Gas detection device, gas supply system, and substrate processing apparatus

Abstract

To provide a technique capable of improving detection accuracy of a processing gas leaked into a gas box.SOLUTION: A gas detection device according to one aspect of the present disclosure is a gas detection device that detects a treatment gas leaking into a gas box, the gas detection device including a suction unit having a plurality of suction holes that suck the treatment gas at positions different from each other in a cross section orthogonal to a central axis of an exhaust duct that exhausts the inside of the gas box, and a gas detector that detects the treatment gas sucked by the suction unit.SELECTED DRAWING: Figure 4

Description

[Technical Field]

[0001] The present disclosure relates to a gas detection device, a gas supply system, and a substrate processing apparatus. [Background technology]

[0002] A technology has been disclosed in which a gas sensor is provided midway through an exhaust port that exhausts the atmosphere inside a gas box, and processing gas leaked into the gas box is detected (see, for example, Patent Document 1). [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Patent Publication No. 2021-52110 Summary of the Invention [Problem to be solved by the invention]

[0004] The present disclosure provides a technique that can improve the accuracy of detecting process gas leaked into a gas box. [Means for solving the problem]

[0005] A gas detection device according to one aspect of the present disclosure is a gas detection device that detects process gas leaking into a gas box, and includes: a suction section having a plurality of suction holes that suck in the process gas at different positions in a cross section perpendicular to the central axis of an exhaust duct that exhausts the gas box; and a gas detector that detects the process gas sucked in by the suction section. [Effects of the Invention]

[0006] According to the present disclosure, it is possible to improve the accuracy of detecting process gas leaked into the gas box. [Brief explanation of the drawings]

[0007] [Figure 1] 1 is a schematic plan view showing a substrate processing apparatus according to an embodiment; [Figure 2] 1 is a schematic cross-sectional view showing a substrate processing apparatus according to an embodiment. [Figure 3] FIG. 1 is a diagram illustrating an example of a gas supply system according to an embodiment. [Figure 4] FIG. 2 is a perspective view showing a first example of a suction part of the gas detecting device. [Figure 5] FIG. 10 is a perspective view showing a second example of the suction part of the gas detector. [Figure 6] FIG. 10 is a perspective view showing a third example of the suction part of the gas detector. [Figure 7] FIG. 10 is a perspective view showing a fourth example of the suction part of the gas detector. [Figure 8] FIG. 10 is a diagram showing an evaluation system for an experiment in which the detection accuracy of a process gas is evaluated. [Figure 9] FIG. 10 is a diagram showing the results when a multi-nozzle is used. [Figure 10] Figure (1) shows the results when a single nozzle is used. [Figure 11] Figure (2) shows the results when a single nozzle is used. [Figure 12] Figure (3) shows the results when a single nozzle is used. [Figure 13] FIG. 10 is a diagram showing the analysis results of gas flow when the suction hole is located on the top surface of the nozzle. [Figure 14] FIG. 10 is a diagram showing the analysis results of gas flow when a suction hole is located on the side of the nozzle. [Figure 15] FIG. 10 is a diagram showing the analysis results of gas flow when there is no duct. [Figure 16] FIG. 10 is a diagram showing the analysis results of gas flow when a duct is present. DETAILED DESCRIPTION OF THE INVENTION

[0008] Hereinafter, non-limiting exemplary embodiments of the present disclosure will be described with reference to the accompanying drawings. In all the accompanying drawings, the same or corresponding reference numerals are used to designate the same or corresponding members or components, and redundant descriptions will be omitted.

[0009] In this specification, the X-axis, Y-axis, and Z-axis are perpendicular to each other. The Y-axis is an example of a first horizontal axis, the X-axis is an example of a second horizontal axis, and the Z-axis is an example of a vertical axis.

[0010] [Substrate Processing Apparatus] A substrate processing apparatus 1 according to an embodiment will be described with reference to FIGS. 1 to 4. FIG. 1 is a schematic plan view showing the substrate processing apparatus 1 according to an embodiment. FIG. 2 is a schematic cross-sectional view showing the substrate processing apparatus 1 according to an embodiment. FIG. 2 corresponds to a cross-sectional view taken along line II-II in FIG. 1. FIG. 3 is a diagram showing an example of a gas supply system 5 according to an embodiment. FIG. 4 is a perspective view showing a first example of a suction unit 71 of a gas detection device 70.

