Film forming device
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- NIKON CORP
- Filing Date
- 2026-03-16
- Publication Date
- 2026-06-29
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Figure 00000000_0000_ABST
Abstract
Claims
1. A film-forming apparatus for supplying a mist carrying a predetermined substance to the surface of an object to form a film of the predetermined substance on the surface of the object, A supply port for supplying the mist to the surface of the object, A mist diffusion unit is provided, which includes a wall surface located above the supply port, and sprays the mist onto the wall surface to diffuse the mist. The system includes a recovery unit provided between the wall surface and the supply port for recovering the liquid generated from the mist adhering to the wall surface, The supply port supplies the mist diffused by the mist diffusion unit to the surface of the object. The recovery unit is a film-forming apparatus that recovers the liquid flowing downward along the wall surface toward the supply port.
2. A film deposition apparatus according to Claim 1, The recovery unit has an opening for trapping the liquid, The aforementioned opening is a film-forming apparatus provided in the wall surface.
3. A film deposition apparatus according to claim 2, The supply port is formed to extend in a predetermined direction along the wall surface, intersecting the direction in which the mist is supplied. The aforementioned opening is formed extending in the predetermined direction, in a film deposition apparatus.
4. A film deposition apparatus according to claim 3, The aforementioned opening is a slit, in a film deposition apparatus.
5. A film deposition apparatus according to claim 2, A film deposition apparatus having multiple openings.
6. A film deposition apparatus according to claim 3, A film-forming apparatus wherein the opening is provided to be longer than the supply port in the predetermined direction.
7. A film deposition apparatus according to claim 3, The aforementioned opening is formed in a direction that intersects with the wall surface, in a film deposition apparatus.
8. A film deposition apparatus according to claim 2, The recovery section has a manifold section connected to the opening for storing the liquid, and is a film-forming apparatus.
9. A film deposition apparatus according to claim 8, The manifold portion is a film deposition apparatus positioned at the end of an extension from the opening in a direction intersecting the wall surface.
10. A film deposition apparatus according to claim 8, The film-forming apparatus comprises a recovery unit connected to the manifold unit and having an outlet for discharging the liquid outside the mist diffusion unit.
11. A film deposition apparatus according to claim 10, The aforementioned outlet is connected to the suction section. The suction unit is a film-forming apparatus that sucks up the liquid recovered in the recovery unit.
12. A film deposition apparatus according to claim 2, It has a second supply port for supplying mist to the mist diffusion section, The second supply port is located above the mist diffusion section of the film deposition apparatus.
13. A film deposition apparatus according to claim 12, The aforementioned wall surface has an inclination angle of 25° to 40° with respect to the mist supply direction of the second supply port, in a film deposition apparatus.