Multi-nozzle for CMP slurry supply

Abstract

To provide a multi-nozzle for supplying CMP slurry that reduces costs by minimizing the amount of slurry wasted.SOLUTION: The multi-nozzle comprises: a fitting unit 100 connected to supply slurry and deionized water stored in a deionized water supply unit; a buffer tank unit 200 coupled to the tip of the fitting unit 100, which uniformly distributes the slurry or deionized water and discharges it through a plurality of lines; a plurality of tubes 300 connected to the tip of the buffer tank unit 200; and a spray nozzle unit 400 connected to each of the tubes 300 to supply the slurry or deionized water to a polishing pad. The slurry is dropped from the center of a pad to the outside through a plurality of spray nozzles 440, thereby making it possible to increase the efficiency of a planarization process by evenly applying the slurry to the entire pad and reduce costs by minimizing the amount of slurry wasted.SELECTED DRAWING: Figure 2

Description

Technical Field

[0001] The invention relates to a multi-nozzle for supplying CMP slurry, and includes a fitting unit 100 connected to supply slurry stored in a slurry supply section and deionized water stored in an ultrapure water supply section, and a buffer tank unit 200 coupled to the tip of the fitting unit 100 to uniformly distribute slurry or ultrapure water and discharge it through a plurality of lines, and a plurality of tubes 300 connected to the tip of the buffer tank unit 200, and an injection nozzle unit 400 connected to each of the tubes 300 to supply slurry or ultrapure water to a polishing pad. The invention relates to a multi-nozzle for supplying CMP slurry, which is characterized by being composed of the above components.

Background Art

[0002] Generally, the chemical mechanical polishing (CMP) process is one of the semiconductor manufacturing processes for planarizing the surface of a silicon wafer. As shown in FIG. 1, in the planarizing process, with the wafer supported by a head 20 provided at the tip of a conditioner 30 having a function of preventing scratching on the surface of the wafer, after the wafer surface is brought into close contact with a pad 10, slurry is dropped through a nozzle device 50 formed on a slurry supply arm 40, and the slurry is injected between the wafer and the pad, and the surface of the wafer is planarized by rotational force and moving force.

[0003] On the other hand, in an existing device for supplying slurry onto a pad, since the slurry is sprayed through one nozzle, the slurry is not uniformly applied over the entire pad, resulting in a decrease in the efficiency of the planarizing process, a large amount of discarded slurry, and a problem of increasing manufacturing costs.

Prior Art Documents

Patent Documents

[0004]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0005] The present invention was devised to solve the above-described problems, and the object of the present invention is to uniformly apply slurry to the entire pad by dropping the slurry from the center to the outside of the pad through a plurality of injection nozzles, increasing the efficiency of the planarization process, minimizing the amount of slurry to be discarded, and providing a multi-nozzle for CMP slurry supply that results in cost savings.

Means for Solving the Problems

[0006] To solve the above problems, the multi-nozzle for CMP slurry supply according to the present invention includes a fitting unit 100 connected to supply slurry stored in a slurry supply unit and deionized water stored in an ultrapure water supply unit, a buffer tank unit 200 coupled to the tip of the fitting unit 100 to uniformly distribute slurry or ultrapure water and discharge it through a plurality of lines, a plurality of tubes 300 connected to the tip of the buffer tank unit 200, and an injection nozzle unit 400 connected to each of the tubes 300 to supply slurry or ultrapure water to a polishing pad, and is characterized by being configured as such.

[0007] Further, the fitting unit 100 is characterized in that a slurry supply line 110 for supplying slurry, an ultrapure water supply line 120 for supplying ultrapure water, and a first discharge line 130 connected to the slurry supply line 110 and the ultrapure water supply line 120 are formed.

[0008] Further, a check valve 140 is formed in the ultrapure water supply line 120 to prevent the slurry supplied through the slurry supply line 110 from flowing back to the ultrapure water supply line 120 side.

