Substrate Processing Equipment

Abstract

To provide a substrate processing apparatus for preventing a tension of a connection structure, such as a belt connecting a plurality of rotary modules, from changing due to a change in temperature inside a chamber, and compensating for the changed tension.SOLUTION: A substrate processing apparatus comprises: a process chamber 100 having a processing space A formed therein to process a plurality of substrates S; a gas injector 200 formed on an upper side of the process chamber to inject a processing gas into the processing space; a plurality of substrate supports 300 formed inside the process chamber to face the gas injector, the plurality of substrates being seated on the plurality of substrate supports; a substrate conveyor 400 to convey the plurality of seated substrates to different substrate supports among the substrate supports; and a substrate rotating part 500 to rotate the plurality of seated substrates. The substrate rotating part comprises a tension adjuster 600 formed to adjust a tension.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to a substrate processing apparatus, and more particularly to a substrate processing apparatus for performing substrate processing on a plurality of substrates in a process chamber. [Background technology]

[0002] In a conventional substrate processing apparatus, substrate processing may be performed on a plurality of substrates in one process chamber for various purposes such as productivity and process uniformity.

[0003] To this end, conventional substrate processing apparatuses may include a process chamber that forms a plurality of processing spaces and performs substrate processing, a plurality of gas injection units installed above the process chamber and that inject process gas into the processing space, and a plurality of substrate support units installed within the process chamber corresponding to the plurality of gas injection units and that support the substrate.

[0004] At this time, the plurality of substrates are placed in the respective processing spaces via a substrate transfer unit, and the substrate processing is performed. When the substrate processing is completed, the processed substrates are discharged outside the process chamber.

[0005] Meanwhile, a structure for a module that rotates a substrate around a vertical axis of rotation has been developed to ensure uniform distribution of the thickness of a thin film on the substrate during substrate processing. At this time, a configuration in which multiple rotation modules are connected to rotate multiple substrates simultaneously has been developed.

[0006] However, a problem occurs in that the tension of a connecting device such as a belt connecting a plurality of rotation modules changes due to a change in temperature inside the chamber, and the position of the rotation modules fluctuates. Summary of the Invention [Problem to be solved by the invention]

[0007] The present invention has been made to solve the above-mentioned problems, and aims to provide a substrate processing apparatus capable of preventing a connection structure such as a belt connecting a plurality of rotation modules from being deformed due to a temperature change inside a chamber and compensating for the deformed tension. However, this problem is merely an example, and the scope of the present invention is not limited thereto. [Means for solving the problem]

[0008] According to one aspect of the present invention for solving the above technical problem, a substrate processing apparatus includes: a process chamber having a processing space formed therein for processing a plurality of substrates; a gas injection unit formed on an upper side of the process chamber and for injecting a processing gas into the processing space; a plurality of substrate support units formed inside the process chamber to face the gas injection unit and on which the plurality of substrates are placed; a substrate transfer unit installed in the process chamber and for transferring the plurality of substrates placed on the respective substrate support units to different substrate support units among the substrate support units; and the plurality of substrates can be placed between adjacent substrate support units among the plurality of substrate support units. and a substrate rotating unit configured to rotate the plurality of substrates placed thereon, the substrate rotating unit including: a drive shaft unit formed in a lower portion of the process chamber and driven to rotate about a central axis; a rotating plate connected to the drive shaft unit and rotated by the rotation of the drive shaft unit, the rotating plate being configured of a plurality of rotary placement units on which the plurality of substrates are placed; a power transmission unit connecting the drive shaft unit and the rotating plate such that a rotational force of the drive shaft unit can be transmitted to the rotating plate; and a tension adjustment unit formed in at least a portion of the power transmission unit and configured to adjust a tension of the power transmission unit connecting the drive shaft unit and the rotating plate.

[0009] According to some embodiments of the present invention, the tension adjustment unit may include: a rotating shaft unit formed of a cylinder; a rotating unit connected to the rotating shaft unit and extending in both directions so that one end and the other end rotate around the rotating shaft unit; an elastic unit that presses one end of the rotating unit; and a first pulley formed so that at least a portion of the first pulley is surrounded by the power transmission unit and connected to the other end of the rotating unit so as to be rotatable.

