Optical device, photoelectric conversion device, and fuel generation device
By using nanostructures with alloy layers of lower work function to reduce Schottky barriers, the photoelectric conversion efficiency is enhanced, allowing detection of near-infrared light with high sensitivity and cost-effective manufacturing.
Patent Information
- Application Number
- JP2021511156
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- Priority Date
- 2019-03-29
- Filing Date
- 2020-01-31
- Publication Date
- 2024-12-20
- Estimated Expiration
- 2040-01-31
AI Technical Summary
Existing photoelectric conversion technologies face challenges in achieving high efficiency for light with energies lower than the bandgap energy of semiconductors, particularly in the near-infrared region, due to high Schottky barriers and reduced plasmon absorption properties when using metals with excellent plasmonic properties.
Incorporating a nanostructure made of single metals, metal nitrides, or conductive oxides with an alloy layer having a lower work function than the nanostructure, forming a Schottky junction with an n-type semiconductor, to reduce the Schottky barrier and enhance hot electron transport efficiency.
This configuration improves photoelectric conversion efficiency by allowing hot electrons to cross the barrier effectively, enabling detection of near-infrared light with high sensitivity and reducing manufacturing costs through simpler methods like nano-ink coating.
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Abstract
Description
[Technical field]
[0001] The present disclosure relates to optical devices, photoelectric conversion devices, and fuel generation devices. [Background technology]
[0002] Photoelectric conversion technology that utilizes surface plasmon resonance in a Schottky structure in which metal nanostructures are arranged on a semiconductor is attracting attention. Electrons that are temporarily brought to a high-energy state by surface plasmon resonance are called hot electrons. When hot electrons overcome the Schottky barrier between the metal and semiconductor, charge separation occurs, realizing photoelectric conversion. Elements in which metal nanostructures are formed on semiconductors are also attracting attention in the field of photocatalysis.
[0003] Patent Documents 1 and 2 disclose examples of photoelectric conversion methods using an element in which metal nanoparticles having surface plasmon resonance absorption are arranged on an n-type semiconductor.
[0004] Non-Patent Document 1 discloses a photoelectric conversion method using a Schottky element in which a metal film having a small work function and a metal film having surface plasmon resonance absorption are formed on an n-type semiconductor.
[0005] Non-Patent Document 2 discloses a photoelectric conversion device using nanoparticles of tin-doped indium oxide (ITO) that exhibits surface plasmon resonance with respect to light in the infrared region. [Prior art documents] [Patent documents]
[0006] [Patent Document 1] JP 2016-162890 A [Patent Document 2] JP 2014-67988 A [Non-patent literature]
[0007] [Non-Patent Document 1] Mark W.Knight, Heidar Sobhani, Peter Nordlander, Naomi J.Halas, “Photodetection with Active Optical Antennas”, Science, 2011, Vol.332 p.702-704 [Non-Patent Document 2] Masanori Sakamoto et al., “Clear and transparent nanocrystals for infrared-responsive carrier transfer”, Nature Communications, 2019, 10, 406 Summary of the Invention [Problem to be solved by the invention]
[0008] One embodiment of the present disclosure provides an optical device capable of improving photoelectric conversion efficiency. [Means for solving the problem]
[0009] An optical device according to an embodiment of the present disclosure includes a nanostructure that induces surface plasmon resonance when irradiated with light, an alloy layer that is in contact with the nanostructure and has a work function lower than that of the nanostructure, and an n-type semiconductor that forms a Schottky junction with the alloy layer. The nanostructure is made of one selected from the group consisting of a single metal, an alloy, a metal nitride, and a conductive oxide. The alloy layer is made of at least two metals.
[0010] The general or specific aspects of the present disclosure may be realized as a device, an apparatus, a system, a method, or any combination thereof. Effect of the Invention
[0011] According to the embodiments of the present disclosure, it is possible to improve the photoelectric conversion efficiency. [Brief description of the drawings]
[0012] [Figure 1A] FIG. 1A is a schematic diagram illustrating an example of a Schottky device according to an embodiment of the present disclosure. [Figure 1B] FIG. 1B is a diagram illustrating a Schottky device according to a modified example. [Figure 1C] FIG. 1C is a diagram illustrating a Schottky device according to another modified example. [Figure 1D] FIG. 1D is a diagram illustrating a Schottky device according to still another modified example. [Figure 1E] FIG. 1E is a diagram illustrating a Schottky device according to still another modified example. [Figure 1F] FIG. 1F is a diagram illustrating a Schottky device according to still another modified example. [Figure 1G] FIG. 1G is a diagram illustrating a Schottky device according to still another modified example. [Figure 1H] FIG. 1H is a schematic diagram showing a Schottky device according to still another modified example. [Figure 2A] FIG. 2A is a top view showing an example of the arrangement of multiple nanoparticles in the Schottky device shown in FIG. 1A. [Figure 2B] FIG. 2B is a top view showing another example of an arrangement of multiple nanoparticles in the Schottky device shown in FIG. 1A. [Figure 2C] FIG. 2C is a top view illustrating an example of a Schottky device including a nanostructure having a comb-shaped structure. [Figure 2D] FIG. 2D is an enlarged view of the structure enclosed by the dashed line in FIG. 2C. [Figure 3A] FIG. 3A is a diagram illustrating a schematic configuration of a photoelectric conversion device including the Schottky device shown in FIG. 1A. [Figure 3B] FIG. 3B is a diagram illustrating a schematic configuration of a modified example of the photoelectric conversion device. [Figure 3C] FIG. 3C is a schematic diagram of an example of a fuel generating apparatus including the Schottky device shown in FIG. 1A. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0013] Before describing the embodiments of the present disclosure, the findings of the inventors will be described.
[0014] Currently popular semiconductor photodetectors use photoelectric conversion based on optical absorption by band-to-band transition. Therefore, they cannot detect light with energy lower than the band gap energy of the semiconductor. It is expected that photoelectric conversion will be realized in a wider wavelength range than conventional semiconductor photodetectors.
[0015] For example, it is expected that a photodetector capable of detecting light in the near-infrared region (hereinafter referred to as "near-infrared light") with high sensitivity can be realized at low cost. By using near-infrared light, highly sensitive imaging can be made possible regardless of day or night. Furthermore, near-infrared light is highly safe for the eyes. For this reason, it is expected that photodetectors in the near-infrared region will be used as sensors for automatic driving of automobiles.
