Ceramic electronic component, mounting board, and method for manufacturing ceramic electronic component

Abstract

To provide a ceramic electronic component that can reduce the height thereof while capable of forming a base layer of an external electrode by firing a coating film applied to an element body.SOLUTION: A ceramic electronic component according to an embodiment includes: an element body having a dielectric, an internal electrode, a first surface and a second surface opposite the first surface; and an external electrode having a base layer, which is connected to the internal electrode, contains a metal and has a first end face on the outside of the element body on a second surface side, and a plating layer, which is laminated on the base layer and has a second end face on the outside of the element body on the second surface side, the second end face forming a layer structure with the first end surface.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to a ceramic electronic component, a mounting substrate, and a method for manufacturing a ceramic electronic component. [Background technology]

[0002] As electronic devices become smaller and more sophisticated, the density of electronic components mounted on a mounting board is increasing. In order to reduce the mounting area on the mounting surface of IC (Integrated Circuit) chips, a method has been proposed in which the height of a multilayer ceramic capacitor is reduced and it is mounted on the side opposite the mounting surface of the IC chip (LSC (land-side capacitor)).

[0003] When the element body is thinned in order to reduce the height of the multilayer ceramic capacitor, the flexural strength of the multilayer ceramic capacitor decreases, which may cause the multilayer ceramic capacitor to crack when mounted.

[0004] In order to reduce the height of a multilayer ceramic capacitor without thinning the element body, Patent Document 1 discloses a configuration in which a terminal electrode is not substantially formed on the bottom surface of an element body located on the opposite side in the stacking direction to the top surface of the element body. Here, in the method disclosed in Patent Document 1, in order to prevent a terminal electrode from being substantially formed on the bottom surface of the element body, a terminal electrode is formed with the bottom surfaces of two element bodies bonded together, and then these element bodies are separated. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] JP 2020-21930 A Summary of the Invention [Problem to be solved by the invention]

[0006] However, in the method disclosed in Patent Document 1, when the thickness of the element body is 100 um or less, the strength of the element body is too weak, making it difficult to separate the element body. Even if the device body can be separated, the terminal electrodes will break and the fracture surface will be uneven. Such electrode surfaces will have partially reduced adhesion to the device body, leading to reduced adhesion strength after mounting on a mounting board, which may cause defects. Furthermore, when the terminal electrodes are formed by electrolytic plating, plating is deposited by electrical contact with the electrode part of the element body, and therefore if the terminal electrode is broken and electrical contact with the electrode part of the element body is lost or deteriorated, the plating layer of the terminal electrode becomes thin and non-uniform.

[0007] Therefore, an object of the present invention is to provide a ceramic electronic component, a mounting substrate, and a method for manufacturing a ceramic electronic component that suppresses a decrease in flexural strength, achieves a low profile, and prevents breakage of external electrodes. [Means for solving the problem]

[0008] In order to solve the above problems, a ceramic electronic component according to one aspect of the present invention comprises a base body having a dielectric, an internal electrode, a first surface, and a second surface opposite the first surface, an external electrode including a base layer connected to the internal electrode and containing a metal, the base layer having a first end surface on the outside of the base body on the second surface side, and a plating layer laminated on the base layer and having a second end surface that forms a layer structure with the first end surface on the outside of the base body on the second surface side.

[0009] In addition, in the ceramic electronic component according to one aspect of the present invention, the external electrodes are formed on a plurality of surfaces of the element body excluding the second surface side.

[0010] In the ceramic electronic component according to one aspect of the present invention, the base layer is exposed from the plating layer on the second surface side, and is covered with the plating layer on the first surface side.

[0011] Furthermore, in a ceramic electronic component according to one aspect of the present invention, the base body has a third surface perpendicular to the first surface and the second surface, the base layer is formed on the third surface, the plating layer is laminated on the base layer on the third surface side, and the laminated structure of the plating layer and the base layer is cut on the second surface side.

[0012] In addition, in the ceramic electronic component according to one aspect of the present invention, the laminated structure of the plating layer and the base layer is cut on the first surface side and the second surface side.

[0013] Furthermore, in a ceramic electronic component according to one embodiment of the present invention, a first end face of the base layer is located outside the second surface of the base body, and a second end face of the plating layer is located outside the first end face of the base layer.

[0014] In the ceramic electronic component according to one aspect of the present invention, the first end face and the second end face are flat surfaces.

[0015] In the ceramic electronic component according to one aspect of the present invention, the normal direction to the second face, the normal direction to the first end face, and the normal direction to the second end face are all equal to each other.

[0016] Furthermore, in a ceramic electronic component according to one aspect of the present invention, the base body has a curved surface with a chamfered corner on the second surface side, and the first end surface of the base layer wraps around the curved surface to reach the second surface.

[0017] In the ceramic electronic component according to one aspect of the present invention, the plating layer wraps around the base layer 7 so that the second end face reaches the second surface.

[0018] In the ceramic electronic component according to one aspect of the present invention, the radius of curvature of the curved surface is not less than 5 um and not more than 20 um.

[0019] In the ceramic electronic component according to one aspect of the present invention, the central portion of the second face is raised higher than the first end face and the second end face.

[0020] In the ceramic electronic component according to one aspect of the present invention, the central portion of the second face protrudes from the first end face and the second end face by 3 um or less.

[0021] In the ceramic electronic component according to one aspect of the present invention, the surface roughness Sa of the second surface of the element body is smaller than the surface roughness Sa of the first surface of the element body.

[0022] In the ceramic electronic component according to one aspect of the present invention, the second surface of the element has a surface roughness Sa of 0.20 μm or less.

[0023] Furthermore, in a ceramic electronic component according to one aspect of the present invention, the plating layer has a laminated structure of multiple plating layers having different metal components, and on the second surface side, end faces of the multiple plating layers form a layered structure outside the base body.

[0024] Furthermore, in a ceramic electronic component according to one embodiment of the present invention, the base body includes a dielectric layer containing the dielectric, and a laminate in which first internal electrode layers and second internal electrode layers provided as the internal electrodes are alternately stacked with the dielectric layer interposed therebetween, and the external electrode includes a first external electrode and a second external electrode separately provided on two opposing third surfaces perpendicular to both the first surface and the second surface, the first internal electrode layer being connected to the first external electrode, and the second internal electrode layer being connected to the second external electrode.

[0025] Furthermore, according to a mounting board according to one aspect of the present invention, any one of the ceramic electronic components described above is mounted on the mounting board via a solder layer, and the solder layer wets up onto a side surface of the external electrode while being separated from the second surface of the element body.

[0026] Furthermore, a mounting board according to one aspect of the present invention includes a resin that seals the ceramic electronic component on the mounting board, and solder balls formed on the mounting board, and the ceramic electronic component is mounted on the side on which the solder balls are formed.

[0027] Furthermore, a method for manufacturing a ceramic electronic component according to one embodiment of the present invention includes the steps of forming a base body having a dielectric and an internal electrode, applying a base material for an external electrode to a side surface of the base body and four surfaces perpendicular to the side surfaces, firing the base material to form a base layer for the external electrode, stacking a plating layer on the base layer, and removing the base layer and plating layer on one of the four surfaces.

[0028] Furthermore, according to a method for manufacturing a ceramic electronic component according to one embodiment of the present invention, the base layer and plating layer on one of the four faces are removed by physically polishing the one of the four faces. Effect of the Invention

[0029] According to the present invention, it is possible to suppress a decrease in flexural strength, reduce the height, and prevent breakage of the external electrodes. [Brief description of the drawings]