[0010] According to some embodiments of the present invention, the rotating part may include: a central part formed by being circularly penetrated so that the rotating shaft part can be inserted; a first extension part formed by extending in one direction from the central part and pressed by the elastic part; and a second extension part formed by extending in the other direction from the central part and having an end to which the first pulley is connected.

[0011] According to some embodiments of the present invention, the second extension portion may be formed to be inclined at a predetermined angle with respect to an arbitrary extension line of the first extension portion.

[0012] According to some embodiments of the present invention, the rotating portion includes a through hole portion formed by penetrating at least a portion of one end of the rotating portion so that the fixed portion of the elastic portion can be inserted, and the through hole portion may be formed by penetrating long in the longitudinal direction of the rotating portion so that the rotating portion surrounding the fixed portion can rotate when the rotating portion rotates around the rotating shaft portion.

[0013] According to some embodiments of the present invention, the elastic portion may include: a fixed portion formed to be inserted into at least a portion of the pivoting portion; an elastic adjustment portion formed with a wider cross-section than the fixed portion in a portion of the fixed portion and coupled to the fixed portion; and an elastic body coupled between the pivoting portion and the elastic adjustment portion and formed to push the pivoting portion out of the elastic adjustment portion.

[0014] According to some embodiments of the present invention, the elastic adjustment part may be screwed to the fixing part so that the elastic adjustment part may be fixed at any position on the fixing part.

[0015] According to some embodiments of the present invention, the elastic portion may include a separation prevention portion coupled to an end of the fixing portion to prevent the elastic adjustment portion from separating from the fixing portion.

[0016] According to some embodiments of the present invention, the elastic body may be formed of any one of a coil spring, an elastic block, a pair of magnetic bodies, and a combination thereof.

[0017] According to some embodiments of the present invention, the power transmission part is a belt formed in a closed shape, and a plurality of second pulleys formed at the lower part of a plurality of the rotating plates are coupled to the inside of the power transmission part, the drive shaft part is coupled to the outside of the power transmission part, and the tension adjustment part is coupled to the inside of the power transmission part and can push the power transmission part outward to form tension in the power transmission part. Effect of the Invention

[0018] According to some embodiments of the present invention as described above, the tension of a connecting structure such as a belt connecting multiple rotation modules can be prevented from being deformed due to temperature changes inside the chamber, and the tension of the connecting structure can be automatically adjusted even if a thermal expansion phenomenon occurs in the connecting structure or the position of the heater changes.

[0019] In addition, it is possible to provide a substrate processing apparatus that does not cause a phenomenon in which the cylinder portion for maintaining tension is sandwiched and fixed between structures, making it impossible to control the tension. Of course, the scope of the present invention is not limited to such effects. [Brief description of the drawings]

[0020] [Figure 1] 1 is a schematic cross-sectional view showing a substrate processing apparatus according to an embodiment of the present invention; [Diagram 2] 2 is a top view showing a substrate support and a substrate rotation unit inside the process chamber of FIG. 1. [Diagram 3]1 is a top view showing a substrate rotating section of a substrate processing apparatus according to an embodiment of the present invention; [Figure 4] FIG. 2 is an exploded perspective view showing a tension adjustment section according to one embodiment of the present invention. [Diagram 5] FIG. 5 is a side view showing the tension adjuster of FIG. 4. [Figure 6] FIG. 5 is a top view showing the tension adjustment part of FIG. 4. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0021] Various preferred embodiments of the present invention will now be described in detail with reference to the accompanying drawings.

[0022] The embodiments of the present invention are provided to more completely explain the present invention to those having ordinary skill in the art, and the following embodiments may be modified into various other forms, and the scope of the present invention is not limited to the following embodiments. Rather, these embodiments are provided to make the present disclosure more complete and complete, and to fully convey the idea of ​​the present invention to those skilled in the art. In addition, the thickness and size of each layer in the drawings are exaggerated for convenience and clarity of explanation.

[0023] Hereinafter, the embodiments of the present invention will be described with reference to the drawings which show an ideal embodiment of the present invention. In the drawings, for example, due to manufacturing techniques and / or tolerances, deformation of the illustrated shapes can be expected. Therefore, the embodiments of the concept of the present invention should not be interpreted as being limited to the specific shapes of the regions illustrated in this specification, but should include, for example, variations in shapes caused by manufacturing.

