Information processing device and information processing method

Abstract

To shorten a time for analyzing an abnormal factor in an apparatus.SOLUTION: An information processing apparatus comprises: first processing data indicating a result of substrate processing in a first substrate processing apparatus; an acquiring section for acquiring information containing second processing data indicating a result of the substrate processing in a second substrate processing apparatus different from the first substrate processing apparatus; and a display control section that controls display on a display device based on the information acquired by the acquisition section. in which the display control section displays the first processing data and the second processing data on separate regions respectively.SELECTED DRAWING: Figure 7

Description

[Technical field]

[0001] The present invention relates to an information processing device and an information processing method. [Background technology]

[0002] Factories that manufacture semiconductors and other devices are usually equipped with manufacturing equipment such as substrate processing equipment, and it is necessary to efficiently process substrates by understanding the operating status of each equipment. Also, if an abnormality occurs in the manufacturing equipment, it is necessary to take immediate action.

[0003] Patent Document 1 discloses a method for detecting abnormalities in a manufacturing device by statistically processing the processing results of the device for each lot consisting of multiple substrates and displaying the statistical processing results as a graph, which allows a user to immediately recognize a lot in which an abnormality has occurred. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] JP 2009-170612 A Summary of the Invention [Problem to be solved by the invention]

[0005] However, even if a graph is displayed by lot, it is difficult to immediately determine what trend there is in the statistical processing results for each device. For example, if an abnormality occurs in a specific device, an abnormality may occur in the data showing the statistical processing results regardless of the lot. In this case, even if the data showing the statistical processing results by lot is displayed as a graph, it is difficult to easily identify the cause of the abnormality, and it may take a long time to resolve the abnormality.

[0006] Therefore, an object of the present invention is to provide a technique that is advantageous in shortening the time required for analyzing the cause of an abnormality in an apparatus. [Means for solving the problem]

[0007] In order to achieve the above object, an information processing apparatus according to one aspect of the present invention includes an acquisition unit that acquires information including first processing data indicating a result of a substrate processing in a first substrate processing apparatus and second processing data indicating a result of a substrate processing in a second substrate processing apparatus different from the first substrate processing apparatus, and The first processing data, the second processing data, and information indicating a difference between processing conditions under which the substrate processing was performed are In display devices In different areas display To make A display control unit that controls the vinegar It is characterized by the above. Effect of the Invention

[0008] According to the present invention, for example, it is possible to provide a technique that is advantageous in shortening the time required for analyzing the cause of an abnormality in an apparatus. [Brief description of the drawings]

[0009] [Figure 1] FIG. 1 illustrates a system for manufacturing an article. [Diagram 2] FIG. 1 is a diagram showing a configuration of an exposure apparatus as an example of a pattern forming apparatus. [Diagram 3] FIG. 2 is a diagram illustrating a hardware configuration of an information processing device. [Figure 4] FIG. 2 is a diagram illustrating the configuration of a CPU. [Diagram 5] 4 is a flowchart showing a display process in the display device. [Figure 6] FIG. 13 is a graph showing lot data classified for each exposure apparatus. [Figure 7] FIG. 13 is a diagram showing a graph in which lot data is displayed in different areas for each exposure apparatus. [Figure 8] FIG. 7 is a diagram in which the display range of the graph in FIG. 6 is changed. [Figure 9]A diagram showing processing conditions in addition to lot data for each exposure tool; [Figure 10] FIG. 13 is a graph showing lot data classified by processing conditions. [Figure 11] FIG. 13 is a graph showing lot data displayed in different areas for each processing condition. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0010] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

[0011] First Embodiment In this embodiment, an article manufacturing system including a plurality of devices and a management device that manages the plurality of devices will be described. Fig. 1 is a diagram showing the article manufacturing system. The article manufacturing system 100 of this embodiment includes a pattern forming device 200 that forms a pattern on a wafer (substrate), a processing device 201, an inspection device 202, and a management device 300 that manages these devices. In the article manufacturing system 100, each of the pattern forming device 200, the processing device 201, and the inspection device 202 includes one or more devices.

