Supply device, positioning module and lithographic apparatus

Abstract

The invention provides a supply device (23) for transferring supplies between a first object and a second object, comprising: a flexible supply structure (24), wherein the flexible supply structure is configured to allow displacement of the first object with respect to the second object in a first horizontal direction (Y); and a support device (29), comprising: a support element (30) for at least partly supporting the flexible supply structure, and a mounting structure (31) to mount the support element, wherein the mounting structure is configured to allow a movement of the support element (30) in a second horizontal (X) direction perpendicular to the first horizontal direction (Y).

Description

SUPPLY DEVICE, POSITIONING MODULE AND LITHOGRAPHIC APPARATUSCROSS-REFERENCE TO RELATED APPLICATIONS

[0001] This application claims priority of EP application 24216760.9 which was filed on 02 December 2024 and which is incorporated herein in its entirety by reference.FIELD

[0002] The present invention relates to a supply device and a positioning module comprising such supply device. The invention further relates to a lithographic apparatus comprising a positioning module.BACKGROUND

[0003] A lithographic apparatus is a machine constructed to apply a desired pattern onto a substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). A lithographic apparatus may, for example, project a pattern at a patterning device (e.g., a mask) onto a layer of radiation-sensitive material (resist) provided on a substrate.

[0004] To project a pattern on a substrate a lithographic apparatus may use electromagnetic radiation. The wavelength of this radiation determines the minimum size of features which can be formed on the substrate. A lithographic apparatus, which uses extreme ultraviolet (EUV) radiation, having a wavelength within the range 4-20 nm, for example 6.7 nm or 13.5 nm, may be used to form smaller features on a substrate than a lithographic apparatus which uses, for example, radiation with a wavelength of 193 nm.

[0005] A lithographic apparatus comprises movable objects that need supplies. These supplies for example comprise, fluids, for example cooling fluid or a vacuum (removal of gas), electricity, such as power supply or control and / or measurement signals, and / or optical signals. To bring these supplies to the movable object, a supply device having a flexible supply structure comprising supply hoses and / or supply cables may be provided to allow a flexible connection of the supply hoses and / or supply cables between the movable object and another object.

[0006] In an embodiment, the flexible supply structure may for example be a C-shaped cable slab comprising the supply hoses and / or supply cables which cable slab is at least partially supported on a support element. The support element may be a slide plate on which the supply hoses and / or supply cables are mechanically supported. Typically the C-shaped cable slab is orientated in a direction of movement of the movable object, i.e. the supply hoses and / or supply cables each extend in a plane extending in the main direction of movement of the movable object and the vertical direction. When the moveable object moves in the direction of movement, i.e. a first horizontal direction, the C-shaped cable slab may roll back and forth, wherein a smaller or larger part of the cable slab is supported by the support.

[0007] In some embodiments, the movable object is arranged to be movable in at least a first horizontal direction. Another movable object may be arranged on the movable object. The other movable object may be movable in a second horizontal direction, perpendicular to the first horizontal direction. Accelerations of the second movable object in the second horizontal direction may result in inertial forces on the cable slab in the second horizontal direction. These inertial forces may result in sliding of the cable slab over the support surface of the support, which may lead to wear of the support surface, the supply hoses and / or the supply cables. This wear may have a substantial negative effect on the maximum life time of the supply hoses and / or supply cables. Moreover, particles that are released from the support surface, the supply hoses and / or the supply cables due to wear may cause substrate defects in the lithographic process.SUMMARY

[0008] It is an object of the invention to provide an improved flexible supply structure. In particular, it is an object of the invention to provide a flexible supply structure that is less susceptible to wear and / or wherein generation of particles due to wear of the flexible supply structure and / or its support is substantially reduced.

[0009] According to an aspect the invention there is provided supply device for transferring supplies between a first object and a second object, wherein the first object is displaceable with respect to the second object in a first horizontal direction, wherein the supply device comprises:a flexible supply structure, wherein a first supply structure end of the flexible supply structure is connected to the first object and a second supply structure end of the flexible supply structure is connected to the second object, wherein the flexible supply structure is configured to allow displacement of the first object with respect to the second object in the first horizontal direction; anda support device for at least partly supporting the flexible supply structure, wherein the support device comprises:a support element to receive the flexible supply structure, anda mounting structure to mount the support element, wherein the mounting structure is configured to allow a movement of the support element in a second horizontal direction perpendicular to the first horizontal direction to at least partially follow a displacement of the flexible supply structure in the second horizontal direction.

