Dimming screen, dimming system, and dimming method

Abstract

The present invention relates to a dimming screen, a dimming system, and a dimming method. The dimming screen includes a first conductive structure, a second conductive structure, and a photoresponsive structure. The bistable display structure is located between the first conductive structure and the second conductive structure, and is located on one side or inside the photoresponsive structure. The system's advantages include low power consumption and extremely fast response because it utilizes the electrical properties of the photoresponsive structure for coloring and erasing. Except for the light-irradiated area, other areas of the photoresponsive structure still function as insulators, and only the light-irradiated area exhibits conductivity. This eliminates the need for complex circuit design and additional sensing structures compared to conventional voltage-resistant types, making it useful for the production of large-scale screens and large-scale promotion.

Description

[Technical Field]

[0001] The present invention relates to the field of multi-stable display technology, and in particular to a dimming screen, a manufacturing method for a dimming screen, a dimming system and a square dimming method. [Background technology]

[0002] Compared to conventional LCD display technology, bistable display technology (e.g., electronic ink displays, LCD writing boards, LCD blackboards) consumes energy only when the displayed content changes, significantly reducing power consumption. In addition, because bistable display technology basically relies on reflected light, it does not suffer from the blue light emission problem of conventional LCD display technology, making it gentle on the eyes.

[0003] However, bi-stable display technology still has drawbacks. 1) For electronic ink displays that need to display specific images, complex circuits need to be designed. 2) Electronic ink displays / LCD whiteboards can only erase the entire screen, not localized erasure. Localized erasure requires the design of complex circuit structures, which increases costs.

[0004] At present, no effective solutions have been proposed to the problems existing in related technologies, such as the need to design complex circuits to display specific images on electronic ink displays, and the inability of LCD handwriting boards / LCD blackboards to realize local erasure at low cost. Summary of the Invention

[0005] The objective of the present invention is to provide a dimming screen, a dimming screen manufacturing method, a dimming system and a square dimming method that address the deficiencies of the prior art, in order to solve the problems existing in the related art, such as the need for a complex circuit design to display a specific image on an electronic ink screen and the inability of LCD handwriting boards / LCD blackboards to realize local erasure at low cost.

[0006] To achieve the above objectives, the technical solutions adopted by the present invention are as follows: In a first aspect, there is provided a light control screen, a first conductive structure; and a second conductive structure provided opposite the first conductive structure; a photoresponsive structure provided between the first conductive structure and the second conductive structure, which exhibits a non-conductive state when not irradiated with light and exhibits a conductive state when irradiated with light having a wavelength of 200 nm to 2000 nm; and a bistable display structure disposed between the first conductive structure and the second conductive structure, located on one side of or within the photoresponsive structure, which is in a locally erased state when a voltage is modulated and the photoresponsive structure is in a conductive state.

[0007] In some embodiments, the first conductive structure comprises: a first base layer; a first conductive layer provided on a side of the first base layer adjacent to the second conductive structure.

[0008] In some embodiments, the second conductive structure comprises: a second base layer; and a second conductive layer provided on a side of the second base layer adjacent to the first conductive structure.

[0009] In some embodiments, the photoresponsive structure comprises: The first photoresponsive layer is disposed between the first conductive structure and the bistable display structure.

[0010] In some embodiments, the photoresponsive structure comprises: A second photoresponsive layer is provided between the second conductive structure and the bistable display structure.

[0011] In some embodiments, the bistable display structure described above comprises: and a liquid crystal display layer provided between the first conductive structure and the second conductive structure, located on one side of the photoresponsive structure, and exhibiting a state of local erasure when a voltage is modulated and the photoresponsive structure is in a conducting state.

[0012] In some embodiments, the bistable display structure described above comprises: and an ink display layer provided between the first conductive structure and the second conductive structure, disposed inside the photoresponsive structure, and exhibiting a localized erased state when a voltage is modulated and the photoresponsive structure is in a conductive state.

[0013] In a second aspect, there is provided a method for manufacturing the light-controlling screen according to the first aspect, the method comprising: Fabricating a First Conductive Structure forming a first conductive layer on a surface of the first base layer to form a first conductive structure; Fabricating a second conductive structure forming a second conductive layer on the surface of the second base layer to form a second conductive structure; (Fabrication of photoresponsive structures) forming a first photoresponsive layer on the surface of the first conductive layer; (Manufacturing dimming screens) The first base layer, the first conductive layer, the first photoresponsive layer, the liquid crystal display layer, the second conductive layer and the second base layer are assembled to form a light control screen.

[0014] Furthermore, there is provided a method for manufacturing a light-controlling screen for manufacturing the light-controlling screen according to the first aspect, the method comprising: Fabricating a First Conductive Structure forming a first conductive layer on a surface of the first base layer to form a first conductive structure; Fabricating a second conductive structure forming a second conductive layer on the surface of the second base layer to form a second conductive structure; (Fabrication of photoresponsive structures) forming a second photoresponsive layer on the surface of the second conductive layer; (Manufacturing dimming screens) The first base layer, the first conductive layer, the liquid crystal display layer, the second photoresponsive layer, the second conductive layer and the second base layer are assembled to form a light-control screen.

[0015] Furthermore, there is provided a method for manufacturing a light-controlling screen for manufacturing the light-controlling screen according to the first aspect, the method comprising: Fabricating a First Conductive Structure forming a first conductive layer on a surface of the first base layer to form a first conductive structure; Fabricating a second conductive structure forming a second conductive layer on the surface of the second base layer to form a second conductive structure; (Fabrication of photoresponsive structures) forming a first photoresponsive layer on the surface of the first conductive layer, and forming a second photoresponsive layer on the surface of the second conductive layer; (Manufacturing dimming screens) The first base layer, the first conductive layer, the first photoresponsive layer, the liquid crystal display layer, the second photoresponsive layer, the second conductive layer, and the second base layer are combined to form a light-control screen.

[0016] Furthermore, there is provided a method for manufacturing a light-controlling screen for manufacturing the light-controlling screen according to the first aspect, the method comprising: Fabricating a First Conductive Structure forming a first conductive layer on a surface of the first base layer to form a first conductive structure; Fabricating a second conductive structure forming a second conductive layer on the surface of the second base layer to form a second conductive structure; (Fabrication of photoresponsive structures) forming a first photoresponsive layer on the surface of the first conductive layer, and forming a second photoresponsive layer on the surface of the second conductive layer; (Manufacturing dimming screens) The first base layer, the first conductive layer, the first photoresponsive layer, the ink display layer, the second photoresponsive layer, the second conductive layer, and the second base layer are combined to form a light-controlling screen. In a third aspect, there is provided a light control system, comprising: a dimming screen according to the first aspect, or The dimming screen manufactured by the manufacturing method according to the second aspect

[0017] In some embodiments, further A controller connected to the dimming screen for adjusting the voltage applied to the dimming screen.

[0018] In some embodiments, further A light-controlling device emits light onto the light-controlling screen to change the state of the light-responsive structure of the light-controlling screen, the light having a wavelength of 200 nm to 2000 nm.

[0019] In a fourth aspect, there is provided a method of dimming, the method comprising: Obtain voltage regulation instructions, According to the voltage adjustment instruction, the voltages applied to the first conductive structure / second conductive structure are adjusted so that the bistable display structure is in the local erasing mode.

[0020] determining whether the photoresponsive structure is irradiated with light when the bistable display structure is in a local erasure mode, wherein the wavelength of the light is 200 nm to 2000 nm; when the photoresponsive structure is illuminated by light, the photoresponsive structure is in a conductive state to locally erase the illuminated bistable display structure; When the photoresponsive structure is not illuminated by light, the photoresponsive structure is in a non-conducting state so as not to put the bistable display structure into a locally erased state.

