Electro-optical device and electronic apparatus

Abstract

Since the microlens condenses the incident light to the vicinity of the center of the opening region of the pixel, the life of the liquid crystal may be shortened.SOLUTION: An electro-optical device includes an electro-optical layer, and a lens member disposed on a light incident side of the electro-optical layer with respect to pixels and having a flat portion and a first Fresnel lens portion disposed outside the flat portion.SELECTED DRAWING: Figure 3

Description

[Technical Field]

[0001] The present disclosure relates to an electro-optical device and an electronic device. [Background technology]

[0002] Electro-optical devices including a microlens array in which microlenses are arranged two-dimensionally are known. Patent Document 1 describes a projection-type liquid crystal display device, which is an example of an electro-optical device. The projection-type liquid crystal display device includes a liquid crystal layer, a pixel electrode portion having pixel openings, and a microlens array. The microlens array is disposed on the light incident side of the liquid crystal layer. The microlenses included in the microlens array allow light to enter the pixel openings. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Laid-Open No. 2010-271687 Summary of the Invention [Problem to be solved by the invention]

[0004] The microlens focuses incident light near the center of the pixel aperture area, which may shorten the life of the liquid crystal. [Means for solving the problem]

[0005] The electro-optical device of the present disclosure includes an electro-optical layer and a lens member disposed on the light incident side of the electro-optical layer relative to pixels, the lens member having a flat portion and a first Fresnel lens portion disposed outside the flat portion.

[0006] An electronic device according to the present disclosure includes the electro-optical device described above. [Brief explanation of the drawings]

[0007] [Figure 1]FIG. 1 is a diagram showing a schematic configuration of a projection display device. [Figure 2] FIG. 1 is a diagram showing a schematic configuration of a liquid crystal device. [Figure 3] FIG. 1 is a diagram schematically illustrating a cross-sectional configuration of a liquid crystal device. [Figure 4] FIG. 2 is a diagram showing the electrical configuration of an element substrate. [Figure 5] FIG. 2 is a diagram showing a schematic configuration of an element substrate in a display area. [Figure 6A] FIG. 1 is a diagram showing a schematic configuration of a micro Fresnel lens. [Figure 6B] FIG. 1 is a diagram showing a schematic configuration of a micro Fresnel lens. [Figure 7A] FIG. 1 is a diagram showing a schematic configuration of a micro Fresnel lens. [Figure 7B] FIG. 1 is a diagram showing a schematic configuration of a micro Fresnel lens. [Figure 8A] 1A to 1C are diagrams showing the manufacturing process of a micro Fresnel lens. [Figure 8B] 1A to 1C are diagrams showing the manufacturing process of a micro Fresnel lens. [Figure 8C] 1A to 1C are diagrams showing the manufacturing process of a micro Fresnel lens. [Figure 8D] 1A to 1C are diagrams showing the manufacturing process of a micro Fresnel lens. [Figure 8E] 1A to 1C are diagrams showing the manufacturing process of a micro Fresnel lens. [Figure 8F] 1A to 1C are diagrams showing the manufacturing process of a micro Fresnel lens. [Figure 9] FIG. 10 is a diagram showing the light amount distribution of light that has passed through a micro Fresnel lens. [Figure 10] FIG. 2 is a diagram showing the positional relationship between a light-shielding film and a micro Fresnel lens. [Figure 11] FIG. 2 is a diagram showing the positional relationship between a conductive layer and a micro Fresnel lens. [Figure 12A] FIG. 1 is a diagram showing a schematic configuration of a micro Fresnel lens. [Figure 12B] FIG. 1 is a diagram showing a schematic configuration of a micro Fresnel lens. DETAILED DESCRIPTION OF THE INVENTION

[0008] FIG. 1 shows a schematic configuration of a projection display device 1000. The projection display device 1000 corresponds to an example of an electronic device. As an example, the projection display device 1000 is a three-plate projector equipped with three liquid crystal devices 300. The liquid crystal devices 300 correspond to an example of an electro-optical device. The projection display device 1000 includes an illumination device 1001, an illumination optical system 1002, a projection optical system 1003, and a control unit 1004.

[0009] In some figures, including Figure 1, the dimensions of each component may be drawn differently from their actual dimensions to make each component easier to understand. The dimensional ratios of each component in the drawings may differ from those of the actual components.

[0010] The illumination device 1001 is a light source that emits light to the illumination optical system 1002. The illumination device 1001 has a lamp light source such as a halogen lamp, a xenon lamp, or an ultra-high pressure mercury lamp. The illumination device 1001 may also have a solid-state light source such as an LED (Light Emitting Diode) or a laser light source.

[0011] The illumination optical system 1002 separates the light emitted from the illumination device 1001 into red light RL, green light GL, and blue light BL. The illumination optical system 1002 supplies the red light RL, green light GL, and blue light BL to the liquid crystal devices 300 provided corresponding to each color light.

[0012] The liquid crystal device 300 modulates light supplied from the illumination optical system 1002. Each of the three liquid crystal devices 300 functions as a light modulation device that modulates one of the separated lights of red light RL, green light GL, and blue light BL in accordance with the display image. A first polarizing plate 410 is disposed on the light incident side of each liquid crystal device 300. A second polarizing plate 420 is disposed on the light exit side of each liquid crystal device 300. The first polarizing plate 410 and the second polarizing plate 420 disposed in the liquid crystal device 300 are disposed in a crossed Nicol configuration in which the transmission axes of the respective polarizing plates for transmitting light are orthogonal to each other. The liquid crystal device 300 emits light to the projection optical system 1003 via the second polarizing plate 420.

[0013] The projection optical system 1003 forms image light by combining the red light RL, green light GL, and blue light BL modulated by the liquid crystal devices 300. The projection optical system 1003 projects the image light onto a screen SC.

[0014] The control unit 1004 is a controller that controls each unit of the projection display device 1000. The control unit 1004 is, for example, a processor having a CPU (Central Processing Unit). The control unit 1004 is composed of one or more processors. The control unit 1004 may have semiconductor memory such as a ROM (Read Only Memory) or a RAM (Random Access Memory). The semiconductor memory functions as a work area for the control unit 1004. The control unit 1004 controls each liquid crystal device 300 to modulate the red light RL, green light GL, and blue light BL supplied from the illumination optical system 1002 in accordance with the display image.

[0015] The projection display device 1000 is not limited to a three-panel projector. The projection display device 1000 may be a single-panel projector, a two-panel projector, or a projector equipped with four or more liquid crystal devices 300. Devices equipped with the liquid crystal device 300 may be smartphones, PDAs (Personal Digital Assistants), cameras, televisions, car navigation systems, personal computers, displays, electronic paper, calculators, videophones, and devices equipped with POS (Point of Sale), printers, scanners, copiers, video players, or touch panels. Devices equipped with the liquid crystal device 300 correspond to examples of electronic devices.

[0016] Fig. 2 shows a schematic configuration of a liquid crystal device 300. The liquid crystal device 300 is an active-drive transmissive liquid crystal device that includes a TFT (Thin Film Transistor) as a switching element for each pixel P. Fig. 2 shows a plan view of the liquid crystal device 300. The liquid crystal device 300 includes an element substrate 100, a counter substrate 200, a scanning line driving circuit 6, a data line driving circuit 7, a sealing member 8, and connection terminals 9. Fig. 2 shows a display area A1 and a peripheral area A2.

