Die parts for processing sheet materials of amorphous alloys, and method for manufacturing punched materials of amorphous alloys.

Abstract

To provide a mold component with an elongated lifetime by improving wear of a tooth point, concerning a mold component for shearing or breaking a plate of an amorphous alloy.SOLUTION: A mold component includes a base metal comprising a metal or a hard metal compound, and a hard coating formed on an area used for processing of a surface. The hard coating is a mold component having a first hard layer containing Ti. Si, N. The hard coating may have multiple layers, and may have a second hard layer between the first hard layer and the base metal. Preferably, the metal compound of the base metal is mainly composed of tungsten carbide.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present invention relates to a die component for processing a sheet material of an amorphous alloy and a method for processing a sheet material of an amorphous alloy.

Background Art

[0002] Rotating electric machines used as electric motors in electric vehicles and hybrid electric vehicles are required to operate with high efficiency by reducing losses due to the high frequency of alternating magnetic fluxes caused by high-speed rotation in order to ensure output. Until now, the high efficiency of rotating electric machines has been promoted by the use of inverters, the application of rare-earth magnets, the optimization of structural design, etc. However, in order to further improve the efficiency, it is necessary to reduce the iron loss of the laminated iron core used for the magnetic poles. Therefore, there is an increasing demand for the application of low-loss magnetic materials such as amorphous alloys and nanocrystalline soft magnetic alloys containing fine bcc-structured Fe crystal phases, FeSi crystal phases, and amorphous phases instead of the silicon steel sheets conventionally used for laminated iron cores.

[0003] As an amorphous alloy, for example, an Fe-Si-B-based soft magnetic alloy is known, and it is produced as a thin strip that is rapidly quenched from a molten metal adjusted to a predetermined composition by a method such as a single-roll liquid quenching method to be made amorphous. Metglas (registered trademark) 2605HB1M, 2605SA1 of METGLAS, Inc. and 2605SA3 of the Fe-Si-B-Cr system are commercially available and can be obtained.

[0004] Also, the nanocrystalline soft magnetic alloy is obtained by heat-treating an amorphous thin strip obtained in the same manner as the amorphous alloy to precipitate (nanocrystallize) Fe crystal phases and FeSi crystal phases. For example, Finemet (registered trademark) FT-3M of Hitachi Metals, Ltd. of the Fe-Si-B-Cu-Nb system, VITROPERM (registered trademark) 800 of VACUUMSCHMELZE GmbH & Co. KG., and NANOPERM (registered trademark) of MAGNETEC Gesellschaft fur Magnettechnologie mbH of the Fe-B-Zr-Cu system are known.

[0005] Each of them usually has a thickness of ten to several tens of μm and is supplied in the form of a long thin strip, which is also called a strip, ribbon, film, or foil. In the following description, in addition to such a single-layer thin strip, a multilayer one formed by stacking a plurality of thin strips, a composite one including an adhesive layer, and a multilayer one formed by laminating other materials such as electromagnetic steel sheets are collectively referred to as an amorphous alloy plate material.

[0006] Amorphous alloys are generally ideal elastoplastic materials that do not undergo strain hardening and have large plastic deformation ability and toughness properties. However, under the condition of uniaxial stress such as a tensile test, it is known that elongation hardly occurs apparently. The amorphous alloy plate material having such properties is very hard and has the drawback of being inferior in workability compared with a crystalline silicon steel sheet, which has been a factor preventing the application to laminated cores that require processing the plate material into a predetermined shape.

[0007] Against this background, various processing technologies for obtaining a thin plate or a core of a predetermined shape from an amorphous alloy plate material have been studied. One of them is punching by a press device using a die component composed of a punch and a die. However, with conventional die components, problems such as wear and chipping of the cutting edge used in processing easily occur, and the frequency of maintenance of the cutting edge and replacement of the die components increases, resulting in low productivity and no progress in application to mass production.

