Sample processing apparatus and sample processing method

Abstract

To provide a sample processing apparatus that can reduce the amount of shavings scattered within the sample chamber. [Solution] The sample processing apparatus 100 is a sample processing apparatus that processes a sample S placed in a sample chamber 12 by irradiating the sample S with a processing beam, and includes a laser device 30 as a processing beam source for irradiating the sample S with a processing beam, a sample holder 50 for holding the sample S, a sample stage 40 on which the sample holder 50 is mounted, and a shield 60 placed in the sample chamber 12, wherein the sample holder 50 and the shield 60 constitute a container for housing the sample S, and the container is provided with a window portion for guiding the processing beam into the container.

Description

Technical Field

[0001] The present invention relates to a sample processing apparatus and a sample processing method.

Background Art

[0002] In analyzers such as scanning electron microscopes and transmission electron microscopes, a sample to be observed or analyzed is processed into a shape suitable for observation or analysis using a sample processing apparatus. Examples of such sample processing apparatuses include a cross-section polisher (registered trademark) using an ion beam, a focused ion beam apparatus using a focused ion beam, and a laser processing apparatus using a laser beam.

[0003] In a sample processing apparatus, chips generated by processing may have an adverse effect. For example, Patent Document 1 discloses a processing apparatus provided with a protection screen between a sample and an objective lens in order to protect the objective lens from fragments generated by processing in an apparatus for processing a sample using a laser beam in a vacuum chamber.

Prior Art Documents

Patent Documents

[0004]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0005] However, chips generated by processing scatter in various directions from the irradiation position of the laser beam. Therefore, for example, in the apparatus disclosed in Patent Document 1, fragments generated by processing may scatter in the vacuum chamber and adhere to an optical system other than the objective lens, a detector, the inner surface of the vacuum chamber, or the like.

Means for Solving the Problems

[0006] One aspect of the sample processing apparatus according to the present invention is A sample processing apparatus that processes a sample placed in a sample chamber by irradiating it with a processing beam, A processing beam source that irradiates the sample with the processing beam, A sample holder for holding the aforementioned sample, A sample stage on which the aforementioned sample holder is attached, A shield placed in the aforementioned sample chamber, Includes, The sample holder and the shield constitute a container for housing the sample. The container is provided with a window portion into which the processing beam is guided.

[0007] With this type of sample processing device, the sample can be processed within the container, thus reducing the amount of shavings scattered within the sample chamber.

[0008] One embodiment of the sample processing method according to the present invention is: The process involves attaching a sample holder to the sample stage located in the sample chamber of the sample processing apparatus, A step of observing the sample using an observation beam and determining the processing area of ​​the sample, The steps include: placing the sample in a container comprising a shield and a sample holder; A processing beam is guided into the container through a window provided in the container, and the container is housed in the container. The process involves processing the sample with the processing beam, Includes.

[0009] This sample processing method allows the sample to be processed within the container, thus reducing the amount of shavings scattered within the sample chamber. [Brief explanation of the drawing]

[0010] [Figure 1] A schematic perspective view showing the sample processing apparatus according to this embodiment. [Figure 2] A schematic plan view showing the sample processing apparatus according to this embodiment. [Figure 3]Perspective view schematically showing a sample holder and a shield. [Figure 4] Perspective view schematically showing a sample holder and a shield. [Figure 5] Perspective view schematically showing a sample holder and a shield. [Figure 6] Perspective view schematically showing a shield. [Figure 7] Perspective view schematically showing a shield. [Figure 8] Perspective view schematically showing a container. [Figure 9] Flowchart showing an example of a measurement method including a sample processing method using a sample processing device. [Figure 10] Diagram for explaining each step of a measurement method including a sample processing method using a sample processing device. [Figure 11] Diagram for explaining each step of a measurement method including a sample processing method using a sample processing device. [Figure 12] Perspective view schematically showing a modified example of a sample holder and a shield. [Figure 13] Perspective view schematically showing a modified example of a shield. [Figure 14] Perspective view schematically showing a modified example of a shield. [Figure 15] Perspective view schematically showing a modified example of a shield. [Figure 16] Perspective view schematically showing a modified example of a shield. [Figure 17] Perspective view schematically showing a modified example of a sample holder and a shield. [Figure 18] Perspective view schematically showing a modified example of a sample holder and a shield. [Figure 19] Perspective view schematically showing a modified example of a container. [Figure 20] Cross-sectional view schematically showing the connection part between a sample holder and a shield. [Figure 21] Diagram for explaining a modified example of a container. [Figure 22] Diagram for explaining a modified example of a container. [Figure 23] Diagram for explaining a modified example of a container. [Figure 24] A diagram illustrating variations in the container. [Figure 25] A schematic perspective view showing modified versions of the sample holder and shield. [Figure 26] A schematic perspective view showing modified versions of the sample holder and shield. [Modes for carrying out the invention]

[0011] Preferred embodiments of the present invention will be described in detail below with reference to the drawings. The embodiments described below are not intended to unduly limit the scope of the present invention as described in the claims. Furthermore, not all of the configurations described below are essential components of the present invention.

[0012] 1. Sample processing equipment First, a sample processing apparatus according to one embodiment of the present invention will be described with reference to the drawings. Figure 1 is a schematic perspective view showing the sample processing apparatus 100 according to this embodiment. Note that in Figure 1, a part of the housing 10 is omitted from the illustration. Figure 2 is a schematic plan view showing the sample processing apparatus 100 according to this embodiment. Figures 1 and 2 show three mutually orthogonal axes: the X axis, the Y axis, and the Z axis.

