Wafers and Semiconductor Devices

Abstract

To provide a wafer capable of stabilizing a characteristic and provide a semiconductor device.SOLUTION: According to an embodiment, a wafer contains: a base body containing silicon carbide and a first surface; and a crystal layer containing the silicon carbide provided to a first surface. The crystal layer contains: a plurality of first lamination defects; and one or a plurality of second lamination defects. Each first lamination defect contains: a first long side; a first short side; and a first inclination side. A position of the first long side in a first direction from the base body to the crystal layer is arranged between a position in the first direction of the base body and a position in the first direction of a first corner part between the first short side and the first inclination side. One of the second lamination defects, contains: a second long side; a second short side; and a second inclination side. A position in the first direction of a second corner part between the second short side and the second inclination side is arranged between the position in the first direction of the base body and the position in the first direction of the second long side. An intensity of each first lamination defection is higher than that of each second lamination defection.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] FIELD OF THE DISCLOSURE Embodiments of the present invention relate to wafers and semiconductor devices. [Background technology]

[0002] For example, semiconductor devices are manufactured using wafers containing silicon carbide, and stable characteristics are desired for the semiconductor devices. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] JP 2014-146748 A Summary of the Invention [Problem to be solved by the invention]

[0004] The embodiments of the present invention provide a wafer and a semiconductor device capable of stabilizing characteristics. [Means for solving the problem]

[0005] According to an embodiment of the present invention, a wafer includes a substrate including silicon carbide and including a first surface, and a crystal layer including silicon carbide provided on the first surface. The crystal layer includes a plurality of first stacking faults and one or a plurality of second stacking faults. One of the plurality of first stacking faults includes a first long side, a first short side, and a first hypotenuse. The length of the first long side is longer than the length of the first short side. The angle between the first long side and the first short side is substantially a right angle. The first long side is along the first surface. The position of the first long side in a first direction from the substrate to the crystal layer is between the position of the substrate in the first direction and the position of a first corner between the first short side and the first hypotenuse in the first direction. The one or a plurality of second stacking faults includes a second long side, a second short side, and a second hypotenuse. The length of the second long side is longer than the length of the second short side. An angle between the second long side and the second short side is substantially a right angle. The second long side is along the first surface. A position in the first direction of a second corner between the second short side and the second oblique side is between the position in the first direction of the base and the position in the first direction of the second long side. A first density of the plurality of first stacking faults in the crystal layer is higher than a second density of the one or more second stacking faults in the crystal layer. [Brief description of the drawings]

[0006] [Figure 1] FIG. 1 is a schematic perspective view illustrating a wafer according to the first embodiment. [Diagram 2] 2(a) to 2(c) are schematic views illustrating a part of the wafer according to the first embodiment. [Diagram 3] 3(a) to 3(c) are schematic views illustrating a part of the wafer according to the first embodiment. [Figure 4] FIG. 4 is a schematic cross-sectional view illustrating the semiconductor device according to the second embodiment. [Diagram 5] FIG. 5 is a schematic cross-sectional view illustrating the semiconductor device according to the second embodiment. [Figure 6] FIG. 6 is a schematic cross-sectional view illustrating the semiconductor device according to the second embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0007] Hereinafter, embodiments of the present invention will be described with reference to the drawings. The drawings are schematic or conceptual, and the relationship between the thickness and width of each part, the size ratio between parts, etc. are not necessarily the same as those in reality. Even when the same part is shown, the dimensions and ratios of each part may be different depending on the drawing. In this specification and each drawing, elements similar to those described above with reference to the previous drawings are given the same reference numerals and detailed descriptions thereof will be omitted as appropriate.

[0008] (First embodiment) FIG. 1 is a schematic perspective view illustrating a wafer according to the first embodiment. As shown in Fig. 1, a wafer 100 according to the embodiment includes a base body 10s and a crystal layer 10C. The base body 10s includes silicon carbide (SiC). The base body 10s is, for example, a silicon carbide crystal substrate. The base body 10s includes a first surface 10F. The first surface 10F is, for example, an upper surface.