[0030] [Figure 1] 1 is a perspective view showing an example of the configuration of a multilayer ceramic capacitor in accordance with a first embodiment. [Figure 2A] 2 is a cross-sectional view of the multilayer ceramic capacitor of FIG. 1 taken in the longitudinal direction. [Figure 2B] 2 is a cross-sectional view of the multilayer ceramic capacitor of FIG. 1 cut in the width direction at the position of an external electrode. [Figure 3A] 2 is a top view showing a configuration example of the multilayer ceramic capacitor of FIG. 1. [Figure 3B] 2 is a bottom view showing a configuration example of the multilayer ceramic capacitor of FIG. 1. [Figure 4]4 is a flowchart showing a method for manufacturing the multilayer ceramic capacitor in accordance with the first embodiment. [Figure 5A] 1A to 1C are cross-sectional views illustrating a method for manufacturing the multilayer ceramic capacitor in accordance with the first embodiment. [Figure 5B] 1A to 1C are cross-sectional views illustrating a method for manufacturing the multilayer ceramic capacitor in accordance with the first embodiment. [Figure 5C] 1A to 1C are cross-sectional views illustrating a method for manufacturing the multilayer ceramic capacitor in accordance with the first embodiment. [Figure 5D] 1A to 1C are cross-sectional views illustrating a method for manufacturing the multilayer ceramic capacitor in accordance with the first embodiment. [Figure 5E] 1A to 1C are cross-sectional views illustrating a method for manufacturing the multilayer ceramic capacitor in accordance with the first embodiment. [Figure 5F] 1A to 1C are cross-sectional views illustrating a method for manufacturing the multilayer ceramic capacitor in accordance with the first embodiment. [Figure 5G] 1A to 1C are cross-sectional views illustrating a method for manufacturing the multilayer ceramic capacitor in accordance with the first embodiment. [Figure 5H] 1A to 1C are cross-sectional views illustrating a method for manufacturing the multilayer ceramic capacitor in accordance with the first embodiment. [Figure 5I] 1A to 1C are cross-sectional views illustrating a method for manufacturing the multilayer ceramic capacitor in accordance with the first embodiment. [Figure 5J] 1A to 1C are cross-sectional views illustrating a method for manufacturing the multilayer ceramic capacitor in accordance with the first embodiment. [Figure 6A] 5 is a cross-sectional view showing an example of a method for removing external electrodes on the upper surface side of the body of the multilayer ceramic capacitor in accordance with the first embodiment. FIG. [Figure 6B] 5 is a cross-sectional view showing an example of a method for removing external electrodes on the upper surface side of the body of the multilayer ceramic capacitor in accordance with the first embodiment. FIG. [Figure 6C] 5 is a cross-sectional view showing an example of a method for removing external electrodes on the upper surface side of the body of the multilayer ceramic capacitor in accordance with the first embodiment. FIG. [Figure 7] 6 is a cross-sectional view showing an example of the configuration of a mounting board on which the multilayer ceramic capacitor in accordance with the second embodiment is mounted. [Figure 8]FIG. 11 is a cross-sectional view showing an example of the configuration of a multilayer ceramic capacitor in accordance with a third embodiment. [Figure 9A] 10 is a cross-sectional view of the multilayer ceramic capacitor in accordance with a fourth embodiment, cut in the length direction. FIG. [Figure 9B] 10 is a cross-sectional view of the multilayer ceramic capacitor in accordance with a fourth embodiment, cut in the width direction at the position of an external electrode. [Figure 10] 13 is a cross-sectional view showing an example of the configuration of a mounting board on which the multilayer ceramic capacitor in accordance with the fifth embodiment is mounted. FIG. [Figure 11] FIG. 13 is a perspective view showing an example of the configuration of a ceramic electronic component according to a sixth embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0031] Hereinafter, the embodiments of the present invention will be described in detail with reference to the accompanying drawings. Note that the following embodiments do not limit the present invention, and not all of the combinations of features described in the embodiments are necessarily essential to the configuration of the present invention. The configuration of the embodiments may be appropriately modified or changed depending on the specifications of the device to which the present invention is applied and various conditions (conditions of use, environment of use, etc.). The technical scope of the present invention is determined by the claims, and is not limited by the individual embodiments below. Also, the drawings used in the following description may differ in scale and shape from the actual structure in order to make each configuration easier to understand.

[0032] (First embodiment) Fig. 1 is a perspective view showing an example of the configuration of the multilayer ceramic capacitor according to the first embodiment, Fig. 2A is a cross-sectional view of the multilayer ceramic capacitor of Fig. 1 cut in the length direction, Fig. 2B is a cross-sectional view of the multilayer ceramic capacitor of Fig. 1 cut in the width direction at the position of an external electrode, Fig. 3A is a top view showing the example of the configuration of the multilayer ceramic capacitor of Fig. 1, and Fig. 3B is a bottom view showing the example of the configuration of the multilayer ceramic capacitor of Fig. 1. Note that in this embodiment, a multilayer ceramic capacitor is taken as an example of a ceramic electronic component.

[0033] 1, 2A, 2B, 3A and 3B, multilayer ceramic capacitor 1A includes an element body 2 and external electrodes 6A, 6B. Element body 2 includes a laminate 2A, a lower cover layer 5A and an upper cover layer 5B. Laminate 2A includes internal electrode layers 3A, 3B and a dielectric layer 4.

[0034] A lower cover layer 5A is provided on the lower layer of the laminate 2A, and an upper cover layer 5B is provided on the upper layer of the laminate 2A. The internal electrode layers 3A, 3B are alternately laminated with a dielectric layer 4 interposed therebetween. Although an example in which the internal electrode layers 3A, 3B are laminated in a total of six layers is shown in FIG. 1, FIG. 2A, and FIG. 2B, the number of layers of the internal electrode layers 3A, 3B is not particularly limited. In this case, the shape of the element body 2 and the laminate 2A can be a substantially rectangular parallelepiped shape. In the following description, the direction in which the side surfaces of the element body 2 face each other may be referred to as the length direction DL, the direction in which the front and rear surfaces of the element body 2 face each other may be referred to as the width direction DW, and the direction in which the top and bottom surfaces of the element body 2 face each other may be referred to as the lamination direction (height direction) DS. In this case, the side surface (third surface) of the element body 2 is vertically connected to four surfaces of the element body 2 (the lower surface (first surface), the upper surface (second surface), the front surface (fourth surface), and the rear surface (fifth surface)). In this case, the first surface and the second surface face each other, and the fourth surface and the fifth surface face each other. The first surface can be disposed at a position facing the mounting surface of a mounting board on which the multilayer ceramic capacitor 1A is mounted.

[0035] The element body 2 is chamfered along the ridges of the element body 2. In this case, the element body 2 has a curved surface R where the corners of the element body 2 are chamfered. The radius of curvature C of the curved surface R where the corners of the element body 2 are chamfered is preferably 5 um or more and 20 um or less, and more preferably 10 um or more and 20 um or less. Note that this radius of curvature C can be defined, for example, by the radius of curvature C of the curved surface R of the corners of the cross section of the element body 2 when the element body 2 is cut vertically along the longitudinal direction DL.

[0036] Here, by setting the radius of curvature C of the curved surface R of the element body 2 to 10 μm or more, the amount of wraparound of the underlayer 7 around the upper surface of the element body 2 along the curved surface R can be increased, making it possible to improve the adhesion between the underlayer 7 and the element body 2 and to distance the boundary of the underlayer 7 on the upper surface side of the element body 2 from the solder used to mount the multilayer ceramic capacitor 1A. This makes it possible to suppress peeling of the underlayer 7 from the element body 2 due to the contraction stress of the solder used to mount the multilayer ceramic capacitor 1A. Furthermore, by setting the radius of curvature C of the curved surface R of the element body 2 to 20 um or less, damage to the internal electrode layers 3A, 3B during barrel polishing of the curved surface R with the chamfered corners of the element body 2 can be suppressed.

[0037] The surface roughness Sa of the upper surface of the element body 2 is smaller than the surface roughness Sa of the lower surface of the element body 2. The surface roughness Sa of the upper surface of the element body 2 is preferably 0.20 μm or less. For example, the average surface roughness Sa of the lower surface of the element body 2 can be Sa>0.50 μm, and the average surface roughness Sa of the upper surface of the element body 2 can be Sa<0.20 μm. By setting the surface roughness Sa of the upper surface of the element body 2 to 0.20 μm or less, even when the upper surface side of the element body 2 is polished, it is possible to make the upper surface side of the element body 2 less susceptible to scratches, and to suppress cracks in the element body 2 originating from scratches.

[0038] The external electrodes 6A, 6B are formed on the element body 2 so as to face each other while being separated from each other in the longitudinal direction DL. Here, each of the external electrodes 6A, 6B is formed continuously from the lower surface side of the element body 2 to the side surface that is connected perpendicularly to the lower surface via the curved surface R, and is not present on the upper surface side of the element body 2. Furthermore, each of the external electrodes 6A, 6B may also be formed on the front and rear surfaces of the element body 2 that are perpendicular to both the lower surface and the side surface and face each other. The thickness of each of the external electrodes 6A, 6B is, for example, 10 to 40 μm.

[0039] Here, by ensuring that the external electrodes 6A, 6B are not present on the upper surface side of the element body 2, the height of the multilayer ceramic capacitor 1A can be reduced without reducing the number of stacked internal electrode layers 3A, 3B, and LSC mounting can be achieved without reducing the capacitance of the multilayer ceramic capacitor 1A.