[0016] For visible light, silicon (Si) photodetectors are relatively inexpensive and widely used. However, near-infrared light has lower energy than visible light, so it cannot be detected unless a semiconductor with a smaller band gap energy is used. An example of a semiconductor with a smaller band gap energy is indium gallium arsenide (InGaAs).
[0017] On the other hand, photoelectric conversion technology with a Schottky structure in which metal nanostructures are arranged on a semiconductor, as disclosed in Patent Documents 1 and 2, has attracted attention. Hot electrons generated by surface plasmon resonance in the metal nanostructures overcome the Schottky barrier, resulting in charge separation, and photoelectric conversion is realized. This technology can utilize light in a wide wavelength range, including long-wavelength light that has been difficult to use until now, and is therefore attracting attention not only in the field of photoelectric conversion but also in the field of photocatalysis.
[0018] Metal nanostructures can be made of metals with excellent plasmonic properties, such as gold (Au). However, metals with excellent plasmonic properties have a large work function, which increases the Schottky barrier at the interface with the semiconductor. This makes it difficult for hot electrons to overcome the Schottky barrier.
[0019] In Non-Patent Document 1, an effort is made to reduce the Schottky barrier by providing titanium (Ti), a metal with a relatively small work function, between a semiconductor substrate and Au, a metal with excellent plasmonic properties.
[0020] In the technique of Non-Patent Document 1, the plasmonic properties of the Ti film are poor, so that the plasmon absorption properties of the metal nanostructure on the semiconductor substrate are deteriorated, resulting in reduced sensitivity and photoelectric conversion efficiency.
[0021] In order to improve the photoelectric conversion efficiency for infrared light, it is possible to use a structure in which a nanostructure of a conductive oxide such as ITO is in contact with a semiconductor such as SnO2, TiO2, or Si, as disclosed in, for example, Non-Patent Document 2. However, even if such a structure is used, it is difficult to realize an appropriate Schottky barrier. In a typical application example, the appropriate Schottky barrier is, for example, about 0.3 eV to 0.5 eV. In contrast, in a structure in which ITO nanoparticles are in contact with SnO2, the Schottky barrier is low at about 0.2 eV. On the other hand, in a structure in which ITO nanoparticles are in contact with TiO2 or Si, the Schottky barrier is high at about 0.7 eV.
[0022] The present inventors have found the above problems and have come up with a novel optical device to solve these problems.
[0023] The optical device according to the embodiment of the present disclosure includes a nanostructure that induces surface plasmon resonance when irradiated with light, an alloy layer that is in contact with the nanostructure and has a work function lower than that of the nanostructure, and an n-type semiconductor that forms a Schottky junction with the alloy layer. The nanostructure may be made of one selected from the group consisting of a single metal, an alloy, a metal nitride, and a conductive oxide. The alloy layer is made of at least two metals.
[0024] In the optical device described above, an alloy layer having a lower work function than the nanostructure is provided between the nanostructure and the n-type semiconductor, which reduces the Schottky barrier and improves the transport efficiency of hot electrons compared to a configuration in which the n-type semiconductor and the nanostructure are in contact with each other.
[0025] The nanostructure may contain at least one single metal selected from the group consisting of gold (Au), silver (Ag), copper (Cu), aluminum (Al), and palladium (Pd). By forming a nanostructure using any of the above metals that have excellent plasmonic properties and low ionization tendency, highly efficient hot electron generation can be realized. Furthermore, by providing an alloy layer with a work function lower than these single metals, both highly efficient hot electron generation and current extraction due to a low Schottky barrier can be achieved. This can improve the photoelectric conversion efficiency.
[0026] The nanostructure may contain at least one metal nitride selected from the group consisting of titanium nitride (TiN), zirconium nitride (ZrN), tantalum nitride (TaN), and hafnium nitride (HfN). When a nanostructure made of these metal nitrides is used, the efficiency of plasmon absorption increases in the long wavelength region of the visible range to the near infrared range, and the photoelectric conversion efficiency can be improved.
[0027] The nanostructure may contain at least one conductive oxide selected from the group consisting of, for example, tin-doped indium oxide (ITO), aluminum-doped zinc oxide (AZO), and gallium-doped zinc oxide (GZO). When a nanostructure made of these conductive oxides is used, the efficiency of plasmon absorption and the transport efficiency of hot electrons are increased in the near-infrared region of longer wavelengths, and the photoelectric conversion efficiency can be improved.
[0028] The nanostructure may be composed of an alloy having a higher work function than the alloy layer, in which case the nanostructure may be, for example, an intermetallic compound or solid solution alloy including a first metal selected from the group consisting of gold (Au), silver (Ag), copper (Cu), aluminum (Al), and palladium (Pd) and a second metal selected from the group consisting of titanium (Ti), chromium (Cr), nickel (Ni), manganese (Mn), iron (Fe), zinc (Zn), gallium (Ga), and tantalum (Ta).
[0029] The alloy layer may be, for example, an intermetallic compound or solid solution alloy containing at least two metals selected from the group consisting of gold (Au), silver (Ag), copper (Cu), aluminum (Al), palladium (Pd), titanium (Ti), chromium (Cr), nickel (Ni), manganese (Mn), iron (Fe), zinc (Zn), gallium (Ga), and tantalum (Ta). However, the combination of metal materials constituting the alloy layer is selected so that the alloy layer has a work function lower than that of the nanostructure. As an example, when the nanostructure is composed of a single element of a first metal having high plasmonic properties, the alloy layer may be an intermetallic compound or solid solution alloy of the first metal and the second metal.
[0030] Here, "an intermetallic compound or solid solution alloy of a first metal and a second metal" means an intermetallic compound or solid solution alloy mainly composed of a first metal and a second metal. The intermetallic compound or solid solution alloy may contain elements other than the first metal and the second metal, such as impurities. As the second metal, a metal having a work function lower than that of the first metal may be selected.
[0031] Hereinafter, exemplary embodiments of the present disclosure will be described with reference to the drawings. Note that more detailed explanations than necessary may be omitted. For example, detailed explanations of already well-known matters may be omitted. In addition, substantially identical configurations may be given the same reference numerals, and duplicate explanations may be omitted. This is to avoid the following explanation from becoming unnecessarily redundant and to facilitate understanding by those skilled in the art. The inventors provide the accompanying drawings and the following explanations so that those skilled in the art can fully understand the present disclosure. It is not intended that the subject matter described in the claims be limited by these.
