Apparatus and method using a liquid for sterilization or cleaning

Abstract

To secure sterilization or cleaning capability without the need for enhancing pressure resistance in an apparatus and a method for sterilizing or cleaning a filling machine.SOLUTION: This apparatus includes: a temperature control part configured to be capable of heating liquid used for sterilizing or cleaning a filling machine; a circulation path that is configured to be capable of circulating the liquid between the temperature control part and the filling machine and is configured to be tightly closable; a pressure feed part configured to be capable of pressure-feeding the liquid in the circulation path; and a control part that generates a command. The pressure feed part includes a first pressure feed part that pressure-feeds the liquid from the temperature control part to the filling machine, and a second pressure feed part that pressure-feeds the liquid from the filling machine to the temperature control part.SELECTED DRAWING: Figure 3

Description

Technical Field

[0001] The present disclosure relates to an apparatus and method for sterilizing or cleaning a filling machine by supplying a liquid for sterilization or cleaning that is heated to the filling machine.

Background Art

[0002] For example, a aseptic filling machine that fills a container with a product liquid such as a beverage is provided with a sterilization and cleaning device for stationary sterilization and stationary cleaning of the inside of a filling tank and a filling valve (for example, Patent Document 1). When the production of the product is finished, the discharge part of the filling valve is closed by a lid member, and a predetermined path is set including the inside of the filling tank and the filling valve. When performing stationary cleaning and stationary sterilization of the filling machine using a liquid such as water or a chemical, the sterilization and cleaning device supplies the liquid to a predetermined path for a predetermined time while monitoring at least the temperature of the liquid. Note that stationary cleaning and stationary sterilization may be performed sequentially, or may be performed in parallel and simultaneously.

[0003] The sterilization and cleaning device includes a heat exchanger, a pump, a valve, and a measuring instrument that measures the temperature, concentration, and flow rate of the liquid. The high-temperature liquid heated to the temperature required for cleaning and sterilization by heat exchange with steam in the heat exchanger is supplied to the filling machine, fills the inside of the filling tank, and then returns from the filling machine to the sterilization and cleaning device through the return path. The high-temperature liquid is circulated through a closed circuit between the sterilization and cleaning device and the filling machine.

Prior Art Documents

Patent Documents

[0004]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0005] To enhance the sterilization and cleaning capabilities, the liquid used for stationary sterilization or stationary cleaning is heated to a temperature well above, for example, 100°C. To prevent the liquid from boiling and to stably pump the liquid by a pump, the circulation path including the filling tank and the filling valve is sealed before the liquid is heated by closing the atmosphere release valve.

[0006] When the liquid circulating in a sealed state is heated, the internal pressure of the circulation path increases as the temperature of the liquid rises. Therefore, if the internal pressure of, for example, the filling tank may exceed the pressure resistance, the sterilization and cleaning apparatus cannot be operated. In that case, it is necessary to employ members with a higher pressure resistance specification, resulting in an increase in the size of the filling machine and an increase in the equipment cost. An object of the present invention is to provide an apparatus and a method for sterilizing or cleaning a filling machine, which do not require an increase in pressure resistance and ensure the sterilization or cleaning ability.

Means for Solving the Problems

[0007] The apparatus according to the present disclosure includes a temperature control unit configured to be able to heat the liquid used for sterilizing or cleaning the filling machine, a circulation path configured to be able to circulate the liquid between the temperature control unit and the filling machine and configured to be sealable, and a pumping unit configured to be able to pump the liquid in the circulation path. The pumping unit includes a first pumping unit that pumps the liquid from the temperature control unit toward the filling machine and a second pumping unit that pumps the liquid from the filling machine toward the temperature control unit.

[0008] Further, the apparatus according to the present disclosure includes a temperature control unit configured to be able to heat the liquid used for sterilizing or cleaning the filling machine, a circulation path configured to be able to circulate the liquid between the temperature control unit and the filling machine, a pumping unit that pumps the liquid in the circulation path, and a control unit that generates a command. The control unit gives a command to the pumping unit to reduce the flow rate of the liquid based on the internal pressure in a part of the filling machine during the process of heating the liquid while the circulation path is sealed.

[0009] The present disclosure relates to a method for sterilizing or cleaning a filling machine using a liquid to be heated, comprising: pumping the liquid used for sterilization or cleaning; circulating the liquid through a closed circulation path between a temperature control unit configured to heat the liquid and the filling machine; and a temperature increase step of increasing the temperature of the liquid by the temperature control unit while circulating the liquid. In the circulation path, a first pumping unit for pumping the liquid from the temperature control unit towards the filling machine and a second pumping unit for pumping the liquid from the filling machine towards the temperature control unit are arranged.

[0010] Further, the present disclosure relates to a method for sterilizing or cleaning a filling machine using a liquid to be heated, comprising: pumping the liquid used for sterilization or cleaning by a pumping unit; circulating the liquid through a closed circulation path between a temperature control unit configured to heat the liquid and the filling machine; and a temperature increase step of increasing the temperature of the liquid by the temperature control unit while circulating the liquid. In the temperature increase step, based on the internal pressure in a part of the filling machine, a command is given to the pumping unit to reduce the flow rate of the liquid.

Advantages of the Invention

[0011] The present disclosure includes a first pumping unit for pumping the liquid from the temperature control unit towards the filling machine and a second pumping unit for pumping the liquid from the filling machine towards the temperature control unit. Thus, compared with the case where the liquid is pumped only by the first pumping unit from the temperature control unit towards the filling machine and from the filling machine towards the temperature control unit, the locations where the internal pressure in the circulation path is relatively high are dispersed to the discharge part of the first pumping unit, the filling machine, and the discharge part of the second pumping unit. Therefore, even if the internal pressure in the circulation path increases during the temperature increase process of the liquid, the internal pressure of the circulation path can be suppressed with respect to the pressure resistance. Alternatively, the present disclosure heats the liquid while circulating it in a closed state, and in the temperature increase process of the liquid, a command is given to the pumping unit based on the internal pressure in a part of the filling machine to reduce the flow rate of the liquid. By this also, the internal pressure of the circulation path can be suppressed with respect to the pressure resistance. According to the present disclosure, while ensuring the sterilization ability or cleaning ability corresponding to the heating temperature of the liquid, it is possible to suppress an increase in the internal pressure during the temperature rise process of the liquid and keep the internal pressure of the circulation path lower than the pressure resistance. Since there is no need to increase the pressure resistance of the circulation path, it is possible to avoid an increase in the size of the equipment and suppress the equipment cost.

Brief Description of the Drawings

[0012]

Figure 1

Figure 2

Figure 3

Figure 4

Figure 5

Figure 6

Figure 7

Figure 8

Figure 9

Figure 10

Figure 11

Figure 12

Figure 13

Embodiments for Carrying Out the Invention

[0013] Hereinafter, an embodiment will be described with reference to the accompanying drawings. [First Embodiment] [Outline Configuration] FIG. 1 shows a sterilization and cleaning device 1 and a filling machine 2. The filling machine 2 constitutes a production line of products such as beverage products, for example, and fills a product liquid into a container (not shown) in a sterile state. The filling machine 2 fills the product liquid stored in the filling tank 20 into the container by a filling valve 21.

[0014] When the production of the product is not in progress, the sterilization and cleaning device 1 uses a liquid L (FIG. 2) as a cleaning medium or a sterilization medium to clean and sterilize the inside of the filling tank 20, the filling valve 21, and the piping. The liquid L corresponds to, for example, water or a chemical such as an aqueous solution of sodium hydroxide. The cleanliness of the water and the type of the chemical are selected according to the type of the product liquid and the use of the liquid L. Examples of the use of the liquid L include rinsing, raising the temperature of the piping before cleaning, sterilization, and cleaning of oil and fat components.

