Organic light-emitting display device and its electronic apparatus

Abstract

This invention provides an organic light-emitting display device and a method for manufacturing the same, which improve not only the vividness of the display's colors but also its reliability and lifespan by having high lateral resistance and preventing lateral current from flowing into the pixels. [Solution] This specification discloses an organic light-emitting display device and a method for manufacturing the same, and an electronic device thereof, comprising a first electrode, a pixel-defining layer disposed on the first electrode and exposing a portion of the first electrode through an opening, an organic material layer disposed in the opening of the pixel-defining layer, and a second electrode disposed on the organic material layer. In this case, the pixel-defining layer comprises a halftone layer composed of a photosensitive composition, a trench formed in the halftone layer, and a fulltone layer protruding from the halftone layer.

Description

[Technical Field]

[0001] This specification relates to an organic light-emitting display device and its electronic apparatus, which include a pixel-defining layer manufactured using a photosensitive composition. [Background technology]

[0002] Plane displays widely utilize liquid crystal displays (LCDs) and organic light-emitting displays (OLEDs). Of these, organic light-emitting displays offer advantages such as low power consumption, fast response speed, high color reproduction, high brightness, and wide viewing angle.

[0003] In the case of organic light-emitting devices, polarizing films are used to block the light that is incident on the panel and reflected from it. However, polarizing films have the disadvantage of being unsuitable for use in flexible devices because they lack sufficient bending properties.

[0004] To solve the aforementioned problem, methods have been proposed that involve forming an inorganic film on the upper substrate to block light, in addition to using a color filter and black matrix. However, these methods have limitations in obtaining the desired level of anti-reflective effect, and have not yet provided a concrete method for replacing polarizing films.

[0005] On the other hand, color patterns are used not only as red, green, and blue color filters in liquid crystal displays, but also as pixel definition layers that distinguish each pixel (red, green, and blue) in organic light-emitting displays.

[0006] During the manufacturing of the pixel definition layer, various types of organic pigments, as well as carbon black and inorganic pigments, are used as colorants. These pigment dispersions are mixed with other compositions to form a pattern. In this case, before the organic light-emitting layer is deposited, a photolithography step is added to support the metal mask for deposition, and then the deposition process proceeds.

[0007] Organic light-emitting displays, which consist of a pixel definition layer, can achieve more vivid colors. However, during display operation, lateral current flows into the pixels through the pixel definition layer, which leads to a problem of reduced color reproduction, reliability, and lifespan of the organic light-emitting display. [Overview of the project] [Problems that the invention aims to solve]

[0008] This embodiment provides an organic light-emitting display device and a method for manufacturing the same, which improve not only the vividness of the display's colors but also its reliability and lifespan by having high lateral resistance and preventing lateral current flowing into the pixels.

[0009] This embodiment provides an electronic device including the organic light-emitting display device described above. [Means for solving the problem]

[0010] In one embodiment, an organic light-emitting display device according to one embodiment includes a first electrode, a pixel-defining layer disposed on the first electrode and exposing a portion of the first electrode through an opening, an organic material layer disposed at the opening of the pixel-defining layer, and a second electrode disposed on the organic material layer. In this case, the pixel-defining layer includes a halftone layer composed of a photosensitive composition, a trench formed in the halftone layer, and a fulltone layer protruding from the halftone layer.

[0011] In another embodiment, a method for manufacturing an organic light-emitting display device according to another embodiment includes the steps of preparing a first electrode on a substrate, forming a pixel definition layer on the first electrode in which a portion of the first electrode is exposed through an opening, forming an organic layer disposed at the opening of the pixel definition layer, and forming a second electrode disposed on the organic layer.

[0012] The step of forming the pixel definition layer involves exposing the photosensitive composition coated on the first electrode to a photomask that includes a first section with 0% transmittance, a second section with 5% to 20% transmittance, a third section with 25% to 50% transmittance, and a fourth section with 100% transmittance, thereby forming trenches, a halftone layer, and a fulltone layer, respectively.

[0013] In another embodiment, an electronic device according to yet another embodiment includes the aforementioned organic light-emitting display device and a control unit for driving the organic light-emitting display device. [Effects of the Invention]

[0014] The organic light-emitting display device, its manufacturing method, and its electronic device according to the present invention increase lateral resistance and prevent lateral current from flowing into the pixels, thereby improving not only the vividness of the colors but also the reliability and lifespan of the display. [Brief explanation of the drawing]

[0015] [Figure 1] This is a partial plan view of an organic light-emitting device according to one embodiment. [Figure 2] This is a cross-sectional view of an organic light-emitting display device according to one embodiment. [Figure 3] This is a cross-sectional view of the pixel definition layer along line A-A' in Figure 1. [Figure 4a] This is a cross-sectional view of an example of an organic layer. [Figure 4b] Figures 4a and 3b are cross-sectional views of examples of organic layers. [Figure 5] This shows the relationship between the taper angle and side current of each layer in the pixel definition layer of an organic light-emitting display device according to one embodiment. [Figure 6] This shows the relationship between the taper angle and side current of each layer in the pixel definition layer of an organic light-emitting display device according to one embodiment. [Figure 7] This shows the relationship between the taper angle and side current of each layer in the pixel definition layer of an organic light-emitting display device according to one embodiment. [Figure 8] This is a flowchart of a method for manufacturing an organic light-emitting display device according to another embodiment. [Figure 9a] Figure 8 shows the step in the manufacturing method for forming the pixel definition layer, specifically the process of forming the pixel definition layer using a multitone photomask. [Figure 9b] Figure 8 shows the step in the manufacturing method for forming the pixel definition layer, specifically the process of forming the pixel definition layer using a multitone photomask. [Modes for carrying out the invention]

[0016] Hereinafter, some embodiments of the present invention will be described in detail with reference to illustrative drawings. In assigning reference numerals to the components in each drawing, the same reference numerals may be used for the same components as far as possible, even if they are shown in other drawings.

[0017] In describing the present invention, if a specific description of a relevant known configuration or function is deemed to obscure the gist of this disclosure, such detailed description will be omitted. Where "includes," "has," "consists of," etc., as used herein, other parts may be added unless "only" is used. When a component is expressed singly, it may include multiple components unless otherwise explicitly stated.

[0018] Furthermore, when describing the components of the present invention, terms such as first, second, A, B, (a), (b), etc., may be used. These terms are used solely to distinguish a component from other components, and do not limit the nature, order, sequence, or number of the component.

[0019] In descriptions of the positional relationships of components, when it is stated that two or more components are “linked,” “joined,” or “connected,” it should be understood that while two or more components can be directly “linked,” “joined,” or “connected,” it is also possible for two or more components to be further “interposed” with other components before being “linked,” “joined,” or “connected.” Here, the other components may be included in one or more of the two or more components that are “linked,” “joined,” or “connected” to each other.

[0020] Furthermore, when we say that a component such as a layer, membrane, region, or plate is "on top of" or "above" another component, this should be understood to include not only cases where it is "directly above" another component, but also cases where yet another component exists in between. Conversely, when we say that one component is "directly above" another, this should be understood to mean that there is no yet another component in between.

[0021] In descriptions of temporal relationships concerning constituent elements, operating methods, or manufacturing methods, when temporal order or sequential relationships are described using phrases such as "after," "following," "next," or "before," unless "immediately" or "directly" is used, this can include cases that are not continuous.

[0022] On the other hand, if numerical values ​​or corresponding information relating to components are mentioned, even without further explicit mention, these numerical values ​​or corresponding information may be interpreted as including a range of errors that can occur due to various factors (e.g., process factors, internal or external shocks, noise, etc.).

[0023] The terms used in this specification and the appended claims, unless otherwise specified, have the following meanings, without departing from the spirit of the invention.

[0024] As used in this application, the terms "halo" or "halogen" include fluorine (F), chlorine (Cl), bromine (Br), and iodine (I), unless otherwise specified.

[0025] As used in this application, the terms "alkyl" or "alkyl group" refer to a radical of a saturated aliphatic functional group having 1 to 60 carbon atoms linked by a single bond, including linear alkyl groups, branched alkyl groups, cycloalkyl (alicyclic) groups, alkyl-substituted cycloalkyl groups, and cycloalkyl-substituted alkyl groups, unless otherwise specified.

[0026] As used in this application, the terms "haloalkyl group" or "halogen alkyl group" mean a halogen-substituted alkyl group unless otherwise specified.

[0027] As used in this application, the terms "alkenyl" or "alkynyl" each have a double or triple bond, include a linear or side-chain linear group, and have 2 to 60 carbon atoms, unless otherwise specified.

[0028] As used in this application, the term "cycloalkyl" means, but is not limited to, an alkyl group forming a ring having 3 to 60 carbon atoms, unless otherwise specified.

[0029] As used in this application, the terms "alkoxy group" or "alkyloxy group" refer to an alkyl group to which an oxygen radical is bonded, and unless otherwise specified, have 1 to 60 carbon atoms, but are not limited thereto.

[0030] As used in this application, the terms "alkenoxyl group," "alkenoxy group," "alkenyloxyl group," or "alkenyloxy group" refer to an alkenyl group to which an oxygen radical is attached, and unless otherwise specified, have 2 to 60 carbon atoms, but are not limited thereto.

[0031] As used in this application, the terms "aryl group" and "arylene group" refer to, but are not limited to, groups having 6 to 60 carbon atoms, respectively, unless otherwise specified. In this specification, aryl groups and arylene groups include monocyclic compounds, ring aggregates, and condensed polycyclic compounds. For example, aryl groups may include phenyl groups, monovalent functional groups of biphenyl, monovalent functional groups of naphthalene, fluorenyl groups, and substituted fluorenyl groups, and arylene groups may include fluorenylene groups and substituted fluorenylene groups.

[0032] As used in this application, the term "ring assemblies" means that two or more ring systems (monocyclic or fused ring systems) are directly linked to each other via single or double bonds, and the number of such direct bonds between rings is one less than the total number of ring systems contained in the compound. Ring assemblies can consist of identical or distinct ring systems directly linked to each other via single or double bonds.

[0033] In this application, the aryl group includes ring assemblies, and therefore includes biphenyl and terphenyl, in which a single aromatic ring, such as a benzene ring, is linked by a single bond. Furthermore, the aryl group also includes compounds in which an aromatic ring system, fused with an aromatic monoring, is linked by a single bond, and therefore includes, for example, a compound in which a benzene ring, which is an aromatic monoring, and fluorene, which is an aromatic ring system, are linked by a single bond.

[0034] As used in this application, the term "fused polycyclic system" refers to a fused ring form that shares at least two atoms, and includes forms in which two or more hydrocarbon ring systems are fused, and forms in which at least one heterocyclic system containing at least one heteroatom is fused. Such fused ring systems may be aromatic rings, heteroaromatic rings, aliphatic rings, or combinations thereof. For example, in the case of an aryl group, it may be a naphthalenyl group, a phenantrenyl group, a fluorenyl group, etc., but is not limited thereto.

[0035] The term "spiro compound" as used in this application refers to a compound having a "spiro bond," which is a linkage formed by two rings sharing only one atom. In this case, the atom shared by the two rings is called a "spiro atom," and depending on the number of spiro atoms contained in a compound, these are called "monospiro-," "dispiro-," and "trispiro-" compounds, respectively.

