Drying system and method for drying products

Abstract

The present invention relates in particular to a drying system (10) for drying products (12) such as medical products, electronic products, and food products, the drying system comprising a processing chamber (11) in which the products can be placed, and a heating unit for heating the processing chamber and / or the products. The drying system further comprises a moisture measuring unit (19) having a trace moisture measuring device (20) for measuring residual moisture in the processing chamber.

Description

Technical Field

[0001] The present invention relates to a drying system and method for drying products, particularly products such as medical products, electronic products, and food products. The drying system includes a processing chamber in which the products can be placed, and a heating unit for heating the processing chamber and / or the products.

[0002] Drying systems of the above-mentioned type are actually known and are typically used for drying or dehumidifying products in the trace moisture range, which can be products such as medical products, electronic products, and food products. The term "trace moisture" refers to trace moisture in the ppm range, particularly in the range of 1000 ppm or less.

Background Art

[0003] Such a drying system typically includes a processing chamber in which the products can be placed, and a heating unit for heating the processing chamber and / or the products. To carry out the drying process, the products are then placed in the processing chamber and dried by heating the processing chamber and / or the products, and after reaching the drying time, they are removed from the processing chamber in a dried state. At this time, the target is that the trace moisture remaining in the dried product, also called the residual moisture of the product, is below the target moisture. However, since the drying time in the drying systems known from practice is based only on empirical values, as a result, the products do not stay in the processing chamber long enough, so the residual moisture of the products exceeds the desired target moisture, or the products stay in the processing chamber longer than necessary, frequently resulting in inefficient use of energy costs and processing time. This always leads to an increase in defective products and / or an increase in product costs.

Summary of the Invention

[0004] Therefore, an object of the present invention is to propose a drying system and method that can minimize defective products and at the same time dry products at low cost.

[0005] This objective is achieved by a drying system having the features of claim 1, and a method having the features of claim 12.

[0006] The drying system according to the present invention is a drying system for drying products such as medical products, electronic products, and food products, and the drying system is A processing chamber in which the aforementioned product may be placed, The processing chamber and / or a heating unit for heating the product, Equipped with, The drying system is a drying system that includes a moisture measuring unit having a trace moisture measuring device for measuring residual moisture in the processing chamber.

[0007] The drying system according to the present invention is suitable for drying and / or dehumidifying solid products such as medical products, electronic products, and food products, and can be used to dry and / or dehumidify products in the trace moisture range, i.e., the ppm range. Products can be dried or dehumidified using the drying system so that the moisture contained in the product after drying, or the intrinsic moisture content of the product, is in the trace moisture range, particularly 1000 ppm or less. If the moisture content in the product or material moisture is already in the trace moisture range before drying, the residual moisture content of the product can be further reduced using the drying system.

[0008] The drying system according to the present invention comprises a processing chamber in which a product can be placed, and a heating unit for heating the processing chamber and / or the product. Thus, the product can be heated directly, and / or indirectly by heating the processing chamber. Heating the product and / or the processing chamber controls the temperature of the product and / or the processing chamber and / or, in particular, the processing air within the processing chamber. As a result, liquids or mixtures of liquid substances, particularly water and / or solvents, present in the product, for example in pores, which cause moisture in the product, material moisture, or residual moisture, are converted into a gaseous condensed state and can escape from the product into the processing air surrounding the product in order to dehumidify or dry the product. This may increase the moisture and / or residual moisture in the processing air to a measurable degree.

[0009] The drying system according to the present invention comprises a moisture measuring unit having a trace moisture measuring device, i.e., a moisture measuring device configured to measure trace moisture, for measuring and / or determining the trace moisture or residual moisture of a product and / or the trace moisture or residual moisture in the processing chamber and / or the processed air present in the processing chamber. Residual moisture is trace moisture within the trace moisture range. The trace moisture measuring device may be provided and / or configured in particular for measuring the residual moisture of the processed air, and the residual moisture of the product may be determined or estimated from the trace moisture measuring device. Thus, the drying system according to the present invention makes it possible to measure and / or determine the residual moisture of the product and / or the residual moisture in the processing chamber and / or the processed air present in the processing chamber during the drying process. Therefore, it is always possible to compare the current residual moisture of the product and / or the current residual moisture in the processing chamber and / or the processed air during the drying process with a desired target moisture and optimally adjust the drying time to suit the product. Thus, energy costs and processing time can be used efficiently and waste can be reduced. Thus, the drying system according to the present invention dries products cost-effectively and simultaneously reduces the rejection rate.