[0015] According to the sterilization and cleaning device 1, it is possible to perform stationary cleaning (CIP; Cleaning In Place) and stationary sterilization (SIP; Sterilization In Place) of the filling machine 2. It is also possible to perform stationary cleaning and sterilization (CSIP; Cleaning Sterilization In Place) in which CIP and SIP are performed in parallel at the same time.

[0016] [Configuration of Filling Machine] The configuration of the filling machine 2 will be described. The filling machine 2 is, for example, a rotary filling machine, and includes a plurality of filling valves 21 provided on a rotating body (not shown), and a filling tank 20 that stores the product liquid and supplies the product liquid to each filling valve 21 through a pipe (not shown). The filling tank 20 may be provided on the rotating body and rotate around the shaft portion of the rotating body, or may be fixed to a base separated from the rotating body. While rotating the rotating body of the filling machine 2, stationary cleaning and stationary sterilization can be performed.

[0017] During stationary cleaning and sterilization, the inside of the filling tank 20 is entirely filled with the liquid L used for cleaning and sterilization. On the other hand, during product production, a gas phase region 20A exists above the liquid level 20B inside the filling tank 20. The inside of the filling tank 20 is preferably pressurized to a pressure higher than atmospheric pressure by introducing an inert gas such as nitrogen gas, or by introducing carbon dioxide gas when the product liquid contains carbon dioxide gas. For this pressurization, for example, an N2 supply source or a CO2 supply source is connected to the gas introduction pipe 22 provided in the filling tank 20. In addition, a compressed air supply source is connected to the gas introduction pipe 22 to drain water for rinsing or the like from the filling tank 20 and the pipes.

[0018] The filling tank 20 is provided with a pressure sensor 23 capable of detecting the pressure in the gas phase region 20A. Further, it is preferable that the filling tank 20 is provided with a liquid level sensor 24 for detecting the liquid level and a temperature sensor 25 for detecting the temperature of the stored liquid.

[0019] The filling tank 20 is disposed above the position of the filling valve 21. The product liquid stored in the filling tank 20 is supplied from the filling tank 20 to the filling valve 21 by its own weight and the internal pressure of the filling tank 20. The filling valve 21 discharges a predetermined amount of the product liquid to the product by driving a valve body (not shown) using, for example, compressed air. It is preferable that the filling valve 21 is provided with a temperature sensor 26.

[0020] The filling machine 2 is provided with a valve device 30 for supplying product liquid, water, chemicals, etc. used for cleaning and sterilization to the filling tank 20. The sterilization and cleaning device 1 sterilizes and cleans the inside of the valve device 30 provided in the filling machine 2. The control unit 15 of the sterilization and cleaning device 1 can control the switching state of the valves of the valve device 30.

[0021] The valve device 30 is composed of single or multiple members not shown. The member may be a rotary joint. It is preferable that a control valve 27 capable of adjusting the flow rate is provided between the valve device 30 and the filling tank 20.

[0022] As shown in an example of the configuration in FIG. 1, the valve device 30 includes a first valve block 31 and a second valve block 32. The valve blocks 31 and 32 may be all or part of the regions of the members. The first valve block 31 is connected to the filling tank 20 via the second valve block 32. During product production, the port 321 of the second valve block 32 is open, and the product liquid is supplied to the filling tank 20 through this port 321. The port 321 is connected to a product liquid tank not shown.

[0023] 〔Configuration of Sterilization and Cleaning Device〕 Referring to FIG. 2, the configuration of the sterilization and cleaning device 1 will be described. FIG. 2 shows the state during stationary cleaning or stationary sterilization with the same configuration as FIG. 1. The sterilization and cleaning device 1 includes a balance tank 11 for storing the liquid L used for cleaning and sterilization, a pump 12 as a pressure-feeding unit for pressure-feeding the liquid L, a heat exchanger 13 as a temperature control unit configured to be able to heat the liquid L, a circulation path C configured to be able to circulate the liquid L, and a control unit 15 for generating commands.

[0024] The balance tank 11 stores the liquid L supplied through the introduction pipe 111 from a supply source of the liquid L not shown. Inside the balance tank 11, a gas phase region 11A exists above the liquid level 11B during product production and during stationary cleaning and sterilization. The balance tank 11 is provided with a valve 11V that can be switched between a state in which the inside of the balance tank 11 is open to the atmosphere and a state in which it is blocked from the atmosphere and sealed.

[0025] Although detailed illustration is omitted, the pump 12 includes a pump body including a member capable of rotational movement or reciprocating movement, and a motor for driving the pump body. The pump 12 inhales and discharges the liquid L by the rotational movement or reciprocating movement of the member. The pump 12 of the present embodiment is arranged between the balance tank 11 and the heat exchanger 13 in the circulation path C, and pumps the liquid L from the heat exchanger 13 toward the filling machine 2.

[0026] The pump 12 of the present embodiment is configured such that the flow rate (discharge flow rate) of the discharged liquid L is variable by adjusting the operating speed such as the rotational speed of the member. As the discharge flow rate changes, the pressure (discharge pressure) of the liquid L discharged from the pump 12 also changes. For example, by giving a command from the control unit 15 to the drive circuit of the motor of the pump 12 and increasing the frequency of the drive current applied to the motor, or the duty ratio, etc., the discharge flow rate and discharge pressure of the liquid L discharged from the pump 12 can be increased.

[0027] Alternatively, the pump 12 may be a variable displacement type, and for example, the discharge flow rate and discharge pressure may be configured to be variable by adjusting the swash plate angle or the like. As a pressure pumping unit for pumping the liquid L, a fixed displacement pump and a flow rate adjustment valve (not shown) capable of adjusting the flow rate of the liquid L discharged from the pump can also be used. In this case, the flow rate of the liquid L discharged from the pressure pumping unit can be adjusted by performing flow rate adjustment based on a command from the control unit 15 to the flow rate adjustment valve.

[0028] The heat exchanger 13 heats or cools the first fluid by exchanging heat between the first fluid flowing through the first flow path 131 and the second fluid as a heat medium or refrigerant flowing through the second flow path 132. For example, when the liquid L flows through the first flow path 131 and the vapor V supplied from a vapor source (not shown) flows through the second flow path 132, the liquid L is heated. By increasing the flow rate of the vapor V, the temperature of the liquid L can be raised to a higher temperature.

[0029] The sterilization and cleaning apparatus 1 of the present embodiment ensures the required sterilization ability by raising the temperature of the liquid L to a temperature sufficiently exceeding 100°C, for example, 120°C or higher (130°C as an example) during steady sterilization. Therefore, during stationary sterilization, in order to prevent the boiling of the liquid L and stably feed the liquid by the pump 12, the circulation path C is sealed by closing the valve 11V and valves (not shown) of the discharge part D.

[0030] In order to adjust the temperature of the liquid L by adjusting the flow rate of the vapor V, it is preferable to detect the temperature of the liquid L flowing into the heat exchanger 13 by the temperature sensor 13A and detect the temperature of the liquid L flowing out of the heat exchanger 13 by the temperature sensor 13B.

[0031] The circulation path C includes a forward path C1 through which the liquid L goes from the balance tank 11 to the filling tank 20 of the filling machine 2 via the pump 12, the heat exchanger 13, and the valve device 30, and a return path C2 through which the liquid L supplied to the filling machine 2 by the forward path C1 is returned from the filling valve 21 to the balance tank 11.

[0032] By the operation of the filling machine 2 for switching from product manufacturing to stationary cleaning and sterilization, the discharge port of the filling valve 21 is blocked by a member (not shown), and the internal flow path of the filling valve 21 communicates with the return path C2 by switching a flow path (not shown) provided in the filling valve 21. At the same time, according to a command given from the control unit 15 to the valve device 30, the opening / closing state of the valve of the valve device 30 is switched to a state in which the liquid L passes through the valve device 30 from the heat exchanger 13 toward the filling tank 20. Then, the circulation path C is configured to enable the circulation of the liquid L between the sterilization and cleaning device 1 and the filling machine 2.