[0036] In this application, the terms "fluorenyl group," "fluorenylene group," and "fluorentryyl group" refer to monovalent, divalent, or trivalent functional groups in the following structures, respectively, where R, R′, R″, and R′″ are all hydrogen atoms, unless otherwise specified. "Substituted fluorenyl group," "substituted fluorenylene group," or "substituted fluorentryyl group" means that at least one of the substituents R, R′, R″, and R′″ is a substituent other than hydrogen, and includes cases where R and R′ are bonded to each other to form a spiro compound with the carbon atom to which they are bonded. In this specification, regardless of valency such as monovalent, divalent, or trivalent, fluorenyl groups, fluorenylene groups, and fluorentryyl groups may be collectively referred to as fluorene groups. JPEG2026089052000002.jpg1939

[0037] Furthermore, R, R′, R″, and R′″ can each independently be an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, or a heterocyclic group having 2 to 30 carbon atoms. For example, the aryl group can be phenyl, biphenyl, naphthalene, anthracene, or phenanthrene, and the heterocyclic group can be pyrrole, furan, thiophene, pyrazole, imidazole, triazole, pyridine, pyrimidine, pyridazine, pyrazine, triazine, indole, benzofuran, quinazoline, or quinoxaline. For example, the substituted fluorenyl group and fluorenylene group can be the monovalent or divalent functional groups of 9,9-dimethylfluorene, 9,9-diphenylfluorene, and 9,9'-spirobi[9H-fluorene], respectively.

[0038] As used in this application, the term "heterocyclic group" includes not only aromatic rings such as "heteroaryl groups" or "heteroarylene groups," but also non-aromatic rings, and unless otherwise specified, means, but is not limited to, rings having 2 to 60 carbon atoms, each containing one or more heteroatoms. As used in this application, the term "heteroatom" refers to N, O, S, P, or Si unless otherwise specified, and heterocyclic group means monocyclic formulas, ring aggregates, fused ring systems, spiro compounds, etc., containing heteroatoms.

[0039] For example, "heterocyclic groups" can include compounds that contain heteroatom groups such as SO2, P=O, etc., instead of the carbon atoms forming the ring, as shown in the following compounds. JPEG2026089052000003.jpg2235

[0040] As used in this application, the term "ring" includes monocyclic and polycyclic rings, as well as hydrocarbon rings, heterocyclic rings containing at least one heteroatom, aromatic rings, and non-aromatic rings.

[0041] As used in this application, the term "polycyclic" includes ring assemblies such as biphenyl and terphenyl, fused ring systems and spiro compounds, and includes not only aromatic but also non-aromatic compounds, and includes not only hydrocarbon rings but also heterocycles containing at least one heteroatom.

[0042] As used in this application, the term "aliphatic ring group" refers to cyclic hydrocarbons excluding aromatic hydrocarbons, and includes monocyclic compounds, ring aggregates, condensed polycyclic systems, spiro compounds, etc. Unless otherwise specified, it refers to rings with 3 to 60 carbon atoms, but is not limited to these. For example, even when benzene, which is an aromatic ring, is fused with cyclohexane, which is a non-aromatic ring, it still falls under the category of an aliphatic ring.

[0043] Also, when prefixes are named continuously, it means that substituents are listed in the order described above. For example, in the case of an arylalkoxy group, it means an alkoxy group substituted with an aryl group; in the case of an alkoxycarbonyl group, it means a carbonyl group substituted with an alkoxy group; and in the case of an arylcarbonylalkenyl group, it means an alkenyl group substituted with an arylcarbonyl group, where the arylcarbonyl group is a carbonyl group substituted with an aryl group.

[0044] Also, unless otherwise explicitly stated, "substituted" in the term "substituted or unsubstituted" used in this application means substituted with deuterium, halogen, an amino group, a nitrile group, a nitro group, a C1 - C 30 alkyl group, a C1 - C 30 alkoxy group, a C1 - C 30 alkylamine group, a C1 - C 30 alkylthiophene group, a C6 - C 30 arylthiophene group, a C2 - C 30 alkenyl group, a C2 - C 30 alkynyl group, a C3 - C 30 cycloalkyl group, a C6 - C 30 aryl group, a C6 - C aryl group substituted with deuterium, a C8 - C 30 aryl group, a C8 - C 30 arylalkenyl group, a silane group, a boron group, a germanium group, and one or more substituents selected from the group consisting of a C2 - C 30 heterocyclic group containing at least one heteroatom selected from the group consisting of O, N, S, Si, and P, and is not limited to these substituents.

[0045] In this application, the "functional group names" corresponding to aryl groups, arylene groups, heterocyclic groups, etc., which are exemplified as examples of each symbol and its substituents, can be described as "names of functional groups that reflect their valency," or they can be described as "names of the parent compound." For example, in the case of "phenanthrene," which is a type of aryl group, the monovalent "group" can be described as "phenanthryl(group)," and the divalent group as "phenanthrylene(group)," etc., distinguishing the names of the groups by their valency, but they can also be described as "phenanthrene," which is the name of the parent compound, regardless of the valency.

[0046] Similarly, in the case of pyrimidines, regardless of valency, they can be described as "pyrimidine," or they can be described using the name of the group corresponding to the valency, such as pyrimidinyl (group) for monovalent pyrimidinyl (group) or pyrimidinylene (group) for divalent pyrimidinyl (group). Therefore, when describing the type of substituent in this application using the name of the parent compound, it can mean an n-valent "group" formed by the elimination of a hydrogen atom bonded to the carbon atom and / or heteroatom of the parent compound.

[0047] In this specification, when describing compound names and substituent names, numbers or letters indicating position may be omitted. For example, pyrido[4,3-d]pyrimidine can be written as pyridopyrimidine, benzoflo[2,3-d]pyrimidine as benzoflopyrimidine, and 9,9-dimethyl-9H-fluorene as dimethylfluorene. Therefore, benzo[g]quinoxaline and benzo[f]quinoxaline can all be written as benzoquinoxaline.

[0048] Furthermore, unless otherwise explicitly stated, the chemical formulas used in this application shall be applied in the same manner as the definition of substituents by exponential definition in the following chemical formulas. JPEG2026089052000004.jpg2119

[0049] Here, if a is an integer of 0, the substituent R 1This means that it is not present; that is, if a is 0, it means that all the carbon atoms forming the benzene ring are bonded to hydrogen atoms, in which case the indication of hydrogen atoms bonded to carbon atoms can be omitted, and the chemical formula or compound can be written. Also, if a is an integer of 1, one substituent R 1 It bonds to any of the carbons forming the benzene ring, and when a is an integer of 2 or 3, for example, it can bond as follows, and when a is an integer of 4 to 6, it bonds to the carbons of the benzene ring in a similar manner, and when a is an integer of 2 or more, R 1 They may be the same as each other or different. JPEG2026089052000005.jpg2645

[0050] In this application, unless otherwise stated, forming a ring means that adjacent groups bond to each other to form a monoring or a plurality of condensed rings, and the monoring and the plurality of condensed rings formed may include hydrocarbon rings as well as heterorings containing at least one heteroatom, and may include aromatic rings and non-aromatic rings.

[0051] In this specification, unless otherwise specified, when a fused ring is indicated, the number in "number-fused ring" indicates the number of rings being fused. For example, a form in which three rings are fused together, such as anthracene, phenanthrene, and benzoquinazoline, can be written as a 3-fused ring.

[0052] On the other hand, the term "bridged bicyclic compound" as used in this application refers to a compound in which two rings share three or more atoms to form a ring, unless otherwise specified. In this case, the shared atoms may include carbon or heteroatoms.

[0053] In this application, the term "organic electrical element" may mean one or more components between an anode and a cathode, or it may mean an organic light-emitting diode or organic light-emitting display device that includes an anode and a cathode and one or more components located between them.

[0054] Furthermore, in some cases, the term "display device" in this application may mean an organic electrical element, an organic light-emitting diode, and a panel containing the same, or an electronic device including a panel and a circuit. Here, for example, the electronic device may include, but is not limited to, lighting devices, solar cells, mobile or portable devices (e.g., smartphones, tablets, PDAs, electronic dictionaries, PMPs, etc.), navigation terminals, game consoles, various televisions, various computer monitors, etc., and can be any form of device as long as it includes components (one or more).

[0055] Embodiments of the present invention will be described in detail below. However, these are presented as examples only and do not limit the present invention; the present invention is defined only within the scope of the claims described later.

[0056] Figure 1 is a partial plan view of an organic light-emitting display device according to one embodiment.

[0057] Referring to Figure 1, an organic light-emitting display device 20 according to one embodiment includes different organic light-emitting elements SP1, SP2, and SP3 arranged on a substrate 1. These different organic light-emitting elements SP1, SP2, and SP3 may be RGB subpixels, and may constitute a single pixel.

[0058] Organic light-emitting elements SP1, SP2, and SP3, which are different from each other, may have different areas, or they may have the same area.

[0059] The organic light-emitting display device 20 may include a pixel definition layer or pixel definition film, or bank (hereinafter referred to as the pixel definition layer 6) in which an organic layer is placed between two electrodes, and a portion of one of the electrodes is exposed through an aperture 6d. As mentioned above, the organic light-emitting elements SP1, SP2, and SP3, which are different from each other, may have different areas because the area of ​​the aperture 6d of the pixel definition layer 6 is different.

[0060] The pixel definition layer 6, as described later, contains a photosensitive composition and includes a halftone layer 6b, a trench 6a formed in the halftone layer 6b, and a fulltone layer 6c protruding from the halftone layer 6a. The trench 6a is arranged around the organic light-emitting elements SP1, SP2, and SP3. The fulltone layer 6c is arranged only on a portion of the organic light-emitting elements. The halftone layer 6b is arranged over the entire substrate 1, excluding the halftone layer 6b and the fulltone layer 6c.

[0061] In one embodiment, the organic light-emitting display device 20 has trenches 6a in the pixel definition layer 6, and the trenches 6a have high lateral resistance, which prevents lateral current from flowing into the organic light-emitting elements SP1, SP2, and SP3. This not only makes the display colors vivid but also improves reliability and lifespan.

[0062] Furthermore, in one embodiment of the organic light-emitting display device 20, a full-tone layer 6c is placed on the pixel definition layer 6, which functions as a spacer against pressure applied to other components placed on the upper surface, such as a touchpad, thereby preventing damage to the display.

[0063] Figure 2 is a cross-sectional view of an organic light-emitting display device according to one embodiment. Figure 3 is a cross-sectional view of line AA' of the pixel definition layer in Figure 1.

[0064] Referring to Figures 2 and 3, an organic light-emitting display device will be described. An organic light-emitting display device 20 according to one embodiment includes a substrate 1, a TFT layer 2 on the substrate, a planarization layer 3 on the TFT layer 2, a first electrode or pixel electrode 4 on the planarization layer 3, an organic material layer 5 on the first electrode, and a second electrode or counter electrode 7 disposed on the organic material layer 5.

[0065] Furthermore, an organic light-emitting display device 20 according to one embodiment may include a sealing layer 8 disposed on the second electrode 7, a touch panel 9 disposed on the sealing layer 8, a color filter 10 disposed on the touch panel 9, an OCA layer 11 disposed on the color filter 10, and a cover glass layer 12 disposed on the OCA layer.

[0066] Figures 4a and 4b are cross-sectional views of an example of an organic layer.

[0067] The organic layer 5 may be configured as a single layer 5 between the first electrode 4 and the second electrode 7, as shown in Figure 4a, or as a tandem structure including a first organic layer 5A, a charge generation layer 5B on the first organic layer 5A, and a second organic layer 5C on the charge generation layer 5B, as shown in Figure 4b.

[0068] The pixel definition layer 6 may be placed on the first electrode 4.

[0069] The pixel definition layer 6 includes a halftone layer 6b and a fulltone layer 6c, and a trench 6a may be placed in the halftone layer 6b.

[0070] One or more trenches 6a may be formed in the halftone layer 6b adjacent to the organic layer 5.

[0071] The trenches 6a formed in the halftone layer 6b increase the lateral resistance, thereby preventing lateral current from flowing into the organic material layer 5 through the pixel definition layer 6, and improving the color reproduction rate, lifespan, and reliability of the organic light-emitting element.