[0032] (Embodiment 1: Schottky Device) As an example of an optical device, an embodiment of a Schottky device will be described.
[0033] FIG. 1A is a schematic diagram showing an example of a Schottky device 100A according to an exemplary embodiment of the present disclosure. The Schottky device 100A includes a plurality of nanoparticles 11, each of which is a nanostructure, an alloy layer 12, and an n-type semiconductor 13. The plurality of nanoparticles 11 are in contact with the alloy layer 12. The alloy layer 12 is in contact with the n-type semiconductor 13. In this example, each nanoparticle 11 is made of a metal element having excellent plasmonic properties. The alloy layer 12 is made of an alloy containing a metal having a lower work function than the nanoparticles 11. The alloy layer 12 may be made of a metal material having a low electrical resistance. The alloy layer 12 shown in FIG. 1A has a uniform film-like structure. The alloy layer 12 is not limited to such a structure, and may have, for example, a spotted structure.
[0034] According to the above-mentioned configuration, the alloy layer 12 and the n-type semiconductor 13 are bonded over a wide area, thereby reducing the Schottky barrier and improving the transport efficiency of hot electrons. Furthermore, by using the nanoparticles 11 of a single metal, plasmon absorption can be achieved more efficiently than when alloy nanoparticles are used. Therefore, an optical device capable of photoelectric conversion with high efficiency can be realized at a relatively low cost.
[0035] Each component will be described in more detail below.
[0036] The nanoparticles 11 may be made of a metal element having high electrical conductivity, excellent plasmonic properties, and low ionization tendency. The metal may be, for example, one metal selected from the group consisting of gold (Au), silver (Ag), copper (Cu), palladium (Pd), and aluminum (Al).
[0037] The nanoparticles 11 have surface plasmon resonance absorption properties. The surface plasmon resonance wavelength of the nanoparticles 11 can be adjusted by changing the particle size, shape, structure, and alloy composition of the nanoparticles 11.
[0038] In the present disclosure, the term "particle diameter" refers to the diameter of a circle circumscribing a particle in a microscope image including an image of the particle. Hereinafter, the particle diameter may be referred to as "size". In addition, in the present disclosure, the term "nanoparticle" refers to a particle having a size on the order of nanometers (nm), which is sufficiently smaller than the wavelength of the light (typically visible light or near infrared light) used. That is, the term "nanoparticle" refers to a particle having a particle diameter of about 1 nm or more and less than 1 μm. The size of the nanoparticles 11 may be, for example, 1 nm or more and 200 nm or less. The size of the nanoparticles 11 may be 1 nm or more and 50 nm or less in one example, and 5 nm or more and 20 nm or less in another example. Plasmon absorption can be improved by making the size of the nanoparticles 11 200 nm or less. In addition, for example, a microscope image including images of at least 10 nanoparticles 11 may be obtained, and the arithmetic average of the sizes of the at least 10 nanoparticles 11 may be calculated based on the microscope image. This arithmetic average may be 1 nm or more and 200 nm or less, 1 nm or more and 50 nm or less, or 5 nm or more and 20 nm or less. The size of the nanoparticles 11 can be measured, for example, by electron microscopy, such as a transmission electron microscope (TEM) or a scanning electron microscope (SEM).
[0039] In addition to the structure of the spherical nanoparticles 11 shown in FIG. 1A, the nanostructure may have various structures or shapes, such as a wire structure long in a certain direction or a cube structure that is a shape close to a cube. Hereinafter, an example using the spherical nanoparticles 11 will be described, but the shape of the nanostructure is not limited to nanoparticles. For example, as will be described later with reference to FIG. 2C, instead of the nanoparticles 11, a nanostructure 11B made of the same material as the nanoparticles 11 and having a comb-shaped structure may be arranged in contact with the alloy layer 12. In the example of FIG. 1A, all the nanoparticles 11 are made of the same single metal. The present invention is not limited to such an example, and the materials of the multiple nanoparticles 11 may be different from each other.
[0040] The alloy layer 12 is an intermetallic compound of two or more metals, or a solid solution alloy of two or more metals. Each metal constituting the alloy layer 12 may be, for example, any metal selected from the group consisting of gold (Au), silver (Ag), copper (Cu), aluminum (Al), palladium (Pd), titanium (Ti), chromium (Cr), nickel (Ni), manganese (Mn), iron (Fe), zinc (Zn), gallium (Ga), and tantalum (Ta). The metals are selected so that the work function of the alloy layer 12 is lower than the work function of the nanoparticles 11.
[0041] An "intermetallic compound" is a compound in which two or more metals are bonded in a simple integer ratio, and is an alloy in which atoms are regularly arranged with order over a relatively long distance (e.g., 1 nm or more). A "solid solution alloy" is a single-phase alloy in which multiple metal elements are distributed uniformly and disorderly within the crystal, and has a structure in which one of the metals is retained while the other metal has penetrated or substituted it.
[0042] Whether or not a certain substance is an alloy can be confirmed by, for example, element mapping using a scanning transmission electron microscope (STEM). If the substance is not separated into phases of the multiple metal elements that are its components, it can be determined that it is an alloy. More specifically, if the following conditions (1) and (2) are satisfied, for example, the alloy layer 12 can be said to be an alloy of a first metal and a second metal. (1) When element mapping measurement is performed with a resolution of 1 nm x 1 nm using a STEM, the first metal and the second metal are detected in 80% or more of the entire area occupied by the alloy layer 12. (2) From energy dispersive X-ray analysis (EDX) and line analysis, the first metal and the second metal are detected in a ratio reflecting the composition ratio even in the cross section of the particle.
[0043] Whether or not a certain substance is a solid solution alloy can be confirmed based on a diffraction pattern obtained by, for example, X-ray diffraction. If a peak shift from the peak positions of the first metal and the second metal, reflecting the composition ratio based on Vegard's law, is observed in the diffraction pattern, it can be determined that the alloy layer 12 is a solid solution alloy of the first metal and the second metal.
