Compounds, compositions, and polymer films

Abstract

Formula (I): [Formula 1] JPEG2023544307000041.jpg2569 (wherein R' is vinyl, epoxy or C 1~3 -alkylene thiol, n has a value of 1 or 2, m has a value of 1, 2 or 3, and M' + is a cation and X is as defined in the claims), wherein the molar fraction of the compound of formula (I) relative to all curable compounds in the composition is greater than 0.25. Further claimed are compositions, methods, films, and uses thereof.

Description

[Technical Field]

[0001] The present invention relates to compositions suitable for making polymeric films, polymeric films, cation exchange membranes, bipolar membranes, and their preparation and use. [Background technology]

[0002] Ion exchange membranes are used in electrodialysis, electrodialysis reversal, electrolysis, diffusion dialysis, and several other processes. Typically, the transport of ions through the membrane occurs under the influence of a driving force such as an ion concentration gradient or, alternatively, an electric potential gradient.

[0003] Ion exchange membranes are generally classified as cation exchange membranes or anion exchange membranes depending on their predominant charge. Cation exchange membranes contain negatively charged groups that allow cations to pass but reject anions, while anion exchange membranes contain positively charged groups that allow anions to pass but reject cations. Bipolar membranes have both cation and anion layers.

[0004] Some ion exchange and bipolar membranes contain a porous support that provides mechanical strength. Such membranes are often called "composite membranes" due to the presence of both an ionically charged polymer that discriminates between oppositely charged ions and a porous support that provides mechanical strength.

[0005] Cation exchange membranes may be used for the treatment of aqueous solutions and other polar liquids and for the generation of electricity. Bipolar membranes may be used to produce acids and bases from salt solutions, for example, for the recovery of hydrofluoric acid and nitric acid, for the separation and processing of organic acids such as lactic acid and citric acid, and for the production of amino acids.

[0006] Electricity can be generated using reverse electrodialysis (RED), in which process-standard ion-exchange or bipolar membranes can be used. Cation-exchange membranes may also be used for hydrogen production in, for example, fuel cells and batteries.

[0007] Bipolar membranes can be prepared by many different methods. In U.S. Patent Nos. 4,024,043 and 4,057,481 (both to Dege et al.), single-film bipolar membranes are prepared from pre-swollen films containing relatively large amounts of insoluble cross-linked aromatic polymers, in which highly dissociative cation exchange groups are chemically bonded to aromatic nuclei from only one side to the desired depth of the film, and subsequently highly dissociative anion exchange groups are chemically bonded to unreacted aromatic nuclei on the other side of the film.

[0008] In Patent Publications Nos. 78-158638 and 79-7196 (both by Tokuyama Soda Co. Ltd.), bipolar membranes are prepared by partially covering a membrane with a covering film, sulfonating the surface of the membrane not in contact with the covering film to introduce cation exchange groups, peeling off the covering film, and introducing anion exchange groups onto the peeled surface.

[0009] Bipolar membranes can also be prepared by joining an anion exchange film or membrane with a cation exchange film or membrane. A bipolar membrane can be formed by fusing two monopolar membranes of opposite selectivity together using heat and pressure. See, for example, U.S. Patent No. 3,372,101 to Kollsman, which uses a hydraulic press to join separate cation and anion membranes at 400 lb / sq. inch (2,758 kPa) pressure at 150°C to form a two-ply bipolar membrane structure.

[0010] However, bipolar membranes formed in this way suffer from the drawback of high electrical resistance created by their fusion. Furthermore, these membranes are prone to bubble or blister formation and can only operate for short periods at relatively low current densities. [Prior art documents] [Patent documents]

[0011] [Patent Document 1] U.S. Patent No. 4,024,043 [Patent Document 2] U.S. Patent No. 4,057,481 [Patent Document 3] Japanese Patent Application Publication No. 55-86821 [Patent Document 4] Japanese Patent Application Publication No. 55-99927 [Patent Document 5] U.S. Patent No. 3,372,101 Summary of the Invention [Problem to be solved by the invention]

[0012] The above-mentioned drawbacks make known bipolar membranes unattractive for commercial electrodialysis operations. There is a need for bipolar membranes with good permselectivity and low electrical resistivity. [Means for solving the problem]

[0013] According to a first aspect of the present invention, a compound of formula (I):

[0014] [ka]

[0015] (In the formula, R' is vinyl, epoxy, or C 1~3 - an alkylene thiol, n has a value of 1 or 2; m has a value of 1, 2, or 3; M' + is a cation, (i) When m and n both have a value of 1, X is vinylphenyl, or a group of formula (II):

[0016] [ka]

[0017] (In formula (II) R" stands for vinyl, epoxy, or C 1~3 - an alkylene thiol, M” + is a cation, wherein n in formula (II) has a value of 1 or 2; (ii) when m has a value of 2 or 3, X is C 1~6 -Alkylene, -C 6~18 -arylene, or N(R''') (3-m) and each R''' is independently H or C 1~4 is alkyl, (iii) When m has a value of 1 and n shown in formula (I) has a value of 2, X is of formula (II) (as defined above) or C 1~6 -Alkyl, C 6~18 -aryl, or N(R''')2, Each R''' is independently H or C 1~4 a polymer film obtained by curing a composition comprising a compound of formula (I) A polymer film is provided in which the mole fraction of the compound of formula (I) relative to all curable compounds in the composition is greater than 0.25. DETAILED DESCRIPTION OF THE INVENTION

[0018] In this document (including the claims), the verb "comprise" and its conjugations are used in their open-ended sense to mean that the items following this word are included, but not that items not specifically mentioned are excluded. In addition, reference to an element by the indefinite article "a" or "an" does not exclude the possibility that more than one of the element is present, unless the context clearly requires that one and only one of the element is present. Thus, the indefinite article "a" or "an" usually means "at least one." The composition according to the second aspect of the present invention is often referred to as a "CEL composition."

[0019] A vinyl group is of the formula -CH=CH2. An epoxy group is of the formula —C2H3O. C 1~3 The alkylenethiol group has the formula -C 1~3 -alkylene-SH.

[0020] M' + is preferably H + , Li + , Na + , K. + , or NL4 + and each L is independently H or C 1~3 - alkyl. M” + is preferably H + , Li + , Na + , K. + , or NL4 + and each L is independently H or C 1~3 - alkyl.

[0021] Preferred C 6~18 -Arylene groups include phenylene (C6H4) and naphthylene (C 10 H6) groups, which may be optionally substituted. Preferred C 6~18 - Aryl groups include phenyl (C6H5) and naphthyl (C 10H7) groups, which may be optionally substituted.