[0008] It is considered that the wear of the cutting edge of the die component is mainly caused by repeated impacts and fatigue fracture due to shearing work, and abrasion due to rubbing against the sheared plate material. As a countermeasure, hard coatings such as DLC (Diamond Like Carbon), AlCrN-based, CrN-based, and TiN-based are formed on the cutting edge. Patent Document 1 shows a die component for punching provided with a hard coating containing Al, Cr, and N on the surface.

Prior Art Documents

Patent Documents

[0009]

Patent Document 1

SUMMARY OF THE INVENTION

PROBLEMS TO BE SOLVED BY THE INVENTION

[0010] However, the mold part of Patent Document 1 is suitable for punching of electromagnetic soft iron, and there is room for improvement in the wear of the cutting edge in the punching of an amorphous alloy sheet material. Similarly, improvement has been demanded for the mold parts formed with the other hard films described above. Therefore, an object of the present invention is to provide a mold part that improves the wear of the cutting edge and has a long life in the shearing or breaking process of an amorphous alloy sheet material, or to provide a processing method for an amorphous alloy sheet material that improves the wear of the cutting edge of the mold part and has a long life.

MEANS FOR SOLVING THE PROBLEMS

[0011] The present invention relates to a mold part for shearing or breaking an amorphous alloy sheet material, A punch member used therefor, a die member having a hole into which the punch member is inserted, comprising: Both the punch member and the die member a base material composed of a metal and a hard metal compound, and a hard film formed in a region on the surface used for the processing, the hard film containing Ti, Si, and N As the main component a first hard layer And a second hard film layer mainly composed of Ti, Al, N is provided between the first hard film layer and the base material, and is a mold part for processing an amorphous alloy sheet material. In the present invention, the hard film is multilayered, On the surface layer and preferably includes the first hard layer. It has, and a hard film layer mainly composed of Ti, Si, N and a hard film layer mainly composed of Ti, Al, N are alternately arranged between the surface layer and the base material, Preferably, it is provided. Also 、 In the present invention, the metal compound preferably contains tungsten carbide having an average particle size of 5 μm or less as a main component. Also 、 In the present invention, Of the punch member it is preferable that the hard film is formed on a portion inserted into the die member. Also 、In the present invention, the side surface of the punch member has a portion where a hard film is formed and a portion where no hard film is formed, and it is preferable that a hard film is formed at least on the portion inserted into the die member. Also 、 In the present invention, In both the punch member and the die member, the surface perpendicular to the sliding direction of the punch is a polished surface, and it is preferable that a hard film is disposed only on the side surface of the punch member and the surface of the hole into which the punch member is inserted in the die member. The present invention is also a method for manufacturing a punched material of an amorphous alloy by shearing or breaking a plate material of an amorphous alloy using a mold part, wherein the mold part includes a punch member and a die member having a hole into which the punch member is inserted, and both the punch member and the die member include a base material composed of a metal and a hard metal compound, and a hard film formed in a region used for the processing on the surface thereof, and the hard film includes a first hard film layer mainly composed of Ti, Si, N, and a second hard film layer mainly composed of Ti, Al, N between the first hard film layer and the base material, and is a method for manufacturing a punched material of an amorphous alloy.

Effects of the Invention

[0012] According to the present invention, in the shearing or breaking process of a sheet material of an amorphous alloy, it is possible to provide a die component that improves the wear of the cutting edge and has a long service life. Also, Using a mold part with an extended service life, of the amorphous alloy Manufacturing a punched material can be achieved.

Brief Description of the Drawings

[0013]

Figure 1

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Figure 9

Modes for Carrying Out the Invention

[0014] Hereinafter, embodiments of the present invention will be specifically described, but the present invention is not limited thereto. Also, in part or all of the drawings, unnecessary parts for the description are omitted, and there are parts that are enlarged or reduced for ease of explanation. In this specification, a numerical range represented by "~" means a range including the numerical values described before and after "~" as the lower limit value and the upper limit value.

