Color conversion substrate and display device

Abstract

A color conversion substrate is provided. The color conversion substrate includes a base substrate, a pattern layer located on the base substrate, a dam layer located on the side of the pattern layer away from the base substrate, the color conversion layer at least partially located in a plurality of first openings extending through the dam layer, and a light-transmitting layer at least partially located in a plurality of second openings extending through the dam layer. The pattern layer includes a plurality of pattern blocks, each of which protrudes away from the base substrate toward the dam layer.

Description

[Technical Field]

[0001] The present invention relates to a display technology, and more particularly to a color conversion substrate and a display device. [Background technology]

[0002] Quantum dot materials have excellent optical and electrical properties, including a narrow emission peak (half-width is approximately 30 nm), a tunable spectrum (ranging from visible to infrared light), high photochemical stability, and a low onset voltage. The wavelength of light emitted from quantum dot materials is tunable based, at least in part, on the particle size of the quantum dots. These excellent properties have made quantum dots a focus of research and development in the display technology field. Summary of the Invention [Means for solving the problem]

[0003] In one aspect, the present disclosure provides a color conversion substrate, comprising: a base substrate; a pattern layer located on the base substrate; a dam layer located on a side of the pattern layer away from the base substrate; a color conversion layer at least partially located in a plurality of first openings each extending through the dam layer; and a light-transmitting layer at least partially located in a plurality of second openings each extending through the dam layer, wherein the pattern layer comprises a plurality of pattern blocks, each pattern block in the plurality of pattern blocks protruding away from the base substrate toward the dam layer.

[0004] Optionally, the surface of the dam layer closest to the pattern layer has a conformal shape with the surface of the pattern layer closest to the dam layer.

[0005] Optionally, the pattern layer and the dam layer are at least partially located in a non-light-transmitting area, the pattern layer and the dam layer are at least partially absent in a plurality of light-transmitting areas, and an orthogonal projection of the dam layer on the base substrate at least partially overlaps with an orthogonal projection of each of the pattern blocks on the base substrate.

[0006] Optionally, the orthogonal projection of the surface of the dam layer closer to the pattern layer on the base substrate covers the orthogonal projection of the plurality of pattern blocks on the base substrate, and the area of ​​the orthogonal projection of the surface of the dam layer closer to the pattern layer on the base substrate is at least 1.2 times the area of ​​the orthogonal projection of the plurality of pattern blocks on the base substrate.

[0007] Optionally, each pattern block is in direct contact with the dam layer.

[0008] Optionally, the color conversion substrate further includes an intermediate layer, the intermediate layer being located on the side of the pattern layer away from the base substrate and on the side of the dam layer closer to the base substrate, each pattern block being in direct contact with the intermediate layer, and the intermediate layer being in direct contact with the dam layer.

[0009] Optionally, the intermediate layer is at least partially present in the non-light-transmitting areas and at least partially absent from the multiple light-transmitting areas, and the orthogonal projection of the intermediate layer on the base substrate does not at least partially overlap with the orthogonal projection of the color conversion layer on the base substrate and does not at least partially overlap with the orthogonal projection of the light-transmitting layer on the base substrate.

[0010] Optionally, the plurality of pattern blocks include a first adjacent pattern block and a second adjacent pattern block, and the first adjacent pattern block and the second adjacent pattern block are located in a portion of a non-light-transmitting region located between a first adjacent light-transmitting region and a second adjacent light-transmitting region in the plurality of light-transmitting regions.

[0011] Optionally, a portion of the dam layer at least partially extends into a gap located between the first adjacent pattern block and the second adjacent pattern block and is in direct contact with the first adjacent pattern block and the second adjacent pattern block.

[0012] Optionally, the color conversion substrate further includes an intermediate layer and a groove, the intermediate layer being located on the side of the first adjacent pattern block and the second adjacent pattern block away from the base substrate, the intermediate layer extending at least partially to the gap located between the first adjacent pattern block and the second adjacent pattern block and directly contacting the first adjacent pattern block and the second adjacent pattern block, the groove extending at least partially to a portion of the intermediate layer extending to the gap, and a portion of the dam layer extending at least partially to the groove and directly contacting the intermediate layer.

[0013] Optionally, each of the pattern blocks has a first side that contacts the base substrate, a second side that faces the first side, a third side that connects the first side and the second side, and a fourth side that connects the first side and the second side, and the third side and the fourth side face each other.

[0014] Optionally, the dam layer at least partially covers the second side, the third side, and the fourth side of each of the pattern blocks.

[0015] Optionally, the color conversion substrate further includes an intermediate layer located on a side of the corresponding pattern block away from the base substrate, the intermediate layer at least partially covering the second side, the third side, and the fourth side of each pattern block, and the dam layer at least partially covering one side of the portion of the intermediate layer covering the second side of each pattern block, at least partially covering one side of the portion of the intermediate layer covering the third side of each pattern block, and at least partially covering one side of the portion of the intermediate layer covering the fourth side of each pattern block.

[0016] Optionally, the intermediate layer has a first refractive index, the pattern layer has a second refractive index, and the base substrate has a third refractive index, the third refractive index being greater than the first refractive index, and the first refractive index being greater than the second refractive index.

[0017] Optionally, the first refractive index is in the range of 1.6 to 1.8, the second refractive index is in the range of 1.4 to 1.6, and the third refractive index is in the range of 1.80 to 1.90.

[0018] Optionally, each of the pattern blocks includes a reflective material.

[0019] Optionally, each of the pattern blocks comprises a metal material.

[0020] Optionally, each of the pattern blocks has an average thickness, and the dam layer has a third average thickness, and a ratio of the third average thickness to the average thickness is in the range of 2-10.

[0021] Optionally, the first adjacent pattern block has a first average thickness, the second adjacent pattern block has a second average thickness, the dam layer has a third average thickness, the ratio of the third average thickness to the first average thickness is in the range of 2 to 10, and the ratio of the third average thickness to the second average thickness is in the range of 2 to 10.

[0022] Optionally, the first adjacent pattern block and the second adjacent pattern block are spaced apart by a minimum distance, and in a cross section along a plane perpendicular to the base substrate and intersecting the first adjacent pattern block and the second adjacent pattern block, the first adjacent pattern block has a first width and the second adjacent pattern block has a second width, and the sum of the minimum distance, the first width and the second width is smaller than the maximum width of a portion of a pixel definition layer located between the first adjacent light-transmitting region and the second adjacent light-transmitting region in the plurality of light-transmitting regions in a display panel having the color conversion substrate.

[0023] In another aspect, the present disclosure provides a display device, comprising a color conversion substrate as described herein and a plurality of light-emitting elements positioned between a first base substrate and the patterned layer.

[0024] Optionally, the display device further includes a package layer that packages the plurality of light-emitting elements, the package layer including a first inorganic package sublayer, an organic package sublayer located on a side of the first inorganic package sublayer away from the plurality of light-emitting elements, and a second inorganic package sublayer located on a side of the organic package sublayer away from the plurality of light-emitting elements, and the pattern layer is in direct contact with the second package sublayer.

[0025] Optionally, the display device further comprises a pixel definition layer defining a plurality of sub-pixel apertures, the orthogonal projection of the pixel definition layer on the base substrate overlaying the orthogonal projection of the pattern layer on the base substrate.

[0026] In accordance with various disclosed embodiments, the following drawings are illustrative examples only and are not intended to limit the scope of the present invention. [Brief explanation of the drawings]

[0027] [Figure 1] 1A and 1B are schematic diagrams illustrating the structure of a display panel in some embodiments of the present disclosure. [Figure 2] FIG. 2 is a cross-sectional view taken along line AA' in FIG. [Figure 3] FIG. 2 is a plan view of a display panel in some embodiments of the present disclosure. [Figure 4] 1 is a cross-sectional view of a display panel in accordance with some embodiments of the present disclosure. [Figure 5] 1 is a cross-sectional view of a display panel in accordance with some embodiments of the present disclosure. [Figure 6A] 1A and 1B are schematic diagrams illustrating the structure of a light-emitting device according to some embodiments of the present disclosure. [Figure 6B] 1A and 1B are schematic diagrams illustrating the structure of a light-emitting device according to some embodiments of the present disclosure. [Figure 6C] 1A and 1B are schematic diagrams illustrating the structure of a light-emitting device according to some embodiments of the present disclosure. [Figure 7A] FIG. 2 is a schematic diagram illustrating the structure of a first color conversion block in some embodiments of the present disclosure. [Figure 7B]FIG. 2 is a schematic diagram illustrating the structure of a second color conversion block in some embodiments of the present disclosure. [Figure 7C] 1A and 1B are schematic diagrams illustrating the structure of a light-transmitting block in some embodiments of the present disclosure. [Figure 8] FIG. 10 is a diagram showing the correlation between the thickness of the color conversion layer and the quantum dot conversion rate in some embodiments of the present disclosure. [Figure 9] 1A and 1B are cross-sectional views of color conversion substrates according to some embodiments of the present disclosure. [Figure 10] 1 is a cross-sectional view of a display panel in accordance with some embodiments of the present disclosure. [Figure 11] 1A and 1B are cross-sectional views of color conversion substrates according to some embodiments of the present disclosure. [Figure 12] 1 is a cross-sectional view of a display panel in accordance with some embodiments of the present disclosure. [Figure 13A] FIG. 2 is a plan view of a color conversion substrate according to some embodiments of the present disclosure. [Figure 13B] FIG. 2 is a plan view of a color conversion substrate according to some embodiments of the present disclosure. [Figure 14] 1A-1C illustrate non-light-transmitting regions in some embodiments of the present disclosure. [Figure 15] FIG. 2 is a plan view of a color conversion substrate according to some embodiments of the present disclosure. [Figure 16] FIG. 2 is a plan view of a color conversion substrate according to some embodiments of the present disclosure. [Figure 17] FIG. 2 is a plan view of a color conversion substrate according to some embodiments of the present disclosure. [Figure 18] FIG. 2 is a plan view of a color conversion substrate according to some embodiments of the present disclosure. [Figure 19] FIG. 2 is a plan view of a color conversion substrate according to some embodiments of the present disclosure. [Figure 20] 1A and 1B are cross-sectional views of patterned layers in accordance with some embodiments of the present disclosure. [Figure 21] 1A and 1B are cross-sectional views of patterned layers in accordance with some embodiments of the present disclosure. [Figure 22] 1A and 1B are cross-sectional views of patterned layers in accordance with some embodiments of the present disclosure. [Figure 23] 1A and 1B are cross-sectional views of two adjacent pattern blocks according to some embodiments of the present disclosure. [Figure 24] FIG. 10 is a cross-sectional view of a portion of an intermediate layer positioned over two adjacent pattern blocks in some embodiments of the present disclosure. [Figure 25] 1A and 1B are cross-sectional views of a portion of a dam layer and a portion of an intermediate layer positioned over two adjacent pattern blocks in some embodiments of the present disclosure. [Figure 26] 1A and 1B are cross-sectional views of a portion of a dam layer and a portion of an intermediate layer positioned over two adjacent pattern blocks in some embodiments of the present disclosure. [Figure 27] FIG. 2 illustrates the optical paths in a color conversion substrate in some embodiments of the present disclosure. [Figure 28] 1A and 1B are cross-sectional views of color conversion substrates according to some embodiments of the present disclosure. [Figure 29] 1 is a cross-sectional view of a display panel in accordance with some embodiments of the present disclosure. [Figure 30] 1A and 1B are cross-sectional views of color conversion substrates according to some embodiments of the present disclosure. [Figure 31] FIG. 2 is a plan view of a color conversion substrate according to some embodiments of the present disclosure. [Figure 32] FIG. 2 is a plan view of a color conversion substrate according to some embodiments of the present disclosure. [Figure 33] FIG. 2 is a plan view of a color conversion substrate according to some embodiments of the present disclosure. [Figure 34] FIG. 2 is a plan view of a color conversion substrate according to some embodiments of the present disclosure. [Figure 35] 1A and 1B are cross-sectional views of patterned layers in accordance with some embodiments of the present disclosure. [Figure 36] 1A and 1B are cross-sectional views of patterned layers in accordance with some embodiments of the present disclosure. [Figure 37] 1A and 1B are cross-sectional views of patterned layers in accordance with some embodiments of the present disclosure. [Figure 38] 1A and 1B are cross-sectional views of two adjacent pattern blocks according to some embodiments of the present disclosure. [Figure 39] 1A and 1B are cross-sectional views of color conversion substrates according to some embodiments of the present disclosure. [Figure 40] 1A and 1B are cross-sectional views of color conversion substrates according to some embodiments of the present disclosure. [Figure 41] 1A-1C are cross-sectional views of corresponding pattern blocks according to some embodiments of the present disclosure. [Figure 42] 10A-10C are cross-sectional views of a portion of a dam layer positioned over a corresponding pattern block in some embodiments of the present disclosure. [Figure 43] 10A-10C are cross-sectional views of a portion of an intermediate layer positioned over a corresponding pattern block in some embodiments of the present disclosure. [Figure 44] 10A-10C are cross-sectional views of a portion of a dam layer and a portion of an intermediate layer positioned over corresponding pattern blocks in some embodiments of the present disclosure. [Figure 45] FIG. 2 illustrates the optical paths in a color conversion substrate in some embodiments of the present disclosure. [Figure 46] 1A-1C are cross-sectional views of corresponding pattern blocks according to some embodiments of the present disclosure. DETAILED DESCRIPTION OF THE INVENTION