[0010] According to an aspect the invention there is provided a positioning module comprising:a first object;a second object, wherein the first object can be displaced with respect to the second object in a first horizontal direction; anda supply device according to any of the claims 1-17 for transferring supplies between the first object and the second object.

[0011] According to an aspect the invention there is provided a lithographic apparatus comprising the positioning module of claim 18.BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Embodiments of the invention will now be described, by way of example only, with reference to the accompanying schematic drawings, in which:Figure 1 depicts a lithographic system comprising a lithographic apparatus and a radiation source;Figure 2 depicts a positioning module comprising a supply device according to an embodiment;Figure 3 depicts a side view of the supply device of Figure 2;Figure 4 shows a cross section of a lower part of the supply device of Figure 2;Figures 5-7 show different top views on the supply device of Figure 2;Figure 8 shows a first alternative embodiment of a supply device; andFigure 9 shows a second alternative embodiment of a supply device.Figure 10 shows a further embodiment of a further supply device.DETAILED DESCRIPTION

[0013] Figure 1 shows a lithographic system comprising a radiation source SO and a lithographic apparatus LA. The radiation source SO is configured to generate an EUV radiation beam B and to supply the EUV radiation beam B to the lithographic apparatus LA. The lithographic apparatus LA comprises an illumination system IL, a support structure MT configured to support a patterning device MA (e.g., a mask), a projection system PS and a substrate table WT configured to support a substrate W.

[0014] A substrate table positioning system WTP is provided to position the substrate table WT in a desired position. The substrate positioning system WTP comprises a position measurement system to measure a position of the substrate table WT and an actuation system to move the substrate table WT to a desired position. A patterning device support positioning system MTP is provided to position the support structure MT in a desired position. The patterning device support positioning system MTP also comprises a position measurement system to measure a position of the support structure MT and an actuation system to move the support structure MT to a desired position.

[0015] The illumination system IL is configured to condition the EUV radiation beam B before the EUV radiation beam B is incident upon the patterning device MA. Thereto, the illumination system IL may include a facetted field mirror device 10 and a facetted pupil mirror device 11. The faceted field mirror device 10 and faceted pupil mirror device 11 together provide the EUV radiation beam B with a desired cross-sectional shape and a desired intensity distribution. The illumination system IL may include other mirrors or devices in addition to, or instead of, the faceted field mirror device 10 and faceted pupil mirror device 11.

[0016] After being thus conditioned, the EUV radiation beam B interacts with the patterning device MA. As a result of this interaction, a patterned EUV radiation beam B' is generated. The projection system PS is configured to project the patterned EUV radiation beam B' onto the substrate W. For that purpose, the projection system PS may comprise a plurality of mirrors 13,14 which are configured to project the patterned EUV radiation beam B' onto the substrate W held by the substrate table WT. The projection system PS may apply a reduction factor to the patterned EUV radiation beam B', thus forming an image with features that are smaller than corresponding features on the patterning device MA. For example, a reduction factor of 4 or 8 may be applied. Although the projection system PS is illustrated as having only two mirrors 13, 14 in Figure 1, the projection system PS may include a different number of mirrors (e.g. six or eight mirrors).

[0017] The substrate W may include previously formed patterns. Where this is the case, the lithographic apparatus LA aligns the image, formed by the patterned EUV radiation beam B', with a pattern previously formed on the substrate W.

[0018] A relative vacuum, i.e. a small amount of gas (e.g. hydrogen) at a pressure well below atmospheric pressure, may be provided in the radiation source SO, in the illumination system IL, and / or in the projection system PS.

[0019] The radiation source SO may be a laser produced plasma (LPP) source, a discharge produced plasma (DPP) source, a free electron laser (FEL) or any other radiation source that is capable of generating EUV radiation.

[0020] The lithographic process comprises a series of projection phases, in which the patterned EUV radiation beam B' is projected onto the substrate W (exposure phase) and / or in which the substrate W is being aligned with the patterned EUV radiation beam B' (alignment phase) and idle phases in which no patterned EUV radiation beam B' is projected onto the substrate W, or on a non-relevant part of the substrate W and positioning accuracy of the substrate W with respect to the patterned EUV radiation beam B' is less critical. During the projection phase the patterning device and the substrate may be moved in a scanning movement with a constant scanning velocity. The idle phase may be used to decelerate and (re)accelerate the patterning device MT and the substrate W to the desired scanning velocity and a desired alignment with respect to the EUV radiation beam B and the patterned EUV radiation beam B', respectively. The constant scanning velocity of the patterning device MT is typically different than the constant scanning velocity of the substrate W.

