 150 (also referred to as a transfer chamber), one or more processing chambers 155, and one or more load lock chambers 156. The main frame 150 may be connected to the factory interface 162 via one or more load lock chambers 156. A substrate carrier 164 may be detachably connected to the front wall of the factory interface 162. The factory interface 162 may include a factory interface robot 161 for moving a substrate 101 and / or other objects (such as a process kit ring, shown by a dotted line for illustrative purposes) between the substrate carrier 164 and the load lock chamber 156. For example, the factory interface 162 may include one or more load ports, and each load port may receive the substrate carrier 164. An overhead track (OHT) may drop a front opening unified pod (FOUP) onto the load port. The factory interface robot 161 may pick up the substrate 101 from the FOUP and optionally align the substrate 101 in an aligner (not shown). Subsequently, the factory interface robot 161 may place the substrate 101 into the load lock chamber 156. Thereafter, a main frame robot 150 (located in the main frame 150) may pick up the substrate 101 from at least one of the load lock chambers 156 and transfer the substrate 101 to at least one of the one or more processing chambers 155.
[0014] As the manufacturing process progresses, the factory interface robot 161 and the main frame robot 150 can operate in cooperation to move the substrate 101 and / or other objects between the substrate carrier 164 and the processing chamber 155. Various electronic device fabrication processes, such as oxidation, thin film deposition, etching, heat treatment, degassing, cooling, etc., can be performed within the process chamber 155 for semiconductor device manufacturing processes.
[0015] After the processing in at least one of the one or more processing chambers 155 is completed, the processed substrate 101 can be picked up by the main frame robot 150 and delivered to at least one of the load lock chambers 156. At least one of the load lock chambers 156 can raise its pressure to atmospheric pressure, and then the processed substrate 101 can be picked up by the factory interface robot 161 and returned into the FOUP. After all the substrates from the substrate carrier 164 have been processed, the OHT (not shown) can pick up the FOUP and drop it using different tools as per the designed manufacturing process.
[0016] The substrate 101 and / or other objects are transferred between adjacent stations (e.g., between the main frame 150 and the process chamber 155, between the load lock chamber 156 and the main frame 150, between the factory interface 162 and the load lock chamber 156, etc.) through at least one gate that is part of a slit valve assembly that can be stored in the port 175. The slit valve assembly according to some embodiments will be described in more detail with respect to FIG. 2. Each slit valve (or gate) is capable of transitioning from a closed position to an open position and vice versa. In the closed position, the slit valve (or gate) separates one station from an adjacent station. In the open position, the slit valve (or gate) does not separate one station from an adjacent station, and objects can be transferred from one station to an adjacent station through the open apertures on two opposite sides of the port 175. The slit valve may include a multi-piece gate as described in some embodiments herein (e.g., the gate may include a seal portion coupled to a base portion).
[0017] As used herein, the term "station" refers to a chamber in which an object, such as a wafer, being transferred through a wafer processing system can be temporarily stored. As used herein, a station can be separated from other parts of the substrate processing system by at least one gate.
[0018] FIG. 2 shows a simplified perspective view of a slit valve device according to an embodiment of the present disclosure. The slit valve device may include a slit valve assembly 200 that can be stored in the port 175 shown in FIG. 1. In some embodiments, the slit valve device includes a plurality of slit valve assemblies, and each of the slit valve assemblies is stored in one of the ports 175.
[0019] In some embodiments, the slit valve assembly 200 includes at least one gate 210 configured to transition between an open position and a closed position (e.g., as shown in FIG. 2). The slit valve assembly 200 may further include a slit valve control mechanism including at least one actuator 215 coupled to the gate 210 via a movable member. The actuator 215 may be configured to apply a force to the gate 210. In some embodiments, the actuator 215 is a pneumatic actuator configured to pneumatically move the gate 210 from the open position to the closed position, or vice versa. In some embodiments, the actuator 215 is an electric actuator, a mechanical actuator, or another type of actuator.