[0010] To perform vacuum drying during the drying process and / or while the processing chamber and / or product are being heated, a vacuum may be created in the processing chamber, at least temporarily. This allows the boiling point of the liquid and / or mixture of liquid substances to be lowered according to the vapor pressure curve, so that evaporation can occur at relatively low temperatures. This type of vacuum drying is particularly gentle on the product and can reach hard-to-reach areas within the product's shape.

[0011] A drying system may have a housing, particularly a cabinet-like housing. Therefore, a drying system may be designed as a drying cabinet. The housing may have a door, which, when opened, can be opened to allow products to be placed inside the processing chamber and to remove dried products from the processing chamber.

[0012] The drying system may include a temperature measuring unit for measuring the temperature of the processing chamber and / or the processing air and / or the product.

[0013] The drying system may include a pressure measuring unit for measuring the pressure of the processing chamber and / or the processing air.

[0014] The heating unit may be configured to heat the processing chamber and / or the processing air and / or the product to a temperature of +200°C or higher.

[0015] Preferably, the heating unit may be designed as a jacketed heater. For this purpose, the processing chamber and / or housing may have a cover that can surround the processing chamber. Thus, the heating unit can heat the processing chamber on all sides. A heat exchange medium may flow through the cover. Preferably, an oily heat exchange medium may be used as the heat exchange medium. Designing the heating unit as a jacketed heater ensures that potentially explosive air inside the processing chamber does not pose a risk to process safety.

[0016] Preferably, in order to achieve optimized heating of the processing chamber and / or the processing air and / or the product, the drying system may include an air circulation unit for circulating the processing air present in the processing chamber.

[0017] Preferably, the drying system may include an inlet for supplying processed air and / or supply air into the processing chamber.

[0018] Preferably, the drying system may be equipped with an outlet for discharging processed air and / or exhaust from the processing chamber.

[0019] Preferably, the air circulation unit may include an air circulation pipe connected to an outlet and an inlet, and / or the inlet connected to the outlet, and the air circulation unit may include a circulation device, preferably a fan, which may be integrated with the air circulation pipe and designed to circulate the processed air through the air circulation pipe in order to circulate the processed air within the processing chamber. By the circulation device, the processed air may then be exhausted and / or discharged from the processing chamber through the outlet, pass through the air circulation pipe, and then be supplied back into the processing chamber through the inlet. This creates a flow of processed air within the processing chamber, and uniform heating of the processing chamber and / or the processed air and / or the product can be achieved. The circulation device may have a fan or may be designed as a fan. The fan may be designed as a radial fan or an axial fan. The fan's drive motor may be located outside the air circulation pipe, and the fan wheel of the fan may be connected and / or coupled to the drive motor by the fan's shaft.

[0020] Trace moisture measurement devices can operate based on the coulometric principle or the principle of oscillating quartz crystal microbalance (QCM). Therefore, trace moisture measurement devices can be designed as coulometric moisture sensors or quartz crystal moisture analyzers. Alternatively, trace moisture measurement devices can also be designed as metal oxide moisture sensors.

[0021] Preferably, the moisture measuring unit can be integrated into the air circulation pipe so that the residual moisture in the processed air discharged from the processing chamber can be measured by a trace moisture measuring device. The residual moisture can then be measured while the air circulation unit is operating. Therefore, preferably, the moisture measuring unit and / or trace moisture measuring device can be positioned upstream of the circulation device and / or fan when viewed from the direction of the processed air flow.

[0022] In one embodiment of the drying system, a trace moisture measuring device may be located within and / or integrated into the air circulation pipe.

