Method for calibrating the operating positions of a grinding head and a transport station

Abstract

An object of the present invention is to provide an apparatus and method for calibrating the operating positions of a polishing head and a transfer station. [Solution] The present invention discloses an apparatus for calibrating the working positions of a polishing head and a transfer station, comprising: a transfer station capable of reciprocating along a linear trajectory; a polishing head capable of circumferentially rotating, the rotation trajectory having at least one intersection with a linear trajectory; a sensor assembly for monitoring a change in the gap between the outer edge of the polishing head and a sensor, the sensor assembly including a sensor capable of measuring distances at least at both radial ends of the transfer station; and a judgment unit for outputting the minimum linear distance between the outer edge of the polishing head monitored by the sensor assembly and the sensor, and for judging whether the central axis of the polishing head and the transfer station overlap. The present invention further discloses a method for calibrating the working positions of the polishing head and the transfer station. The present invention has high calibration efficiency, low requirements on the mounting position of the sensor, and small detection error.

Description

Technical Field

[0001] The present invention belongs to the technical field of semiconductor integrated circuit chip manufacturing, and particularly relates to an apparatus and method for calibrating the operating positions of a polishing head and a transfer station.

Background Art

[0002] A Chemical Mechanical Planarization (CMP for short) apparatus generally includes a semiconductor device front-end module (EFEM), a cleaning unit, and a polishing unit. The EFEM mainly includes a magazine for storing wafers, a wafer transfer manipulator, an air purification system, etc. The cleaning unit mainly includes different numbers of megasonic cleaning members, rolling brush cleaning members, drying members, and a device for transmitting wafers between the members. The polishing unit usually includes members such as a workbench, a polishing disk, a polishing head, a polishing arm, a trimmer, a polishing liquid arm, etc., and each member is arranged on the workbench according to the process processing position. It is found in the actual wafer processing process that the spatial arrangement of the polishing unit and modules such as cleaning and wafer transportation has a great impact on the overall polishing throughput of the chemical mechanical planarization apparatus. The transfer between the wafer polishing unit and the outside and between the polishing units is usually realized by a transfer station or a device playing a similar role.

[0003] The currently known polishing module includes an array of two columns of polishing units, each column of polishing units includes one set or multiple sets of polishing units, the conveying stations corresponding to the two columns of polishing unit arrays are arranged vertically in the column direction of the polishing unit array, the operating part of the wafer conveying module is located vertically above the conveying stations arranged along the vertical direction, and completes the conveyance between the other wafer attaching / detaching area and the conveying stations and between the conveying stations. Each conveying station services two opposing polishing units. The above-mentioned multiple sets of polishing units cooperate with the wafer conveying module and the conveying stations mutually, and can realize the efficient flow of the wafer throughout the polishing unit array, with high polishing throughput. Each column of polishing units can be freely increased or decreased according to process requirements or maintenance requirements, and the throughput can be further improved. With the increase in the number of polishing units, the difficulty and workload for the wafer attaching / detaching operator to manually calibrate are increasing.

[0004] Chinese Patent CN110411344B discloses "Calibration Method, Calibration Device, Calibration System and Electronics", which requires four distance values to complete centering, and with these four distance values, centering of the polishing head with respect to the conveying station can be completed only by rotating the polishing head. The conveying station is fixed and there is no mention of centering of the conveying station. The device is relatively complex, with low centering efficiency and no realization of centering of the conveying station. Also, the detection data volume of the four sensors is large, the calculation is further complex, and the time taken for centering is long.

Summary of the Invention

[0005] In order to solve the deficiencies of the prior art, the present invention provides a device and method for calibrating the operating positions of a polishing head and a conveying station, which have a simple structure and a convenient method.

[0006] The present invention adopts the following technical solutions to solve its technical problems. That is, an apparatus for calibrating the operating positions of a polishing head and a transfer station, which comprises: a transfer station capable of reciprocating along a linear trajectory; a polishing head rotatable in the circumferential direction and having a rotational trajectory with at least one intersection with the linear trajectory; a sensor assembly for monitoring the change in the distance between the outer edge of the polishing head and the sensor, the sensor assembly including sensors capable of measuring distances at least at the radial both ends of the transfer station; a determination unit for outputting the minimum linear distance between the outer edge of the polishing head monitored by the sensor assembly and the sensor, and used for determining whether the central axis of the polishing head and the transfer station overlap.

[0007] Furthermore, when the number of the sensors is at least two, they are arranged at the radial both ends of the transfer station, or when the number of the sensors is one, it is movable to the radial both ends around the outer edge of the transfer station.

