Drive method of display device

Abstract

To display a low-resolution image at higher resolution and furthermore to reduce an afterimage.SOLUTION: Resolution is made higher by super-resolution processing. In this case, the super-resolution processing is performed after frame interpolation processing is performed. Further in that case, the super-resolution processing can be performed using a plurality of processing systems. Therefore, super-resolution processing can be performed at high speed even when frame frequency is made higher. An afterimage can be reduced since frame rate doubling is performed by frame interpolation processing.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to a display device, a liquid crystal display device, a semiconductor device, a method for producing the same, or a method for manufacturing the same. In particular, the present invention relates to a method for driving a display device, a liquid crystal display device, a semiconductor device, etc. The present invention relates to a method for processing signals in a digital camera or a digital video camera. [Background technology]

[0002] In recent years, flat panel displays, such as liquid crystal displays, have become widely used. And the various performance features of flat panels are improving more and more. One of the specifications of a camera is its resolution (or number of pixels), and resolution has also improved significantly.

[0003] Therefore, super-resolution processing technology, which is a technology for converting low-resolution images into high-resolution images, is being developed. are being investigated (Patent Documents 1 to 3). [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Laid-Open No. 2008-160565 [Patent Document 2] Japanese Patent Application Laid-Open No. 2008-085411 [Patent Document 3] Japanese Patent Application Laid-Open No. 2008-252701 Summary of the Invention [Problem to be solved by the invention]

[0005] On the other hand, various technologies are being considered to improve the image quality of LCD displays. Therefore, in flat panel displays such as LCDs, the image quality needs to be improved. When performing processing to cause it to go up, various problems may occur. For example, the image quality may deteriorate, the correct image may not be displayed, the power consumption may increase, the noise may increase, extra components may be required, the cost may increase, the device may become larger, the frame of the display device may become larger, the processing may become slower, the display may become slower, the frame rate may become lower, and so on.

[0006] From the above, an aspect of the present invention is to provide a device with improved image quality, its driving method, or its manufacturing method. Or, an aspect of the present invention is to provide a device that displays a correct image, its driving method, or its manufacturing method. Or, an aspect of the present invention is to provide a device with low power consumption, its driving method, or its manufacturing method. Or, an aspect of the present invention is to provide a device with less noise, its driving method, or its manufacturing method. Or, an aspect of the present invention is to provide a device with fewer components, its driving method, or its manufacturing method. Or, an aspect of the present invention is to provide a device with low cost, its driving method, or its manufacturing method. Or, an aspect of the present invention is to provide a miniaturized device, its driving method, or its manufacturing method. Or, an aspect of the present invention is to provide a device with a small bezel, its driving method, or its manufacturing method. Or, an aspect of the present invention is to provide a device with fast processing, its driving method, or its manufacturing method. Also ​​​​​​​​​​​One aspect of the present invention is to provide a device with fast display, a driving method thereof, or a manufacturing method thereof. Another aspect of the present invention is to provide a device with a non-low frame frequency, a driving method thereof, or a manufacturing method thereof. Another aspect of the present invention is to provide a device with less afterimage, a driving method thereof, or a manufacturing method thereof. Another aspect of the present invention is to provide a device with high contrast, a driving method thereof, or a manufacturing method thereof. It should be noted that the description of these problems does not prevent the existence of other problems. It should be noted that one aspect of the present invention does not necessarily have to solve all of these problems. **Means for Solving the Problems**

[0007] After performing interpolation of frame data for high frame frequency display, use super-resolution processing technology to convert a low-resolution image into a high-resolution image. Then, perform image processing such as edge enhancement, data processing for local brightness control (LOCAL DIMMING) using a backlight, data processing for overdrive driving, and the like. Or, while performing interpolation of frame data for high frame frequency display, use super-resolution processing technology to convert a low-resolution image into a high-resolution image. Then, perform image processing such as edge enhancement, and perform interpolation of frame data for high frame frequency display. After that, perform data processing for local brightness control (LOCAL DIMMING) using a backlight, data processing for overdrive driving, and the like.

[0008] Or, while performing interpolation of frame data for high frame frequency display, use super-resolution processing technology to convert a low-resolution image into a high-resolution image. Then, perform image processing such as edge enhancement, and perform interpolation of frame data for high frame frequency display. After that, perform data processing for local brightness control (LOCAL DIMMING) using a backlight, data processing for overdrive driving, and the like.

[0009] ​Therefore, a first step of performing frame interpolation processing and a second step of performing super-resolution processing are provided, and after the first step, the second step is performed, and a driving method of a liquid crystal display device is provided.

[0010] Or, a first step of performing frame interpolation processing and a second step of performing super-resolution processing are provided, and the first step and the second step have a period during which they are performed simultaneously and a driving method of a liquid crystal display device is provided.

[0011] Or, a first step of performing frame interpolation processing, a second step of performing a first super-resolution processing and a third step of performing a second super-resolution processing are provided, and after the first step, the second step or the third step of the previous period is performed, and a driving method of a liquid crystal display device is provided.

[0012] Or, a first step of performing frame interpolation processing, a second step of performing super-resolution processing and a third step of performing local dimming processing are provided, and after the first step, the second step is performed, and after the second step, the third step is performed and a driving method of a liquid crystal display device is provided.

[0013] Or, a first step of performing frame interpolation processing, a second step of performing super-resolution processing and a third step of performing local dimming processing, and a fourth step of performing overdrive processing are provided, and after the first step, the second step is performed, after the second step, the third step is performed, and after the third step, the fourth step is performed, A driving method for a liquid crystal display device is provided, characterized in that the step of

[0014] Note that switches can be of various forms. Examples include electrical switches and mechanical switches. That is, any device that can control the flow of current is acceptable and not limited to a specific type. For example, as switches, transistors (e.g., bipolar transistors, MOS transistors, etc.), diodes (e.g., PN diodes, PIN diodes, Schottky diodes, MIM (Metal Insulator Metal) diodes, MIS (Metal Insulator Semicon ductor) diodes, transistor diode connections, etc.) can be used. Alternatively, a logic circuit combining these can be used as a switch.

[0015] Examples of mechanical switches include switches using MEMS (Micro-Electro-Mechanical System) technology, such as Digital Micro-Mirror Devices (DMD). Such a switch has an electrode that can be mechanically moved, and by moving the electrode, conduction and non-conduction are controlled for operation.

[0016] When a transistor is used as a switch, since the transistor operates merely as a switch, the polarity (conductivity type) of the transistor is not particularly limited. [[ID=3S]] However, when it is desired to suppress the off-current, it is desirable to use a transistor with a lower off-current polarity. Transistors with a low off-current include transistors having an LDD region and transistors having a multi-gate The potential of the source terminal operates at a value close to the potential of the low-potential-side power supply (Vss, GND, 0V, etc.). When this is the case, it is desirable to use an N-channel transistor. Conversely, when the potential of the source terminal operates at a value close to the potential of the high-potential-side power supply (Vdd, etc.), it is desirable to use a P-channel transistor. This is because, in an N-channel transistor, when the source terminal operates at a value close to the potential of the low-potential-side power supply, and in a P-channel transistor, when the source terminal operates at a value close to the potential of the high-potential-side power supply, the absolute value of the voltage between the gate and the source can be made large, so that more accurate operation can be performed as a switch. Furthermore, since the transistor is less likely to operate in source follower mode, the magnitude of the output voltage is less likely to decrease.

[0017] Note that both an N-channel transistor and a P-channel transistor can be used to form a CMOS-type switch as the switch. When a CMOS-type switch is used, current flows when either the P-channel transistor or the N-channel transistor conducts, making it easier to function as a switch. For example, appropriate voltage can be output whether the voltage of the input signal to the switch is high or low. Furthermore, since the voltage amplitude value of the signal for turning the switch on or off can be made small, the power consumption can also be reduced.

[0018] Note that when a transistor is used as a switch, the switch has an input terminal (either the source terminal or the drain terminal) and an output terminal (the other of the source terminal or the drain terminal). ​​​​​​​​​​​​​​It has a terminal (gate terminal) for controlling conduction. On the other hand, when using a diode as a switch, the switch may not have a terminal for controlling conduction. Therefore, using a diode as a switch rather than a transistor can reduce the wiring for controlling the terminal. When using a diode as a switch, the switch may not have a terminal for controlling conduction. Therefore, using a diode as a switch rather than a transistor can reduce the wiring for controlling the terminal. When using a diode as a switch rather than a transistor, the wiring for controlling the terminal can be reduced. When using a diode as a switch rather than a transistor, the wiring for controlling the terminal can be reduced.

[0019] In addition, when it is explicitly described that A and B are connected, it shall include the case where A and B are electrically connected, the case where A and B are functionally connected, and the case where A and B are directly connected. Here, A and B are assumed to be objects (for example, devices, elements, circuits, wirings, electrodes, terminals, conductive films, layers, etc.). Therefore, it is not limited to a predetermined connection relationship, for example, the connection relationship shown in the figure or the text, but shall also include those other than the connection relationship shown in the figure or the text. In addition, when it is explicitly described that A and B are connected, it shall include the case where A and B are electrically connected, the case where A and B are functionally connected, and the case where A and B are directly connected. Here, A and B are assumed to be objects (for example, devices, elements, circuits, wirings, electrodes, terminals, conductive films, layers, etc.). Therefore, it is not limited to a predetermined connection relationship, for example, the connection relationship shown in the figure or the text, but shall also include those other than the connection relationship shown in the figure or the text. In addition, when it is explicitly described that A and B are connected, it shall include the case where A and B are electrically connected, the case where A and B are functionally connected, and the case where A and B are directly connected. Here, A and B are assumed to be objects (for example, devices, elements, circuits, wirings, electrodes, terminals, conductive films, layers, etc.). Therefore, it is not limited to a predetermined connection relationship, for example, the connection relationship shown in the figure or the text, but shall also include those other than the connection relationship shown in the figure or the text. In addition, when it is explicitly described that A and B are connected, it shall include the case where A and B are electrically connected, the case where A and B are functionally connected, and the case where A and B are directly connected. Here, A and B are assumed to be objects (for example, devices, elements, circuits, wirings, electrodes, terminals, conductive films, layers, etc.). Therefore, it is not limited to a predetermined connection relationship, for example, the connection relationship shown in the figure or the text, but shall also include those other than the connection relationship shown in the figure or the text. In addition, when it is explicitly described that A and B are connected, it shall include the case where A and B are electrically connected, the case where A and B are functionally connected, and the case where A and B are directly connected. Here, A and B are assumed to be objects (for example, devices, elements, circuits, wirings, electrodes, terminals, conductive films, layers, etc.). Therefore, it is not limited to a predetermined connection relationship, for example, the connection relationship shown in the figure or the text, but shall also include those other than the connection relationship shown in the figure or the text. In addition, when it is explicitly described that A and B are connected, it shall include the case where A and B are electrically connected, the case where A and B are functionally connected, and the case where A and B are directly connected. Here, A and B are assumed to be objects (for example, devices, elements, circuits, wirings, electrodes, terminals, conductive films, layers, etc.). Therefore, it is not limited to a predetermined connection relationship, for example, the connection relationship shown in the figure or the text, but shall also include those other than the connection relationship shown in the figure or the text.

[0020] For example, in the case where A and B are electrically connected, one or more elements (for example, switches, transistors, capacitor elements, inductors, resistor elements, diodes, etc.) that enable the electrical connection between A and B may be connected between A and B. Alternatively, in the case where A and B are functionally connected, a circuit (for example, a logic circuit (inverter, NAND circuit, NOR circuit, etc.), a signal conversion circuit (DA conversion circuit, AD conversion circuit, gamma correction circuit, etc.), a potential level conversion circuit (power supply circuit (boost circuit, buck circuit, etc.), level shifter circuit for changing the potential level of a signal, etc.), a voltage source, a current source, a switching circuit, an amplification circuit (circuit that can increase the signal amplitude or current amount, operational amplifier, differential amplification circuit, source follower circuit, buffer circuit, etc.), a signal generation circuit, a memory circuit) that enables the functional connection between A and B may be provided. For example, in the case where A and B are electrically connected, one or more elements (for example, switches, transistors, capacitor elements, inductors, resistor elements, diodes, etc.) that enable the electrical connection between A and B may be connected between A and B. Alternatively, in the case where A and B are functionally connected, a circuit (for example, a logic circuit (inverter, NAND circuit, NOR circuit, etc.), a signal conversion circuit (DA conversion circuit, AD conversion circuit, gamma correction circuit, etc.), a potential level conversion circuit (power supply circuit (boost circuit, buck circuit, etc.), level shifter circuit for changing the potential level of a signal, etc.), a voltage source, a current source, a switching circuit, an amplification circuit (circuit that can increase the signal amplitude or current amount, operational amplifier, differential amplification circuit, source follower circuit, buffer circuit, etc.), a signal generation circuit, a memory circuit) that enables the functional connection between A and B may be provided. For example, in the case where A and B are electrically connected, one or more elements (for example, switches, transistors, capacitor elements, inductors, resistor elements, diodes, etc.) that enable the electrical connection between A and B may be connected between A and B. Alternatively, in the case where A and B are functionally connected, a circuit (for example, a logic circuit (inverter, NAND circuit, NOR circuit, etc.), a signal conversion circuit (DA conversion circuit, AD conversion circuit, gamma correction circuit, etc.), a potential level conversion circuit (power supply circuit (boost circuit, buck circuit, etc.), level shifter circuit for changing the potential level of a signal, etc.), a voltage source, a current source, a switching circuit, an amplification circuit (circuit that can increase the signal amplitude or current amount, operational amplifier, differential amplification circuit, source follower circuit, buffer circuit, etc.), a signal generation circuit, a memory circuit) that enables the functional connection between A and B may be provided. For example, in the case where A and B are electrically connected, one or more elements (for example, switches, transistors, capacitor elements, inductors, resistor elements, diodes, etc.) that enable the electrical connection between A and B may be connected between A and B. Alternatively, in the case where A and B are functionally connected, a circuit (for example, a logic circuit (inverter, NAND circuit, NOR circuit, etc.), a signal conversion circuit (DA conversion circuit, AD conversion circuit, gamma correction circuit, etc.), a potential level conversion circuit (power supply circuit (boost circuit, buck circuit, etc.), level shifter circuit for changing the potential level of a signal, etc.), a voltage source, a current source, a switching circuit, an amplification circuit (circuit that can increase the signal amplitude or current amount, operational amplifier, differential amplification circuit, source follower circuit, buffer circuit, etc.), a signal generation circuit, a memory circuit) that enables the functional connection between A and B may be provided. For example, in the case where A and B are electrically connected, one or more elements (for example, switches, transistors, capacitor elements, inductors, resistor elements, diodes, etc.) that enable the electrical connection between A and B may be connected between A and B. Alternatively, in the case where A and B are functionally connected, a circuit (for example, a logic circuit (inverter, NAND circuit, NOR circuit, etc.), a signal conversion circuit (DA conversion circuit, AD conversion circuit, gamma correction circuit, etc.), a potential level conversion circuit (power supply circuit (boost circuit, buck circuit, etc.), level shifter circuit for changing the potential level of a signal, etc.), a voltage source, a current source, a switching circuit, an amplification circuit (circuit that can increase the signal amplitude or current amount, operational amplifier, differential amplification circuit, source follower circuit, buffer circuit, etc.), a signal generation circuit, a memory circuit) that enables the functional connection between A and B may be provided. For example, in the case where A and B are electrically connected, one or more elements (for example, switches, transistors, capacitor elements, inductors, resistor elements, diodes, etc.) that enable the electrical connection between A and B may be connected between A and B. Alternatively, in the case where A and B are functionally connected, a circuit (for example, a logic circuit (inverter, NAND circuit, NOR circuit, etc.), a signal conversion circuit (DA conversion circuit, AD conversion circuit, gamma correction circuit, etc.), a potential level conversion circuit (power supply circuit (boost circuit, buck circuit, etc.), level shifter circuit for changing the potential level of a signal, etc.), a voltage source, a current source, a switching circuit, an amplification circuit (circuit that can increase the signal amplitude or current amount, operational amplifier, differential amplification circuit, source follower circuit, buffer circuit, etc.), a signal generation circuit, a memory circuit) that enables the functional connection between A and B may be provided. For example, in the case where A and B are electrically connected, one or more elements (for example, switches, transistors, capacitor elements, inductors, resistor elements, diodes, etc.) that enable the electrical connection between A and B may be connected between A and B. Alternatively, in the case where A and B are functionally connected, a circuit (for example, a logic circuit (inverter, NAND circuit, NOR circuit, etc.), a signal conversion circuit (DA conversion circuit, AD conversion circuit, gamma correction circuit, etc.), a potential level conversion circuit (power supply circuit (boost circuit, buck circuit, etc.), level shifter circuit for changing the potential level of a signal, etc.), a voltage source, a current source, a switching circuit, an amplification circuit (circuit that can increase the signal amplitude or current amount, operational amplifier, differential amplification circuit, source follower circuit, buffer circuit, etc.), a signal generation circuit, a memory circuit) that enables the functional connection between A and B may be provided. For example, in the case where A and B are electrically connected, one or more elements (for example, switches, transistors, capacitor elements, inductors, resistor elements, diodes, etc.) that enable the electrical connection between A and B may be connected between A and B. Alternatively, in the case where A and B are functionally connected, a circuit (for example, a logic circuit (inverter, NAND circuit, NOR circuit, etc.), a signal conversion circuit (DA conversion circuit, AD conversion circuit, gamma correction circuit, etc.), a potential level conversion circuit (power supply circuit (boost circuit, buck circuit, etc.), level shifter circuit for changing the potential level of a signal, etc.), a voltage source, a current source, a switching circuit, an amplification circuit (circuit that can increase the signal amplitude or current amount, operational amplifier, differential amplification circuit, source follower circuit, buffer circuit, etc.), a signal generation circuit, a memory circuit) that enables the functional connection between A and B may be provided. For example, in the case where A and B are electrically connected, one or more elements (for example, switches, transistors, capacitor elements, inductors, resistor elements, diodes, etc.) that enable the electrical connection between A and B may be connected between A and B. Alternatively, in the case where A and B are functionally connected, a circuit (for example, a logic circuit (inverter, NAND circuit, NOR circuit, etc.), a signal conversion circuit (DA conversion circuit, AD conversion circuit, gamma correction circuit, etc.), a potential level conversion circuit (power supply circuit (boost circuit, buck circuit, etc.), level shifter circuit for changing the potential level of a signal, etc.), a voltage source, a current source, a switching circuit, an amplification circuit (circuit that can increase the signal amplitude or current amount, operational amplifier, differential amplification circuit, source follower circuit, buffer circuit, etc.), a signal generation circuit, a memory circuit) that enables the functional connection between A and B may be provided. One or more control circuits, etc. may be connected between A and B. For example, when another circuit is interposed between A and B and the signal output from A is transmitted to B, A and B shall be regarded as functionally connected.

[0021] Note that when it is explicitly described that A and B are electrically connected, it includes the case where A and B are electrically connected (that is, connected with another element or another circuit interposed between A and B), the case where A and B are functionally connected (that is, functionally connected with another circuit interposed between A and B), and the case where A and B are directly connected (that is, connected without another element or another circuit interposed between A and B). That is, when it is explicitly described that they are electrically connected, it is regarded as the same as the case where it is only explicitly described that they are connected.

[0022] Note that a display element, a display device having the display element, a light-emitting element, and a light-emitting device having the light-emitting element can use various forms and have various elements. For example, as the display element, the display device, the light-emitting element, or the light-emitting device, there are EL (electroluminescence) elements (EL elements including organic and inorganic substances, organic EL elements, inorganic EL elements), LEDs (white LEDs, red LEDs, green LEDs, blue LEDs, etc.), transistors (transistors that emit light in response to current), electron-emitting elements, liquid crystal elements, electronic ink, electrophoretic elements, grating light valves (GLVs), plasma display panels (PDPs), digital micromirror devices (DMDs), piezoelectric ceramic displays, carbon nanotubes It can have a display medium in which contrast, luminance, reflectance, transmittance, etc. change due to electromagnetic effects such as electromagnetic waves. As a display device using an EL element, there is an EL display. As a display device using an electron-emitting element, there are a field emission display ( FED) and a SED type flat panel display (SED: Surface-conducti on Electron-emitter Disply), etc. As a display device using a liquid crystal element, there are liquid crystal displays (transmissive liquid crystal displays, transflective liquid crystal displays, reflective liquid crystal displays, direct-view liquid crystal displays, projection liquid crystal displays), and as a display device using an electroink or an electrophoretic element, there is an electronic paper.

[0023] Note that an EL element is an element having an anode, a cathode, and an EL layer sandwiched between the anode and the cathode. Note that as the EL layer, there are those using light emission (fluorescence) from singlet excitons, those using light emission (phosphorescence) from triplet excitons, those including those using light emission (fluorescence) from singlet excitons and those using light emission (phosphorescence) from triplet excitons, those formed by organic substances, those formed by inorganic substances, those including those formed by organic substances and those formed by inorganic substances, those having a polymer material, a low molecular weight material, those including a polymer material and a low molecular weight material, etc. However, it is not limited to this, and various EL elements can be used.

[0024] Note that an electron-emitting element is an element that concentrates a high electric field on the cathode to extract electrons. For example, as an electron-emitting element, there are spin type, carbon nanotube (CNT) type, metal-insulator ​- MIM (Metal-Insulator-Metal) type with metal layers, metal-insulator-semiconductor stacked MIS (Metal-Insulator-Semiconductor) type, MOS type, silicon type, thin film diode type, diamond type, metal-insulator -semiconductor-metal type, etc. of thin film type, HEED type, EL type, porous silicon type, surface conduction ( SCE) type, etc. can be included. However, it is not limited to this, and various types can be included as electron emission elements.

[0025] Note that a liquid crystal element is an element that controls light transmission or non-transmission by the optical modulation action of liquid crystal, and is composed of a pair of electrodes and liquid crystal. Note that the optical modulation action of liquid crystal is controlled by an electric field applied to the liquid crystal (including a horizontal electric field, a vertical electric field, or an oblique electric field). Note that as liquid crystal elements, nematic liquid crystal, cholesteric liquid crystal, smectic liquid crystal, discotic liquid crystal, thermotropic liquid crystal, lyotropic liquid crystal, low molecular liquid crystal , polymer liquid crystal, polymer dispersed liquid crystal (PDLC), ferroelectric liquid crystal, antiferroelectric liquid crystal, main chain type liquid crystal , side chain type polymer liquid crystal, plasma addressed liquid crystal (PALC), banana type liquid crystal, etc. can be mentioned. Also, as driving methods of liquid crystal, TN (Twisted Nematic) mode, STN (Super Twisted Nematic) mode, IPS (In-Plane-Switching) mode, FFS (Fringe Field Switching) mode, MVA (Multi-domain Vertical Alignment) mode, PVA (Patterned Vertical Alignment) mode, ASV (Advanced Super View) mode, ASM mode, STN (Super Twisted Nematic) mode, IPS (In-Plane-Switching) mode, FFS (Fringe Field Switching) mode, MVA (Multi-domain Vertical Alignment) mode, PVA (Patterned Vertical Alignment) mode, ASV (Advanced Super View) mode, ASM -Plane-Switching) mode, FFS (Fringe Field Switching) mode, MVA (Multi-domain Vertical Alignment) mode, PVA (Patterned Vertical Alignment) mode, ASV (Advanced Super View) mode, ASM itching) mode, MVA (Multi-domain Vertical Alignment) mode, PVA (Patterned Vertical Alignment) mode, ASV (Advanced Super View) mode, ASM ignment) mode, PVA (Patterned Vertical Alignment) mode, ASV (Advanced Super View) mode, ASM ment) mode, ASV (Advanced Super View) mode, ASM (Axially Symmetric aligned Micro-cell) mode mode, OCB (Optically Compensated Birefringence) mode mode, ECB (Electrically Controlled Birefringence) mode mode, FLC (Ferroelectric Liquid Crystal) mode mode, AFLC (AntiFerroelectric Liquid Crystal) mode mode, PDLC (Polymer Dispersed Liquid Crystal) mode mode, guest-host mode, blue phase mode, etc. can be used. However, it is not limited thereto, and various liquid crystal elements and their driving methods can be used.

[0026] Note that as electronic paper, those displayed by molecules (such as optical anisotropy and dye molecule orientation), those displayed by particles (such as electrophoresis, particle movement, particle rotation, phase change, etc.), those displayed by the movement of one end of a film, those displayed by the color development / phase change of molecules, those displayed by the light absorption of molecules, those displayed by the combination of electrons and holes to emit light spontaneously, etc. are referred to. For example, as the display method of electronic paper, microcapsule type electrophoresis, horizontal movement type electrophoresis, vertical movement type electrophoresis, spherical twist ball, magnetic twist ball, cylindrical twist ball method, charged toner, electron powder fluid, magnetophoresis type, magnetic heat sensitive type, electrowetting, light scattering (transparent / opaque change), cholesteric liquid crystal / photoconductive layer, cholesteric liquid crystal, bistable nematic liquid crystal, ferroelectric liquid crystal, dichroic dye / liquid crystal type, etc. can be used. type, etc. can be used. layer, cholesteric liquid crystal, bistable nematic liquid crystal, ferroelectric liquid crystal, dichroic dye / liquid crystal ​Dispersion type, movable film, color development and color fading by leuco dye, photochromic, electrochromic, electrodeposition, flexible organic EL, etc. can be used. However, it is not limited to this, and various types can be used as electronic paper and its display methods. Here, by using the microcapsule type electrophoresis, the aggregation and precipitation of electrophoresis particles, which are the disadvantages of the electrophoresis method, can be solved. The electro-fluid has merits such as high-speed responsiveness, high reflectivity, wide viewing angle, low power consumption, and memory property.