[0011] The substrate processing apparatus 1 includes a transfer module 2, a processing module 3, an exhaust unit 4, and a gas supply system 5.

[0012] The transfer module 2 is disposed adjacent to a first side wall 3a of the processing module 3. The transfer module 2 transfers a substrate W to the processing module 3. The transfer module 2 includes a load port 21, a stocker 22, and a substrate transfer device .

[0013] The load port 21 is arranged on the negative side of the X axis of the transfer module 2. Multiple (e.g., two) load ports 21 are arranged along the Y axis. However, the number of load ports 21 is not particularly limited. A cassette C is placed on the load port 21. The cassette C stores multiple (e.g., 25) substrates W. The cassette C is carried in and out of the load port 21. The cassette C holds each substrate W horizontally. The cassette C is, for example, a FOUP (Front Opening Unified Pod).

[0014] A plurality of stockers 22 (for example, two) are arranged along the Z axis on the negative side of the X axis of the transport module 2. A plurality of stockers 22 (for example, two) are arranged along the Z axis on the positive side of the X axis of the transport module 2. A plurality of stockers 22 may be arranged along the Y axis. However, the number of stockers 22 is not particularly limited. The stockers 22 temporarily store the cassettes C.

[0015] The substrate transfer device 23 transports substrates W between a cassette C placed on the load port 21 and a boat 32 in the processing module 3. The substrate transfer device 23 transports, for example, multiple substrates W simultaneously. For example, the substrate transfer device 23 removes an unprocessed substrate W from a cassette C placed on the load port 21 and transports it to the boat 32. For example, the substrate transfer device 23 removes a processed substrate W from the boat 32 and transports it to a cassette C placed on the load port 21.

[0016] The transfer module 2 may have a cassette transfer device that transfers the cassette C between the load port 21 and the stocker 22. The transfer module 2 may have a loader separate from the load port 21 for transferring substrates to and from the substrate transfer device 23.

[0017] The processing module 3 has a processing chamber A1 and a transfer chamber A2. The processing chamber A1 and the transfer chamber A2 are adjacent to each other along the Z axis. The transfer chamber A2 is located on the negative side of the processing chamber A1 along the Z axis. The processing module 3 has a first sidewall 3a and a second sidewall 3b. The first sidewall 3a is located on the negative side of the X axis of the processing module 3. The second sidewall 3b is located on the positive side of the X axis of the processing module 3. The first sidewall 3a and the second sidewall 3b are spaced apart in the direction along the X axis. The first sidewall 3a and the second sidewall 3b each extend from the end of the processing module 3 on the negative side of the Y axis to the end on the positive side of the Y axis. The first sidewall 3a and the second sidewall 3b each extend from the lower end of the transfer chamber A2 to the upper end of the processing chamber A1.

[0018] The processing module 3 includes a processing vessel 31, a boat 32, a driving mechanism 33, and a maintenance door .

[0019] The processing vessel 31 is disposed in the processing chamber A1. The processing vessel 31 is disposed between the first side wall 3a and the second side wall 3b in the direction along the X-axis. The processing vessel 31 is heated by a heater (not shown). The processing vessel 31 is configured to accommodate a boat 32 holding substrates W. A processing gas is supplied into the processing vessel 31 from a gas supply system 5. The processing gas is selected depending on the type of processing. The processing gas supplied into the processing vessel 31 is exhausted by an exhaust unit 4. Inside the processing vessel 31, the substrates W held in the boat 32 are subjected to a desired processing using the processing gas supplied from the gas supply system 5.

[0020] The boat 32 holds multiple substrates W in a shelf-like manner along the Z axis. The boat 32 is movable between a transfer position (the position shown in FIG. 2) and a processing position. The transfer position is a position below the processing vessel 31. The transfer position may be directly below the processing vessel 31. The processing position is a position housed within the processing vessel 31 and is a position above the transfer position. The processing position may be directly above the transfer position. For example, the boat 32 moves to the transfer position when transferring substrates W to and from the substrate transfer device 23. For example, the boat 32 moves to the processing position when performing a desired process on the substrates W.