[0021] In some embodiments, further Obtain voltage regulation instructions, According to the voltage adjustment command, the voltages applied to the first conductive structure / the second conductive structure are adjusted so that the bistable display structure is in a write mode.

[0022] In some embodiments, further Obtain voltage regulation instructions, adjusting the voltages applied to the first conductive structure / the second conductive structure according to the voltage adjustment command, so that the bistable display structure is in a write mode; When the bistable display structure is in a writing mode, determining whether the photoresponsive structure is irradiated with light, wherein the wavelength of the light is 200 nm to 2000 nm; When the photoresponsive structure is irradiated with light, the photoresponsive structure exhibits a conductive state, such that the irradiated bistable display structure is in a written state; When the photoresponsive structure is not illuminated by light, the photoresponsive structure exhibits a non-conducting state such that the bistable display structure is not in a written state.

[0023] In some embodiments, further Obtain voltage regulation instructions, According to the voltage adjusting command, the voltages applied to the first conductive structure / second conductive structure are adjusted so that the bistable display structure is in a global erase mode.

[0024] In some embodiments, further When the photoresponsive structure is irradiated with light, it detects the area irradiated with light, Dividing the photoresponsive structure into a conductive region and a non-conductive region based on the irradiation range of the light, Based on the conductive and non-conductive regions, the bistable display structure is divided into erasable and non-erasable regions.

[0025] In some embodiments, further When the photoresponsive structure is irradiated with light, the area irradiated with light is detected; Dividing the photoresponsive structure into a conductive region and a non-conductive region based on the illumination range; Based on the conductive and non-conductive regions, the bistable display structure is divided into writable and non-writable regions.

[0026] Compared with the prior art, the light control screen, the manufacturing method for the light control screen, the light control system and the square light control method according to the present invention have the following technical advantages: 1) Low system power consumption. In the write mode, the dimming screen is essentially power-free, and the color development depends solely on the properties of the bistable material display layer itself. In the erase mode, power consumption is low because local erasure prevents most of the circuit from conducting due to the insulating effect of the photoresponsive structure, and full erasure simply requires a large number of high-voltage pulses. 2) High-speed response: Coloring and erasing are achieved by utilizing the physical properties of the bistable material and the electrical properties of the photoresponsive structure, so there is no additional signal processing required locally, resulting in extremely fast response. 3) Super-resolution. Compared with pixel displays, dimming screens have extremely high resolution and are capable of local erasure. When local erasure is performed, the non-illuminated areas of the photoresponsive structure remain insulated, and only the illuminated areas are energized, allowing for partial erasure of handwritten characters in the energized areas. 4) Low cost: Compared with the conventional methods, the present invention does not require complicated circuit design or additional sensing structures, making it suitable for the production of large screens (such as electronic whiteboards) and large-scale promotion. [Brief explanation of the drawings]

[0027] [Figure 1] FIG. 1 is a cross-sectional view (1) of a light control screen according to an embodiment of the present invention. [Figure 2] FIG. 2 is a cross-sectional view (2) of a light control screen according to an embodiment of the present invention. [Figure 3] FIG. 3 is a cross-sectional view (III) of a light control screen according to an embodiment of the present invention. [Figure 4]FIG. 4 is a cross-sectional view (4) of a light control screen according to an embodiment of the present invention. [Figure 5] FIG. 5 is a frame diagram of a dimming system according to an embodiment of the present invention.

[0028] The technical solutions in the embodiments of the present invention are clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only a part, not all, of the embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments that can be obtained by those skilled in the art without any creative work fall within the scope of protection of the present invention. It should be noted that the embodiments of the present invention and the features in the embodiments can be combined with each other unless they are inconsistent.

[0029] The present invention is further described below in conjunction with the accompanying drawings and specific embodiments, which should not be used as limitations of the present invention.

[0030] First embodiment The present embodiment relates to a light control screen and a method for manufacturing a light control screen of the present invention. 1 to 3, a light-controlling screen 100 includes a first conductive structure 110, a second conductive structure 120, a photoresponsive structure 130, and a bistable display structure 140. The second conductive structure 120 is disposed opposite the first conductive structure 110. The photoresponsive structure 130 is disposed between the first conductive structure 110 and the second conductive structure 120, and is in a non-conductive state in the absence of light irradiation and in a conductive state in the presence of light irradiation. The bistable display structure 140 is disposed between the first conductive structure 110 and the second conductive structure 120, and is disposed on the side / inside of the photoresponsive structure 130 to indicate a state of local erasure under voltage regulation and when the photoresponsive structure 130 is in a conductive state. Here, the wavelength of the light is 200 nm to 2000 nm, that is, the light includes ultraviolet light, visible light, and infrared light.

[0031] The present invention works as follows. The dimming screen 100 includes a write mode, a local erasure mode and a full erasure mode, When the dimming screen 100 is in the local erasure mode, it has the following two states: When no light is irradiated, the photoresponsive structure 130 is in a non-conducting state, and at this time, regardless of whether a voltage is applied to the bistable display structure 140 or whether the direction of the voltage applied to the bistable display structure 140 is adjusted, the strength of the electric field of the bistable display structure 140 is limited. When illuminated with light, the photo-responsive structure 130 is in a conducting state, and at this time, the electric field strength of the bistable display structure 140 is strengthened, so that the bistable display structure 140 can be operated.

[0032] In the present invention, there is no limitation on the size of the light control screen 100. Specifically, the size of the light control screen 100 is from 5 inches to 200 inches, including, but not limited to, 5.4 inches, 7.9 inches, 8.3 inches, 9.7 inches, 10.2 inches, 10.5 inches, 10.9 inches, 11 inches, 12.9 inches, 14 inches, 16 inches, 21.5 inches, 24 inches, 27 inches, 32 inches, 43 inches, 48 ​​inches, 50 inches, 55 inches, 65 inches, 75 inches, 85 inches, 100 inches, 148 inches, and 168 inches.

[0033] In the present invention, the dimming screen 100 can be used as a writing board, a display screen, or an electronic whiteboard.

[0034] This embodiment has the following three embodiments: As shown in FIG. 1, the bistable display structure 140 is disposed between the second conductive structure 120 and the photoresponsive structure 130; As shown in FIG. 2, the bistable display structure 140 is disposed between the first conductive structure 110 and the photoresponsive structure 130; As shown in FIG. 3, the bi-stable display structure 140 is disposed within the photo-responsive structure 130 . As shown in Figures 1 to 3, the first conductive structure 110 consists of a first base layer 111 and a first conductive layer 112, and the first conductive layer 112 is provided on the side of the first base layer 111 closer to the second conductive structure 120.

[0035] The first base layer 111 is made of optically transparent materials, including but not limited to flexible materials and non-flexible materials such as glass, plastic film, PET, and the like.

[0036] In some embodiments, the first base layer 111 is a light-colored material or a dark-colored material. When the first base layer 111 is made of a light-colored material, the light transmittance of the first base layer 111 is 15% to 90%.

[0037] Preferably, the light transmittance of the first base layer 111 is 30% to 90%. More preferably, the light transmittance of the first base layer 111 is 50% to 90%. More preferably, the light transmittance of the first base layer 111 is 75% to 90%.

[0038] When the first base layer 111 is made of a dark color material, the light transmittance of the first base layer 111 is 0% to 80%.

[0039] Preferably, the light transmittance of the first base layer 111 is 0% to 60%. More preferably, the light transmittance of the first base layer 111 is 0% to 50%. More preferably, the light transmittance of the first base layer 111 is 0% to 35%.

[0040] The thickness of the first base layer 111 is not particularly limited, and is limited according to the needs of the light control screen 100 .

[0041] In some embodiments, the thickness of the first base layer 111 is between 100 um and 1 cm.

[0042] The dimensions of the first conductive layer 112 match the dimensions of the first base layer 111. Generally, the length of the first conductive layer 112 is equal to the length of the first base layer 111, and the width of the first conductive layer 112 is equal to the width of the first base layer 111.