[0023] In an alternative embodiment of the drying system, the moisture measurement unit may comprise a bypass pipe connected to an air circulation pipe, in which a trace moisture measuring device may be located and / or integrated into the bypass pipe. The moisture measuring device may further comprise a measuring gas pump located in the bypass pipe, preferably downstream of the trace moisture measuring device, and / or a cooling channel located in the bypass pipe, preferably upstream of the trace moisture measuring device. Thus, the trace moisture measuring device, and, where applicable, the measuring gas pump and / or cooling channel, are located in a bypass pipe parallel to the air circulation pipe. By locating the trace moisture measuring device in the bypass pipe, a reduction in the flow velocity of the processed air in the air circulation pipe can be avoided. A relatively small amount of processed air that can form the measuring gas can flow through the bypass pipe, and this can be used to measure residual moisture. The use of a measuring gas pump ensures that the trace moisture measuring device is continuously and accurately pressurized. If the temperature of the measuring gas is too high for the trace moisture measuring device, the measuring gas can be cooled by the cooling channel and / or cooling device. Preferably, the measuring gas pump and / or cooling channel are positioned downstream or upstream of the trace moisture measuring device, with respect to the flow direction of the measuring gas in the bypass pipe.

[0024] Preferably, the drying system may comprise an exhaust unit for evacuating the processing chamber. By means of the exhaust unit, the process air can be discharged from the processing chamber and / or the drying system, for example to the environment, and a vacuum can be formed and / or brought about in the processing chamber. In principle, the vacuum is considered to be a low vacuum, a fine vacuum, or a high vacuum. The exhaust unit may be configured to bring about a pressure of less than 100 mbar in the processing chamber.

[0025] Preferably, the exhaust unit may comprise an exhaust pipe and an exhaust device integrated into the exhaust pipe, preferably a vacuum pump. Preferably, the exhaust pipe may be connected between an air circulation pipe, preferably a moisture measurement unit and / or a trace moisture measurement device and a circulation device and / or a fan, as a result of which the configuration is simplified. Furthermore, residual moisture can thus also be measured during evacuation. The process air can, for example via a three-way valve, after passing through the moisture measurement unit and / or the trace moisture measurement device, depending on the operating mode of the drying system, be re-supplied to the processing chamber via the circulation device and / or the fan, or discharged from the drying system, for example to the environment, via the exhaust unit. It is also conceivable that the drying system comprises a further outlet to which the exhaust pipe can be connected.

[0026] Preferably, the drying system may comprise a heat exchanger integrated into the exhaust pipe. Preferably, the heat exchanger may be arranged upstream of the exhaust device and / or the vacuum pump when viewed in the flow direction of the process air in the exhaust pipe. The heat exchanger can be used to transfer heat from the process air to a refrigerant. In this way, energy recovery can be achieved and / or the process air to be exhausted or discharged can be cooled.

[0027] Suitably, the drying system may comprise a cleaning unit having at least one cleaning device for cleaning the processing chamber using a cleaning gas, particularly an inert gas, preferably nitrogen or dry air. After cleaning the processing chamber using the cleaning gas, the cleaning gas may be present in the processing chamber, and / or optionally after prior evacuation of the processing chamber by the exhaust unit, the processing chamber may be filled with the cleaning gas as processing air, such that the cleaning gas can substantially form the processing air present in the processing chamber. The cleaning unit comprises at least one cleaning pipe, via which the cleaning device may be connected downstream of the circulation device and / or the fan in the direction of flow of the processing air in the air circulation pipe, preferably the air circulation pipe, such that the cleaning gas can preferably enter the processing chamber via the inlet and the configuration is simplified. The drying system may also be considered to comprise a further inlet to which the cleaning pipe may be connected. Further, the cleaning device may have a metering valve, by which the amount of the cleaning gas may be metered. In a preferred embodiment of the drying system, the drying system may comprise two cleaning devices, the first cleaning device may be configured to clean the processing chamber using nitrogen, and the second cleaning device may be configured to clean the processing chamber using dry air. Thus, the cleaning unit may comprise two cleaning lines.

[0028] A further preferred embodiment of the drying system results from the description of the features of the dependent claims referring to claim 12 of the method.

[0029] In a method according to the invention, in particular products such as medical products, electronic products, foodstuffs are dried by means of a drying system The product is placed in the processing chamber of the drying system, and the processing chamber and / or the product are heated by the heating unit of the drying system In particular, the residual moisture in the processing chamber is measured by the trace moisture measurement device of the moisture measurement unit of the drying system.

[0030] For preferred effects of the method according to the present invention, please refer to the description of the advantages of the drying system according to the present invention.

[0031] Preferably, the placement of the product within the processing chamber can be carried out at ambient temperature. Thus, the processing chamber can be maintained at ambient temperature.

[0032] Preferably, the residual moisture content of the processing chamber and / or the processed air present in the processing chamber can be measured. The residual moisture content of the product can be determined from the residual moisture content of the processed air, and / or the residual moisture content of the product can be estimated. Therefore, the residual moisture content of the product can be easily determined from the residual moisture content in the processing chamber and / or the processed air.