[0013] As shown in Figures 1 and 2, the sample processing apparatus 100 comprises a housing 10 having a sample chamber 12 and It includes a scanning electron microscope (SEM) tube 20 as an observation beam source, a laser device 30 as a processing beam source, a sample stage 40, a sample holder 50, a shield 60, a backscattered electron diffraction detector (EBSD detector) 70, and an energy-dispersive X-ray spectrometer (EDS detector) 80.

[0014] The housing 10 has a sample chamber 12 in which a sample S is housed. The housing 10 is fitted with a SEM tube 20, a laser device 30, an EBSD detector 70, and an EDS detector 80. The SEM tube 20 is mounted on the side of the housing 10 facing the +Z direction. A connection port 16a is provided on the side of the housing 10 facing the +X direction, and a connection port 16b is provided on the side facing the +Y direction. The laser device 30 is mounted on the connection port 16a. The EBSD detector 70 is mounted on the connection port 16b. The housing 10 is further fitted with a connection port 16c, and the EDS detector 80 is mounted on the connection port 16c.

[0015] The sample chamber 12 houses the sample S to be processed and observed. The sample chamber 12 is evacuated by a vacuum evacuation device (not shown) and maintained under vacuum (reduced pressure). The housing 10 is provided with a door 14. The sample S, held in the sample holder 50, is introduced into the sample chamber 12 through the door 14.

[0016] The SEM tube 20 irradiates the sample S with an electron beam. The electron beam is directed onto the sample S along the Z-axis. The SEM tube 20 includes an electron gun that emits the electron beam and an electron optical system for focusing the electron beam to form an electron probe and scanning the sample S with the formed electron probe. The electron optical system includes an objective lens 22. The objective lens 22 is the lens positioned closest to the sample S and focuses the electron probe onto the surface of the sample S.

[0017] In the sample processing device 100, an SEM image can be obtained by scanning the sample S with an electron probe and detecting electrons emitted from the sample S with an electron detector (not shown).

[0018] The laser device 30 irradiates the sample S with laser light for processing. This allows the sample S to be processed. The laser device 30 may also process the sample S by scanning it with laser light. For example, in cross-sectional processing of the sample S, using laser light as the processing beam allows for processing a larger area in a shorter time compared to using a focused ion beam (FIB).

[0019] The sample stage 40 is located in the sample chamber 12. A sample holder 50 is placed on the sample stage 40. The sample stage 40 can move the sample holder 50 horizontally and vertically. That is, the sample stage 40 can move the sample holder 50 along the X, Y, and Z axes. Furthermore, the sample stage 40 can tilt the sample holder 50.

[0020] The sample holder 50 holds the sample S. The sample holder 50 is attached to the sample stage 40. The sample holder 50 is detachable from the sample stage 40.

[0021] The shield 60 is located in the sample chamber 12. The shield 60 is supported by a support member 90. The shield 60 is fixed to the housing 10 via the support member 90. The shield 60 is used to reduce the amount of debris scattered inside the sample chamber 12, as will be described later.

[0022] The EBSD detector 70 acquires electron diffraction patterns obtained using backscattered electron diffraction. For example, when an electron beam is incident on the surface of the sample S from a direction of approximately 70°, electrons The electrons are diffracted and emitted from the sample S as backscattered electrons. The electron diffraction pattern that appears at this time is acquired by the EBSD detector 70. By scanning the sample S with the electron beam and acquiring the electron diffraction pattern, an EBSD mapping image can be obtained. The EBSD mapping image allows visualization of the orientation of the crystal grains, the grain boundaries, and differences in crystal phases.

[0023] The EDS detector 80 obtains an X-ray spectrum by discriminating the X-rays emitted from the sample S by energy when the sample S is irradiated with an electron beam. Compositional information of the sample S can be obtained from the X-ray spectrum.

[0024] In the sample processing apparatus 100, SEM observation, EBSD measurement, and EDS measurement are performed at an observation position located below the objective lens 22 (-Z direction). With the sample holder 50 holding the sample S positioned at the observation position, an electron beam is irradiated onto the sample S from the SEM tube 20, and an SEM image is captured. Similarly, with the sample holder 50 holding the sample S positioned at the observation position, an electron beam is irradiated onto the sample S from the SEM tube 20, and EBSD measurement and EDS measurement are performed. Figure 1 illustrates the state in which the sample holder 50 is positioned at the observation position.

[0025] Furthermore, in the sample processing apparatus 100, laser processing is performed at a processing position located in front of the connection port 16a (-X direction) to which the laser device 30 is connected. With the sample holder 50 that holds the sample S positioned at the processing position, laser light is irradiated onto the sample S from the laser device 30, and the sample S is laser processed.

[0026] When sample S is laser processed, shavings are generated from sample S. These shavings scatter in various directions. When the sample holder 50 is positioned at the processing location, sample S is contained within the container formed by the sample holder 50 and the shield 60. Therefore, the sample processing device 100 can reduce the amount of shavings scattered within the sample chamber 12.

[0027] As described above, EBSD measurement is performed with the sample S tilted at 70°. Therefore, the sample S is laser-processed while tilted at 70°. Accordingly, as shown in Figure 1, the shield 60 is fixed in the sample chamber 12 at a 70° angle to fit the sample holder 50 which is tilted at 70°.