[0015] FIG. 1 and FIG. 2 show schematic diagrams of a mold part according to an embodiment of the present invention. The mold part 1 shown in FIG. 1 includes a hard film 21 provided with a first hard layer containing Ti, Si, and N on the surface of a rectangular prismatic base material 20. The hard film 21 is formed on the surfaces including the entire bottom surface and the side surfaces that do not appear in the drawing. In the illustrated example, the hard film 21 is formed only on the lower side of the base material 20, but it may be formed at least in the region used for processing. The mold part 2 shown in FIG. 2 can be used as a pair of dies when the mold part 1 is used as, for example, a punching punch. The base material 20 having a rectangular hole (through-hole) through which the mold part 1 (punch) can be inserted is provided with a hard film 21 having a first hard layer containing Ti, Si, and N on at least the upper surface of the through-hole.

[0016] In the mold part 1 (punch member) shown in FIG. 1, among the side surfaces, the hard film 21 is formed on the lower side, and the hard film 21 is not formed on the upper side thereof. The portion where the lower hard film 21 is formed includes the portion inserted into the hole of the mold part 2 (die member) shown in FIG. 2. Thus, by forming the hard film 21 only on a part of the punch member, it is possible to reduce the man-hours and raw materials for forming the hard film 21, which is efficient. Also, this point is the same for the mold part 2 (die member).

[0017] The hard film 21 having the first hard layer containing Ti, Si, and N is preferably provided on both of the mold parts 1 and 2. However, it is sufficient if at least one of the mold parts has the hard film 21, and the conventional hard film described above may be formed on the other mold part. Further, the mold part includes those configured by combining divided parts.

[0018] FIG. 3 shows a schematic cross-sectional view of a mold part according to an embodiment of the present invention. A hard film 21 is provided on a base material 20 in a two-layer configuration, and a first hard layer 22 containing Ti, Si, and N is provided on the outermost surface of the hard film 21.

[0019] The first hard layer according to the present invention contains at least Ti, Si, and N, and protects the base material 20 as a hard film excellent in wear resistance and durability, prevents wear, and improves the lifespan. When the first hard layer 22 is formed by a vapor deposition method using a Ti—Si target in a chamber into which nitrogen is introduced, the higher the Si content, the higher the hardness. Therefore, when represented by Ti x Si 1-x it is desirable that x < 0.90. Note that the structure of the first hard layer is preferably a nanocrystal with an average particle size of 25 nm or less. Further, a second hard layer 23 is provided between the base material 20 and the first hard layer 22. This second hard layer 23 contains at least Ti, Al, and N. The second hard layer 23 serves as an underlayer that improves adhesion and peel strength. Therefore, it is preferable to provide the second hard layer 23, but it may be omitted. When the second hard layer 23 is represented by Ti y Al 1-y it is desirable that 0.25 < y < 0.75, and more desirably 0.30 < y < 0.50.

[0020] In addition, if the hard film 21 has a structure having a first hard layer containing Ti, Si, and N on the surface layer, it may further include a plurality of hard layers. For example, a hard layer mainly composed of Ti, Si, N and a hard layer mainly composed of Ti, Al, N are alternately formed into a form of a hard film laminated in three or more layers, and a hard layer having other components may be provided. Also, the case where a film for temporarily protecting the first hard layer 22 is formed is included in the present invention.

[0021] The first hard layer 22 and the second hard layer 23 can be formed by known film forming methods. For example, it can be formed by using a liquid phase method such as electroplating or electroless plating, a physical vapor deposition method such as vacuum evaporation, molecular beam epitaxy, sputtering, or ion plating, or a chemical vapor deposition method such as thermal CVD, photo CVD, or plasma CVD. Further, before forming the hard film 21, the base material 20 may be nitrided or carburized. The film forming method may be selected according to the composition and plate thickness of the amorphous alloy plate, or the presence or absence of a single layer, a multilayer, or an adhesive layer.