[0033] During heating of the processing chamber and / or the product, a vacuum may be formed, at least temporarily, within the processing chamber in order to perform vacuum drying.

[0034] Preferably, the processing chamber and / or the product can be heated to a target temperature by heating the processing chamber and / or the product.

[0035] Residual moisture content may be measured during heating of the processing chamber and / or the product.

[0036] Preferably, residual moisture can be measured and / or determined at least once after the target temperature has been reached.

[0037] Residual moisture may be measured at least once after heating the processing chamber and / or the product.

[0038] Preferably, the residual moisture content can be compared to a target moisture content. The drying process can be terminated as soon as the target moisture content is reached or falls below it. The dried product can then be removed from the processing chamber, preferably after the processing chamber has cooled, preferably to ambient temperature.

[0039] Preferably, in order to achieve uniform heating of the processing chamber and / or the processing air and / or the product, the processing air present in the processing chamber may be circulated at least temporarily by the air circulation unit of the drying system while the processing chamber and / or the product are being heated. To obtain a reliable value of residual moisture, residual moisture may be measured while the air circulation unit is operating.

[0040] Preferably, residual moisture in the processed air and / or exhaust gas discharged from the processing chamber can be measured during the circulation of the processed air within the processing chamber, or as a result thereof.

[0041] Preferably, the processing chamber may be evacuated by the exhaust unit of the drying system before the processing chamber and / or the product are heated, and after the processing chamber has been evacuated, the processing chamber may be cleaned with a cleaning gas, particularly an inert gas, preferably nitrogen or dry air, by at least one cleaning device of the cleaning unit of the drying system, so that the cleaning gas may be present in the processing chamber after it has been cleaned with the cleaning gas. During evacuation, a vacuum may be initially formed or constructed in the processing chamber. The pressure in the processing chamber may be equivalent to the ambient pressure before evacuation, and may be less than, for example, 100 mbar. During evacuation, relatively humid air and / or processing air that may have initially been present in the processing chamber may be discharged from the processing chamber or the drying system, for example, into the environment. This is because, for example, the placement of the product in the processing chamber causes ambient air to flow into the processing chamber. During cleaning, as a result of evacuating the processing chamber, the vacuum previously constructed in the processing chamber may be released again. Thus, the pressure in the processing chamber substantially matches the ambient pressure after the processing chamber has been cleaned with the cleaning gas. Since inert gases do not contain water vapor, cleaning and / or filling a processing chamber with a cleaning gas may result in the processing air inside the chamber being substantially dry after cleaning. In principle, it is possible to evacuate without cleaning, or to clean without evacuating.

[0042] Preferably, the initial value can be determined by measuring the residual moisture content before heating the processing chamber and / or the product. Preferably, the initial value can be determined by measuring the residual moisture content after exhausting and cleaning the processing chamber with a cleaning gas. Preferably, to determine the initial value, heating of the processing chamber and / or the product can be performed after the residual moisture content has been measured.

[0043] Preferably, especially if the residual moisture measured after reaching the target temperature exceeds the target moisture, the processing chamber and / or product may be evacuated at least once by the exhaust unit of the drying system while the processing chamber and / or product is preferably heated to the target temperature, or after the processing chamber and / or product is heated, and the processing chamber may be cleaned after the processing chamber has been evacuated by at least the cleaning device of the cleaning unit of the drying system using a cleaning gas, particularly an inert gas, preferably nitrogen or dry air, so that cleaning gas is present in the processing chamber after the processing chamber has been cleaned with the cleaning gas. Thus, the evacuation and the subsequent cleaning gas may occur at least once. During evacuation, a vacuum may be formed and / or constructed in the processing chamber first. The pressure in the processing chamber may be equivalent to the ambient pressure before evacuation, and may be reduced to a target pressure, e.g., less than 100 mbar. As a result of heating the processing chamber and / or product, it is possible, or would be possible, for liquids located in the product to be converted into a gaseous condensation state, which increases the moisture and / or residual moisture in the processing air, which may have been substantially dry until then. During exhaust, process air containing relatively high moisture content and / or relatively high residual moisture content can be removed from the process chamber. During cleaning, the vacuum previously built up in the process chamber as a result of exhausting the process chamber can be released again. Therefore, the pressure inside the process chamber after cleaning with the cleaning gas can be substantially equal to the ambient pressure. Since inert gases do not contain water vapor in particular, cleaning and / or filling the process chamber with the cleaning gas may result in the process air inside the chamber being substantially dry initially after cleaning. If exhaust and cleaning occur during heating, the air circulation unit may be switched off during exhaust and cleaning and switched on again after exhaust and cleaning. If exhaust and cleaning occur after heating, heating may be continued after exhaust and cleaning, and if necessary, after measuring residual moisture. In principle, it is possible to exhaust without cleaning, and to clean without exhaust.

