Chemical processing vessel with fluid director and method of operating the same

Abstract

A chemical processing vessel may comprise a base, a grid distributor, a solid transport passage, an outer skirt, a fluid inlet, and a fluid director. The solid transport passage may extend between the base and the grid distributor in the central regions of the base and the grid distributor, respectively. The outer skirt may comprise walls radially arranged around the outer periphery of the base and the grid distributor. The base, grid distributor, solid transport passage, and outer skirt define an annular region between the outer skirt and the solid transport passage. The fluid inlet extends through the base. The fluid director is positioned within the annular region and is shaped to direct the fluid from the fluid inlet into the annular region in a fluid direction substantially tangential to the outer skirt. Methods for operating the chemical processing vessel are also disclosed herein.

Description

Technical Field

[0001] (Cross - Reference to Related Applications) This application claims the benefit of U.S. Provisional Patent Application No. 63 / 420,177, filed Oct. 28, 2022, the entire disclosure of which is incorporated herein by reference.

[0002] This specification generally relates to chemical processing, and more specifically, to systems and methods for directing fluid through a dispenser.

Background Art

[0003] Gaseous chemical substances can be supplied to a reactor or other vessel through a dispenser. Using a dispenser, a balanced distribution of such fluid to the reactor or vessel can be facilitated. Such fluid distribution can promote a desired reaction and maintain mass transfer equilibrium in a chemical system.

Summary of the Invention

[0004] In many chemical processes, fluid is supplied to a chemical processing vessel through a grid dispenser. In some chemical processes, solids such as catalysts can be simultaneously removed through a solid transport passage within the grid dispenser while the fluid is being supplied to the chemical processing vessel. Such a grid dispenser can have a central solid passage that forms an annular region under the grid. In many conventional chemical processing vessels, the fluid supplied to the annular region under the grid of the chemical processing vessel can create non - uniform temperatures in the surrounding solid components. Thus, there is a need for a fluid director to direct fluid around the annular region of the chemical processing vessel so that a more uniform temperature is obtained by the chemical processing vessel. Embodiments of such a fluid director are described herein, and the fluid director directs fluid in a substantially tangential direction with respect to the outer skirt of the chemical processing vessel.

[0005] According to one or more embodiments, the chemical processing vessel may comprise a base, a grid distributor, a solid transport passage, an outer skirt, a fluid inlet, and a fluid director. The solid transport passage may extend between the base and the grid distributor in the central regions of the base and the grid distributor, respectively. The outer skirt may comprise walls radially arranged around the outer periphery of the base and the grid distributor. The base, grid distributor, solid transport passage, and outer skirt may define an annular region between the outer skirt and the solid transport passage. The fluid inlet may extend through the base into the annular region. The fluid director may be located within the annular region and molded to direct the fluid from the fluid inlet into the annular region in a fluid direction substantially tangential to the outer skirt.

[0006] According to one or more additional embodiments, a chemical processing vessel may be operated by a method including passing a fluid through the chemical processing vessel and directing the fluid using a fluid director. The chemical processing vessel may comprise a base, a grid distributor, a solid transport passage, an outer skirt, a fluid inlet, and a fluid director. The solid transport passage may extend between the base and the grid distributor in the central regions of the base and the grid distributor, respectively. The outer skirt may comprise substantially frustoconical walls radially arranged around the outer periphery of the base and the grid distributor. The base, grid distributor, solid transport passage, and outer skirt may define an annular region between the outer skirt and the solid transport passage. The fluid inlet may extend through the base into the annular region. The fluid director may be located within the annular region and molded to direct the fluid from the fluid inlet into the annular region in a fluid direction substantially tangential to the outer skirt. The fluid may be directed from the fluid inlet into the annular region in a fluid direction substantially tangential to the outer skirt.

[0007] Additional features and benefits are described below in the “Modes for Carrying Out the Invention,” some of which will be readily apparent to those skilled in the art from that description, or will be recognized by carrying out the embodiments described herein, including the “Modes for Carrying Out the Invention” and the “Claims.”

[0008] It should be understood that both the general description above and the detailed description below are intended to illustrate various embodiments and to provide an overview or framework for understanding the nature and characteristics of the claimed subject matter. [Brief explanation of the drawing]

[0009] [Figure 1] This is a schematic diagram of a cross-sectional view of a fluid director in a chemical processing vessel according to one or more embodiments of the present disclosure. [Figure 2] This is a schematic perspective view of the grid distributor and solid transport passage of the chemical processing vessel shown in Figure 1, according to one or more embodiments of the present disclosure. [Figure 3] This is a schematic diagram of a reactor system according to one or more embodiments of the present disclosure. [Figure 4] This is a schematic plan view of the fluid director shown in Figure 1, according to one or more embodiments of the present disclosure. [Figure 5] This is a schematic diagram of a cross-sectional view of another fluid director in a chemical processing vessel according to one or more embodiments of the present disclosure. [Figure 6] This is a schematic diagram of a cross-sectional view of another fluid director in a chemical processing vessel according to one or more embodiments of the present disclosure. [Figure 7A] This is a schematic diagram of a model of the temperature of a solid transport passage in a chemical processing vessel equipped with a flat fluid director, according to one or more embodiments of the present disclosure. [Figure 7B] This is a schematic diagram of a model of the temperature of a solid transport passage in a chemical processing vessel equipped with a curved fluid director, according to one or more embodiments of the present disclosure. [Figure 8A] This is a schematic diagram of a temperature model for a grid distributor of a chemical processing vessel equipped with a flat fluid director, according to one or more embodiments of the present disclosure. [Figure 8B] This is a schematic diagram of a temperature model for a grid distributor of a chemical processing vessel equipped with a curved fluid director, according to one or more embodiments of the present disclosure.