[0008] Furthermore, when the number of the sensors is at least two, they are arranged along the extending direction of the linear trajectory.

[0009] Furthermore, the determination unit outputs the minimum value of the sum of the distances between the outer edge of the polishing head monitored by the sensor assembly and the sensor, and / or outputs the minimum value of the difference between the distances between the outer edge of the polishing head monitored by the sensor assembly and the sensor, and is used for determining whether the central axis of the polishing head and the transfer station overlap.

[0010] Furthermore, the determination unit compares the minimum value of the sum of the distances between the outer edge of the polishing head monitored by the sensor assembly and the sensor with a set value, and / or compares the minimum value of the difference between the distances between the outer edge of the polishing head monitored by the sensor assembly and the sensor with a set value, and is used for determining whether the central axis of the polishing head and the transfer station overlap.

[0011] Furthermore, the sensor assembly further includes a locking groove provided in the transfer station and a fixing base connectable to the sensor, and the fixing base and the locking groove are removably connected.

[0012] Furthermore, a longitudinal cross-section of the locking groove is U-shaped, a lateral cross-section of the fixing base is I-shaped, and a necking portion of the fixing base can be inserted into a notch portion of the locking groove from top to bottom.

[0013] Furthermore, the sensor is a distance measuring sensor and the number thereof is two.

[0014] Furthermore, the transfer station reciprocates along a linear trajectory by driving of a support base, and the polishing head rotates circumferentially by driving of a polishing head swing arm.

[0015] The present invention further discloses a method for calibrating operating positions of a polishing head and a transfer station, and the method includes: rotating the polishing head circumferentially along a rotational trajectory; reciprocating and translating the transfer station along a linear trajectory; centering the transfer station; centering the transfer station, The centering step of the polishing head and the centering step of the transfer station may be performed in sequence or simultaneously.

[0016] Furthermore, when the centering step of the polishing head is performed first, the sensor assembly monitors that a sum of distances between an outer edge of the polishing head and the sensor becomes a minimum value, and when the centering step of the transfer station is then performed, the sensor assembly monitors that a difference between distances between the outer edge of the polishing head and the sensor becomes a minimum value.

[0017] Furthermore, when the centering step of the transfer station is performed first, the sensor assembly monitors that the sum of the distances between the outer edge of the polishing head and the sensor is minimized. When the centering step of the polishing head is then performed, the sensor assembly monitors that the difference in the distances between the outer edge of the polishing head and the sensor is minimized.

[0018] Furthermore, when centering the polishing head and the transfer station in sequence, after performing the centering step of the polishing head, the centering step of the transfer station is performed.

[0019] Furthermore, it further includes the step of determining the rotation trajectory of the polishing head, oscillating the polishing head, and setting the angular range of the readings that can be displayed by the sensors at both ends of the transfer station as the oscillation range of the polishing head.

[0020] Furthermore, before determining the rotation trajectory of the polishing head, it further includes the step of moving the transfer station along a linear trajectory below the polishing head.

[0021] Furthermore, the step of manually bringing the transfer station and the polishing head closer, and determining the rotation trajectory of the polishing head, setting the angular range of the readings that can be displayed by the sensors at both ends of the transfer station as the oscillation range of the polishing head, and defining the readings of the two sensors and the edge of the polishing head as L1 and L2 respectively, setting the step width of the polishing head and randomly selecting the rotation direction of the polishing head, the polishing head starts to rotate based on the set step width and direction. When the value of L1 + L2 increases, the polishing head is controlled to rotate in the reverse direction. When the value of L1 + L2 decreases, the movement direction is maintained without change. Until the situation where the value of L1 + L2 increases occurs again, the polishing head is controlled to rotate one step width in the reverse direction, and the position of the polishing head at this time is recorded as the position where the centering of the polishing head is completed. Set the step width of the transfer station and randomly select the moving direction of the transfer station; The transfer station starts to move based on the set step width and direction. When the absolute value of L1 - L2 increases, control the transfer station to move in the reverse direction. When the absolute value of L1 - L2 decreases, keep the moving direction unchanged. Until the situation where the absolute value of L1 - L2 increases occurs again, control the transfer station to move one step width in the reverse direction again, and record the position of the transfer station at this time as the position where the centering of the transfer station is completed; When the central axis lines of the polishing head and the transfer station overlap, end the correction. The method includes the above steps.

[0022] Furthermore, the sensors are installed at both radial ends of the transfer station, or the sensors are installed at both radial ends of the transfer station and arranged along the extending direction of the linear trajectory, or the sensors are installed at both radial ends of the transfer station and arranged along the direction perpendicular to the linear trajectory.