[0022] In a preferred embodiment, n is 1 and m is 2. In this embodiment, R' and R" are preferably vinyl. Preferred vinylphenyl groups are those of the formula -C6H4-CH=CH2.

[0023] Typically, the composition comprises a compound of formula (I) and a further ingredient. Compounds having particularly good solubility in water and aqueous liquids are obtained, so that M' + and M' + Li + It is particularly preferred that:

[0024] Illustrative synthetic methods for the compounds of formula (I) described above can be found in the Examples section below. Additionally, many of the compounds of formula (I) can be prepared by (i) providing a benzenesulfonyl chloride compound; (ii) reacting the sulfonyl chloride group of component (i) with a compound containing a sulfonamide group to obtain a compound of formula (I). Including, At least one of component (i) and component (ii) contains a vinyl group, an epoxy group, or a thiol group. It may be prepared by a process.

[0025] Typically, a vinyl group, an epoxy group, or a thiol group is attached to the benzene ring of one of components (i) and (ii). In a preferred embodiment, the benzenesulfonyl chloride compound used in the process contains one or more vinyl groups, more preferably one or two vinyl groups.

[0026] In one embodiment, the composition comprises one and only one polymerizable group, and a bissulfonylimide (—SO—N - Further included are compounds containing the —SO2— group. According to a second aspect of the present invention, a composition comprising the following components: (a) a compound of formula (I) as defined in relation to the first aspect of the present invention; and optionally, (b) a compound comprising one and only one polymerizable group; and optionally, (c) a solvent; and optionally, (d) a radical initiator; and A composition comprising:

[0027] Preferably, the composition comprises one, two, or all three of component (b), component (c), and component (d). Preferably, the composition according to the second aspect of the invention comprises: provided that the mole fraction of the compound of component (a) relative to all curable components of the composition is greater than 0.25; (a) 20 to 80 wt% of component (a); (b) 0 to 50 wt% of component (b); (c) 10 to 50 wt% of component (c); (d) 0 to 10 wt% of component (d) Includes.

[0028] Preferred embodiments for the compounds of formula (I) used in the compositions are as described above in relation to the first aspect of the invention. Preferably, in some embodiments, the composition comprises 30 to 75 wt %, more preferably 40 to 70 wt % of component (a).

[0029] Preferably, the molar fraction of component (a) in the composition relative to all hardenable components of the composition is at least 0.30, more preferably at least 0.40, especially at least 0.50.

[0030] Component (b) may be obtained commercially or by commonly known methods. Preferably, component (b) contains an anionic group. Preferably, component (b) is a bissulfonylimide (-SO2-N- -SO2-) group.

[0031] Preferably, the composition comprises 0 to 40 wt%, most preferably 5 to 30 wt% of component (b). Preferred polymerizable groups that may be present in component (b) include ethylenically unsaturated groups, particularly (meth)acrylic acid groups and / or vinyl groups (e.g., vinyl ether groups, aromatic vinyl compounds, N-vinyl compounds, and allyl groups).

[0032] Examples of suitable (meth)acrylic acid groups include acrylate (HC=CHCO-), acrylamide (HC=CHCONH-), methacrylate (HC=C(CH)CO-), and methacrylamide (HC=C(CH)CONH-) groups. Acrylic acid groups are preferred over methacrylic acid groups because they are more reactive.

[0033] Preferred ethylenically unsaturated groups do not contain ester groups, as this can improve the stability and pH tolerance of the resulting composition. Preferred ethylenically unsaturated groups that do not contain ester groups include vinyl groups.

[0034] Preferred examples of the polymerizable group include those of the following formula:

[0035] [ka]

[0036] There may be groups represented by the formula: Preferred ethylenically unsaturated groups that may be present in component (b) are vinyl groups, for example in the form of (meth)acrylic, allylic, or styrenic groups. Styrenic groups are preferred over (meth)acrylic groups because they increase the pH stability of the membrane in the range of 0 to 14, which is of particular interest for bipolar and cation exchange membranes for fuel cells.

[0037] Examples of compounds having one and only one ethylenically unsaturated group that can be used as component (b) include compounds of the following formulae (MB-α), (AM-B), and (III):

[0038] [ka]

[0039] (In formula (MB-α), R A2 represents a hydrogen atom or an alkyl group, R A4 represents an organic group containing a sulfo group in the form of a free acid or a salt and having no ethylenically unsaturated groups, Z 2 represents -NRa-, and Ra represents a hydrogen atom or an alkyl group, preferably a hydrogen atom).

[0040] Examples of formula (MB-α) include:

[0041] [ka]

[0042] Examples include: Synthesis methods can be found, for example, in US2015 / 0353696.

[0043] [ka]

[0044] Synthesis methods can be found, for example, in US2016 / 0369017.

[0045] [ka]

[0046] (In formula (AM-B), LL2 represents a single bond or a divalent linking group, A represents a sulfo group in the form of a free acid or a salt, and m represents 1 or 2). Examples of formula (AM-B) include:

[0047] [ka]

[0048] Examples include: Such compounds are commercially available from, for example, Tosoh Chemicals and Sigma-Aldrich.

[0049] [ka]

[0050] (In the formula, R is C1-C4 alkyl, NH2, C6-C 12 is aryl, M + is H + , Li + , Na + , K. + , NL4 + and L is H or C1-C3 alkyl.

[0051] Examples of formula (III) include:

[0052] [ka]

[0053] Examples include: Synthetic methods for the four compounds mentioned above bearing the prefix MM are described in the Examples section below.

[0054] Preferably, component (b) is selected from compounds according to formula (AM-B) and / or formula (III), since in the pH range 0-14, films with particularly good stability can be obtained.

[0055] Preferably, component (c) is an inert solvent. In other words, component (c) preferably does not react with any of the other components of the curable composition. In one embodiment, the solvent preferably comprises water and, optionally, an organic solvent, particularly where some or all of the organic solvent is water-miscible. Water is useful for dissolving component (a) and optionally also component (b), and the organic solvent is useful for dissolving any other organic components present in the composition.

[0056] Component (c) is useful for reducing the viscosity and / or surface tension of the composition. In some embodiments, the composition comprises 15 to 40 wt %, particularly 20 to 38 wt %, of component (c).