[0009] The crystal layer 10C is provided on the first face 10F. The crystal layer 10C is in contact with the first face 10F. The crystal layer 10C includes silicon carbide. The crystal layer 10C is an epitaxially grown layer of silicon carbide.

[0010] In this example, the crystal layer 10C includes a first crystal region 41 and a second crystal region 42. The first crystal region 41 is between the substrate 10s and the second crystal region 42. The concentration of the impurity in the second crystal region 42 is higher than the concentration of the impurity in the first crystal region 41. In one example, the impurity is p-type. In this case, the first crystal region 41 may be n-type. For example, the first crystal region 41 includes a first element including at least one selected from the group consisting of N, P, and As. The second crystal region 42 includes a second element including at least one selected from the group consisting of B, Al, and Ga. In this way, the first crystal region 41 and the second crystal region 42 may have different conductivity types. The concentration of the first element in the first crystal region 41 is, for example, 5×10 13 cm -3 5×10 or more 16 cm -3 The concentration of the second element in the second crystal region 42 is, for example, 1×10 17 cm -3 5×10 or more 20 cm -3 The following is the result.

[0011] As shown in Fig. 1, the crystal layer 10C includes a plurality of first stacking faults SF1 and one or a plurality of second stacking faults SF2. These stacking faults are generated, for example, from basal plane dislocations (BPDs) in the crystal layer 10C that are connected to basal plane dislocations (BPDs) in the substrate 10s. For example, by irradiating the crystal layer 10C with ultraviolet light or the like, stacking faults are expanded from the basal plane dislocations (BPDs) generated in the crystal layer 10C. The stacking faults are, for example, single Shockley stacking faults.

[0012] Broadly speaking, there are two types of stacking faults: a plurality of first stacking faults SF1 and one or a plurality of second stacking faults SF2.

[0013] 1, a first direction D1 from the substrate 10s to the crystal layer 10C is defined as a Z-axis direction. A direction perpendicular to the Z-axis direction is defined as an X-axis direction. A direction perpendicular to the Z-axis direction and the X-axis direction is defined as a Y-axis direction.

[0014] The substrate 10s and the crystal layer 10C are layered and extend substantially parallel to the XY plane.

[0015] The first surface 10F may be inclined with respect to the (0001) plane of the substrate 10s. For example, the

[0001] direction of the substrate 10s may be inclined with respect to the Z-axis direction (first direction D1). For example, the angle θ between the

[0001] direction of the substrate 10s and the Z-axis direction (first direction D1) may be greater than 0 degrees and less than or equal to 10 degrees. For example, the angle θ between the first surface 10F and the (0001) plane of the substrate 10s may be greater than 0 degrees and less than or equal to 10 degrees. The substrate 10s is an offset substrate. The angle θ corresponds to the angle between the first surface 10F and the (0001) plane of the crystal layer 10C.

[0016] An example of one of the plurality of first stacking faults SF1 and one second stacking fault SF2 will be described below.

[0017] 2(a) to 2(c) are schematic views illustrating a part of the wafer according to the first embodiment. These figures illustrate the first stacking fault SF1. Fig. 2(a) is a cross-sectional view. Fig. 2(b) is a plan view as viewed along the Z-axis direction. Fig. 2(c) is a plan view as viewed along the <0001> direction.

[0018] As shown in FIG. 2(b) and FIG. 2(c), the first stacking fault SF1 has a right-angled triangular shape. As shown in FIG. 2(c), one of the first stacking faults SF1 includes a first long side 45a, a first short side 46a, and a first hypotenuse 47a. The length of the first long side 45a is longer than the length of the first short side 46a. An angle α3 between the first long side 45a and the first short side 46a is substantially a right angle. The first long side 45a is aligned along the [-1100] direction of the crystal layer 10C. The first short side 46a is aligned along the [11-20] direction of the crystal layer 10C.

[0019] In this specification, in notations such as "[-1100]", "-" indicates that a "bar" is added to the number following the "-".

[0020] A first corner 48a is located between the first short side 46a and the first oblique side 47a. An angle α1 between the first short side 46a and the first oblique side 47a (the angle of the first corner 48a) is substantially 60 degrees. An angle α2 between the first long side 45a and the first oblique side 47a is substantially 30 degrees.