[0010] Herein, various embodiments are referred to in more detail, some of which are illustrated in the accompanying drawings. Wherever possible, the same reference numerals will be used throughout the drawings to refer to the same or similar parts. [Modes for carrying out the invention]

[0011] This disclosure relates to a chemical processing vessel having a fluid director and a method for operating such a chemical processing vessel, according to one or more embodiments described herein. Generally, the chemical processing vessels described herein may comprise a solid transport passage substantially at the center of the chemical processing vessel and an outer skirt surrounding the solid transport passage. Thus, the outer skirt can define an annular region between the outer skirt and the solid transport passage. The chemical processing vessel generally comprises a fluid inlet and a fluid director located above the fluid inlet and positioned within the annular region. The fluid director may be molded to direct the fluid from the fluid inlet into the annular region in a fluid direction that is substantially tangential to the wall of the outer skirt.

[0012] Referring here to Figure 1, one embodiment of the chemical processing vessel 110 is schematically shown. The chemical processing vessel 110 can have various configurations. The chemical processing vessel 110 may have a cylindrical shape. For example, the chemical processing vessel 110 may have a rounded hollow shape having a longitudinal axis A. The longitudinal axis A can define a radial direction R extending therefrom. The chemical processing vessel 110 may include a side wall 111, a base 116, an upper part 118, a catalyst outlet 120, and a receiving passage 122. The side wall 111, base 116, and upper part 118 of the chemical processing vessel 110 may have a fire-resistant lining inner wall 112 and an outer wall 114.

[0013] According to one or more embodiments, the chemical processing vessel 110 may include a grid distributor 100 for distributing fluid within the chemical processing vessel 110. The grid distributor 100 may include a plate 102. The plate 102 may include a top surface 104 and a bottom surface 106. The bottom surface 106 may be opposite the top surface 104 and spaced apart from the top surface 104. The distance between the top surface 104 and the bottom surface 106 can define the thickness of the plate 102. The plate 102 may include an outer surface 108 that extends around the outer circumference of the plate 102. The outer surface 108 may have portions perpendicular to the top surface 104 and the bottom surface 106. The plate 102 may have an average diameter of 5 feet (1.5 meters (m)) or more and 75 feet (22.9 m) or less, for example, 10 feet (3.0 m) or more and 50 feet (15.2 m) or less. The plate 102 may be substantially flat (i.e., the top surface 104 and the bottom surface 106 may be substantially parallel). In other embodiments, the plate 102 may be non-planar, such as dish-shaped. If the plate 102 is dish-shaped, the top surface 104 and the bottom surface 106 do not have to be flat (i.e., the outer surface 108 of the plate 102 may be higher or lower than the more central region of the plate 102).

[0014] The bottom surface 106, the top surface 104, or both of the plate 102 may be lined with fire-resistant material. For example, Figure 1 shows fire-resistant material in the shaded area above the plate 102. Additionally or alternatively, other materials with thermal insulation properties (e.g., thermal insulation material) may be placed between the bottom surface 106 and the top surface 104 of the plate 102. The fire-resistant lining, thermal insulation material, or both may help prevent the bottom surface 106 of the plate 102 from heating up.

[0015] The plate 102 may have a plurality of openings 130. Each of the plurality of openings 130 may be in fluid communication with the bottom surface 106 and the top surface 104 of the plate 102 through a first opening 132 and a second opening 134. The plurality of openings 130 may be at the same height as the top surface 104 and / or the bottom surface 106. Alternatively, the plurality of openings 130 may extend beyond the bottom surface 106 (i.e., downward) and / or beyond the top surface 104 (i.e., upward). That is, the plurality of openings 130 may have an enclosure that extends above the top surface 104 of the plate 102. The second opening 134 may have a larger cross-sectional area than the first opening 132.

[0016] The first opening 132 of plate 102 can provide a pressure drop from the bottom surface 106 of plate 102 to the top surface 104 of plate 102 to ensure uniform distribution of the gas passing through plate 102. The second opening 134 can reduce the velocity of the gas passing through plate 102. If the velocity of the gas passing through plate 102 is too high, the gas may abrade or damage the catalyst in the chemical processing vessel 110 above plate 102. The first opening 132 and the second opening 134 of plate 102 may have uniform or varying cross-sectional areas to help a uniform distribution of gas pass through each of the multiple openings 130. For example, openings 130 closer to the fluid inlet 123 may have a larger pressure difference between the bottom surface 106 and the top surface 104 of plate 102. Therefore, the first opening 132 of the plate 102 that is closer to the fluid inlet 123 may have a smaller cross-sectional area than the first opening 132 that is further from the fluid inlet 123, in order to help equalize the pressure difference across the entire plate 102.

[0017] Referring to FIGS. 1 and 2 in combination, the plate 102 may include a bottom surface 106. The bottom surface 106 may include a plurality of openings 130 formed by the first opening 132 of the plate 102. The plurality of openings 130 may be arranged around the longitudinal axis A in a geometric pattern. The geometric pattern may vary for different applications. For example, the plurality of openings 130 may be arranged around the longitudinal axis A in a grid and / or concentrically. The plate 102 may include 10 to 50 openings 130 per square meter, for example, 20 to 35 openings per square meter. Other numbers of openings 130 per square meter are also contemplated.