[0009] In addition, the buffer tank unit 200 is characterized in that a cover member 210 having a space formed inside and a distribution housing 220 that stops in the space of the cover member 210 and distributes slurry or ultrapure water are formed.

[0010] Further, the distribution housing 220 is characterized in that a conical fluid inlet groove 221 is formed at the center of the end, a plurality of fluid movement holes 222 are formed around the surface of the fluid inlet groove 221, and a plurality of second discharge lines 223 connected to each of the fluid movement holes 222 are formed.

[0011] In addition, between the fitting unit 100 and the distribution housing 220, a mesh plate 230 is formed so that the slurry can be spread during the process of supplying the slurry to the distribution housing 220 side through the slurry supply line 110 and the first discharge line 130, or foreign substances contained in the slurry can be filtered.

[0012] Further, the second discharge lines 223 are arranged in a circular shape around the horizontal axis of the distribution housing 220.

[0013] In addition, the tube 300 is connected to the second discharge line 223, and the tube 300 and the second discharge line 223 are connected via a connecting nipple 240.

[0014] In addition, the injection nozzle unit 400 is formed of a connection plate 410 coupled to the buffer tank unit 200, a base plate 420 coupled to the tip of the connection plate 410, a nozzle block 430 whose angle is adjusted according to whether an operator can operate at the tip of the base plate 420, and an injection nozzle 440 coupled to the nozzle block 430 and connected to the tube 300.

[0015] In addition, the nozzle block 430 is formed of a hinge portion 431 formed on the base plate 420, a rotary block member 432 that is coupled to the hinge portion 431 and rotates about the hinge portion 431, and a plurality of angle adjustment holes 433 and a plurality of injection nozzle stop holes 434 are respectively formed therein, and a fixing member 435 that is rotatably formed and inserted into the base plate 420 and can adjust the angle of the rotary block member 432 by the angle adjustment holes 433.

[0016] In addition, the injection nozzle 440 is formed of a fitting head 441 into which the tube 300 is inserted and a nozzle tube 442 through which slurry or ultrapure water is injected.

[0017] In addition, the injection nozzle 440 is formed of eight.

[0018] In addition, a bumper groove 421 is recessed and formed on the side surface of the base plate 420, and a bumper stopper 436 is formed on the side surface of the rotary block member 432 so as to be inserted into the bumper groove 421 when the maximum rotation of the rotary block member 432 occurs during the rotation of the rotary block member 432 about the hinge portion 431.

[0019] In addition, a lifting protrusion 431a protrudes from the end of the hinge portion 431, the lifting protrusion 431a is inserted into the base plate 420, and a lifting guide groove 422 is drilled and formed so that the hinge portion 431 rises or falls.

[0020] In addition, a rhombus-shaped fixing seal member 310 is provided on the outer surface of the tube 300, and a rhombus-shaped coupling groove 443 is formed on the inner surface of the fitting head 441 so that the fixing seal member 310 can be inserted and fixed therein.

[0021] In addition, at the end of the fitting unit 100, a slurry mixing unit 500 is formed so as to be connected to the slurry supply line 110 and mix and supply slurries having different components.

[0022] In addition, a pressure sensor is provided in the supply pipe connected to the slurry supply unit. When slurry hardens or a clogging phenomenon occurs due to foreign matter in any one of the fitting unit 100, the buffer tank unit 200, the tube 300, or the injection nozzle unit 400, the pressure sensor senses a pressure deviation and transmits a sensing signal to the control room.

Effects of the Invention

[0023] As described above, according to the present invention, since the slurry is uniformly applied on the pad, the efficiency of the planarization process is increased, and there is an advantage of cost reduction.

[0024] In addition, due to the configuration of the mesh plate having the mesh formed thereon, the slurry spreads, enters each discharge line, and moves, thereby guiding the slurry in each injection nozzle to be uniformly injected, and filtering foreign matter that may be present in the slurry to prevent clogging of the injection nozzle and the like.