[0017] Several figures, including FIG. 2, illustrate an XYZ coordinate system. The X-axis, Y-axis, and Z-axis are mutually orthogonal. The Z-axis is an axis parallel to the stacking direction of the element substrate 100, the liquid crystal layer Lc, and the counter substrate 200. The +Z direction is the direction from the element substrate 100 to the counter substrate 200. The -Z direction is the direction from the counter substrate 200 to the element substrate 100. The X-axis is an axis parallel to the arrangement direction of the connection terminals 9. The +X direction is the direction from left to right in FIG. 2. The -X direction is the direction from right to left in FIG. 2. The Y-axis is an axis perpendicular to the X-axis and Z-axis. The +Y direction is the direction from bottom to top in FIG. 2. The -Y direction is the direction from top to bottom in FIG. 2.

[0018] The element substrate 100 is disposed on the light-emitting side of the liquid crystal layer Lc. The element substrate 100 is made of a light-transmitting material. Light-transmitting means that the material has transparency to visible light. The light-transmitting material preferably has a visible light transmittance of 50% or more.

[0019] The counter substrate 200 is disposed on the light incident side of the liquid crystal layer Lc. The counter substrate 200 is made of a light-transmitting material. The counter substrate 200 has a Fresnel lens array 83, which will be described later.

[0020] The scanning line driving circuit 6 is electrically connected to the scanning lines 3 (described later). The scanning line driving circuit 6 supplies a scanning signal to each of the scanning lines 3.

[0021] The data line driving circuit 7 is electrically connected to a plurality of data lines 4 (described later). The data line driving circuit 7 supplies an image signal to each of the data lines 4.

[0022] The sealing member 8 is provided in a frame shape surrounding the display area A1. The sealing member 8 is disposed between the element substrate 100 and the counter substrate 200. The sealing member 8 is made of an adhesive or the like containing a curable resin such as an epoxy resin.

[0023] The connection terminals 9 are mounting terminals on which external connection lines such as flexible printed circuits (FPCs) (not shown) are mounted. Various signals such as image signals, synchronization signals, inspection signals, common potentials, and power supply potentials are supplied to the connection terminals 9 from the outside via the external connection lines.

[0024] 2, the liquid crystal device 300 has a display area A1 and a peripheral area A2. The display area A1 is an area where an image is displayed. The peripheral area A2 is an area located on the outer periphery of the display area A1 when viewed from the +Z direction.

[0025] The display area A1 has a plurality of pixels P arranged in a matrix. The liquid crystal device 300 and the display area A1 shown in FIG. 2 are rectangular in shape. The shapes of the liquid crystal device 300 and the display area A1 are not limited to rectangular. The shapes of the liquid crystal device 300 and the display area A1 may be other shapes, such as circular.

[0026] In the peripheral area A2 of the element substrate 100, various circuits including a scanning line driving circuit 6, a data line driving circuit 7, connection terminals 9, and an inspection circuit (not shown) are arranged.

[0027] FIG. 3 is a schematic cross-sectional view of a liquid crystal device 300. FIG. 3 shows a schematic configuration of the liquid crystal device 300 along the line BB in FIG. 2. As shown in FIG. 3, the element substrate 100 and the counter substrate 200 are disposed with a sealing member 8 and a liquid crystal layer Lc interposed therebetween. Incident light IL is modulated by the liquid crystal layer Lc and emitted from the element substrate 100 as modulated light ML. The incident light IL is red light RL, green light GL, or blue light BL that has passed through the first polarizer 410. The incident light IL is linearly polarized light that vibrates in the direction of the transmission axis of the first polarizer 410.

[0028] The counter substrate 200 has a counter substrate base 92 , a Fresnel lens array 83 , a light-shielding film 85 , an insulating layer 87 , a first phase difference control member 50 , a counter electrode 20 , and a first alignment film 32 .

[0029] The counter substrate base 92 is a flat plate that is light-transmitting and insulating. The counter substrate base 92 is disposed on the incident side of the counter substrate 200 on which the incident light IL is incident. The counter substrate base 92 is made of a glass substrate or a quartz substrate. As an example, the counter substrate base 92 is made of silicon oxide (SiO2) with a refractive index of 1.48.

[0030] The Fresnel lens array 83 is disposed on the liquid crystal layer Lc side of the counter substrate base 92. The Fresnel lens array 83 is bonded to the counter substrate base 92. The refractive index of the Fresnel lens array 83 is different from that of the counter substrate base 92. The refractive index of the Fresnel lens array 83 is higher than that of the counter substrate base 92. The Fresnel lens array 83 is made of silicon oxynitride (SiON) having a refractive index of 1.58 to 1.68, for example. The Fresnel lens array 83 has a plurality of micro Fresnel lenses 80 and a lens surface 81. The counter substrate 200 shown in FIG. 3 is made of one Fresnel lens array 83, but is not limited to this. Two Fresnel lens arrays 83 may be arranged along the Z axis.

[0031] The micro Fresnel lens 80 is disposed on the light incident side of the liquid crystal layer Lc. The micro Fresnel lens 80 is disposed relative to the pixel P. The micro Fresnel lens 80 is provided corresponding to the pixel electrode 10, which will be described later, in a plan view from the +Z direction. The multiple micro Fresnel lenses 80 are two-dimensionally disposed along the X-axis and Y-axis. The micro Fresnel lens 80 is a type of microlens. The micro Fresnel lens 80 converges incident light IL. The micro Fresnel lens 80 suppresses light blocked by the multiple conductive layers 60, which will be described later, to achieve a bright display. The micro Fresnel lens 80 corresponds to an example of a lens member.

[0032] Lens surface 81 is a surface facing opposite substrate body 92. Lens surface 81 has a flat portion 210 and a Fresnel lens portion 220. Fresnel lens portion 220 is disposed outside flat portion 210. The detailed configurations of flat portion 210 and Fresnel lens portion 220 will be described later.

[0033] The light-shielding film 85 is provided on the liquid crystal layer Lc side of the lens surface 81. The light-shielding film 85 is made of a light-shielding metal or metal oxide. The light-shielding film 85 is arranged in an island shape. The arrangement of the light-shielding film 85 will be described later.

[0034] The insulating layer 87 is light-transmitting and insulating. The insulating layer 87 is made of an inorganic material such as silicon oxide. The insulating layer 87 may function as an optical path adjustment layer that adjusts the optical path of the incident light IL.

[0035] The first phase difference control member 50 changes the polarization state of the incident light IL from linearly polarized light to circularly polarized light or elliptically polarized light. By changing the polarization state of the light incident on the liquid crystal layer Lc to circularly polarized light or elliptically polarized light, the first phase difference control member 50 suppresses degradation of display quality due to reverse tilt domains. The first phase difference control member 50 is made of a dielectric material with a high refractive index, such as titanium oxide, silicon oxide, silicon oxynitride, silicon nitride, aluminum oxide, or hafnium oxide.

[0036] The counter electrode 20 is an electrode disposed opposite the plurality of pixel electrodes 10. The counter electrode 20 is also called a common electrode. The counter electrode 20 is formed of ITO (Indium Tin Oxide). The counter electrode 20 may also be formed of a transparent conductive material such as IZO (Indium Zinc Oxide) and FTO (Fluorine-doped tin oxide). The counter electrode 20 and the pixel electrodes 10 apply an electric field to the liquid crystal layer Lc.