[0040] In the length direction DL, the internal electrode layers 3A and 3B are alternately arranged at different positions in the laminate 2A. In this case, the internal electrode layer 3A can be arranged on one side surface side of the element body 2 relative to the internal electrode layer 3B, and the internal electrode layer 3B can be arranged on the other side surface side of the element body 2 relative to the internal electrode layer 3A. Then, an end of the internal electrode layer 3A is drawn to an end of the dielectric layer 4 on one side surface side of the element body 2 in the length direction DL and connected to the external electrode 6A. An end of the internal electrode layer 3B is drawn to an end of the dielectric layer 4 on the other side surface side of the element body 2 in the length direction DL and connected to the external electrode 6B. On the other hand, in the width direction DW of the element body 2, the ends of the internal electrode layers 3A, 3B are covered with the dielectric layer 4. In the width direction DW, the positions of the ends of the internal electrode layers 3A, 3B may be aligned.

[0041] The thickness of the internal electrode layers 3A, 3B and the dielectric layer 4 in the lamination direction DS can be within a range of 0.05 μm to 5 μm, for example, 0.3 μm. The material of the internal electrode layers 3A, 3B can be selected from metals such as Cu (copper), Ni (nickel), Ti (titanium), Ag (silver), Au (gold), Pt (platinum), Pd (palladium), Ta (tantalum), and W (tungsten), or may be an alloy containing these metals.

[0042] The material of the dielectric layer 4 may be, for example, mainly composed of a ceramic material having a perovskite structure. The main component may be contained at a ratio of 50 at% or more. The ceramic material of the dielectric layer 4 may be selected from, for example, barium titanate, strontium titanate, calcium titanate, magnesium titanate, barium strontium titanate, barium calcium titanate, calcium zirconate, barium zirconate, calcium titanate zirconate, titanium oxide, etc.

[0043] The material of lower cover layer 5A and upper cover layer 5B may be mainly composed of a ceramic material, for example. In this case, the main component of the ceramic material of lower cover layer 5A and upper cover layer 5B may be the same as the main component of the ceramic material of dielectric layer 4. The thickness of lower cover layer 5A and upper cover layer 5B is preferably 5 μm or more and 30 μm or less.

[0044] Each of the external electrodes 6A, 6B includes an underlayer 7 formed on the element body 2 and a plating layer 9 laminated on the underlayer 7. The underlayers 7 are formed on the element body 2 so as to face each other while being separated from each other in the length direction DL. In this case, the underlayer 7 is formed continuously from the lower surface side of the element body 2 to the side surface via the curved surface R, and is not formed on the upper surface side of the element body 2. The underlayer 7 may be formed continuously from the lower surface side of the element body 2 to the front surface side and the rear surface side. The thickness of the underlayer 7 is preferably 3 μm or more and 6 μm or less. By setting the thickness of the underlayer 7 to 3 μm or more, the underlayer 7 can be formed continuously and stably from the lower surface side to the side surface of the element body 2 so as to cover the curved surface R of the element body 2. By setting the thickness of the underlayer 7 to 6 μm or less, an increase in the thickness of each of the external electrodes 6A, 6B can be suppressed, and the multilayer ceramic capacitor 1A can be made low-profile.

[0045] The metal used as the conductive material of the underlayer 7 may be, for example, a metal or alloy containing at least one selected from Cu, Fe (iron), Zn (zinc), Al (aluminum), Ni, Pt, Pd, Ag, Au, and Sn (tin) as a main component. The underlayer 7 may contain a common material mixed with a metal. The common material is mixed in the underlayer 7 in an island shape to reduce the difference in thermal expansion coefficient between the element body 2 and the underlayer 7, and to relieve the stress applied to the underlayer 7. The common material is, for example, a ceramic component that is a main component of the dielectric layer 4. The underlayer 7 may contain a glass component. The glass component is mixed into the underlayer 7 to densify the underlayer 7. The glass component is, for example, an oxide of Ba (barium), Sr (strontium), Ca (calcium), Zn, Al, Si (silicon), or B (boron).

[0046] The underlayer 7 may contain a metal component contained in the element body 2. The metal component is, for example, Mg (Ni, Cr, Sr, Al, Na, and Fe may also be contained in trace amounts). In this case, the underlayer 7 may contain, for example, a compound containing Mg, Ni, and O as a compound of the metal used as the conductive material of the underlayer 7, the metal contained in the element body 2, and oxygen.

[0047] Here, the underlayer 7 is preferably composed of a sintered body of a coating film containing a dielectric material. This makes it possible to increase the thickness of the underlayer 7 while ensuring adhesion between the element body 2 and the underlayer 7, and to ensure the strength of each of the external electrodes 6A, 6B while ensuring electrical continuity with the internal electrode layers 3A, 3B. The underlayer 7 may have a sputtered film formed by a sputtering method on the sintered body of the coating film on the lower surface side for the purpose of expanding the electrode area to improve adhesion with a conductive material such as solder during mounting. In this case, the sputtered film does not contain the metal component contained in the element body 2, and can be formed of a metal or alloy such as Cu or Ni. The underlayer 7 may also be formed of only a sputtered film for the purpose of thinning.

[0048] The plating layer 9 is formed continuously for each external electrode 6A, 6B so as to cover the underlayer 7, and is not formed on the upper surface side of the element body 2. The plating layer 9 is electrically connected to the internal electrode layers 3A, 3B via the underlayer 7. The plating layer 9 is also electrically connected to the terminals of the mounting board via solder. To ensure the strength of each of the external electrodes 6A, 6B and to ensure reliable electrical connection between the underlayer 7 and the terminals of the mounting board, the thickness of the plating layer 9 is preferably 10 μm or more.

[0049] The material of the plating layer 9 is, for example, mainly composed of a metal such as Cu, Ni, Al, Zn, or Sn, or an alloy of two or more of these metals. The plating layer 9 may be a plating layer of a single metal component, or may be a plating layer of multiple metal components different from each other. The plating layer 9 may have a three-layer structure of, for example, a Cu plating layer 9A formed on the underlayer 7, a Ni plating layer 9B formed on the Cu plating layer 9A, and a Sn plating layer 9C formed on the Ni plating layer 9B. The Cu plating layer 9A can improve the adhesion of the plating layer 9 to the underlayer 7. The Ni plating layer 9B can improve the heat resistance of each of the external electrodes 6A and 6B during soldering. The Sn plating layer 9C can improve the wettability of the solder to the plating layer 9. For example, when the thickness of the underlayer 7 is 4.5 μm, the thickness of the Cu plating layer 9A can be 3 μm, the thickness of the Ni plating layer 9B can be 2 μm, and the thickness of the Sn plating layer 9C can be 6 μm.

[0050] Here, on the upper surface side of the element body 2, the end face (first end face) of the underlayer 7 and the end face (second end face) of the plating layer 9 form a layer structure on the outside of the element body 2. Also, on the upper surface side of the element body 2, the end face of the Cu plating layer 9A, the end face of the Ni plating layer 9B, and the end face of the Sn plating layer 9C form a layer structure on the outside of the underlayer 7. In this case, the layered structure of the underlayer 7, the Cu plating layer 9A, the Ni plating layer 9B, and the Sn plating layer 9C laminated on the side surface of the element body 2 is cut in the horizontal direction on the upper surface side of the element body 2. At this time, the underlayer 7 has an end face MU that protrudes outward from the element body 2 on the upper surface side of the element body 2. The Cu plating layer 9A has an end face MA that protrudes outward from the end face MU on the upper surface side of the element body 2. The Ni plating layer 9B has an end face MB that protrudes outward from the end face MA on the upper surface side of the element body 2. The Sn plating layer 9C has an end face MC that protrudes outward from the end face MB on the upper surface side of the element body 2.

[0051] The end faces MU, MA, MB, and MC can be located in the same plane including the top surface of the element body 2. In this case, the normal direction of each of the end faces MU, MA, MB, and MC can be the same as the normal direction of the top surface of the element body 2. In this case, each of the end faces MU, MA, MB, and MC can be a flat surface.