[0044] On the other hand, whether or not the alloy layer 12 is an intermetallic compound can be confirmed by, for example, analysis using electron beam diffraction or X-ray diffraction. If the diffraction pattern obtained by electron beam diffraction or X-ray diffraction matches the diffraction pattern of an intermetallic compound of a first metal and a second metal disclosed in a literature such as a technical book, it can be determined that the alloy layer 12 is an intermetallic compound of a first metal and a second metal.
[0045] When the composition ratio of the intermetallic compound is different from the composition ratio disclosed in the literature, the spacing of the diffraction spots (peaks in the case of X-ray diffraction) may be slightly shifted according to the difference in the interplanar spacing. In that case, the lattice spacing may be calculated from a lattice image obtained by structural analysis of the particle using STEM, and the presence or absence of an intermetallic compound may be determined based on whether or not the peak position calculated from the lattice spacing matches the peak position disclosed in the literature. Alternatively, the composition ratio of the particle may be determined by EDX, the lattice spacing may be calculated by Vegard's law, and the presence or absence of an intermetallic compound may be determined based on whether or not the peak position calculated from the lattice spacing matches the peak position disclosed in the literature.
[0046] The alloy layer 12 has a work function lower than that of the nanoparticles 11. Therefore, compared to a structure in which the nanoparticles 11 are in direct contact with the n-type semiconductor 13, the Schottky barrier can be reduced and the current extraction efficiency can be improved. This makes it possible to achieve a dramatic improvement in performance compared to a case in which the alloy layer 12 does not exist.
[0047] The electron affinity of n-type semiconductor 13 is lower than the work function of alloy layer 12, and a Schottky junction is realized between n-type semiconductor 13 and alloy layer 12. As a result, Schottky device 100A exhibits rectifying characteristics.
[0048] In this embodiment, the wavelength corresponding to the band gap energy of n-type semiconductor 13 may be shorter than the surface plasmon resonance wavelength of nanoparticle 11. In other words, the energy of light that causes surface plasmon resonance in nanoparticle 11, i.e., the energy of the irradiated light, may be lower than the band gap energy of n-type semiconductor 13. Even if the energy of the irradiated light is lower than the band gap energy of n-type semiconductor 13, charge separation occurs if the generated hot electrons exceed the Schottky barrier.
[0049] The n-type semiconductor 13 may include at least one selected from the group consisting of, for example, a silicon (Si) semiconductor, a germanium (Ge) semiconductor, and a gallium arsenide (GaAs) semiconductor. The n-type semiconductor 13 may be a Si semiconductor, a Ge semiconductor, or a GaAs semiconductor. In that case, the surface plasmon resonance wavelength in the nanoparticle 11 may be, for example, 900 nm or more. The n-type semiconductor 13 may be a wide-gap semiconductor. This wide-gap semiconductor may include at least one selected from the group consisting of a titanium oxide (TiO2) semiconductor, a gallium nitride (GaN) semiconductor, and a strontium titanate (SrTiO3) semiconductor. The wide-gap semiconductor may be a titanium oxide (TiO2) semiconductor, a gallium nitride (GaN) semiconductor, or a strontium titanate (SrTiO3) semiconductor. When the n-type semiconductor 13 is a wide-gap semiconductor, the surface plasmon resonance wavelength in the nanoparticle 11 may be, for example, 400 nm or more. In this way, the n-type semiconductor 13 may be, for example, an inorganic semiconductor.
[0050] Conventionally, for light with a wavelength of 900 nm or less, Si semiconductors, for which high-quality crystal fabrication technology has been established, have been used, and highly sensitive light detection has been realized. For near-infrared light with energy lower than the band gap energy of Si semiconductors, InGaAs semiconductors epitaxially grown on InP single crystal substrates have been used, and high sensitivity has been realized. However, advanced thin film formation technology is required for fabricating InGaAs semiconductors. According to this embodiment, even when Si semiconductors, Ge semiconductors, GaAs semiconductors, or wide-gap semiconductors are used, light in the near-infrared region can be detected. These semiconductors do not require advanced thin film formation technology for fabrication, and therefore costs can be reduced. In particular, when Si semiconductors are used, dark current can be reduced compared to InGaAs semiconductors.
[0051] Also, as disclosed in Non-Patent Document 1, a structure in which a metal film having a low work function is provided between an n-type semiconductor substrate and a metal that generates surface plasmon resonance has been known. However, no attempt has been made to provide an alloy layer 12 for reducing the plasmon barrier between nanoparticles 11 that generate surface plasmon resonance and an n-type semiconductor 13, as in the present embodiment. By employing a structure such as that of the present embodiment, a highly efficient photoelectric conversion device can be fabricated by a simple method such as a nanoink coating process.
[0052] Depending on the film formation process used to fabricate Schottky device 100A, an oxide film may be formed on the surface of the substrate of n-type semiconductor 13 or on the surface of alloy layer 12. In that case, the manufacturing process may include a step of removing the oxide film, as necessary.
[0053] 1B is a schematic diagram of a Schottky device 100B according to a modification of this embodiment, which differs from the configuration of FIG. 1A in that nanoparticles 14, which are nanostructures of metal nitride, are disposed on the alloy layer 12.
[0054] The nanoparticles 14 in this modification may be made of at least one metal nitride selected from the group consisting of, for example, titanium nitride (TiN), zirconium nitride (ZrN), tantalum nitride (TaN), and hafnium nitride (HfN).
[0055] These metal nitrides have high plasmon absorption properties for light in the long wavelength region of the visible range to the near infrared range, which increases the efficiency of plasmon absorption for light in the long wavelength region of the visible range to the near infrared range and the transport efficiency of hot electrons, thereby improving the photoelectric conversion efficiency.
[0056] 1C is a schematic diagram of a Schottky device 100C according to another modification of the present embodiment, which differs from the configurations of FIGS. 1A and 1B in that nanoparticles 15, which are nanostructures of a conductive oxide, are disposed on the alloy layer 12.
[0057] The nanoparticles 15 in this modification may be made of at least one conductive oxide selected from the group consisting of, for example, tin-doped indium oxide (ITO), aluminum-doped zinc oxide (AZO), and gallium-doped zinc oxide (GZO).
[0058] These conductive oxides have high plasmon absorption characteristics for light in the near-infrared region with even longer wavelengths, which increases the efficiency of plasmon absorption for light in the near-infrared region with even longer wavelengths and the hot electron transport efficiency, thereby improving the photoelectric conversion efficiency.
