Chemical vapor deposition system with gas curtain module and method

Abstract

To provide a chemical vapor deposition system, a gas curtain module for a gas distribution system of the chemical vapor deposition system, and a valve control method for such a system.SOLUTION: A gas distribution system 130 for transporting deposition products from a reactor to a collection chamber comprises a gas curtain module 142 disposed in a pipeline between a gas inlet 131 and a collection valve 140, wherein the gas curtain module comprises one or more purge gas inlets and is configured to introduce a purge gas into the pipeline at that location.SELECTED DRAWING: Figure 2

Description

[Technical Field]

[0001] The present invention relates to gas flow control for chemical vapor deposition (CVD) systems. [Background technology]

[0002] Certain types of chemical vapor deposition (CVD) systems have a reactor for producing the deposition product that is separate from a collection chamber for processing the deposition product, and the reactor may be connected to the chamber by a distribution system. In the distribution system, debris can collect and eventually find its way into the collection chamber, contaminating the deposition product. Summary of the Invention [Problem to be solved by the invention]

[0003] It is an object to provide a system and method for mitigating contamination problems. [Means for solving the problem]

[0004] To this end, a CVD system and a method for controlling a CVD system are presented.

[0005] According to a first aspect, a chemical vapor deposition (CVD) system is disclosed. The system includes multiple components: a reactor for producing a deposition product, a collection chamber for processing the deposition product, and a gas distribution system (GDS) for transporting the deposition product from the reactor to the collection chamber. The deposition products may include or consist of nanostructures, such as high aspect ratio molecular (HARM) structures, which are first generated in a reactor by any suitable method and then transported via a GDS to a collection chamber for processing. Processing performed in the collection chamber can include deposition, such as chemical vapor deposition, or product collection, separation, processing in a vacuum system, product removal, and any combination thereof. The processing can provide a CVD product.

[0006] The GDS comprises a pipeline connecting the reactor with a collection chamber, the pipeline comprising an interior surface. The GDS also includes a gas inlet connecting the pipeline and the reactor, the gas inlet configured to deliver deposition products from the reactor to the pipeline. The GDS further includes a collection valve disposed between the pipeline and the collection chamber, the collection valve configured to deliver the deposition product from the pipeline to the collection chamber, and a gas curtain module disposed in the pipeline between the gas inlet and the collection valve. The gas curtain module includes one or more purge gas inlets configured to introduce purge gas into the pipeline at the locations. The gas curtain module may also include one or more valves for supplying gas to one or more purge gas inlets, and extension pipes if any of the components of the gas curtain module are spaced apart. When included in a CVD system, the gas curtain module can effectively function as a gas curtain that can reduce the amount of debris that passes through the gas curtain module in the pipeline and is collected. Additionally, the CVD system of the first embodiment having a gas curtain module can help flush unwanted debris from a portion of the pipeline.

[0007] In one embodiment, the GDS also includes a gas outlet valve disposed in the pipeline between the gas inlet and the gas curtain module. In a further embodiment, the GDS may include an additional gas curtain module positioned between the gas inlet and the gas outlet valve, which prevents debris from collecting at the gas outlet valve.

[0008] According to one embodiment, the gas outlet valve is connected to the waste outlet. This creates additional potential gas flow from the gas inlet to the waste outlet.

[0009] In an alternative embodiment, the gas outlet valve is connected to a second collection chamber for processing of the deposition products to provide the CVD products. This allows the possibility of processing in two collection chambers simultaneously or sequentially. The advantage of a setup with two or more collection chambers is that cycle times can be reduced. Once collection is complete and the CVD product is unloaded from the first chamber, the second chamber can be operated. As with the previous embodiment, the GDS can include an additional gas curtain module positioned between the gas inlet and gas outlet valves, where the two gas curtain modules can support two-way gas flow, for example from the gas inlet to either of the collection chambers, while preventing debris formation in the closed direction.

[0010] According to one embodiment, the purge gas is an inert gas selected from the group of nitrogen, argon and helium. Inert gases may be suitable as purge gases for gas curtain modules because they are less likely to react with any of the chemicals introduced with the gas stream.

[0011] In one embodiment, the gas curtain module comprises a buffer region arranged to distribute purge gas supplied from one or more purge gas inlets before the purge gas is introduced into the pipeline. The buffer region may be at least partially filled with purge gas before the purge gas is released into the pipeline, allowing for more uniform introduction of the purge gas.