[0023] Furthermore, Manually bring the transfer station and the polishing head closer; Determine the rotation trajectory of the polishing head, and set the angular range where it rotates to both ends of the transfer station and the sensors can display readings as the swing range of the polishing head. Define the readings of the two sensors and the edge of the polishing head as L1 and L2 respectively; Set the step width of the transfer station and randomly select the moving direction of the transfer station; The conveying station starts to move based on the set step width and direction. When the value of L1 + L2 increases, the conveying station is controlled to move in the reverse direction. When the value of L1 + L2 decreases, the movement direction is maintained without change. Until the situation where the value of L1 + L2 increases occurs again, the conveying station is controlled to move one step width in the reverse direction again, and the position of the conveying station at this time is recorded as the position where the centering of the conveying station is completed, and Set the step width of the polishing head and randomly select the rotation direction of the polishing head, and The polishing head starts to rotate based on the set step width and direction. When the absolute value of L1 - L2 increases, the polishing head is controlled to rotate in the reverse direction. When the absolute value of L1 - L2 decreases, the movement direction is maintained without change. Until the situation where the absolute value of L1 - L2 increases occurs again, the polishing head is controlled to rotate one step width in the reverse direction again, and the position of the polishing head at this time is recorded as the position where the centering of the polishing head is completed, and When the central axes of the polishing head and the conveying station overlap, the correction is terminated, including.

[0024] Furthermore, Manually bring the conveying station and the polishing head close to each other, and Determine the rotation trajectory of the polishing head, and the angular range within which it rotates to both ends of the conveying station and the sensor can display readings is defined as the swing range of the polishing head. Define the readings of the two sensors and the edge of the polishing head as L1 and L2 respectively, and Set the step width of the conveying station, randomly select the moving direction of the conveying station, and the conveying station starts to move based on the set step width and direction, and Set the step width of the polishing head, randomly select the rotation direction of the polishing head, and the polishing head starts to rotate based on the set step width and direction, and Synchronously moving the transfer station and the polishing head until the central axes thereof overlap, and ending the correction; When the polishing head moves ahead of the transfer station, setting the position where the minimum value of L1 + L2 is obtained as the position where the centering of the polishing head is completed, and setting the position where the minimum value of the absolute value of L1 - L2 is obtained as the position where the centering of the transfer station is completed; When the transfer station moves ahead of the polishing head, setting the position where the minimum value of L1 + L2 is obtained as the position where the centering of the transfer station is completed, and setting the position where the minimum value of the absolute value of L1 - L2 is obtained as the position where the centering of the polishing is completed, including the steps.

[0025] In the present invention, a sensor assembly is attached to the transfer station. When the polishing head is within the detection range of the sensor on the transfer station, the controller executes a centering program to control the oscillation of the polishing head and the linear movement of the transfer station in the X direction, and until the centering of the polishing head and the transfer station is completed, the centering of the intersection point of the linear movement locus and the circular arc movement locus is completed, and the positions of the polishing head and the transfer station are automatically recorded and set as the wafer attachment / detachment positions. The sensor assembly is removed and attached to another transfer station, and the calibration of the attachment / detachment positions of each wafer is sequentially completed. When the calibration is completed, the sensor assembly is removed, and the centering of the CMP apparatus is ended.

Effect of the Invention

[0026] The present invention has the following beneficial effects: 1) It can achieve centering in a complex centering scene with high calibration efficiency, fewer sensors, less data, and a better data processing method; 2) By setting the positions of the sensors and selecting the calibration method, the calibration accuracy is improved and the requirements for the mounting positions of the sensors are reduced; 3) The detection error is small. The judgment unit adopts a judgment mechanism where the sum of the distances between the outer edge of the polishing head and the sensors is the smallest and the difference in distances is the smallest, which is more accurate than the equidistant judgment mechanism; 4) It is easy to use. The sensor assembly can be easily detached and attached, and the calibration algorithm can be integrated into software, enabling calibration with one button; 5) Both the transfer station and the polishing head are movable. The former has a linear motion trajectory and the latter has an arc motion trajectory. Even when the calibration difficulty is high, calibration can still be completed accurately and quickly.

Brief Description of the Drawings

[0027]

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Mode for Carrying Out the Invention

[0028] In order to enable those skilled in the art to better understand the solution means of the present invention, in the following, with reference to the drawings in the embodiments of the present invention, the technical solution means in the embodiments of the invention will be clearly and completely described. Of course, the described embodiments are only a part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments in the present invention, all other embodiments obtained by those skilled in the art without creative efforts shall fall within the protection scope of the present invention.