[0028] The processing position is located in the +X direction of the observation position, and the observation and processing positions are aligned along the X-axis. Therefore, by simply moving the sample holder 50 along the X-axis on the sample stage 40, the sample holder 50 can be moved between the observation and processing positions. Consequently, the sample processing device 100 can minimize the displacement of the sample S caused by moving it between the observation and processing positions. Note that the positional relationship between the observation and processing positions is not limited to this.

[0029] 2. Sample holder and shield Figures 3 to 5 are schematic perspective views of the sample holder 50 and shield 60. Figure 3 shows the sample holder 50 in the observation position. Figure 4 shows the sample stage 58 in an inclined position. Figure 5 shows the sample holder 50 in the processing position. Note that, as shown in Figure 1, the shield 60 is fixed to the sample chamber 12 at a 70° angle, but for convenience, Figures 3 to 5 show the shield 60 as not inclined.

[0030] As shown in Figures 3 to 5, the sample holder 50 includes a base 52, a tilting mechanism 54, a first member 56a, a second member 56b, a sample stage 58, and a protrusion 59.

[0031] The base 52 is mounted on the sample stage 40. A tilting mechanism 54 is provided on the base 52.

[0032] The tilting mechanism 54 tilts the sample stage 58 to any angle. This allows the sample S placed on the sample stage 58 to be tilted, as shown in Figure 4. The tilting mechanism 54 has a base 540, a projection 542 that protrudes perpendicularly from the base 540, and a connecting part 544 connected to the first member 56a.

[0033] The base portion 540 is fixed to the base body 52. ​​The protruding portion 542 and the connecting portion 544 are connected by an inclination axis T. The inclination mechanism 54 has a drive unit that rotates the connecting portion 544 around the inclination axis T. The drive unit rotates the connecting portion 544 using power such as a motor. By rotating the connecting portion 544 around the inclination axis T, the first member 56a, the second member 56b, and the sample stage 58 can be tilted together as a single unit, as shown in Figure 4.

[0034] The configuration of the tilting mechanism 54 is not particularly limited as long as it can tilt the sample stage 58.

[0035] As shown in Figure 5, the sample holder 50 and shield 60 constitute a container 2 for containing the sample S at the processing position. The first member 56a and the second member 56b are components for forming the container 2. The first member 56a defines the bottom surface of the container 2. The second member 56b defines one of the four sides of the container 2.

[0036] The sample stage 58 is positioned on the first member 56a. The sample S is placed on the sample stage 58. The sample S can be tilted by tilting the sample stage 58 using the tilting mechanism 54.

[0037] A protrusion 59 is provided at the connection point between the sample holder 50 and the shield 60. The protrusion 59 is provided on the first member 56a and the second member 56b of the sample holder 50. The protrusion 59 is provided so as to surround the sample stage 58.

[0038] Figures 6 and 7 are schematic perspective views of the shield 60.

[0039] The shield 60 has a third member 62a, a fourth member 62b, a fifth member 62c, a sixth member 62d, a window portion 64, and a recess 66. The third member 62a defines one of the four sides of the container 2. The fourth member 62b defines one of the four sides of the container 2. The fifth member 62c defines one of the four sides of the container 2. The sixth member 62d defines the top surface of the container 2.

[0040] Container 2 is composed of a first member 56a, a second member 56b, a third member 62a, a fourth member 62b, a fifth member 62c, and a sixth member 62d. The first member 56a, the second member 56b, the third member 62a, the fourth member 62b, the fifth member 62c, and the sixth member 62d form six surfaces that surround the sample S. The sample S is contained in the space surrounded by these six surfaces (the inner surface of container 2). Container 2 surrounds the sample S on all four sides with its six surfaces.

[0041] The inner surface of container 2 has fine irregularities formed to prevent shavings attached by laser processing from easily peeling off. For example, the inner surface of container 2 has irregularities of about several hundred μm to 1 mm. For example, the inner surface of container 2 may be made irregular by forming a film of metal, ceramics, cermet, etc. on the inner surface of container 2 by thermal spraying. This makes it difficult for shavings attached by laser processing to peel off the inner surface of container 2. This is possible. In addition, the members constituting the inner surface of the container 2, namely the first member 56a, the second member 56b, the third member 62a, the fourth member 62b, the fifth member 62c, and the sixth member 62d, may be made of a material that prevents shavings attached by laser processing from easily peeling off the inner surface of the container 2.

[0042] The window portion 64 guides the laser light into the container 2. The window portion 64 transmits the laser light. The material of the window portion 64 is, for example, glass. The window portion 64 is provided on the fifth member 62c, which has a surface facing the direction of the laser device 30. The window portion 64 is replaceable relative to the container 2. The window portion 64 is detachable from the fifth member 62c.

[0043] A recess 66 is provided at the connection point between the shield 60 and the sample holder 50. As shown in Figure 7, the recess 66 is located on the inner surface of the shield 60. When the sample holder 50 is positioned in the processing location, the protrusion 59 is inserted into the recess 66.

[0044] Figure 8 is a schematic perspective view of container 2.

[0045] As shown in Figure 8, when the container 2 is constructed by the sample holder 50 and the shield 60, the protrusion 59 is inserted into the recess 66. Therefore, the path connecting the inside and outside of the container 2 can be bent at the connection point between the sample holder 50 and the shield 60. Thus, compared to, for example, a case where the path connecting the inside and outside of the container 2 is straight, the possibility of shavings leaking out of the container 2 from the connection point between the sample holder 50 and the shield 60 can be reduced.