[0022] When the hard film 21 is a single layer of the first hard layer 22, the film thickness is desirably in the range of 0.1 to 60 μm in consideration of the wear allowance and the peel strength. Incidentally, the film thickness of the hard film 21 is more preferably 0.2 to 20 μm, and still more preferably 0.5 to 10 μm. However, the optimum film thickness can be selected according to the composition and plate thickness of the amorphous alloy plate, and is not limited to this range. When the hard film 21 is multilayered, the film thickness of the first hard layer 22 on the surface is preferably in the range of 0.1 to 30 μm. Also, the film thickness of the second hard layer 23 is preferably in the range of 0.1 to 30 μm. Incidentally, the film thickness of the first hard layer 22 is more preferably 0.2 to 10 μm, and still more preferably 0.5 to 5 μm. Also, the film thickness of the second hard layer 23 is more preferably 0.2 to 10 μm, and still more preferably 0.5 to 5 μm.

[0023] The base material 20 is composed of a material made of a metal and a hard metal compound. As the base material 20, for example, those classified as HW, HF, or HT in the material classification described in JIS B4053 2013 can be used. When using those classified as HW or HF, for example, those composed of a hard phase mainly composed of tungsten carbide and a binder phase mainly composed of an iron group metal such as Co are preferable. It may contain a solid solution composed of at least one selected from transition metal elements of Groups 4a, 5a, and 6a of the periodic table and at least one selected from carbon, nitrogen, oxygen, and boron. When using those classified as HT, for example, a solid solution phase composed of at least one selected from transition metal elements of Groups 4a, 5a, and 6a of the periodic table and at least one selected from carbon, nitrogen, oxygen, and boron, a binder phase composed of one or more iron-based metals, and inevitable impurities can be used. Further, by using tungsten carbide having an average particle size of 5 μm or less as the main component of the metal compound, the strength of the base material 20 can be improved, and further the wear resistance can be improved. More preferably, the average particle size of the metal compound is 2 μm or less. Further, in order to suppress chipping due to a decrease in the toughness of the base material 20, the average particle size of the metal compound is preferably 0.5 μm or more, and more preferably 0.7 μm or more.

[0024] FIG. 4 shows an example of a sheet material of an amorphous alloy to be subjected to shearing or breaking using the mold part according to the present invention. The sheet material 11 of the amorphous alloy includes at least one layer of a thin sheet 12 of the amorphous alloy. As the thin sheet 12 of the amorphous alloy, for example, an Fe-based amorphous alloy, a Co-based amorphous alloy, a Ni-based amorphous alloy, or the like can be used. Further, this includes an amorphous alloy as a precursor of a nanocrystalline soft magnetic alloy.

[0025] The thin plates 12 of amorphous alloy that are widely used usually have a plate thickness of several tens of μm per layer. When the plate material 11 of amorphous alloy is composed of one layer of the thin plate 12 of amorphous alloy, it has poor handleability for subjecting it to shearing or breaking processes. Also, there are drawbacks such as low production efficiency per stroke (number of hits) for punching, and difficulty in adjusting the minute clearance between the die and the punch when processing by combining a plurality of die parts. For this reason, the plate material 11 of amorphous alloy may be one in which a plurality of thin plates 12 of amorphous alloy are laminated. The plurality of thin plates 12 of amorphous alloy may be a combination of amorphous alloys with different compositions and plate thicknesses. Also, it may be one in which thin plates 13 of different materials are laminated. As the thin plates 13 of different materials, for example, soft magnetic materials such as electromagnetic steel sheets, electromagnetic soft iron, permalloy, and permendur can be used, but the optimal material can be selected according to the production process, and it is not limited to these examples.

[0026] The plate material 11 of amorphous alloy may have an adhesive layer 14 between each layer of the plurality of thin plates 12 of amorphous alloy and between the thin plates 13 of different materials. As the material of the adhesive layer 14, for example, if it is thermoplastic, engineering plastics such as PPS (polyphenylene sulfide), PC (polycarbonate), and PET (polyethylene terephthalate) can be used, and if it is a thermosetting resin, epoxy resin or unsaturated polyester can be used, but it is not limited to these examples. Also, when being processed by die parts, the adhesive layer 14 may be uncured.