[0057] Examples of inert solvents that may be used as component (c) include water, alcoholic solvents, etheric solvents, amide solvents, ketone solvents, sulfoxide solvents, sulfone solvents, nitrile solvents, and organic phosphorus solvents. Examples of alcoholic solvents that may be used as component (c) or in component (c) (especially in combination with water) include methanol, ethanol, isopropanol, n-butanol, ethylene glycol, propylene glycol, diethylene glycol, dipropylene glycol, and mixtures containing two or more thereof. In addition, preferred inert organic solvents that may be used in component (c) include dimethyl sulfoxide, dimethylimidazolidinone, sulfolane, N-methylpyrrolidone, dimethylformamide, acetonitrile, acetone, 1,4-dioxane, 1,3-dioxolane, tetramethylurea, hexamethylphosphoramide, hexamethylphosphorotriamide, pyridine, propionitrile, butanone, cyclohexanone, tetrahydrofuran, tetrahydropyran, 2-methyltetrahydrofuran, ethylene glycol diacetate, cyclopentyl methyl ether, methyl ethyl ketone, ethyl acetate, y-butyrolactone, and mixtures containing two or more thereof. Dimethyl sulfoxide, N-methylpyrrolidone, dimethylformamide, dimethylimidazolidinone, sulfolane, acetone, cyclopentyl methyl ether, methyl ethyl ketone, acetonitrile, tetrahydrofuran, 2-methyltetrahydrofuran, and mixtures containing two or more thereof are preferred.

[0058] The composition preferably comprises 0 to 2 wt% of component (d). If the composition is intended to be cured thermally or with light (e.g., UV or visible light), the composition preferably comprises 0.001 to 2 wt%, in particular 0.005 to 0.9 wt%, of component (d).

[0059] Examples of suitable thermal initiators that may be used as component (d) include 2,2'-azobis(2-methylpropionitrile) (AIBN), 4,4'-azobis(4-cyanovaleric acid), 2,2'-azobis(2,4-dimethylvaleronitrile), 2,2'-azobis(2-methylbutyronitrile), 1,1'-azobis(cyclohexane-1-carbonitrile), 2,2'-azobis(4-methoxy-2,4-dimethylvaleronitrile), 1,1'-azobis(cyclohexane-1-carbonitrile), 2,2'-azobis(4-methyl ... nitrile), dimethyl 2,2'-azobis(2-methylpropionate), 2,2'-azobis[N-(2-propenyl)-2-methylpropionamide, 1-[(1-cyano-1-methylethyl)azo]formamide, 2,2'-azobis(N-butyl-2-methylpropionamide), 2,2'-azobis(N-cyclohexyl-2-methylpropionamide), 2,2'-azobis(2-methylpropionamidi 2,2'-Azobis[2-(2-imidazolin-2-yl)propane]dihydrochloride, 2,2'-Azobis[2-(2-imidazolin-2-yl)propane]dihydrochloride, 2,2'-Azobis[2-(2-imidazolin-2-yl)propane]disulfate dihydrate, 2,2'-Azobis[N-(2-carboxyethyl)-2-methylpropionamidine]hydrate, 2,2'-Azobis{2-[1-(2-hydroxyethyl)-2-imidazolin-2-yl]propane}dihydrate Examples of suitable azobis include 2,2'-azobis[2-(2-imidazolin-2-yl)propane], 2,2'-azobis(1-imino-1-pyrrolidino-2-ethylpropane) dihydrochloride, 2,2'-azobis{2-methyl-N-[1,1-bis(hydroxymethyl)-2-hydroxyethyl]propionamide}, and 2,2'-azobis[2-methyl-N-(2-hydroxyethyl)propionamide].

[0060] Examples of suitable photoinitiators that may be included in the composition as component (d) include aromatic ketones, acylphosphine compounds, aromatic onium salt compounds, organic peroxides, thio compounds, hexa-arylbiimidazole compounds, ketoxime ester compounds, borate compounds, azinium compounds, metallocene compounds, active ester compounds, compounds having a carbon-halogen bond, and alkylamine compounds. Preferred examples of aromatic ketones, acylphosphine oxide compounds, and thio compounds include compounds having a benzophenone skeleton or a thioxanthone skeleton, as described in "RADIATION CURING IN POLYMER SCIENCE AND TECHNOLOGY," pp. 77-117 (1993).More preferred examples thereof include alpha-thiobenzophenone compounds described in JP1972-6416B (JP-S47-6416B), benzoin ether compounds described in JP1972-3981B (JP-S47-3981B), alpha-substituted benzoin compounds described in JP1972-22326B (JP-S47-22326B), and alpha-substituted benzoin compounds described in JP1972-23664B (JP-S47-23664B). benzoin derivatives described in JP1982-30704A (JP-S57-30704A), aroylphosphonic acid esters described in JP1985-26483B (JP-S60-26483B), dialkoxybenzophenones described in JP1985-26403B (JP-S60-26403B) and JP1987-81345A (JPS62-81345A), benzoin ethers described in JP1989-34242B (JP alpha-aminobenzophenones described in JP 1990-211452A (JP-H02-211452A), U.S. Pat. No. 4,318,791A, and EP 0284561A1, p-di(dimethylaminobenzoyl)benzene described in JP 1990-211452A (JP-H02-211452A), thio-substituted aromatic ketones described in JP 1986-194062A (JPS61-194062A), acylphosphine sulfides described in JP 1990-9597B (JP-H02-9597B), acylphosphines described in JP 1990-9596B (JP-H02-9596B), thioxanthones described in JP 1988-61950B (JP-S63-61950B), and coumarins described in JP 1984-42864B (JP-S59-42864B). In addition, the photoinitiators described in JP2008-105379A and JP2009-114290A are also preferred. In addition, the photoinitiators described in Kato Kiyomi, "Ultraviolet Curing System," pages 65-148 (Research Center Co., Ltd., 1989) may also be used.

[0061] Particularly preferred photoinitiators include Norrish Type II photoinitiators that have an absorption maximum at wavelengths greater than 380 nm when measured in one or more of the following solvents: water, ethanol, and toluene at a temperature of 23° C. Examples include xanthene, flavin, curcumin, porphyrin, anthraquinone, phenoxazine, camphorquinone, phenazine, acridine, phenothiazine, xanthone, thioxanthone, thioxanthene, acridone, flavone, coumarin, fluorenone, quinoline, quinolone, naphthaquinone, quinolinone, arylmethane, azo, benzophenone, carotenoid, cyanine, phthalocyanine, dipyrrin, squarine, stilbene, styryl, triazine, or anthocyanin-derivatized photoinitiators.