[0020] (e.g., as shown in FIG. 2) While in the closed position, the slit valve gate 210 may seal an opening formed in the surface 270. The opening formed in the surface 270 may be the slit valve opening described herein. The seal portion of the gate 210 may connect with the sealing surface of the surface 270 to create an airtight seal. In some embodiments, the seal portion may elastically deform when the actuator 215 moves the gate 210 to the closed position. The elastic deformation of the seal portion may create the airtight seal described herein. The airtight seal may prevent contaminants or gases from passing through the slit valve opening.
[0021] FIG. 3A shows a simplified perspective view of a slit valve gate 300 according to an embodiment of the present disclosure. FIG. 3B shows a simplified perspective view of a disassembled slit valve gate 300 according to an embodiment of the present disclosure. In some embodiments, the slit valve gate 300 includes a base portion 310, a seal portion 320 (e.g., a seal), and / or a clamp portion 330. In many embodiments, the slit valve gate 300 is configured to couple to a slit valve actuator (e.g., actuator 215 of FIG. 2). In some examples, the base portion 310 may be configured to couple to the actuator via an attachment interface 312 (e.g., directly or indirectly via a movable member). In some embodiments, the attachment interface 312 is or includes a hole and / or a recess formed in the base portion 310.
[0022] The base portion may include a lip 316 around the recess 315. The recess 315 may be configured to receive the clamp portion 330. In some embodiments, the base portion 310 forms a plurality of holes 314, and the fasteners 340 may pass through the plurality of holes 314 to secure (e.g., fasten) the clamp portion 330 to the base portion 310. In some embodiments, each of the holes 314 is surrounded by a seal (e.g., an O-ring seal) to seal the hole 314. The clamp portion 330 may form corresponding holes (e.g., corresponding to the holes 314) for receiving the fasteners 340. In some embodiments, the clamp portion 330 is coupled to the base portion 310 via one or more fasteners 340. In some embodiments, the fasteners 340 are screws, bolts, or another threaded fastener. In some embodiments, the clamp portion 330 is coupled to the base portion 310 by a weld joint, a soldered joint, and / or a brazed joint.
[0023] In some embodiments, the base portion 310 forms alignment recesses 318 for receiving corresponding alignment pins 334 of the clamp portion 330. In some embodiments, the clamp portion 330 includes one or more alignment pins 334 that protrude from the surface of the clamp portion 330. In some examples, the clamp portion 330 includes a first alignment pin 334 proximate to the first distal end and a second alignment pin 334 proximate to the second distal end. The alignment pins 334 and the alignment recesses 318 can serve to align the clamp portion 330 relative to the base portion 310 when the clamp portion 330 is coupled to the base portion 310. Each of the alignment pins 334 can fit into a corresponding recess (e.g., alignment recess 318) formed in the base portion 310. In other embodiments, the base portion 310 can include one or more alignment pins, and the clamp portion 330 can include one or more recesses that align with the alignment pins to align the clamp portion with the base portion.
[0024] In some embodiments, the clamp portion 330 is configured to hold the seal portion 320. The flange 332 (e.g., of the clamp portion 330) and the lip 316 (e.g., of the base portion 310) can hold the seal portion 320. The flange 332 can extend around the outer periphery of the clamp portion 330 from the surface of the clamp portion 330. In some embodiments, the flange 332 and the lip 316 can substantially form a groove for holding the seal portion 320 when the clamp portion 330 is coupled to the base portion 310. In some embodiments, the lip 316 and the flange 332 are together and form a groove as described hereinafter in this specification. In other embodiments, the lip 316 and the flange 332 can together form a groove having other cross-sectional shapes, such as an inverted T-shaped groove, an L-shaped groove, a hemispherical groove, a circular groove, etc.
[0025] In some embodiments, the seal portion 320 is an elastomeric seal. The seal portion 320 can be manufactured from materials such as rubber, silicone, plastic, foam, fluoroelastomer, or another suitable polymer and / or elastomer. The seal portion 320 can have a cross-sectional profile described herein below (e.g., with reference to FIGS. 4A-4B). In some embodiments, the seal portion 320 can have a circular profile (e.g., similar to an O-ring). Alternatively, the seal portion 320 can have other cross-sectional profiles such as an inverted T-shape, an L-shape, a hemispherical shape, a circular shape, etc. In some embodiments, the seal portion 320 can be hollow (e.g., can form an inner cavity). By including an inner cavity within the seal portion 320, the seal portion 320 can be made more flexible when compared to a seal that does not include an inner cavity (e.g., is solid). In some embodiments, the seal portion 320 can at least partially compress (e.g., when the actuator moves the slit valve gate 300 to the closed position) and can form an airtight seal when pressed against the sealing surface. In some embodiments, the seal portion 320 can substantially fill a groove (e.g., a mating groove) formed by the clamp portion 330 and the base portion 310.