[0044] Residual moisture can be measured after exhaust and cleaning.

[0045] Preferably, the exhaust of the processing chamber, cleaning of the processing chamber with a cleaning gas, and, if necessary, the continuation of heating if exhaust and cleaning occur after heating, can be repeated until the residual moisture reaches or falls below the target moisture level. Thus, the residual moisture can be continuously reduced until the desired target moisture level is reached by performing the above loop.

[0046] The target moisture content may be, for example, between 1 ppm and 1000 ppm.

[0047] Further preferred embodiments of the method can be obtained from the description of the features of the dependent claims relating to claim 1 of the apparatus. [Brief explanation of the drawing]

[0048] Preferred embodiments of the present invention will be described in more detail below with reference to the attached drawings. [Figure 1] Figure 1 shows a schematic diagram of the drying system. [Figure 2a] Figure 2a shows a partial schematic diagram of the further drying system in the area of ​​the moisture measurement unit of the drying system. [Figure 2b] Figure 2b shows a partial schematic diagram of the further drying system in the area of ​​the moisture measurement unit of the drying system. [Figure 2c] Figure 2c shows a partial schematic diagram of the further drying system in the area of ​​the moisture measurement unit of the drying system. [Figure 3] Figure 3 shows a flowchart of the method for the drying system. [Figure 4] Figure 4 shows the residual moisture content over a certain period during the execution of the method. [Modes for carrying out the invention]

[0049] Figure 1 shows a drying system 10 comprising a processing chamber 11 in which the product 12 is placed, and a heating unit designed to heat the processing chamber 11 and the product 12 as a jacket heater, the heating unit not shown here. Furthermore, the drying system 10 includes an air circulation unit 13 for circulating the processing air present in the processing chamber 11. The air circulation unit 13 comprises an air circulation pipe 16 and a fan 17, the air circulation pipe 16 being connected to the outlet 14 and inlet 15 of the drying system 10, and the fan 17 being integrated with the air circulation pipe 16 and configured to circulate the processing air in the flow direction indicated by arrow 18 through the air circulation pipe 16 in order to circulate the processing air within the processing chamber 11. Furthermore, the drying system 10 includes a moisture measuring unit 19 integrated into the air circulation pipe 16 upstream of the fan 17 when viewed from the flow direction, and a trace moisture measuring device 20, the trace moisture measuring device 20 located within the air circulation pipe 16, which can measure the residual moisture in the processed air discharged from the processing chamber 11 through the outlet 14. Furthermore, the drying system 10 includes an exhaust unit 21 for exhausting the processing chamber 11. The exhaust unit 21 includes an exhaust pipe 22 connected to the air circulation pipe 16 between the moisture measuring unit 19 and / or the trace moisture measuring device 20 and the fan 17, and a vacuum pump 23. The vacuum pump 23 can exhaust and / or discharge the processed air from a portion of the processing chamber 11 via the air circulation pipe 16, and may exhaust and / or discharge it via the exhaust pipe 22 in a further flow direction indicated by arrow 24, for example, into the environment. Furthermore, the drying system 10 includes a cleaning unit 25 having a first cleaning device 26 for cleaning the processing chamber 11 using nitrogen and a second cleaning device 27 for cleaning the processing chamber 11 using dry air.The first cleaning device 26 and / or the second cleaning device 27 are connected to the air circulation pipe 16 via the first cleaning line 28 and / or the second cleaning line 29 of the cleaning unit 25, downstream of the fan 17 when viewed in the direction of flow. The first cleaning device 26 and / or the second cleaning device 27 have a first metering valve 30 and / or a second metering valve 31.