[0012] The pattern forming apparatus 200 includes an exposure apparatus that irradiates a reticle (mask, original) on which a pattern is formed with light and projects the pattern onto a shot area on a wafer with the light from the reticle. The pattern forming apparatus 200 also includes an imprinting apparatus that, for example, brings an imprinting material supplied onto a wafer into contact with a mold (original, mold) and applies energy for hardening to the imprinting material to form a composition to which the pattern shape of the mold is transferred. The pattern forming apparatus 200 also includes a drawing apparatus that draws on a substrate with a charged particle beam such as an electron beam or an ion beam via a charged particle optical system to form a pattern on the substrate. The pattern forming apparatus 200 performs substrate processing using these methods.

[0013] The processing apparatus 201 includes manufacturing apparatuses that perform processes other than those performed by an exposure apparatus or the like in the manufacture of an article such as a device, such as a coating apparatus that coats a photoconductor or the like on the surface of a substrate, a developing apparatus that develops a substrate onto which a pattern has been transferred, etc. In addition, the processing apparatus 201 includes an etching apparatus, a film forming apparatus, etc.

[0014] The inspection device 202 includes, for example, an overlay inspection device, a line width inspection device, a pattern inspection device, and an electrical property inspection device. Here, the overlay inspection device is a device that inspects the accuracy of the misalignment between an upper layer pattern and a lower layer pattern on a substrate on which patterns are formed in multiple layers. The line width inspection device is a device that inspects the accuracy of dimensions such as the line width of a pattern formed on a substrate. The pattern inspection device is a device that inspects the presence or absence of a foreign matter attached to a substrate on which a pattern is formed, or the presence or absence of a pattern that does not meet the required accuracy due to insufficient filling of an imprint material, etc. The electrical property inspection device is a device that inspects the accuracy of the electrical properties of a semiconductor device or the like manufactured from a substrate on which a pattern is formed.

[0015] Next, as an example of the pattern forming apparatus 200, an exposure apparatus that exposes a wafer with light from a reticle on which a pattern is formed will be described. FIG. 2 is a diagram showing an exposure apparatus as an example of the pattern forming apparatus. The exposure apparatus 204 according to this embodiment will be described as a step-and-scan type exposure apparatus that performs exposure while synchronously driving a reticle stage and a wafer stage. The exposure apparatus 204 is not limited to a scanner, and may be a step-and-repeat type exposure apparatus that performs exposure while the wafer stage is stationary. In the example of FIG. 2, the exposure apparatus 204 has a light source 7, an illumination optical system 8, a reticle stage 2, a projection optical system 3, a wafer stage 6, a wafer chuck 5, and a control unit 13. The exposure apparatus 204 also has a laser interferometer 9, a laser interferometer 10, a focus sensor 11, a wafer transport unit 12, a reticle transport unit 14, and an alignment scope 15. In FIG. 2, the direction parallel to the optical axis of the projection optical system 3 is the Z-axis direction, and two directions perpendicular to each other in a plane perpendicular to the Z-axis direction are the X-axis direction and the Y-axis direction.

[0016] Examples of light source 7 include a high-pressure mercury lamp, an ArF excimer laser, and a KrF excimer laser. Furthermore, light source 7 is not limited to being inside the chamber of the exposure apparatus, and may be provided outside the chamber. Light emitted from light source 7 illuminates reticle 1 via illumination optical system 8. Reticle 1 has a pattern drawn thereon to be transferred onto wafer 4 coated with a photosensitive material, and is mounted on reticle stage 2. Reticle stage 2 adsorbs and holds the reticle via a reticle chuck, and is configured to be movable by, for example, a linear motor.