[0043] The first conductive layer 112 is made from a conductive material, including but not limited to indium tin oxide (ITO), TCO conductive glass (FTO), polyethylenedioxythiophene (PEDOT), and the like.

[0044] In some embodiments, the first conductive layer 112 has a thickness between 2 nm and 100 um.

[0045] As shown in Figures 1 to 3, the second conductive structure 120 includes a second base layer 121 and a second conductive layer 122, where the second conductive layer 122 is disposed on the side of the second base layer 121 closer to the first conductive structure 110.

[0046] Specifically, the second conductive layer 122 is disposed on the side of the second base layer 121 closer to the first conductive layer 112 .

[0047] The second base layer 121 is made of materials including, but not limited to, flexible and non-flexible materials such as glass, plastic film, PET, and the like.

[0048] In some embodiments, the second base layer 121 is a light or dark material.

[0049] When the second base layer 121 is made of a light-colored material, the light transmittance of the second base layer 121 is 15% to 90%.

[0050] Preferably, the light transmittance of the second base layer 121 is 30% to 90%. More preferably, the light transmittance of the second base layer 121 is 50% to 90%. More preferably, the light transmittance of the second base layer 121 is 75% to 90%.

[0051] When the second base layer 121 is made of a dark color material, the light transmittance of the second base layer 121 is 0% to 80%.

[0052] Preferably, the light transmittance of the second base layer 121 is 0% to 60%. More preferably, the light transmittance of the second base layer 121 is 0% to 50%. More preferably, the light transmittance of the second base layer 121 is 0% to 35%.

[0053] At least one of the first base layer 111 and the second base layer 121 is made of a light-colored material.

[0054] The size of the second base layer 121 matches the size of the first base layer 111. Generally, the length of the second base layer 121 is equal to the length of the first base layer 111, and the width of the second base layer 121 is equal to the width of the first base layer 111.

[0055] The thickness of the second base layer 121 is not particularly limited, and is limited according to the needs of the light control screen 100 .

[0056] In some embodiments, the thickness of the second base layer 121 is between 100 um and 1 cm.

[0057] The dimensions of the second conductive layer 112 match the dimensions of the second base layer 121. Generally, the length of the second conductive layer 112 is equal to the length of the first base layer 111, and the width of the first conductive layer 112 is equal to the width of the first base layer 111.

[0058] The second conductive layer 122 is made of a transparent conductive material, including but not limited to indium tin oxide (ITO), TCO conductive glass (FTO), polyethylenedioxythiophene (PEDOT), and the like.

[0059] In some embodiments, the second conductive layer 122 has a thickness of 2 nm to 100 um.

[0060] 1, photoresponsive structure 130 includes first photoresponsive layer 131, where first photoresponsive layer 131 is disposed between first conductive structure 110 and bi-stable display structure 140. Specifically, first photoresponsive layer 131 is disposed between first conductive layer 112 and bi-stable display structure 140 .

[0061] The dimensions of first photoresponsive layer 131 match the dimensions of first conductive layer 112. Generally, the length of first conductive layer 131 is equal to the length of first conductive layer 112, and the width of first photoresponsive layer 131 is equal to the width of first conductive layer 112.

[0062] The first photoresponsive layer 131 is made of a photosensitive material or a material that forms a rectifying structure with the first conductive layer 112, such as a PN junction or a Schottky contact, such as titanium dioxide, gallium nitride, zinc oxide, perovskite material, or mercury cadmium telluride.

[0063] The thickness of the first photoresponsive layer 131 is not particularly limited, and is limited according to the needs of the light control screen 100 . In some embodiments, the thickness of first photoresponsive layer 131 is between 2 nm and 100 um.

[0064] As shown in FIG. 2, the photoresponsive structure 130 includes a second photoresponsive layer 132, where the second photoresponsive layer 132 is disposed between the second conductive structure 120 and the bistable display structure 140.

[0065] Specifically, second photoresponsive layer 132 is disposed between second conductive layer 122 and bi-stable display structure 140 .

[0066] The size of second photoresponsive layer 132 matches the size of second conductive layer 122. Generally, the length of second photoresponsive layer 132 is equal to the length of second conductive layer 122, and the width of second photoresponsive layer 132 is equal to the width of second conductive layer 122.

[0067] The first photoresponsive layer 131 is made of a photosensitive material or a material that forms a rectifying structure with the second conductive layer 122, such as a PN junction or a Schottky contact, such as titanium dioxide, gallium nitride, zinc oxide, perovskite material, or mercury cadmium telluride.

[0068] The thickness of the second photoresponsive layer 132 is not particularly limited, and is determined according to the needs of the light control screen 100 .

[0069] In some embodiments, the thickness of second photoresponsive layer 132 is between 2 nm and 100 um.

[0070] As shown in Figures 1 and 2, the bistable display structure 140 includes a liquid crystal display layer 141, where the liquid crystal display layer 141 is disposed between the first conductive structure 110 and the second conductive structure 120 and disposed on one side of the photoresponsive structure 130 to exhibit a partially erased state under voltage modulation and a conductive state of the photoresponsive structure 130.

[0071] Specifically, the liquid crystal display layer 141 is disposed between the first conductive layer 112 and the second conductive layer 122, and is arranged on one side of the first photoresponsive layer 131 and / or one side of the second photoresponsive layer 132.

[0072] In this embodiment, there are several embodiments as follows. 1) As shown in FIG. 1, the liquid crystal display layer 141 is provided between the second conductive layer 122 and the first photoresponsive layer 131. 2) As shown in FIG. 2, the liquid crystal display layer 141 is provided between the first conductive layer 112 and the second photoresponsive layer 132. 3) As shown in FIG. 3, the liquid crystal display layer 141 is provided between the first photoresponsive layer 131 and the second photoresponsive layer 132.

[0073] The size of the liquid crystal display layer 141 matches the size of the first photoresponsive layer 131 / second photoresponsive layer 132. In general, the length of the liquid crystal display layer 141 is not greater than the length of the first photoresponsive layer 131 / second photoresponsive layer 132, and the width of the liquid crystal display layer 141 is not greater than the width of the first photoresponsive layer 131 / second photoresponsive layer 132.

[0074] The liquid crystal display layer 141 is made from a liquid crystal material, such as a cholesteric phase liquid crystal material. The thickness of the liquid crystal display layer 141 is not limited, but is limited according to the needs of the light control screen 100 .

[0075] In some embodiments, the thickness of the liquid crystal display layer 141 is between 10 nm and 100 um.

[0076] The dimming screen 100 as shown in FIG. 1 is manufactured as follows: Fabricating the First Conductive Structure 110 forming a first conductive layer 112 on the surface of the first base layer 111 to form a first conductive structure 110; Fabricating the Second Conductive Structure 120 forming a second conductive layer 122 on the surface of the second base layer 121 to form a second conductive structure 120; (Fabrication of photoresponsive structure 130) forming a first photoresponsive layer 131 on the surface of the first conductive layer 112; (Manufacturing the light-control screen 100) The first base layer 111, the first conductive layer 112, the first photoresponsive layer 131, the liquid crystal display layer 141, the second conductive layer 122, and the second base layer 121 are combined to form the light control screen 100.

[0077] Before preparing the light control screen 100, Fabricating the Bistable Display Structure 140 A liquid crystal display layer 141 is formed on the surface of the second conductive layer 122 .

[0078] The manufacturing method of the light control screen 100 shown in FIG. 2 is as follows: Fabricating the First Conductive Structure 110 forming a first conductive layer 112 on the surface of a first base layer 111 to form a first conductive structure 110; Fabricating the Second Conductive Structure 120 forming a second conductive layer 122 on the surface of the second base layer 121 to form a second conductive structure 120; Fabricating the Photo-Responsive Structure 130 forming a second photoresponsive layer 132 on the surface of the second conductive layer 122; (Manufacturing the light-control screen 100) The first base layer 111 , the first conductive layer 112 , the liquid crystal display layer 141 , the second photoresponsive layer 132 , the second conductive layer 122 and the second base layer 121 are assembled to form the light control screen 100 .