[0021] Figure 2 shows a positioning module comprising a base frame 20, a first movable object 21, and a second movable object 22. The first movable object 21 is supported on the base frame 22 and is movable with respect to the base frame 22 in a first horizontal direction, e.g. the y-direction. The second movable object 22 is supported on the first movable object 21 and is movable with respect to the first movable object 21 in a second horizontal direction, e.g. the x-direction. Actuators may be provided to exert actuation forces on the first movable object 21 and the second movable object 22 to move the first movable object 21 and the second movable object 22 towards a desired position.

[0022] The positioning module may for example be part of a substrate positioning system WTP arranged to position a substrate W, for example supported on the second movable object 22, in a desired position, as shown in Figure 1.

[0023] It may be desirable that supplies are exchanged between the base frame 20 and the first movable object 21. These supplies for example comprise, fluids, for example cooling fluid or a vacuum (removal of gas), electricity, such as power supply or control and measurement signals and / or optical signals. The positioning module comprises a supply device 23 comprising a flexible supply structure 24 that extends between the base frame 20 and the first movable object 21 to exchange supplies between the base frame 20 and the first movable object 21. The supplies may be transported from the base frame 20 to the first movable object 21 and / or from the first movable object 21 to the base frame 20.

[0024] The flexible supply structure 24 comprises supply hoses and / or supply cables 25 extending between the base frame 20 and the first movable object 21. The flexible supply structure 24 further comprises clamp brackets 26 to clamp the supply hoses and / or supply cables 25 to form a cable slab. One end of the cable slab is connected to a first manifold 27 mounted on the first movable object 21 and a second opposite end of the cable slab is connected to a second manifold 28 mounted on the base frame 20. The first manifold 27 and the second manifold 28 may be any structure or device arranged to connect the supply hoses and / or supply cables 25 to the first movable object 21 and the base frame 20, respectively. The clamp brackets 26 may each comprise a pair of clamp strips between which the multiple supply hoses and supply cables 25 are clamped next to each other.

[0025] The cable slab is shaped in a C-shape having a lower part, a middle part and an upper part. The C-shaped cable slab is orientated in the direction of movement of the first movable object 21, i.e. the supply hoses and / or supply cables 25 each extend in a plane extending in the y-direction and z-direction. When the first moveable object 21 moves in the first horizontal direction, e.g. y-direction, the C-shaped cable slab may roll back and forth, wherein a smaller or larger part of the cable slab may be supported by a support. In alternative embodiments, the flexible supply structure 24 may comprise two or more C-shaped cable slabs, wherein one C-shaped cable slab is provided in another C-shaped cable slab as a CC-configuration.

[0026] A further supply device comprising a flexible supply structure (not shown) similar to the supply device 23 between the base frame 20 and the first movable object 21 may be provided between the first movable object 21 and the second movable object 22 to exchange supplies between the first movable object 21 and the second movable object 22. This further flexible supply structure will typically be orientated in the second horizontal direction, e.g. x-direction. This means that the supply hoses and / or supply cables will extend in the plane extending in the x-direction and z-direction.

[0027] In known embodiments of a cable slab, a support is provided to support the cable slab. The support may for example be formed as a slide plate on which the supply hoses and / or supply cables are mechanically supported. Inertia forces on the cable slab due to accelerations of the second movable object 22 in the second horizontal direction, e.g. x-direction, may result in sliding of the cable slab over the support surface of the slide plate in the second horizontal direction. This sliding may lead to wear of the support surface of the support, the supply hoses and / or the supply cables. The wear may have a substantial negative effect on the maximum life time of the supply hoses and / or supply cables. Moreover, particles that are released due to wear of the support surface, the supply hoses and / or the supply cables may lead to substrate defects in a lithographic process.

[0028] In the embodiment of Figure 2, the supply device 23 comprises multiple support devices 29 arranged to at least partially support the flexible supply structure 24. The support devices 29 are configured to prevent or at least reduce sliding between the flexible supply structure 24 and the respective support device 29.

[0029] Figure 3 shows a side view of the supply device 23 comprising the flexible supply structure 24 supported on the support device 29. Figure 4 shows a cross-section of the lower part of the supply device 23.