[0017] The projection optical system 3 projects an image of the pattern drawn on the reticle 1 onto the wafer 4 placed on the wafer chuck 5. When projecting the image of the pattern onto the wafer 4, an image that has been inverted and reduced at a projection magnification (for example, 1 / 4) is projected onto the wafer 4 via the projection optical system 3. A plurality of shot areas are set on the wafer 4, and projection onto the shot areas is repeated in sequence.

[0018] The wafer stage 6 is driven by an actuator such as a linear motor, and is thus movable in the X and Y directions. The wafer chuck 5 is mounted on the wafer stage 6 and holds the wafer 4. The wafer 4 held by the wafer chuck 5 is moved by driving the wafer stage 6 and the wafer chuck 5.

[0019] Laser interferometer 9 measures the position of reticle stage 2 in the Y direction, and measures the attitude of reticle stage 2. Laser interferometer 9 similarly includes a laser interferometer for measuring the position of reticle stage 2 in the X direction. Laser interferometer 10 also measures the position of wafer stage 6 on which wafer 4 is mounted in the Y direction, and measures the attitude of wafer stage 6. Laser interferometer 10 also includes a laser interferometer for measuring the position of wafer stage 6 in the X direction. The positions of reticle stage 2 and wafer stage 6 are controlled by controller 13, which will be described later, based on the positions measured by laser interferometer 9 and laser interferometer 10.

[0020] The focus sensor includes a light projection system 11a that projects light onto the wafer 4, a light receiving system 11b that receives light reflected from the wafer, and a detection section that detects the light from the light receiving system and outputs a detection signal to a control section 13. The light projection system 11a and the light receiving system 11b are installed on either side of the exit section of the projection optical system 3, with the light projection system 11a irradiating the wafer with obliquely incident light and the light receiving system 11b capturing the light reflected on the opposite side. The control section 13, which will be described later, measures the position of the wafer 4 in the Z direction from the detection signal detected by the focus sensor and controls the movement of the wafer 4 by the wafer stage 6.

[0021] The wafer transfer unit 12 transfers the wafer 4. The wafer transfer unit 12 transfers the wafer 4 from a wafer storage container or the like that stores the wafer 4 to the wafer stage 6. The wafer transfer unit 12 also transfers the wafer 4 from the wafer stage 6 to the wafer storage container or the like.

[0022] The reticle transport unit 14 transports the reticle 1. The reticle transport unit 14 transports the reticle 1 from a reticle storage container or the like that stores the reticle 1 to the reticle stage 2. In addition, the reticle transport unit 14 transports the reticle 1 from the reticle stage 2 to the reticle storage container or the like.

[0023] The alignment scope 15 acquires a digital image signal obtained by capturing an image of a mark formed on the wafer 4 in order to perform positioning (alignment) of the wafer 4 held by the wafer chuck 5. The alignment scope 15 includes an image sensor that outputs a grayscale image signal corresponding to the brightness, i.e., grayscale, of the light reflected from the wafer 4, and an A / D converter that converts the grayscale image signal obtained from the image sensor into a digital image signal. The control unit 13, which will be described later, detects the position of the mark formed on the wafer 4 using the acquired digital image signal, and controls the wafer stage 6 based on the detected position of the mark to perform positioning of the wafer 4.

[0024] The control unit 13 controls the exposure process on the wafer 4 by controlling the operation and adjustment of each part of the exposure apparatus 204. The control unit 13 is configured, for example, by a PLD (abbreviation of Programmable Logic Device) such as an FPGA (abbreviation of Field Programmable Gate Array), an ASIC (abbreviation of Application Specific Integrated Circuit), a computer with a program installed, or a combination of all or part of these. The control unit 13 may be configured integrally with other parts of the exposure apparatus 204 (in a common housing), or may be configured separately from other parts of the exposure apparatus 204 (in a different housing). The control unit 13 also applies information acquired from a storage device or the like, which will be described later, to control the exposure process (pattern formation process) on the wafer 4 to be executed.