[0024] FIG. 1 is a schematic cross-sectional view showing a substrate processing apparatus according to one embodiment of the present invention, FIG. 2 is a top view showing a substrate support unit 300 and a substrate rotation unit 500 inside the process chamber 100 of FIG. 1, and FIG. 3 is a top view showing the substrate rotation unit 500.

[0025] First, the substrate processing apparatus according to an embodiment of the present invention may include a process chamber 100 , a gas injecting unit 200 , a substrate supporting unit 300 , a substrate transferring unit 400 , and a substrate rotating unit 500 .

[0026] As shown in FIG. 1, a process chamber 100 may have a processing space A for processing a plurality of substrates S formed therein.

[0027] Specifically, the process chamber 100 may include a chamber body 110 having an opening formed on the upper side, and a top lid 120 that is detachably coupled to the opening of the chamber body 110 and forms a processing space A together with the chamber body 110.

[0028] In addition, the process chamber 100 may have a plurality of different processing spaces A for processing a plurality of substrates. In this case, the processing spaces A may not be completely sealed spaces within the process chamber 100 but may be spaces that are spatially separated from each other.

[0029] For example, as shown in FIG. 2, the process chamber 100 may have four processing spaces A formed above the substrate support parts 300 arranged in a circumferential direction on a plane.

[0030] At this time, the chamber body 110 may have substrate support part mounting grooves formed on a bottom surface thereof in which the substrate support parts 300 are to be formed. For example, if four substrate support parts 300 are provided in the process chamber 100, four substrate support part mounting grooves may be formed respectively.

[0031] Since the internal space of the process chamber 100 is generally formed in a vacuum atmosphere, an exhaust groove (not shown) and an exhaust port (not shown) may be formed on the bottom surface of the chamber body 110 for discharging process gases such as source gas, plasma gas, cleaning gas, etc. present in the processing space A.

[0032] The exhaust port may be connected to an exhaust line connected to an external pump.

[0033] The process chamber 100 may be formed with one or more gates (not shown) for loading and unloading a plurality of substrates S.

[0034] As shown in FIG. 1, the gas injection units 200 are formed on the upper side of the process chamber 100 corresponding to the processing spaces A, respectively, and are capable of injecting processing gas into the processing spaces A.

[0035] The gas injection unit 200 may be installed corresponding to the number of the processing spaces A, that is, corresponding to the substrate support unit 300. For example, the gas injection unit 200 may be installed on the top lid 120 and may include a gas inlet unit (not shown) formed on one side, one or more diffusion plates (not shown) for diffusing the process gas introduced through the gas inlet unit, and a plurality of injection holes (not shown) for injecting the diffused process gas toward the processing space A.

[0036] As shown in FIG. 1, the substrate support unit 300 is formed in the process chamber 100 to face the gas ejection unit 200, and may be formed in a plurality of units so that a plurality of substrates S can be placed thereon.

[0037] The substrate support parts 300 may be installed corresponding to each gas ejection part 200 and may be installed to face the gas ejection parts 200 vertically.

[0038] The substrate support part 300 may be provided with a plurality of substrate mounting parts on which a plurality of substrates S are mounted, and the plurality of substrate mounting parts may be installed at equal intervals in a circumferential direction around a center of the process chamber 100. For example, the substrate support part 300 may be provided with four substrate mounting parts on which a plurality of substrates S are mounted, arranged in a circumferential direction on a plane.

[0039] The substrate support part 300 has a shaft part 310 formed thereon for supporting and raising and lowering the substrate support part 300, and the shaft part 310 is connected to a driving part outside the process chamber 100 at the bottom surface of the chamber body 110 so that it can be raised and lowered.

[0040] Specifically, the shaft portion 310 is a shaft that is coupled to the substrate support portion 300 and supports the substrate support portion 300, and may be coupled to the bottom surface of the substrate support portion 300 by passing through an opening penetrating the lower wall of the process chamber 100, and may be coupled to be movable up and down by a separate lifting and lowering drive portion outside the process chamber 100.