[0052] The underlayer 7 wraps around the curved surface R on the upper surface of the element body 2, and the end surface MU reaches the upper surface of the element body 2. The wrap-around amount of the underlayer 7 on the upper surface of the element body 2 can be made equal to the radius of curvature C of the curved surface R on the upper surface of the element body 2. As shown in FIG. 3A, the underlayer 7 may wrap around the inside of the element body 2 from the ridges of the front and rear surfaces of the element body 2. The wrap-around amount can be changed depending on the magnitude of the radius of curvature C of the curved surface R or the thickness of each layer of the external electrodes 6A and 6B. Furthermore, the end surfaces MA, MB, and MC of the Cu plating layer 9A, the Ni plating layer 9B, and the Sn plating layer 9C also wrap around the wrap-around of the underlayer 7 and reach the upper surface of the element body 2. However, unlike FIG. 1, the Sn plating layer 9C may extend outside the element body 2, and the length of the end surface MC in the longitudinal direction DL may be longer than the length of the Sn plating layer 9C on the side surface of the element body 2 in the longitudinal direction DL. In this case, the Sn plating layer 9C, depending on its spread to the outside of the element body 2, can prevent the solder from wetting up onto the element body during mounting.

[0053] Here, the end of the base layer 7 is exposed from the plating layer 9A, the Ni plating layer 9B, and the Sn plating layer 9C on the upper surface side of the element body 2. At this time, the layered structure of the external electrodes 6A, 6B is exposed to the outside of the multilayer ceramic capacitor 1A. Meanwhile, the end of the base layer 7 is covered with the Cu plating layer 9A, the Ni plating layer 9B, and the Sn plating layer 9C on the lower surface side of the element body 2.

[0054] Here, by providing the underlayer 7, the Cu plating layer 9A, the Ni plating layer 9B, and the Sn plating layer 9C with the end faces MU, MA, MB, and MC on the upper surface side of the element body 2, respectively, it is possible to manufacture a multilayer ceramic capacitor 1A without the external electrodes 6A and 6B on the upper surface side of the element body 2 without breaking the external electrodes 6A and 6B. Therefore, it is possible to suppress a decrease in the flexural strength of the multilayer ceramic capacitor 1A while achieving a low height, and to suppress the non-uniformity of the cross-sectional shapes of the external electrodes 6A and 6B on the upper surface side of the element body 2, thereby suppressing a decrease in the adhesive strength between the external electrodes 6A and 6B and the element body 2. In addition, when the external electrodes 6A and 6B break, the plating will precipitate in the height direction from the fractured surfaces of the external electrodes 6A and 6B. On the other hand, the multilayer ceramic capacitor 1A does not break the external electrodes 6A and 6B, so it is possible to reliably achieve a low height.

[0055] Furthermore, by providing end faces MU, MA, MB, and MC on the underlayer 7, Cu plating layer 9A, Ni plating layer 9B, and Sn plating layer 9C, respectively, on the top surface side of element body 2, it is possible to maintain uniformity in the film thickness of Cu plating layer 9A, Ni plating layer 9B, and Sn plating layer 9C from the side surface side to the cut surface on the top surface side of element body 2. This makes it possible to suppress a decrease in the strength of each of the external electrodes 6A, 6B, and also to suppress a decrease in conductivity between the underlayer 7 and the terminals of the mounting board.

[0056] Furthermore, the entire upper surface side of the multilayer ceramic capacitor 1A can be flattened by positioning the end faces MU, MA, MB, and MC in the same plane including the upper surface of the element body 2. This makes it possible to eliminate unevenness on the upper surface side of the multilayer ceramic capacitor 1A, stabilizing the posture of the multilayer ceramic capacitor 1A when it is picked up by the nozzle of the mounter, and reducing mounting errors.

[0057] Furthermore, by wrapping the underlayer 7 around the curved surface R on the upper surface side of the element body 2, it is possible to improve the adhesion between the underlayer 7 and the element body 2, and to distance the boundary of the underlayer 7 on the upper surface side of the element body 2 from the solder used to mount the multilayer ceramic capacitor 1A. This makes it possible to prevent the underlayer 7 from peeling off from the element body 2 due to the contraction stress of the solder used to mount the multilayer ceramic capacitor 1A.

[0058] For example, the external dimensions of the multilayer ceramic capacitor 1A may be length>width>height, or length>width=height. In this case, in order to reduce the height of the multilayer ceramic capacitor 1A, the height of the multilayer ceramic capacitor 1A is preferably 150 μm or less. The height of the multilayer ceramic capacitor 1A is equal to the thickness of the multilayer ceramic capacitor 1A from the lower surfaces of the external electrodes 6A, 6B to the upper surface of the element body 2.

[0059] By setting the height of the multilayer ceramic capacitor 1A to 150 μm or less, the height of the multilayer ceramic capacitor 1A can be made smaller than the diameter of the solder balls on the mounting substrate. Therefore, the multilayer ceramic capacitor 1A can be mounted on the solder ball-formed surface side of the mounting substrate, and the mounting substrate can be mounted on the motherboard via the solder balls. As a result, the multilayer ceramic capacitor 1A can be disposed on the back side of the semiconductor chip disposed on the mounting substrate, and the multilayer ceramic capacitor 1A can be mounted close to the semiconductor chip, and the mounting area on the mounting surface side of the semiconductor chip can be increased. Therefore, it is possible to effectively remove noise applied to the semiconductor chip while improving the mounting density of the semiconductor chip mounted on the mounting substrate.

[0060] For example, suppose that the thickness of each of the external electrodes 6A, 6B is 15 um, and that the height of the multilayer ceramic capacitor 1A is required to be 80 um. In this case, the thickness of the element body 2 can be set to be 50 um or more and 65 um or less. Also, suppose that the height of the multilayer ceramic capacitor 1A is required to be 60 um. In this case, the thickness of the element body 2 can be set to be 30 um or more and 45 um or less. This makes it possible to reduce the height of the multilayer ceramic capacitor 1A while suppressing a decrease in the flexural strength of the multilayer ceramic capacitor 1A, and improves the resistance of the multilayer ceramic capacitor 1A to shocks during mounting and various stresses after mounting.

[0061] Fig. 4 is a flowchart showing the method for manufacturing the multilayer ceramic capacitor in accordance with the first embodiment, and Fig. 5A to Fig. 5J are cross-sectional views showing the method for manufacturing the multilayer ceramic capacitor in accordance with the first embodiment. Note that Fig. 5C to Fig. 5J show an example in which three layers of internal electrode layers 3A and 3B are alternately laminated with a dielectric layer 4 interposed therebetween.

[0062] In S1 of FIG. 4, an organic binder and an organic solvent as a dispersant and a molding aid are added to a dielectric material powder, and the powder is pulverized and mixed to generate a mud-like slurry. The dielectric material powder includes, for example, a ceramic powder. The dielectric material powder may include an additive. The additive is, for example, an oxide or glass of Mg, Mn, V, Cr, Y, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Co, Ni, Li, B, Na, K, or Si. The organic binder is, for example, a polyvinyl butyral resin or a polyvinyl acetal resin. The organic solvent is, for example, ethanol or toluene.

[0063] Next, as shown in S2 of Fig. 4 and Fig. 5A, the slurry containing ceramic powder is applied in a sheet form onto a carrier film and dried to produce a green sheet 24. The carrier film is, for example, a PET (polyethylene terephthalate) film. The slurry can be applied by a doctor blade method, a die coater method, a gravure coater method, or the like.

[0064] Next, as shown in S3 of FIG. 4 and FIG. 5B, the conductive paste for the internal electrodes is applied to the green sheets 24 of the layers forming the internal electrode layers 3A and 3B among the plurality of green sheets in a predetermined pattern to form the internal electrode patterns 23. At this time, a plurality of internal electrode patterns 23 separated in the longitudinal direction of the green sheets 24 can be formed on one green sheet 24. The conductive paste for the internal electrodes contains powder of the metal used as the material for the internal electrode layers 3A and 3B. For example, when the metal used as the material for the internal electrode layers 3A and 3B is Ni, the conductive paste for the internal electrodes contains Ni powder. The conductive paste for the internal electrodes also contains a binder, a solvent, and an auxiliary agent as necessary. The conductive paste for the internal electrodes may contain a ceramic material, which is the main component of the dielectric layer 4, as a common material. The conductive paste for the internal electrodes can be applied by screen printing, inkjet printing, gravure printing, or the like.