[0079] Furthermore, before manufacturing the light control screen 100, Fabricating the Bistable Display Structure 140 The method includes forming a liquid crystal display layer 141 on the surface of the second conductive layer 122.

[0080] The manufacturing method of the light control screen 100 shown in FIG. 2 is as follows: Fabricating the First Conductive Structure 110 forming a first conductive layer 112 on the surface of a first base layer 111 to form a first conductive structure 110; Fabricating the Second Conductive Structure 120 forming a second conductive layer 122 on the surface of the second base layer 121 to form a second conductive structure 120; Fabricating the Photo-Responsive Structure 130 forming a second photoresponsive layer 132 on the surface of the second conductive layer 122; (Manufacturing the light-control screen 100) The method includes assembling a first base layer 111, a first conductive layer 112, a liquid crystal display layer 141, a second photoresponsive layer 132, a second conductive layer 122, and a second base layer 121 to form a light-controlling screen 100.

[0081] Furthermore, before manufacturing the light control screen 100, Fabricating the Bistable Display Structure 140 The method includes forming a liquid crystal display layer 141 on the surface of the first conductive layer 112.

[0082] The method for preparing the light control screen 100 as shown in FIG. 3 is as follows: Fabricating the First Conductive Structure 110 forming a first conductive layer 112 on the surface of the first base layer 111 to form a first conductive structure 110; Fabricating the Second Conductive Structure 120 forming a second conductive layer 122 on the surface of the second base layer 121 to form a second conductive structure 120; Fabricating the Photo-Responsive Structure 130 forming a first photoresponsive layer (112) on the surface of the first conductive layer (112) and a second photoresponsive layer (132) on the surface of the second conductive layer (122); (Manufacturing the light-control screen 100) The method includes assembling a first base layer 111, a first conductive layer 112, a first photoresponsive layer 131, a liquid crystal display layer 141, a second photoresponsive layer 132, a second conductive layer 122, and a second base layer 121 to form a light-controlling screen 100.

[0083] Furthermore, before manufacturing the light control screen 100, Fabricating the Bistable Display Structure 140 The method includes forming a liquid crystal display layer 141 on the surface of the first photoresponsive layer 131 or the second photoresponsive layer 132.

[0084] To manufacture the first conductive structure 110, a first conductive layer 112 is formed on the surface of the first base layer 111 by a combination of any one or more of magnetron sputtering, ion plating, electron beam evaporation, thermal evaporation, electrochemical vapor deposition, coating, and printing methods.

[0085] In some embodiments, a 125 μm PET film is used as the first base layer 111, and a 200 nm ITO layer is sputtered onto the surface of the first base layer 111 as the first conductive layer 112 using magnetron sputtering technology under an inert gas (argon) atmosphere.

[0086] In some embodiments, a 125 μm PET film is used as the second base layer 121, and a 200 nm ITO layer is formed as the second conductive layer 122 by magnetron sputtering under inert gas (argon) partial pressure.

[0087] To manufacture the second conductive structure 120, the second conductive layer 112 is formed on the surface of the second base layer 121 by a combination of any one or more of magnetron sputtering, ion plating, electron beam evaporation, thermal evaporation, electrochemical vapor deposition, coating, and printing methods.

[0088] In some embodiments, a 125 μm PET film is used as the second base layer 121, and a 200 nm ITO layer is sputtered onto the surface of the second base layer 111 as the second conductive layer 122 using magnetron sputtering technology under an inert gas (argon) atmosphere.

[0089] To manufacture the photoresponsive structure 130, a first photoresponsive layer 131 is formed on the surface of the first base layer 112 by a combination of any one or more of magnetron sputtering, ion plating, electron beam evaporation, thermal evaporation, electrochemical vapor deposition, coating, and printing, or a second photoresponsive layer 132 is formed on the surface of the second base layer 122 by a combination of any one or more of magnetron sputtering, ion plating, electron beam evaporation, thermal evaporation, electrochemical vapor deposition, coating, and printing.

[0090] In some embodiments, a magnetron sputtering technique is used to sputter a 100 nm layer of zinc oxide as the first photoresponsive layer 131 onto the surface of the first conductive layer 112, or a 100 nm layer of zinc oxide as the second photoresponsive layer 132 onto the surface of the second conductive layer 122, under an atmosphere of a mixture of oxygen and argon (4:71).

[0091] For manufacturing the dimming screen 100, assembly methods include, but are not limited to, roll-to-roll assembly.

[0092] To fabricate the bistable display structure 140, the liquid crystal slurry is uniformly distributed between the first photoresponsive layer 131 and the second conductive layer 122 by extrusion coating or injection or other common methods, or between the first conductive layer 112 and the second photoresponsive layer 132, and then cured (such as by UV irradiation curing) and edge-sealed (such as by UV-curable adhesive or other adhesive edge-sealing).

[0093] In some embodiments, the liquid crystal slurry is prepared as follows. A liquid crystal (e.g., cholesteric liquid crystal), a prepolymer, and a photoinitiator are mixed in a mass ratio of 70:28:2 at 40°C for 5 hours with stirring to obtain a mixed slurry. This mixed slurry is mixed with 500 nm spacers at a mass ratio of 0.4% to obtain a liquid crystal slurry.

[0094] The method of using the light control screen 100 of the present invention is as follows. 1) Write mode There is no need to apply a voltage to the first conductive layer 112 and the second conductive layer 122, and the bistable effect of the liquid crystal display layer 141 itself can be used to sense physical pressure, thereby realizing writing display. 2) Erase mode A voltage is applied to the first conductive layer 112 and the second conductive layer 122 so that the liquid crystal display layer 141 is in the erase mode; When light is not irradiated to the first photoresponsive layer 131 / second photoresponsive layer 132, the first photoresponsive layer 131 / second photoresponsive layer 132 are in a non-conductive state, the first photoresponsive layer 131 / second photoresponsive layer 132 limit the strength of the electric field in the liquid crystal display layer 141, and the liquid crystal display layer 141 is in the erase mode but not in the erase state.

[0095] When light is irradiated onto the first photoresponsive layer 131 / second photoresponsive layer 132, the first photoresponsive layer 131 / second photoresponsive layer 132 become conductive, and the first photoresponsive layer 131 / second photoresponsive layer 132 do not limit the electric field strength of the liquid crystal display layer 141. Due to the action of the first conductive layer 112 and the second conductive layer 122, the electric field strength of the liquid crystal display layer 141 increases, and the liquid crystal display layer 141 is in an erased state, thereby realizing local erasure (by applying continuous low voltage or low voltage pulses to the first conductive layer 112 and the second conductive layer 122) or total erasure (by applying high voltage pulses to the first conductive layer 112 and the second conductive layer 122).

[0096] The technical effects of the present invention are: 1. Low system power consumption. In write mode, the dimming screen consumes essentially no power and relies on the properties of the LCD layer itself to sense physical compression and display color. In erase mode, during local erasure, most of the circuits are not conductive due to the insulating effect of the photoresponsive structure, and only a few high-voltage pulses are used for global erasure, so power consumption is low. 2. Fast response: Coloring and erasing are achieved by utilizing the physical properties of the liquid crystal display layer (cholesteric liquid crystal material) and the electrical properties of the photoresponsive structure, eliminating the need for additional local signal processing and resulting in extremely fast response. 3. Super resolution. Compared with pixel displays, dimming screens have a very high resolution. 4. Local erasure. When performing local erasure, the other areas of the photoresponsive structure remain insulators except for the illuminated area, making only the illuminated area conductive, allowing for partial erasure of handwritten characters in conductive areas. 5. Low cost. Compared with the conventional voltage-resistant type, this invention does not require complicated circuit design or additional sensing structure, which is advantageous for the production of large screens such as electronic whiteboards and large-scale promotions.