[0025] Next, the management device 300 will be described. FIG. 3 is a diagram showing the hardware configuration of the information processing device. The information processing device includes a CPU 301, a ROM 302, a RAM 303, a storage device 304, an input device 305, a display device 306, and a communication device 307. Each hardware configuration of the information processing device functions according to a program. In the example of FIG. 3, the CPU 301 is a processing device that performs calculations for control according to a program and controls each component connected to a bus 308. The ROM 302 is a memory dedicated to reading data, and stores programs and data. The RAM 303 is a memory for reading and writing data, and is used for storing programs and data. The RAM 303 is used for temporarily storing data such as the results of calculations by the CPU 301. The storage device 304 is also used for storing programs and data. The storage device 304 is also used as a temporary storage area for programs and data of the operating system (OS) of the information processing device.

[0026] The storage device 304 is slower in data input / output than the RAM 303, but is capable of storing large amounts of data. It is desirable that the storage device 304 is a non-volatile storage device that can store data as permanent data so that the data can be referenced for a long period of time. The storage device 304 is mainly composed of a magnetic storage device (HDD), but may also be a device that reads and writes data by loading external media such as CDs, DVDs, and memory cards.

[0027] The input device 305 is a device for inputting characters and data to the information processing device, and corresponds to various keyboards and mice. The display device 306 plays a role as a user interface of the management device 300 and displays information required for operating the information processing device, processing results, and the like, and corresponds to a CRT or liquid crystal monitor. When the display device 306 can be operated by touching the screen, for example, like a touch panel, it also plays a role of the input device 305. In addition, the input device 305 and the display device 306 have been described as parts of the management device 300, but are not limited to this, and may be parts of the pattern forming device 200, for example.

[0028] The communication device 307 is used when connecting to a network and performing data communication using a communication protocol such as TCP / IP to communicate with other devices. The information processing device may also be configured with a GPU (Graphics Processor Unit) to enable high-speed arithmetic processing. The management device 300 is an information processing device, and is connected to a plurality of exposure devices 204 via the communication device 307 to communicate data.

[0029] Fig. 4 is a diagram showing the configuration of CPU 301 in management apparatus 300. CPU 301 includes an acquisition unit 401, a storage unit 402, a calculation unit 403, and a display control unit 404. Fig. 5 is a flowchart showing the display processing of a user interface for analyzing an abnormality occurring in the exposure apparatus.

[0030] 4 and 5, the display processing of the display device 306 in the management device 300 of this embodiment will be described below. In this embodiment, the display on the display device 306 makes it possible to shorten the time required to analyze the cause of an abnormality in the exposure apparatus 204. An abnormality in this embodiment includes a serious abnormality that causes the exposure apparatus 204 to stop, and an abnormality that affects productivity such as reducing the accuracy of the exposure apparatus 204.

[0031] Next, the flowchart of FIG. 5 will be described. The flowchart of FIG. 5 can be executed by the CPU 301. In step S501, the acquisition unit 401 acquires processing information of the exposure apparatus 204. The processing information of the exposure apparatus 204 includes processing conditions applied during exposure processing in addition to processing data of the exposure apparatus 204. The processing data of the exposure apparatus 204 is information including the operation result of the exposure apparatus 204 and the state of the wafer exposed by the exposure apparatus 204, and specifically includes synchronization accuracy data, alignment accuracy data, and the like. The synchronization accuracy data is data indicating the error in the relative positions of the reticle stage 2 and the wafer stage 6 during a period in which the reticle stage 2 and the wafer stage 6 are driven synchronously in, for example, the Y-axis direction in order to expose a target shot area. The alignment accuracy data is data indicating waveform data of a digital image signal obtained by capturing an image of a mark formed on the target wafer 4 and an evaluation of the digital image signal (symmetry of the waveform data, contrast of the digital image signal).