[0029] As shown in FIGS. 1 to 5, it is a device for calibrating the operating positions of a polishing head and a transfer station, including a transfer station 1 that can reciprocate along a linear trajectory 2, a polishing head 3 that can rotate in the circumferential direction, a sensor assembly 4 disposed at least partially on the transfer station 1, and a judgment unit.

[0030] In this embodiment, the transfer station 1 reciprocates along the linear trajectory 2 under the drive of the support base 11, and the polishing head 3 rotates in the circumferential direction under the drive of the polishing head swing arm 31.

[0031] The circumferential rotation trajectory 5 of the polishing head 3 has at least one intersection with the linear trajectory 2. The sensor assembly 4 includes at least two sensors 41 disposed at both radial ends of the transfer station 1, which are used to monitor the change in the distance between the outer edge of the polishing head 3 and the sensor 41. That is, the sensor 41 is a distance measuring sensor.

[0032] Of course, the number of sensors 41 may be one, which can move half a circle around the outer edge of the transfer station 1 and reach the positions at both radial ends of the transfer station 1 to perform distance measurement.

[0033] The two sensors 41 may be arranged not only along the radial direction of the transfer station 1, but also along the extending direction of the linear trajectory 2.

[0034] The judgment unit is used to achieve the purpose of outputting the minimum linear distance between the outer edge of the polishing head 3 monitored by the sensor assembly 4 and the sensor 41, and judging whether the central axis of the polishing head 3 coincides with that of the transfer station 1. The judgment unit outputs the result when the polishing head 3 and the transfer station 1 are in a moving state. The above moving state may be a state where only the polishing head 3 moves and the transfer station 1 does not move, a state where only the transfer station 1 moves and the polishing head 3 does not move, or a state where both the polishing head 3 and the transfer station 1 move.

[0035] The minimum linear distance between the outer edge of the polishing head 3 output by the judgment unit and the sensor 41 may be to output the minimum value of the sum of the intervals between the outer edge of the polishing head 3 monitored by the sensor assembly 4 and the sensor 41, or to output the minimum value of the difference between the intervals between the outer edge of the polishing head 3 monitored by the sensor assembly 4 and the sensor 41, or to output the minimum value of the sum of the intervals between the outer edge of the polishing head 3 and the sensor 41 and also output the minimum value of the difference between the intervals between the outer edge of the polishing head 3 and the sensor 41. The ultimate goal is to judge whether the central axes of the polishing head 3 and the transfer station 1 coincide and achieve centering.

[0036] If the minimum value is not zero, it can circulate infinitely. Therefore, manually set one set value first, compare the minimum value of the sum of the distances between the outer edge of the polishing head 3 and the sensor 41 with the set value. If the difference between the two is within the allowable range, stop the correction process and determine that the central axis lines of the polishing head and the transfer station already overlap. Similarly, manually set one set value first, compare the minimum value of the difference in the distances between the outer edge of the polishing head 3 and the sensor 41 with the set value. If the difference between the two is within the allowable range, stop the correction process and determine that the central axis lines of the polishing head and the transfer station already overlap. As shown in FIGS. 2 to 4, in order to facilitate the installation of the sensor 41, the sensor assembly 4 further includes a locking groove 42 fixedly provided on the transfer station 1 and a fixing seat 43 connectable to the sensor 41. This fixing seat 43 is removably connected to the locking groove 42. Specifically, the longitudinal cross-section of the locking groove 42 is U-shaped, that is, it forms a notch 421. The transverse cross-section of the fixing seat 43 is I-shaped, that is, the fixing seat 43 has a necking portion 431, and the necking portion 431 can be inserted into the notch 421 of the locking groove 42 from top to bottom. At this time, in the horizontal direction, when the fixing seat 43 cannot move relative to the locking groove 42, the assembly is completed.

[0037] A method for calibrating the operating positions of a polishing head and a transfer station, the method comprising: A step that can be manually operated, the step of moving the transfer station 1 along the linear trajectory 2 below the polishing head 3; Determine the rotation trajectory 5 of the polishing head 3, swing the polishing head 3, and use the angular range that the sensors 41 at both ends of the transfer station 1 can display as the swing range of the polishing head 3. Record the starting position and the ending position where the polishing head 3 swings, and use the area between the starting position and the ending position as the rotation trajectory 5 of the polishing head 3, that is, determine whether the initial position of the polishing head 3 falls within the rotation trajectory 5 or within the swing range. The step of rotating the polishing head 3 along the circumferential direction of the rotation trajectory 5; The step of reciprocating the transfer station 1 along the linear trajectory 2 for translational movement. The step of centering the polishing head 3, The step of centering the transfer station 1, and The centering step of the polishing head 3 and the centering step of the transfer station 1 may be performed in order, or may be performed simultaneously.