[0027] In addition, a plasma display panel has a structure in which a substrate with electrodes formed on its surface and a substrate with electrodes and minute grooves formed on its surface and a phosphor layer formed in the grooves are opposed to each other at a narrow interval, and a rare gas is enclosed. Alternatively, the plasma display panel can also have a structure in which a plasma tube is sandwiched between film-like electrodes from above and below. A plasma tube is a glass tube in which a discharge gas, phosphors for each of RGB, etc. are sealed. In addition, by applying a voltage between the electrodes to generate ultraviolet rays and making the phosphor emit light, display can be performed. As the plasma display panel, a DC type P DP or an AC type PDP may be used. Here, as the driving method of the plasma display panel, AWS (Address While Sustain) driving, ADS (Address Display Separated) driving in which the subframe is divided into a reset period, an address period, and a sustain period, CLEAR (HI-CONTRAST&LOW ENERG Y ADDRESS&REDUCTION OF FALSE CONTOUR SEQ ​UENCE) drive, ALIS (Alternate Lighting of Surf aces) method, TERES (Technology of Reciprocal S ustainer) drive, etc. can be used. However, it is not limited to this, and various driving methods can be used for the plasma display panel.

[0028] Note that for display devices that require a light source, such as liquid crystal displays (transmissive liquid crystal displays , transflective liquid crystal displays, reflective liquid crystal displays, direct-view liquid crystal displays, projection type liquid crystal displays), display devices using a grating light valve (GLV), display devices using a digital micromirror device (DMD), etc., as the light source, electroluminescence, cold cathode tubes, hot cathode tubes, LEDs, laser light sources, mercury lamps, etc. can be used. However, it is not limited to this, and various light sources can be used. Note that as the transistor, various forms of transistors can be used. Therefore, there is no limitation on the type of transistor used. For example, thin film transistors (TFTs) having an amorphous semiconductor film represented by amorphous silicon, polycrystalline silicon, microcrystalline (also referred to as microcrystal, nanocrystal, semi-amorphous) silicon, etc. can be used. When using a TFT, there are various advantages. For example, since it can be manufactured at a lower temperature than in the case of single crystal silicon, the manufacturing cost can be reduced, or the size of the manufacturing apparatus can be increased.

[0029] Since the size of the manufacturing apparatus can be increased, it can be manufactured on a large substrate. Therefore, since a large number of display devices can be manufactured at the same time, it can be manufactured at a low cost. Furthermore, since the manufacturing temperature is low, it is possible to reduce the manufacturing cost or avoid the need for a large manufacturing apparatus. Since it can be manufactured on a large substrate, a large number of display devices can be manufactured at the same time, enabling low-cost production. Additionally, due to the low manufacturing temperature, it is possible to manufacture a large number of display devices at the same time, resulting in low-cost production. Therefore, a substrate with poor heat resistance can be used. Thus, a transistor can be manufactured on a substrate having translucency. And, the transmission of light in a display element can be controlled using the transistor on the substrate having translucency. Alternatively, since the film thickness of the transistor is thin, a part of the film constituting the transistor can transmit light. Therefore, the aperture ratio can be improved.

[0030] Note that when manufacturing polycrystalline silicon, by using a catalyst (such as nickel), the crystallinity can be further improved, and it becomes possible to manufacture a transistor with good electrical characteristics. As a result, a gate driver circuit (scanning line driving circuit), a source driver circuit (signal line driving circuit ), a signal processing circuit (such as a signal generation circuit, a gamma correction circuit, a DA conversion circuit, etc.) can be integrally formed on the substrate.

[0031] Note that when manufacturing microcrystalline silicon, by using a catalyst (such as nickel), the crystallinity can be further improved, and it becomes possible to manufacture a transistor with good electrical characteristics. At this time, it is also possible to improve the crystallinity only by applying heat treatment without performing laser irradiation. As a result, a part of the source driver circuit (such as an analog switch) and a gate driver circuit (scanning line driving circuit) can be integrally formed on the substrate. Furthermore, when laser irradiation is not performed for crystallization, unevenness in the crystallinity of silicon can be suppressed. Therefore, an image with improved image quality can be displayed.

[0032] However, it is possible to manufacture polycrystalline silicon or microcrystalline silicon without using a catalyst (such as nickel).

[0033] Note that improving the crystallinity of silicon to polycrystalline or microcrystalline, etc. is preferably carried out for the entire panel, but is not limited thereto. In only a part of the panel region, the crystallinity of silicon may be improved. Selectively improving the crystallinity can be achieved by selectively irradiating with laser light. For example, laser light may be irradiated only to the peripheral circuit region which is a region other than the pixel. Or, laser light may be irradiated only to regions such as the gate driver circuit and the source driver circuit. Alternatively, laser light may be irradiated only to a part (for example, an analog switch) of the source driver circuit region. As a result, the crystallization of silicon can be improved only in the region where it is necessary to operate the circuit at high speed. Since the pixel region has little need to operate at high speed, the pixel circuit can operate without problems even if the crystallinity is not improved. Since the number of regions where the crystallinity is improved can be reduced, the manufacturing process can be shortened, the throughput can be improved, and the manufacturing cost can be reduced. Since the required number of manufacturing apparatuses can be reduced, the manufacturing cost can be reduced. Note that improving the crystallinity of silicon to polycrystalline or microcrystalline, etc. is preferably carried out for the entire panel, but is not limited thereto. In only a part of the panel region, the crystallinity of silicon may be improved. Selectively improving the crystallinity can be achieved by selectively irradiating with laser light. For example, laser light may be irradiated only to the peripheral circuit region which is a region other than the pixel. Or, laser light may be irradiated only to regions such as the gate driver circuit and the source driver circuit. Alternatively, laser light may be irradiated only to a part (for example, an analog switch) of the source driver circuit region. As a result, the crystallization of silicon can be improved only in the region where it is necessary to operate the circuit at high speed. Since the pixel region has little need to operate at high speed, the pixel circuit can operate without problems even if the crystallinity is not improved. Since the number of regions where the crystallinity is improved can be reduced, the manufacturing process can be shortened, the throughput can be improved, and the manufacturing cost can be reduced. Since the required number of manufacturing apparatuses can be reduced, the manufacturing cost can be reduced. Note that improving the crystallinity of silicon to polycrystalline or microcrystalline, etc. is preferably carried out for the entire panel, but is not limited thereto. In only a part of the panel region, the crystallinity of silicon may be improved. Selectively improving the crystallinity can be achieved by selectively irradiating with laser light. For example, laser light may be irradiated only to the peripheral circuit region which is a region other than the pixel. Or, laser light may be irradiated only to regions such as the gate driver circuit and the source driver circuit. Alternatively, laser light may be irradiated only to a part (for example, an analog switch) of the source driver circuit region. As a result, the crystallization of silicon can be improved only in the region where it is necessary to operate the circuit at high speed. Since the pixel region has little need to operate at high speed, the pixel circuit can operate without problems even if the crystallinity is not improved. Since the number of regions where the crystallinity is improved can be reduced, the manufacturing process can be shortened, the throughput can be improved, and the manufacturing cost can be reduced. Since the required number of manufacturing apparatuses can be reduced, the manufacturing cost can be reduced. Note that improving the crystallinity of silicon to polycrystalline or microcrystalline, etc. is preferably carried out for the entire panel, but is not limited thereto. In only a part of the panel region, the crystallinity of silicon may be improved. Selectively improving the crystallinity can be achieved by selectively irradiating with laser light. For example, laser light may be irradiated only to the peripheral circuit region which is a region other than the pixel. Or, laser light may be irradiated only to regions such as the gate driver circuit and the source driver circuit. Alternatively, laser light may be irradiated only to a part (for example, an analog switch) of the source driver circuit region. As a result, the crystallization of silicon can be improved only in the region where it is necessary to operate the circuit at high speed. Since the pixel region has little need to operate at high speed, the pixel circuit can operate without problems even if the crystallinity is not improved. Since the number of regions where the crystallinity is improved can be reduced, the manufacturing process can be shortened, the throughput can be improved, and the manufacturing cost can be reduced. Since the required number of manufacturing apparatuses can be reduced, the manufacturing cost can be reduced. Note that improving the crystallinity of silicon to polycrystalline or microcrystalline, etc. is preferably carried out for the entire panel, but is not limited thereto. In only a part of the panel region, the crystallinity of silicon may be improved. Selectively improving the crystallinity can be achieved by selectively irradiating with laser light. For example, laser light may be irradiated only to the peripheral circuit region which is a region other than the pixel. Or, laser light may be irradiated only to regions such as the gate driver circuit and the source driver circuit. Alternatively, laser light may be irradiated only to a part (for example, an analog switch) of the source driver circuit region. As a result, the crystallization of silicon can be improved only in the region where it is necessary to operate the circuit at high speed. Since the pixel region has little need to operate at high speed, the pixel circuit can operate without problems even if the crystallinity is not improved. Since the number of regions where the crystallinity is improved can be reduced, the manufacturing process can be shortened, the throughput can be improved, and the manufacturing cost can be reduced. Since the required number of manufacturing apparatuses can be reduced, the manufacturing cost can be reduced. Note that improving the crystallinity of silicon to polycrystalline or microcrystalline, etc. is preferably carried out for the entire panel, but is not limited thereto. In only a part of the panel region, the crystallinity of silicon may be improved. Selectively improving the crystallinity can be achieved by selectively irradiating with laser light. For example, laser light may be irradiated only to the peripheral circuit region which is a region other than the pixel. Or, laser light may be irradiated only to regions such as the gate driver circuit and the source driver circuit. Alternatively, laser light may be irradiated only to a part (for example, an analog switch) of the source driver circuit region. As a result, the crystallization of silicon can be improved only in the region where it is necessary to operate the circuit at high speed. Since the pixel region has little need to operate at high speed, the pixel circuit can operate without problems even if the crystallinity is not improved. Since the number of regions where the crystallinity is improved can be reduced, the manufacturing process can be shortened, the throughput can be improved, and the manufacturing cost can be reduced. Since the required number of manufacturing apparatuses can be reduced, the manufacturing cost can be reduced. Note that improving the crystallinity of silicon to polycrystalline or microcrystalline, etc. is preferably carried out for the entire panel, but is not limited thereto. In only a part of the panel region, the crystallinity of silicon may be improved. Selectively improving the crystallinity can be achieved by selectively irradiating with laser light. For example, laser light may be irradiated only to the peripheral circuit region which is a region other than the pixel. Or, laser light may be irradiated only to regions such as the gate driver circuit and the source driver circuit. Alternatively, laser light may be irradiated only to a part (for example, an analog switch) of the source driver circuit region. As a result, the crystallization of silicon can be improved only in the region where it is necessary to operate the circuit at high speed. Since the pixel region has little need to operate at high speed, the pixel circuit can operate without problems even if the crystallinity is not improved. Since the number of regions where the crystallinity is improved can be reduced, the manufacturing process can be shortened, the throughput can be improved, and the manufacturing cost can be reduced. Since the required number of manufacturing apparatuses can be reduced, the manufacturing cost can be reduced. Note that improving the crystallinity of silicon to polycrystalline or microcrystalline, etc. is preferably carried out for the entire panel, but is not limited thereto. In only a part of the panel region, the crystallinity of silicon may be improved. Selectively improving the crystallinity can be achieved by selectively irradiating with laser light. For example, laser light may be irradiated only to the peripheral circuit region which is a region other than the pixel. Or, laser light may be irradiated only to regions such as the gate driver circuit and the source driver circuit. Alternatively, laser light may be irradiated only to a part (for example, an analog switch) of the source driver circuit region. As a result, the crystallization of silicon can be improved only in the region where it is necessary to operate the circuit at high speed. Since the pixel region has little need to operate at high speed, the pixel circuit can operate without problems even if the crystallinity is not improved. Since the number of regions where the crystallinity is improved can be reduced, the manufacturing process can be shortened, the throughput can be improved, and the manufacturing cost can be reduced. Since the required number of manufacturing apparatuses can be reduced, the manufacturing cost can be reduced. Note that improving the crystallinity of silicon to polycrystalline or microcrystalline, etc. is preferably carried out for the entire panel, but is not limited thereto. In only a part of the panel region, the crystallinity of silicon may be improved. Selectively improving the crystallinity can be achieved by selectively irradiating with laser light. For example, laser light may be irradiated only to the peripheral circuit region which is a region other than the pixel. Or, laser light may be irradiated only to regions such as the gate driver circuit and the source driver circuit. Alternatively, laser light may be irradiated only to a part (for example, an analog switch) of the source driver circuit region. As a result, the crystallization of silicon can be improved only in the region where it is necessary to operate the circuit at high speed. Since the pixel region has little need to operate at high speed, the pixel circuit can operate without problems even if the crystallinity is not improved. Since the number of regions where the crystallinity is improved can be reduced, the manufacturing process can be shortened, the throughput can be improved, and the manufacturing cost can be reduced. Since the required number of manufacturing apparatuses can be reduced, the manufacturing cost can be reduced. Note that improving the crystallinity of silicon to polycrystalline or microcrystalline, etc. is preferably carried out for the entire panel, but is not limited thereto. In only a part of the panel region, the crystallinity of silicon may be improved. Selectively improving the crystallinity can be achieved by selectively irradiating with laser light. For example, laser light may be irradiated only to the peripheral circuit region which is a region other than the pixel. Or, laser light may be irradiated only to regions such as the gate driver circuit and the source driver circuit. Alternatively, laser light may be irradiated only to a part (for example, an analog switch) of the source driver circuit region. As a result, the crystallization of silicon can be improved only in the region where it is necessary to operate the circuit at high speed. Since the pixel region has little need to operate at high speed, the pixel circuit can operate without problems even if the crystallinity is not improved. Since the number of regions where the crystallinity is improved can be reduced, the manufacturing process can be shortened, the throughput can be improved, and the manufacturing cost can be reduced. Since the required number of manufacturing apparatuses can be reduced, the manufacturing cost can be reduced. Note that improving the crystallinity of silicon to polycrystalline or microcrystalline, etc. is preferably carried out for the entire panel, but is not limited thereto. In only a part of the panel region, the crystallinity of silicon may be improved. Selectively improving the crystallinity can be achieved by selectively irradiating with laser light. For example, laser light may be irradiated only to the peripheral circuit region which is a region other than the pixel. Or, laser light may be irradiated only to regions such as the gate driver circuit and the source driver circuit. Alternatively, laser light may be irradiated only to a part (for example, an analog switch) of the source driver circuit region. As a result, the crystallization of silicon can be improved only in the region where it is necessary to operate the circuit at high speed. Since the pixel region has little need to operate at high speed, the pixel circuit can operate without problems even if the crystallinity is not improved. Since the number of regions where the crystallinity is improved can be reduced, the manufacturing process can be shortened, the throughput can be improved, and the manufacturing cost can be reduced. Since the required number of manufacturing apparatuses can be reduced, the manufacturing cost can be reduced. Note that improving the crystallinity of silicon to polycrystalline or microcrystalline, etc. is preferably carried out for the entire panel, but is not limited thereto. In only a part of the panel region, the crystallinity of silicon may be improved. Selectively improving the crystallinity can be achieved by selectively irradiating with laser light. For example, laser light may be irradiated only to the peripheral circuit region which is a region other than the pixel. Or, laser light may be irradiated only to regions such as the gate driver circuit and the source driver circuit. Alternatively, laser light may be irradiated only to a part (for example, an analog switch) of the source driver circuit region. As a result, the crystallization of silicon can be improved only in the region where it is necessary to operate the circuit at high speed. Since the pixel region has little need to operate at high speed, the pixel circuit can operate without problems even if the crystallinity is not improved. Since the number of regions where the crystallinity is improved can be reduced, the manufacturing process can be shortened, the throughput can be improved, and the manufacturing cost can be reduced. Since the required number of manufacturing apparatuses can be reduced, the manufacturing cost can be reduced. Note that improving the crystallinity of silicon to polycrystalline or microcrystalline, etc. is preferably carried out for the entire panel, but is not limited thereto. In only a part of the panel region, the crystallinity of silicon may be improved. Selectively improving the crystallinity can be achieved by selectively irradiating with laser light. For example, laser light may be irradiated only to the peripheral circuit region which is a region other than the pixel. Or, laser light may be irradiated only to regions such as the gate driver circuit and the source driver circuit. Alternatively, laser light may be irradiated only to a part (for example, an analog switch) of the source driver circuit region. As a result, the crystallization of silicon can be improved only in the region where it is necessary to operate the circuit at high speed. Since the pixel region has little need to operate at high speed, the pixel circuit can operate without problems even if the crystallinity is not improved. Since the number of regions where the crystallinity is improved can be reduced, the manufacturing process can be shortened, the throughput can be improved, and the manufacturing cost can be reduced. Since the required number of manufacturing apparatuses can be reduced, the manufacturing cost can be reduced.

[0034] Or, a transistor can be formed using a semiconductor substrate, an SOI substrate, etc. By these, transistors with little variation in characteristics, size, shape, etc., high current supply ability, and small size can be manufactured. Using these transistors, power consumption reduction of the circuit or high integration of the circuit can be achieved. Or, a transistor can be formed using a semiconductor substrate, an SOI substrate, etc. By these, transistors with little variation in characteristics, size, shape, etc., high current supply ability, and small size can be manufactured. Using these transistors, power consumption reduction of the circuit or high integration of the circuit can be achieved.

[0035] Or, ZnO, a-InGaZnO, SiGe, GaAs, indium zinc oxide ( (IZO), indium tin oxide (ITO), SnO, TiO, AlZnSnO (AZTO ) and other compound semiconductors or oxide semiconductors, and further, these chemical Compound semiconductors or oxide semiconductors can be used to form thin film transistors and the like . By using these, the manufacturing temperature can be lowered, for example, it becomes possible to manufacture transistors at room temperature . As a result, transistors can be directly formed on substrates with low heat resistance, such as plastic substrates and film substrates . In addition, these compound semiconductors or oxide semiconductors Can be used not only in the channel portion of the transistor but also in other applications . For example, these compound semiconductors or oxide semiconductors can be used as resistive elements, pixel electrodes, and electrodes with transparency . Furthermore, since they can be deposited or formed simultaneously with the transistor, the cost can be reduced .

[0036] Or, transistors formed using inkjet or printing methods can be used . By using these, it becomes possible to manufacture at room temperature, at low vacuum, or on a large substrate . Since it is possible to manufacture without using a mask (reticle), the layout of the transistor Can be easily changed. Furthermore, since there is no need to use a resist , the material cost is reduced and the number of processes can be reduced. Furthermore, since the film is applied only to the necessary parts , the material is not wasted and the cost can be reduced compared to the manufacturing method of etching after depositing the film over the entire surface .

[0037] Or, transistors having organic semiconductors or carbon nanotubes can be used . By using these, transistors can be formed on substrates that can be bent 。A semiconductor device using such a substrate can be made resistant to shock.

[0038] Furthermore, transistors with various structures can be used. For example, MOS transistors, junction transistors, bipolar transistors, etc. can be used as transistors. By using MOS transistors, the size of the transistors can be reduced. Therefore, a large number of transistors can be mounted. By using bipolar transistors, a large current can be passed. Therefore, the circuit can be operated at high speed. By using MOS transistors, the size of the transistors can be reduced. Therefore, a large number of transistors can be mounted. By using bipolar transistors, a large current can be passed. Therefore, the circuit can be operated at high speed.

[0039] In addition, MOS transistors, bipolar transistors, etc. can be mixed and formed on one substrate. This can achieve low power consumption, miniaturization, high-speed operation, etc. In addition, MOS transistors, bipolar transistors, etc. can be mixed and formed on one substrate. This can achieve low power consumption, miniaturization, high-speed operation, etc.

[0040] In addition, various other transistors can be used.

[0041] Note that transistors can be formed using various substrates. The type of substrate is not limited to a specific one. As such a substrate, for example, single crystal substrates (e.g., silicon substrates), SOI substrates, glass substrates, quartz substrates, plastic substrates, metal substrates, stainless steel substrates, substrates having stainless steel foils, tungsten substrates, substrates having tungsten foils, flexible substrates, etc. can be used. Examples of glass substrates include barium borosilicate glass, aluminoborosilicate glass, etc. An example of a flexible substrate is polyethylene terephthalate (PET), polyethylene naphthalate, etc. Note that transistors can be formed using various substrates. The type of substrate is not limited to a specific one. As such a substrate, for example, single crystal substrates (e.g., silicon substrates), SOI substrates, glass substrates, quartz substrates, plastic substrates, metal substrates, stainless steel substrates, substrates having stainless steel foils, tungsten substrates, substrates having tungsten foils, flexible substrates, etc. can be used. Examples of glass substrates include barium borosilicate glass, aluminoborosilicate glass, etc. An example of a flexible substrate is polyethylene terephthalate (PET), polyethylene naphthalate, etc. Examples of glass substrates include barium borosilicate glass, aluminoborosilicate glass, etc. An example of a flexible substrate is polyethylene terephthalate (PET), polyethylene naphthalate, etc. An example of a flexible substrate is polyethylene terephthalate (PET), polyethylene naphthalate, etc. Plastics typified by PEN (polyethylene naphthalate) and PES (polyethersulfone), or flexible synthetic resins such as acrylic, etc. There are also laminated films (such as polypropylene, polyester, vinyl, polyvinyl fluoride, vinyl chloride, etc.), papers containing fibrous materials, substrate films (such as polyester, polyamide, polyimide, inorganic vapor deposition films, papers, etc.). Alternatively, a transistor may be formed on a certain substrate, and then the transistor may be transposed onto another substrate and arranged on the other substrate. As the substrate on which the transistor is transposed, a single crystal substrate, an SOI substrate, a glass substrate, a quartz substrate, a plastic substrate, a paper substrate, a cellophane substrate, a stone substrate, a wood substrate, a cloth substrate (including natural fibers (silk, cotton, linen), synthetic fibers (nylon, polyurethane, polyester) or recycled fibers (acetate, cupra, rayon, recycled polyester), etc.), a leather substrate, a rubber substrate, a stainless steel substrate, a substrate having a stainless steel foil, etc. can be used. Alternatively, the skin (epidermis, dermis) or subcutaneous tissue of an animal such as a human may be used as the substrate. Alternatively, a transistor may be formed on a certain substrate and the substrate may be polished to make it thinner. As the substrate to be polished, a single crystal substrate, an SOI substrate, a glass substrate, a quartz substrate, a plastic substrate, a stainless steel substrate, a substrate having a stainless steel foil, etc. can be used. By using these substrates, it is possible to form transistors with good characteristics, form transistors with low power consumption, manufacture devices that are not easily broken, impart heat resistance, reduce weight, or make them thinner. Note that the configuration of the transistor can take various forms and is not limited to a specific configuration.

[0042] ​ Yes. For example, a multi-gate structure with two or more gate electrodes can be applied. In the case of a multi- gate structure, since the channel regions are connected in series, a configuration in which a plurality of transistors are connected in series is formed. With the multi-gate structure, it is possible to reduce the off-current and improve the breakdown voltage (reliability) of the transistor. Alternatively, with the multi-gate structure, when operating in the saturation region, even if the drain-source voltage changes, the drain-source current hardly changes, and the slope of the voltage-current characteristics can be made flat. Utilizing the characteristic that the slope of the voltage-current characteristics is flat, an ideal current source circuit or an active load having a very high resistance value can be realized. As a result, a differential circuit or a current mirror circuit with good characteristics can be realized. Another example is that a structure in which gate electrodes are arranged above and below the channel can be applied. By adopting a structure in which gate electrodes are arranged above and below the channel, the channel region increases, so that the current value can be increased. Or, by adopting a structure in which gate electrodes are arranged above and below the channel, depletion layers are more likely to be formed, so that the S value can be improved. Note that by adopting a configuration in which gate electrodes are arranged above and below the channel, a configuration is formed in which a plurality of transistors are connected in parallel.

[0043] A structure in which a gate electrode is arranged above the channel region, a structure in which a gate electrode is arranged below the channel region, a normal staggered structure, an inverse staggered structure, a structure in which the channel region is divided into a plurality of regions, a structure in which the channel regions are connected in parallel, or a configuration in which the channel regions are connected in series

[0044] is also applicable. Furthermore, a structure in which a source electrode or a drain electrode overlaps with the channel region (or a part thereof) is also applicable. By forming a structure in which a source electrode or a drain electrode overlaps with the channel region (or a part thereof), it is possible to prevent the operation from becoming unstable due to the accumulation of charges in a part of the channel region. Alternatively, a structure provided with an LDD region can be applied. By providing an LDD region, it is possible to reduce the off-current or improve the breakdown voltage of the transistor (improve the reliability). Alternatively, by providing an LDD region, even when the drain-source voltage changes during operation in the saturation region, the drain-source current does not change much, and the slope of the voltage-current diagram can be flattened. is also applicable. By forming a structure in which a source electrode or a drain electrode overlaps with the channel region (or a part thereof), it is possible to prevent the operation from becoming unstable due to the accumulation of charges in a part of the channel region. By forming a structure in which a source electrode or a drain electrode overlaps with the channel region (or a part thereof), it is possible to prevent the operation from becoming unstable due to the accumulation of charges in a part of the channel region. Alternatively, a structure provided with an LDD region can be applied. By providing an LDD region, it is possible to reduce the off-current or improve the breakdown voltage of the transistor (improve the reliability). By providing an LDD region, it is possible to reduce the off-current or improve the breakdown voltage of the transistor (improve the reliability). Alternatively, by providing an LDD region, even when the drain-source voltage changes during operation in the saturation region, the drain-source current does not change much, and the slope of the voltage-current diagram can be flattened. Alternatively, by providing an LDD region, even when the drain-source voltage changes during operation in the saturation region, the drain-source current does not change much, and the slope of the voltage-current diagram can be flattened. Alternatively, by providing an LDD region, even when the drain-source voltage changes during operation in the saturation region, the drain-source current does not change much, and the slope of the voltage-current diagram can be flattened.