[0026] In some embodiments, the base portion 310 and / or the clamp portion 330 are manufactured from a material selected from the group including aluminum, alloy steel, stainless steel, nickel alloy, titanium, ceramic, and / or plastic. The base portion 310 and the clamp portion 330 may be manufactured from different materials. In some examples, the base portion 310 may be manufactured from aluminum, while the clamp portion 330 is manufactured from stainless steel. The material of the base portion 310 and / or the material of the clamp portion 330 may be selected based on the specific coating to be applied to each of the components and / or based on the environment to which each of the components may be exposed (e.g., a corrosive environment, a plasma environment, etc.). The material of the base portion 310 and / or the material of the clamp portion 330 may be selected to have complementary coefficients of thermal expansion. In some examples, the base portion 310 is manufactured from a material having a coefficient of thermal expansion similar to (e.g., substantially similar to) the material of the clamp portion 330. In some embodiments, at least one surface of the base portion 310 and / or at least one surface of the clamp portion 330 is polished. In some examples, the surface of the base portion 310 and / or the surface of the clamp portion is electropolished.
[0027] In some embodiments, the base portion 310 and / or the clamp portion 330 includes a coating (e.g., a protective coating). The coating may cover at least one surface of the base portion 310 and / or at least one surface of the clamp portion 330. In some embodiments, the coating is a corrosion-resistant protective coating and / or a plasma-resistant protective coating. In some embodiments, the coating is a nickel plating coating and / or an anodized coating. The coating may be an electroplated coating. In some embodiments, the coating is an oxide coating. The coating may be selectively applied to either the base portion 310 or the clamp portion 330. In some examples, the base portion 310 includes a first coating and the clamp portion 330 includes a second coating. In some embodiments, the first coating may be different from the second coating. The coating may be optimized for the environment in which the slit valve gate is to operate.
[0028] In some embodiments, the coating is deposited using techniques such as, for example, atomic layer deposition (ALD), ion assist deposition (IAD), plasma spraying (PS), low pressure plasma spraying (LPPS), chemical vapor deposition (CVD), plasma spray chemical vapor deposition (PS-CVD), sputtering, combinations thereof, or other techniques suitable for forming conformal coatings or modifications thereof. In some embodiments, the coating includes a ceramic material that is resistant to corrosion by process gases or reactive species. For example, in some embodiments, the coating is Y2O3, YZrO, Y x Zr y O z 、YZrOF、Y3Al5O 12 、Y4Al2O9、YF3、Y x O y F z 、YOF、Er2O3、Er3Al5O 12 、ErF3、E x O y F z、ErOF, La2O3, Lu2O3, Sc2O3, ScF3, ScOF, Gd2O3, Sm2O3, Dy2O3, a Y2O3-ZrO2 solid solution, a ceramic containing Y2Al4O9 and the Y2O3-ZrO2 solid solution, an amorphous phase containing a mixture of Al2O3 and Y2O3, or a combination thereof.
[0029] In some embodiments, the coating comprises Al2O3. In one embodiment, the coating comprises Al2O3 deposited by atomic layer deposition (ALD).
[0030] In some embodiments, the coating has a substantially uniform thickness, is conformal to the underlying surface being coated, is non-porous, crack-free, acts as a diffusion barrier for metal contaminants, and has a high purity (e.g., greater than about 99% purity, or greater than about 99.95% purity). In some embodiments, ALD can be advantageously used to coat all dimensions of the sensor assembly. In some embodiments, the coating is resistant to cracking and / or delamination at various temperatures (such as up to 350 °C).