[0021] 2(a) and 2(c), the first long side 45a is aligned along the first surface 10F. The first long side 45a is aligned along the XY plane. The first long side 45a is substantially perpendicular to the first direction D1.

[0022] 2(a), the position of the first long side 45a in the first direction D1 is between the position of the base body 10s in the first direction D1 and the position of the first corner portion 48a in the first direction D1. As already described, the first corner portion 48a is a corner portion between the first short side 46a and the first oblique side 47a.

[0023] 2(a), in the first stacking fault SF1, the first long side 45a is on the side (deep side) of the base body 10s, and the first corner 48a is on the side (shallow side) away from the base body 10s.

[0024] 3(a) to 3(c) are schematic views illustrating a part of the wafer according to the first embodiment. These figures illustrate the second stacking fault SF2. Fig. 3(a) is a cross-sectional view. Fig. 3(b) is a plan view as viewed along the Z-axis direction. Fig. 3(c) is a plan view as viewed along the <0001> direction.

[0025] As shown in FIG. 3(b) and FIG. 3(c), the second stacking fault SF2 has a right-angled triangular shape. As shown in FIG. 3(c), one of the one or more second stacking faults SF2 includes a second long side 45b, a second short side 46b, and a second hypotenuse 47b. The length of the second long side 45b is longer than the length of the second short side 46b. The angle α6 between the second long side 45b and the second short side 46b is substantially a right angle. The second long side 45b is aligned along the [-1100] direction of the crystal layer 10C. The second short side 46b is aligned along the [11-20] direction of the crystal layer 10C.

[0026] A first corner 48b is located between the second short side 46b and the second oblique side 47b. An angle α4 between the second short side 46b and the second oblique side 47b (the angle of the second corner 48b) is substantially 60 degrees. An angle α5 between the second long side 45b and the second oblique side 47b is substantially 30 degrees.

[0027] 3(a) and 3(c), the second long side 45b is aligned along the first surface 10F. The second long side 45b is aligned along the XY plane. The second long side 45b is substantially perpendicular to the first direction D1.

[0028] 3(a), the position of the second corner 48b in the first direction D1 is between the position of the base 10s in the first direction D1 and the position of the second long side 45b in the first direction D1. As already described, the second corner 48b is a corner between the second short side 46b and the second oblique side 47b.

[0029] 3(a), in the second stacking fault SF2, the second long side 45b is on the side farther from the base body 10s (shallow side), and the second corner 48b is on the side closer to the base body 10s (deep side).

[0030] In this manner, the first stacking faults SF1 and the second stacking faults SF2 having different configurations may occur. In the embodiment, a first density of the plurality of first stacking faults SF1 in the crystal layer 10C is higher than a second density of one or more second stacking faults SF2 in the crystal layer 10C.

[0031] For example, stacking faults can cause a deterioration in forward voltage Vf. Furthermore, if partial dislocations of stacking faults reach the p-type layer, the leakage current increases in the reverse characteristics, which can cause a breakdown voltage failure.

[0032] According to the study of the inventors, it has been found that the second stacking fault SF2 is prone to cause degradation, whereas the first stacking fault SF1 is unlikely to cause degradation.

[0033] In the second stacking fault SF2, the second long side 45b is located on the shallow side. As shown in FIG. 3A, for example, the second long side 45b may be located in the second crystal region 42. The shallow second long side 45b is likely to cause a deterioration in the forward voltage Vf. The leakage current is likely to increase.

[0034] In contrast, in the first stacking fault SF1, the first corner 48a is located on the shallower side. The first corner 48a is substantially a point, and is short or has a small area. Therefore, the deterioration of the forward voltage Vf caused by the first corner 48a does not substantially occur. The deterioration of the forward voltage Vf is suppressed. In the first stacking fault SF1, the increase in the leakage current is suppressed.

[0035] The first stacking faults SF1 do not substantially affect the characteristics. The second stacking faults SF2 do affect the characteristics. Therefore, by reducing the number of the second stacking faults SF2, the deterioration of the forward voltage Vf can be suppressed. The increase in the leakage current can be suppressed.