[0072] The substrate 1 may be a flexible substrate. The substrate 1 can be made from a plastic material that has excellent heat resistance and durability, such as polyimide (PI), polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polycarbonate (PC), polyarylate (PAR), polyetherimide (PEI), and polyethersulfone (PES).

[0073] However, the present invention is not limited thereto, and various flexible materials such as metallic foil or thin glass can be used. On the other hand, the substrate 1 may be a rigid substrate, in which case the substrate may be made of a glass material mainly composed of SiO2.

[0074] In the case of a bottom-emission type, where the image is projected in the direction of the substrate, the substrate must be made of a transparent material. However, in the case of a top-emission type, where the image is projected in the opposite direction of the substrate 1, the substrate 1 does not necessarily have to be made of a transparent material. In this case, the substrate can be made of metal. When the substrate is made of metal, the substrate 1 may include, but is not limited to, one or more materials selected from the group consisting of carbon, iron, chromium, manganese, nickel, titanium, molybdenum, and stainless steel (SUS).

[0075] A TFT layer 2 may be arranged on the substrate 1. The term TFT layer 2 as used herein refers to a thin-film transistor (TFT) array for driving an organic light-emitting element, and signifies the driving portion for displaying an image. Figure 1 shows only the organic light-emitting element and the driving thin-film transistors for driving the organic light-emitting element; however, this is for illustrative purposes only, and it will be apparent to those skilled in the art that the present invention is not limited to what is shown and may further include a plurality of thin-film transistors, storage capacitors, and various types of wiring.

[0076] The TFT layer 2 may be covered and protected by a planarization layer 3. The planarization layer 3 may include an inorganic insulating film and / or an organic insulating film. Examples of inorganic insulating films that can be used for the planarization layer 3 include silicon oxide (SiO2) and silicon nitride (SiN xThis may include silicon oxynitride (SiON), aluminum oxide (Al2O3), titanium oxide (TiO2), tantalum oxide (Ta2O5), hafnium oxide (HfO2), zirconium oxide (ZrO2), BST (Barium Strontium Titanate), PZT (Lead Zirconate-Titanate), etc.

[0077] Furthermore, examples of organic insulating films that can be used in the planarization layer 3 include general-purpose polymers (PMMA, PS), polymer derivatives having phenolic groups, acrylic polymers, imide polymers, aryl ether polymers, amide polymers, fluorine polymers, p-xylene polymers, vinyl alcohol polymers, and blends thereof.

[0078] On the other hand, the planarization layer 3 may have a composite laminated structure of an inorganic insulating film and an organic insulating film. Furthermore, the planarization layer 3 may contain the photosensitive composition of the present invention. Matters relating to the photosensitive composition of the present invention are the same as those described in the embodiment of the present invention described above, and are therefore omitted.

[0079] An organic layer 5 may be formed on top of the planarization layer 3. The organic layer 5 may include a first electrode 4 formed on the planarization layer, a second electrode or common electrode 7 positioned opposite it, and the organic layer 5 interposed between them. When a voltage is applied between the second electrode 4 and the second electrode 7, the organic layer 5 can emit light. The organic layer 5 can emit red light, green light, blue light, or white light, etc. When the organic layer 5 emits white light, the organic light-emitting display device 23 may further include blue, green, and red color filters to represent a color image, or when the organic layer 5 emits red, green, or blue light, to improve color purity and light efficiency.

[0080] The organic light-emitting display device 20 can be classified into types such as bottom emission type, top emission type, and dual emission type, depending on the direction of light emission. In the back emission type organic light-emitting display device 20, the first electrode 4 is provided as a light-transmitting electrode, and the second electrode 7 is provided as a reflective electrode. In the front emission type organic light-emitting display device 20, the first electrode 4 is provided as a second electrode 7 which is a reflective electrode, and the second electrode 7 is provided as a semi-transparent electrode. In this invention, the front emission type organic light-emitting display device 20, in which light is emitted in the direction of the sealing layer 8, will be described as the standard.

[0081] The first electrode 4 may be a reflective electrode. The first electrode 4 may include a laminated structure of a reflective layer and a transparent or translucent electrode layer with a high work function. The reflective layer may include Ag, Mg, Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, or alloys thereof. The transparent or translucent electrode layer may include at least one material selected from transparent conductive oxide materials such as indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium oxide (In2O3), indium gallium oxide (IGO), and aluminum zinc oxide (AZO).

[0082] The first electrode can be formed by patterning it in an island configuration corresponding to each of the organic light-emitting elements SP1, SP2, and SP3.

[0083] Furthermore, the first electrode 4 can function as an anode electrode.

[0084] On the other hand, a pixel definition layer 6 may be placed on the first electrode 4, which includes a predetermined opening 6d that covers the edge of the pixel electrode and exposes the central part of the first electrode 4. An organic material layer 5, which includes an organic light-emitting layer that emits light, may be placed on the region defined by the opening 6d. The region on which the organic material layer 5 is placed may be defined as a light-emitting region.

[0085] On the other hand, when light-emitting regions are formed within the aperture 6d of the pixel definition layer 6, regions protruding from the pixel definition layer 6 are arranged between the light-emitting regions. Since an organic light-emitting layer is not formed in these protruding regions, they can be defined as non-light-emitting regions. The pixel definition layer 6 may contain the photosensitive composition of the present invention.

[0086] A composition containing a colorant according to one embodiment may be used to produce a red pattern, a green pattern, a blue pattern, or a black matrix, or a pixel definition layer 6.

[0087] The black pixel definition layer 6 according to one embodiment may further include an organic black pigment or black dye as an additional colorant in addition to the colorant contained in the aforementioned colorant. For example, the organic pigment can be used alone, or the organic pigment can be used in combination with the colorant. In this case, because a colorant with insufficient light-shielding properties is mixed in, even if the amount of colorant increases relatively, there is an advantage that the strength of the film (layer) or adhesion to the substrate does not decrease. The pixel definition layer 6 according to one embodiment of the present invention may include a black pigment or black dye as an additional colorant instead of the colorant contained in the aforementioned colorant.

[0088] The following provides a detailed explanation of each component.

[0089] I. Pixel Definition Layer The pixel definition layer 6 of the present invention includes a halftone layer 6b and a fulltone layer 6c, which are composed of a photosensitive composition, and a trench 6a may be placed in the halftone layer 6b.

[0090] The pixel definition layer 6 has high lateral resistance due to the presence of trenches 6a, which prevents lateral current from flowing into the pixels. Therefore, when applied to a display, this can result in sharper colors and improved display lifespan and reliability.

[0091] Figure 3 shows the taper angle of the full tone layer 6c (A) and the taper angle of the trench 6a (B).

[0092] The taper angle A of trench 6a may be, but is not limited to, 50° to 80°, 60° to 70°, or 63° to 67°.

[0093] Figures 5 to 7 show the relationship between the taper angle of each layer in the pixel definition layer of an organic light-emitting display device according to one embodiment and the side current.

[0094] Referring to Figure 5, the trench 6a of the pixel definition layer 6 can improve the color reproduction accuracy and lifespan of the display by efficiently preventing lateral current flowing into the organic light-emitting elements SP1, SP2, and SP3, regardless of the taper angle A.

[0095] In particular, if the taper angle A of the trench 6a of the pixel definition layer 6 falls within the range, the color reproduction rate and lifespan of the display can be improved by efficiently preventing lateral current from flowing into the organic light-emitting elements SP1, SP2, and SP3.

[0096] On the other hand, as shown in Figure 6, if the trench 6a is absent, or if the taper angle A of the trench 6a is less than the range mentioned above, the extent to which the trench 6a is formed is substantially small, reducing the effect of preventing lateral current, and potentially lowering the color reproduction rate and lifespan of the display.

[0097] Furthermore, as shown in Figure 7, if the taper angle A of the trench 6a exceeds the aforementioned range, relatively fewer pixel definition layers 6 are formed, allowing lateral current to easily flow into the organic light-emitting elements SP1, SP2, and SP3 through the electrodes, which can reduce the color reproduction rate and lifespan of the display, as described above. In addition, the possibility of short circuits during deposition in the encapsulation process increases, which may cause panel defects.

[0098] The distance between the halftone layer 6b and the lowest edge of the trench 6a is 0.1 μm to 1.2 μm, and can be 0.3 μm to 1.0 μm.

[0099] When the gap between the halftone layer 6b and the lowest end of the trench 6a falls within the range, sufficient space exists due to the trench 6a, resulting in higher lateral resistance. This efficiently prevents lateral current from flowing into the organic light-emitting elements SP1, SP2, and SP3, thereby improving the color reproduction accuracy, lifespan, and reliability of the display.

[0100] The taper angle B of the full tone layer 6c may be, but is not limited to, 15° to 40°, 20° to 35°, or 25° to 30°.

[0101] The thickness of the halftone layer 6b may be, but is not limited to, 1.0 μm to 2.0 μm or 1.3 μm to 1.7 μm.

[0102] The thickness of the full tone layer 6c may be, but is not limited to, 0.8 μm to 1.7 μm or 1.0 μm to 1.5 μm.

[0103] The composition forming the photosensitive composition constituting the pixel definition layer 6 is as follows:

[0104] (1) Resin for patterning The patterning resin, which is a photosensitive composition constituting the pixel definition layer 6, may include an acrylic binder resin, a cardo binder resin, a polyimide resin, or a combination thereof.

[0105] The acrylic binder resin is a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and is a resin containing one or more acrylic repeating units.

[0106] The first ethylenically unsaturated monomer is an ethylenically unsaturated monomer containing at least one carboxyl group, and specific examples include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or combinations thereof. The first ethylenically unsaturated monomer may be included in an amount of 5% to 50% by weight, for example, 10% to 40% by weight, based on the total amount of the acrylic binder resin.

[0107] Examples of the second ethylenically unsaturated monomer include aromatic vinyl compounds such as styrene, α-methylstyrene, vinyltoluene, and vinylbenzyl methyl ether; unsaturated carboxylate ester compounds such as methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, benzyl (meth)acrylate, cyclohexyl (meth)acrylate, and phenyl (meth)acrylate; unsaturated carboxylate aminoalkyl ester compounds such as 2-aminoethyl (meth)acrylate and 2-dimethylaminoethyl (meth)acrylate; vinyl carboxylate ester compounds such as vinyl acetate; unsaturated carboxylate glycidyl ester compounds such as glycidyl (meth)acrylate; vinyl cyanide compounds such as (meth)acrylonitrile; and unsaturated amide compounds such as (meth)acrylamide. These can be used individually or in combination of two or more.

[0108] Specific examples of acrylic binder resins include, but are not limited to, (meth)acrylic acid / benzyl methacrylate copolymer, (meth)acrylic acid / benzyl methacrylate / styrene copolymer, (meth)acrylic acid / benzyl methacrylate / 2-hydroxyethyl methacrylate copolymer, and (meth)acrylic acid / benzyl methacrylate / styrene / 2-hydroxyethyl methacrylate copolymer. These can be used individually or in combination of two or more. The weight-average molecular weight of the acrylic binder resin can range from 3,000 g / mol to 150,000 g / mol, for example, 5,000 g / mol to 50,000 g / mol, or for example, 20,000 g / mol to 30,000 g / mol.