[0033] In this embodiment, the liquid L is pumped through the circulation path C by the pump 12 disposed only in the forward path C1 in the circulation path C. The liquid L discharged from the pump 12 and passing through the inside of the filling machine 2 is sucked into the pump 12 via the return path C2 and the balance tank 11. Since no member with a large resistance such as the heat exchanger 13 is disposed in the return path C2, the return path C2 has a smaller pressure loss than the forward path C1.

[0034] In addition, near the end of the return path C2, a discharge part D for discharging the liquid L used for purposes such as rinsing is provided. On the filling machine 2 side of the discharge part D in the return path C2, a temperature sensor 16, a concentration meter 17, and a flow meter 18 for measuring and detecting the temperature, concentration, and flow rate of the liquid L, respectively, are provided. A pressure sensor 19 may be provided at this location. The concentration meter 17 needs to be provided at least near the discharge part D of the circulation path C in order to judge the end of replacement during rinsing based on the concentration of the liquid L. By being provided downstream of the filling machine 2, the flow meter 18 can ensure a flow rate sufficient to wash the inside of the filling machine 2 based on the flow rate of the liquid L.

[0035] As the concentration meter 17, typically a conductivity meter is used based on the correlation between the conductivity of the liquid L as an aqueous solution containing a chemical component contributing to sterilization or cleaning and the concentration of the chemical. Here, since there is also a correlation between the conductivity of the liquid L and the temperature, as will be described later, the control unit 15 timely measures the concentration of the liquid L in the process of stationary cleaning and sterilization and adjusts the concentration of the liquid L to the target concentration. The sterilization and cleaning device 1 preferably includes a concentration adjustment unit 17C configured to be able to adjust the concentration of the liquid L by adding or diluting the chemical component. The concentration adjustment unit 17C is connected so that the stock solution of the chemical or water can be introduced into the path through which the liquid L flows. The concentration adjustment unit 17C may be connected to the balance tank 11 as shown in FIG. 1, for example, or may be connected to the pipe between the balance tank 11 and the pump 12.

[0036] 〔Establishment conditions for stationary cleaning and sterilization〕 In the present embodiment, the stationary cleaning and the stationary sterilization are established, for example, when the following physical quantities all satisfy the following requirements. The following establishment conditions are applicable when the stationary sterilization is started after the completion of the stationary cleaning, etc., when the stationary cleaning and the stationary sterilization are performed separately and sequentially with a time shift, and are also applicable when the stationary cleaning and the stationary sterilization are performed in parallel and simultaneously as the stationary cleaning and sterilization (CSIP).

[0037] (Establishment conditions CC for stationary cleaning) Temperature of the liquid L: T1 or higher (for example, 80 °C or higher) Concentration of the liquid L: M1 or higher (for example, volume concentration 3% or higher) Flow rate of the liquid L: Q1 or higher Time satisfying all of the above three requirements: t1 (for example, 10 minutes) Note that when water is used as the liquid L, the concentration requirement is excluded from the establishment conditions.

[0038] (Establishment conditions SC for stationary sterilization) Temperature of the liquid L: T2 or higher (for example, 130 °C) Time satisfying the above requirement: t2 (for example, 30 minutes)

[0039] From the establishment conditions of the stationary cleaning and sterilization in this embodiment, during the stationary sterilization (SIP) or during the stationary cleaning and sterilization (CSIP) performed in parallel with the stationary cleaning and the stationary sterilization, the liquid L is heated to a temperature T2 exceeding 100°C. In this case, prior to the temperature rise of the liquid L, the circulation path C is set in a closed circuit state. Then, due to the volume increase of the liquid L accompanying the temperature rise and the increase in the saturated vapor pressure in the balance tank 11, the liquid L in the circulation path C is pressurized to a pressure higher than the atmospheric pressure, so that the boiling of the liquid in the circulation path C can be avoided.

[0040] 〔An example of the control of the stationary cleaning and sterilization (CSIP)〕 With reference to FIGS. 3 to 10, an example of the procedure of the CSIP using a chemical agent as the liquid L will be described. FIG. 3 corresponds to the step of circulating the chemical agent in the CSIP and corresponds to FIGS. 5 to 7 in terms of the circuit diagram of the liquid feeding. In FIGS. 6 and 7, the closed valve 11V is shown in black. The temperature T shown in FIG. 3 is detected by the temperature sensors 13A, 13B, 16, 25, and 26. The flow rate Q is measured by the flow meter 18. The pressure P (internal pressure) inside the filling tank 20 is measured by the pressure sensor 23 of the filling tank 20. The sterilization condition SC indicates the integrated time measured up to the sterilization time t2. The cleaning condition CC indicates the integrated time measured up to the cleaning time t1.

[0041] Typically, prior to the use of the chemical agent, as shown in FIG. 4, a rinsing step is performed using water W at room temperature or heated (for example, about 60°C). In the rinsing step, while supplying water W from a supply source (not shown) of the water W to the balance tank 11 through the introduction pipe 111 for a predetermined rinsing time, the pump 12 is driven to pump the water W while the discharge part D is open.

[0042] When the rinsing process (Figure 4) is completed, as shown in Figure 5, the inside of the pipe is replaced from water W to liquid L (chemical), and liquid L is circulated. At the start of this chemical circulation process, while supplying liquid L to the balance tank 11, a command for a constant rotational speed is given to the motor of the pump 12 to drive it at a constant discharge flow rate and discharge pressure (liquid supply start step S01 in Figure 3). And, for a predetermined time until the replacement from water W to liquid L is completed, water W is pushed out by liquid L and discharged from the discharge part D. After that, the supply of liquid L to the balance tank 11 is stopped, and liquid L spread throughout the circulation path C is circulated at a constant flow rate Q (circulation start step S02 in Figure 3, Figure 6). The flow rate Q is equal to or greater than the flow rate Q1 of the cleaning condition CC.

[0043] Simultaneously with the start of the circulation of liquid L, or before or after the start of the circulation, the valves 11V of the valve and the valve of the discharge part D are closed according to the command of the control unit 15 to make the circulation path C in a sealed state (sealing step S03). Furthermore, as shown in Figure 6, by supplying steam V to the second flow path 132 of the heat exchanger 13, the temperature increase of liquid L is started (first temperature increase start step S04). In order to prevent the boiling of liquid L and pressurize liquid L, it is preferable to make the circulation path C in a sealed state while liquid L is at room temperature as much as possible without a large delay in the start of the temperature increase. Also, in order to suppress the influence on the temperature control of liquid L, it is preferable to make the circulation path C in a sealed state while liquid L is at room temperature as much as possible.

[0044] As liquid L is heated in the sealed circulation path C, the pressure inside the circulation path C, including the pressure P inside the filling tank 20, increases. When the temperature T of liquid L reaches the temperature T1 of the cleaning condition CC, the control unit 15 stabilizes the liquid temperature at T1 or higher by adjusting the flow rate of steam V. When the control unit 15 determines that the concentration M of liquid L is equal to or higher than the concentration M1 of the cleaning condition CC, the temperature T of liquid L is equal to or higher than the temperature T1 of the cleaning condition CC, and the flow rate Q of liquid L is equal to or higher than the flow rate Q1 of the cleaning condition CC, the counting of the cleaning time t1 is started (cleaning time counting start step S05).