[0025] In addition, by determining and arranging the number of injection nozzles in consideration of the cross-sectional area of the pad, there is an advantage that efficient slurry supply can be achieved.

[0026] In addition, since the angle of the injection nozzle on the plane is configured to be adjustable, it has the advantage that it can be made compatible with the equipment specifications of different CMP equipment manufacturers and the position of the injection nozzle can be adjusted.

Brief Description of the Drawings

[0027]

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Mode for Carrying Out the Invention

[0028] Hereinafter, with reference to the accompanying drawings, the multi-nozzle 1 for CMP slurry supply according to an embodiment of the present invention will be described in detail. First, it should be noted that in the drawings, the same components or parts are represented by the same reference numerals as much as possible. In the description of the present invention, specific descriptions of related known functions or configurations are omitted in order not to obscure the gist of the present invention.

[0029] Referring to FIGS. 1, 2, or 3, the multi-nozzle 1 for supplying CMP slurry according to an embodiment of the present invention includes a platen in the shape of a rotating table, a pad for polishing, a wafer carrier on which a force for vertically pressing a wafer acts, a conditioner for removing polishing residues and restoring a dulled pad to its original state, and a slurry supply device for supplying slurry. In the configuration of a CMP equipment for performing a CMP (chemical mechanical polishing) process, it is formed in the slurry supply device and is configured to inject slurry or ultrapure water onto the pad. Generally, it is mainly composed of a fitting unit 100, a buffer tank unit 200, a tube 300, and an injection nozzle unit 400.

[0030] First, the fitting unit 100 will be described. As shown in FIGS. 2, 3, or 4, the fitting unit 100 is connected to each external slurry supply section and ultrapure water supply section, and slurry or ultrapure water is supplied according to the process, and it is a component that enables movement to the buffer tank unit 200 to be described later, and is composed of a slurry supply line 110, an ultrapure water supply line 120, a first discharge line 130, and a backflow prevention check valve 140.

[0031] The slurry supply line 110 is a kind of pipeline through which slurry moves. It is formed inside from the end of the fitting unit 100. The end is connected to the slurry supply section, and the tip branches in a Y shape and is connected to the first discharge line 130 to be described later.

[0032] The ultrapure water supply line 120 is a pipeline through which ultrapure water moves. It is formed inside from the end of the fitting unit 100 separately from the slurry supply line 110. The end is connected to the ultrapure water supply section, and its tip is connected to the first discharge line 130.

[0033] The first discharge line 130 is a pipeline that is respectively connected to the slurry supply line 110 and the ultrapure water supply line 120, through which slurry or ultrapure water moves in a process. Preferably, the end is bifurcated in a Y shape and is respectively connected to the slurry supply line 110 and the ultrapure water supply line 120.

[0034] The backflow prevention check valve 140 is a component provided in the ultrapure water supply line 120, and serves to prevent the slurry supplied through the slurry supply line 110 from flowing back to the ultrapure water supply line 120 side during the process of the slurry moving to the buffer tank unit 200 side through the first discharge line 130.

[0035] At this time, the backflow prevention check valve 140 is preferably formed to be open in the direction in which ultrapure water moves (from the left side to the right side with reference to FIG. 5) and closed in the reverse direction.

[0036] On the other hand, as shown in FIG. 14, a slurry mixing unit 500 having a plurality of moving pipelines formed inside is formed between the slurry supply unit and the slurry supply line 110, so that slurries with different components can be mixed and supplied.

[0037] Next, the buffer tank unit 200 will be described. As shown in FIG. 2, FIG. 5, or FIG. 6, the buffer tank unit 200 is coupled to the tip of the fitting unit 100 and is composed of a cover member 210, a distribution housing 220, a mesh plate 230, and a connecting nipple 240 as a component for uniformly distributing and discharging slurry or ultrapure water to the tube 300 side described later.