[0027] FIG. 5 shows an example of punching the plate material 11 of amorphous alloy using the die part 1 as a punching punch and the die part 2 as a punching die. For example, in the case of punching, generally, shearing and breaking occur on the processed cross-section. Although the forms of shearing and breaking differ depending on the clearance between the punch and the die, the shape of the cutting edge, and the configuration of the plate material 11 of amorphous alloy, it can be applied not only to punching but also to all processes in which at least one of shearing or breaking occurs. In the present invention, the sheet material 11 of the amorphous alloy is preferably a single thin strip of amorphous alloy or a laminate of 2 to 6 thin plates 12 of amorphous alloy. Also in the present invention, the sheet material 11 of the amorphous alloy preferably has a thickness of 10 μm to 200 μm, and more preferably has a thickness of 14 μm to 150 μm. Also in the present invention, the thickness of the thin plate 12 of the amorphous alloy constituting the sheet material 11 of the amorphous alloy is preferably 10 to 50 μm, and more preferably 14 to 40 μm. Also in the present invention, the clearance between the punch and the die is preferably 2% to 10% of the plate thickness of the sheet material of the amorphous alloy.

Example

[0028] As the sheet material of the amorphous alloy, Metglas (registered trademark) 2605HB1M was prepared. The sheet material of the amorphous alloy is a long single thin strip, with a plate thickness of 25 μm and a width of 30 mm. This sheet material of the amorphous alloy was sheared and broken using a punching die (die parts 1 and 2 in FIG. 5) to produce a punched material (punched material of the sheet material of the amorphous alloy) having the shape shown in FIG. 6. The dimensions of the punched material are a rectangle of 15 mm × 5 mm, and the R of the corner (chamfer with a radius of curvature R) is 0.3 mm.

[0029] The base material of the punching die part according to the present invention is mainly composed of tungsten carbide. A superfine particle cemented carbide with an average particle size of 0.7 μm was used for the punch, and a coarse particle mixed cemented carbide with average particle sizes of 0.5 μm and 5.0 μm was used for the die. The dimensions of the punch are a rectangular parallelepiped of 5 mm × 15 mm × 44 mm, and the dimensions of the die are a rectangular parallelepiped of 75 mm × 40 mm × 8 mm with a rectangular hole of 5 mm × 15 mm provided. Parts other than the die parts (punch and die) of the punching die according to the present invention mainly use high-speed tool steel and the like.

[0030] The hard layer of the hard film was formed in a chamber into which nitrogen was introduced using BALIQ (registered trademark) TISINOS of OC Oerlikon Balzers AG as a TiSi target. In the formation of the hard layer of this hard film, HiPIMS (High Power Impulse Magnetron Sputtering), which is a type of sputtering, is used. This method generates a high-density plasma by applying a high-power pulsed voltage to the target, and can obtain excellent adhesion and a uniform and smooth film quality.

[0031] First, TiAlN was formed as an intermediate layer (corresponding to the second hard layer) on the punch and the die, respectively, and then TiSiN (corresponding to the first hard layer) was formed on the outermost surface. The film-forming part is the end with a perimeter of 5 mm × 15 mm in a punching shape, and is the region extending about 1 cm from the cutting edge 24 of the punch and the cutting edge 25 of the die. It was applied to both a plane parallel to the plane perpendicular to the punch sliding direction (corresponding to the vertical direction in FIG. 5). After film formation, both the punch and the die were polished on the plane perpendicular to the sliding direction, leaving only the part of the hard film on the plane parallel to the punch sliding direction (the side surface of the punch, the surface of the hole of the die). It is also possible to use the punch and the die without polishing the plane perpendicular to the sliding direction, but by polishing the plane perpendicular to the sliding direction, the cutting edge can be made into a sharp shape. At the time of punching, the sliding length after contacting the sheet material of the amorphous alloy is 105 μm from the cutting edge, and the sheet material of the amorphous alloy does not contact the part where the hard film is not formed on the plane parallel to the punch sliding direction. Note that when punching is repeated using a punch and a die, wear of the hard film occurs. Although the hard film of the present invention has higher durability than conventional hard films, wear also occurs in the hard film of the present invention when the number of punching repetitions increases. When the degree of wear of the hard film increases, the effect of the hard film cannot be exerted. When the degree of wear of the hard film becomes large, the cutting edge of the punch or die is polished (the surface perpendicular to the sliding direction of the punch or die is polished), whereby the cutting edge of the punch or die can be reformed into a sharp shape. Thereby, the punch and die can be used repeatedly. It is preferable to determine the width of the film-forming portion in consideration of the number of times of this polishing operation. The width of the film-forming portion is preferably 3 times or more the sliding length. Further, it is preferably 10 times or more the sliding length.