[0018] Referring again to FIG. 1, the ratio of the inner diameter of the first opening 132 of the plate 102 to the inner diameter of the second opening 134 of the plate 102 may be 0.13 to 0.8, for example, 0.34 to 0.51. The ratio of the inner diameter of the first opening 132 of the plate 102 to the inner diameter of the chemical treatment vessel 110 may be 0.003 to 0.014, for example, 0.008 to 0.012. The ratio of the inner diameter of the second opening 134 of the plate 102 to the inner diameter of the chemical treatment vessel 110 may be 0.008 to 0.163, for example, 0.026 to 0.087.

[0019] Referring further to FIG. 1, the chemical treatment vessel 110 may include an outer skirt 150. The outer skirt 150 can attach to and support the grid distributor 100 to the chemical treatment vessel 110 at or near the base 116 of the chemical treatment vessel 110. The outer skirt 150 may extend downwardly at or near the outer periphery of the grid distributor 100. As used in this disclosure, "outer periphery" may refer to the outermost 25% of the plate 102 (i.e., the portion closest to the refractory lining inner wall). The outer skirt 150 may extend from the outer periphery of the grid distributor 100 to the outer periphery of the base 116 so as to be arranged radially (e.g., in the radial direction R) around the outer periphery of the base 116 and the grid distributor 100. The outer skirt 150 may be centered on the longitudinal axis A.

[0020] The outer skirt 150 may include a first end 152 and a second end 154. The outer skirt 150 is shaped as a frustum in FIG. 1, and the first end 152 and the second end 154 are circular, but other shapes are also contemplated. The first end 152 may be connected to the base 116 of the chemical treatment vessel 110. The plate 102 may be connected to the outer skirt 150 at or near the second end 154. In some embodiments, as shown in FIG. 1, the outer skirt 150 extends upward to the height of the refractory material. The first end 152 and the second end 154 may be spaced apart from each other and may form a wall as a whole. The space between the first end 152 and the second end 154 can define the thickness of the outer skirt 150 in a particular region, and the outer skirt 150 includes an outer surface 156 and an inner surface 158.

[0021] In an embodiment, the outer surface 156 may be spaced from the refractory-lined inner wall 112. The filling of the plate grid distributor (i.e., the heat insulator) may be disposed between the lower portion of the refractory-lined inner wall 112 near the position where the refractory-lined inner wall 112 is connected to the base 116 of the chemical treatment vessel 110 and the outer surface 108 of the plate 102. The filling of the plate grid distributor may be a ceramic wool heat insulator. In an embodiment, the outer skirt 150 may be angled to form a substantially frustum-shaped wall. Alternatively, the outer skirt 150 may be vertical (i.e., perpendicular to the base 116 or parallel to the side wall 111).

[0022] Referring further to Figure 1, the chemical processing vessel 110 may also include a solid transport passage 121. In embodiments, the solid transport passage 121 may have a frustum. As used in this disclosure, “frustum” may refer to a frustum shape made by cutting off the top of a cone (the cut is made parallel to the base). The solid transport passage 121 may extend from the grid distributor 100 or an upper opening 121B in its vicinity to the catalyst outlet 120 or a bottom opening 121A below it. Thus, the solid transport passage 121 may extend between the base and the grid distributor 100. In embodiments, the solid transport passage 121 may be aligned with the longitudinal axis A so as to extend between the base 116 and the grid distributor 100 in the central region of the base 116 and the grid distributor 100, respectively. The solid transport passage 121 can form a passage from the region above the grid distributor 100 to the catalyst outlet 120.

[0023] The solid transport passage 121 and the plate 102 may be connected so that they form a single unit. As used herein, a single unit may mean that two components (e.g., the solid transport passage 121 and the plate 102) are formed from a single structure. While not bound by any particular theory, a single unit is considered to be lighter and more rigid than a structure using separate parts. The plate 102 and the solid transport passage 121 may be operable to accommodate a catalyst below the plate 102 inside the solid transport passage 121. It should be understood that the catalyst may be above the plate 102 as well as inside the solid transport passage 121. The solid transport passage 121 may have a rounded transition 126 between the solid transport passage 121 and the plate 102. A “rounded transition” may refer to a rounded inner or outer corner of the part design. The rounded shape is a concave line when it is at an inner corner, and a convex line when it is at an outer corner. The rounded transition section 126 can provide a smooth transition from the plate 102 to the solid transport passage 121. The fire-resistant material can be in direct contact with and cover substantially all of the inner surface of the solid transport passage 121.

[0024] The solid transport passage 121 does not necessarily have to extend above the plate 102. The rounded transition section 126 of the solid transport passage 121 can provide a coplanar transition from the solid transport passage 121 to the plate 102. That is, the upper surface 128 of the solid transport passage 121 can be substantially coplanar with the upper surface 104 of the plate 102. Such a design can minimize the catalyst stock required for chemical processing carried out in the chemical processing vessel 110. Conventional plate grid distributors and catalyst recovery standpipes may require a hopper cone above the conventional plate grid distributor. Any particulate solid above the plate of a conventional plate grid distributor and within the hopper cone may, in some embodiments, be unhelpful and unnecessarily increase catalyst stock costs.

[0025] The solid transport passage 121 may have a larger cross-sectional area than the catalyst outlet 120 at the central opening 121B of the plate 102. In this embodiment, the solid transport passage 121 may be 2 to 6 times larger than the catalyst outlet 120, for example, 3.5 to 4.5 times larger. Therefore, the cross-sectional area of ​​the solid transport passage 121 may be 2 to 6 times larger than the catalyst outlet 120 at the central opening 121B of the plate 102, for example, 3.5 to 4.5 times larger.