[0109] Cardo resins contain a repeating structure as shown in Chemical Formula 1 below. <Chemical formula 1> JPEG2026089052000006.jpg3092

[0110] In chemical formula 1, 1) R 1 and R 2 These are hydrogen; deuterium; halogens; C6~C, independently of each other. 30 The aryl group; containing at least one heteroatom from O, N, S, Si, and P (C2-C2). 30 heterocyclic group; C6~C 30 A fused ring group of an aliphatic ring and an aromatic ring; C1~C 20 alkyl groups; C2~C 20 alkenyl group; C2~C 20 Alkynyl group: C1~C 20 alkoxy group; C6~C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group, 2) R 1 and R 2 It can form rings with adjacent groups, 3) m or n are independent integers between 0 and 4. 4) A1 and A2 are independently of each other, and are either chemical formula 2 or chemical formula 3 below. <Chemical formula 2> JPEG2026089052000007.jpg1917<Chemical formula 3> JPEG2026089052000008.jpg1422 In chemical formulas 2 and 3, 4-1)* indicates a connecting part, 4-2)R 3 ~R 6 These are hydrogen; deuterium; halogens; C6~C, independently of each other. 30 The aryl group; containing at least one heteroatom from O, N, S, Si, and P (C2-C2). 30 heterocyclic group; C6~C 30 A fused ring group of an aliphatic ring and an aromatic ring; C1~C 20 alkyl groups; C2~C 20 alkenyl group; C2~C 20 Alkynyl group: C1~C 20 alkoxy group; C6~C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group, 4-3)R 3 ~R 6 It can form rings with adjacent groups, 4-4)Y 1 and Y 2 These are independently of each other, and are either chemical formula 6 or chemical formula 7 below. <Chemical formula 6> JPEG2026089052000009.jpg1318<Chemical formula 7> JPEG2026089052000010.jpg1943 In chemical formulas 6 and 7, 4-4-1)* represents the bond position, 4-4-2)R 9 is hydrogen or methyl, 4-4-3)R 10 ~R 13 These are hydrogen; deuterium; halogens; C6~C, independently of each other. 30The aryl group; containing at least one heteroatom from O, N, S, Si, and P (C2-C2). 30 heterocyclic group; C6~C 30 A fused ring group of an aliphatic ring and an aromatic ring; C1~C 20 alkyl groups; C2~C 20 alkenyl group; C2~C 20 Alkynyl group: C1~C 20 alkoxy group; C6~C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group, 4-4-4)L 1 ~L 3 These are single bonds independent of each other; fluorenylene group; C2~C 30 Alkylene; C6~C 30 Arrine; C2~C 30 heterocyclic; C1~C 30 Alkoxylenes; C2~C 30 Alkylene oxy; C6~C 30 aryloxy group; C2~C 30 It is a polyethylene oxy group, 4-4-5) q and r are independent integers between 0 and 3, where q + r = 3. 5) The ratio of chemical formula 2 to chemical formula 3 in the polymer chain of a resin containing repeating units represented by chemical formula 1 is 9:1 to 1:9. 6)X 1 This is a single bond; O; CO; SO2; CR′R″; SiR′R″; and is represented by chemical formula 4 or chemical formula 5 below. 6-1) R′ and R″ are independently hydrogen; deuterium; halogen; C6~C 30 The aryl group; containing at least one heteroatom from O, N, S, Si, and P (C2-C2). 30 heterocyclic group; C6~C 30 A fused ring group of an aliphatic ring and an aromatic ring; C1~C 20 alkyl groups; C2~C 20 alkenyl group; C2~C 20 Alkynyl group: C1~C 20 alkoxy group; C6~C 30an aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or a C1-C 20 alkoxycarbonyl group, 6-2) R′ and R″ can form a ring with adjacent groups, <Chemical Formula 4> JPEG2026089052000011.jpg1739<Chemical Formula 5> JPEG2026089052000012.jpg1422In Chemical Formulas 4 and 5, 6-3) * represents the bonding position, 6-4) R 7 ~R 8 are, independently of each other, hydrogen; deuterium; halogen; C6-C 30 aryl group; a C2-C containing at least one heteroatom of O, N, S, Si and P 30 heterocyclic group; C6-C 30 condensed ring group of an aliphatic ring and an aromatic ring; C1-C 20 alkyl group; C2-C 20 alkenyl group; C2-C 20 alkynyl group: C1-C 20 alkoxy group; C6-C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or a C1-C 20 alkoxycarbonyl group, 6-5) o and p are, independently of each other, integers from 0 to, 7) X 2 is a C6-C 30 aryl group; a C2-C containing at least one heteroatom of O, N, S, Si and P 30 heterocyclic group; C6-C 30 condensed ring group of an aliphatic ring and an aromatic ring; C1-C 20 alkyl group; C2-C 20 alkenyl group; C2-C 20 alkynyl group: C1-C 20 alkoxy group; C6-C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or a C1-C 20 alkoxycarbonyl group, 8) R′, R″, X 2 , L 1 ~L 3 , R 1 ~R 8 and R 10 ~R 13 are each a deuterium; halogen; C1 - C 30 alkyl group or C6 - C 30 aryl group substituted or unsubstituted silane group; siloxane group; boron group; germanium group; cyano group; amino group; nitro group; C1 - C 30 alkylthio group; C1 - C 30 alkoxy group; C6 - C 30 aryloxy group; C1 - C 30 alkyl group; C2 - C 30 alkenyl group; C2 - C 30 alkynyl group; C6 - C 30 aryl group; C6 - C 30 aryl group substituted with deuterium; fluorenyl group; C2 - C 30 heterocyclic group containing at least one heteroatom selected from the group consisting of O, N, S, Si and P; C3 - C 30 aliphatic ring group; C7 - C 30 arylalkyl group; C8 - C 30 arylalkenyl group; and may be further substituted with one or more substituents selected from the group consisting of these combinations, and may form a ring between adjacent substituents.

[0111] R′, R″, X 2 , L 1 ~L 3 , R 1 ~R 8 and R 10 ~R 13 When R′, R″, X 30 , L 18 are aryl groups, preferably a C6 - C

[0112] <于 R′, R″, X 2 , L 1 ~L 3, R 1 ~R 8 and R 10 ~R 13 When is a heterocyclic group, preferably C2~C 30 A heterocyclic group, more preferably C2-C 18 The heterocyclic group may be, for example, dibenzofuran, dibenzothiophene, naphthobenzothiophene, naphthobenzofuran, etc.

[0113] R', R'', R 1 ~R 8 and R 10 ~R 13 When the group is a fluorenyl group, it is preferably a 9,9-dimethyl-9H-fluorene, a 9,9-diphenyl-9H-fluorenyl group, or a 9,9'-spirobifluorene.

[0114] L 1 ~L 3 When is an arylene group, preferably C6~C 30 Arylene group, more preferably C6-C 18 The arylene group may be, for example, phenyl, biphenyl, naphthyl, terphenyl, etc.

[0115] R', R'', X 2 , R 1 ~R 8 and R 10 ~R 13 If is an alkyl group, preferably C1-C 10 It can be an alkyl group, such as methyl or t-butyl.

[0116] R', R'', X 2 , R 1 ~R 8 and R 10 ~R 13 When is an alkoxyl group, preferably C1-C 20 an alkoxyl group, more preferably C1-C 10 The alkoxy group may be, for example, methoxy, t-butoxy, etc.

[0117] R', R'', X 2 , L 1 ~L 3 , R 1 ~R 8 and R 10 ~R 13 The ring formed by the bonding of adjacent groups is C6~C 60 Aromatic ring group; fluorenyl group; C2-C containing at least one heteroatom from O, N, S, Si and P. 60 heterocyclic group; or C3~C 60 It may also be an aliphatic ring group, for example, when adjacent groups bond to each other to form an aromatic ring, preferably C6~C 20 Aromatic rings, more preferably C6-C 14 Aromatic rings, such as benzene, naphthalene, and phenanthrene, can be formed.

[0118] Cardo resins include, for example, fluorene-containing compounds such as 9,9-bis(4-oxyranylmethoxyphenyl)fluorene; anhydride compounds such as benzenetetracarboxylate dianhydride, naphthalene tetracarboxylate dianhydride, biphenyl tetracarboxylate dianhydride, benzophenone tetracarboxylate dianhydride, pyromellitic acid dianhydride, cyclobutane tetracarboxylate dianhydride, perylene tetracarboxylate dianhydride, tetrahydrofuran tetracarboxylate dianhydride, and tetrahydrophthalic acid anhydride; ethylene glycol, propylene glycol, polyethylene glycol It can be produced by mixing two or more of the following: glycol compounds such as lycolic acid; alcohol compounds such as methanol, ethanol, propanol, n-butanol, cyclohexanol, and benzyl alcohol; solvent compounds such as propylene glycol methyl ethyl acetate and N-methylpyrrolidone; phosphorus compounds such as triphenylphosphine; and amine or ammonium salt compounds such as tetramethylammonium chloride, tetraethylammonium bromide, benzyl diethylamine, triethylamine, tributylamine, and benzyltriethylammonium chloride.

[0119] The weight-average molecular weight of the cardo resin is 1,000 to 100,000 g / mol, preferably 1,000 to 50,000 g / mol, and more preferably 1,000 to 30,000 g / mol. When the weight-average molecular weight of the resin is within the above range, a good pattern can be formed without residue during the production of the light-shielding layer, and a good pattern can be obtained without loss of film thickness during development. The resin may be included in an amount of 1 to 30% by weight, more preferably 3 to 20% by weight, based on the total amount of the photosensitive resin composition. When the resin is included within the above range, excellent sensitivity, developability, and adhesion can be obtained.

[0120] Cardo resins and acrylic resins can be mixed.

[0121] The resin mixture may be included in an amount of 1 to 50% by weight, more preferably 5 to 45% by weight, relative to the total amount of the photosensitive composition. When the sum of the cardo resin and the acrylic resin falls within the above range, the pixel definition layer 6 can obtain excellent sensitivity, developability, and adhesion.

[0122] Furthermore, in polyimide resins, the solubility can be adjusted by copolymerizing the polyimide, which is the main structure of the polymer, to prevent the over-solubility of polyamic acid, a polyimide precursor, in alkaline aqueous solutions. This allows for an appropriate difference in solubility between exposed and unexposed areas during the patterning process, thereby enabling the realization of a black pixel partition layer with excellent heat resistance and pattern-forming properties.

[0123] For example, a polyimide resin may contain polyamic acid repeating units and polyimide repeating units, which may be present in a molar ratio of 5:5 to 9:1, for example, 2:8 to 8:2. When the polyamic acid repeating units and polyimide repeating units are present in a molar ratio within the above range, solubility in the solvent used in the composition can be ensured, and appropriate developability can be achieved in the patterning process. The polyimide-polyamic acid copolymers that can be used have a structure comprising the following chemical formulas 1-1, 1-2, or combinations thereof. <Chemical formula 1-1> JPEG2026089052000013.jpg1443<Chemical formula 1-2> JPEG2026089052000014.jpg1444