[0046] In the examples shown in Figures 3 to 8 above, the case described is one in which a protrusion 59 is provided on the sample holder 50 and a recess 66 is provided on the shield 60. However, although not shown in the figures, the shield 60 may be provided with a protrusion and the sample holder 50 may be provided with a recess into which the protrusion is inserted. In this case as well, the same effects can be achieved.

[0047] 3. Sample preparation method Next, a sample processing method using the sample processing device 100 and a measurement method for measuring the sample processed by the sample processing method will be described. Figure 9 is a flowchart showing an example of a measurement method including the sample processing method using the sample processing device 100. Figures 10 and 11 are diagrams illustrating each step of the measurement method including the sample processing method using the sample processing device 100.

[0048] First, as shown in Figure 1, the sample holder 50 that holds the sample S is attached to the sample stage 40 (step S100).

[0049] First, the sample chamber 12 is vented, and the sample holder 50, which holds the sample S, is introduced into the sample chamber 12 through the door 14. Next, the sample holder 50 is attached to the sample stage 40. After the sample holder 50 is attached to the sample stage 40, the door 14 is closed, and the sample chamber 12 is evacuated. As a result, the sample chamber 12 is in a vacuum state. At this time, the sample holder 50 is in the observation position.

[0050] Next, as shown in Figure 10, the processing area is determined using an SEM image (step S102).

[0051] First, the sample holder 50 is tilted 70° on the sample stage 40. This allows the electron beam to be incident on the surface of the sample S at a 70° angle. Next, the EBSD detector 70 is inserted and positioned near the sample S. This makes the system ready for EBSD measurement. Then, the electron beam is irradiated onto the sample S from the SEM tube 20 to acquire an SEM image of the sample S, and the processing area of ​​the sample S is determined using the SEM image of the sample S.

[0052] Next, as shown in Figure 11, the sample S is placed in container 2 (step S104).

[0053] First, the sample holder 50 is moved from the observation position to the processing position using the sample stage 40. Specifically, the sample holder 50, which is located at the observation position, is moved by a predetermined distance in the +X direction using the sample stage 40. This allows the sample holder 50 to be moved from the observation position to the processing position. Since the shield 60 is fixed at the processing position, moving the sample holder 50 to the processing position causes the sample holder 50 and the shield 60 to form a container 2 for holding the sample S.

[0054] Next, sample S is laser-processed (step S106).

[0055] First, an optical microscope (not shown) attached to the housing 10 is used to check the processing area of ​​the sample S inside the container 2 through the window 64. Next, the laser device 30 is made to emit laser light. The laser light passes through the window 64 and irradiates the sample S inside the container 2. This allows the processing area of ​​the sample S to be laser-processed and a cross-section of the sample S to be created. Through these steps, a cross-section of the processing area of ​​the sample S can be created.

[0056] Next, as shown in Figure 10, the processed area of ​​the laser-processed sample S is measured (step S108).

[0057] First, the sample holder 50 is moved from the processing position to the observation position using the sample stage 40. Specifically, the sample holder 50, which is located at the processing position, is moved by a predetermined distance in the -X direction using the sample stage 40. This allows the sample holder 50 to be moved from the processing position to the observation position. Since the shield 60 is fixed at the processing position, the sample S is exposed by moving the sample holder 50 from the processing position to the observation position.

[0058] Next, the sample S is irradiated with an electron beam to obtain a SEM image of the sample S, and the SEM image of the sample S is used to confirm that the electron beam is irradiating the laser-processed area. Then, the processed area of ​​the sample S is irradiated with an electron beam to perform EBSD and EDS measurements.

[0059] In this case, depending on the laser processing conditions, the cross-section of the laser-processed area may be tilted. In this case, the cross-section of the processed area of ​​sample S may not face the direction of the EBSD detector 70 at the observation position. In such cases, as shown in Figure 4, the tilting mechanism 54 of the sample holder 50 is used to tilt sample S so that the cross-section of the processed area of ​​sample S faces the direction of the EBSD detector 70. As a result, the cross-section of the processed area of ​​sample S faces the EBSD detector 70, enabling accurate EBSD measurement.

[0060] Through the above process, the laser-processed area of ​​sample S can be measured.

[0061] Furthermore, by repeatedly performing the processing of sample S including steps S102, S104, and S106 described above, and measuring sample S including step S108, multiple cross-sectional images can be obtained, and by reconstructing the multiple obtained cross-sectional images, three-dimensional information of sample S can be obtained. In this way, the sample processing apparatus 100 can easily perform three-dimensional measurement of sample S.

[0062] 4. Effects The sample processing apparatus 100 includes a laser device 30 as a processing beam source that irradiates the sample S with a processing beam, a sample holder 50 that holds the sample S, a sample stage 40 on which the sample holder 50 is mounted, and a shield 60 located in the sample chamber 12. In the sample processing apparatus 100, the sample holder 50 and the shield 60 constitute a container 2 that houses the sample S. Furthermore, the container 2 is provided with a window 64 into which laser light, which is used as a processing beam, is guided.

[0063] Therefore, in the sample processing device 100, the sample S can be laser processed while it is contained in the container 2, thus reducing the amount of debris scattered inside the sample chamber 12. Consequently, the possibility of debris adhering to the SEM tube 20, EBSD detector 70, EDS detector 80, and other components of the sample processing device 100 is reduced. Furthermore, the possibility of debris adhering to the inner surface of the sample chamber 12 is reduced. As a result, the sample processing device 100 can laser process the sample S without degrading the performance of the device.