[0045] Note that various types of transistors can be used and can be formed using various substrates. Therefore, it is also possible to form all of the circuits necessary to realize a predetermined function on the same substrate. For example, it is also possible to form all of the circuits necessary to realize a predetermined function using various substrates such as a glass substrate, a plastic substrate, a single crystal substrate, or an SOI substrate. By forming all of the circuits necessary to realize a predetermined function on the same substrate, it is possible to reduce the cost by reducing the number of components or improve the reliability by reducing the number of connection points with circuit components. Alternatively, it is also possible that a part of the circuits necessary to realize a predetermined function is formed on one substrate and another part of the circuits necessary to realize a predetermined function is formed on another substrate. That is, it is also possible that all of the circuits necessary to realize a predetermined function are formed using the same substrate. Note that various types of transistors can be used and can be formed using various substrates. Therefore, it is also possible to form all of the circuits necessary to realize a predetermined function on the same substrate. For example, it is also possible to form all of the circuits necessary to realize a predetermined function using various substrates such as a glass substrate, a plastic substrate, a single crystal substrate, or an SOI substrate. For example, it is also possible to form all of the circuits necessary to realize a predetermined function using various substrates such as a glass substrate, a plastic substrate, a single crystal substrate, or an SOI substrate. By forming all of the circuits necessary to realize a predetermined function on the same substrate, it is possible to reduce the cost by reducing the number of components or improve the reliability by reducing the number of connection points with circuit components. By forming all of the circuits necessary to realize a predetermined function on the same substrate, it is possible to reduce the cost by reducing the number of components or improve the reliability by reducing the number of connection points with circuit components. Alternatively, it is also possible that a part of the circuits necessary to realize a predetermined function is formed on one substrate and another part of the circuits necessary to realize a predetermined function is formed on another substrate. Alternatively, it is also possible that a part of the circuits necessary to realize a predetermined function is formed on one substrate and another part of the circuits necessary to realize a predetermined function is formed on another substrate. That is, it is also possible that all of the circuits necessary to realize a predetermined function are formed using the same substrate. That is, it is also possible that all of the circuits necessary to realize a predetermined function are formed using the same substrate. It is not necessary. For example, a part of the circuit necessary to realize a predetermined function is glass formed by transistors on a glass substrate, and another part of the circuit necessary to realize a predetermined function is formed on a single crystal substrate and is composed of transistors formed using the single crystal substrate The IC chip thus formed can be connected to the glass substrate by COG (Chip On Glass), and the IC chip can be arranged on the glass substrate. Alternatively, the IC chip can also be connected to the glass substrate using TAB (Tape Automated Bonding) or a printed circuit board. In this way, since a part of the circuit is formed on the same substrate, it is possible to reduce costs by reducing the number of components or improve reliability by reducing the number of connection points with circuit components. Alternatively, since the circuits in the high drive voltage part and the high drive frequency part consume a large amount of power, the circuits in such parts are not formed on the same substrate. Instead, for example, the circuits in such parts are formed on a single crystal substrate, and the IC chips composed of such circuits are used, so that an increase in power consumption can be prevented. Note that one pixel indicates the smallest unit of an image. Therefore, in the case of a full-color display device composed of color elements of R (red), G (green), and B (blue ), one pixel is composed of a dot of the R color element, a dot of the G color element, and a dot of the B color element. Note that the color elements are not limited to three colors, and more than three colors can be used, or colors other than RGB can be used. For example white can be added to make it RGBW (W is white). Or, for example, one or more colors such as yellow cyan, magenta, emerald green, and vermilion can be added to RGB. Also

[0046] Note that one pixel indicates the smallest unit of an image. Therefore, in the case of a full-color display device composed of color elements of R (red), G (green), and B (blue ), one pixel is composed of a dot of the R color element, a dot of the G color element, and a dot of the B color element. Note that the color elements are not limited to three colors, and more than three colors can be used, or colors other than RGB can be used. For example white can be added to make it RGBW (W is white). Or, for example, one or more colors such as yellow cyan, magenta, emerald green, and vermilion can be added to RGB. Also cyan, magenta, emerald green, and vermilion can be added to RGB. Also For example, a color similar to at least one of RGB may be added to RGB. For example, they may be R, G, B1, and B2. Both B1 and B2 are blue, but slightly different in wavelength. Similarly, they may be R1, R2, G, and B. By using such color elements, a display closer to the real object can be achieved. Alternatively, by using such color elements, power consumption can be reduced. Note that there may be multiple dots of color elements of the same color in one pixel. In that case, the multiple color elements may each have a different size of the area contributing to the display. Alternatively, gradation may be expressed by controlling each of the multiple dots of color elements of the same color. This is called the area gradation method. Alternatively, by using multiple dots of color elements of the same color and making the signals supplied to each dot slightly different, the viewing angle may be widened. That is, the potentials of the pixel electrodes of the multiple color elements of the same color may each be different. As a result, the voltages applied to the liquid crystal molecules are

[0047] each different for each pixel electrode. Therefore, the viewing angle can be widened. Note that in some cases where a circuit diagram is shown, one pixel may represent one element capable of controlling brightness. Therefore, in that case, one pixel represents one color element, and the brightness is expressed by that one color element. Therefore, in the case of a color display device composed of color elements of R (red), G

[0048] (green), and B (blue), the minimum unit of the image may be composed of three pixels: an Being arranged in a stripe pattern means that, in the vertical or horizontal direction, pixels are arranged in a straight line or are arranged on a zigzag line. Thus, when performing full-color display with, for example, three color elements (e.g., RGB), it includes cases where a stripe arrangement is made or where dots of three color elements are arranged in a delta pattern. Furthermore, it also includes cases where a Bayer arrangement is made. Note that the size of the display area may be different for each dot of the color element. This makes it possible to achieve lower power consumption or longer life of the display element.

[0049] Note that an active matrix method in which pixels have active elements or a passive matrix method in which pixels do not have active elements can be used.

[0050] In the active matrix method, as active elements (active elements, non-linear elements), not only transistors but also various active elements (active elements, non-linear elements) can be used. For example, it is also possible to use MIM (Metal Insulator Metal), TFD (Thin Film Diode), etc. These elements have fewer manufacturing steps, so it is possible to reduce manufacturing costs or improve yield. Furthermore, since the size of the elements is small, the aperture ratio can be improved, and lower power consumption and higher brightness can be achieved.

[0051] Note that, as something other than the active matrix method, it is also possible to use a passive matrix type that does not use active elements (active elements, non-linear elements). Active elements (active elements, non-linear elements) ​​​​Since it does not use active elements (active elements, non-linear elements), the manufacturing process is less, and it is possible to reduce the manufacturing cost or improve the yield. Since it does not use active elements (active elements, non-linear elements), the aperture ratio can be improved, and low power consumption and high brightness can be achieved. For reference, a transistor is an element having at least three terminals including a gate, a drain, and a source, and has a channel region between the drain region and the source region, and current can flow through the drain region, the channel region, and the source region. Here, since the source and the drain change depending on the structure and operating conditions of the transistor, etc., it is difficult to limit which one is the source or the drain. Therefore, the regions functioning as the source and the drain may not be called the source or the drain. In that case, as an example, each may be denoted as the first terminal and the second terminal. Alternatively, each may be denoted as the first electrode and the second electrode. Alternatively, there are cases where they are denoted as the first region and the second region.

[0052] For reference, a transistor may be an element having at least three terminals including a base, an emitter, and a collector. Also in this case, the emitter and the collector may be denoted as the first terminal, the second terminal, etc. For reference, a semiconductor device refers to a device having a circuit including semiconductor elements (transistors, diodes, thyristors, etc.). Furthermore, all devices that can function by utilizing semiconductor characteristics may be called semiconductor devices. Or, a device having a semiconductor material is called a semiconductor device. Since it does not use active elements (active elements, non-linear elements), the manufacturing process is less, and it is possible to reduce the manufacturing cost or improve the yield. Since it does not use active elements (active elements, non-linear elements), the aperture ratio can be improved, and low power consumption and high brightness can be achieved. For reference, a transistor is an element having at least three terminals including a gate, a drain, and a source, and has a channel region between the drain region and the source region, and current can flow through the drain region, the channel region, and the source region. Here, since the source and the drain change depending on the structure and operating conditions of the transistor, etc., it is difficult to limit which one is the source or the drain. Therefore, the regions functioning as the source and the drain may not be called the source or the drain. In that case, as an example, each may be denoted as the first terminal and the second terminal. Alternatively, each may be denoted as the first electrode and the second electrode. Alternatively, there are cases where they are denoted as the first region and the second region. For reference, a transistor may be an element having at least three terminals including a base, an emitter, and a collector. Also in this case, the emitter and the collector may be denoted as the first terminal, the second terminal, etc. For reference, a semiconductor device refers to a device having a circuit including semiconductor elements (transistors, diodes, thyristors, etc.). Furthermore, all devices that can function by utilizing semiconductor characteristics may be called semiconductor devices. Or, a device having a semiconductor material is called a semiconductor device. Since it does not use active elements (active elements, non-linear elements), the manufacturing process is less, and it is possible to reduce the manufacturing cost or improve the yield. Since it does not use active elements (active elements, non-linear elements), the aperture ratio can be improved, and low power consumption and high brightness can be achieved.

[0053] For reference, a transistor is an element having at least three terminals including a gate, a drain, and a source, and has a channel region between the drain region and the source region, and current can flow through the drain region, the channel region, and the source region. Here, since the source and the drain change depending on the structure and operating conditions of the transistor, etc., it is difficult to limit which one is the source or the drain. Therefore, the regions functioning as the source and the drain may not be called the source or the drain. In that case, as an example, each may be denoted as the first terminal and the second terminal. Alternatively, each may be denoted as the first electrode and the second electrode. Alternatively, there are cases where they are denoted as the first region and the second region. For reference, a transistor may be an element having at least three terminals including a base, an emitter, and a collector. Also in this case, the emitter and the collector may be denoted as the first terminal, the second terminal, etc. For reference, a semiconductor device refers to a device having a circuit including semiconductor elements (transistors, diodes, thyristors, etc.). Furthermore, all devices that can function by utilizing semiconductor characteristics may be called semiconductor devices. Or, a device having a semiconductor material is called a semiconductor device.

[0054] For reference, a semiconductor device refers to a device having a circuit including semiconductor elements (transistors, diodes, thyristors, etc.). Furthermore, all devices that can function by utilizing semiconductor characteristics may be called semiconductor devices. Or, a device having a semiconductor material is called a semiconductor device. Since it does not use active elements (active elements, non-linear elements), the manufacturing process is less, and it is possible to reduce the manufacturing cost or improve the yield. Since it does not use active elements (active elements, non-linear elements), the aperture ratio can be improved, and low power consumption and high brightness can be achieved. For reference, a transistor is an element having at least three terminals including a gate, a drain, and a source, and has a channel region between the drain region and the source region, and current can flow through the drain region, the channel region, and the source region. Here, since the source and the drain change depending on the structure and operating conditions of the transistor, etc., it is difficult to limit which one is the source or the drain. Therefore, the regions functioning as the source and the drain may not be called the source or the drain. In that case, as an example, each may be denoted as the first terminal and the second terminal. Alternatively, each may be denoted as the first electrode and the second electrode. Alternatively, there are cases where they are denoted as the first region and the second region.

[0055] Note that the display device refers to a device having a display element. Note that the display device may include a plurality of pixels including the display element. Note that the display device may include a peripheral drive circuit for driving the plurality of pixels. Note that the peripheral drive circuit for driving the plurality of pixels may be formed on the same substrate as the plurality of pixels. Note that the display device may include a peripheral drive circuit arranged on the substrate by wire bonding or bumps, that is, an IC chip connected by so-called chip on glass (COG), or an IC chip connected by TAB or the like. Note that the display device may include a flexible printed circuit (FPC) to which an IC chip, a resistive element, a capacitive element, an inductor, a transistor, etc. are attached. Note that the display device may include a printed wiring board (PWB) connected via a flexible printed circuit (FPC) or the like and to which an IC chip, a resistive element, a capacitive element, an inductor, a transistor, etc. are attached. Note that the display device may include an optical sheet such as a polarizing plate or a retardation plate. Note that the display device may include an illumination device, a housing, an audio input / output device, a light sensor, etc. Note that the illumination device may have a backlight unit, a light guide plate, a prism sheet, a diffusion sheet, a reflection sheet, a light source (LED, cold cathode tube, etc.), a cooling device (water-cooled, air-cooled), etc. Note that the light-emitting device refers to a device having a light-emitting element or the like. When having a light-emitting element as a display element, the light-emitting device is one specific example of the display device.

[0056]

[0057]

[0058] ​​​​​​​​​​Note that the reflection device refers to a device having a light reflection element, a light diffraction element, a light reflection electrode, etc. This is what is referred to as such.

[0059] Note that the liquid crystal display device refers to a display device having a liquid crystal element. The liquid crystal display device includes a direct view type, a projection type, a transmissive type, a reflective type, a transflective type, etc.

[0060] Note that the driving device refers to a device having a semiconductor element, an electric circuit, or an electronic circuit. For example, a transistor (sometimes called a selection transistor, a switching transistor, etc.) that controls the input of a signal from a source signal line into a pixel, a transistor that supplies a voltage or current to a pixel electrode, a transistor that supplies a voltage or current to a light emitting element, etc. are examples of driving devices. Further, a circuit that supplies a signal to a gate signal line (sometimes called a gate driver, a gate line driving circuit, etc.), a circuit that supplies a signal to a source signal line (sometimes called a source driver, a source line driving circuit, etc.) are examples of driving devices.

[0061] Note that a display device, a semiconductor device, a lighting device, a cooling device, a light emitting device, a reflection device, a driving device, etc. may overlap with each other. For example, a display device may have a semiconductor device and a light emitting device. Or, a semiconductor device may have a display device and a driving device.

[0062] When it is explicitly described that B is formed on A, or B is formed on A, it is not limited to B being formed in direct contact with A. It shall also include the case where they are not in direct contact, that is, the case where another object is interposed between A and B. ​​​​​​​Here, A and B are assumed to be objects (e.g., devices, elements, circuits, wirings, electrodes, terminals, conductive films, layers , etc.).

[0063] Therefore, for example, when it is explicitly described that layer B is formed on (or over) layer A, it includes the case where layer B is formed directly in contact with layer A, and the case where another layer (e.g., layer C or layer D, etc.) is formed directly in contact with layer A and layer B is formed directly on top of it. Note that another layer (e.g., layer C or layer D, etc.) may be a single layer or a multi-layer. When it is explicitly described that layer B is formed on layer A, it includes the case where layer B is formed directly in contact with layer A, and the case where another layer (e.g., layer C or layer D, etc.) is formed directly in contact with layer A and layer B is formed directly on top of it. Note that another layer (e.g., layer C or layer D, etc.) may be a single layer or a multi-layer. When it is explicitly described that layer B is formed on layer A, it includes the case where layer B is formed directly in contact with layer A, and the case where another layer (e.g., layer C or layer D, etc.) is formed directly in contact with layer A and layer B is formed directly on top of it. Note that another layer (e.g., layer C or layer D, etc.) may be a single layer or a multi-layer. When it is explicitly described that layer B is formed on layer A, it includes the case where layer B is formed directly in contact with layer A, and the case where another layer (e.g., layer C or layer D, etc.) is formed directly in contact with layer A and layer B is formed directly on top of it. Note that another layer (e.g., layer C or layer D, etc.) may be a single layer or a multi-layer. When it is explicitly described that layer B is formed on layer A, it includes the case where layer B is formed directly in contact with layer A, and the case where another layer (e.g., layer C or layer D, etc.) is formed directly in contact with layer A and layer B is formed directly on top of it. Note that another layer (e.g., layer C or layer D, etc.) may be a single layer or a multi-layer.

[0064] Furthermore, the same applies when it is explicitly described that B is formed above A. It is not limited to the case where B is directly in contact with A, and also includes the case where another object is interposed between A and B. Therefore, for example, when it is described that layer B is formed above layer A, it includes the case where layer B is formed directly in contact with layer A, and the case where another layer (e.g., layer C or layer D, etc.) is formed directly in contact with layer A and layer B is formed directly on top of it. Note that another layer (e.g., layer C or layer D, etc.) may be a single layer or a multi-layer. Furthermore, the same applies when it is explicitly described that B is formed above A. It is not limited to the case where B is directly in contact with A, and also includes the case where another object is interposed between A and B. Therefore, for example, when it is described that layer B is formed above layer A, it includes the case where layer B is formed directly in contact with layer A, and the case where another layer (e.g., layer C or layer D, etc.) is formed directly in contact with layer A and layer B is formed directly on top of it. Note that another layer (e.g., layer C or layer D, etc.) may be a single layer or a multi-layer. Furthermore, the same applies when it is explicitly described that B is formed above A. It is not limited to the case where B is directly in contact with A, and also includes the case where another object is interposed between A and B. Therefore, for example, when it is described that layer B is formed above layer A, it includes the case where layer B is formed directly in contact with layer A, and the case where another layer (e.g., layer C or layer D, etc.) is formed directly in contact with layer A and layer B is formed directly on top of it. Note that another layer (e.g., layer C or layer D, etc.) may be a single layer or a multi-layer. Furthermore, the same applies when it is explicitly described that B is formed above A. It is not limited to the case where B is directly in contact with A, and also includes the case where another object is interposed between A and B. Therefore, for example, when it is described that layer B is formed above layer A, it includes the case where layer B is formed directly in contact with layer A, and the case where another layer (e.g., layer C or layer D, etc.) is formed directly in contact with layer A and layer B is formed directly on top of it. Note that another layer (e.g., layer C or layer D, etc.) may be a single layer or a multi-layer. Furthermore, the same applies when it is explicitly described that B is formed above A. It is not limited to the case where B is directly in contact with A, and also includes the case where another object is interposed between A and B. Therefore, for example, when it is described that layer B is formed above layer A, it includes the case where layer B is formed directly in contact with layer A, and the case where another layer (e.g., layer C or layer D, etc.) is formed directly in contact with layer A and layer B is formed directly on top of it. Note that another layer (e.g., layer C or layer D, etc.) may be a single layer or a multi-layer. Furthermore, the same applies when it is explicitly described that B is formed above A. It is not limited to the case where B is directly in contact with A, and also includes the case where another object is interposed between A and B. Therefore, for example, when it is described that layer B is formed above layer A, it includes the case where layer B is formed directly in contact with layer A, and the case where another layer (e.g., layer C or layer D, etc.) is formed directly in contact with layer A and layer B is formed directly on top of it. Note that another layer (e.g., layer C or layer D, etc.) may be a single layer or a multi-layer. Furthermore, the same applies when it is explicitly described that B is formed above A. It is not limited to the case where B is directly in contact with A, and also includes the case where another object is interposed between A and B. Therefore, for example, when it is described that layer B is formed above layer A, it includes the case where layer B is formed directly in contact with layer A, and the case where another layer (e.g., layer C or layer D, etc.) is formed directly in contact with layer A and layer B is formed directly on top of it. Note that another layer (e.g., layer C or layer D, etc.) may be a single layer or a multi-layer.

[0065] In addition, when it is explicitly described that B is formed on A, B is formed on A, or B is formed above A, it is to be understood that it also includes the case where B is formed obliquely above. In addition, when it is explicitly described that B is formed on A, B is formed on A, or B is formed above A, it is to be understood that it also includes the case where B is formed obliquely above. .

[0066] In addition, the same applies to the case where B is below A or B is beneath A.

[0067] In addition, for those explicitly described as singular, it is desirable that they be singular. However, it is not limited to this, and a plurality is also possible. Similarly, for those explicitly described as a plurality, it is desirable to be a plurality. However, it is not limited to this, and a single one is also possible. and for those described as such, it is desirable to be a plurality. However, it is not limited to this, and a single one is also possible.

[0068] In the drawings, the size, layer thickness, or area may be exaggerated for clarity. Therefore, it is not necessarily limited to that scale.

[0069] The drawings schematically show ideal examples and are not limited to the shapes or values shown in the drawings. For example, it can include variations in shape due to manufacturing techniques, variations in shape due to errors, variations in signals, voltages, or currents due to noise, or variations in signals, voltages, or currents due to timing deviations.

[0070] Technical terms are often used for the purpose of describing specific embodiments or examples. However, one aspect of the present invention is not to be construed as being limited by technical terms.

[0071] For terms that are not defined (including scientific and technical terms such as technical terms or academic terms), they can be used with a meaning equivalent to the general meaning understood by those of ordinary skill in the art. Terms defined by a dictionary or the like are preferably interpreted in a meaning that is not inconsistent with the background of the related art.

[0072] Terms such as first, second, and third are used to describe various elements, members, regions, layers, and areas separately from others. Therefore, terms such as first, second, and third do not necessarily imply any order or importance among the elements or parts. ​​​​​​​​​​It does not limit the number of materials, regions, layers, areas, etc. Further, for example, "first" can be replaced with "second", "third", etc. It is possible to replace it with "second", "third", etc.

[0073] In addition, terms indicating spatial arrangements such as "above", "upward", "below", "downward", "sideways", "right", "left", "diagonal", "inward", "forward", "inside", "outside", or "inside" are often used to simply show the relationship between one element or feature and another element or feature by a figure. However, it is not limited to this, and the terms indicating these spatial arrangements can include other directions in addition to the directions depicted in the figure. For example, when explicitly shown as B above A, it is not limited to B being above A. Since the device in the figure can be inverted or rotated 180°, it is possible to include B being below A. Thus, the term "above" can include the direction of "below" in addition to the direction of "above". However, it is not limited to this. Since the device in the figure can be rotated in various directions, the term "above" can include other directions such as "sideways", "right", "left", "diagonal", "inward", "forward", "inside", "outside", "inside", or "inside" in addition to the directions of "above" and "below". That is, it can be interpreted appropriately according to the situation.

Advantages of the Invention

[0074] It becomes possible to improve the image quality.

Brief Description of the Drawings

[0075]

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Embodiments for Carrying Out the Invention

[0076] Hereinafter, embodiments will be described with reference to the drawings. However, the embodiments can be implemented in many different ways, and it will be easily understood by those skilled in the art that the form and details can be variously changed without departing from the spirit and its scope. Therefore, the embodiments should not be construed as being limited to the described content. In the configurations described below, the same parts or parts having similar functions are denoted by common reference numerals in different drawings, and detailed descriptions of the same parts or parts having similar functions are omitted.

[0077] Note that the content described in one embodiment (even some of the content) can be applied, combined, or replaced with the content described in another part of the same embodiment (even some of the content), and / or the content described in one or more other embodiments (even some of the content). That is, such operations as application, combination, or replacement can be performed.

[0078] Note that the content described in the embodiments refers to the content described using various diagrams in each embodiment, or the content described using the text described in the specification. That is, it is the content described using the text described in the specification.

[0079] Note that the figure (which may be a part) described in a certain embodiment can be combined with another part of that figure, another figure (which may be a part) described in that embodiment, and / or one or more figures (which may be a part) described in one or more other embodiments to form even more figures.

[0080] Note that in the figure or text described in a certain embodiment, it is possible to extract a part thereof to form an aspect of the invention. Therefore, when a figure or text describing a certain part is provided, the content obtained by extracting a part of that figure or text is also disclosed as an aspect of the invention and can form an aspect of the invention. For this reason, for example, active elements (such as transistors and diodes), wiring, passive elements (such as capacitive elements and resistive elements), conductive layers, insulating layers, semiconductor layers, organic materials, inorganic materials, components, substrates, modules, devices, solids, liquids, gases, operating methods, manufacturing methods, etc., when described singly or in plurality in drawings (such as cross-sectional views, plan views, circuit diagrams, block diagrams, flowcharts, process diagrams, perspective views , elevation views, layout diagrams, timing charts, structure diagrams, schematic diagrams, graphs, tables, optical path diagrams, vector diagrams, state diagrams, waveform diagrams, photographs, chemical formulas, etc.) or text, it is possible to extract a part thereof to form an aspect of the invention. As an example, from a circuit diagram composed of N (N is an integer) circuit elements (such as transistors and capacitive elements), M (M is an integer and M < N) circuit elements (such as transistors and capacitive elements) can be extracted to form an aspect of the invention. As another example, from a cross-sectional view composed of N (N is an integer) layers, M (M is an integer and M < N) layers can be extracted to form an aspect of the invention This is possible. As another example, from a flowchart composed of N (N is an integer) elements, it is possible to extract M (M is an integer, M < N) elements and constitute one aspect of the invention.

[0081] (Embodiment 1) Super-resolution processing is a process of generating a high-resolution image based on a low-resolution image. Or, super-resolution processing is a process of restoring lost information during shooting or signal transfer. Therefore, due to the low resolution, fine parts are blurred and averaged in the image. By performing super-resolution processing on the averaged image, an image can be generated that can accurately recognize even the fine parts. Therefore, when such a high-resolution image is displayed, a high-quality image can be displayed. For example, in an image of a park with many small stones arranged, or a tree with many fine leaves arranged, each small stone or each fine leaf can be accurately identified by performing super-resolution processing. Similarly, characters that were blurred and unreadable can be accurately read by performing super-resolution processing because fine parts can be recognized. That is, it becomes possible to see as if the vision has improved. For example, super-resolution processing creates an image with a resolution (number of pixels) of 1920×1080 by restoring image information from an image with a resolution (number of pixels) of 1440×1080. That is, it is possible to say that the super-resolution processing technology performs resolution conversion while increasing the amount of information in the image from the original image. Or, super-resolution processing is among the information contained in the image, the standard of the input image ​A technology for restoring frequency components higher than the Nyquist frequency determined by the localization frequency. It can also be said like this.

[0082] On the other hand, in a hold-type display such as a liquid crystal display device, when displaying a fast-moving video, motion blur may occur and afterimages may be visible. For example, when displaying characters while moving them up and down or left and right in a telop, the characters may be blurred and it may not be possible to accurately identify them. There are cases.

[0083] Therefore, by performing frame interpolation processing, the frame frequency can be improved and the video resolution can be improved. Frame interpolation processing is a process of creating interpolated frame data when increasing the frame frequency for display in order to reduce afterimages and the like. For example, as shown in Fig. 2(A), in the first frame image, a circle is displayed at the left end, and in the second frame image, since the circle has moved from left to right, it is assumed that the circle is displayed at the right end. At this time, data in which the circle is displayed in the center is created. The process of creating such data is frame interpolation processing. And by frame interpolation processing, it is possible to increase the frame frequency in display by the number of interpolated frames. By performing frame interpolation processing in this way and increasing the frame frequency for display, it is possible to accurately display a smooth image in which the circle moves from left to right and reduce afterimages. Therefore, it is possible to display the video without blurring, and thus the video resolution can be improved. Note that in this specification, video resolution refers to the resolution in appearance when the video is displayed, that is, the resolution that a person feels when the video is displayed. As described above, by performing frame interpolation processing and increasing the frame frequency for display, it is possible to accurately display a smooth image in which the circle moves from left to right and reduce afterimages. Therefore, it is possible to display the video without blurring, and thus the video resolution can be improved. Note that in this specification, video resolution refers to the resolution in appearance when the video is displayed, that is, the resolution that a person feels when the video is displayed. In other words, it is the resolution in appearance when the video is displayed, That is. For example, a wedge-shaped figure is scrolled on the screen, and the resolution at which the interval can be identified is what is meant.

