Color filter substrate, display device, and method for manufacturing color filter substrate

Abstract

To miniaturize a light shielding part.SOLUTION: A color filter substrate 20 comprises a first color filter 29G, a second color filter 29B, and a light shielding part 40 disposed at the boundary between the first color filter 29G and the second color filter 29B. The light shielding part 40 includes a first transmission film 41, a first reflection film 42 disposed on the upper layer side of the first transmission film 41, a second transmission film 43 disposed on the upper layer side of the first reflection film 42, and a second reflection film 44 disposed on the upper layer side of the second transmission film 43 and having a film thickness larger than that of the first reflection film 42. The first transmission film 41 has a first bottom face 41A located on the side opposite to the first reflection film 42 side, and a first side face 41B forming a first angle θ1, the acute angle with respect to the first bottom face 41A. The second reflection film 44 has a second bottom face 44A in contact with the upper surface 43C of the second transmission film 43 and parallel to the first bottom face 41A, and a second side face 44B forming a second angle θ2, the acute angle with respect to the second bottom face 44A.SELECTED DRAWING: Figure 8

Description

[Technical Field]

[0001] The technology disclosed in this specification relates to a color filter substrate, a display device, and a method for manufacturing a color filter substrate. [Background technology]

[0002] Conventionally, one example of a color filter substrate provided in an image display panel such as a liquid crystal panel is known from Patent Document 1. In Patent Document 1, a photosensitive composition containing a light-blocking agent, which constitutes a black matrix provided in the color filter substrate, uses an oxime ester compound with a specific structure as a photopolymerization initiator and resin-coated carbon black as a light-blocking agent. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Publication No. 2019-120768 Summary of the Invention [Problem to be solved by the invention]

[0004] In the above-mentioned Patent Document 1, a resin material is used as the material for the black matrix. Therefore, when the pixel density of the image display panel is increased to, for example, 1000 ppi or more (particularly, 1200 ppi or more), there is a problem that the exposure precision when exposing the black matrix using an exposure device is not sufficient, making it difficult to miniaturize the black matrix.

[0005] The technology described in this specification was developed based on the above circumstances, and aims to achieve miniaturization of the light-shielding portion. [Means for solving the problem]

[0006] (1) A color filter substrate according to the technology described in this specification includes a first color filter, a second color filter having a color different from that of the first color filter, and a light-shielding portion disposed below the first color filter and the second color filter at the boundary between the first color filter and the second color filter. The light-shielding portion includes a first transparent film, a first reflective film disposed above the first transparent film, a second transparent film disposed above the first reflective film, and a second reflective film disposed above the second transparent film and having a thickness greater than that of the first reflective film. The first transparent film has a first bottom surface located on the opposite side to the first reflective film and a first side surface that forms a first acute angle with the first bottom surface. The second reflective film has a second bottom surface that is in contact with an upper surface of the second transparent film and is parallel to the first bottom surface, and a second side surface that forms a second acute angle with the second bottom surface.

[0007] (2) In addition to the above (1), the color filter substrate may be configured such that the first reflective film has a third bottom surface in contact with the upper surface of the first transparent film and parallel to the first bottom surface, and a third side surface that forms a third angle with the third bottom surface, the second transparent film has a fourth bottom surface in contact with the upper surface of the first reflective film and parallel to the first bottom surface, and a fourth side surface that forms a fourth angle with the fourth bottom surface, and the first reflective film is configured such that the third side surface is in contact with the upper surface of the first transparent film without being in contact with the first side surface.

[0008] (3) In addition to the above (2), the color filter substrate may be configured such that the third angle and the fourth angle of the light-shielding portion are greater than the first angle.

[0009] (4) In addition to either (2) or (3) above, the color filter substrate may also have a fifth side surface in contact with the second bottom surface, the second reflective film forming a fifth angle that is an obtuse angle with respect to the second bottom surface.

[0010] (5) In addition to any one of (1) to (4) above, the color filter substrate may be configured such that the angle formed by the line segment connecting the outer end of the first transmission film and the outer end of the second reflection film with respect to the first bottom surface is in the range of 70° or more and 90° or less.

[0011] (6) A display device according to the technology described in this specification includes a color filter substrate according to any one of (1) to (5) above, and an array substrate arranged opposite the color filter substrate.

[0012] (7) A method for manufacturing a color filter substrate according to the technology described in this specification includes forming a first transmission film on a substrate, forming a first reflective film on an upper layer side of the first transmission film, forming a second transmission film on an upper layer side of the first reflective film, forming a second reflective film on an upper layer side of the second transmission film, the second reflective film having a thickness larger than that of the first reflective film, forming a photosensitive resist film on an upper layer side of the second reflective film, exposing and developing the resist film, performing a first etching process to etch at least the second reflective film using the resist film as a mask, and A second etching is performed in which the second reflective film, the second transparent film, the first reflective film, and the first transparent film are etched at an etching rate slower than the first etching, using a mask as a mask to form a light-shielding portion made of the first transparent film, the first reflective film, the second transparent film, and the second reflective film, and a first color filter whose end is disposed on the upper layer side of the light-shielding portion is formed, and a second color filter whose color is different from that of the first color filter and whose end is disposed on the upper layer side of the light-shielding portion and adjacent to the first color filter is formed.

[0013] (8) In addition to the above (7), the method for manufacturing a color filter substrate may be such that at least SF6 gas is used in the first etching, and at least CF4 gas and O2 gas are used in the second etching.

[0014] (9) In addition to the above (7) or (8), the method for manufacturing the color filter substrate may also be such that, in the first etching and the second etching, an etching apparatus is used that has a vacuum chamber in which the substrate is accommodated, and a substrate support portion disposed in the vacuum chamber, the substrate support portion having a plurality of protrusions arranged at intervals within the main surface of the substrate and supporting the substrate. [Effects of the Invention]

[0015] According to the technology described in this specification, it is possible to miniaturize the light-shielding portion. [Brief explanation of the drawings]

[0016] [Figure 1] FIG. 1 is a schematic perspective view showing a state in which a user wears a head-mounted display according to a first embodiment on their head. [Figure 2] FIG. 1 is a schematic side view showing the optical relationship between a liquid crystal display device and a lens unit provided in a head-mounted device constituting a head-mounted display according to a first embodiment, and the user's eyeballs. [Figure 3] 1 is a schematic plan view of a liquid crystal panel and a flexible substrate provided in a liquid crystal display device according to Embodiment 1. [Figure 4] 1 is a schematic cross-sectional view of a liquid crystal panel according to a first embodiment. [Figure 5] FIG. 1 is a circuit diagram showing a pixel arrangement in a display area of an array substrate provided in a liquid crystal panel according to a first embodiment. [Figure 6] 1 is a cross-sectional view showing a pixel arrangement in a display area of a liquid crystal panel according to Embodiment 1. [Figure 7] 1 is a cross-sectional view of a color filter substrate provided in a liquid crystal panel according to Embodiment 1. [Figure 8] FIG. 1 is an enlarged cross-sectional view of a second light-shielding portion provided on the color filter substrate according to Embodiment 1. [Figure 9] FIG. 1 is a diagram showing a schematic configuration of an etching apparatus used in a first step of the color filter substrate manufacturing process according to Embodiment 1. [Figure 10]1 is a cross-sectional view showing a state in which a glass substrate is supported by a protrusion of a substrate support portion provided in the etching apparatus according to the first embodiment. [Figure 11] FIG. 1 is a cross-sectional view showing a state in which a resist film has been exposed and developed in a first step of the color filter substrate manufacturing process according to Embodiment 1. [Figure 12] FIG. 1 is a cross-sectional view showing a state in which a first etching step is performed in a first step of the color filter substrate manufacturing process according to Embodiment 1. [Figure 13] FIG. 1 is a cross-sectional view showing a state in which a second etching step is performed in the first step of the color filter substrate manufacturing process according to Embodiment 1. [Figure 14] Table showing experimental results of Comparative Example 1 of Comparative Experiment 1 according to Embodiment 1 [Figure 15] Table showing experimental results of Comparative Example 2 of Comparative Experiment 1 according to Embodiment 1 [Figure 16] Table showing experimental results of Comparative Example 3 of Comparative Experiment 1 according to Embodiment 1 [Figure 17] Table showing experimental results of Comparative Example 4 of Comparative Experiment 1 according to Embodiment 1 [Figure 18] Table showing experimental results of Example 1 of Comparative Experiment 1 according to Embodiment 1 [Figure 19] Table showing experimental results of Example 2 of Comparative Experiment 1 according to Embodiment 1 [Figure 20] Table showing experimental results of Example 3 of Comparative Experiment 1 according to Embodiment 1 [Figure 21] Table showing experimental results of Example 4 of Comparative Experiment 1 according to Embodiment 1 [Figure 22] Table showing experimental results of Example 5 of Comparative Experiment 1 according to Embodiment 1 [Figure 23] Table showing experimental results of Example 6 of Comparative Experiment 1 according to Embodiment 1 [Figure 24] Table showing experimental results of Example 7 of Comparative Experiment 1 according to Embodiment 1 DETAILED DESCRIPTION OF THE INVENTION

[0017] <Embodiment 1> The first embodiment will be described with reference to Fig. 1 to Fig. 24. In this embodiment, a goggle-type head-mounted display (HMD) 10 and a liquid crystal display device 10 used therein are illustrated. Note that X-axis, Y-axis, and Z-axis are shown in a portion of each drawing, and each axis direction is drawn to correspond to the direction shown in each drawing.

[0018] The appearance of the goggle-type head-mounted display 10HMD will be described using Fig. 1. The head-mounted display 10HMD includes a head-mounted device 10HMDa that is worn on the user's head 10HD, as shown in Fig. 1. The head-mounted device 10HMDa surrounds both of the user's eyes.