[0026] During the operation, particulate solids such as catalyst particles can be removed from the chemical treatment vessel 110 via the solid transport passage 121. The solid transport passage 121 may be connected to a standpipe (not shown) to deliver the particulate solids to another container or treatment unit. During the operation, the catalyst is 50 lb / ft 2 -sec or more 400lb / ft 2 -sec or less, for example, 100lb / ft 2 -sec or more 300lb / ft 2The catalyst is recovered from the chemical processing vessel 110 at a catalyst flux of -sec or less and may be passed through a standpipe. The fluid inlet 123 can deliver gas into the chemical processing vessel 110 through the grid distributor 100, while particulate solids can be removed through the solid transport passage 121. Thus, the solid transport passage 121 forms a barrier between the catalyst and the gas that is ultimately distributed. As can be understood here, the solid transport passage 121, base 116, outer skirt 150, and grid distributor 100 can define an annular region 180 between the outer skirt 150 and the solid transport passage 121.

[0027] Referring further to Figure 1, the chemical processing vessel 110 may also be provided with a fluid inlet 123. The fluid inlet 123 may be connected to a receiving passage 122 that extends through the base of the chemical processing vessel 110. The fluid inlet 123 can define a fluid opening 124 from which a fluid such as air can enter the annular region 180. The chemical processing vessel 110 may have a plurality of fluid inlets 123 (not shown in Figure 1). In embodiments, the plurality of fluid inlets 123 may be connected to a plurality of receiving passages 122. The plurality of receiving passages 122 may surround the longitudinal axis A of the chemical processing vessel 110. The fluid inlet 123 may be mounted coplanar with the fire-resistant lining inner wall 112, as shown in Figure 6, or it may extend beyond the fire-resistant lining inner wall 112, as shown in Figure 1. The fluid inlet 123 may have an inner diameter D, as shown in Figure 1. The ratio of the inner diameter D of the fluid inlet 123 to the inner diameter of the chemical processing vessel 110 may be 0.02 to 0.4, for example, 0.20 to 0.23.

[0028] Referring to Figures 1 and 4 in combination, the chemical processing vessel 110 may include a fluid director 200 located within an annular region 180. The annular region 180 is a substantially ring-shaped region whose inner edge is bounded by a solid transport passage 121 and its outer edge by an outer skirt 150, along its radial direction. The annular region 180 may be bounded on its upper side by a grid distributor 100 and on its lower side by a base 116. As shown in the “top view” of Figure 4, the direction of flow is substantially tangential when entering the annular region and around the “ring”-shaped region.

[0029] In one or more embodiments, such as those shown in Figure 1, the fluid director 200 may be curved as shown. As used herein, “curved” means any curved or angular shape, not limited to a rounded shape, such that the fluid director 200 does not define a single flat surface. The fluid director 200 may be any curved shape, such as angled, arched, elliptical, rectangular, cylindrical, irregular, a combination thereof, and / or a part thereof. For example, as shown in Figures 1 and 4, the fluid director 200 may have a semi-cylindrical shape extending perpendicular to the radial direction R and substantially tangential to the outer skirt 150 (e.g., in the flow direction F shown in Figure 4). The fluid director 200 may have a height H measured in the direction aligned with the fluid inlet 123, a width W measured perpendicular to the fluid inlet 123, and a length L measured perpendicular to the radial direction R (e.g., in the flow direction F shown in Figure 4). In this embodiment, the length L may be greater than the width W. The height H may be more than half of the width W. The width W may be greater than twice the inner diameter D of the fluid inlet 123.

[0030] Referring further to Figures 1 and 4, the fluid director 200 can be positioned above the fluid inlet 123. The fluid director 200 may be concave in the direction facing the fluid inlet 123, as shown, or convex in the direction away from the fluid inlet 123. In embodiments, the fluid director 200 can be centered above the fluid opening 124. Thus, in embodiments, the fluid can enter the chemical processing vessel 110 through the fluid inlet 123 and collide with the fluid director 200. Upon collision with the fluid director 200, the fluid can be directed in the flow direction F along the length L of the fluid director 200. In embodiments, the concave shape of the fluid director 200 can assist in directing the fluid in the flow direction F. As described above, the flow direction F may be substantially tangential to the outer skirt 150. As used herein, “substantially tangential to the outer skirt 150” means substantially tangential to the outer skirt 150 at a circumferential position 151 that is angularly aligned with the fluid opening 124. For example, referring to Figure 4, the radial direction R is schematically shown as an axis passing through the center of the fluid opening 124 and through the circumferential position 151 of the outer skirt 150. Thus, the center of the fluid opening 124 and the circumferential position 151 are angularly aligned. As shown in Figure 4, the flow direction F is oriented tangentially to the outer skirt 150 at the circumferential position 151.

[0031] In some embodiments, the flow direction F does not need to be exactly tangential to the outer skirt 150. Instead, the flow direction F may be substantially tangential to the outer skirt 150. As used herein, “substantially tangential” means that the flow direction F is within + / - 15° of the tangential direction of the outer skirt 150 when taken at an angular position aligned with the fluid opening 124. Thus, the fluid can be directed in and around the annular region 180. By directing the fluid into the annular region 180 substantially tangential to the outer skirt 150, as will be described in more detail herein, the fluid can be distributed more uniformly around the annular region 180. In some embodiments, the fluid may have a lower temperature compared to the rest of the chemical processing vessel 110. Thus, by distributing the fluid more uniformly around the annular region 180, a more uniform heat distribution may exist around the annular region 180 and around the chemical processing vessel 110.