[0084] In this way, performing frame interpolation processing and increasing the frame frequency accordingly is called double-speed driving. For example, when the frame frequency is doubled, it is called 2x speed driving , and when the frame frequency is quadrupled, it is called 4x speed driving. In the case of 2x speed driving, images of the same number of frames as the original frames are created by frame interpolation processing. As a result, since the total data volume doubles, the frame frequency can be doubled for display. Similarly, in the case of 4x speed driving, images of three times the number of original frames are created by frame interpolation processing. As a result, since the total data volume quadruples, the frame frequency can be quadrupled for display. By performing such double-speed driving, video characteristics can be improved and afterimages can be reduced. As a display device to which it is applied, it is desirable that it is a hold-type display device, for example, it is preferably applied to a liquid crystal display, an organic EL display, etc. Since afterimages are likely to be seen in a hold-type display device, it becomes possible to reduce afterimages by using double-speed driving. Therefore, by performing both frame interpolation processing and super-resolution processing, the resolution in still images and the video resolution can be improved. If only super-resolution processing is performed and frame interpolation processing is not performed

[0085] and double-speed driving is not performed, then, despite having increased the resolution by super-resolution processing, the image will become blurred due to afterimages or the like, so the fact that the resolution has been increased cannot be visually recognized ​​It becomes difficult. That is, the effect of performing the super-resolution process is halved. Or when only frame interpolation processing is performed, double-speed driving is performed, and super-resolution processing is not performed, even though it has finally become possible to correctly visually recognize even videos, since the resolution of the displayed image itself is low, it becomes impossible to display high-quality video. From the above, in order to accurately display high-resolution images whether they are still images or videos, it is important to perform both frame interpolation processing and super-resolution processing. However, an example of an embodiment is not limited to this.

[0086] Therefore, FIG. 1 shows an example of a processing flow when super-resolution processing is performed after frame interpolation processing. An example is shown.

[0087] In FIG. 1(A), after performing frame interpolation processing using the image signal obtained from the image source, a processing flow when super-resolution processing is performed to increase the resolution is shown. After the super-resolution processing is performed, various further processes are performed, and then the image can be displayed.

[0088] Note that the image source includes a TV broadcast signal sent from a broadcasting station and / or an image generated from that signal. Or the image source includes a signal obtained from an optical storage medium such as a DVD (including Blu-ray, etc.) or a CD (including a magnetic storage medium or a magneto-optical storage medium), a streaming, a signal obtained from the Internet, etc., and / or an image generated from that signal. Or the image source includes a signal obtained from a mobile phone, a computer, a CPU, a microcomputer for graphics, a controller, an electronic device, etc., and / or an image generated from that signal. Or the image source includes a signal obtained from a mobile phone, a computer, a CPU, a microcomputer for graphics, a controller, an electronic device, etc., and / or an image generated from that signal. including magnetic storage media or magneto-optical storage media), streaming, signals obtained from the Internet, etc., and / or images generated from those signals. In addition, the image source includes signals obtained from a mobile phone, a computer, a CPU, a microcomputer for graphics, a controller, an electronic device, etc., and / or images generated from those signals. Or the image source includes signals obtained from a mobile phone, a computer, a CPU, a microcomputer for graphics, a controller, an electronic device, etc., and / or images generated from those signals. from a mobile phone, a computer, a CPU, a microcomputer for graphics, a controller, an electronic device, etc., and / or an image generated from that signal. It includes the generated image. In addition, the image source includes the original signal for display, and / or the image generated from the signal.

[0089] Note that the image includes a still image, and / or a moving image, and / or video.

[0090] Note that the image source can be an interlaced (skip-scan) image or a progressive (non-interlaced, non-skip-scan) image. Or, the image source can be an IP conversion (interlace-progressive conversion) that is a process of converting an interlaced image into a progressive image and has already been performed on the image. Or, it is possible to perform IP conversion before or after frame interpolation processing or before performing super-resolution processing. Figure 3(A) shows a part of the processing flow when performing super-resolution processing using a progressive image. Figure 3(B) shows a part of the processing flow when performing frame interpolation processing after IP-converting an interlaced image. Figure 3(C) shows a part of the processing flow when performing frame interpolation processing after IP-converting an interlaced image and then performing super-resolution processing. Figure 3(D) shows a part of the processing flow when performing super-resolution processing after IP-converting an interlaced image.

[0091] Normally, super-resolution processing is performed using one image (or a part thereof) or multiple images (or a part thereof). And super-resolution processing creates a high-resolution image by creating new information using those images. Therefore, in order to accurately perform super-resolution processing, like in the case of interlacing, part of the image information is missing. is not desirable. Therefore, the image on which super-resolution processing is performed is preferably a progressive (non-interlaced, non-overleaping scan) image. Thus, in the case of an interlaced image, IP conversion is performed before super-resolution processing, and it is desirable to perform super-resolution processing using the progressive image. However, an example of an embodiment is not limited to these. In addition, IP conversion can be performed before or after super-resolution processing. And / or, IP conversion can be performed before or after frame interpolation processing. And / or, IP conversion can be performed before or after another process. In addition, as shown in FIG. 4(A) etc., it is desirable that the resolution (number of pixels) of the image after super-resolution processing is higher than that of the image before super-resolution processing. However, an example of an embodiment is not limited to this. For example, assume that the resolution (or number of pixels) has already been increased by enlargement processing before super-resolution processing. In that case, since the resolution is already high, the resolution itself does not change before and after super-resolution processing. However, in the enlargement processing before super-resolution processing, the missing image information is not restored. That is, it is simply enlarged, so the display itself is not of high quality. For example, in an image such as a park with many small stones arranged or a tree with many fine leaves arranged, each small stone or each fine leaf is not accurately displayed by the enlargement processing, but is simply enlarged and displayed in a blurred state. Therefore, by performing super-resolution processing, the resolution (number of pixels) of the image does not change. However, an example of an embodiment is not limited to these.

[0092] In addition, IP conversion can be performed before or after super-resolution processing. And / or, IP conversion can be performed before or after frame interpolation processing. And / or, IP conversion can be performed before or after another process. In addition, IP conversion can be performed before or after super-resolution processing. And / or, IP conversion can be performed before or after frame interpolation processing. And / or, IP conversion can be performed before or after another process.

[0093] In addition, as shown in FIG. 4(A) etc., it is desirable that the resolution (number of pixels) of the image after super-resolution processing is higher than that of the image before super-resolution processing. However, an example of an embodiment is not limited to this. For example, assume that the resolution (or number of pixels) has already been increased by enlargement processing before super-resolution processing. In that case, since the resolution is already high, the resolution itself does not change before and after super-resolution processing. However, in the enlargement processing before super-resolution processing, the missing image information is not restored. That is, it is simply enlarged, so the display itself is not of high quality. For example, in an image such as a park with many small stones arranged or a tree with many fine leaves arranged, each small stone or each fine leaf is not accurately displayed by the enlargement processing, but is simply enlarged and displayed in a blurred state. Therefore, by performing super-resolution processing, the resolution (number of pixels) of the image does not change. However, an example of an embodiment is not limited to this. For example, assume that the resolution (or number of pixels) has already been increased by enlargement processing before super-resolution processing. In that case, since the resolution is already high, the resolution itself does not change before and after super-resolution processing. However, in the enlargement processing before super-resolution processing, the missing image information is not restored. That is, it is simply enlarged, so the display itself is not of high quality. For example, in an image such as a park with many small stones arranged or a tree with many fine leaves arranged, each small stone or each fine leaf is not accurately displayed by the enlargement processing, but is simply enlarged and displayed in a blurred state. Therefore, by performing super-resolution processing, the resolution (number of pixels) of the image does not change. However, an example of an embodiment is not limited to this. For example, assume that the resolution (or number of pixels) has already been increased by enlargement processing before super-resolution processing. In that case, since the resolution is already high, the resolution itself does not change before and after super-resolution processing. However, in the enlargement processing before super-resolution processing, the missing image information is not restored. That is, it is simply enlarged, so the display itself is not of high quality. For example, in an image such as a park with many small stones arranged or a tree with many fine leaves arranged, each small stone or each fine leaf is not accurately displayed by the enlargement processing, but is simply enlarged and displayed in a blurred state. Therefore, by performing super-resolution processing, the resolution (number of pixels) of the image does not change. That is, it is simply enlarged, so the display itself is not of high quality. For example, in an image such as a park with many small stones arranged or a tree with many fine leaves arranged, each small stone or each fine leaf is not accurately displayed by the enlargement processing, but is simply enlarged and displayed in a blurred state. Therefore, by performing super-resolution processing, the resolution (number of pixels) of the image does not change. ​​​ However, it is also possible to obtain a high-quality image in which the missing image information is restored and fine details can be identified. That is, as shown in FIG. 4(B), an image of 1440×1080 can be enlarged to an image of 1920×1080, and the 1920×1080 image can also be subjected to super-resolution processing to obtain an image of 1920×1080. At this time, when the 1440×1080 image is enlarged to a 1920×1080 image, there is no restored information. However, after super-resolution processing, since the information is restored, it is possible to obtain an image in which fine details can be accurately identified and viewed.

[0094] Note that such a situation often occurs for the entire screen, but an example of the embodiment is not limited to this. It is also possible for this to occur in a part of the screen.

[0095] Note that it is also possible to increase the resolution by enlargement processing and then further increase the resolution by super-resolution processing. For example, an image of 800×600 can be enlarged to an image of 1440×1080, and the 1440×1080 image can be subjected to super-resolution processing to obtain an image of 1920×1080. However, when the resolution is increased by enlargement processing, no information restoration is performed. And when the resolution is increased by super-resolution processing, information restoration is performed. However, an example of the embodiment is not limited to these.

[0096] Or, it is also possible to increase the resolution by super-resolution processing and then increase the resolution by enlargement processing. For example, an image of 800×600 is subjected to super-resolution processing to obtain an image of 1440×1080, and the 1440×1080 image is enlarged to an image of 1920×1080. It is also possible to perform processing. However, when the resolution is increased by enlargement processing, restoration of information is not performed. And when the resolution is increased by super-resolution processing, restoration of information is performed. However, an example of an embodiment is not limited to these.

[0097] Note that the enlargement processing can be performed before or after the super-resolution processing. Or, the enlargement processing can be performed before or after the frame interpolation processing. Or, the enlargement processing can be performed before or after a certain processing. However, an example of an embodiment is not limited to these.

[0098] Thus, it is possible to perform both the enlargement processing and the super-resolution processing. For example, when the resolution in the vertical direction or the horizontal direction is made 2 times or more, more preferably 5 times or more, it is preferable to perform both the enlargement processing and the super-resolution processing. However, an example of an embodiment is not limited to these.

[0099] Note that as an example of the enlargement processing, it is possible to use, for example, the bilinear method or the bicubic method. The bilinear method is a method of collecting and calculating the pixels in the 4-nearest neighbors and interpolating the insufficient pixels during enlargement. Or, in the bicubic method, 16 pixel values of 4×4 are taken out from the original coordinates based on the coordinate system after conversion. Then, these 16 point values are weighted and a weighted average calculation is performed to determine the pixel value after conversion.

[0100] Note that as shown in FIG. 4(C), it is analyzed whether the image has been subjected to enlargement processing or not, and when the enlargement processing is performed on a part or all of the screen, ​​​​​​When super-resolution processing is performed and no enlargement processing is carried out, that is, when the resolution is originally high it is also possible not to perform super-resolution processing. Since there are various images as image sources by performing image analysis, it is possible to correctly perform super-resolution processing on an enlarged image as well. As a method of image analysis, as an example, there is a method of performing frequency analysis and making a determination based on whether or not it has a high frequency. When the frequency is low it can be determined that enlargement processing has been performed.

[0101] Next, for an image with a horizontal resolution (number of pixels) of A and a vertical resolution (number of pixels) of B, by performing super-resolution processing, it is assumed that the image becomes an image with a horizontal resolution (number of pixels) of C and a vertical resolution (number of pixels) of D. Or, for an image with a horizontal resolution (number of pixels) of A and a vertical resolution (number of pixels) of B by performing enlargement processing and super-resolution processing, it is assumed that the image becomes an image with a horizontal resolution (number of pixels) of C and a vertical resolution (number of pixels) of D. At this time, when performing super-resolution processing the magnification when increasing the resolution is the number obtained by dividing C by A, which is C / A, or the number obtained by dividing D by B, which is D / B. On the other hand, when performing double-speed driving, it is assumed that the frame frequency is increased by N times. At this time, it is desirable that N > (C / A), or N > (D / B). Or it is desirable that N ≥ (C / A) and N ≥ (D / B). However, an example of the embodiment is not limited to this.

[0102] When performing frame interpolation processing for double-speed driving, the number of frame data to be interpolated is large

[0103] However, data can be created without any problems. For example, in the case of Fig. 2(A), it was 2x speed However, as shown in Fig. 2(B), by adjusting the position of the circle, it can be easily set to 3x speed That is, for the frame interpolation process for double-speed driving, even if the number of frames to be interpolated increases, there will be no major problem with the image. Alternatively, by increasing the number of frames to be interpolated, the video characteristics can be further improved, and the afterimage can be further reduced.

[0104] On the other hand, super-resolution processing is a process of restoring the resolution information that has been lost during shooting or signal transfer, etc. Therefore, when too much information has been lost, it becomes difficult to fully restore it. Therefore, if (C / A) or (D / B ) is increased too much, problems will occur in the image itself and the image will be distorted.

[0105] From the above, when both frame interpolation processing and super-resolution processing are performed, it is desirable that N > (C / A) or N > (D / B). Or it is desirable that N ≥ (C / A) and N ≥ (D / B). Therefore, when both super-resolution processing and frame interpolation processing are performed, by satisfying this relationship, fine details can be clearly seen and a high-quality image without an afterimage feeling can be displayed. However, an example of the embodiment is not limited to this.

[0106] Note that when performing frame interpolation processing, in the area where there is movement on the screen, data is often newly created for frame interpolation processing. And in the screen, where there is movement In most cases, data is not newly created in areas where there is no data. By frame interpolation processing, new data is generated in the area where the new data is generated. For example, in the case of Figure 2(A), as shown in Figure 2(C), In the area 301 and the area 303, the data of the first frame before interpolation and the data of the second frame before interpolation are Therefore, there is no change in the data of the interpolated frame. The data is not newly created, but the data of the first frame before interpolation or the data of the interpolated frame. The data is created using the data of the second frame just before. There is a change between the data of the first frame before interpolation and the data of the second frame before interpolation. Therefore, there are areas where the circles are erased and areas where circles are created, so new data is being created. This will be the case.

[0107] In this way, when frame interpolation processing is performed, new data is created within the screen. There may be areas where new data is not created and areas where new data is not created. The area changes from moment to moment. For example, an example of an area where data is created is a subtitle. Examples of such areas include areas where characters are displayed and the characters move up and down or left and right. When letters or symbols become difficult to see due to afterimages, it can be difficult to tell what kind of letters or symbols they are. This becomes a major problem because it becomes impossible to determine the

[0108] In this way, when frame interpolation processing is performed, new images are generated only in a part of the screen. Creating data in a timely manner can improve processing speed, reduce power consumption, or improve processing accuracy. It has the advantage of improving the degree of

[0109] On the other hand, super-resolution processing is not performed on the entire screen, but on only some areas. For example, it is possible to display a streaming broadcast on a part of the screen. In such cases, a low-resolution image may be enlarged and displayed only in that area. In this case, super-resolution processing is performed only on the area displaying the streaming broadcast to improve the image quality. It can be improved.

[0110] In this way, when super-resolution processing is performed only in a part of the screen, the processing speed is This has advantages such as improved image quality, lower power consumption, improved processing accuracy, and reduced image quality defects.

[0111] Therefore, in the screen, the first data for which new data is generated for frame interpolation processing is There is a first area where super-resolution processing is performed and a second area where super-resolution processing is performed. Therefore, there is a third region where no new data is created and no super-resolution processing is performed. The area where the first area and the second area do not overlap is also possible. Alternatively, the first region and the second region may overlap each other. can be present on the screen.

[0112] New data is created for frame interpolation processing when characters and symbols such as captions are inserted. Information is often displayed, and super-resolution processing is performed in areas with little movement. Therefore, new frames are generated within the screen for frame interpolation processing. The first area where the super-resolution data is generated and the second area where the super-resolution processing is performed do not overlap. It is preferable to have a region for the following reasons: In the first area where new data is created for processing, since it is an area with movement, to make the afterimage invisible, new data is created for frame interpolation processing. However, in such an area with movement even if super-resolution processing is performed to increase the resolution, it may be difficult for the eye to recognize that resolution. Therefore, it can be said that super-resolution processing may not be performed in such an area with movement. And in the second area where super-resolution processing is performed, it is an area where it is desirable to clearly see even fine details. When displaying an image such as a still image with no movement, it can be said that even fine details can be clearly seen. Since such a situation may occur, both frame interpolation processing and super-resolution processing are performed, and while being able to display a screen with both advantages, it is possible to have an area where the first area where new data is created for frame interpolation processing and the second area where super-resolution processing is performed do not overlap. As a result, it is possible to display an optimal image. However, an example of the embodiment is not limited to this. In this way, by performing frame interpolation processing and super-resolution processing, it becomes possible to display an image with high resolution in a still image and high video resolution. However, an example of the embodiment is not limited to this.

[0113] Thus, by performing frame interpolation processing and super-resolution processing, it becomes possible to display an image with high resolution in a still image and high video resolution. When performing super-resolution processing after frame interpolation processing, the frame frequency is high for frame interpolation processing.

[0114] Therefore, the processing speed of super-resolution processing may not be sufficient. So, it is possible to provide a plurality of processing systems for super-resolution processing. For example, the case where two processing systems for super-resolution processing are provided is shown in Fig. 1(B). Furthermore, the processing of super-resolution processing The case where three science departments are provided is shown in Fig. 1(C). Similarly, it is possible to arrange any number of processing systems. It is possible.

[0115] When multiple processing systems are provided, it is possible to distribute the processing to each processing system in various ways. For example, it is possible to perform super-resolution processing 1 on the right half of the screen and super-resolution processing 2 on the left half of the screen. Normally, since image information is transferred line by line, by dividing the image data for one line into two parts, left and right, the processing can be distributed to super-resolution processing 1 and super-resolution processing 2. This is possible. However, an example of the embodiment is not limited to this. Or, a certain frame (for example, an odd-numbered frame, or a frame on which frame interpolation processing is not performed) is processed by super-resolution processing 1, and another frame (for example, an even-numbered frame, or a frame created by performing frame interpolation processing) can be processed by super-resolution processing 2.

[0116] In this way, even if the processing speed of the super-resolution processing is slower than the frame frequency, by performing the processing alternately, the processing can be completed normally. Or, since the processing speed performed by one processing system can be slow, the power consumption can be reduced. This is possible. Moreover, an example of the embodiment is not limited to performing the super-resolution processing after the frame interpolation processing is completed. For example, as shown in Fig. 5(A), it is also possible to perform the super-resolution processing while performing the frame interpolation processing. First, image data A is supplied from the image source. Since this is the original image data, it is not the image data created by the frame interpolation processing. Therefore, the super-resolution processing can be performed immediately. Next, image data B is the image source. This is possible.

[0117] Note that an example of the embodiment is not limited to performing the super-resolution processing after the frame interpolation processing is completed. For example, as shown in Fig. 5(A), it is also possible to perform the super-resolution processing while performing the frame interpolation processing. First, image data A is supplied from the image source. Since this is the original image data, it is not the image data created by the frame interpolation processing. Therefore, the super-resolution processing can be performed immediately. Next, image data B is the image source. This is the original image data, so it is not the image data created by the frame interpolation processing. Therefore, the super-resolution processing can be performed immediately. Next, image data B is supplied from the image source. This is not the image data created by the frame interpolation processing. Therefore, the super-resolution processing can be performed immediately. Next, image data B is supplied from the image source. - supplied from the source. Therefore, using the already supplied image data A and image data B, interpolate the frame data. When performing the frame interpolation process using image data A and image data B, super-resolution processing can be performed using image data A. That is, image data A is used for both the frame interpolation process and the super-resolution process. Therefore, it turns out that the super-resolution process and the frame interpolation process are performed simultaneously. After that, image data C is generated by the frame interpolation process using image data A and image data B. After that, the frame-interpolated image data C from image data A and image data B is subjected to super-resolution processing. By performing the frame interpolation process and the super-resolution process simultaneously in this way, the number of memories for storing image data A can be reduced. If image data A is stored in one memory, the processing can be performed by reading the data separately for the super-resolution process and the frame interpolation process. However, it can be said that the image data for which the frame data is created is subjected to super-resolution processing after the frame interpolation process. However, an example of the embodiment is not limited to these.

[0118] Similar to FIG. 1(B), regarding the super-resolution process, a plurality of processing systems can be provided to perform the super-resolution process and the frame interpolation process simultaneously. An example thereof is shown in FIG. 5(B). For example, at least for image data A, super-resolution processing is performed using super-resolution process 2. At the same time, frame interpolation processing is performed using at least image data A. That is, at least using image data A, simultaneously, the frame interpolation process and the super-resolution process are performed. After that, super ​Using the resolution processing 1, super-resolution processing is performed on the frame-interpolated image data. By providing a plurality of super-resolution processing systems in this way, processing can be performed simultaneously. In addition, frame data that is not created by frame interpolation can be quickly super-resolved by using the super-resolution processing 2. Therefore, once the image data is input powered, display can be performed quickly. Therefore, it is suitable when displaying an image that requires real-time processing such as a game. However, an example of the embodiment is not limited to this.

[0119] Note that when performing a plurality of processes simultaneously, processing can be performed simultaneously only in a part of each processing period. That is, even when performing a plurality of processes simultaneously it is possible to have a period during which a plurality of processes are not being performed simultaneously. Or, it is also possible to perform a plurality of processes simultaneously throughout the entire period of each processing period. Or, it may be as shown in Fig. 5(C). For example, at least for the image data A

[0120] super-resolution processing is performed using the super-resolution processing 1 or the super-resolution processing 2. At the same time, frame interpolation processing is performed using at least the image data A. That is, at least using the image data A, frame interpolation processing and super-resolution processing are performed simultaneously. Then, super-resolution processing is performed on the frame-interpolated image data using the super-resolution processing 2 or the super- resolution processing 1. In this way, by providing a plurality of super-resolution processing systems, processing can be performed simultaneously. Also, frame data that is not created by frame interpolation is processed by the super-resolution processing 1 or super-resolution processing 2 ​By using super-resolution processing 2, super-resolution processing can be performed quickly. Therefore , when image data is input, display can be performed quickly. Therefore, it is suitable for displaying an image that requires real-time processing such as a game . However, An example of the embodiment is not limited to this.

[0121] As an example, in FIGS. 1, 3, 4, and 5, the processing flow is shown. However, An example of the configuration (block diagram) for realizing this is shown in FIG. 6(A). For example, an image source is input to the input terminal of circuit 101 . And the output terminal of circuit 101 is connected to the input terminal of circuit 102 . As an example, circuit 101 has a function of performing frame interpolation processing . As an example, circuit 102 has a function of performing super-resolution processing. Circuit 101 or circuit 102 may have a storage circuit (memory) for storing information . Or, circuit 101 or circuit 102 may have a unit for calculation .

[0122] Or, another example of the configuration (block diagram) for realizing the processing flow is shown in FIG. 6(B). FIG. 6(B) corresponds to FIG. 1(B). For example, an image source is input to the input terminal of circuit 101 . And the output terminal of circuit 101 is connected to the input terminal of circuit 102a via switch 103a. Further, the output terminal of circuit 101 is connected to the input terminal of circuit 102b via switch 103 b. The output terminal of circuit 102a is connected to the output terminal via switch 104a. Further, the output terminal of circuit 102b is connected to the output terminal via switch 104b. Note that as shown in FIG. 6(C), ​ For example, switch 103b can also be connected between the input terminal of circuit 102b and the input terminal of circuit 101. Note that FIG. 6(C) corresponds to FIG. 5(B). Circuit 101 has a function of performing frame interpolation processing. Circuits 102a and 102b have a function of performing super-resolution processing. Circuit 101 or circuit 102 can have a storage circuit (memory) for storing information. Or, circuit 101 or circuit 102 can have a unit for calculation. By controlling switch 103a, switch 103b, switch 104a, and / or switch 104b respectively, processing can be performed simultaneously. Note that circuit 101, circuit 102, circuit 102a, and / or circuit 102b can each realize the functions they have using hardware, or using software, or using both hardware and software. By realizing with hardware, the processing speed can be increased. Or, the power consumption can be reduced. By realizing with software, the processing content can be changed to appropriately perform various processes. Or, by using a multi-core CPU having a plurality of CPU cores and distributing the processing to each CPU core, it is also possible to perform a plurality of super-resolution processes and frame interpolation processes. In this way, by using a multi-core CPU, high-speed processing can be performed with a small number of components. Note that such a multi-core CPU is a semiconductor device having SOI.

[0123]

[0124] It can be configured to have a device (or transistor). By using SOI , it can operate with low power consumption and also suppress heat generation during operation to a low level.

[0125] Even when the number of processes increases, the circuit can be configured as shown in FIG. 6 by increasing circuits such as circuit 101, circuit 102, circuit 102a, or circuit 1 02b. Note that the processes performed by circuit 101, circuit 102, circuit 102a, or circuit 102b are not limited to super-resolution processing or frame interpolation processing. It is possible to perform various other processes .

[0126] Note that in the content described so far and / or the content described below, instead of super-resolution processing, it is also possible to perform simple enlargement processing, etc.

[0127] (Embodiment 2) Next, an example of super-resolution processing technology will be described. By performing super-resolution processing, it becomes possible to display an image with high resolution .

[0128] First, a region with motion is detected and the velocity information of that region is extracted. That is, for an image at an arbitrary point in time, an optical flow, which is a vector representing the flow of each pixel from the two images before and after it, is obtained. Then, based on the extracted velocity information, the displacement amount per image of the region is detected with an accuracy less than the size of one pixel. That is, the displacement amount between the images is obtained from the obtained optical flow. Then, based on the detected displacement amount, the luminance values between pixels are interpolated from a plurality of images in the image sequence. By performing such processing, it is possible to generate an image with a resolution exceeding the physical resolution. Thus, the super-resolution processing technology is Information for high-resolution image restoration can be extracted and restored from a low-resolution image based on motion vector information and the like. It can be said that this is a technology for extraction and restoration.