[0064] Furthermore, the sample processing device 100 allows for the processing of the sample S, as well as observation and analysis of the sample S, without removing the sample holder 50 from the sample stage 40. Therefore, the sample processing device 100 can improve the throughput of analysis and observation, and enable highly accurate positional measurements. Consequently, the sample processing device 100 can easily perform three-dimensional measurement to acquire three-dimensional information of the sample S by repeatedly processing the sample S and observing and analyzing the sample S.

[0065] The sample processing apparatus 100 includes an SEM microscope tube 20, which is an observation beam source that irradiates the sample S with an electron beam as an observation beam. In the sample processing apparatus 100, the sample stage 40 moves the sample holder 50 between an observation position where the sample S is irradiated with an electron beam and a processing position where the sample S is irradiated with laser light. By moving the sample holder 50 to the processing position, the sample S is placed in the container 2. In this way, the sample processing apparatus 100 can place the sample S in the container 2 by using the sample stage 40 to move the sample holder 50 from the observation position to the processing position. Therefore, the sample processing apparatus 100 can easily reduce the amount of debris scattered inside the sample chamber 12.

[0066] In the sample processing apparatus 100, the shield 60 is fixed in the processing position. Therefore, in the sample processing apparatus 100, the sample S can be placed in the container 2 by moving the sample holder 50 to the processing position.

[0067] In the sample processing device 100, the sample holder 50 is provided with a protrusion 59, and the shield 60 is provided with a recess 66 into which the protrusion 59 is inserted. Therefore, the sample processing device 100 can reduce the possibility of shavings leaking out of the container 2 from the connection between the sample holder 50 and the shield 60.

[0068] In the sample processing apparatus 100, the sample holder 50 has a sample stage 58 on which the sample S is placed, and the protrusion 59 surrounds the sample stage 58. Therefore, in the sample processing apparatus 100, the possibility of shavings leaking out of the container 2 from the connection between the sample holder 50 and the shield 60 can be reduced.

[0069] In the sample processing apparatus 100, the sample holder 50 has a tilting mechanism 54 that tilts the sample S. Therefore, in the sample processing apparatus 100, the cross-section of the processing area of ​​the sample S can be directed toward the EBSD detector 70.

[0070] In the sample processing device 100, the processing beam is laser light, and the material of the window section 64 transmits the laser light. Therefore, the sample processing device 100 can laser process the sample S inside the container 2.

[0071] In the sample processing apparatus 100, the window portion 64 is replaceable. Therefore, in the sample processing apparatus 100, the window portion 64 can be replaced if shavings adhere to it. Also, for example, if shavings adhere to the window portion 64, the window portion 64 can be cleaned.

[0072] A sample processing method using the sample processing apparatus 100 includes the steps of: attaching a sample holder 50 for holding a sample S to a sample stage 40 located in the sample chamber 12; observing the sample S using an observation beam and determining the processing area of ​​the sample S; housing the sample S in a container 2 composed of a shield 60 and a sample holder 50; and guiding a processing beam into the container 2 from a window 64 provided in the container 2 and processing the sample S housed in the container 2 with the processing beam.

[0073] Therefore, in the sample processing method using the sample processing device 100, the sample S can be processed within the container 2, thus reducing the amount of debris scattered within the sample chamber 12.

[0074] 5. Variations 5.1. First Variation Figure 12 is a schematic perspective view showing modified samples of the sample holder 50 and shield 60. Figure 13 is a schematic perspective view showing modified shield 60.

[0075] As shown in Figures 12 and 13, the sample holder 50 does not have a protrusion, and the shield 60 does not have a recess. Even in this case, by housing the sample S in the container 2, the amount of debris scattered in the sample chamber 12 can be reduced. Furthermore, the configuration of the sample holder 50 and the shield 60 can be simplified compared to the case where the sample holder 50 has a protrusion 59 and the shield 60 has a recess 66.

[0076] 5.2. Second Variation Figures 14 and 15 are schematic perspective views showing modified examples of the shield 60. In the examples shown in Figures 6 and 7 described above, the window portion 64 was made of glass that transmits laser light, but as shown in Figures 14 and 15, the window portion 64 may be a through-hole that penetrates the container 2.

[0077] In the examples shown in Figures 14 and 15, the window portion 64 is a through-hole that penetrates the fifth member 62c of the shield 60. When laser processing the sample S, the laser light emitted from the laser device 30 passes through the through-hole, which serves as the window portion 64, and irradiates the sample S contained in the container 2. The diameter of the through-hole is, for example, larger than the diameter of the laser beam.

[0078] If the window portion 64 is a through hole, the processing beam may be a laser beam, an ion beam, a focused ion beam (FIB), a plasma focused ion beam, an electron beam, or the like.

[0079] Even when the window portion 64 is a through hole, the amount of debris scattered into the sample chamber 12 can be reduced by placing the sample S in the container 2, just as when the window portion 64 is made of glass.

[0080] Figure 16 is a schematic perspective view showing a modified example of the shield 60. As shown in Figure 16, when the window portion 64 is a through hole, the shield 60 does not have a recess 66 and the sample holder 50 does not have a protrusion, similar to the examples shown in Figures 12 and 13. In the example shown in Figure 16 as well, by housing the sample S in the container 2, the amount of debris scattered into the sample chamber 12 can be reduced.