[0031] In some embodiments, the coating can have a uniform thickness with a thickness variation of less than about + / - 20%, less than about + / - 10%, less than about + / - 5%, or lower, when comparing the thickness of the coating at one location to the thickness of the coating at another location (or when comparing the thickness of the coating at one location to the average thickness of the coating, or when evaluating the standard deviation of the thickness of the coating across several locations).
[0032] In some embodiments, the coating can be conformal to the underlying surface being coated, including underlying surface features having a high aspect ratio and / or complex geometries and / or the coated portion. For example, the coating can conformally and uniformly coat portions having a length:width (L:W) or length:diameter (L:D) in the range of a high aspect ratio, such as from about 2:1 to about 500:1, from about 5:1 to about 300:1, from about 10:1 to about 150:1, from about 15:1 to about 100:1, or from about 20:1 to about 50:1.
[0033] In some embodiments, the coating can be extremely dense and have extremely low porosity, such as less than about 1%, less than about 0.5%, less than about 0.1% porosity, or non-porous (0% porosity). In some embodiments, the coating can have a crack-free microstructure, hermeticity, and high dielectric breakdown resistance.
[0034] In some embodiments, the coating can be deposited at a low deposition temperature, such as up to 350 °C, thereby enabling the use of the coating with a wide variety of materials.
[0035] Figures 4A - 4B show cross-sectional views of a slit valve gate according to an embodiment of the present disclosure. Figure 4A can show the slit valve gate 400A in a closed position. Figure 4B can show a detailed view of the groove 436 of the slit valve gate 400B. Some of the features in Figures 4A - 4B having the same reference numbers as in other figures can have the same properties, functions, and / or structures as the reference numbers in Figures 4A - 4B.
[0036] Referring to FIG. 4A, the clamp portion 430 and the base portion 410 of the slit valve gate 400A can hold the seal portion 420. The seal portion 420 can abut against a sealing surface 470 that surrounds the slit valve opening 472 (e.g., when the slit valve gate 400A is in the closed position). The seal portion 420 can create an airtight seal in response to the slit valve gate 400A being moved to the closed position (e.g., by an actuator). In some embodiments, the base portion 410 can correspond to the base portion 310 of FIGS. 3A-3B, the seal portion 420 can correspond to the seal portion 320 of FIGS. 3A-3B, and / or the clamp portion 430 can correspond to the clamp portion 330 of FIGS. 3A-3B.
[0037] Referring to FIG. 4B, a flange 432 extending from the surface of the clamp portion 430, together with a lip 416 of the base portion 410, can hold the seal portion 420 within a groove 436. In some embodiments, the clamp portion 430, together with the base portion 410, substantially forms a groove (e.g., groove 436) when the clamp portion 430 is coupled to the base portion 410. In some examples, the base portion 410 forms a first part of the groove 436 and the clamp portion 430 forms a second part of the groove 436. In some examples, the flange 432 forms a part of the groove 436 (e.g., a first wall), and the lip 416 forms another part of the groove 436 (e.g., an opposing second wall). The groove 436 can be a grooved groove as shown in FIG. 4B and described herein, or can have another cross-sectional shape as described herein. The seal portion 420 can substantially conform to the groove 436.
[0038] In some embodiments, the seal portion 420 has a substantially trapezoidal cross-section. In some embodiments, the seal portion 420 has a substantially triangular cross-section. In some embodiments, the seal portion 420 has a substantially T-shaped cross-section. In some embodiments, the seal portion 420 has a circular (e.g., substantially circular) cross-section. The cross-section of the seal portion 420 may have substantially rounded corners. The cross-section of the seal portion 420 may include two shoulders 421A in some embodiments. The rounded portion 421B may protrude from the shoulders 421A. The rounded portion 421B may contact the sealing surface 470 when the slit valve gate is moved to the closed position. The seal portion 420 may substantially fill a groove (e.g., a groove formed by the lip 416 and the flange 432) formed by the base portion 410 and the clamp portion 430, and may include a portion protruding above the surface of the clamp portion 430. In some examples, the cross-sectional shape of the seal portion 420 matches (e.g., substantially matches) the groove 436 formed by the base portion 410 and the clamp portion 430.