[0059] 1D is a schematic diagram of a Schottky device 100D according to another modification of the present embodiment, which differs from the configurations of FIGS. 1A to 1C in that nanoparticles 11A, which are alloy nanostructures, are disposed on an alloy layer 12.
[0060] The nanoparticles 11A in this modification are an intermetallic compound or solid solution alloy containing a first metal 11A1 and a second metal 11A2. The first metal 11A1 has excellent plasmonic properties and a small ionization tendency. The second metal 11A2 has a lower work function than the first metal 11A1. The composition of the nanoparticles 11A is different from the composition of the alloy layer 12.
[0061] The first metal 11A1 may be made of a material that has high electrical conductivity, excellent plasmonic properties, and low ionization tendency, and may be, for example, one or more metals selected from the group consisting of gold (Au), silver (Ag), copper (Cu), palladium (Pd), and aluminum (Al).
[0062] The second metal 11A2 may be made of a material having a work function lower than that of the first metal 11A1. The second metal 11A2 may be, for example, one or more metals selected from the group consisting of titanium (Ti), chromium (Cr), silver (Ag), copper (Cu), aluminum (Al), nickel (Ni), manganese (Mn), iron (Fe), zinc (Zn), gallium (Ga), and tantalum (Ta).
[0063] Thus, the nanostructure may be composed of an alloy having a higher work function than the alloy layer 12 .
[0064] FIG. 1E is a schematic diagram showing a Schottky device 100E according to yet another modified example of the present embodiment. In this example, the Schottky device 100E has an n-type semiconductor 13 with a trench structure or texture structure. The upper part of the n-type semiconductor 13 is covered with an alloy layer 12 and a single metal layer 11. In this example, a plurality of recesses or protrusions are present on the surface of the Schottky device 100E. The center-to-center distance between two adjacent recesses or protrusions may be on the order of nanometers, that is, 1 nm or more and less than 1 μm. In such a structure, the single metal layer 11 on the outermost surface functions as a nanostructure that induces surface plasmon resonance. According to the configuration shown in FIG. 1E, the efficiency of plasmon absorption is increased by the nanoantenna structure, and the photoelectric conversion efficiency can be improved.
[0065] FIG. 1F is a schematic diagram showing a Schottky device 100F according to yet another modified example of the present embodiment. In the Schottky device 100F in this example, the n-type semiconductor 13 has a trench structure or a texture structure, and the upper part is covered with an alloy layer 12 and a metal nitride layer 14. In such a structure, the metal nitride layer 14 on the outermost surface functions as a nanostructure that induces surface plasmon resonance. According to the configuration shown in FIG. 1F, the efficiency of plasmon absorption of light from the long wavelength region of the visible range to the near infrared region is increased, and the photoelectric conversion efficiency can be improved. The gold nitride layer 14 can be formed of at least one metal nitride selected from the group consisting of, for example, titanium nitride (TiN), zirconium nitride (ZrN), tantalum nitride (TaN), and hafnium nitride (HfN).
[0066] FIG. 1G is a schematic diagram showing a Schottky device 100G according to yet another modified example of the present embodiment. In the Schottky device 100G in this example, the n-type semiconductor 13 has a trench structure or a texture structure, and the upper part thereof is covered with an alloy layer 12 and a conductive oxide layer 15. In such a structure, the conductive oxide layer 15 on the outermost surface functions as a nanostructure that induces surface plasmon resonance. According to the configuration shown in FIG. 1G, the efficiency of plasmon absorption for light in the near-infrared region with a longer wavelength is further increased, and the photoelectric conversion efficiency can be improved. The conductive oxide layer 15 can be formed of at least one conductive oxide selected from the group consisting of, for example, tin-doped indium oxide (ITO), aluminum-doped zinc oxide (AZO), and gallium-doped zinc oxide (GZO).
[0067] FIG. 1H is a schematic diagram of a Schottky device 100H according to yet another modified example of the present embodiment. The Schottky device 100H is different from the configurations of FIGS. 1E to 1G in that the alloy layer 12 is covered with an alloy layer 11A having a different composition from the alloy layer 12. The alloy layer 11A has a work function higher than that of the alloy layer 12. In such a structure, the outermost alloy layer 11A functions as a nanostructure that induces surface plasmon resonance. In this way, the alloy layer 12 may be covered with the alloy layer 11A having a higher work function.
[0068] Next, examples of nanostructure arrangements will be described with reference to FIGS. 2A to 2C.
[0069] FIG. 2A is a top view showing an example of the arrangement of the plurality of nanoparticles 11 in the Schottky device 100A shown in FIG. 1A. As in this example, the plurality of nanoparticles 11 may be arranged two-dimensionally and periodically. The plurality of nanoparticles 11 may be arranged one-dimensionally. The period of the arrangement of the plurality of nanoparticles 11 is not particularly limited. For example, the period may be set to about twice the size of the particles.
[0070] 2B is a top view showing another example of the arrangement of the nanoparticles 11 in the Schottky device 100A shown in FIG. 1A. In this example, the nanoparticles 11 do not have a clear periodicity, but are arranged randomly or pseudo-randomly. Even with such an arrangement, the effect of this embodiment can be obtained without any problem.
[0071] The arrangement as shown in FIGS. 2A and 2B may be adopted not only in FIG. 1A but also in any of the configurations shown in FIGS. 1B to 1D.
[0072] The structure of the nanoparticles does not need to be uniform, and the size, shape, and material may be different from each other. Furthermore, the effect of this embodiment can be obtained even when only a single nanoparticle is provided, not limited to a plurality of nanoparticles.
[0073] In the structures shown in each of Figures 1E to 1H, the nanostructure may have a one-dimensional or two-dimensional periodic structure or aperiodic structure.
[0074] FIG. 2C is a top view showing yet another modified example of the Schottky device. The Schottky device in this example includes a nanostructure 11B having a comb-shaped structure. The nanostructure 11B in this example includes a plurality of portions 11Ba extending in one direction and a portion 11Bb connecting the ends of the portions 11Ba. Each of the plurality of portions 11Ba extending in one direction has a diameter on the order of nanometers and functions as a nanowire. With this structure, the portions 11Ba of the nanostructure 11B are electrically connected to each other by the portions 11Bb.