[0021] The drive mechanism 33 is configured to move the boat 32 between the transfer position and the processing position. The drive mechanism 33 may include a boat elevator.

[0022] A maintenance opening 3c is provided in the second side wall 3b. The maintenance opening 3c is provided on the negative side of the second side wall 3b in the Z-axis direction. The maintenance opening 3c is provided at the same height as the transfer chamber A2. The maintenance opening 3c is provided, for example, at an intermediate position in the direction along the Y-axis. The maintenance opening 3c is an opening for performing maintenance on the processing module 3. The maintenance opening 3c is an opening for loading and unloading the processing vessel 31 and the boat 32 into and out of the processing module 3. Therefore, the maintenance opening 3c has a size that allows the processing vessel 31 and the boat 32 to pass through. For example, the maintenance opening 3c is used when the processing vessel 31 is removed from the inside of the processing module 3 for replacement due to damage or cleaning. For example, the maintenance opening 3c is used when the boat 32 is removed from the inside of the processing module 3 for replacement due to damage or cleaning.

[0023] The maintenance door 34 rotates horizontally to open and close the maintenance opening 3c. When the maintenance door 34 is open, the processing vessel 31 and the boat 32 can be loaded and unloaded through the maintenance opening 3c. In FIG. 1, the maintenance door 34 is shown in a closed state.

[0024] The exhaust unit 4 includes an exhaust box 41, an exhaust pipe 42, and a pressure control valve 43. The exhaust box 41 is disposed adjacent to the second side wall 3b on the positive side of the Y-axis of the processing module 3. The exhaust pipe 42 connects the exhaust port 31a of the processing vessel 31 to a vacuum pump (not shown). A portion of the exhaust pipe 42 between one end and the other end is housed inside the exhaust box 41. The pressure control valve 43 is provided inside the exhaust box 41. The pressure control valve 43 is interposed midway along the exhaust pipe 42. The pressure control valve 43 controls the pressure inside the processing vessel 31 to a desired pressure.

[0025] The gas supply system 5 includes a gas box 51, gas supply lines 52 and 53, a fluid control device 54, an exhaust duct 55, a damper 56, and a gas detection device 70.

[0026] The gas box 51 is disposed adjacent to the X-axis positive side of the exhaust box 41. The gas box 51 has, for example, a rectangular parallelepiped shape.

[0027] Gas supply lines 52 and 53 supply processing gas into the processing vessel 31. The gas supply lines 52 and 53 pass through the gas box 51. In the example of FIG. 3, two gas supply lines 52 and 53 are shown, but the number of gas supply lines is not limited to two.

[0028] The fluid control device 54 is housed in the gas box 51. The fluid control device 54 controls the flow of the process gas flowing through the gas supply lines 52 and 53 in the gas box 51. The fluid control device 54 includes, for example, an on-off valve, a mass flow controller, and a filter.

[0029] The exhaust duct 55 exhausts the atmosphere inside the gas box 51. The exhaust duct 55 is provided, for example, to penetrate the bottom plate of the gas box 51.

[0030] The damper 56 is provided at the inlet of the exhaust duct 55. The damper 56 adjusts the exhaust flow rate.

[0031] The gas detection device 70 detects the process gas leaking into the gas box 51. The gas detection device 70 has a suction unit 71, a suction line 77, a gas detector 78, and an exhaust line 79.

[0032] The suction unit 71 is provided at the inlet of the exhaust duct 55. The suction unit 71 has an outer nozzle 72, an inner nozzle 73, and a plurality of suction holes 74.