[0012] In a further embodiment, the buffer region has a shape that conforms to a portion of the inner surface of the gas curtain module and has an inner surface that faces the inside of the pipeline. In this embodiment, the buffer region may, for example, be shaped similarly to the inner surface of the pipeline and may be positioned inwardly facing the inside of the pipeline or around its circumference.

[0013] In a further embodiment, the buffer region of the gas curtain module comprises at least one slit located on an inner surface of the buffer region, the at least one slit being positioned to introduce purge gas from the buffer region into the pipeline. The slits may help introduce the purge gas into the pipeline more uniformly along the length of the slit. In some embodiments, the slits can be positioned at different locations, for example, the slits can be circumferentially along the inner surface of the buffer region, or can be positioned along the direction of gas flow inside the pipeline, or can be positioned at an angle between two locations.

[0014] In the above alternative embodiment, the buffer region of the gas curtain module may include at least four openings arranged opposite each other in pairs on the inner surface of the buffer region, the openings being positioned to introduce purge gas from the buffer region into the pipeline. As an alternative to a slit, the purge gas can be introduced through multiple openings.

[0015] According to one embodiment, the pipeline has a circular cross section and the gas curtain module is configured to introduce purge gas into the pipeline along the radial periphery of the cross section of the pipeline. This configuration of the inner surface of the pipeline with a circular cross section provides a substantially circular gas curtain module that allows for uniform introduction of purge gas to specific locations within the pipeline.

[0016] In an alternative embodiment, the pipeline has a rectangular cross section and the gas curtain module is configured to introduce purge gas into the pipeline along the rectangular periphery of the cross section of the pipeline.

[0017] In one embodiment, the gas inlet is a gate valve.

[0018] According to one embodiment, the system of the first aspect further comprises one or more controllers for controlling the gas inlet, the collection valve, the gas outlet valve and the gas curtain module. The controller may be configured to direct the gas flow by controlling the valves mentioned. In a further embodiment, the one or more controllers are configured to open the gas curtain module while the gas inlet and gas outlet valves are open, but close the collection valve. In this embodiment, when the collection valve is closed, the gas flow coming through the inlet valve is directed towards the outlet valve while the gas curtain module prevents debris from forming near the closed collection valve. This can be combined with any other flushing techniques and configurations.

[0019] According to one embodiment, the gas curtain module is located at a distance of 0 to 100 centimeters from the collection valve. The selection of the distance from the recovery valve may be based on the overall pipeline structure, configuration, gas flow rate, and other parameters.

[0020] In one embodiment, the gas curtain module is positioned transverse to the direction of gas flow in the pipeline. This configuration can provide for efficient lateral introduction of purge gas.

[0021] In an alternative embodiment, the gas curtain module is positioned at an angle between 1 and 90 degrees relative to the direction of gas flow in the pipeline. An angled position of the gas curtain module may be beneficial in some pipeline configurations and may aid in purging debris from the pipeline.

[0022] In one embodiment, the GDS includes a bypass valve. The bypass valve is positioned such that a bypass mode can be activated in which gas flowing from the gas inlet for the collection chamber is directed through the bypass valve, partially or completely blocking passage through the collection valve. In a further embodiment, a bypass valve may be connected to a bypass arm of the pipeline.

[0023] According to an embodiment, the CVD system may be a floating catalyst chemical vapor deposition (FCCVD) system or any other aerosol CVD system.

[0024] In one embodiment, the system further includes a viewport connected to the pipeline together with the secondary arm, and a second gas curtain module positioned between the viewport and the connection point of the secondary arm with the pipeline, the second gas curtain module including one or more purge gas inlets configured to introduce purge gas into the secondary arm at its location. The second gas curtain module may be the same as or different from the first gas curtain module and may also be effective in preventing debris formation near the secondary arm, for example the viewport.

[0025] According to a second aspect, a gas curtain module for a gas distribution system of a chemical vapor deposition (CVD) system is provided. The gas curtain module is disposed in a pipeline of the gas distribution system and comprises one or more inlets configured to introduce purge gas, a buffer region connected to the one or more inlets and arranged to distribute purge gas supplied from the one or more purge gas inlets before the purge gas is introduced into the pipeline, and at least one slit and / or four or more openings arranged to supply a gas flow of the purge gas from the buffer region to the pipeline.