[0019] The configuration of the head-worn device 10HMDa will be described with reference to FIG. 2. As shown in FIG. 2, the head-worn device 10HMDa incorporates at least a liquid crystal display device 10 that displays an image and a lens unit 10RE that focuses the image displayed on the liquid crystal display device 10 onto the user's eyeball 10EY. The liquid crystal display device 10 includes at least a liquid crystal panel (display device) 11 and a backlight device (illumination device) 12 that irradiates the liquid crystal panel 11 with light. The main surface of the liquid crystal panel 11 facing the lens unit 10RE serves as a display surface 11DS that displays an image. The lens unit 10RE is disposed between the liquid crystal display device 10 and the user's eyeball 10EY. The lens unit 10RE imparts a refracting effect to light. By adjusting the focal length of the lens unit 10RE, the user can perceive an image that is focused on the retina 10EYb via the lens 10EYa of the eyeball 10EY as being displayed on a virtual display 10VD that appears to be located at a distance L2 from the eyeball 10EY. This distance L2 is much greater than the actual distance L1 from the eyeball 10EY to the liquid crystal display device 10. This allows the user to view an enlarged image, which is a virtual image, displayed on the virtual display 10VD, which has a screen size (e.g., about several tens of inches to several hundred inches) that is much larger than the screen size (e.g., about several tenths of an inch to a few inches) of the liquid crystal display device 10.

[0020] It is possible to mount one liquid crystal display device 10 in the head-mounted device 10HMDa and display an image for the right eye and an image for the left eye on that liquid crystal display device 10. Alternatively, it is possible to mount two liquid crystal display devices 10 in the head-mounted device 10HMDa and display an image for the right eye on one liquid crystal display device 10 and an image for the left eye on the other liquid crystal display device 10. The head-mounted device 10HMDa may also be equipped with earphones or the like that are placed against the user's ears to output sound.

[0021] The configuration of the liquid crystal panel 11 included in the liquid crystal display device 10 will be described using Figure 3 and other figures. The backlight device 12 has a known configuration, including, for example, a light source such as an LED and an optical member that converts light from the light source into planar light by applying an optical effect. As shown in Figure 3, the liquid crystal panel 11 has an overall rectangular shape in a planar view. The central portion of the screen of the liquid crystal panel 11 is a display area AA where an image is displayed. The frame-like outer peripheral portion of the screen of the liquid crystal panel 11 surrounding the display area AA is a non-display area NAA where no image is displayed. The area surrounded by a dashed line in Figure 3 is the display area AA. The liquid crystal panel 11 according to this embodiment is used in the head-mounted display 10HMD described above, and therefore has extremely high resolution, with a pixel density of, for example, 1000 ppi or more, particularly 1200 ppi or more.

[0022] As shown in FIG. 3, the liquid crystal panel 11 is formed by bonding a pair of substrates 20 and 21 together. The substrate 20, 21, which is disposed on the front side, is a color filter substrate (counter substrate, CF substrate) 20, and the substrate 21, which is disposed on the back side, is an array substrate (active matrix substrate) 21. The color filter substrate 20 and the array substrate 21 are each formed by laminating various films on the inner surface of glass substrates 20GS and 21GS, respectively, which are substantially transparent and have excellent light-transmitting properties. The substrates 20GS and 21GS are primarily made of, for example, alkali-free glass. The array substrate 21 is larger than the color filter substrate 20, and a portion of it protrudes laterally from the color filter substrate 20. A flexible substrate 13 is mounted on the protruding portion 21A of the array substrate 21. The flexible substrate 13 is configured by forming multiple wiring patterns on an insulating and flexible base material. One end of the flexible substrate 13 is connected to the array substrate 21, and the other end is connected to an external control substrate (signal supply source). Various signals supplied from the control substrate are transmitted to the liquid crystal panel 11 via the flexible substrate 13.

[0023] As shown in FIG. 3, a circuit unit (peripheral circuit unit) 14 is provided in the non-display area NAA of the liquid crystal panel 11. The circuit unit 14 includes a first circuit unit 14A and a second circuit unit 14B. A pair of first circuit units 14A are arranged to sandwich the display area AA from both sides in the X-axis direction. The first circuit unit 14A is provided in a strip-shaped area extending along the Y-axis direction. The first circuit unit 14A supplies scanning signals to gate wiring 25 (described later) and is monolithically provided on the array substrate 21. The first circuit unit 14A is a GDM (Gate Driver Monolithic) circuit. The first circuit unit 14A includes a shift register circuit that outputs scanning signals at predetermined timing, a buffer circuit that amplifies the scanning signals, and the like. The second circuit unit 14B is arranged between the display area AA and the flexible substrate 13 in the Y-axis direction. The second circuit unit 14B is provided in a strip-shaped area extending along the X-axis direction. The second circuit section 14B is for supplying image signals (data signals) to the source lines 26 described below, and is monolithically provided on the array substrate 21. The second circuit section 14B includes an SSD (Source Shared Driving) circuit, etc. The second circuit section 14B has a switch function for distributing image signals supplied by the flexible substrate 13 to each of the source lines 26, etc.

[0024] Next, a cross-sectional configuration of the liquid crystal panel 11 will be outlined with reference to FIG. 4. As shown in FIG. 4, the pair of substrates 20, 21 are disposed facing each other with a gap in the Z-axis direction, which is the normal direction to the principal surfaces of the substrates 20, 21. Between the pair of substrates 20, 21 are at least a liquid crystal layer 22 and a sealing portion 23 that seals the liquid crystal layer 22. The liquid crystal layer 22 contains liquid crystal molecules, which are a substance whose optical properties change when an electric field is applied. The sealing portion 23 has a rectangular frame shape (endless ring) in plan view as a whole, and surrounds the liquid crystal layer 22 all around in the non-display area NAA. The sealing portion 23 maintains a gap (cell gap) equal to the thickness of the liquid crystal layer 22. A polarizing plate 24 is attached to the outer surface of each of the pair of substrates 20, 21.

[0025] An outline of the pixel arrangement in the display area AA of the array substrate 21 will be described with reference to FIG. 5. As shown in FIG. 5, a plurality of gate lines (scanning lines) 25 and source lines (image lines) 26 are arranged in a grid pattern on the inner surface of the display area AA of the array substrate 21. The gate lines 25 extend along the X-axis direction across the display area AA. Multiple gate lines 25 are arranged side by side at intervals in the Y-axis direction. Scanning signals output from the first circuit unit 14A are supplied to the multiple gate lines 25. The source lines 26 extend along the Y-axis direction across the display area AA and intersect with the gate lines 25. Multiple source lines 26 are arranged at intervals in the X-axis direction. Image signals output from the second circuit unit 14B are distributed to the source lines 26. TFTs (switching elements) 27 and pixel electrodes 28 are provided near the intersections of the gate lines 25 and source lines 26. The TFTs 27 and pixel electrodes 28 are regularly arranged in groups along the X-axis and Y-axis directions. The TFTs 27 are connected to the gate wiring 25, the source wiring 26, and the pixel electrodes 28. The TFTs 27 each have a gate electrode 27A connected to the gate wiring 25, a source electrode 27B connected to the source wiring 26, a drain electrode 27C connected to the pixel electrode 28, and a semiconductor portion 27D connected to the source electrode 27B and the drain electrode 27C. The semiconductor portion 27D is made of a semiconductor material and is arranged to overlap the gate electrode 27A. When the TFT 27 is driven based on a scanning signal supplied from the gate wiring 25 to the gate electrode 27A, it charges the pixel electrode 28 to a potential based on an image signal supplied from the source wiring 26 to the source electrode 27B. The pixel electrode 28 is elongated along the Y-axis.

[0026] The configurations of the inner surfaces of the color filter substrate 20 and the array substrate 21 in the display area AA will be described using FIG. 6 . As shown in FIG. 6 , the inner surface of the array substrate 21 in the display area AA is provided with a common electrode 30, a pixel circuit section 31, an alignment film, and the like. Note that the alignment film is not shown. The pixel circuit section 31 includes the gate lines 25, source lines 26, and TFTs 27, and functions to supply a predetermined potential to a plurality of pixel electrodes 28 at a predetermined timing. The common electrode 30 is located above the pixel electrodes 28 and is disposed across almost the entire display area AA. As a result, the common electrode 30 overlaps all of the pixel electrodes 28 disposed in the display area AA. In this manner, in the array substrate 21 according to this embodiment, the common electrode 30 is the "upper electrode," which is the electrode located above the pixel electrodes 28 and the common electrode 30, and the pixel electrode 28 is the "lower electrode," which is the electrode located below. An insulating film 32 is interposed between the pixel electrodes 28 and the common electrode 30. A plurality of slits 30A are formed in the common electrode 30 at portions thereof overlapping the plurality of pixel electrodes 28. A common potential signal, which serves as a common potential (reference potential), is supplied to the common electrode 30 by the pixel circuit unit 31. When the TFTs 27 are driven and the pixel electrodes 28 are charged to a potential based on an image signal transmitted to the source lines 26, a potential difference is generated between the pixel electrodes 28 and the common electrode 30. A fringe electric field (oblique electric field) is then generated between the edge of the slits 30A in the common electrode 30 and the pixel electrodes 28, the oblique electric field including a component normal to the principal surface of the array substrate 21 in addition to a component along the principal surface of the array substrate 21. Therefore, the fringe electric field can be utilized to control the orientation of liquid crystal molecules contained in the liquid crystal layer 22, and a predetermined display is achieved based on the orientation of the liquid crystal molecules. In other words, the liquid crystal panel 11 according to this embodiment operates in a fringe field switching (FFS) mode.

[0027] On the other hand, as shown in FIG. 6, a color filter 29, a light-shielding portion 40, and an alignment film are provided on the inner surface side of the display area AA of the color filter substrate 20. The alignment film is not shown. The alignment films provided on the color filter substrate 20 and the array substrate 21 are made of an organic material such as polyimide. Each alignment film is provided on the innermost side (closest to the liquid crystal layer 22) of the color filter substrate 20 and the array substrate 21. Each alignment film has the function of aligning liquid crystal molecules by undergoing a photo-alignment treatment on the upper surface facing the liquid crystal layer 22.