[0062] According to a third aspect of the present invention there is provided a method for preparing a polymer film, the method comprising curing a composition according to the second aspect of the present invention. Preferred embodiments for the polymer film and composition used in the method of the third aspect of the invention are as described herein in relation to the first and second aspects of the invention, respectively.

[0063] The composition may be cured to prepare a film according to the first aspect of the present invention by any suitable process, including thermal curing, photocuring, electron beam (EB) irradiation, gamma irradiation, and combinations of the foregoing. Optionally, a dual-cure method, defined as a combination of two of the above-mentioned curing techniques, may be used. However, the composition is preferably cured by photocuring, e.g., by irradiating the composition with visible or ultraviolet light, thereby polymerizing the curable components present in the composition.

[0064] Preferably, the polymer film according to the first aspect of the present invention further comprises a porous support. For example, the composition according to the second aspect of the present invention may further comprise a porous support, and when the composition according to the first aspect of the present invention comprises a porous support, the process according to the third aspect of the present invention may be carried out.

[0065] The porous support is useful for imparting mechanical strength to the polymer film, which is particularly useful when the polymer film is intended to be used as a cation exchange membrane (CEM) or bipolar membrane (BPM).

[0066] Examples of porous supports that can be used include synthetic woven and nonwoven fabrics and extruded films. Examples include wet-laid and dry-laid nonwoven materials, spunbond fabrics, meltblown fabrics, and nanofiber webs made from polyethylene, polypropylene, polyacrylonitrile, polyvinyl chloride, polyphenylene sulfide, polyester, polyamide, polyaryletherketones such as polyetheretherketone, and copolymers thereof. The porous support can also be a porous membrane, such as a polysulfone membrane, a polyethersulfone membrane, a polyphenylene sulfone membrane, a polyphenylene sulfide membrane, a polyimide membrane, a polyetherimide membrane, a polyamide membrane, a polyamideimide membrane, a polyacrylonitrile membrane, a polycarbonate membrane, a polyacrylate membrane, a cellulose acetate membrane, a polypropylene membrane, a poly(4-methyl-1-pentene) membrane, a polyylidene fluoride membrane, a polytetrafluoroethylene membrane, a polyhexafluoropropylene membrane, and a polychlorotrifluoroethylene membrane, and derivatives thereof.

[0067] The porous support preferably has an average thickness between 10 and 800 μm, more preferably between 15 and 300 μm, especially between 20 and 150 μm. Preferably, the porous support has a porosity between 30 and 95%. The porosity of the support may be determined by a porometer, for example a Porolux™ 1000 from IB-FT GmbH, Germany.

[0068] If present, the porous support may be treated to modify its surface energy, for example to a value greater than 45 mN / m, preferably greater than 55 mN / m. Suitable treatments include, for example, corona discharge treatment, plasma glow discharge treatment, flame treatment, ultraviolet radiation treatment, or chemical treatment to improve the wettability and adhesion of the porous support to polymer films.

[0069] Commercially available porous supports are available from several sources, such as Freudenberg Filtration Technologies (Novatexx materials), Lydall Performance Materials, Celgard LLC, APorous Inc., SWM (Conwed Plastics, DelStar Technologies), Teijin, Hirose, Mitsubishi Paper Mills Ltd, and Sefar AG.

[0070] Preferably, the support is a polymeric support. Preferably, the support comprises a synthetic woven or nonwoven fabric or extruded film that does not have covalently attached ionic groups. According to a fourth aspect of the present invention there is provided a bipolar membrane (BPM) comprising a polymer film according to the first aspect of the present invention.

[0071] Preferably, the polymer film is a cation exchange membrane (CEM) or cation exchange layer (CEL) of a bipolar membrane (BPM), preferably obtained by a process comprising curing a composition according to the second aspect of the invention and / or by a process according to the third aspect of the invention. Preferably, the BPM further comprises an anion exchange layer (AEL).

[0072] Preferably, the polymer film according to the first aspect of the present invention has a structure represented by formula (A):

[0073] [ka]

[0074] (In the formula, M' + is as defined above). In formula (A), the asterisk indicates the point where the structural group is covalently bonded to another group (which may or may not be of formula (A)) in the polymer film.

[0075] In a preferred embodiment, the polymer film according to the first aspect of the present invention is fluorine-free, e.g., does not contain perfluoro-groups. This preference arises for environmental reasons.

[0076] In a process according to the preferred third aspect of the invention, the curable composition according to the second aspect of the invention may be continuously applied to a moving (porous) support, preferably by a manufacturing section comprising a curable composition application station, one or more irradiation sources for curing the composition, a membrane collection station, and means for moving the support from the curable composition application station to the irradiation source and to the membrane collection station.

[0077] The curable composition application station may be located upstream relative to the irradiation source, and the irradiation source may be located upstream relative to the film recovery station. Examples of suitable coating techniques for applying the curable composition according to the second aspect of the present invention to a (porous) support include slot die coating, slide coating, air knife coating, roller coating, screen printing, and dipping. Depending on the technique used and the desired final specifications, it may be desirable to remove excess coating from the substrate, for example, by roll-to-roll squeeze, roll-to-blade or blade-to-roll squeeze, blade-to-blade squeeze, or removal using a coating bar. Light curing is preferably performed at a dose of 40 to 1500 mJ / cm. -2The process is carried out at wavelengths between 400 nm and 800 nm, using a dose between 100 and 1500 nm. In some cases, additional drying may be required, at which temperatures between 40°C and 200°C may be employed.

[0078] The process according to the third aspect of the present invention may be used to prepare, for example, polymer films according to the first aspect of the present invention and BPMs according to the fourth aspect of the present invention in several ways, including multi-pass and single-pass processes. For example, in a two-pass process, each of the layers of the BPM (e.g., CEL and AEL) may be produced in separate steps. In the first step to produce the first layer, an optionally pretreated porous support may be impregnated with a first curable composition. To ensure a thin, pinhole-free film, the coating step is preferably followed by squeezing to remove air. The impregnated support may then be cured to produce a layer that is sufficiently rigid for handling in a coating machine but still contains enough unreacted polymerizable groups to ensure good adhesion to the second layer. In the second step, a process very similar to that for the first layer may be used, in which an optionally pretreated porous support is impregnated with a second curable composition and laminated to the first layer, followed by squeezing out the excess composition and curing.

[0079] In an alternative method for making a BPM, a second layer is coated onto the first layer, followed by laminating an optionally pretreated porous substrate on the side of the second curable composition, whereby the second curable composition penetrates the porous substrate. The resulting laminate may be compressed and cured to yield a BPM.