[0030] The support device 29 comprises a support element 30 to receive the flexible supply structure 24 and a mounting structure 31 to mount the support element 30. The mounting structure 31 is configured to allow a movement of the support element 30 in the second horizontal direction, e.g. x-direction, perpendicular to the direction of movement of the first movable object 21 in a range of movement.

[0031] The support element 30 of the support device 29 is a support plate having a support surface 32 to support the flexible supply structure 24. The support surface 32 is a flat surface.

[0032] The support element 30 has an elongated shape and extends in the second horizontal direction, e.g. x-direction, from a first support element end to a second support element end. A first flexure 33 is arranged at the first support element end and a second flexure 34 is arranged at the second support element end.

[0033] The first flexure 33 is mounted on a first mounting element 35 and the second flexure 34 is mounted on a second mounting element 36. The first mounting element 35 and the second mounting element 36 are rigid elements arranged on the base frame 20. The range of movement of the support element 30 in the second horizontal direction is limited by two end stops 37.

[0034] The first flexure 33 and the second flexure 34 are flexible plate shaped elements that allow a movement of the support element 30 in the second horizontal direction, e.g. x-direction. Such movement may for example be induced by friction between the flexible supply structure 24 and the support surface 32 of the support element 30. The support element 30 is thus capable of following movement of the supply hoses and supply cables 25 of the flexible supply structure 24 supported on the support element 30. This may significantly reduce sliding of the supply hoses and supply cables 25 over the support surface compared to a rigid support plate.

[0035] The first flexure 33 and the second flexure 34 are arranged as a pendulum like element that ensure that without any external force exerted on the support element 30, the support element 30 will be arranged in a central position. By using pendulum like flexure elements, no stiffness is required to bias the support element 30 to the central position. As a result, a low stiffness in the second horizontal direction can be provided.

[0036] As an alternative for the flexible plate shaped elements used for the first flexure 33 and the second flexure 34 any other suitable flexures that allow movement in the second horizontal direction may also be applied.

[0037] Figure 5 shows a top view on the lower part of the supply device 23. The supply hoses and / or supply cables 25 of the flexible supply structure 24 are supported on the support element 30. The position of the support element is a central position, corresponding to the position shown in Figures 3 and 4.

[0038] Figure 6 shows the same view as Figure 5, but with the supply hoses and / or supply cables 25 of the flexible supply structure 24 displaced in the positive x-direction. Due to the friction between the supply hoses and / or supply cables 25, the support element 30 is moved together with the supply hoses and / or supply cables 25 in the positive x-direction. The displacement of the supply hoses and / or supply cables 25 and the support element 30 is indicated by arrow DX.

[0039] Figure 7 shows the same view as Figure 5, but now with the supply hoses and / or supply cables 25 of the flexible supply structure 24 rotated about a rotation axis extending in z-direction. The first flexure 33 and the second flexure 34 are arranged to allow the support element 30 to follow, in a range of movement, such rotation of the supply hoses and / or supply cables 25. The rotation of the supply hoses and / or supply cables 25 and the support element 30 is indicated by arrow RZ.

[0040] In practice, the supply hoses and / or supply cables 25 may be forced in a combination of displacement in the x-direction and rotation about a rotation axis extending in z-direction. The support device 29 may be configured to at least partially follow such combination of displacement and rotation of the flexible supply structure 24, in particular by providing a mounting structure 31 that allows the support element 30 to follow the combination of displacement in the second horizontal direction and rotation about the vertical axis within a range of movement. The mounting structure 31 may have any type of suitable flexures to allow these movements of the support element 30.

[0041] It is noted that, as shown in Figure 2, the supply device 23 may have multiple support devices 29 for at least partly supporting the flexible supply structure 24. The multiple support devices may be distributed in the y-direction. Each support device 29 may comprise a support element 30 to receive the flexible supply structure 24 and a mounting structure 31 to mount the support element 30. The mounting structure 31 is configured to allow a movement of the support element 30 in a second horizontal direction, e.g. x-direction, perpendicular to the first horizontal direction, e.g. y-direction, to at least partially follow a displacement or rotation of the flexible supply structure 24 in the second horizontal direction.

[0042] Figure 8 shows a first alternative embodiment of a supply device 23. In this embodiment, a first damping device 40 is arranged between the first mounting element 35 and the support element 30 and a second damping device 41 is arranged between the second mounting element 36 and the support element 30. The first damping device 40 and the second damping device 41 are arranged to damp movements of the support element 30 in the second horizontal direction, e.g. the x-direction.

