CURABLE COMPOSITION, CURED PRODUCT, COLOR FILTER, SOLID-STATE IMAGING DEVICE, AND IMAGE DISPLAY DEVICE

Abstract

To provide a curable composition having excellent dispersion stability and excellent moisture resistance of the resulting cured product.SOLUTION: There are provided: a curable composition which comprises a pigment, a curable compound and a resin A having a constitutional unit represented by the formula (1), a constitutional unit represented by the formula (2), and a constitutional unit having a molecular weight of 1000 or less and represented by the formula (3); a cured product of the curable composition; a color filter provided with the cured product; and a solid state imaging element and an image display device provided with the color filter. In the formulas, X1 represents an (m+2)-valent organic group; X2 and X3 represent a trivalent organic group; m represents an integer of 1 to 4; L2s each independently represent O or NR; L3s each independently represent a carbonyl group, O or NR; R represents a hydrogen atom, an alkyl group or an aryl group; P1 represents a group having a polymer chain; R1s each independently represent a substituent; and R3 represents a group having a polymerizable group.SELECTED DRAWING: None

Description

[Technical field]

[0001] The present disclosure relates to a curable composition, a cured product, a color filter, a solid-state imaging device, and an image display device. [Background technology]

[0002] The widespread use of digital cameras and mobile phones with cameras has led to a large increase in demand for solid-state imaging elements such as charge-coupled device (CCD) image sensors. Color filters are used as key devices in displays and optical elements. Color filters usually have pixels (colored patterns) of the three primary colors of red, green, and blue, and play the role of separating transmitted light into the three primary colors. Color filters are formed using compositions that contain colorants such as pigments. As a dispersant used in a conventional pigment composition, for example, the one described in Patent Document 1 is known. Further, as a conventional composition for color filters, for example, there are Hardening The composition is known.

[0003] Patent Document 1: JP 2008-246469 A Patent Document 2: JP 2019-78878 A Patent Document 3: JP 2013-254127 A Summary of the Invention [Problem to be solved by the invention]

[0004] An object of the present disclosure is to provide a curable composition that has excellent dispersion stability and moisture resistance of the resulting cured product. Another problem to be solved by the embodiments of the present disclosure is to provide a cured product of the curable composition, a color filter including the cured product, or a solid-state imaging device or an image display device including the color filter. [Means for solving the problem]

[0005] Means for solving the above problems include the following aspects. <1> A curable composition comprising a pigment, a curable compound, and a resin A having a constitutional unit represented by formula (1), a constitutional unit represented by formula (2), and a constitutional unit having a molecular weight of 1,000 or less and represented by formula (3).

[0006] [ka]

[0007] In formulas (1) to (3), X 1 represents an organic group having a valence of (m+2), and X 2 and X 3 represents a trivalent organic group, m represents an integer of 1 to 4, L 2 each independently represents O or NR; L 3 each independently represents a carbonyl group, O, or NR, R represents a hydrogen atom, an alkyl group, or an aryl group, P 1 represents a group having a polymer chain, R 1 each independently represents a substituent; R 3 represents a group having a polymerizable group.

[0008] <2> R 1 are each independently an acid group or a salt of an acid group; <1> The curable composition according to claim 1. <3> R 1 are each independently a carboxy group or a salt of a carboxy group. <1> or <2> The curable composition according to claim 1. <4> X 1 is an (m+2)-valent organic group having an aromatic ring <1> ~ <3> 13. The curable composition according to claim 12, <5> m is 2 <1> ~ <4> 13. The curable composition according to claim 12, <6> L 2 is O or NH <1> ~ <5> 13. The curable composition according to claim 12, <7> X 2is a trivalent aliphatic hydrocarbon group having a thioether bond <1> ~ <6> 13. The curable composition according to claim 12, <8> P 1 is a group having a polyacrylic resin chain, a polyester chain, or a polyether chain. <1> ~ <7> 13. The curable composition according to claim 12, <9> L 3 is O or NR, and X 3 is a trivalent aliphatic hydrocarbon group <1> ~ <8> 13. The curable composition according to claim 12, <10> L 3 is a carbonyl group, and X 3 is a trivalent organic group having an aromatic ring <1> ~ <8> 13. The curable composition according to claim 12, <11> R 3 is a group having an ethylenically unsaturated group <1> ~ <10> 13. The curable composition according to claim 12, <12> Further comprising a polymerization initiator <1> ~ <11> 13. The curable composition according to claim 12, <13> The polymerization initiator contains an oxime compound. <12> The curable composition according to claim 1. <14> Further containing pigment derivatives <1> ~ <13> 13. The curable composition according to claim 12, <15> <1> ~ <14> 2. A cured product obtained by curing the curable composition according to claim 1. <16> <15> A color filter comprising the cured product according to claim 1. <17> <16> A solid-state imaging device having the color filter according to claim 1. <18> <16> An image display device comprising the color filter according to claim 1. Effect of the Invention

[0009] According to an embodiment of the present disclosure, there is provided a curable composition that has excellent dispersion stability and moisture resistance of the resulting cured product. Further, another embodiment according to the present disclosure provides a cured product of the curable composition, a color filter including the cured product, or a solid-state imaging device or an image display device including the color filter. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0010] The contents of the present disclosure will be described in detail below. The following description of the components may be based on a representative embodiment of the present disclosure, but the present disclosure is not limited to such an embodiment. In the present disclosure, the use of "to" indicating a numerical range means that the numerical values ​​before and after it are included as the lower limit and upper limit. In the numerical ranges described in the present disclosure in stages, the upper or lower limit value described in one numerical range may be replaced with the upper or lower limit value of another numerical range described in stages. In addition, in the numerical ranges described in the present disclosure, the upper or lower limit value of the numerical range may be replaced with a value shown in the examples. Furthermore, in the present disclosure, when a plurality of substances corresponding to each component are present in the composition, the amount of each component in the composition means the total amount of the corresponding substances present in the composition, unless otherwise specified. In addition, in the description of groups (atomic groups) in the present disclosure, descriptions that do not indicate whether they are substituted or unsubstituted include those that have no substituents as well as those that have a substituent. For example, an "alkyl group" includes not only an alkyl group that has no substituents (unsubstituted alkyl groups) but also an alkyl group that has a substituent (substituted alkyl groups). In this disclosure, unless otherwise specified, "Me" represents a methyl group, "Et" represents an ethyl group, "Pr" represents a propyl group, "Bu" represents a butyl group, and "Ph" represents a phenyl group. In the present disclosure, "(meth)acrylic" is a term used as a concept that includes both acrylic and methacrylic, and "(meth)acryloyl" is a term used as a concept that includes both acryloyl and methacryloyl. In addition, in the present disclosure, the term "process" refers not only to an independent process, but also to a process that cannot be clearly distinguished from other processes, as long as the intended purpose of the process is achieved. In the present disclosure, the term "total solid content" refers to the total mass of the components excluding the solvent from the entire composition of the composition. Also, as described above, the "solid content" refers to the components excluding the solvent, and may be, for example, solid or liquid at 25°C. In the present disclosure, the term "main chain" refers to the relatively longest bonding chain in the molecule of the polymer compound constituting the resin, and when the bonding chain has a ring structure, the entire ring structure is regarded as the main chain, and the term "side chain" refers to an atomic group branched off from the main chain. In the present disclosure, "mass %" and "weight %" are synonymous, and "parts by mass" and "parts by weight" are synonymous. Furthermore, in the present disclosure, combinations of two or more preferred embodiments are more preferred embodiments. In addition, unless otherwise specified, the weight average molecular weight (Mw) and number average molecular weight (Mn) in the present disclosure are molecular weights detected by a gel permeation chromatography (GPC) analyzer using columns of TSKgel GMHxL, TSKgel G4000HxL, or TSKgel G2000HxL (all product names manufactured by Tosoh Corporation) in a solvent of THF (tetrahydrofuran) and a differential refractometer, and converted using polystyrene as a standard substance. In the present disclosure, a pigment refers to a colorant that is difficult to dissolve in a solvent. For example, the solubility of the pigment in 100 g of water at 23° C. and 100 g of propylene glycol monomethyl ether acetate at 23° C. is preferably 0.1 g or less, more preferably 0.01 g or less. The present disclosure will be described in detail below.

[0011] (Curable composition) The curable composition according to the present disclosure contains a pigment, a curable compound, and a resin A having a constitutional unit represented by formula (1), a constitutional unit represented by formula (2), and a constitutional unit having a molecular weight of 1,000 or less and represented by formula (3).

[0012] [ka]

[0013] In formulas (1) to (3), X 1 represents an organic group having a valence of (m+2), and X 2 and X 3 represents a trivalent organic group, m represents an integer of 1 to 4, L 2 each independently represents O or NR; L 3 each independently represents a carbonyl group, O, or NR, R represents a hydrogen atom, an alkyl group, or an aryl group, P 1 represents a group having a polymer chain, R 1 each independently represents a substituent; R 3 represents a group having a polymerizable group.

[0014] The curable composition according to the present disclosure can be preferably used as a curable composition for a solid-state imaging device. In addition, the curable composition according to the present disclosure can be preferably used as a curable composition for a color filter. Specifically, the curable composition can be preferably used as a curable composition for forming pixels of a color filter, and more preferably used as a curable composition for forming pixels of a color filter used in a solid-state imaging device.

[0015] In recent years, the number of pixels in image sensors has increased, and patterns have become finer and thinner. Accordingly, the present inventors have found that conventional curable compositions containing pigments may not have sufficient dispersion stability and moisture resistance of the resulting cured products. Therefore, the present inventors conducted extensive research and found that the above-mentioned embodiment provides excellent dispersion stability and moisture resistance of the resulting cured product. It is presumed that by including resin A having a structural unit represented by the above formula (1), a structural unit represented by the above formula (2), and a structural unit having a molecular weight of 1,000 or less and represented by the above formula (3), the composition has excellent moisture resistance without impairing dispersibility. In addition, since Resin A has a structural unit having a polymerizable group (structural unit represented by the above formula (3)) inside the main chain of the resin, and the molecular weight of the structural unit represented by the above formula (3) is 1,000 or less, it is presumed that groups that are easily hydrolyzed in the main chain, polymerizable group, etc. are located relatively inside the resin, and the resulting cured product has excellent moisture resistance.

[0016] In addition, the curable composition according to the present disclosure contains resin A having a structural unit represented by formula (1) above, a structural unit represented by formula (2) above, and a structural unit having a molecular weight of 1,000 or less and represented by formula (3) above. It is presumed that the polar structures of resin A result in excellent developability and excellent adhesion of the resulting cured product.

[0017] Hereinafter, details of each component contained in the curable composition according to the present disclosure and physical property values ​​and the like will be described.

[0018] <Resin A> The curable composition according to the present disclosure contains a resin A having a constitutional unit represented by the above formula (1), a constitutional unit represented by the above formula (2), and a constitutional unit having a molecular weight of 1,000 or less and represented by the above formula (3).

[0019] -Constituent unit represented by formula (1)- Resin A has a constitutional unit represented by the following formula (1).

[0020] [ka]

[0021] In formula (1), X 1 represents an (m+2)-valent organic group, m represents an integer of 1 to 4, R 1 each independently represents a substituent.

[0022] R in formula (1) 1 are each independently preferably an acid group or a salt of an acid group from the viewpoints of developability, dispersion stability, and the moisture resistance and adhesion of the resulting cured product. As the acid group, from the viewpoints of developability, dispersion stability, and the moisture resistance and adhesion of the resulting cured product, a carboxy group, a sulfo group, or a phosphonic acid group is preferable, a carboxy group or a sulfo group is more preferable, and a carboxy group is particularly preferable. The counter cation forming the salt in the salt of the acid group is not particularly limited, but is preferably an alkali metal ion, an alkaline earth metal ion, or a primary to quaternary ammonium ion, more preferably an alkali metal ion or a quaternary ammonium ion, and particularly preferably an alkali metal ion. In addition, the counter cation may be a monovalent cation or a divalent or higher cation as long as the compound as a whole is electrically neutral, but is preferably a monovalent cation. Among them, R 1 From the viewpoints of developability, dispersion stability, and the moisture resistance and adhesion of the resulting cured product, a carboxy group or a salt of a carboxy group is particularly preferred. In formula (1), m is preferably an integer of 1 to 3, more preferably 1 or 2, and particularly preferably 2, from the viewpoints of developability, dispersion stability, and the moisture resistance and adhesion of the resulting cured product.

[0023] X in formula (1) 1 From the viewpoint of moisture resistance of the obtained cured product, the alkyl group is preferably an (m+2)-valent organic group having an aliphatic ring or an aromatic ring, more preferably an (m+2)-valent organic group having an aromatic ring, even more preferably an (m+2)-valent hydrocarbon group having a cyclohexane ring structure or a benzene ring structure, and particularly preferably an (m+2)-valent hydrocarbon group having a benzene ring structure. Preferred examples of the (m+2)-valent hydrocarbon group having an aliphatic ring structure or an aromatic ring structure include the groups shown below. The wavy line portion represents a carbonyl group in formula (1) or R 1 represents the bonding position with

[0024] [ka]

[0025] In addition, examples of the structural unit represented by formula (1) include a structural unit formed from an aromatic tricarboxylic acid anhydride, a structural unit formed from an aromatic tetracarboxylic acid anhydride, etc. Examples of the aromatic tricarboxylic acid anhydride and the aromatic tetracarboxylic acid anhydride include compounds having the following structures.

[0026] [ka]

[0027] In the above formula, Q 1 represents a single bond, -O-, -CO-, -COOCH2CH2OCO-, -SO2-, -C(CF3)2-, a group represented by the following formula (Q-1) or a group represented by the following formula (Q-2).

[0028] [ka]

[0029] Specific examples of aromatic tricarboxylic anhydrides include benzenetricarboxylic anhydride (1,2,3-benzenetricarboxylic anhydride, trimellitic anhydride [1,2,4-benzenetricarboxylic anhydride], etc.), naphthalenetricarboxylic anhydride (1,2,4-naphthalenetricarboxylic anhydride, 1,4,5-naphthalenetricarboxylic anhydride, 2,3,6-naphthalenetricarboxylic anhydride, 1,2,8-naphthalenetricarboxylic anhydride, etc.), 3,4,4'-benzophenonetricarboxylic anhydride, 3,4,4'-biphenylethertricarboxylic anhydride, 3,4,4'-biphenyltricarboxylic anhydride, 2,3,2'-biphenyltricarboxylic anhydride, 3,4,4'-biphenylmethanetricarboxylic anhydride, and 3,4,4'-biphenylsulfonetricarboxylic anhydride. Specific examples of aromatic tetracarboxylic acid anhydrides include pyromellitic dianhydride, ethylene glycol ditrimellitic anhydride ester, propylene glycol ditrimellitic anhydride ester, butylene glycol ditrimellitic anhydride ester, 3,3',4,4'-benzophenone tetracarboxylic acid dianhydride, 3,3',4,4'-biphenylsulfone tetracarboxylic acid dianhydride, 1,4,5,8-naphthalene tetracarboxylic acid dianhydride, 2,3,6,7-naphthalene tetracarboxylic acid dianhydride, 3,3',4,4'-biphenyl ether tetracarboxylic acid dianhydride, 3,3',4,4'-dimethyldiphenylsilane tetracarboxylic acid dianhydride, 3,3',4,4'-tetraphenylsilane tetracarboxylic acid dianhydride, 1,2,3,4-furan tetracarboxylic acid dianhydride, 4,4'-bis(3,4-dicarboxyphenoxy)diphenyl sulfide dianhydride, 4,4'-bis(3,4-dicarboxyphenoxy)diphenylsulfone dianhydride. dianhydride, 4,4'-bis(3,4-dicarboxyphenoxy)diphenylpropane dianhydride, 3,3',4,4'-perfluoroisopropylidenediphthalic dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, bis(phthalic acid)phenylphosphine oxide dianhydride, p-phenylene-bis(triphenylphthalic acid) dianhydride, m-phenylene-bis(triphenylphthalic acid) dianhydride, bis(triphenylphthalic acid)-4,4'-diphenyl ether dianhydride, bis(triphenylphthalic acid)-4,4'-diphenylmethane dianhydride, 9,9-bis(3,4-dicarboxyphenyl)fluorene dianhydride, 9,9-bis[4-(3,4-dicarboxyphenoxy)phenyl]fluorene dianhydride, 3,4-dicarboxy-1,2,3,4-tetrahydro-1-naphthalene succinic dianhydride, and 3,4-dicarboxy-1,2,3,4-tetrahydro-6-methyl-1-naphthalene succinic dianhydride.

[0030] Specific examples of the group in which two carbonyl groups have been removed from the constitutional unit represented by formula (1) include a group represented by formula (Ar-1), a group represented by formula (Ar-2), and a group represented by formula (Ar-3).

[0031] [ka]

[0032] In formula (Ar-1), n1 represents an integer of 1 to 4, is preferably 1 or 2, and is more preferably 2. In formula (Ar-2), n2 represents an integer of 1 to 8, preferably an integer of 1 to 4, more preferably 1 or 2, and even more preferably 2. In formula (Ar-3), n3 and n4 each independently represent an integer of 0 to 4, and are preferably an integer of 0 to 2, more preferably 1 or 2, and even more preferably 1. However, at least one of n3 and n4 is an integer of 1 or greater. In formula (Ar-3), Q 1 represents a single bond, -O-, -CO-, -COOCH2CH2OCO-, -SO2-, -C(CF3)2-, a group represented by the above formula (Q-1) or a group represented by the above formula (Q-2).

[0033] Resin A may have one type of constitutional unit represented by the above formula (1) alone, or may have two or more types. The content of the structural unit represented by the above formula (1) is preferably 0.1% by mass to 50% by mass, more preferably 1% by mass to 30% by mass, even more preferably 2% by mass to 20% by mass, and particularly preferably 6% by mass to 15% by mass, based on the total mass of Resin A, from the viewpoints of developability, dispersion stability, and the moisture resistance and adhesion of the resulting cured product.

[0034] -Constituent unit represented by formula (2)- Resin A has a constitutional unit represented by the following formula (2).

[0035] [ka]

[0036] In formula (2), X 2 represents a trivalent organic group, L2 each independently represents O or NR, R represents a hydrogen atom, an alkyl group, or an aryl group, P 1 represents a group having a polymer chain.