[0026] In one embodiment of the second aspect, the four or more openings are arranged in pairs on opposite sides of the pipeline in a plane perpendicular to the direction of gas flow in the pipeline.

[0027] What has been described above with respect to the first aspect also applies to the second aspect, which includes various embodiments and combinations of features relating to the gas curtain module.

[0028] According to a third aspect, a valve control method for a chemical vapor deposition (CVD) system is provided. The system includes a reactor for producing a deposition product, a collection chamber for processing the deposition product, and a gas distribution system (GDS) for transporting the deposition product from the reactor to the collection chamber. The method includes the steps of opening a gas inlet of the GDS connecting the reactor to the GDS and a gas outlet valve between the gas inlet of the GDS and the gas curtain module while a collection valve for the GDS is closed to circulate the deposition product without allowing it to reach a collection chamber, and then opening the gas inlet and collection valve while the gas outlet is closed, thereby directing the deposition product from the reactor to the collection chamber for processing to supply the CVD product without debris. The gas outlet valve may be connected to an exhaust port, in which case circulation of the deposition product may be performed to flush and clean the debris from the GDS. The use of a gas curtain module during circulation of the deposition product without the deposition product reaching the collection chamber can have the effect of preventing debris from forming past the gas curtain module in the GDS.

[0029] In one embodiment, the collection chamber can have an exhaust valve that can be opened in conjunction with the collection chamber exhaust valve to direct deposition products from the reactor to the collection chamber for processing.

[0030] The valve control method according to the third aspect and any of its embodiments may be implemented as a computer program which, when executed on a computer, performs the steps of the method.

[0031] What was said above with respect to the first aspect also applies to the third aspect.

[0032] In the disclosed CVD system, a large amount of recirculating gas flow may occur within the gas distribution system (GDS). This recirculating gas flow can result in the accumulation of debris, which may be released into the collection chamber and contaminate it.

[0033] The disclosed solution provides a GDS configuration with one or more gas curtain modules that can prevent debris from forming and accumulating in the GDS, for example, adjacent to closed valves where debris often accumulates first. This configuration may also be useful for flushing portions of the GDS that are not flushed under normal operation of the system. The presented system, gas curtain module and method can reduce the amount of debris in the collection chamber and therefore also reduce the amount of debris in the products produced in the reactor, improving the purity and quality of the resulting CVD products.

[0034] It should be noted that all instances of an "open" valve herein may refer to the valve being partially open or the valve being fully open. Similarly, all instances herein of a valve being "closed" may refer to the valve being partially closed or the valve being fully closed.

[0035] It should be understood that the above-described aspects and embodiments can be used in any combination with each other. Some aspects and embodiments may be combined to form further embodiments of the present invention. [Brief explanation of the drawings]

[0036] The accompanying drawings, which are included to provide a further understanding and constitute a part of this specification, illustrate examples and, together with the description, serve to explain the principles of the disclosure.

[0037] [Figure 1A] 1 is a schematic diagram of a chemical vapor deposition (CVD) system according to an embodiment. [Figure 1B] 1 is a schematic diagram of a chemical vapor deposition (CVD) system according to an embodiment. [Figure 2] 1 illustrates components of a gas distribution system (GDS) according to an embodiment. [Figure 3A] 1 illustrates a gas curtain module according to an embodiment. [Figure 3B] 1 illustrates a gas curtain module according to an embodiment. [Figure 4] 1 illustrates a gas curtain module according to another embodiment. [Figure 5] 1 shows a GDS connected to two collection chambers according to an embodiment. [Figure 6] FIG. 1 is a diagram of a method according to an embodiment.

[0038] Similar references are used in the accompanying drawings to designate equivalent or at least functionally equivalent parts. DETAILED DESCRIPTION OF THE INVENTION

[0039] The detailed description provided below in connection with the accompanying drawings is intended as a description of the embodiments and is not intended to represent the only manner in which the embodiments may be constructed or utilized. However, the same or equivalent functions and structures may be accomplished by different examples.