[0124] In chemical formulas 1-1 and 1-2, 1) * is the part where the combination is linked by a repeating unit. 2) The asterisks at the ends of the polymer are the parts where chemical formulas Q-1 to Q-10 are linked by amide or imide bonds. 3) X is given by the following chemical formula 2, 4) Y is C6~C 30 Arylene group; C2-C containing at least one heteroatom from O, N, S, Si and P 30 heterocyclic group; C6~C 30 A fused ring group of an aliphatic ring and an aromatic ring; C1~C 20 alkylene group; C1~C 20 Cycloalkylene group; C2~C 20 alkenylene group; C3~C 20 Cycloalkenylene group; C2~C 20 Alkynylene group; C3~C 20 A cycloalkylene group; chemical formula 2; and selected from the group consisting of combinations thereof, 5) Z is C6~C 30 Arylene group; C2-C containing at least one heteroatom from O, N, S, Si and P 30 heterocyclic group; C6~C30 A fused ring group of an aliphatic ring and an aromatic ring; C1~C 20 alkylene group; C1~C 20 Cycloalkylene group; C2~C 20 alkenylene group; C3~C 20 Cycloalkenylene group; C2~C 20 Alkynylene group; C3~C 20 A cycloalkylene group; chemical formula 3; and selected from the group consisting of combinations thereof, 6) m and n are integers greater than or equal to 1. <Chemical formula Q1~Q10> JPEG2026089052000015.jpg841017) The polymer ends are bonded by amide or imide bonds to a chemical formula selected from the group consisting of one or a combination thereof, selected from chemical formulas Q-1 to Q-10. <Chemical formula 2> In JPEG2026089052000016.jpg2142 Chemical formula 2, 8) L 1 The group is selected from the group consisting of single bonds, -CH2-, -CH2CH2-, -CH2OCH2-, -CH(CH3)-, -C(CH3)2-, -O-, -CH(CF3)-, -C(CF3)2-, -S-, -SO2-, Si(CH3)2-, -C6H4-, -CO-, -NHCO-, -COO-, 9)R 1 ~R 10 Two of these are linking sites with the amide group of chemical formulas 1-1 and 1-2. 10) The remaining R excluding the aforementioned connecting portion 1 ~R 10 These are hydrogen; deuterium; hydroxyl group; C6~C, independently of each other. 30 The aryl group of; C2-C containing at least one heteroatom from O, N, S, Si and P. 30 heterocyclic group; C6~C 30 A fused ring group of an aliphatic ring and an aromatic ring; C1~C 20 alkyl groups; C2~C 20 alkenyl group; C2~C 20 Alkynyl group of C1~C 20 alkoxy group; C6~C30 Aryloxy group; fluorenyl group; carbonyl group; ether group; carboxyl group; or C1~C 20 It is an alkoxycarbonyl group, 11) L 1 If it is a single bond, then the adjacent R is not the aforementioned connection site. 1 and R 10 ; and R 5 and R 6 It can form a ring, <Chemical formula 3> JPEG2026089052000017.jpg2243 In chemical formula 3, 12) L 2 The group is selected from the group consisting of single bonds, -CH2-, -CH2CH2-, -CH2OCH2-, -CH(CH3)-, -C(CH3)2-, -O-, -CH(CF3)-, -C(CF3)2-, -S-, -SO2-, Si(CH3)2-, -C6H4-, -CO-, -NHCO-, -COO-, 13)R 11 ~R 20 Two of these are linking sites with the amide group of chemical formulas 1-1 and 1-2. 14) The remaining R excluding the aforementioned connecting portion 11 ~R 20 These are hydrogen; deuterium; hydroxyl group; C6~C, independently of each other. 30 The aryl group of; C2-C containing at least one heteroatom from O, N, S, Si and P. 30 heterocyclic group; C6~C 30 A fused ring group of an aliphatic ring and an aromatic ring; C1~C 20 alkyl groups; C2~C 20 alkenyl group; C2~C 20 Alkynyl group of C1~C 20 alkoxy group; C6~C 30 Aryloxy group; fluorenyl group; carbonyl group; ether group; carboxyl group; or C1~C 20 The alkoxycarbonyl group, provided that the remaining R is removed from the aforementioned linking site. 11 ~R 20 Two of them are carboxyl groups, 15) L2 If it is a single bond, then the adjacent R is not the aforementioned connection site. 11 and R 20 and R 15 and R 16 It can form a ring.

[0125] Polyimide resins are preferably produced from diamine monomers; diacylloride monomers; or dianhydride monomers.

[0126] The diamine preferably contains one or more monomers selected from the group consisting of 2,2'-bis(3-amino-4-hydroxyphenyl)hexafluoropropane, 2,2'-bis(3-amino-4-hydroxyphenyl)propane, 3,3'-dihydroxybenzidine, and combinations thereof.

[0127] Diacylchloride preferably contains one or more monomers selected from the group consisting of 4,4'-oxybisbenzoyl chloride, 1,2-cyclobutanedicarboxylate dichloride, 1,4-cyclohexanedicarboxylate dichloride, and combinations thereof.

[0128] The dianhydride preferably contains one or more monomers selected from the group consisting of 4,4'-(hexafluoroisopropylidene)diphthalic acid dianhydride, bicyclooctanedetracarboxylate dianhydride, and combinations thereof.

[0129] The weight-average molecular weight of the resin is preferably 5,000 to 40,000 g / mol.

[0130] The polyimide resin is preferably included in an amount of 5 to 50% by weight relative to the total amount of the composition.

[0131] (2) Reactive unsaturated compounds The reactive unsaturated compounds essential for negative patterns possess ethylenically unsaturated double bonds, which, during exposure in the pattern formation process, induce sufficient polymerization, enabling the formation of patterns with excellent heat resistance, light resistance, and chemical resistance.

[0132] Specific examples of reactive unsaturated compounds include ethylene glycol diacrylate, ethylene glycol dimethacrylate, diethylene glycol diacrylate, triethylene glycol diacrylate, triethylene glycol dimethacrylate, 1,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate (Miramer M600, manufactured by Miwan Specialty Chemicals), bisphenol A epoxy acrylate, ethylene glycol monomethyl ether acrylate, trimethylolpropane triacrylate, and tripentaerythritol octaacrylate.

[0133] Examples of commercially available reactive unsaturated compounds are as follows:

[0134] Examples of difunctional esters of (meth)acrylic acid include Arronix M-210, M-240, M-6200, etc., manufactured by Toa Synthetic Chemical Industry Co., Ltd.; KAYARAD HDDA, HX-220, R-604, etc., manufactured by Nippon Kayaku Co., Ltd.; and V-260, V-312, V-335HP, etc., manufactured by Osaka Organic Chemical Industry Co., Ltd.

[0135] Examples of trifunctional esters of (meth)acrylic acid include Arronix M-309, M-400, M-405, M-450, M-7100, M-8030, M-8060 etc. manufactured by Toa Synthetic Chemical Industry Co., Ltd.; KAYARAD TMPTA, DPCA-20, DPCA-60, DPCA-120 etc. manufactured by Nippon Kayaku Co., Ltd.; and V-295, V-300, V-360 etc. manufactured by Osaka Organic Chemical Industry Co., Ltd.

[0136] This product may be used alone or in combination with two or more other products.

[0137] The reactive unsaturated compound may also be treated with an acid anhydride to impart better developability. The reactive unsaturated compound may be present in an amount of 1 to 40% by weight, for example, 1 to 20% by weight, relative to the total amount of the photosensitive resin composition. When the reactive unsaturated compound is within the above range, sufficient curing occurs during exposure in the pattern formation process, resulting in excellent reliability, and the pattern exhibits excellent heat resistance, light resistance, and chemical resistance, as well as excellent resolution and adhesion.

[0138] (3) Photoinitiator To achieve negative patterns using photolithography, it is necessary to use a photoradical initiator.

[0139] As photopolymerization initiators, commonly used in photosensitive resin compositions, examples include acetophenone compounds, benzophenone compounds, thioxanthone compounds, benzoin compounds, triazine compounds, oxime compounds, or mixtures thereof.

[0140] Examples of acetophenone compounds include 2,2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2-methylpropiophenone, pt-butyltrichloroacetophenone, pt-butyldichloroacetophenone, 4-chloroacetophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1-(4-(methylthio)phenyl)-2-mopolinopropan-1-one, and 2-benzyl-2-dimethylamino-1-(4-mopolinophenyl)-butan-1-one.

[0141] Examples of benzophenone compounds include benzophenone, benzoylbenzoic acid, methyl benzoylbenzoate, 4-phenylbenzophenone, hydroxybenzophenone, acrylic benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(bis(dimethylamino)benzophenone), 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, and 3,3'-dimethyl-2-methoxybenzophenone.

[0142] Examples of the thioxanthone compounds mentioned above include thioxanthone, 2-chlorthioxanthone, 2-methylthioxanthone, isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone, and 2-chlorothioxanthone.

[0143] Examples of benzoin compounds include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and benzyl dimethyl ketal.

[0144] Examples of triazine compounds include 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(3',4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, and 2-(p-tolyl)-4,6-bis(trichloromethyl)-s Examples include triazines, 2-biphenyl-4,6-bis(trichloromethyl)-s-triazines, bis(trichloromethyl)-6-styryl-s-triazines, 2-(naphtho-1-yl)-4,6-bis(trichloromethyl)-s-triazines, 2-(4-methoxynaphtho-1-yl)-4,6-bis(trichloromethyl)-s-triazines, 2-4-trichloromethyl(piferonyl)-6-triazines, and 2-4-trichloromethyl(4'-methoxystyryl)-6-triazines.

[0145] Examples of oxime compounds include 2-(o-benzoyloxime)-1-[4-(phenylthio)phenyl]-1, 2-octanedione, 1-(o-acetyloxime)-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazole-3-yl]ethanone, (E)-1(((3-cyclopentyl-1-(9-ethyl-6-(2-methylbenzoyl)-9H-carbazole-3-yl)propyridene)amino)oxy)ethane-1-one (PBG-304, manufactured by Trony).

[0146] In addition to the aforementioned compounds, other photoinitiators that can be used include carbazole compounds, diketone compounds, sulfonium borate compounds, diazo compounds, imidazole compounds, and biimidazole compounds.

[0147] As photoinitiators, peroxide compounds, azobis compounds, etc., can be used as radical polymerization initiators.

[0148] Examples of peroxide compounds include ketone peroxides such as methyl ethyl ketone peroxide, methyl isobutyl ketone peroxide, cyclohexanone peroxide, methylcyclohexanone peroxide, and acetylacetone peroxide; diacyl peroxides such as isobutyryl peroxide, 2,4-dichlorobenzoyl peroxide, o-methylbenzoyl peroxide, and bis-3,5,5-trimethylhexanoyl peroxide; hydroperoxides such as 2,4,4-trimethylpentyl-2-hydroperoxide, diisopropylbenzene hydroperoxide, cumene hydroperoxide, and t-butyl hydroperoxide; dicumyl peroxide, 2,5-dimethyl-2,5-di(t-butylperoxy)hexane, 1 Examples include dialkyl peroxides such as 3-bis(t-butyloxyisopropyl)benzene and n-butyl t-butyl peroxyvalate; alkyl peresters such as 2,4,4-trimethylpentyl peroxyphenoxyacetate, α-cumyl peroxyneodecanoate, t-butyl peroxybenzoate, and di-t-butyl peroxytrimethyl adipate; and peroxides such as di-3-methoxybutyl peroxydicarbonate, di-2-ethylhexyl peroxydicarbonate, bis-4-t-butylcyclohexyl peroxydicarbonate, diisopropyl peroxydicarbonate, acetylcyclohexylsulfonyl peroxide, and t-butyl peroxyaryl carbonate.

[0149] Examples of azobis compounds include 1,1'-azobiscyclohexane-1-carbonitride, 2,2'-azobis(2,4-dimethylvaleronitrile), 2,2-azobis(methylisobutyrate), 2,2'-azobis(4-methoxy-2,4-dimethylvaleronitrile), α,α'-azobis(isobutylnitrile), and 4,4'-azobis(4-cyanovaleic acid).

[0150] The photoinitiator may be used in conjunction with a photosensitizer that induces a chemical reaction by absorbing light, becoming excited, and then transferring that energy. Examples of photosensitizers include tetraethylene glycol bis-3-mercaptopropionate, pentaerythritol tetrakis-3-mercaptopropionate, and dipentaerythritol tetrakis-3-mercaptopropionate.

[0151] The photoinitiator may be included in an amount of 0.01 to 10% by weight, for example, 0.1 to 5% by weight, relative to the total amount of the photosensitive composition. When the photoinitiator is included within this range, sufficient curing occurs during exposure in the pattern formation process, resulting in excellent reliability, excellent heat resistance, light resistance, and chemical resistance of the pattern, excellent resolution and adhesion, and prevention of a decrease in transmittance due to unreacted initiators.

[0152] (4) Colorants Organic pigments, inorganic pigments, and dyes can all be used as colorants.

[0153] As colorants, red pigments, green pigments, blue pigments, yellow pigments, black pigments, etc., can be used.