[0037] L in Equation (2) 2 are each independently preferably O or NH, and more preferably O, from the viewpoint of the moisture resistance and adhesion of the resulting cured product. In addition, the two L in Eq. (2) 2 are preferably the same group. X in formula (2) 2 may be an aliphatic group, an aromatic group, or a combination thereof, but is preferably an aliphatic group from the viewpoint of the moisture resistance and adhesion of the resulting cured product. In addition, X in formula (2) 2 From the viewpoint of the moisture resistance and adhesion of the resulting cured product, is preferably a trivalent group having a sulfur atom, more preferably a trivalent group having a thioether bond, and particularly preferably a trivalent aliphatic group having a thioether bond. Furthermore, X in formula (2) 2 From the viewpoint of moisture resistance and adhesion of the resulting cured product, the number of carbon atoms is preferably 1 to 30, more preferably 2 to 15, even more preferably 3 to 8, particularly preferably 3 to 6, and most preferably 3. Among them, X in formula (2) 2 From the viewpoint of moisture resistance and adhesion of the resulting cured product, is preferably a group represented by the following formula (X-1), and more preferably a group represented by the following formula (X-2).

[0038] [ka]

[0039] In formula (X-1) and formula (X-2), L X represents an alkylene group having 1 to 8 carbon atoms, and the wavy line represents L 2 Or P 1represents the bonding position with In addition, in the formula (X-1) and the formula (X-2), P in the formula (2) 1 and a sulfur atom are preferably bonded to each other.

[0040] P in Equation (2) 1 From the viewpoints of developability, dispersion stability, and the moisture resistance and adhesion of the obtained cured product, the alkyl group is preferably a group having an acrylic resin chain, a polyester chain, a polyether chain, or a polymer chain consisting of a combination of two or more of these, more preferably a group having an acrylic resin chain, a polyester chain, or a polyether chain, and particularly preferably a group having an acrylic resin chain. From the viewpoints of developability, dispersion stability, and moisture resistance and adhesion of the resulting cured product, the acrylic resin chain is preferably an acrylic resin chain obtained by copolymerizing two or more alkyl (meth)acrylate compounds, more preferably an acrylic resin chain obtained by copolymerizing n-butyl (meth)acrylate with another alkyl (meth)acrylate compound, and particularly preferably an acrylic resin chain obtained by copolymerizing n-butyl (meth)acrylate with methyl (meth)acrylate or ethyl (meth)acrylate. P in Equation (2) 1 The weight average molecular weight of the polymer chain in is preferably 500 to 20,000 from the viewpoints of developability, dispersion stability, and moisture resistance and adhesion of the resulting cured product. The lower limit is more preferably 600 or more, and even more preferably 1,000 or more. The upper limit is more preferably 10,000 or less, even more preferably 5,000 or less, and particularly preferably 3,000 or less. In addition, P in Eq. (2) 1 and X in formula (2) 2 may be bonded via a linking group or directly, but is preferably bonded directly. The number of atoms in the linking group is preferably 1 to 30, and more preferably 2 to 20.

[0041] P in Equation (2) 1The polymer chain in is preferably a polymer chain having a structural unit represented by any one of the following formulas (P-1) to (P-5), and more preferably a polymer chain having a structural unit represented by the following formula (P-5).

[0042] [ka]

[0043] In the above formula, R P1 and R P2 Each of R represents an alkylene group. P1 and R P2 The alkylene group represented by the formula (I) is preferably a linear or branched alkylene group having 1 to 20 carbon atoms, more preferably a linear or branched alkylene group having 2 to 16 carbon atoms, and even more preferably a linear or branched alkylene group having 3 to 12 carbon atoms. In the above formula, R P3 represents a hydrogen atom or a methyl group. In the above formula, L P1 represents a single bond or an arylene group; L P2 represents a single bond or a divalent linking group. P1 is preferably a single bond. P2 Examples of the divalent linking group represented by the formula (I) include an alkylene group (preferably an alkylene group having 1 to 12 carbon atoms), an arylene group (preferably an arylene group having 6 to 20 carbon atoms), -NH-, -SO-, -SO2-, -CO-, -O-, -COO-, -OCO-, -S-, -NHCO-, -CONH-, and groups formed by combining two or more of these. R P4 represents a hydrogen atom or a substituent, examples of which include a hydroxy group, a carboxy group, an alkyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a heteroaryloxy group, an alkylthioether group, an arylthioether group, a heteroarylthioether group, and an ethylenically unsaturated group.

[0044] In addition, P in Eq. (2) 1It is also preferable that the polymer chain in has a structural unit having an acid group. Examples of the acid group include a carboxy group, a phosphate group, a sulfo group, and a phenolic hydroxy group. According to this embodiment, the dispersibility of the pigment in the composition can be further improved. Furthermore, the developability can also be further improved. The content of the structural unit having an acid group is preferably 1% by mass to 30% by mass, more preferably 2% by mass to 20% by mass, and even more preferably 3% by mass to 10% by mass, based on the total mass of the polymer chain.

[0045] Resin A may have one type of constitutional unit represented by the above formula (2) alone, or may have two or more types. The content of the structural unit represented by the above formula (2) is preferably 50% by mass to 98% by mass, more preferably 60% by mass to 95% by mass, and particularly preferably 70% by mass to 90% by mass, based on the total mass of resin A, from the viewpoints of developability, dispersion stability, and the moisture resistance and adhesion of the resulting cured product.

[0046] -Constituent unit represented by formula (3)- Resin A has a molecular weight of 1,000 or less and has a constitutional unit represented by the following formula (3).

[0047] [ka]

[0048] In formula (3), X 3 represents a trivalent organic group, L 3 each independently represents a carbonyl group, O, or NR, R represents a hydrogen atom, an alkyl group, or an aryl group, R 3 represents a group having a polymerizable group.

[0049] In formula (3), from the viewpoint of the moisture resistance of the resulting cured product, L 3 is O or NR, and X 3 is preferably a trivalent aliphatic group, and L 3 is O or NH, and X 3is more preferably a trivalent aliphatic group having a thioether bond, and L 3 is particularly preferably O. In formula (3), L 3 When is O or NR, X 3 A preferred embodiment of the present invention is X in formula (2). 2 This is similar to the preferred embodiment of the above. In addition, L in formula (3) 3 From the viewpoint of production suitability, is preferably O or NR, more preferably O or NH, and particularly preferably O. Furthermore, from the viewpoint of the moisture resistance of the resulting cured product, the resin A is 3 A structural unit represented by formula (3) in which L is O or NR 3 It is preferable that the copolymer has both of the constitutional units represented by the formula (3) in which

[0050] In addition, in the formula (3), from the viewpoint of developability and dispersion stability, L 3 is a carbonyl group, and X 3 is preferably a trivalent organic group having an aromatic ring. In formula (3), L 3 When is a carbonyl group, X 3 A preferred embodiment of the formula (1) is that m is 1 and X 1 When X is a (m+2)-valent hydrocarbon group having an aromatic ring structure, 1 This is similar to the preferred embodiment of the above.

[0051] R in Equation (3) 3 From the viewpoint of moisture resistance of the resulting cured product, it is preferable that the group is a group having an ethylenically unsaturated group. Examples of the ethylenically unsaturated group include a (meth)acryloxy group, a styryl group (vinyl aryl group), a (meth)acrylamide group, an allyl group, a vinyl ether group, a vinyl ester group, etc. Among them, from the viewpoint of the moisture resistance of the obtained cured product, a (meth)acryloxy group, a styryl group, a (meth)acrylamide group, or an allyl group is preferable, a (meth)acryloxy group, a styryl group, or a (meth)acrylamide group is more preferable, and a (meth)acryloxy group or a styryl group is particularly preferable. R in Equation (3) 3 The number of polymerizable groups that the copolymer has is not particularly limited, but from the viewpoint of the moisture resistance and adhesion of the resulting cured product, it is preferably 1 to 10, more preferably 1 to 6, even more preferably 1 or 2, and particularly preferably 1.

[0052] R in Equation (3) 3 In the formula (3), the polymerizable group is X 3 may be bonded directly to the ring or via a linking group. The number of carbon atoms in the linking group is not particularly limited, but from the viewpoints of developability, dispersion stability, and moisture resistance of the resulting cured product, it is preferably 1 to 40, more preferably 1 to 20, even more preferably 2 to 9, and particularly preferably 3 to 5. In addition, the linking group is preferably an aliphatic group, and is preferably a divalent aliphatic hydrocarbon group or a group in which one or more divalent aliphatic hydrocarbon groups are linked to one or more structures selected from the group consisting of an ether bond, an ester bond, an amide bond, a urethane bond, and a urea bond. Furthermore, the linking group may have a substituent such as a hydroxy group, an amino group, etc. Among these, from the viewpoints of developability, dispersion stability, and moisture resistance of the obtained cured product, a hydroxy group is preferred as the substituent. Furthermore, the minimum number of atoms connecting the main chain of resin A and the polymerizable group is not particularly limited, but from the viewpoints of developability and dispersion stability, it is preferably 1 to 40, more preferably 1 to 15, even more preferably 1 to 9, and particularly preferably 1 to 5.

[0053] The molecular weight of the constitutional unit represented by the above formula (3) is preferably 100 to 1,000, more preferably 100 to 700, and particularly preferably 100 to 500, from the viewpoints of developability, dispersion stability, and the moisture resistance and adhesion of the resulting cured product.

[0054] Resin A may have one type of constitutional unit represented by the above formula (3) alone, or may have two or more types. The content of the structural unit represented by the above formula (3) is preferably 0.1% by mass to 50% by mass, more preferably 0.5% by mass to 20% by mass, even more preferably 1% by mass to 15% by mass, and particularly preferably 2% by mass to 10% by mass, based on the total mass of resin A, from the viewpoints of developability, dispersion stability, and the moisture resistance and adhesion of the resulting cured product.

[0055] Resin A may have other structural units in addition to the structural units represented by the above formulas (1) to (3). The other constituent units are not particularly limited, and examples thereof include constituent units formed from polyvalent carboxylic acid compounds, polyhydric alcohol compounds, polyvalent amine compounds, hydroxycarboxylic acid compounds, polyvalent isocyanate compounds, and the like. Resin A may have one type of the other structural unit alone, two or more types, or none. The total content of the structural units represented by the above formulas (1) to (3) is preferably 50% by mass or more, more preferably 80% by mass or more, even more preferably 90% by mass or more, and particularly preferably 95% to 100% by mass, based on the total mass of resin A, from the viewpoints of developability, dispersion stability, and the moisture resistance and adhesion of the resulting cured product.

[0056] The terminal structure of resin A is not particularly limited, and may be a known terminal structure depending on the reaction termination conditions (quenching conditions) and isolation conditions during the production of resin A. Examples of the terminal structure include a hydrogen atom, a hydroxyl group, an alkoxy group, a carboxyl group, and an amino group.

[0057] Specific examples of the resin A include, but are not limited to, those shown below.

[0058] [ka]

[0059] [ka]

[0060] [ka]

[0061] In the above dispersants A1 to A20, B1 to B23, and C1 to C3, the mass proportion of the structural unit represented by formula (3) in the resin was calculated on the assumption that one polymerizable group was introduced into each structural unit. The above-mentioned structural units are shown below.

[0062] [ka]

[0063] [ka]

[0064] [ka]

[0065] [ka]

[0066] [ka]

[0067] [ka]

[0068] [ka]

[0069] [ka]

[0070] [ka]

[0071] [ka]

[0072] [ka]

[0073] As described above, the structural units 3-A to 3-H may further include not only a structural unit having a group having a polymerizable group introduced into one of the two carboxy groups on the aromatic ring, but also a structural unit having a group having a polymerizable group introduced into each of the two carboxy groups on the aromatic ring. In addition, in the dispersants A1 to A20, B1 to B23, and C1 to C3, the structural units 3-A to 3-H are presumed to be mixtures of the structural units shown above.

[0074] The weight average molecular weight (Mw) of Resin A is preferably 3,000 or more, more preferably 3,000 to 30,000, still more preferably 3,000 to 15,000, and particularly preferably 5,000 to 10,000, from the viewpoints of developability, dispersion stability, and adhesion of the resulting cured product.

[0075] The ethylenically unsaturated bond value (also referred to as "C=C value") of Resin A is preferably 0.01 mmol / g to 2.0 mmol / g, more preferably 0.1 mmol / g to 1.5 mmol / g, still more preferably 0.1 mmol / g to 1.0 mmol / g, and particularly preferably 0.15 mmol / g to 0.6 mmol / g, from the viewpoints of developability, curability, and adhesion of the resulting cured product. The ethylenically unsaturated bond value of Resin A represents the molar amount of ethylenically unsaturated bonds per 1 g of the solid content of Resin A, and is measured by the following method.

[0076] <<Sample Preparation Method>> Weigh 0.2 g of propyl benzoate (manufactured by Fujifilm Wako Pure Chemical Corporation, product number 164-04893), mix it with 50 g of deuterated dimethyl sulfoxide (deuterated DMSO) (manufactured by Fujifilm Wako Pure Chemical Corporation, product number 534-74585) to prepare deuterated DMSO containing an internal standard. Next, weigh 0.03 g of Resin A (in terms of solid content), mix it with 1.7 g of deuterated DMSO containing an internal standard to prepare a measurement sample.

[0077] <<Measurement Method of Nuclear Magnetic Resonance Spectroscopy (NMR)>> Transfer the measurement sample to an NMR sample tube and measure NMR ( 1 1H-NMR, 400 MHz, DMSO, method number of integration times 16 times).

[0078] <<NMR Spectrum Analysis Method>> An internal target peak (propyl benzoate) was obtained from 7.90 ppm to 8.04 ppm, and the bias and slope were adjusted to set the integral value to 2. A peak of an ethylenically unsaturated group was obtained from 6.25 ppm to 6.38 ppm, and the bias and slope were adjusted to record the integral value.

[0079] <<Calculation method>> The ethylenically unsaturated bond value was calculated by the following formula: Note that, for the ethylenically unsaturated bond value in the present disclosure, an average value of three values ​​that were separately adjusted and measured was used. Ethylenically unsaturated bond value [mmol / g] = (integral value of ethylenically unsaturated group × weight value of deuterated DMSO containing internal standard [g] × internal standard concentration [mmol / g]) / (weight value of resin A [g])

[0080] From the viewpoint of developability, the acid value of Resin A is preferably from 20 mgKOH / g to 100 mgKOH / g, more preferably from 30 mgKOH / g to 80 mgKOH / g, and particularly preferably from 30 mgKOH / g to 60 mgKOH / g.

[0081] The acid value of resin A represents the mass of potassium hydroxide required to neutralize the acidic components per 1 g of solid content. The acid value of resin A is measured as follows. That is, a measurement sample is dissolved in a mixed solvent of tetrahydrofuran / water = 9 / 1 (mass ratio), and the obtained solution is neutralized and titrated with a 0.1 mol / L aqueous sodium hydroxide solution at 25 ° C. using a potentiometric titrator (product name: AT-510, manufactured by Kyoto Electronics Manufacturing Co., Ltd.). The inflection point of the titration pH curve is set as the titration end point, and the acid value is calculated by the following formula. A=56.11×Vs×0.5×f / w A: Acid value (mgKOH / g) Vs: Amount of 0.1 mol / L sodium hydroxide solution required for titration (mL) f: Potency of 0.1 mol / L sodium hydroxide solution w: Measurement sample mass (g) (solid content equivalent)

[0082] The curable composition according to the present disclosure may contain one type of resin A alone, or may contain two or more types of resin A. The content of the resin A is preferably 1% by mass to 50% by mass based on the total solid content of the curable composition. The lower limit is more preferably 3% by mass or more, further preferably 5% by mass or more, and particularly preferably 10% by mass or more. The upper limit is more preferably 45% by mass or less, and particularly preferably 40% by mass or less.

[0083] <Pigments> The curable composition according to the present disclosure includes a pigment. Examples of the pigment include white pigments, black pigments, chromatic pigments, and near-infrared absorbing pigments. In the present disclosure, the white pigment includes not only pure white but also light gray pigments close to white (e.g., grayish white, light gray, etc.). The pigment may be either an inorganic pigment or an organic pigment, and is preferably an organic pigment because it is easier to improve the dispersion stability. The pigment preferably has a maximum absorption wavelength in the wavelength range of 400 nm to 2,000 nm, and more preferably has a maximum absorption wavelength in the wavelength range of 400 nm to 700 nm. In addition, when a pigment (preferably a chromatic pigment) having a maximum absorption wavelength in the wavelength range of 400 nm to 700 nm is used, the curable composition according to the present disclosure can be preferably used as a curable composition for forming a colored layer in a color filter. Examples of the colored layer include a red colored layer, a green colored layer, a blue colored layer, a magenta colored layer, a cyan colored layer, and a yellow colored layer.

[0084] The average primary particle diameter of the pigment is preferably 1 nm to 200 nm. The lower limit is preferably 5 nm or more, more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less. If the average primary particle diameter of the pigment is within the above range, the dispersion stability of the pigment in the curable composition is good. In the present disclosure, the primary particle diameter of the pigment can be obtained from a photograph obtained by observing the primary particles of the pigment with a transmission electron microscope. Specifically, the projected area of ​​the primary particles of the pigment is obtained, and the corresponding circle equivalent diameter is calculated as the primary particle diameter of the pigment. In the present disclosure, the average primary particle diameter is the arithmetic average value of the primary particle diameters of 400 primary particles of the pigment. In addition, the primary particles of the pigment refer to independent particles without aggregation.

[0085] - Chromatic pigments - The chromatic pigment is not particularly limited, and known chromatic pigments can be used. Examples of chromatic pigments include pigments having a maximum absorption wavelength in the wavelength range of 400 nm to 700 nm. Examples include yellow pigments, orange pigments, red pigments, green pigments, purple pigments, and blue pigments. Specific examples of these include the following.