[0041] The substrate support portion 300 may include a vacuum chuck or an electrostatic chuck for attracting and fixing the plurality of substrates S placed on the plurality of substrate placement portions.

[0042] The substrate support portion 300 may include a built-in heater portion (not shown) for heating the substrates S supported on the substrate placement portions.

[0043] The substrate support part 300 may include a lift part 320 at a lower part of the substrate support part 300 to lift the substrates S from the substrate placement part and separate them vertically.

[0044] The lift unit 320 may support the substrates S in a state in which the substrates S are vertically spaced apart from the substrate placement units when the substrates S are loaded, unloaded, or transferred within the process chamber 100.

[0045] The lift part 320 may include a plurality of lift pins that penetrate the substrate support part 300 vertically to support the bottom surfaces of the plurality of substrates S, and a lift pin main body part to which the plurality of lift pins are coupled and which is located at the bottom of the substrate support part 300.

[0046] As shown in FIG. 1, the substrate transfer unit 400 is installed in the process chamber 100 and can transfer multiple substrates S respectively placed on the substrate support units 300 to different substrate support units among the substrate support units 300.

[0047] Specifically, the substrate transfer unit 400 can transfer each of the plurality of substrates S from one of the substrate support units 300 to another of the substrate support units 300 .

[0048] In addition, the substrate transfer unit 400 can transfer a plurality of substrates S from one substrate support unit 300 to a substrate rotation unit 500 (described later) or transfer a plurality of substrates S from the substrate rotation unit 500 to another substrate support unit 300.

[0049] For example, the substrate transport portion 400 can include at least one or more fins capable of supporting a substrate.

[0050] The blades may be formed in a number corresponding to the number of substrates S, and may be formed to extend radially from the substrate transfer shaft 410 that rotates at the center of the process chamber 100 .

[0051] For example, when four substrate support parts 300 are formed to process four substrates, the four blade parts may be formed by extending equiangularly from the substrate transfer shaft part 410 .

[0052] As shown in FIG. 1, the substrate rotation part 500 is formed so that a plurality of substrates S can be placed between adjacent substrate support parts 300 among a plurality of substrate support parts 300, and can rotate the plurality of substrates S placed thereon.

[0053] The substrate rotating unit 500 can rotate the plurality of substrates S based on the vertical direction. Specifically, the substrate rotating unit 500 may include a rotating plate 520 on which the plurality of substrates S are placed and which rotates around a driving shaft unit 510, a power transmitting unit 530 which transmits rotational power to the rotating plate 520, and a tension adjusting unit 600.

[0054] The substrate rotating unit 500 has a space for installing a rotation driver formed on the lower surface of the process chamber 100, and a driving shaft unit 510, a rotating plate 520, and a power transmission unit 530 may be installed in the space for the rotation driver.

[0055] As shown in FIGS. 2 and 3, the driving shaft 510 is formed at the bottom of the process chamber 100 and can be rotated around a central axis.

[0056] The drive shaft 510 may be formed on the same axis as the substrate transfer shaft 410, which is the central axis of the substrate transfer part 400, and the drive shaft 510 may be formed integrally with or separately from the substrate transfer shaft 410. For example, the drive shaft 510 may be formed in a partial region of the substrate transfer shaft 410.

[0057] The drive shaft 510 is operable to rotate independently of the rotation of the substrate transport shaft 410 .

[0058] The drive shaft 510 can be rotated by a power section formed at the bottom.

[0059] The drive shaft portion 510 may be installed with the power transmission portion 530 wound at least partially around it, and rotation of the drive shaft portion 510 may rotate the power transmission portion 530 in either direction, thereby rotating at least one rotating plate 520 connected to the power transmission portion 530 in the same direction or the opposite direction.

[0060] As shown in FIGS. 2 and 3, the rotating plate 520 is connected to the driving shaft 510 and rotates with the rotation of the driving shaft 510, and may be formed with a plurality of rotating placement portions on which a plurality of substrates S may be placed.

[0061] The rotating plate 520 has a plurality of substrates S placed thereon and can rotate the placed substrates around a first rotation axis C1 that is a vertical rotation axis. Specifically, the rotating plate 520 rotates around the first rotation axis C1 that is vertical to the center, thereby rotating the substrates placed on the upper surface around the first rotation axis C1.