[0036] At this time, if the first stacking faults SF1 are reduced in addition to the reduction in the second stacking faults SF2, for example, distortion of the crystal layer 10C is likely to occur. For example, when the crystal layer 10C is epitaxially grown by step growth or the like, dislocations that are the source of stacking faults are generated. These dislocations relieve stress generated in the crystal layer 10C. The presence of the first stacking faults SF1 relieves stress in the crystal layer 10C due to dislocations and stacking faults expanding from the dislocations, suppressing distortion. The presence of the first stacking faults SF1 makes it possible to practically obtain the crystal layer 10C with stable characteristics.

[0037] In the embodiment, a first stacking fault SF1 that does not substantially cause deterioration of the forward voltage Vf is provided, and a second stacking fault SF2 that causes deterioration of the forward voltage Vf is reduced. This makes it possible to suppress deterioration of the forward voltage Vf while relaxing stress and suppressing distortion. An increase in leakage current is suppressed. According to the embodiment, a wafer and a semiconductor device capable of stabilizing characteristics are provided.

[0038] According to the inventor's study, under one manufacturing condition, both the first stacking fault SF1 and the second stacking fault SF2 occur. The first stacking fault SF1 and the second stacking fault SF2 each occur with a certain occurrence probability. In general, it is considered that the occurrence probability of the second stacking fault SF2 is higher than the occurrence probability of the first stacking fault SF1. In this case, the density of the first stacking fault SF1 is lower than the density of the second stacking fault SF2.

[0039] In contrast, in the wafer 100 according to the embodiment, the density of the first stacking faults SF1 is higher than the density of the second stacking faults SF2. In one example, such a wafer 100 is obtained by, for example, selecting the manufactured wafers 100 through inspection.

[0040] For example, a wafer including a substrate 10s and a crystal layer 10C is irradiated with ultraviolet light or the like. This causes stacking faults to expand. The stacking faults include a first stacking fault SF1 and a second stacking fault SF2. For example, the crystal layer 10C is irradiated with light, and the expanded stacking faults can be observed by photoluminescence imaging. Since the configurations of the first stacking fault SF1 and the second stacking fault SF2 are different, the presence of the first stacking fault SF1 and the second stacking fault SF2 can be easily distinguished. The amount of the second stacking fault SF2 can be inspected by observation. For example, based on the inspection result, a wafer having a large number of the second stacking faults SF2 is not used for manufacturing a semiconductor device. Or, a region of the wafer having a large number of the second stacking faults SF2 is not used as a product of a semiconductor device. By such a method, a wafer 100 in which the density of the first stacking faults SF1 is higher than the density of the second stacking faults SF2 is obtained. A semiconductor device in which the density of the first stacking faults SF1 is higher than the density of the second stacking faults SF2 is obtained.

[0041] In the embodiment, the method for obtaining the wafer 100 in which the density of the first stacking faults SF1 is higher than the density of the second stacking faults SF2 is arbitrary.

[0042] In the embodiment, for example, the first density is 1.2 times or more the second density. For example, it is easy to stabilize the characteristics while suppressing distortion. The first density may be twice or more the second density. For example, it is easy to stabilize the characteristics while further suppressing distortion.

[0043] 2(a), the crystal layer 10C may include a first crystal region 41 and a second crystal region 42. The first crystal region 41 is located between the substrate 10s and the second crystal region 42. As already described, the concentration of an impurity in the second crystal region 42 is higher than the concentration of the impurity in the first crystal region 41.

[0044] 2(a), in the embodiment, the first corner 48a of the first stacking fault SF1 may be located below the interface between the first crystal region 41 and the second crystal region 42. The first corner 48a may be located in the first crystal region 41 and away from the second crystal region 42. For example, the position of the first corner 48a in the first direction D1 is between the position of the first long side 45a in the first direction D1 and the position of the second crystal region 42 in the first direction D1. By separating the first stacking fault SF1 from the second crystal region 42, the fluctuation in characteristics is further suppressed.