[0028] As shown in FIG. 6 , the color filters 29 are arranged overlapping the pixel electrodes 28 of the array substrate 21, and together with the overlapping pixel electrodes 28, form pixels, which are display units. The color filters 29 include multiple types (three types) of color filters that exhibit different colors. The multiple types of color filters 29 that exhibit different colors are arranged side by side in the extension direction (X-axis direction) of the gate wiring 25. In other words, the arrangement direction of the multiple types of color filters 29 that exhibit different colors coincides with the X-axis direction. The multiple types of color filters 29 that exhibit different colors extend along the extension direction (Y-axis direction) of the source wiring 26. In this way, the multiple types of color filters 29 that exhibit different colors are arranged in a vertical stripe pattern as a whole. The multiple color filters 29 that exhibit different colors are arranged so that their boundaries (color boundaries) overlap with the source wiring 26. The color filters 29 include three types: a green color filter (first color filter) 29G that exhibits green, a blue color filter (second color filter) 29B that exhibits blue, and a red color filter (third color filter) 29R that exhibits red. The green color filter 29G, together with the overlapping pixel electrode 28, forms a green pixel (first pixel) that exhibits green. The blue color filter 29B, together with the overlapping pixel electrode 28, forms a blue pixel (second pixel) that exhibits blue. The red color filter 29R, together with the overlapping pixel electrode 28, forms a red pixel (third pixel) that exhibits red. Note that in FIG. 6 and other figures, the colors exhibited by the color filters 29 are represented by the letters R (Red), G (Green), and B (Blue).

[0029] As shown in FIG. 6 , the light-shielding portions 40 are provided on the inner surface of the glass substrate (substrate) 20GS and are positioned below the color filters 29. The light-shielding portions 40 extend along the Y-axis direction and overlap the source wiring 26 provided on the array substrate 21. A plurality of the light-shielding portions 40 are arranged side by side at intervals along the X-axis direction, forming a vertical stripe pattern in a plan view. The light-shielding portions 40 are respectively arranged at color boundaries between the plurality of color filters 29 that exhibit different colors. Specifically, the light-shielding portions 40 include a light-shielding portion 40 arranged at the boundary between the green color filter 29G and the blue color filter 29B, a light-shielding portion 40 arranged at the boundary between the blue color filter 29B and the red color filter 29R, and a light-shielding portion 40 arranged at the boundary between the red color filter 29R and the green color filter 29G. The arrangement intervals of the light-shielding portions 40 are approximately the same as the arrangement intervals of the source wiring 26. The light blocking portion 40 can block light from passing between pixels that exhibit different colors, thereby making it difficult for color mixture to occur and ensuring the display independence of the display of each pixel that exhibits each color.

[0030] The detailed configuration of the light-shielding section 40 will be described. As shown in FIG. 7, the light-shielding section 40 has a layered structure (multilayer film structure) made up of, from bottom to top, a first transmission film 41, a first reflective film (reflective / transmission film) 42, a second transmission film 43, and a second reflective film 44. The first transmission film 41 is provided on the inner surface of the glass substrate 20GS. The first reflective film 42 is disposed above the first transmission film 41. The second transmission film 43 is disposed above the first reflective film 42. The second reflective film 44 is disposed above the second transmission film 43.

[0031] The first transmission film 41 is preferably made of a material that is almost transparent and has a high refractive index, such as a light-transmitting resin material (e.g., SiN xThe first transmission film 41 is made of a material such as silicon nitride (silicon nitride) and has a refractive index of about 1.9. The first transmission film 41 has a function of reducing reflection of external light by utilizing thin film interference, which will be described later. In order to achieve the function of reducing reflection of external light described above, the film thickness of the first transmission film 41 is preferably set in the range of, for example, 20 nm to 100 nm, and specifically, for example, about 70 nm.

[0032] The first reflective film 42 is preferably made of a material with high light reflectivity and light blocking properties, and is made of a metal material (for example, W (tungsten) or the like). The first reflective film 42 has the function of reducing reflection of external light, which will be described later, and the function of re-reflecting light reflected by the second reflective film 44, which will be described later. In order to fulfill the above-mentioned functions, the film thickness of the first reflective film 42 is preferably set to, for example, a range of 3 nm to 20 nm, and specifically, is set to, for example, approximately 10 nm. The film thickness of the first reflective film 42 is smaller than the film thickness of the second reflective film 44. Compared to the second reflective film 44, the first reflective film 42 has a higher light transmittance and a lower light reflectance. Compared to each of the transmission films 41 and 43, the first reflective film 42 has a lower light transmittance and a higher light reflectance, resulting in a high light blocking property. Specifically, the film thickness of the first reflective film 42 is adjusted so that the light transmittance and light reflectance are approximately 50% each.

[0033] The second transparent film 43 is preferably made of a material that is almost transparent and has a high refractive index, such as a light-transmitting resin material (e.g., SiN x The second transmission film 43 is made of a material such as a glass substrate (e.g., a glass substrate), and has a refractive index of about 1.9. The second transmission film 43 has a function of reducing reflection of external light by utilizing thin film interference, which will be described later. In order to achieve the function of reducing reflection of external light described above, the film thickness of the second transmission film 43 is preferably set to a range of, for example, 20 nm to 100 nm, and specifically, for example, about 60 nm. The film thickness of the second transmission film 43 is smaller than the film thickness of the first transmission film 41.

[0034] The second reflective film 44 is preferably made of a material with high light reflectivity and light blocking properties, such as a metal material (e.g., W). The second reflective film 44 primarily functions to block light emitted from the backlight device 12. That is, the second reflective film 44 can block light that attempts to pass between the color filters 29R, 29G, and 29B that are adjacent in the X-axis direction and exhibit different colors. To achieve the above-mentioned light blocking function, the second reflective film 44 preferably has a thickness of, for example, 30 nm or more, and more specifically, is approximately 100 nm. The thickness of the second reflective film 44 is greater than the thickness of the first reflective film 42. Compared to the first reflective film 42, the second reflective film 44 has a lower light transmittance and higher light blocking and reflectance. Specifically, the thickness of the second reflective film 44 is adjusted so that the light reflectance is approximately 100% and the light transmittance is approximately 0%.

[0035] Thus, the second reflective film 44 has the lowest light transmittance and the highest light reflectance among the films constituting the light-shielding portion 40. Therefore, the amount of reflected light generated when external light incident on the liquid crystal panel 11 from the outside on the front side is reflected by the second reflective film 44 is greater than the amount of light reflected by the first reflective film 42. If the light reflected by the second reflective film 44 were to be emitted as is, there is a risk of significant degradation in display quality.

[0036] In contrast, among the films constituting the light-shielding section 40, the first transmission film 41, the first reflective film 42, and the second transmission film 43 mainly function to suppress reflection of external light incident on the liquid crystal panel 11 from the outside on the front side. More specifically, the above-mentioned external light passes through the glass substrate 20GS of the color filter substrate 20 and then enters the first transmission film 41. A portion of the light that enters the first transmission film 41 is reflected at the interface between the glass substrate 20GS and the first transmission film 41 (the bottom surface of the first transmission film 41), and the remainder passes through the first transmission film 41 and reaches the first reflective film 42. A portion (approximately 50%) of the light that reaches the first reflective film 42 is reflected at the interface between the first transmission film 41 and the first reflective film 42 (the bottom surface of the first reflective film 42), and the remainder (approximately 50%) passes through the first reflective film 42. A portion of the light that has passed through the first reflective film 42 is reflected at the interface between the first reflective film 42 and the second transmissive film 43 (the bottom surface of the second transmissive film 43), and the remainder passes through the second transmissive film 43 and reaches the second reflective film 44. Almost all of the light that has reached the second reflective film 44 is reflected at the interface between the second transmissive film 43 and the second reflective film 44 (the bottom surface of the second reflective film 44). When the light reflected at the interface between the second transmissive film 43 and the second reflective film 44 passes through the second transmissive film 43 and reaches the first reflective film 42, a portion (approximately 50%) of the light passes through the first reflective film 42, while the remainder (approximately 50%) is reflected again by the first reflective film 42 and travels toward the second reflective film 44. This prevents the light reflected at the interface between the second transmissive film 43 and the second reflective film 44 from emitting downward from the first transmissive film 41.

[0037] Here, light reflected at the interface between the first transmission film 41 and the first reflective film 42 and light reflected at the interface between the second transmission film 43 and the second reflective film 44 and transmitted through the first reflective film 42 are canceled out to a certain extent based on interference conditions according to the refractive indexes and film thicknesses of the first transmission film 41 and the second transmission film 43. That is, the refractive indexes and film thicknesses of the first transmission film 41 and the second transmission film 43 are adjusted so that the reflected light at the interface between the first transmission film 41 and the first reflective film 42 and the reflected light at the interface between the second transmission film 43 and the second reflective film 44 are in opposite phase to each other. Specifically, in this embodiment, the film thickness of the first transmission film 41 is approximately 70 nm, the refractive index of the first transmission film 41 is approximately 1.9, the film thickness of the second transmission film 43 is approximately 60 nm, and the refractive index of the second transmission film 43 is approximately 1.9. As a result, the light reflected at the interface between the first transmission film 41 and the first reflective film 42 and the light reflected at the interface between the second transmission film 43 and the second reflective film 44 and transmitted through the first reflective film 42 are in opposite phases, and these lights efficiently cancel each other out, thereby reducing the reflection of external light by the light-shielding portion 40. Moreover, part of the light reflected at the interface between the second transmission film 43 and the second reflective film 44 is repeatedly reflected between the second reflective film 44 and the first reflective film 42 and does not exit to the outside on the front side. In this way, the low reflectivity of the light-shielding portion 40 is achieved, and the degradation of display quality due to the installation of the light-shielding portion 40 can be sufficiently suppressed.

[0038] As described above, the light-shielding portion 40 according to this embodiment has a laminated structure of the first transmitting film 41, the first reflective film 42, the second transmitting film 43, and the second reflective film 44. Therefore, compared to the conventional case where the light-shielding portion 40 is made of a resin material, the exposure accuracy of the exposure device used to pattern the light-shielding portion 40 in the manufacturing process can be sufficiently increased. This is suitable for miniaturizing the light-shielding portion 40.