[0086] Color Index (CI) Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86 ,93,94,95,97,98,100,101,104,106,108,109,110,113,114,115,116,117,118,119,120,123,125,126,127,128,129,137,138,139,147,148,150,1 51,152,153,154,155,156,161,162,164,166,167,168,169,170,171,172,173,174,175,176,177,179,180,181,182,185,187,188,193,194,199,213,214,215,228 (direct-linked quinophthalone dimers described in International Publication No. 2013 / 098836), 231,232 (methine-based), 233 (quinoline-based), 234 (aminoketone-based), 235 (aminoketone-based), 236 (aminoketone-based), etc. (all yellow pigments), CI Pigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73, etc. (orange pigments) CIPigment Red 1,2,3,4,5,6,7,9,10,14,17,22,23,31,38,41,48:1,48:2,48:3,48:4,49,49:1,49:2,52:1,52:2 ,53:1,57:1,60:1,63:1,66,67,81:1,81:2,81:3,83,88,90,105,112,119,122,123,144,146,149, 150,155,166,168,169,170,171,172,175,176,177,178,179,184,185,187,188,190,200,202,206,207,208,209,210,216,220,224,226,242,246,254,255,264,270,272,279,294 (xanthene, Organo Ultramarine, Bluish Red), 295 (monoazo), 296 (diazo), 297 (aminoketone), etc. (above, red pigments), CI Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, etc. (green pigments), CI Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane type), 61 (xanthene type), etc. (purple pigments) CI Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 60, 64, 66, 79, 80, 87 (monoazo type), 88 (methine type), etc. (above, blue pigments).

[0087] As the green pigment, a halogenated zinc phthalocyanine compound having an average of 10 to 14 halogen atoms, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms in one molecule can be used. Specific examples include compounds described in International Publication No. 2015 / 118720, compounds described in Chinese Patent Publication No. 106909027, and phthalocyanine compounds having a phosphate ester as a ligand. In addition, as the green pigment, the green pigment described in JP-A-2019-8014 or JP-A-2018-180023 may be used.

[0088] As the blue pigment, an aluminum phthalocyanine compound having a phosphorus atom can also be used. Specific examples thereof include the compounds described in paragraphs 0022 to 0030 of JP-A No. 2012-247591 and paragraph 0047 of JP-A No. 2011-157478.

[0089] In addition, as the yellow pigment, the pigments described in JP 2017-201003 A and the pigments described in JP 2017-197719 A can be used. In addition, as the yellow pigment, a metal azo pigment containing at least one anion selected from the group consisting of azo compounds represented by the following formula (Y) and azo compounds having a tautomeric structure thereof, two or more metal ions, and a melamine compound can also be used.

[0090] [ka]

[0091] In formula (Y), R Y1 and R Y2 each independently represents -OH or -NR Y5 R Y6 R Y3 and R Y4 each independently represents ═O or ═NR Y7 R Y5 ~R Y7 each independently represents a hydrogen atom or an alkyl group. R Y5 ~R Y7 The number of carbon atoms of the alkyl group represented by is preferably 1 to 10, more preferably 1 to 6, and further preferably 1 to 4. The alkyl group may be linear, branched, or cyclic, preferably linear or branched, and more preferably linear. The alkyl group may have a substituent. Preferred examples of the substituent include a halogen atom, a hydroxy group, an alkoxy group, a cyano group, and an amino group.

[0092] For the above metal azo pigments, reference can be made to paragraphs 0011 to 0062, 0137 to 0276 of JP 2017-171912 A, paragraphs 0010 to 0062, 0138 to 0295 of JP 2017-171913 A, paragraphs 0011 to 0062, 0139 to 0190 of JP 2017-171914 A, and paragraphs 0010 to 0065, 0142 to 0222 of JP 2017-171915 A, the contents of which are incorporated herein by reference.

[0093] As the yellow pigment, a quinophthalone dimer represented by the following formula (Q) can also be suitably used. Furthermore, the quinophthalone dimer described in Japanese Patent No. 6443711 can also be suitably used.

[0094] [ka]

[0095] In formula (Q), X1~X 16 each independently represents a hydrogen atom or a halogen atom, and Z represents an alkylene group having 1 to 3 carbon atoms.

[0096] As yellow pigments, JP 2018-203798 A, JP 2018-62578 A, Patent No. 6432077 A, Patent No. 6432076 A, JP 2018-155881 A, JP 2018-111757 A, JP 2018-40835 A, JP 2017-197640 A, JP 2016-145282 A, JP 2014-85565 A, JP 2014-21139 A, JP 2013-209614 A, JP 2013-209435 A Quinophthalone pigments described in JP-A-2013-181015, JP-A-2013-61622, JP-A-2013-54339, JP-A-2013-32486, JP-A-2012-226110, JP-A-2008-74987, JP-A-2008-81565, JP-A-2008-74986, JP-A-2008-74985, JP-A-2008-50420, JP-A-2008-31281, or JP-B-48-32765 can also be suitably used.

[0097] In addition, as the yellow pigment, the quinophthalone compound described in paragraphs 0011 to 0034 of JP-A-2013-54339, the quinophthalone compound described in paragraphs 0013 to 0058 of JP-A-2014-26228, the yellow pigment described in JP-A-2019-8014, the quinophthalone compound described in Japanese Patent No. 6607427, the compound described in Korean Patent Publication No. 10-2014-0034963, the compound described in JP-A-2017-095706, the compound described in Taiwan Patent Application Publication No. 201920495, the compound described in Japanese Patent No. 6607427, and the like can also be used. In addition, the compound described in JP-A-2018-62644 can also be used as a yellow pigment. This compound can also be used as a pigment derivative. Furthermore, as described in JP 2018-155881 A, CI Pigment Yellow 129 may be added for the purpose of improving weather resistance.

[0098] As the red pigment, a diketopyrrolopyrrole pigment having at least one bromine atom substituted in the structure described in JP 2017-201384 A, a diketopyrrolopyrrole pigment described in paragraphs 0016 to 0022 of Japanese Patent No. 6248838 A, a diketopyrrolopyrrole compound described in WO 2012 / 102399 A, a diketopyrrolopyrrole compound described in WO 2012 / 117965 A, a naphthol azo compound described in JP 2012-229344 A, and the like can also be used. Furthermore, as the red pigment, the red pigments described in Japanese Patent No. 6516119 or Japanese Patent No. 6525101 can also be suitably used. In addition, as the red pigment, a compound having a structure in which an aromatic ring group, in which a group in which an oxygen atom, a sulfur atom or a nitrogen atom is bonded to an aromatic ring, is bonded to a diketopyrrolopyrrole skeleton, can also be used. As such a compound, a compound represented by formula (DPP1) is preferable, and a compound represented by formula (DPP2) is more preferable.

[0099] [ka]

[0100] In the above formula, R 11 and R 13 each independently represents a substituent; R 12 and R 14 each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; n11 and n13 each independently represent an integer of 0 to 4; X 12 and X 14 each independently represents an oxygen atom, a sulfur atom, or a nitrogen atom; X 12 When is an oxygen atom or a sulfur atom, m12 represents 1, and X 12 When is a nitrogen atom, m12 represents 2, and X 14 When is an oxygen atom or a sulfur atom, m14 represents 1, and X 14 When is a nitrogen atom, m14 is 2. 11 and R 13 Preferred specific examples of the substituent represented by the formula (I) include an alkyl group, an aryl group, a halogen atom, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heteroaryloxycarbonyl group, an amido group, a cyano group, a nitro group, a trifluoromethyl group, a sulfoxide group, and a sulfo group.

[0101] In the present disclosure, two or more chromatic pigments may be used in combination. When two or more chromatic pigments are used in combination, the combination of two or more chromatic pigments may form a black color. Examples of such combinations include the following embodiments (1) to (7). When the curable composition contains two or more chromatic pigments and exhibits a black color due to the combination of two or more chromatic pigments, the curable composition according to the present disclosure can be preferably used as an infrared transmission filter, and more preferably used as a near-infrared transmission filter. (1) An embodiment containing a red pigment and a blue pigment. (2) An embodiment containing a red pigment, a blue pigment, and a yellow pigment. (3) An embodiment containing a red pigment, a blue pigment, a yellow pigment, and a purple pigment. (4) An embodiment containing a red pigment, a blue pigment, a yellow pigment, a purple pigment, and a green pigment. (5) An embodiment containing a red pigment, a blue pigment, a yellow pigment, and a green pigment. (6) An embodiment containing a red pigment, a blue pigment, and a green pigment. (7) An embodiment containing a yellow pigment and a purple pigment.

[0102] In addition, in the case of a cyan curable composition, the pigment preferably contains at least one phthalocyanine pigment selected from the group consisting of CI Pigment Blue 15:3 and CI Pigment Blue 15:4. Hereinafter, CI Pigment Blue 15:3 and CI Pigment Blue 15:4 are collectively referred to as the specific phthalocyanine pigment.

[0103] The average secondary particle diameter of the specific phthalocyanine pigment is preferably 50 nm to 100 nm, because it increases the transmittance of visible light and makes it easier to obtain a cured film having spectral characteristics suitable for cyan color. The lower limit is preferably 55 nm or more, and more preferably 60 nm or more, from the viewpoint of light fastness. The upper limit is preferably 95 nm or less, and more preferably 90 nm or less, from the viewpoint of spectral characteristics.

[0104] In this specification, the average secondary particle diameter of the pigment is measured by directly measuring the size of the secondary particles of the pigment from an electron microscope photograph using a transmission electron microscope (TEM). Specifically, the minor axis diameter and major axis diameter of each secondary particle of the pigment are measured, and the average is taken as the particle diameter of the pigment. Next, for each of the 100 pigment particles, the volume of each pigment is calculated by approximating it to a cube of the calculated particle diameter, and the volume average particle diameter is taken as the average secondary particle diameter.

[0105] In the case of a cyan curable composition, the pigment preferably contains the specific phthalocyanine pigment in an amount of 50% by mass or more, more preferably 55% by mass or more, even more preferably 60% by mass or more, and particularly preferably 65% ​​by mass or more, based on the total mass of the pigment. The upper limit may be 100% by mass, 95% by mass or less, or 90% by mass or less.

[0106] When the pigment used in the curable composition according to the present disclosure contains CI Pigment Blue 15:3 and CI Pigment Blue 15:4, the mass ratio of CI Pigment Blue 15:3 to CI Pigment Blue 15:4 is preferably 10 parts by mass to 1,000 parts by mass, more preferably 25 parts by mass to 400 parts by mass, and even more preferably 50 parts by mass to 200 parts by mass, per 100 parts by mass of CI Pigment Blue 15:3.

[0107] -White pigment- Examples of the white pigment include titanium oxide, strontium titanate, barium titanate, zinc oxide, magnesium oxide, zirconium oxide, aluminum oxide, barium sulfate, silica, talc, mica, aluminum hydroxide, calcium silicate, aluminum silicate, hollow resin particles, and zinc sulfide. The white pigment is preferably a particle having a titanium atom, and more preferably titanium oxide. The white pigment is preferably a particle having a refractive index of 2.10 or more for light with a wavelength of 589 nm. The refractive index is preferably 2.10 to 3.00, and more preferably 2.50 to 2.75.

[0108] In addition, the titanium oxide described in "Titanium Oxide: Physical Properties and Application Technology, by Manabu Seino, pages 13-45, published June 25, 1991, by Gihodo Publishing Co., Ltd." can also be used as the white pigment.

[0109] The white pigment may be not only a single inorganic substance, but also a particle composited with other materials. For example, it is preferable to use a particle having a void or other material inside, a particle having a large number of inorganic particles attached to a core particle, or a core-shell composite particle composed of a polymer particle and a shell layer composed of inorganic nanoparticles. For the core-shell composite particle composed of a polymer particle and a shell layer composed of inorganic nanoparticles, the description in paragraphs 0012 to 0042 of JP 2015-047520 A can be referred to, and the contents of this specification are incorporated herein.

[0110] The white pigment can also be hollow inorganic particles. The hollow inorganic particles are inorganic particles with a structure having a cavity inside, and refer to inorganic particles with a cavity surrounded by an outer shell. Examples of the hollow inorganic particles include the hollow inorganic particles described in JP2011-075786A, WO2013 / 061621A, JP2015-164881A, etc., the contents of which are incorporated herein by reference.

[0111] -Black pigment- The black pigment is not particularly limited, and known pigments can be used. Examples include carbon black, titanium black, graphite, etc., with carbon black and titanium black being preferred, and titanium black being more preferred. Titanium black is a black particle containing titanium atoms, and low-order titanium oxide or titanium oxynitride is preferred. Titanium black can be surface-modified as necessary for the purpose of improving dispersibility, suppressing aggregation, etc. For example, the surface of titanium black can be coated with silicon oxide, titanium oxide, germanium oxide, aluminum oxide, magnesium oxide, or zirconium oxide. In addition, treatment with a water-repellent substance such as that shown in JP-A-2007-302836 can also be performed. Examples of black pigments include Color Index (CI) Pigment Black 1,7, etc. It is preferable that both the primary particle size and the average primary particle size of the individual particles of titanium black are small. Specifically, the average primary particle size is preferably 10 to 45 nm. Titanium black can also be used as a dispersion. For example, a dispersion containing titanium black particles and silica particles, and the ratio of Si atoms to Ti atoms in the dispersion is adjusted to a range of 0.20 to 0.50, can be mentioned. For the above dispersion, the description in paragraphs 0020 to 0105 of JP 2012-169556 A can be referred to, and the contents thereof are incorporated herein. Examples of commercially available titanium black products include titanium black 10S, 12S, 13R, 13M, 13M-C, 13R-N, and 13M-T (trade names: manufactured by Mitsubishi Materials Corporation), Tilack D (trade name: manufactured by Ako Kasei Co., Ltd.), and the like.

[0112] - Near infrared absorbing pigment - The near infrared absorbing pigment is preferably an organic pigment. The near infrared absorbing pigment preferably has a maximum absorption wavelength in the range of more than 700 nm to 1,400 nm. The maximum absorption wavelength of the near infrared absorbing pigment is preferably 1,200 nm or less, more preferably 1,000 nm or less, and even more preferably 950 nm or less. The near infrared absorbing pigment has an absorbance A at a wavelength of 550 nm. 550 and absorbance A at the maximum absorption wavelengthmax A is the ratio of 550 / A max is preferably 0.1 or less, more preferably 0.05 or less, even more preferably 0.03 or less, and particularly preferably 0.02 or less. The lower limit is not particularly limited, but can be, for example, 0.0001 or more, or can be 0.0005 or more. If the above-mentioned absorbance ratio is within the above range, the near-infrared absorbing pigment can be excellent in visible transparency and near-infrared shielding. In the present disclosure, the maximum absorption wavelength and the absorbance value at each wavelength of the near-infrared absorbing pigment are values ​​obtained from the absorption spectrum of a film formed using a curable composition containing the near-infrared absorbing pigment.

[0113] The near-infrared absorbing pigment is not particularly limited, but examples thereof include a pyrrolopyrrole compound, a rylene compound, an oxonol compound, a squarylium compound, a cyanine compound, a croconium compound, a phthalocyanine compound, a naphthalocyanine compound, a pyrylium compound, an azulenium compound, an indigo compound, and a pyrromethene compound. At least one selected from the group consisting of a pyrrolopyrrole compound, a squarylium compound, a cyanine compound, a phthalocyanine compound, and a naphthalocyanine compound is preferred, a pyrrolopyrrole compound or a squarylium compound is more preferred, and a pyrrolopyrrole compound is particularly preferred.

[0114] In addition, the pigment used in the present disclosure is preferably a pigment having a specific X-ray diffraction pattern by CuKα radiation.Specific examples thereof include the phthalocyanine pigment described in Japanese Patent No. 6561862, the diketopyrrolopyrrole pigment described in Japanese Patent No. 6413872, and the azo pigment (CI Pigment Red 269) described in Japanese Patent No. 6281345.

[0115] The content of the pigment in the total solid content of the curable composition is preferably 5% by mass or more, more preferably 10% by mass or more, even more preferably 20% by mass or more, even more preferably 30% by mass or more, and particularly preferably 40% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 70% by mass or less, and even more preferably 60% by mass or less.

[0116] <dye> The curable composition according to the present disclosure may contain a dye. The dye is not particularly limited, and a known dye can be used. The dye may be a chromatic dye or a near-infrared absorbing dye. Examples of the chromatic dye include pyrazole azo compounds, anilino azo compounds, triarylmethane compounds, anthraquinone compounds, anthrapyridone compounds, benzylidene compounds, oxonol compounds, pyrazolotriazole azo compounds, pyridone azo compounds, cyanine compounds, phenothiazine compounds, pyrrolopyrazole azomethine compounds, xanthene compounds, phthalocyanine compounds, benzopyran compounds, indigo compounds, and pyrromethene compounds. In addition, the thiazole compounds described in JP-A-2012-158649, the azo compounds described in JP-A-2011-184493, and the azo compounds described in JP-A-2011-145540 can also be used. In addition, as the yellow dye, the quinophthalone compounds described in paragraphs 0011 to 0034 of JP-A No. 2013-054339 and the quinophthalone compounds described in paragraphs 0013 to 0058 of JP-A No. 2014-026228 can also be used. Examples of the near-infrared absorbing dye include pyrrolopyrrole compounds, rylene compounds, oxonol compounds, squarylium compounds, cyanine compounds, croconium compounds, phthalocyanine compounds, naphthalocyanine compounds, pyrylium compounds, azulenium compounds, indigo compounds and pyrromethene compounds.In addition, the squarylium compounds described in JP 2017-197437 A, the squarylium compounds described in paragraphs 0090 to 0107 of WO 2017 / 213047 A, the pyrrole ring-containing compounds described in paragraphs 0019 to 0075 of JP 2018-054760 A, the pyrrole ring-containing compounds described in paragraphs 0078 to 0082 of JP 2018-040955 A, the pyrrole ring-containing compounds described in paragraphs 0043 to 0069 of JP 2018-002773 A, the squarylium compounds having an aromatic ring at the amide α-position described in paragraphs 0024 to 0086 of JP 2018-041047 A, It is also possible to use the amide-linked squarylium compound described in JP 2017-179131 A, the compound having a pyrrole bis-type squarylium skeleton or a croconium skeleton described in JP 2017-141215 A, the dihydrocarbazole bis-type squarylium compound described in JP 2017-082029 A, the asymmetric compound described in paragraphs 0027 to 0114 of JP 2017-068120 A, the pyrrole ring-containing compound (carbazole type) described in JP 2017-067963 A, and the phthalocyanine compound described in Japanese Patent No. 6251530. In addition, as the dye, the methine dyes described in JP-A-2019-073695, the methine dyes described in JP-A-2019-073696, the methine dyes described in JP-A-2019-073697, and the methine dyes described in JP-A-2019-073698 can also be used.