[0043] Figure 9 shows a second alternative embodiment of a supply device 23. In this embodiment, the position of the support element 30 is actively controlled to follow movements of the flexible supply structure 24. The mounting structure 31 of the supply device 23 comprises a bearing 50, for example a vacuum or roller bearing, that supports the support element 30, while allowing movement of the support element 30 in the second horizontal direction, e.g. x-direction.

[0044] The support device 29 further comprises at least one actuator 51 to actuate movement of the support element 30 in at least the second horizontal direction, and a position sensor 52 configured to measure a position signal representative for a position of the flexible supply structure 24. The position signal is received by a control device 53. The control device 53 is arranged to provide an actuation signal based on the desired position of the flexible supply structure 24 and the actual position of the flexible supply structure 24. The actuation signal is fed into the at least one actuator 51 to actuate movement of the support element 30 to follow a movement of the flexible supply structure 24. The at least one actuator 51 is configured to actuate the support element 30 in the second horizontal direction, e.g. the x-direction, and may further be configured to actuate rotation of the support element 30 in a rotation around a rotation axis extending in z-direction.

[0045] Figure 10 shows an further embodiment in relation to the further supply device. In this embodiment the further supply device may for example be supported by clamp brackets (not shown) that contact a mounting interface 60. The contact load of the further supply structure is reduced as the clamp brackets contact a flexible monolithic structure 61. The flexible monolithic structure 61 has a triangular shape. The triangular shape may be optimized in relation to e.g. stress, stiffness, fit within the available volume or in any suitable combination.A tip 62 of the triangular shape may be provided with a radius to reduce a level of contact stress to reduce for example contact wear. The triangular shapes as shown in Figure 10 are provided with a slightly inclined angle with respect to a further supply support surface (not shown) that supports the mounting interface 60. The inclined angle provides a deflection range of tip 62 with respect to the further supply support surface. In an embodiment the height value 63 may for example equal 10 millimeters and the height value 64 may for example equal 21 millimeters indicating a maximum deflection of the tip of 10 millimeters (providing a safety range of 1 millimeter) to cope with predefined load conditions. In this deflection range the further supply structure is supported in the flexible range of the monolithic structure reducing the contact load and potential contact wear.

[0046] Hereinabove, a flexible supply structure 24 is shown and described having a C-shaped configuration, wherein a lower part of the C-shaped configuration is supported by a support device 29. In other embodiments, as an alternative of or in addition to the support device 29 at the lower part of the flexible supply structure 23, there may also be provided support for the middle part and / or the upper part of the C-shaped configuration.

[0047] It may also be possible that the flexible supply structure 24 has other shapes or configurations, wherein support devices are used to support the flexible supply structure 24.

[0048] Hereinabove, a supply device 23 is shown and described with respect to a first movable object 21 movably supported on a base frame 20, in particular in a positioning module of a lithographic apparatus. The same supply device 23 may also be used in combination with any other movable object to exchange supplies between the movable object and another object in order to improve the support of the flexible supply structure. The other object may be a movable or a stationary object.

[0049] Although specific reference may be made in this text to the use of lithographic apparatus in the manufacture of ICs, it should be understood that the lithographic apparatus described herein may have other applications. Possible other applications include the manufacture of integrated optical systems, guidance and detection patterns for magnetic domain memories, flat-panel displays, liquid-crystal displays (LCDs), thin-film magnetic heads, etc.

[0050] Although specific reference may be made in this text to embodiments of the invention in the context of a lithographic apparatus, embodiments of the invention may be used in other apparatus. Embodiments of the invention may form part of a mask inspection apparatus, a metrology apparatus, or any apparatus that measures or processes an object such as a wafer (or other substrate) or mask (or other patterning device). These apparatus may be generally referred to as lithographic tools. Such a lithographic tool may use vacuum conditions or ambient (non-vacuum) conditions.

[0051] Although specific reference may have been made above to the use of embodiments of the invention in the context of optical lithography, it will be appreciated that the invention, where the context allows, is not limited to optical lithography and may be used in other applications, for example imprint lithography.