[0129] As a method of similar super-resolution processing technology, for example, first, select consecutive frames with high correlation from the video. Then, detect the motion vector of the video at a fine scale close to the pixel unit. And track the motion at the pixel unit, and infer the missing high-resolution pixels from the change information of the tracked pixels between each frame. At this time, because the camera is slightly shaking, even though the same part is being photographed, the way the photographed low-resolution part is crushed is different between frames. Therefore, using this information, it is possible to fill in the missing pixels and increase the resolution. That is to say, it can be said that this processing method is a type of super-resolution processing technology that deeply explores in the time direction. In the case of this super-resolution processing, since the motion vector can be precisely grasped, it is also possible to restore the missing pixels between frames that could not be obtained due to the relationship of the camera resolution during shooting.

[0130] Or, as another super-resolution processing, investigate the similarity for a plurality of frames. Then, align the similar frames with each other and grasp the temporal change of each pixel. And it is possible to use the method of predicting and generating the lost high-resolution pixels.

[0131] Or, as another super-resolution processing, first, analyze a plurality of consecutive image information. Then, correct the common parts of the subject and restore the high-frequency components. As a result, a high-resolution image can be obtained.

[0132] Alternatively, as another super-resolution processing method, it is possible to use a reconstruction-type super-resolution processing method. Re In the reconstruction-type super-resolution processing method, first, a high-resolution image (initial high-resolution image) is assumed from the original low-resolution image. Then, based on the point spread function (PSF function) obtained by the camera model from the assumed high-resolution image, for each pixel of all the low-resolution images, its pixel value is estimated. That is, it is down-converted by a unique function (imaging model function) to create a low-resolution image identical to the original low-resolution image. Then, the difference between the estimated value and the observed pixel value ( observed value) is taken. And for the image before down-conversion, a high-resolution image is searched for such that the difference becomes small. Note that this search process can be repeated until convergence to improve the accuracy, or it is also possible to perform the search only once. Thereby, a high-resolution image can be obtained.

[0133] As the imaging model function, for example, it is possible to use an imaging element model in which a one-dimensional linear filter is applied two-dimensionally vertically and horizontally.

[0134] In the case of this reconstruction-type super-resolution processing method, a high-resolution image is reconstructed by iterative calculations that require an initial high-resolution image. And as the calculation method at that time, it is possible to use the ML (Maximum-likelihood) method, the MAP (Maximum A Post erior) method, or the POCS (Projection On to Convex Sets) method, etc.

[0135] In the ML method, the estimated pixel value from the assumed high-resolution image and the actually observed pixel value ​​Use the mean squared error as the evaluation function. Then, estimate the high-resolution image that minimizes the evaluation function. This is a method for setting the estimated image.

[0136] The MAP method is a method for estimating a high-resolution image that minimizes an evaluation function obtained by adding probability information of the high-resolution image to the mean squared error. That is, the MAP method is a super-resolution image processing method for estimating a high-resolution image as an optimization problem that maximizes the posterior probability by using certain prior information about the high-resolution image. That is, the MAP method estimates a high-resolution image as an optimization problem that maximizes the posterior probability by using certain prior information about the high-resolution image. That is, the MAP method estimates a high-resolution image as an optimization problem that maximizes the posterior probability by using certain prior information about the high-resolution image. This is a super-resolution image processing method.

[0137] The POCS method is a method for creating a system of simultaneous equations for the pixel values of the high-resolution image and the low-resolution image, and sequentially solving the equations. This is a method for sequentially solving the equations.

[0138] In addition, a plurality of frames of an image are combined into one frame. Then, the number of pixels is increased to increase the resolution of the image. At that time, it is also possible to perform super-resolution processing so as to cancel the aliasing component. In addition, a plurality of frames of an image are combined into one frame. Then, the number of pixels is increased to increase the resolution of the image. At that time, it is also possible to perform super-resolution processing so as to cancel the aliasing component. This is also possible.

[0139] Alternatively, as a super-resolution processing method, it is possible to use an iterative method, a frequency domain method, a statistical method, etc. In the case of the iterative method, it mainly consists of three stages. First, an initial estimate is made, second, there is an imaging process, and third, it consists of a reconstruction process. second, there is an imaging process, and third, it consists of a reconstruction process.

[0140] In addition, super-resolution processing can be performed on the entire screen. However, an example of the implementation form is not limited to these. Depending on the content of the image, it is possible to perform super-resolution processing. For example, in an image, in the edge part or the flat part, super-resolution processing is not performed, but in the texture part, it is possible to perform super-resolution processing. In that case, for the image, in real time but in the texture part, it is possible to perform super-resolution processing. In that case, for the image, in real time but in the texture part, it is possible to perform super-resolution processing. In that case, for the image, in real time Perform spectral analysis. Then, perform super-resolution processing only on the region having high frequencies. This is also possible. In this way, by controlling the presence or absence of super-resolution processing according to the image, it is possible to reduce the possibility that the image will deteriorate conversely.

[0141] Note that the flat part is a part where the frequency of a specific frequency region or a concentrated luminance region is highly distributed. Therefore, it corresponds to, for example, a sky with a relatively smooth color distribution or a blurred background. Thus, it can be said that it is mainly a region where gradation expression is the main in the image.

[0142] Note that the texture part is the part with high frequency of the image. In this region, since the frequency is high, there is a high possibility that more detailed parts exist. Therefore, it can be said that the effect of increasing the resolution by performing super-resolution processing in the texture part is very large.

[0143] Note that when performing super-resolution processing, it is also possible to recognize the resolution in various regions of the image and perform super-resolution processing with different intensities for each region.

[0144] Note that when the resolution of the original image is sufficiently high, it is possible not to perform super-resolution processing. It is also possible to determine whether the resolution of the original image is high and control whether to perform super-resolution processing according to the result.

[0145] As described above, there are various super-resolution processing techniques, but the super-resolution processing technique in this specification is not limited to these.

[0146] (Embodiment 3) ​​​​​​​​​​​After super-resolution processing or frame interpolation processing, various processes can be performed for display. Therefore, the content described in other embodiments can be applied to, combined with, or replaced in this embodiment.

[0147] In FIG. 7(A), a processing flow is shown when super-resolution processing is performed using an image signal subjected to frame interpolation processing, and after increasing the resolution, contour enhancement processing is performed. After the contour enhancement processing, various further processes are performed, and then the image can be displayed. Therefore, the processing flow in FIG. 7(A) corresponds to the case where contour enhancement processing is further performed on FIG. 1(A). After increasing the resolution, contour enhancement processing is performed. After the contour enhancement processing, various further processes are performed, and then the image can be displayed. Therefore, the processing flow in FIG. 7(A) corresponds to the case where contour enhancement processing is further performed on FIG. 1(A). After the contour enhancement processing, various further processes are performed, and then the image can be displayed. Therefore, the processing flow in FIG. 7(A) corresponds to the case where contour enhancement processing is further performed on FIG. 1(A). Therefore, the processing flow in FIG. 7(A) corresponds to the case where, with respect to FIG. 1(A), contour enhancement processing is further performed. corresponds.

[0148] In this way, by performing super-resolution processing before performing contour enhancement processing, the resolution can be accurately improved. The image before performing super-resolution processing has not undergone contour enhancement processing, so no unnecessary processing is performed. If contour enhancement processing is performed before super-resolution processing, it means that the image has been processed by the contour enhancement processing. Using an image on which such processing has been performed may prevent accurate super-resolution processing. Since super-resolution processing is a process of newly creating a high-resolution image, in order to accurately create a high-resolution image, it is desirable to perform super-resolution processing using an image on which contour enhancement processing has not been performed, that is, an image in a state close to the original image. Therefore, by performing super-resolution processing before performing contour enhancement processing, accurate super-resolution processing can be performed. And since contour enhancement processing can be performed using the more accurate and higher-resolution image created by the super-resolution processing, the contour of the object in the image can be obtained more accurately. The image before performing super-resolution processing has not undergone contour enhancement processing, so no unnecessary processing is performed. If contour enhancement processing is performed before super-resolution processing, it means that the image has been processed by the contour enhancement processing. Using an image on which such processing has been performed may prevent accurate super-resolution processing. Since super-resolution processing is a process of newly creating a high-resolution image, in order to accurately create a high-resolution image, it is desirable to perform super-resolution processing using an image on which contour enhancement processing has not been performed, that is, an image in a state close to the original image. Therefore, by performing super-resolution processing before performing contour enhancement processing, accurate super-resolution processing can be performed. And since contour enhancement processing can be performed using the more accurate and higher-resolution image created by the super-resolution processing, the contour of the object in the image can be obtained more accurately. The image before performing super-resolution processing has not undergone contour enhancement processing, so no unnecessary processing is performed. If contour enhancement processing is performed before super-resolution processing, it means that the image has been processed by the contour enhancement processing. Using an image on which such processing has been performed may prevent accurate super-resolution processing. Since super-resolution processing is a process of newly creating a high-resolution image, in order to accurately create a high-resolution image, it is desirable to perform super-resolution processing using an image on which contour enhancement processing has not been performed, that is, an image in a state close to the original image. Therefore, by performing super-resolution processing before performing contour enhancement processing, accurate super-resolution processing can be performed. And since contour enhancement processing can be performed using the more accurate and higher-resolution image created by the super-resolution processing, the contour of the object in the image can be obtained more accurately. If contour enhancement processing is performed before super-resolution processing, it means that the image has been processed by the contour enhancement processing. Using an image on which such processing has been performed may prevent accurate super-resolution processing. Since super-resolution processing is a process of newly creating a high-resolution image, in order to accurately create a high-resolution image, it is desirable to perform super-resolution processing using an image on which contour enhancement processing has not been performed, that is, an image in a state close to the original image. Therefore, by performing super-resolution processing before performing contour enhancement processing, accurate super-resolution processing can be performed. And since contour enhancement processing can be performed using the more accurate and higher-resolution image created by the super-resolution processing, the contour of the object in the image can be obtained more accurately. Using an image on which such processing has been performed may prevent accurate super-resolution processing. Since super-resolution processing is a process of newly creating a high-resolution image, in order to accurately create a high-resolution image, it is desirable to perform super-resolution processing using an image on which contour enhancement processing has not been performed, that is, an image in a state close to the original image. Therefore, by performing super-resolution processing before performing contour enhancement processing, accurate super-resolution processing can be performed. And since contour enhancement processing can be performed using the more accurate and higher-resolution image created by the super-resolution processing, the contour of the object in the image can be obtained more accurately. Since super-resolution processing is a process of newly creating a high-resolution image, in order to accurately create a high-resolution image, it is desirable to perform super-resolution processing using an image on which contour enhancement processing has not been performed, that is, an image in a state close to the original image. Therefore, by performing super-resolution processing before performing contour enhancement processing, accurate super-resolution processing can be performed. And since contour enhancement processing can be performed using the more accurate and higher-resolution image created by the super-resolution processing, the contour of the object in the image can be obtained more accurately. Since super-resolution processing is a process of newly creating a high-resolution image, in order to accurately create a high-resolution image, it is desirable to perform super-resolution processing using an image on which contour enhancement processing has not been performed, that is, an image in a state close to the original image. Therefore, by performing super-resolution processing before performing contour enhancement processing, accurate super-resolution processing can be performed. And since contour enhancement processing can be performed using the more accurate and higher-resolution image created by the super-resolution processing, the contour of the object in the image can be obtained more accurately. Since super-resolution processing is a process of newly creating a high-resolution image, in order to accurately create a high-resolution image, it is desirable to perform super-resolution processing using an image on which contour enhancement processing has not been performed, that is, an image in a state close to the original image. Therefore, by performing super-resolution processing before performing contour enhancement processing, accurate super-resolution processing can be performed. And since contour enhancement processing can be performed using the more accurate and higher-resolution image created by the super-resolution processing, the contour of the object in the image can be obtained more accurately. Since super-resolution processing is a process of newly creating a high-resolution image, in order to accurately create a high-resolution image, it is desirable to perform super-resolution processing using an image on which contour enhancement processing has not been performed, that is, an image in a state close to the original image. Therefore, by performing super-resolution processing before performing contour enhancement processing, accurate super-resolution processing can be performed. And since contour enhancement processing can be performed using the more accurate and higher-resolution image created by the super-resolution processing, the contour of the object in the image can be obtained more accurately. Since super-resolution processing is a process of newly creating a high-resolution image, in order to accurately create a high-resolution image, it is desirable to perform super-resolution processing using an image on which contour enhancement processing has not been performed, that is, an image in a state close to the original image. Therefore, by performing super-resolution processing before performing contour enhancement processing, accurate super-resolution processing can be performed. And since contour enhancement processing can be performed using the more accurate and higher-resolution image created by the super-resolution processing, the contour of the object in the image can be obtained more accurately. Since contour enhancement processing can be performed using the more accurate and higher-resolution image created by the super-resolution processing, the contour of the object in the image can be obtained more accurately. This enables a clearer image to be obtained. Therefore, in order to obtain an image with good image quality, it is important to perform super-resolution processing before performing edge enhancement processing. However, an example of the implementation form is not limited to this. Similarly, by performing frame interpolation processing before performing edge enhancement processing, accurate frame interpolation data can be created. Then, since edge enhancement processing can be performed using a more accurate and higher-resolution image, the outline of the object in the image can be obtained more accurately, so that a clearer image can be obtained.

[0149] Regarding the edge enhancement processing, an example of the implementation form is not limited to the above example, and other image processing can be performed. As other image processing, for example, smoothing, distortion correction, error processing, scratch correction, color correction, gamma correction, inverse gamma correction, etc. can be performed instead of, or in addition to, the edge enhancement processing. For example, by performing color correction, an image with an NTSC ratio of 100% or less can be converted into an image with an NTSC ratio of 100% or more. Thereby, an image with high color purity can be displayed.

[0150] Note that the edge enhancement processing is not limited to the above example, and other image processing can be performed. As other image processing, for example, smoothing, distortion correction, error processing, scratch correction, color correction, gamma correction, inverse gamma correction, etc. can be performed instead of, or in addition to, the edge enhancement processing. For example, by performing color correction, an image with an NTSC ratio of 100% or less can be converted into an image with an NTSC ratio of 100% or more. Thereby, an image with high color purity can be displayed.

[0151] When performing a plurality of image processing such as edge enhancement processing, it is possible to perform the processing continuously. However, an example of the implementation form is not limited to this. It is possible to perform a plurality of processes separately. For example, it is also possible to perform a certain image processing before a certain process A and another image processing after a certain process B.

[0152] Note that the content or drawings described in the case of Embodiment 1 are for performing other processing such as edge enhancement processing. This can also be applied in the same way. Similarly, the content or drawings described for performing a certain process can also be applied in the same way when performing another process. This can also be applied in the same way. Similarly, the content or drawings described for performing a certain process can also be applied in the same way when performing another process.

[0153] As an example, for super-resolution processing, the processing flow in the case of having multiple processing systems is shown in FIG. 7(B). The processing flow in FIG. 7(B) corresponds to the case where contour enhancement processing is performed with respect to FIG. 1(B). Note that it can also be applied in the same way for other processing flows. Note that it can also be applied in the same way for other processing flows.

[0154] It should be noted that various other processes can be performed before and after each stage in the processing flow. Examples of various other processes include IP conversion processing, enlargement processing, etc., and furthermore, other processes are also possible. Examples of various other processes include IP conversion processing, enlargement processing, etc., and furthermore, other processes are also possible. Examples of various other processes include IP conversion processing, enlargement processing, etc., and furthermore, other processes are also possible.

[0155] Next, as a process performed after super-resolution processing, similar to the case of contour enhancement processing, the processing flow for the case of over-drive processing is shown in FIG. 7(C). Therefore, the content or drawings described for the case of contour enhancement processing can also be applied in the same way when performing other processes such as over-drive processing. Similarly, the content or drawings described for performing a certain process can also be applied in the same way when performing another process. Next, as a process performed after super-resolution processing, similar to the case of contour enhancement processing, the processing flow for the case of over-drive processing is shown in FIG. 7(C). Therefore, the content or drawings described for the case of contour enhancement processing can also be applied in the same way when performing other processes such as over-drive processing. Similarly, the content or drawings described for performing a certain process can also be applied in the same way when performing another process. Next, as a process performed after super-resolution processing, similar to the case of contour enhancement processing, the processing flow for the case of over-drive processing is shown in FIG. 7(C). Therefore, the content or drawings described for the case of contour enhancement processing can also be applied in the same way when performing other processes such as over-drive processing. Similarly, the content or drawings described for performing a certain process can also be applied in the same way when performing another process. Next, as a process performed after super-resolution processing, similar to the case of contour enhancement processing, the processing flow for the case of over-drive processing is shown in FIG. 7(C). Therefore, the content or drawings described for the case of contour enhancement processing can also be applied in the same way when performing other processes such as over-drive processing. Similarly, the content or drawings described for performing a certain process can also be applied in the same way when performing another process. Next, as a process performed after super-resolution processing, similar to the case of contour enhancement processing, the processing flow for the case of over-drive processing is shown in FIG. 7(C). Therefore, the content or drawings described for the case of contour enhancement processing can also be applied in the same way when performing other processes such as over-drive processing. Similarly, the content or drawings described for performing a certain process can also be applied in the same way when performing another process.

[0156] Over-drive processing is a process for increasing the response speed of liquid crystal elements. Usually, a signal corresponding to the gradation to be displayed for each pixel in the screen is supplied. However, in the case of liquid crystal elements, since the response speed is slow, even if a signal corresponding to the gradation is supplied, it is not possible to perform a display corresponding to the gradation within one frame period, and after several frame periods have elapsed, finally, the gradation Over-drive processing is a process for increasing the response speed of liquid crystal elements. Usually, a signal corresponding to the gradation to be displayed for each pixel in the screen is supplied. However, in the case of liquid crystal elements, since the response speed is slow, even if a signal corresponding to the gradation is supplied, it is not possible to perform a display corresponding to the gradation within one frame period, and after several frame periods have elapsed, finally, the gradation Over-drive processing is a process for increasing the response speed of liquid crystal elements. Usually, a signal corresponding to the gradation to be displayed for each pixel in the screen is supplied. However, in the case of liquid crystal elements, since the response speed is slow, even if a signal corresponding to the gradation is supplied, it is not possible to perform a display corresponding to the gradation within one frame period, and after several frame periods have elapsed, finally, the gradation Over-drive processing is a process for increasing the response speed of liquid crystal elements. Usually, a signal corresponding to the gradation to be displayed for each pixel in the screen is supplied. However, in the case of liquid crystal elements, since the response speed is slow, even if a signal corresponding to the gradation is supplied, it is not possible to perform a display corresponding to the gradation within one frame period, and after several frame periods have elapsed, finally, the gradation It will perform a display that matches. Therefore, when supplying a voltage to the liquid crystal element, instead of supplying a voltage that matches the original gradation, a voltage with a larger amplitude value is supplied to the liquid crystal element. As a result, the transmittance of the liquid crystal element changes rapidly. After that, a voltage that matches the original gradation is supplied. By the above operation, the response speed of the liquid crystal element can be increased. In this way, a voltage with a larger amplitude value than the voltage that matches the original gradation is temporarily supplied to the liquid crystal element before supplying the voltage that matches the original gradation, which is called over-drive driving. And the process of determining how much voltage to supply as a voltage with a larger amplitude value than the voltage that matches the original gradation is called over-drive processing. After performing the super-resolution processing in this way and then performing the over-drive processing, the response speed can be increased, the over-drive amount can be set to an appropriate size, and a display with less afterimage can be performed. Or, since the super-resolution processing is a process of creating a new image, the image changes by that process. Along with that, the gradation of each pixel changes. Therefore, after performing the super-resolution processing and then performing the over-drive processing, it becomes possible to change the over-drive processing according to the amount of change caused by the super-resolution processing. Therefore, after performing the super-resolution processing and then performing the over-drive processing,

[0157] the over-drive amount can be set to an appropriate size, so that each pixel can be set to an optimal gradation. Therefore, the response speed can be increased, and the over-drive drive can be performed accurately. Furthermore, by the super-resolution processing, a high-resolution display can be obtained without afterimage. Or, since the super-resolution processing is a process of creating a new image, the image changes by that process. Along with that, the gradation of each pixel changes. Therefore, after performing the super-resolution processing and then performing the over-drive processing, it becomes possible to change the over-drive processing according to the amount of change caused by the super-resolution processing. Therefore, after performing the super-resolution processing and then performing the over-drive processing, the over-drive amount can be set to an appropriate size, so that each pixel can be set to an optimal gradation. Therefore, the response speed can be increased, and the over-drive drive can be performed accurately. Furthermore, by the super-resolution processing, a high-resolution display can be obtained without afterimage. By performing the over-drive processing after the super-resolution processing, the over-drive amount can be set to an appropriate size, so that each pixel can be set to an optimal gradation. Therefore, the response speed can be increased, and the over-drive drive can be performed accurately. Furthermore, by the super-resolution processing, a high-resolution display can be obtained without afterimage. By performing the over-drive processing after the super-resolution processing, the over-drive amount can be set to an appropriate size, so that each pixel can be set to an optimal gradation. Therefore, the response speed can be increased, and the over-drive drive Therefore, in order to obtain a good quality image, overdrive processing is required. It is important to perform super-resolution processing before performing the above. However, this embodiment is not limited to this. Not determined.

[0158] Here, the overdrive amount is the amount of the change in the voltage applied to the liquid crystal element, etc., by the overdrive process. The amplitude of the voltage supplied to the amplifier increases, and this refers to the amount of voltage increase at that time.

[0159] Similarly, by performing overdrive processing after frame interpolation processing, The response speed can be increased, the amount of overdrive can be set to an appropriate value, and the remaining Or, the frame interpolation process can be used to display new frame data. Since this is a process that creates data, the process results in a changed image. As a result, the gradation of each pixel changes. Therefore, after frame interpolation processing, By performing overdrive processing, the amount of change caused by frame interpolation processing is reduced. The overdrive processing can be changed accordingly. After processing, overdrive processing is performed to adjust the overdrive amount appropriately. Since the size can be adjusted to an appropriate value, each pixel can be set to an optimal gradation. The response speed can be increased, and overdrive driving can be performed accurately. In addition, frame interpolation processing can be used to obtain a display with less afterimages. To obtain high-quality images, frame interpolation is performed before overdrive processing. However, the embodiment is not limited to this example.

[0160] In addition, in the area where there is movement on the screen, overdrive processing is often performed. And in the area where there is no movement on the screen, since there is no afterimage, overdrive processing is rarely performed. That is, in the screen, there are areas where overdrive processing is performed and areas where overdrive processing is not performed. And those areas change every moment. Thus, when performing overdrive processing only in some areas of the screen, there are advantages such as improvement in processing speed, lower power consumption, or improvement in processing accuracy.

[0161] On the other hand, in super-resolution processing as well, it is also possible to perform it not in all areas of the screen but only in some areas. Thus, when performing super- resolution processing only in some areas of the screen, there are advantages such as improvement in processing speed, lower power consumption, improvement in processing

[0162] accuracy, or reduction in image quality defects. When processing is performed in some areas of the screen, in the screen, there is a first area where overdrive processing is performed and a second area where super-resolution processing is performed. Furthermore, it is also possible that there is a third area where neither of the two processes is performed. And it is possible that there is an area

[0163] in the screen where the first area where overdrive processing is performed and the second area where super-resolution processing is performed do not overlap. Or it is In the first area where processing is performed, since it is an area with movement, in order to prevent afterimages from being visible overdrive processing is performed. However, in such an area with movement, even if super-resolution processing is performed to increase the resolution, it may be difficult for the human eye to recognize that resolution There is a possibility. Therefore, in such an area with movement, there are cases where super-resolution processing is not performed As a result, in such cases, there may be an area where the first area where overdrive processing is performed and the second area where super-resolution processing is performed do not overlap It can be said. And in such a case, in the second area where super-resolution processing is performed, it is an area where it is desirable to clearly see even fine parts. When displaying an image like a still image without movement, it is possible to clearly see even fine parts. As a result, it can be said that there may be an area where the first area where overdrive processing is performed and the second area where super-resolution processing is performed do not overlap each other.

[0164] In the area where the first area where overdrive processing is performed and the second area where super-resolution processing overlap an image with a high response speed, few afterimages, and clear visibility of even fine parts can be displayed, so an image with a sense of presence can be displayed.

[0165] So far, when performing contour enhancement processing or overdrive processing after super-resolution processing has been described, but the processing performed after super-resolution processing is not limited to these. Similar to the case of performing contour enhancement processing or overdrive processing, it is also possible to perform local dimming (local brightness control of the backlight) processing after super-resolution processing. In that case, the processing The processing flow is shown in FIG. 7(D). Therefore, the content or drawings described for performing edge enhancement processing or over-drive processing can be similarly applied when performing local dimming (local brightness control of the backlight) processing. Similarly, the content or drawings described for performing local dimming (local brightness control of the backlight) processing can be similarly applied when performing another processing. Here, local dimming (local brightness control of the backlight) is a technology for performing display by changing the brightness of the backlight in each area within the screen. Therefore, according to the image, the brightness of the backlight will be different for each area within one screen. For example, when there is an area for displaying a low gradation within the screen, the brightness of the backlight in that area is reduced. Further, when there is an area for displaying a high gradation within the screen, the brightness of the backlight in that area is increased. And on the premise of those backlight brightnesses, the transmittance of each pixel is determined so as to be able to display a correct image. As a result, in the area for displaying a low gradation within the screen, since the brightness of the backlight itself is low, the influence of light leakage can be reduced. Therefore, when it is desired to display black in such an area, it can be displayed as complete black. Also, in the area for displaying a high gradation within the screen, since the brightness of the backlight itself is high, a sufficiently bright display can be performed. Therefore, when it is desired to display white in such an area, the brightness can be made higher than in the case of normal white, and the peak brightness can be increased for display. Therefore, the contrast can be improved.