[0040] 1A-1B schematically illustrate a chemical vapor deposition (CVD) system (hereinafter, "system" refers to a CVD system) according to an embodiment, while FIG. 2 is a more detailed schematic diagram of an exemplary gas distribution system (GDS). It should be noted that the CVD system may be a floating catalyst chemical vapor deposition (FCCVD) system or an aerosol CVD system.

[0041] The system 100 includes a reactor 110, such as an FCCVD reactor, which can be configured to produce a deposition product. The reactor may be configured to produce a deposition product with the aid of a catalyst, such as an aerosol. The system also includes a collection chamber 120 that may be configured for processing of the deposition products. The processing performed in the collection chamber 120 may include deposition, such as chemical vapor deposition, or product collection, separation, processing in a vacuum system, product removal, and any combination thereof. The deposition product may include or consist of nanostructures, such as high aspect ratio molecular (HARM) structures. A HARM structure may have a length that is 50 to 10,000 times or more its maximum diameter. In this sense, they can be considered to be substantially one-dimensional structures. The HARM structure may comprise or consist of carbon nanostructures, for example, carbon nanotubes (CNTs), such as single-walled CNTs and / or multi-walled CNTs, carbon nanobuds (molecules having fullerene molecules covalently attached to the sides of carbon nanotubes), carbon nanoribbons, or any combination thereof. Alternatively or additionally, the HARM structure may comprise other types of HARM structures such as cellulose fibers, nanorods or nanowires, for example silver nanowires or III-V nanowires. The HARM structure may comprise or consist of uncoated and / or coated structures, for example coated CNTs. The deposition product may be deposited into a substantially planar network of HARM structures. The HARM structures may be substantially randomly oriented within the network. The HARM structure may be a conductive HARM structure.

[0042] The system 100 includes a gas distribution system (GDS) 130 that can be configured to transport deposition products from the reactor 110 to a collection chamber 120 . GDS130 comprises a pipeline that may have multiple "arms," ​​and although this term is sometimes used to provide a clearer understanding of the diagrams, arms should not be seen as a limiting feature as pipelines may have a variety of configurations. Gas supply through any or all of the arms may be controlled by valves located in the corresponding arms. For example, the GDS comprises a pathway from the reactor to the collection chamber, which may be formed by one, two or more arms. A reactor arm 132 may be provided for transporting deposition products from the reactor, which may be directly or indirectly connected to a collection arm 134 for transporting the deposition products to a collection chamber. The reactor arm and recovery arm may also be joined as a single monolithic arm. In such a case, the reactor arm may correspond to the reactor side region of the monolithic arm, and the recovery arm may correspond to the chamber side region of the monolithic arm.

[0043] The pipeline connecting the reactor with the collection chamber has an interior surface.

[0044] The system 100 may include a gas inlet 131, which may include a gate valve or any other valve. It is configured to feed the deposition product from the reactor into a pipeline that then delivers it to a collection chamber 120 . The gas inlet 131 may be considered part of the GDS.

[0045] The system 100 may include a recovery valve 140, which may also be considered part of the GDS. A recovery valve 140 may be located between the pipeline and the recovery chamber, for example, at the end of the recovery arm. The collection valve can be configured, in an open position, to partially or completely allow gas flow that helps deliver deposition products from the reactor 110 to the collection chamber 120 . The system may also be configured with a gas outlet valve, such as an exhaust valve, as defined below. In the closed position, the recovery valve 140 can be configured to partially or completely block gas flow to prevent transfer of deposition products from the reactor to the recovery chamber. The recovery valve may be a control valve that can assume one or more positions, for example continuously, between a maximum open position and a maximum closed position. The recovery valve may also be any other suitable type of valve.

[0046] The system 100 may include a gas curtain module 142 positioned in the pipeline between the gas inlet 131 and the recovery valve 140, the gas curtain module 142 including one or more purge gas inlets configured to introduce purge gas into the pipeline at that location. The gas inlet is shown schematically by an arrow inside the gas curtain module 142, although its structure is not limited to that shown in Figures 1A-1B, as the gas curtain module may have a buffer zone and any suitable configuration, as shown in more detail below. When included in a CVD system, the gas curtain module 142 can effectively function as a gas curtain that can reduce the amount of debris that passes through the gas curtain module in the pipeline and is collected. Additionally, the CVD system 100 with the gas curtain module 142 can help flush unwanted debris from a portion of the pipeline.