[0028] The present disclosure will be more specifically described with reference to the following examples. It should be noted that the following description of some of the examples presented herein is for purposes of illustration and description only. They are not intended to be exhaustive or to be limited to the precise forms disclosed.

[0029] In particular, the present disclosure provides a color conversion substrate and a display device that substantially overcome one or more problems resulting from limitations or drawbacks of the prior art. In one aspect, the present disclosure provides a color conversion substrate. In some embodiments, the color conversion substrate includes a base substrate, a pattern layer disposed on the base substrate, a dam layer disposed on a side of the pattern layer away from the base substrate, the color conversion layer at least partially disposed in a plurality of first openings extending through the dam layer, and a light-transmitting layer at least partially disposed in a plurality of second openings extending through the dam layer. Optionally, the pattern layer includes a plurality of pattern blocks. Optionally, each pattern block in the plurality of pattern blocks protrudes away from the base substrate toward the dam layer.

[0030] Fig. 1 is a schematic diagram showing the structure of a display panel in some embodiments of the present disclosure. Fig. 2 is a cross-sectional view taken along line A-A' in Fig. 1. Referring to Figs. 1 and 2, in some embodiments, the display panel DP includes a light-emitting substrate LS, a color conversion substrate CS, and a spacer layer SL separating the light-emitting substrate LS and the color conversion substrate CS. The display panel DP includes a display area DA and a non-display area NDA.

[0031] FIG. 3 is a plan view of a display panel according to some embodiments of the present disclosure. Referring to FIG. 3 , in some embodiments, the display panel includes a plurality of subpixel regions SR and inter-subpixel regions ISR. As used herein, a subpixel region refers to a subpixel emissive region, e.g., a region corresponding to a pixel electrode in a liquid crystal display, a region corresponding to a light-emitting layer in a light-emitting diode display panel, or a region corresponding to a color conversion block in a display panel according to the present disclosure. Optionally, a pixel may include a plurality of individual emissive regions corresponding to a plurality of subpixels within the pixel. Optionally, a subpixel region is a red subpixel emissive region. Optionally, a subpixel region is a green subpixel emissive region. Optionally, a subpixel region is a blue subpixel emissive region. Optionally, a subpixel region is a white subpixel emissive region. As used herein, an inter-subpixel region refers to a region between adjacent subpixel regions, e.g., a region corresponding to a black matrix in a liquid crystal display, a region corresponding to a pixel definition layer in a light-emitting diode display panel, or a region corresponding to a dam layer in a display panel according to the present disclosure. Optionally, the inter-subpixel region is a region between adjacent subpixel regions in the same pixel. Optionally, the inter-subpixel region is a region between two adjacent subpixel regions of two adjacent pixels. Optionally, the inter-subpixel region is a region between a subpixel region of a red subpixel and a subpixel region of an adjacent green subpixel. Optionally, the inter-subpixel region is a region between a subpixel region of a red subpixel and a subpixel region of an adjacent blue subpixel. Optionally, the inter-subpixel region is a region between a subpixel region of a green subpixel and a subpixel region of an adjacent blue subpixel.

[0032] Various suitable embodiments can be implemented to manufacture the display panel of the present disclosure. In one example, the light-emitting substrate and the color-converting substrate are manufactured separately and then assembled using a filler layer to form the display panel. In another example, the color-converting substrate is manufactured directly on the light-emitting substrate.

[0033] 4 is a cross-sectional view of a display panel according to some embodiments of the present disclosure. Referring to FIG. 4, in some embodiments, the display panel includes a light-emitting substrate LS and a color conversion substrate CS. The light-emitting substrate LS and the color conversion substrate CS are assembled together. In some embodiments, the display panel further includes a filler layer FL positioned between the light-emitting substrate LS and the color conversion substrate CS, and the light-emitting substrate LS and the color conversion substrate CS are assembled to form the display panel.

[0034] 5 is a cross-sectional view of a display panel according to some embodiments of the present disclosure. Referring to FIG. 5, the display panel does not include a filler layer. The color conversion substrate CS is located directly on the light-emitting substrate LS, for example, directly on the surface of the second inorganic package sub-layer ENL3 of the light-emitting substrate LS.

[0035] 4 and 5, in some embodiments, the light-emitting substrate LS includes a first base substrate BS1, a plurality of thin-film transistors TFTs (e.g., transistors in pixel driving circuits) located on the first base substrate BS1, an insulating layer IN located on a side of the plurality of transistors TFTs away from the first base substrate BS1, a pixel definition layer PDL and a plurality of light-emitting elements LE located on a side of the insulating layer IN away from the first base substrate BS1, and a packaging layer TFE located on a side of the plurality of light-emitting elements LE and the pixel definition layer PDL away from the first base substrate BS1. Each light-emitting element in the plurality of light-emitting elements LE includes an anode AD, an emitting layer EL located on a side of the anode AD away from the first base substrate BS1, and a cathode CD located on a side of the emitting layer EL away from the first base substrate BS1. In one example, the packaging layer TFE includes a first inorganic package sub-layer ENL1, an organic package sub-layer ENL2 located on a side of the first inorganic package sub-layer ENL1 away from the first base substrate BS1, and a second inorganic package sub-layer ENL3 located on a side of the organic package sub-layer ENL2 away from the first base substrate BS1.

[0036] 4 and 5, in some embodiments, the color conversion substrate CS includes a dam layer BL that defines a plurality of openings, and a color conversion layer CCL and a light-transmitting layer LTL that are at least partially located within the plurality of openings defined by the dam layer BL. The color conversion layer CCL includes a plurality of color conversion blocks CCB. The light-transmitting layer LTL includes a plurality of light-transmitting blocks LTB.

[0037] In some embodiments, the color conversion substrate further includes a first cap layer CAP1 located on the side of the dam layer BL, the color conversion layer CCL, and the light transmitting layer LTL away from the base substrate BBS.

[0038] In some embodiments, the color conversion substrate CS further includes a color film CF positioned on the color conversion layer CCL and the light-transmitting layer LTL. The color film CF includes a plurality of color film blocks CFB. The orthogonal projection of each color film block CFB on the base substrate at least partially overlaps with the orthogonal projection of the corresponding color conversion block or the corresponding light-transmitting block on the base substrate. The orthogonal projections of adjacent color film blocks may partially overlap each other, for example, along edges.

[0039] In some embodiments, the color conversion substrate CS further includes a black matrix BM located on a side of the color film CF that is remote from the color conversion layer CCL and the light-transmitting layer LTL. The black matrix BM is located in the inter-subpixel region ISR. Each color film block, each color conversion block, or each light-transmitting block is at least partially located in an individual subpixel region. Optionally, the color conversion substrate CS includes a second cap layer CAP2 located on a side of the color film CF that is closer to the dam layer BL, the color conversion layer CCL, and the light-transmitting layer LTL. Optionally, the color conversion substrate CS includes a second cap layer CAP2 located on a side of the dam layer BL, the color conversion layer CCL, and the light-transmitting layer LTL that is remote from the color film CF.

[0040] In some embodiments, the light-transmitting layer LTL is a light-scattering layer and the plurality of light-transmitting blocks LTB are a plurality of light-scattering blocks.

[0041] In some embodiments, the display panel is a quantum dot display panel. In the quantum dot display panel, a light source (e.g., a blue light source) is used to excite the quantum dots to emit light based on the photoluminescence excitation principle. In some embodiments, the plurality of color conversion blocks CCB includes a first color conversion block and a second color conversion block. In one example, the first color conversion block is configured to convert light of a third color (e.g., blue light) into light of a first color (e.g., red light). In another example, the second color conversion block is configured to convert light of the third color (e.g., blue light) into light of a second color (e.g., green light). The plurality of light-transmitting blocks LTB do not convert the color of the incident light. Optionally, the plurality of light-transmitting blocks LTB are configured to scatter the incident light (e.g., blue light), which is then emitted through the color film block to display an image. The multiple color film blocks CFB include a first color film block (e.g., a red color film block) corresponding to the first color conversion block, a second color film block (e.g., a green color film block) corresponding to the second color conversion block, and a third color film block (e.g., a blue color film block) corresponding to the light transmission block.

[0042] Various suitable light-emitting elements can be implemented in display panels according to the present disclosure. Figure 6A is a schematic diagram illustrating the structure of a light-emitting element in some embodiments of the present disclosure. Referring to Figure 6A, in some embodiments, the light-emitting element includes an anode AD, a hole-transporting layer HTL disposed on the anode AD, a first light-emitting layer EML1 disposed on a side of the hole-transporting layer HTL remote from the anode AD, an electron-transporting layer ETL disposed on a side of the first light-emitting layer EML1 remote from the hole-transporting layer HTL, and a cathode CD disposed on a side of the electron-transporting layer ETL remote from the first light-emitting layer EML1.