[0039] The detailed configuration of each film 41 to 44 constituting the light-shielding portion 40 will be described mainly with reference to FIG. 8. As shown in FIG. 8, the first transmitting film 41 has a first bottom surface 41A in contact with the glass substrate 20GS and a first side surface 41B inclined relative to the first bottom surface 41A. The first bottom surface 41A is the surface of the first transmitting film 41 opposite the top surface 41C and located opposite the first reflecting film 42. The first bottom surface 41A is a flat surface extending along the X-axis direction (width direction of the light-shielding portion 40) and the Y-axis direction (length direction of the light-shielding portion 40). A pair of first side surfaces 41B are provided at both ends of the first transmitting film 41 in the X-axis direction. The first side surfaces 41B are inclined surfaces that form a first angle θ1 with respect to the first bottom surface 41A. The first angle θ1 is an acute angle that is smaller than 90°. That is, the first side surface 41B is an inclined surface that tapers forward relative to the first bottom surface 41A. Specifically, the first angle θ1 is set to, for example, a range of 29° to 75°, and Fig. 8 shows an example where the first angle θ1 is set to approximately 52°. The rising base end of the first side surface 41B (the point of contact between the first side surface 41B and the inner surface of the glass substrate 20GS) is the outer end 41D of the first transmitting film 41 in the X-axis direction.

[0040] As shown in FIG. 8, the second reflective film 44 has a second bottom surface 44A in contact with the top surface 43C of the second transmitting film 43 and a second side surface 44B inclined relative to the second bottom surface 44A. The second bottom surface 44A is the surface of the second reflective film 44 opposite the top surface 44C and is parallel to the first bottom surface 41A. A pair of second side surfaces 44B are provided at both ends of the second reflective film 44 in the X-axis direction. The second side surface 44B is an inclined surface that forms a second angle θ2 with respect to the second bottom surface 44A. The second angle θ2 is an acute angle and is smaller than 90°. In other words, the second side surface 44B is an inclined surface that tapers forward relative to the second bottom surface 44A. Specifically, the second angle θ2 is, for example, in the range of 50° to 65°, and FIG. 8 illustrates an example in which the second angle θ2 is approximately 57°.

[0041] As described above, in this embodiment, the first side surface 41B of the first transmitting film 41 forms an acute first angle θ1 with respect to the first bottom surface 41A, and the second side surface 44B of the second reflective film 44 forms an acute second angle θ2 with respect to the second bottom surface 44A. Therefore, compared to a case where the first side surface forms an obtuse angle with respect to the first bottom surface 41A and the second side surface forms an obtuse angle with respect to the second bottom surface 44A, when forming the color filters 29R, 29G, 29B during the manufacturing process, the wettability of the material of the color filters 29R, 29G, 29B near the light-shielding portion 40 is improved. Because the material of the color filters 29R, 29G, 29B is less likely to be repelled near the light-shielding portion 40, unintended openings (non-formed portions) are less likely to occur in the color filters 29R, 29G, 29B.

[0042] 8, the first reflective film 42 has a third bottom surface 42A in contact with the top surface 41C of the first transmissive film 41 and a third side surface 42B that forms a third angle θ3 with respect to the third bottom surface 42A. The third bottom surface 42A is the surface of the first reflective film 42 opposite the top surface 42C, located opposite the second transmissive film 43, and parallel to the first bottom surface 41A. A pair of third side surfaces 42B are provided at both ends of the first reflective film 42 in the X-axis direction. The third angle θ3 that the third side surface 42B forms with respect to the third bottom surface 42A may be smaller than 90°, greater than 90°, or even 90°. In other words, the third side surface 42B may be a forward-tapered inclined surface with respect to the third bottom surface 42A, a reverse-tapered inclined surface, or even a vertical surface. Specifically, the third angle θ3 is set, for example, in the range of 73° to 105°, and FIG. 8 illustrates a case where the third angle θ3 is set to approximately 80°. Furthermore, the third angle θ3 is greater than the first angle θ1 and the second angle θ2. In this embodiment, the first reflective film 42 is configured so that the third side surface 42B is in contact with the upper surface 41C of the first transmissive film 41 without being in contact with the first side surface 41B. In other words, the first reflective film 42 is disposed so that the third side surface 42B is recessed inward relative to the first side surface 41B of the first transmissive film 41.

[0043] As shown in FIG. 8 , the second transmission film 43 has a fourth bottom surface 43A in contact with the top surface 42C of the first reflection film 42 and a fourth side surface 43B that forms a fourth angle θ4 with the fourth bottom surface 43A. The fourth bottom surface 43A is the surface of the second transmission film 43 opposite the top surface 43C, is located opposite the second reflection film 44, and is parallel to the first bottom surface 41A. A pair of fourth side surfaces 43B are provided at both ends of the second transmission film 43 in the X-axis direction. The fourth angle θ4 that the fourth side surface 43B forms with the fourth bottom surface 43A may be smaller than 90°, may be larger than 90°, or may even be 90°. In other words, the fourth side surface 43B may be a forward-tapered inclined surface with respect to the fourth bottom surface 43A, may be a reverse-tapered inclined surface, or may even be a vertical surface. Specifically, the fourth angle θ4 is set, for example, in the range of 73° to 105°, and FIG. 8 illustrates a case where the fourth angle θ4 is set to approximately 80°. The fourth angle θ4 is greater than the first angle θ1 and the second angle θ2. In this embodiment, the fourth side surface 43B of the second transmitting film 43 is substantially flush with and parallel to the third side surface 42B of the first reflecting film 42. That is, the fourth side surface 43B of the second transmitting film 43 is recessed inward relative to the first side surface 41B of the first transmitting film 41.

[0044] 8, the second reflective film 44 has a fifth side surface 44D in addition to the second side surface 44B. The fifth side surface 44D forms an obtuse fifth angle θ5 with the second bottom surface 44A and is in contact with both the second side surface 44B and the second bottom surface 44A. That is, the fifth side surface 44D is an inclined surface that is inversely tapered with respect to the second bottom surface 44A. Specifically, the fifth angle θ5 is, for example, in the range of 97° to 137°, and FIG. 8 illustrates an example in which the fifth angle θ5 is approximately 110°. The point of contact between the fifth side surface 44D and the second side surface 44B is the outer end 44E of the second reflective film 44 in the X-axis direction. That is, the portion of the second reflective film 44 including the outer end 44E protrudes outward in the X-axis direction relative to the second transmitting film 43. Furthermore, the contact point between the fifth side surface 44D and the second side surface 44B is located closer to the second bottom surface 44A in the Z-axis direction than to the top surface 44C. That is, the fifth side surface 44D has a smaller area than the second side surface 44B.

[0045] 8, the light-shielding portion 40 is configured so that a line segment LS connecting the outer edge 41D of the first transmitting film 41 and the outer edge 44E of the second reflecting film 44 forms an acute angle with the first bottom surface 41A. Specifically, the light-shielding portion 40 is configured so that a sixth angle θ6, which is the angle that the line segment LS forms with the first bottom surface 41A, is in the range of 70° to 90°. Note that in FIG. 8, the line segment LS is illustrated by a two-dot chain line. The sixth angle θ6 is greater than the first angle θ1 and the second angle θ2.

[0046] The liquid crystal display device 10 according to this embodiment has the above-described structure, and its manufacturing method will now be described. The liquid crystal display device 10 is manufactured by assembling a liquid crystal panel 11 and a backlight device 12, which are manufactured separately. The manufacturing method for the liquid crystal panel 11 includes a color filter substrate manufacturing process (CF substrate manufacturing process) for manufacturing a color filter substrate 20, an array substrate manufacturing process for manufacturing an array substrate 21, and a bonding process for bonding the manufactured color filter substrate 20 and the array substrate 21 together. The color filter substrate manufacturing process will be described below.

[0047] The color filter substrate manufacturing process includes at least a first step (second light-shielding portion forming step) of forming a light-shielding portion 40 on the inner surface of the glass substrate 20GS, and a second step (color filter forming step) of forming a color filter 29 on the upper side of the light-shielding portion 40. The first step will be described in detail below.

[0048] In the first step, a first transparent film 41, a first reflective film 42, a second transparent film 43, a second reflective film 44, and a resist film R are formed (film formation step), and the resist film R is exposed and developed (exposure and development step). In the film formation step, the first transparent film 41 is formed on the glass substrate (substrate) 20GS, the first reflective film 42 is formed on the upper side of the first transparent film 41, the second transparent film 43 is formed on the upper side of the first reflective film 42, the second reflective film 44, which is thicker than the first reflective film 42, is formed on the upper side of the second transparent film 43, and the photosensitive resist film R is formed on the upper side of the second reflective film 44. The resist film R may be positive-type or negative-type. In the exposure and development step, light emitted from a light source of an exposure device is irradiated onto the resist film R through a photomask having a predetermined exposure pattern. Portions of the resist film R corresponding to the exposure pattern of the photomask are selectively exposed. When the exposed resist film R is developed, the exposed or unexposed portions of the resist film R are selectively removed (see FIG. 11).

[0049] In the first step, after the exposure and development steps are completed, etching is performed using the resist film R as a mask (etching step). An etching apparatus 50 shown in FIG. 9 is used in the etching step. The etching apparatus 50 will be described. The etching apparatus 50 of this embodiment is a dry etching apparatus that employs an inductively coupled plasma (ICP) method. As shown in FIG. 9, the etching apparatus 50 includes at least a vacuum chamber (etching processing chamber) 51, a substrate support 52, a dielectric 53, and a coil (antenna) 54. The vacuum chamber 51 can accommodate a glass substrate 20GS therein and is maintained in a vacuum state during etching. The dielectric 53 is made of, for example, quartz glass and is disposed at an upper portion within the vacuum chamber 51. The coil 54 is disposed above the dielectric 53 outside the vacuum chamber 51. A first high-frequency power supply (plasma generation power supply) RF1 is connected to the coil 54, and a high-frequency current (RF (radio-frequency) current) is supplied from the first high-frequency power supply RF1. As a high-frequency current is supplied from the first high-frequency power supply RF1 to the coil 54, an induced electric field is generated in the plasma, and the resulting acceleration of electrons generates high-density plasma. The substrate support 52 is disposed at the bottom of the vacuum chamber 51 and supports the glass substrate 20GS. The substrate support 52 constitutes a lower electrode, and is connected to a second high-frequency power supply (bias power supply) RF2. A high-frequency current is supplied to the substrate support 52, which is the lower electrode, by the second high-frequency power supply RF2.