[0047] The pipeline may have a circular, rectangular, or any other suitable cross-section, and the pipeline comprises an inner surface. The shape of the gas curtain module 142 may conform to at least a portion of the inner surface of the pipeline at that location.

[0048] Debris 160 can accumulate between the collection valve and the bypass valve. In particular, debris 160 can accumulate at the reactor-side collection valve 140 . The GDS configuration comprising at least one gas curtain module 142 disclosed herein makes it possible to block such debris from entering the collection chamber 120.

[0049] Arrow 170 in FIGS. 1A-1B generally indicates the direction of deposition product from gas inlet 131 to collection chamber 120. This orientation is typically positioned when the collection valve 140 is open and the gas curtain module 142 allows gas flow through to allow processing in the collection chamber 120 . The configuration of GDS 130 allows for different gas flow directions, and the gas curtain module 142 can prevent debris accumulation in the different directional modes, so that when the deposition product eventually flows along direction 170, the amount of debris entering the collection chamber 120 is significantly reduced.

[0050] As shown in FIG. 1B, the system can also include a bypass arm 136 for directing gas flow away from the reactor and collection chamber. The bypass arm may be configured to direct gases away from the reactor and from the collection chamber to a bypass outlet. A filter may be installed in the bypass exhaust to collect the deposition products, which can then be disposed of. The bypass arm may be considered part of the GDS. The system may also include a bypass valve 143, which may be considered part of the GDS. This allows for bypass of the collection chamber, or the entire collection arm. The bypass valve 143 may be located away from the reactor and collection chamber, specifically in the bypass arm. The bypass valve 143 may be configured to allow gas flow from the reactor to bypass the collection chamber. The bypass valve may be configured to partially or completely permit gas flow in an open position to facilitate transport of deposition products from the reactor to the bypass exhaust. In the closed position, the bypass valve 143 can be configured to partially or completely block gas flow to prevent transfer of deposition products from the reactor to the bypass exhaust.

[0051] The arms shown in Figures 1A-1B may extend apart from one another, for example, from a common origin. They may be arranged in a T-shape. The GDS may also include a viewing and / or cleaning window 138, for example, in the extension arm of the GDS.

[0052] The system may also include a collection chamber exhaust valve 146, shown in FIG. 1B. The collection chamber exhaust valve 146 may also be considered part of the GDS. Valve 146 may be located in the collection chamber or may be located downstream of the collection chamber, for example in the collection arm. This may be configured to facilitate the removal of gas from collection chamber 120, particularly in a direction away from collection valve 140 (along the gas transfer path). The exhaust valve may be configured to partially or fully permit gas flow in an open position to facilitate removal of gas from the collection chamber. The exhaust valve may be configured to partially or completely block gas flow in the closed position to prevent removal of gas from the collection chamber through the exhaust valve. The collection chamber exhaust valve 146 may be a control valve that can assume one or more positions, for example continuously, between a fully open position and a fully closed position. This allows the openness of the valve 146 to be adjusted. The passage of gas into and out of the collection chamber may be controlled by at least an exhaust valve and / or a collection valve.

[0053] The system may include one or more controllers 150, shown in FIG. 1B as separate modules, for controlling any or all of the valves. This applies to any or all of the following: gas inlet 131, bypass valve 143, recovery valve 140, gas curtain module 142, if implemented as a valve, and any of the exhaust valves. One or more of the controllers may include one or more processors 152 for this purpose. For the same purpose, one or more of the controllers may also include one or more memories 154 . The one or more memories may include instructions that, when executed by the one or more processors, cause any of the valve control-related operations disclosed herein to be performed. One or more controllers may be configured to control any or all of the valves through wired and / or wireless connections.

[0054] Any or all of the valves described herein may be electrically, pneumatically or hydraulically controllable valves. As such, any or all of the valves may be provided as automatic or actuated valves. Any or all of the valves may incorporate actuators for automating the opening, closing, or adjustment of the valves, particularly based on external signals or commands from one or more controllers. The actuators can be powered by any combination of electricity, compressed air (pneumatic), and compressed fluid (hydraulic). In particular, as previously mentioned, any or all of the valves may be control valves such as throttle valves. This allows the valve to be controlled to one or more intermediate positions between fully open and fully closed. Any or all of the valves may be configured to allow such control in a stepped and / or continuous manner. Any or all of the valves may be configured to allow incremental adjustment of the valve position, allowing fine adjustment to the gas flow at that valve(s). Control valves, in particular throttle valves, make it possible to maintain a specific flow rate.