[0052] Aspects of the invention are set out in the clauses below:1. A supply device for transferring supplies between a first object and a second object, wherein the first object is displaceable with respect to the second object in a first horizontal direction, wherein the supply device comprises:a flexible supply structure, wherein a first supply structure end of the flexible supply structure is connected to the first object and a second supply structure end of the flexible supply structure is connected to the second object, wherein the flexible supply structure is configured to allow displacement of the first object with respect to the second object in the first horizontal direction; anda support device for at least partly supporting the flexible supply structure, wherein the support device comprises:a support element to receive the flexible supply structure, anda mounting structure to mount the support element, wherein the mounting structure is configured to allow a movement of the support element in a second horizontal direction perpendicular to the first horizontal direction to at least partially follow a displacement of the flexible supply structure in the second horizontal direction.2. The supply device of clause 1, wherein the support element is a support plate.3. The supply device of clause 1 or 2, wherein the support element comprises a support surface to receive the flexible supply structure.4. The supply device of clause 3, wherein the support surface is a flat surface.5. The supply device of any of the preceding clauses, wherein the mounting structure comprises at least two flexures to allow movement of the support element in the second horizontal direction.6. The supply device of any of the preceding clauses, wherein the support element extends in the second horizontal direction from a first support element end to a second support element end, wherein a first flexure is arranged at the first support element end and a second flexure is arranged at the second support element end.7. The supply device of clause 6, wherein the first flexure and the second flexure are flexible plate shaped elements.8. The supply device of any of the preceding clauses, wherein the support device comprises one or more dampers to damp movement of the support element in at least the second horizontal direction.9. The supply device of any of the preceding clauses, wherein the supply device comprises one or more actuators to move the support element.10. The supply device of clause 9, wherein the supply device comprises a position sensor to measure movement of the flexible supply structure and a control device to control the one or more actuators to follow the measured movement of the flexible supply structure.11. The supply device of any of the preceding clauses, wherein the support device is configured to at least partially follow a rotation of the flexible supply structure about a vertical axis.12. The supply device of clause 11, wherein the mounting structure comprises at least two flexures to allow rotation of the support element about the vertical axis.13. The supply device of any of the preceding clauses, wherein the flexible supply structure comprises one or more supply hoses and / or supply cables.14. The supply device of any of the preceding clauses, wherein the supplies comprise gas, liquid, electricity, control and / or measurement signals, and / or optical signals.15. The supply device of any of the preceding clauses, wherein the flexible supply structure is arranged in a C-shape having a lower part, a middle part and an upper part, wherein at least the lower part is at least partially supported by the support device.16. The supply device of any of the preceding clauses, wherein the mounting structure is arranged on the first object or the second object.17. The supply device of any of the preceding clauses, wherein the supply device comprises multiple support devices for at least partly supporting the flexible supply structure, wherein each support device comprises:a support element to receive the flexible supply structure, anda mounting structure to mount the support element, wherein the mounting structure is configured to allow a movement of the support element in a second horizontal direction perpendicular to the first horizontal direction to at least partially follow a displacement of the flexible supply structure in the second horizontal direction.18. A positioning module comprising:a first object;a second object, wherein the first object can be displaced with respect to the second object in a first horizontal direction; anda supply device according to any of the preceding clauses for transferring supplies between the first object and the second object.19. An exposure apparatus such as an lithographic apparatus comprising the positioning module of clause 18.20. The exposure apparatus of clause 19, wherein the first object and / or the second object are part of a substrate support or a patterning device support.21. A supply device for transferring supplies between a first object and a second object, comprising:a flexible supply structure, wherein the flexible supply structure is configured to allow displacement of the first object with respect to the second object in a first horizontal direction; anda support device, comprising:a support element for at least partly supporting the flexible supply structure, anda mounting structure to mount the support element, wherein the mounting structure is configured to allow a movement of the support element in a second horizontal direction perpendicular to the first horizontal direction.22. The supply device of clause 21, wherein the support element is a support plate.23. The supply device of clause 21 or 22, wherein the support element comprises a support surface to receive the flexible supply structure.24. The supply device of clause 23, wherein the support surface is a flat surface.25. The supply device of any one of clauses 21 - 24, wherein the mounting structure comprises at least two flexures to allow movement of the support element in the second horizontal direction.26. The supply device of any one of clauses 21 - 25, wherein the support element extends in the second horizontal direction from a first support element end to a second support element end, wherein a first flexure is arranged at the first support element end and a second flexure is arranged at the second support element end.27. The supply device of clause 26, wherein the first flexure and the second flexure are flexible plate shaped elements.28. The supply device of any one of clauses 21 - 27, wherein the support device comprises one or more dampers to damp movement of the support element in at least the second horizontal direction.29. The supply device of any one of clauses 21 - 28, wherein the supply device comprises one or more actuators to move the support element.30. The supply device of clause 29, wherein the supply device comprises a position sensor to measure movement of the flexible supply structure and a control device to control the one or more actuators to follow the measured movement of the flexible supply structure.31. The supply device of any one of clauses 21 - 30, wherein the support device is configured to at least partially follow a rotation of the flexible supply structure about a vertical axis.32. The supply device of clause 31, wherein the mounting structure comprises at least two flexures to allow rotation of the support element about the vertical axis.33. The supply device of any one of clauses 21 - 32, wherein the flexible supply structure comprises one or more supply hoses and / or supply cables.34. The supply device of any one of clauses 21 - 33, wherein the supplies comprise gas, liquid, electricity, control and / or measurement signals, and / or optical signals.35. The supply device of any one of clauses 21 - 34, wherein the flexible supply structure is arranged in a C-shape having a lower part, a middle part and an upper part, wherein at least the lower part is at least partially supported by the support device.36. The supply device of any one of clauses 21 - 35, wherein the mounting structure is arranged on the first object or the second object.37. The supply device of any one of clauses 21 - 36, wherein the supply device comprises multiple support devices for at least partly supporting the flexible supply structure, wherein each support device comprises:a support element to receive the flexible supply structure, anda mounting structure to mount the support element, wherein the mounting structure is configured to allow a movement of the support element in a second horizontal direction perpendicular to the first horizontal direction to at least partially follow a displacement of the flexible supply structure in the second horizontal direction.38. A positioning module comprising:a first object;a second object, wherein the first object can be displaced with respect to the second object in a first horizontal direction; anda supply device according to any one of clauses 21 - 37 for transferring supplies between the first object and the second object.39. An exposure apparatus such as an lithographic apparatus comprising the positioning module of clause 38.40. The exposure apparatus of clause 39, wherein the first object and / or the second object are part of a substrate support or a patterning device support.