[0032] The processing conditions applied during exposure processing are recipes determined for each recipe of the wafers to be produced, and equipment parameters determined for each exposure tool 204. A recipe is a processing condition that is shared among a plurality of exposure tools, and equipment parameters are processing conditions that are not shared among a plurality of exposure tools. Examples of recipes include the exposure dose when exposing a wafer, and selection of individual correction values ​​and correction algorithms for tracking an exposed pattern. Examples of equipment parameters include correction values ​​for the projection optical system, and a control method and control parameters for the wafer stage. Furthermore, the processing conditions are not limited to these, and parameters that define other processing conditions may also be displayed.

[0033] Next, in step S502, the processing data and processing conditions of the exposure tool 204 acquired in step S501 are stored in the storage unit 402. The processing data stored in the storage unit 402 is, for example, processing data on a wafer basis (substrate basis).

[0034] In step S503, calculation unit 403 calculates lot data, which is processing data per lot, based on the processing data per wafer accumulated by accumulation unit 402. The lot data is calculated from statistical values ​​(e.g., maximum value, minimum value, average value, median value, standard deviation) of the processing data per wafer. Also, the lot data may be calculated in exposure tool 304 instead of being calculated by calculation unit 403. For example, acquisition unit 401 may acquire the lot data calculated in exposure tool 304 from exposure tool 204 and proceed to step S504.

[0035] In step S504, the display control unit 404 outputs the lot data calculated in step S503 to the display device 306, and a graph such as that shown in Fig. 6 is displayed on the display device 306. Graph 601 is a graph in which the lot data is classified by exposure apparatus and displayed collectively. Graph 601 is displayed in chronological order, with the horizontal axis of graph 601 indicating the time when the exposure process was performed and the vertical axis indicating the lot data value, which is the value of the processing data for each lot. Since the lot data for a plurality of exposure apparatuses is displayed collectively, it is possible to visually confirm the overall trend, but it is difficult to judge the trend of the data variation for a specific apparatus, etc.

[0036] In Fig. 6, the display method of the graph 601 can be changed by switching buttons 602, 603, and 604. Fig. 6 shows a state in which the switching button 602 is selected. The user can change the display method of the graph 601 by selecting a non-selected switching button. The switching buttons 602, 603, and 604 may be integrated into one button.

[0037] In step S505, the display control unit 404 determines whether the graph display method has been changed. That is, it determines whether the user has selected a non-selected button among the switching buttons 602, 603, and 604. If a non-selected button is selected, the process proceeds to step S506. Selection of the switching button is achieved by a computer input device such as a mouse, keyboard, or touch panel and a program that controls the device.

[0038] In step S506, the display control unit 404 outputs the lot data calculated in step S503 to the display device 306, and displays the lot data on the display device 306 as shown in Fig. 7. Fig. 7 shows a graph 701 that is displayed when the switching button 604 is selected.

[0039] Graph 701 is a graph in which the display area is divided for each exposure apparatus, and lot data is displayed in each separate area. Graph 701 is displayed in chronological order, and the horizontal axis of graph 701 is the time when the exposure process was performed, and is divided for each exposure apparatus. The vertical axis indicates the lot data value, which is the value of the processing data for each lot. For example, the lot data (first processing data) of exposure apparatus A as a first substrate processing apparatus is plotted as a triangle, and the lot data (second processing data) of exposure apparatus B as a second substrate processing apparatus is plotted as a circle.

[0040] A scroll bar 705 is used to change the display range of the horizontal axis of graph 701, and can display lot data for time periods that are not displayed in Fig. 7 on display device 306. Note that in Fig. 7, there is no lot data to be displayed for exposure tool D, so nothing is displayed.

[0041] By dividing the area displaying the lot data by exposure tool, as in Figure 7, it becomes possible to easily infer that the cause of the anomaly is due to a specific exposure tool. In Figure 7, the variation in the lot data for exposure tool C is large, and it can be inferred that some kind of anomaly has occurred in exposure tool C. This allows the user to quickly take action to resolve the anomaly, which results in reduced equipment downtime and improved productivity.