[0045] The measurement and adjustment of the concentration of the liquid L containing the drug component are performed by the control unit 15 when the temperature of the liquid L is 100°C or lower. Here, from the start of the temperature increase of the liquid L (step S04), while measuring the concentration of the liquid L with the concentration meter 17, the concentration adjustment of the liquid L is started by the concentration adjustment unit 17C to which a command is given by the control unit 15 (concentration adjustment step Sa). Then, prior to the liquid L reaching a temperature exceeding 100°C due to the temperature increase, at the start of the temperature increase (step S06) toward the temperature T2 during stationary sterilization, the adjustment of the concentration is completed by adjusting the concentration of the liquid L to the target concentration M1 (concentration adjustment end step Sb). The start of the measurement of the washing time t1 (step S05) is performed after the completion of the concentration adjustment. Note that 100°C exists between the temperature T1 and the temperature T2.

[0046] The control unit 15 can measure the concentration M based on the data showing the correlation between the conductivity and the concentration indicated by the concentration meter 17 provided in the temperature region of 100°C or lower. The conductivity correlates not only with the concentration M of the liquid L but also with the temperature T of the liquid L. If the concentration M is measured and adjusted using the concentration meter 17 in the temperature region exceeding 100°C, then, since the concentration has to be derived from the conductivity indicated by the concentration meter 17 using the data provided in the temperature region of 100°C or lower, as a result of the concentration adjustment being performed based on the conductivity indicated by the concentration meter 17, which is higher than the conductivity corresponding to the temperature region of the data, the actual concentration M of the liquid L becomes lower than the target concentration M1. Therefore, as described above, prior to the liquid L reaching a temperature exceeding 100°C due to the temperature increase, the adjustment of the concentration is completed by adjusting the concentration M of the liquid L to the target concentration M1 (step Sb), and after the completion of the adjustment of the concentration M (step Sb), in the example shown in FIG. 3, simultaneously with Sb, the measurement of the washing time t1 is started (step S05). By doing so, it is possible to avoid poor washing and reliably wash the inside of the filling machine 2. It is preferable that the concentration M is adjusted to the target concentration M1 when the temperature T is 100°C or in the vicinity thereof, for example, 85 to 95°C. If the concentration M is equal to or higher than the target concentration M1 at that time, it can be said that the concentration requirement is satisfied even when the temperature T exceeds 100°C.

[0047] In the example shown in FIG. 3, since stationary sterilization is performed in combination with stationary cleaning, when the measurement of the cleaning time t1 starts, the temperature rise starts toward the temperature T2 which is the temperature requirement for stationary sterilization (second temperature rise start step S06). As the liquid L further rises in temperature, the pressure inside the circulation path C including the filling tank 20 further increases.

[0048] Here, the pressure increase from the pressure (atmospheric pressure) in the gas phase region 11A of the balance tank 11 before sealing to the saturated vapor pressure in the balance tank 11 increased by the temperature rise of the liquid L in the sealed state is applied to the inside of the circulation path C. Then, in the temperature rise process HP of the liquid L, the pressure P inside the filling tank 20 increases significantly compared to the pressure inside the balance tank 11. The reason is that unlike the balance tank 11, there is no compressible gas phase region 20A inside the filling tank 20 during stationary cleaning and sterilization, and the pipe pressure loss from the outlet of the filling tank 20 to the balance tank 11 and the pressure corresponding to the internal pressure of the balance tank 11 are applied to the filling tank 20. When the pressure in the balance tank 11 increases with P, the internal pressure of the filling tank 20 approaches the pressure resistance. If the circulation path C is sealed, even if the temperature T2 is less than 100°C, the residual pressure and the increase in the pressure in the balance tank 11 due to the temperature rise cause the pressure P inside the filling tank 20 to increase. The higher the temperature T of the liquid L, the higher the pressure P.

[0049] Therefore, in the temperature rise process HP in which the liquid L rises in temperature, when the pressure P reaches the upper limit value P1 determined in advance in consideration of the pressure resistance of the filling tank 20, the control unit 15 gives a command to the pump 12 to reduce the flow rate Q of the liquid L, so as to control the pressure P not to exceed the pressure resistance. When the flow rate Q decreases, the pressure P of the filling tank 20 decreases, and when the flow rate Q increases, the pressure P of the filling tank 20 increases.

[0050] In order to reduce the flow rate Q, a command to reduce the discharge flow rate is given from the control unit 15 to the pump 12 (flow rate reduction step S07). Note that the command to reduce the discharge flow rate corresponds to the command to reduce the discharge pressure. For example, the control unit 15 gives an instruction to decrease the driving frequency of the motor of the pump 12 by a predetermined frequency (for example, several Hz). After giving an instruction to the pump 12, the control unit 15 may use a timer to keep the inside of the circulation path C in a balanced state as much as possible without giving the next instruction for a predetermined time (for example, about several seconds to 20 seconds). Although not shown in FIG. 3, when the flow rate Q decreases, the rate of increase in the temperature T slightly decreases. Through this, the rate of increase in the pressure P of the filling tank 20 slightly decreases.

[0051] Although the pressure P decreases due to the decrease in the flow rate Q, since the temperature T of the liquid L is rising, the pressure P rises again. Therefore, when the pressure P reaches the upper limit value P1, the control unit 15 gives an instruction to the pump 12 to decrease the discharge flow rate and discharge pressure so as to further decrease the flow rate Q. By repeating this several times until the liquid L reaches the temperatures T2 and T3 and gradually decreasing the flow rate Q step by step, the pressure P of the filling tank 20 can be kept lower than the pressure resistance.

[0052] In order to suppress the influence on the temperature control of the liquid L, it is preferable to avoid a sudden change in the flow rate Q. However, it is not always necessary to decrease the flow rate Q step by step, and it is also possible to gradually decrease the flow rate Q continuously while the control unit 15 monitors the pressure P and the temperature T.

[0053] When the flow rate Q decreases so that the flow rate Q is lower than the required flow rate Q1 of the cleaning condition CC, or when the temperature T is less than the required temperature T1, the measurement of the cleaning time t1 is interrupted (cleaning time measurement interruption step S08). The remaining time of the cleaning time t1 is measured after the flow rate Q is restored.

[0054] When the temperature T of the liquid L reaches the temperature T2 of the stationary sterilization condition SC, the control unit 15 starts measuring the sterilization time t2 while keeping the temperature T at T2 or higher (for example, T3) (sterilization time measurement start step S09). Here, since the higher the temperature T of the liquid L, the higher the time efficiency of sterilization, the sterilization time t2 can be shortened by raising the temperature of the liquid L to T3 and performing sterilization. The temperature-raising process HP (the step of raising the temperature of the liquid L) in which the liquid L is heated by the heat exchanger 13 and its temperature rises corresponds to the period from the first temperature-raising start step S04 until the liquid L reaches the target temperature (here, the temperature T2). When the sterilization time t2 elapses while the temperature T of the liquid L is maintained at or above the temperature T2, the stationary sterilization condition SC is satisfied (sterilization condition satisfaction step S10).

[0055] Since the sterilization process is completed as described above, as shown in FIG. 7, by supplying a refrigerant R such as cold water to the second flow path 132 of the heat exchanger 13, the cooling of the liquid L is started (cooling start step S11). In order to promote the cooling of the liquid L to the necessary extent, while reducing the temperature T of the liquid L and within the limit that the pressure P of the filling tank 20 does not exceed the pressure resistance, the flow rate Q may be increased, for example, stepwise, in the same manner as in the above-described flow rate reduction step S07 (flow rate increase step S12).

[0056] In order to suppress the influence on the temperature control of the liquid L, it is preferable that the circulation path C be kept in a sealed state throughout the cooling process CP of the liquid L by the heat exchanger 13.