[0037] The first alignment film 32 is an obliquely evaporated film formed on the counter electrode 20 by oblique evaporation. The first alignment film 32 is made of silicon oxide or the like. The first alignment film 32 aligns the liquid crystal molecules Lm of the liquid crystal layer Lc in a desired pretilt direction. The pretilt direction is expressed by a pretilt orientation and a pretilt angle. The pretilt orientation refers to the vector component in a plane including the X-axis and Y-axis of the vector that indicates the orientation direction of the liquid crystal molecules Lm when no electric field is applied to the liquid crystal layer Lc. The pretilt angle is the angle between the first alignment film 32 and the long axis of the liquid crystal molecules Lm.

[0038] The sealing member 8 is disposed between the first alignment film 32 and the second alignment film 31. The second alignment film 31 will be described later. The sealing member 8 is disposed on the outer periphery of the liquid crystal layer Lc. The sealing member 8 may include a gap material made of an inorganic material such as glass.

[0039] The liquid crystal layer Lc is disposed within an area surrounded by the element substrate 100, the counter substrate 200, and the sealing member 8. The liquid crystal layer Lc is an electro-optical layer whose optical properties change in response to the electric field generated by the pixel electrode 10 and the counter electrode 20. The liquid crystal layer Lc is made of a liquid crystal material containing liquid crystal molecules Lm with negative dielectric anisotropy. The orientation of the liquid crystal molecules Lm changes in response to the electric field applied to the liquid crystal layer Lc. The liquid crystal layer Lc modulates incident light IL in response to the applied electric field.

[0040] The element substrate 100 includes an element substrate base 91 , a transistor 1 , a conductive layer 60 , an interlayer insulating layer 70 , a second phase difference control member 40 , a pixel electrode 10 , and a second alignment film 31 .

[0041] The element substrate base 91 is a flat plate having light-transmitting and insulating properties, and is made of a glass substrate or a quartz substrate.

[0042] The transistor 1 is, for example, a TFT (Thin Film Transistor). The transistor 1 is a switching element provided corresponding to the pixel electrode 10. The arrangement of the transistor 1 will be described later.

[0043] The conductive layer 60 includes a first conductive layer 61, a second conductive layer 62, and a third conductive layer 63. The conductive layer 60 also includes a relay electrode and other wiring, etc. The relay electrode and other wiring, etc. are not shown. The conductive layer 60 is provided in a layer between the pixel electrode 10 and the transistor 1, and in a layer between the transistor 1 and the element substrate base 91. The conductive layer 60 has a light-shielding function of shielding the transistor 1 from light.

[0044] An example of the first conductive layer 61 is the scanning line 3. The first conductive layer 61 is formed of a conductive material having a light-shielding property. The conductive material having a light-shielding property is a metal or a metallic material. Examples of metals include tungsten (W), titanium (Ti), chromium (Cr), iron (Fe), and aluminum (Al). Examples of metallic materials include metal nitrides and metal silicides. The light-shielding property indicates the ability to block visible light. The light-shielding property preferably indicates that the transmittance of visible light is less than 50%, and more preferably 10% or less.

[0045] The second conductive layer 62 is, for example, a data line 4. Like the first conductive layer 61, the second conductive layer 62 is formed of a conductive material having a light-blocking property. The third conductive layer 63 is, for example, a constant potential wiring 5 described later. Like the first conductive layer 61 and the second conductive layer 62, the third conductive layer 63 is formed of a conductive material having a light-blocking property.

[0046] The interlayer insulating layer 70 is transparent and insulating. The interlayer insulating layer 70 includes a first insulating layer 71, a second insulating layer 72, a third insulating layer 73, and a fourth insulating layer 74. The first insulating layer 71, the second insulating layer 72, the third insulating layer 73, and the fourth insulating layer 74 are formed of an inorganic material such as silicon oxide.

[0047] The second phase difference control member 40 is provided between the pixel electrode 10 and the conductive layer 60. The second phase difference control member 40 changes the polarization state of light that has passed through the liquid crystal layer Lc from circularly polarized or elliptically polarized light to linearly polarized light. The light that passes through the conductive layer 60 is changed from circularly polarized or elliptically polarized light to linearly polarized light by the second phase difference control member 40 before it reaches the plurality of conductive layers 60. By the second phase difference control member 40 changing the light from circularly polarized or elliptically polarized light to linearly polarized light, changes in the polarization state when the light is reflected by the side surfaces of the third conductive layer 63, etc. are suppressed.

[0048] The pixel electrode 10 is provided in the display area A1. The pixel electrode 10 is light-transmitting. The pixel electrode 10 is made of ITO. The pixel electrode 10 may also be made of a transparent conductive material such as IZO or FTO.

[0049] The second alignment film 31 is an obliquely evaporated film formed by oblique evaporation on the second phase difference controlling member 40. The second alignment film 31 is made of silicon oxide.

[0050] Fig. 4 shows the electrical configuration of the element substrate 100. Fig. 4 shows the electrical configuration of the element substrate 100 in the form of an equivalent circuit diagram. A display area A1 of the element substrate 100 is provided with a plurality of transistors 1, n scanning lines 3, m data lines 4, m constant potential wirings 5, a plurality of pixel electrodes 10, and a plurality of capacitive elements 2. n and m are each an integer of 2 or greater.

[0051] The transistors 1 are provided at the intersections of the n scanning lines 3 and the m data lines 4. The pixel electrodes 10 are electrically connected to the drain regions of the transistors 1.

[0052] Each of the n scanning lines 3 extends along the X-axis. The n scanning lines 3 are arranged side by side at equal intervals along the Y-axis. Each of the n scanning lines 3 is electrically connected to the gate electrode of the corresponding transistor 1. The n scanning lines 3 are electrically connected to a scanning line driving circuit 6 shown in FIG. 2. The scanning line driving circuit 6 sequentially supplies a first scanning signal G1, a second scanning signal G2, ..., and an n-th scanning signal Gn to the first to n scanning lines 3.

[0053] Each of the m data lines 4 extends along the Y axis. The m data lines 4 are arranged side by side at equal intervals along the X axis. Each of the m data lines 4 is electrically connected to the source regions of the corresponding plurality of transistors 1. The m data lines 4 are electrically connected to a data line driving circuit 7 shown in FIG. 2. The data line driving circuit 7 supplies a first image signal E1, a second image signal E2, ..., and an m-th image signal Em to the first to m data lines 4.

[0054] The n scanning lines 3 and m data lines 4 are electrically insulated from each other. The n scanning lines 3 and m data lines 4 are arranged in a lattice pattern when viewed from the +Z direction. A region surrounded by two adjacent scanning lines 3 and two adjacent data lines 4 corresponds to a pixel P.

[0055] Each of the m constant potential wirings 5 ​​extends along the Y axis. The m constant potential wirings 5 ​​are arranged side by side at equal intervals along the X axis. The constant potential wirings 5 ​​are electrically insulated from the data lines 4 and the scanning lines 3. The constant potential wirings 5 ​​are arranged at intervals from the data lines 4 and the scanning lines 3. A constant potential such as a common potential or a ground potential applied to the counter electrode 20 is supplied to the constant potential wirings 5 ​​via a connection terminal 9.