[0038] After performing the centering step of the polishing head 3, the centering step of the transfer station 1 may be performed. At this time, when the centering step of the polishing head 3 is performed first, the sensor assembly 4 monitors that the sum of the distances between the outer edge of the polishing head 3 and the sensor 41 becomes the minimum value. When the centering step of the transfer station 1 is performed next, the sensor assembly 4 monitors that the difference in the distances between the outer edge of the polishing head 3 and the sensor 41 becomes the minimum value.

[0039] After performing the centering step of the transfer station 1, the centering step of the polishing head 3 may be performed. At this time, when the centering step of the transfer station 1 is performed first, the sensor assembly 4 monitors that the sum of the distances between the outer edge of the polishing head 3 and the sensor 41 becomes the minimum value. When the centering step of the polishing head 3 is performed next, the sensor assembly 4 monitors that the difference in the distances between the outer edge of the polishing head 3 and the sensor 41 becomes the minimum value.

[0040] Example 1 As shown in FIGS. 5 and 6, at this time, the number of sensors 41 is two, and it is arranged not only along the radial direction of the transfer station 1 but also along the extending direction of the linear locus 2.

[0041] A method for calibrating the operating positions of a polishing head and a transfer station, the method comprising: The step of attaching the sensor assembly 4 to the transfer station 1, manually bringing the transfer station 1 and the polishing head 3 close to each other, and calibrating the indication of the sensor 41, Determine the rotation locus 5 of the grinding head 3. The angle range within which it rotates at both ends of the conveying station 1 and can be indicated by the sensor 41 is defined as the swing range of the grinding head 3, and record the starting position and the ending position. Define the indications of the two sensors 41 and the edge of the grinding head 3 as L1 and L2 respectively. In other words, manually roughly adjust the grinding head 3 and the conveying station 1 to bring the grinding head 3 and the conveying station 1 within the adjustment range. That is, the center of the grinding head 3 is located at P1, the center of the conveying station 1 is located at P2, one sensor 41a is within the detection range and the indication is L1, and the other sensor 41b is within the detection range and the indication is L2. And the step of Set an appropriate step width for the grinding head 3. The step width is related to the accuracy of the sensor and the set centering accuracy, and randomly select the rotation direction of one grinding head 3. The step of The grinding head 3 starts to rotate based on the set step width and direction. When the value of L1 + L2 increases, control the motor to move the grinding head 3 in the reverse direction. When the value of L1 + L2 decreases, keep the movement direction unchanged. Until the situation where the value of L1 + L2 increases occurs again, control the motor again to rotate the grinding head 3 in the reverse direction by one step width, and record the position of the grinding head 3 at this time as the position where the centering of the grinding head is completed. The step of Set an appropriate step width for the conveying station 1. The step width is related to the accuracy of the sensor and the set centering accuracy, and randomly select the moving direction of one conveying station. The step of The conveying station 1 starts to move based on the set step width and direction. When the absolute value of L1 - L2 increases, control the conveying station 1 to move in the reverse direction. When the absolute value of L1 - L2 decreases, keep the movement direction unchanged. Until the situation where the absolute value of L1 - L2 increases occurs again, control the conveying station 1 to move in the reverse direction by one step width again, and record the position of the conveying station 1 at this time as the position where the centering of the conveying station is completed. The step of At this time, both P1 and P2 move towards P3. Since P3 is the target position, P1 and P2 are at this position simultaneously. That is, when the central axis of the polishing head 3 coincides with that of the transfer station 1, it is considered that the polishing head 3 and the transfer station 1 are already centered, including the step of ending the correction.

[0042] Embodiment 2 As shown in FIGS. 7 and 8, at this time, the number of sensors 41 is two, which are arranged not only along the radial direction of the transfer station 1 but also along the direction perpendicular to the linear locus 2.

[0043] In this embodiment, the method for calibrating the operating positions of the polishing head and the transfer station is the same as that in Embodiment 1, and the description is omitted.

[0044] Embodiment 3 As shown in FIGS. 9 and 10, at this time, the number of sensors 41 is two, which are arranged only along the radial direction of the transfer station 1, not along the direction perpendicular to the linear locus 2, nor along the extending direction of the linear locus 2.