[0057] When the flow rate Q reaches the necessary flow rate Q1 of the cleaning condition CC, the temperature T is equal to or higher than the temperature T1 of the cleaning condition CC, and the measured concentration M at a liquid temperature of 100°C or lower is equal to or higher than the concentration M1 of the cleaning condition CC, the timing of the interrupted cleaning time t1 is resumed (cleaning time timing resumption step S13). The temperature T at this time may be, for example, less than 100°C and about 90°C. When the remaining time of the cleaning time t1 elapses, since the integrated timing time reaches the cleaning time t1, the cleaning condition CC is satisfied (cleaning condition satisfaction step S14). In the example shown in FIG. 3, when the cleaning condition CC is satisfied, the chemical circulation process ends (chemical circulation process end step S15). By measuring the cleaning time t1 in parallel with the cooling of the liquid L, the non-production time can be shortened. However, when the flow rate Q reaches the necessary flow rate Q1 of the cleaning condition CC during the cooling process CP and the temperature T is close to the temperature T1 of the cleaning condition CC, as shown in FIG. 3, it is preferable to interrupt the cooling of the liquid L and maintain the temperature T at or above the temperature T1 while resuming the timing of the cleaning time t1.

[0058] Thereafter, as shown in FIG. 8, it is possible to shift to a step of rinsing the chemical agent with sterile water W1. In this sterile water rinsing step, sterile water W1 is supplied from the port 311 of the first valve block 31 to the pipe of the forward path C1, and the liquid L is pushed by the sterile water W1 and discharged from the discharge part D. Thereby, the section from the first valve block 31 to the discharge part D is replaced from the liquid L to the sterile water W1. The supply and discharge of the sterile water W1 can be performed for a predetermined time necessary to sufficiently rinse the chemical agent.

[0059] Next, as in the draining step shown in FIG. 9, sterile air (sterile compressed air) is introduced into the filling tank 20 through the gas introduction pipe 22, and the inside of the filling tank 20 is pressurized to remove the sterile water W1 from the inside of the forward path C1 and the return path C2. The sterile air pushes the sterile water W1 from the filling tank 20 toward the discharge part D of the return path C2 and discharges it from the discharge part D, and also pushes the sterile water W1 from the filling tank 20 toward the discharge part 312 of the first valve block 31 of the forward path C1 and discharges it from the discharge part 312. When the draining is completed, the valves of the discharge part 312 and the discharge part D are closed to maintain the sterile state.

[0060] Thereafter, as shown in FIG. 10, the supply of the product liquid to the filling machine 2 is started through the port 321 of the second valve block 32, thereby shifting to the manufacturing process. At this time, the liquid L existing in the section between the valve 313 of the first valve block 31 and the balance tank 11 is discharged from the discharge part D by a rinsing step (not shown). In this rinsing step, the liquid L is pushed out from the discharge part D by the water supplied to the balance tank 11 through the introduction pipe 111. Thus, a series of processes related to the in-place cleaning and sterilization (CSIP) are completed.

[0061] 〔An Example of the Control of the In-Place Cleaning (CIP)〕 When only stationary cleaning is performed without performing stationary sterilization simultaneously, for example, after performing a rinsing step (Figure 4), through replacement from water W to liquid L (Figure 5), liquid L is circulated through circulation path C while heating it to a temperature T1 or higher of cleaning conditions CC (Figure 6). Liquid L is not limited to a chemical agent and may be water. Here, when the temperature T1 is less than 100°C, since it is not necessarily required to seal the circulation path C, the balance tank 11 may be open to the atmosphere by the valve 11V. Also, if the circulation path C is not sealed, it is not necessary to give a command to the pump 12 to reduce the flow rate Q of the liquid L during the temperature increase process HP, and the flow rate Q can be maintained constant throughout the temperature increase process HP. When the temperature T of the liquid L reaches the temperature T1 of the cleaning conditions CC and the flow rate Q reaches the flow rate Q1 of the cleaning conditions CC, and the timing over the cleaning time t1 ends (the cleaning conditions CC are satisfied), the liquid L is cooled to a predetermined temperature (Figure 7). When a chemical agent is used, rinsing is performed (Figure 8), and otherwise, it directly proceeds to draining (Figure 9) and shifts to product manufacturing.

[0062] Even when heating the liquid L to a temperature T1 exceeding 100°C in stationary cleaning, prior to the temperature increase of the liquid L, the circulation path C should be made airtight, and during the temperature increase process HP, the flow rate Q may be decreased by giving a command to the pump 12 based on the pressure P. Also, even when the temperature T1 is less than 100°C, when the circulation path C is made airtight, the flow rate Q may be decreased based on the pressure P during the temperature increase process HP. When the flow rate Q falls below the required flow rate Q1 due to the decrease in the flow rate Q, similar to the above steps S08 and S12, it involves interruption and resumption of the timing of the cleaning time t1.

[0063] 〔An example of the control of stationary sterilization (SIP)〕 When only stationary sterilization is performed without performing it simultaneously with stationary cleaning, for example, after performing a rinsing step (Figure 4), through replacement from water W to liquid L (Figure 5), liquid L is circulated through circulation path C while heating it to a temperature T2 or higher of sterilization conditions SC (Figure 6). Liquid L is not limited to a chemical agent and may be water. When the temperature T2 exceeds 100°C, the circulation path C is made airtight prior to the temperature rise of the liquid L. Note that the circulation path C may be made airtight even when the temperature T2 is less than 100°C. When the circulation path C is made airtight, in the process HP of the temperature rise of the liquid L, similar to the above step S07, a command is given to the pump 12 to reduce the discharge flow rate and discharge pressure so that the pressure P in the filling tank 20 does not exceed the upper limit value P1, thereby reducing the flow rate Q of the liquid L. When the temperature T of the liquid L reaches the temperature T2 of the sterilization condition SC and the time measurement over the sterilization time t2 is completed (the sterilization condition SC is satisfied), the liquid L is cooled to a predetermined temperature (Fig. 7). At this time, by increasing the flow rate Q within the limit that the pressure P does not exceed the pressure resistance, cooling can be promoted and the cooling step can be terminated earlier. When a chemical agent is used as the liquid L, rinsing is performed (Fig. 8), and if not, it directly proceeds to draining (Fig. 9) and then shifts to product manufacturing.

[0064] When the temperature T2 of the sterilization condition SC is less than 100°C, the liquid L can be heated with the circulation path C not airtight. In this case, it is not necessary to reduce the flow rate Q during the temperature rise process HP.

[0065] 〔Effect according to the first embodiment〕 As described above, the first embodiment heats the liquid L while circulating it in an airtight state, and in the process HP of the temperature rise of the liquid L, a command is given to the pump 12 based on the pressure P in the filling tank 20 to reduce the flow rate Q of the liquid L. By doing so, while ensuring the sterilization ability corresponding to a liquid temperature high enough to sufficiently exceed 100°C using the pressurized liquid, the internal pressure of the circulation path C including the filling tank 20 can be kept lower than the pressure resistance. If, for example, a tank with a thick wall is used in the filling tank 20 to increase the pressure resistance of the circulation path C, the equipment will become larger and the equipment cost will increase. According to the present embodiment, it is not necessary to increase the pressure resistance of the circulation path C, and by controlling to give a command to the pump 12 based on the pressure P of the filling tank 20, an excessive increase in the internal pressure of the circulation path C due to heating the liquid L to a high temperature can be avoided. When applying the sterilization and cleaning device 1 of the present embodiment to the existing filling machine 2, only the addition of control to the control unit 15 is sufficient, and it is not necessary to change the existing device configuration, and a troublesome operation such as replacing the filling tank 20 with a tank having a high pressure resistance does not occur.

[0066] Furthermore, in the present embodiment, even when the flow rate Q decreased based on the pressure P deviates from the required flow rate Q1, after the flow rate Q is restored to the required flow rate Q1 in the cooling process CP, the remaining time of the cleaning time t1 is measured. By this control, the sterilization and cleaning device 1 that conforms to the cleaning conditions CC can be provided.