[0053] While specific embodiments of the invention have been described above, it will be appreciated that the invention may be practiced otherwise than as described. The descriptions above are intended to be illustrative, not limiting. Thus it will be apparent to one skilled in the art that modifications may be made to the invention as described without departing from the scope of the claims set out below.

Claims

CLAIMS1. A supply device for transferring supplies between a first object and a second object, wherein the first object is displaceable with respect to the second object in a first horizontal direction, wherein the supply device comprises:a flexible supply structure, wherein a first supply structure end of the flexible supply structure is connected to the first object and a second supply structure end of the flexible supply structure is connected to the second object, wherein the flexible supply structure is configured to allow displacement of the first object with respect to the second object in the first horizontal direction; anda support device for at least partly supporting the flexible supply structure, wherein the support device comprises:a support element to receive the flexible supply structure, anda mounting structure to mount the support element, wherein the mounting structure is configured to allow a movement of the support element in a second horizontal direction perpendicular to the first horizontal direction to at least partially follow a displacement of the flexible supply structure in the second horizontal direction.

2. The supply device of claim 1, wherein the support element is a support plate.

3. The supply device of claim 1 or 2, wherein the support element comprises a support surface to receive the flexible supply structure.

4. The supply device of claim 3, wherein the support surface is a flat surface.

5. The supply device of any of the preceding claims, wherein the mounting structure comprises at least two flexures to allow movement of the support element in the second horizontal direction.

6. The supply device of any of the preceding claims, wherein the support element extends in the second horizontal direction from a first support element end to a second support element end, wherein a first flexure is arranged at the first support element end and a second flexure is arranged at the second support element end.

7. The supply device of claim 6, wherein the first flexure and the second flexure are flexible plate shaped elements.

8. The supply device of any of the preceding claims, wherein the support device comprises one or more dampers to damp movement of the support element in at least the second horizontal direction.

9. The supply device of any of the preceding claims, wherein the supply device comprises one or more actuators to move the support element.

10. The supply device of claim 9, wherein the supply device comprises a position sensor to measure movement of the flexible supply structure and a control device to control the one or more actuators to follow the measured movement of the flexible supply structure.

11. The supply device of any of the preceding claims, wherein the support device is configured to at least partially follow a rotation of the flexible supply structure about a vertical axis.

12. The supply device of claim 11, wherein the mounting structure comprises at least two flexures to allow rotation of the support element about the vertical axis.

13. The supply device of any of the preceding claims, wherein the flexible supply structure comprises one or more supply hoses and / or supply cables.