[0154] Examples of red pigments include CI Red Pigment 254, CI Red Pigment 255, CI Red Pigment 264, CI Red Pigment 270, CI Red Pigment 272, CI Red Pigment 177, and CI Red Pigment 89.

[0155] Examples of green pigments include halogen-substituted copper phthalocyanine pigments such as CI Green Pigment 36 and CI Green Pigment 7.

[0156] Examples of blue pigments include copper phthalocyanine pigments such as CI blue pigment 15:6, CI blue pigment 15, CI blue pigment 15:1, CI blue pigment 15:2, CI blue pigment 15:3, CI blue pigment 15:4, CI blue pigment 15:5, and CI blue pigment 16.

[0157] Examples of yellow pigments include isoindoline pigments such as CI Yellow Pigment 139, quinophthalone pigments such as CI Yellow Pigment 138, and nickel complex pigments such as CI Yellow Pigment 150.

[0158] Examples of black pigments include lactam black, aniline black, perylene black, titanium black, and carbon black.

[0159] Furthermore, the colorant in the photosensitive resin composition according to the embodiment may include pigments, dyes, or combinations thereof. For example, the dye may include phthalocyanine compounds.

[0160] Pigments and dyes can be used individually or in combination of two or more, and are not limited to these examples.

[0161] Of these, black pigments can be used to efficiently block light in the light-shielding layer. When using black pigments, they may be used in combination with color correctors such as anthraquinone pigments, perylene pigments, phthalocyanine pigments, and azo pigments.

[0162] A dispersant may be used in combination to disperse the pigment in the photosensitive resin composition. Specifically, the pigment may be pre-treated with a dispersant before use, or the dispersant may be added together with the pigment during the manufacturing of the photosensitive resin composition.

[0163] Nonionic dispersants, anionic dispersants, cationic dispersants, etc., can be used as dispersants. Specific examples of dispersants include polyalkylene glycols and their esters, polyoxyalkylenes, polyhydric alcohol ester alkylene oxide adducts, alcohol alkylene oxide adducts, sulfonic acid esters, sulfonates, carboxylates, carboxylates, alkylamide alkylene oxide adducts, alkylamines, etc. These can be used individually or in combination of two or more.

[0164] Examples of commercially available dispersants include BYK's DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK-166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, DISPERBYK-2001, etc.; EFKA Chemicals Examples include the EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450 from [company name]; Solsperse5000, Solsperse12000, Solsperse13240, Solsperse13940, Solsperse17000, Solsperse20000, Solsperse24000GR, Solsperse27000, Solsperse28000 from Zeneka; or the PB711, PB821 from Ajinomoto.

[0165] The dispersant may be included in an amount of 0.1% to 15% by weight relative to the total amount of the photosensitive resin composition. When the dispersant is included within this range, the dispersibility of the composition is excellent, resulting in excellent stability, developability, and patternability during the manufacture of the light-shielding layer.

[0166] The pigment may be pretreated with a water-soluble inorganic salt and a wetting agent before use. When the pigment is pretreated, the average particle size of the pigment can be made finer.

[0167] The pretreatment can be carried out by kneading the pigment with a water-soluble inorganic salt and a wetting agent, and by filtering and washing the pigment obtained in the kneading step.

[0168] Kneading is performed at temperatures between 40°C and 100°C, and filtration and washing can be carried out by washing the inorganic salts with water, etc., followed by filtration.

[0169] Examples of water-soluble inorganic salts include, but are not limited to, sodium chloride and potassium chloride.

[0170] The wetting agent acts as a medium that allows the pigment and water-soluble inorganic salt to be uniformly mixed and the pigment to be easily pulverized. Examples of wetting agents include alkylene glycol monoalkyl ethers such as ethylene glycol monoethyl ether, propylene glycol monomethyl ether, and diethylene glycol monomethyl ether; and alcohols such as ethanol, isopropanol, butanol, hexanol, cyclohexanol, ethylene glycol, diethylene glycol, polyethylene glycol, and glycerin polyethylene glycol. These can be used individually or in combination of two or more.

[0171] Pigments that have undergone the kneading process can have an average particle size of 20 nm to 110 nm. When the average particle size of the pigment is within this range, it is possible to effectively form fine patterns while maintaining excellent heat resistance and light resistance.

[0172] The pigment may be included in an amount of 1 to 40% by weight, more specifically 2 to 30% by weight, relative to the total amount of the photosensitive resin composition. When the pigment is included within this range, the color reproduction rate is excellent, and the curability and adhesion of the pattern are excellent.

[0173] (5) Solvent The solvent can be a substance that is compatible with and does not react with cardo resins, reactive unsaturated compounds, pigments, cardo compounds, and initiators.

[0174] Examples of solvents include alcohols such as methanol and ethanol; ethers such as dichloroethyl ether, n-butyl ether, diisoamyl ether, methylphenyl ether, and tetrahydrofuran; glycol ethers such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; cellosolve acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, and diethyl cellosolve acetate; methyl ethyl carbitol, diethyl carbitol, and diethylene glycol monomethyl ether. Carbitols such as diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, and diethylene glycol diethyl ether; propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate and propylene glycol propyl ether acetate; aromatic hydrocarbons such as toluene and xylene; ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl-n-propyl ketone, methyl-n-butyl ketone, methyl-n-amyl ketone, and 2-heptanone; saturated aliphatic monocarboxylate alkyl esters such as ethyl acetate, n-butyl acetate, and isobutyl acetate; methyl lactate, lactic acid Lactic acid esters such as ethyl oxyacetate; alkyl oxyacetate esters such as methyl oxyacetate, ethyl oxyacetate, and butyl oxyacetate; alkyl alkoxyacetate esters such as methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, and ethyl ethoxyacetate; alkyl 3-oxypropionate esters such as methyl 3-oxypropionate and ethyl 3-oxypropionate; alkyl 3-alkoxypropionate esters such as methyl 3-methoxypropionate, ethyl 3-methoxypropionate, ethyl 3-ethoxypropionate, and methyl 3-ethoxypropionate; alkyl 2-oxypropionate esters such as methyl 2-oxypropionate, ethyl 2-oxypropionate, and propyl 2-oxypropionate;Examples include alkyl esters of 2-alkoxypropionates such as methyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-ethoxypropionate, and methyl 2-ethoxypropionate; 2-oxy-2-methylpropionate esters such as methyl 2-oxy-2-methylpropionate and ethyl 2-oxy-2-methylpropionate; alkyl monooxymonocarboxylate esters of alkyl 2-alkoxy-2-methylpropionates such as methyl 2-methoxy-2-methylpropionate and ethyl 2-ethoxy-2-methylpropionate; esters such as ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, ethyl hydroxyethyl acetate, and methyl 2-hydroxy-3-methylbutanoate; and ketone acid esters such as ethyl pyruvate.

[0175] In addition, high-boiling point solvents such as N-methylformamide, N,N-dimethylformamide, N-methylformanilide, N-methylacetamide, N,N-dimethylacetamide, N-methylpyrrolidone, dimethyl sulfoxide, benzyl ethyl ether, dihexyl ether, acetylacetone, isophorone, caproic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, and phenyl cellosolve acetate can also be used.

[0176] Considering their compatibility and reactivity in the solvent, glycol ethers such as ethylene glycol monoethyl ether; ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate; esters such as ethyl 2-hydroxypropionate; carbitols such as diethylene glycol monomethyl ether; and propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate and propylene glycol propyl ether acetate can be used.

[0177] The solvent may be included in the remainder of the total amount of the photosensitive resin composition, specifically in an amount of 40 to 90% by weight. When the solvent is included within this range, the photosensitive resin composition has an appropriate viscosity, resulting in excellent processability during pattern layer manufacturing.

[0178] (6) Other additives The photosensitive composition may further contain additives such as malonic acid; 3-amino-1,2-propanediol; silane coupling agents containing vinyl groups or (meth)acrylooxy groups; leveling agents; fluorine-based surfactants; silicone-based surfactants; and radical polymerization initiators in order to prevent staining and spots during application, improve leveling performance, and prevent the formation of residues due to unphenated properties.

[0179] For example, the photosensitive resin composition may further contain a silane coupling agent having a reactive substituent such as a vinyl group, carboxyl group, methacrylate group, isocyanate group, or epoxy group in order to improve adhesion to the substrate.

[0180] Examples of silane coupling agents include trimethoxysilylbenzoic acid, γ-methacrylateoxypropyltrimethoxysilane, vinyltriacetoxysilane, vinyltrimethoxysilane, γ-isocyanatetopropyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane, and β-epoxycyclohexylethyltrimethoxysilane, which can be used individually or in combination of two or more.

[0181] The silane coupling agent may be included in an amount of 0.01 to 10 parts by weight per 100 parts by weight of the photosensitive resin composition. When the silane coupling agent is included within the above range, excellent adhesion, storage properties, etc., are obtained.

[0182] Furthermore, the photosensitive resin composition may, if necessary, further contain a surfactant, such as a fluorine-based surfactant or a silicone-based surfactant, for improved coating properties and to prevent the formation of defects.

[0183] As fluorine-based surfactants, commercially available fluorine-based surfactants such as BM-1000 and BM-1100 from BM Chemie; Mechapack F142D, F172, F173, and F183 from Dainippon Ink and Chemicals, Inc.; Prolard FC-135, FC-170C, FC-430, and FC-431 from Sumitomo 3M Limited; Saffron S-112, S-113, S-131, S-141, and S-145 from Asahi Glass Co., Ltd.; and SH-28PA, SH-190, SH-193, SZ-6032, and SF-8428 from Toray Silicone Co., Ltd. can be used.

[0184] As for silicone-based surfactants, commercially available silicone-based surfactants such as EFKA3030, EFKA3034, and EFKA3886 from BASF; 3030, 3085, and 3236 from AFCONA; and BYK-379, BYK-3550, BYK-3751, and BYK-3754 from BYK can be used.

[0185] The surfactant can be used in an amount of 0.001 to 5 parts by weight per 100 parts by weight of the photosensitive resin composition. When the surfactant is within this range, coating uniformity is ensured, no fouling occurs, and excellent wettability to the glass substrate is achieved. In addition, the photosensitive resin composition may contain a certain amount of other additives, such as antioxidants and stabilizers, as long as they do not impair its physical properties.

[0186] II. Method for Manufacturing an Organic Light-Emitting Display Device Figure 8 is a flowchart of a method for manufacturing an organic light-emitting display device according to another embodiment. Figures 9a and 9b show the step of forming the pixel definition layer using a multitone photomask in the manufacturing method of Figure 8.

[0187] Referring to FIGS. 1 and 8, a method 30 for manufacturing an organic light-emitting display device 20 according to another embodiment includes a step (S32) of preparing a first electrode 4 on a substrate 1, a step (S34) of forming a pixel defining layer 6 exposing a part of the first electrode 40 through an opening 6d on the first electrode 4, a step (S36) of forming an organic layer 5 disposed in the opening 6d of the pixel defining layer 6, and a step (S38) of forming a second electrode 7 disposed on the organic layer 5.

[0188] Referring to FIGS. 9a and 9b, in the step S34 of forming the pixel defining layer 6, a photosensitive composition 42 applied to the first electrode 4 is exposed using a photomask 40 including a first section (x) with a transmittance of 0%, a second section (y) with a transmittance of 5% to 20%, a third section (z) with a transmittance of 25% to 50%, and a fourth section (w) with a transmittance of 100%, thereby forming a trench 6a, a halftone layer 6b, and a fulltone layer 6c, respectively.

[0189] As described above, the taper angle A of the trench 6a can be 50° to 80°, or 60° to 70°, or 63° to 67°. However, by adjusting the transmittance and exposure time of the second section (y), an appropriate taper angle A of the trench 6a can be formed.