[0065] Next, as shown in S4 of Fig. 4 and Fig. 5C, a laminated block is prepared by stacking a plurality of green sheets 24 on which the internal electrode pattern 23 is formed and green sheets 25A, 25B for outer layers on which the internal electrode pattern 23 is not formed, in a predetermined order. The thickness of the green sheets 25A, 25B for outer layers is greater than the thickness of the green sheet 24 on which the internal electrode pattern 23 is formed. At this time, the green sheets 24 adjacent in the stacking direction are stacked so that the internal electrode patterns 23A, 23B are alternately shifted in the longitudinal direction of the green sheets 24. Also, there are a portion where only the internal electrode pattern 23A is stacked in the stacking direction, a portion where the internal electrode patterns 23A, 23B are alternately stacked in the stacking direction, and a portion where only the internal electrode pattern 23B is stacked in the stacking direction.

[0066] Next, as shown in S5 and 5D of Fig. 4, the laminated block obtained in the molding step S4 of Fig. 4 is pressed to pressure-bond the green sheets 24, 25A, and 25B. As a method for pressing the laminated block, for example, a method of sandwiching the laminated block between resin films and isostatic pressing can be used.

[0067] Next, as shown in S6 of Fig. 4 and Fig. 5E, the pressed laminated block is cut and divided into individual rectangular parallelepiped elements. The laminated block is cut at a portion where only the internal electrode patterns 23A are stacked in the stacking direction and at a portion where only the internal electrode patterns 23B are stacked in the stacking direction. For example, a method such as blade dicing can be used to cut the laminated block.

[0068] At this time, as shown in FIG. 5F, the singulated element body 2" has internal electrode layers 3A, 3B stacked alternately with dielectric layers 4 interposed therebetween, and cover layers 5A, 5B are formed on the bottom and top layers. The internal electrode layer 3A is drawn out from the surface of the dielectric layer 4 on one side of the element body 2", and the internal electrode layer 3B is drawn out from the surface of the dielectric layer 4 on the other side of the element body 2". Note that FIG. 4F shows one singulated element body of FIG. 4E enlarged in the length direction.

[0069] Next, as shown in S7 of Fig. 4, the binder contained in the element body 2'' individualized in S6 of Fig. 4 is removed. To remove the binder, the element body 2'' is heated in an N2 atmosphere at about 350°C, for example.

[0070] Next, as shown in S8 of Fig. 4 and Fig. 5G, the element body 2'' is chamfered to form an element body 2'' having curved surfaces R with a curvature radius C at corners of the element body 2''. The element body 2'' can be chamfered by barrel polishing, for example.

[0071] Next, as shown in S9 of FIG. 4, a conductive paste for the base layer is applied to both side surfaces of the element body 2′ chamfered in S8 of FIG. 4 and the four peripheral surfaces (upper, lower, front and rear surfaces) of each side surface, and then dried. For example, a dipping method can be used to apply the conductive paste for the base layer. The conductive paste for the base layer contains a powder or filler of a metal used as a conductive material for the base layer 7. For example, when the metal used as the conductive material for the base layer 7 is Ni, the conductive paste for the base layer contains a powder or filler of Ni. The conductive paste for the base layer also contains, as a common material, a ceramic component that is the main component of the dielectric layer 4. For example, the conductive paste for the base layer contains particles of an oxide ceramic mainly composed of barium titanate (e.g., 0.8 μm to 4 μm in D50 particle size) as a common material. The conductive paste for the base layer also contains a binder and a solvent.

[0072] Next, as shown in S10 of Fig. 4 and Fig. 5H, the element body 2' to which the conductive paste for the underlayer is applied in S9 of Fig. 4 is fired to integrate the internal electrode layers 3A, 3B and the dielectric layer 4, and to form an underlayer 7' integrated with the element body 2'. The element body 2' and the conductive paste for the underlayer are fired, for example, in a firing furnace at 1000 to 1400°C for 10 minutes to 2 hours. When a base metal such as Ni or Cu is used for the internal electrode layers 3A, 3B, firing can be performed in a reducing atmosphere in the firing furnace to prevent oxidation of the internal electrode layers 3A, 3B.

[0073] Next, as shown in S11 of FIG. 4 and FIG. 5I, a Cu plating layer 9A', a Ni plating layer 9B', and a Sn plating layer 9C' are sequentially formed on the underlayer 7'. At this time, a multilayer ceramic capacitor 1A' is produced in which the external electrodes 6A', 6B' are located on the lower and upper sides of the element body 2'. In forming the plating layer 9', for example, the Cu plating layer 9A', the Ni plating layer 9B', and the Sn plating layer 9C' can be sequentially formed. At this time, the element body 2' on which the underlayer 7' has been formed is placed in a barrel together with a plating solution, and the plating layer 9' can be formed by passing electricity through the barrel while rotating it.

[0074] Next, as shown in S12 of FIG. 4 and FIG. 5J, the underlayer 7', Cu plating layer 9A', Ni plating layer 9B', and Sn plating layer 9C' on the upper surface of the element body 2' are removed by physically polishing the upper surface of the element body 2'. At this time, a multilayer ceramic capacitor 1A is produced in which the underlayer 7, Cu plating layer 9A, Ni plating layer 9B, and Sn plating layer 9C are formed on the element body 2 whose upper surface side has been polished. Here, the surface roughness Sa of the upper surface of the element body 2 on which the underlayer 7, Cu plating layer 9A, Ni plating layer 9B, and Sn plating layer 9C are formed can be made smaller than the surface roughness Sa of the lower surface of the element body 2. At this time, the Sn plating layer 9C may extend outside the element body 2, unlike FIG. 5J.

[0075] Here, when manufacturing the multilayer ceramic capacitor 1A of Fig. 5J, the multilayer ceramic capacitor 1A' of Fig. 5I can be used. In this case, the manufacturing process of the multilayer ceramic capacitor 1A of Fig. 5J can be directly used for the manufacturing process of the multilayer ceramic capacitor 1A' of Fig. 5I. Therefore, in order to manufacture the multilayer ceramic capacitor 1A of Fig. 5J, it is sufficient to add the step S12 of Fig. 4 to the manufacturing line of the multilayer ceramic capacitor 1A' of Fig. 5I, and there is no need to modify the manufacturing line of the multilayer ceramic capacitor 1A' of Fig. 5I.

[0076] In addition, the thickness of the element bodies 2, 2', 2" can be increased while the height of the multilayer ceramic capacitor 1A is reduced. This makes it possible to prevent the element bodies 2, 2', 2" from becoming difficult to handle, and allows for stable manufacture of the multilayer ceramic capacitor 1A.

[0077] 6A to 6C are cross-sectional views showing an example of a method for removing external electrodes on the upper surface side of the body of the multilayer ceramic capacitor in accordance with the first embodiment. In Fig. 6A, an adhesive sheet 42 is attached to one side of a flat substrate 41. Then, a plurality of multilayer ceramic capacitors 1A' in Fig. 5I are arranged on the adhesive sheet 42, and the lower surfaces of the external electrodes 6A', 6B' are attached to the adhesive sheet 42. At this time, in order to improve the holding ability of the multilayer ceramic capacitor 1A' on the adhesive sheet 42, the lower surfaces of the external electrodes 6A', 6B' may be recessed into the adhesive sheet 42. The substrate 41 may be, for example, a glass substrate. The adhesive sheet 42 may be, for example, a foamed release sheet or a UV release tape having double-sided adhesiveness.

[0078] 6B, an abrasive 44 such as a file is attached to one side of a flat base 43. The abrasive 44 can be attached to the base 43 using tape or the like. The base 43 can be, for example, a glass plate.

[0079] Then, the substrate 41 is placed on the base 43 so that the upper surfaces of the external electrodes 6A', 6B' of the multilayer ceramic capacitor 1A' arranged on the adhesive sheet 42 are pressed against the abrasive 44. Here, a load WT can be applied to the substrate 41 so that the upper surfaces of the external electrodes 6A', 6B' are pressed against the abrasive 44 under predetermined conditions.

[0080] Then, the upper surfaces of the external electrodes 6A', 6B' are physically polished based on the fine oscillation VB of at least one of the substrate 41 and the base 43, thereby removing the upper surfaces of the external electrodes 6A', 6B' from the element body 2'. At this time, the upper surface of the element body 2' is also polished, and the surface roughness Sa of the upper surface of the element body 2' can be reduced.

[0081] As a result, as shown in FIG. 6C, a multilayer ceramic capacitor 1A is manufactured in which an underlayer 7, a Cu plating layer 9A, a Ni plating layer 9B and a Sn plating layer 9C are formed on element body 2 whose upper surface 2' has been polished.