[0032] Referring further to Figures 1 and 4, the fluid director 200 is positioned above the fluid inlet 123 and can thus extend outward from the fluid inlet 123. In some embodiments, the fluid director 200 may extend outward from the fluid inlet by an extension distance C, which may be a portion of the height H. The extension C may be more than half of the inner diameter D of the fluid inlet 123. In some embodiments, the extension distance C may be greater than 0.15 times the inner diameter D. The extension distance C can prevent the fluid from moving radially R and thus can help direct the fluid in the flow direction F. As shown, the extension distance C can block the line of sight between the fluid opening 124 and the solid transport passage 121. Similarly, the extension distance C can block the line of sight between the fluid opening 124 and the outer skirt 150.

[0033] In this way, the fluid director 200 can prevent the fluid from directly colliding with the solid transport passage 121 and / or the outer skirt 150, and instead direct the fluid within and around the annular region 180. This may be beneficial in some embodiments, as direct collision of the fluid can create a thermal gradient within the solid transport passage 121 and / or the outer skirt 150. For example, in embodiments where the fluid temperature is lower than the operating temperature of the chemical processing vessel 100, direct collision of the fluid into the solid transport passage 121 can create a "cold" spot, in which case the temperature of the solid transport passage 121 at the collision site is lower than the ambient temperature of the solid transport passage 121. By preventing such direct collisions, the solid transport passage 121 can have a more uniform temperature and, consequently, lower thermal stress.

[0034] Referring further to Figures 1 and 4, the fluid director 200 may be positioned above the fluid inlet 123 so as to be spaced apart from the base 116. In particular, in some embodiments, the fluid director 200 may have a minimum distance between it and the base 116 that is greater than 0.5 times the inner diameter D of the fluid inlet 123.

[0035] In some embodiments, the fluid director 200 may be positioned above the fluid inlet 123 so as to be spaced apart from the bottom surface 106 of the plate 102. In some embodiments, the fluid director 200 may be coupled to the bottom surface 106 via one or more supports (not shown) extending between the bottom surface 106 and the fluid director 200 so as to fix the fluid director 200 in place. In some embodiments, the fluid director 200 may be coupled to the fluid inlet 123 via one or more supports (not shown) extending between the fluid inlet 123 and the fluid director 200 so as to fix the fluid director 200 in place. In some embodiments, the fluid director 200 may be coupled to the base 116 via one or more supports (not shown) extending between the base 116 and the fluid director 200 so as to fix the fluid director 200 in place.

[0036] The fluid director 200 can divert and / or decelerate the fluid entering the chemical processing vessel 110 through the fluid inlet 123. By diverting and / or redirecting the fluid, it can be distributed more uniformly around the annular region 180 and through the multiple openings 130. As a result, the temperature of the chemical processing vessel 110 can be made more uniform.

[0037] Referring now to Figure 5, another embodiment of the fluid director 220 is schematically shown. The fluid director 220 is substantially similar to the fluid director 200. Thus, similar numbers and letters are used to refer to similar features. For example, the fluid director 220 may have a height H measured in a direction aligned with the fluid inlet 123 and a width W measured in a direction perpendicular to the fluid inlet 123. The fluid director 220 may also have a length L (not shown in Figure 5) measured in a direction perpendicular to the radial direction R (e.g., the flow direction F). As shown, the fluid director 220 may have a hollow cylindrical shape extending in the flow direction F. Briefly referring to Figure 4, the fluid director 220 may look the same as the fluid director 200 when viewed from above, as shown. Referring back to Figure 5, the fluid director 220 may be coupled to the fluid inlet 123 so as to form a "T" with the fluid inlet 123. Therefore, the fluid can enter the fluid director 220 through the fluid inlet 123 and be directed by the fluid director 220 into the annular region 180 in the flow direction F.

[0038] Referring here to Figure 6, another embodiment of the fluid director 240 is schematically shown. The fluid director 240 is substantially similar to the fluid directors 200 and 220. Thus, similar numbers and letters are used to refer to similar features. For example, the fluid director 240 may have a height H measured in a direction aligned with the fluid inlet 123 and a width W measured in a direction perpendicular to the fluid inlet 123. The fluid director 240 may also have a length L (not shown in Figure 5) measured in a direction perpendicular to the radial direction R (e.g., the flow direction F). As shown, the fluid director 240 may have a first plate 242 and a second plate 244, each extending in the flow direction F. The first plate 242 may be oriented at an angle to the second plate 244. The first plate 242 and the second plate 244 may jointly define a concave surface in the direction facing the fluid inlet 123. In this way, the first plate 242 and the second plate 244 can substantially prevent the fluid from moving in the radial direction R, and thus can direct the fluid in the flow direction F. Accordingly, the fluid inlet 123 can be directed by the fluid director 240 into the annular region 180 in the flow direction F.

[0039] Referring back to Figure 1, in the embodiment, the chemical processing vessel 110 may include a spurger 160 above the plate 102 or within a solid transport passage 121 that can be operated to direct the gas toward the catalyst outlet 120. The spurger may be used to fluidize the material passing through the solid transport passage 121, although in some embodiments, defluidification can be performed without using a spurge due to the relatively large size of the solid transport passage 121. The spurger 160 may comprise a spurger body 162 and a plurality of spurger openings 164. During operation, the fluid may be directed through the spurger body 162 and the plurality of spurger openings 164 to help fluidize particulate solid from the chemical processing vessel 110. The fluid may also be directed downward toward the catalyst outlet 120, which can help fluidize particulate solid coming from above the plate 102 through the solid transport passage 121 and out of the catalyst outlet 120. The fluid may also be directed into the spurger body through a spurger supply pipe 166. The sparger 160 can deliver an oxygen-containing gas or an inert gas such as nitrogen into the chemical processing container 110.