[0067] [Second Embodiment] Next, referring to FIGS. 11 and 12, a second embodiment of the present disclosure will be described. Hereinafter, the description will focus on matters different from the first embodiment. The same reference numerals are given to the same components as those in the first embodiment. The configuration of the second embodiment is the same as that of the first embodiment unless otherwise specified, and the operations and effects obtained from the configuration are also the same as those of the first embodiment. Therefore, for the same matters, repeated explanations are avoided, and the operations and effects described in the first embodiment are cited.

[0068] The sterilization and cleaning device 4 according to the second embodiment, as shown in FIG. 11, is different from the sterilization and cleaning device 1 of the above-described first embodiment in that it includes two pumps 121 and 122. The pumps 121 and 122 may each be configured in the same manner as the pump 12 of the first embodiment. However, since the same flow rate Q1 as in the first embodiment is realized by the two pumps 121 and 122, it is sufficient that each of the pumps 121 and 122 has a lower capacity than the pump 12 of the first embodiment.

[0069] The first pump 121 as the first pumping unit pumps the liquid L from the heat exchanger 13 toward the filling machine 2. The first pump 121 can be arranged at the same position as the pump 12 in the first embodiment.

[0070] The second pump 122 as the second pumping unit pumps the liquid L from the filling machine 2 toward the heat exchanger 13. The second pump 122 is arranged in the return path C2 into which the liquid L flows from the filling valve 21. When the second pump 122 sucks the liquid L discharged from the first pump 121 and whose pressure has dropped due to the resistance of pipes and the like, it discharges at a pressure higher than the suction pressure. The return path C2 has a smaller pressure loss than the forward path C1 where the heat exchanger 13 is arranged. Therefore, it suffices for the second pump 122 to have a capacity lower than that of the first pump 121.

[0071] In the second embodiment, by operating the first pump 121 arranged in the forward path C1 and the second pump 122 arranged in the return path C2, different from the first embodiment, the internal pressure of the filling tank 20 can be suppressed with respect to the pressure resistance without reducing the flow rate Q. When circulating the liquid L in a sealed state at a constant flow rate Q equal to or higher than the required flow rate Q1 only by the pump 12 arranged in the forward path C1 as in the first embodiment, if the maximum pressure (pressure P of the filling tank 20) in the circulation path C exceeds the pressure resistance during the heating process HP, the flow rate Q has to be reduced with respect to the required flow rate Q1. On the other hand, in the second embodiment, since the same flow rate Q as in the first embodiment can be realized by the two pumps 121 and 122, for example, by applying discharge pressures p1 and p2 to the pumps 121 and 122 respectively, the discharge pressure p1 of the first pump 121 is smaller than the discharge pressure of the pump 12 when pumping the liquid by one pump 12 in the first embodiment. Then, the force pushing the liquid L from the first pump 121 toward the filling tank 20 is smaller than the force pushing the liquid L from the pump 12 in the first embodiment toward the filling tank 20, so the pressure P of the filling tank 20 decreases compared to the first embodiment. Moreover, the pressure P of the filling tank 20 also decreases compared to the first embodiment because the liquid L is sucked from the downstream side of the filling tank 20 by the second pump 122.

[0072] From the above, by providing the first pump 121 and the second pump 122, the required flow rate Q1 is ensured throughout the liquid temperature rising process HP of the liquid L, and the locations where the pressure in the circulation path C is relatively high are dispersed to the discharge part of the first pump 121, the inside of the filling tank 20, and the discharge part of the second pump 122. Therefore, even if the internal pressure of the circulation path C increases during the liquid temperature rising process HP, it will not become an excessive pressure, and the internal pressure of the circulation path C can be suppressed with respect to the pressure resistance. Therefore, similar to the first embodiment, while ensuring the sterilization ability corresponding to a liquid temperature high enough to sufficiently exceed 100°C by using pressurized liquid, the internal pressure of the circulation path C including the filling tank 20 can be suppressed lower than the pressure resistance. By suppressing the internal pressure of the circulation path C, it is not necessary to increase the pressure resistance of the circulation path C, so it is possible to avoid an increase in the size of the equipment and suppress the equipment cost.

[0073] In addition to providing the first pump 121 and the second pump 122, for example, by performing the control shown below, the pressure P of the filling tank 20 can be more sufficiently suppressed with respect to the pressure resistance. FIG. 12 shows an example of the control of the stationary cleaning and stationary sterilization being performed in parallel, that is, the stationary cleaning and sterilization (CSIP), according to the configuration of the second embodiment. After the rinsing step, the supply of the liquid L is started (liquid feeding start step S01 in FIG. 12), and after the replacement from water to the liquid L, the circulation of the liquid L is started while forming the circulation path C (circulation start step S02 in FIG. 12). At this time, the control unit 15 gives a constant rotational speed to the motor of the first pump 121 and also gives a constant rotational speed to the motor of the second pump 122, so that the first pump 121 and the second pump 122 can be driven at a constant discharge flow rate and discharge pressure respectively. At this time, the flow meter 18 measures a flow rate Q equal to or greater than the flow rate Q1 of the cleaning condition CC.

[0074] Furthermore, by closing the valve 11V and the valve of the discharge part D, the circulation path C is made airtight (sealing step S03), and by supplying steam V to the second flow path 132 of the heat exchanger 13, the temperature rise of the liquid L is started (first temperature rise start step S04).

[0075] If the temperature T of the liquid L reaches the temperature T1 of the cleaning condition CC, and the concentration M, temperature T, and flow rate Q of the liquid L satisfy the requirements of the concentration M1, temperature T1, and flow rate Q1, respectively, the control unit 15 starts counting the cleaning time t1 (cleaning time counting start step S05).

[0076] In order to avoid cleaning defects, the measurement and adjustment of the concentration of the liquid L are performed when the temperature of the liquid L is 100 °C or lower, similar to the first embodiment (concentration adjustment step Sa). Then, prior to reaching a temperature exceeding 100 °C due to the temperature increase of the liquid L, the adjustment of the concentration is completed by adjusting the concentration M of the liquid L to the target concentration M1.

[0077] When the counting of the cleaning time t1 is started, the temperature increase is started toward the temperature T2 which is the temperature requirement for stationary sterilization (second temperature increase start step S06). In the second embodiment, in the process of increasing the temperature of the liquid L beyond the temperature T1 of the cleaning condition CC, a command is given to the first pump 121 to decrease the discharge pressure p1 (first pump discharge pressure decrease step S07-1), and a command is given to the second pump 122 to increase the discharge pressure p2 (second pump discharge pressure increase step S07-2).

[0078] Then, due to the decrease in the force with which the first pump 121 pushes the liquid L accompanying the decrease in the pressure p1, the pressure P in the filling tank 20 decreases, and also due to the increase in the liquid suction amount from the filling tank 20 of the second pump 122 accompanying the increase in the pressure p2, the pressure P in the filling tank 20 decreases. Since the discharge pressure p1 is decreased while the discharge pressure p2 is increased, the required flow rate Q1 can be ensured without decreasing the flow rate Q. The control unit 15 may give commands to the pumps 121 and 122 while monitoring the pressure P and the flow rate Q in order to stably send the liquid throughout the circulation path C. Since the required flow rate Q1 is ensured in the temperature increase process HP, the counting of the cleaning time t1 is not interrupted. When the flow rate Q is equal to or greater than the required flow rate Q1, the measured concentration M is equal to or greater than the required concentration M1 at a liquid temperature of 100°C or lower, and the temperature T is equal to or greater than the required temperature T1, when the cleaning time t1 is reached from the start of timing, the cleaning condition CC is satisfied (cleaning condition satisfaction step S14).