[0056] The capacitive element 2 has two electrodes. One electrode of the capacitive element 2 is electrically connected to the constant potential wiring 5. The other electrode of the capacitive element 2 is electrically connected to the pixel electrode 10. The other electrode of the capacitive element 2 holds the potential of the first image signal E1 etc. supplied to the pixel electrode 10.

[0057] Fig. 5 shows a schematic configuration of the element substrate 100 in the display region A1. Fig. 5 shows a part of the element substrate 100 in the display region A1. Fig. 5 shows a part of the element substrate 100 in the display region A1 in a plan view from the +Z direction.

[0058] The display area A1 has a plurality of aperture areas A11, a first light-shielding area A12, and a second light-shielding area A13. The aperture areas A11 are arranged in a matrix along the X and Y axes in a plan view from the +Z direction. The first light-shielding area A12 and the second light-shielding area A13 are arranged in a frame shape between adjacent aperture areas A11.

[0059] The aperture region A11 is a region where the pixel electrode 10 is arranged. The aperture region A11 is a pixel aperture through which modulated light ML modulated by the liquid crystal layer Lc passes.

[0060] The first light-shielding region A12 and the second light-shielding region A13 prevent light passing through one opening region A11 from passing through the other opening region A11. The first light-shielding region A12 is a region extending along the Y-axis. The first light-shielding region A12 is composed of a conductive layer 60 including transistors 1, data lines 4, etc. The conductive layer 60 constituting the first light-shielding region A12 corresponds to the Y-axis conductive layer 60a described below. The second light-shielding region A13 is a region extending along the X-axis. The second light-shielding region A13 is composed of a conductive layer 60 including scan lines 3, etc. The conductive layer 60 constituting the second light-shielding region A13 corresponds to the X-axis conductive layer 60b described below.

[0061] 6A and 6B show a schematic configuration of the micro Fresnel lens 80. FIGS. 6A and 6B show a schematic configuration of a first micro Fresnel lens 80a, which is an example of the micro Fresnel lens 80. The first micro Fresnel lens 80a is formed in a first Fresnel lens array 83a. The first Fresnel lens array 83a is an example of the Fresnel lens array 83. The first Fresnel lens array 83a has a plurality of first micro Fresnel lenses 80a arranged along the X-axis and the Y-axis.

[0062] FIG. 6A shows the cross-sectional configuration of the first micro Fresnel lens 80a. FIG. 6A shows the cross-sectional configuration of the first micro Fresnel lens 80a in a plan view from the -Y direction. FIG. 6A shows the XZ cross section of the first micro Fresnel lens 80a. FIG. 6A shows the XZ cross section of the second portion Pt2 of the first micro Fresnel lens 80a. The second portion Pt2 will be described later. The first micro Fresnel lens 80a has a flat portion 210 and a plurality of Fresnel lens portions 220. The plurality of Fresnel lens portions 220 are a first Fresnel lens portion 221, a second Fresnel lens portion 222, and a third Fresnel lens portion 223. The first Fresnel lens portion 221, the second Fresnel lens portion 222, and the third Fresnel lens portion 223 are arranged in this order with the flat portion 210 at the center.

[0063] The flat portion 210 is disposed in the center of the first micro Fresnel lens 80a. The flat portion 210 is configured as a flat surface when viewed from the -Y direction. The flat portion 210 is configured at a first height from the plane of the Fresnel lens array 83 in the -Z direction. By providing the flat portion 210 in the center of the first micro Fresnel lens 80a, it is possible to prevent light from concentrating at the center of the pixel P.

[0064] The Fresnel lens portion 220 is disposed outside the flat portion 210. The Fresnel lens portion 220 is configured with a sloped surface that slopes from one side to the other due to multiple steps. The Fresnel lens portion 220 focuses light at a predetermined position within the pixel aperture. The first micro Fresnel lens 80a shown in FIG. 6A includes a first Fresnel lens portion 221, a second Fresnel lens portion 222, and a third Fresnel lens portion 223, but is not limited to this. The micro Fresnel lens 80 may include one or more Fresnel lens portions 220. By including the Fresnel lens portion 220, the micro Fresnel lens 80 is configured to have a thinner thickness along the Z axis than a spherical micro lens.

[0065] First Fresnel lens portion 221 is disposed outside flat portion 210. First Fresnel lens portion 221 is composed of second step portion 232, third step portion 233, and fourth step portion 234. In first Fresnel lens portion 221, second step portion 232, third step portion 233, and fourth step portion 234 form a first inclined surface SL1. First inclined surface SL1 is inclined at a first inclination angle θ1 with respect to imaginary plane VS. Imaginary plane VS is an imaginary plane parallel to the XY plane. First inclined surface SL1 is an inclined surface whose height in the +Z direction changes from one side to the other along the X axis. First inclined surface SL1 is composed of a first width W1 along the X axis.

[0066] The second step portion 232 is a step having a second height from the plane of the Fresnel lens array 83 in the -Z direction. The second height is lower than the first height. The second step portion 232 is formed by dry etching. A method for manufacturing the micro Fresnel lens 80, including dry etching, will be described later.

[0067] The third step portion 233 is a step having a third height from the plane of the Fresnel lens array 83 in the -Z direction. The third height is lower than the first height and the second height. The third step portion 233 is formed at a position adjacent to the second step portion 232. The third step portion 233 is formed by dry etching.

[0068] The fourth step portion 234 is a step configured by a fourth height from the plane of the Fresnel lens array 83 in the -Z direction. The fourth height is lower than the first height, the second height, and the third height. The fourth step portion 234 is formed at a position adjacent to the third step portion 233. The fourth step portion 234 is formed at a position adjacent to the first step portion 231 of the second Fresnel lens portion 222 formed outside the first Fresnel lens portion 221.

[0069] The second Fresnel lens portion 222 is disposed outside the flat portion 210 and the first Fresnel lens portion 221. The second Fresnel lens portion 222 is composed of a first step portion 231, a second step portion 232, a third step portion 233, a fourth step portion 234, and an intersection surface portion 235. In the second Fresnel lens portion 222, the first step portion 231, the second step portion 232, the third step portion 233, and the fourth step portion 234 form a second inclined surface SL2. The second inclined surface SL2 is inclined at a second inclination angle θ2 with respect to the imaginary plane VS. The second inclination angle θ2 of the first micro Fresnel lens 80a is smaller than the first inclination angle θ1. The second inclined surface SL2 is an inclined surface whose height in the +Z direction changes from one side to the other along the X-axis. The inclination direction of the second inclined surface SL2 is the same as the inclination direction of the first inclined surface SL1 of the adjacent first Fresnel lens portion 221. The second inclined surface SL2 is defined by a second width W2 along the X axis. The second width W2 of the first micro Fresnel lens 80a is wider than the first width W1.

[0070] The first step portion 231 is a step having a first height from the plane in the −Z direction of the Fresnel lens array 83. The first step portion 231 is formed by dry etching.

[0071] The crossing surface 235 of the second Fresnel lens portion 222 is disposed at a position adjacent to the fourth step portion 234 of the first Fresnel lens portion 221. The crossing surface 235 of the second Fresnel lens portion 222 is connected to the fourth step portion 234 of the first Fresnel lens portion 221. The crossing surface 235 of the second Fresnel lens portion 222 is connected to the first step portion 231 of the second Fresnel lens portion 222. The crossing surface 235 is a surface that is orthogonal or approximately orthogonal to the −Z direction surface of the Fresnel lens array 83.