[0097] Second embodiment The present embodiment relates to a light control screen and a method for manufacturing a light control screen of the present invention. 4, a light-controlling screen 100 includes a first conductive structure 110, a second conductive structure 120, a photo-responsive structure 130, and a bistable display structure 140. The second conductive structure 120 is disposed opposite the first conductive structure 110. The photo-responsive structure 130 is disposed between the first conductive structure 110 and the second conductive structure 120, and is configured to be non-conductive when not irradiated with light and to be conductive when irradiated with light. The bistable display structure 140 is disposed between the first conductive structure 110 and the second conductive structure 120 and is disposed inside the photo-responsive structure 130.

[0098] In this embodiment, the structures and materials of the first conductive structure 110 and the second conductive structure 120 are basically the same as those in the first embodiment, and therefore a description thereof will be omitted here.

[0099] 4, the photoresponsive structure 130 includes a first photoresponsive layer 131 and a second photoresponsive layer 132. Among them, the first photoresponsive layer 131 is disposed between the first conductive structure 110 and the bistable display structure 140, and the second photoresponsive layer 132 is disposed between the second conductive structure 120 and the bistable display structure 140.

[0100] Specifically, the first photoresponsive layer 131 is disposed between the first conductive layer 112 and the bistable display structure 140, and the second photoresponsive layer 132 is disposed between the second conductive layer 122 and the bistable display structure 140.

[0101] Here, the configurations and materials of first photoresponsive layer 131 and second photoresponsive layer 132 are basically the same as those in the first embodiment, and therefore a description thereof will be omitted here.

[0102] 4, the bistable display structure 140 includes an ink display layer 142. The ink display layer 142 is disposed between the first conductive structure 110 and the second conductive structure 120 and is located inside the photoresponsive structure 130, and is used to locally erase the photoresponsive structure 130 when the photoresponsive structure 130 is in a partially conductive state under voltage adjustment.

[0103] Specifically, the ink display layer 142 is disposed between the first photoresponsive layer 131 and the second photoresponsive layer 132 .

[0104] The size of the ink display layer 142 matches the size of the first / second photoresponsive layer 131 / 132. Generally, the length of the ink display layer 142 is equal to or less than the length of the first / second photoresponsive layer 131 / 132, and the width of the ink display layer 142 is equal to or less than the width of the first / second photoresponsive layer 131 / 132.

[0105] As shown in FIG. 4, the ink display layer 142 is composed of electronic ink capsules and a transparent adhesive, and the electronic ink capsules are composed of dyed positive and negative charges. The thickness of the ink display layer 142 is not limited and is limited according to the needs of the light control screen 100 .

[0106] In some embodiments, the ink-displaying layer 142 has a thickness of between 10 nm and 100 μm.

[0107] The method for manufacturing the light control screen 100 of this embodiment is as follows. Fabricating the First Conductive Structure 110 forming a first conductive layer 112 on the surface of the first base layer 111 to form a first conductive structure 110; Fabricating the Second Conductive Structure 120 forming a second conductive layer 122 on the surface of the second base layer 121 to form a second conductive structure 120; Fabricating the Photo-Responsive Structure 130 forming a first photoresponsive layer 131 on the surface of the first conductive layer 112; forming a second photoresponsive layer 132 on the surface of the second conductive layer 122; (Manufacturing the light-control screen 100) The first base layer 111, the first conductive layer 112, the first photoresponsive layer 131, the ink display layer 142, the second photoresponsive layer 132, the second conductive layer 122, and the second base layer 121 are combined to form the light-controlling screen 100.

[0108] Furthermore, before manufacturing the step dimming screen 100, Fabricating the Bistable Display Structure 140 The method includes forming an ink-indicating layer 142 between a first photoresponsive layer 131 and a second photoresponsive layer 132 .

[0109] The steps of manufacturing the first conductive structure 110, the steps of manufacturing the second conductive structure 120, and the steps of manufacturing the photoresponsive structure 130 are basically the same as those in the first embodiment, so the description thereof will be omitted here.

[0110] Regarding the steps for fabricating the bistable display structure 140, the fabrication method is as follows. The electronic ink capsules are placed on the second conductive layer 122 to ensure contact between each electronic ink capsule and the electrode, the first conductive structure 110 is covered on top of the electronic ink capsules, and a transparent adhesive is injected between the electronic ink capsules to shorten the distance between the electrode and the electronic ink capsule.

[0111] The method of using the light control screen 100 of the present invention is as follows. 1) Write mode A forward voltage is applied to the first conductive layer 112 and the second conductive layer 122 so that the ink display layer 142 is in the writing mode. When light is not irradiated onto the first photoresponsive layer 131 / second photoresponsive layer 132, the first photoresponsive layer 131 / second photoresponsive layer 132 are in a non-conductive state, and the first photoresponsive layer 131 / second photoresponsive layer 132 limit the strength of the electric field in the ink display layer 142, so that the ink display layer 142 is not in a writing state even though it is in a writing mode. When light is irradiated onto the first photoresponsive layer 131 / second photoresponsive layer 132, the first photoresponsive layer 131 / second photoresponsive layer 132 become conductive, and the conductive state of the first photoresponsive layer 131 / second photoresponsive layer 132 does not limit the electric field strength of the ink display layer 142. Due to the action of the first conductive layer 112 and the second conductive layer 122, the electric field strength of the ink display layer 142 increases, and the ink display layer 142 enters a writing state, thereby realizing writing.

[0112] 2) Local deletion mode A reverse voltage (either a continuous low voltage or a low voltage pulse) is applied to the first conductive layer 112 and the second conductive layer 122 to place the ink display layer 142 in a local erasure mode. When light is not irradiated onto the first photoresponsive layer 131 / second photoresponsive layer 132, the first photoresponsive layer 131 / second photoresponsive layer 132 are in a non-conductive state, and the first photoresponsive layer 131 / second photoresponsive layer 132 limit the strength of the electric field in the ink display layer 142, so that the ink display layer 142 is not in a writing state even though it is in a writing mode. When light is irradiated onto the first photoresponsive layer 131 / second photoresponsive layer 132, the first photoresponsive layer 131 / second photoresponsive layer 132 become conductive, and the conductive state of the first photoresponsive layer 131 / second photoresponsive layer 132 does not limit the electric field strength of the ink display layer 142. Due to the action of the first conductive layer 112 and the second conductive layer 122, the electric field strength of the ink display layer 142 increases, and the ink display layer 142 enters a write state, thereby realizing writing.

[0113] 3) Total erase mode A reverse voltage (high voltage pulse) is applied to the first conductive layer 112 and the second conductive layer 122, and the ink display layer 142 is put into the total erasing mode.

[0114] The technical effects of the present invention are as follows: 1) Low system power consumption: In write and erase modes, the isolation of the photoresponsive structure prevents most of the circuit from conducting, resulting in low power consumption. 2) Fast response: Coloring and erasing are performed using the electrical properties of the ink display layer and the photoresponsive structure, so there is no additional local signal processing process and the response is extremely fast. 3) Super resolution: Compared to pixel displays, dimming screens have a very high resolution. 4) Local erasure: When erasing locally, the other areas of the photoresponsive structure still function as insulators, except for the area illuminated by light, and only the illuminated area is conductive, allowing for partial erasure of handwritten characters in the conductive areas. 5) Localized writing: When writing locally, except for the area illuminated by light, the other areas of the photoresponsive structure still function as insulators, and only the illuminated areas become conductive. This makes it possible to write handwritten characters locally on the conductive areas without the need for multiple electrodes. 5) Low cost: Compared to conventional voltage-resistant types, there is no need for complex circuit designs or additional sensing structures, which is advantageous for producing large screens such as electronic whiteboards and for large-scale promotions.