[0039] FIG. 5 is a flowchart of a method 500 for manufacturing a slit valve gate according to an embodiment of the present disclosure. In some embodiments, the method 500 may be performed by a machine (e.g., an assembly machine, a robotic machine, etc.) and / or by a technician (e.g., a user, an engineer, an assembler, a human, etc.). In some embodiments, the method 500 may be performed by and / or caused to be performed by processing logic including hardware (e.g., circuits, dedicated logic, programmable logic, microcode, processing devices, etc.), software (e.g., instructions executed on a processing device, a general-purpose computer system, or a dedicated machine), firmware, microcode, or combinations thereof.
[0040] For simplicity of explanation, method 500 is shown and described as a series of operations. However, the operations according to the present disclosure can be performed in various orders and / or simultaneously, as well as with other operations not presented and described herein. Further, in some embodiments, not all of the operations shown are executed to implement method 500 according to the disclosed subject matter. Additionally, those skilled in the art will understand and appreciate that method 500 can alternatively be represented as a series of interrelated states via a state diagram or events.
[0041] In block 510, a seal portion (e.g., a seal) of the slit valve gate is coupled to (or inserted into or disposed against) a base portion of the slit valve gate (e.g., as described herein). The seal portion can correspond to the seal portion 320 of FIGS. 3A-3B and / or the seal portion 420 of FIGS. 4A-4B. In some embodiments, the seal is inserted into a groove (e.g., a portion of the groove) formed by the base portion. In some examples, the seal can be inserted into a portion of a mating groove formed by a lip (e.g., lip 316 of FIG. 3B) proximate to an outer periphery of the base portion (e.g., base portion 310 of FIGS. 3A-4B). The surface of the base portion can be coated by a protective coating before coupling the seal portion to the base portion.
[0042] In block 520, the clamp portion of the slit valve gate is coupled to the base portion. The clamp portion (e.g., clamp portion 330 in FIGS. 3A-3B) can be coupled to the base portion (e.g., base portion 310 in FIGS. 3A-3B) by one or more fasteners (e.g., fastener 340 in FIG. 3B). In some embodiments, the clamp portion can be coupled to the base portion by a joint such as a welded joint, a brazed joint, and / or a soldered joint. In some embodiments, the clamp portion is coupled to the base portion by an adhesive. In some embodiments, one or more alignment pins (e.g., alignment pin 334 in FIG. 3B) of the clamp portion are aligned with corresponding alignment holes (e.g., alignment hole 318 in FIG. 3B). In some embodiments, the clamp portion fits into a recess (e.g., recess 315 in FIG. 3B) formed in the base portion. The surface of the clamp portion can be coated by a protective coating before coupling the clamp portion to the base portion. By coupling the clamp portion to the base portion, the seal portion can be fixed between the lip of the base portion and the lip of the clamp portion such that a portion of the seal portion protrudes above the clamp portion to provide a sealing surface.
[0043] In block 530, a protective coating can be deposited on one or more of the base portion or the clamp portion. In some embodiments, the protective coating is deposited before coupling the clamp portion to the base portion and / or before coupling the seal portion to the base portion.
[0044] The coatings (e.g., metal layers, electrode layers, dielectric layers, dielectric sleeves, etc.) according to the embodiments described herein can be formed using deposition processes selected from chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), physical vapor deposition (PVD), plasma enhanced physical vapor deposition (PEPVD), and atomic layer deposition (ALD). CVD is a well-known technique for depositing pure metal coatings. In a typical CVD process, a substrate is exposed to at least one volatile precursor under ultra-high vacuum conditions. The at least one precursor reacts or decomposes on the substrate surface to form a film. The reaction chamber is then purged with an inert gas flowing through it. In the PECVD process, a chemical reaction is initiated by the generation of a plasma of reactive precursor gases. In the ALD process, a thin film layer grows by repeatedly exposing the surface of the substrate to pulses of gaseous chemical precursors that react with the surface one at a time in a self-limiting manner. CVD and ALD are non-line-of-sight processes that can be used to coat high aspect ratio features. The PVD process is also performed under vacuum conditions and generally involves sputtering and / or evaporation of a target material to form a gas that deposits and / or reacts on the surface of the substrate. PVD (generally including evaporation, plasma spraying, etc.) is a line-of-sight process. In the PEPVD process (generally including ion assist deposition, ion assist evaporation deposition, ion assist sputtering deposition, ion plating, etc.), a plasma or energetic ions are generated to react with the deposited material from a PVD process, such as an ion beam, and involves sputtering or evaporation of a target material. PEPVD is a line-of-sight process, but can be changed to a non-line-of-sight process when the substrate is biased during the deposition process. Compared with ALD, PVD and PEPVD can deposit relatively thick coatings (up to about 500 μm, or up to about 250 μm, or about 5 μm to about 250 μm) at relatively low deposition temperatures (<200 °C).