[0043] In some embodiments, the light-emitting device may have a stacked structure. Figure 6B is a schematic diagram illustrating the structure of a light-emitting device according to some embodiments of the present disclosure. Referring to Figure 6B, the light-emitting device includes an anode AD, a hole-transporting layer HTL disposed on the anode AD, a first emissive layer EML1 disposed on the hole-transporting layer HTL on a side of the hole-transporting layer HTL that is remote from the anode AD, a first charge-generating layer CGL1 disposed on the first emissive layer EML1 on a side of the first emissive layer EML1 that is remote from the hole-transporting layer HTL, a second emissive layer EML2 disposed on the first charge-generating layer CGL1 on a side of the second emissive layer EML2 that is remote from the first charge-generating layer CGL1, an electron-transporting layer ETL disposed on the second emissive layer EML2 on a side of the electron-transporting layer EML2 that is remote from the first charge-generating layer CGL1, and a cathode CD disposed on the electron-transporting layer ETL on a side of the second emissive layer EML2 that is remote from the second emissive layer EML2.

[0044] 6C is a schematic diagram illustrating a structure of a light-emitting device according to some embodiments of the present disclosure. Referring to FIG. 6C, the light-emitting device includes an anode AD, a hole-transport layer HTL disposed on the anode AD, a first emissive layer EML1 disposed on a side of the hole-transport layer HTL away from the anode AD, a first charge generation layer CGL1 disposed on a side of the first emissive layer EML1 away from the hole-transport layer HTL, a second emissive layer EML2 disposed on a side of the first charge generation layer CGL1 away from the first emissive layer EML1, a second charge generation layer CGL2 disposed on a side of the second emissive layer EML2 away from the first charge generation layer CGL1, a third emissive layer EML3 disposed on a side of the second charge generation layer CGL2 away from the second emissive layer EML2, an electron-transport layer ETL disposed on a side of the third emissive layer EML3 away from the second charge generation layer CGL2, and a cathode CD disposed on a side of the electron-transport layer ETL away from the second emissive layer EML3.

[0045] FIG. 7A is a schematic diagram illustrating the structure of a first color conversion block in some embodiments of the present disclosure. Referring to FIG. 7A, the first color conversion block CCB1 is a color conversion block that converts light of a third color (e.g., blue light) into light of a first color (e.g., red light). In some embodiments, the first color conversion block CCB1 includes a first matrix MS1, a plurality of first scattering particles SP1 dispersed in the first matrix MS1, and a plurality of first quantum dots QD1. The first matrix MS1 may include a polymer material, such as an organic polymer material. Examples of suitable polymer materials for preparing the first matrix MS1 include epoxy resin, acrylic resin, polyurethane resin, organic silicone resin, and silane resin. Examples of suitable materials for preparing the plurality of first scattering particles SP1 include TiO2, ZnO, ZrO2, Al2O3, and SiO2. Examples of suitable quantum dot materials for manufacturing the plurality of first quantum dots QD1 include quantum dot materials of a first color (e.g., red). The quantum dot material comprises a material selected from the group consisting of CdS, CdSe, ZnSe, InP, PbS, CsPbCl, CsPbBr, CsPhI, CdS / ZnS, CdSe / ZnS, InP / ZnS, PbS / ZnS, CsPbCl / ZnS, CsPbBr / ZnS and CsPhI / ZnS.

[0046] FIG. 7B is a schematic diagram illustrating the structure of a second color conversion block in some embodiments of the present disclosure. Referring to FIG. 7B, the second color conversion block CCB2 is a color conversion block that converts light of a third color (e.g., blue light) into light of a second color (e.g., green light). In some embodiments, the second color conversion block CCB2 includes a second matrix MS2, a plurality of second scattering particles SP2 dispersed in the second matrix MS2, and a plurality of second quantum dots QD2. The second matrix MS2 may include a polymer material, such as an organic polymer material. Examples of suitable polymer materials for preparing the second matrix MS2 include epoxy resin, acrylic resin, polyurethane resin, organic silicone resin, and silane resin. Examples of suitable materials for preparing the plurality of second scattering particles SP2 include TiO2, ZnO, ZrO2, Al2O3, and SiO2. Examples of suitable quantum dot materials for manufacturing the plurality of second quantum dots QD2 include quantum dot materials of a second color (e.g., green). The quantum dot material comprises a material selected from the group consisting of CdS, CdSe, ZnSe, InP, PbS, CsPbCl, CsPbBr, CsPhI, CdS / ZnS, CdSe / ZnS, InP / ZnS, PbS / ZnS, CsPbCl / ZnS, CsPbBr / ZnS and CsPhI / ZnS.

[0047] 7C is a schematic diagram illustrating the structure of a light-transmitting block according to some embodiments of the present disclosure. Referring to FIG. 7C, in some embodiments, the light-transmitting block LTB includes a third matrix MS3 and a plurality of third scattering particles SP3 dispersed in the third matrix MS3. The third matrix MS3 may include a polymeric material, such as an organic polymeric material. Examples of suitable polymeric materials for preparing the third matrix MS3 include epoxy resin, acrylic resin, polyurethane resin, organic silicone resin, and silane resin. Examples of suitable materials for preparing the plurality of third scattering particles SP3 include TiO2, ZnO, ZrO2, Al2O3, and SiO2.

[0048] In one example, the first matrix MS1, the second matrix MS2, and the third matrix MS3 comprise the same polymeric material, while in another example, at least two of the first matrix MS1, the second matrix MS2, and the third matrix MS3 comprise different polymeric materials.

[0049] In one example, the first, second and third scattering particles SP1, SP2 and SP3 comprise the same scattering material, while in another example, at least two of the first, second and third scattering particles SP1, SP2 and SP3 comprise different scattering materials.

[0050] FIG. 8 shows the correlation between the thickness of the color conversion layer and the quantum dot conversion rate in some embodiments of the present disclosure. The inventors of the present disclosure have found that the quantum dot conversion rate is correlated with the thickness of the color conversion layer. Generally, the quantum dot conversion rate increases with the thickness of the color conversion layer. Due to limitations on the materials used to manufacture the color conversion layer, the maximum thickness of the color conversion layer in the associated color conversion substrate is typically only about 10 μm, which is less than the optimal thickness value for achieving the maximum quantum dot conversion rate.

[0051] The inventors of the present disclosure have discovered that in related color conversion substrates, the dam layer is prone to peeling due to insufficient adhesion between the dam layer and the layer below it (usually the packaging layer). The inventors of the present disclosure have surprisingly and unexpectedly discovered that the fine structure of the color conversion substrate significantly improves the performance of the color conversion substrate. The unique structure of the color conversion substrate of the present disclosure significantly increases the contact area between the dam layer and the underlying structure. The color conversion substrate can deposit a color conversion layer with a large thickness and improved luminous efficiency. Furthermore, the color conversion substrate has a higher quantum dot conversion rate.

[0052] 9 is a cross-sectional view of a color conversion substrate according to some embodiments of the present disclosure. Referring to FIG. 9, in some embodiments, the color conversion substrate includes a pattern layer PTN located on a base substrate BBS, a dam layer BL located on a side of the pattern layer PTN away from the base substrate BBS, a plurality of first openings AP1 and a plurality of second openings AP2 extending through the dam layer BL, a color conversion layer CCL located at least partially in the plurality of first openings AP1, and a light transmitting layer LTL located at least partially in the plurality of second openings AP2.

[0053] In some embodiments, the color conversion substrate further includes a first cap layer CAP1 located on the side of the dam layer BL, the color conversion layer CCL, and the light transmitting layer LTL away from the base substrate BBS.

[0054] In some embodiments, the color conversion substrate further includes a color film CF located on the side of the color conversion layer CCL and the light-transmitting layer LTL that is away from the base substrate BBS. In some embodiments, the color film CF includes multiple color film blocks (e.g., a first color film block CFB1, a second color film block CFB2, and a third color film block CFB3). The orthogonal projection of each color film block CFB on the base substrate at least partially overlaps with the orthogonal projection of the corresponding color conversion block or the corresponding light-scattering block on the base substrate. The orthogonal projections of adjacent color film blocks may partially overlap each other, for example, along edges.

[0055] In some embodiments, the color conversion substrate further includes a color film CF located on the color conversion layer CCL and the light scattering layer LSL.

[0056] Depending on the application scenario, various appropriate layers can be realized as the base substrate BBS. For example, referring to FIG. 4 or FIG. 5, in some embodiments, the base substrate BBS may be a second cap layer CAP2. For another example, in some embodiments, the base substrate BBS may be a second inorganic package sub-layer ENL3. FIG. 10 is a cross-sectional view of a display panel in some embodiments of the present disclosure. Referring to FIG. 10, the pattern layer PTN is located on the second package sub-layer ENL3 (corresponding to the base substrate BBS in FIG. 9). In one example, the pattern layer PTN is in direct contact with the second package sub-layer ENL3.

[0057] 11 is a cross-sectional view of a color conversion substrate according to some embodiments of the present disclosure. Referring to FIG. 11, in some embodiments, the color conversion substrate includes a pattern layer PTN located on a base substrate BBS, an intermediate layer IML located on a side of the pattern layer PTN away from the base substrate BBS, a dam layer BL located on a side of the intermediate layer IML away from the base substrate BBS, a plurality of first openings AP1 and a plurality of second openings AP2 extending through the dam layer BL, a color conversion layer CCL located at least partially in the plurality of first openings AP1, and a light transmitting layer LTL located at least partially in the plurality of second openings AP2.

[0058] 12 is a cross-sectional view of a display panel according to some embodiments of the present disclosure. Referring to FIG. 12, the pattern layer PTN is located on the second package sub-layer ENL3 (corresponding to the base substrate BBS in FIG. 11). In one example, the pattern layer PTN is in direct contact with the second package sub-layer ENL3.

[0059] In one particular example, the intermediate layer IML is an additional package sub-layer, as shown in FIG.

[0060] In some embodiments, the color conversion substrate includes a plurality of sub-pixels. In some embodiments, the color conversion substrate includes a plurality of light-transmitting regions and non-light-transmitting regions. Optionally, the light-transmitting regions are the same as the sub-pixel regions SR shown in FIG. 4 or 5, and the non-light-transmitting regions are the same as the inter-sub-pixel regions ISR shown in FIG. 4 or 5.

[0061] 9 to 12, the plurality of subpixels include a first subpixel sp1, a second subpixel sp2, and a third subpixel sp3. As shown in FIGS. 9 to 12, the plurality of light-transmitting regions include a first light-transmitting region LTR1 located in the first subpixel sp1, a second light-transmitting region LTR2 located in the second subpixel sp2, a third light-transmitting region LTR3 located in the third subpixel sp3, and a non-light-transmitting region NTR. In some embodiments, the pattern layer PTN is at least partially located in the non-light-transmitting region NTR. Optionally, the pattern layer PTN is completely located in the non-light-transmitting region NTR. The intermediate layer IML is at least partially located in the non-light-transmitting region NTR. Optionally, the intermediate layer IML is at least partially located in the non-light-transmitting region NTR and at least partially located in the light-transmitting region (e.g., the first light-transmitting region LTR1, the second light-transmitting region LTR2, and the third light-transmitting region LTR3).

[0062] In some embodiments, the black matrix BM is at least partially located in the non-light-transmitting region NTR. Optionally, the black matrix BM is completely located in the non-light-transmitting region NTR.

[0063] In some embodiments, the dam layer BL is at least partially located in the non-light-transmitting region NTR. Optionally, the dam layer BL is completely located in the non-light-transmitting region NTR.

[0064] In some embodiments, each of the plurality of color film blocks is at least partially located in a corresponding light-transmitting region of the plurality of light-transmitting regions, and optionally, at least 80% (e.g., at least 85%, at least 90%, at least 95%, at least 99%, or 100%) of each of the color film blocks is located in the corresponding light-transmitting region.