[0045] As shown in FIG. 2(a), the angle between the first surface 10F and the (0001) plane of the crystal layer 10C corresponds to an angle θ. The angle θ is, for example, greater than 0 and equal to or less than 10 degrees. The first crystal region 41 has a first thickness t1 along the first direction D1. As shown in FIG. 2(c), the length of the first short side 46a is defined as a length L1. As described above, the first corner portion 48a is in the first crystal region 41 and is separated from the second crystal region 42. In this case, the length L1 is smaller than t1 / tan(θ). By separating the first stacking fault SF1 from the second crystal region 42, the variation in characteristics is further suppressed.

[0046] 3A, in the second stacking fault SF2, the length of the second short side 46b is defined as L2, which is, for example, equal to or greater than t1 / tan(θ).

[0047] In the embodiment, the first short side 46a of the first stacking fault SF1 is shorter than the second short side 46b.

[0048] In the embodiment, the first thickness t1 is, for example, not less than 5 μm and not more than 150 μm. For example, at such a thickness, the first stacking faults SF1 and the second stacking faults SF2 are likely to occur.

[0049] The second thickness t2 (see FIGS. 2(a) and 3(a)) of the second crystal region 42 along the first direction D1 is, for example, not less than 0.3 μm and not more than 3 μm. In a semiconductor device using the wafer 100, appropriate characteristics can be obtained.

[0050] As shown in Figure 1, the substrate 10s includes a plurality of basal plane dislocations BPDs. As shown in Figures 2(a) and 2(c), a first short side 46a of the first stacking fault SF1 is continuous with one of the plurality of basal plane dislocations BPDs. As shown in Figures 3(a) and 3(c), a second short side 46b of the second stacking fault SF2 is continuous with another of the plurality of basal plane dislocations BPDs.

[0051] In the embodiment, the crystal layer 10C may not include the second stacking faults SF2. In this case, the crystal layer 10C also includes one or more first stacking faults SF1.

[0052] Second embodiment The second embodiment relates to a semiconductor device. The semiconductor device includes at least a part of the wafer 100 according to the first embodiment and a plurality of electrodes (at least a first electrode and a second electrode). The first electrode is electrically connected to a part of the crystal layer 10C. The second electrode is electrically connected to another part of the crystal layer 10C.

[0053] FIG. 4 is a schematic cross-sectional view illustrating the semiconductor device according to the second embodiment. As shown in FIG. 4, the semiconductor device 110 according to the embodiment includes at least a portion of the wafer 100, a first electrode 51, a second electrode 52, a third electrode 53, and an insulating portion 61.

[0054] At least a portion of the base 10s is between the first electrode 51 and the second electrode 52 in the first direction D1. At least a portion of the crystal layer 10C is between the base 10s and the second electrode 52 in the first direction D1.

[0055] The crystal layer 10C includes a first semiconductor region 10 of a first conductivity type, a second semiconductor region 20 of a second conductivity type, and a third semiconductor region 30 of the first conductivity type. The first conductivity type is, for example, one of n-type and p-type. The second conductivity type is, for example, the other of n-type and p-type. In the following, the first conductivity type is n-type, and the second conductivity type is p-type.

[0056] For example, at least a portion of the first crystalline region 41 may correspond to the first semiconductor region 10. For example, at least a portion of the second crystalline region 42 may correspond to the second semiconductor region 20.

[0057] The first semiconductor region 10 includes a first semiconductor portion 10a and a second semiconductor portion 10b. The direction from the second semiconductor portion 10b to the third electrode 53 is along the first direction D1. The intersecting direction from the second semiconductor portion 10b to the first semiconductor portion 10a intersects with the first direction D1. The direction from the first semiconductor portion 10a to the third semiconductor region 30 is along the first direction D1.

[0058] The second semiconductor region 20 includes a third semiconductor portion 20c and a fourth semiconductor portion 20d. The third semiconductor portion 20c is between the first semiconductor portion 10a and the third semiconductor region 30 in the first direction D1. The fourth semiconductor portion 20d is between a part of the second semiconductor portion 10b and the third semiconductor region 30 in a second direction D2 intersecting the first direction D1. The second direction D2 is, for example, the X-axis direction.