[0190] The distance between the halftone layer 6b and the lowermost end of the trench 6a can be 0.1 μm to 1.2 μm, or 0.3 μm to 1.0 μm. However, by adjusting the transmittance and exposure time of the first to third sections (x, y, z), an appropriate distance at the lowermost end can be formed.

[0191] The taper angle B of the fulltone layer 6c can be 15° to 40°, or 20° to 35°, or 25° to 30°. However, by adjusting the transmittance and exposure time of the fourth section (w), an appropriate taper angle B of the fulltone layer 6c can be formed.

[0192] The thickness of the halftone layer 6b can be 1.0 μm to 2.0 μm or 1.3 μm to 1.7 μm, but an appropriate thickness of the halftone layer 6b can be formed by adjusting the transmittance and exposure time of the second section (y).

[0193] The thickness of the full-tone layer 6c may be 0.8 μm to 1.7 μm or 1.0 μm to 1.5 μm, but can be determined according to the thickness of the photosensitive composition itself.

[0194] In addition to the transmittance and exposure time of the section described above, the aforementioned characteristics can also be adjusted by the coating and application process, exposure process, and development process described later.

[0195] In the above example, a negative photoresist was used as the photosensitive composition 42 to form the trench 6a, the halftone layer 6b, and the fulltone layer 6c, but a positive photoresist can also be used. In this case, the first to fourth sections may have transmittances opposite to those in the above example.

[0196] Step S34 for forming the pixel definition layer 6 may include a coating step of applying and coating the photosensitive composition 42, an exposure step of exposing the photosensitive composition 42 using a photomask 40, and a developing step of developing the photosensitive composition 42 that has been exposed at a temperature of 19°C to 27°C for 30 to 120 seconds.

[0197] The step S34 of forming the pixel definition layer may further include a pre-baking step.

[0198] The following describes in detail step S34, which involves forming the pixel definition layer 6.

[0199] III. Method for Manufacturing the Pixel Definition Layer (1) Coating and application process The photosensitive composition 42 constituting the pixel definition layer 6 of the present invention is a low-viscosity liquid sample, and after application to the substrate, a spin coater or slit coater is used to coat it to a constant thickness. A spin coater has the advantage that although the thickness decreases as the rotation speed increases, the deviation in flatness over area is reduced. For coating large-area substrates, a slit coater is preferable to a spin coater. A disadvantage is that residual solvent after coating causes the surface to become fluid, which worsens the flatness. To overcome this, the fluidity on the surface is reduced by partially removing the solvent using VCD (vacuum chamber dry).

[0200] (2) Pre-baking process This process involves heating the coated substrate on a hot plate or in an oven at a constant temperature and time to remove some of the solvent contained in the coating film. If the surface or depth of the coating film is not dried, contamination of the photomask will occur during exposure in the next step, resulting in insufficient curing of the exposed area during ultraviolet light irradiation. As a result, the uncured material will not form a pattern during the development process and will be removed.

[0201] (3) Exposure process After the pre-baking process is complete, the photomast 40 with the pattern formed on it is used to cure the formed film by irradiating it with active rays (ultraviolet light). The lamps used to generate the active rays include LED lamps or metal (mercury) lamps, and the wavelengths include g-line (436nm), h-line (405nm), i-line (365nm), and Deep UV (<260nm), which can be used individually or in combination.

[0202] (4)Developing process During the exposure process, when irradiated with actinic rays, it is divided into an exposed portion and an unexposed portion by the photomask 40. In the case of a positive type, the exposed portion is dissolved by the developer, and the unexposed portion withstands the developer and remains as a pattern. In the case of a negative type, the exposed portion is cured and resistant to the developer, and the unexposed portion is developed. The black pixel definition layer (Black PDL) produced from the composition containing the colorant of the present invention is of the negative type, and a pattern can be formed by being divided into an exposed portion (cured) and an unexposed portion (developed).

[0203] For the developer in the development process, it is preferable to use a developer of 2.38 wt% of TMAH (tetramethylammonium hydroxide).

[0204] The development process is preferably carried out at a temperature of 19°C to 27°C for 30 seconds to 120 seconds, preferably 30 seconds to 90 seconds, and more preferably 30 seconds to 60 seconds.

[0205] In another embodiment, the pixel definition layer 6 produced using the aforementioned photosensitive composition 42 can be patterned into the pixel separation portion of the organic light-emitting device electrode.

[0206] The second electrode 7 can be formed as a transmissive electrode. The second electrode 7 can be a semi-transmissive film formed by thinly depositing metals such as Li, Ca, LiF / Ca, LiF / Al, Al, Mg, Ag with a small work function. In order to compensate for the problem of high resistance of the thin metal semi-transmissive film, a transparent conductive film made of a transparent conductive oxide can be laminated on the metal semi-transmissive film.

[0207] The second electrode 7 can be formed over the entire surface of the substrate in the form of a common electrode.

[0208] Also, such a second electrode 7 can function as a cathode electrode.

[0209] The pixel electrode and the second electrode 7 as described above may have opposite polarities to each other.

[0210] The organic layer 5 includes an organic light-emitting layer, and the organic light-emitting layer can be made of low-molecular-weight organic material or high-molecular-weight organic material. If the organic light-emitting layer is a low-molecular-weight organic layer formed of low-molecular-weight organic material, a hole transport layer (HTL) and a hole injection layer (HIL) may be arranged in the direction of the pixel electrode with the organic light-emitting layer at the center, and an electron transport layer (ETL) and an electron injection layer (EIL) may be arranged in the direction of the second electrode 7.

[0211] Of course, the organic layer 5 may have other functional layers laminated on top of these hole injection layer, hole transport layer, electron transport layer, and electron injection layer. Also, as mentioned above, the organic layer 5 may consist of a single layer 5 including a functional layer as shown in Figure 4a, or it may consist of a tandem structure including a first organic layer 5A including a functional layer, a charge generation layer 5B on the first organic layer, and a second organic layer 5C on the charge generation layer including a functional layer as shown in Figure 4b.

[0212] A sealing layer 8 may be placed on the organic material layer 5 so as to cover it. The organic light-emitting element contained in the organic material layer 5 is made of organic material and can easily deteriorate due to external moisture and oxygen. Therefore, it is necessary to seal the organic material layer 5 in order to protect such organic light-emitting elements. The sealing layer 8 is a means for sealing the organic material layer 5 and can have a structure in which multiple inorganic films and multiple organic films are alternately stacked.

[0213] In this embodiment, the organic light-emitting display device preferably forms the sealing layer 8 with a thin film obtained by alternately stacking multiple inorganic films and multiple organic films, rather than using a sealing substrate. By using a thin film as the sealing means, the organic light-emitting display device can be easily made flexible and thin.

[0214] The sealing layer 8 may include a plurality of inorganic films and a plurality of organic films. The inorganic films and organic films may be stacked alternately with respect to each other.

[0215] The inorganic film may consist of a metal oxide, metal nitride, metal carbide, or a combination thereof. For example, the inorganic film may consist of aluminum oxide, silicon oxide, or silicon nitride. In another example, the inorganic film may include a laminated structure of multiple inorganic insulating layers. The inorganic film can serve to suppress the penetration of external moisture and / or oxygen into the organic light-emitting layer.

[0216] The organic film may be a polymeric organic compound. For example, the organic film may contain epoxy, acrylate, or urethane acrylate. The organic film can function to alleviate internal stress in the inorganic film or to compensate for and planarize defects in the inorganic film.

[0217] The stacking order of the inorganic film and organic film constituting the sealing layer 8 is not limited; an organic film or an inorganic film may be stacked on the organic layer 5, and the top layer of the sealing layer 8 may also be an organic film or an inorganic film.

[0218] A touch panel 9 may be formed on the sealing layer 8. The touch panel 9 may include a first touch electrode formed on the sealing layer 8, a second touch electrode positioned opposite it, and an insulating layer interposed between them.

[0219] The first and second touch electrodes may be formed in a grid pattern or a specific pattern shape. The first touch electrode may be formed in contact with the upper part of the sealing layer 8, and an inorganic layer may be further provided between the sealing layer 8 and the first touch electrode.

[0220] The first and second touch electrodes may be formed from ITO or a metal mesh, and it is preferable that they be formed from a metal mesh.

[0221] Metal mesh electrodes are manufactured by printing opaque metals (such as copper, silver, gold, and aluminum) in a grid pattern with a thickness of 1 to 7 μm. Because they use highly conductive metals, they have very low resistance, fast touch response speed, are easy to implement in large screens, and have the advantage of being cheaper to produce than ITO film. Furthermore, metal mesh electrodes have superior durability against repeated bending compared to ITO electrodes, making them suitable for use as touch panel electrodes for foldable displays.

[0222] Preferably, the touch panel 9 is a capacitive touch panel that, when a user touches it, uses the capacitance of the human body to recognize the part where the amount of current has changed, calculates the size, and detects the position.

[0223] It will be obvious to those skilled in the art that the organic light-emitting display device of the present invention is not limited to those shown in the figures, and may further include a Control IC that converts analog signals transmitted from a touch panel into digital signals and controls coordinate values ​​necessary for determining the coordinates of a touch area, an optical clear adhesive, a flexible circuit board (FPCB) on which conductive and signal line patterns are formed and which transmits various signals to electronic components, and various other electronic components and wiring.

[0224] A color filter 10 may be formed on the touch panel 9. The color filter 10 is located at the top of the touch panel 9 and may include a color portion aligned perpendicularly to the light-emitting region of the organic material layer 5 and a color separation portion aligned perpendicularly to the non-light-emitting region, separating the color portion.

[0225] It is obvious to those skilled in the art that the positions of each layer in the structure of the organic light-emitting display device 20 described above are not limited, and that multiple functional layers having specific purposes and functions may be further arranged between each layer. Therefore, the organic light-emitting display device of the present invention is not limited to the structure and drawings described above.

[0226] The following describes specific examples of synthesis and embodiments of the present invention, but the examples of synthesis and embodiments of the present invention are not limited thereto.

[0227] I. Manufacture of photosensitive composition Synthesis Example 1: (Preparation of 9,9-bis[4-(glycidyloxy)phenyl]fluorene of chemical formula 8) 20 g of 9,9-bisphenol fluorene (Sigma Aldrich), 8.67 g of glycidyl chloride (Sigma Aldrich), and 30 g of anhydrous potassium carbonate were placed in a 300 ml three-necked round-bottom flask equipped with a distillation tube and 100 ml of dimethylformamide. The mixture was heated to 80°C and reacted for 4 hours. After lowering the temperature to 25°C, the reaction solution was filtered, and the filtrate was added dropwise to 1000 ml of water with stirring. The precipitated powder was filtered, washed with water, and dried under reduced pressure at 40°C to obtain 25 g of 9,9-bis[4-(glycidyloxy)phenyl]fluorene, which has the following chemical formula 8. The obtained powder showed a purity of 98% as determined by HPLC. <Chemical formula 8> JPEG2026089052000018.jpg2246

[0228] Synthesis Example 2: Production of Cardo-type Binder Resin 25 g (54 mmol) of compound 1 obtained in Synthesis Example 1, 8 g of acrylic acid (manufactured by Taisho Chemical Co., Ltd.), 0.2 g of benzyltriethylammonium chloride (manufactured by Taisho Chemical Co., Ltd.), and 0.2 g of hydroquinone (manufactured by Taisho Chemical Co., Ltd.) were placed together with 52 g of propylene glycol methyl ether acetate (manufactured by Sigma Aldrich) in a 300 ml three-necked round-bottom flask equipped with a distillation tube, and stirred at 110°C for 6 hours. After the reaction was complete, 8 g of biphenyltetracarboxylate dianhydride (manufactured by Mitsubishi Gas Co., Ltd.) and 1.8 g of tetrahydrophthalic acid (manufactured by Sigma Aldrich) were added, and the mixture was stirred again at 110°C for 6 hours. After the reaction was complete, the reaction solution was collected and analyzed, and a cardo-type binder resin with a molecular weight of 4,580 and a solid content of 45% was obtained.