[0115] Third embodiment This embodiment relates to a light control system of the present invention. 5, the dimming system includes the dimming screen 100 according to the first embodiment 1 or the second embodiment.

[0116] The dimming system further includes a control device 200. The control device 200 is connected to the dimming screen 100 and is used to adjust the voltage applied to the dimming screen 100.

[0117] Specifically, the control device 200 is connected to at least the first conductive structure 110 and the second conductive structure 120 and adjusts the voltages applied to the first conductive structure 110 and the second conductive structure 120.

[0118] More specifically, the control device 200 is connected to at least the first conductive layer 112 and the second conductive layer 122 and adjusts the voltages applied to the first conductive layer 112 and the second conductive layer 122 .

[0119] The control device 200 has the following modes of operation: 1) The control device 200 directly controls the light-controlling screen 100, for example, through key switching, so that the light-controlling screen 100 is in a writing mode or an erasing mode. 2) The control device 200 receives a control signal from the outside, for example, via a wireless connection, and causes the dimming screen 100 to enter a writing mode or an erasing mode.

[0120] The control device 200 includes at least a control circuit, a power module, and a drive module. Among these, the power module is connected to the control circuit, and the drive module is connected to the control circuit, the first conductive layer 112, and the second conductive layer 122, respectively.

[0121] In some embodiments, the control circuitry includes, but is not limited to, a microcontroller and low power circuitry.

[0122] In some embodiments, the driving module includes, but is not limited to, logic gate circuits, chips, such as STC and STM.

[0123] The control device 200 also includes a communication module, which is connected to the control circuit and is used for communicating with the outside.

[0124] In some embodiments, the communication modules include, but are not limited to, Bluetooth sensors, antennas, and the like, such as SKYLAB Bluetooth modules and 2.4G wireless modules.

[0125] Furthermore, the light control system also includes a light control device 300. The light control device 300 is used to emit light to the light control screen 100 to change the state of the light-responsive structure 130 of the light control screen 100.

[0126] Among these, the wavelength of the light is 200 nm to 2000 nm.

[0127] In some embodiments, the dimming device 300 is also communicatively coupled to the control device 200 for sending control signals to the control device 200 so that the control device 200 switches the operating mode of the dimming screen 100 .

[0128] The light control device 300 includes at least a light-emitting module, which is used to emit light to the light-controlling screen 100 to change the state of the light-responsive structure 130.

[0129] Specifically, the light-emitting module emits light to the first photoresponsive layer 131 / second photoresponsive layer 132, and the areas of the first photoresponsive layer 131 / second photoresponsive layer 132 illuminated by the light become conductive.

[0130] The technical effects of the present invention are as follows: 1) Fast response: The electrical properties of the photoresponsive structure are utilized for color development and erasure, without any additional local signal processing process, and the response is extremely fast. 2) Local erasure: When performing local erasure, a dimming device is used to irradiate the dimming screen with light, and except for the irradiated area, other areas of the photoresponsive structure still function as insulators, and only the irradiated area becomes conductive, making it possible to locally erase handwritten characters in the conductive area. 3) Low cost: Compared with conventional pressure-resistant types, it does not require complex circuit designs or additional sensing structures, which is advantageous for large-scale promotion.

[0131] Fourth embodiment This embodiment relates to a light control method of the present invention. An exemplary embodiment of a light control method according to the present invention includes: Step S602 of obtaining a voltage adjustment command; Step S604: adjusting the voltage applied to the first conductive structure / second conductive structure according to the voltage adjustment command to put the bistable display structure into a local erase mode; a step S606 of determining whether the photoresponsive structure is illuminated with light when the bistable display structure is in the local erase mode; Step S608: when the photoresponsive structure is illuminated by light, turning the photoresponsive structure into a conducting state to locally erase the illuminated bistable display structure; and step S610 of placing the photoresponsive structure in a non-conductive state when the photoresponsive structure is not illuminated by light, thereby not locally placing the bistable display structure in an erased state. Here, steps S608 and S610 are parallel steps.

[0132] In step S502, the voltage adjustment command includes a first voltage adjustment command, a second voltage adjustment command, and a third voltage adjustment command, where the first voltage adjustment command is for instructing to apply a continuous low voltage or a low voltage pulse to the first conductive structure / second conductive structure, the second voltage adjustment command is for instructing to apply a high voltage pulse to the first conductive structure / second conductive structure, and the third voltage adjustment command is for instructing to apply a reverse voltage to the first conductive structure / second conductive structure.

[0133] Here, the first voltage adjustment command and the second adjustment voltage instruction are applied to the dimming screen 100 described in the first embodiment, and the third voltage adjustment command is applied to the dimming screen 100 described in the second embodiment.

[0134] In step S604, there are the following embodiments. 1) After the voltage applied to the first conductive structure / second conductive structure is adjusted according to the first voltage adjustment command, the bistable display structure (liquid crystal display layer 141) enters a local erase mode. 2) After the voltage applied to the first conductive structure / second conductive structure is adjusted according to the second voltage adjustment command, the bistable display structure (liquid crystal display layer 141) enters a global erase mode. 3) After the voltage applied to the first conductive structure / second conductive structure is adjusted according to the third voltage adjustment command, the bistable display structure (ink display layer 142) enters a local erase mode. Through the above steps, partial erasure of the dimming screen can be achieved by utilizing the partial conduction property of the photo-responsive structure.

[0135] Furthermore, the dimming method is Step S702 of obtaining a voltage regulation command; Step S704: adjusting the voltage applied to the first conductive structure / second conductive structure according to the voltage adjustment command, so as to put the bistable display structure into a write mode; If the bistable display structure is in the write mode, a step S706 is performed to determine whether the photoresponsive structure is illuminated by light; step S708, when the photoresponsive structure is illuminated by light, the photoresponsive structure becomes conductive, thereby placing the illuminated bistable display structure in a write mode; If the photo-responsive structure is not illuminated by light, the photo-responsive structure is in a non-conducting state, and the bistable display structure is not in a written state (step S710).

[0136] Here, steps S702 to S710 and steps S602 to S610 are parallel steps.

[0137] Furthermore, step S702 is the same step as step S702. In step S702, the voltage adjustment command includes a fourth voltage adjustment command, where the fourth voltage adjustment command is for instructing to apply a positive voltage to the first conductive structure / second conductive structure. In this case, the bistable display structure is ink display layer 142 .

[0138] If the bistable display structure is liquid crystal display layer 141, only steps S702 to S704 need to be performed.

[0139] Furthermore, the dimming method is Step S802 of detecting the range of light irradiation when the photoresponsive structure is irradiated with light; Step S804: classifying the photoresponsive structures into conductive and non-conductive regions based on the illumination range; and step S806, classifying the bistable display structure into erasable and non-erasable regions based on said conductive and non-conductive regions.

[0140] moreover, A step S808 includes classifying the bistable display structure into writable and non-writable regions based on said conductive regions and said non-conductive regions.

[0141] Here, steps S802 to S808 are executed after steps S608 and S708.

[0142] The dimming method for the dimming screen 100 of the first embodiment is as follows: Step S901 of obtaining a voltage regulation command; If the voltage adjustment command is a first voltage adjustment command, adjusting the voltage applied to the first conductive structure / second conductive structure to place the bistable display structure in a localized blanking mode (S902); If the voltage adjustment command is a second voltage adjustment command, adjusting the voltage applied to the first conductive structure / second conductive structure to put the bistable display structure into a global erase mode (S903); If the bistable display structure is in the local erase mode, a step S904 is performed to determine whether the photoresponsive structure is illuminated by light; When the photoresponsive structure is irradiated with light, a step S905 of detecting the irradiated area of ​​the light; Step S906: classifying the photoresponsive structures into conductive and non-conductive regions according to the illumination range; Step S907: classifying the bistable display structures into erasable and non-erasable regions according to conductive and non-conductive regions.