[0059] The first electrode 51 is electrically connected to the first semiconductor region 10. The second electrode 52 is electrically connected to the third semiconductor region 30.

[0060] At least a portion of the insulating portion 61 is between the second semiconductor portion 10b and the third electrode 53, and between the fourth semiconductor portion 20d and the third electrode 53.

[0061] In the semiconductor device 110, the current flowing between the first electrode 51 and the second electrode 52 can be controlled by the potential of the third electrode 53. The potential of the third electrode 53 may be a potential based on the potential of the second electrode 52. The first electrode 51 functions as, for example, a drain electrode. The second electrode 52 functions as, for example, a source electrode. The third electrode 53 functions as a gate electrode. The base 10s is, for example, of a first conductivity type (n-type). The semiconductor device 110 is, for example, a MOSFET.

[0062] In this example, the second semiconductor region 20 includes a fifth semiconductor portion 20e. In the second direction D2, the third semiconductor region 30 is between the fourth semiconductor portion 20d and the fifth semiconductor portion 20e. The second electrode 52 is electrically connected to the fifth semiconductor portion 20e.

[0063] FIG. 5 is a schematic cross-sectional view illustrating the semiconductor device according to the second embodiment. 5, in the semiconductor device 111, the base body 10sA is of the second conductivity type (p-type). Except for this, the configuration of the semiconductor device 111 is similar to the configuration of the semiconductor device 110. The semiconductor device 111 is, for example, an IGBT (Insulated Gate Bipolar Transistor).

[0064] FIG. 6 is a schematic cross-sectional view illustrating the semiconductor device according to the second embodiment. As shown in FIG. 6, the semiconductor device 112 includes at least a portion of the wafer 100, a first electrode 51, and a second electrode 52.

[0065] The direction from the first electrode 51 to the second electrode 52 is along the first direction D1. At least a portion of the base body 10s is between the first electrode 51 and the second electrode 52 in the first direction D1. The crystal layer 10C includes a first semiconductor region 10 of a first conductivity type and a second semiconductor region 20 of a second conductivity type. For example, at least a portion of the first crystal region 41 may correspond to the first semiconductor region 10. For example, at least a portion of the second crystal region 42 may correspond to the second semiconductor region 20.

[0066] The first semiconductor region 10 is between the substrate 10s and the second electrode 52. The second semiconductor region 20 is between the first semiconductor region 10 and the second electrode 52. The first electrode 51 is electrically connected to the first semiconductor region 10. The second electrode 52 is electrically connected to the second semiconductor region 20. The first electrode 51 is, for example, a cathode electrode. The second electrode 52 is, for example, an anode electrode. The semiconductor device 112 is, for example, a diode. In the semiconductor device 112, termination regions 82a and 82b may be provided.

[0067] In the embodiment, at least one of the first electrode 51 and the second electrode 52 includes at least one selected from the group consisting of Al, Cu, and Au, for example. For example, the third electrode 53 (e.g., a gate electrode) includes at least one selected from the group consisting of TiN, Al, Ru, W, and TaSiN. The insulating portion 61 includes at least one selected from the group consisting of silicon oxide, silicon nitride, silicon oxynitride, aluminum oxide, and hafnium oxide, for example.

[0068] In the embodiment, the information on the impurity concentration is obtained by, for example, SIMS (Secondary Ion Mass Spectrometry) or the like. In the above, the impurity concentration may be, for example, a carrier concentration. The information on the relative level of the impurity concentration can be obtained based on the information on the relative level of the carrier concentration obtained by, for example, SCM (Scanning Capacitance Microscopy). The information on the crystal orientation is obtained by, for example, X-ray diffraction analysis.

[0069] According to the embodiment, it is possible to provide a wafer and a semiconductor device that can stabilize characteristics.

[0070] In this specification, "electrically connected" includes a state in which multiple conductors are in physical contact with each other and a current flows between the multiple conductors. "Electrically connected" includes a state in which a conductor is inserted between multiple conductors and a current flows between the multiple conductors.

[0071] In this specification, "vertical" and "parallel" do not only mean strictly vertical and strictly parallel, but also include, for example, variations in the manufacturing process, and may mean substantially vertical and substantially parallel.