[0166] ​​​​​​​​​​​​​​​​, an image with sharpness can be displayed. Furthermore, with local dimming, the brightness of the backlight itself can also be lowered, making it possible to reduce power consumption. Thus, in order to perform local dimming, according to the image to be displayed, there are processes for determining the brightness of the backlight for each region, and processes for determining the transmittance of each pixel so that the image to be displayed can be correctly displayed based on that backlight brightness. These processes, or some of these processes, are called local dimming processes. Therefore, in the local dimming process, after performing the process of determining the brightness of the backlight for each region, it is possible to perform the process of determining the video signal supplied to each pixel. However, an example of the embodiment is not limited to this. Therefore, as an example, the process flow when separately describing the process of determining the brightness of the backlight for each region and the process of determining the video signal supplied to each pixel can also be represented as shown in Fig. 7(E). That is, after performing super-resolution processing, it is preferable to perform local dimming processing. When super-resolution processing is performed, a state is created where new information is added due to the restoration of information. Therefore, the number of gradations of each pixel may be different before and after super-resolution processing. Or, there will be a region within the screen where the number of gradations of the pixels changes before and after super-resolution processing. Therefore, after the image information has been restored by super-resolution processing, by performing local dimming processing, it is possible to accurately perform local dimming processing, thereby improving the contrast and displaying an accurate image. Therefore, it is possible to perform the process of determining the brightness of the backlight for each region, and then perform the process of determining the video signal supplied to each pixel. However, an example of the embodiment is not limited to this. Therefore, as an example, the process flow when separately describing the process of determining the brightness of the backlight for each region and the process of determining the video signal supplied to each pixel can also be represented as shown in Fig. 7(E). However, an example of the embodiment is not limited to this. Therefore, as an example, the process flow when separately describing the process of determining the brightness of the backlight for each region and the process of determining the video signal supplied to each pixel can also be represented as shown in Fig. 7(E). That is, after performing super-resolution processing, it is preferable to perform local dimming processing. When super-resolution processing is performed, a state is created where new information is added due to the restoration of information. Therefore, the number of gradations of each pixel may be different before and after super-resolution processing. Or, there will be a region within the screen where the number of gradations of the pixels changes before and after super-resolution processing. Therefore, after the image information has been restored by super-resolution processing, by performing local dimming processing, it is possible to accurately perform local dimming processing, thereby improving the contrast and displaying an accurate image. Therefore,

[0167] After performing super-resolution processing in this way, it is suitable to perform local dimming processing. When super-resolution processing is performed, a state is created where new information is added due to the restoration of information. Therefore, the number of gradations of each pixel may be different before and after super-resolution processing. Or, there will be a region within the screen where the number of gradations of the pixels changes before and after super-resolution processing. Therefore, after the image information has been restored by super-resolution processing, by performing local dimming processing, it is possible to accurately perform local dimming processing, thereby improving the contrast and displaying an accurate image. Therefore, it is possible to accurately perform local dimming processing, thereby improving the contrast and displaying an accurate image. Therefore, it is possible to accurately perform local dimming processing, thereby improving the contrast and displaying an accurate image. Therefore, it is possible to accurately perform local dimming processing, thereby improving the contrast and displaying an accurate image. Therefore, it is possible to accurately perform local dimming processing, thereby improving the contrast and displaying an accurate image. Therefore, the contrast can be improved and an accurate image can be displayed. Therefore, To obtain a good quality image, perform super-resolution processing before performing local dimming processing. It is also important to determine the brightness of the backlight in local dimming processing. It is important to perform super-resolution processing before performing processing to determine the local dimming. In the image processing, super-resolution processing is performed before the process of determining the video signal to be supplied to the pixel is performed. However, the embodiment is not limited to these examples.

[0168] Furthermore, when local dimming is in operation, the backlight brightness is reduced. Therefore, even if the transmittance of the pixel changes slightly, the actual display gradation does not change much. In other words, when the backlight brightness is low, the transmittance of the pixel can be changed. This makes it possible to express finer gradations. Therefore, local dimming processing and super-resolution processing can be performed. By performing both of these functions, high-resolution images can be displayed with high expressiveness, allowing even the finest details to be distinguished. In particular, it is possible to properly express gradation in dark gradation areas on the screen. This makes it possible to avoid displaying images with a loss of gradation.

[0169] In addition, local dimming processing is performed in areas of the screen where there are many displays with small gradations. In areas where there are many displays with a large number of gradations on the screen, In areas with high brightness and many bright displays, it is difficult to reduce the brightness of the backlight. Cardimming processing is rarely performed. In other words, local dimming is performed within the screen. There are areas where local dimming processing is performed and areas where local dimming processing is not performed. Thus, those areas change constantly. In this way, when performing local dimming processing only in some areas within the screen, there are advantages such as an improvement in processing speed, power consumption reduction, or an improvement in processing accuracy.

[0170] On the other hand, in super-resolution processing as well, it is also possible to perform it not in all areas but only in some areas within the screen. In this way, when performing super-resolution processing only in some areas within the screen, there are advantages such as an improvement in processing speed, power consumption reduction, improvement in processing accuracy, or reduction of image quality defects.

[0171] When processing is performed in some areas of the screen, within the screen, there is a first area where local dimming processing is performed and the backlight brightness is reduced, and a second area where super-resolution processing is performed. Furthermore, it is also possible that there is a third area where neither local dimming processing nor super-resolution processing is performed. And it is possible that within the screen, there is an area where the first area where local dimming processing is performed and the backlight brightness is reduced and the second area where super-resolution processing is performed do not overlap. Or, it is possible that within the screen, there is an area where the first area and the second area overlap.

[0172] In an area where the first area where local dimming processing is performed and the backlight brightness is reduced and the second area where super-resolution processing is performed overlap, the contrast is high, and it is possible to display an image with a smooth gradation expression and to clearly see even fine parts, so an image with a sense of presence can be displayed.

[0173] In the case where local dimming is performed, the inside of the screen is divided into a plurality of regions, and each respective backlight is arranged in each region. Comparing the length (or width) of the region, or the pitch of the region, with the length (or width) of the pixel of the display device that performs super-resolution processing in a partial region of the screen and displays an image region with improved resolution, or the pitch, it is preferable that the length (or width) of the region of the backlight, or the pitch of the region, is longer. This is because when local dimming is performed, not only the luminance of the backlight in each region but also the transmittance of the pixels is controlled to display an image. Therefore, even in the case of displaying an image subjected to super-resolution processing, as long as the length (or width) of the region of the backlight, or the pitch of the region, is long, and the pitch of each pixel is short, a sufficiently clear high-resolution display can be performed. It is desirable to divide the region for controlling the luminance of the backlight into a plurality within the screen, but an example of the embodiment is not limited to these. It is also possible to control the luminance of the entire screen without dividing the screen into a plurality of regions. Similarly, it is preferable to perform local dimming processing after performing frame interpolation processing. Since frame interpolation processing is a process of creating new frame data, by this process, a changed image is created. Along with this, the gradation of each pixel changes. Or, a region where the number of gradations of the pixels changes exists within the screen before and after the frame interpolation processing.

[0174] Therefore, after new frame data is created by frame interpolation processing, by performing local dimming processing, the local dimming processing can be accurately performed.

[0175] ​​​​​​​Since it can be performed, the contrast can be improved and an accurate image can be displayed. This can be achieved. Therefore, in order to obtain an image with good image quality, it is important to perform frame interpolation processing before performing local dimming processing. Alternatively, in the local dimming processing it is important to perform frame interpolation processing before performing the process of determining the brightness of the backlight. Alternatively, in the local dimming processing, it is important to perform frame interpolation processing before performing the process of determining the video signal supplied to the pixel. However, an example of the embodiment is not limited to these.

[0176] In FIG. 7, the case of performing super-resolution processing, frame interpolation processing, and other processing, for example, contour enhancement processing, over-drive processing, and local dimming (local brightness control of the backlight) processing is shown. However, an example of the embodiment is not limited to these, and in addition to these, it is also possible to further perform processing such as contour enhancement processing, over-drive processing, and local dimming (local brightness control of the backlight) processing. Therefore, the content described so far or the drawings can be similarly applied even when further other processing is performed.

[0177] For example, in addition to super-resolution processing, frame interpolation processing, and contour enhancement processing, the processing flow when further performing another process is shown in FIGS. 8(A) and 8(B). That is, it corresponds to the case where further other processing is performed on the content described in FIGS. 7(A) and 1(A). However, an example of the embodiment is not limited to these.

[0178] In FIG. 8(A), using the image signal obtained from the image source, frame interpolation processing is performed, and the frame After the frame frequency has increased, perform super-resolution processing to increase the resolution, and then perform edge enhancement processing The processing flow in the case of performing edge enhancement processing after that and then performing over-drive processing is shown. Therefore, FIG. 8 (A)'s processing flow also corresponds to the case where edge enhancement processing is performed with respect to FIG. 7(C). The processing flow of FIG. 8(A) also corresponds to the case where edge enhancement processing and over-drive processing are performed with respect to FIG. 1(A).

[0179] Note that after over-drive processing is performed, various further processes are performed, and then the image can be displayed.

[0180] Note that, similar to FIG. 1(B), FIG. 1(C), FIG. 5(B), FIG. 5(C), FIG. 7(B), etc., it is possible to perform super-resolution processing having a plurality of processing systems. An example in that case is shown in FIG. 9(A) and FIG. 9(B).

[0181] By performing super-resolution processing before performing edge enhancement processing, such as in FIG. 8(A), FIG. 9(A), or FIG. 9(B), the resolution can be accurately improved. Since the image before performing super-resolution processing has no edge enhancement processing, no unnecessary processing is performed. Therefore, super-resolution processing can be accurately performed. Before performing super-resolution processing, the image has no edge enhancement processing, so no unnecessary processing is performed. Therefore, super-resolution processing can be accurately performed. Before performing super-resolution processing, the image has no edge enhancement processing, so no unnecessary processing is performed. Therefore, super-resolution processing can be accurately performed. Therefore, super-resolution processing can be accurately performed.

[0182] Similarly, in order to perform frame interpolation processing before performing edge enhancement processing, frame interpolation data can be accurately created. Then, using a more accurate and higher-resolution image, edge enhancement processing can be performed, so the outline of the object in the image can be more accurately obtained and a clearer image can be obtained.

[0183] Alternatively, after performing super-resolution processing, edge enhancement processing, and frame interpolation processing, over drive processing is performed to increase the response speed, and the over-drive amount can be set to an appropriate size, enabling display with less afterimage. Or, due to frame interpolation processing, the frame frequency increases, and accordingly, the over-drive processing can also be changed. Or, as the image changes due to super-resolution processing, edge enhancement processing, and frame interpolation processing, the gradation of each pixel changes, so the over-drive processing can also be changed according to the amount of change. Therefore, after performing super-resolution processing, edge enhancement processing, and frame interpolation processing, over-drive processing is performed to set the over-drive amount to an appropriate size, so each pixel can be set to an optimal gradation. Thus, the response speed can be increased, and accurate over-drive driving can be performed. Furthermore, due to super-resolution processing, a high-resolution display can be obtained without afterimage. Also, due to edge enhancement processing, a clear image with distinct contours can be displayed. Or, due to frame interpolation processing, afterimage can be reduced, and a video can be accurately displayed. Therefore, in order to obtain an image with good image quality, it is important to perform super-resolution processing, edge enhancement processing, and frame interpolation processing before performing over-drive processing. However, an example of the embodiment is not limited to this.

[0184] In FIG. 8(B), using the image signal obtained from the image source, frame interpolation processing is performed, and after the frame frequency increases, super-resolution processing is performed to increase the resolution, and then edge enhancement processing is Shows the processing flow when performing local dimming processing after that operation. Therefore, the processing flow in FIG. 8(B) also corresponds to the case where edge enhancement processing is performed on FIG. 7(D). .

[0185] Note that after local dimming processing is performed, various additional processes are carried out, and then the image can be displayed.

[0186] In this way, by performing super-resolution processing before edge enhancement processing, the resolution can be accurately improved. The image before super-resolution processing has not undergone edge enhancement processing , so no unnecessary processing is carried out. Therefore, super-resolution processing can be accurately performed.

[0187] Similarly, in order to perform frame interpolation processing before edge enhancement processing, frame interpolation data can be accurately created. Then, using a more accurate and higher-resolution image, edge enhancement processing can be performed, so the edge can be obtained more accurately, and a clearer image can be obtained.

[0188] Alternatively, it is preferable to perform local dimming processing after super-resolution processing, edge enhancement processing, and frame interpolation processing. When super-resolution processing is performed, new information is added as if by information restoration. Therefore, the number of gradations of each pixel may be different before and after super-resolution processing. Or, there may be areas where the number of gradations of pixels changes before and after super-resolution processing within the screen. Similarly, through edge enhancement processing, the outline of objects in the image is processed into an image where the outline is emphasized. Therefore, areas where the number of gradations of pixels changes are within the screen . will exist. Similarly, new frames are created by frame interpolation processing , and new images are created. Therefore, an area where the number of gradations of pixels changes will exist within the screen . Therefore, new frames are created by frame interpolation processing, and the image information is restored by super-resolution processing, and after the image is processed by edge enhancement processing , local dimming processing is performed, so that local dimming processing can be accurately performed, the contrast can be improved, and an accurate image can be displayed. Therefore, in order to obtain an image with good image quality, it is important to perform super-resolution processing, edge enhancement processing, and frame interpolation processing before performing local dimming processing . Or, in local dimming processing, it is important to perform super-resolution processing, edge enhancement processing, and frame interpolation processing before performing the processing for determining the luminance of the backlight . Or, in local dimming processing, it is important to perform super-resolution processing, edge enhancement processing, and frame interpolation processing before performing the processing for determining the video signal supplied to the pixels . However, an example of the embodiment is not limited to these . FIG. 8(C) shows a processing flow in the case where frame interpolation is performed using the image signal obtained from the image source, super-resolution processing is performed, the resolution is increased, then local dimming processing is performed, and then overdrive processing is performed . Therefore, the processing flow of FIG. 8(C) also corresponds to the case where local dimming processing is performed with respect to FIG. 8(A). Or, the processing flow of FIG. 8(C ) also corresponds to the case where overdrive processing is performed with respect to FIG. 8(B . However, an example of the embodiment is not limited to these . However, an example of the embodiment is not limited to these

[0189] In FIG. 8(C), frame interpolation is performed using the image signal obtained from the image source, super-resolution processing is performed, after increasing the resolution, local dimming processing is performed, and then overdrive processing is performed. Therefore, the processing flow of FIG. 8(C) also corresponds to the case where local dimming processing is performed with respect to FIG. 8(A). Or, the processing flow of FIG. 8(C ) also corresponds to the case where overdrive processing is performed with respect to FIG. 8(B . Therefore, the processing flow of FIG. 8(C) also corresponds to the case where local dimming processing is performed with respect to FIG. 8(A). Or, the processing flow of FIG. 8(C ) also corresponds to the case where overdrive processing is performed with respect to FIG. 8(B Or, the processing flow of FIG. 8(C) also corresponds to the case where over-drive processing and local dimming processing are performed on FIG. 1(A). Or, the processing flow of FIG. 8(C) also corresponds to the case where local dimming processing is performed on FIG. 7(C). Or, the processing flow of FIG. 8(C) also corresponds to the case where local dimming processing is performed on FIG. 7(D). Thus, it is preferable to perform local dimming processing after performing super-resolution processing and frame interpolation processing. When super-resolution processing is performed, new information is added due to information restoration. Therefore, the number of gradations of each pixel may be different before and after super-resolution processing. Or, there may be a region where the number of gradations of pixels changes within the screen before and after super-resolution processing. Similarly, a new frame is created by frame interpolation processing, and a new image is created. Therefore, there will be a region where the number of gradations of pixels changes within the screen. Therefore, after a new frame is created by frame interpolation processing and the image information is restored by super-resolution processing, local dimming processing is performed, so that local dimming processing can be accurately performed, the contrast can be improved, and an accurate image can be displayed. Therefore, in order to obtain an image with good image quality, it is important to perform super-resolution processing and frame interpolation processing before performing local dimming processing. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before performing the processing for determining the brightness of the backlight. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before determining the video signal supplied to the pixels Or, the processing flow of FIG. 8(C) also corresponds to the case where local dimming processing is performed on FIG. 7(C). Or, the processing flow of FIG. 8(C) also corresponds to the case where local dimming processing is performed on FIG. 7(D). Or, the processing flow of FIG. 8(C) also corresponds to the case where local dimming processing is performed on FIG. 7(D). Case.

[0190] Thus, after performing super-resolution processing and frame interpolation processing, it is preferable to perform local dimming processing. When super-resolution processing is performed, new information is added due to information restoration. Therefore, the number of gradations of each pixel may be different before and after super-resolution processing. Or, there may be a region where the number of gradations of pixels changes within the screen before and after super-resolution processing. Similarly, a new frame is created by frame interpolation processing, and a new image is created. Therefore, there will be a region where the number of gradations of pixels changes within the screen. Therefore, after a new frame is created by frame interpolation processing and the image information is restored by super-resolution processing, local dimming processing is performed, so that local dimming processing can be accurately performed, the contrast can be improved, and an accurate image can be displayed. Therefore, in order to obtain an image with good image quality, it is important to perform super-resolution processing and frame interpolation processing before performing local dimming processing. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before performing the processing for determining the brightness of the backlight. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before determining the video signal supplied to the pixels When super-resolution processing is performed, new information is added due to information restoration. Therefore, the number of gradations of each pixel may be different before and after super-resolution processing. Or, there may be a region where the number of gradations of pixels changes within the screen before and after super-resolution processing. Similarly, a new frame is created by frame interpolation processing, and a new image is created. Therefore, there will be a region where the number of gradations of pixels changes within the screen. Therefore, after a new frame is created by frame interpolation processing and the image information is restored by super-resolution processing, local dimming processing is performed, so that local dimming processing can be accurately performed, the contrast can be improved, and an accurate image can be displayed. Therefore, in order to obtain an image with good image quality, it is important to perform super-resolution processing and frame interpolation processing before performing local dimming processing. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before performing the processing for determining the brightness of the backlight. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before determining the video signal supplied to the pixels Therefore, the number of gradations of each pixel may be different before and after super-resolution processing. Or, there may be a region where the number of gradations of pixels changes within the screen before and after super-resolution processing. Similarly, a new frame is created by frame interpolation processing, and a new image is created. Therefore, there will be a region where the number of gradations of pixels changes within the screen. Therefore, after a new frame is created by frame interpolation processing and the image information is restored by super-resolution processing, local dimming processing is performed, so that local dimming processing can be accurately performed, the contrast can be improved, and an accurate image can be displayed. Therefore, in order to obtain an image with good image quality, it is important to perform super-resolution processing and frame interpolation processing before performing local dimming processing. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before performing the processing for determining the brightness of the backlight. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before determining the video signal supplied to the pixels Or, there may be a region where the number of gradations of pixels changes within the screen before and after super-resolution processing. Similarly, a new frame is created by frame interpolation processing, and a new image is created. Therefore, there will be a region where the number of gradations of pixels changes within the screen. Therefore, after a new frame is created by frame interpolation processing and the image information is restored by super-resolution processing, local dimming processing is performed, so that local dimming processing can be accurately performed, the contrast can be improved, and an accurate image can be displayed. Therefore, in order to obtain an image with good image quality, it is important to perform super-resolution processing and frame interpolation processing before performing local dimming processing. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before performing the processing for determining the brightness of the backlight. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before determining the video signal supplied to the pixels Similarly, a new frame is created by frame interpolation processing, and a new image is created. Therefore, there will be a region where the number of gradations of pixels changes within the screen. Therefore, after a new frame is created by frame interpolation processing and the image information is restored by super-resolution processing, local dimming processing is performed, so that local dimming processing can be accurately performed, the contrast can be improved, and an accurate image can be displayed. Therefore, in order to obtain an image with good image quality, it is important to perform super-resolution processing and frame interpolation processing before performing local dimming processing. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before performing the processing for determining the brightness of the backlight. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before determining the video signal supplied to the pixels A new image is created. Therefore, there will be a region where the number of gradations of pixels changes within the screen. Therefore, after a new frame is created by frame interpolation processing and the image information is restored by super-resolution processing, local dimming processing is performed, so that local dimming processing can be accurately performed, the contrast can be improved, and an accurate image can be displayed. Therefore, in order to obtain an image with good image quality, it is important to perform super-resolution processing and frame interpolation processing before performing local dimming processing. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before performing the processing for determining the brightness of the backlight. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before determining the video signal supplied to the pixels Therefore, there will be a region where the number of gradations of pixels changes within the screen. Therefore, after a new frame is created by frame interpolation processing and the image information is restored by super-resolution processing, local dimming processing is performed, so that local dimming processing can be accurately performed, the contrast can be improved, and an accurate image can be displayed. Therefore, in order to obtain an image with good image quality, it is important to perform super-resolution processing and frame interpolation processing before performing local dimming processing. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before performing the processing for determining the brightness of the backlight. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before determining the video signal supplied to the pixels After the image information is restored by super-resolution processing, local dimming processing is performed, so that local dimming processing can be accurately performed, the contrast can be improved, and an accurate image can be displayed. Therefore, in order to obtain an image with good image quality, it is important to perform super-resolution processing and frame interpolation processing before performing local dimming processing. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before performing the processing for determining the brightness of the backlight. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before determining the video signal supplied to the pixels So that local dimming processing can be accurately performed, the contrast can be improved, and an accurate image can be displayed. Therefore, in order to obtain an image with good image quality, it is important to perform super-resolution processing and frame interpolation processing before performing local dimming processing. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before performing the processing for determining the brightness of the backlight. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before determining the video signal supplied to the pixels Therefore, in order to obtain an image with good image quality, it is important to perform super-resolution processing and frame interpolation processing before performing local dimming processing. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before performing the processing for determining the brightness of the backlight. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before determining the video signal supplied to the pixels Therefore, in order to obtain an image with good image quality, it is important to perform super-resolution processing and frame interpolation processing before performing local dimming processing. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before performing the processing for determining the brightness of the backlight. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before determining the video signal supplied to the pixels Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before performing the processing for determining the brightness of the backlight. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before determining the video signal supplied to the pixels Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before performing the processing for determining the brightness of the backlight. Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before determining the video signal supplied to the pixels Or, in local dimming processing, it is important to perform super-resolution processing and frame interpolation processing before determining the video signal supplied to the pixels Before performing the processing to be done, it is important to perform super-resolution processing and frame interpolation processing. However an example of an embodiment is not limited to these.

[0191] Or, after performing frame interpolation processing, super-resolution processing, and local dimming processing, by performing overdrive processing, the response speed can be increased, the amount of overdrive can be set to an appropriate size, and a display with less afterimage can be achieved. Or by frame interpolation processing, super-resolution processing, and local dimming processing, as the brightness of an image or backlight changes, the gradation of each pixel changes, and accordingly the overdrive processing can also be changed. Therefore, after performing frame interpolation processing, super-resolution processing, and local dimming processing, by performing overdrive processing, the amount of overdrive can be set to an appropriate size, so that each pixel can be set to an optimal gradation. Thus, the response speed can be increased, and accurate overdrive driving can be performed. Furthermore, by super-resolution processing, a high-resolution display can be obtained without afterimage. Also, by local dimming processing, an image with high contrast can be displayed. Or, by frame interpolation processing, afterimage can be reduced and a video can be accurately displayed. Therefore, in order to obtain an image with good image quality, it is important to perform frame interpolation processing, super-resolution processing, and local dimming processing before performing overdrive processing. However, an example of an embodiment is not limited to this .

[0192] .

[0192] In this way, when both local dimming processing and overdrive processing are performed, as shown in FIG. 8 As shown in (D), after performing local dimming processing, it is preferable to perform over-drive processing. However, an example of an embodiment is not limited to this. Note that it is possible to perform various other processes before and after each stage in the processing flow. Examples of various other processes include super-resolution processing, edge enhancement processing, frame interpolation processing, over-drive processing, local dimming processing, IP conversion processing, enlargement processing, etc., and furthermore, other processes are also possible. Therefore, when performing over-drive processing in FIG. 8(B), or when performing local dimming processing in FIG. 8(A ), it is preferable that the processing flow is as shown in FIG. 8(E). However, an example of an embodiment is not limited to this.

[0193] (Embodiment 4) Next, a case where a part of the processing flow is modified will be described. Therefore, the content described in other embodiments can be applied, combined, or replaced in this embodiment.

[0194] (Embodiment 4) Next, a case where a part of the processing flow is modified will be described. Therefore, the content described in other embodiments can be applied, combined, or replaced in this embodiment. .

[0195] FIG. 10 shows an example of a case where a part of FIGS. 7(E), 7(D), 8(B), 8(C), 8(E), etc. is modified. First, super-resolution processing is performed. And at the same time, using the image data for which super-resolution processing is not performed, the process of controlling the brightness of the backlight in local dimming processing is performed. Then, super-resolution processing is performed, and using the data with increased resolution and the data of the brightness of the backlight in each determined region with low resolution, the process of determining the video signal to be supplied to each pixel in local dimming processing is performed. brightness control process of the backlight in local dimming processing is performed. Then, super-resolution processing is performed, and using the data with increased resolution and the data of the brightness of the backlight in each determined region with low resolution, the process of determining the video signal to be supplied to each pixel in local dimming processing is performed. resolution is low, but the data of the brightness of the backlight in each determined region, the process of determining the video signal to be supplied to each pixel in local dimming processing is performed. imming processing is performed.

[0196] When super-resolution processing is performed, the image may not change significantly. The pitch of the light arrangement is much larger than the pixel pitch. Using the data before processing, the backlight of each area in local dimming processing is There is no practical problem even if a process for determining the luminance of the pixel is performed.

[0197] By performing this processing, the buffer in the super-resolution processing and local dimming processing is reduced. Since the brightness control process for the LCD monitor can be performed simultaneously, the overall processing time can be reduced. Therefore, it is possible to display images that require real-time performance, such as games. Even in this case, the image can be displayed without delay.

[0198] For example, a multi-core CPU with multiple CPU cores is used, and processing is performed on each CPU core. By distributing the processing, it is possible to perform super-resolution processing and local dimming processing simultaneously. In this way, by using a multi-core CPU, high speed is possible with fewer components. Such a multi-core CPU can process data in a single chip. It can be constructed with semiconductor devices (or transistors). This allows the device to operate with low power consumption and also reduces heat generation during operation.