[0079] According to the drive control of the pumps 121 and 122 in the heating process HP of the second embodiment, the inside of the filling tank 20 can be maintained at a pressure P sufficiently lower than the upper limit value P1. The decrease in the discharge pressure p1 and the increase in the discharge pressure p2 in the heating process HP can be performed step by step while stabilizing the pressure P and the flow rate Q within a predetermined value range on the premise that the pressure P does not exceed the upper limit value P1 and the flow rate Q is equal to or greater than the required flow rate Q1. For example, based on a command from the control unit 15, the drive frequency of each motor of the pumps 121 and 122 may be changed by several Hz at a time. Note that it is also possible to change the discharge pressures p1 and p2 continuously.

[0080] When the temperature T of the liquid L reaches the temperature T2 of the stationary sterilization condition SC, the measurement of the sterilization time t2 is started (sterilization time measurement start step S09). Thereafter, when the sterilization time t2 elapses while the temperature T of the liquid L is maintained at T2 or higher, the stationary sterilization condition SC is satisfied (sterilization condition satisfaction step S10). In the example shown in FIG. 12, there is a cleaning condition satisfaction step S14 between the sterilization time measurement start step S09 and the sterilization condition satisfaction step S10, but this is not the only case. Depending on the cleaning time t1 and the like, the cleaning condition satisfaction step S14 may exist, for example, between the sterilization condition satisfaction step S10 and the chemical circulation process end step S15.

[0081] When the sterilization condition is satisfied, the cooling of the liquid L is started (cooling start step S11). At this time, while decreasing the temperature T of the liquid L, for example, contrary to the heating process HP, the discharge pressure p1 of the first pump 121 may be increased and the discharge pressure p2 of the second pump 122 may be decreased. When the temperature of the liquid L is cooled to a predetermined temperature T4 by the heat exchanger 13, the chemical circulation process is terminated (chemical circulation process termination step S15). In the second embodiment, since the required flow rate Q1 is ensured during the heating process HP, the timing of the cleaning time t1 is not interrupted, and it is not necessary to accumulate the shortage time of the cleaning time t1 after the sterilization process. Accordingly, the chemical circulation process ends earlier compared to when it ends (S15) in the chemical circulation process in the control shown in FIG. 3.

[0082] Thereafter, as in the first embodiment, through the steps shown in FIGS. 8 to 10, a series of processes related to stationary cleaning and sterilization (CSIP) are completed.

[0083] The sterilization and cleaning apparatus 4 of the second embodiment can perform stationary cleaning that is not performed simultaneously with stationary sterilization. The procedure for stationary cleaning (CIP) is basically the same as that of the first embodiment.

[0084] The sterilization and cleaning apparatus 4 of the second embodiment can perform stationary sterilization that is not performed simultaneously with stationary cleaning. The procedure for stationary sterilization (SIP) is basically the same as that of the first embodiment.

[0085] As described above, since the second embodiment includes two pumps 121 and 122, an increase in the internal pressure of the filling tank 20 during the heating process HP can be suppressed compared to the first embodiment. Therefore, for both stationary cleaning and stationary sterilization, it is not always necessary to give commands to the pumps 121 and 122 to reduce the flow rate Q during the heating process HP.

[0086] [Modification Example of the Second Embodiment] As shown in FIG. 13, by giving a command to change the discharge pressure only to the second pump 122 by the control unit 15 in the temperature rising process HP, the discharge pressure p1 of the first pump 121 can be kept constant while increasing the discharge pressure p2 of the second pump 122. Even in this case, compared with the case of pumping the liquid L only by the pump 12 of the first embodiment, the force with which the first pump 121 pushes the liquid L decreases, and the amount of liquid sucked from the filling tank 20 by the second pump 122 increases. Therefore, the inside of the filling tank 20 can be kept at a pressure P lower than the upper limit value P1. Note that when the discharge pressure p1 is kept constant and the discharge pressure p2 is increased, the flow rate Q gradually increases. Furthermore, although not shown, by the control unit 15, while keeping the discharge pressure p2 of the second pump 122 constant and decreasing the discharge pressure p1 of the first pump 121, the force with which the first pump 121 pushes the liquid L decreases, and the liquid L is sucked from the filling tank 20 by the second pump 122, so that the inside of the filling tank 20 can be kept at a pressure P lower than the upper limit value P1.

[0087] In addition to the above, it is possible to select and choose the configurations described in the above embodiments, or to appropriately change them to other configurations. In the forward path C1 of the circulation path C of the first embodiment, a plurality of pumps 12 as pressure feeding units may be arranged in series. For example, the pumps 12 are arranged between the balance tank 11 and the heat exchanger 13, and between the heat exchanger 13 and the valve device 30, respectively. Also, in the forward path C1 of the circulation path C of the second embodiment, a plurality of first pumps 121 as the first pressure feeding unit may be arranged, and in the return path C2, a plurality of second pumps as the second pressure feeding unit may be arranged. For example, the first pumps 121 are arranged between the balance tank 11 and the heat exchanger 13, and between the heat exchanger 13 and the valve device 30, respectively. For example, the second pumps 122 are arranged at positions near the filling machine 2 and near the balance tank 11 in the return path C2, respectively. Furthermore, the sterilization and cleaning device of the present disclosure only needs to have a function of performing at least one of sterilization and cleaning of the filling machine 2. That is, the device of the present disclosure that uses the liquid L for sterilization or cleaning includes a cleaning device that exclusively cleans the filling machine 2 using the liquid L, and a sterilization device that exclusively sterilizes the filling machine 2 using the liquid L. The same applies to the method of the present disclosure that uses the liquid L for sterilization or cleaning as to the device.

[0088] [Appendix] From the above disclosure, the following configurations can be understood. [1] A temperature control unit configured to be able to heat the liquid used for sterilization or cleaning of the filling machine, A circulation path configured to be able to circulate the liquid between the temperature control unit and the filling machine and configured to be sealable, A pumping unit configured to be able to pump the liquid in the circulation path, and The pumping unit A first pumping unit that pumps the liquid from the temperature control unit toward the filling machine, and A second pumping unit that pumps the liquid from the filling machine toward the temperature control unit, Device.

[0089] [2] Comprising a control unit that generates a command, In the process of the liquid heating up while the circulation path is sealed, the control unit Gives the command to decrease the discharge pressure to the first pumping unit, Gives the command to increase the discharge pressure to the second pumping unit, The device according to item [1].

[0090] [3] Comprising a control unit that generates a command, In the process of the liquid heating up while the circulation path is sealed, the control unit Keeps the discharge pressure of the first pumping unit constant, Gives the command to increase the discharge pressure to the second pumping unit, The device according to item [1] or [2].

[0091] [4] A temperature control unit configured to be able to heat the liquid used for sterilizing or cleaning the filling machine, A circulation path configured to be able to circulate the liquid between the temperature control unit and the filling machine, A pumping unit for pumping the liquid in the circulation path, A control unit for generating a command, and comprising: In the process of the liquid heating up while the circulation path is in a sealed state, the control unit Based on the internal pressure in a part of the filling machine, gives the command to the pumping unit to reduce the flow rate of the liquid. Device.

[0092] [5] The temperature control unit is configured to be able to cool the liquid in addition to heating the liquid. In the process of the liquid heating up, after starting the timing of a predetermined cleaning time, the control unit interrupts the timing as the flow rate decreases, In the process of the liquid being cooled by the temperature control unit, resumes the timing. The device according to item [4].

[0093] [6] The temperature control unit raises the temperature of the liquid to a temperature exceeding 100°C. The device according to any one of [1] to [5].

[0094] [7] A liquid storage tank for supplying the liquid to the temperature control unit, A filling tank as a part of the filling machine, and comprising: Inside the liquid storage tank, there is a gas phase region. The device according to any one of [1] to [6].