[0072] The third Fresnel lens portion 223 is disposed outside the flat portion 210, the first Fresnel lens portion 221, and the second Fresnel lens portion 222. The third Fresnel lens portion 223 is composed of a first step portion 231, a second step portion 232, a third step portion 233, a fourth step portion 234, and an intersection surface portion 235. In the third Fresnel lens portion 223, the first step portion 231, the second step portion 232, the third step portion 233, and the fourth step portion 234 form a third inclined surface SL3. The third inclined surface SL3 is inclined at a third inclination angle θ3 with respect to the imaginary plane VS. The third inclination angle θ3 of the first micro Fresnel lens 80a is the same as or substantially the same as the second inclination angle θ2. The third inclined surface SL3 is an inclined surface whose height in the +Z direction changes from one side to the other along the X axis. The inclination direction of the third inclined surface SL3 is the same as the inclination direction of the second inclined surface SL2 of the adjacent second Fresnel lens portion 222. The third inclined surface SL3 is defined by a third width W3 along the X axis. The third width W3 of the first micro Fresnel lens 80a is the same as the second width W2 and is wider than the first width W1.

[0073] The crossing surface 235 of the third Fresnel lens portion 223 is disposed at a position adjacent to the fourth step portion 234 of the second Fresnel lens portion 222. The crossing surface 235 of the third Fresnel lens portion 223 is connected to the fourth step portion 234 of the second Fresnel lens portion 222. The crossing surface 235 of the third Fresnel lens portion 223 is connected to the first step portion 231 of the third Fresnel lens portion 223.

[0074] The plurality of Fresnel lens portions 220 are configured with steps such as, but not limited to, the second step portion 232 and the third step portion 233. The plurality of Fresnel lens portions 220 are configured with a plurality of steps each having a different height from the plane of the Fresnel lens array 83 in the -Z direction.

[0075] Although not shown, the YZ cross section of the first micro Fresnel lens 80a is the same as or substantially the same as the shape shown in FIG. 6A. The first width W1, second width W2, and third width W3 along the Y axis may be the same as or different from the first width W1, second width W2, and third width W3 along the X axis, respectively. The length relationship between the first width W1, second width W2, and third width W3 along the Y axis is configured to be the same as the length relationship between the first width W1, second width W2, and third width W3 along the X axis.

[0076] Fig. 6B shows a plan view of the first micro Fresnel lens 80a from the +Z direction. Fig. 6B shows a virtual diagonal line DL of the first micro Fresnel lens 80a. The first micro Fresnel lens 80a is made up of a flat portion 210 and a plurality of Fresnel lens portions 220 surrounding the flat portion 210.

[0077] The flat portion 210 is configured in a quadrangular shape. Each corner of the flat portion 210 is arranged on the diagonal line DL of the first micro Fresnel lens 80a. Along each side of the flat portion 210, a Fresnel lens portion 220 is configured.

[0078] Each of the multiple Fresnel lens portions 220 is configured in a quadrangular shape. Each corner of the Fresnel lens portion 220 is arranged on the diagonal line DL of the first micro Fresnel lens 80a. The Fresnel lens portion 220 is configured with a first portion Pt1 consisting of multiple steps along the Y axis and a second portion Pt2 consisting of multiple steps along the X axis.

[0079] First step portion 231, second step portion 232, third step portion 233, and fourth step portion 234 that constitute Fresnel lens portion 220 are formed in a quadrangular shape. In first Fresnel lens portion 221, second step portion 232, third step portion 233, and fourth step portion 234 are arranged in this order from flat portion 210 toward the outside. In second Fresnel lens portion 222 and third Fresnel lens portion 223, first step portion 231, second step portion 232, third step portion 233, and fourth step portion 234 are arranged in this order from flat portion 210 toward the outside.

[0080] The first step portion 231, the second step portion 232, the third step portion 233, and the fourth step portion 234 in the first portion Pt1 extend along the Y axis. The height along the Z axis of the first portion Pt1 of the Fresnel lens portion 220 changes from one side to the other along the X axis. The first step portion 231, the second step portion 232, the third step portion 233, and the fourth step portion 234 in the second portion Pt2 extend along the X axis. The height along the Z axis of the second portion Pt2 of the Fresnel lens portion 220 changes from one side to the other along the Y axis.

[0081] FIG. 6B shows the light collection area FA. The light collection area FA is an area where the amount of light is higher than areas other than the light collection area FA. The light collection area FA is an area where the first portion Pt1 and the second portion Pt2 of the Fresnel lens section 220 are connected. In the first micro Fresnel lens 80a, light collection areas FA are generated in eight locations. The light collection areas FA are not generated in the flat portion 210. The multiple light collection areas FA are dispersed within the plane of the pixel opening. The multiple light collection areas FA are dispersed within the XY plane of the liquid crystal layer Lc corresponding to the pixel opening. Dispersing the multiple light collection areas FA within the plane of the pixel opening suppresses deterioration in the lifespan of the liquid crystal due to light collection on one part of the liquid crystal layer Lc.

[0082] 6B, the width of the first micro Fresnel lens 80a along the X axis is different from the width along the Y axis, but is not limited to this. The width of the first micro Fresnel lens 80a along the X axis may be the same as or different from the width along the Y axis. The widths of the first micro Fresnel lens 80a along the X axis and the Y axis are set appropriately depending on the shape of the pixel aperture.

[0083] The liquid crystal device 300 includes a liquid crystal layer Lc, and a first micro Fresnel lens 80a that is arranged on the light incident side of the liquid crystal layer Lc with respect to the pixel P and has a flat portion 210 and a first Fresnel lens portion 221 that is arranged outside the flat portion 210. By providing the first micro Fresnel lens 80a having the Fresnel lens portion 220 disposed outside the flat portion 210, the plurality of light-collecting regions FA are dispersed at positions different from the center of the pixel aperture. Dispersing the plurality of light-collecting regions FA suppresses a decrease in the life span of the liquid crystal.

[0084] 7A and 7B show a schematic configuration of the micro Fresnel lens 80. FIGS. 7A and 7B show a schematic configuration of a second micro Fresnel lens 80b, which is an example of the micro Fresnel lens 80. The second micro Fresnel lens 80b is formed in a second Fresnel lens array 83b. The second Fresnel lens array 83b is an example of the Fresnel lens array 83. The second Fresnel lens array 83b has a plurality of second micro Fresnel lenses 80b arranged along the X-axis and the Y-axis.

[0085] FIG. 7A shows the cross-sectional configuration of the second micro Fresnel lens 80b. FIG. 7A shows the cross-sectional configuration of the second micro Fresnel lens 80b in a plan view from the -Y direction. FIG. 7A shows the XZ cross section of the second micro Fresnel lens 80b. Like the first micro Fresnel lens 80a, etc., the second micro Fresnel lens 80b has a flat portion 210 and multiple Fresnel lens portions 220. The multiple Fresnel lens portions 220 are a first Fresnel lens portion 221, a second Fresnel lens portion 222, and a third Fresnel lens portion 223. The configuration of the second micro Fresnel lens 80b is the same as that of the first micro Fresnel lens 80a, except for the first Fresnel lens portion 221.