[0040] In embodiments, the chemical processing vessel 110 may comprise a plurality of spargers 160, for example, two, three, five, or any number of spargers 160. In embodiments, the grid distributor 100 may comprise one or more loops 168. One or more loops 168 may be fixed to the plate 102 using any conventional or undetermined means, such as welding. One or more loops 168 may provide mechanical support to the spargers 160. The spargers 160 may comprise a refractory material stretched over the outside of the sparger body 162 of the sparger 160. As used herein, the refractory material is a material that can withstand decomposition by heat, pressure, or chemical attack and can maintain its strength and shape at high temperatures. Oxides of aluminum, silicon, magnesium, and calcium may be common materials used in the manufacture of refractory materials.

[0041] Referring here to Figure 3, an exemplary reactor system 300 in which the chemical processing vessel 110 of this disclosure may be located is schematically shown. The reactor system 200 generally comprises several system units, such as a reactor section 400 and a regenerator section 500. As used herein in relation to Figure 3, the reactor section 400 generally refers to the portion of the reactor system 300 in which the main process reaction takes place and particulate solids are separated from the reaction product logistics. In one or more embodiments, the particulate solids may be spent, meaning that the particulate solids are at least partially inactivated. Also as used herein, the regenerator section 500 generally refers to the portion of the reactor system 300 in which the particulate solids are regenerated by combustion or the like, and the regenerated particulate solids are separated from materials previously burned on the spent particulate solids or from other process materials such as gases generated from auxiliary fuels. The reactor section 400 generally comprises a reaction vessel 450, a riser 430 having an external riser segment 432 and an internal riser segment 434, and a particulate solid separation section 410. The regenerator section 500 generally comprises a particulate solid processing vessel 550, a riser 530 having an external riser segment 532 and an internal riser segment 534, and a particulate solid separation section 510. Generally, the particulate solid separation section 410 may be in fluid communication with the particulate solid processing vessel 550, for example by a standpipe 526, and the particulate solid separation section 510 may be in fluid communication with the reaction vessel 450, for example by a standpipe 324 and a transport riser 330.

[0042] Generally, the reactor system 300 is operated by supplying a hydrocarbon feed and a fluidized particulate solid to a reaction vessel 450, and reacting the hydrocarbon feed by contacting it with the fluidized particulate solid, thereby producing a product in the reaction vessel 450 of the reactor section 400. The product and particulate solid can exit the reaction vessel 450 and enter a gas / solid separation device 420 in the particulate solid separation section 410 via a riser 430, where the particulate solid can be separated from the product. The particulate solid can then exit the particulate solid separation section 410 and be transported to a particulate solid processing vessel 550. In the particulate solid processing vessel 550, the particulate solid can be regenerated by a chemical process. For example, spent particulate solid can be regenerated by one or more of the following: oxidation of the particulate solid by contact with an oxygen-containing gas, combustion of coke present on the particulate solid, and combustion of an auxiliary fuel to heat the particulate solid. Next, the particulate solid may exit the particulate solid processing vessel 550 and enter the riser termination device 578 via the riser 530, where the gas and particulate solid from the riser 530 are partially separated. The gas and residual particulate solid from the riser 530 are transported to the gas / solid separation device 520 in the particulate solid separation section 510, where the residual particulate solid is separated from the gas from the regeneration reaction. The particulate solid separated from the gas may be passed through a solid particle collection area 580, which may be structured as a grid distributor 100 of the chemical processing vessel of this disclosure (as further detailed in Figures 1 and 2). The separated particulate solid may then be passed from the solid particle collection area 580 to the reaction vessel 450, where the separated particulate solid is further utilized. Thus, the particulate solid may circulate between the reactor section 400 and the regeneration section 500.

[0043] The solid particle collection area 580 may also include an oxygen treatment zone. The oxygen treatment zone may be in fluid communication with the reactor section 450 (for example, via a standpipe 324 and a transport riser 330) so that the treated catalyst can be returned and supplied from the catalyst treatment section 500 of the reactor system 300 to the reactor section 400. The oxygen treatment zone may include an oxygen-containing gas inlet 328, such as a fluid inlet 123 of the grid distributor 100 of this disclosure, which can supply an oxygen-containing gas to the oxygen treatment zone for the oxygen treatment of the catalyst.

[0044] Referring again to Figure 1, the disclosure also covers a method for operating the chemical processing vessel 110. The method may include passing a fluid into the chemical processing vessel 110 under reaction conditions through a fluid inlet 123 below the grid distributor 100, and directing the fluid through the grid distributor 100 within the chemical processing vessel 110. The grid distributor 100 may include a plate 102 having an upper surface 104 and a lower surface 106 opposite the upper surface that defines the thickness of the plate 102. The plate 102 may include a plurality of openings 130 extending through the thickness of the plate 102. The plate 102 may include a central opening 121B. A solid transport passage 121 may extend from the central opening 121B to a catalyst outlet 120, forming a passage from the upper region of the plate 102 to the catalyst outlet 120. The solid transport passage 121 and the plate 102 may be connected so that they form a single unit. The solid transport passage 121 may have a larger cross-sectional area than the catalyst outlet 120 at the central opening 121B of the plate 102. The method may include discharging the catalyst from above the plate 102 through the solid transport passage 121, and discharging it from the chemical processing container 110 through the catalyst outlet 120.