[0143] The dimming method for the dimming screen 100 of the second embodiment is as follows: Step S1001 of obtaining a voltage regulation command; If the voltage adjustment command is a fourth voltage adjustment command, step S1002 adjusts the voltage applied to the first conductive structure / second conductive structure so as to put the bistable display structure into a write mode; If the voltage adjustment command is a third voltage adjustment command, step S1003 adjusts the voltage applied to the first conductive structure / second conductive structure to place the bistable display structure in a localized blanking mode; If the bistable display structure is in a write mode or a local erase mode, a step S1004 is performed to determine whether the photoresponsive structure is illuminated by light; When the photoresponsive structure is irradiated with light, a step S1005 of detecting the irradiated area of ​​the light; Step S1006: classifying the photoresponsive structures into conductive and non-conductive regions according to the illumination range; and step S1007 of classifying the bistable display structures into erasable (writable) and non-erasable (non-writable) regions according to the conductive and non-conductive regions.

[0144] The technical effects of the present invention are as follows: 1) Local erasure: When performing local erasure, light is irradiated onto the light-sensitive screen using a light-controlling device, and the other areas of the photoresponsive structure, excluding the irradiated areas, continue to function as insulators, and only the irradiated areas become conductive, allowing the handwriting in the conductive areas to be partially erased.

[0145] Fifth embodiment This embodiment relates to a specific embodiment of the light control screen of the present invention. A locally erasable dimming screen includes a first conductive film, a second conductive film, an ultraviolet-sensitive layer, and a cholesteric-phase liquid crystal layer, where the first conductive film includes a first substrate and a first conductive layer, the second conductive film includes a second substrate and a second conductive layer, the ultraviolet-sensitive layer can be fabricated on or in the first conductive film, and the cholesteric-phase liquid crystal layer is disposed between the first conductive film and the second conductive film and is located on one side of the ultraviolet-sensitive layer.

[0146] One of the first conductive film and the second conductive film is a transparent conductive film, and the other is a dark conductive film. In this embodiment, the first conductive film is a transparent conductive film, the second conductive film is a dark conductive film, an ultraviolet ray responsive layer is provided on the second conductive film, and a cholesteric phase liquid crystal layer is disposed between the first conductive film and the ultraviolet ray responsive layer.

[0147] The material of the first substrate is not particularly limited, but is preferably polyethylene terephthalate (PET), or may be other flexible or non-flexible transparent materials. The transmittance of the first substrate is preferably 15% to 90%, and most preferably 75% to 90%.

[0148] The material and manufacturing process for the first conductive layer are not particularly limited, and it is sufficient to adopt conductive materials and processes used in liquid crystal handwriting boards that are well known to those skilled in the art.

[0149] In some embodiments, the manufacturing process of the first conductive film is to use a 125 μm PET film as the first substrate and sputter a 200 nm ITO layer of the first conductive layer using magnetron sputtering technology in an inert gas (argon) atmosphere.

[0150] The material of the second substrate is not particularly limited, and it is sufficient to adopt conductive materials and processes used in liquid crystal handwriting boards that are well known to those skilled in the art.

[0151] In some embodiments, the manufacturing process of the second conductive film is to use a 125 μm PET film as the second substrate and sputter a 250 nm ITO layer of the first conductive layer using magnetron sputtering technology in an inert gas (argon) atmosphere.

[0152] The material of the ultraviolet responsive layer can be any material that is in a high resistance state, is sensitive to ultraviolet response, or can form a pn junction or Schottky contact with the first conductive layer or the second conductive layer.

[0153] The position where the ultraviolet responsive layer is formed is not limited, and it may be on a transparent conductive film or on a dark conductive film. The manufacturing method is also not limited, and known coating methods or spin coating methods can be used.

[0154] In some embodiments, the fabrication process of the ultraviolet responsive layer is to sputter a 100 nm layer of zinc oxide as the ultraviolet responsive layer on top of the second conductive film using magnetron sputtering technique in a mixed atmosphere of oxygen and argon (4:71).

[0155] The raw material of the cholesteric liquid crystal layer is a liquid crystal slurry, the main components of which are cholesteric liquid crystal, spacer, prepolymer, and photoinitiator. The specific components are not limited, and materials well known to those skilled in the art can be used.

[0156] In some embodiments, the manufacturing process of the cholesteric liquid crystal layer is to stir and mix the cholesteric liquid crystal, prepolymer, and photoinitiator in a mass ratio of 70:28:2 at 40°C for 5 hours, and then mix 500 nm spacers into the mixed slurry in a mass ratio of 0.4% to obtain a liquid crystal slurry.

[0157] In this embodiment, the method for assembling the dimming screen is to uniformly distribute the liquid crystal slurry on the first conductive film (transparent conductive film) and the second conductive film (dark color) by extrusion coating, injection, or other common methods, irradiate with ultraviolet light to harden, and then seal with ultraviolet-hardening adhesive or other adhesives.

[0158] The method of use of this embodiment is as follows. 1) Write mode There is no need to apply a voltage to the first conductive film and the second conductive film; the cholesteric liquid crystal layer changes from a planar state to a focal conic state by physical squeezing, allowing handwriting to be left on the dimming screen, thereby realizing the writing function. 2) Local erasure mode A bias voltage of continuous constant voltage or low voltage pulses is applied between the first conductive film and the second conductive film, forming a reverse pn junction structure or a Schottky contact with the ultraviolet-responsive layer and the second conductive layer of the second conductive film (dark conductive film). Alternatively, since the ultraviolet-responsive layer itself is in a high-resistance state, the circuit does not conduct with a low voltage bias and the cholesteric liquid crystal layer is maintained in a pyrocon state. Under external ultraviolet irradiation, the ultraviolet-responsive layer irradiated with ultraviolet light becomes conductive, so a low voltage is applied to the corresponding part of the cholesteric liquid crystal layer, causing the liquid crystal state of this part to return from a pyramidal state to a planar state, thereby partially erasing the handwriting. 3) Global erasure mode A bias voltage is applied as a high voltage pulse between the first conductive film and the second conductive film, and the high voltage will destroy the reverse pn junction or Schottky contact, or will become a high voltage according to the law of partial pressure in the cholesteric phase liquid crystal layer, so that the cholesteric phase liquid crystal layer liquid crystal as a whole will be converted into a planar state, thereby achieving full-screen erasure handwriting.

[0159] Sixth embodiment This embodiment relates to a specific embodiment of the light control screen of the present invention. A locally erasable dimming screen includes a first conductive film, a second conductive film, a first ultraviolet-responsive layer, a second ultraviolet-responsive layer, and an electronic ink layer, wherein the first conductive film includes a first substrate and a first conductive layer, the second conductive film includes a second substrate and a second conductive layer, the first ultraviolet-responsive layer is disposed on the first conductive film, the second ultraviolet-responsive layer is disposed on the second conductive film, and the electronic ink layer is disposed between the first ultraviolet-responsive layer and the second ultraviolet-responsive layer.

[0160] The material of the first substrate is not particularly limited, and is preferably polyethylene terephthalate (PET), but other flexible materials or non-flexible transparent materials are also possible. The material and manufacturing process for the first conductive layer are not limited, and it is sufficient to adopt conductive materials and processes used in liquid crystal handwriting boards that are well known to those skilled in the art.

[0161] In some embodiments, the manufacturing process of the first conductive film is to use a 125 μm PET film as the first substrate and sputter a 250 nm ITO layer of the first conductive layer using magnetron sputtering technology in an inert gas (argon) atmosphere.

[0162] The material of the second substrate is not limited, but is preferably polyethylene terephthalate (PET). Other flexible or non-flexible transparent materials can be used.