[0086] The first Fresnel lens portion 221 of the second micro Fresnel lens 80b is composed of a third step portion 233 and a fourth step portion 234. The first Fresnel lens portion 221 has a first inclined surface SL1 composed of the third step portion 233 and the fourth step portion 234. The first inclined surface SL1 is inclined at a first inclination angle θ1 with respect to the imaginary plane VS. The first inclined surface SL1 has a first width W1 along the X-axis. The first inclination angle θ1 of the second micro Fresnel lens 80b is larger than the first inclination angle θ1 of the first micro Fresnel lens 80a. The first width W1 of the second micro Fresnel lens 80b is narrower than the first width W1 of the first micro Fresnel lens 80a. The configuration of the first Fresnel lens portion 221 can be changed as needed by varying the configuration of each step.

[0087] In the second micro Fresnel lens 80b, the first tilt angle θ1 is configured to be larger than the second tilt angle θ2 and the third tilt angle θ3. In the second micro Fresnel lens 80b, the first width W1 is configured to be narrower than the second width W2 and the third width W3.

[0088] Although not shown, the YZ cross section of the second micro Fresnel lens 80b is the same as or substantially the same as the shape shown in FIG. 7A. The first width W1, the second width W2, and the third width W3 along the Y axis may be the same as or different from the first width W1, the second width W2, and the third width W3 along the X axis, respectively. The length relationship between the first width W1, the second width W2, and the third width W3 along the Y axis is configured to be the same as the length relationship between the first width W1, the second width W2, and the third width W3 along the X axis.

[0089] Fig. 7B shows a plan view of the second micro Fresnel lens 80b from the +Z direction. Fig. 7B shows a virtual diagonal line DL of the second micro Fresnel lens 80b. The second micro Fresnel lens 80b is made up of a flat portion 210 and a plurality of Fresnel lens portions 220 surrounding the flat portion 210.

[0090] 7B, the width of the second micro Fresnel lens 80b along the X axis is different from the width along the Y axis, but is not limited to this. The width of the second micro Fresnel lens 80b along the X axis may be the same as or different from the width along the Y axis. The widths of the second micro Fresnel lens 80b along the X axis and the Y axis are set appropriately depending on the shape of the pixel aperture.

[0091] 8A, 8B, 8C, 8D, 8E, and 8F show the manufacturing process of the micro Fresnel lens 80. Figures 8A, 8B, 8C, 8D, 8E, and 8F show the manufacturing process of a second micro Fresnel lens 80b, which is an example of the micro Fresnel lens 80.

[0092] Fig. 8A shows the state after the first mask forming step. Fig. 8A shows the counter substrate base 92 and the mask Mk. Fig. 8A shows the XZ cross section of the counter substrate base 92 before the micro Fresnel lens 80 is formed. Fig. 8A shows the first mask Mk1, which is an example of the mask Mk.

[0093] The counter substrate base 92 is formed of, for example, a quartz substrate. The counter substrate base 92 may be subjected to a planarization process such as CMP (Chemical Mechanical Polishing).

[0094] The first mask Mk1 is formed on the counter substrate base 92 by applying a resist material onto the counter substrate base 92, followed by exposure and development. The first mask Mk1 has a plurality of openings. The widths of each of the plurality of openings along the X axis and the Y axis are set appropriately.

[0095] 8B shows the state after the first dry etching process. The first dry etching process is performed after the first mask formation process. The dry etching used in the first dry etching process is, for example, RIE (Reactive Ion Etching) using fluorine gas such as CHF3 (Trifluoromethane) as a reactive gas. By performing the first dry etching process, the surface of the counter substrate base 92 corresponding to the openings in the first mask Mk1 is etched.

[0096] Fig. 8C shows the state after the second mask forming step. The second mask forming step is performed after the first dry etching step. Fig. 8C shows the opposing substrate base 92 and the second mask Mk2 after the first dry etching step. The second mask Mk2 is an example of the mask Mk.

[0097] The second mask Mk2 is formed on the counter substrate base 92 after the first mask Mk1 is removed from the counter substrate base 92. The second mask Mk2 is formed on the counter substrate base 92 by applying a resist material to the counter substrate base 92 after the first dry etching step, and then exposing and developing the resist material. A plurality of openings are provided in the second mask Mk2. The second mask Mk2 is formed in a part of the area where the first mask Mk1 was formed and in a part of the area etched by the first dry etching step. The part of the area where the second mask Mk2 is formed corresponds to the position where the fourth step portion 234 is to be formed.

[0098] 8D shows the state after the second dry etching process. The second dry etching process is performed after the second mask formation process. The dry etching used in the second dry etching process is, for example, RIE, similar to the dry etching used in the first dry etching process. By performing the second dry etching process, the surface of the counter substrate base 92 corresponding to the openings of the second mask Mk2 is etched.

[0099] By the second dry etching process, multiple steps are formed in the opposing substrate base 92. The multiple steps correspond to positions where the flat portion 210, the first step portion 231, the second step portion 232, the third step portion 233, and the fourth step portion 234 are formed. The positions where the first mask Mk1 and the second mask Mk2 are formed correspond to positions where the fourth step portion 234 is formed. The positions where the first mask Mk1 and the second mask Mk2 are not formed correspond to positions where the flat portion 210 and the first step portion 231 are formed. The positions where the first mask Mk1 is formed and the second mask Mk2 is not formed correspond to positions where the third step portion 233 is formed. The positions where the first mask Mk1 is not formed and the second mask Mk2 is formed correspond to positions where the second step portion 232 is formed.

[0100] FIG. 8E shows the state after the mask removal process. The mask removal process is performed after the second dry etching process. For the mask removal process, ashing using plasma or ozone is used. FIG. 8E shows the counter substrate base 92 from which the second mask Mk2 has been removed. Steps are formed on the counter substrate base 92.

[0101] FIG. 8F shows the state after the lens layer forming process. After the opposing substrate base 92 shown in FIG. 8E is formed, the lens layer forming process is performed. Before the lens layer forming process is performed, a chemical such as hydrogen fluoride may be used to round off the corners of the steps formed on the opposing substrate base 92. In the lens layer forming process, a vapor deposition method such as CVD is used. A Fresnel lens array 83 including micro Fresnel lenses 80 is formed by the lens layer forming process. The molded Fresnel lens array 83 is subjected to a planarization process such as CMP.

[0102] 8F shows a second Fresnel lens array 83b formed in the lens layer forming process. The second Fresnel lens array 83b includes second micro Fresnel lenses 80b. The second micro Fresnel lenses 80b include a flat portion 210, a first Fresnel lens portion 221, a second Fresnel lens portion 222, and a third Fresnel lens portion 223. Each Fresnel lens portion 220 includes a third step portion 233, a fourth step portion 234, etc.

[0103] 8A, 8B, 8C, 8D, 8E, and 8F show the manufacturing process of the second Fresnel lens array 83b including the second micro Fresnel lenses 80b. The first Fresnel lens array 83a including the first micro Fresnel lenses 80a can be manufactured by the same manufacturing process. By adjusting various manufacturing conditions such as the formation position of the mask Mk and the number of etching processes, it is possible to form a Fresnel lens array 83 including micro Fresnel lenses 80 with different configurations.