[0033] The outer nozzle 72 is attached to the side wall of the exhaust duct 55. The outer nozzle 72 is provided along the side wall of the exhaust duct 55. The outer nozzle 72 has a rectangular ring shape. The outer nozzle 72 forms a flow path therein through which the processing gas flows. The outer nozzle 72 includes a first portion 72a, a second portion 72b, a third portion 72c, and a fourth portion 72d. The first portion 72a extends along the X-axis. The second portion 72b extends along the Y-axis. The second portion 72b is connected to the first portion 72a. The third portion 72c extends along the X-axis. The third portion 72c is parallel to the first portion 72a. The third portion 72c is connected to the second portion 72b. The fourth portion 72d extends along the Y-axis. The fourth portion 72d is parallel to the second portion 72b. The fourth portion 72d is connected to the third portion 72c and the first portion 72a. The length of the first portion 72a and the third portion 72c along the X axis is, for example, 150 mm. The length of the second portion 72b and the fourth portion 72d along the Y axis is, for example, 145 mm.

[0034] The inner nozzle 73 is provided inside the outer nozzle 72. The inner nozzle 73 is provided on the same plane (XY plane) as the outer nozzle 72. The inner nozzle 73 extends, for example, along the X axis, with one end connected to the second portion 72b and the other end connected to the fourth portion 72d. The inner nozzle 73 may extend along the Y axis with one end connected to the first portion 72a and the other end connected to the third portion 72c. The inner nozzle 73 is provided, for example, to pass through the center of the exhaust duct 55. The inner nozzle 73 may also be provided to pass through a position offset from the center of the exhaust duct 55. The inner nozzle 73 forms a flow path therein through which the processing gas flows. The flow path in the inner nozzle 73 communicates with the flow path in the outer nozzle 72.

[0035] The plurality of suction holes 74 suck in the process gas at different positions in a cross section (XY cross section) perpendicular to the central axis of the exhaust duct 55. Each suction hole 74 has, for example, a circular shape. The hole diameter of each suction hole 74 is, for example, 0.8 mm or more and 1.2 mm or less. In this case, the variation in the amount of gas sucked from each suction hole 74 can be reduced. The number of the plurality of suction holes 74 is, for example, 16. In this case, the internal pressure of the outer nozzle 72 and the inner nozzle 73 is reduced, making it easier to suck in the process gas into the outer nozzle 72 and the inner nozzle 73. The plurality of suction holes 74 includes an outer suction hole 74a and an inner suction hole 74b.

[0036] The outer suction holes 74a are provided in the outer nozzle 72. In a cross section perpendicular to the central axis of the exhaust duct 55, the outer suction holes 74a are provided closer to the sidewall than to the center of the exhaust duct 55. In the example of FIG. 4, ten outer suction holes 74a are provided. The central axes of the outer suction holes 74a are inclined with respect to the central axis of the exhaust duct 55. In this case, the pressure difference between the inside of the outer nozzle 72 and the periphery of the outer nozzle 72 is reduced, thereby suppressing the outflow of processing gas from within the outer nozzle 72. The inclination angle of the central axis of the outer suction holes 74a with respect to the central axis of the exhaust duct 55 is, for example, 45° to 90°, and is 90° in the example of FIG. 4. The outer suction holes 74a are provided on the inner surface of the outer nozzle 72 and open toward the center of the exhaust duct 55.

[0037] The inner suction holes 74b are provided in the inner nozzle 73. In a cross section perpendicular to the central axis of the exhaust duct 55, the inner nozzle 73 is provided closer to the center of the exhaust duct 55 than the outer suction holes 74a. In the example of FIG. 4, six inner suction holes 74b are provided. The central axes of the inner suction holes 74b are inclined with respect to the central axis of the exhaust duct 55. In this case, the pressure difference between the inside of the inner nozzle 73 and the periphery of the inner nozzle 73 is reduced, thereby suppressing the outflow of processing gas from within the inner nozzle 73. The inclination angle of the central axis of the inner suction holes 74b with respect to the central axis of the exhaust duct 55 is, for example, 45° to 90°, and is 90° in the example of FIG. 4. In the example of FIG. 4, three inner suction holes 74b are provided on the surface of the side surface of the inner nozzle 73 facing the first portion 72a, and three inner suction holes 74b are provided on the surface of the side surface of the inner nozzle 73 facing the third portion 72c.