[0062] The rotating plate 520 is coupled to the upper part of a second pulley 540 that is rotatable about a first rotation axis C1, and can rotate by the rotation of the second pulley 540.

[0063] The rotating plate 520 may be configured with an electrostatic chuck or a vacuum chuck that adsorbs the multiple substrates S so that the multiple substrates S placed on the rotating plate 520 can rotate smoothly without slipping on the top of the rotating plate 520, or may support the substrates placed thereon using a material that increases friction with the multiple substrates S.

[0064] The rotating plate 520 may be installed at least one between the multiple substrate supports 300, for example, four of them may be arranged between each of the substrate supports 300 so as to simultaneously rotate four substrates supported by the four substrate supports 300.

[0065] As a result, the rotating plates 520 are disposed between the four substrate support parts 300, and the power transmission part 530 described below is disposed to be connected to the multiple rotating plates 520 from the center on the plane of the process chamber 100, thereby providing rotational power to each rotating plate 520.

[0066] The substrate rotating unit 500 of the substrate processing apparatus according to some embodiments of the present invention may include a power transmission guide 550 .

[0067] As shown in FIG. 3, the power transmission guide 550 is a pulley structure for guiding the direction and position of rotation of the power transmission part in order to transmit the rotational power from the drive shaft part 510 to the rotation plate 520.

[0068] Specifically, a plurality of power transmission guides 550 are provided, and the power transmission part 530 is wound around the power transmission guides 550 together with the driving shaft part 510 and the second pulley 540, so that the installation direction of the power transmission part 530 can be changed.

[0069] As shown in FIGS. 2 and 3 , the power transmission unit 530 may connect the drive shaft unit 510 and the rotating plate 520 so that the rotational force of the drive shaft unit 510 may be transmitted to the rotating plate 520 .

[0070] Specifically, the power transmission unit 530 is wound around the drive shaft unit 510 and the second pulley 540, and can transmit the rotational power of the drive shaft unit 510 to the second pulley 540. For example, as shown in Fig. 3, the power transmission unit 530 can be installed by being wound around at least a part of the outer circumferential surface of the second pulley 540, which is provided in plurality around the drive shaft unit 510, and thus the power transmission unit 530 can rotate the plurality of second pulleys 540 by rotating one of the power transmission units 530.

[0071] The power transmission unit 530 may be formed of a belt or chain formed in a closed structure. In this case, the second pulley 540 formed at the lower part of the plurality of rotating plates 520 may be coupled to the inside of the closed structure of the power transmission unit 530, and the power transmission guide 550 may be coupled to the outside of the closed structure between the respective rotating plates 520.

[0072] Also, the drive shaft portion 510 may be coupled to the outside of the closed structure of the power transmission portion 530 and the tension adjustment portion 600 may be coupled to the inside of the power transmission portion 530 .

[0073] For example, as shown in FIG. 3, the drive shaft 510 may be connected to the outside of the closed structure of the power transmission part 530, and may be connected to the second pulley 540 at the bottom of the radially formed rotating plate 520 by surrounding it on the inside of the closed structure of the power transmission part 530, and at this time, the position may be set by the power transmission guide 550 so that it may be installed without interfering with the substrate support part 300.

[0074] As shown in FIGS. 2 and 3, the tension adjustment unit 600 may be formed in at least a portion of the power transmission unit 530 and configured to adjust the tension of the power transmission unit 530 connecting the drive shaft unit 510 and the rotating plate 520.

[0075] Specifically, the tension adjusting unit 600 is installed to contact a portion of the power transmitting unit 530 and pushes the power transmitting unit 530 in one direction to control the tension formed in the power transmitting unit 530. For example, the tension adjusting unit 600 is coupled to the inside of the closed structure of the power transmitting unit 530 and pushes the power transmitting unit 530 outward to form the tension of the power transmitting unit 530.

[0076] FIG. 4 is an exploded perspective view of a tension adjustment unit 600 according to one embodiment of the present invention, FIG. 5 is a side view of the tension adjustment unit 600 of FIG. 4, and FIG. 6 is a top view of the tension adjustment unit 600 of FIG. 4.