[0081] 5.3. Third Variation Figure 17 is a schematic perspective view showing modified examples of the sample holder 50 and shield 60. As shown in Figure 17, the sample holder 50 does not necessarily have a tilting mechanism 54 for tilting the sample S. In this case, for example, the tilting mechanism of the sample stage 40 may be used to tilt the sample S.

[0082] Figure 18 is a schematic perspective view showing modified examples of the sample holder 50 and the shield 60. As shown in Figure 18, the sample holder 50 does not necessarily have a tilting mechanism 54 for tilting the sample S. In the example shown in Figure 18, the sample holder 50 does not have a convex portion, and the shield 60 does not have a concave portion.

[0083] 5.4. Fourth Variation Figure 19 is a schematic perspective view showing a modified example of container 2. Figure 20 is a schematic cross-sectional view showing the connection between the sample holder 50 and the shield 60. Note that Figure 20 is a cross-sectional view taken along line XX-XX in Figure 19.

[0084] As shown in Figure 20, the protrusion 59 of the sample holder 50 and the recess 66 of the shield 60 do not need to be in contact. By inserting the protrusion 59 into the recess 66, the path connecting the inside and outside of the container 2 can be bent even if the protrusion 59 and the recess 66 are not in contact. Therefore, the possibility of shavings leaking out of the container 2 from the connection between the sample holder 50 and the shield 60 can be reduced.

[0085] Since the convex portion 59 and concave portion 66 of the sample holder 50 and shield 60 do not come into contact, the sample holder 50 does not come into contact with the shield 60 when the sample holder 50 is moved from the observation position to the processing position. This reduces the displacement of the sample holder 50. For example, if the sample holder 50 comes into contact with the shield 60, the impact caused by the contact may cause the sample holder 50 to become displaced. By preventing the sample holder 50 from coming into contact with the shield 60, the displacement of the sample can be reduced.

[0086] In the example shown in Figure 20, the width A of the recess 66 is greater than the width B of the protrusion 59. A gap is formed between the recess 66 and the protrusion 59. Therefore, when moving the sample holder 50 to the processing position and inserting the protrusion 59 into the recess 66, the positional displacement of the sample holder 50 can be tolerated by the size of the gap.

[0087] Although not shown in the figures, an impact-absorbing member may be placed in the recess 66 to absorb the impact when the protrusion 59 contacts the recess 66. For example, an elastic member that elastically deforms when the protrusion 59 collides with it may be placed in the recess 66 as the impact-absorbing member. This can reduce the displacement of the sample holder 50. As such an elastic member, rubber, a spring, resin, etc., can be used.

[0088] 5.5. Fifth Variation Figure 21 illustrates a modified version of container 2. Figure 21 shows the cases where the inclination angle θ of the sample stage 58 is 10° and the cases where the inclination angle θ of the sample stage 58 is 40°. As shown in Figure 21, the height of container 2 may be variable.

[0089] The shield 60 has a lid portion 602 that forms the top of the container 2. The lid portion 602 is located inside the members that make up the three sides of the container 2, namely the third member 62a, the fourth member 62b, and the fifth member 62c shown in Figure 7.

[0090] The lid 602 is configured to be movable. The lid 602 is supported by the sample holder 50. In the illustrated example, the lid 602 is supported by the second member 56b that constitutes the container 2. Therefore, by tilting the sample stage 58 using the tilting mechanism 54, the lid 602 moves in the vertical direction. Although not shown in the illustration, the lid 602 may also be supported by the sample stage 58, or by other members that are tilted by the tilting mechanism 54.

[0091] In the example shown in Figure 21, the height of the lid 602 when the inclination angle θ = 40° is greater than the height of the lid 602 when the inclination angle θ = 10°. The greater the inclination angle θ of the sample stage 58, the greater the height of the lid 602. In this way, the height of the container 2 changes as the height of the lid 602 changes.

[0092] By changing the height of the container 2 according to the tilt angle θ, the sample S can be tilted during laser processing. Therefore, in the example shown in Figure 21, the sample S can be laser processed at various angles.

[0093] If the height of the lid 602 is fixed at a height corresponding to the maximum inclination angle of the sample stage 58, then reducing the inclination angle θ will increase the gap between the sample holder 50 and the lid 602. In contrast, by changing the height of the container 2 according to the inclination angle θ, the gap between the sample holder 50 and the lid 602 can be kept constant even when the inclination angle θ changes.

[0094] The shield 60 may also have a drive unit for moving the lid 602. For example, the drive unit may move the lid 602 using power such as a motor. The drive unit moves the lid 602 in conjunction with the tilt of the sample stage 58, for example. This allows the height of the container 2 to be changed according to the tilt angle θ.

[0095] 5.6. Sixth Variation Figure 22 is a diagram illustrating a modified version of container 2. In the example shown in Figure 22, similar to the example shown in Figure 21, the lid 602 is movable and the height of container 2 is variable.

[0096] As shown in Figure 22, the lid portion 602 has an upper surface portion 604 that constitutes the top of the container 2, and a side portion 606 that overlaps with the members that constitute the three sides of the container 2 (i.e., the third member 62a, the fourth member 62b, and the fifth member 62c shown in Figure 7). The side portion 606 is in contact with the outer surface of the fifth member 62c. Although not shown, the side portion 606 is in contact with the outer surfaces of the third member 62a and the fourth member 62b.