[0045] At this time, the operating positions of the polishing head and the transfer station can be calibrated in the direction in Embodiment 1, and can also be calibrated by the following method.

[0046] A method for calibrating the operating positions of the polishing head and the transfer station, attaching the sensor assembly 4 to the transfer station 1, manually bringing the transfer station 1 and the polishing head 3 close to each other, and calibrating the readings of the sensors 41; Determine the rotation locus 5 of the grinding head 3. The angular range within which it rotates at both ends of the conveying station 1 and can be indicated by the sensor 41 is defined as the swing range of the grinding head 3, and record the starting position and the ending position. Define the indications of the two sensors 41 and the edge of the grinding head 3 as L1 and L2 respectively. In other words, manually roughly adjust the grinding head 3 and the conveying station 1 to bring the grinding head 3 and the conveying station 1 within the adjustment range. That is, the center of the grinding head 3 is located at P1, the center of the conveying station 1 is located at P2, one sensor 41a is within the detection range and the indication is L1, and the other sensor 41b is within the detection range and the indication is L2. And the step of Set an appropriate step width for the conveying station 1. The step width is related to the accuracy of the sensor and the set centering accuracy, and randomly select the moving direction of one conveying station. And the step of The conveying station 1 starts to move based on the set step width and direction. When the value of L1 + L2 increases, control the conveying station 1 to move in the reverse direction. When the value of L1 + L2 decreases, keep the moving direction unchanged. Until the situation where the value of L1 + L2 increases occurs again, control the conveying station 1 to rotate one step width in the reverse direction again, and record the position of the conveying station 1 at this time as the position where the centering of the conveying station is completed. And the step of Set an appropriate step width for the grinding head 3. The step width is related to the accuracy of the sensor and the set centering accuracy, and randomly select the rotation direction of one grinding head 3. And the step of The grinding head 3 starts to rotate based on the set step width and direction. When the absolute value of L1 - L2 increases, control the motor to rotate the grinding head 3 in the reverse direction. When the absolute value of L1 - L2 decreases, keep the moving direction unchanged. Until the situation where the absolute value of L1 - L2 increases occurs again, control the motor to rotate the grinding head 3 one step width in the reverse direction again, and record the position of the grinding head 3 at this time as the position where the centering of the grinding head is completed. And the step of At this time, both P1 and P2 move towards P3. Since P3 is the target position, P1 and P2 are at this position simultaneously. That is, when the central axis of the polishing head 3 coincides with that of the transfer station 1, it is considered that the polishing head 3 and the transfer station 1 are already centered, and the step of ending the correction is included.

[0047] Example 4 In this embodiment, the transfer station 1 and the polishing head 3 perform synchronous movement for dynamic centering. This is applicable when two sensors 41 can be arranged at arbitrary positions on the premise of being along the radial direction of the transfer station 1, or the number of sensors 41 can be increased.

[0048] A method for calibrating the operating positions of a polishing head and a transfer station, attaching the sensor assembly 4 to the transfer station 1, manually bringing the transfer station 1 and the polishing head 3 close to each other, and calibrating the readings of the sensors 41; determining the rotation locus 5 of the polishing head 3, taking the angular range within which the sensors 41 can display readings as the swing range of the polishing head 3 when it rotates to both ends of the transfer station 1, and recording the starting position and the ending position. Defining the readings of the two sensors 41 and the edge of the polishing head 3 as L1 and L2 respectively. In other words, manually roughly adjusting the polishing head 3 and the transfer station 1 to bring the polishing head 3 and the transfer station 1 within the adjustment range. That is, the center of the polishing head 3 is located at P1, the center of the transfer station 1 is located at P2, one sensor 41a is within the detection range and the reading is L1, and the other sensor 41b is within the detection range and the reading is L2; setting the step width of the transfer station 1, randomly selecting the moving direction of the transfer station 1, and the transfer station 1 starts to move based on the set step width and direction; setting the step width of the polishing head 3, randomly selecting the rotation direction of the polishing head 3, and the polishing head 3 starts to rotate based on the set step width and direction; Synchronously move the transfer station 1 and the polishing head 3 until the central axes of the polishing head 3 and the transfer station 1 overlap. At this time, both P1 and P2 move to P3, and the correction is completed. In the above process, when the polishing head 3 starts to move earlier than the transfer station 1, the position where the minimum value of L1 + L2 is reached is defined as the position where the centering of the polishing head 3 is completed, and the position where the minimum value of the absolute value of L1 - L2 is reached is defined as the position where the centering of the transfer station 1 is completed. When the transfer station 1 starts to move earlier than the polishing head 3, the position where the minimum value of L1 + L2 is reached is defined as the position where the centering of the transfer station 1 is completed, and the position where the minimum value of the absolute value of L1 - L2 is reached is defined as the position where the centering of the polishing head 3 is completed.