[0104] Fig. 9 shows the light intensity distribution of light that has passed through the micro Fresnel lens 80. Fig. 9 shows the light intensity distribution of light that has passed through the second micro Fresnel lens 80b. Fig. 9 shows the light intensity distribution of light that has passed through the second micro Fresnel lens 80b in the XY plane. Fig. 9 shows the light intensity distribution of light that is condensed by the liquid crystal layer Lc.

[0105] As shown in FIG. 9, four light intensity peaks occur on the XY plane. The positions where the light intensity peaks occur correspond to the positions of the light-collecting areas FA. The positions where the light intensity peaks occur are located on the diagonal line DL of the second micro Fresnel lens 80b. The light intensity peaks are dispersed to four locations. The light intensity at the position corresponding to the center of the second micro Fresnel lens 80b is lower than the peak value. Providing a flat portion 210 at the center of the second micro Fresnel lens 80b suppresses light concentration at the center. As the light intensity peaks do not concentrate at the center but are dispersed within the plane, deterioration of the liquid crystal layer Lc is suppressed.

[0106] Fig. 10 shows the positional relationship between the light-shielding film 85 and the micro Fresnel lens 80. Fig. 10 shows the positional relationship between the light-shielding film 85 and the second micro Fresnel lens 80b in a plan view from the +Z direction.

[0107] The light-shielding films 85 are arranged in an island shape. Each of the multiple light-shielding films 85 has a second micro Fresnel lens 80b arranged at its corner. The light-shielding films 85 are arranged on the fourth step portion 234 of the third Fresnel lens portion 223. The width of the light-shielding film 85 along the X-axis shown in FIG. 10 is the same as or approximately the same as the width of the fourth step portion 234 of the third Fresnel lens portion 223 along the X-axis. The width of the light-shielding film 85 along the Y-axis shown in FIG. 10 is the same as or approximately the same as the width of the fourth step portion 234 of the third Fresnel lens portion 223 along the Y-axis. The size of the light-shielding film 85 is not limited to the configuration shown in FIG. 10. The size of the light-shielding film 85 can be set as appropriate.

[0108] Fig. 11 shows the positional relationship between the conductive layer 60 and the micro Fresnel lens 80. Fig. 11 shows the positional relationship between the conductive layer 60 and the second micro Fresnel lens 80b in a plan view from the +Z direction.

[0109] The conductive layer 60 includes a Y-axis conductive layer 60a and an X-axis conductive layer 60b. The Y-axis conductive layer 60a and the X-axis conductive layer 60b are disposed in positions surrounding the second micro Fresnel lens 80b. The Y-axis conductive layer 60a and the X-axis conductive layer 60b block light that has passed through the liquid crystal layer Lc.

[0110] The Y-axis conductive layer 60a extends along the Y-axis. The direction along the Y-axis corresponds to an example of a first direction. The Y-axis conductive layer 60a corresponds to the first light-shielding area A12. The Y-axis conductive layer 60a corresponds to an example of a first light-shielding member. The Y-axis conductive layer 60a is provided in the first portion Pt1. The Y-axis conductive layer 60a is disposed along the first portion Pt1 of the Fresnel lens portion 220.

[0111] The X-axis conductive layer 60b extends along the X-axis. The direction along the X-axis corresponds to an example of the second direction. The X-axis conductive layer 60b corresponds to the second light-shielding area A13. The X-axis conductive layer 60b corresponds to an example of a second light-shielding member. The X-axis conductive layer 60b is provided in the second portion Pt2. The X-axis conductive layer 60b is disposed along the second portion Pt2 of the Fresnel lens section 220.

[0112] The Y-axis conductive layer 60a and the X-axis conductive layer 60b are disposed at positions overlapping the fourth step portion 234 of the third Fresnel lens portion 223. The width along the X-axis of the Y-axis conductive layer 60a shown in FIG. 11 is configured to be the same as or approximately the same as the width along the X-axis of the fourth step portion 234 of the third Fresnel lens portion 223. The width along the Y-axis of the X-axis conductive layer 60b shown in FIG. 11 is configured to be the same as or approximately the same as the width along the Y-axis of the fourth step portion 234 of the third Fresnel lens portion 223. The width along the X-axis of the Y-axis conductive layer 60a and the width along the Y-axis of the X-axis conductive layer 60b are not limited to the configuration shown in FIG. 11. The width along the X-axis of the Y-axis conductive layer 60a and the width along the Y-axis of the X-axis conductive layer 60b are set as appropriate.

[0113] The light-shielding film 85 is disposed at a position overlapping with the Y-axis conductive layer 60a and the X-axis conductive layer 60b in plan view from the +Z direction. The light-shielding film 85 and the conductive layer 60 suppress light diffusing to the outside of the second micro Fresnel lens 80b along the diagonal line DL of the second micro Fresnel lens 80b.

[0114] The second micro Fresnel lens 80b has a flat portion 210 and multiple Fresnel lens portions 220. Each Fresnel lens portion 220 has a first portion Pt1 and a second portion Pt2. The first portion Pt1 is arranged along the Y-axis conductive layer 60a. The second portion Pt2 is arranged along the X-axis conductive layer 60b. By arranging the Y-axis conductive layer 60a along the first portion Pt1, light passing through the second micro Fresnel lens 80b can be prevented from diffusing in the +X and −X directions beyond the position where the second micro Fresnel lens 80b is arranged. By arranging the X-axis conductive layer 60b along the second portion Pt2, light passing through the second micro Fresnel lens 80b can be prevented from diffusing in the +Y and −Y directions beyond the position where the second micro Fresnel lens 80b is arranged.

[0115] The liquid crystal device 300 includes a Y-axis conductive layer 60a extending along the Y-axis and an X-axis conductive layer 60b extending along the X-axis that intersects with the Y-axis. The first Fresnel lens portion 221 includes a first portion Pt1 disposed along the Y-axis conductive layer 60a and a second portion Pt2 disposed along the X-axis conductive layer 60b. By providing the Y-axis conductive layer 60a and the X-axis conductive layer 60b, it is possible to suppress light diffusing outside the second micro Fresnel lens 80b.

[0116] 12A and 12B show a schematic configuration of the micro Fresnel lens 80. FIGS. 12A and 12B show a schematic configuration of a third micro Fresnel lens 80c, which is an example of the micro Fresnel lens 80. The third micro Fresnel lens 80c is formed in a third Fresnel lens array 83c. The third Fresnel lens array 83c is an example of the Fresnel lens array 83. The third Fresnel lens array 83c has a plurality of third micro Fresnel lenses 80c arranged along the X-axis and the Y-axis.

[0117] FIG. 12A shows the cross-sectional configuration of the third micro Fresnel lens 80c. FIG. 12A shows the cross-sectional configuration of the third micro Fresnel lens 80c in a plan view from the -Y direction. FIG. 12A shows the XZ cross section of the third micro Fresnel lens 80c. Like the first micro Fresnel lens 80a, etc., the third micro Fresnel lens 80c has a flat portion 210 and multiple Fresnel lens portions 220. The multiple Fresnel lens portions 220 are a first Fresnel lens portion 221, a second Fresnel lens portion 222, and a third Fresnel lens portion 223. The configuration of the third micro Fresnel lens 80c is the same as that of the first micro Fresnel lens 80a, except for the width and tilt angle of each Fresnel lens portion 220.