[0055] FIG. 2 shows an example layout of the GDS 130. In this example, the GDS 130 comprises a pipeline having an interior surface as can be seen in the figure, a gas inlet 131, a collection valve 140 and a gas curtain module 142. Additionally, the GDS of this example includes a gas outlet valve 210 disposed between the gas inlet 131 and the gas curtain module 142 . The gas outlet valve 210 is connected to a waste outlet or exhaust port, which can be an exhaust valve, or can be connected to a second collection chamber for processing of the deposition products. The gas outlet valve 210 provides an alternative gas flow direction when the recovery valve 140 is closed, which can be used in operating cycles such as flushing, or any other cycle where the deposition products do not need to pass through the recovery valve 140 to reach the recovery chamber. During such alternate operating cycles or modes, debris may accumulate at certain points in the pipeline, for example, near the recovery valve 140 . The gas curtain module 142, as described herein, helps minimize the accumulation of such debris. An example of a gas outlet valve 210 leading to a second collection chamber is described in more detail below in connection with FIG.

[0056] In FIG. 2, the GDS 130 further comprises a viewing and / or cleaning window 138 in the extension arm. This window 138 may be configured to allow access for monitoring gas flow or for cleaning. In some examples, the second gas curtain module 242 may be positioned between the gas inlet 131 and the window 138, as the extension arm with the window may create an additional point of debris collection.

[0057] The gas curtain module 142 may form a volume between its location in the pipeline and the collection valve. The gas flowing through the gas curtain module 142 creates a local pressure increase that blocks gas flow from the gas inlet side from entering the volume between the collection valve 140 and the gas curtain module 142, reducing the amount of debris that accumulates in this volume. The gas curtain module 142 includes one or more purge gas inlets for introducing an inert purge gas, such as nitrogen or argon. The gas curtain module 142 may also include a buffer region 242 positioned to distribute purge gas provided through one or more purge gas inlets before the purge gas is introduced into the pipeline. In the example shown in FIG. 2, the buffer region 242 circumferentially follows the shape of the inner surface of the pipeline. The buffer region 242 may itself have an inner surface facing the inside of the pipeline, and the inner surface of the buffer region 242 may be arranged to introduce purge gas into the pipeline through openings or slits or any other suitable means.

[0058] 3A-3B show an example of a gas curtain module 340 in which slits 360 are arranged on the inner surface of a buffer region 242 along the circumference of the pipeline. FIG. 3A is a side view of gas curtain module 340, while FIG. 3B provides a cross-sectional view. This configuration forms a ring-shaped gas curtain module that outputs a radially uniform gas flow into the pipeline, promoting the effect of local pressure increase that blocks gas flow from the gas inlet side. The slits 360 may be along the circumference or localized on a portion of the interior surface. In other examples, the gas curtain module 340 can include two or more slits spaced apart at various angles.

[0059] FIG. 4 shows an example of a gas curtain module 440 that has openings 460 positioned on the inner surface of the buffer region 242 along the circumference of the pipeline. The buffer region 242 of the gas curtain module 440 connected to the purge gas inlets 410 , 411 is positioned to thereby distribute the purge gas supplied from the inlets 410 , 411 before introducing it into the pipeline through the opening 460 .

[0060] Gas curtain modules 340 and 440 are shown with two purge gas inlets 310, 311 and 410, 411, although other configurations are possible, for example with one purge gas inlet or multiple radially arranged purge gas inlets.

[0061] FIG. 5 shows an exemplary GDS 530 with two pipeline arms 534, 536 leading to two collection chambers (not shown), allowing for simultaneous or sequential processing of deposition products in the two collection chambers. The effect of the setup shown in Figure 5 is to reduce cycle times. When one of the pipeline arms 534, 536 is not in use for some reason, such as because deposition product is being unloaded from the collection chamber, the other pipeline (and collection chamber) can be operational in the meantime. The GDS 530 comprises a gas inlet 531, two gas curtain modules 540, 541, and two collection valves 550, 551. One of the collection valves 550, 551 can also be considered an outlet valve connected to a secondary collection chamber.