[0097] The lid portion 602 is supported by the sample holder 50, similar to the example shown in Figure 21, and moves vertically by tilting the sample stage 58 using the tilting mechanism 54.

[0098] In the example shown in Figure 22, the height of container 2 is variable, similar to the example shown in Figure 21, and therefore the same effects and advantages as in the example shown in Figure 21 can be achieved.

[0099] 5.7. Seventh Variation Figure 23 is a diagram illustrating a modified version of container 2. In the example shown in Figure 23, the sample holder 50 has a movable wall 610 that moves in accordance with the inclination of the sample stage 58.

[0100] The movable wall 610, together with the first member 56a and the second member 56b, constitutes the container 2. The movable wall 610 closes the gap G between the second member 56b, which defines the side surface of the container 2, and the sixth member 62d, which defines the top surface of the container 2.

[0101] The movable wall 610 is configured to be movable. The movable wall 610 is supported by the second member 56b. Therefore, by tilting the sample stage 58 using the tilting mechanism 54, the movable wall 610 moves in the vertical direction. Although not shown in the figures, the movable wall 610 may be supported by the sample stage 58, or by other members that are tilted by the tilting mechanism 54.

[0102] Since the position of the second member 56b changes according to the inclination angle θ, the size of the gap G between the second member 56b and the sixth member 62d also changes according to the inclination angle θ. In the example shown in Figure 23, the size of the gap G when the inclination angle θ = 10° is larger than the size of the gap G when the inclination angle θ = 40°.

[0103] As shown in Figure 23, the movable wall 610 moves according to the tilt angle θ, closing the gap G between the second member 56b and the sixth member 62d. Therefore, the sample S can be tilted during laser processing.

[0104] The sample holder 50 may also have a drive unit for moving the movable wall 610. For example, the drive unit may move the movable wall 610 using power such as a motor. The drive unit may also move the movable wall 610 in conjunction with the tilt of the sample stage 58, for example.

[0105] 5.8. Eighth Variation Figure 24 illustrates a modified example of container 2. In the example shown in Figure 24, the lid 602 is movable, and the height of container 2 is variable, similar to the example shown in Figure 21.

[0106] The lid portion 602 is connected to the shaft member 603. The shaft member 603 is fixed to the fifth member 62c. The shaft member 603 functions as the axis of rotation for the lid portion 602. Therefore, the lid portion 602 is rotatable around the shaft member 603 as its axis of rotation.

[0107] One end of the lid 602 is connected to the shaft member 603, and the other end of the lid 602 is supported by the sample holder 50. In the example shown in Figure 24, the other end of the lid 602 is supported by the second member 56b of the sample holder 50. Therefore, by tilting the sample stage 58 using the tilting mechanism 54, the lid 602 rotates around the shaft member 603 as its axis of rotation and moves in the vertical direction.

[0108] In the example shown in Figure 24, the height of the container 2 is variable, similar to the example shown in Figure 21, and therefore the same effects and advantages as in the example shown in Figure 21 can be achieved. The shield 60 may also have a drive unit for moving the lid 602.

[0109] 5.9. Ninth Variation Figure 25 is a schematic perspective view showing modified examples of the sample holder 50 and shield 60. Figure 25 illustrates the shield 60 in the first position P1, the shield 60 moving between the first position P1 and the second position P2, and the shield 60 in the second position P2.

[0110] The sample processing apparatus 100 has a moving mechanism 620 for moving the shield 60. The moving mechanism 620 is equipped with two rails 622. The moving mechanism 620 is equipped with a drive unit, which moves the shield 60 using power such as a motor, although this unit is not shown in the figure.

[0111] Two rails 622 support the shield 60 so that it can move. The shield 60 slides horizontally on the two rails 622. The shield 60 moves between a first position P1 and a second position P2.

[0112] The first position P1 is a position where the shield 60 does not overlap with the sample holder 50. When the shield 60 is in the first position P1, the sample S is not contained in the container 2 and is exposed, so the sample S can be irradiated with an electron beam and SEM observation, EBSD measurement, and EDS measurement can be performed.

[0113] The second position P2 is the position where the shield 60 overlaps with the sample holder 50. Shield 60 When the shield 60 is in the second position P2, the sample holder 50 and the shield 60 constitute the container 2. That is, the sample S is housed in the container 2. Therefore, when the shield 60 is in the second position P2, the sample S can be laser processed.

[0114] In the example shown in Figure 25, the shield 60 can be moved to switch between a state in which the sample S is contained in the container 2 and a state in which the sample S is exposed. Therefore, for example, the observation position and the processing position can be in the same location. That is, without moving the sample holder 50 on the sample stage 40, observation and analysis of the sample S and laser processing of the sample S can be performed in the same location.

[0115] 5.10. Tenth variation Figure 26 is a schematic perspective view showing modified examples of the sample holder 50 and shield 60. Figure 26 illustrates the state in which the shield 60 is open and the sample S is exposed, the state in which the shield 60 is being opened and closed, and the state in which the shield 60 is closed and the sample S is contained in the container 2.

[0116] The shield 60 comprises a lid 630 and a hinge 632 that supports the lid 630 so that it can be opened and closed. The shield 60 further includes a drive unit (not shown) that opens and closes the lid 630 using power such as a motor. The lid 630 is connected to the sample holder 50 via the hinge 632. The lid 630 defines the four sides of the container 2 and the top surface of the container 2. The lid 630 is provided with a window that transmits laser light.