[0082] 6B, it is the external electrodes 6A', 6B' that are polished, and the hard element body 2' containing ceramic is hardly polished at all, so the curved surface R of the element body 2 after polishing is maintained almost as it is. For example, when the external electrodes 6A', 6B' and the element body 2' are polished under the same conditions, the polishing rate of the element body 2' relative to the polishing rate of the external electrodes 6A', 6B' (amount removed per unit time) is 1 / 20 to 25. In this case, even if the element body 2' is polished under conditions that polish only the external electrodes 6A', 6B' by 15 um, only 0.50 to 0.75 um can be removed.

[0083] The polishing grains and the load WT are adjusted in consideration of the strength of the multilayer ceramic capacitor 1A'. Experimental verification has shown that the polishing grains should be fine grains of #2000 to #6000, and the load per multilayer ceramic capacitor 1A' should preferably be set at 1 to 5 g / piece. In addition to these conditions, the oscillation speed and processing time for polishing are adjusted based on the thickness (amount polished) and layer structure (hardness) of the external electrodes 6A', 6B' to be polished.

[0084] Second embodiment FIG. 7 is a cross-sectional view showing an example of the configuration of a mounting board on which the multilayer ceramic capacitor in accordance with the second embodiment is mounted. 7, land electrodes 42A, 42B, 44A, and 44B are formed on the back surface of the mounting substrate 41. The multilayer ceramic capacitor 1A is connected to the land electrodes 42A and 42B via solder layers 43A and 43B respectively attached to the plating layers 9 of the external electrodes 6A and 6B. At this time, the solder layers 43A and 43B wet and rise to the side surfaces of the external electrodes 6A and 6B while being separated from the upper surface of the element body 2. Solder balls 47A and 47B are formed on the land electrodes 44A and 44B on the back surface of the mounting substrate 41.

[0085] On the other hand, a semiconductor chip (not shown) is mounted on the front surface side of the mounting board 41. This semiconductor chip may be a microprocessor, a semiconductor memory, an FPGA (Field-Programmable Gate Array), or an ASIC (Application Specific Integrated Circuit).

[0086] Land electrodes 46A and 46B are formed on the back surface side of mounting substrate 45. Mounting substrates 41 and 45 are connected to each other via solder balls 47A and 47B. Mounting substrate 45 can be used as a motherboard on which mounting substrate 41 is mounted.

[0087] A constant distance is maintained between the mounting substrates 41 and 45 via the solder balls 47A and 47B. At this time, a resin 48 for sealing the multilayer ceramic capacitor 1A is provided between the mounting substrates 41 and 45. The resin 48 is, for example, an epoxy resin. After the mounting substrates 41 and 45 are connected to each other via the solder balls 47A and 47B, the resin 48 may be injected between the mounting substrates 41 and 45 and cured. At this time, the resin 48 covers the multilayer ceramic capacitor 1A, the solder layers 43A and 43B, and the solder balls 47A and 47B, and is in close contact with the upper surface of the element body 2.

[0088] Here, by mounting the multilayer ceramic capacitor 1A on the back side of the mounting substrate 41, the multilayer ceramic capacitor 1A can be disposed on the back side of the semiconductor chip mounted on the front side of the mounting substrate 41. This makes it possible to mount the multilayer ceramic capacitor 1A in close proximity to the semiconductor chip mounted on the front side of the mounting substrate 41, making it possible to effectively remove noise applied to the semiconductor chip.

[0089] Furthermore, by setting the height of the multilayer ceramic capacitor 1A to 150 μm or less, the multilayer ceramic capacitor 1A can be accommodated in the gap between the mounting boards 41, 45 connected to each other via the solder balls 47A, 47B, and the multilayer ceramic capacitor 1A can be arranged on the back side of the semiconductor chip that is placed on the front side of the mounting board 41.

[0090] Furthermore, the layered structure of the underlayer 7, Cu plating layer 9A, Ni plating layer 9B, and Sn plating layer 9C at the end faces of the upper surface side of the element body 2 makes it possible to reduce the height of the multilayer ceramic capacitor 1A while suppressing a decrease in the flexural strength, and to maintain the uniformity of the film thicknesses of the Cu plating layer 9A, Ni plating layer 9B, and Sn plating layer 9C. This makes it possible to mount the multilayer ceramic capacitor 1A on the mounting board 41 while preventing cracks in the multilayer ceramic capacitor 1A, and to suppress a decrease in conductivity between the underlayer 7 and the land electrodes 42A, 42B.

[0091] Third embodiment FIG. 8 is a cross-sectional view showing an example of the configuration of the multilayer ceramic capacitor in accordance with the third embodiment. In Fig. 8, the multilayer ceramic capacitor 1B has an element body 2B instead of the element body 2 of the multilayer ceramic capacitor 1A in Fig. 2A. In the multilayer ceramic capacitor 1B, the center of the upper surface of the element body 2B is raised relative to the end faces MU, MA, MB, and MC. In this case, the cross-sectional shape of the upper surface of the element body 2B in the longitudinal direction DL can be an arc shape or an arch shape. The amount of rise HS of the center of the upper surface of the element body 2B relative to the end faces MU, MA, MB, and MC is preferably 3 um or less.

[0092] In this case, by changing the fixed state of the multilayer ceramic capacitor 1A' (such as the adhesive state of the adhesive sheet 42 in FIG. 6A) when polishing the external electrodes 6A', 6B', the inclination of the element body 2' on the adhesive sheet 42 can be periodically changed based on the minute oscillation VB in FIG. 6B. During this polishing, the amount of polishing at the ends of the upper surface of the element body 2' can be made greater than the amount of polishing at the center, and the center of the element body 2B can be made into a gently rising arc shape. At this time, the positions of the external electrodes 6A, 6B are lower than the center of the element body 2B. In this case, the center of the element body 2B may be flat.

[0093] Here, by raising the center of the upper surface of the element body 2B, the flexural strength of the multilayer ceramic capacitor 1B can be improved. In addition, as a manufacturing process after the polishing process, the multilayer ceramic capacitor 1B may be inspected and taped by machine. In this case, even if the orientation of the multilayer ceramic capacitor 1B becomes random and the upper surface of the element body 2B faces downward, it is possible to prevent the end faces MU, MA, MB, and MC of the external electrodes 6A and 6B from being rubbed by each part (feeder surface, etc.) of the inspection device and the taping device. Therefore, even if the layer structure of the external electrodes 6A and 6B is exposed on the upper surface side of the element body 2B, it is possible to prevent the layer structure of the external electrodes 6A and 6B from being destroyed.

[0094] (Fourth embodiment) FIG. 9A is a cross-sectional view of the multilayer ceramic capacitor in accordance with the fourth embodiment taken in the length direction, and FIG. 9B is a cross-sectional view of the multilayer ceramic capacitor in accordance with the fourth embodiment taken in the width direction at the position of an external electrode.

[0095] 9A and 9B, the multilayer ceramic capacitor 1D includes an element body 2D and external electrodes 6AD, 6BD instead of the element body 2 and external electrodes 6A, 6B of the multilayer ceramic capacitor 1A in FIG. 2A. The surface roughness Sa of the upper surface of the element body 2D is equal to the surface roughness Sa of the lower surface of the element body 2D. The surface roughness Sa of the upper and lower surfaces of the element body 2D is preferably 0.20 μm or less. The rest of the configuration of the element body 2D can be configured in the same way as the element body 2.

[0096] The external electrodes 6AD, 6BD are formed on the element body 2D so as to face each other while being separated from each other in the length direction DL. Here, the external electrodes 6AD, 6BD are formed on the side surfaces and are not present on the top and bottom surfaces of the element body 2D. The external electrodes 6AD, 6BD may also be formed on the front and rear surfaces that are perpendicular to both the bottom and side surfaces of the element body 2D and face each other.

[0097] Here, by ensuring that the external electrodes 6AD, 6BD are not present on the upper and lower surfaces of the element body 2D, the height of the multilayer ceramic capacitor 1D can be further reduced without reducing the number of stacked internal electrode layers 3A, 3B, and LSC mounting can be achieved without reducing the capacitance of the multilayer ceramic capacitor 1D.

[0098] Each of the external electrodes 6AD, 6BD includes an underlayer 7D formed on the element body 2D and a plating layer 9D laminated on the underlayer 7D. The underlayers 7D are formed on the element body 2D so as to face each other while being separated from each other in the longitudinal direction DL. In this case, the underlayers 7D are formed on the side surfaces of the element body 2D, and are not formed on the upper and lower surfaces of the element body 2D. The underlayers 7D may also be formed on the front and rear surfaces of the element body 2D.