[0117] The content of the dye in the total solid content of the curable composition is preferably 1% by mass or more, more preferably 5% by mass or more, and particularly preferably 10% by mass or more. There is no particular upper limit, but it is preferably 70% by mass or less, more preferably 65% ​​by mass or less, and even more preferably 60% by mass or less. The content of the dye is preferably 5 to 50 parts by mass relative to 100 parts by mass of the pigment. The upper limit is preferably 45 parts by mass or less, and more preferably 40 parts by mass or less. The lower limit is preferably 10 parts by mass or more, and more preferably 15 parts by mass or more. In addition, the curable composition according to the present disclosure may be substantially free of dye. When the curable composition according to the present disclosure is substantially free of dye, the content of the dye in the total solid content of the curable composition according to the present disclosure is preferably 0.1 mass% or less, more preferably 0.05 mass% or less, and particularly preferably free of dye.

[0118] The curable composition according to the present disclosure may also use a dye multimer. The dye multimer is preferably a dye dissolved in a solvent for use. The dye multimer may also form particles. When the dye multimer is in the form of particles, it is usually used in a state of being dispersed in a solvent. The dye multimer in a particulate state can be obtained, for example, by emulsion polymerization, and specific examples of the compounds and manufacturing methods described in JP-A-2015-214682 include those. The dye multimer has two or more dye structures in one molecule, and preferably has three or more dye structures. The upper limit is not particularly limited, but may be 100 or less. The multiple dye structures in one molecule may be the same dye structure or different dye structures. The weight average molecular weight (Mw) of the dye multimer is preferably 2,000 to 50,000. The lower limit is more preferably 3,000 or more, and even more preferably 6,000 or more. The upper limit is more preferably 30,000 or less, and even more preferably 20,000 or less. As the dye multimer, compounds described in JP-A-2011-213925, JP-A-2013-041097, JP-A-2015-028144, JP-A-2015-030742, WO 2016 / 031442, and the like can also be used.

[0119] <Curable compound> The curable composition according to the present disclosure contains a curable compound, and from the viewpoints of film strength and pattern formability, it preferably contains a curable compound and further contains a polymerization initiator described later, and it is more preferable that it contains a curable compound and further contains a photopolymerization initiator described later. The reaction mechanism when the curable compound is cured is not particularly limited. Examples of the reaction mechanism include a radical polymerization reaction, a cationic polymerization reaction, a condensation polymerization reaction, a nucleophilic addition reaction, and a crosslinking reaction by a substitution reaction. The curable compound is preferably a compound that is cured by a radical polymerization reaction. Examples of the polymerizable group include an ethylenically unsaturated group, an epoxy group, etc. Examples of the ethylenically unsaturated group include a vinyl group, a vinyloxy group, an allyl group, a methallyl group, a (meth)acryloyl group, a styrene group, a cinnamoyl group, and a maleimide group, of which a (meth)acryloyl group, a styrene group, or a maleimide group is preferred, a (meth)acryloyl group is more preferred, and an acryloyl group is particularly preferred. The curable compound preferably contains an ethylenically unsaturated compound.

[0120] The curable compound may be a monomer or a resin such as a polymer. A monomer-type curable compound and a resin-type curable compound may be used in combination.

[0121] The molecular weight of the curable compound is preferably less than 3,000. The upper limit is more preferably 2,000 or less, and even more preferably 1,500 or less. The lower limit is preferably 100 or more, more preferably 150 or more, and even more preferably 250 or more. The curable compound is preferably a compound having 3 or more ethylenically unsaturated groups, more preferably a compound having 3 to 15 ethylenically unsaturated groups, and even more preferably a compound having 3 to 6 ethylenically unsaturated groups. In addition, the curable compound is preferably a trifunctional to 15-functional (meth)acrylate compound, and more preferably a trifunctional to 6-functional (meth)acrylate compound. Specific examples of polymerizable monomers include compounds described in paragraphs 0095 to 0108 of JP 2009-288705 A, paragraph 0227 of JP 2013-029760 A, paragraphs 0254 to 0257 of JP 2008-292970 A, paragraphs 0034 to 0038 of JP 2013-253224 A, paragraph 0477 of JP 2012-208494 A, JP 2017-048367 A, Japanese Patent No. 6057891 A, and Japanese Patent No. 6031807 A, the contents of which are incorporated herein by reference.

[0122] The curable compound is preferably dipentaerythritol triacrylate (a commercially available product is KAYARAD D-330, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetraacrylate (a commercially available product is KAYARAD D-320, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (a commercially available product is KAYARAD D-310, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth)acrylate (commercially available products are KAYARAD DPHA, manufactured by Nippon Kayaku Co., Ltd., and NK Ester A-DPH-12E, manufactured by Shin-Nakamura Chemical Co., Ltd.), and compounds having a structure in which these (meth)acryloyl groups are bonded via ethylene glycol and / or propylene glycol residues (e.g., SR454, SR499, commercially available from Sartomer Corporation).

[0123] The curable compound may be a compound having an acid group. By using a curable compound having an acid group, the unexposed portion of the curable composition layer is easily removed during development, and development residue is reduced. The generation of oxidative stress can be suppressed. Examples of the acid group include a carboxy group, a sulfo group, and a phosphate group, and the carboxy group is preferred. Examples of the curable compound having an acid group include succinic acid modified dipentaerythritol penta(meth)acrylate. Examples of commercially available polymerizable monomers having an acid group include ARONIX M-510, M-520, and ARONIX TO-2349 (manufactured by Toagosei Co., Ltd.). The acid value of the polymerizable monomer having an acid group is preferably 0.1 mgKOH / g to 40 mgKOH / g, and more preferably 5 mgKOH / g to 30 mgKOH / g. If the acid value of the curable compound is 0.1 mgKOH / g or more, the solubility in the developer is good, and if it is 40 mgKOH / g or less, it is advantageous in terms of production and handling.

[0124] A preferred embodiment of the curable compound is a compound having a caprolactone structure. Curable compounds having a caprolactone structure are commercially available as the KAYARAD DPCA series from Nippon Kayaku Co., Ltd., including DPCA-20, DPCA-30, DPCA-60, and DPCA-120.

[0125] The curable compound may also be a compound having an alkyleneoxy group. The curable compound having an alkyleneoxy group is preferably a compound having an ethyleneoxy group and / or a propyleneoxy group, more preferably a compound having an ethyleneoxy group, and even more preferably a trifunctional to hexafunctional (meth)acrylate compound having 4 to 20 ethyleneoxy groups. Examples of commercially available curable compounds having an alkyleneoxy group include SR-494, a tetrafunctional (meth)acrylate having 4 ethyleneoxy groups manufactured by Sartomer, and KAYARAD TPA-330, a trifunctional (meth)acrylate having 3 isobutyleneoxy groups.

[0126] It is also preferable to use a compound that is substantially free of environmentally regulated substances such as toluene as the curable compound. Commercially available products of such compounds include KAYARAD DPHA LT and KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.).

[0127] As the curable compound, urethane acrylates as described in JP-B-48-041708, JP-A-51-037193, JP-B-02-032293, and JP-B-02-016765, and urethane compounds having an ethylene oxide skeleton as described in JP-B-58-049860, JP-B-56-017654, JP-B-62-039417, and JP-B-62-039418 are also suitable. In addition, it is also preferable to use compounds having an amino structure or a sulfide structure in the molecule as described in JP-A-63-277653, JP-A-63-260909, and JP-A-01-105238. In addition, commercially available products such as UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, and LINC-202UA (manufactured by Kyoeisha Chemical Co., Ltd.) can also be used as the curable compound.

[0128] As the compound having an epoxy group (hereinafter also referred to as an epoxy compound) used as the curable compound, a compound having two or more epoxy groups in one molecule is preferably used. The upper limit of the epoxy group of the epoxy compound is preferably 100 or less, more preferably 10 or less, and even more preferably 5 or less.

[0129] The epoxy equivalent of the epoxy compound (=molecular weight of compound having epoxy group / number of epoxy groups) is preferably 500 g / eq or less, more preferably 100 g / eq to 400 g / eq, and even more preferably 100 g / eq to 300 g / eq.

[0130] The epoxy compound may be a low molecular weight compound (e.g., molecular weight less than 1,000) or a high molecular weight compound (macromolecule) (e.g., molecular weight 1,000 or more, in the case of a polymer, weight average molecular weight 1,000 or more). The molecular weight of the epoxy compound (in the case of a polymer, weight average molecular weight) is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the molecular weight (in the case of a polymer, weight average molecular weight) is preferably 3,000 or less, more preferably 2,000 or less, and even more preferably 1,500 or less.

[0131] The curable compounds may be used alone or in combination of two or more. The content of the curable compound is preferably 0.1% by mass to 40% by mass based on the total solid content of the curable composition. The lower limit is preferably 1% by mass or more, and more preferably 2% by mass or more. The upper limit is preferably 30% by mass or less, more preferably 20% by mass or less, and even more preferably 10% by mass or less. In addition, when an epoxy compound is used as the curable compound, the content of the epoxy compound is preferably 0.1% by mass to 40% by mass based on the total solid content of the curable composition. The lower limit is, for example, more preferably 1% by mass or more, and even more preferably 2% by mass or more. The upper limit is, for example, more preferably 30% by mass or less, and even more preferably 20% by mass or less. The epoxy compound may be used alone or in combination of two or more kinds. In addition, when an ethylenically unsaturated compound and a compound having an epoxy group are used in combination, the ratio (mass ratio) of the two (mass of the ethylenically unsaturated compound:mass of the compound having an epoxy group) is preferably 100:1 to 100:400, more preferably 100:1 to 100:100, and even more preferably 100:1 to 100:50.

[0132] <Polymerization initiator> The curable composition according to the present disclosure preferably further comprises a polymerization initiator, and more preferably further comprises a photopolymerization initiator. In particular, when an ethylenically unsaturated compound is used as the curable compound, it is particularly preferable that the curable composition according to the present disclosure further comprises a photopolymerization initiator. The polymerization initiator is not particularly limited, and can be appropriately selected from known photopolymerization initiators and thermal polymerization initiators. As the photopolymerization initiator, for example, a compound having photosensitivity to light rays in the ultraviolet region to the visible region is preferable. In addition, the photopolymerization initiator is preferably a photoradical polymerization initiator.

[0133] Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole, oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, and α-aminoketone compounds. From the viewpoint of exposure sensitivity, the photopolymerization initiator preferably contains at least one compound selected from the group consisting of a trihalomethyltriazine compound, a benzyl dimethyl ketal compound, an α-hydroxyketone compound, an α-aminoketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene compound, an oxime compound, a triarylimidazole dimer, an onium compound, a benzothiazole compound, a benzophenone compound, an acetophenone compound, a cyclopentadiene-benzene-iron complex, a halomethyloxadiazole compound, and a 3-aryl substituted coumarin compound, more preferably contains at least one compound selected from the group consisting of an oxime compound, an α-hydroxyketone compound, an α-aminoketone compound, and an acylphosphine compound, and even more preferably contains an oxime compound. Regarding the photopolymerization initiator, the photopolymerization initiator described in paragraphs 0065 to 0111 of JP 2014-130173 A, the photopolymerization initiator described in Japanese Patent No. 6301489 A, the peroxide-based photopolymerization initiator described in MATERIAL STAGE 37 to 60p, vol. 19, No. 3, 2019, the photopolymerization initiator described in WO 2018 / 221177 A, the photopolymerization initiator described in WO 2018 / 110179 A, ​​the photopolymerization initiator described in JP 2019-043864 A, the photopolymerization initiator described in JP 2019-044030 A, and the organic peroxide described in JP 2019-167313 A can be mentioned, the contents of which are incorporated herein by reference.

[0134] Commercially available α-hydroxyketone compounds include IRGACURE-184, DAROCUR-1173, IRGACURE-500, IRGACURE-2959, and IRGACURE-127 (all manufactured by BASF). Commercially available α-aminoketone compounds include IRGACURE-907, IRGACURE-369, IRGACURE-379, and IRGACURE-379EG (all manufactured by BASF). Commercially available acylphosphine compounds include IRGACURE-819 and DAROCUR-TPO (all manufactured by BASF).

[0135] Examples of the oxime compound include compounds described in JP-A-2001-233842, compounds described in JP-A-2000-080068, compounds described in JP-A-2006-342166, compounds described in J.C.S. Perkin II (1979, pp. 1653-1660), compounds described in J.C.S. Perkin II (1979, pp. 156-162), compounds described in Journal of Photopolymer Science and Technology (1995, pp. 202-232), compounds described in JP 2000-066385 A, compounds described in JP 2000-080068 A, compounds described in JP-T-2004-534797 A, compounds described in JP 2006-342166 A, compounds described in JP 2017-019766 A, compounds described in Japanese Patent No. 6065596, compounds described in WO 2015 / 152153, compounds described in WO 2017 / 051680, compounds described in JP 2017-198865 A, compounds described in paragraphs 0025 to 0038 of WO 2017 / 164127, compounds described in WO 2013 / 167515, and the like. Specific examples of the oxime compound include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, and 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one. Examples of commercially available products include IRGACURE OXE01, IRGACURE OXE02, IRGACURE OXE03, and IRGACURE OXE04 (all manufactured by BASF), TR-PBG-304 (manufactured by Changzhou Strong Electronic New Materials Co., Ltd.), and Adeka Optomer N-1919 (manufactured by ADEKA Corporation, photopolymerization initiator 2 described in JP 2012-014052 A). In addition, it is also preferable to use, as the oxime compound, a compound that is not colorable or a compound that is highly transparent and does not easily discolor.Commercially available products include ADEKA Arcles NCI-730, NCI-831, and NCI-930 (all manufactured by ADEKA Corporation).

[0136] In addition, an oxime compound having a fluorene ring can also be used as a photopolymerization initiator. Specific examples of the oxime compound having a fluorene ring include the compounds described in JP 2014-137466 A, the contents of which are incorporated herein by reference.

[0137] In addition, an oxime compound having a fluorine atom can also be used as a photopolymerization initiator. Specific examples of the oxime compound having a fluorine atom include the compounds described in JP-A-2010-262028, compounds 24, 36 to 40 described in JP-T-2014-500852, and compound (C-3) described in JP-A-2013-164471. The contents of these compounds are incorporated herein by reference.

[0138] Furthermore, an oxime compound having a nitro group can be used as a photopolymerization initiator. The oxime compound having a nitro group is also preferably a dimer. Specific examples of the oxime compound having a nitro group include the compounds described in paragraphs 0031 to 0047 of JP 2013-114249 A, paragraphs 0008 to 0012, and 0070 to 0079 of JP 2014-137466 A, the compounds described in paragraphs 0007 to 0025 of JP 4223071 A, and ADEKA ARCLES NCI-831 (manufactured by ADEKA Corporation).

[0139] As the photopolymerization initiator, an oxime compound having a benzofuran skeleton can also be used. Specific examples include OE-01 to OE-75 described in WO 2015 / 036910.

[0140] Specific examples of the oxime compound that can be preferably used are shown below, but the invention is not limited to these.

[0141] [ka]

[0142] [ka]

[0143] The oxime compound is preferably a compound having a maximum absorption wavelength in the wavelength range of 350 nm to 500 nm, more preferably a compound having a maximum absorption wavelength in the wavelength range of 360 nm to 480 nm. In addition, the molar absorption coefficient of the oxime compound at a wavelength of 365 nm or 405 nm is preferably high from the viewpoint of sensitivity, more preferably 1,000 to 300,000, even more preferably 2,000 to 300,000, and particularly preferably 5,000 to 200,000. The molar absorption coefficient of the compound can be measured using a known method. For example, it is preferable to measure using a spectrophotometer (Varian Cary-5 spectrophotometer) using ethyl acetate as a solvent at a concentration of 0.01 g / L.

[0144] Further, as a thermal polymerization initiator or a polymerization initiator capable of polymerizing by both light and heat, there can be mentioned peroxide compounds described in MATERIAL STAGE 37-60p, vol. 19, No. 3, 2019, WO 2018 / 221177, WO 2018 / 110179, or JP 2019-43864 A.

[0145] As the photopolymerization initiator, a bifunctional or trifunctional or more functional photoradical polymerization initiator may be used. By using such a photoradical polymerization initiator, two or more radicals are generated from one molecule of the photoradical polymerization initiator, so that good sensitivity can be obtained. In addition, when a compound having an asymmetric structure is used, crystallinity is reduced and solubility in a solvent or the like is improved, so that precipitation is less likely to occur over time, and the temporal stability of the curable composition can be improved. Specific examples of bifunctional or trifunctional or more functional photoradical polymerization initiators include dimers of oxime compounds described in JP-T-2010-527339, JP-T-2011-524436, WO-P-2015 / 004565, paragraphs 0407 to 0412 of JP-T-2016-532675, and paragraphs 0039 to 0055 of WO-P-2017 / 033680, compounds (E) and (G) described in WO-P-2013-522445, and compounds (H) and (I) described in WO-P-2015-004566, WO-P-2015-004567, WO-P-2016-532675, WO-P-2016-004567 ... Examples of the photoinitiator include Cmpd1 to 7 described in JP 2016 / 034963 A, the oxime ester photoinitiator described in paragraph 0007 of JP 2017-523465 A, the photoinitiator described in paragraphs 0020 to 0033 of JP 2017-167399 A, the photopolymerization initiator (A) described in paragraphs 0017 to 0026 of JP 2017-151342 A, and the oxime ester photoinitiator described in Japanese Patent No. 6,469,669 A.

[0146] The content of the polymerization initiator in the total solid content of the curable composition according to the present disclosure is preferably 0.1% by mass to 30% by mass. The lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more. The upper limit is preferably 20% by mass or less, and more preferably 15% by mass or less. In the curable composition according to the present disclosure, only one type of polymerization initiator may be used, or two or more types may be used. When two or more types are used, the total amount thereof is preferably within the above range.

[0147] <Pigment derivatives> From the viewpoint of dispersion stability, the curable composition according to the present disclosure preferably further contains a pigment derivative. Examples of pigment derivatives include compounds having a structure in which a part of a pigment is substituted with an acid group, a basic group, or a phthalimidomethyl group. Examples of pigment derivatives include those described in JP-A-56-118462, JP-A-63-264674, JP-A-01-217077, JP-A-03-009961, JP-A-03-026767, JP-A-03-153780, JP-A-03-045662, JP-A-04-285669, JP-A-06-145546, JP-A-06-212088, JP-A-06-240158, and JP-A-06-240258. Compounds described in JP-A-10-030063, JP-A-10-195326, paragraphs 0086 to 0098 of WO 2011 / 024896, paragraphs 0063 to 0094 of WO 2012 / 102399, paragraph 0082 of WO 2017 / 038252, paragraph 0171 of JP-A-2015-151530, and JP-A-2019-133154 can be used, the contents of which are incorporated herein by reference.