[0075] FIG. 2D is a diagram showing a schematic example of a structure in the region surrounded by a dashed circle in FIG. 2C. In FIG. 2D, each metal atom is represented by a sphere. As shown in FIG. 2D, a nanostructure 11B is formed from a single metal. The nanostructure 11B may have a size larger than the nanometer scale as a whole. Even in this case, each nanowire part of the comb-shaped nanostructure 11B acts as an antenna, so that the effect of surface plasmon resonance can be obtained. The material of the nanowire structure shown in FIG. 2C is not limited to a single metal, and may be a metal nitride, a conductive oxide, or an alloy, as in the examples shown in FIGS. 1B to 1D, respectively.
[0076] (Embodiment 2: Photoelectric conversion device) Next, an embodiment of a photoelectric conversion device including a Schottky device will be described.
[0077] Fig. 3A is a diagram illustrating a schematic configuration of a photoelectric conversion device 200A including the Schottky device 100A shown in Fig. 1A. When the photoelectric conversion device 200A is irradiated with light from a light source 19, a current is generated.
[0078] The photoelectric conversion device 200A includes a Schottky device 100A which is an optical device, an ohmic electrode 17 (also referred to as a first electrode) which is in contact with the n-type semiconductor 13 on the side opposite to the side on which the nanoparticles 11 are located, and a conductive wire 18 which electrically connects the ohmic electrode 17 and the nanoparticles 11. The photoelectric conversion device 200A further includes a transparent conductive film 16 which is provided on the surface of the alloy layer 12 on which the nanoparticles 11 are arranged. The transparent conductive film 16 encapsulates the nanoparticles 11. The transparent conductive film 16 is not in contact with the n-type semiconductor 13. The conductive wire 18 electrically connects the ohmic electrode 17 and the transparent conductive film 16.
[0079] The photovoltaic device 200A is fabricated by forming a transparent conductive film 16, an ohmic electrode 17, and a conductive wire 18 on the Schottky device 100A.
[0080] For the transparent conductive film 16, a material having high transmittance at the wavelength of light irradiated from the light source 19 can be used. Particularly in the visible to near infrared region, for example, tin-doped indium oxide (ITO), gallium-doped zinc oxide (GZO), aluminum-doped zinc oxide (AZO), or the like can be used.
[0081] The light source 19 emits light toward the nanoparticles 11 in the Schottky device 100A. Specific examples of the light source 19 may be a laser, a xenon lamp, a mercury lamp, or a halogen lamp. The light source 19 emits light having energy equal to or lower than the band gap energy of the n-type semiconductor 13 and corresponding to the plasmon resonance wavelength of the nanoparticles 11. The light source 19 may emit light in a relatively wide wavelength range. The wavelength range is determined so as to include the surface plasmon resonance wavelength of the nanoparticles 11. The light source 19 may be a component of the photoelectric conversion device 200A or may be an external element of the photoelectric conversion device 200A. When the light source 19 irradiates the Schottky device 100A with light, a current flows through the conductive wire 18.
[0082] According to the above-mentioned configuration, the Schottky barrier can be reduced at a relatively low cost, and as a result, a device that performs photoelectric conversion with higher efficiency can be realized.
[0083] Fig. 3B is a schematic diagram showing a photoelectric conversion device 200B according to a modified example of embodiment 2. The photoelectric conversion device 200B in this example does not include the transparent conductive film 16 shown in Fig. 3A. The alloy layer 12 and the ohmic electrode 17 are electrically connected through a conductor 18. When the Schottky device 100A is irradiated with light from a light source 19, a current flows through the conductor 18.
[0084] The above-mentioned configuration also makes it possible to suppress natural oxidation of a metal with a low work function and reduce the Schottky barrier at a relatively low cost, thereby realizing a device that performs photoelectric conversion with higher efficiency.
[0085] 3A and 3B, a current is generated by irradiating the Schottky device with light. The generated current can be extracted to the outside via a conductor 18. By adjusting the structure of the nanoparticles 11 to control the surface plasmon resonance wavelength, the wavelength of light that can be used can also be controlled.
[0086] In this embodiment, an example including the Schottky device 100A shown in Fig. 1A has been described. However, the present invention is not limited to this configuration, and a photoelectric conversion device including any of the Schottky devices shown in Fig. 1B to Fig. 2D may be configured.
[0087] (Embodiment 3: Fuel Generation Device) Next, as yet another example of an optical device, an embodiment of a fuel generating apparatus equipped with a Schottky device will be described.
[0088] FIG. 3C is a diagram showing a schematic diagram of an example of a fuel production apparatus 200C including the Schottky device 100A shown in FIG. 1A. When light is irradiated from a light source 19, the fuel production apparatus 200C performs photoelectric conversion and further produces fuel by a photochemical reaction. The fuel production apparatus 200C includes an oxidation reaction tank 20, a reduction reaction tank 21, a proton-permeable membrane 22, a Schottky device 100A, a reduction electrode 25, an ohmic electrode 17, a conductor 18, and a quartz glass window 26. A first electrolytic solution 23 is held inside the oxidation reaction tank 20. A second electrolytic solution 24 is held inside the reduction reaction tank 21. The oxidation reaction tank 20 and the reduction reaction tank 21 are separated by a proton-permeable membrane 22. The Schottky device 100A is at least partially immersed in the first electrolytic solution 23. The reduction electrode 25 is at least partially immersed in the second electrolytic solution 24. An ohmic electrode 17 (also referred to as a first electrode) is provided at an end of the n-type semiconductor 13. The first electrode 17 is electrically connected to a reduction electrode 25 (also referred to as a second electrode) through a conducting wire .
[0089] An example of the first electrolytic solution 23 in the oxidation reaction tank 20 is an aqueous solution containing at least one selected from the group consisting of potassium bicarbonate (KHCO3), sodium bicarbonate (NaHCO3), potassium hydroxide (KOH), and sodium hydroxide (NaOH). The concentration of the electrolyte in the first electrolytic solution 23 can be set to, for example, 0.1 mol / L or more. The first electrolytic solution 23 can be, for example, alkaline. A general electrolyte can be used for the second electrolytic solution 24 in the reduction reaction tank 21. For example, the second electrolytic solution 24 can be an aqueous solution containing at least one selected from the group consisting of potassium bicarbonate (KHCO3), sodium bicarbonate (NaHCO3), potassium chloride (KCl), and sodium chloride (NaCl). Regardless of which electrolyte the second electrolytic solution contains, the concentration of the electrolyte in the second electrolytic solution can be set to, for example, 0.1 mol / L or more. The second electrolytic solution 24 can be, for example, acidic.