[0117] The sample holder 50 is provided with a bottom portion 500 that defines the bottom surface of the container 2. By closing the lid portion 630, the lid portion 630 and the bottom portion 500 constitute the container 2 that contains the sample S.

[0118] In the example shown in Figure 26, for example, by opening and closing the lid 630, it is possible to switch between a state in which the sample S is contained in the container 2 and a state in which the sample S is exposed. Therefore, for example, the observation position and the processing position can be in the same location. That is, without moving the sample holder 50 on the sample stage 40, observation and analysis of the sample S and laser processing of the sample S can be performed in the same position.

[0119] 5.11. Eleventh Variation In the container 2 shown in Figure 5 above, the sample S is surrounded on all four sides by six surfaces, but the container 2 does not have to surround the sample S on all four sides. For example, the container 2 may surround the sample S with five surfaces, leaving one surface open. Alternatively, the container 2 may be dome-shaped, for example, a hemispherical or hemispherical-like convex structure.

[0120] 5.12. Twelfth Variation In the embodiments described above, the case where the observation beam is an electron beam and the processing beam is laser light was explained, but the observation beam is not limited to an electron beam. For example, a focused ion beam, a plasma focused ion beam, etc. may be used as the observation beam. Also, for example, a focused ion beam, a plasma focused ion beam, a broad ion beam with a diameter of several mm, etc. may be used as the processing beam. Furthermore, for example, a focused ion beam may be used as both the observation beam and the processing beam. In other words, the observation beam and the processing beam may be the same.

[0121] The embodiments and modifications described above are merely examples and are not limiting. For example, each embodiment and each modification can be combined as appropriate.

[0122] The present invention is not limited to the embodiments described above, and various further modifications are possible. For example, the present invention includes configurations that are substantially identical to those described in the embodiments. A substantially identical configuration is, for example, a configuration that has the same function, method, and result, or a configuration that has the same purpose and effect. The present invention also includes configurations that replace non-essential parts of the configurations described in the embodiments. The present invention also includes configurations that produce the same effects or achieve the same purpose as the configurations described in the embodiments. Furthermore, the present invention includes configurations that add known technology to the configurations described in the embodiments. [Explanation of symbols]

[0123] 2...Container, 10...Housing, 12...Sample chamber, 14...Door, 16a...Connection port, 16b...Connection port, 16c...Connection port, 20...SEM tube, 22...Objective lens, 30...Laser device, 40...Sample stage, 50...Sample holder, 52...Base, 54...Tilting mechanism, 56a...First component, 56b...Second component, 58...Sample stage, 59...Protrusion, 60...Shield, 62a...Third component, 62b...Fourth component, 62 c...5th member, 62d...6th member, 64...window section, 66...recess, 70...EBSD detector, 80...EDS detector, 90...support member, 100...sample processing device, 500...bottom, 540...base, 542...protrusion, 544...connection section, 602...lid, 603...shaft member, 604...top surface, 606...side section, 610...movable wall, 620...moving mechanism, 622...rail, 630...lid section, 632...hinge section

Claims

1. A sample processing apparatus that processes a sample placed in a sample chamber by irradiating it with a processing beam, A processing beam source that irradiates the sample with the processing beam, A sample holder for holding the aforementioned sample, A sample stage on which the aforementioned sample holder is attached, A shield placed in the aforementioned sample chamber, Includes, The sample holder and the shield constitute a container for housing the sample. A sample processing apparatus comprising a container provided with a window portion for guiding the processing beam into the container.

2. In claim 1, The observation beam source includes an observation beam source for irradiating the sample with an observation beam. The sample stage moves the sample holder between an observation position where the observation beam is irradiated onto the sample and a processing position where the processing beam is irradiated onto the sample. A sample processing apparatus, wherein the sample is placed in the container by moving the sample holder to the processing position.

3. In claim 2, The shield is fixed to the processing position in the sample processing apparatus.

4. In claim 1, The sample holder is provided with a protrusion, A sample processing apparatus, wherein the shield is provided with a recess into which the protrusion is inserted.

5. In claim 4, The sample holder has a sample stage on which the sample is placed, The aforementioned protrusion surrounds the sample stage, which is part of the sample processing apparatus.

6. In claim 4, A sample processing apparatus in which, when the sample holder and the shield constitute the container, the protrusion and the recess do not come into contact.

7. In claim 1, The shield is provided with a protrusion, A sample processing apparatus, wherein the sample holder is provided with a recess into which the protrusion is inserted.

8. In claim 1, The sample holder has a tilting mechanism for tilting the sample, and is a sample processing apparatus.

9. In claim 8, A sample processing apparatus in which the height of the container is variable.

10. In claim 9, The shield has a lid portion that forms the upper part of the container, The aforementioned lid is a movable sample processing device.

11. In any one of claims 1 to 10, The aforementioned processing beam is laser light, The aforementioned window portion is a sample processing device through which the laser light is transmitted.

12. In claim 11, The aforementioned window section is a replaceable sample processing device.

13. In any one of claims 1 to 10, The window portion is a through-hole that penetrates the container, in the sample processing apparatus.

14. The process involves attaching a sample holder to the sample stage located in the sample chamber of the sample processing apparatus, A step of observing the sample using an observation beam and determining the processing area of ​​the sample, The steps include: placing the sample in a container comprising a shield and a sample holder; The process involves guiding a processing beam into the container through a window provided in the container, and processing the sample contained in the container with the processing beam. A sample processing method, including the following.

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