[0148] In addition, the pigment derivative preferably has a quinoline skeleton, a benzimidazolone skeleton, a diketopyrrolopyrrole skeleton, an azo skeleton, a phthalocyanine skeleton, an anthraquinone skeleton, a quinacridone skeleton, a dioxazine skeleton, a perinone skeleton, a perylene skeleton, a thioindigo skeleton, an isoindoline skeleton, an isoindolinone skeleton, a quinophthalone skeleton, a threne skeleton, a metal complex skeleton, or the like as a chromophore. Among them, the quinoline skeleton, the benzimidazolone skeleton, the diketopyrrolopyrrole skeleton, an azo skeleton, a quinophthalone skeleton, an isoindoline skeleton, or a phthalocyanine skeleton is preferred, and the azo skeleton or the benzimidazolone skeleton is more preferred. As the acid group of the pigment derivative, a sulfo group or a carboxy group is preferred, and a sulfo group is more preferred. As the basic group of the pigment derivative, an amino group is preferred, and a tertiary amino group is more preferred. The pigment derivative preferably contains a pigment derivative having a basic group (also referred to as a "basic pigment derivative"). In addition, from the viewpoints of developability and dispersion stability, the curable compound according to the present disclosure more preferably contains a binder polymer (dispersant) having an acid group and a pigment derivative having a basic group.

[0149] The content of the pigment derivative is preferably 1 to 50 parts by mass relative to 100 parts by mass of the pigment. The lower limit is preferably 3 parts by mass or more, and more preferably 5 parts by mass or more. The upper limit is preferably 40 parts by mass or less, and more preferably 30 parts by mass or less. When the content of the pigment derivative is within the above range, the dispersibility of the pigment is improved, and aggregation of the pigment can be efficiently suppressed. Only one type of pigment derivative may be used, or two or more types may be used. When two or more types are used, the total amount thereof is preferably within the above range.

[0150] <Binder polymer> The curable composition according to the present disclosure preferably comprises a binder polymer. The weight average molecular weight (Mw) of the binder polymer is preferably 2,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit is preferably 3,000 or more, and more preferably 5,000 or more.

[0151] Examples of the binder polymer include (meth)acrylic resins, ene-thiol resins, polycarbonate resins, polyether resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyphenylene resins, polyarylene ether phosphine oxide resins, polyimide resins, polyamideimide resins, polyolefin resins, cyclic olefin resins, polyester resins, styrene resins, etc. One of these resins may be used alone, or two or more of them may be used in combination.

[0152] The binder polymer may have an acid group. Examples of the acid group include a carboxy group, a phosphoric acid group, a sulfo group, and a phenolic hydroxy group, and the carboxy group is preferred. These acid groups may be one type or two or more types. The resin having an acid group can also be used as an alkali-soluble resin.

[0153] As the resin having an acid group, a polymer having a carboxy group in a side chain is preferable. Specific examples include alkali-soluble phenolic resins such as methacrylic acid copolymers, acrylic acid copolymers, itaconic acid copolymers, crotonic acid copolymers, maleic acid copolymers, partially esterified maleic acid copolymers, novolac resins, acidic cellulose derivatives having a carboxy group in a side chain, and resins obtained by adding an acid anhydride to a polymer having a hydroxy group. In particular, copolymers of (meth)acrylic acid and other monomers copolymerizable therewith are suitable as alkali-soluble resins. As other monomers copolymerizable with (meth)acrylic acid, alkyl (meth)acrylates, aryl (meth)acrylates, vinyl compounds, etc. can be mentioned. Examples of the alkyl (meth)acrylate and aryl (meth)acrylate include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, butyl (meth)acrylate, isobutyl (meth)acrylate, pentyl (meth)acrylate, hexyl (meth)acrylate, octyl (meth)acrylate, phenyl (meth)acrylate, benzyl (meth)acrylate, tolyl (meth)acrylate, naphthyl (meth)acrylate, cyclohexyl (meth)acrylate, and glycidyl (meth)acrylate. Examples of the vinyl compound include styrene, α-methylstyrene, vinyltoluene, acrylonitrile, vinyl acetate, N-vinylpyrrolidone, polystyrene macromonomer, and polymethyl methacrylate macromonomer. Examples of other monomers include N-substituted maleimide monomers described in JP-A-10-300922, such as N-phenylmaleimide and N-cyclohexylmaleimide. The other monomer copolymerizable with (meth)acrylic acid may be of only one type, or of two or more types.

[0154] As the resin having an acid group, a benzyl (meth)acrylate / (meth)acrylic acid copolymer, a benzyl (meth)acrylate / (meth)acrylic acid / 2-hydroxyethyl (meth)acrylate copolymer, or a multi-component copolymer consisting of benzyl (meth)acrylate / (meth)acrylic acid / other monomers can be preferably used. In addition, a copolymer of 2-hydroxyethyl (meth)acrylate, a 2-hydroxypropyl (meth)acrylate / polystyrene macromonomer / benzyl methacrylate / methacrylic acid copolymer, a 2-hydroxy-3-phenoxypropyl acrylate / polymethyl methacrylate macromonomer / benzyl methacrylate / methacrylic acid copolymer, a 2-hydroxyethyl methacrylate / polystyrene macromonomer / methyl methacrylate / methacrylic acid copolymer, or a 2-hydroxyethyl methacrylate / polystyrene macromonomer / benzyl methacrylate / methacrylic acid copolymer, as described in JP-A-7-140654, can also be preferably used.

[0155] Preferred examples of the resin having an acid group include the polymers described in paragraphs 0153 to 0167 of JP-A-2018-173660.

[0156] For the resin having an acid group, the description in paragraphs 0558 to 0571 of JP 2012-208494 A (corresponding to paragraphs 0685 to 0700 of U.S. Patent Application Publication No. 2012 / 0235099 A) and the description in paragraphs 0076 to 0099 of JP 2012-198408 A can be referred to, the contents of which are incorporated herein by reference. In addition, a commercially available product can be used as the resin having an acid group.

[0157] The acid value of the resin having an acid group is preferably 30 mgKOH / g to 200 mgKOH / g. The lower limit is preferably 50 mgKOH / g or more, more preferably 70 mgKOH / g or more. The upper limit is preferably 150 mgKOH / g or less, more preferably 120 mgKOH / g or less.

[0158] The curable composition according to the present disclosure may contain one type of binder polymer alone, or may contain two or more types of binder polymers. The content of the binder polymer is preferably 1% by mass to 50% by mass based on the total solid content of the curable composition. The lower limit is preferably 3% by mass or more, more preferably 5% by mass or more, and even more preferably 10% by mass or more. The upper limit is preferably 45% by mass or less, and more preferably 40% by mass or less.

[0159] <Silane coupling agent> The curable composition according to the present disclosure may contain a silane coupling agent. According to this aspect, the adhesion of the obtained cured film to the support can be improved. The silane coupling agent means a silane compound having a hydrolyzable group and a functional group other than the hydrolyzable group. The hydrolyzable group means a substituent that is directly bonded to a silicon atom and can generate a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, and an acyloxy group, and an alkoxy group is preferable. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group. Examples of functional groups other than the hydrolyzable group include a vinyl group, a (meth)allyl group, a (meth)acryloyl group, a mercapto group, an epoxy group, an oxetanyl group, an amino group, a ureido group, a sulfide group, an isocyanate group, and a phenyl group, and an amino group, a (meth)acryloyl group, and an epoxy group are preferable. Specific examples of the silane coupling agent include the compounds described in paragraphs 0018 to 0036 of JP-A No. 2009-288703 and the compounds described in paragraphs 0056 to 0066 of JP-A No. 2009-242604, the contents of which are incorporated herein by reference.

[0160] The content of the silane coupling agent in the total solid content of the curable composition is preferably 0.1% by mass to 5% by mass. The upper limit is preferably 3% by mass or less, more preferably 2% by mass or less. The lower limit is preferably 0.5% by mass or more, more preferably 1% by mass or more. The silane coupling agent may be one type or two or more types. In the case of two or more types, the total amount is preferably within the above range.

[0161] <Solvent> The curable composition according to the present disclosure may contain a solvent. Examples of the solvent include organic solvents. Basically, the solvent is not particularly limited as long as it satisfies the solubility of each component and the coatability of the curable composition. Examples of the organic solvent include ester-based solvents, ketone-based solvents, alcohol-based solvents, amide-based solvents, ether-based solvents, and hydrocarbon-based solvents. For details of these, reference can be made to paragraph 0223 of International Publication No. 2015 / 166779, the contents of which are incorporated herein by reference. In addition, ester-based solvents substituted with a cyclic alkyl group and ketone-based solvents substituted with a cyclic alkyl group can also be preferably used. Specific examples of organic solvents include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, cyclohexanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, 3-methoxy-N,N-dimethylpropanamide, and 3-butoxy-N,N-dimethylpropanamide. However, aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) as solvents may be reduced for environmental reasons (for example, the amount of the total organic solvent may be 50 ppm (parts per million) by mass or less, 10 ppm by mass or less, or 1 ppm by mass or less).

[0162] In the curable composition according to the present disclosure, it is preferable to use a solvent with a low metal content, and the metal content of the solvent is preferably 10 mass ppb (parts per billion) or less. If necessary, a solvent with a mass ppt (parts per trillion) level may be used, and such a high purity solvent is provided, for example, by Toyo Gosei Co., Ltd. (The Chemical Daily, November 13, 2015).

[0163] Methods for removing impurities such as metals from a solvent include, for example, distillation (molecular distillation, thin film distillation, etc.) and filtration using a filter. The filter used for filtration has a filter pore size of preferably 10 μm or less, more preferably 5 μm or less, and even more preferably 3 μm or less. The filter material is preferably polytetrafluoroethylene, polyethylene, or nylon.

[0164] The solvent may contain isomers (compounds having the same number of atoms but different structures). In addition, the solvent may contain only one type of isomer or multiple types of isomers.

[0165] The content of peroxide in the organic solvent is preferably 0.8 mmol / L or less, and more preferably contains substantially no peroxide.

[0166] The content of the solvent in the curable composition is preferably from 10% by mass to 95% by mass, more preferably from 20% by mass to 90% by mass, and further preferably from 30% by mass to 90% by mass.

[0167] In addition, the curable composition according to the present disclosure is preferably substantially free of environmentally regulated substances from the viewpoint of environmental regulations. In the present disclosure, substantially free of environmentally regulated substances means that the content of the environmentally regulated substances in the colored composition is 50 mass ppm or less, preferably 30 mass ppm or less, more preferably 10 mass ppm or less, and particularly preferably 1 mass ppm or less.

[0168] <Polymerization inhibitor> The curable composition according to the present disclosure preferably further contains a polymerization inhibitor. Examples of the polymerization inhibitor include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, 2,2,6,6-tetramethylpiperidine-1-oxyl, 2,2,6,6-tetramethyl-4-hydroxypiperidine-1-oxyl, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-t-butylphenol), and N-nitrosophenylhydroxyamine salts (ammonium salts, cerium salts, etc.). Among these, it is preferable to include at least one compound selected from the group consisting of 2,2,6,6-tetramethylpiperidine-1-oxyl and 2,2,6,6-tetramethyl-4-hydroxypiperidine-1-oxyl. The content of the polymerization inhibitor in the total solid content of the curable composition is preferably 0.0001% by mass to 5% by mass.

[0169] <Surfactant> The curable composition according to the present disclosure may contain a surfactant. As the surfactant, various surfactants such as fluorine-based surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, silicon-based surfactants, etc. can be used. For details of the surfactant, refer to paragraphs 0238 to 0245 of International Publication No. 2015 / 166779 and paragraphs 0253 to 0260 of JP-A-2018-173660, the contents of which are incorporated herein by reference.

[0170] The surfactant is preferably a fluorosurfactant. By including a fluorosurfactant in the curable composition, the liquid properties (particularly, fluidity) can be further improved, and the liquid saving can be further improved. In addition, a film with less unevenness in thickness can be formed.

[0171] The fluorine atom content in the fluorine-based surfactant is preferably 3% by mass to 40% by mass, more preferably 5% by mass to 30% by mass, and particularly preferably 7% by mass to 25% by mass. A fluorine-based surfactant having a fluorine atom content within this range is effective in terms of uniformity of the thickness of the coating film and liquid saving properties, and also has good solubility in the curable composition.

[0172] The content of the surfactant in the total solid content of the curable composition is preferably 0.001% by mass to 5.0% by mass, more preferably 0.005% by mass to 3.0% by mass. The surfactant may be one type or two or more types. In the case of two or more types, the total amount is preferably within the above range.

[0173] <Ultraviolet absorbing agent> The curable composition according to the present disclosure preferably contains an ultraviolet absorber. The ultraviolet absorbent may be a conjugated diene compound, an aminodiene compound, a salicylate compound, a benzophenone compound, a benzotriazole compound, an acrylonitrile compound, a hydroxyphenyltriazine compound, an indole compound, a triazine compound, or the like. For details, refer to paragraphs 0052-0072 of JP 2012-208374 A, paragraphs 0317-0334 of JP 2013-068814 A, and paragraphs 0061-0080 of JP 2016-162946 A, the contents of which are incorporated herein by reference. Examples of commercially available ultraviolet absorbents include UV-503 (manufactured by Daito Chemical Co., Ltd.). Examples of benzotriazole compounds include the MYUA series (The Chemical Daily, February 1, 2016) manufactured by Miyoshi Oil & Fat Co., Ltd. Furthermore, the compounds described in paragraphs 0049 to 0059 of Japanese Patent No. 6268967 can also be used as ultraviolet absorbents.

[0174] The content of the ultraviolet absorbent in the total solid content of the curable composition is preferably 0.01% by mass to 10% by mass, more preferably 0.01% by mass to 5% by mass. Only one type of ultraviolet absorbent may be used, or two or more types may be used. When two or more types are used, the total amount is preferably within the above range.

[0175] <Antioxidants> The curable compositions according to the present disclosure may contain an antioxidant. Examples of the antioxidant include phenol compounds, phosphite compounds, and thioether compounds. As the phenol compound, any phenol compound known as a phenol-based antioxidant can be used. As a preferred phenol compound, a hindered phenol compound can be used. A compound having a substituent at the site (ortho position) adjacent to the phenolic hydroxy group is preferred. As the aforementioned substituent, a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms is preferred. In addition, as the antioxidant, a compound having a phenol group and a phosphite group in the same molecule is also preferred. In addition, as the antioxidant, a phosphorus-based antioxidant can also be suitably used. Examples of phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosphepin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphepin-2-yl)oxy]ethyl]amine, and ethyl bis(2,4-di-tert-butyl-6-methylphenyl)phosphite. Examples of commercially available antioxidants include Adeka STAB AO-20, Adeka STAB AO-30, Adeka STAB AO-40, Adeka STAB AO-50, Adeka STAB AO-50F, Adeka STAB AO-60, Adeka STAB AO-60G, Adeka STAB AO-80, and Adeka STAB AO-330 (all manufactured by ADEKA Corporation). In addition, the antioxidant may be a compound described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, a compound described in Korean Patent Publication No. 10-2019-0059371, or the like.

[0176] The content of the antioxidant in the total solid content of the curable composition is preferably 0.01% by mass to 20% by mass, and more preferably 0.3% by mass to 15% by mass. Only one type of antioxidant may be used, or two or more types may be used. When two or more types are used, the total amount is preferably within the above range.

[0177] <Other ingredients> The curable composition according to the present disclosure may contain, as necessary, a sensitizer, a curing accelerator, a filler, a heat curing accelerator, a plasticizer, and other auxiliaries (e.g., conductive particles, fillers, defoamers, flame retardants, leveling agents, peeling accelerators, fragrances, surface tension modifiers, chain transfer agents, etc.). By appropriately incorporating these components, it is possible to adjust properties such as film properties. For these components, the descriptions in, for example, paragraphs 0183 and onward of JP 2012-003225 A (corresponding paragraph 0237 of the specification of US Patent Application Publication No. 2013 / 0034812), and paragraphs 0101-0104, 0107-0109, etc. of JP 2008-250074 A can be referred to, and the contents of these are incorporated herein by reference. In addition, the curable composition according to the present disclosure may contain a latent antioxidant as necessary. Examples of latent antioxidants include compounds in which a site functioning as an antioxidant is protected by a protecting group, and the protecting group is removed by heating at 100°C to 250°C or at 80°C to 200°C in the presence of an acid / base catalyst to function as an antioxidant. Examples of latent antioxidants include compounds described in International Publication No. 2014 / 021023, International Publication No. 2017 / 030005, and JP-A No. 2017-008219. Examples of commercially available products include ADEKA ARCLES GPA-5001 (manufactured by ADEKA Corporation).

[0178] The curable composition according to the present disclosure may contain a metal oxide to adjust the refractive index of the resulting film. Examples of the metal oxide include TiO2, ZrO2, Al2O3, and SiO2. The primary particle size of the metal oxide is preferably 1 nm to 100 nm, more preferably 3 nm to 70 nm, and most preferably 5 nm to 50 nm. The metal oxide may have a core-shell structure, in which case the core may be hollow.

[0179] The curable compositions according to the present disclosure may also include a light resistance improver.

[0180] The viscosity (25°C) of the curable composition according to the present disclosure is preferably 1 mPa·s to 100 mPa·s, for example, when forming a film by coating. The lower limit is more preferably 2 mPa·s or more, and even more preferably 3 mPa·s or more. The upper limit is more preferably 50 mPa·s or less, even more preferably 30 mPa·s or less, and particularly preferably 15 mPa·s or less.

[0181] In the curable composition according to the present disclosure, the content of free metal not bonded or coordinated to pigments, etc. is preferably 100 ppm or less, more preferably 50 ppm or less, even more preferably 10 ppm or less, and particularly preferably substantially free. According to this embodiment, it is possible to expect effects such as stabilization of pigment dispersibility (prevention of aggregation), improvement of spectral characteristics due to improved dispersibility, stabilization of curable components, prevention of conductivity fluctuation due to elution of metal atoms and metal ions, and improvement of display characteristics.