[0080] In the two-pass process described above, either the first curable composition or the second curable composition is as defined in the second aspect of the present invention. In a more preferred single-pass process for preparing a BPM, two optionally pretreated porous supports are unwound and each is impregnated (e.g., simultaneously or sequentially) with a curable composition, one of which is as defined in the second aspect of the invention as providing a CEL, and the other curable composition comprises at least one cationic curable monomer to provide an AEL. The two layers (the CEL from the composition according to the second aspect of the invention, and the AEL from the other curable composition) are then laminated together and squeezed to remove air, and the resulting laminate is subsequently cured to provide the final BPM.

[0081] The efficiency of the BPM according to the fourth aspect of the invention may be increased by increasing the surface area between the AEL and CEL, for example by physical treatment (roughening) or by other means.

[0082] In one embodiment, the BPM according to the fourth aspect of the invention optionally comprises a catalyst, such as a metal salt, metal oxide, organometallic compound, monomer, polymer, or copolymer, or salt, preferably at the interface between the CEL and AEL of the BPM.

[0083] Suitable inorganic compounds or salts that may be used as catalysts include, for example, cations selected from Groups 1a to 4a (inclusive), along with the lanthanide and actinide series elements of the Periodic Table of the Elements, such as thorium, zirconium, iron, lanthanum, cobalt, cadmium, manganese, cerium, molybdenum, nickel, copper, chromium, ruthenium, rhodium, tin, titanium, and indium, and combinations comprising two or more of the foregoing. Suitable salts that may be used as catalysts include anions such as tetraborate, metaborate, silicate, metasilicate, tungstate, chlorate, phosphate, sulfate, chromate, hydroxyl, carbonate, molybdate, chloroplatinate, chloropalladite, orthobanate, tellurite, and others, or mixtures of the foregoing.

[0084] Other examples of inorganic compounds or salts that may be used as catalysts include, but are not limited to, FeCl3, FeCl2, AlCl3, MgCl2, RuCl3, CrCl3, Fe(OH)3, Al2O3, NiO, Zr(HPO4)2, MoS2, graphene oxide, Fe-polyvinyl alcohol complexes, polyvinyl alcohol (PVA), polyethylene glycol (PEG), polyethyleneimine (PEI), polyacrylic acid (PAA), copolymers of acrylic acid and maleic anhydride (PAAMA), and hyperbranched aliphatic polyesters, and combinations comprising two or more of the foregoing.

[0085] Where the polymer film according to the first aspect of the present invention is a CEM or CEL, the polymer film preferably has a very high density, for example as a result of being obtained from a composition according to the second aspect of the present invention in which the molar fraction of component (a) relative to all curable components of the composition is greater than 0.25, by ensuring that the composition contains a low amount of component (c) (e.g., 10 to 40 wt % of component (c)). The present invention therefore enables the production of polymer films (e.g., CEMs and BPMs) with very high ion exchange capacity and, consequently, high permselectivity (PS) and low electrical resistivity (ER).

[0086] Preferably, the polymer film has a resistivity of 5 ohm.cm 2 Less than, more preferably 2.5 ohm.cm 2 It has an ER (for 0.5M NaCl) of less than 100mg / mL. Component (b) of the composition preferably comprises a compound of formula (AM-B) and / or formula (III) (including the salts described above) as defined above, since this allows for obtaining polymer films (e.g., CEM and BPM) with excellent pH stability in the range of 0 to 14.

[0087] Furthermore, the polymer film of the present invention has low electrical resistance whether used as a CEM or as a CEL in a BPM. As a result, the polymer film and BPM of the present invention can be used in bipolar electrodialysis to provide high voltage at low current density. Therefore, when the BPM of the present invention is used in a bipolar electrodialysis process for producing acids and bases, the BPM can provide low energy costs and / or high productivity.

[0088] In one embodiment, the polymer film according to the first aspect of the invention is preferably BPM or a film convertible to BPM by hydrolysis. The anion exchange layer (AEL) of the BPM is preferably preparable by curing a composition (i.e., an "AEL composition") that includes a curable cationic compound. Accordingly, the AEL composition preferably includes a curable cationic compound.

[0089] A preferred curable cationic compound contains at least two ethylenically unsaturated groups, for example, it can be represented by formula (IV):

[0090] [ka]

[0091] (In the formula, L 1 is an alkylene or alkenylene group, R a , R b , R c , and R d are each independently an alkyl group or an aryl group; or R a and R b , and / or R c and R d may form a ring together with the atoms to which they are attached, n1 and n2 each independently represent an integer having a value of 1 to 10, X1 - and X2 - are each independently an anion.

[0092] L 1 is preferably ethylene (CH2CH2), propylene (CH2CH2CH2), hexylene (CH2CH2CH2CH2CH2CH2CH2), or vinylene (CH=CH).

[0093] R a , R b , R c , and R d If any of the is an alkyl group, it is preferably C 1~4 alkyl groups, in particular methyl. R a , R b , R c , and R d When any of the groups is an aryl group, it is preferably a C 10 - an aryl group, in particular phenyl.

[0094] R a and R b , and / or R c and R d When they form a ring together with the atoms to which they are attached, the ring is preferably a five- or six-membered ring. X1 - and X2 - are preferably each independently halo, especially Cl - is.

[0095] Thus, the AEL composition preferably comprises the following ingredients: (a2) a curable cationic compound containing at least two ethylenically unsaturated groups; and optionally (b2) a compound containing one and only one ethylenically unsaturated group; optionally (c2) a solvent; optionally (d2) a radical initiator; Includes.

[0096] Preferably, the AEL composition comprises at least one, more preferably at least two, especially all three of component (b2), component (c2), and component (d2). Examples of compounds of formula (IV) include:

[0097] [ka]

[0098] Examples include: Synthetic methods for compounds of formula (IV) can be found, for example, in EP3184558 and US2016 / 0001238.

[0099] The AEL composition preferably comprises 30-80 wt% of component (a2), more preferably between 40-70 wt% of component (a2). Preferably, the AEL composition comprises: (i) 30 to 80 wt% of component (a2); (ii) 0 to 60 wt% of component (b2); (iii) 10 to 40 wt% of component (c2) Includes.

[0100] Component (b2) preferably contains an aromatic group. Component (b2) preferably contains cationic groups. Examples of compounds that may be used as component (b2) of the AEL composition include the following:

[0101] [ka]

[0102] Examples include: The above compounds may be prepared, for example, as described in US2016177006.