[0042] The setting button 704 is for setting whether or not the display range of the horizontal axis is aligned for each exposure tool. As shown in FIG. 7, when the setting button 704 is ON, a graph of the same time range is displayed for each recipe, as in graph 701. On the other hand, FIG. 8 is a diagram showing the state in which the setting button 704 is OFF. FIG. 8 is a diagram in which the lot data is displayed in a separate area for each exposure tool, as in FIG. 7, but in graph 801, the displayed time range differs depending on the exposure tool. Therefore, when there is a change over time in the lot data for a certain exposure tool, the overall trend for that exposure tool can be seen, making it easy to judge the trend. Also, the display range can be changed by the scroll bar 705, and it may be possible to select the exposure tool to be displayed separately.

[0043] In step S507, in response to the user selecting to end the screen display, the display on the display device 306 is ended. If the user has not selected to end the screen display, the process returns to step S505, and the display control unit 404 continues to determine whether or not the graph display method has been changed.

[0044] Here, as shown in Fig. 9, processing conditions related to the exposure tool specified by the user may be added to and displayed on the graph shown in Fig. 8. The lot is specified by the user selecting the lot data plotted on the graph 901 or inputting the lot name. The lot is specified by a computer input device such as a mouse, keyboard, or touch panel and a program that controls the same.

[0045] Processing conditions 724 indicate recipe parameters applied to the lot data 722a to 722c. Processing conditions 725 indicate equipment parameters applied to the lot data 722a to 722c. The parameters displayed in the processing conditions 724 and 725 may be such that parameters with differences are highlighted, or only parameters with differences are displayed, so that the user can easily compare the lot data 722a to 722c. Furthermore, the parameters may be displayed based on a preset priority order, or parameters that are deemed unnecessary based on preset information may not be displayed.

[0046] In the example shown in Fig. 9, the user first searches for a characteristic point of the change in the lot data from the graph 901. The user then specifies the characteristic point and the lot data 722a to 722c around it. The display device 306 displays the processing conditions 724, 725 applied to the lot data 722a to 722c. From the displayed processing conditions 724, 725, the user can determine that changes in the setting values ​​1, 3, 5, and 6 are related to changes in the tendency of the lot data. Therefore, the user can correct the settings of the setting values ​​1, 3, 5, and 6 so as to eliminate the abnormality.

[0047] 6 to 9, the lot data for exposure tool A is plotted as a triangle (first icon), the lot data for exposure tool B as a circle (second icon), the lot data for exposure tool C as a X, and the lot data for exposure tool D as a cross. In these graphs, the shape of each icon may be changed as appropriate, and the color of the icon may be changed for each exposure tool.

[0048] Furthermore, with the screen shown in FIG. 7 as the first screen and the screen shown in FIG. 6 as the second screen, the display control unit 404 may selectively display the first screen and the second screen, or may display the first screen and the second screen simultaneously.

[0049] <Second embodiment> In this embodiment, an example will be described in which an optimal graph display is selectively switched to identify the cause of an abnormality. Note that matters not mentioned in this embodiment follow the first embodiment.

[0050] Graph 1001 in Fig. 10 is a graph in which lot data is classified by exposure conditions (recipe) and displayed collectively. Like graph 601 in Fig. 6, graph 1001 is displayed in chronological order, with the horizontal axis of graph 1001 indicating the time when exposure processing was performed and the vertical axis indicating the lot data value, which is the value of processing data for each lot.

[0051] As in the first embodiment, the display method of the graph 1001 can be changed by the switching buttons 1002, 1003, and 1004. FIG. 10 shows a state in which the switching button 1002 is selected. The user can change the display method of the graph 1001 by selecting a non-selected switching button. The switching buttons 1002, 1003, and 1004 may be integrated into one button. The button 1005 is a button for switching between the notations in FIG. 6 and FIG. 10. In FIG. 10, "recipe" is selected, and the lot data is categorized by recipe and displayed together. By operating the button 1005, "equipment" can be selected, and when the equipment is selected, the lot data is categorized by exposure equipment and displayed together, as shown in FIG. 6.