[0049] Example 5 In the above example, one polishing head 3 is centered with one transfer station 1.

[0050] In this example, one polishing head 3 may be centered with two transfer stations 1, and the centering method is the same.

[0051] As shown in FIG. 11, the positions of one transfer station and one polishing head are calibrated to the target positions b and d. After the coaxiality of the polishing head and the transfer station is completed, the polishing head moves from any position a to a position close to the target position h, and another transfer station moves from any position i to a position of the target j. The sensor can detect the minimum straight-line distance from each attachment point to the arc surface of the polishing head. The movements of the transfer station and the polishing head are controlled by an algorithm, and the positions of both are calibrated to the target positions h and j. When the polishing head and the transfer station are coaxial, the centering of two transfer stations and one polishing head is completed.

[0052] Also, the polishing head can, if necessary, only complete the centering of one of the transfer stations.

[0053] Also, the number of transfer stations corresponding to a single polishing head may be further two or more. That is, the number of centering transfer stations required for a single polishing head may be two or more. The number of transfer stations can be set according to actual requirements, and centering of the polishing head and one or more of the transfer stations therein can be completed respectively.

[0054] Furthermore, one transfer station 1 may be centered with two polishing heads 3, and the centering directions are the same.

[0055] As shown in FIG. 12, after calibrating the positions of one transfer station and one polishing head to the target positions b and d and completing the coaxial alignment of the polishing head and the transfer station, another polishing head is moved from any position e to a position close to the target position f, and the transfer station is moved from any position c to a position of the target g. The sensor can detect the minimum linear distance from each mounting point to the arc surface of the polishing head. The movements of the transfer station and the polishing head are controlled by an algorithm, and their positions are calibrated to the target positions f and g. When the polishing head and the transfer station are coaxial, centering of one transfer station and two polishing devices is completed.

[0056] Also, the transfer station can complete centering of only one of the polishing heads therein as required.

[0057] Also, the number of polishing heads corresponding to a single transfer station may be further two or more. That is, the number of centering polishing heads required for a single transfer station may be two or more. The number of polishing heads can be set according to actual requirements, and centering of the transfer station and one or more of the polishing heads therein can be completed respectively.

[0058] Example 6 In this embodiment, the number of sensors 41 is one. When centering the polishing head 3, after the polishing head 3 rotates by one step width, the rotation stops, and the sensor 41 quickly moves from one end to the other end to measure L1 and L2. Of course, the polishing head 3 may also rotate continuously and the sensor 41 may move to the other end at a very high speed. When the polishing head 3 rotates by one step width, the sensor 41 repeats the above steps until centering is completed. The rest is the same as in Embodiment 1 and the description thereof is omitted.

[0059] The above specific embodiments are for interpreting and explaining the present invention and do not limit the present invention. Any modifications and changes made to the present invention within the spirit and scope of the claims of the present invention are all within the protection scope of the present invention.

Claims

1. The step of manually bringing the transfer station and the polishing head into proximity; Determining the rotation locus of the polishing head, and setting the angular range of the scale that can be displayed by the sensor when it rotates at both ends of the transfer station as the swing range of the polishing head, and defining the scales at the edges of the two sensors and the polishing head as L1 and L2 respectively; Setting the step width of the polishing head, randomly selecting the rotation direction of the polishing head, rotating the polishing head circumferentially along the rotation locus based on the step width of the polishing head and the rotation direction of the polishing head, and centering the polishing head; Including the step of reciprocating the transfer station along a linear locus and making a translational movement, and centering the transfer station; The centering step of the polishing head and the centering step of the transfer station may be performed in sequence or simultaneously; When the polishing head moves ahead of the transfer station, when the value of L1 + L2 increases, control is performed to rotate the polishing head in the reverse direction, and when the value of L1 + L2 decreases, maintain without changing the movement direction, and until the situation where the value of L1 + L2 increases occurs again, control is performed to rotate the polishing head in the reverse direction by one step width again, and record the position of the polishing head at this time as the position where the centering of the polishing head is completed; When the transfer station moves ahead of the polishing head, setting the step width of the transfer station, randomly selecting the moving direction of the transfer station, the transfer station starts to move based on the set step width and direction, when the value of L1 + L2 increases, control is performed to move the transfer station in the reverse direction, and when the value of L1 + L2 decreases, maintain without changing the movement direction, and until the situation where the value of L1 + L2 increases occurs again, control is performed to move the transfer station in the reverse direction by one step width again, and record the position of the transfer station at this time as the position where the centering of the transfer station is completed. A method for calibrating the operating positions of the polishing head and the transfer station, characterized by this.