[0065] In some embodiments, each color conversion block of the plurality of color conversion blocks is at least partially located in a first discrete light-transmitting region of the plurality of light-transmitting regions, and optionally, at least 80% (e.g., at least 85%, at least 90%, at least 95%, at least 99%, or 100%) of each color conversion block is located in the first discrete light-transmitting region.

[0066] In some embodiments, each light-transmitting block of the plurality of light-transmitting blocks is at least partially located in a second discrete light-transmitting region of the plurality of light-transmitting regions, and optionally, at least 80% (e.g., at least 85%, at least 90%, at least 95%, at least 99%, or 100%) of each light-transmitting block is located in the second discrete light-transmitting region.

[0067] 9-12, in some embodiments, the orthogonal projection of the pixel definition layer PDL on the base substrate BBS at least partially overlaps with the orthogonal projection of the pattern layer PTN on the base substrate BBS. Optionally, the orthogonal projection of the pixel definition layer PDL on the base substrate BBS covers the orthogonal projection of the pattern layer PTN on the base substrate BBS.

[0068] In some embodiments, the orthogonal projection of the dam layer BL on the base substrate BBS at least partially overlaps the orthogonal projection of the pattern layer PTN on the base substrate BBS. Optionally, the orthogonal projection of the dam layer BL on the base substrate BBS covers the orthogonal projection of the pattern layer PTN on the base substrate BBS.

[0069] In some embodiments, the orthogonal projection of the black matrix BM on the base substrate BBS at least partially overlaps the orthogonal projection of the pattern layer PTN on the base substrate BBS. Optionally, the orthogonal projection of the black matrix BM on the base substrate BBS covers the orthogonal projection of the pattern layer PTN on the base substrate BBS.

[0070] FIG. 13A is a plan view of a color conversion substrate according to some embodiments of the present disclosure. With reference to FIGS. 9 to 13A, in some embodiments, the pattern layer PTN includes a plurality of pattern blocks PTB. Each pattern block of the plurality of pattern blocks PTB protrudes away from the base substrate BBS, for example, protrudes toward the dam layer BL. With reference to FIGS. 9 and 10, in some embodiments, each pattern block is in direct contact with the dam layer BL. With reference to FIGS. 11 and 12, in some embodiments, each pattern block is in direct contact with the intermediate layer IML, and the intermediate layer IML is in direct contact with the dam layer BL.

[0071] FIG. 14 illustrates a non-light-transmitting region in some embodiments of the present disclosure. Referring to FIG. 14 , in some embodiments, the non-light-transmitting region NTR includes a plurality of row portions RP and a plurality of column portions CP. The plurality of row portions RP and the plurality of column portions CP intersect with each other to form a plurality of intersection portions isp. The non-light-transmitting region NTR includes a plurality of first portions p1. Each first portion of the plurality of first portions p1 of the non-light-transmitting region NTR is located between two adjacent light-transmitting regions in a plurality of light-transmitting regions arranged along a first direction DR1. The non-light-transmitting region NTR includes a plurality of second portions p2. Each second portion of the plurality of second portions p2 of the non-light-transmitting region NTR is located between two adjacent light-transmitting regions in a plurality of light-transmitting regions arranged along a second direction DR2.

[0072] The pattern blocks PTB may be arranged in various suitable ways. With reference to Figures 13A and 14, in some embodiments, the pattern blocks PTB are at least partially located in the column portions CP. In some embodiments, the pattern blocks PTB are at least partially absent from the row portions RP. Optionally, the pattern blocks PTB are absent from the row portions RP, except for the intersection portions isp.

[0073] In some embodiments, the plurality of pattern blocks PTB are at least partially located in the plurality of first portions p1 of the non-light-transmitting region NTR. Optionally, the plurality of pattern blocks PTB are at least partially located in the plurality of first portions p1 of the non-light-transmitting region NTR and at least partially located in the plurality of intersection portions isp of the non-light-transmitting region NTR. Optionally, the plurality of pattern blocks PTB are at least partially absent from the plurality of second portions p2. Optionally, the plurality of pattern blocks PTB are not present at all in the plurality of second portions p2.

[0074] In some embodiments, the plurality of pattern blocks PTB includes a plurality of first arrays, each of which is located in a corresponding column portion of the plurality of column portions CP. In some embodiments, the pattern blocks in each of the first arrays are arranged in a plurality of rows and a plurality of columns. Optionally, the pattern blocks in each column are arranged along the second direction DR2, and the pattern blocks in each row are arranged along the first direction DR1. Optionally, each of the first arrays includes two columns of pattern blocks.

[0075] In some embodiments, the pattern blocks located in the corresponding first array in each column portion have mirror symmetry with respect to a plane perpendicular to the base substrate and parallel to the second direction DR2, and in some embodiments, the rows of pattern blocks located in the corresponding first array in each column portion have translation symmetry along the first direction DR1.

[0076] 13B is a plan view of a color conversion substrate in some embodiments of the present disclosure. Referring to FIGS. 13B and 14, in some embodiments, the plurality of pattern blocks PTB are at least partially located in the plurality of first portions p1. Optionally, the plurality of pattern blocks PTB are at least partially absent from the plurality of second portions p2. Optionally, the plurality of pattern blocks PTB are at least partially absent from the plurality of intersection portions isp. As shown in FIG. 13B, the plurality of pattern blocks PTB are not present in the plurality of second portions p2 and are not present in the plurality of intersection portions isp.

[0077] 15 is a plan view of a color conversion substrate according to some embodiments of the present disclosure. Referring to FIGS. 15 and 14, in some embodiments, the pattern blocks PTB are at least partially located in the row portions RP. In some embodiments, the pattern blocks PTB are at least partially absent from the column portions CP. Optionally, the pattern blocks PTB are absent from the column portions CP, except for the intersection portions isp.

[0078] In some embodiments, the plurality of pattern blocks PTB are at least partially located in the plurality of second portions p2 of the non-light-transmitting region NTR. Optionally, the plurality of pattern blocks PTB are at least partially located in the plurality of second portions p2 of the non-light-transmitting region NTR and at least partially located in the plurality of intersection portions isp of the non-light-transmitting region NTR. Optionally, the plurality of pattern blocks PTB are at least partially absent from the plurality of first portions p1. Optionally, the plurality of pattern blocks PTB are not present at all in the plurality of first portions p1.

[0079] In some embodiments, the plurality of pattern blocks PTB includes a plurality of second arrays, each of which is located in a corresponding row portion of the plurality of row portions RP. In some embodiments, the pattern blocks in each second array are arranged in a plurality of rows and a plurality of columns. Optionally, the pattern blocks in each column are arranged along the second direction DR2, and the pattern blocks in each row are arranged along the first direction DR1. Optionally, each second array includes two rows of pattern blocks.

[0080] In some embodiments, the pattern blocks located in the corresponding second array in each row portion have mirror symmetry with respect to a plane perpendicular to the base substrate and parallel to the first direction DR1, and in some embodiments, the rows of the pattern blocks located in the corresponding second array in each row portion have translation symmetry along the second direction DR2.

[0081] 16 is a plan view of a color conversion substrate according to some embodiments of the present disclosure. Referring to FIGS. 16 and 14, in some embodiments, the pattern blocks PTB are at least partially located in the column portions CP. In some embodiments, the pattern blocks PTB are at least partially absent from the row portions RP. Optionally, the pattern blocks PTB are absent from the row portions RP, except for the intersection portions isp.

[0082] In some embodiments, the plurality of pattern blocks PTB are at least partially located in the plurality of first portions p1 of the non-light-transmitting region NTR. Optionally, the plurality of pattern blocks PTB are at least partially located in the plurality of first portions p1 of the non-light-transmitting region NTR and at least partially located in the plurality of intersection portions isp of the non-light-transmitting region NTR. Optionally, the plurality of pattern blocks PTB are at least partially absent from the plurality of second portions p2. Optionally, the plurality of pattern blocks PTB are not present at all in the plurality of second portions p2.

[0083] In some embodiments, the plurality of pattern blocks PTB includes a plurality of first arrays, each of which is located in a corresponding column portion of the plurality of column portions CP. In some embodiments, the pattern blocks in each of the first arrays are arranged in a plurality of columns. Optionally, the pattern blocks in each column are arranged along the second direction DR2. Optionally, each of the first arrays includes two columns of pattern blocks. In some embodiments, the pattern blocks in two adjacent columns in each of the first arrays are interleaved with respect to each other. Optionally, the corresponding first arrays located in each column portion do not have mirror symmetry with respect to a plane perpendicular to the base substrate and parallel to the second direction DR2.

[0084] 17 is a plan view of a color conversion substrate according to some embodiments of the present disclosure. Referring to FIG. 17 and FIG. 14, in some embodiments, the pattern blocks PTB are at least partially located in the row portions RP. In some embodiments, the pattern blocks PTB are at least partially absent from the column portions CP. Optionally, the pattern blocks PTB are absent from the column portions CP, except for the intersection portions isp.

[0085] In some embodiments, the plurality of pattern blocks PTB are at least partially located in the plurality of second portions p2 of the non-light-transmitting region NTR. Optionally, the plurality of pattern blocks PTB are at least partially located in the plurality of second portions p2 of the non-light-transmitting region NTR and at least partially located in the plurality of intersection portions isp of the non-light-transmitting region NTR. Optionally, the plurality of pattern blocks PTB are at least partially absent from the plurality of first portions p1. Optionally, the plurality of pattern blocks PTB are not present at all in the plurality of first portions p1.

[0086] In some embodiments, the plurality of pattern blocks PTB includes a plurality of second arrays, each of which is located in a corresponding row portion of the plurality of row portions RP. In some embodiments, the pattern blocks in each second array are arranged in a plurality of rows. Optionally, the pattern blocks in each row are arranged along the first direction DR1. Optionally, each second array includes two rows of pattern blocks. In some embodiments, the pattern blocks in two adjacent rows in each second array are interleaved with respect to each other. Optionally, the corresponding second array located in each row portion does not have mirror symmetry with respect to a plane perpendicular to the base substrate and parallel to the first direction DR1.

[0087] 18 is a plan view of a color conversion substrate according to some embodiments of the present disclosure. Referring to FIG. 18 and FIG. 14, in some embodiments, the plurality of pattern blocks PTB are at least partially located in the plurality of column portions CP and at least partially located in the plurality of row portions RP. In some embodiments, the plurality of pattern blocks PTB are at least partially located in the plurality of first portions p1 of the non-light-transmitting region NTR and at least partially located in the plurality of second portions p2. Optionally, the plurality of pattern blocks PTB are at least partially located in the plurality of intersection portions isp of the non-light-transmitting region NTR.

[0088] In some embodiments, the plurality of pattern blocks PTB includes a plurality of third arrays, each of which is located in a corresponding first portion p1 of the plurality of first portions p1. In some embodiments, the pattern blocks in each of the third arrays are arranged in a plurality of rows and a plurality of columns. Optionally, the pattern blocks in each column are arranged along the second direction DR2, and the pattern blocks in each row are arranged along the first direction DR1. Optionally, each of the third arrays includes two columns of pattern blocks.

[0089] In some embodiments, the pattern blocks located in the corresponding third array in each column portion have mirror symmetry with respect to a plane perpendicular to the base substrate and parallel to the second direction DR2, and in some embodiments, the columns of the pattern blocks located in the corresponding third array in each column portion have translation symmetry along the first direction DR1.