[0038] The cover member 210 is a kind of cover that is coupled and fixed to the front side of a connecting plate 410 described later. A space for the distribution housing 220 and the mesh plate 230 described later to stop is formed inside, and insertion holes (not shown) into which a plurality of the tubes 300 are inserted are drilled at the tip.

[0039] As shown in FIG. 7 or FIG. 8, the distribution housing 220 is located in the space formed inside the cover member 210, and is a component for uniformly distributing the slurry or ultrapure water that has moved from the first discharge line 130 to each tube 300, and includes a fluid inlet groove 221, a fluid movement hole 222, and a second discharge line 223.

[0040] The fluid inlet groove 221 is formed as a groove in a conical shape in the central inner part of the end of the distribution housing 220 in the tip direction. As a component formed through an inclined surface structure formed by a curved surface, when it is formed in a cylindrical shape, a rectangular shape, etc., the fluid movement angle to the fluid movement hole 222 described later is gentler than that, and the deviation of the flow pressure and the flow velocity can be reduced, and the slurry or ultrapure water can move to each tube 300 side at a uniform flow rate.

[0041] A plurality of the fluid movement holes 222 are formed by drilling around the surface of the fluid inlet groove 221, and as a flow path hole for guiding the slurry or ultrapure water supplied through the fluid inlet groove 221 to the second discharge line 223 described later, due to the characteristics of the shapes of the fluid movement holes 222 and the fluid inlet groove 221, they are formed to be inclined at a predetermined angle and are connected to the second discharge line 223 described later.

[0042] The second discharge line 223 is connected to each of the fluid movement holes 222, and as a component for guiding the slurry or ultrapure water supplied through the fluid movement holes 222 to the tube 300 side, it is preferable that the fluid movement holes 222 and the second discharge line 223 are formed in the same number.

[0043] On the other hand, the second discharge line 223 is arranged in a circular shape around the horizontal axis of the distribution housing 220, thereby guiding the slurry or ultrapure water supplied to each tube 300 side to move in a state where the flow velocity, flow pressure, and flow rate are uniform.

[0044] The mesh plate 230 is a component positioned between the fitting unit 100 and the distribution housing 220. It slows down the flow rate of the supplied slurry, forms a mesh net on the central side to spread the slurry, guides the slurry to move uniformly to each fluid transfer hole 222, filters foreign substances and the like contained in the slurry, and prevents hardening and clogging phenomena from occurring in components of the pipeline structure such as the tube 300 or the injection nozzle 440 described later.

[0045] Next, the tube 300 will be described. As shown in FIGS. 2, 5, or 6, the end of the tube 300 is connected to the second discharge line 223, and the tip is exposed to the outside through an insertion hole (not shown) formed at the tip of the buffer tank unit 200. As a pipeline for moving slurry or ultrapure water to the injection nozzle unit 400, for a tight connection with the second discharge line 223, it is preferable that the tube 300 and the second discharge line 223 are connected through a connection nipple 240 with a pipeline formed inside.

[0046] On the other hand, the tube 300 is preferably formed of a Tygon tube coated on the inner surface to prevent the deposition or hardening of the slurry.

[0047] Next, the injection nozzle unit 400 will be described. As shown in FIGS. 9, 10, or 11, each of the injection nozzle units 400 is connected to the tube 300 and is composed of a connection plate 410, a base plate 420, a nozzle block 430, and an injection nozzle 440 as components for supplying slurry or ultrapure water to the polishing pad.

[0048] The connection plate 410 is a component formed long in the length direction. On the front surface, the buffer tank unit 200 is coupled, on the rear surface, the slurry supply arm 40 is coupled, and at the tip, the base plate 420 described later is coupled.