[0182] It is also preferred that the curable composition according to the present disclosure is substantially free of terephthalic acid esters. Here, "substantially free" means that the content of terephthalic acid esters is 1,000 ppb by mass or less, more preferably 100 ppb by mass or less, and particularly preferably zero, based on the total mass of the curable composition.

[0183] The water content of the curable composition according to the present disclosure is preferably 3% by mass or less, more preferably 0.01% by mass to 1.5% by mass, and particularly preferably 0.1% by mass to 1.0% by mass. The water content can be measured by the Karl Fischer method.

[0184] <Containment Container> The container for storing the curable composition according to the present disclosure is not particularly limited, and any known container can be used. In addition, it is also preferable to use a multi-layer bottle whose inner wall is made of six types of six-layer resin or a bottle with a seven-layer structure made of six types of resin as the container, in order to prevent impurities from being mixed into the raw materials or the curable composition. Examples of such containers include the container described in JP-A-2015-123351. In addition, for the curable composition according to the present disclosure and the composition used for manufacturing an image sensor, it is also preferable that the inner wall of the storage container be made of glass, stainless steel, or the like, for the purposes of preventing metal elution from the inner wall of the container, improving the storage stability of the composition, and suppressing deterioration of the components.

[0185] <Method of producing curable composition> The curable composition according to the present disclosure can be produced by mixing the above-mentioned components. When producing the curable composition, all the components may be simultaneously dissolved and / or dispersed in a solvent to produce the curable composition, or, if necessary, each component may be appropriately prepared as two or more solutions or dispersions, which are mixed at the time of use (at the time of application) to produce the curable composition.

[0186] In addition, it is preferable that the production of the curable composition includes a process of dispersing the pigment. In the process of dispersing the pigment, mechanical forces used to disperse the pigment include compression, squeezing, impact, shear, and cavitation. Specific examples of these processes include a bead mill, a sand mill, a roll mill, a ball mill, a paint shaker, a microfluidizer, a high-speed impeller, a sand grinder, a flow jet mixer, high-pressure wet atomization, and ultrasonic dispersion. In addition, in the grinding of the pigment in a sand mill (bead mill), it is preferable to use beads with a small diameter, increase the bead packing rate, and perform the treatment under conditions that increase the grinding efficiency. In addition, it is preferable to remove coarse particles by filtration, centrifugation, or the like after the grinding treatment.

[0187] In producing the curable composition, it is preferable to filter the curable composition with a filter for the purpose of removing foreign matter and reducing defects. As the filter, any filter that has been used for filtering purposes can be used without any particular limitation. For example, there are filters using materials such as fluororesins such as polytetrafluoroethylene (PTFE), polyamide resins such as nylon (e.g., nylon-6, nylon-6,6), and polyolefin resins (including high-density and ultra-high-molecular-weight polyolefin resins) such as polyethylene and polypropylene (PP). Among these materials, polypropylene (including high-density polypropylene) and nylon are preferred.

[0188] The pore size of the filter is preferably 0.01 μm to 7.0 μm, more preferably 0.01 μm to 3.0 μm, and even more preferably 0.05 μm to 0.5 μm. When the pore size of the filter is within the above range, fine foreign matter can be removed more reliably. The nominal value of the filter manufacturer can be referred to for the pore size value of the filter. Various filters provided by Nippon Pall Co., Ltd. (DFA4201NIEY, etc.), Advantech Toyo Co., Ltd., Nippon Integris Co., Ltd. (formerly Nippon Microlith Co., Ltd.), Kitz Microfilter Co., Ltd., etc. can be used.

[0189] It is also preferable to use a fibrous filter medium as the filter. Examples of fibrous filter medium include polypropylene fiber, nylon fiber, glass fiber, etc. Commercially available products include SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.), and SHPX type series (SHPX003, etc.) manufactured by ROKI TECHNO CO., LTD.

[0190] When using a filter, different filters (for example, a first filter and a second filter, etc.) may be combined. In this case, filtration with each filter may be performed only once or two or more times. Filters having different pore sizes within the above-mentioned range may be combined. Filtration with the first filter may be performed only on the dispersion liquid, and filtration with the second filter may be performed after mixing with other components.

[0191] (cured product) The cured product according to the present disclosure is a cured product obtained by curing the curable composition according to the present disclosure. The cured product according to the present disclosure can be suitably used in color filters, etc. Specifically, it can be suitably used as a colored layer (pixel) of a color filter. The cured product according to the present disclosure is preferably a film-like cured product (cured film), and its film thickness can be appropriately adjusted according to the purpose. For example, the film thickness is preferably 20 μm or less, more preferably 10 μm or less, and even more preferably 5 μm or less. The lower limit of the film thickness is preferably 0.1 μm or more, more preferably 0.2 μm or more, and even more preferably 0.3 μm or more.

[0192] (Color filter) Next, the color filter according to the present disclosure will be described. The color filter according to the present disclosure has the cured product according to the present disclosure, and preferably has the cured product according to the present disclosure as a pixel of the color filter. The color filter according to the present disclosure can be used in a solid-state image sensor such as a CCD (charge-coupled device) or a CMOS (complementary metal-oxide semiconductor), an image display device, etc. The pixels of the color filter are not particularly limited, but examples thereof include red pixels, green pixels, blue pixels, cyan pixels, yellow pixels, and magenta pixels.

[0193] In the color filter according to the present disclosure, the thickness of the film made of the cured product according to the present disclosure can be adjusted appropriately depending on the purpose. The thickness is preferably 20 μm or less, more preferably 10 μm or less, and even more preferably 5 μm or less. The lower limit of the thickness is preferably 0.1 μm or more, more preferably 0.2 μm or more, and even more preferably 0.3 μm or more.

[0194] In the color filter according to the present disclosure, the pixel width is preferably 0.5 μm to 20.0 μm. The lower limit is preferably 1.0 μm or more, and more preferably 2.0 μm or more. The upper limit is preferably 15.0 μm or less, and more preferably 10.0 μm or less. The pixel Young's modulus is preferably 0.5 GPa to 20 GPa, and more preferably 2.5 GPa to 15 GPa.

[0195] Each pixel included in the color filter according to the present disclosure preferably has high flatness. Specifically, the surface roughness Ra of the pixel is preferably 100 nm or less, more preferably 40 nm or less, and even more preferably 15 nm or less. Although the lower limit is not specified, it is preferably 0.1 nm or more, for example. The surface roughness of the pixel can be measured, for example, using an AFM (atomic force microscope) Dimension3100 manufactured by Veeco. In addition, the contact angle of water on the pixel can be appropriately set to a preferred value, but is typically in the range of 50 to 110°. The contact angle can be measured, for example, using a contact angle meter CV-DT·A type (manufactured by Kyowa Interface Science Co., Ltd.). In addition, the volume resistance value of the pixel is preferably high. Specifically, the volume resistance value of the pixel is 10 9 It is preferable that the resistance is 10 Ω·cm or more. 11 It is more preferable that the resistivity is Ω·cm or more. There is no upper limit, but for example, 10 14The volume resistance of the pixel can be measured, for example, by using an ultra-high resistance meter 5410 (manufactured by Advantest Corporation). In addition, pixels obtained by curing the curable composition according to the present disclosure can also be suitably used in the pixel configuration described in WO 2019 / 102887.

[0196] In addition, the color filter according to the present disclosure may have a protective layer on the surface of the cured product according to the present disclosure. By providing a protective layer, various functions such as oxygen blocking, low reflection, hydrophilicity / hydrophobicity, and blocking of light of a specific wavelength (ultraviolet rays, near infrared rays, etc.) can be imparted. The thickness of the protective layer is preferably 0.01 μm to 10 μm, more preferably 0.1 μm to 5 μm. Methods for forming the protective layer include a method of forming the protective layer by applying a resin composition dissolved in an organic solvent, a chemical vapor deposition method, and a method of attaching a molded resin with an adhesive. The components constituting the protective layer include (meth)acrylic resin, ene-thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polysulfone resin, polyethersulfone resin, polyphenylene resin, polyarylene ether phosphine oxide resin, polyimide resin, polyamideimide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, polyol resin, polyvinylidene chloride resin, melamine resin, urethane resin, aramid resin, polyamide resin, alkyd resin, epoxy resin, modified silicone resin, fluorine resin, polycarbonate resin, polyacrylonitrile resin, cellulose resin, Si, C, W, Al2O3, Mo, SiO2, Si2N4, etc., and may contain two or more of these components. For example, in the case of a protective layer intended for oxygen blocking, the protective layer preferably contains a polyol resin, SiO2, and Si2N4. In addition, in the case of a protective layer intended for low reflection, the protective layer preferably contains a (meth)acrylic resin and a fluorine resin.

[0197] When the protective layer is formed by applying a resin composition, known methods such as spin coating, casting, screen printing, and ink jetting can be used as the method for applying the resin composition. Known organic solvents (e.g., propylene glycol-1-monomethyl ether-2-acetate, cyclopentanone, ethyl lactate, etc.) can be used as the organic solvent contained in the resin composition. When the protective layer is formed by chemical vapor deposition, known chemical vapor deposition methods (thermal chemical vapor deposition, plasma chemical vapor deposition, photochemical vapor deposition) can be used as the chemical vapor deposition method.

[0198] The protective layer may contain additives such as organic or inorganic particles, absorbents of specific wavelengths (e.g., ultraviolet rays, near infrared rays, etc.), refractive index adjusters, antioxidants, adhesives, and surfactants, as necessary. Examples of organic or inorganic particles include polymer particles (e.g., silicone resin particles, polystyrene particles, melamine resin particles), titanium oxide, zinc oxide, zirconium oxide, indium oxide, aluminum oxide, titanium nitride, titanium oxynitride, magnesium fluoride, hollow silica, silica, calcium carbonate, and barium sulfate. Known absorbents can be used as absorbents of specific wavelengths. Examples of ultraviolet absorbents and near infrared absorbents include the above-mentioned materials. The content of these additives can be appropriately adjusted, but is preferably 0.1% by mass to 70% by mass, and more preferably 1% by mass to 60% by mass, based on the total weight of the protective layer.

[0199] In addition, as the protective layer, the protective layers described in paragraphs 0073 to 0092 of JP2017-151176A can also be used.

[0200] The color filter may have an underlayer. The underlayer may be formed, for example, using a composition obtained by removing the colorant from the curable composition according to the present disclosure, and the composition forming the underlayer preferably contains at least one selected from the group consisting of the binder polymer, the surfactant, and the curable compound. Furthermore, the surface contact angle of the underlayer in a color filter, preferably a color filter having red, green and blue (RGB) pixels, is preferably 20° to 70° when measured with diiodomethane, and is preferably 30° to 80° when measured with water. When the contact angle is in the above range, the wettability during color filter formation is appropriate, and the coating property of the composition forming the underlayer is also excellent. In order to achieve the above contact angle range, a method such as adding a surfactant can be mentioned.

[0201] <Manufacturing method of color filters> Next, a method for producing a color filter according to the present disclosure will be described. The color filter according to the present disclosure can be suitably manufactured through a step of forming a curable composition layer on a support using the curable composition according to the present disclosure, and a step of forming a pattern in the curable composition layer by a photolithography method or a dry etching method.

[0202] -Photolithography method- First, a case where a color filter is manufactured by forming a pattern by photolithography will be described. The pattern formation by the photolithography method preferably includes a step of forming a curable composition layer on a support using the curable composition according to the present disclosure, a step of exposing the curable composition layer in a pattern, and a step of developing and removing the unexposed part of the curable composition layer to form a pattern (pixel). If necessary, a step of baking the curable composition layer (pre-baking step) and a step of baking the developed pattern (pixel) (post-baking step) may be provided.

[0203] In the step of forming a curable composition layer, a colored composition layer is formed on a support using the curable composition according to the present disclosure. The support is not particularly limited and can be appropriately selected depending on the application. For example, a glass substrate, a silicon substrate, etc. can be mentioned, and a silicon substrate is preferable. In addition, a charge-coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a transparent conductive film, etc. may be formed on the silicon substrate. In addition, a black matrix that isolates each pixel may be formed on the silicon substrate. In addition, an undercoat layer may be provided on the silicon substrate to improve adhesion with the upper layer, prevent diffusion of a substance, or flatten the substrate surface.

[0204] The curable composition can be applied by any known method, including, for example, a dropping method (drop casting), a slit coating method, a spray method, a roll coating method, a spin coating method, a casting coating method, a slit and spin method, a pre-wetting method (e.g., a method described in JP-A-2009-145395), various printing methods such as ejection printing such as inkjet (e.g., on-demand method, piezo method, thermal method) and nozzle jet, flexographic printing, screen printing, gravure printing, reverse offset printing, and metal mask printing, a transfer method using a mold, and a nanoimprint method. The application method by inkjet is not particularly limited, and examples thereof include the method described in "Expanding and Usable Inkjet - Infinite Possibilities Seen in Patents -, published in February 2005, Sumibe Techno Research" (particularly pages 115 to 133), and the methods described in JP 2003-262716 A, JP 2003-185831 A, JP 2003-261827 A, JP 2012-126830 A, JP 2006-169325 A, etc. In addition, for the application method of the curable composition, the descriptions in WO 2017 / 030174 and WO 2017 / 018419 can be referred to, and the contents of these are incorporated herein by reference.

[0205] The curable composition layer formed on the support may be dried (prebaked). When a film is produced by a low-temperature process, prebaking may not be performed. When prebaking is performed, the prebaking temperature is preferably 150° C. or lower, more preferably 120° C. or lower, and even more preferably 110° C. or lower. The lower limit can be, for example, 50° C. or higher, and can also be 80° C. or higher. The prebaking time is preferably 10 seconds to 300 seconds, more preferably 40 seconds to 250 seconds, and even more preferably 80 seconds to 220 seconds. Prebaking can be performed using a hot plate, an oven, or the like.

[0206] <<Exposure process>> Next, the curable composition layer is exposed to light in a pattern (exposure step). For example, the curable composition layer can be exposed to light in a pattern by using a stepper exposure machine or a scanner exposure machine through a mask having a predetermined mask pattern. This allows the exposed portion to be cured.

[0207] Examples of radiation (light) that can be used for exposure include g-line and i-line. Light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 nm to 300 nm) can also be used. Examples of light with a wavelength of 300 nm or less include KrF line (wavelength 248 nm) and ArF line (wavelength 193 nm), with KrF line (wavelength 248 nm) being preferred. Long-wave light sources with wavelengths of 300 nm or more can also be used.

[0208] The irradiation dose (exposure amount) is 0.03 J / cm 2 ~2.5J / cm 2 is preferred, and 0.05 J / cm 2 ~1.0J / cm 2 is more preferable. The oxygen concentration during exposure can be appropriately selected. In addition to exposure in air, exposure may be performed in a low-oxygen atmosphere with an oxygen concentration of 19 volume% or less (e.g., 15 volume%, 5 volume%, or substantially oxygen-free), or in a high-oxygen atmosphere with an oxygen concentration of more than 21 volume% (e.g., 22 volume%, 30 volume%, or 50 volume%). The exposure illuminance can be appropriately set, and is preferably 1,000 W / m2 ~100,000W / m 2 (For example, 5,000 W / m 2 , 15,000W / m 2 , or 35,000 W / m 2 The oxygen concentration and exposure illuminance may be appropriately combined. For example, the oxygen concentration is 10% by volume and the illuminance is 10,000 W / m 2 , oxygen concentration 35% by volume, illuminance 20,000 W / m 2 etc.

[0209] Next, the unexposed portion of the curable composition layer is developed and removed to form a pattern (pixels). The unexposed portion of the curable composition layer can be developed and removed using a developer. As a result, the unexposed portion of the curable composition layer in the exposure step is dissolved into the developer, and only the photocured portion remains. The developer is preferably an organic alkaline developer that does not damage the underlying elements or circuits. The temperature of the developer is preferably, for example, 20°C to 30°C. The development time is preferably 20 seconds to 180 seconds. In order to improve the removability of residues, the process of shaking off the developer every 60 seconds and supplying new developer may be repeated several times.

[0210] The developer is preferably an alkaline aqueous solution (alkaline developer) in which an alkaline agent is diluted with pure water. Examples of the alkaline agent include organic alkaline compounds such as ammonia, ethylamine, diethylamine, dimethylethanolamine, diglycolamine, diethanolamine, hydroxylamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, ethyltrimethylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis(2-hydroxyethyl)ammonium hydroxide, choline, pyrrole, piperidine, and 1,8-diazabicyclo[5.4.0]-7-undecene, and inorganic alkaline compounds such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, sodium silicate, and sodium metasilicate. From the viewpoints of environment and safety, the alkaline agent is preferably a compound having a large molecular weight. The concentration of the alkaline agent in the alkaline aqueous solution is preferably 0.001 to 10% by mass, and more preferably 0.01 to 1% by mass. The developer may further contain a surfactant. The surfactant may be any of those mentioned above, and nonionic surfactants are preferred.

[0211] After development and drying, it is preferable to perform additional exposure treatment or heating treatment (post-baking). Additional exposure treatment and post-baking are curing treatments after development to complete curing. The heating temperature in post-baking is, for example, preferably 100°C to 240°C, more preferably 200°C to 240°C. Post-baking can be performed continuously or batchwise using a heating means such as a hot plate, a convection oven (hot air circulation dryer), or a high-frequency heater to ensure that the developed film meets the above conditions. When additional exposure treatment is performed, it is preferable that the light used for exposure has a wavelength of 400 nm or less. The additional exposure treatment may be performed by the method described in Korean Patent Publication No. 20170122130.

[0212] -Dry etching method- Next, a case where a color filter is manufactured by forming a pattern by a dry etching method will be described. The pattern formation by the dry etching method preferably includes a step of forming a curable composition layer on a support using the curable composition according to the present disclosure, curing the entire curable composition layer to form a cured product layer, a step of forming a photoresist layer on the cured product layer, a step of exposing the photoresist layer in a pattern shape and developing it to form a resist pattern, and a step of dry etching the cured product layer using an etching gas with the resist pattern as a mask. In the formation of the photoresist layer, it is preferable to further perform a pre-bake treatment. In particular, as a process for forming the photoresist layer, a form in which a heat treatment after exposure and a heat treatment after development (post-bake treatment) are performed is desirable. For the pattern formation by the dry etching method, the description in paragraphs 0010 to 0067 of JP 2013-064993 A can be referred to, and the contents thereof are incorporated herein.