[0062] Successful operation of the system does not require the exact structure shown in the figures, and any of the elements of the system may be substituted with suitable substitutes while maintaining the major components defined herein.

[0063] FIG. 6 illustrates an example of a method 600 . In this method, one or more of the steps may be performed simultaneously or in a different order. This method can be utilized with any of the systems disclosed herein.

[0064] Method 600 is a valve control method for a chemical vapor deposition (CVD) system having a reactor for producing a deposition product, a collection chamber for processing the deposition product, e.g., to produce a CVD product, and a gas distribution system (GDS) for transporting the deposition product from the reactor to the collection chamber. The CVD system can be any of the systems described in the examples above.

[0065] The method includes step 610 of opening a gas inlet of the GDS connecting the reactor to the GDS and a gas outlet valve between the gas inlet of the GDS and the gas curtain module while a collection valve for the GDS is closed to circulate the deposition product without allowing it to reach a collection chamber, and then step 620 of opening the gas inlet and collection valve while the gas outlet is closed, thereby directing the deposition product from the reactor to the collection chamber for processing without debris. This causes a switch in operation mode, and the opening of the gas curtain module in step 610 significantly reduces the amount of debris accumulating in the collection valve, allowing the deposition product to reach the collection chamber without debris during transfer in step 620.

[0066] In examples where the collection chamber of the CVD system includes an exhaust valve, method 600 may also include an optional step 630 of opening the collection valve together with (simultaneously with) the exhaust valve of the collection chamber to direct deposition products from the reactor to the collection chamber for processing.

[0067] Different functions discussed herein may be performed in different orders and / or concurrently with one another.

[0068] The values ​​of any ranges or devices given herein can be expanded or modified without losing the effect sought, unless otherwise indicated. Unless expressly prohibited, any example may be combined with another example.

[0069] Although the present subject matter has been described in terms of particular structural features and / or acts, it should be understood that the subject matter defined in the appended claims is not necessarily limited to these particular features or acts. Rather, the specific features and acts described above are disclosed as example forms of implementing the claims and other equivalent features and acts are intended to be encompassed within the scope of the claims.

[0070] It will be appreciated that the benefits and advantages described above may relate to one embodiment or to multiple embodiments. The embodiments are not limited to those that solve any or all of the stated problems or have any or all of the stated benefits and advantages. Additionally, it will be understood that a reference to "an" item may refer to one or more of those items.

[0071] As used herein, the term "comprising" is used to mean including specified methods, blocks, or elements, but such blocks or elements do not constitute an exclusive list and methods or apparatus may include additional blocks or elements.

[0072] Within this text, numerical descriptors such as "first," "second," etc. are used merely as a means of distinguishing between otherwise similarly named moieties. Numerical descriptors should not be construed as indicating any particular order, such as priority, order of production, or order of appearance in any particular structure.

[0073] Although the present invention is described in connection with particular types of apparatus and / or methods, it should be understood that the present invention is not limited to any particular types of apparatus and / or methods. While the invention has been described in connection with several examples, embodiments and implementations, the invention is not so limited, but rather includes various modifications and equivalent arrangements included within the scope of the appended claims. While various examples have been described with a certain degree of particularity or with reference to one or more individual embodiments, those skilled in the art could make numerous modifications to the disclosed examples without departing from the scope of the present specification.

Claims

1. a reactor for producing the deposition product, a recovery chamber for the treatment of said deposition products; a gas distribution system (GDS) for transporting the deposition products from the reactor to the collection chamber; 1. A chemical vapor deposition (CVD) system comprising: a pipeline connecting the reactor with the collection chamber, the pipeline having an inner surface; a gas inlet connecting the pipeline and the reactor, the gas inlet configured to supply the deposition product from the reactor to the pipeline; a collection valve disposed between the pipeline and the collection chamber, the collection valve configured to deliver the deposition product from the pipeline to the collection chamber; a gas curtain module disposed in the pipeline between the gas inlet and the recovery valve, the gas curtain module including one or more purge gas inlets configured to introduce purge gas into the pipeline at said locations; A chemical vapor deposition (CVD) system comprising:

2. The system of claim 1 , wherein the GDS also comprises a gas outlet valve disposed in the pipeline between the gas inlet and the gas curtain module.