[0049] The base plate 420 is a component that is coupled in an orthogonal relationship with the connection plate 410, and a hinge portion 431 and a fixing member 435, which will be described later, are respectively coupled thereto, and the nozzle block 430, which will be described later, can be supported.

[0050] On the other hand, a groove-shaped bumper groove 421 is recessed and formed on the side surface of the base plate 420. When the rotary block member 432 makes a maximum rotation about the hinge portion 431, a bumper stopper 436, which will be described later, is inserted and supported, and it can play a role in preventing impact.

[0051] In addition, a vertical lifting guide groove 422 is drilled and formed in the base plate 420.

[0052] On the other hand, the lifting protrusion 431a, which will be described later, is inserted into the lifting guide groove 422, and by moving in the vertical direction and enabling the lifting movement of the hinge portion 431, the height of the injection nozzle 440 can be adjusted.

[0053] The nozzle block 430 is rotatably coupled to the tip of the base plate 420, and its angle is adjusted according to whether the operator can operate it. As a component where the injection nozzle 440, which will be described later, stops, it is composed of a hinge portion 431, a rotary block member 432, a fixing member 435, and a bumper stopper 436.

[0054] The hinge portion 431 is coupled to the tip of the base plate 420 and serves as the rotation axis of the nozzle block 430 as a component that is hinge-coupled to the nozzle block 430.

[0055] On the other hand, at the end of the hinge portion 431, a lifting protrusion 431a that is inserted into the lifting guide groove 422 and is fixed and released according to whether the operator can operate it protrudes, and the height of the hinge portion 431 can be adjusted.

[0056] At this time, the elevating projection 431a is preferably formed by a bolt fastening type or the like so as to be easily fixed to and released from the elevating guide groove 422.

[0057] As shown in FIG. 12, the rotary block member 432 is coupled to the hinge portion 431 and rotates about the hinge portion 431. As a component whose position is fixed by a fixing member 435 described later, it has a rotation range from a minimum of 0° to a maximum of 35° on a plane depending on the insertion position of the fixing member 435 inserted into a plurality of angle adjustment holes 433 described later.

[0058] On the other hand, a plurality of angle adjustment holes 433 are formed in the rotary block member 432 at predetermined intervals so that a fixing protrusion (not shown) of the fixing member 435 is inserted therein to fix the position of the rotary block member 432. Separately from the angle adjustment holes 433, a plurality of injection nozzle stop holes 434 into which the injection nozzle 440 is inserted and fixed are formed by drilling.

[0059] The fixing member 435 is a component formed to be rotatable about an axis on the upper side of the base plate 420. A fixing protrusion (not shown) protruding downward is formed at the lower part of the tip, and the angle of the rotary block member 432 can be adjusted according to the position of the angle adjustment hole 433 into which the fixing protrusion (not shown) is inserted.

[0060] The bumper stopper 436 is a component formed in a curved surface shape on the side surface of the rotary block member 432. When the maximum rotation of the rotary block member 432 occurs during the rotation about the hinge portion 431, it can be inserted into the bumper groove 421 to minimize the occurrence of impact.

[0061] The injection nozzle 440 is connected to the tube 300, and as a component for injecting slurry or ultrapure water supplied through the tube 300 onto the pad, the injection position can be adjusted by the rotary block member 432 while being inserted into the injection nozzle stop hole 434.

[0062] On the one hand, as shown in FIG. 13, the injection nozzle 440 includes a fitting head 441 into which the tube 300 is inserted, a nozzle tube 442 through which slurry or ultrapure water is injected, and a rhombic coupling groove 443 formed on the inner surface of the fitting head 441 into which a fixing seal member 310 described later is inserted and fixed.

[0063] On the other hand, the outer surface of the tube 300 is provided with a rhombic fixing seal member 310 that is in surface contact with the outer surface of the tube 300.