[0213] <Solid-state imaging element> The solid-state imaging device according to the present disclosure includes the cured product according to the present disclosure, and preferably has a color filter according to the present disclosure. A preferred embodiment of the solid-state imaging device according to the present disclosure includes an embodiment in which at least one pixel selected from the group consisting of red pixels, green pixels, and blue pixels is the cured product according to the present disclosure (RGB pixels). Another preferred embodiment of the solid-state imaging element according to the present disclosure is one in which at least one pixel selected from the group consisting of cyan pixels, yellow pixels, and magenta pixels is a cured product according to the present disclosure (CMY pixels). The configuration of the solid-state imaging device according to the present disclosure is not particularly limited as long as it comprises a cured product according to the present disclosure and functions as a solid-state imaging device, and examples thereof include the following configurations.

[0214] The substrate has a plurality of photodiodes constituting a light receiving area of ​​a solid-state imaging device (such as a CCD (charge-coupled device) image sensor or a CMOS (complementary metal oxide semiconductor) image sensor) and a transfer electrode made of polysilicon or the like, a light-shielding film having an opening only for the light receiving portion of the photodiode on the photodiode and the transfer electrode, a device protection film made of silicon nitride or the like formed on the light-shielding film so as to cover the entire light-shielding film and the light receiving portion of the photodiode, and a color filter on the device protection film. Furthermore, the device protection film may have a light-collecting means (e.g., a microlens, etc.; the same applies below) on the device protection film and below the color filter (on the side closer to the substrate), or a light-collecting means on the color filter. The color filter may have a structure in which each colored pixel is embedded in a space partitioned by partitions, for example, in a lattice shape. In this case, the partitions preferably have a low refractive index with respect to each colored pixel. Examples of imaging devices having such a structure include those described in JP 2012-227478 A, JP 2014-179577 A, and WO 2018 / 043654 A. Imaging devices including a solid-state imaging element according to the present disclosure can be used for digital cameras, electronic devices having imaging functions (such as mobile phones), as well as vehicle-mounted cameras and surveillance cameras. In addition, as described in JP 2019-211559 A, the solid-state imaging element according to the present disclosure may have an ultraviolet absorbing layer (UV cut filter) in the structure of the solid-state imaging element, thereby improving the light resistance of the color filter.

[0215] (Image display device) The image display device according to the present disclosure preferably includes the cured product according to the present disclosure and the color filter according to the present disclosure. Examples of the image display device include liquid crystal display devices and organic electroluminescence display devices. The definition of the image display device and details of each image display device are described in, for example, "Electronic Display Devices" (written by Akio Sasaki, published by Kogyo Chosakai Co., Ltd. in 1990) and "Display Devices" (written by Junsho Ibuki, published by Sangyo Tosho Co., Ltd. in 1989). In addition, liquid crystal display devices are described in, for example, "Next Generation Liquid Crystal Display Technology" (edited by Tatsuo Uchida, published by Kogyo Chosakai Co., Ltd. in 1994). There are no particular limitations on the liquid crystal display device, and examples thereof include various types of liquid crystal display devices described in the above "Next Generation Liquid Crystal Display Technology." EXAMPLES

[0216] The present disclosure will be described in detail below with reference to examples, but the present disclosure is not limited to these examples. In the present examples, "%" and "parts" mean "% by mass" and "parts by mass", respectively, unless otherwise specified. In addition, in polymer compounds, unless otherwise specified, the molecular weight is the weight average molecular weight (Mw), and the ratio of the constitutional units is the mole percentage. The ethylenically unsaturated bond value (C=C value) was measured by the method described above.

[0217] <Measurement of weight average molecular weight (Mw)> The weight average molecular weight (Mw) of the resin was measured by gel permeation chromatography (GPC) according to the following conditions. Column type: A column consisting of TSKgel Super HZM-H (manufactured by Tosoh Corporation), TSKgel Super HZ4000 (manufactured by Tosoh Corporation), and TSKgel Super HZ2000 (manufactured by Tosoh Corporation) Developing solvent: Tetrahydrofuran Column temperature: 40℃ Flow rate (sample injection volume): 1.0 μL (sample concentration 0.1% by mass) Device name: Tosoh Corporation HLC-8220GPC Detector: RI (refractive index) detector Calibration curve base resin: polystyrene resin

[0218] <Acid value measurement method> The acid value of the resin represents the mass of potassium hydroxide required to neutralize the acidic components per 1 g of solid content. The acid value of the resin was measured as follows. That is, the measurement sample was dissolved in a mixed solvent of tetrahydrofuran / water = 9 / 1 (mass ratio), and the obtained solution was neutralized and titrated with a 0.1 mol / L aqueous sodium hydroxide solution at 25 ° C. using a potentiometric titrator (product name: AT-510, manufactured by Kyoto Electronics Manufacturing Co., Ltd.). The inflection point of the titration pH curve was set as the titration end point, and the acid value was calculated by the following formula. A=56.11×Vs×0.5×f / w A: Acid value (mgKOH / g) Vs: Amount of 0.1 mol / L sodium hydroxide solution required for titration (mL) f: Potency of 0.1 mol / L sodium hydroxide solution w: Measurement sample mass (g) (solid content equivalent)

[0219] <Production of Dispersion> (Preparation of Dispersion G1) 8.75 parts by mass of CI Pigment Green 36 as the G pigment, 3.85 parts by mass of CI Pigment Yellow 185 as the Y pigment, 1.40 parts by mass of Derivative 1 as the pigment derivative, 18.7 parts by mass of Dispersant A1 (equivalent to 5.61 parts by mass of solids) as the resin, and 67.3 parts by mass of propylene glycol monomethyl ether acetate as the solvent were mixed, and then 230 parts by mass of zirconia beads having a diameter of 0.3 mm were added and the mixture was dispersed for 5 hours using a paint shaker. The beads were then separated by filtration to produce dispersion G1.

[0220] Derivative 1: Compound having the following structure (in the following structural formula, Et represents an ethyl group)

[0221] [ka]

[0222] (Production of Dispersions G2 to G48, G81 to G83, and Comparative Dispersions G1 to G4) Each dispersion was produced in the same manner as for Dispersion G1, except that the type and blending amount of the resin, and the type of the solvent were changed as shown in Table 1 or Table 2 below, respectively.

[0223] (Production of Dispersions G49 to G62) A mixture of G pigment of the type shown in Table 3 below in the parts by weight shown in Table 3 below, Y pigment of the type shown in Table 3 below in the parts by weight shown in Table 3 below, pigment derivative of the type shown in Table 3 below in the parts by weight shown in Table 3 below, 18.7 parts by weight (equivalent to 5.61 parts by weight of solids) of the above-mentioned dispersant B4, and 67.3 parts by weight of propylene glycol monomethyl ether acetate as a solvent was mixed, and then 230 parts by weight of zirconia beads having a diameter of 0.3 mm were added. The mixture was dispersed for 5 hours using a paint shaker, and the beads were separated by filtration to produce a dispersion.

[0224] (Preparation of Dispersions R1 to R12 and Y1, and Comparative Dispersions R1 to R4) A mixture of the type of pigment shown in Table 4 below in the parts by weight shown in Table 4 below, the pigment derivative shown in Table 4 below in the parts by weight shown in Table 4 below, the dispersant shown in Table 4 below in the parts by weight shown in Table 4 below, and 60 parts by weight of propylene glycol monomethyl ether acetate as a solvent was mixed, and then 230 parts by weight of zirconia beads having a diameter of 0.3 mm were added. The mixture was dispersed for 5 hours using a paint shaker, and the beads were separated by filtration to produce a dispersion.

[0225] (Preparation of Dispersions B1 to B6 and Comparative Dispersions B1 to B4) A pigment of the type shown in Table 5 below in the parts by weight shown in Table 5 below, Derivative 4 in the parts by weight shown in Table 5 below, a dispersant shown in Table 5 below in the parts by weight shown in Table 5 below, and 60 parts by weight of propylene glycol monomethyl ether acetate as a solvent were mixed, and then 230 parts by weight of zirconia beads having a diameter of 0.3 mm were added. The mixture was dispersed for 5 hours using a paint shaker, and the beads were separated by filtration to produce a dispersion.

[0226] [Table 1]

[0227] [Table 2]

[0228] [Table 3]

[0229] [Table 4]

[0230] [Table 5]

[0231] The raw materials shown by the abbreviations in Tables 1 to 5 above are as follows.

[0232] <Resin> Dispersants A1 to A20, B1 to B23, and C1 to C3: 30 mass % solutions of the above-mentioned dispersants A1 to A20, B1 to B23, and C1 to C3 in PGMEA Comparative dispersants 1 to 4: Dispersants synthesized by the methods shown below

[0233] <Production method of comparative dispersant 1> A reaction vessel equipped with a gas inlet tube, a thermometer, a condenser, and a stirrer was charged with 75 parts by mass of methyl methacrylate, 75 parts by mass of n-butyl acrylate, and 68.1 parts by mass of propylene glycol monomethyl ether acetate (PGMEA), and the inside of the reaction vessel was replaced with nitrogen gas. The inside of the reaction vessel was heated to 70 ° C, 9 parts by mass of 3-mercapto-1, 2-propanediol was added, and 0.18 parts by mass of AIBN (azobisisobutyronitrile) was further added, and the reaction was allowed to proceed for 12 hours. It was confirmed that 95% had reacted by measuring the solid content. Subsequently, 14.6 parts by mass of pyromellitic anhydride, 105.5 parts by mass of PGMEA, and 0.3 parts by mass of 1,8-diazabicyclo-[5.4.0]-7-undecene (DBU) as a reaction catalyst were added, and the reaction was allowed to proceed for 7 hours at 120 ° C. It was confirmed by measuring the acid value that 98% or more of the acid anhydride had been half-esterified, and the reaction was terminated. PGMEA was added to adjust the solid concentration to 30%, and comparative dispersant 1 with an acid value of 41 mgKOH / g and a weight average molecular weight of 8,800 was obtained.

[0234] <Production method of comparative dispersant 2> In a reaction vessel equipped with a gas inlet tube, a thermometer, a condenser, and a stirrer, 372 parts of n-butyl acrylate, 372 parts of methyl methacrylate, and 1,236 parts of propylene glycol monomethyl ether acetate (PGMAc) were charged and replaced with nitrogen gas. The inside of the reaction vessel was heated to 80°C, and 80 parts of 1-thioglycerol and 0.75 parts of 2,2'-azobisisobutyronitrile were added and reacted for 12 hours (first step). It was confirmed that 95% had reacted by measuring the solid content. Next, 130 parts of pyromellitic anhydride, 195 parts of PGMAc, and 1.0 part (1,000 ppm) of 1,8-diazabicyclo-[5.4.0]-7-undecene as a catalyst were added, and the reaction was carried out at 120°C for 7 hours (second step). It was confirmed that 98% or more of the acid anhydride had been half-esterified by measuring the acid value. Finally, 46 parts of 2-methacryloyloxyethyl isocyanate (MOI) and 69 parts of PGMAc were added, and infrared spectroscopy (IR) was performed to determine the 2,270 cm -1The reaction was continued until the disappearance of the peak was confirmed (third step). After the disappearance of the peak was confirmed, the reaction solution was cooled and the solid content was adjusted with PGMAc to obtain a solution of comparative dispersant 2 with a solid content of 30%.

[0235] <Production method of comparative dispersant 3> In a reaction vessel equipped with a gas inlet tube, a thermometer, a condenser, and a stirrer, 8 parts of 3-mercapto-1,2-propanediol, 12 parts of pyromellitic anhydride, 80 parts of propylene glycol monomethyl ether acetate (PGMAc), and 0.2 parts of monobutyltin oxide as a catalyst were charged, and after replacing with nitrogen gas, the reaction was carried out at 120°C for 5 hours. It was confirmed by measuring the acid value that 95% or more of the acid anhydride was half-esterified. Next, 30 parts of methyl methacrylate (MMA), 10 parts of t-butyl acrylate (tBA), 10 parts of ethyl acrylate (EA), 5 parts of methacrylic acid (MAA), 10 parts of benzyl methacrylate (BzMA), and 35 parts of 2-hydroxyethyl methacrylate (HEMA) were charged into the reaction vessel, the inside of the reaction vessel was heated to 80°C, and 1 part of 2,2'-azobis(2,4-dimethylvaleronitrile) was added and reacted for 12 hours. A solids content measurement confirmed that 95% had reacted. Next, the inside of the flask was replaced with air, 38.0 parts of 2-methacryloyloxyethyl isocyanate (MOI) and 0.1 parts of hydroquinone were charged, and the reaction was carried out at 70°C for 4 hours (third step). -1 After confirming the disappearance of the peak, the reaction solution was cooled and the solid content was adjusted with PGMAc to obtain a solution of Comparative Dispersant 3 with a solid content of 30%. The resulting Comparative Dispersant 3 had an acid value of 40 mgKOH / g and a weight average molecular weight of 12,000.

[0236] <Production method of comparative dispersant 4> Into a reaction vessel equipped with a gas inlet tube, a thermometer, a condenser, and a stirrer, 87 parts of 1-thioglycerol, 24 parts of 1,6-hexanediol, 235 parts of 3,3',4,4'-biphenyltricarboxylic anhydride, 650 parts of PGMAc, and 0.2 part of monobutyltin oxide as a catalyst were charged. After purging with nitrogen gas, the mixture was reacted at 120 °C for 5 hours (first step). It was confirmed by measurement of the acid value that 95% or more of the acid anhydride was half-esterified. Next, 523 parts of the compound obtained in the first step in terms of solid content, 100 parts of 2-hydroxypropyl methacrylate, 50 parts of ethyl acrylate, 300 parts of methyl methacrylate, 300 parts of n-butyl methacrylate, 200 parts of benzyl methacrylate, 50 parts of methacrylic acid, and 663 parts of PGMAc were charged. The inside of the reaction vessel was heated to 80 °C, 1.2 parts of 2,2'-azobis(2,4-dimethylvaleronitrile) was added, and the mixture was reacted for 12 hours (second step). It was confirmed by measurement of the solid content that 95% of the reaction had occurred. Finally, 500 parts of a 50% PGMAC solution of the compound obtained in the second step, 31.0 parts of 2-acryloyloxyethyl isocyanate (AOI), and 0.1 part of hydroquinone were charged, and the reaction was carried out until disappearance of the peak at 2270 cm-1 based on the isocyanate group was confirmed by IR (third step). After confirmation of the disappearance of the peak, the reaction solution was cooled and the solid content was adjusted with PGMAc to obtain Comparative Dispersant 4 solution having a solid content of 30%. The acid value of the obtained Comparative Dispersant 4 was 118 mgKOH / g, the C=C value was 1,274 mmol / g, and the weight average molecular weight was 7,000.

[0237] <Pigment Derivative> Derivatives 2 to 5: The following compounds

[0238]

Chemical Formula

[0239] <G Pigment> PG36: C.I. Pigment Green 36 PG58: C.I. Pigment Green 58 PG7: C.I. Pigment Green 7 PG59: C.I. Pigment Green 59 PG62: C.I. Pigment Green 62 PG63: C.I. Pigment Green 63

[0240] <Y Pigment> PY139: C.I. Pigment Yellow 139 PY150: C.I. Pigment Yellow 150 PY185: C.I. Pigment Yellow 185

[0241] <Other Pigments> PR254: C.I. Pigment Red 254 PR264: C.I. Pigment Red 264 PR272: C.I. Pigment Red 272 PO71: C.I. Pigment Orange 71 PB15:6: C.I. Pigment Blue 15:6 PV23: C.I. Pigment Violet 23

[0242] <Solvent> PGMEA: Propylene Glycol Monomethyl Ether Acetate PGME: Propylene Glycol Monomethyl Ether

[0243] (Examples G1 - G62 and G81 - G83, and Comparative Examples G1 - G4) <Production of Curable Composition> The following raw materials were mixed to prepare a curable composition. Dispersion liquid described in Tables 7 - 10 below: 39.4 parts by mass Resin C1: 0.58 parts by mass Polymerizable compound E1: 0.54 parts by mass Photoinitiator F3: 0.33 parts by mass Surfactant H1: 4.17 parts by mass p-Methoxyphenol: 0.0006 parts by mass Propylene glycol monomethyl ether acetate (PGMEA): 7.66 parts by mass

[0244] Details of the materials indicated by the above abbreviations are as follows:

[0245] Resin C1: Resin shown below, Mw 10,000, the numbers added to the main chain are molar ratios, and the numbers in parentheses to the right of the ethyleneoxy units represent the average number of repetitions.

[0246] [ka]

[0247] Polymerizable compound E1: KAYARAD DPHA (manufactured by Nippon Kayaku Co., Ltd.) Photopolymerization initiator F3: a compound having the following structure.

[0248] [ka]

[0249] Surfactant H1: 1 mass % PGMEA solution of the following mixture (Mw=14,000): In the following formula, % indicating the proportion of repeating units is mol %.

[0250] [ka]

[0251] (Examples G63 to G80) <Production of Curable Composition> Except for changing the types and amounts of the dispersion, resin, curable compound, photopolymerization initiator, and solvent as shown in Table 6, the same procedures as in Example G23 were carried out to prepare curable compositions.

[0252] [Table 6]

[0253] Details of the compounds listed in Table 6 other than those mentioned above are shown below. Resin C2: Resin shown below, Mw 11,000, the numbers added to the main chain are molar ratios, and the numbers in parentheses to the right of the ethyleneoxy units represent the average number of repetitions.

[0254] [ka]

[0255] E2: Compound with the following structure

[0256] [ka]

[0257] E3: Compound with the following structure

[0258] [ka]

[0259] E4: Compound having the following structure

[0260] [ka]

[0261] E5: Aronix TO-2349 (manufactured by Toagosei Co., Ltd.) F1: IRGACURE-OXE01 (manufactured by BASF), a compound having the following structure. F2: IRGACURE-OXE02 (manufactured by BASF), a compound having the following structure. F4: IRGACURE 369 (manufactured by BASF), a compound having the following structure. F5: A compound having the following structure.