[0090] In some embodiments, the plurality of pattern blocks PTB includes a plurality of fourth arrays, each of which is located in a corresponding second portion p2 of the plurality of second portions p2. In some embodiments, the pattern blocks in each fourth array are arranged in a plurality of rows and a plurality of columns. Optionally, the pattern blocks in each column are arranged along the second direction DR2, and the pattern blocks in each row are arranged along the first direction DR1. Optionally, each fourth array includes two rows of pattern blocks.

[0091] In some embodiments, the pattern blocks located in the corresponding fourth array in each second portion have mirror symmetry with respect to a plane perpendicular to the base substrate and parallel to the first direction DR1, and in some embodiments, the rows of the pattern blocks located in the corresponding fourth array in each row portion have translation symmetry along the second direction DR2.

[0092] 19 is a plan view of a color conversion substrate according to some embodiments of the present disclosure. Referring to FIG. 19 and FIG. 14, in some embodiments, the plurality of pattern blocks PTB are at least partially located in the plurality of column portions CP and at least partially located in the plurality of row portions RP. In some embodiments, the plurality of pattern blocks PTB are at least partially located in the plurality of first portions p1 of the non-light-transmitting region NTR and at least partially located in the plurality of second portions p2. Optionally, the plurality of pattern blocks PTB are at least partially located in the plurality of intersection portions isp of the non-light-transmitting region NTR.

[0093] In some embodiments, the plurality of pattern blocks PTB includes a plurality of third arrays, and each of the plurality of third arrays is located in a corresponding first portion of the plurality of first portions p1. In some embodiments, the pattern blocks in each of the third arrays are arranged in a plurality of columns. Optionally, the pattern blocks in each column are arranged along the second direction DR2. Optionally, each of the third arrays includes two columns of pattern blocks. In some embodiments, the pattern blocks in two adjacent columns in each of the first arrays are interleaved with each other. Optionally, the corresponding third array located in each column does not have mirror symmetry with respect to a plane perpendicular to the base substrate and parallel to the second direction DR2.

[0094] In some embodiments, the plurality of pattern blocks PTB includes a plurality of fourth arrays, and each fourth array of the plurality of fourth arrays is located in a corresponding second portion of the plurality of second portions p2. In some embodiments, the pattern blocks in each fourth array are arranged in a plurality of rows. Optionally, the pattern blocks in each row are arranged along the first direction DR1. Optionally, each fourth array includes two rows of pattern blocks. In some embodiments, the pattern blocks in two adjacent rows in each fourth array are interleaved with each other. Optionally, the corresponding fourth array located in each row does not have mirror symmetry with respect to a plane perpendicular to the base substrate and parallel to the first direction DR1.

[0095] Each pattern block can have a variety of suitable shapes. In one example, with reference to Figures 9-12, each pattern block has a rectangular shape in a cross section taken along a plane perpendicular to the base substrate BBS and intersecting two adjacent pattern blocks in the plurality of pattern blocks PTB. Figure 20 is a cross-sectional view of a pattern layer in some embodiments of the present disclosure. In some embodiments, with reference to Figure 20, each pattern block has a trapezoidal shape in a cross section taken along a plane perpendicular to the base substrate BBS and intersecting two adjacent pattern blocks in the plurality of pattern blocks PTB.

[0096] 21 is a cross-sectional view of a pattern layer in some embodiments of the present disclosure. In some embodiments, referring to FIG. 21, in a cross section along a plane perpendicular to the base substrate BBS and intersecting two adjacent pattern blocks in the plurality of pattern blocks PTB, each pattern block has a triangular shape.

[0097] 22 is a cross-sectional view of a pattern layer according to some embodiments of the present disclosure. In some embodiments, referring to FIG. 22, each pattern block has a sawtooth surface on the side away from the base substrate BBS. By providing a sawtooth surface, the contact area between the dam layer BL and the underlying layer increases, allowing for better adhesion of the dam layer BL.

[0098] In a cross section along a plane perpendicular to the base substrate BBS and intersecting two adjacent pattern blocks in the plurality of pattern blocks PTB, examples of other suitable shapes of each pattern block include an inverted trapezoid, a square, a partial circle shape, etc.

[0099] Each pattern block may have a variety of suitable three-dimensional shapes, examples of which include a cylinder, a cone, a cube, a rectangular parallelepiped, a hexagonal prism, a triangular prism, a tetrahedron, and a pyramid.

[0100] In some embodiments, the plurality of pattern blocks PTB have the same shape. For example, in a cross section along a plane perpendicular to the base substrate BBS and intersecting two adjacent pattern blocks in the plurality of pattern blocks PTB, the plurality of pattern blocks PTB have the same shape. Optionally, the pattern blocks located in two adjacent columns have the same shape. Optionally, the pattern blocks located in two adjacent rows have the same shape.

[0101] In some embodiments, at least two pattern blocks in the plurality of pattern blocks PTB have different shapes. For example, in a cross section along a plane perpendicular to the base substrate BBS and intersecting two adjacent pattern blocks in the plurality of pattern blocks PTB, at least two pattern blocks in the plurality of pattern blocks PTB have different shapes. Optionally, pattern blocks located in two adjacent columns have different shapes. Optionally, pattern blocks located in two adjacent rows have different shapes.

[0102] FIG. 23 is a cross-sectional view of two adjacent pattern blocks in some embodiments of the present disclosure. Referring to FIG. 23, the two adjacent pattern blocks include a first adjacent pattern block PTB1 and a second adjacent pattern block PTB2. In one example, the first adjacent pattern block PTB1 and the second adjacent pattern block PTB2 are located in the same column portion. In an alternative example, the first adjacent pattern block PTB1 and the second adjacent pattern block PTB2 are located in the same row portion. In an alternative example, the first adjacent pattern block PTB1 and the second adjacent pattern block PTB2 are located in the same intersection portion. In an alternative example, the first adjacent pattern block PTB1 and the second adjacent pattern block PTB2 are located in the same first portion. In an alternative example, the first adjacent pattern block PTB1 and the second adjacent pattern block PTB2 are located in the same second portion.

[0103] In some embodiments, the first adjacent pattern block PTB1 and the second adjacent pattern block PTB2 are spaced apart by a minimum distance d. In some embodiments, the first adjacent pattern block PTB1 has a first average thickness t1. In some embodiments, the second adjacent pattern block PTB2 has a second average thickness t2. In some embodiments, in a cross section along a plane perpendicular to the base substrate BBS and intersecting the first adjacent pattern block PTB1 and the second adjacent pattern block PTB2, the first adjacent pattern block PTB1 has a first width w1 and the second adjacent pattern block PTB2 has a second width w2. In some embodiments, in a cross section along a plane perpendicular to the base substrate BBS and intersecting the first adjacent pattern block PTB1 and the second adjacent pattern block PTB2, a portion of the pixel defining layer PDL located between the first adjacent light-transmitting region ALTR1 and the second adjacent light-transmitting region ALTR2 of the plurality of light-transmitting regions has a maximum width w3.

[0104] In one example, w1 and w2 are essentially the same. In an alternative example, w1 and w2 are different from one another.

[0105] In one example, 1 μm≦w1≦10 μm, 1 μm≦w2≦10 μm, and 1 μm≦d≦10 μm.

[0106] In one example, t1 and t2 are essentially the same. In an alternative example, t1 and t2 are different from one another.

[0107] In one example, 1 μm≦t1≦5 μm and 1 μm≦t2≦5 μm.

[0108] In some embodiments, the sum of w1, w2, and d is less than w3.

[0109] In some embodiments, the dam layer has an average thickness t3. In some embodiments, 2≦t3 / t1≦10, e.g., 2≦t3 / t1≦3, 3≦t3 / t1≦4, 4≦t3 / t1≦5, 5≦t3 / t1≦6, 6≦t3 / t1≦7, 7≦t3 / t1≦8, 8≦t3 / t1≦9, or 9≦t3 / t1≦10. In some embodiments, 2≦t3 / t2≦10, e.g., 2≦t3 / t2≦3, 3≦t3 / t2≦4, 4≦t3 / t2≦5, 5≦t3 / t2≦6, 6≦t3 / t2≦7, 7≦t3 / t2≦8, 8≦t3 / t2≦9, or 9≦t3 / t2≦10.

[0110] 9-12 and 23, in a cross section along a plane perpendicular to the base substrate BBS and intersecting the plurality of pattern blocks PTB, the pattern block closest to the corresponding light-transmitting block in the plurality of light-transmitting blocks LTB has a first average thickness t1, and the pattern block closest to the corresponding color conversion block in the plurality of color conversion blocks (e.g., the first color conversion block CCB1 or the second color conversion block CCB2) has a second average thickness t2. Optionally, t1 and t2 are different from each other. In one example, t1>t2. In another example, t2>t1.

[0111] Various suitable materials and manufacturing methods can be used to form the multiple pattern block PTBs. Examples of suitable materials for manufacturing the multiple pattern block PTBs include organic insulating materials, metallic materials, inorganic insulating materials, reflective materials, or any combination thereof. Examples of organic insulating materials for manufacturing the multiple pattern block PTBs include methacrylate esters, cinnamate esters, polyurethane resins, silicone resins, and silane resins. Examples of metallic materials for manufacturing the multiple pattern block PTBs include aluminum, silver, gold, and copper. The multiple pattern block PTBs can be formed by photolithography, imprinting, nanoimprinting, and sputtering.

[0112] In some embodiments, the surface of the pattern blocks PTB can be treated to increase its roughness, thereby increasing the contact area with the layer located on top of the pattern blocks PTB. In particular, when a dam layer is formed to directly contact the pattern blocks PTB, the increased roughness of the surface of the pattern blocks PTB can increase the contact area between the dam layer and the pattern blocks PTB, thereby increasing the adhesion between the dam layer and the pattern layer PTN. The surface of the pattern blocks PTB can be treated, for example, by plasma treatment or ultraviolet ozone treatment.

[0113] In some embodiments, the refractive index of the plurality of pattern blocks PTB is in the range of 1.4 to 1.6.

[0114] The inventors of the present disclosure have found that in related color conversion substrates, the dam layer is prone to peeling due to insufficient adhesion between the dam layer and the underlying layer (usually the packaging layer). The inventors of the present disclosure have surprisingly and unexpectedly found that the fine structure of the color conversion substrate significantly improves the performance of the color conversion substrate. The unique structure of the color conversion substrate of the present disclosure (e.g., due to the presence of a patterned layer) significantly increases the contact area between the dam layer and the underlying structure. The color conversion substrate allows for the deposition of a thicker color conversion layer with improved luminous efficiency. Furthermore, the color conversion substrate has a higher quantum dot conversion rate.

[0115] 11 and 12, in some embodiments, the color conversion substrate further includes an intermediate layer IML located on a side of the pattern layer PTN away from the base substrate BBS and closer to the dam layer BL of the pattern layer PTN. Optionally, each pattern block is in direct contact with the intermediate layer IML, and the intermediate layer IML is in direct contact with the dam layer BL.

[0116] Various suitable materials can be used to fabricate the IML, including, but not limited to, silicon oxide (SiOy), silicon nitride (Si3N4, e.g., SiNy), silicon oxynitride (SiOxNy), aluminum oxide, barium oxide, and calcium oxide.