[0103] Preferably, the molar ratio of component (a2) to component (b2) is 9:1 to 1:4. The AEL composition preferably comprises 0 to 45 wt %, more preferably 5 to 45 wt %, and most preferably 10 to 40 wt % of component (b2).

[0104] Preferably, component (c2) is an inert solvent, in other words, preferably, component (c2) does not react with any of the other components of the AEL composition. Component (c2) of the AEL composition preferably comprises water and, optionally, an organic solvent. Preferably, some or all of the organic solvent is water-miscible. Water is useful for dissolving the compound of formula (IV) and, if present, component (b2). The solvent is useful for reducing the viscosity and / or surface tension of the composition.

[0105] Examples of suitable solvents that may be used as component (c2) of the AEL composition include water, alcoholic solvents, etheric solvents, amide-based solvents, ketone-based solvents, sulfoxide-based solvents, sulfone-based solvents, nitrile-based solvents, organic phosphorus-based solvents, and mixtures comprising two or more thereof. Examples of alcoholic solvents that may be used as component (c2) or in component (c2) (especially in combination with water) include methanol, ethanol, isopropanol, n-butanol, ethylene glycol, propylene glycol, diethylene glycol, dipropylene glycol, and mixtures comprising two or more thereof. In addition, preferred inert organic solvents that may be used in component (c2) include dimethyl sulfoxide, dimethylimidazolidinone, sulfolane, N-methylpyrrolidone, dimethylformamide, acetonitrile, acetone, 1,4-dioxane, 1,3-dioxolane, tetramethylurea, hexamethylphosphoramide, hexamethylphosphorotriamide, pyridine, propionitrile, butanone, cyclohexanone, tetrahydrofuran, tetrahydropyran, 2-methyltetrahydrofuran, ethylene glycol diacetate, cyclopentyl methyl ether, methyl ethyl ketone, ethyl acetate, y-butyrolactone, and mixtures containing two or more thereof. Dimethyl sulfoxide, N-methylpyrrolidone, dimethylformamide, dimethylimidazolidinone, sulfolane, acetone, cyclopentyl methyl ether, methyl ethyl ketone, acetonitrile, tetrahydrofuran, 2-methyltetrahydrofuran, and mixtures containing two or more thereof are preferred.

[0106] In some embodiments, the AEL composition comprises 10 to 40 wt %, more preferably 10 to 35 wt %, and most preferably 15 to 30 wt % of component (c2). Examples of components (c2)-(d2) that may be included in the AEL composition used to form the AEL are as described above for the CEL composition as components (c) and (d), respectively. However, component (c2) of the AEL composition is preferably aqueous.

[0107] Component (d2) preferably is or comprises a thermal initiator, a photoinitiator, or a combination thereof. Most preferably, component (d) is or comprises a photoinitiator.

[0108] Examples of suitable photoinitiators that may be used as component (d2) of the AEL composition include those described above in relation to the CEL composition according to the second aspect of the invention. The AEL composition preferably contains 0.001 to 2 wt % of component (d2), more preferably 0.005 to 0.9 wt %.

[0109] The AEL composition and the CEL composition optionally each independently further comprise a polymerization inhibitor, which can be useful in making the compositions stable during storage and use.

[0110] As the polymerization inhibitor, well-known polymerization inhibitors can be used, examples of which include phenol compounds, hydroquinone compounds, certain amine compounds, mercapto compounds, and nitroxyl radical compounds.

[0111] Examples of phenolic compounds include hindered phenols (phenols having a t-butyl group at the ortho position, typically 2,6-di-t-butyl-4-methylphenol) and bisphenols. Specific examples of hydroquinone compounds include monomethyl ether hydroquinone. Specific examples of amine compounds include N-nitroso-N-phenylhydroxylamine and N,N-diethylhydroxylamine. Specific examples of nitroxyl radical compounds include 4-hydroxyTEMPO (4-hydroxy-2,2,6,6-tetramethylpiperidine-1-oxyl free radical).

[0112] The AEL and CEL compositions optionally each independently further comprise two or more polymerization inhibitors. When the CEL or AEL composition contains a polymerization inhibitor, the content is preferably 0.01 to 5 wt %, more preferably 0.01 to 1 wt %, and even more preferably 0.01 to 0.5 wt %, based on the total weight of the relevant composition.

[0113] The AEL composition and the CEL composition optionally each independently further comprise a surfactant, a polymeric dispersant, and / or an anti-crater agent. Various polymer compounds may be included in the AEL and / or CEL composition films to adjust their physical properties. Suitable polymer compounds include acrylic polymers, polyurethane resins, polyamide resins, polyester resins, epoxy resins, phenolic resins, polycarbonate resins, polyvinyl butyral resins, polyvinyl formal resins, shellac, vinyl resins, acrylic resins, rubber resins, waxes, and natural resins, as well as combinations of two or more of the foregoing.

[0114] The AEL composition and the CEL composition may each independently further comprise a surfactant, such as a nonionic surfactant, a cationic surfactant, or an organic fluorosurfactant. Specific examples of surfactants include anionic surfactants (e.g., alkylbenzenesulfonates, alkylnaphthalenesulfonates, higher fatty acid salts, sulfonates of higher fatty acid esters, sulfate ester salts of higher alcohol ethers, sulfonates of higher alcohol ethers, alkyl carboxylate salts of higher alkylsulfonamides, and alkyl phosphate salts), and nonionic surfactants (e.g., poly(oxyethylene) alkyl ethers, poly(oxyethylene) alkylphenyl ethers, poly(oxyethylene) fatty acid esters, sorbitan fatty acid esters, ethylene oxide adducts of acetylene glycol, ethylene oxide adducts of glycerin, and polyoxyethylene sorbitan fatty acid esters). Other examples of suitable surfactants include amphoteric surfactants (e.g., alkylbetaines and amidobetaines), silicone surfactants, and fluorosurfactants. The surfactant may be suitably selected from surfactants known in the art or their derivatives.

[0115] The AEL composition and the CEL composition optionally each independently further comprise a polymeric dispersant. Specific examples of polymer dispersants include polyvinylpyrrolidone, polyvinyl alcohol, polyvinyl methyl ether, polyethylene oxide, polyethylene glycol, polypropylene glycol, and polyacrylamide. Among these, polyvinylpyrrolidone is preferably used.