[0077] The tension adjusting unit 600 may include a body unit 610 , a pivot unit 620 , a pivot unit 630 , an elastic unit 640 , and a first pulley 650 .

[0078] As shown in FIGS. 4 to 6, the body part 610 is a structure that is fixed to the bottom surface of the process chamber 100 .

[0079] A pivot shaft portion 620 may be coupled to the body portion 610 in a vertical direction, and an elastic portion 640 may be coupled to the body portion 610 in a horizontal direction.

[0080] The rotating shaft part 620 has a cylindrical structure, and a second bearing 670 may be coupled to the outer side of the rotating shaft part 620, and the rotating part 630 may be coupled to the outer side of the second bearing 670.

[0081] The rotating part 630 is coupled to the rotating shaft part 620 and may be formed so that one end and the other end extend in both directions so as to rotate around the rotating shaft part 620 .

[0082] The rotating part 630 is coupled to the rotating shaft part 620 in the vertical direction and can rotate in a clockwise or counterclockwise direction around the rotating shaft part 620. Thus, one side and the other side of the rotating part 630 can rotate in the same direction. At this time, the vertical direction is a direction parallel to the axial direction of the rotating shaft part 620.

[0083] Specifically, the rotating part 630 may include a center part 631 , a first extension part 632 extending to one side, a second extension part 633 extending to the other side, and a through hole part 634 .

[0084] The central portion 631 is a central portion in which a circular through-hole portion 634 is formed so that the rotating shaft portion 620 can be inserted.

[0085] The center portion 631 is coupled to the rotating shaft portion 620 with a second bearing 670 sandwiched therebetween, so that the rotating portion 630 can rotate about the rotating shaft portion 620 .

[0086] The first extension portion 632 is formed to extend in one direction from the center portion 631 and can be compressed by the elastic portion 640 .

[0087] For example, the first extension portion 632 is formed with a through hole portion 634 into which at least a portion of the elastic portion 640 is inserted, and for example, the through hole portion 634 may be formed by penetrating at least a portion of one end of the rotating portion 630 so that the fixed portion 641 of the elastic portion 640 can be inserted.

[0088] In this case, the through hole portion 634 may be formed to extend long in the longitudinal direction of the rotating portion 630, as shown in FIG. 5, so that the rotating portion 630 surrounding the fixed portion 641 can rotate when the rotating portion 630 rotates around the rotating shaft portion 620.

[0089] That is, the through-hole portion 634 of the rotating portion 630 may be formed to be spaced apart in the circumferential direction from the rotating shaft portion 620 which is the rotation axis of the rotating portion 630. In this case, when the rotating portion 630 rotates around the rotating shaft portion 620 as the central axis, the through-hole portion 634 may be formed to be larger than the fixed portion 641, and the fixed portion 641 may be able to move relatively within the through-hole portion 634.

[0090] In addition, the rotation angle of the rotating part 630 can be controlled by adjusting the size of the through hole part 634. Specifically, the longer the length of the hole of the through hole part 634, the larger the rotation angle of the rotating part 630 can be, and the shorter the length of the hole of the through hole part 634, the smaller the rotation angle of the rotating part 630 can be. Preferably, the size of the fixing part 641 and the size of the through hole part 634 can be set and installed so that the rotation angle θ1 of the rotating part 630 rotates 10° in both directions.

[0091] The second extension part 633 may be formed to extend from the center part 631 in the other direction, and may have an end part to which the first pulley 650 is coupled. For example, the second extension part 633 may have a first bearing 660 coupled thereto with a vertical axis, and the first pulley 650 coupled to the first bearing 660 such that the first pulley 650 can rotate from the second extension part 633.

[0092] In this case, the second extension portion 633 may be formed to be inclined at a predetermined angle based on any extension line of the first extension portion 632. For example, as shown in Fig. 6, the first extension portion 632 and the second extension portion 633 are formed to have a second angle θ2, and preferably, the second angle θ2 may be less than 180°.

[0093] Also, when the first extension portion 632 and the second extension portion 633 extend in the same direction, the second angle θ2 may be less than 90°.

[0094] The second extension 633 is formed to be inclined at a predetermined angle to the first extension 632, so that the tension applied to and maintained by the power transmission part 530 can be adjusted.