[0045] The chemical processing vessel 110 may have any of the features previously discussed in this disclosure. The grid distributor 100 may have any of the features previously discussed in this disclosure. The solid transport passage 121 may have any of the features previously discussed in this disclosure. [Examples]

[0046] Examples that may disclose one or more embodiments of the present disclosure are provided herein. However, the examples should not be considered to limit the claimed embodiments provided below.

[0047] Example 1: Effect of fluid director shape on temperature inside chemical processing vessel In Example 1, a chemical processing vessel equipped with a fluid director having a flat shape (hereinafter, "fluid director A") was compared with a chemical processing vessel equipped with a fluid director having an arched shape (hereinafter, "fluid director B") using a 3D computational fluid dynamics (CFD) model. The model was created using Ansys Fluent Version 19.4 software. Both chemical processing vessels have a fluid inlet that provides a gas flow at a temperature of 30°C and an inlet velocity of 40 ft / s. Both chemical processing vessels direct the gas flow to a fluidized bed reactor operating at a temperature of °C, which has a central recovery standpipe with a 5-inch insulated refractory lining.

[0048] In Example 1, fluid director A has a circular, flat plate shape with a diameter of 24 inches. It is oriented parallel to the grid distributor and positioned approximately 12 inches away from the fluid inlet (center-to-center distance). Conversely, fluid director B has a curved shape, such as that described above with reference to fluid director 200. Specifically, fluid director B has a semi-cylindrical shape with a height of 18 inches, a width of 36 inches, and a length of 36 inches. Fluid director B is oriented upward from the fluid inlet, with a distance of 14.5 inches at its furthest point and an overhang of 3.5 inches from the fluid inlet.

[0049] As illustrated in Figures 7A and 7B, the temperature of the solid transport passage in a chemical processing vessel having fluid director A (Figure 7A) is compared with the temperature of the solid transport passage in a chemical processing vessel having fluid director B (Figure 7B). The temperature of the solid transport passage was obtained from a CFD model. As illustrated in Figures 7A and 7B, compared to fluid director A, fluid director B exhibits a more uniform temperature around the solid transport passage. Specifically, as illustrated in Figure 7A, when the chemical processing vessel has fluid director A, the maximum temperature difference around the solid transport passage can be approximately 160°C. Conversely, as illustrated in Figure 7B, when the chemical processing vessel has fluid director B, the maximum temperature difference around the solid transport passage can be approximately 80°C or less. Therefore, in the embodiment, a curved fluid director such as fluid director B can limit the maximum difference in the solid transport passage to less than approximately 160°C, less than approximately 100°C, or less than approximately 80°C.

[0050] As illustrated in Figures 8A and 8B, the temperature of the grid distributor in a chemical processing vessel having fluid director A (Figure 8A) is compared with the temperature of the grid distributor in a chemical processing vessel having fluid director B (Figure 8B). The grid distributor temperature was obtained from a CFD model. As illustrated in Figures 8A and 8B, compared to fluid director A, fluid director B exhibits a more uniform temperature in the grid distributor. Specifically, as illustrated in Figure 8A, when the chemical processing vessel has fluid director A, the maximum temperature difference around the grid distributor can be approximately 60°C. As illustrated in Figure 8B, when the chemical processing vessel has fluid director B, the maximum temperature difference around the grid distributor can be approximately 40°C. Therefore, in the embodiment, a curved fluid director such as fluid director B can limit the maximum difference in the grid distributor to less than approximately 60°C, less than approximately 50°C, or less than approximately 40°C.

[0051] One or more aspects of the present disclosure are described herein. One aspect may include a chemical processing vessel comprising: a base; a grid distributor; a solid transport passage extending between the base and the grid distributor in the central region of the base and the grid distributor, respectively; an outer skirt having walls radially arranged around the outer periphery of the base and the grid distributor, wherein the base, the grid distributor, the solid transport passage, and the outer skirt define an annular region between the outer skirt and the solid transport passage; a fluid inlet penetrating the base and extending into the annular region; and a fluid director positioned within the annular region and molded to direct the fluid from the fluid inlet into the annular region in a fluid direction substantially tangential to the outer skirt.

[0052] Another embodiment is any single embodiment or combination thereof in which the fluid inlet is a pipe and the fluid director protrudes from the fluid inlet.

[0053] Another embodiment is any single embodiment or combination thereof in which the fluid director has a semi-cylindrical shape.

[0054] Another embodiment is that the fluid director is any single embodiment or combination thereof having a cylindrical shape.

[0055] Another embodiment is any single embodiment or combination thereof in which the fluid director has a height in a first direction aligned with the fluid inlet and a width in a second direction perpendicular to the fluid inlet, wherein the height is more than half the width.

[0056] Another embodiment is any single embodiment or combination thereof in which the fluid director has a height in a first direction aligned with the fluid inlet, a width in a second direction perpendicular to the fluid inlet, and a length in a third direction aligned with the flow direction, wherein the length is greater than or equal to the width.

[0057] Another embodiment is any single embodiment or combination thereof, wherein the fluid inlet has a diameter, and the fluid director has a height in a first direction aligned with the fluid inlet and a width in a second direction perpendicular to the fluid inlet, the width being at least twice the diameter of the fluid inlet.

[0058] Another embodiment is any single embodiment or combination thereof in which the fluid director is spaced apart from the base.