[0118] Fig. 12B shows a plan view of the third micro Fresnel lens 80c from the +Z direction. Fig. 12B shows the first width W1, the second width W2, and the third width W3. The first width W1 is the width of the first Fresnel lens portion 221 along the X-axis. The second width W2 is the width of the second Fresnel lens portion 222 along the X-axis. The third width W3 is the width of the third Fresnel lens portion 223 along the X-axis.

[0119] 12A and 12B, the width relationship of each Fresnel lens portion 220 of the third micro Fresnel lens 80c is different from the width relationship of each Fresnel lens portion 220 of the first micro Fresnel lens 80a. The first width W1, the second width W2, and the third width W3 have the following relationship: W1>W2>W3 (formula 1) Furthermore, the relationship between the inclination angles of the Fresnel lens portions 220 of the third micro Fresnel lens 80c is different from the relationship between the inclination angles of the Fresnel lens portions 220 of the first micro Fresnel lens 80a. As shown in Fig. 12A, the first inclination angle θ1, the second inclination angle θ2, and the third inclination angle θ3 have the following relationship: θ1<θ2<θ3 (Equation 2) The width and inclination angle of each Fresnel lens portion 220 are adjusted by changing the width along the X-axis of each step that constitutes each Fresnel lens portion 220.

[0120] The second Fresnel lens portion 222 is disposed on the outer periphery of the first Fresnel lens portion 221. The first width W1 of the first Fresnel lens portion 221 is configured to be wider than the second width W2 of the second Fresnel lens portion 222. The first inclination angle θ1 is smaller than the second inclination angle θ2. The relationship between the widths and inclination angles of the first Fresnel lens portion 221 and the second Fresnel lens portion 222 suppresses light from concentrating on the center of the third micro Fresnel lens 80c. In addition, light can be prevented from diffusing at the outer periphery of the third micro Fresnel lens 80c.

[0121] The third Fresnel lens portion 223 is disposed on the outer periphery of the first Fresnel lens portion 221 and the second Fresnel lens portion 222. The first width W1 of the first Fresnel lens portion 221 is configured to be wider than the second width W2 of the second Fresnel lens portion 222 and the third width W3 of the third Fresnel lens portion 223. The first inclination angle θ1 is smaller than the second inclination angle θ2 and the third inclination angle θ3. The relationship between the widths and inclination angles of the Fresnel lens portions 220 suppresses light concentration at the center of the third micro Fresnel lens 80c. Furthermore, light can be prevented from diffusing at the outer periphery of the third micro Fresnel lens 80c.

[0122] 12A and 12B show a first width W1 along the X-axis, a second width W2 along the X-axis, and a third width W3 along the X-axis. The relationship between the first width W1 along the Y-axis, the second width W2 along the Y-axis, and the third width W3 along the Y-axis is the same as the relationship between the first width W1 along the X-axis, the second width W2 along the X-axis, and the third width W3 along the X-axis. FIG. 12A shows a first tilt angle θ1, a second tilt angle θ2, and a third tilt angle θ3 along the X-axis. The relationship between the first tilt angle θ1, the second tilt angle θ2, and the third tilt angle θ3 along the Y-axis is the same as the relationship between the first tilt angle θ1, the second tilt angle θ2, and the third tilt angle θ3 along the X-axis.

[0123] The third Fresnel lens array 83c has a first Fresnel lens portion 221 having a first width W1 and a second Fresnel lens portion 222 having a second width W2 arranged outside the first Fresnel lens portion 221, and it is preferable that the first width W1 is wider than the second width W2. Light concentration at the center of the third micro Fresnel lens 80c is suppressed.

[0124] The projection display device 1000 includes a liquid crystal device 300 having a liquid crystal layer Lc and a first micro Fresnel lens 80a arranged on the light incident side of the liquid crystal layer Lc relative to the pixel P, and having a flat portion 210 and a Fresnel lens portion 220 arranged outside the flat portion 210. By providing the first micro Fresnel lens 80a having the Fresnel lens portion 220 disposed outside the flat portion 210, the light-collecting area FA is dispersed to a position different from the center of the pixel aperture. Dispersing the light-collecting area FA suppresses a decrease in the lifespan of the liquid crystal. [Explanation of symbols]

[0125] REFERENCE SIGNS LIST 1...transistor, 2...capacitor element, 3...scanning line, 4...data line, 5...constant potential wiring, 6...scanning line driving circuit, 7...data line driving circuit, 8...sealing member, 9...connecting terminal, 10...pixel electrode, 20...counter electrode, 31...second alignment film, 32...first alignment film, 40...second phase difference control member, 50...first phase difference control member, 60...conductive layer, 60a...Y-axis conductive layer, 60b...X-axis conductive layer, 61...first conductive layer, 62...second conductive layer, 63...third conductive layer, 70...interlayer insulating layer, 71...first insulating layer, 72...second insulating layer, 73...third insulating layer, 74...fourth insulating layer, 80 ...micro Fresnel lens, 80a...first micro Fresnel lens, 80b...second micro Fresnel lens, 80c...third micro Fresnel lens, 81...lens surface, 83...Fresnel lens array, 83a...first Fresnel lens array, 83b...second Fresnel lens array, 83c...third Fresnel lens array, 85...light-shielding film, 87...insulating layer, 91...element substrate base, 92...counter substrate base, 100...element substrate, 200...counter substrate, 210...flat portion, 220...Fresnel lens portion, 221...first Fresnel lens portion, 222...second Fresnel lens Fresnel lens portion, 223...third Fresnel lens portion, 231...first step portion, 232...second step portion, 233...third step portion, 234...fourth step portion, 235...intersecting surface portion, 300...liquid crystal device, 410...first polarizing plate, 420...second polarizing plate, 1000...projection type display device, 1001...illumination device, 1002...illumination optical system, 1003...projection optical system, 1004...controller, A1...display area, A11...aperture area, A12...first light-shielding area, A13...second light-shielding area, A2...peripheral area, BL...blue light, DL...diagonal line, E1...first image signal, E2...second image signal, Em...mth image signal, FA...light collection area, G1...first scanning signal, G2...second scanning signal, Gn...nth scanning signal, GL...green light, IL...incident light, Lc...liquid crystal layer, Lm...liquid crystal molecules, Mk...mask, Mk1...first mask, Mk2...second mask, ML...modulated light, P...pixel, Pt1...first portion, Pt2...second portion, RL...red light, SC...screen, SL1...first inclined surface, SL2...second inclined surface, SL3...third inclined surface, VS...virtual plane, W1...first width, W2...second width, W3...third width, θ1...first inclination angle, θ2...second inclination angle, θ3...third inclination angle.

Claims

1. an electro-optic layer; a lens member disposed on a light incident side of the electro-optical layer with respect to pixels, the lens member having a flat portion and a first Fresnel lens portion disposed outside the flat portion; An electro-optical device comprising:

2. a first light blocking member extending along a first direction; a second light-blocking member extending along a second direction intersecting the first direction, the first Fresnel lens portion has a first portion disposed along the first light-shielding member and a second portion disposed along the second light-shielding member; The electro-optical device according to claim 1 .

3. the lens member has the first Fresnel lens portion having a first width and a second Fresnel lens portion having a second width disposed outside the first Fresnel lens portion, The first width is greater than the second width. The electro-optical device according to claim 1 .

4. An electronic device comprising the electro-optical device according to claim 1 .

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