[0262] [ka]

[0263] (Examples R1 to R12 and Comparative Examples R1 to R4) <Production of Curable Composition> The following ingredients were mixed to prepare a curable composition. Dispersion liquid described in Table 11 below: 60.0 parts by weight Resin C1: 10.0 parts by mass Polymerizable compound E1: 3.10 parts by mass Photopolymerization initiator F3: 0.80 parts by mass Surfactant H1: 5.00 parts by mass p-Methoxyphenol: 0.001 parts by mass Propylene glycol monomethyl ether acetate (PGMEA): 21.1 parts by mass

[0264] (Examples B1 to B6 and Comparative Examples B1 to B4) <Production of Curable Composition> The following ingredients were mixed to prepare a curable composition. Dispersion liquid described in Table 12 below: 65.0 parts by weight Resin C1: 7.00 parts by mass Polymerizable compound E1: 2.60 parts by mass Photopolymerization initiator F3: 0.70 parts by mass Surfactant H1: 5.00 parts by mass p-Methoxyphenol: 0.001 parts by mass Propylene glycol monomethyl ether acetate (PGMEA): 19.7 parts by mass

[0265] The following evaluations were carried out using the obtained curable compositions. The evaluation results are shown in Tables 7 to 12.

[0266] <Dispersion stability> The initial viscosity (V0) of the curable composition obtained above was measured using "RE-85L" manufactured by Toki Sangyo Co., Ltd. Next, this curable composition was left to stand at 45°C for 3 days, and the viscosity (V1) after standing was measured. The viscosity increase rate (%) of the curable composition after standing was calculated from the following formula, and the dispersion stability was evaluated according to the following evaluation criteria. The smaller the viscosity increase rate (%), the better the dispersion stability. The viscosity of the curable composition was measured at a temperature adjusted to 25°C. Viscosity increase rate (%) = [(viscosity after standing (V1) - initial viscosity (V0)) / initial viscosity (V0)] x 100 A: 0≦Viscosity increase rate≦3% B:3%<viscosity increase rate≦5% C:5%<viscosity increase rate≦10% D: 10%< Viscosity increase rate≦15% E: 15%< Viscosity increase rate

[0267] <Moisture resistance> Each curable composition was applied onto a silicon wafer using a spin coater so that the film thickness after prebaking would be 0.7 μm, and the applied composition was heat-treated (prebaked) for 120 seconds using a hot plate at 100° C. Next, light with a wavelength of 365 nm was applied at 500 mJ / cm using an i-line stepper exposure device FPA-3000i5+ (Canon Corporation). 2 The film was exposed to light at an exposure dose of 1000 nm. A heat treatment (post-baking) was then performed for 300 seconds using a hot plate at 220° C. to form a film. The film thus obtained was subjected to a moisture resistance test for 250 hours under the conditions of a temperature of 130° C. and a humidity of 85% RH using a moisture resistance tester (HAST device PC-304R8, manufactured by Hirayama Seisakusho Co., Ltd.), and the film thickness after the moisture resistance test was measured. When [film thickness after moisture resistance test] / [film thickness before moisture resistance test]=X, the moisture resistance was evaluated according to the following criteria. AA:X≧0.99 A: 0.95≦X<0.99 B: 0.9≦X<0.95 C: 0.8≦X<0.9 D: 0.7≦X<0.8 E:X<0.7

[0268] <Adhesion> CT-4000 (manufactured by Fujifilm Electronic Materials Co., Ltd.) was applied to a silicon wafer by spin coating so that the film thickness was 0.1 μm, and heated at 220° C. for 1 hour using a hot plate to form an undercoat layer. Each curable composition was applied to the silicon wafer with the undercoat layer by spin coating, and then heated at 100° C. for 2 minutes using a hot plate to obtain a composition layer with a film thickness of 0.5 μm. An i-line stepper FPA-3000i5+ (manufactured by Canon Inc.) was used to apply light having a wavelength of 365 nm at 500 mJ / cm2 to this composition layer through a mask pattern in which square pixels with sides of 1.1 μm were arranged in an area of ​​4 mm×3 mm on the substrate. 2 The composition layer after exposure was paddle-developed at 23°C for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide. Thereafter, the composition layer was rinsed with water using a spin shower, and then washed with pure water. Thereafter, the water droplets were blown off with high-pressure air, the silicon wafer was naturally dried, and then post-baked at 220°C for 300 seconds using a hot plate to form a pattern. The obtained pattern was observed using an optical microscope, and the number of patterns that were in close contact among all patterns was counted to evaluate the adhesion. A: All patterns are tightly attached. B: The percentage of closely-contacted patterns is 95% or more but less than 100% of all patterns. C: The percentage of closely-contacted patterns is 90% or more but less than 95% of all patterns. D: The percentage of closely-contacted patterns is 85% or more but less than 90% of all patterns. E: Less than 85% of all patterns are in close contact.

[0269] <Developability> CT-4000 (manufactured by Fujifilm Electronic Materials Co., Ltd.) was applied to a silicon wafer by spin coating so that the film thickness was 0.1 μm, and heated at 220° C. for 1 hour using a hot plate to form an undercoat layer. Each curable composition was applied to the silicon wafer with the undercoat layer by spin coating, and then heated at 100° C. for 2 minutes using a hot plate to obtain a composition layer with a film thickness of 1 μm. An i-line stepper FPA-3000i5+ (manufactured by Canon Inc.) was used to apply light having a wavelength of 365 nm at 200 mJ / cm2 to this composition layer through a mask pattern in which square pixels with sides of 1.1 μm were arranged in an area of ​​4 mm×3 mm on the substrate. 2 The composition layer after exposure was paddle-developed at 23°C for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide. After that, the composition layer was rinsed with water using a spin shower, and then washed with pure water. After that, the water droplets were blown off with high-pressure air, the silicon wafer was naturally dried, and then post-baked at 200°C for 300 seconds using a hot plate to form a pattern. The presence or absence of residuals between the patterns was observed to evaluate the developability. The area outside the pattern formation area (unexposed area) was observed with a scanning electron microscope (SEM) (magnification 10,000 times), and residues with a diameter of 0.1 μm or more per 5 μm × 5 μm area (1 area) of the unexposed area were counted and evaluated according to the following evaluation criteria. A: Absolutely no residue per area. B: Fewer than 10 residues per area. C: The number of residues per area is 10 or more but less than 20. D: The number of residues per area is between 20 and 30. E: The number of residues per area is between 30 and 100. F: Development was not possible at all.

[0270] [Table 7]

[0271] [Table 8]

[0272] [Table 9]

[0273] [Table 10]

[0274] [Table 11]

[0275] [Table 12]

[0276] As shown in Tables 7 to 12 above, the curable compositions of the Examples were superior in dispersion stability and moisture resistance of the resulting cured products to the cured compositions of the Comparative Examples. Furthermore, as shown in Tables 7 to 12 above, the curable compositions of the examples were also excellent in developability and adhesion of the resulting cured products.

[0277] (Example Y1) In Example G23, the same effect can be obtained by using Dispersion Y1 instead of Dispersion G23.

[0278] (Examples G101 to G183, R101 to R112 and B101 to B106) In Examples G101 to G183, R101 to R112 and B101 to B106, the curable compositions of Examples G1 to G83, R1 to R12 and B1 to B6 were used, respectively. In order to avoid overlapping with the above curable compositions in color, the following Red, Green, and Blue compositions were used in place of the above curable compositions. For example, the curable compositions of Examples G1 to G83 are green, the curable compositions of Examples R1 to R12 are red, and the curable compositions of Examples B1 to B6 are blue.

[0279] The Red composition was applied onto a silicon wafer by spin coating so that the film thickness after formation would be 1.0 μm. Then, the wafer was heated at 100° C. for 2 minutes using a hot plate. Next, an i-line stepper exposure system FPA-3000i5+ (Canon Inc.) was used to apply 1,000 mJ / cm 2 The substrate was exposed to light at 1000 nm through a mask with a dot pattern of 2 μm square. Then, paddle development was performed at 23° C. for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH). After that, the substrate was rinsed with a spin shower and further washed with pure water. Next, the substrate was heated at 200° C. for 5 minutes using a hot plate to pattern the red composition on the infrared cut filter pattern. Similarly, the green composition and the blue composition were patterned in sequence to form red, green and blue colored patterns (Bayer patterns). The Bayer pattern is a repeated 2 x 2 array of color filter elements, each having one red element, two green elements, and one blue element, as disclosed in U.S. Pat. No. 3,971,065. This was incorporated into a solid-state imaging device according to a known method. The obtained solid-state imaging device was irradiated with infrared rays by an infrared light emitting diode (infrared LED) in a low illuminance environment (0.001 lux), an image was captured, and the image performance was evaluated. When any of the curable compositions obtained in Examples G1 to G83, R1 to R12, or B1 to B6 was used, a solid-state imaging device having suitable image recognition ability and moisture resistance was obtained.

[0280] The Red compositions, Green compositions, and Blue compositions other than the curable compositions of Examples G1 to G83, R1 to R12, and B1 to B6 used in Examples G101 to G183, R101 to R112, and B101 to B106 are as follows.

[0281] -Red composition- The following components were mixed and stirred, and then filtered through a nylon filter having a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to prepare a Red composition. Red pigment dispersion: 51.7 parts by weight Resin 4 (40% by mass PGMEA solution): 0.6 parts by mass Polymerizable compound 4: 0.6 parts by mass Photopolymerization initiator 1: 0.3 parts by weight Surfactant 1: 4.2 parts by weight PGMEA: 42.6 parts by mass

[0282] -Green composition- The following components were mixed and stirred, and then filtered through a nylon filter having a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to prepare a Green composition. Green pigment dispersion: 73.7 parts by mass Resin 4 (40% by mass PGMEA solution): 0.3 parts by mass Polymerizable compound 1: 1.2 parts by mass Photopolymerization initiator 1: 0.6 parts by weight Surfactant 1: 4.2 parts by weight Ultraviolet absorber (UV-503, manufactured by Daito Chemical Co., Ltd.): 0.5 parts by mass PGMEA: 19.5 parts by mass

[0283] -Blue composition- The following components were mixed and stirred, and then filtered through a nylon filter having a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to prepare a Blue composition. Blue pigment dispersion: 44.9 parts by mass Resin 4 (40% by mass PGMEA solution): 2.1 parts by mass Polymerizable compound 1: 1.5 parts by mass Polymerizable compound 4: 0.7 parts by mass Photopolymerization initiator 1: 0.8 parts by weight Surfactant 1: 4.2 parts by weight PGMEA: 45.8 parts by mass

[0284] The raw materials used for the Red, Green, and Blue compositions are as follows:

[0285] ·Red pigment dispersion A mixture of 9.6 parts by mass of CI Pigment Red 254, 4.3 parts by mass of CI Pigment Yellow 139, 6.8 parts by mass of a dispersant (Disperbyk-161, manufactured by BYK Chemie), and 79.3 parts by mass of PGMEA was mixed and dispersed for 3 hours using a bead mill (zirconia beads, 0.3 mm diameter) to prepare a pigment dispersion. Thereafter, the mixture was mixed and dispersed at 2,000 kg / cm using a high-pressure disperser NANO-3000-10 equipped with a pressure reducing mechanism (manufactured by Japan BEE Co., Ltd.). 3 The dispersion treatment was carried out at a flow rate of 500 g / min under a pressure of 1000 g / min. This dispersion treatment was repeated 10 times to obtain a red pigment dispersion liquid.

[0286] ·Green pigment dispersion A mixture of 6.4 parts by mass of CI Pigment Green 36, 5.3 parts by mass of CI Pigment Yellow 150, 5.2 parts by mass of a dispersant (Disperbyk-161, manufactured by BYK Chemie), and 83.1 parts by mass of PGMEA was mixed and dispersed for 3 hours using a bead mill (zirconia beads 0.3 mm in diameter) to prepare a pigment dispersion. Thereafter, the mixture was mixed and dispersed at 2,000 kg / cm using a high-pressure disperser NANO-3000-10 equipped with a pressure reducing mechanism (manufactured by Japan BEE Co., Ltd.). 3 The dispersion treatment was carried out at a flow rate of 500 g / min under a pressure of 1000 g / min. This dispersion treatment was repeated 10 times to obtain a green pigment dispersion.

[0287] ·Blue pigment dispersion A mixture of 9.7 parts by mass of CI Pigment Blue 15:6, 2.4 parts by mass of CI Pigment Violet 23, 5.5 parts of a dispersant (Disperbyk-161, manufactured by BYK Chemie), and 82.4 parts of PGMEA was mixed and dispersed for 3 hours using a bead mill (zirconia beads, 0.3 mm diameter) to prepare a pigment dispersion. Thereafter, the mixture was mixed and dispersed at 2,000 kg / cm using a high-pressure disperser NANO-3000-10 equipped with a pressure reducing mechanism (manufactured by Japan BEE Co., Ltd.). 3 The dispersion treatment was carried out at a flow rate of 500 g / min under a pressure of 1000 g / min. This dispersion treatment was repeated 10 times to obtain a blue pigment dispersion.

[0288] Polymerizable compound 1: KAYARAD DPHA (a mixture of dipentaerythritol hexaacrylate and dipentaerythritol pentaacrylate, manufactured by Nippon Kayaku Co., Ltd.) Polymerizable compound 4: structure shown below

[0289] [ka]

[0290] Polymerizable compound 5: Structure shown below (a mixture of the compound on the left and the compound on the right in a molar ratio of 7:3)

[0291] [ka]

[0292] Resin 4: Structure shown below (acid value: 70 mg KOH / g, Mw=11,000, ratio of each structural unit is molar ratio)

[0293] [ka]

[0294] Photopolymerization initiator 1: IRGACURE-OXE01 (1-[4-(phenylthio)]-1,2-octanedione-2-(O-benzoyloxime), manufactured by BASF) Surfactant 1: 1 mass % PGMEA solution of the following mixture (Mw = 14,000). In the following formula, the units of % (62% and 38%) indicating the proportion of the constituent units are % by mass.

[0295] [ka]

[0296] (Example 201) <Production of Curable Composition> The following ingredients were mixed to prepare a curable composition. 2.1 parts by mass of CI Pigment Blue 15:3, 3.5 parts by mass of Dispersant B1, and propylene glycol monomethyl ether acetate were mixed, 230 parts by mass of zirconia beads having a diameter of 0.3 mm were added, and a dispersion treatment was carried out for 5 hours using a paint shaker. The beads were separated by filtration to produce a pigment dispersion with a solids content of 20% by weight. Next, the obtained pigment dispersion was mixed with propylene glycol monomethyl ether acetate in an amount such that the total addition amount was 90.0 parts by mass when combined with the above addition amount, 1.1 parts by mass of dispersant B1, 2.7 parts by mass of polymerizable compound M2 (compound below), 0.5 parts by mass of photopolymerization initiator I2 (compound below), 0.10 parts by mass of ultraviolet absorber U1 (compound below), and 0.01 parts by mass of surfactant 1 (compound above) to prepare a curable composition (cyan color).

[0297] The obtained curable composition was used for the same evaluation as above, and the same evaluation results as in Example G23 were obtained.

[0298] M2: A mixture of compounds with the following structure (compound on the left: compound on the right = 7:3 (mass ratio))

[0299] [ka]

[0300] I2: Compound having the following structure (oxime compound) U1: Compound having the following structure (conjugated diene compound)

[0301] [ka]

[0302] [Preparation of Dispersion] <Dispersion liquid G301> A dispersion was prepared in the same manner as Dispersion G23, except that Pigment G was replaced with Pigment 1.

[0303] <Dispersion liquid G302> A dispersion was prepared in the same manner as Dispersion G23, except that Pigment G was changed to Pigment 2.

[0304] The structures of Pigment 1 and Pigment 2 are as follows:

[0305] [ka]

[0306] (Example G301) A curable composition was produced in the same manner as in Example G1, except that Dispersion G1 in Example G1 was changed to Dispersion G301. The obtained curable composition was used to perform the same evaluation as above, and the same evaluation results as in Example G23 were obtained.

[0307] (Example G302) A curable composition was produced in the same manner as in Example G1, except that Dispersion G1 in Example G1 was changed to Dispersion G302. The obtained curable composition was used to perform the same evaluation as above, and the same evaluation results as in Example G23 were obtained.

[0308] The disclosure of Japanese Patent Application No. 2019-154275, filed on August 27, 2019, is incorporated herein by reference in its entirety. All publications, patent applications, and technical standards mentioned in this specification are herein incorporated by reference to the same extent as if each individual publication, patent application, or technical standard was specifically and individually indicated to be incorporated by reference.

Claims

1. Pigments, an ethylenically unsaturated compound which is a curable compound; and The resin A includes a structural unit represented by formula (1), a structural unit represented by formula (2), and a structural unit having a molecular weight of 1,000 or less and represented by formula (3), The formula (3) includes at least one selected from formulas 3-A to 3-R. Curable composition. 【Chemistry 1】 【Chemistry 2】 【Chemistry 3】 【Chemistry 4】 【Chemistry 5】 【Chemistry 6】 【Chemistry 7】 In formulas (1) to (3), X １ represents an organic group having a valence of (m+2); ２ and X ３ represents a trivalent organic group, m represents an integer of 1 to 4, L ２ each independently represents O or NR; L ３ each independently represents a carbonyl group, O, or NR, R represents a hydrogen atom, an alkyl group, or an aryl group, P １ represents a group having a polymer chain, R １ each independently represents a carboxy group or a salt of a carboxy group; R ３ represents a group having an ethylenically unsaturated group.

2. X １ The curable composition according to claim 1 , wherein is an (m+2)-valent organic group having an aromatic ring.

3. The curable composition according to claim 1 or 2, wherein m is 2.

4. L ２ The curable composition according to any one of claims 1 to 3, wherein is O or NH.

5. X ２ The curable composition according to any one of claims 1 to 4, wherein is a trivalent aliphatic group having a thioether bond.

6. P １ The curable composition according to any one of claims 1 to 5, wherein is a group having an acrylic resin chain, a polyester chain, or a polyether chain.

7. L ３ is O or NR, and X ３ The curable composition according to any one of claims 1 to 6, wherein is a trivalent aliphatic group.

8. L ３ is a carbonyl group, and X ３ The curable composition according to any one of claims 1 to 6, wherein is a trivalent organic group having an aromatic ring.

9. The curable composition according to any one of claims 1 to 8, further comprising a polymerization initiator.

10. The curable composition according to claim 9 , wherein the polymerization initiator comprises an oxime compound.

11. The curable composition according to any one of claims 1 to 10, further comprising a pigment derivative.

12. A cured product obtained by curing the curable composition according to any one of claims 1 to 11.

13. A color filter comprising the cured product according to claim 12.

14. A solid-state imaging device comprising the color filter according to claim 13.

15. An image display device comprising the color filter according to claim 13.

Images