[0072] The above describes the embodiments of the present invention with reference to specific examples. However, the present invention is not limited to these specific examples. For example, the specific configurations of the substrate and crystal layer included in the wafer, and the semiconductor region, electrode, and insulating portion included in the semiconductor device, are included in the scope of the present invention as long as a person skilled in the art can implement the present invention in a similar manner and obtain the same effects by appropriately selecting from the known range.

[0073] Furthermore, any combination of two or more elements of each of the specific examples, within the scope of technical feasibility, is also included within the scope of the present invention as long as it includes the gist of the present invention.

[0074] In addition, all wafers and semiconductor devices that can be implemented by a person skilled in the art by making appropriate design modifications based on the wafers and semiconductor devices described above as embodiments of the present invention also fall within the scope of the present invention as long as they include the gist of the present invention.

[0075] In addition, within the scope of the concept of the present invention, a person skilled in the art may conceive of various modifications and alterations, and it will be understood that these modifications and alterations also fall within the scope of the present invention.

[0076] Although some embodiments of the present invention have been described, these embodiments are presented as examples and are not intended to limit the scope of the invention. These novel embodiments can be implemented in various other forms, and various omissions, substitutions, and modifications can be made without departing from the spirit of the invention. These embodiments and their modifications are included in the scope and spirit of the invention, and are included in the scope of the invention and its equivalents described in the claims. [Explanation of symbols]

[0077] 10...first semiconductor region, 10C...crystal layer, 10F...first surface, 10a, 10b...first and second semiconductor portions, 10s, 10sA...base, 20...second semiconductor region, 20c-20e...third to fifth semiconductor portions, 30...third semiconductor region, 41...first crystal region, 42...second crystal region, 45a, 45b...first and second long sides, 46a, 46b...first and second short sides, 47a, 47b...first and second oblique sides, 48a, 48b...first and second corners, 51-53...first to third electrodes, 61...insulating portion, 80...silicon carbide member, 82a, 82b...termination region, α1-α6...angle, θ...angle, 100...wafer, 110-112...semiconductor device; BPD...basal plane dislocation; D1, D2...first and second directions; L1, L2...length; SF1, SF2...first and second stacking faults; t1, t2...first and second thicknesses

Claims

1. a substrate comprising silicon carbide and including a first surface; a crystal layer including silicon carbide provided on the first surface; Equipped with the crystal layer includes a plurality of first stacking faults and one or a plurality of second stacking faults; one of the plurality of first stacking faults includes a first long side, a first short side, and a first hypotenuse, a length of the first long side is longer than a length of the first short side, an angle between the first long side and the first short side is substantially a right angle, the first long side is along the first surface, and a position of the first long side in a first direction from the substrate to the crystal layer is between a position of the substrate in the first direction and a position of a first corner between the first short side and the first hypotenuse in the first direction, one of the one or more second stacking faults includes a second long side, a second short side, and a second oblique side, a length of the second long side is longer than a length of the second short side, an angle between the second long side and the second short side is substantially a right angle, the second long side is along the first surface, and a position in the first direction of a second corner between the second short side and the second oblique side is between the position of the base in the first direction and a position of the second long side in the first direction, a first density of the first plurality of stacking faults in the crystalline layer is greater than a second density of the one or more second stacking faults in the crystalline layer.

2. The wafer of claim 1 , wherein the first density is greater than or equal to 1.2 times the second density.

3. The wafer of claim 1 , wherein the first density is greater than or equal to twice the second density.

4. 4. The wafer according to claim 1, wherein the first short side is shorter than the second short side.

5. the substrate comprises a plurality of basal plane dislocations; the first short side is continuous with one of the plurality of basal plane dislocations; 5. The wafer according to claim 1, wherein the second short side is continuous with another one of the plurality of basal plane dislocations.