[0050] As shown in FIG. 10 , the substrate support portion 52 has multiple protrusions (embossments) 52A on its main surface facing the glass substrate 20GS. The multiple protrusions 52A are arranged at intervals in the X-axis direction and the Y-axis direction on the main surface of the glass substrate 20GS and support the glass substrate 20GS from below. The multiple protrusions 52A are arranged at intervals of several millimeters. The protrusions 52A are roughly hemispherical and make point contact with the main surface of the glass substrate 20GS. Because the substrate support portion 52 has multiple protrusions 52A, the contact area of the substrate support portion 52 with the glass substrate 20GS is smaller than if the substrate support portion were to make surface contact with the main surface of the glass substrate 20GS. This reduces the likelihood of etching defects caused by the adhered material, even if material from the first reflective film 42 or the second reflective film 44 scatters and adheres to the surface of the substrate support portion 52 during etching.

[0051] 10, the glass substrate 20GS has portions that contact the protrusions 52A and portions that do not contact the protrusions 52A, which raises concerns about differences in heat dissipation. If differences in the heat dissipation of the glass substrate 20GS occur between portions, differences will occur in the amount of recession of the resist film R as etching progresses, which could result in differences in the finished width dimension (dimension in the X-axis direction) of the light-shielding portion 40. If differences in the width dimension of the light-shielding portion 40 occur between portions of the glass substrate 20GS in this way, there is a risk that display unevenness reflecting the arrangement spacing of the protrusions 52A will be visible.

[0052] To solve this problem, in this embodiment, the etching process includes a first etching process and a second etching process having a slower etching rate than the first etching process. Specifically, in the first etching process, at least the second reflective film 44 is etched using the resist film R as a mask, and the etching rate is faster than the etching rate in the second etching process. Specifically, in the first etching process, at least SF gas is used as the etching gas (reactive gas) introduced into the vacuum chamber 51, thereby making the etching rate faster than the etching rate in the second etching process. On the other hand, in the second etching process, the second reflective film 44, the second transparent film 43, the first reflective film 42, and the first transparent film 41 are etched using the resist film R as a mask, and the etching rate is slower than the etching rate in the first etching process. Specifically, in the second etching process, at least CF gas and O gas are used as the etching gas introduced into the vacuum chamber 51, thereby making the etching rate slower than the etching rate in the first etching process.

[0053] As shown in Fig. 11, the first etching step is performed by etching at least the second reflective film 44 through the resist film R that has been patterned through the exposure and development steps. When the first etching step is performed, at least the portion of the second reflective film 44 that is not covered by the resist film R is removed, as shown in Fig. 12. Because the etching rate in the first etching step is faster than the etching rate in the second etching step, the second reflective film 44 at the stage after the first etching step is processed so that its side surface forms a large angle of nearly 90° with respect to the bottom surface.

[0054] Subsequently, when a second etching step is performed via the resist film R, as shown in Fig. 13, portions of the second reflective film 44, the second transparent film 43, the first reflective film 42, and the first transparent film 41 that are not covered by the resist film R are removed, thereby forming the light-shielding portion 40. In Fig. 13, the films 41 to 44 and R in the state before the second etching step are shown by two-dot chain lines. Since the etching rate in the second etching step is slower than the etching rate in the first etching step, the resist film R gradually retreats as the etching progresses, and the second reflective film 44, the second transparent film 43, the first reflective film 42, and the first transparent film 41 are gradually etched. As a result, the second reflective film 44, the second transparent film 43, the first reflective film 42, and the first transparent film 41 are processed so that the angles that the side surfaces 41B to 44B form with the bottom surfaces 41A to 44A are smaller than the angles of the side surfaces that would be formed if only the first etching step were performed without the second etching step. After the second etching step is completed, ashing is performed to remove the resist film R (ashing step).

[0055] After the first step is completed, the second step is performed. In the second step, materials for the color filters 29R, 29G, and 29B of each color are sequentially applied to the inner surface of the glass substrate 20GS using an inkjet device or the like. For example, when the material for the green color filter 29G is applied, its edge is disposed on the upper layer side of the light-shielding portion 40. Next, when the material for the blue color filter 29B is applied, its edge is disposed adjacent to the green color filter 29G on the upper layer side of the light-shielding portion 40. Then, when the material for the red color filter 29R is applied, its edge is disposed adjacent to the green color filter 29G and the blue color filter 29B on the upper layer side of the light-shielding portion 40. Note that the order in which the materials for the color filters 29R, 29G, and 29B of each color are applied can be changed as appropriate.

[0056] As described above, in the first step according to this embodiment, by performing the first etching step and then the second etching step, it is possible to make at least the first angle θ1 that the first side surface 41B of the first permeable film 41 makes with respect to the first bottom surface 41A and the second angle θ2 that the second side surface 44B of the second reflective film 44 makes with respect to the second bottom surface 44A both acute angles. Furthermore, the first reflective film 42 and the second permeable film 43 have their respective side surfaces 42B, 43B recessed inward from the first side surface 41B of the first permeable film 41, and the third side surface 42B comes into contact with the upper surface 41C of the first permeable film 41 without coming into contact with the first side surface 41B. In addition, the third angle θ3 that the third side surface 42B of the first reflective film 42 makes with the third bottom surface 42A and the fourth angle θ4 that the fourth side surface 43B of the second transparent film 43 makes with the fourth bottom surface 43A are both larger than the first angle θ1.

[0057] According to this embodiment, recession of the first transmission film 41 and the second transmission film 43 is suppressed compared to when the etching process is performed only with the first etching process, making it less likely that a large undercut will occur in the light-shielding portion 40. Furthermore, according to this embodiment, compared to when the etching process is performed only with the second etching process, both the first angle θ1 formed by the first side surface 41B of the first transmission film 41 with respect to the first bottom surface 41A and the second angle θ2 formed by the second side surface 44B of the second reflective film 44 with respect to the second bottom surface 44A can be increased. Therefore, heat transfer from the second reflective film 44 to the first transmission film 41 is reduced, thereby mitigating the difference in heat dissipation that may occur between the portion of the glass substrate 20GS that contacts the protrusion 52A and the portion that does not contact the protrusion 52A. This results in a uniform finished width dimension of the light-shielding portion 40, thereby equalizing the amount of light transmitted through each of the color filters 29R, 29G, and 29B. Furthermore, compared to the case where the first angle that the first side surface of the first transmitting film 41 makes with respect to the first bottom surface 41A and the second angle that the second side surface of the second reflective film 44 makes with respect to the second bottom surface 44A are both obtuse angles, when forming the color filters 29G, 29B in the second step, the wettability of the material of the color filters 29G, 29B near the light-shielding portion 40 is improved. Therefore, the material of the color filters 29G, 29B is less likely to be repelled near the light-shielding portion 40, making it less likely that unintended openings will be formed in the color filters 29G, 29B.

[0058] Furthermore, because the third side surface 42B of the first reflective film 42 is recessed inward relative to the first side surface 41B, heat transfer from the first reflective film 42 to the first transmissive film 41 is lower than in a configuration in which the third side surface is in contact with the first side surface 41B. Therefore, even if the substrate support portion 52 included in the etching apparatus 50 used in the etching step has a configuration in which a plurality of intermittently arranged protrusions 52A are provided, a difference in heat dissipation is unlikely to occur between the portion of the glass substrate 20GS that is in contact with the protrusions 52A and the portion that is not in contact with the protrusions 52A. This results in a uniform finish of the light-shielding portion 40, and therefore the amount of transmitted light passing through each of the color filters 29R, 29G, and 29B is equalized. Moreover, since the light-shielding portion 40 is configured such that the third angle θ3 and the fourth angle θ4 are larger than the first angle θ1, the heat transfer from the first reflective film 42 to the first transmissive film 41 is lower than if the third angle θ3 and the fourth angle θ4 were equal to or smaller than the first angle θ1. This results in a more uniform finish of the light-shielding portion 40. Furthermore, the second reflective film 44 has a fifth side surface 44D that forms an obtuse fifth angle θ5 with respect to the second bottom surface 44A and is in contact with the second bottom surface 44A, and is configured such that a portion of the second reflective film 44 protrudes outward from the second transmissive film 43. This results in a more uniform finish of the light-shielding portion 40.

[0059] Furthermore, the light-shielding portion 40 is configured such that the sixth angle θ6 formed by the line segment LS connecting the outer edge 41D of the first transmitting film 41 and the outer edge 44E of the second reflective film 44 with respect to the first bottom surface 41A is in the range of 70° to 90°. Because the sixth angle θ6 is 90° or less, the wettability of the material of the color filters 29R, 29G, and 29B near the light-shielding portion 40 is improved when forming the color filters 29R, 29G, and 29B in the second step, compared to when the sixth angle exceeds 90°. This reduces the likelihood of the material of the color filters 29R, 29G, and 29B being repelled near the light-shielding portion 40, making it more unlikely that unintended openings will occur in the color filters 29R, 29G, and 29B. On the other hand, because the sixth angle θ6 is 70° or greater, heat transfer from the second reflective film 44 to the first transmitting film 41 is lower than when the sixth angle is less than 70°. Therefore, even if the substrate support portion 52 included in the etching apparatus 50 used in the etching step has a plurality of intermittently arranged protrusions 52A, a difference in heat dissipation is unlikely to occur between the portion of the glass substrate 20GS that contacts the protrusions 52A and the portion that does not contact the protrusions 52A. This makes the finished width dimension of the light-shielding portion 40 uniform, thereby equalizing the amount of light transmitted through each of the color filters 29R, 29G, and 29B.

[0060] Next, to verify the superiority of the color filter substrate 20 according to this embodiment, the following Comparative Experiment 1 was conducted. In Comparative Experiment 1, the conditions of the first step included in the color filter substrate manufacturing process were changed as described below, and a light-shielding portion 40 was provided on each of the color filter substrates 20 of Comparative Examples 1 to 4 and Examples 1 to 7.