3. The system of claim 2 , wherein the gas outlet valve is connected to a waste outlet.

4. The system of claim 2 , wherein the gas outlet valve is connected to a second collection chamber for processing of the deposition products.

5. The system according to any one of claims 1 to 4, wherein the purge gas is an inert gas selected from the group consisting of nitrogen, argon and helium.

6. 6. The system of claim 1, wherein the gas curtain module comprises a buffer region positioned to distribute the purge gas supplied from the one or more purge gas inlets before the purge gas is introduced into the pipeline.

7. The system of claim 6 , wherein the buffer region has a shape that conforms to a portion of the inner surface of the gas curtain module and has an inner surface that faces the inside of the pipeline.

8. 8. The system of claim 7, wherein the buffer region of the gas curtain module comprises at least one slit disposed on the inner surface of the buffer region, the at least one slit positioned to introduce the purge gas from the buffer region into the pipeline.

9. 8. The system of claim 7, wherein the buffer region of the gas curtain module comprises at least four openings arranged in pairs opposite each other on the inner surface of the buffer region, the openings being positioned to introduce the purge gas from the buffer region into the pipeline.

10. 10. The system of claim 1, wherein the pipeline has a circular cross-section and the gas curtain module is configured to introduce the purge gas into the pipeline along a radial periphery of the cross-section of the pipeline.

11. 10. The system of claim 1, wherein the pipeline has a rectangular cross-section and the gas curtain module is configured to introduce the purge gas into the pipeline along the periphery of the rectangle of the cross-section of the pipeline.

12. The system of any one of claims 1 to 11, wherein the gas inlet is a gate valve.

13. The system of any one of claims 2 to 11, comprising one or more controllers for controlling the gas inlet, the collection valve, the gas outlet valve and the gas curtain module.

14. 14. The system of claim 13, wherein the one or more controllers are configured to open the gas curtain module while the gas inlet and gas outlet valves are open, but close the recovery valve.

15. The system of any one of claims 1 to 14, wherein the gas curtain module is positioned at a distance of 0 to 100 centimeters from the collection valve.

16. The system according to any one of claims 1 to 15, wherein the gas curtain modules are arranged transversely to the direction of gas flow in the pipeline.

17. The system of any one of claims 1 to 15, wherein the gas curtain modules are positioned at an angle between 0 and 90 degrees relative to the direction of gas flow in the pipeline.

18. A system according to any preceding claim, comprising a bypass valve.

19. The system of any one of claims 1 to 18, wherein the CVD system is a floating catalyst chemical vapor deposition (FCCVD) system.

20. 20. The system of any one of claims 1 to 19, further comprising a viewport connected to the pipeline together with a secondary arm, and a second gas curtain module positioned between the viewport and a connection point of the secondary arm with the pipeline, the second gas curtain module comprising one or more purge gas inlets configured at its location to introduce purge gas into the secondary arm.

21. 1. A gas curtain module for a gas distribution system of a chemical vapor deposition (CVD) system, the gas curtain module being disposed in a pipeline of the gas distribution system, the gas curtain module comprising: one or more inlets configured to introduce a purge gas; a buffer area connected to said one or more inlets and arranged to distribute the purge gas supplied by said one or more inlets before said purge gas is introduced into the pipeline; at least one slit and / or four or more openings arranged to feed a gas flow of said purge gas from said buffer area into said pipeline; A gas curtain module comprising:

22. 1. A valve control method for a chemical vapor deposition (CVD) system having a reactor for producing a deposition product, a collection chamber for processing the deposition product, and a gas distribution system (GDS) for transporting the deposition product from the reactor to the collection chamber, comprising: - opening a gas inlet of the GDS connecting the reactor to the GDS and a gas outlet valve between the gas inlet of the GDS and a gas curtain module while a recovery valve for the GDS is closed in order to circulate the deposition product without allowing it to reach the recovery chamber; and then - opening the gas inlet and the collection valve while the gas outlet is closed, whereby the deposition products from the reactor are directed to the collection chamber for deposition without debris; A valve control method comprising:

23. 23. The valve control method of claim 22, wherein the collection chamber has an exhaust valve that opens together with the exhaust valve of the collection chamber to direct the deposition product from the reactor to the collection chamber for processing.

Images