6. a substrate comprising silicon carbide and including a first surface; a crystal layer including silicon carbide provided on the first surface; Equipped with the crystalline layer includes one or more first stacking faults; one of the one or more first stacking faults includes a first long side, a first short side, and a first hypotenuse, a length of the first long side is longer than a length of the first short side, an angle between the first long side and the first short side is substantially a right angle, the first long side is along the first surface, and a position of the first long side in a first direction from the substrate to the crystal layer is between a position of the substrate in the first direction and a position of a first corner between the first short side and the first hypotenuse in the first direction, the crystal layer does not include a second stacking fault; the second stacking fault includes a second long side, a second short side, and a second hypotenuse, a length of the second long side is longer than a length of the second short side, an angle between the second long side and the second short side is substantially a right angle, the second long side is along the first surface, and a position in the first direction of a second corner between the second short side and the second hypotenuse is between the position of the substrate in the first direction and a position of the second long side in the first direction.

7. the substrate contains basal plane dislocations; The wafer of claim 6 , wherein the first short side is continuous with the basal plane dislocation.

8. the crystalline layer includes a first crystalline region and a second crystalline region, the first crystalline region is between the substrate and the second crystalline region, a concentration of an impurity in the second crystal region is higher than a concentration of the impurity in the first crystal region; 8. A wafer according to claim 1, wherein the position of the first corner in the first direction is between the position of the first long side in the first direction and the position of the second crystal region in the first direction.

9. an angle θ between the first surface and a (0001) plane of the crystal layer is greater than 0 and equal to or less than 10 degrees; The first crystalline region has a first thickness t1 along the first direction, The wafer of claim 8 , wherein the length of the first short side is smaller than t1 / tan(θ).

10. The wafer of claim 9 , wherein the first thickness t1 is not less than 5 μm and not more than 150 μm.

11. 11. The wafer according to claim 8, wherein a second thickness t2 of the second crystal region along the first direction is not less than 0.3 μm and not more than 3 μm.

12. The wafer according to any one of claims 8 to 11, wherein the impurity is p-type.

13. The first crystalline region includes at least one selected from the group consisting of N, P, and As, 13. The wafer according to claim 8, wherein the second crystal region contains at least one selected from the group consisting of B, Al, and Ga.

14. At least a part of a wafer according to any one of claims 1 to 13; A first electrode; A second electrode; Equipped with the first electrode is electrically connected to a portion of the crystal layer; the second electrode is electrically connected to another part of the crystal layer.

15. A third electrode; An insulating portion; Further equipped with At least a portion of the substrate is between the first electrode and the second electrode in the first direction, At least a portion of the crystal layer is between the substrate and the second electrode in the first direction, The crystal layer is a first semiconductor region of a first conductivity type; a second semiconductor region of a second conductivity type; a third semiconductor region of the first conductivity type; Including, the first semiconductor region includes a first semiconductor portion and a second semiconductor portion; a direction from the second semiconductor portion to the third electrode is along the first direction; an intersecting direction from the second semiconductor portion to the first semiconductor portion intersects with the first direction, a direction from the first semiconductor portion to the third semiconductor region is along the first direction, the second semiconductor region includes a third semiconductor portion and a fourth semiconductor portion, the third semiconductor portion is between the first semiconductor portion and the third semiconductor region in the first direction, the fourth semiconductor portion is located between a part of the second semiconductor portion and the third semiconductor region in a second direction intersecting the first direction, the first electrode is electrically connected to the first semiconductor region; the second electrode is electrically connected to the third semiconductor region; The semiconductor device according to claim 14 , wherein at least a part of the insulating portion is between the second semiconductor portion and the third electrode and between the fourth semiconductor portion and the third electrode.

16. The semiconductor device according to claim 15 , wherein the substrate is of the first conductivity type.

17. The semiconductor device according to claim 15 , wherein the substrate is of the second conductivity type.

18. A direction from the first electrode to the second electrode is along the first direction, At least a portion of the substrate is between the first electrode and the second electrode in the first direction, The crystal layer is a first semiconductor region of a first conductivity type; a second semiconductor region of a second conductivity type; Including, the first semiconductor region is between the substrate and the second electrode; the second semiconductor region is between the first semiconductor region and the second electrode; the first electrode is electrically connected to the first semiconductor region; The semiconductor device according to claim 14 , wherein the second electrode is electrically connected to the second semiconductor region.

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