[0038] The suction line 77 is connected to the suction unit 71. In the example of Fig. 4, the suction line 77 is provided to penetrate the outer surface of the second portion 72b. The suction line 77 causes the process gas sucked by the suction unit 71 to flow into the gas detector 78.

[0039] The gas detector 78 detects the process gas flowing in from the suction line 77. The process gas flowing out from the gas detector 78 flows into the exhaust duct 55 via the exhaust line 79.

[0040] The exhaust line 79 has one end connected to the gas detector 78 and the other end connected to the exhaust duct 55 downstream in the flow of the processing gas from the damper 56. The exhaust line 79 allows the processing gas flowing out from the gas detector 78 to flow into the exhaust duct 55.

[0041] As described above, according to the embodiment, gas detection device 70 has suction unit 71, suction line 77, and gas detector 78. Suction unit 71 has multiple suction holes 74. Multiple suction holes 74 suck in process gas at different positions in a cross section perpendicular to the central axis of exhaust duct 55. Suction line 77 is connected to suction unit 71. Gas detector 78 detects process gas flowing in from suction line 77. In this case, process gas can be sucked in from the entire cross section perpendicular to the central axis of exhaust duct 55. This improves the accuracy of detecting process gas leaking into gas box 51.

[0042] Fig. 5 is a perspective view showing a second example of suction unit 71 of gas detection device 70. As shown in Fig. 5, suction unit 71 does not have to have inner nozzle 73. In this case, the conductance of exhaust duct 55 increases.

[0043] Fig. 6 is a perspective view showing a third example of suction unit 71 of gas detection device 70. As shown in Fig. 6, when the flow path of the process gas at the inlet of exhaust duct 55 is circular in plan view, outer nozzle 72 may have a substantially annular shape in plan view. Outer nozzle 72 may be formed by connecting a semicircular annular fifth portion 72e and a semicircular annular sixth portion 72f.

[0044] FIG. 7 is a perspective view showing a fourth example of suction unit 71 of gas detection device 70. As shown in FIG. 7, suction unit 71 may further include ducts 76a and 76b. Ducts 76a and 76b have a rectangular cylindrical shape. Ducts 76a and 76b rectify the process gas flow along the Z-axis upstream of multiple suction holes 74. In this case, the process gas is more easily drawn into outer nozzle 72 and inner nozzle 73. The length of ducts 76a and 76b along the Z-axis is, for example, 50 mm or more. In this case, the process gas is more easily rectified to flow along the Z-axis. Duct 76a rectifies the flow of process gas flowing into the region surrounded by first portion 72a, second portion 72b, fourth portion 72d, and inner nozzle 73 to flow along the central axis of exhaust duct 55. The duct 76b straightens the flow of the processing gas flowing into the region surrounded by the second portion 72b, the third portion 72c, the fourth portion 72d, and the inner nozzle 73, so that the flow is along the central axis of the exhaust duct 55. The ducts 76a and 76b are examples of straightening members.

[0045] [Experimental results] The results of an experiment evaluating the detection accuracy of the process gas will be described with reference to Fig. 8 to Fig. 12. Fig. 8 is a diagram showing an evaluation system for an experiment evaluating the detection accuracy of the process gas. In Fig. 8, the fluid control device 54 is not shown.

[0046] In the experiment, hydrogen gas diluted with nitrogen gas (hereinafter also referred to as "diluted hydrogen gas") was discharged (leaked) in different directions from different positions within the gas box 51, and whether or not the gas detector 78 detected hydrogen gas was measured. In the experiment, an outer nozzle 72 (hereinafter also referred to as "multi-nozzle") having multiple outer suction holes 74a as shown in FIG. 5 was used. In the experiment, diluted hydrogen gas was discharged in one of six directions from one of five positions P1 to P5. Position P1 is a position on the negative side of the X axis and the positive side of the Z axis (upper left). Position P2 is a position on the negative side of the X axis and the negative side of the Z axis (lower left). Position P3 is a position at the center of the X axis and the center of the Z axis (center). Position P4 is a position on the positive side of the X axis and the positive side of the Z axis (upper right). Position P5 is a position on the positive side of the X axis and the negative side of the Z axis (lower right). The six directions are Z-axis positive direction (up), Z-axis negative direction (down), X-axis negative direction (left), X-axis positive direction (right), Y-axis negative direction (front), and Y-axis positive direction (back).