[0045] In some embodiments, the coating is deposited using one or more of ALD, IAD, LPPS, CVD, PS-CVD, or sputtering. In some embodiments, the coating is Y2O3, YZrO, Y x Zr y O z 、YZrOF、Y3Al5O 12 、Y4Al2O9、YF3、Y x O y F z 、YOF、Er2O3、Er3Al5O 12 、ErF3、E x O y F z 、ErOF、La2O3、Lu2O3、Sc2O3、ScF3、ScOF、Gd2O3、Sm2O3、Dy2O3、Y2O3-ZrO2 solid solution, a ceramic containing Y2Al4O9 and Y2O3-ZrO2 solid solution, or a rare earth ceramic selected from a combination thereof. In some embodiments, the coating contains Al2O3. In some embodiments, the coating contains ALD-deposited Al2O3. In some embodiments, the coating contains multiple layers. In some embodiments, the coating has a thickness of about 10 nanometers to about 500 nanometers, or any sub-range or single value therein.
[0046] In the above description, numerous specific details, such as specific materials, dimensions, process parameters, etc., have been described to provide a complete understanding of the present disclosure. Specific features, structures, materials, or characteristics can be combined in any suitable manner in one or more embodiments. The words "example" or "exemplary" are used in this specification to mean serving as an example, instance, or illustration. Any aspect or design described herein as "example" or "exemplary" is not necessarily to be construed as being more preferred or advantageous than other aspects or designs. Rather, the use of the words "example" or "exemplary" is merely for the purpose of presenting concepts in a concrete form. As used in this application, the term "or" means an inclusive "or" rather than an exclusive "or". That is, unless otherwise specified or clear from the context, "X includes A or B" means any of the natural inclusive permutations. That is, "X includes A or B" is satisfied under any of the above cases if X includes A, X includes B, or X includes both A and B. Throughout this specification, references to "an embodiment", "some embodiments", or "one embodiment" mean that the specific features, structures, or characteristics described in connection with the embodiment are included in at least one embodiment. Thus, the appearances of the phrases "an embodiment", "some embodiments", or "one embodiment" in various places throughout this specification are not necessarily all referring to the same embodiment.
[0047] Embodiments of the present disclosure have been described with respect to specific exemplary embodiments thereof. The specification and drawings should, therefore, be considered in an illustrative rather than a limiting sense. In addition to what has been illustrated and described herein, various modifications of the present disclosure will become apparent to those skilled in the art and fall within the scope of the appended claims.
[0048] As used herein, the singular forms "a", "an", and "the" include plural references unless the context clearly dictates otherwise. Thus, for example, reference to "a wafer" includes a single wafer as well as two or more wafers.
[0049] As used herein, the term "about" with respect to a measured quantity refers to the normal variation in that measured quantity that would be expected by a person of ordinary skill in the art when making a measurement and exercising a level of care commensurate with the purpose of the measurement and the precision of the measuring equipment. In some embodiments, the term "about" includes the recited number ±10%, such that "about 10" includes 9 - 11.
[0050] The recitation of a range of values herein is merely a convenient way of referring individually to each separate value falling within the range, and each separate value is incorporated herein as if it were individually recited herein. All methods described herein can be performed in any suitable order unless otherwise specified herein or otherwise clearly precluded by context. The use of any and all examples, or exemplary language (e.g., "such as") provided herein is merely to clarify some materials and methods and is not limiting. The language of the specification should not be construed as indicating any non-claimed element as essential to the practice of the disclosed materials and methods.