[0229] Synthesis Example 3: Production of Polyimide Resin A 250 ml three-necked round-bottom flask was fitted with a stirrer, nitrogen injection device, dropping funnel, temperature controller, and condenser. While filling with nitrogen, 65.7 g of N-methylpyrrolidone (NMP) was added, followed by 15 g of 2,2'-bis(3-amino-4-hydroxyphenyl)hexafluoropropane and 0.52 g of pyridine. The flask was then stirred and maintained at 40°C. 0.910 g of phthalic anhydride was slowly added, and the mixture was stirred for a set period of time to dissolve and react. Subsequently, 52.70 g of NMP was added to the flask where the reaction was progressing, and the mixture was stirred for 30 minutes while maintaining the solution temperature at 5°C. Then, 11.18 g of 4,4'-oxybisbenzoyl chloride was slowly added and dissolved, and the reaction was allowed to proceed by stirring for 12 hours.

[0230] The polyhydroxyamide solution was stirred at room temperature for 1 hour, then precipitated with 1506 g of methanol. The precipitated solid was dried under vacuum at 60°C for 12 hours to obtain 21.13 g of copolymerized polyimide resin powder.

[0231] Manufacturing Example 1: Production of Black Pigment Dispersion A dispersion was obtained by dispersing 15g of Irgaphor Black S100CF (black pigment / BASF), 3.5g of Disperbyk 16 (BYK), and 6.5g of SR-3613 (SMS) together with 70g of propylene glycol methyl ether acetate for 10 hours using a paint shaker (Asada) containing 100g of 0.5mm diameter zirconia beads (Toray).

[0232] A photosensitive composition was prepared with the composition shown in Table 1 below.

[0233] Specifically, the initiator was dissolved in a solvent and stirred at room temperature. Then, the binder resin and reactive unsaturated compound were added and stirred at room temperature. Next, the colorant and other additives were added to the resulting reaction product and stirred at room temperature. Then, the product was filtered three times to remove impurities, thereby producing photosensitive resin compositions A-1 to A-3 as shown in Table 1 below.

[0234] [Table 1]

[0235] The acrylic resin (polymer C-1) used was SR-3100 (SMS Co., Ltd., a resin containing double bonds with an average molecular weight of 6,000-8,000), the reactive unsaturated compound was Miramer M600 (Mion Specialty Chemicals Co., Ltd.), the photoinitiator was PBG-304 (Trony Co., Ltd.), and the solvent was propylene glycol ether acetate.

[0236] II. Method for Manufacturing a Pixel Definition Layer (PDL) and Measurement Examples (1) Coating and application process A photosensitive composition is applied to a cleaned 10cm x 10cm metal-deposited substrate using a spin coater to a uniform thickness. A coating film is then formed by partially removing the solvent using VCD (vacuum chamber dry). After VCD, the photosensitive composition coating forms a film with a thickness of 3.5 μm to 3.3 μm.

[0237] (2) Pre-baking process To remove the solvent contained in the obtained coating film, it is heated on a hot plate at 80°C to 150°C, preferably 90°C to 120°C, for 50 to 200 seconds, preferably 60 to 180 seconds, and more preferably 100 to 150 seconds. By removing a certain amount of solvent from this step, pixel-shaped mask contamination can be reduced in the next step (exposure step), and a clear pattern can be produced.

[0238] (3) Exposure process To form the necessary pattern and obtain a certain thickness in the resulting coating film, the pattern can be formed by irradiating the film with a light source, preferably a metal or LED lamp with active rays of 190 nm to 600 nm, through an exposure unit, after passing it through a pixel-shaped mask. The exposure dose irradiated to form the pattern is 20 to 150 mJ / cm². 2 Preferably, 70 mJ / cm 2 ~140 mJ / cm² 2 More preferably, 80-110 mJ / cm² 2 This is a negative-type photoresist material that is formed. The transmittance of the photomask used during exposure is set to form a pattern with four transmittance zones: 0% (unexposed area), 5%~20% (trench), 25%~50% (halftone), and 100% (fulltone). In the following example, the exposure amount when forming the halftone layer is x mJ / cm 2 The photomask transmittance was set to 35%, and trenches were formed by adjusting the photomask transmittance within the range of 5% to 20%, as shown in Table 2.

[0239] (4)Developing process Following the exposure process, the image was developed using a 2.38 wt% TMAH (tetramethylammonium hydroxide) developer by dipping at 23±2°C for 30 to 120 seconds. After that, it was washed with ultrapure water (DI water) to dissolve and remove the unexposed areas, leaving only the exposed areas to form the image pattern.

[0240] (5) Pattern and taper angle analysis To confirm the image pattern and taper angle obtained by development, a scanning electron microscope (JEOL) was used to measure the shape and thickness of the pattern cross-section. The top of the highest pattern at the bottom was defined as the pluto layer, the central part as the halftone layer, and the recess in the central part as the trench, and the taper angle was confirmed.

[0241] (6) Measurement of side resistance To measure the lateral resistance, a lateral current measurement module was constructed as shown in Figure 3 below. The comparative example is the same as the embodiment described above, but differs from the embodiment in that, as shown in Table 2, there is no trench, the taper angle of the trench is not within the appropriate range, or the distance between the surface of the halftone layer and the bottom edge of the trench is not within the appropriate range.

[0242] The side current measurement module shown in Figure 5 is described below. On an organic light-emitting display device consisting of a first electrode or anode and a second electrode or cathode, a pixel definition layer was constructed with a width (based on the photo mask) of 5 μm × 5 μm and a full tone thickness (based on the actual thickness after firing) of 1.5 μm, forming a halftone, trench, and full tone. An ITO electrode layer was applied to the outer part of the provided pixel definition layer, and a P-doped HTL layer without an ITO electrode layer was applied to the central part, and the side current value of the pixel definition layer was measured.

[0243] The side current values ​​were derived using the aforementioned module to create IV curves for each embodiment and comparative example. Furthermore, to accurately measure the side resistance using the IV values, the side resistance values ​​were derived using a Keithley 2400.

[0244] [Table 2]

[0245] Table 2 shows that when comparing the results of the Examples with Comparative Examples 1 and 2, it can be confirmed that the lateral resistance is relatively high when the taper angle value of the trench falls within the range limited by the present invention.

[0246] When the trench taper angle falls within the range limited by the present invention, the trenches in the halftone layer can exist as sufficient voids, resulting in increased resistance, effective blocking of charge flow, and suppression of lateral current. On the other hand, when the trench taper angle is less than 50°, the voids are relatively small, and there is a large amount of medium through which charge can flow sufficiently, making it difficult to efficiently block lateral current.

[0247] Furthermore, comparing the results of the example with those of Comparative Examples 3 and 4, it can be confirmed that the lateral resistance is relatively high even when the distance between the halftone layer and the lowest end of the trench falls within the range limited by the present invention. In particular, referring to the results of Comparative Example 4, in which no trench was formed, it can be confirmed that the example with a trench had relatively high lateral resistance. This is judged to be a result of increased resistance and suppression of lateral current when the trench exists as a sufficient gap, similar to the comparison results of the taper angle.

[0248] Furthermore, as in Comparative Example 3, when the spacing is 1.2 μm or more, the pixel definition layer is relatively thin, and it is judged that the physical stability is reduced, resulting in an inability to efficiently interrupt the side current.

[0249] Comparing the comparative examples, Comparative Example 4, which lacks trenches, has a very low lateral resistance, while Comparative Examples 1-3 have relatively higher lateral resistance compared to Comparative Example 4.

[0250] When comparing the above-mentioned embodiment with the comparative example, the organic light-emitting display device, its manufacturing method, and its electronic device according to the above-mentioned embodiment can increase lateral resistance because trenches are formed in the pixel definition layer, and the lateral resistance can be relatively further increased because the trenches include a taper angle value within an appropriate range.

[0251] In conclusion, the organic light-emitting display device, its manufacturing method, and its electronic device according to the above-described embodiment have trenches formed in the pixel definition layer, and because the trenches include a taper angle value within an appropriate range, the lateral resistance is high, preventing lateral current from flowing into the pixels. This not only makes the display colors more vivid but also improves reliability and lifespan.

[0252] The above description is merely illustrative, and any person with ordinary skill in the art to which the present invention pertains could make various modifications without departing from the essential characteristics of the present invention.

[0253] Accordingly, the embodiments disclosed herein are for illustrative purposes only, not to limit the invention, and such embodiments do not limit the spirit and scope of the invention. The scope of protection of the invention should be interpreted by the claims, and all technologies within an equivalent scope should be interpreted as being included within the scope of the invention.

Claims

1. First electrode; A pixel definition layer disposed on the first electrode, exposing a portion of the first electrode through an opening; An organic layer disposed in the opening of the pixel definition layer; and It includes a second electrode disposed on the organic layer, The pixel definition layer comprises a photosensitive composition and includes a halftone layer, a trench formed in the halftone layer, and a fulltone layer protruding from the halftone layer, in an organic light-emitting display device.

2. The organic light-emitting device according to claim 1, wherein the taper angle of the trench is 50° to 80°.

3. The aforementioned organic layer has a tandem structure including two light-emitting layers. The organic light-emitting display device according to claim 1, further comprising a touch pad on the second electrode.

4. The organic light-emitting device according to claim 1, wherein the distance between the halftone layer and the lowest end of the trench is 0.1 μm to 1.2 μm.

5. The pixel definition layer having a full-tone layer thickness of 0.8 μm to 1.7 μm and a half-tone layer thickness of 1.0 μm to 2.0 μm, the organic light-emitting display device according to claim 1.

6. The organic light-emitting device according to claim 1, wherein the photosensitive composition comprises an acrylic binder resin, a cardo binder resin, a polyimide resin, or a combination thereof.

7. The organic light-emitting device according to claim 1, wherein the photosensitive composition comprises a coloring agent.

8. The photosensitive composition comprises a reactive unsaturated compound, as described in claim 1, for the organic light-emitting device.

9. The organic light-emitting device according to claim 1, wherein the photosensitive composition comprises a photoinitiator.

10. Steps include preparing a first electrode on a substrate; A step of forming a pixel definition layer on the first electrode, such that a portion of the first electrode is exposed through an opening; The steps of forming an organic layer placed at the opening of the pixel definition layer; and The step includes forming a second electrode that is placed on the organic layer, A method for manufacturing an organic light-emitting display device, comprising the step of forming the pixel definition layer, in which a photosensitive composition coated on the first electrode is exposed using a photomask that includes a first section with a transmittance of 0%, a second section with a transmittance of 5% to 20%, a third section with a transmittance of 25% to 50%, and a fourth section with a transmittance of 100%, thereby forming a trunch, a halftone layer, and a fulltone layer, respectively.

11. The method for manufacturing an organic light-emitting display device according to claim 10, wherein the taper angle of the trench is 50° to 80°.

12. The method for manufacturing an organic light-emitting device according to claim 10, wherein the step of forming the pixel definition layer includes a coating step of applying and coating the photosensitive composition; an exposure step of exposing the photosensitive composition using the photomask; and a developing step of developing the photosensitive composition exposed at a temperature of 19°C to 27°C for 30 to 120 seconds.

13. The method for manufacturing an organic light-emitting display device according to claim 12, wherein the step of forming the pixel definition layer further comprises a pre-bake step.

14. The method for manufacturing an organic light-emitting device according to claim 10, wherein the photosensitive composition comprises an acrylic binder resin, a cardo binder resin, a polyimide resin, or a combination thereof.

15. The method for manufacturing an organic light-emitting device according to claim 10, wherein the photosensitive composition comprises a colorant and a reactive unsaturated compound, and the photosensitive composition comprises a photoinitiator.

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