[0050] Figure 2a shows a moisture measuring unit 32 of a drying system (not shown) having a trace moisture measuring device 34 located within an air circulation pipe 33 of the drying system's air circulation unit (not shown). Moisture measuring unit 32 corresponds to moisture measuring unit 19. In this respect, Figure 2a can be understood as a partial view of the area of ​​moisture measuring unit 19 in Figure 1. Thus, this drying system could be drying system 10.

[0051] Figure 2b shows a moisture measurement unit 35 of a drying system (not shown) having a bypass pipe 37 connected to an air circulation pipe 36 of an air circulation unit (not shown) of the drying system, wherein a trace moisture measurement device 38 of the moisture measurement unit 35 is located in the bypass pipe, and the moisture measurement unit 35 further comprises a measuring gas pump 39 located in the bypass pipe 37 downstream of the trace moisture measurement device 38. This drying system may also be designed in the same way as drying system 10.

[0052] Figure 2c shows a moisture measurement unit 40 of a drying system (not shown) having a bypass pipe 42 connected to an air circulation pipe 41 of an air circulation unit (not shown) of the drying system, wherein a trace moisture measurement device 43 of the moisture measurement unit 40 is located in the bypass pipe, and the moisture measurement unit 40 further comprises a measuring gas pump 44 located in the bypass pipe 42 downstream of the trace moisture measurement device 43, and a cooling channel 45 located in the bypass pipe 42 upstream of the trace moisture measurement device 43. The drying system may also be designed in the same way as drying system 10.

[0053] Figure 3 shows a flowchart of a method for drying product 12. This method is performed using a drying system 10. After start 46, product 12 is placed in the processing chamber 11 in the first step 47. The processing chamber 11 is then evacuated by the exhaust unit 21 to a pressure preferably less than 100 mbar in the second step 48, and then washed to ambient pressure by the washing unit 25 in the third step 49. Next, in the fourth step 50, an initial measurement of residual moisture in the processing chamber 11 is measured and / or determined by the trace moisture measuring device 20. In the fifth step 51, the processing chamber 11 and product 12 are heated to a target temperature by the heating unit while the air circulation unit 13 is operating. After heating, the processing chamber 11 is evacuated by the exhaust unit 21 to a target pressure in the sixth step 52, and then washed to ambient pressure by the washing unit 25 in the seventh step 53. In step 8, step 54, the residual moisture in the processing chamber 11 is measured and / or determined by the trace moisture measuring device 20 and compared with the target moisture in step 9, step 55. Steps 51, 6, 7, 8, 54, and 9 are repeated until the target moisture is reached or falls below it. Steps 6, 52, 7, 8, 54, and 9 may also be performed during heating, particularly while the processing chamber and product are heated to the target temperature, and as a result, in this case, steps 6, 52, 7, 8, 54, and 9 may also be repeated until the target moisture is reached or falls below it. Steps 8, 54, and 9 may also be performed before step 6, step 52. If the residual moisture reaches or falls below the target moisture level, the processing chamber 11 may be cooled in the 10th step 56, and the product 12 may be removed and / or taken out of the processing chamber 11 in the 11th step 57. The process reaches completion 58.

[0054] Of course, this method may also be carried out using the drying system shown in Figures 2a-2c.

[0055] Figure 4 shows the residual moisture and / or water content on the vertical axis 59 and / or the saturation of the treated air over time on the horizontal axis 60 during the execution of the method according to the flow diagram shown in Figure 3. The first measurement curve 61, the second measurement curve 62, and the third measurement curve 63 for residual moisture are shown. In each case, the measurement curves 61, 62, and 63 initially increase because the liquid, especially water, in the product 12 is converted into a gaseous condensed state as a result of heating and enters the treated air. Subsequently, in each case, they eventually reach a substantially constant value (not shown) that extends roughly parallel to the horizontal axis 60. Figure 4 illustrates how, in this implementation, residual moisture can be continuously reduced until it falls below the target moisture level shown by the straight line 64 by repeating steps 62 and 753 twice.

Claims

1. A drying system (10) for drying products (12) in particular such as medical products, electronic products, and food products, wherein the drying system is A processing chamber (11) in which the product may be placed, The processing chamber and / or a heating unit for heating the product, Equipped with, The drying system includes a moisture measuring unit (19, 32, 35, 40) having a trace moisture measuring device (20, 34, 38, 43) for measuring residual moisture in the processing chamber. Drying system.