[0199] In FIG. 10A, the edge enhancement process, the overdrive process, and the frame interpolation process It is also possible to perform additional processing such as the following. is shown in Fig. 10(B). Fig. 10(B) shows the image after the super-resolution processing and the edge enhancement processing. However, the exemplary embodiment is not limited to the above.

[0200] Or, Fig. 11 shows a partial transformation of Fig. 7(D), Fig. 8(B), Fig. 8(C), Fig. 8(E), etc. Here is another example of the case where frame interpolation is performed. Using data from before the frame frequency increased, the backlight in local dimming processing Then, frame interpolation is performed, and the frame frequency is high. The resulting data is then used for super-resolution processing. Although the accuracy is low, the local display is calculated using the determined backlight brightness data for each area. This involves processing to determine the video signal to be supplied to each pixel in the matching process.

[0201] The control of backlight brightness in local dimming processing is performed using the super-resolution processing. It is also possible to carry out the above simultaneously.

[0202] For example, a multi-core CPU with multiple CPU cores is used, and processing is performed on each CPU core. By distributing the processing, frame interpolation processing, super-resolution processing, and local dimming processing can be performed simultaneously. In this way, by using a multi-core CPU, It is possible to perform high-speed processing with a small number of components. , can be configured to include a semiconductor device (or transistor) having SOI. By using SOI, it is possible to operate with low power consumption and reduce heat generation during operation. It is possible to do this.

[0203] When frame interpolation is performed, the image may not change significantly. The pitch of the backlight arrangement is much larger than the pixel pitch. Using the data before performing the frame interpolation process, it is practically not a problem to perform the process of determining the brightness of the backlight in each area in the local dimming process. Even if the process of determining the brightness of the backlight in the local dimming process is performed using the data before the frame interpolation process, there is no problem in practice.

[0204] By performing such a process, since the frame interpolation process and the process of controlling the brightness of the backlight in the local dimming process can be performed simultaneously, the overall processing time can be shortened. Therefore, even when performing a display that requires real-time performance such as a game, it is possible to display without delay. In addition, in FIG. 11(A), it is also possible to additionally perform processes such as edge enhancement processing and overdrive processing. As an example, an example when edge enhancement processing is also performed is shown in FIG. 11(B).

[0205] However, an example of the embodiment is not limited to these.

[0206] In addition, in FIG. 11(A), it is possible to perform super-resolution processing using a plurality of processing systems. An example in that case is shown in FIGS. 12(A) and 12(B). The processing flow of FIG. 12(A) corresponds to the case where the processing flow of FIG. 1(B) is applied, and the processing flow of FIG. 12(B) corresponds to the case where the processing flow of FIG. 5(B) is applied. Thus, it is possible to apply the content described in Embodiment 1, and the same can be applied to other content as well.

[0207] (Embodiment 5) In this embodiment, an example of a lighting device is shown. The lighting device can be used as a backlight of a liquid crystal display device or as an interior light, etc. However, an example of the embodiment is not limited to this.

[0208] ​FIG. 13 shows a backlight or a lighting device using a point light source. FIG. 13 As shown in (A), a plurality of point light sources 1002 are arranged in the device 1001. In an array By arranging the point light sources 1002, it is possible to configure a uniform surface light source. The device 1001 can be used as a backlight of a liquid crystal display device or a part thereof. It is possible.

[0209] And, the threshold 1003 is arranged to extend in the horizontal direction. Or, the threshold 1004 is arranged to extend in the vertical direction. By arranging a plurality of these thresholds 1003 and 1004 the surface light source can be divided into a plurality of regions. In FIG. 13(A), the vertical direction is divided into 3 regions and the horizontal direction is divided into 9 regions. Therefore, light leakage to other regions can be reduced by the thresholds. And, by controlling the brightness of the point light sources 1002 in each region, local dimming (local brightness control of the backlight, LOCAL DIMMING) can be realized. In particular, by arranging the thresholds, light leakage to other regions can be reduced, so that the brightness of each region can be precisely controlled. Therefore, it becomes easy to derive the transmittance of the liquid crystal elements of each pixel. Or, since there is little light leakage, the contrast can be improved. However, an example of the embodiment is not limited to this.

[0210] Or, it is possible to turn off a part of the light source and move the off state within the screen. That is, it is possible to partially turn off the point light sources within the screen and cancel the turned-off regions. For example, it is possible to scan from top to bottom. By performing such a backlight scan, afterimages can be reduced and video characteristics can be improved. This is achievable.

[0211] Note that as a threshold, only those extending horizontally and arranged like threshold 1003 can be arranged. Or, as a threshold, only those extending vertically and arranged like threshold 1004 can be arranged. Or, it is also possible not to provide a threshold itself. Or, as a threshold, only those extending vertically and arranged like threshold 1004 can be arranged. Or, it is also possible not to provide a threshold itself. Or, as a threshold, only those extending vertically and arranged like threshold 1004 can be arranged. Or, it is also possible not to provide a threshold itself. It is also possible not to provide a threshold itself.

[0212] Note that the surface of threshold 1003 or threshold 1004 is preferably a mirror surface or white. However, an example of the embodiment is not limited to this. In the case of a mirror surface, since light can be reflected, light can be effectively utilized. Therefore, power consumption can be reduced. In the case of white, light can be diffused. Therefore, the boundary of the area becomes difficult to see, and visibility can be improved. Note that the surface of threshold 1003 or threshold 1004 is preferably a mirror surface or white. However, an example of the embodiment is not limited to this. In the case of a mirror surface, since light can be reflected, light can be effectively utilized. Therefore, power consumption can be reduced. In the case of white, light can be diffused. Therefore, the boundary of the area becomes difficult to see, and visibility can be improved. In the case of a mirror surface, since light can be reflected, light can be effectively utilized. Therefore, power consumption can be reduced. In the case of white, light can be diffused. Therefore, the boundary of the area becomes difficult to see, and visibility can be improved. In the case of white, light can be diffused. Therefore, the boundary of the area becomes difficult to see, and visibility can be improved.

[0213] Note that the transmittance of threshold 1003 or threshold 1004 is desirably 50% or less, more preferably 30% or less. Or, the transmittance of threshold 1003 or threshold 1004 is desirably 1% or more, more preferably 5% or more. However, an example of the embodiment is not limited to these. By having a low transmittance, light leakage can be reduced, and the luminance of each area can be precisely controlled. However, if light is not completely transmitted, the boundary of the area may be visible, and visibility may decrease. Therefore, by allowing a small amount of light to pass through, the boundary of the area becomes difficult to see, and visibility can be improved. Note that the transmittance of threshold 1003 or threshold 1004 is desirably 50% or less, more preferably 30% or less. Or, the transmittance of threshold 1003 or threshold 1004 is desirably 1% or more, more preferably 5% or more. However, an example of the embodiment is not limited to these. By having a low transmittance, light leakage can be reduced, and the luminance of each area can be precisely controlled. However, if light is not completely transmitted, the boundary of the area may be visible, and visibility may decrease. Therefore, by allowing a small amount of light to pass through, the boundary of the area becomes difficult to see, and visibility can be improved. Note that the transmittance of threshold 1003 or threshold 1004 is desirably 1% or more, more preferably 5% or more. However, an example of the embodiment is not limited to these. By having a low transmittance, light leakage can be reduced, and the luminance of each area can be precisely controlled. However, if light is not completely transmitted, the boundary of the area may be visible, and visibility may decrease. Therefore, by allowing a small amount of light to pass through, the boundary of the area becomes difficult to see, and visibility can be improved. Note that the transmittance of threshold 1003 or threshold 1004 is desirably 1% or more, more preferably 5% or more. However, an example of the embodiment is not limited to these. By having a low transmittance, light leakage can be reduced, and the luminance of each area can be precisely controlled. However, if light is not completely transmitted, the boundary of the area may be visible, and visibility may decrease. Therefore, by allowing a small amount of light to pass through, the boundary of the area becomes difficult to see, and visibility can be improved. By having a low transmittance, light leakage can be reduced, and the luminance of each area can be precisely controlled. However, if light is not completely transmitted, the boundary of the area may be visible, and visibility may decrease. However, if light is not completely transmitted, the boundary of the area may be visible, and visibility may decrease. Therefore, by allowing a small amount of light to pass through, the boundary of the area becomes difficult to see, and visibility can be improved.

[0214] In addition, Threshold 1003 or Threshold 1004 is made of acrylic, plastic, polycarbonate, etc. It is possible to use organic materials such as polyethylene terephthalate (PET). An example is not limited to this.

[0215] It is also possible to provide a spacer 1005. However, in this embodiment, The spacer 1005 may be omitted. A sheet placed on the light source 1002, the threshold 1003, or the threshold 1004, etc. It has a function to prevent bending.

[0216] When providing spacers 1005, it is recommended to provide a small number of them, not too many. Therefore, for example, in FIG. 13(A), there are three regions in the vertical direction and one region in the horizontal direction. It is divided into 9 regions, and has a total of 27 regions, but spacers 1005 are provided. It is possible to create areas where the spacers 1005 are provided and areas where the spacers 1005 are not provided. Alternatively, the number of spacers 1005 can be set to be less than the number of regions. As described above, by not providing the spacers 1005 in all areas, manufacturing can be facilitated. and / or costs can be reduced.

[0217] The spacer 1005 is preferably transparent, black, or white. By using black or white, the brightness unevenness can be reduced depending on whether or not the spacer 1005 is present. However, it is possible to reduce the occurrence of color shifts and color variations. An example is not limited to this.

[0218] Note that the spacer 1005 can be composed of organic substances such as acrylic, plastic, polycarbonate, and PET. However, an example of the embodiment is not limited to this. It can be configured to have organic substances. However, an example of the embodiment is not limited to this. It is not limited to this.

[0219] Note that the point light source 1002 is composed of, for example, light-emitting diodes for three colors or lasers for three colors. And each light-emitting diode or laser has the colors of red, blue, and green. And, for example, by using light-emitting diodes of three colors, it is possible to make it white. Therefore, if it can be made white, the colors are not limited to red, blue, and green. For example, it is also possible to use CMYK such as cyan, magenta, and yellow as the point light source. It is composed of. And each light-emitting diode or laser has the colors of red, blue, and green. And, for example, by using light-emitting diodes of three colors, it is possible to make it white. Therefore, if it can be made white, the colors are not limited to red, blue, and green. For example, it is also possible to use CMYK such as cyan, magenta, and yellow as the point light source. It has. And, for example, by using light-emitting diodes of three colors, it is possible to make it white. Therefore, if it can be made white, the colors are not limited to red, blue, and green. For example, it is also possible to use CMYK such as cyan, magenta, and yellow as the point light source. It is possible to make it white. Therefore, if it can be made white, the colors are not limited to red, blue, and green. For example, it is also possible to use CMYK such as cyan, magenta, and yellow as the point light source. Therefore, if it can be made white, the colors are not limited to red, blue, and green. For example, it is also possible to use CMYK such as cyan, magenta, and yellow as the point light source. It is also possible to use.

[0220] In this way, when the brightness can be controlled for each color, more precise local dimming can be performed, so it is possible to reduce power consumption or improve contrast. It can be performed, so it is possible to reduce power consumption or improve contrast. It becomes possible.

[0221] Note that it is preferable that the number of light-emitting diodes of each color is the same. However, an example of the embodiment is not limited to these. It is also possible to increase the number of light-emitting diodes of only a certain color. For example, it is possible to double the number of green light-emitting diodes compared to the number of red or blue light-emitting diodes. By making the number of light-emitting diodes different for each color in this way, the chromaticity can be easily adjusted. Also, it is possible to reduce the difference in the lifespan of the light-emitting diodes for each color. It is not limited to these. It is also possible to increase the number of light-emitting diodes of only a certain color. It is also possible to increase the number of light-emitting diodes of only a certain color. For example, it is possible to double the number of green light-emitting diodes compared to the number of red or blue light-emitting diodes. It is possible to double the number of green light-emitting diodes compared to the number of red or blue light-emitting diodes. By making the number of light-emitting diodes different for each color in this way, the chromaticity can be easily adjusted. Also, it is possible to reduce the difference in the lifespan of the light-emitting diodes for each color. It is also possible to reduce the difference in the lifespan of the light-emitting diodes for each color.

[0222] Note that the light-emitting diodes are not limited to three colors. For example, it has a color close to a certain color. By also using light-emitting diodes, the chromaticity can be widened. For example, in addition to red, blue, green, colors close to green can also be added and it is also possible to configure with four colors.

[0223] Note that as light-emitting diodes, in addition to red, blue, and green, white light-emitting diodes can also be used It is possible to extend the life of the light-emitting diodes by using white light-emitting diodes. Or, by using white light-emitting diodes, it is possible to reduce the color change due to temperature It becomes possible.

[0224] Note that it is also possible to use only white light-emitting diodes and not use light-emitting diodes other than white such as red, blue, and green. By using only white, it is possible to prevent the colors from being mixed. Or, by using only white, it is possible to reduce the occurrence of color deviation due to deterioration. It becomes possible. Note that the horizontal pitch 1007 of the point light source 1002 is preferably shorter than the vertical pitch 1

[0225] 006 of the point light source 1002. However, an example of the embodiment is not limited to these. Note that it is preferable that the number of regions in the horizontal direction is larger than the number of regions in the vertical direction. For example, in FIG. 13(A), the number of regions in the vertical direction is 3 and the number of regions in the horizontal direction is 9.

[0226] Note that it is preferable that the number of regions in one screen is smaller than the number of light-emitting diodes of a certain color. That is, for one color in one region, it is desirable to have a plurality of point light sources. And for the point light sources arranged in one region, for a certain color, It is desirable to have a plurality of point light sources.

[0227] Note that it is preferable that the number of regions in one screen is smaller than the number of light-emitting diodes of a certain color. That is, it is desirable to have a plurality of point light sources for one color in one region. And for the point light sources arranged in one region, it is desirable to have a plurality of point light sources for one color in one region. And for the point light sources arranged in one region, it is desirable to have one color for one of the point light sources arranged in one region. It is preferable that the luminances of a plurality of point light sources are controlled to be the same at the same time. That is, in one region, it is preferable that the luminance is controlled for each color. For example, if there are three red light-emitting diodes in one region, when increasing the luminance, all three light-emitting diodes increase the luminance, and when decreasing the luminance, all three decrease the luminance. It is preferable to do so. However, in light-emitting diodes and the like, it is difficult to achieve exactly the same luminance because of variations in characteristics. Therefore, it is desirable to emit light with the same luminance within a range including characteristic variations. For example, it is desirable to emit light with the same luminance having a variation of about 30%. In this way, by arranging a plurality of point light sources in one region, it is possible to reduce luminance unevenness. Or it is possible to reduce the deterioration of the point light sources. However, an example of the embodiment is not limited to these.

[0228] FIG. 13(B) shows an example of a part of the cross section of FIG. 13(A). On the device 1001, a diffusion plate 1011 is arranged. The diffusion plate 1011 reduces luminance unevenness. The diffusion plate 1011 is supported by the spacer 1005 so as not to bend at the center of the screen.

[0229] On the diffusion plate 1011, a display panel 1012 is arranged. The display panel has, for example, pixels, a driving circuit, liquid crystal elements, glass substrates, thin film transistors, polarizing plates, retardation plates, color filters, and / or prism sheets. By operating the display panel 1012 in cooperation with the backlight, it is possible to realize an appropriate display.

[0230] ​​​​​​​​​Note that the diffusion plate 1011 has a function of diffusing light while transmitting it. Therefore, while having the function of diffusing light, it is preferable that the transmittance is high. Therefore, the transmittance of the diffusion plate 1011 is preferably higher than the transmittance of the threshold 1003. When the transmittance of the diffusion plate 1011 is high, the light reflected by the threshold 1003 can pass through the diffusion plate 1011. Therefore, while reducing the leakage of light to other regions, light can be easily emitted to the screen. Therefore, the luminance of each region can be precisely controlled, and local dimming can be appropriately performed. However, an example of the embodiment is not limited to these.

[0231] Note that the height 1014 of the threshold 1003 is preferably higher than the height 1013 of the point light source 1002. In order to prevent the light emitted from the point light source 1002 from leaking into another region, it is desirable that the height 1014 of the threshold 1003 is higher. However, an example of the embodiment is not limited to these.

[0232] Note that the distance 1015 between the threshold 1003 and the diffusion plate 1011 is preferably shorter than the height 10 14 of the threshold 1003. When the distance 1015 is long, too much light leaks. Therefore, the distance 1015 is preferably shorter than the height 1014 of the threshold 1003. However, an example of the embodiment is not limited to these.

[0233] Note that the distance 1015 between the threshold 1003 and the diffusion plate 1011 is preferably longer than the height 10 13 of the point light source 1002. When the distance 1015 is too small, the boundary of the region becomes distinct. Since it is too smooth, there is a possibility that the boundary will be visible on the screen. Therefore, in order to prevent the boundary of the area from being visually recognized on the screen, a length that allows some light to leak is necessary. Thus, by making the threshold 1003 longer than the height 1013 of the point light source 1002, an appropriate amount of light can be made to leak. However, an example of an embodiment is not limited to this. In order to prevent the boundary of the area from being visually recognized on the screen, a length that allows some light to leak is necessary. Therefore, by making the threshold 1003 longer than the height 1013 of the point light source 1002, an appropriate amount of light can be made to leak. However, an example of an embodiment is not limited to this.

[0234] Incidentally, it is preferable that the height 1014 of the threshold 1003 and the height of the threshold 1004 are approximately equal. By "approximately equal" it is meant that, assuming that there may be some difference including manufacturing errors and variations, it is the case when they are equal. For example, it is possible to have variations within about 10%. By making the heights of the thresholds approximately equal, the amount of light leakage becomes uniform, so that it is possible to reduce luminance unevenness. However, an example of an embodiment is not limited to these.

[0235] In FIG. 13, point light sources are arranged in each area. However, an example of an embodiment is not limited to this. It is also possible to arrange small surface light sources for each area. FIG. 14 shows an example when surface light sources are arranged in each area. When using a surface light source, it is also possible to configure it in the same way as when using a point light source. Therefore, the content described in FIG. 13 (even a part) can be applied to FIG. 14 (even a part).

[0236] In FIG. 14(A), surface light sources 1102 are arranged in each area. The surface light source 1102 can be realized using various configurations.

[0237] ​​​​​​​​​​​In FIG. 14(A), the case where the thresholds 1003 and 1004 are not provided is shown, but an example of the embodiment is not limited to this. It is also possible to arrange only those extending in the horizontal direction, such as the threshold 1003. Or, it is also possible to arrange only those extending in the vertical direction, such as the threshold 1004. Or, it is also possible to provide both thresholds. It should be noted that it is also possible to provide the spacer 1005. However, an example of the embodiment is not limited to this, and it is also possible not to provide the spacer 1005. The spacer 1005 has a function of preventing the sheet disposed above the surface light source 1102 and the like from sagging. However, in the case of a surface light source, since the area where cavities can be formed within the region is small, it is possible not to provide the spacer 1005. It should be noted that it is also possible to provide the spacer 1005. However, an example of the embodiment is not limited to this, and it is also possible not to provide the spacer 1005. The spacer 1005 has a function of preventing the sheet disposed above the surface light source 1102 and the like from sagging. However, in the case of a surface light source, since the area where cavities can be formed within the region is small, it is possible not to provide the spacer 1005. It should be noted that it is also possible to provide the spacer 1005. However, an example of the embodiment is not limited to this, and it is also possible not to provide the spacer 1005. The spacer 1005 has a function of preventing the sheet disposed above the surface light source 1102 and the like from sagging. However, in the case of a surface light source, since the area where cavities can be formed within the region is small, it is possible not to provide the spacer 1005. It should be noted that it is also possible to provide the spacer 1005. However, an example of the embodiment is not limited to this, and it is also possible not to provide the spacer 1005. The spacer 1005 has a function of preventing the sheet disposed above the surface light source 1102 and the like from sagging. However, in the case of a surface light source, since the area where cavities can be formed within the region is small, it is possible not to provide the spacer 1005.

[0238] It should be noted that it is also possible to provide the spacer 1005. However, an example of the embodiment is not limited to this, and it is also possible not to provide the spacer 1005. The spacer 1005 has a function of preventing the sheet disposed above the surface light source 1102 and the like from sagging. However, in the case of a surface light source, since the area where cavities can be formed within the region is small, it is possible not to provide the spacer 1005. It should be noted that it is also possible to provide the spacer 1005. However, an example of the embodiment is not limited to this, and it is also possible not to provide the spacer 1005. The spacer 1005 has a function of preventing the sheet disposed above the surface light source 1102 and the like from sagging. However, in the case of a surface light source, since the area where cavities can be formed within the region is small, it is possible not to provide the spacer 1005. It should be noted that it is also possible to provide the spacer 1005. However, an example of the embodiment is not limited to this, and it is also possible not to provide the spacer 1005. The spacer 1005 has a function of preventing the sheet disposed above the surface light source 1102 and the like from sagging. However, in the case of a surface light source, since the area where cavities can be formed within the region is small, it is possible not to provide the spacer 1005. It should be noted that it is also possible to provide the spacer 1005. However, an example of the embodiment is not limited to this, and it is also possible not to provide the spacer 1005. The spacer 1005 has a function of preventing the sheet disposed above the surface light source 1102 and the like from sagging. However, in the case of a surface light source, since the area where cavities can be formed within the region is small, it is possible not to provide the spacer 1005. It should be noted that it is also possible to provide the spacer 1005. However, an example of the embodiment is not limited to this, and it is also possible not to provide the spacer 1005. The spacer 1005 has a function of preventing the sheet disposed above the surface light source 1102 and the like from sagging. However, in the case of a surface light source, since the area where cavities can be formed within the region is small, it is possible not to provide the spacer 1005.

[0239] It should be noted that it is preferable that the horizontal pitch of the surface light source 1102 is shorter than the vertical pitch of the surface light source 1102. However, an example of the embodiment is not limited to these. It should be noted that it is preferable that the horizontal pitch of the surface light source 1102 is shorter than the vertical pitch of the surface light source 1102. However, an example of the embodiment is not limited to these.

[0240] It should be noted that it is preferable that the height of the threshold is higher than the height of the surface light source 1102. In order to make it difficult for the light emitted from the surface light source 1102 to leak into another region, it is desirable that the height of the threshold is higher. However, an example of the embodiment is not limited to these. It should be noted that it is preferable that the height of the threshold is higher than the height of the surface light source 1102. In order to make it difficult for the light emitted from the surface light source 1102 to leak into another region, it is desirable that the height of the threshold is higher. However, an example of the embodiment is not limited to these. It should be noted that it is preferable that the height of the threshold is higher than the height of the surface light source 1102. In order to make it difficult for the light emitted from the surface light source 1102 to leak into another region, it is desirable that the height of the threshold is higher. However, an example of the embodiment is not limited to these.

[0241] Furthermore, when a diffusion plate is provided on the surface light source 1102, it is preferable that the distance between the threshold and the diffusion plate is longer than the height of the surface light source 1102. If the distance is too small, the boundary of the region may be too distinct, and there is a possibility that the boundary may also be visible on the screen. Therefore, for the picture Furthermore, when a diffusion plate is provided on the surface light source 1102, it is preferable that the distance between the threshold and the diffusion plate is longer than the height of the surface light source 1102. If the distance is too small, the boundary of the region may be too distinct, and there is a possibility that the boundary may also be visible on the screen. Therefore, for the picture Furthermore, when a diffusion plate is provided on the surface light source 1102, it is preferable that the distance between the threshold and the diffusion plate is longer than the height of the surface light source 1102. If the distance is too small, the boundary of the region may be too distinct, and there is a possibility that the boundary may also be visible on the screen. Therefore, for the picture In order to make the boundary of the region invisible on the surface, a length allowing for a certain amount of light leakage is necessary. Therefore, by making the threshold longer than the height of the surface light source 1102, an appropriate amount of light can be made to leak. However, an example of the embodiment is not limited to these. .

[0242] Next, as an example of the surface light source 1102, a cross-sectional view when a light guide plate and a linear light source (or a collection of point light sources) are used to constitute a small surface light source is shown in FIG. 14(B). In FIG. 14(B), a cross-sectional view of one-third of the surface light source is shown. Light is incident from the linear light source 1103 to the light guide plate 1104. In the light guide plate 1104, the light is repeatedly totally reflected and propagated. Then, the bottom surface 1105 of the light guide plate 1104 is processed. Therefore, light exits from the surface of the light guide plate 1104, and a surface light source is realized.

[0243] Regarding the processing of the bottom surface 1105, as an example, there are cases where unevenness is formed in a prism shape, or cases where ink is printed. By controlling these densities or shapes, a uniform surface light source can be realized.

[0244] In addition, when using a surface light source as shown in FIG. 14(A), it is possible to provide a diffusion plate 101 1 on the surface light source. Thereby, it is possible to reduce luminance unevenness. However, when using the surface light source 1102, unlike the case of a point light source, since the luminance is already uniform to some extent within the region, it is also possible not to provide the diffusion plate 1011.

[0245] As another example of the surface light source 1102, it is possible to use a flat fluorescent tube (flat cathode tube). .

[0246] Alternatively, as shown in FIG. 14(C), the fluorescent tube (cathode tube) 1106 is bent and arranged within the area, and the flat It is also possible to create a surface light source by making it similar to a surface fluorescent tube (flat cathode tube). In this case, as shown in the cross-sectional view of FIG. 14(D), the area around the fluorescent tube (cathode tube) 1106, especially the upper It is also possible to place a diffusion plate 1107 to approximate a uniform surface light source. However, the embodiment is not limited to these.

[0247] (Sixth embodiment) Next, another example of the configuration of the display device and a method of driving the same will be described. In this case, a display device using a display element with a slow response time (long response time) in brightness to signal writing is used. In this embodiment, a liquid crystal display (LCD) is used as a display element with a long response time. However, the display element in this embodiment is not limited to this, and may be any suitable element. Various display elements can be used that have a slow response of brightness to interference.