[0090] The quartz glass window 26 is provided on the side of the oxidation reaction vessel 20. A light source 19 irradiates a region of the light irradiation surface side of the Schottky device 100A that is immersed in the first electrolytic solution 23 through the quartz glass window 26. Since the proton permeable membrane 22 is sandwiched between the oxidation reaction vessel 20 and the reduction reaction vessel 21, the first electrolytic solution 23 and the second electrolytic solution 24 do not mix with each other. The structure of the proton permeable membrane 22 is such that protons (H + There are no particular limitations on the proton-permeable membrane 22 as long as it allows the protons to pass through it and prevents the passage of other substances. A specific example of the proton-permeable membrane 22 is a Nafion (registered trademark) membrane.
[0091] The first electrode 17 may be, for example, platinum, an alloy containing platinum, or a platinum compound. When the nanoparticles 11 are irradiated with light having energy corresponding to the surface plasmon resonance wavelength, hydrogen is generated at the second electrode 25.
[0092] According to the above-mentioned configuration, the Schottky barrier can be reduced at a relatively low cost, thereby realizing a device capable of performing photoelectric conversion and fuel generation with higher efficiency.
[0093] In the example shown in Fig. 3C, a suitable reduction electrode 25 is placed in the reduction reaction vessel 21, and fuel is generated by irradiating the Schottky device 100A with light. As a result, for example, hydrogen (H2) or the like may be generated as a reduction product. The type of product can be changed by selecting the type of material of the catalyst layer used.
[0094] The fuel generating apparatus 200C in this embodiment may include any of the Schottky devices shown in FIGS. 1B to 2D instead of the Schottky device 100A shown in FIG. 1A.
[0095] As described above, an optical device according to one embodiment of the present disclosure comprises a nanostructure that induces surface plasmon resonance when irradiated with light, the nanostructure being composed of one type selected from the group consisting of a single metal, an alloy, a metal nitride, and a conductive oxide, an alloy layer in contact with the nanostructure and having a lower work function than the nanostructure, and an n-type semiconductor that forms a Schottky junction with the alloy layer.
[0096] According to the above configuration, an alloy layer having a lower work function than the nanostructure is disposed between the nanostructure and the n-type semiconductor, which reduces the Schottky barrier and improves the transport efficiency of hot electrons generated from the nanostructure, thereby improving the photoelectric conversion efficiency.
[0097] The nanostructures may comprise at least one simple metal selected from the group consisting of gold (Au), silver (Ag), copper (Cu), aluminum (Al), and palladium (Pd).
[0098] According to this configuration, since a metal with excellent plasmonic properties is used, the plasmonic properties of the nanostructure can be improved, and the photoelectric conversion efficiency can be improved.
[0099] The nanostructures may include at least one metal nitride selected from the group consisting of titanium nitride (TiN), zirconium nitride (ZrN), tantalum nitride (TaN), and hafnium nitride (HfN).
[0100] According to this configuration, the efficiency of plasmon absorption for light in the long wavelength region of the visible range to the near infrared region and the transport efficiency of hot electrons are increased, thereby improving the photoelectric conversion efficiency.
[0101] The nanostructures may comprise at least one conductive oxide selected from the group consisting of tin-doped indium oxide (ITO), aluminum-doped zinc oxide (AZO), and gallium-doped zinc oxide (GZO).
[0102] According to this configuration, the efficiency of plasmon absorption and the hot electron transport efficiency for light in the near-infrared region with a longer wavelength are further increased, and the photoelectric conversion efficiency can be improved.
[0103] The alloy layer may be an intermetallic compound or a solid solution alloy containing at least two metals selected from the group consisting of gold (Au), silver (Ag), copper (Cu), aluminum (Al), palladium (Pd), titanium (Ti), chromium (Cr), nickel (Ni), manganese (Mn), iron (Fe), zinc (Zn), gallium (Ga), and tantalum (Ta).
[0104] The n-type semiconductor may be an inorganic semiconductor.
[0105] The nanostructure may have a comb-shaped structure.
[0106] The nanostructure may include at least one nanoparticle, and the particle size of the at least one nanoparticle may be 1 nm or more and 200 nm or less.
[0107] According to this configuration, for example, by providing a plurality of nanoparticles, the photoelectric conversion efficiency can be further improved.
[0108] The optical device may further include a light source that emits light having energy equal to or lower than the band gap energy of the n-type semiconductor and corresponding to a plasmon resonance wavelength of the at least one nanostructure.
[0109] The n-type semiconductor may include at least one selected from the group consisting of a silicon semiconductor, a germanium semiconductor, and a gallium arsenide semiconductor.The nanostructure may have a surface plasmon resonance wavelength of 900 nm or more.
[0110] The n-type semiconductor may include at least one selected from the group consisting of a titanium oxide (TiO2) semiconductor, a gallium nitride (GaN) semiconductor, and a strontium titanate (SrTiO3) semiconductor. The surface plasmon resonance wavelength of the at least one nanostructure may be 400 nm or more.
[0111] A photoelectric conversion device according to an embodiment of the present disclosure includes any one of the optical devices described above, an electrode, and a conductive wire electrically connecting the electrode and the nanostructure. The n-type semiconductor has a first surface in contact with the alloy layer and a second surface opposite to the first surface. The electrode is in contact with the second surface of the n-type semiconductor.
[0112] The photoelectric conversion device may further include a transparent conductive film covering the nanostructure. The transparent conductive film may not be in contact with the n-type semiconductor. The conductive wire may electrically connect the electrode and the transparent conductive film.
[0113] A fuel generating apparatus according to an embodiment of the present disclosure includes any one of the optical devices described above, a first electrode in contact with the n-type semiconductor in the optical device, an oxidation reaction tank containing a first electrolytic solution and the optical device, a reduction reaction tank containing a second electrolytic solution and a second electrode, a proton-permeable membrane located at the boundary between the oxidation reaction tank and the reduction reaction tank, and a conductor connecting the first electrode and the second electrode. The optical device is in contact with the first electrolytic solution. The reduction electrode is in contact with the second electrolytic solution.
[0114] The first electrode may be platinum, an alloy containing platinum, or a platinum compound. When light having energy corresponding to a surface plasmon resonance wavelength of the first metal is incident on the intermetallic compound or the solid solution alloy in the optical device, hydrogen may be generated at the second electrode.