[0099] The plating layer 9D is continuously formed for each of the external electrodes 6AD, 6BD so as to cover the underlayer 7D, and is not formed on the upper and lower surfaces of the element body 2D. The plating layer 9D is electrically connected to the internal electrode layers 3A, 3B via the underlayer 7D. The plating layer 9D is also electrically connected to the terminals of the mounting board via solder. The plating layer 9D can have a three-layer structure, for example, a Cu plating layer 9AD laminated on the underlayer 7D, a Ni plating layer 9BD laminated on the Cu plating layer 9AD, and a Sn plating layer 9CD laminated on the Ni plating layer 9BD.

[0100] Here, on the upper and lower sides of the element body 2D, the end faces of the underlayer 7 and the end faces of the plating layer 9 form a layer structure outside the element body 2D. Also, on the upper and lower sides of the element body 2D, the end faces of the Cu plating layer 9A, the end faces of the Ni plating layer 9B, and the end faces of the Sn plating layer 9C form a layer structure outside the underlayer 7. In this case, the layered structure of the underlayer 7D, the Cu plating layer 9AD, the Ni plating layer 9BD, and the Sn plating layer 9CD laminated on the side of the element body 2D is cut horizontally on the upper and lower sides of the element body 2D. At this time, the underlayer 7D has end faces MU and KU that protrude outward from the element body 2D on the upper and lower sides of the element body 2D, respectively. The Cu plating layer 9AD has end faces MA and KA that protrude outward from the end faces MU and KU on the upper and lower sides of the element body 2D, respectively. The Ni plating layer 9BD has end faces MB and KB that protrude outward from the end faces MA and KA on the upper and lower surfaces of the element 2D, respectively. The Sn plating layer 9CD has end faces MC and KC that protrude outward from the end faces MB and KB on the upper and lower surfaces of the element 2D, respectively.

[0101] The end faces MU, MA, MB, and MC can be located in the same plane including the top surface of the element body 2D. In this case, the normal direction of each end face MU, MA, MB, and MC can be the same as the normal direction of the top surface of the element body 2D. In this case, each end face MU, MA, MB, and MC can be a flat surface.

[0102] The end faces KU, KA, KB, and KC can be located in the same plane including the bottom surface of the element body 2D. In this case, the normal direction of each end face KU, KA, KB, and KC can be the same as the normal direction of the bottom surface of the element body 2D. In this case, each end face KU, KA, KB, and KC can be a flat surface.

[0103] Further, base layer 7D wraps around along curved surface R on the upper surface side of element body 2D, with end face MU reaching the upper surface of element body 2D. Further, base layer 7D wraps around along curved surface R on the lower surface side of element body 2D, with end face KU reaching the lower surface of element body 2D. The wraparound amounts of base layer 7D on each of the upper and lower sides of element body 2D can be made equal to the radius of curvature C of curved surface R on the upper and lower sides of element body 2D.

[0104] Here, the ends of the base layer 7D are exposed from the plating layer 9AD, the Ni plating layer 9BD, and the Sn plating layer 9CD on the upper surface side of the element body 2D. At this time, the layered structure of the external electrodes 6AD, 6BD is exposed to the outside of the multilayer ceramic capacitor 1D. Meanwhile, the ends of the base layer 7D are covered with the Cu plating layer 9AD, the Ni plating layer 9BD, and the Sn plating layer 9CD on the lower surface side of the element body 2D.

[0105] Other than that, the configurations of underlayer 7D, Cu plating layer 9AD, Ni plating layer 9BD, and Sn plating layer 9CD can be similar to those of underlayer 7, Cu plating layer 9A, Ni plating layer 9B, and Sn plating layer 9C.

[0106] Here, by providing end faces MU, KU, MA, KA, MB, KB, MC, and KC on the undercoat layer 7D, Cu plating layer 9AD, Ni plating layer 9BD, and Sn plating layer 9CD on the upper and lower sides of the element body 2D, respectively, it is possible to manufacture a multilayer ceramic capacitor 1D that does not have external electrodes 6AD, 6BD on the upper and lower sides of the element body 2D without breaking the external electrodes 6AD, 6BD. This makes it possible to further reduce the height while suppressing a decrease in the flexural strength of the multilayer ceramic capacitor 1D, and to suppress non-uniformity in the cross-sectional shapes of the external electrodes 6AD, 6BD on the upper and lower sides of the element body 2D, thereby suppressing a decrease in the adhesion strength between the external electrodes 6AD, 6BD and the element body 2D.

[0107] Furthermore, by providing end faces MU, KU, MA, KA, MB, KB, MC, and KC on the underlayer 7D, Cu plating layer 9AD, Ni plating layer 9BD, and Sn plating layer 9CD, respectively, on the upper and lower sides of the element body 2D, it is possible to maintain uniformity in the thickness of the Cu plating layer 9AD, Ni plating layer 9BD, and Sn plating layer 9CD. This makes it possible to prevent a decrease in the strength of each of the external electrodes 6AD, 6BD, and also to prevent a decrease in the conductivity between the underlayer 7D and the terminals of the mounting board.

[0108] Furthermore, by eliminating the external electrodes 6AD, 6BD on the upper and lower surfaces of the element body 2D, the shape of the multilayer ceramic capacitor 1D can be made vertically symmetrical, eliminating the need to distinguish between the top and bottom of the multilayer ceramic capacitor 1D. This eliminates the need to align the multilayer ceramic capacitor 1D so that the top surface of the multilayer ceramic capacitor 1D faces upward when the multilayer ceramic capacitor 1D is picked up by the nozzle of the mounter, thereby preventing an increase in the number of steps when mounting the multilayer ceramic capacitor 1D.

[0109] Fifth embodiment FIG. 10 is a cross-sectional view showing an example of the configuration of a mounting board on which the multilayer ceramic capacitor in accordance with the fifth embodiment is mounted. 10, a multilayer ceramic capacitor 1D is mounted on a mounting board 41 instead of the multilayer ceramic capacitor 1A in FIG. 8. At this time, the bottom surface of an element body 2D of the multilayer ceramic capacitor 1D may be in contact with land electrodes 42A, 42B. The multilayer ceramic capacitor 1D is connected to the land electrodes 42A, 42B via solder layers 43AD, 43BD attached to the plating layers 9D of the external electrodes 6AD, 6BD, respectively. At this time, the connection between the multilayer ceramic capacitor 1D and the mounting board 41 is ensured via the external electrodes 6AD, 6BD on each side of the element body 2D.

[0110] Note that the solder layers 43AD, 43BD may be allowed to wet onto the external electrodes 6AD, 6BD on the front and rear surfaces of the element body 2D in order to improve the mounting strength of the multilayer ceramic capacitor 1D to the mounting board 41. The lengths of the external electrodes 6AD, 6BD on the front and rear surfaces of the element body 2D may be increased in order to increase the amount of wet-up of the solder layers 43AD, 43BD onto the external electrodes 6AD, 6BD on the front and rear surfaces of the element body 2D.

[0111] Sixth embodiment Fig. 11 is a perspective view showing an example of the configuration of a ceramic electronic component according to a sixth embodiment. In Fig. 11, a chip inductor is taken as an example of the ceramic electronic component. 11, chip inductor 61 includes an element body 62 and external electrodes 66A, 66B. The element body 62 includes a coil pattern 63, internal electrode layers 63A, 63B, and a magnetic material 64. The magnetic material 64 is also used as a dielectric that insulates the internal electrode layers 63A, 63B. The shape of the element body 62 may be a substantially rectangular parallelepiped shape.

[0112] The element body 62 is chamfered along the ridgeline of the element body 62. At this time, the element body 62 has a curved surface R with its corners chamfered. The surface roughness Sa of the upper surface of the element body 62 is smaller than the surface roughness Sa of the lower surface of the element body 62.

[0113] The coil pattern 63 and the internal electrode layers 63A, 63B are covered with a magnetic material 64. However, an end of the internal electrode layer 63A is drawn out from the magnetic material 64 on one side surface of the element body 62 and connected to an external electrode 66A. An end of the internal electrode layer 63B is drawn out from the magnetic material 64 on the other side surface of the element body 62 and connected to an external electrode 66B.

[0114] The material of the coil pattern 63 and the internal electrode layers 63A, 63B can be selected from metals such as Cu, Ni, Ti, Ag, Au, Pt, Pd, Ta, and W, or may be an alloy containing these metals. The magnetic material 64 is, for example, ferrite.