Claims
1. A base portion configured to be coupled to a slit valve actuator, A seal portion coupled to the base portion, the seal portion being configured to create an airtight seal between a slit valve gate and a sealing surface of a slit valve opening, A clamp portion coupled to the base portion, the clamp portion at least partially holding the seal portion between the clamp portion and the base portion A slit valve gate including.
2. A plurality of mechanical fasteners for fixing the clamp portion to the base portion The slit valve gate according to claim 1, further comprising.
3. The slit valve gate according to claim 1, wherein the clamp portion is coupled to the base portion by a welded joint, a soldered joint, or a brazed joint.
4. The slit valve gate according to claim 1, wherein the clamp portion includes an alignment pin protruding from a surface of the clamp portion, and the alignment pin fits into a corresponding recess formed in the base portion.
5. The slit valve gate according to claim 1, wherein one or both of the base portion or the clamp portion includes a material selected from the group consisting of aluminum, stainless steel, titanium, ceramic, and plastic.
6. The slit valve gate according to claim 1, wherein one or both of the base portion or the clamp portion is coated with a protective coating.
7. The slit valve gate according to claim 1, wherein the clamp portion includes a flange around the periphery of the clamp portion, the clamp portion and the base portion form a groove, and the flange at least partially holds the seal portion in the groove.
8. The slit valve gate according to claim 7, wherein the groove is a mating groove, a first portion of the mating groove is formed by the clamp portion, and a second portion of the mating groove is formed by the base portion.
9. The slit valve gate according to claim 8, wherein the seal portion has a cross-sectional shape that matches the mating groove.
10. A slit valve, comprising: A slit valve opening, A slit valve actuator, A slit valve gate coupled to the slit valve actuator Comprising. The slit valve gate is configured to seal the slit valve opening in response to the slit valve actuator moving the slit valve gate to a closed position. The slit valve gate is a base portion, wherein the slit valve gate is coupled to the slit valve actuator via the base portion, the base portion and a seal portion coupled to the base portion, the seal portion being configured to create an airtight seal between the slit valve gate and a sealing surface of the slit valve opening in response to the slit valve actuator moving the slit valve gate to the closed position, the seal portion and a clamp portion coupled to the base portion, the clamp portion at least partially holding the seal portion between the clamp portion and the base portion, the clamp portion and comprises a slit valve.
11. A plurality of mechanical fasteners for fixing the clamp portion to the base portion The slit valve according to claim 10, further comprising.
12. The slit valve according to claim 10, wherein the clamp portion comprises an alignment pin protruding from a surface of the clamp portion, and the alignment pin fits into a corresponding recess formed in the base portion.
13. The slit valve according to claim 10, wherein one or both of the base portion or the clamp portion comprises a material selected from the group consisting of aluminum, stainless steel, titanium, ceramic, or plastic.
14. The slit valve according to claim 10, wherein one or both of the base portion or the clamp portion is coated with a protective coating.
15. The slit valve according to claim 10, wherein the clamp portion comprises a flange around the periphery of the clamp portion, the clamp portion and the base portion form a groove, and the flange at least partially holds the seal portion in the groove.
16. The slit valve according to claim 15, wherein the groove is a dovetail groove, a first portion of the dovetail groove is formed by the clamp portion, and a second portion of the dovetail groove is formed by the base portion.
17. The slit valve according to claim 16, wherein the seal portion has a cross-sectional shape that matches the groove.
18. Coupling the seal portion of the slit valve gate to the base portion of the slit valve gate, wherein the seal portion is configured to create an airtight seal between the slit valve gate and the sealing surface of the slit valve opening, and coupling the seal portion of the slit valve gate to the base portion of the slit valve gate. Coupling the clamp portion of the slit valve gate to the base portion, wherein coupling the clamp portion to the base portion causes the clamp portion to at least partially hold the seal portion between the clamp portion and the base portion, and coupling the clamp portion of the slit valve gate to the base portion. A method comprising.
19. Depositing a protective coating on one or both of the base portion or the clamp portion. The method according to claim 18, further comprising.
20. The method according to claim 18, wherein the clamp portion includes a flange around the periphery of the clamp portion, and coupling the clamp portion to the base portion forms a groove between the clamp portion and the base portion, and the flange at least partially holds the seal portion in the groove in response to coupling the clamp portion to the base portion.
Citation Information
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