[0117] 24 is a cross-sectional view of a portion of an intermediate layer (IML) located above two adjacent pattern blocks in some embodiments of the present disclosure. Referring to FIG. 24 , in some embodiments, a portion of the intermediate layer (IML) is at least partially located in the gap G between the first adjacent pattern block PTB1 and the second adjacent pattern block PTB2. Optionally, the color conversion substrate includes a groove (GV), which extends partially to a portion of the intermediate layer (IML) located above or within the gap G. Optionally, the groove (GV) extends at least partially to the gap G located between the first adjacent pattern block PTB1 and the second adjacent pattern block PTB2.

[0118] In some embodiments, a portion of the dam layer BL extends at least partially into the gap G located between the first adjacent pattern block PTB1 and the second adjacent pattern block PTB2. With reference to Figure 9, in some embodiments, a portion of the dam layer BL extends into the gap G and is in direct contact with the first adjacent pattern block PTB1 and the second adjacent pattern block PTB2. With reference to Figure 24, a portion of the dam layer BL extends into the groove GV, and the groove GV extends partially into the gap G located between the first adjacent pattern block PTB1 and the second adjacent pattern block PTB2. The portion of the dam layer BL extends partially into the gap G and is in direct contact with the intermediate layer IML.

[0119] 25 is a cross-sectional view of a portion of a dam layer and a portion of an intermediate layer located on two adjacent pattern blocks in some embodiments of the present disclosure. Referring to FIGS. 24 and 25, in some embodiments, the dam layer BL extends at least partially into the groove GV. By providing multiple pattern blocks and extending the groove GV at least partially into the gap G located between the first adjacent pattern block PTB1 and the second adjacent pattern block PTB2, the contact area between the dam layer BL and the underlying layer (e.g., the intermediate layer IML) can be increased, thereby improving adhesion between the dam layer BL and the underlying layer.

[0120] 26 is a cross-sectional view of a portion of the dam layer and a portion of the intermediate layer located on two adjacent pattern blocks in some embodiments of the present disclosure. Referring to FIG. 26, in some embodiments, the surfaces of the portions of the intermediate layer IML located on the sides of the first adjacent pattern block PTB1 and the second adjacent pattern block PTB2 away from the base substrate BBS may be treated (e.g., by plasma treatment or ultraviolet / ozone treatment) to form a sawtooth surface. Providing a sawtooth surface increases the contact area between the dam layer BL and the underlying layer (e.g., the intermediate layer IML), allowing for better adhesion of the dam layer BL.

[0121] In some embodiments, the intermediate layer IML has a first refractive index and the patterned layer PTN has a second refractive index. Optionally, the first refractive index is greater than the second refractive index. In one example, the first refractive index is in the range of 1.6 to 1.8 and the second refractive index is in the range of 1.4 to 1.6. In one example, the thickness of the intermediate layer IML is in the range of 0.5 μm to 2.0 μm.

[0122] In some embodiments, the base substrate BBS has a third refractive index, the intermediate layer IML has a first refractive index, and the patterned layer PTN has a second refractive index. Optionally, the third refractive index is greater than the first refractive index, and the first refractive index is greater than the second refractive index. In one example, the third refractive index is in the range of 1.80 to 1.90 (e.g., 1.85), the first refractive index is in the range of 1.70 to 1.75, and the second refractive index is in the range of 1.5 to 1.6.

[0123] 27 is a diagram illustrating the optical path in a color conversion substrate according to some embodiments of the present disclosure. Referring to FIG. 27, by making the first refractive index greater than the second refractive index or by making the third refractive index greater than the first refractive index, incident light irradiated on each pattern block can be refracted toward the center of the corresponding light-transmitting region (e.g., the first light-transmitting region LTR1, the second light-transmitting region LTR2, or the third light-transmitting region LTR3). For example, by converging the incident light into the corresponding light-transmitting region, the quantum dot material can be excited at a better incident angle, thereby improving the quantum dot conversion rate.

[0124] In some embodiments, the plurality of pattern blocks PTB include a reflective material such as a metal material. Incident light irradiated onto each pattern block, particularly light with a relatively large incident angle, may be reflected by the surface of each pattern block toward the center of the corresponding light-transmitting region (e.g., the first light-transmitting region LTR1, the second light-transmitting region LTR2, or the third light-transmitting region LTR3). Furthermore, by making the third refractive index greater than the first refractive index, incident light with a relatively small incident angle can be refracted toward the center of the corresponding light-transmitting region. Combining the above mechanisms allows the incident light entering the corresponding light-transmitting region to converge, exciting the quantum dot material at a better incident angle and improving the quantum dot conversion rate.

[0125] In one example, each pattern block is made of a metallic material.

[0126] Alternatively, each pattern block includes a reflective material and an insulating material. Optionally, the reflective material is located on a side of the insulating material remote from the base substrate BBS. Optionally, each pattern block includes a base portion and a coating portion located on a side of the base portion remote from the base substrate BBS. The coating portion is made of a reflective material, such as a metallic material, and the base portion is made of an insulating material, such as an organic insulating material. Optionally, the coating portion at least partially covers a side surface of the base portion.

[0127] Fig. 28 is a cross-sectional view of a color conversion substrate according to some embodiments of the present disclosure. Fig. 29 is a cross-sectional view of a display panel according to some embodiments of the present disclosure. Referring to Figs. 28 and 29, in some embodiments, the color conversion substrate includes a pattern layer PTN located on a base substrate BBS, an intermediate layer IML located on a side of the pattern layer PTN away from the base substrate BBS, a dam layer BL located on a side of the intermediate layer IML away from the base substrate BBS, a plurality of first openings AP1 and a plurality of second openings AP2 extending through the dam layer BL, a color conversion layer CCL located at least partially in the plurality of first openings AP1, and a light transmission layer LTL located at least partially in the plurality of second openings AP2.

[0128] 11 and 12, in some embodiments, the intermediate layer IML extends in a plurality of light-transmitting regions (e.g., a first light-transmitting region LTR1, a second light-transmitting region LTR2, or a third light-transmitting region LTR3) and a non-light-transmitting region NTR. In some embodiments, with reference to FIGS. 11 and 12, the orthogonal projection of the intermediate layer IML on the base substrate BBS covers the orthogonal projection of the color conversion layer CCL and the light-transmitting layer LTL on the base substrate BBS.

[0129] 28 and 29, in some embodiments, the intermediate layer IML is at least partially present in the non-light-transmitting region NTR and at least partially absent from the plurality of light-transmitting regions. Optionally, the orthogonal projection of the intermediate layer IML on the base substrate BBS does not at least partially overlap with the orthogonal projection of the color conversion layer CCL on the base substrate BBS, and does not at least partially overlap with the orthogonal projection of the light-transmitting layer LTL on the base substrate BBS.

[0130] The inventors of the present disclosure have discovered that by at least partially eliminating the intermediate layer IML from multiple light-transmitting regions, the thicknesses of the color conversion layer CCL and the light-transmitting layer LTL can be increased, and the luminous efficiency of the color conversion layer CCL can be improved.

[0131] FIG. 30 is a cross-sectional view of a color conversion substrate according to some embodiments of the present disclosure. FIG. 31 is a plan view of a color conversion substrate according to some embodiments of the present disclosure. Referring to FIGS. 30, 31, and 14, in some embodiments, the pattern blocks PTB are at least partially located in the column portions CP. In some embodiments, the pattern blocks PTB are at least partially absent from the row portions RP. Optionally, the pattern blocks PTB are not present in the row portions RP except for the intersection portions isp. In some embodiments, the pattern blocks PTB are at least partially located in the first portions p1 of the non-light-transmitting region NTR. Optionally, the pattern blocks PTB are at least partially located in the first portions p1 of the non-light-transmitting region NTR and at least partially located in the intersection portions isp of the non-light-transmitting region NTR. Optionally, the pattern blocks PTB are at least partially absent from the second portions p2. Optionally, the pattern blocks PTB are not present at all in the second portions p2. In some embodiments, the plurality of pattern blocks PTB includes a plurality of first arrays, each of which is located in a corresponding column portion of the plurality of column portions CP. In some embodiments, the pattern blocks in each of the first arrays are arranged in a plurality of rows and a plurality of columns. Optionally, the pattern blocks in each column are arranged along the second direction DR2, and the pattern blocks in each row are arranged along the first direction DR1. Optionally, as shown in FIG. 31 , each of the first arrays includes one column of pattern blocks.

[0132] Fig. 32 is a plan view of a color conversion substrate according to some embodiments of the present disclosure. Referring to Figs. 30, 32, and 14, in some embodiments, the plurality of pattern blocks PTB are at least partially located in the plurality of first portions p1. Optionally, the plurality of pattern blocks PTB are at least partially absent from the plurality of second portions p2. Optionally, the plurality of pattern blocks PTB are at least partially absent from the plurality of intersection portions isp. As shown in Fig. 13B, the plurality of pattern blocks PTB are absent from the plurality of second portions p2 and are also absent from the plurality of intersection portions isp.

[0133] FIG. 33 is a plan view of a color conversion substrate according to some embodiments of the present disclosure. With reference to FIGS. 30, 33, and 14, in some embodiments, the pattern blocks PTB are at least partially located in the row portions RP. In some embodiments, the pattern blocks PTB are at least partially absent from the column portions CP. Optionally, the pattern blocks PTB are not present in the column portions CP except for the intersection portions isp. In some embodiments, the pattern blocks PTB are at least partially located in the second portions p2 of the non-light-transmitting region NTR. Optionally, the pattern blocks PTB are at least partially located in the second portions p2 of the non-light-transmitting region NTR and at least partially located in the intersection portions isp of the non-light-transmitting region NTR. Optionally, the pattern blocks PTB are at least partially absent from the first portions p1. Optionally, the pattern blocks PTB are not present at all in the first portions p1. In some embodiments, the pattern blocks PTB include second arrays, and each second array of the second arrays is located in a corresponding row portion of the row portions RP. In some embodiments, the pattern blocks in each second array are arranged in a plurality of rows and a plurality of columns. Optionally, the pattern blocks in each column are arranged along the second direction DR2, and the pattern blocks in each row are arranged along the first direction DR1. Optionally, each second array includes one row of pattern blocks.

[0134] FIG. 34 is a plan view of a color conversion substrate according to some embodiments of the present disclosure. Referring to FIGS. 30, 34, and 14, in some embodiments, the pattern blocks PTB are at least partially located in the column portions CP and at least partially located in the row portions RP. In some embodiments, the pattern blocks PTB are at least partially located in the first portions p1 of the non-light-transmitting region NTR and at least partially located in the second portions p2. Optionally, the pattern blocks PTB are at least partially located in the intersection portions isp of the non-light-transmitting region NTR. In some embodiments, the pattern blocks PTB include a plurality of third arrays, each of which is located in a corresponding first portion p1 of the first portions p1. In some embodiments, the pattern blocks in each third array are arranged in a plurality of rows and a plurality of columns. Optionally, the pattern blocks in each column are arranged along the second direction DR2, and the pattern blocks in each row are arranged along the first direction DR1. Optionally, each third array includes one column of pattern blocks. In some embodiments, the plurality of pattern blocks PTB includes a plurality of fourth arrays, each of which is located in a corresponding second portion p2 of the plurality of second portions p2. In some embodiments, the pattern blocks in each fourth array are arranged in a plurality of rows and a plurality of columns. Optionally, the pattern blocks in each column are arranged along the second direction DR2, and the pattern blocks in each row are arranged along the first direction DR1. Optionally, each fourth array includes one row of pattern blocks.