[0095] As shown in FIGS. 4 to 6, the elastic portion 640 may be formed to press one end of the rotating portion 630 .

[0096] The elastic part 640 may include a fixing part 641 , an elastic body 642 , an elasticity adjusting part 643 and a separation prevention part 644 .

[0097] The fixing portion 641 may be coupled to and fixed to a portion of the body portion 610 , and may be inserted into a through-hole portion 634 formed in the first extension portion 632 of the rotating portion 630 .

[0098] The elastic adjustment portion 643 may be formed in a portion of the fixed portion 641 with a cross section wider than that of the fixed portion 641 and may be coupled to the fixed portion 641 .

[0099] The elastic adjustment part 643 may be formed to be movable and fixed to the fixed part 641 so that the distance between the elastic adjustment part 643 and the rotating part 630 can be adjusted. For example, the elastic adjustment part 643 may be screwed to the fixed part 641 so that the elastic adjustment part 643 can be fixed to any position of the fixed part 641.

[0100] The elastic body 642 may be coupled between the pivot portion 630 and the elastic adjustment portion 643 and may be formed to push the pivot portion 630 out from the elastic adjustment portion 643 .

[0101] Specifically, the elastic body 642 may pressurize the rotating part 630 in a direction to push out the first extension part 632 of the rotating part 630 from the elastic adjustment part 643. As a result, the first extension part 632 may rotate in a clockwise direction (or counterclockwise direction) around the rotation shaft part 620, and the second extension part 633 may rotate along the first extension part 632 in the same direction.

[0102] As a result, the first pulley 650 coupled to the second extension portion 633 can generate additional tension on the other side of the power transmission portion 530 .

[0103] The elastic body 642 may be formed of any one of a coil spring, an elastic block, a pair of magnetic bodies, and a combination thereof, which applies a force to push the first extension part 632 out of the elastic adjustment part 643.

[0104] The separation prevention part 644 may be formed in a flange shape at the end of the fixing part 641 so as to prevent the elastic adjustment part 643 from separating from the fixing part 641 .

[0105] As shown in FIGS. 4 to 6, the first pulley 650 may be formed so that at least a portion thereof is surrounded by the power transmission part 530 and is rotatably coupled to the other end of the rotating part 630.

[0106] Specifically, the first pulley 650 may be coupled to the outside of the first bearing 660 coupled to the second extension portion 633, and the power transmission portion 530 may be installed to surround at least a portion of the first pulley 650, and the power transmission portion 530 may be driven by rotation of the first pulley 650.

[0107] The substrate processing apparatus according to the present invention can prevent the power transmission unit 530, which connects a plurality of rotating plates 520 so as to drive them simultaneously, from being deformed due to temperature changes inside the process chamber 100, thereby preventing the tension from being deformed. Also, even if the position of the heater changes, the tension of the connection structure can be automatically adjusted.

[0108] The present invention has been described with reference to the embodiments shown in the drawings, but these are merely illustrative, and those skilled in the art will appreciate that various modifications and equivalent embodiments are possible. Therefore, the true technical scope of protection of the present invention should be determined by the technical ideas of the appended claims. [Explanation of symbols]

[0109] A Processing Space S Multiple boards 100 Process Chamber 200 Gas injection section 300 Substrate support 400 Substrate transfer section 500 Substrate Rotation Unit 510 Drive shaft 520 Rotating Plate 530 Power transmission section 540 No. 2 pulley 550 Power Transmission Guide 600 Tension adjustment section 610 Body 620 Rotating shaft 630 Rotating part 640 Elastic part 650 1st pulley