[0052] 11 shows a graph 1101 that is displayed when the switching button 903 is selected. The graph 1101 is a graph in which the display area is divided for each recipe, and lot data is displayed in each separate area. The graph 1101 is displayed in chronological order, and the horizontal axis of the graph 1101 indicates the time when the exposure process was performed, and is divided by recipe. The vertical axis indicates the lot data value, which is the value of the processing data for each lot.

[0053] By displaying the lot data for each processing condition such as a recipe, the user can easily recognize that there is a significant change over time in the lot data for a particular recipe.

[0054] When analyzing the cause of an anomaly, the user can selectively switch to the graph display that is most suitable for identifying the cause. For example, if an anomaly occurs in a specific exposure tool, the lot data is displayed for each exposure tool, as shown in Fig. 7. This allows the user to infer that the lot data for exposure tool C varies greatly and that some kind of anomaly has occurred in exposure tool C.

[0055] When an abnormality factor occurs in a specific recipe, the lot data is displayed for each recipe as shown in Fig. 11. This allows one to infer that the lot data for recipe D varies greatly and that some abnormality has occurred in the exposure process based on recipe D.

[0056] In this way, by appropriately switching the lot data display method, the user can easily guess the cause of the abnormality and, as a result, can quickly take measures to resolve the abnormality. Early resolution of the equipment abnormality reduces the equipment downtime and improves productivity.

[0057] 10 and 11, the lot data of recipe A is plotted as a triangle icon, the lot data of recipe B as a circle icon, the lot data of recipe C as a cross icon, and the lot data of recipe D as a x icon. In these graphs, the shape of each icon may be changed as appropriate, and the color of the icon may be changed for each recipe.

[0058] Furthermore, with the screen shown in FIG. 7 as the first screen and the screen shown in FIG. 11 as the third screen, the display control unit 404 may selectively display the first screen and the third screen, or may display the first screen and the third screen simultaneously.

[0059] In the explanation of the first and second embodiments, the lot data has been described as a statistical value of the processing data of one lot, but this is not limited to this and the lot data may be a statistical value of the processing data of multiple lots to which the same recipe is applied.

[0060] Although the first and second embodiments have been described with respect to an abnormality analysis of an exposure apparatus as a pattern forming apparatus, the screen displayed on the display device 306 may be used for abnormality analysis in other apparatuses. For example, the screen displayed on the display device 306 may be used for abnormality analysis in processing apparatuses such as a coating apparatus, a developing apparatus, an etching apparatus, etc., and in inspection apparatuses such as an overlay inspection apparatus, a line width inspection apparatus, a pattern inspection apparatus, etc.

[0061] <Embodiments of the method for manufacturing an article> The method for manufacturing an article according to an embodiment of the present invention is suitable for manufacturing an article such as a microdevice such as a semiconductor device or an element having a fine structure. The method for manufacturing an article according to this embodiment may include a forming step of forming a pattern of an original on a substrate using the above-mentioned manufacturing system for the article, and a processing step of processing the substrate on which the pattern has been formed in the forming step. Furthermore, such an article manufacturing method may include other well-known steps (oxidation, film formation, deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, etc.). The method for manufacturing an article according to this embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article compared to conventional methods.

[0062] <Other embodiments> The present invention can also be realized by a process in which a program for implementing one or more of the functions of the above-described embodiments is supplied to a system or device via a network or a storage medium, and one or more processors in a computer of the system or device read and execute the program. The present invention can also be realized by a circuit (e.g., ASIC) for implementing one or more of the functions.