[0061] In Comparative Example 1, the first step is composed of only the first etching step, and SF6 gas and O2 gas are used. In Comparative Examples 2 and 3, the first step is composed of only the second etching step, and CF4 gas and O2 gas are used. Comparative Examples 2 and 3 are both composed of the same conditions, but etching is performed in different vacuum chambers 51 among the multiple vacuum chambers 51 provided in the etching apparatus 50. Comparative Example 4 and Examples 1 to 7 are common in that the first step is composed of the first etching step and the second etching step, and the first etching step is performed before the second etching step. Comparative Example 4 and Examples 1 to 7 are also common in that SF6 gas and O2 gas are used in the first etching step, and CF4 gas, O2 gas, and Cl2 gas are used in the second etching step.

[0062] On the other hand, Comparative Example 4 and Examples 1 to 7 differ in any one of the time for performing the first etching step, the time for performing the second etching step, and the flow rate of Cl2 gas in the second etching step, and Example 1 serves as a reference for these parameters. Specifically, in Example 2, the time for performing the first etching step is 10 seconds longer than in Example 1. In Example 3, the time for performing the first etching step is 10 seconds shorter than in Example 1. In Example 4, the flow rate of Cl2 gas in the second etching step is 1.33 times that of Example 1. In Example 5, the flow rate of Cl2 gas in the second etching step is 0.66 times that of Example 1. In Example 6, the time for performing the second etching step is 15 seconds longer than in Example 1. In Example 7, the time for performing the second etching step is 15 seconds shorter than in Example 1. In Comparative Example 4, the time for performing the second etching step is 30 seconds longer than in Example 1.

[0063] In Comparative Experiment 1, images (SEM images) of the light-shielding portions 40 of the manufactured color filter substrates 20 of Comparative Examples 1 to 4 and Examples 1 to 7 were obtained using a scanning electron microscope (SEM). Based on the obtained images of the light-shielding portions 40, a sixth angle θ6 was measured, which was the angle formed by a line segment LS connecting the outer edge 41D of the first transmission film 41 and the outer edge 44E of the second reflective film 44 with the first bottom surface 41A. Furthermore, each of the color filter substrates 20 of Comparative Examples 1 to 4 and Examples 1 to 7 was bonded to an array substrate 21 to manufacture a liquid crystal panel 11, and a lighting test was performed on the manufactured liquid crystal panel 11 to determine whether or not display unevenness (defective display) was visible. The experimental results of Comparative Experiment 1 are shown in FIGS. 14 to 24. FIGS. 14 to 24 show the images, the sixth angle θ6, and the determination results. The sixth angle θ6 is measured in degrees. The evaluation results are represented as follows: "◯" indicates that the display unevenness is almost not visible; "X" indicates that the display unevenness is visible across the entire area; and "Δ" indicates that the display unevenness is partially visible. Fig. 14 shows the experimental results of Comparative Example 1. Fig. 15 shows the experimental results of Comparative Example 2. Fig. 16 shows the experimental results of Comparative Example 3. Fig. 17 shows the experimental results of Comparative Example 4. Fig. 18 shows the experimental results of Example 1. Fig. 19 shows the experimental results of Example 2. Fig. 20 shows the experimental results of Example 3. Fig. 21 shows the experimental results of Example 4. Fig. 22 shows the experimental results of Example 5. Fig. 23 shows the experimental results of Example 6. Fig. 24 shows the experimental results of Example 7.

[0064] The experimental results of Comparative Experiment 1 will be described. As shown in Figs. 14 to 17, in Comparative Examples 1 to 4, the judgment result was either "×" or "△", and the sixth angle θ6 was smaller than 70° or larger than 90°. Specifically, in Comparative Example 1, the judgment result was "×", and the sixth angle θ6 was 99°. In Comparative Example 2, the judgment result was "△", and the sixth angle θ6 was 50°. In Comparative Example 3, the judgment result was "×", and the sixth angle θ6 was 47°. In Comparative Example 4, the judgment result was "△", and the sixth angle θ6 was 64°. In Comparative Example 1, a large undercut occurred in the light-shielding portion 40 and the sixth angle θ6 exceeded 90°. This resulted in poor wettability of the material of the color filters 29R, 29G, and 29B near the light-shielding portion 40 during the formation of the color filters 29R, 29G, and 29B, causing the material to repel. As a result, unintended openings (non-formed portions) were formed in the color filters 29R, 29G, and 29B. This is thought to be why the evaluation result was "×." In Comparative Examples 2 to 4, the sixth angle θ6 was smaller than 70°, resulting in high heat transfer from the second reflective film 44 to the first transmissive film 41. Therefore, in Comparative Examples 2 to 4, a large difference in heat dissipation occurred between the portions of the glass substrate 20GS that contacted and did not contact the multiple protrusions 52A provided on the substrate support portion 52 of the etching apparatus 50 used in the first step. This difference resulted in a large difference in the finished width dimension of the light-shielding portion 40. As a result, a large difference occurs in the amount of light transmitted through each of the color filters 29R, 29G, and 29B, and it is presumed that this is why the evaluation result was "×" or "△." In particular, in Comparative Example 3, the sixth angle θ6 is 47°, which is less than 50°, and therefore a large difference occurs in the finished width dimension of the light-shielding portion 40, and it is presumed that this is why the evaluation result was "×." On the other hand, in Comparative Examples 2 and 4, the sixth angle θ6 is 50° or more, and therefore the difference in the finished width dimension of the light-shielding portion 40 is smaller than in Comparative Example 3, and it is presumed that this is why the evaluation results were both "△."

[0065] In contrast, as shown in FIGS. 18 to 24, in Examples 1 to 7, the judgment result was "○" and the sixth angle θ6 was in the range of 70° or more and 90° or less. More specifically, in Example 1, the judgment result was "○" and the sixth angle θ6 was 74°. In Example 2, the judgment result was "○" and the sixth angle θ6 was 78°. In Example 3, the judgment result was "○" and the sixth angle θ6 was 70°. In Example 4, the judgment result was "○" and the sixth angle θ6 was 70°. In Example 5, the judgment result was "○" and the sixth angle θ6 was 74°. In Example 6, the judgment result was "○" and the sixth angle θ6 was 71°. In Example 7, the judgment result was "○" and the sixth angle θ6 was 81°. In all of Examples 1 to 7, the sixth angle θ6 is 90° or less, and therefore, compared to Comparative Example 1 in which the sixth angle θ6 exceeds 90°, when forming each of color filters 29R, 29G, 29B, the wettability of the material of each of color filters 29R, 29G, 29B is good near light-shielding portion 40, making it less likely for the material to be “repelled.” As a result, it is less likely for unintended openings to be formed in each of color filters 29R, 29G, 29B. In all of Examples 1 to 7, the sixth angle θ6 is 70° or more, and therefore, compared to Comparative Examples 2 to 4 in which the sixth angle θ6 is less than 70°, the heat transfer from the second reflective film 44 side to the first transmissive film 41 side is lower. For this reason, in Examples 1 to 7, differences in heat dissipation are unlikely to occur between the portions of the glass substrate 20GS that contact and do not contact the multiple protrusions 52A provided on the substrate support portion 52 of the etching apparatus 50 used in the first step, and therefore differences are unlikely to occur in the finished width dimension of the light-shielding portion 40. As a result, it is presumed that differences are unlikely to occur in the amount of light transmitted through each of the color filters 29R, 29G, and 29B, and the evaluation result was "○". As described above, in Examples 1 to 7, unintended openings are unlikely to occur in each of the color filters 29R, 29G, and 29B, and differences are unlikely to occur in the finished width dimension of the light-shielding portion 40, making it difficult for display unevenness to be visually recognized.Although undercuts occur in all of the light-shielding portions 40 in Examples 1, 2, 5, and 7, the size of the undercuts is smaller than that of the light-shielding portions 40 in Comparative Example 1, and therefore the "repulsion" of the material of each color filter 29R, 29G, and 29B is sufficiently suppressed, and the effect of reducing heat transfer from the second reflective film 44 side to the first transmissive film 41 side is sufficiently obtained, which is preferable. On the other hand, in Examples 3, 4, and 6, the second reflective film 44 does not have the fifth side surface 44D (a configuration in which no undercut occurs), and even with this configuration, the occurrence of display unevenness is sufficiently suppressed.

[0066] As described above, the color filter substrate 20 of this embodiment includes the green color filter (first color filter) 29G, the blue color filter (second color filter) 29B that exhibits a color different from that of the green color filter 29G, and the light-shielding portion 40 that is disposed below the green color filter 29G and the blue color filter 29B at the boundary between the green color filter 29G and the blue color filter 29B. The light-shielding portion 40 includes the first transmission film 41, the first reflective film 42 that is disposed above the first transmission film 41, and the first reflective film 43 that is disposed above the first transmission film 41. 2, and a second reflective film 44 arranged above the second reflective film 43 and having a thickness greater than that of the first reflective film 42. The first reflective film 41 has a first bottom surface 41A located on the opposite side to the first reflective film 42 and a first side surface 41B that forms a first angle θ1 that is an acute angle with the first bottom surface 41A. The second reflective film 44 has a second bottom surface 44A that is in contact with an upper surface 43C of the second reflective film 43 and is parallel to the first bottom surface 41A, and a second side surface 44B that forms a second angle θ2 that is an acute angle with the second bottom surface 44A.

[0067] Light that attempts to pass between green color filter 29G and blue color filter 29B is blocked by light-shielding portion 40 located at the boundary between green color filter 29G and blue color filter 29B, making it difficult for color mixing to occur.

[0068] External light incident on the light-shielding portion 40 from the lower layer side passes through the first transmission film 41 and then reaches the first reflection film 42. The first reflection film 42 is thinner than the second reflection film 44, so it does not reflect all light, but rather reflects a predetermined amount of light while allowing a predetermined amount of light to pass through. The light that passes through the first reflection film 42 passes through the second transmission film 43 and reaches the second reflection film 44. The second reflection film 44 is thicker than the first reflection film 42, so it can reflect almost all light. The light reflected by the first reflection film 42 and the light reflected by the second reflection film 44 cancel each other out to a certain extent based on interference conditions according to the refractive indexes and film thicknesses of the first transmission film 41 and the second transmission film 43. This suppresses reflection of external light by the light-shielding portion 40. Furthermore, a predetermined amount of the light reflected by the second reflective film 44 is reflected again by the first reflective film 42 back toward the second reflective film 44, thereby preventing the light from being emitted from the first transparent film 41 toward the lower layer side.