[0064] During the process in which the tip of the tube 300 is partially inserted into the inside of the injection nozzle 440, the fixing seal member 310 is fitted into the coupling groove 443. The fixing seal member 310 fitted into the coupling groove 443 is in close contact with the coupling groove 443, and can prevent the tube 300 from being arbitrarily separated from the injection nozzle 440 by pressing the outer surface of the tube 300.

[0065] On the one hand, considering the cross-sectional area of the pad 10 that is normally used, it is preferable that the injection nozzles 440 are formed in eight. Also, in accordance with the number of the injection nozzles 440, it is preferable that the fluid movement holes 222, the second discharge lines 223, the tubes 300, and the injection nozzle stop holes 434 are also formed in eight.

[0066] On the other hand, in order to confirm that a constant flow pressure of the slurry supplied through the multi-nozzle 1 for supplying CMP slurry of the present invention is maintained, a pressure sensor is provided in the supply pipe connected to the slurry supply unit.

[0067] When slurry is cured or a pressure difference is generated by foreign matter at any one of the fitting unit 100, the buffer tank unit 200, the tube 300, or the injection nozzle unit 400 through the pressure sensor, it senses this and transmits a sensing signal to the control room, so that it can quickly respond when a curing phenomenon or a clogging phenomenon occurs.

[0068] The optimal embodiments are disclosed in the drawings and the specification. Although specific terms are used here, these are merely used for the purpose of explaining the present invention and are not used to limit the meaning or the scope of the present invention described in the claims. Therefore, those of ordinary skill in the art should understand that various modifications and equivalent other embodiments are possible. Also, the true technical protection scope of the present invention is defined by the technical idea of the appended claims.

Explanation of Reference Numerals

[0069] 1: Multi-nozzle for CMP slurry supply 100: Fitting unit 110: Slurry supply line 120: Ultra-pure water supply line 130: First discharge line 140: Backflow prevention check valve 200: Buffer tank unit 210: Cover member 220: Distribution housing 221: Fluid inlet groove 222: Fluid movement hole 223: Second discharge line 230: Mesh plate 240: Connecting nipple 300: Tube 310: Fixed seal member 400: Injection nozzle unit 410: Connecting plate 420: Base plate 421: Bumper groove 422: Lifting guide groove 430: Nozzle block 431: Hinge part 431a: Lifting projection 432: Rotary block member 433: Angle adjustment hole 434: Injection nozzle stop hole 435: Fixing member 436: Bumper stopper 440: Injection nozzle 441: Fitting head 442: Nozzle pipe 443: Coupling groove 450: Pointer jig 500: Slurry mixing unit

Claims

1. A fitting unit 100 connected to supply the slurry stored in the slurry supply unit and the deionized water stored in the deionized water supply unit; a buffer tank unit 200 which is connected to the end of the fitting unit 100 and distributes slurry or ultrapure water uniformly and discharges it through a plurality of lines; A plurality of tubes 300 connected to the tip of the buffer tank unit 200; and a spray nozzle unit 400 connected to each of the tubes 300 to supply slurry or ultrapure water to the polishing pad. The injection nozzle unit 400 includes: a connecting plate 410 connected to the buffer tank unit 200; a base plate 420 connected to a tip of the connecting plate 410; a nozzle block 430, the angle of which is adjustable according to whether or not an operator operates the nozzle block 430, at the tip of the base plate 420; The nozzle block 430 is coupled to the injection nozzle 440 connected to the tube 300. A multi-nozzle 1 for supplying CMP slurry, characterized in that:

2. The fitting unit 100 includes: a slurry supply line 110 for supplying a slurry, and an ultrapure water supply line 120 for supplying ultrapure water; A first discharge line 130 is formed to be connected to the slurry supply line 110 and the ultrapure water supply line 120.

2. The CMP slurry supply multi-nozzle 1 according to claim 1 .

3. The ultrapure water supply line 120 includes: A backflow prevention check valve 140 is provided to prevent the slurry supplied through the slurry supply line 110 from flowing back to the ultrapure water supply line 120.