[0047] For comparison, a nozzle having one suction hole (hereinafter also referred to as a "single nozzle") was used instead of outer nozzle 72. Specifically, a nozzle having a suction hole only on the negative side of the X axis and whose detection position is on the negative side of the X axis (left), a nozzle having a suction hole only at the center of the X axis and whose detection position is at the center of the X axis (center), and a nozzle having a suction hole only on the positive side of the X axis and whose detection position is on the positive side of the X axis (right) were used.

[0048] Figure 9 shows the results when a multi-nozzle was used. In Figure 9, "OK" means that the gas detector 78 detected hydrogen gas, and "NG" means that the gas detector 78 did not detect hydrogen gas. As shown in Figure 9, when a multi-nozzle was used, the gas detector 78 detected hydrogen gas except for one condition (the leak location was position P3 and the leak direction was downward).

[0049] 10 to 12 show the results when a single nozzle was used. In FIGS. 10 to 12, "OK" means that the gas detector 78 detected hydrogen gas, and "NG" means that the gas detector 78 did not detect hydrogen gas. FIG. 10 shows the results when the detection position was on the left, FIG. 11 shows the results when the detection position was in the center, and FIG. 12 shows the results when the detection position was on the right. As shown in FIG. 10, when a single nozzle with a left detection position was used, the gas detector 78 did not detect hydrogen gas under 15 conditions. As shown in FIG. 11, when a single nozzle with a center detection position was used, the gas detector 78 did not detect hydrogen gas under 8 conditions. As shown in FIG. 12, when a single nozzle with a right detection position was used, the gas detector 78 did not detect hydrogen gas under 9 conditions.

[0050] The results of FIGS. 9 to 12 show that the use of a multi-nozzle can improve the accuracy of detecting the process gas leaked into the gas box 51.

[0051] Furthermore, as shown in Figure 11, when a single nozzle with a central detection position is used, hydrogen gas is detected when the leak location is at position P3 and the leak direction is downward. From this, it is thought that by adding inner nozzle 73 with multiple inner suction holes 74b to outer nozzle 72 with multiple outer suction holes 74a shown in Figure 5, hydrogen gas can be detected when the leak location is at position P3 and the leak direction is downward. In other words, it is thought that by using suction unit 71 shown in Figure 4, hydrogen gas can be detected under all conditions.

[0052] [Simulation results] 13 and 14, the results of analyzing the gas flow when the orientation of the suction holes 74 is different will be described. FIG. 13 is a diagram showing the results of analyzing the gas flow when the suction holes 74 are located on the top surface of the nozzle. Specifically, in FIG. 13, the outer suction hole 74a is located on the top surface of the outer nozzle 72, and the inner suction hole 74b is located on the top surface of the inner nozzle 73. FIG. 14 is a diagram showing the results of analyzing the gas flow when the suction holes 74 are located on the side surface of the nozzle. Specifically, in FIG. 14, the outer suction hole 74a is located on the side surface of the outer nozzle 72, and the inner suction hole 74b is located on the side surface of the inner nozzle 73. FIGS. 13 and 14 show the results of analyzing the gas flow in the YZ cross section that passes through the center of the exhaust duct 55.

[0053] 13, when the inner suction hole 74b is located on the top surface of the inner nozzle 73, the gas in the gas box 51 flows into the inner nozzle 73 from the inner suction hole 74b without colliding with the inner nozzle 73. In this case, the pressure in the inner nozzle 73 and the outer nozzle 72 increases. As a result, the gas in the outer nozzle 72 is more likely to flow out of the outer nozzle 72 from the outer suction hole 74a.