[0095] [8] A concentration meter for measuring the concentration of the liquid containing a chemical component contributing to the sterilization or the cleaning, A concentration adjustment unit configured to be able to adjust the concentration by adding or diluting the chemical component. When the temperature of the liquid is 100 °C or lower, the concentration is adjusted by the concentration adjustment unit while measuring the concentration with the concentration meter, and prior to reaching a temperature exceeding 100 °C due to the temperature rise of the liquid, the adjustment of the concentration is terminated by adjusting the concentration to a predetermined concentration. After the completion of the adjustment of the concentration during the temperature rise process of the liquid, the counting of a predetermined cleaning time is started. The apparatus according to any one of [1] to [7].

[0096] 〔9〕A method for sterilizing or cleaning a filling machine using a liquid to be heated, pumping the liquid used for the sterilization or the cleaning, and circulating the liquid through a closed circulation path between a temperature control unit configured to heat the liquid and the filling machine; and a temperature rising step of raising the temperature of the liquid by the temperature control unit while circulating the liquid. In the circulation path, a first pumping unit for pumping the liquid from the temperature control unit toward the filling machine and a second pumping unit for pumping the liquid from the filling machine toward the temperature control unit are arranged. Method.

[0097] 〔10〕In the temperature rising step, while reducing the discharge pressure of the first pumping unit, increasing the discharge pressure of the second pumping unit. The method according to item [9].

[0098] 〔11〕In the temperature rising step, while keeping the discharge pressure of the first pumping unit constant, increasing the discharge pressure of the second pumping unit. The method according to item [9].

[0099] 〔12〕A method for sterilizing or cleaning a filling machine using a liquid to be heated, Pumping the liquid used for the sterilization or the cleaning by a pumping unit, and circulating the liquid through a sealed circulation path between a temperature control unit configured to heat the liquid and the filling machine; while circulating the liquid, a temperature rising step of raising the temperature of the liquid by the temperature control unit; In the temperature rising step, Based on the internal pressure in a part of the filling machine, giving a command to the pumping unit to reduce the flow rate of the liquid.

[0100] 〔13〕In the temperature rising step, starting to measure a predetermined cleaning time; Interrupting the measurement when the flow rate decreases; Resuming the measurement in the process of cooling the liquid by the temperature control unit. The method according to item 〔12〕.

[0101] 〔14〕Following the temperature rising of the liquid, a cooling step of cooling the liquid by the temperature control unit; In the cooling step, Giving a command to the pumping unit to increase the flow rate of the liquid. The method according to item 〔12〕.

[0102] 〔15〕When the temperature of the liquid is 100 °C or lower, while measuring the concentration of the liquid containing the chemical component contributing to the sterilization or the cleaning, adjusting the concentration by adding or diluting the chemical component; Before reaching a temperature exceeding 100 °C due to the temperature rising of the liquid, ending the adjustment of the concentration by adjusting the concentration to a predetermined concentration; After the end of the adjustment of the concentration in the temperature rising process of the liquid, starting to measure a predetermined cleaning time. The method according to any one of items 〔9〕 to 〔14〕.

Explanation of Signs

[0103] 1,4 Sterilization and Cleaning Device 2 Filling machine 11 Balance tank (liquid storage tank) 11A Gas phase region 11B Liquid level 11V Valve 12 Pump (pressure feeding section) 13 Heat exchanger (temperature control section) 13A, 13B Temperature sensor 15 Control section 16 Temperature sensor 17 Concentration meter 17C Concentration adjustment section 18 Flow meter 19 Pressure sensor 20 Filling tank 20A Gas phase region 20B Liquid level 21 Filling valve 22 Gas introduction pipe 23 Pressure sensor 24 Liquid level sensor 25 Temperature sensor 26 Temperature sensor 27 Control valve 30 Valve device 31 First valve block 32 Second valve block 111 Introduction pipe 121 First pump (first pressure feeding section) 122 Second pump (second pressure feeding section) 131 First flow path 132 Second flow path 311 Port 312 Discharge section 313 Valve 321 Port C Circulation path C1 Forward path C2 Return path CP Cooling process D Discharge section HP Heating process L Liquid P Pressure P1 Upper limit value Q Flow rate Q1 Required flow rate Discharge pressures of p1 and p2 Refrigerant R S01 Liquid supply start step S02 Circulation start step S03 Sealing step S04 First temperature rise start step S05 Cleaning time measurement start step S06 Second temperature rise start step S07 Flow rate reduction step S07-1 Discharge pressure reduction step of the first pump S07-2 Discharge pressure increase step of the second pump S08 Cleaning time measurement interruption step S09 Sterilization time measurement start step S10 Sterilization condition fulfillment step S11 Cooling start step S12 Flow rate increase step S13 Cleaning time measurement resumption step S14 Cleaning condition fulfillment step S15 End step of the chemical circulation process Sa Concentration adjustment step Sb Concentration adjustment end step Temperature T Required temperatures T1 and T2 Temperatures T3 and T4 Cleaning time t1 Sterilization time t2 Vapor V Water W Sterile water W1

Claims

1. A temperature control unit configured to be able to heat a liquid used for sterilizing or cleaning a filling machine; A circulation path configured to be able to circulate the liquid between the temperature control unit and the filling machine and configured to be sealable; A pumping unit configured to be able to pump the liquid in the circulation path; A control unit that generates commands, and comprising: The pumping unit: A first pumping unit that pumps the liquid from the temperature control unit toward the filling machine; A second pumping unit that pumps the liquid from the filling machine toward the temperature control unit, and including: The control unit: In the process of the liquid heating up while the circulation path is sealed, Gives the command to reduce the discharge pressure to the first pumping unit, An apparatus that gives the command to increase the discharge pressure to the second pumping unit.

2. A temperature control unit configured to be able to heat a liquid used for sterilizing or cleaning a filling machine; A circulation path configured to be able to circulate the liquid between the temperature control unit and the filling machine and configured to be sealable; A pumping unit configured to be able to pump the liquid in the circulation path; A control unit that generates commands, and comprising: The pumping unit: A first pumping unit that pumps the liquid from the temperature control unit toward the filling machine; A second pumping unit that pumps the liquid from the filling machine toward the temperature control unit, and including: The control unit, in the process of the liquid heating up while the circulation path is sealed, Keeps the discharge pressure of the first pumping unit constant, An apparatus that gives the command to increase the discharge pressure to the second pumping unit.

3. A method for sterilizing or cleaning a filling machine using a liquid to be heated, comprising: A step of pumping the liquid used for the sterilization or the cleaning, and circulating the liquid through a sealed circulation path between a temperature control unit configured to be able to heat the liquid and the filling machine; A temperature rising step of raising the temperature of the liquid by the temperature control unit while circulating the liquid, and including: In the circulation path, a first pumping unit that pumps the liquid from the temperature control unit toward the filling machine and a second pumping unit that pumps the liquid from the filling machine toward the temperature control unit are arranged; In the temperature rising step: While reducing the discharge pressure of the first pumping unit, A method of increasing the discharge pressure of the second pumping unit.

4. A method for sterilizing or cleaning a filling machine using a liquid to be heated, comprising: A step of pumping the liquid used for the sterilization or the cleaning, and circulating the liquid through a sealed circulation path between a temperature control unit configured to be able to heat the liquid and the filling machine; A temperature increase step of increasing the temperature of the liquid by the temperature control unit while circulating the liquid; In the circulation path, a first pumping unit for pumping the liquid from the temperature control unit toward the filling machine and a second pumping unit for pumping the liquid from the filling machine toward the temperature control unit are arranged; In the temperature increase step, while keeping the discharge pressure of the first pumping unit constant, a method of increasing the discharge pressure of the second pumping unit.

Images