[0248] In the case of a general liquid crystal display device, the response of brightness to signal writing is slow, and the signal current is not applied to the liquid crystal element. Even if pressure is applied continuously, it may take more than one frame period for the response to complete. Even if a moving image is displayed on such a display device, it is not possible to faithfully reproduce the moving image. Furthermore, in the case of active matrix driving, the time required to write a signal to one liquid crystal element is Usually, the signal writing period (one frame period or one sub-frame period) is divided by the number of scanning lines. The time it takes to select a scan line is only a short time (one scan line selection period), and the liquid crystal element cannot respond within this short time. Therefore, most of the response of the liquid crystal element occurs during the period when no signal is written. It will occur. Here, the dielectric constant of the liquid crystal element changes according to the transmittance of the liquid crystal element. However, the fact that the liquid crystal element responds during a period when signal writing is not performed means that the dielectric constant of the liquid crystal element changes in a state where there is no charge transfer with the outside (constant charge state). That is, in the formula (charge)=(capacitance)·(voltage), since the capacitance changes in a state where the charge is constant, the voltage applied to the liquid crystal element changes according to the response of the liquid crystal element and thus changes from the voltage at the time of signal writing. Therefore, when driving a liquid crystal element with a slow luminance response to signal writing using an active matrix, the voltage applied to the liquid crystal element cannot reach the voltage at the time of signal writing in principle.

[0249] In the display device according to the present embodiment, in order to make the display element respond to a desired luminance within a signal writing cycle, by using a signal level at the time of signal writing that has been corrected in advance (correction signal), the above problems can be solved. Furthermore, since the response time of the liquid crystal element becomes shorter as the signal level becomes larger, the response time of the liquid crystal element can also be shortened by writing the correction signal. Such a driving method for adding such a correction signal is also called over-drive. The over-drive in the present embodiment can make the display element respond to a desired luminance within the signal writing cycle by correcting the signal level according to the signal writing cycle, even when the signal writing cycle is shorter than the cycle of the image signal input to the display device (input image signal cycle Tin). When the signal writing cycle is shorter than the input image signal cycle Tin, for example, it is possible to divide one original image into a plurality of sub-images and sequentially display the plurality of sub-images within one frame period.

[0250] Next, an example of a method for correcting the signal level during signal writing in an active matrix drive display device will be described with reference to FIGS. 15(A) and (B). FIG. 15(A) is a graph showing the time change of the luminance of the signal level during signal writing in a certain display element, with the horizontal axis representing time and the vertical axis representing the signal level during signal writing. FIG. 15(B) is a graph showing the time change of the display level in a certain display element, with the horizontal axis representing time and the vertical axis representing the display level. When the display element is a liquid crystal element, the signal level during signal writing can be a voltage, and the display level can be the transmittance of the liquid crystal element. Hereinafter, it will be described assuming that the vertical axis of FIG. 15(A) is voltage and the vertical axis of FIG. 15(B) is transmittance. The overdrive in this embodiment includes cases where the signal level is other than voltage (duty ratio, current, etc.). The overdrive in this embodiment also includes cases where the display level is other than transmittance (luminance, current, etc.). The liquid crystal element includes a normally black type (e.g., VA mode, IPS mode, etc.) that becomes black display when the voltage is 0 and a normally white type (e.g., TN mode, OCB mode, etc.) that becomes white display when the voltage is 0. However, the graph shown in FIG. 15(B) corresponds to both types. For the normally black type, the transmittance increases as going upward in the graph, and for the normally white type, the transmittance increases as going downward in the graph. That is, the liquid crystal mode in this embodiment can be either a normally black type or a normally white type. The signal writing timing is indicated by a dotted line on the time axis, and after signal writing is performed, FIG. 15(A) is a graph schematically showing the time change of the luminance of the signal level during signal writing in a certain display element, with the horizontal axis representing time and the vertical axis representing the signal level during signal writing. FIG. 15(B) is a graph schematically showing the time change of the display level in a certain display element, with the horizontal axis representing time and the vertical axis representing the display level. When the display element is a liquid crystal element, the signal level during signal writing can be a voltage, and the display level can be the transmittance of the liquid crystal element. Hereinafter, it will be described assuming that the vertical axis of FIG. 15(A) is voltage and the vertical axis of FIG. 15(B) is transmittance. The overdrive in this embodiment includes cases where the signal level is other than voltage (duty ratio, current, etc.). The overdrive in this embodiment also includes cases where the display level is other than transmittance (luminance, current, etc.). The liquid crystal element includes a normally black type (e.g., VA mode, IPS mode, etc.) that becomes black display when the voltage is 0 and a normally white type (e.g., TN mode, OCB mode, etc.) that becomes white display when the voltage is 0. However, the graph shown in FIG. 15(B) corresponds to both types. For the normally black type, the transmittance increases as going upward in the graph, and for the normally white type, the transmittance increases as going downward in the graph. That is, the liquid crystal mode in this embodiment can be either a normally black type or a normally white type. The signal writing timing is indicated by a dotted line on the time axis, and after signal writing is performed, FIG. 15(A) is a graph schematically showing the time change of the luminance of the signal level during signal writing in a certain display element, with the horizontal axis representing time and the vertical axis representing the signal level during signal writing. FIG. 15(B) is a graph schematically showing the time change of the display level in a certain display element, with the horizontal axis representing time and the vertical axis representing the display level. When the display element is a liquid crystal element, the signal level during signal writing can be a voltage, and the display level can be the transmittance of the liquid crystal element. Hereinafter, it will be described assuming that the vertical axis of FIG. 15(A) is voltage and the vertical axis of FIG. 15(B) is transmittance. The overdrive in this embodiment includes cases where the signal level is other than voltage (duty ratio, current, etc.). The overdrive in this embodiment also includes cases where the display level is other than transmittance (luminance, current, etc.). The liquid crystal element includes a normally black type (e.g., VA mode, IPS mode, etc.) that becomes black display when the voltage is 0 and a normally white type (e.g., TN mode, OCB mode, etc.) that becomes white display when the voltage is 0. However, the graph shown in FIG. 15(B) corresponds to both types. For the normally black type, the transmittance increases as going upward in the graph, and for the normally white type, the transmittance increases as going downward in the graph. That is, the liquid crystal mode in this embodiment can be either a normally black type or a normally white type. The signal writing timing is indicated by a dotted line on the time axis, and after signal writing is performed, The period until the next signal writing is performed shall be referred to as the holding period Fi. In this embodiment it is assumed that i is an integer and is an index representing each holding period. In FIGS. 15(A) and (B), i is shown as ranging from 0 to 2, but i can also take other integers (not shown for integers other than 0 to 2). Note that in the holding period Fi, let the transmittance for realizing the luminance corresponding to the image signal be Ti, and let the voltage for giving the transmittance Ti in the steady state be Vi. Note that the dashed line 5101 in FIG. 15(A) represents the time change of the voltage applied to the liquid crystal element when over-drive is not performed, and the solid line 5102 represents the time change of the voltage applied to the liquid crystal element when over-drive is performed in this embodiment. Similarly, the dashed line 5103 in FIG. 15(B) represents the time change of the transmittance of the liquid crystal element when over-drive is not performed, and the solid line 5104 represents the time change of the transmittance of the liquid crystal element when over-drive is performed in this embodiment. Note that the difference between the desired transmittance Ti and the actual transmittance at the end of the holding period Fi shall be denoted as the error αi. In the graph shown in FIG. 15(A), in the holding period F0, the desired voltage V0 is applied to both the dashed line 5101 and the solid line 510 2. Also, in the graph shown in FIG. 15(B), it is assumed that the desired transmittance T0 is obtained for both the dashed line

[0251] 5103 and the solid line 5104. Then, when over-drive is not performed, as shown by the dashed line 5101, at the beginning of the holding period F1 the desired voltage V1 is applied to the liquid crystal element. However, as already described, the period during which the signal is written is extremely short compared to the holding period, and since most of the holding period is in a constant charge state, as shown by the dashed line 5101, at the beginning of the holding period F1 the desired voltage V1 is applied to the liquid crystal element. However, as already described, the period during which the signal is written is extremely short compared to the holding period, and since most of the holding period is in a constant charge state, During the holding period, the voltage applied to the liquid crystal element changes along with the change in transmittance. During the holding period at the end of F1, it becomes a voltage significantly different from the desired voltage V1. At this time, the broken line 5103 in the graph shown in FIG. 15(B) also becomes significantly different from the desired transmittance T1 and thus a faithful display according to the image signal cannot be achieved, resulting in a deterioration in image quality On the other hand, when over-driving is performed in the present embodiment, as shown by the solid line 510 2, at the beginning of the holding period F1, a voltage V1' larger than the desired voltage V1 is applied to the liquid crystal element. That is, anticipating that the voltage applied to the liquid crystal element gradually changes during the holding period F1, so that the voltage applied to the liquid crystal element at the end of the holding period F1 becomes a voltage near the desired voltage V1, a corrected voltage V1' from the desired voltage V1 is applied to the liquid crystal element at the beginning of the holding period F1 so that the desired voltage V1 can be accurately applied to the liquid crystal element At this time, as shown by the solid line 5104 in the graph shown in FIG. 15(B) the desired transmittance T1 is obtained at the end of the holding period F1. That is, even though it becomes a constant charge state for most of the holding period, the response of the liquid crystal element within the signal writing cycle can be realized. Next, in the holding period F2, although the case where the desired voltage V2 is smaller than V1 is shown, in this case as well, similar to the holding period F1, anticipating that the voltage applied to the liquid crystal element gradually changes during the holding period F2, at the end of the holding period F2, a corrected voltage F2' from the desired voltage V2 is applied to the liquid crystal element at the beginning of the holding period F2 so that the voltage applied to the liquid crystal element becomes a voltage near the desired voltage V2. By doing so, as shown by the solid line 5104 in the graph shown in FIG. 15(B), at the end of the holding period F2 a voltage corrected from the desired voltage V2 may be applied to the liquid crystal element. In this way, as shown by the solid line 5104 in the graph shown in FIG. 15(B), at the end of the holding period F2 At the end, a desired transmittance T2 is obtained. Note that, like the holding period F1, when Vi is larger than Vi-1 the corrected voltage Vi´ is preferably corrected to be larger than the desired voltage Vi. Further, like the holding period F2, when Vi is smaller than Vi-1 the corrected voltage Vi´ is preferably corrected to be smaller than the desired voltage Vi. The specific correction value can be derived by measuring the response characteristics of the liquid crystal element in advance. As a method of implementing it in the device, a method of formulating a correction formula and incorporating it into a logic circuit, a method of storing the correction value in a memory as a look-up table and reading out the correction value as needed, etc. can be used. Note that, when actually realizing the overdrive in this embodiment as a device, there are various restrictions. For example, the voltage correction must be performed within the rated voltage range of the source driver. That is, if the desired voltage is originally a large value and the ideal correction voltage exceeds the rated voltage of the source driver, it cannot be corrected. The problems in such cases will be described with reference to FIGS. 15(C) and (D). FIG. 15(C) is a graph schematically showing the time change of the voltage applied to a certain liquid crystal element with the horizontal axis being time and the vertical axis being voltage, similar to FIG. 15(A), with the solid line 5105. FIG. 15(D) is a graph schematically showing the time change of the transmittance of a certain liquid crystal element with the horizontal axis being time and the vertical axis being transmittance, similar to FIG. 15(B), with the solid line 5106. Since the other notations are the same as those in FIGS. 15(A) and (B), the description is omitted. FIG. 15

[0252] C) is, like FIG. 15(A), a graph schematically showing the time change of the voltage applied to a certain liquid crystal element with the horizontal axis being time and the vertical axis being voltage, with the solid line 5105. FIG. 15(D) is ​​​​​​​​​​​​(C) and (D) are correction voltages for achieving a desired transmittance T1 during the holding period F1. Since the correction voltage V1' exceeds the rated voltage of the source driver, V1' must be set to V1, indicating a state where sufficient correction cannot be achieved. At this time, the transmittance at the end of the holding period F1 becomes a value deviated from the desired transmittance T1 by an error α1. However, the increase in the error α1 is limited to the case where the desired voltage is originally a large value. Therefore, the deterioration of image quality itself due to the occurrence of the error α1 is often within an acceptable range. However, when the error α1 becomes large, the error within the voltage correction algorithm also becomes large. That is, in the voltage correction algorithm, assuming that the desired transmittance is obtained at the end of the holding period, in reality, even though the error α1 is large, the voltage is corrected assuming that the error α1 is small. As a result, an error is included in the correction for the next holding period F2, and as a result, the error α2 also becomes large. Furthermore, if the error α2 becomes large, the next error α3 becomes even larger, and the error increases chain - like. Consequently, the image quality deterioration becomes significant. In the over - drive in this embodiment, in order to suppress the situation where the error increases chain - like in this way, when the correction voltage Vi' exceeds the rated voltage of the source driver during the holding period Fi, the error αi at the end of the holding period Fi is estimated, and considering the magnitude of the error αi, the correction voltage for the holding period Fi + 1 can be adjusted. By doing so, even if the error αi becomes large, the influence on the error αi + 1 can be minimized. Therefore, it is possible to suppress the situation where the error increases chain - like. In the over - drive in this embodiment, An example of minimizing the error α2 will be described with reference to FIGS. 15(E) and 15(F). The graph shown in FIG. 15(E) is a further example of the correction voltage V2' in the graph shown in FIG. 15(C). The time change of the voltage when the correction voltage is V2'' is shown as a solid line 5107. The graph shown in FIG. 15(F) shows the voltage after correction by the graph shown in FIG. 15(E). The solid line 51 in the graph shown in FIG. In 06, over-correction occurs due to the correction voltage V2', but the graph shown in Figure 15(F) The solid line 5108 in Fig. 5 shows the result of the correction voltage V2' adjusted to take into account the error α1. Overcorrection is suppressed and the error α2 is minimized. This can be derived by measuring the response characteristics of the liquid crystal element. The methods include formulating a correction formula and incorporating it into a logic circuit, and using a look-up table to calculate the correction value. The correction values can be read out as needed, for example. These methods can be added separately from the part that calculates the correction voltage Vi', or It can be incorporated into the part that calculates the positive voltage Vi'. The correction amount of the adjusted correction voltage Vi' (the difference from the desired voltage Vi) is It is preferable to make it small. In other words, |Vi´´-Vi|<|Vi´-Vi| It is preferable that

[0253] In addition, the error αi caused by the ideal correction voltage exceeding the rated voltage of the source driver The shorter the signal writing period, the larger the The response time of the element must also be short, which results in a larger compensation voltage being required. This is the case. Furthermore, as a result of the required correction voltage increasing, the frequency at which the correction voltage exceeds the rated voltage of the source driver also increases, so the frequency at which a large error αi occurs also increases. Therefore, it can be said that the overdrive in the present embodiment is more effective when the signal writing period is shorter. Specifically, when one original image is divided into a plurality of sub-images and the plurality of sub-images are sequentially displayed within one frame period, the movement included in the images is detected from the plurality of images, an image in an intermediate state of the plurality of images is generated, and it is inserted between the plurality of images and driven (so-called motion compensation double-speed driving), or when these are combined, etc., when such driving methods are performed, the overdrive in the present embodiment is used, which will have a remarkable effect. In addition, the rated voltage of the source driver has a lower limit in addition to the upper limit described above. For example, there is a case where a voltage lower than voltage 0 cannot be applied. At this time, similar to the case of the upper limit described above, since the ideal correction voltage cannot be applied, the error αi becomes large. However, even in this case, similar to the method described above, the error αi at the end of the holding period Fi is estimated, and the correction voltage in the holding period Fi+1 is adjusted in consideration of the magnitude of the error αi. When a voltage lower than voltage 0 (negative voltage) can be applied as the rated voltage of the source driver, a negative voltage may be applied to the liquid crystal element as the correction voltage. By doing so, in anticipation of the potential fluctuation due to the constant charge state, the voltage applied to the liquid crystal element at the end of the holding period Fi can be adjusted to be a voltage near the desired voltage Vi. This is the case. Furthermore, as a result of the required correction voltage increasing, the frequency at which the correction voltage exceeds the rated voltage of the source driver also increases, so the frequency at which a large error αi occurs also increases. Therefore, it can be said that the overdrive in the present embodiment is more effective when the signal writing period is shorter. Specifically, when one original image is divided into a plurality of sub-images and the plurality of sub-images are sequentially displayed within one frame period, the movement included in the images is detected from the plurality of images, an image in an intermediate state of the plurality of images is generated, and it is inserted between the plurality of images and driven (so-called motion compensation double-speed driving), or when these are combined, etc., when such driving methods are performed, the overdrive in the present embodiment is used, which will have a remarkable effect. In addition, the rated voltage of the source driver has a lower limit in addition to the upper limit described above. For example, there is a case where a voltage lower than voltage 0 cannot be applied. At this time, similar to the case of the upper limit described above, since the ideal correction voltage cannot be applied, the error αi becomes large. However, even in this case, similar to the method described above, the error αi at the end of the holding period Fi is estimated, and the correction voltage in the holding period Fi+1 is adjusted in consideration of the magnitude of the error αi. When a voltage lower than voltage 0 (negative voltage) can be applied as the rated voltage of the source driver, a negative voltage may be applied to the liquid crystal element as the correction voltage. By doing so, in anticipation of the potential fluctuation due to the constant charge state, the voltage applied to the liquid crystal element at the end of the holding period Fi can be adjusted to be a voltage near the desired voltage Vi. This is the case. Furthermore, as a result of the required correction voltage increasing, the frequency at which the correction voltage exceeds the rated voltage of the source driver also increases, so the frequency at which a large error αi occurs also increases. Therefore, it can be said that the overdrive in the present embodiment is more effective when the signal writing period is shorter. Specifically, when one original image is divided into a plurality of sub-images and the plurality of sub-images are sequentially displayed within one frame period, the movement included in the images is detected from the plurality of images, an image in an intermediate state of the plurality of images is generated, and it is inserted between the plurality of images and driven (so-called motion compensation double-speed driving), or when these are combined, etc., when such driving methods are performed, the overdrive in the present embodiment is used, which will have a remarkable effect. In addition, the rated voltage of the source driver has a lower limit in addition to the upper limit described above. For example, there is a case where a voltage lower than voltage 0 cannot be applied. At this time, similar to the case of the upper limit described above, since the ideal correction voltage cannot be applied, the error αi becomes large. However, even in this case, similar to the method described above, the error αi at the end of the holding period Fi is estimated, and the correction voltage in the holding period Fi+1 is adjusted in consideration of the magnitude of the error αi. When a voltage lower than voltage 0 (negative voltage) can be applied as the rated voltage of the source driver, a negative voltage may be applied to the liquid crystal element as the correction voltage. By doing so, in anticipation of the potential fluctuation due to the constant charge state, the voltage applied to the liquid crystal element at the end of the holding period Fi can be adjusted to be a voltage near the desired voltage Vi.

[0254] In addition, the rated voltage of the source driver has a lower limit in addition to the upper limit described above. For example, there is a case where a voltage lower than voltage 0 cannot be applied. At this time, similar to the case of the upper limit described above, since the ideal correction voltage cannot be applied, the error αi becomes large. However, even in this case, similar to the method described above, the error αi at the end of the holding period Fi is estimated, and the correction voltage in the holding period Fi+1 is adjusted in consideration of the magnitude of the error αi. When a voltage lower than voltage 0 (negative voltage) can be applied as the rated voltage of the source driver, a negative voltage may be applied to the liquid crystal element as the correction voltage. By doing so, in anticipation of the potential fluctuation due to the constant charge state, the voltage applied to the liquid crystal element at the end of the holding period Fi can be adjusted to be a voltage near the desired voltage Vi. This is the case. Furthermore, as a result of the required correction voltage increasing, the frequency at which the correction voltage exceeds the rated voltage of the source driver also increases, so the frequency at which a large error αi occurs also increases. Therefore, it can be said that the overdrive in the present embodiment is more effective when the signal writing period is shorter. Specifically, when one original image is divided into a plurality of sub-images and the plurality of sub-images are sequentially displayed within one frame period, the movement included in the images is detected from the plurality of images, an image in an intermediate state of the plurality of images is generated, and it is inserted between the plurality of images and driven (so-called motion compensation double-speed driving), or when these are combined, etc., when such driving methods are performed, the overdrive in the present embodiment is used, which will have a remarkable effect. In addition, the rated voltage of the source driver has a lower limit in addition to the upper limit described above. For example, there is a case where a voltage lower than voltage 0 cannot be applied. At this time, similar to the case of the upper limit described above, since the ideal correction voltage cannot be applied, the error αi becomes large. However, even in this case, similar to the method described above, the error αi at the end of the holding period Fi is estimated, and the correction voltage in the holding period Fi+1 is adjusted in consideration of the magnitude of the error αi. When a voltage lower than voltage 0 (negative voltage) can be applied as the rated voltage of the source driver, a negative voltage may be applied to the liquid crystal element as the correction voltage. By doing so, in anticipation of the potential fluctuation due to the constant charge state, the voltage applied to the liquid crystal element at the end of the holding period Fi can be adjusted to be a voltage near the desired voltage Vi. This is the case. Furthermore, as a result of the required correction voltage increasing, the frequency at which the correction voltage exceeds the rated voltage of the source driver also increases, so the frequency at which a large error αi occurs also increases. Therefore, it can be said that the overdrive in the present embodiment is more effective when the signal writing period is shorter. Specifically, when one original image is divided into a plurality of sub-images and the plurality of sub-images are sequentially displayed within one frame period, the movement included in the images is detected from the plurality of images, an image in an intermediate state of the plurality of images is generated, and it is inserted between the plurality of images and driven (so-called motion compensation double-speed driving), or when these are combined, etc., when such driving methods are performed, the overdrive in the present embodiment is used, which will have a remarkable effect. In addition, the rated voltage of the source driver has a lower limit in addition to the upper limit described above. For example, there is a case where a voltage lower than voltage 0 cannot be applied. At this time, similar to the case of the upper limit described above, since the ideal correction voltage cannot be applied, the error αi becomes large. However, even in this case, similar to the method described above, the error αi at the end of the holding period Fi is estimated, and the correction voltage in the holding period Fi+1 is adjusted in consideration of the magnitude of the error αi. When a voltage lower than voltage 0 (negative voltage) can be applied as the rated voltage of the source driver, a negative voltage may be applied to the liquid crystal element as the correction voltage. By doing so, in anticipation of the potential fluctuation due to the constant charge state, the voltage applied to the liquid crystal element at the end of the holding period Fi can be adjusted to be a voltage near the desired voltage Vi. This is the case. Furthermore, as a result of the required correction voltage increasing, the frequency at which the correction voltage exceeds the rated voltage of the source driver also increases, so the frequency at which a large error αi occurs also increases. Therefore, it can be said that the overdrive in the present embodiment is more effective when the signal writing period is shorter. Specifically, when one original image is divided into a plurality of sub-images and the plurality of sub-images are sequentially displayed within one frame period, the movement included in the images is detected from the plurality of images, an image in an intermediate state of the plurality of images is generated, and it is inserted between the plurality of images and driven (so-called motion compensation double-speed driving), or when these are combined, etc., when such driving methods are performed, the overdrive in the present embodiment is used, which will have a remarkable effect. In addition, the rated voltage of the source driver has a lower limit in addition to the upper limit described above. For example, there is a case where a voltage lower than voltage 0 cannot be applied. At this time, similar to the case of the upper limit described above, since the ideal correction voltage cannot be applied, the error αi becomes large. However, even in this case, similar to the method described above, the error αi at the end of the holding period Fi is estimated, and the correction voltage in the holding period Fi+1 is adjusted in consideration of the magnitude of the error αi. When a voltage lower than voltage 0 (negative voltage) can be applied as the rated voltage of the source driver, a negative voltage may be applied to the liquid crystal element as the correction voltage. By doing so, in anticipation of the potential fluctuation due to the constant charge state, the voltage applied to the liquid crystal element at the end of the holding period Fi can be adjusted to be a voltage near the desired voltage Vi.

[0255] To prevent deterioration of the liquid crystal element, the polarity of the voltage applied to the liquid crystal element is periodically reversed. In other words, so-called inversion driving can be performed in combination with overdriving. That is, the overdrive in this embodiment includes the case where it is performed simultaneously with the inversion drive. For example, when the signal writing period is half of the input image signal period Tin, the polarity is inverted. When the period for writing the positive polarity signal and the period for writing the negative polarity signal are approximately the same as each other, In this way, the polarity of the signal is reversed. By making the period of charge and discharge longer than the signal writing period, the frequency of pixel charging and discharging can be reduced. Power consumption can be reduced. However, if the polarity reversal period is too long, the difference in polarity The difference in brightness caused by the polarity of the The period for which the signal is applied is preferably equal to or shorter than the input image signal period Tin.

[0256] (Embodiment 7) Next, another example of the configuration of the display device and a method of driving the same will be described. In this case, an image that interpolates the movement of an image (input image) input from outside the display device is generated by multiple The image is generated inside the display device based on the input image, and the generated image (generated image) and the input The generated image is displayed by compensating for the movement of the input image. By creating an image that looks like it's moving between the two, you can make the movement of the video smoother, and This can improve the problem of video quality being reduced by afterimages caused by video drive. The display of moving images ideally involves changing the brightness of each pixel in real time. This is achieved by controlling the pixels in real time, but the real-time individual control of the pixels is Problems such as an extremely large number of paths, wiring space problems, and an extremely large amount of data in the input image exist, making implementation difficult. Therefore, video display by a display device is achieved by sequentially displaying a plurality of still images at a fixed cycle so that the display appears as a video. This cycle (referred to as the input image signal cycle and denoted as Tin in this embodiment) is standardized. For example, in the NTSC standard, it is 1 / 60 second, and in the PAL standard, it is 1 / 50 second. Even at this level of cycle, there were no problems with video display in a CRT, which is an impulse type display device. However, in a hold type display device, if a video conforming to these standards is displayed as it is, problems such as blurring due to afterimages caused by the hold type occur, resulting in unclear display (hold blur). Hold blur is recognized as a discrepancy between the unconscious movement interpolation by the human eye's tracking and the hold type display. Therefore, it can be reduced by sho...

Claims

【Claim 1】 A first step of performing frame interpolation processing using image data; A second step of performing first super-resolution processing on the m-th frame (m is a natural number of 1 or more) generated by the first step; A third step of performing second super-resolution processing on the (m + 1)-th frame generated by the first step; A fourth step of performing edge enhancement processing using the data generated by the second step and the data generated by the third step; A fifth step of performing overdrive processing using the data generated by the fourth step, and A driving method for a display device, wherein the second step and the third step are performed simultaneously after the first step.

Images