[0115] According to this configuration, hydrogen can be obtained by water decomposition using the first electrode containing platinum.
[0116] The first electrolytic solution may be an aqueous solution containing at least one selected from the group consisting of potassium bicarbonate (KHCO3), sodium bicarbonate (NaHCO3), potassium hydroxide (KOH), and sodium hydroxide (NaOH).
[0117] The second electrolytic solution may be an aqueous solution containing at least one selected from the group consisting of potassium bicarbonate (KHCO3), sodium bicarbonate (NaHCO3), potassium chloride (KCl), and sodium chloride (NaCl). [Industrial Applicability]
[0118] The techniques of the present disclosure may be used in any application in which photoelectric conversion is performed, such as in photodetectors such as image sensors, and in fuel generation devices. [Explanation of symbols]
[0119] 11 Nanoparticles Nanostructures made from 11A alloy 11B Comb-shaped nanostructure 12 alloy layer 13 n-type semiconductor 14 Metal nitride nanostructures 15 Nanostructures made from conductive oxides 16 Transparent conductive film 17 Ohmic electrode 18 Conductor 19 Light source 20 Oxidation reactor 21 Reduction reaction tank 22 Proton-permeable membrane 23 First electrolyte 24 Second electrolyte 25 Reduction Electrode 26 Quartz glass window 100A, 100B, 100C, 100D, 100E, 100F, 100G, 100H Schottky Devices 200A, 200B Photoelectric conversion device 200C fuel generator
Claims
1. A nanostructure that induces surface plasmon resonance when irradiated with light, the nanostructure being made of one selected from the group consisting of a single metal, an alloy, a metal nitride, and a conductive oxide; an alloy layer in contact with the nanostructure and having a work function lower than that of the nanostructure, the alloy layer being composed of at least two kinds of metal elements; an n-type semiconductor that forms a Schottky junction with the alloy layer; The alloy layer contains at least one metal selected from the group consisting of gold (Au), silver (Ag), copper (Cu), aluminum (Al), and palladium (Pd); Optical devices.
2. 10. The optical device of claim 1, wherein the nanostructure comprises at least one simple metal selected from the group consisting of gold (Au), silver (Ag), copper (Cu), aluminum (Al), and palladium (Pd).
3. 3. The optical device of claim 1, wherein the nanostructure comprises at least one metal nitride selected from the group consisting of titanium nitride (TiN), zirconium nitride (ZrN), tantalum nitride (TaN), and hafnium nitride (HfN).
4. 4. The optical device of claim 1, wherein the nanostructure comprises at least one conductive oxide selected from the group consisting of tin-doped indium oxide (ITO), aluminum-doped zinc oxide (AZO), and gallium-doped zinc oxide (GZO).
5. 5. The optical device according to claim 1, wherein the alloy layer is an intermetallic compound or a solid solution alloy containing at least two metals selected from the group consisting of gold (Au), silver (Ag), copper (Cu), aluminum (Al), palladium (Pd), titanium (Ti), chromium (Cr), nickel (Ni), manganese (Mn), iron (Fe), zinc (Zn), gallium (Ga), and tantalum (Ta).
6. The optical device according to claim 1 , wherein the n-type semiconductor is an inorganic semiconductor.
7. The optical device according to claim 1 , wherein the nanostructure has a comb-shaped structure. vinegar.
8. The nanostructure comprises at least one nanoparticle; The optical device according to claim 1 , wherein the particle diameter of the at least one nanoparticle is 1 nm or more and 200 nm or less.
9. 9. The optical device according to claim 1, further comprising a light source that emits light having energy equal to or lower than the band gap energy of the n-type semiconductor and corresponding to the plasmon resonance wavelength of the nanostructure.
10. The n-type semiconductor includes at least one selected from the group consisting of a silicon semiconductor, a germanium semiconductor, and a gallium arsenide semiconductor; The optical device according to claim 1 , wherein the surface plasmon resonance wavelength of the nanostructure is 900 nm or more.
11. The n-type semiconductor is titanium oxide (TiO 2 ) semiconductor, gallium nitride (GaN) semiconductor, strontium titanate (SrTiO 3 ) semiconductors; The optical device according to claim 1 , wherein the surface plasmon resonance wavelength in the nanostructure is 400 nm or more.
12. An optical device according to any one of claims 1 to 11; An electrode; A photoelectric conversion device comprising: the n-type semiconductor has a first surface in contact with the alloy layer and a second surface opposite to the first surface; The electrode is in contact with the second surface of the n-type semiconductor.
13. Further comprising a transparent conductive film covering the nanostructure, The transparent conductive film and the n-type semiconductor are not in contact with each other, The photoelectric conversion device according to claim 12 , wherein the conductive wire electrically connects the electrode and the transparent conductive film.
14. An optical device according to any one of claims 1 to 11; a first electrode in contact with the n-type semiconductor in the optical device; an oxidation reaction tank containing a first electrolytic solution and the optical device; a reduction reaction tank containing a second electrolytic solution and a second electrode; a proton permeable membrane located at the boundary between the oxidation reaction tank and the reduction reaction tank; a conducting wire connecting the first electrode and the second electrode, The optical device is in contact with the first electrolyte solution, The second electrode is in contact with the second electrolyte.
15. The fuel generating apparatus according to claim 14 , wherein hydrogen is generated at the second electrode when light having energy corresponding to a surface plasmon resonance wavelength of the nanostructure is incident on the nanostructure in the optical device.
16. The first electrolyte is potassium bicarbonate (KHCO 3 ), sodium bicarbonate (NaHCO 3 16. The fuel generating device according to claim 14 or 15, wherein the aqueous solution is an aqueous solution containing at least one selected from the group consisting of potassium hydroxide (KOH), and sodium hydroxide (NaOH).
17. The second electrolyte is potassium bicarbonate (KHCO 3 ), sodium bicarbonate (NaHCO 317. The fuel generating device according to claim 14, wherein the aqueous solution contains at least one selected from the group consisting of potassium chloride (KCl), potassium chloride (KCl), and sodium chloride (NaCl).
18. 12. The optical device of claim 1, wherein the nanostructure comprises a plurality of nanostructures spaced apart from one another, and the alloy layer is provided continuously in contact with the plurality of nanostructures.
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