[0032] The total film thickness of the hard film formed on the punch and die from the base material to the outermost surface was about 2 μm, and the breakdown was about 1 μm for the second hard layer of TiAlN and about 1 μm for the first hard layer of TiSiN. The thickness of the hard film was measured from a photograph obtained with an optical microscope. Also, each part was assembled so that the clearance between the punch and die with the hard film was 10% of the plate thickness of the plate material, that is, 2.5 μm. The composition of the second hard layer is Ti 0.20 Al 0.25 N 0.55 by atomic ratio, and the composition of the first hard layer is Ti 0.34 Si 0.12 N 0.54 by atomic ratio. These compositions were determined by composition analysis using wavelength dispersive X-ray spectrometry, excluding inevitable impurities.

[0033] The press used in this embodiment is MPS405UD manufactured by Discharge Precision Machining Laboratory Co., Ltd. In addition to the plate thickness of 25 μm of the amorphous alloy plate material, considering the elongation until its fracture, the bottom dead center was set at a position 80 μm lower than the position where the heights of the punch tip and the die upper end were aligned. That is, the bottom dead center is the point where the punch surface has slid 105 μm after contacting the amorphous alloy plate material. The punching speed was set at 31 mm / s. The punching speed is obtained by reading the value of the linear scale mounted on the 4-axis servo press with a sequencer having a sampling rate of 0.2 ms and calculating the speed at the position where the punch and the amorphous alloy plate material come into contact. The punching speed is preferably 10 mm / s or more, more preferably 30 mm / s or more, considering productivity. Also, the punching speed is preferably 800 mm / s or less, more preferably 600 mm / s or less, in order to avoid rapid heat generation of various parts due to friction.

[0034] As a method for evaluating the shape of the punched material, first, 14 points at the end of the punched material were imaged using a Keyence laser microscope VK-X1000. The imaging locations were subject to fixed-point observation for points 110 to 123 shown in FIG. 6, and a region of 270 μm × 202 μm was set as the imaging range for each point. The magnification of the lens was 50 times. Observation was performed from the vertical direction with respect to the surface of the punched material that had contacted the punch. That is, when imaging from the negative direction to the positive direction of the z-axis shown in FIG. 7, a deformation height of 40 was detected in the negative direction of the z-axis.

[0035] Figure 8 shows an example of an observation image. At least 50% or more of the imaging range was taken as the punching material 11, and the position was adjusted for observation so that the deformation height 40 could be imaged. The inclination was obtained within the correction range 130 so that the flat portion excluding the end of the punching material would be the reference plane, and first-order plane correction of the entire image was performed. For the corrected image, five profile lines 131 intersecting perpendicularly to the end of the punching material were drawn at intervals of about 60 μm, and the respective deformation heights 40 were obtained from each profile line. That is, for one imaging point, data of five deformation heights 40 were obtained. This measurement was performed for 14 imaging points, and 5×14 = 70 profiles were obtained. That is, 70 data of the deformation height 40 were obtained for the punching material with a specific number of punches. The average value, maximum value, and minimum value of these 70 data of the deformation height 40 were obtained. The above evaluation was performed for the punching material every 100,000 punches.