[0135] Each pattern block can have a variety of suitable shapes. Figure 35 is a cross-sectional view of a pattern layer in some embodiments of the present disclosure. In some embodiments, referring to Figure 35, each pattern block has a rectangular shape in a cross section along a plane perpendicular to the base substrate BBS and intersecting two adjacent pattern blocks in the plurality of pattern blocks PTB.

[0136] 36 is a cross-sectional view of a pattern layer in some embodiments of the present disclosure. In some embodiments, referring to FIG. 36, in a cross section along a plane perpendicular to the base substrate BBS and intersecting two adjacent pattern blocks in the plurality of pattern blocks PTB, each pattern block has a triangular shape.

[0137] 37 is a cross-sectional view of a pattern layer in some embodiments of the present disclosure. In some embodiments, referring to FIG. 37, in a cross section along a plane perpendicular to the base substrate BBS and intersecting two adjacent pattern blocks in the plurality of pattern blocks PTB, each pattern block has a trapezoidal shape.

[0138] 38 is a cross-sectional view of a pattern layer according to some embodiments of the present disclosure. In some embodiments, referring to FIG. 38, each pattern block has a sawtooth surface on the side away from the base substrate BBS. By providing a sawtooth surface, the contact area between the dam layer BL and the underlying layer increases, allowing for better adhesion of the dam layer BL.

[0139]

[0049] Fig. 39 is a cross-sectional view of a color conversion substrate according to some embodiments of the present disclosure. Fig. 40 is a cross-sectional view of a color conversion substrate according to some embodiments of the present disclosure. Referring to Figs. 39 and 40, in some embodiments, the color conversion substrate includes a pattern layer PTN located on a base substrate BBS, an intermediate layer IML located on a side of the pattern layer PTN away from the base substrate BBS, a dam layer BL located on a side of the intermediate layer IML away from the base substrate BBS, a plurality of first openings AP1 and a plurality of second openings AP2 extending through the dam layer BL, a color conversion layer CCL located at least partially in the plurality of first openings AP1, and a light transmitting layer LTL located at least partially in the plurality of second openings AP2.

[0140] 39, in some embodiments, the intermediate layer IML extends in a plurality of light-transmitting regions (e.g., a first light-transmitting region LTR1, a second light-transmitting region LTR2, or a third light-transmitting region LTR3) and a non-light-transmitting region NTR. In some embodiments, the orthogonal projection of the intermediate layer IML on the base substrate BBS covers the orthogonal projection of the color conversion layer CCL and the light-transmitting layer LTL on the base substrate BBS.

[0141] 40 , in some embodiments, the intermediate layer IML is at least partially present in the non-light-transmitting region NTR and at least partially absent from the plurality of light-transmitting regions. Optionally, the orthogonal projection of the intermediate layer IML on the base substrate BBS does not at least partially overlap with the orthogonal projection of the color conversion layer CCL on the base substrate BBS, and does not at least partially overlap with the orthogonal projection of the light-transmitting layer LTL on the base substrate BBS.

[0142] 41 is a cross-sectional view of a corresponding pattern block in some embodiments of the present disclosure. In some embodiments, referring to FIG. 41, in a cross section along a plane perpendicular to the base substrate BBS and intersecting two adjacent pattern blocks in the plurality of pattern blocks PTB, each pattern block has a first side S1 in contact with the base substrate BBS, a second side S2 opposite to the first side S1, a third side S3 connecting the first side S1 and the second side S2, and a fourth side S4 connecting the first side S1 and the second side S2.

[0143] 42 is a cross-sectional view of a portion of a dam layer positioned on a corresponding pattern block in some embodiments of the present disclosure. Referring to FIG. 42, in some embodiments, the dam layer BL at least partially covers the second side S2, the third side S3, and the fourth side S4 of the corresponding pattern block.

[0144] 42, in some embodiments, the corresponding pattern blocks protrude into the recesses of the dam layer BL. By protruding the corresponding pattern blocks into the recesses of the dam layer BL, the contact area between the dam layer BL and the underlying layer (e.g., the corresponding pattern blocks) can be increased, and the adhesion between the dam layer BL and the underlying layer can be improved.

[0145] 43 is a cross-sectional view of a portion of an interlayer IML positioned over a corresponding pattern block in some embodiments of the present disclosure. Referring to FIGS. 41 and 43, in some embodiments, the interlayer IML at least partially covers the second side S2, the third side S3, and the fourth side S4 of the corresponding pattern block.

[0146] 44 is a cross-sectional view of a portion of a dam layer and a portion of an intermediate layer located on a corresponding pattern block in some embodiments of the present disclosure. Referring to FIGS. 41, 43, and 44, in some embodiments, the dam layer BL at least partially covers one side of the portion of the intermediate layer IML covering the second side S2 of the corresponding pattern block, at least partially covers one side of the portion of the intermediate layer IML covering the third side S3 of the corresponding pattern block, and at least partially covers one side of the portion of the intermediate layer IML covering the fourth side S4 of the corresponding pattern block.

[0147] 44, in some embodiments, portions of the corresponding pattern blocks and intermediate layer IML protrude into the recesses of the dam layer BL. By allowing portions of the corresponding pattern blocks and intermediate layer IML to protrude into the recesses of the dam layer BL, the contact area between the dam layer BL and the underlying layer (e.g., the intermediate layer IML) can be increased, and adhesion between the dam layer BL and the underlying layer can be improved.

[0148] In some embodiments, the intermediate layer IML has a first refractive index and the patterned layer PTN has a second refractive index. Optionally, the first refractive index is greater than the second refractive index. In one example, the first refractive index is in the range of 1.6 to 1.8 and the second refractive index is in the range of 1.4 to 1.6. In one example, the thickness of the intermediate layer IML is in the range of 0.5 μm to 2.0 μm.

[0149] In some embodiments, the base substrate BBS has a third refractive index, the intermediate layer IML has a first refractive index, and the patterned layer PTN has a second refractive index. Optionally, the third refractive index is greater than the first refractive index, and the first refractive index is greater than the second refractive index. In one example, the third refractive index is in the range of 1.80 to 1.90 (e.g., 1.85), the first refractive index is in the range of 1.70 to 1.75, and the second refractive index is in the range of 1.5 to 1.6.

[0150] 45 illustrates the optical paths in a color conversion substrate according to some embodiments of the present disclosure. Referring to FIG. 45, by making the first refractive index greater than the second refractive index or by making the third refractive index greater than the first refractive index, incident light irradiated on a corresponding pattern block can be refracted toward the center of the corresponding light-transmitting region (e.g., the first light-transmitting region LTR1, the second light-transmitting region LTR2, or the third light-transmitting region LTR3). For example, by converging the incident light into the corresponding light-transmitting region, the quantum dot material can be excited at a better incident angle, thereby improving the quantum dot conversion rate.

[0151] In some embodiments, the plurality of pattern blocks PTB include a reflective material such as a metal material. Incident light irradiated onto a corresponding pattern block, particularly light with a relatively large incident angle, may be reflected by the surface of the corresponding pattern block toward the center of the corresponding light-transmitting region (e.g., the first light-transmitting region LTR1, the second light-transmitting region LTR2, or the third light-transmitting region LTR3). Furthermore, by making the third refractive index greater than the first refractive index, incident light with a relatively small incident angle can be refracted toward the center of the corresponding light-transmitting region. Combining the above mechanisms allows the incident light entering the corresponding light-transmitting region to converge, exciting the quantum dot material at a better incident angle and improving the quantum dot conversion rate.

[0152] In one example, each pattern block is made of a metallic material.

[0153] Alternatively, each pattern block includes a reflective material and an insulating material. Optionally, the reflective material is located on a side of the insulating material remote from the base substrate BBS. Optionally, each pattern block includes a base portion and a coating portion located on a side of the base portion remote from the base substrate BBS. The coating portion is made of a reflective material, such as a metallic material, and the base portion is made of an insulating material, such as an organic insulating material. Optionally, the coating portion at least partially covers a side surface of the base portion.

[0154] 46 is a cross-sectional view of a corresponding pattern block in some embodiments of the present disclosure. Referring to FIG. 46, each pattern block has an average thickness t. In some embodiments, each pattern block has a width w in a cross-section along a plane perpendicular to the base substrate BBS and intersecting two adjacent pattern blocks in the plurality of pattern blocks PTB.

[0155] In one example, 1 μm≦w≦10 μm.

[0156] In one example, 1 μm≦t≦5 μm.

[0157] In some embodiments, the dam layer has an average thickness t3, in some embodiments, 2≦t3 / t≦10, e.g., 2≦t3 / t≦3, 3≦t3 / t≦4, 4≦t3 / t≦5, 5≦t3 / t≦6, 6≦t3 / t≦7, 7≦t3 / t≦8, 8≦t3 / t≦9, or 9≦t3 / t≦10.

[0158] With reference to Figures 9-12, 25-30, 39, 40, 42, 44, and 45, in some embodiments, the shape of the surface (e.g., bottom surface) of the dam layer BL closer to the pattern layer PTN conforms to the shape of the surface (e.g., top surface) of the pattern layer PTN closer to the dam layer BL. As used herein, the term "conformal" means that a first layer (e.g., dam layer BL) follows the shape of the surface of a second layer (e.g., pattern layer) below the first layer, e.g., the shape of the bottom surface of the first layer essentially matches the shape of the top surface of the second layer. The term "conformal" may refer to, but is not limited to, a complementary match between two surfaces. In the present disclosure, the term "conformal" is interpreted to include cases where the two surfaces are not perfectly complementary. For example, a third layer (e.g., an intermediate layer IML) is deposited on a second layer, and the first layer is deposited on the third layer. In this case, the morphology of the bottom surface of the third layer essentially matches the morphology of the top surface of the second layer, and the morphology of the bottom surface of the first layer essentially matches the morphology of the top surface of the third layer. The first and second layers are considered conformal as long as the first layer essentially conforms to the morphology of the top surface of the second layer. In one example, the morphology of the top surface of the second layer includes a gap located between two protruding structures, and the morphology of the top surface of the third layer includes a corresponding groove. When the first layer fills the groove and contacts the top surface of the third layer, the first layer is considered conformal with the second layer. Similarly, this interpretation applies when additional layers (one or more) are included between the first and second layers.

[0159] 9, 10, 30, and 42, in some embodiments, the dam layer BL is in direct contact with the pattern layer PTN. The shape of at least a portion of the bottom surface of the dam layer BL is complementary to the shape of at least a portion of the top surface of the pattern layer PTN. The shape of the surface of the dam layer BL closer to the pattern layer PTN (e.g., the bottom surface) conforms to the shape of the surface of the pattern layer PTN closer to the dam layer BL (e.g., the top surface).

[0160] 11, 12, 25-29, 39, 40, 44, and 45, the shape of the bottom surface of the dam layer BL is not perfectly complementary to the shape of the top surface of the pattern layer PTN, but basically follows the shape of the top surface of the pattern layer PTN. The bottom surface of the dam layer BL is considered to have a shape conformal to the top surface of the pattern layer PTN.