[0069] As described above, the light-shielding portion 40 has a laminated structure of the first transmitting film 41, the first reflective film 42, the second transmitting film 43, and the second reflective film 44. Therefore, compared to the conventional case where the light-shielding portion 40 is made of a resin material, the exposure accuracy of the exposure device used to pattern the light-shielding portion 40 in the manufacturing process can be sufficiently increased. This is suitable for miniaturizing the light-shielding portion 40. Furthermore, because the first side surface 41B of the first transmitting film 41 forms an acute first angle θ1 with the first bottom surface 41A and the second side surface 44B of the second reflective film 44 forms an acute second angle θ2 with the second bottom surface 44A, the wettability of the material of each of the color filters 29G, 29B near the light-shielding portion 40 is improved when forming each of the color filters 29G, 29B in the manufacturing process, compared to a case where the first side surface forms an obtuse angle with the first bottom surface 41A and the second side surface forms an obtuse angle with the second bottom surface 44A. Therefore, the material of each of the color filters 29G, 29B is less likely to be repelled near the light-shielding portion 40, making it less likely that unintended openings will be formed in each of the color filters 29G, 29B.

[0070] The first reflective film 42 has a third bottom surface 42A that is in contact with the top surface 41C of the first permeable film 41 and is parallel to the first bottom surface 41A, and a third side surface 42B that forms a third angle θ3 with the third bottom surface 42A, and the second permeable film 43 has a fourth bottom surface 43A that is in contact with the top surface 42C of the first reflective film 42 and is parallel to the first bottom surface 41A, and a fourth side surface 43B that forms a fourth angle θ4 with the fourth bottom surface 43A, and the first reflective film 42 is configured so that the third side surface 42B is in contact with the top surface 41C of the first permeable film 41 without contacting the first side surface 41B. In this way, since the third side surface 42B is disposed inward relative to the first side surface 41B, heat transfer from the first reflective film 42 to the first permeable film 41 is lower than in a configuration in which the third side surface is in contact with the first side surface 41B. Therefore, in the manufacturing process, when an etching device 50 is used to pattern the light-shielding portion 40 and the color filter substrate 20 is supported by a substrate support portion 52 including intermittent protrusions 52A, a difference in heat dissipation is unlikely to occur between the portion of the color filter substrate 20 that contacts the protrusions 52A and the portion that does not contact the protrusions 52A. This makes the finished light-shielding portion 40 uniform, and therefore the amount of light transmitted through each of the color filters 29G, 29B is equalized.

[0071] Furthermore, the light-shielding portion 40 is configured so that the third angle θ3 and the fourth angle θ4 are larger than the first angle θ1. In this way, the heat transfer from the first reflective film 42 to the first transmissive film 41 is lower than when the third angle and the fourth angle are set equal to or smaller than the first angle θ1. This results in a more uniform finish of the light-shielding portion 40.

[0072] The second reflective film 44 also has a fifth side surface 44D that forms an obtuse fifth angle θ5 with respect to the second bottom surface 44A and is in contact with the second bottom surface 44A. The second reflective film 44 having the fifth side surface 44D is configured such that a portion of the second reflective film 44 protrudes outward relative to the second transmitting film 43. Therefore, compared to a case in which the second reflective film does not have the fifth side surface 44D, the heat transfer from the second reflective film 44 to the second transmitting film 43 is lower. This results in a more uniform finish of the light-shielding portion 40.

[0073] Furthermore, the light-shielding portion 40 is configured such that the sixth angle θ6, which is the angle formed by the line segment LS connecting the outer edge 41D of the first transmitting film 41 and the outer edge 44E of the second reflective film 44 with respect to the first bottom surface 41A, is in the range of 70° to 90°. Because the sixth angle θ6, which is the angle formed by the line segment LS with respect to the first bottom surface 41A, is 90° or less, the wettability of the material of the color filters 29G, 29B near the light-shielding portion 40 is improved when forming the color filters 29G, 29B during the manufacturing process, compared to when the sixth angle exceeds 90°. This makes it less likely that the material of the color filters 29G, 29B will be repelled near the light-shielding portion 40, making it less likely that unintended openings will occur in the color filters 29G, 29B. On the other hand, because the sixth angle θ6, which is the angle between the line segment LS and the first bottom surface 41A, is set to 70° or more, heat transfer from the second reflective film 44 to the first transmissive film 41 is lower than if the sixth angle were less than 70°. Therefore, if an etching apparatus 50 is used to pattern the light-shielding portion 40 and the color filter substrate 20 is supported by a substrate support portion 52 including intermittent protrusions 52A during the manufacturing process, a difference in heat dissipation is unlikely to occur between the portion of the color filter substrate 20 that contacts the protrusions 52A and the portion that does not contact the protrusions 52A. This results in a uniform finish of the light-shielding portion 40, and therefore the amount of transmitted light passing through each color filter 29G, 29B is equalized.

[0074] Moreover, the liquid crystal display device (display device) 10 according to this embodiment includes the above-described color filter substrate 20 and an array substrate 21 disposed opposite the color filter substrate 20. According to such a liquid crystal display device 10, the light-shielding portions 40 of the color filter substrate 20 are miniaturized, which is suitable for achieving high-definition display images.

[0075] Furthermore, the manufacturing method of the color filter substrate 20 according to this embodiment includes forming a first transmission film 41 on a glass substrate (substrate) 20GS, forming a first reflective film 42 on the upper side of the first transmission film 41, forming a second transmission film 43 on the upper side of the first reflective film 42, forming a second reflective film 44 on the upper side of the second transmission film 43, the second reflective film 44 having a thickness larger than that of the first reflective film 42, forming a photosensitive resist film R on the upper side of the second reflective film 44, exposing and developing the resist film R, and performing a first etching process to etch at least the second reflective film 44 using the resist film R as a mask. as a mask to perform a second etching that etches the second reflective film 44, the second transparent film 43, the first reflective film 42, and the first transparent film 41 at an etching rate slower than that of the first etching, thereby forming a light-shielding portion 40 consisting of the first transparent film 41, the first reflective film 42, the second transparent film 43, and the second reflective film 44, forming a green color filter 29G whose end is arranged on the upper layer side of the light-shielding portion 40, and forming a blue color filter 29B that has a different color from the green color filter 29G and whose end is arranged on the upper layer side of the light-shielding portion 40 and adjacent to the green color filter 29G.

[0076] After the first transparent film 41, the first reflective film 42, the second transparent film 43, the second reflective film 44, and the resist film R are formed in sequence, the resist film R is exposed and developed. When a first etching is performed through the patterned resist film R, at least a portion of the second reflective film 44 that is not covered by the resist film R is removed. Subsequently, when a second etching is performed through the resist film R, the portions of the second reflective film 44, the second transparent film 43, the first reflective film 42, and the first transparent film 41 that are not covered by the resist film R are removed, thereby forming the light-shielding portion 40. Thereafter, when the green color filter 29G and the blue color filter 29B are formed, the light-shielding portion 40 is positioned at the boundary between the green color filter 29G and the blue color filter 29B.

[0077] The first etching and the second etching will be described in detail. When the first etching, which has a faster etching rate than the second etching, is performed first, the second reflective film 44 is processed so that its side surfaces form a large angle close to 90° with respect to the bottom surface. When the second etching, which has a slower etching rate than the first etching, is then performed, the resist film R gradually retreats while etching of the second reflective film 44, the second transparent film 43, the first reflective film 42, and the first transparent film 41 progresses. As a result, the second reflective film 44, the second transparent film 43, the first reflective film 42, and the first transparent film 41 are processed so that the angles that the side surfaces 41B to 44B form with respect to the bottom surfaces 41A to 44A of the second reflective film 44, the second transparent film 43, the first reflective film 42, and the first transparent film 41 are smaller than the angles that the side surfaces would form if only the first etching were performed without the second etching. As a result, it is possible to make both the first angle θ1, which is the angle between the first side surface 41B, which is the side surface of the first transmitting film 41, and the first bottom surface 41A, which is the bottom surface, and the second angle θ2, which is the angle between the second side surface 44B, which is the side surface of the second reflecting film 44, and the second bottom surface 44A, which is the bottom surface, acute angles. Furthermore, compared to the case where only the first etching is performed, recession of the first transmitting film 41 and the second transmitting film 43 is suppressed, making it less likely that a large undercut will occur in the light-shielding portion 40.

[0078] The light-shielding portion 40 thus formed has a laminated structure of a first transmitting film 41, a first reflective film 42, a second transmitting film 43, and a second reflective film 44. Therefore, compared to the conventional case where the light-shielding portion 40 is made of a resin material, the exposure accuracy of the exposure device used to pattern the light-shielding portion 40 in the manufacturing process can be sufficiently increased. This is suitable for miniaturizing the light-shielding portion 40. Furthermore, since the first angle θ1, which is the angle between the first side surface 41B, which is the side surface of the first transmission film 41, and the first bottom surface 41A, which is the bottom surface, and the second angle θ2, which is the angle between the second side surface 44B, which is the side surface of the second reflective film 44, and the second bottom surface 44A, which is the bottom surface, are both acute angles, compared to a case where the first angle between the first side surface of the first transmission film 41 and the first bottom surface 41A and the second angle between the second side surface of the second reflective film 44 and the second bottom surface 44A are both obtuse angles, the wettability of the material of the color filters 29G, 29B near the light-shielding portion 40 is improved when forming the color filters 29G, 29B in the manufacturing process. Therefore, the material of the color filters 29G, 29B is less likely to be repelled near the light-shielding portion 40, and unintended openings are less likely to be formed in the color filters 29G, 29B.

[0079] Furthermore, at least SF6 gas is used in the first etching, and at least CF4 gas and O2 gas are used in the second etching. By using at least SF6 gas in the first etching and at least CF4 gas and O2 gas in the second etching, the etching rate in the first etching can be increased and the etching rate in the second etching can be decreased.