[0163] The material and manufacturing process of the second conductive layer are not limited, and conductive materials and processes used in liquid crystal handwriting boards well known to those skilled in the art can be used.

[0164] In some embodiments, the manufacturing process of the second conductive film is to use a 125 μm PET film as the second substrate and sputter a 250 nm ITO layer of the second conductive layer using magnetron sputtering technology in an inert gas (argon) atmosphere.

[0165] The material of the first ultraviolet responsive layer can be any material that is in a high resistance state, is sensitive to ultraviolet response, or can form a pn junction or Schottky contact with the first conductive layer.

[0166] In some embodiments, the manufacturing process of the first ultraviolet-responsive layer is to sputter a 100 nm layer of zinc oxide as the first ultraviolet-responsive layer on top of the first conductive film using magnetron sputtering technology in a mixed atmosphere of oxygen and argon (4:71).

[0167] The material of the second ultraviolet responsive layer can be any material that is in a high resistance state, is sensitive to ultraviolet response, or can form a pn junction or Schottky contact with the first conductive layer.

[0168] In some embodiments, the manufacturing process of the second ultraviolet-responsive layer is to sputter a 100 nm layer of zinc oxide as the second ultraviolet-responsive layer on top of the second conductive film using magnetron sputtering technology in a mixed atmosphere of oxygen and argon (4:71). There are no limitations on the material or manufacturing process of the electronic ink layer, and materials commonly used in the field can be used.

[0169] In some embodiments, the manufacturing process of the electronic ink layer is as follows: the electronic ink capsules are placed on a second conductive layer to ensure contact between each electronic ink capsule and an electrode; a first conductive film is covered on top of the electronic ink capsules; a transparent adhesive is injected between the electronic ink capsules; and the distance between the electrode and the electronic ink capsules is reduced.

[0170] The method of use of this embodiment is as follows. 1) Write mode When a positive voltage is applied between the first conductive film and the second conductive film, under the action of the first ultraviolet-responsive layer and the second ultraviolet-responsive layer, when there is no ultraviolet irradiation, the electric field in the electronic ink layer is small and no display can be realized; when there is ultraviolet irradiation, the first ultraviolet-responsive layer and the second ultraviolet-responsive layer become conductive, and the ions with corresponding charges in the electronic ink layer move to the top of the electronic ink layer, thereby realizing the display of the ultraviolet-irradiated handwriting. 2) Local erasure mode When a reverse voltage is applied between the first conductive film and the second conductive film, the first ultraviolet-responsive layer and the second ultraviolet-responsive layer act together so that when there is no ultraviolet light, the electric field in the electronic ink layer is small and erasure is not possible. When there is ultraviolet light, the first ultraviolet-responsive layer and the second ultraviolet-responsive layer become conductive, increasing the electric field strength in the electronic ink layer and enabling local erasure.

[0171] The above is merely a better embodiment of the present invention, and is not intended to limit the embodiments and protection scope of the present invention. Those skilled in the art should recognize that all equivalent replacements and obvious modifications obtained by applying the contents of the specification and drawings of the present invention should be included in the protection scope of the present invention. [Explanation of symbols]

[0172] 100...dimming screen, 110...first conductive structure, 111...first base layer, 112...first conductive layer, 120...second conductive structure, 121...second base layer, 122...second conductive layer, 130...photoresponsive structure, 131...first photoresponsive layer, 132...second photoresponsive layer, 140...bistable display structure, 141...liquid crystal display layer, 142...ink display layer, 200...control device, 300...dimming device

Claims

1. A dimming screen, a first conductive structure; and a second conductive structure provided opposite the first conductive structure; and a photoresponsive structure provided between the first conductive structure and the second conductive structure, which is in a non-conductive state when no light is irradiated and in a conductive state when light is irradiated, and the wavelength of the light is 200 nm to 2000 nm; a bistable display structure disposed between the first conductive structure and the second conductive structure, located on one side of or within the photoresponsive structure, and exhibiting a localized erased state when a voltage is modulated and the photoresponsive structure is in a conducting state.

2. 2. The dimming screen according to claim 1, wherein the first conductive structure comprises: a first base layer; and a first conductive layer disposed on a side of the first base layer adjacent to the second conductive structure; and / or The second conductive structure includes: a second base layer; and a second conductive layer provided on a side of the second base layer adjacent to the first conductive structure.

3. 2. The light-controlling screen according to claim 1, wherein the light-responsive structure comprises: the first photoresponsive layer disposed between the first conductive structure and the bistable display structure; and / or A light-modulating screen comprising a second photoresponsive layer disposed between the second conductive structure and the bistable display structure.

4. 2. The dimming screen according to claim 1, wherein the bistable display structure comprises: a liquid crystal display layer disposed between the first conductive structure and the second conductive structure, located on one side of the photoresponsive structure, the liquid crystal display layer exhibiting a written state, a global erase state, under voltage modulation, and a local erase state when the voltage modulation and the photoresponsive structure are in a conducting state; or A light-controlling screen comprising an ink display layer disposed between the first conductive structure and the second conductive structure, disposed inside the photoresponsive structure, and indicating a writing state, a global erasure state, or a local erasure state when a voltage is modulated and the photoresponsive structure is in a conductive state.

5. A method for manufacturing a light-controlling screen for manufacturing the light-controlling screen according to any one of claims 1 to 4, the method comprising the steps of: Fabricating the First Conductive Structure forming a first conductive layer on a surface of the first base layer to form a first conductive structure; Fabricating the Second Conductive Structure forming a second conductive layer on the surface of the second base layer to form a second conductive structure; (Fabrication of Photoresponsive Structures) forming a first photoresponsive layer on the surface of the first conductive layer; and / or A second photoresponsive layer is formed on the surface of the second conductive layer. (Manufacturing dimming screens) Assembling the first base layer, the first conductive layer, the first photoresponsive layer, the liquid crystal display layer, the second conductive layer and the second base layer to form a light-controlling screen; or Assembling the first base layer, the first conductive layer, the first photoresponsive layer, the liquid crystal display layer, the second photoresponsive layer, the second conductive layer, and the second base layer to form a light-control screen; or A method for manufacturing a light-controlling screen, comprising assembling a first base layer, a first conductive layer, a first photoresponsive layer, an ink-indicating layer, a second photoresponsive layer, a second conductive layer, and a second base layer to form a light-controlling screen.

6. It is a dimming system, A light control screen according to any one of claims 1 to 4, or The present invention is characterized by including a light control screen manufactured by the manufacturing method according to claim 5.

7. The light control system according to claim 6 further comprises: A light control system comprising: a control device connected to the light control screen and adjusting a voltage applied to the light control screen.

8. The above-mentioned dimming system according to claim 6 or 7 further comprises: A dimming system comprising a dimming device that emits light onto the dimming screen to change the state of the photoresponsive structure of the dimming screen, the light having a wavelength of 200 nm to 2000 nm.

9. A dimming method, the dimming method comprising: Obtain voltage regulation instructions, adjusting the voltages applied to the first conductive structure / second conductive structure according to the voltage adjustment instructions to place the bistable display structure in a local erase mode; determining whether the photoresponsive structure is irradiated with light when the bistable display structure is in a local erasure mode, wherein the wavelength of the light is 200 nm to 2000 nm; when the photoresponsive structure is illuminated by light, the photoresponsive structure becomes conductive so as to locally erase the illuminated bistable display structure; The light-controlling method includes the step of: when the photoresponsive structure is not irradiated with light, the photoresponsive structure is in a non-conductive state so as not to locally erase the bistable display structure.

10. The light control method according to claim 9 further comprises: When the photoresponsive structure is irradiated with light, it detects the area irradiated with light, Dividing the photoresponsive structure into a conductive region and a non-conductive region based on the irradiation range of the light, A method of dimming comprising dividing the bistable display structure into erasable and non-erasable regions based on the conductive and non-conductive regions.

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