[0063] Although the preferred embodiments of the present invention have been described above, the present invention is not limited to these embodiments, and various modifications and changes are possible within the scope of the gist of the present invention. [Explanation of symbols]

[0064] 200 Pattern forming device 300 Management device 306 Display device 401 Acquisition Department 404 Display control section

Claims

1. an acquiring unit that acquires information including first processing data indicating a result of a substrate processing in a first substrate processing apparatus and second processing data indicating a result of a substrate processing in a second substrate processing apparatus different from the first substrate processing apparatus; and a display control unit that controls the first processing data and the second processing data acquired by the acquisition unit, and information indicating a difference in processing conditions under which the substrate processing was performed, to be displayed in mutually different areas on a display device.

2. The information processing apparatus according to claim 1 , wherein the display control unit displays the first processing data and the second processing data in a chronological order.

3. The information processing apparatus according to claim 2 , wherein the display control unit is capable of changing a display range of at least one of the first processing data and the second processing data.

4. The information processing device according to any one of claims 1 to 3, characterized in that the display control unit causes the display device to display a first icon indicating the first processing data and a second icon indicating the second processing data, the second icon being different from the first icon.

5. 5. The information processing apparatus according to claim 4, wherein the first icon and the second icon have different colors.

6. 6. The information processing apparatus according to claim 4, wherein the first icon and the second icon have different shapes.

7. 2 . The information processing apparatus according to claim 1 , wherein the processing conditions include a recipe, which is a processing condition shared and used by a plurality of apparatuses, and an apparatus parameter, which is a processing condition not shared among the plurality of apparatuses.

8. 8. The information processing apparatus according to claim 1, further comprising a calculation unit that calculates processing data for each lot based on the processing data for each substrate acquired by the acquisition unit.

9. 9. The information processing apparatus according to claim 8, wherein the calculation unit calculates the processing data per lot based on one of statistical processing of a maximum value, a minimum value, an average value, a median value, and a standard deviation of the processing data per substrate acquired by the acquisition unit.

10. The information processing device according to any one of claims 1 to 9, characterized in that the display control unit causes the display device to display a first screen in which the first processing data and the second processing data are displayed in different areas of the display device.

11. The information processing device according to claim 10, characterized in that the display control unit selectively causes the display device to display the first screen and a second screen that displays the first processing data and the second processing data in the same area of ​​the display device.

12. The information processing device according to claim 10, characterized in that the display control unit causes the display device to simultaneously display the first screen and a second screen that displays the first processing data and the second processing data in the same area of ​​the display device.

13. the display control unit is capable of causing the display device to display a third screen in which third processing data indicating a result of the substrate processing under a first processing condition and fourth processing data indicating a result of the substrate processing under a second processing condition different from the first processing condition are displayed in mutually different areas of the display device, 11. The information processing apparatus according to claim 10, wherein the first screen and the third screen are selectively displayed on the display device.

14. 13. The information processing apparatus according to claim 1, wherein the first processing data and the second processing data are information including an operation result of the substrate processing apparatus and a state of the substrate after the substrate processing.

15. The information processing device described in Claim 13, characterized in that the third processing data and the fourth processing data are information including the operation results of the substrate processing device and the state of the substrate after substrate processing.

16. acquiring information including first processing data indicating a result of a substrate processing in a first substrate processing apparatus and second processing data indicating a result of a substrate processing in a second substrate processing apparatus different from the first substrate processing apparatus; a display control step of controlling the first processing data and the second processing data acquired in the acquisition step, and information indicating a difference between processing conditions used for the substrate processing, to be displayed in different areas of a display device; 13. An information processing method comprising:

17. A program for causing a computer to execute each step of the information processing method according to claim 16.

18. An information processing device according to any one of claims 1 to 15; a pattern forming device for forming a pattern on a substrate; The manufacturing system of the article, wherein the information processing device manages a plurality of devices including the pattern forming device.

19. forming a pattern on a substrate using the manufacturing system of claim 18; performing at least one process among oxidation, film formation, deposition, doping, planarization, etching, resist stripping, dicing, bonding, and packaging on the substrate on which the pattern has been formed in the process; A method for manufacturing an article, comprising manufacturing an article from the processed substrate.

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