[0036] In the cross-section of the punching material, sag 44, shear cross-section 43, fracture cross-section 42, and burr 41 are usually confirmed as shown in the schematic diagram of Fig. 7. In the case of proper punching, a cross-section including two modes of the shear cross-section 43 and the fracture cross-section 42 can usually be observed. As the wear of the mold progresses, the shear cross-section decreases, the ratio of the fracture cross-section increases, and the heights of the sag 44 and the burr 41 increase.

[0037] As Comparative Example 1, a mold provided with a hard film of AlCrSiN was prepared and punching of an amorphous alloy plate material was performed. In Comparative Example 1, the film was formed by the arc ion plating method. Conditions such as the base material, plate material, and punching speed were not changed from those in the Examples.

[0038] Table 1 shows the differences in configuration between Example 1 and Comparative Example 1. Fig. 9 shows a graph with the number of punches of the punching material on the horizontal axis and the deformation height of the punching material on the vertical axis. The average value was plotted, and the ranges of the maximum value and the minimum value were shown as error bars.

[0039]

Table 1

[0040] In Comparative Example 1, a deformation of approximately 23 μm at most occurred with only 20,000 punches. In Example 1, the base material of the mold was protected by the hard film containing TiSiN which is the first hard layer, and within the scope of implementation, the deformation height 40 did not exceed 20 μm. From this, it was confirmed that the hard film of Example 1 is advantageous for processing the amorphous alloy and the service life can be improved.

Explanation of Signs

[0041] 1 Mold part (punch) 2 Mold part (die) 11 Sheet material of amorphous alloy 12 Thin sheet of amorphous alloy 13 Thin sheet of different material 14 Adhesive layer 20 Base material 21 Hard film 22 First hard layer 23 Second hard layer 24 Edge of punch 25 Edge of die 40 Deformation height 41 Burr 42 Fracture surface 43 Shear surface 44 Sag 110 - 123 Imaging location 130 Correction range 131 Profile line

Claims

1. A die component comprising a punch member and a die member having a hole into which the punch member is inserted, which is used for shearing or breaking a sheet material of an amorphous alloy, both the punch member and the die member include a base material composed of a metal and a hard metal compound, and a hard film formed in a region on the surface used for the processing, the hard film includes a first hard layer mainly composed of Ti, Si, and N, and a second hard layer mainly composed of Ti, Al, and N between the first hard layer and the base material, and is characterized by a die component for processing a sheet material of an amorphous alloy.

2. The hard film is multilayered, having the first hard layer on the surface layer, and alternately provided with a hard layer mainly composed of Ti, Si, and N and a hard layer mainly composed of Ti, Al, and N between the surface layer and the base material, and is characterized by a die component for processing a sheet material of an amorphous alloy according to Claim 1.

3. The metal compound is mainly composed of tungsten carbide having an average particle size of 5 μm or less, and is characterized by a die component for processing a sheet material of an amorphous alloy according to Claim 1 or 2.

4. The hard film is formed on a portion of the punch member inserted into the die member, and is characterized by a die component for processing a sheet material of an amorphous alloy according to any one of Claims 1 to 3.

5. The side surface of the punch member has a portion where a hard film is formed and a portion where no hard film is formed, and at least a portion inserted into the die member has a hard film formed, and is characterized by a die component for processing a sheet material of an amorphous alloy according to Claim 4.

6. In both the punch member and the die member, a surface perpendicular to the sliding direction of the punch is a polished surface, and the hard film is disposed only on the side surface of the punch member and the surface of the hole into which the punch member is inserted in the die member, and is characterized by a die component for processing a sheet material of an amorphous alloy according to Claim 4 or 5.

7. A method for manufacturing a punched material of an amorphous alloy by shearing or breaking a sheet material of an amorphous alloy using a die component, the die component includes a punch member and a die member having a hole into which the punch member is inserted, Both the punch member and the die member include a base material made of a metal and a hard metal compound, and a hard film formed in a region used for the processing on the surface thereof. The hard film includes a first hard layer mainly composed of Ti, Si, and N, and a second hard layer mainly composed of Ti, Al, and N between the first hard layer and the base material, and is characterized by a method for manufacturing a punching material of an amorphous alloy.

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