14. The supply device of any of the preceding claims, wherein the supplies comprise gas, liquid, electricity, control and / or measurement signals, and / or optical signals.

15. The supply device of any of the preceding claims, wherein the flexible supply structure is arranged in a C-shape having a lower part, a middle part and an upper part, wherein at least the lower part is at least partially supported by the support device.

16. The supply device of any of the preceding claims, wherein the mounting structure is arranged on the first object or the second object.

17. The supply device of any of the preceding claims, wherein the supply device comprises multiple support devices for at least partly supporting the flexible supply structure, wherein each support device comprises:a support element to receive the flexible supply structure, anda mounting structure to mount the support element, wherein the mounting structure is configured to allow a movement of the support element in a second horizontal direction perpendicular to the first horizontal direction to at least partially follow a displacement of the flexible supply structure in the second horizontal direction.

18. A positioning module comprising:a first object;a second object, wherein the first object can be displaced with respect to the second object in a first horizontal direction; anda supply device according to any of the preceding claims for transferring supplies between the first object and the second object.

19. An exposure apparatus such as an lithographic apparatus comprising the positioning module of claim 18.

20. The exposure apparatus of claim 19, wherein the first object and / or the second object are part of a substrate support or a patterning device support.

21. A supply device for transferring supplies between a first object and a second object, comprising:a flexible supply structure, wherein the flexible supply structure is configured to allow displacement of the first object with respect to the second object in a first horizontal direction; anda support device, comprising:a support element for at least partly supporting the flexible supply structure, anda mounting structure to mount the support element, wherein the mounting structure is configured to allow a movement of the support element in a second horizontal direction perpendicular to the first horizontal direction.

22. The supply device of claim 21, wherein the support element is a support plate.

23. The supply device of claim 21 or 22, wherein the support element comprises a support surface to receive the flexible supply structure.

24. The supply device of claim 23, wherein the support surface is a flat surface.

25. The supply device of any one of claims 21 - 24, wherein the mounting structure comprises at least two flexures to allow movement of the support element in the second horizontal direction.

26. The supply device of any one of claims 21 - 25, wherein the support element extends in the second horizontal direction from a first support element end to a second support element end, wherein a first flexure is arranged at the first support element end and a second flexure is arranged at the second support element end.

27. The supply device of claim 26, wherein the first flexure and the second flexure are flexible plate shaped elements.

28. The supply device of any one of claims 21 - 27, wherein the support device comprises one or more dampers to damp movement of the support element in at least the second horizontal direction.

29. The supply device of any one of claims 21 - 28, wherein the supply device comprises one or more actuators to move the support element.

30. The supply device of claim 29, wherein the supply device comprises a position sensor to measure movement of the flexible supply structure and a control device to control the one or more actuators to follow the measured movement of the flexible supply structure.

31. The supply device of any one of claims 21 - 30, wherein the support device is configured to at least partially follow a rotation of the flexible supply structure about a vertical axis.

32. The supply device of claim 31, wherein the mounting structure comprises at least two flexures to allow rotation of the support element about the vertical axis.

33. The supply device of any one of claims 21 - 32, wherein the flexible supply structure comprises one or more supply hoses and / or supply cables.

34. The supply device of any one of claims 21 - 33, wherein the supplies comprise gas, liquid, electricity, control and / or measurement signals, and / or optical signals.

35. The supply device of any one of claims 21 - 34, wherein the flexible supply structure is arranged in a C-shape having a lower part, a middle part and an upper part, wherein at least the lower part is at least partially supported by the support device.

36. The supply device of any one of claims 21 - 35, wherein the mounting structure is arranged on the first object or the second object.

37. The supply device of any one of claims 21 - 36, wherein the supply device comprises multiple support devices for at least partly supporting the flexible supply structure, wherein each support device comprises:a support element to receive the flexible supply structure, anda mounting structure to mount the support element, wherein the mounting structure is configured to allow a movement of the support element in a second horizontal direction perpendicular to the first horizontal direction to at least partially follow a displacement of the flexible supply structure in the second horizontal direction.

38. A positioning module comprising:a first object;a second object, wherein the first object can be displaced with respect to the second object in a first horizontal direction; anda supply device according to any one of claims 21 - 37 for transferring supplies between the first object and the second object.

39. An exposure apparatus such as an lithographic apparatus comprising the positioning module of claim 38.

40. The exposure apparatus of claim 39, wherein the first object and / or the second object are part of a substrate support or a patterning device support.

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