[0161] 9-12, 25-30, 39, 40, 42, 44, and 45, in some embodiments, the orthogonal projection of the surface (e.g., bottom surface) of the dam layer BL closer to the pattern layer PTN on the base substrate BS at least partially overlaps with the orthogonal projection of the plurality of pattern blocks PTB on the base substrate BS. Optionally, the orthogonal projection of the surface of the dam layer BL closer to the pattern layer PTN on the base substrate BS covers the orthogonal projection of the plurality of pattern blocks PTB on the base substrate BS. Optionally, the area of ​​the orthogonal projection of the surface of the dam layer BL closer to the pattern layer PTN on the base substrate BS is larger than the area of ​​the orthogonal projection of the plurality of pattern blocks PTB on the base substrate BS. Optionally, the area of ​​the orthogonal projection of the surface of the dam layer BL closer to the pattern layer PTN on the base substrate BS is at least 1.2 times (e.g., at least 1.3 times, at least 1.4 times, at least 1.5 times, at least 1.6 times, at least 1.7 times, at least 1.8 times, at least 1.9 times, at least 2.0 times, at least 2.1 times, at least 2.2 times, at least 2.3 times, at least 2.4 times, at least 2.5 times, at least 2.6 times, at least 2.7 times) the area of ​​the orthogonal projection of the plurality of pattern blocks PTB on the base substrate BS. fold, at least 2.8-fold, at least 2.9-fold, at least 3.0-fold, at least 3.1-fold, at least 3.2-fold, at least 3.3-fold, at least 3.4-fold, at least 3.5-fold, at least 3.6-fold, at least 3.7-fold, at least 3.8-fold, at least 3.9-fold, at least 4.0-fold, at least 4.1-fold, at least 4.2-fold, at least 4.3-fold, at least 4.4-fold, at least 4.5-fold, at least 4.6-fold, at least 4.7-fold, at least 4.8-fold, at least 4.9-fold, or at least 5.0-fold).

[0162] In another aspect, the present disclosure provides a display device, comprising a color conversion substrate described herein or fabricated by the methods described herein, and a plurality of light-emitting elements positioned between a first base substrate and a patterned layer. Examples of suitable display devices include, but are not limited to, electronic paper, mobile phones, tablet computers, televisions, monitors, laptops, digital albums, GPS, etc.

[0163] In some embodiments, the display device further includes a package layer that packages the plurality of light-emitting elements. In some embodiments, the package layer includes a first inorganic package sublayer, an organic package sublayer located on a side of the first inorganic package sublayer away from the plurality of light-emitting elements, and a second inorganic package sublayer located on a side of the organic package sublayer away from the plurality of light-emitting elements. Optionally, the pattern layer is in direct contact with the second package sublayer.

[0164] In some embodiments, the display device further comprises a pixel definition layer defining a plurality of sub-pixel apertures. Optionally, the orthogonal projection of the pixel definition layer on the base substrate overlies the orthogonal projection of the patterned layer on the base substrate.

[0165] In another aspect, the present disclosure provides a method for manufacturing a color conversion substrate. In some embodiments, the method includes forming a pattern layer on a base substrate, forming a dam layer on a side of the pattern layer away from the base substrate, forming the color conversion layer at least partially in a plurality of first openings each extending through the dam layer, and forming a light-transmitting layer at least partially in a plurality of second openings each extending through the dam layer. Optionally, forming the pattern layer includes forming a plurality of pattern blocks. Optionally, each pattern block in the plurality of pattern blocks protrudes away from the base substrate toward the dam layer.

[0166] The foregoing embodiments of the present invention have been described for purposes of illustration and description. They are not exhaustive and are not intended to limit the invention to the precise forms or exemplary embodiments disclosed. Therefore, the foregoing description should be considered illustrative and not limiting. Obviously, many modifications and variations will be apparent to those skilled in the art. The embodiments were chosen and described in order to interpret the principles of the invention and its best mode practical application, thereby enabling those skilled in the art to appreciate various embodiments of the invention, as well as various modifications thereof that may be suitable for the particular use or implementation contemplated. The scope of the present invention is limited by the appended claims and their equivalents, and all terms are to be given their broadest reasonable meaning unless otherwise stated. Thus, terms such as "the invention," "the present invention," and the like are not intended to limit the scope of the claims to any particular embodiment, and reference to exemplary embodiments of the present invention is not intended to limit the invention, and no such limitation should be inferred. The present invention is limited only by the spirit and scope of the appended claims. Furthermore, these claims may use terms such as "first," "second," etc., followed by a noun or element. These terms should be understood as nomenclature and should not be construed as limiting the number of elements that may be modified by these nomenclatures unless a specific number is given. Any benefits and advantages described may not apply to all embodiments of the present invention. Those skilled in the art should understand that modifications can be made to the described embodiments without departing from the scope of the present invention, which is limited by the appended claims. Furthermore, elements or components of the present disclosure, whether or not explicitly recited in the claims, are not intended to be a contribution to the public. [Explanation of symbols]

[0167] CS color conversion board BS, BBS base board PTN Pattern Layer BL Dam Layer CCL color conversion layer LTL light transmission layer

Claims

1. A color conversion substrate, A base substrate; a patterned layer located on the base substrate; a dam layer located on a side of the pattern layer away from the base substrate; a color conversion layer at least partially positioned in a plurality of first openings each extending through the dam layer; a light-transmitting layer at least partially positioned in a plurality of second openings each extending through the dam layer; the pattern layer includes a plurality of pattern blocks; a color conversion substrate, wherein each pattern block in the plurality of pattern blocks protrudes away from the base substrate toward the dam layer;

2. a surface of the dam layer closer to the pattern layer having a conformal shape with a surface of the pattern layer closer to the dam layer; Or, the pattern layer and the dam layer are at least partially located in a non-light-transmitting region; the pattern layer and the dam layer are at least partially absent in a plurality of light-transmitting regions; 2. The color conversion substrate according to claim 1, wherein an orthogonal projection of the dam layer on the base substrate at least partially overlaps an orthogonal projection of each of the pattern blocks on the base substrate.

3. an orthogonal projection of a surface of the dam layer closer to the pattern layer on the base substrate covers an orthogonal projection of the plurality of pattern blocks on the base substrate; an area of ​​an orthogonal projection of the surface of the dam layer closer to the pattern layer on the base substrate is at least 1.2 times an area of ​​an orthogonal projection of the plurality of pattern blocks on the base substrate; Or, 2. The color conversion substrate of claim 1, wherein each of the pattern blocks is in direct contact with the dam layer.

4. an intermediate layer located on a side of the pattern layer away from the base substrate and on a side of the dam layer closer to the base substrate; each pattern block directly contacts the intermediate layer; the intermediate layer is in direct contact with the dam layer; the intermediate layer is at least partially present in the non-light-transmitting region and at least partially absent in the plurality of light-transmitting regions; The color conversion substrate of claim 1, wherein the orthogonal projection of the intermediate layer on the base substrate does not at least partially overlap with the orthogonal projection of the color conversion layer on the base substrate, and does not at least partially overlap with the orthogonal projection of the light transmission layer on the base substrate.

5. A color conversion substrate as described in any one of claims 1 to 4, wherein the plurality of pattern blocks include a first adjacent pattern block and a second adjacent pattern block, and the first adjacent pattern block and the second adjacent pattern block are located in a part of a non-light-transmitting region located between a first adjacent light-transmitting region and a second adjacent light-transmitting region in the plurality of light-transmitting regions.

6. a portion of the dam layer at least partially extends into a gap located between the first adjacent pattern block and the second adjacent pattern block and directly contacts the first adjacent pattern block and the second adjacent pattern block; Or, the color conversion substrate further includes an intermediate layer and a groove, the intermediate layer is located on a side of the first adjacent pattern block and the second adjacent pattern block away from the base substrate, the intermediate layer at least partially extends to a gap located between the first adjacent pattern block and the second adjacent pattern block, and directly contacts the first adjacent pattern block and the second adjacent pattern block; the recessed groove extends to a portion of the intermediate layer that extends at least partially to the gap; 6. The color conversion substrate of claim 5, wherein a portion of the dam layer at least partially extends to the groove and is in direct contact with the intermediate layer.

7. A color conversion substrate as described in any one of claims 1 to 4, wherein each pattern block has a first edge contacting the base substrate, a second edge opposite to the first edge, a third edge connecting the first edge and the second edge, and a fourth edge connecting the first edge and the second edge, and the third edge and the fourth edge are opposite to each other.

8. the dam layer at least partially covers the second side, the third side, and the fourth side of each of the pattern blocks; Or, The color conversion substrate further includes an intermediate layer located on a side of the corresponding pattern block away from the base substrate; the intermediate layer at least partially covers the second side, the third side, and the fourth side of each of the pattern blocks; The color conversion substrate of claim 7, wherein the dam layer at least partially covers one side of the portion of the intermediate layer that covers the second side of each pattern block, at least partially covers one side of the portion of the intermediate layer that covers the third side of each pattern block, and at least partially covers one side of the portion of the intermediate layer that covers the fourth side of each pattern block.

9. the intermediate layer has a first refractive index; the patterned layer has a second refractive index; the base substrate has a third refractive index; the third refractive index is greater than the first refractive index; the first refractive index is greater than the second refractive index; and, the first refractive index is in the range of 1.6 to 1.8; the second refractive index is in the range of 1.4 to 1.6; 5. The color conversion substrate according to claim 4, wherein the third refractive index is in the range of 1.80 to 1.

90.

10. 10. The color conversion substrate according to claim 1, wherein each of the pattern blocks comprises a reflective material.

11. 11. The color conversion substrate of claim 10, wherein each of the pattern blocks comprises a metal material.

12. each said pattern block having an average thickness; the dam layer has a third average thickness; 10. The color conversion substrate according to claim 1, wherein the ratio of the third average thickness to the average thickness is in the range of 2-10.

13. the first adjacent pattern block has a first average thickness; the second adjacent pattern block has a second average thickness; the dam layer has a third average thickness; a ratio of the third average thickness to the first average thickness is in the range of 2 to 10; the ratio of the third average thickness to the second average thickness is in the range of 2 to 10; Or, the first adjacent pattern block and the second adjacent pattern block are spaced apart by a minimum distance; In a cross section along a plane perpendicular to the base substrate and intersecting the first adjacent pattern block and the second adjacent pattern block, the first adjacent pattern block has a first width and the second adjacent pattern block has a second width; 7. The color conversion substrate of claim 6, wherein the sum of the minimum distance, the first width, and the second width is smaller than the maximum width of a portion of a pixel definition layer located between a first adjacent light-transmitting region and a second adjacent light-transmitting region in the plurality of light-transmitting regions in a display panel having the color conversion substrate.

14. A display device, 5. A display device comprising: the color conversion substrate according to claim 1; and a plurality of light-emitting elements positioned between a first base substrate and the pattern layer.

15. Further comprising a packaging layer that packages the plurality of light emitting elements; the package layer includes a first inorganic package sublayer, an organic package sublayer located on a side of the first inorganic package sublayer away from the plurality of light emitting elements, and a second inorganic package sublayer located on a side of the organic package sublayer away from the plurality of light emitting elements; the patterned layer directly contacts the second inorganic package sub-layer; Or, the display device further includes a pixel defining layer defining a plurality of sub-pixel apertures; 15. The display device of claim 14, wherein an orthogonal projection of the pixel definition layer on the base substrate overlies an orthogonal projection of the pattern layer on the base substrate.

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