[0054] As shown in Figure 14, when the outer suction hole 74a is located on the side surface of the outer nozzle 72 and the inner suction hole 74b is located on the side surface of the inner nozzle 73, the pressure difference between inside the outer nozzle 72 and its periphery and the pressure difference between inside the inner nozzle 73 and its periphery are small. In this case, almost no gas flows out from the outer nozzle 72 and the inner nozzle 73. Therefore, gas flowing into the outer nozzle 72 and the inner nozzle 73 is likely to flow into the gas detector 78 via the suction line 77. As a result, the accuracy of gas detection by the gas detector 78 is improved.

[0055] The results of analyzing the gas flow when the ducts 76a and 76b are present and absent will be described with reference to Figures 15 and 16. Figure 15 is a diagram showing the results of analyzing the gas flow when the ducts 76a and 76b are absent. Figure 16 is a diagram showing the results of analyzing the gas flow when the ducts 76a and 76b are present. Figures 15 and 16 show the results of analyzing the gas flow in the YZ cross section passing through the center of the exhaust duct 55.

[0056] 15, without the ducts 76a and 76b, the airflow around the outer nozzle 72 changes suddenly from horizontal to vertical. In this case, the pressure around the outer nozzle 72 drops, causing entrainment. This makes it difficult for gas to flow into the outer nozzle 72.

[0057] 16, when ducts 76a and 76b are provided, the gas flow around the outer nozzle 72 is directed vertically by the ducts 76a and 76b. In this case, gas is more likely to flow into the outer nozzle 72. This increases the amount of gas flowing into the gas detector 78 via the suction line 77, improving the accuracy of gas detection by the gas detector 78.

[0058] The embodiments disclosed herein should be considered to be illustrative in all respects and not restrictive, and the above-described embodiments may be omitted, substituted, or modified in various ways without departing from the scope and spirit of the appended claims. [Explanation of symbols]

[0059] 51 Gas Box 55 Exhaust duct 70 Gas detection devices 71 Suction part 74 Suction hole 77 Suction Line 78 Gas Detector

Claims

1. A gas detection device that detects a process gas leaking into a gas box, a suction unit having a plurality of suction holes for sucking the processing gas at different positions in a cross section perpendicular to a central axis of an exhaust duct for exhausting the inside of the gas box; a gas detector that detects the processing gas sucked by the suction unit; A gas detection device comprising:

2. The plurality of suction holes include two or more outer suction holes provided closer to the side wall than to the center of the exhaust duct in the cross section.

2. The gas detection device of claim 1.

3. The plurality of suction holes include one or more inner suction holes that are provided closer to the center of the exhaust duct than the outer suction holes in the cross section.

3. The gas detection device according to claim 2.

4. The central axes of the plurality of suction holes are inclined with respect to the central axis of the exhaust duct.

2. The gas detection device of claim 1.

5. The inclination angle of the central axes of the plurality of suction holes with respect to the central axis of the exhaust duct is 45° or more and 90° or less.

5. The gas detection device according to claim 4.

6. The plurality of suction holes are provided at the inlet portion of the exhaust duct.

6. A gas detection device according to claim 1.

7. a flow straightening member that straightens the processing gas to a flow along a central axis of the exhaust duct, the flow straightening member being located upstream of the plurality of suction holes in the processing gas flow direction; 6. A gas detection device according to claim 1.

8. a gas supply line for supplying a processing gas into the processing chamber; a fluid control device provided in the gas supply line; a gas box that houses the fluid control device; an exhaust duct for exhausting the gas box; a gas detection device that detects the processing gas leaking into the gas box; Equipped with The gas detection device comprises: a suction unit having a plurality of suction holes that suck the processing gas at different positions in a cross section perpendicular to the central axis of the exhaust duct; a gas detector that detects the processing gas sucked by the suction unit; A gas supply system comprising:

9. a processing vessel for accommodating a substrate; a gas supply line for supplying a processing gas into the processing chamber; a fluid control device provided in the gas supply line; a gas box that houses the fluid control device; an exhaust duct for exhausting the gas box; a gas detection device that detects the processing gas leaking into the gas box; Equipped with The gas detection device comprises: a suction unit having a plurality of suction holes that suck the processing gas at different positions in a cross section perpendicular to the central axis of the exhaust duct; a gas detector that detects the processing gas sucked by the suction unit; The substrate processing apparatus has:

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