[0115] The external electrodes 66A, 66B are located on opposing side surfaces of the element body 62 and are separated from each other in the longitudinal direction DL of the element body 62. Here, each external electrode 66A, 66B is formed continuously from the lower surface side of the element body 62 to the side surface that connects perpendicularly to the lower surface via the curved surface R, and is not present on the upper surface side of the element body 62. Furthermore, each external electrode 66A, 66B may also be formed on the front and rear surfaces of the element body 62 that are opposing each other and perpendicular to both the lower surface and the side surfaces.

[0116] The external electrodes 66A, 66B include an underlayer 67 formed on the element body 62, and a plating layer 69 formed on the underlayer 67. The underlayer 67 may include a common material in which metals are mixed. The common material is, for example, a ferrite component that is the main component of the magnetic material 64. The plating layer 69 may have a three-layer structure, for example, a Cu plating layer 69A formed on the underlayer 67, a Ni plating layer 69B formed on the Cu plating layer 69A, and a Sn plating layer 69C formed on the Ni plating layer 69B.

[0117] The underlayer 67 is formed continuously from the lower surface side of the element body 62 through the curved surface R to the side surface, and is not formed on the upper surface side of the element body 62. The underlayer 67 may also be formed continuously from the lower surface side to the front surface side and rear surface side of the element body 62. The plating layer 69 is formed continuously for each external electrode 66A, 66B so as to cover the underlayer 67, and is not formed on the upper surface side of the element body 62.

[0118] Here, on the upper surface side of the element body 62, the end face of the underlayer 67 and the end face of the plating layer 69 form a layer structure on the outside of the element body 6. Also, on the upper surface side of the element body 62, the end face of the Cu plating layer 69A, the end face of the Ni plating layer 69B, and the end face of the Sn plating layer 69C form a layer structure on the outside of the underlayer 67. In this case, the layered structure of the underlayer 67, the Cu plating layer 69A, the Ni plating layer 69B, and the Sn plating layer 69C laminated on the side surface of the element body 62 is cut in the horizontal direction on the upper surface side of the element body 62. At this time, the underlayer 67 has an end face PU that protrudes outward from the element body 62 on the upper surface side of the element body 62. The Cu plating layer 69A has an end face PA that protrudes outward from the end face PU on the upper surface side of the element body 62. The Ni plating layer 69B has an end face PB that protrudes outward from the end face PA on the upper surface side of the element body 62. The Sn plating layer 69C has an end face PC that protrudes outward from the end face PB on the upper surface side of the element body 62.

[0119] The end faces PU, PA, PB, and PC can be located in the same plane including the upper surface of the element body 62. In this case, the normal direction of each end face PU, PA, PB, and PC can be the same as the normal direction of the upper surface of the element body 62. In this case, each end face PU, PA, PB, and PC can be a flat surface. Furthermore, the base layer 67 wraps around the curved surface R on the upper surface side of the element body 62, so that the end face PU reaches the upper surface of the element body 62.

[0120] Here, the end of the base layer 67 is exposed from the plating layer 69A, the Ni plating layer 69B, and the Sn plating layer 69C on the upper surface side of the element body 62. At this time, the layer structure of the external electrodes 66A, 66B is exposed to the outside of the chip inductor 61. Meanwhile, the end of the base layer 67 is covered on the lower surface side of the element body 62 with the Cu plating layer 69A, the Ni plating layer 69B, and the Sn plating layer 69C.

[0121] For example, the external size of the chip inductor 61 may be length>width>height, or length>width=height. In this case, in order to reduce the height of the chip inductor 61, the height of the chip inductor 61 is preferably 150 μm or less. [Explanation of symbols]

[0122] 1. Multilayer ceramic capacitors 2 Base 2A laminate 3A, 3B Internal electrode layer 4 Dielectric Layer 5A, 5B Cover Layer 6A, 6B external electrode 7 Base layer 9 Plating layer

Claims

1. A ceramic electronic component that is mounted on a substrate via a solder layer, the ceramic electronic component after mounting comprising: an element body having a dielectric, an internal electrode, a first surface, a second surface opposite to the first surface, two opposing third surfaces perpendicular to the first surface and the second surface, and two opposing fourth surfaces perpendicular to the first surface, the second surface, and the third surface; an external electrode including a base layer connected to the internal electrode and containing a metal, the base layer having a first end face outside the element body on the second surface side, and a plating layer laminated on the base layer and having a second end face forming a layer structure with the first end face outside the element body on the second surface side; the external electrodes are formed on a plurality of surfaces of the element body excluding the second surface side, the underlayer is exposed from the plating layer on the second surface side and is covered by the plating layer on the first surface side; a ridge portion connecting the second surface and the third surface has a curved surface, and a ridge portion connecting the second surface and the fourth surface also has a curved surface.

2. The base layer is formed on the third surface, the plating layer is laminated on the base layer on the third surface side, 2. The ceramic electronic component according to claim 1, wherein the laminated structure of the plating layer and the underlayer is cut on the second surface side.

3. a first end surface of the underlayer is located outside the second surface of the element body, 3. The ceramic electronic component according to claim 1, wherein the second end surface of the plating layer is located outside the first end surface of the base layer.

4. 4. The ceramic electronic component according to claim 1, wherein the first end face and the second end face are flat surfaces.

5. 5. The ceramic electronic component according to claim 1, wherein a normal direction to the second face, a normal direction to the first end face, and a normal direction to the second end face are all the same.

6. A ceramic electronic component described in any one of claims 1 to 5, characterized in that the first end face of the base layer reaches the second face by wrapping around the curved surface of the ridge portion connecting the second face and the third face.

7. 7. The ceramic electronic component according to claim 6, wherein the plating layer extends along the undercoat layer so that the second end face reaches the second surface.

8. 8. The ceramic electronic component according to claim 6, wherein the radius of curvature of the curved surface is 5 μm or more and 20 μm or less.

9. 9. The ceramic electronic component according to claim 1, wherein a central portion of the second face is raised higher than the first end face and the second end face.

10. 10. The ceramic electronic component according to claim 9, wherein a protrusion amount of a central portion of the second surface relative to the first end surface and the second end surface is 3 μm or less.

11. 11. The ceramic electronic component according to claim 1, wherein a surface roughness Sa of the element body on the second surface is smaller than a surface roughness Sa of the element body on the first surface.

12. 12. The ceramic electronic component according to claim 11, wherein the surface roughness Sa of the second surface of the element is 0.20 μm or less.

13. The plating layer has a laminated structure of a plurality of plating layers having different metal components, 13. The ceramic electronic component according to claim 1, wherein on the second surface side, end faces of the plurality of plating layers form a layered structure outside the element body.

14. The element body is a dielectric layer comprising the dielectric; a laminate in which first internal electrode layers and second internal electrode layers provided as the internal electrodes are alternately laminated with the dielectric layers interposed therebetween, the external electrodes include a first external electrode and a second external electrode provided separately on the two third surfaces, the first internal electrode layer is connected to the first external electrode; 14. The ceramic electronic component according to claim 1, wherein the second internal electrode layer is connected to the second external electrode.

15. A mounting substrate on which the ceramic electronic component according to any one of claims 1 to 14 is mounted via a solder layer, The solder layer wets and rises onto the side surfaces of the external electrodes while being spaced from the second surface of the element body.

16. a resin for sealing the ceramic electronic component on the mounting substrate; solder balls formed on the mounting substrate; 16. The mounting board according to claim 15, wherein the ceramic electronic component is mounted on a surface on which the solder balls are formed.

17. A method for producing the ceramic electronic component according to claim 1, comprising the steps of: forming an element body provided with the dielectric and the internal electrodes; forming a curved surface on a ridge line portion connecting the second surface and the third surface of the element body; forming a curved surface on a ridge line portion connecting the second surface and the fourth surface of the element body; applying a base material for the external electrodes to the first surface, the second surface, and the third surface of the element body; firing the base material to form a base layer for the external electrodes; laminating a plating layer on the underlayer; and removing the underlayer and plating layer on the second surface.

18. The manufacturing method according to claim 17 , further comprising the step of physically polishing the second surface to remove the undercoat layer and the plating layer on the second surface.

19. A ceramic electronic component described in any one of claims 1 to 14, characterized in that the base body further has a first surface side cover layer and a second surface side cover layer sandwiching the dielectric and the internal electrode, and the thickness of the first surface side cover layer is approximately the same as the thickness of the second surface side cover layer.

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