[0116] The AEL and CEL compositions may optionally each independently further comprise an anti-crater agent (sometimes called a surface conditioner), a leveling or slip agent to prevent unevenness of the CEM / CEL or AEL surface, examples of which include organically modified polysiloxanes (mixtures of polyether siloxanes and polyethers), polyether-modified polysiloxane copolymers, and silicone-modified copolymers.

[0117] Examples of commercially available surfactants that may be included in the AEL and / or CEL compositions include Tego Glide™ 432, Tego Glide™ 110, Tego Glide™ 130, Tego Glide™ 406, Tego Glide™ 410, Tego Glide™ 411, Tego Glide™ 415, Tego Glide™ 420, Tego Glide™ 435, Tego Glide™ 440, Tego Glide™ 450, Tego Glide™ 482, Tego Glide™ A115, Tego Glide™ B1484, and Tego Glide™ ZG400 (all trade names) manufactured by Evonik Industries GmbH.

[0118] The AEL and CEL compositions preferably each independently comprise 0 to 10 wt%, more preferably 0 to 5 wt%, especially 1 to 2 wt% of anti-crater agent (based on the total weight of the relevant composition).

[0119] As mentioned above, in a preferred embodiment, the BPM according to the fourth aspect of the present invention comprises a catalyst. In one embodiment, the AEL composition and / or the CEL composition further comprises a catalyst. For example, the catalyst can be applied to the AEL (as a post-treatment step) (e.g., before applying the CEL composition thereto) using, but not limited to, dipping, air knife coating, micro-roller coating, spraying, chemical (vapor deposition) deposition, or physical (vapor deposition) deposition. Examples of suitable catalysts are described above.

[0120] When the AEL or CEL composition includes a catalyst, the amount of catalyst is preferably up to 5 wt %, for example 0.001 wt % to 1 wt %, based on the weight of the relevant composition.

[0121] The BPM according to the fourth aspect of the present invention comprises: (i) applying an AEL composition to a substrate; (ii) at least partially curing the AEL composition, thereby forming an anion exchange layer (AEL); (iii) applying a CEL composition to the AEL; (iv) curing the CEL composition, thereby forming a cation exchange layer (CEL) on the AEL; It may be prepared by a process comprising:

[0122] In step (ii), the AEL composition is preferably photocured, for example using ultraviolet light. Thus, preferably, component (d2) of the AEL composition is or comprises a photoinitiator.

[0123] In step (ii), the AEL composition is preferably cured to an extent such that the resulting AEL can be processed in a curable composition application station while still containing unreacted ethylenically unsaturated groups available for crosslinking to one or more components of the CEL composition.

[0124] In step (iv), the CEL composition is preferably thermally cured, and therefore preferably, component (d) of the CEL composition is or comprises a thermal initiator. The temperature suitable for curing the CEL composition is 50 to 120°C, more preferably 50 to 100°C, and particularly 60 to 85°C.

[0125] Thermal curing of the CEL composition typically takes from one minute to several hours. Optionally, the CEL composition further comprises a porous support and is cured while sandwiched between transparent foils to prevent evaporation of component (c), if present.

[0126] The CEL composition and AEL composition are preferably applied sequentially in steps (i) and (iii), preferably by a manufacturing section including a composition application station, one or more curing stations equipped with an irradiation source if the composition is photocurable, one or more curing stations equipped with one or more heat sources if the composition is heat curable, a bipolar membrane collection station, and means for moving the support from the composition application station to the curing station and to the bipolar membrane collection station.

[0127] The composition application station may be located upstream relative to the curing station, which may be located upstream relative to the bipolar membrane collection station. Examples of application techniques include slot die coating, slide coating, air knife coating, roller coating, screen printing, and dipping. Depending on the technique used and the desired final specifications, it may be necessary to remove excess composition from the porous support, for example, by roll-to-roll squeeze, roll-to-blade or blade-to-roll squeeze, blade-to-blade squeeze, or removal using a coating bar.

[0128] Photocuring with ultraviolet or visible light is preferred, typically at 40-1500 mJ / cm 2 The thermal curing is preferably carried out at a temperature between 20°C and 100°C for a period of, for example, 0.01 hours to 24 hours.

[0129] The performance of the BPM according to the fourth aspect of the present invention may be characterized by a plot of intensity versus voltage. To measure this plot, a six-compartment cell is preferably used. The first electrode compartment preferably contains a platinum plate as the cathode and is separated from the second compartment by a CEM (CMX from Astom). The electrode compartments are preferably filled with 0.5M Na2SO4. A reference BPM (from Fumatech) is preferably located between the second and third compartments. Both the second and third compartments preferably contain 0.5M NaCl solution. The BPM to be analyzed is located between the third and fourth compartments. The same reference BPM (from Fumatech) is located between the fourth and fifth compartments, and a CEM (CMX from Astom) is located between the fifth and sixth compartments. The fourth and fifth compartments are preferably also filled with 0.5M NaCl solution. The sixth compartment preferably contains a platinum plate as the anode and is the electrode compartment, containing 0.5M Na2SO4.

[0130] Using the six-compartment cell described above, 0.5 M NaCl and Na2SO4 solutions exhibited a current of 600 A / m at a temperature of 25°C. 2 A current density of 0.01 may be applied and sent through each chamber. The bipolar voltage may be measured using Haber-Luggin capillaries placed on each side of the BPM to be analyzed.

[0131] The CEM and BPM containing a cation exchange layer (CEL) according to the present invention have good pH stability, high permselectivity, and low electrical resistance. As a result, the CEM and BPM according to the present invention can be used in bipolar electrodialysis to provide high voltage at low current density. Therefore, when the BPM of the present invention is used in a bipolar electrodialysis process for producing acids and bases, the BPM can provide low energy costs and / or high productivity. [Example]

[0132] In the following non-limiting examples, all parts and percentages are by weight unless otherwise specified.

[0133] [Table 1-1]

[0134] [Table 1-2]

[0135] [ka]

[0136] The lithium content of the prepared compounds of formula (I) was determined using inductively coupled plasma atomic emission spectroscopy (ICP-OES). The ICP-OES analysis was carried out using a Thermo iCAP™ PRO XP ICP-OES instrument from Thermo Fisher Scientific. A coaxial nebulizer was used in conjunction with a cyclone spray chamber. Approximately 50 mg of each compound under test was sprayed onto a 50 cm 3 The compounds were dissolved in Milli-Q water. The dissolved compounds were diluted 100 times and acidified with 0.5% concentrated nitric acid containing yttrium as an internal standard. All samples were prepared and measured in duplicate. Results were expressed as g of Li per kg of monomer.