2. The aforementioned heating unit is designed as a jacket heater. The drying system according to claim 1.

3. The drying system (10) includes an air circulation unit (13) that circulates the processed air present in the processing chamber (11). The drying system according to claim 1 or 2.

4. The drying system (10) includes an outlet (14) for discharging processed air from the processing chamber (11) and an inlet (15) for supplying processed air to the processing chamber. The air circulation unit (13) is equipped with air circulation pipes (16, 33, 36, 41) connected to the outlet and the inlet, The air circulation unit preferably includes a circulation device which is a fan (17). The circulation device is integrated with the air circulation pipe and is designed to circulate the processed air through the air circulation pipe in order to circulate the processed air within the processing chamber. The drying system according to claim 3.

5. The moisture measurement unit (19, 32, 35, 40) is integrated with the air circulation pipe (16, 33, 36, 41) so that the residual moisture in the processed air discharged from the processing chamber (11) is measured by the trace moisture measuring device (20, 34, 38, 43). The drying system according to claim 4.

6. The aforementioned trace moisture measuring devices (20, 34) are located within the air circulation pipes (16, 33). The drying system according to claim 5.

7. The moisture measurement unit (35, 40) is connected to the air circulation pipe (36, 41) and includes bypass pipes (37, 42) on which the trace moisture measurement devices (38, 43) are located. The moisture measurement unit further comprises a measuring gas pump (39, 44) located in the bypass pipe, preferably downstream of the trace moisture measurement device, and / or a cooling channel (45) located in the bypass pipe, preferably upstream of the trace moisture measurement device. The drying system according to claim 5.

8. The drying system (10) includes an exhaust unit (21) for exhausting the processing chamber (11). A drying system according to any one of claims 1 to 7.

9. The exhaust unit (21) comprises an exhaust pipe (22) and an exhaust device, preferably a vacuum pump (23), which is integrated within the exhaust pipe. The drying system according to claim 8.

10. The drying system (10) includes a heat exchanger integrated into the exhaust pipe (22). The drying system according to claim 9.

11. The drying system (10) includes a cleaning unit (25) having at least one cleaning device (26, 27) for cleaning the processing chamber (11) with a cleaning gas, particularly an inert gas, preferably nitrogen or dry air. A drying system according to any one of claims 1 to 10.

12. A method for drying products (12), particularly medical products, electronic products, and food products, using a drying system (10), The product is placed in the processing chamber (11) of the drying system, and the processing chamber and / or the product is heated by the heating unit of the drying system. In particular, the residual moisture in the processing chamber is measured by the trace moisture measuring devices (20, 34, 38, 43) of the moisture measuring unit (19, 32, 35, 40) of the drying system. method.

13. The processing chamber (11) and / or the product (12) are heated to a target temperature. The residual moisture is measured at least once after the target temperature is reached. The method according to claim 12.

14. The processing air present in the processing chamber (11) is circulated, at least temporarily, by the air circulation unit (13) of the drying system (10) while the processing chamber and / or the product (12) are being heated. The method according to claim 12 or 13.

15. While the processed air is circulated within the processing chamber, the residual moisture content of the processed air discharged from the processing chamber (11) is measured. The method according to claim 14.

16. The processing chamber (11) is exhausted by the exhaust unit (21) of the drying system (10) before the processing chamber and / or the product (12) are heated. After the processing chamber has been cleaned with the cleaning gas, the processing chamber is cleaned with a cleaning gas, particularly an inert gas, preferably nitrogen or dry air, by at least one cleaning device (26, 27) of the cleaning unit (25) of the drying system after the processing chamber has been evacuated, so that the cleaning gas is present in the processing chamber. The method according to any one of claims 12-15.

17. While the processing chamber and / or the product (12) is being heated or after it has been heated, the processing chamber (11) is evacuated at least once by the exhaust unit (21) of the drying system (10). After the processing chamber has been cleaned with the cleaning gas, the processing chamber is cleaned with a cleaning gas, particularly an inert gas, preferably nitrogen or dry air, by at least one cleaning device (26, 27) of the cleaning unit (25) of the drying system, after the processing chamber has been evacuated, so that the cleaning gas is present inside the processing chamber. The method according to any one of claims 12-16.

18. The process of exhausting and cleaning the processing chamber (11) using the cleaning gas is repeated until the residual moisture reaches or falls below the target moisture level. The method according to claim 17.

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