2. First, perform the centering step of the polishing head. The sensor assembly monitors that the sum of the distances between the outer edge of the polishing head and the sensor reaches the minimum value. Next, when performing the centering step of the transfer station, the sensor assembly monitors that the difference in the distances between the outer edge of the polishing head and the sensor reaches the minimum value. A method for calibrating the operating positions of the polishing head and the transfer station according to claim 1, characterized by the above.

3. First, perform the centering step of the transfer station. The sensor assembly monitors that the sum of the distances between the outer edge of the polishing head and the sensor reaches the minimum value. Next, when performing the centering step of the polishing head, the sensor assembly monitors that the difference in the distances between the outer edge of the polishing head and the sensor reaches the minimum value. A method for calibrating the operating positions of the polishing head and the transfer station according to claim 1, characterized by the above.

4. Perform the centering of the polishing head and the centering of the transfer station in sequence. After performing the centering step of the polishing head, perform the centering step of the transfer station. A method for calibrating the operating positions of the polishing head and the transfer station according to claim 1, characterized by the above.

5. The method for calibrating the operating positions of the polishing head and the transfer station according to claim 1 further includes the step of determining the rotation locus of the polishing head, swinging the polishing head, and setting the angular range of the scale that can be displayed by the sensors at both ends of the transfer station as the swinging range of the polishing head.

6. The method for calibrating the operating positions of the polishing head and the transfer station according to claim 5 further includes the step of moving the transfer station along a straight trajectory below the polishing head before determining the rotation locus of the polishing head.

7. First, the step of centering the polishing head is executed, Next, as the step of centering the transfer station, The conveying station starts to move based on the set step width and direction. When the absolute value of L1 - L2 becomes large, it is controlled to move the conveying station in the reverse direction. When the absolute value of L1 - L2 becomes small, it is maintained so as not to change the movement direction. Until the situation where the absolute value of L1 - L2 becomes large occurs again, it is controlled again to move the conveying station one step width in the reverse direction, and the position of the conveying station at this time is recorded as the position where the centering of the conveying station is completed, and When the central axis lines of the polishing head and the conveying station overlap, the step of ending the correction, which is characterized by including the execution of the method for calibrating the operating positions of the polishing head and the conveying station according to claim 1.

8. The sensor is installed at both radial ends of the conveying station, or the sensor is installed at both radial ends of the conveying station and arranged along the extending direction of the linear trajectory, or the sensor is installed at both radial ends of the conveying station and arranged along the direction perpendicular to the linear trajectory, which is characterized by the method for calibrating the operating positions of the polishing head and the conveying station according to claim 7.

9. First, the step of centering the polishing head is executed, and Next, as the step of centering the conveying station, The polishing head starts to rotate based on the set step width and direction. When the absolute value of L1 - L2 becomes large, it is controlled to rotate the polishing head in the reverse direction. When the absolute value of L1 - L2 becomes small, it is maintained so as not to change the movement direction. Until the situation where the absolute value of L1 - L2 becomes large occurs again, it is controlled again to rotate the polishing head one step width in the reverse direction, and the position of the polishing head at this time is recorded as the position where the centering of the polishing head is completed, and When the central axis lines of the polishing head and the conveying station overlap, the step of ending the correction, which is characterized by including the execution of the method for calibrating the operating positions of the polishing head and the conveying station according to claim 1.

10. Set the step width of the polishing head, randomly select the rotation direction of the polishing head, and the step that the polishing head starts to rotate based on the set step width and direction, Synchronously moving the transfer station and the polishing head until the central axes thereof overlap, and ending the correction; When the polishing head moves ahead of the transfer station, setting the position where the minimum value of L1 + L2 is obtained as the position where the centering of the polishing head is completed, and setting the position where the minimum value of the absolute value of L1 - L2 is obtained as the position where the centering of the transfer station is completed; When the transfer station moves ahead of the polishing head, setting the position where the minimum value of L1 + L2 is obtained as the position where the centering of the transfer station is completed, and setting the position where the minimum value of the absolute value of L1 - L2 is obtained as the position where the centering of the polishing is completed, the method for calibrating the operating positions of the polishing head and the transfer station according to claim 1, further comprising the steps.

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