[0080] The first and second etching processes use an etching apparatus 50 having a vacuum chamber 51 that accommodates the glass substrate 20GS and a substrate support part 52 disposed within the vacuum chamber 51. The substrate support part 52 has a plurality of protrusions 52A that are spaced apart on the main surface of the glass substrate 20GS and support the glass substrate 20GS. When performing the first and second etching processes, the glass substrate 20GS accommodated within the vacuum chamber 51 of the etching apparatus 50 is supported by the plurality of protrusions 52A provided on the substrate support part 52. The contact area of the substrate support part 52 with the glass substrate 20GS is smaller than when the substrate support part is in surface contact with the main surface of the glass substrate 20GS. This reduces the likelihood of etching defects due to the adhered material, even if material from the first reflective film 42 or the second reflective film 44 scatters and adheres to the surface of the substrate support part 52 during the first and second etching processes. On the other hand, because the glass substrate 20GS has portions that contact the protrusions 52A and portions that do not, there is a concern that a difference in heat dissipation between these portions may occur. In this regard, the first etching, which has an etching rate faster than the second etching, is performed first, followed by the second etching, which has an etching rate slower than the first etching. Therefore, compared to when only the second etching is performed, the angle between the side surface of the first transmission film 41 and the bottom surface and the angle between the side surface of the second reflective film 44 and the bottom surface can both be increased. This reduces heat transfer from the second reflective film 44 to the first transmission film 41, thereby mitigating the difference in heat dissipation that may occur between the portion of the glass substrate 20GS that contacts the protrusions 52A and the portion that does not contact the protrusions 52A. This results in a uniform finish for the light-shielding portion 40, which equalizes the amount of light transmitted through each color filter 29G, 29B.

[0081] <Other embodiments> The technology disclosed in this specification is not limited to the embodiments described above and illustrated in the drawings, and the following embodiments, for example, are also included in the technical scope.

[0082] (1) The specific values of the angles θ1 to θ6 in the light-shielding portion 40 can be changed appropriately to values other than those described above. Even in this case, the sixth angle θ6 is preferably set in the range of 70° or more and 90° or less, but this is not necessarily limited to this.

[0083] 7 and 8, the light-shielding portion 40 may have a configuration in which the second reflective film 44 does not have the fifth side surface 44D (a configuration in which no undercut occurs), as in Examples 3, 4, and 6 of Comparative Experiment 1. In other words, the first reflective film 42 may be configured so that the third side surface 42B is in contact with the first side surface 41B.

[0084] 7 and 8, the light-shielding unit 40 may have the third angle θ3 and the fourth angle θ4 of the first reflective film 42 and the second transmissive film 43 be equal to or greater than 90°. In this case, the third side surface 42B and the fourth side surface 43B of the first reflective film 42 and the second transmissive film 43 may be parallel to the fifth side surface 44D or may intersect with the fifth side surface 44D.

[0085] (4) The material of each of the reflective films 42 and 44 that constitute the light-shielding portion 40 can be changed to, for example, Mo (molybdenum), MoW (molybdenum tungsten) which is an alloy of Mo and W, Al (aluminum), Cu (copper), or the like.

[0086] (5) The light-transmitting resin material of the respective transmitting films 41 and 43 that constitute the light-shielding portion 40 can be changed to, for example, SiO2 (silicon oxide) or the like.

[0087] (6) The material of each of the transparent films 41 and 43 that constitute the light-shielding portion 40 may be a material other than an insulating material, and may be a transparent electrode material such as ITO (Indium Tin Oxide).

[0088] (7) The specific film thicknesses of the films 41 to 44 that make up the light-shielding portion 40 can be changed as appropriate.

[0089] (8) The specific values of the refractive index of the material of each of the transparent films 41 and 43 that constitute the light blocking portion 40 can be changed as appropriate.

[0090] (9) The first transparent film 41 constituting the light-shielding portion 40 may have a smaller film thickness than the second transparent film 43. It is also possible to make the first transparent film 41 and the second transparent film 43 have different refractive indices and have the same film thickness.

[0091] (10) Another film may be interposed between the glass substrate 20GS constituting the color filter substrate 20 and the first transmission film 41 constituting the light-shielding portion 40. In other words, the first bottom surface 41A of the first transmission film 41 does not need to be in direct contact with the inner surface of the glass substrate 20GS.

[0092] (11) The specific types of etching gases used in the first etching and the second etching can be changed appropriately to those other than those mentioned above.

[0093] (12) In the etching apparatus 50, the substrate support portion 52 may not have the protrusions 52A, and the main surface facing the glass substrate 20GS may be flat. Even in this case, if dirt or the like occurs on the main surface of the substrate support portion 52, the glass substrate 20GS may have portions that come into contact with the dirt or the like and portions that do not come into contact with the dirt or the like, resulting in differences in heat dissipation. This may cause differences in the width dimension of the light-shielding portion 40, resulting in visually noticeable display unevenness reflecting the dirt or the like. However, this prevents such problems from occurring. Alternatively, the main surface of the substrate support portion 52 facing the glass substrate 20GS may be formed with lattice-shaped slits (grooves) for filling with a cooling gas (e.g., He (helium) gas). In this case, the glass substrate 20GS will have a portion that is in contact with the main surface of the substrate support portion 52 and a portion that is not in contact with the main surface of the substrate support portion 52 (a portion that overlaps with the lattice-shaped slits), and since there will be a difference in the heat dissipation properties between these portions, there is a risk that there will be a difference in the width dimension of the light-shielding portion 40 and display unevenness reflected by the slits will be visible, but the occurrence of such defects can be suppressed.

[0094] (13) The etching device 50 may be a dry etching device that employs a method other than the inductively coupled plasma method.

[0095] (14) The light-shielding portions 40 may be arranged in a grid pattern in a plan view so as to overlap both the gate lines 25 and the source lines 26 .

[0096] (15) The color filter substrate 20 may be provided with an overcoat film for planarization.

[0097] (16) The number of colors of the color filter 29 may be four or more. The additional color filter 29 may be a yellow color filter that exhibits yellow, a transparent color filter that transmits light in the entire wavelength range, or the like.

[0098] (17) Instead of the first circuit section 14A, a source driver may be attached to the array substrate 21.

[0099] (18) A source driver may be attached to the flexible substrate 13 instead of the first circuit section 14A.

[0100] (19) Instead of the second circuit section 14B, a gate driver may be attached to the array substrate 21.

[0101] (20) Of the pixel electrode 28 and the common electrode 30, the "upper electrode" that is the electrode located on the upper layer may be the pixel electrode 28, and the "lower electrode" that is the electrode located on the lower layer may be the common electrode 30. In this case, a slit is provided in the pixel electrode 28 that is the "upper electrode."

[0102] (21) The display mode of the liquid crystal panel 11 may be VA mode, IPS mode, or the like, in addition to FFS mode.

[0103] (22) The liquid crystal panel 11 may be a reflective or semi-transmissive type in addition to a transmissive type. If the liquid crystal panel 11 is a reflective type, the backlight device 12 can be omitted.

[0104] (23) In addition to the head-mounted display 10 HMD, the present invention can also be applied to devices such as head-up displays and projectors that use lenses to enlarge an image displayed on the liquid crystal panel 11. The present invention can also be applied to display devices that do not have an enlargement function (such as television receivers, tablet terminals, and smartphones). [Explanation of symbols]

[0105] 10...liquid crystal display device (display device), 20...color filter substrate, 20GS...glass substrate (substrate), 21...array substrate, 29B...blue color filter (second color filter), 29G...green color filter (first color filter), 40...light-shielding portion, 41...first transmission film, 41A...first bottom surface, 41B...first side surface, 41C...top surface, 41D...outer edge, 42...first reflective film, 42A...third bottom surface, 42B...third side surface, 42 C...top surface, 43...second transmission film, 43A...fourth bottom surface, 43B...fourth side surface, 43C...top surface, 44...second reflective film, 44A...second bottom surface, 44B...second side surface, 44D...fifth side surface, 44E...outer end, 50...etching device, 51...vacuum chamber, 52...substrate support part, 52A...protrusion, LS...line segment, R...resist film, θ1...first angle, θ2...second angle, θ3...third angle, θ4...fourth angle, θ5...fifth angle, θ6...sixth angle (angle)

Claims

1. a first color filter; a second color filter that exhibits a color different from that of the first color filter; a light-shielding portion disposed at a boundary between the first color filter and the second color filter below the first color filter and the second color filter, the light-shielding portion includes a first transmission film, a first reflection film disposed above the first transmission film, a second transmission film disposed above the first reflection film, and a second reflection film disposed above the second transmission film and having a thickness greater than that of the first reflection film; the first transmitting film has a first bottom surface located on the opposite side to the first reflecting film side, and a first side surface that forms a first acute angle with the first bottom surface, the second reflective film has a second bottom surface that is in contact with an upper surface of the second transmitting film and is parallel to the first bottom surface, and a second side surface that forms a second acute angle with the second bottom surface, the first reflective film has a third bottom surface in contact with an upper surface of the first transparent film and parallel to the first bottom surface, and a third side surface that forms a third angle with the third bottom surface; the second transmitting film has a fourth bottom surface in contact with an upper surface of the first reflecting film and parallel to the first bottom surface, and a fourth side surface that forms a fourth angle with the fourth bottom surface, The color filter substrate is configured such that the third side surface of the first reflective film is in contact with the upper surface of the first transmissive film without being in contact with the first side surface.

2. The color filter substrate according to claim 1 , wherein the light-shielding portion is configured such that the third angle and the fourth angle are larger than the first angle.

3. 3. The color filter substrate according to claim 1, wherein the second reflective film has a fifth side surface that makes a fifth obtuse angle with respect to the second bottom surface and is in contact with the second bottom surface.

4. 3. The color filter substrate according to claim 1, wherein the light-shielding portion is configured such that an angle formed by a line segment connecting an outer end of the first transmission film and an outer end of the second reflective film with respect to the first bottom surface is in the range of 70° or more and 90° or less.

5. The color filter substrate according to claim 1 or 2; an array substrate disposed opposite the color filter substrate.

Images