Claims

1. a process chamber having a processing space formed therein for processing a plurality of substrates; a gas injector formed above the process chamber and configured to inject a process gas into the processing space; a substrate support part formed in the process chamber to face the gas injection part and on which the substrates are placed; a substrate transfer unit installed in the process chamber and configured to transfer the substrates placed on the substrate support units to different ones of the substrate support units; a substrate rotation unit configured to rotate the substrates between adjacent ones of the substrate support units, the substrate rotation unit being configured to rotate the substrates, The substrate rotating unit includes: a driving shaft portion formed at a lower portion of the process chamber and adapted to rotate about a central axis; a rotating plate connected to the driving shaft portion and rotated by the rotation of the driving shaft portion, the rotating plate being formed of a plurality of rotating placement portions on which the plurality of substrates are placed; a power transmission unit that connects the drive shaft unit and the rotary plate so that a rotational force of the drive shaft unit can be transmitted to the rotary plate; a tension adjusting section formed in at least a portion of the power transmission section and configured to adjust the tension of the power transmission section connecting the drive shaft section and the rotary plate; Including, The tension adjustment unit is A rotation shaft portion formed of a cylinder; a rotating part connected to the rotating shaft part and having one end and the other end extending in both directions so as to rotate around the rotating shaft part; An elastic portion that applies pressure to one end of the rotating portion; a first pulley, at least a portion of which is surrounded by the power transmission portion and which is rotatably coupled to the other end of the rotating portion.

2. The rotating portion is a central portion formed by being circularly penetrated so that the pivot shaft portion can be inserted; a first extension portion extending from the center portion in one direction and being pressed by the elastic portion; The substrate processing apparatus of claim 1 , further comprising: a second extension portion extending from the center portion in a direction toward the other side, the second extension portion having an end portion to which the first pulley is coupled.

3. The second extension portion is The substrate processing apparatus according to claim 2 , wherein the first extension portion is formed so as to be inclined at a predetermined angle with respect to an arbitrary extension line of the first extension portion.

4. The rotating portion is a through-hole portion formed by passing at least a portion of one end of the pivot portion through such that the fixing portion of the elastic portion can be inserted; The through hole portion is The substrate processing apparatus according to claim 1 , wherein the fixed portion is formed to penetrate the rotating portion in a longitudinal direction so that the rotating portion surrounding the fixed portion can rotate when the rotating portion rotates about the rotating shaft portion.

5. The elastic portion is A fixing portion formed to be inserted into at least a portion of the rotating portion; an elastic adjustment part formed in a part of the fixing part with a cross section wider than that of the fixing part and coupled to the fixing part; The substrate processing apparatus of claim 1 , further comprising: an elastic body coupled between the pivot portion and the elasticity adjustment portion, the elastic body being configured to push the pivot portion away from the elasticity adjustment portion.

6. The elastic adjustment portion is The substrate processing apparatus according to claim 5 , wherein the substrate processing apparatus is screw-coupled to the fixing portion so that the substrate processing apparatus can be fixed at any position on the fixing portion.

7. The elastic portion is The substrate processing apparatus of claim 5 , further comprising a separation prevention portion coupled to an end of the fixing portion so as to prevent the elastic adjustment portion from separating from the fixing portion.

8. The elastic body is The substrate processing apparatus according to claim 5 , wherein the substrate processing apparatus is formed of any one of a coil spring, an elastic block, a pair of magnetic bodies, and a combination thereof.

9. A process chamber having a processing space formed therein for processing a plurality of substrates; a gas injector formed above the process chamber and configured to inject a process gas into the processing space; a substrate support part formed in the process chamber to face the gas injection part and on which the substrates are placed; a substrate transfer unit installed in the process chamber and configured to transfer the substrates placed on the substrate support units to different ones of the substrate support units; a substrate rotation unit configured to rotate the substrates between adjacent ones of the substrate support units, the substrate rotation unit being configured to rotate the substrates, The substrate rotating unit includes: a driving shaft portion formed at a lower portion of the process chamber and adapted to rotate about a central axis; a rotating plate connected to the driving shaft portion and rotated by the rotation of the driving shaft portion, the rotating plate being formed of a plurality of rotating placement portions on which the plurality of substrates are placed; a power transmission unit that connects the drive shaft unit and the rotary plate so that a rotational force of the drive shaft unit can be transmitted to the rotary plate; a tension adjusting section formed in at least a portion of the power transmission section and configured to adjust the tension of the power transmission section connecting the drive shaft section and the rotary plate; Including, The power transmission unit is a belt formed in a closed shape, a plurality of second pulleys formed at the lower portions of the plurality of rotary plates are coupled to the inside of the power transmission part; the drive shaft portion is coupled to an outside of the power transmission portion, The tension adjusting unit is coupled to an inner side of the power transmission unit and pushes the power transmission unit outward to form tension in the power transmission unit.

Images