3. The CMP slurry supply multi-nozzle 1 according to claim 2.

4. The buffer tank unit 200 includes: A cover member 210 having a space formed therein and a distribution housing 220 for distributing slurry or ultrapure water are formed in the space of the cover member 210.

2. The CMP slurry supply multi-nozzle 1 according to claim 1 .

5. The distribution housing 220 has a cone-shaped fluid intake groove 221 at the center of the end thereof, A plurality of fluid movement holes 222 are formed around the surface of the fluid inlet groove 221, and a plurality of second discharge lines 223 are connected to each of the fluid movement holes 222.

5. The CMP slurry supply multi-nozzle 1 according to claim 4.

6. Between the fitting unit 100 and the distributor housing 220, A mesh plate 230 is formed to spread the slurry during the process of supplying the slurry to the distribution housing 220 through the slurry supply line 110 and the first discharge line 130, or to filter out foreign matter contained in the slurry.

5. The CMP slurry supply multi-nozzle 1 according to claim 4.

7. The second discharge line 223 is The distribution housing 220 is arranged in a circular shape around the horizontal axis thereof.

6. The CMP slurry supply multi-nozzle 1 according to claim 5.

8. The tube 300 is connected to the second discharge line 223, The tube 300 and the second discharge line 223 are connected through a connecting nipple 240.

6. The CMP slurry supply multi-nozzle 1 according to claim 5.

9. The nozzle block 430 includes a hinge portion 431 formed on the base plate 420; a rotation block member 432 which is connected to the hinge portion 431 and rotates about the hinge portion 431, and in which a plurality of angle adjustment holes 433 and a plurality of injection nozzle stop holes 434 are formed; The base plate 420 is formed with a fixing member 435 that can adjust the angle of the rotation block member 432 by the angle adjustment hole 433 that is rotatably formed and inserted into the base plate 420.

2. The CMP slurry supply multi-nozzle 1 according to claim 1 .

10. The injection nozzle 440 is The fitting head 441 into which the tube 300 is inserted and the nozzle tube 442 for spraying the slurry or the ultrapure water are formed.

2. The CMP slurry supply multi-nozzle 1 according to claim 1 .

11. The injection nozzles 440 are formed in eight pieces.

2. The CMP slurry supply multi-nozzle 1 according to claim 1 .

12. A bumper groove 421 is recessed and formed on a side surface of the base plate 420, and a bumper stopper 436 is formed on a side surface of the rotation block member 432 so as to be inserted into the bumper groove 421 when the rotation block member 432 rotates to the maximum extent while rotating about the hinge portion 431.

10. The CMP slurry supply multi-nozzle 1 according to claim 9.

13. The hinge portion 431 has an elevation protrusion 431a at an end thereof. The base plate 420 is provided with a lift guide groove 422 through which the lift protrusion 431a is inserted to lift or lower the hinge portion 431.

10. The CMP slurry supply multi-nozzle 1 according to claim 9.

14. The tube 300 is provided with a diamond-shaped fixed seal member 310 on its outer surface. The fitting head 441 has a diamond-shaped coupling groove 443 formed on its inner surface so that the stationary seal member 310 can be inserted and fixed.

11. A multi-nozzle 1 for supplying CMP slurry according to claim 10.

15. At the end of the fitting unit 100, A slurry mixing unit 500 is connected to the slurry supply line 110 so as to mix and supply slurries having different components.

3. The CMP slurry supply multi-nozzle 1 according to claim 2.

16. a supply pipe connected to the slurry supply unit is provided with a pressure sensor; When any one of the fitting unit 100, the buffer tank unit 200, the tube 300, or the injection nozzle unit 400 is clogged due to hardening of the slurry or foreign matter, the pressure sensor detects the pressure difference and transmits a detection signal to the control room.

2. The CMP slurry supply multi-nozzle 1 according to claim 1 .

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