[0059] Another embodiment is any single embodiment or combination thereof in which the fluid director is spaced apart from the grid distributor.

[0060] Another embodiment is any single embodiment or combination thereof in which the fluid director is coupled to the fluid inlet.

[0061] Another embodiment is any single embodiment or combination thereof, in which the fluid director is coupled to the base.

[0062] Another embodiment is any single embodiment or combination thereof in which the fluid director is centrally located relative to the fluid inlet, or the fluid director blocks the direct path between the fluid inlet and the solid transport passage, or both.

[0063] Another embodiment is any single embodiment or combination thereof in which the outer skirt wall is substantially frustoconical.

[0064] Another embodiment is a method for operating a chemical processing vessel, comprising passing a fluid through the chemical processing vessel, wherein the chemical processing vessel comprises a base, a grid distributor, a solid transport passage, the solid transport passage extending between the base and the grid distributor in the central region of the base and the grid distributor, and an outer skirt having substantially frustoconical walls radially arranged around the outer periphery of the base and the grid distributor, the base, the grid distributor, the solid transport passage, and the outer skirt defining an annular region between the outer skirt and the solid transport passage, a fluid inlet penetrating the base and extending into the annular region, and a fluid director positioned within the annular region and shaped to direct the fluid from the fluid inlet into the annular region in a fluid direction substantially tangential to the outer skirt, the method comprising passing the fluid through and directing the fluid using the fluid director, wherein the fluid is directed from the fluid inlet into the annular region in a fluid direction substantially tangential to the outer skirt.

[0065] Another embodiment is any single embodiment or combination thereof in which the fluid is directed using a fluid director to limit the maximum temperature difference of the solid transport passage to less than 100°C.

[0066] It will be apparent to those skilled in the art that various modifications and changes can be made to the embodiments described herein without departing from the spirit and scope of the claimed subject matter. Accordingly, this specification is intended to cover such modifications and changes to the various embodiments described herein, provided that such modifications and changes fall within the scope of the appended claims and their equivalents.

Claims

1. A chemical processing container, The base and, Grid distributor and A solid transport passage, comprising a solid transport passage extending between the base and the grid distributor in the central region of the base and the grid distributor, respectively, An outer skirt comprising walls arranged radially around the base and the outer circumference of the grid distributor, wherein the base, the grid distributor, the solid transport passage, and the outer skirt define an annular region between the outer skirt and the solid transport passage, A fluid inlet extending through the base into the annular region, A chemical processing vessel comprising: a fluid director disposed within the annular region and shaped to direct the fluid from the fluid inlet into the annular region in a fluid direction substantially tangential to the outer skirt.

2. The chemical processing vessel according to claim 1, wherein the fluid inlet is a pipe and the fluid director protrudes from the fluid inlet.

3. The chemical processing vessel according to claim 1 or 2, wherein the fluid director has a semi-cylindrical shape.

4. The chemical processing vessel according to claim 1 or 2, wherein the fluid director has a cylindrical shape.

5. The chemical processing vessel according to any one of claims 1 to 4, wherein the fluid director has a height in a first direction aligned with the fluid inlet and a width in a second direction perpendicular to the fluid inlet, and the height is at least half of the width.

6. The chemical processing vessel according to any one of claims 1 to 5, wherein the fluid director has a height in a first direction aligned with the fluid inlet, a width in a second direction perpendicular to the fluid inlet, and a length in a third direction aligned with the flow direction, the length being greater than the width.

7. The fluid inlet has a diameter, The fluid director has a height in a first direction aligned with the fluid inlet and a width in a second direction perpendicular to the fluid inlet. The chemical processing vessel according to any one of claims 1 to 6, wherein the width is twice or more the diameter of the fluid inlet.

8. The chemical processing vessel according to any one of claims 1 to 7, wherein the fluid director is spaced apart from the base.

9. The chemical processing vessel according to any one of claims 1 to 8, wherein the fluid director is spaced apart from the grid distributor.

10. The chemical processing vessel according to any one of claims 1 to 9, wherein the fluid director is coupled to the fluid inlet.

11. The chemical processing vessel according to any one of claims 1 to 10, wherein the fluid director is coupled to the base.

12. The fluid director is positioned centrally with respect to the fluid inlet, or The chemical processing vessel according to any one of claims 1 to 11, wherein the fluid director either blocks the direct path between the fluid inlet and the solid transport passage or both.

13. The chemical processing vessel according to any one of claims 1 to 12, wherein the wall of the outer skirt is substantially frustoconical in shape.

14. A method for operating a chemical processing vessel, Passing a fluid through the chemical treatment container, wherein the chemical treatment container is The base and, Grid distributor and A solid transport passage, comprising a solid transport passage extending between the base and the grid distributor in the central region of the base and the grid distributor, respectively, An outer skirt comprising substantially frustoconical walls arranged radially around the base and the outer circumference of the grid distributor, wherein the base, the grid distributor, the solid transport passage, and the outer skirt define an annular region between the outer skirt and the solid transport passage, A fluid inlet extending through the base into the annular region, A fluid director is provided, which is positioned within the annular region and is shaped to direct the fluid from the fluid inlet into the annular region in a fluid direction substantially tangential to the outer skirt. A method comprising directing the fluid using the fluid director such that the fluid is directed from the fluid inlet into the annular region in a fluid direction substantially tangential to the outer skirt.

15. The method according to claim 14, wherein directing the fluid using the fluid director limits the maximum temperature difference of the solid transport passage to less than 100°C.

Images