[0137] A Magritek Spincolve 60 Carbon (60 MHz, 4 scans) NMR spectrometer was used. 1 The structure of the compound of formula (I) was confirmed by H-NMR. Samples for analysis were prepared by dissolving 5 wt % of each compound of formula (I) in DMSO-d6.

[0138] Exemplary structures of compounds of formula (I):

[0139] [ka]

[0140] The purity of the compound of formula (I) was determined by HPLC-MS. A Waters ACQUITY UPLC System with 2D Technology was used. The UPLC was equipped with two pumps (BSM and QSM), an FTN sample manager, a column manager, and a PDA detector (192 to 400 nm). The HPLC was equipped with a Waters Xbridge C8 5 μm 2.1 × 150 mm column using an operating temperature of 45°C. Additionally, the instrument was equipped with a Waters Q-TOF premier mass spectrometer with ESI and ESCi ionization options. Chromatograms were collected using dual detection mode. The PDA detector collected the signal at 245 nm. The mass detector was set to negative mode to detect anionic molecules. A sample containing the compound of formula (I) was prepared as follows: 5 mg of the compound of formula (I) was dissolved in 50 ml of Milli-Q water. The resulting solution was diluted 10 times with Milli-Q water and a volume of 10 μl was injected into the HPLC-MS instrument described above for analysis.

[0141] Table 2 shows a typical method employed to elute samples of compounds of formula (I) represented in Table 3. In Table 3, a summary of the retention times and molecular weights recorded for identification of the substances is provided.

[0142] [Table 2]

[0143] [Table 3]

[0144] The solubility of the compounds of formula (I) was determined visually or by UV spectroscopy. For each compound of formula (I), three solutions were prepared at 40°C: one solution at 30 wt%, one solution at 60 wt%, and one solution at 70 wt%. 500 ppm of 4OH-TEMPO was included in all three solutions to prevent premature polymerization. The solutions were kept in a 40°C water bath overnight and centrifuged prior to investigation. UV spectra were recorded using a 1 mm pathlength quartz cuvette on an Agilent Technologies Cary™ 100 UV-visible spectrophotometer.

[0145] [ka]

[0146] [Table 4]

[0147] In a separate, comparative experiment from that shown in Table 4, the highest solubility achieved by combining lithium styrene sulfonate (LiSS) and DVBS-Na was 55 wt %, while when such monomers (e.g., LiSS and NaSS) were combined with compounds of formula (I), compositions were achieved with solids contents of greater than 70 wt %.

[0148] The ER (ohm.cm) of the polymer films prepared in the examples was determined by the method described by Dlugolecki et al., J. Membrane Science, 319 (2008), pp. 217-218, with the following modifications: 2 ) was measured.

[0149] The auxiliary membranes were CMX and AMX from Tokuyama Soda, Japan. The capillary and Ag / AgCl reference electrode (Metrohm type 6.0750.100) contained 3M KCl. The calibration solution and the liquid in chambers 2, 3, 4 and 5 were 0.5M NaCl solutions at 25°C. The effective area of the polymer film is 9.62cm 2 was, The distance between the capillaries was 5.0 mm. The measurement temperature was 25°C. Cole Parmer Masterflex console drives (77521-47) with Easyload II model 77200-62 gear pumps were used for all chambers. The flow rate of each stream was 475 ml / min, controlled by a Porter Instrument flow meter (model 150AV-B250-4RVS) and a Cole Parmer flow meter (model G-30217-90); and Prior to measurements, polymer film samples were equilibrated in a 0.5 M solution of NaCl for at least 1 hour at room temperature.

[0150] Preferably, the ER (for 0.5M NaCl) is 5 ohm.cm 2 Lower, preferably 2.5 ohm.cm 2 Lower.

[0151] Permselectivity (PS) measurement The permselectivity PS (%), which is the selectivity for the passage of ions of opposite charge to that of the polymer films prepared in the examples, was measured as follows: The polymer film to be analyzed was placed in a two-chamber system: one chamber was filled with a 0.05 M solution of NaOH and the other with a 0.5 M solution of NaOH.

[0152] setting: The capillary and Ag / AgCl reference electrode (Metrohm type 6.0750.100) contained 3M KCl. The effective area of the polymer film is 9.62cm 2 was, The distance between the capillaries was approximately 15 mm. The measured temperature was 21.0±0.2℃. A Cole Parmer Masterflex console drive (77521-47) with an EasyLoad II model 77200-62 gear pump was used for two chambers. Flow was controlled at a constant 500 ml / min using a Porter Instrument flow meter (model 150AV-B250-4RVS) and a Cole Parmer flow meter (model G-30217-90). Prior to measurement, the polymer film samples were equilibrated in 0.5M NaOH solution for 1 hour. After 20 minutes, the voltage was read from a standard VOM (multimeter).

[0153] Preferably, the PS with respect to NaOH was at least 50%.

[0154] pH stability To broaden the range of applications in which the polymer film can be used, it is preferable that the film be stable in acidic and / or alkaline conditions. Stability is typically tested by immersing a sample of the polymer film in 4M HCl or NaOH at 80°C for 7 days. After this treatment, the selectivity should be at least 80% of the original selectivity to be considered stable.

[0155] extraction analysis To analyze the degree of polymerization of the polymer film and to demonstrate the presence of the claimed substance in the polymer film, a sample of the polymer film was dissolved in purified water (10 cm in 50 mL of purified water). 2 ) was extracted and the extract was then analyzed using the HPLC-MS method described above.

[0156] Preparation of compounds of formula (I) and comparative compounds Synthesis of starting materials Cl-SS

[0157] [ka]

[0158] In a double-walled reactor actively cooled to 5°C, thionyl chloride (109 mL, 178.46 g, 1.5 mol, 3 moleq) was added dropwise to a solution of 4-vinylbenzenesulfonic acid lithium salt (95.08 g, 0.500 mol, 1 moleq) and 4OH-TEMPO (50 mg, 500 ppm) in DMF (300 mL). After the addition was complete, the solution was slowly heated to room temperature and stirred for an additional 16 h. The reaction mixture was then poured into 1 L of cold 1 M KCl in a separatory funnel. The bottom layer was removed and dissolved in 500 mL of diethyl ether. This solution was washed with 1 M KCl solution (300 mL). The organic layer was dried over sodium sulfate, filtered, and concentrated in vacuo to give a yellow oil. The crude product was used in the next step without further purification. The typical yield was 89.5 g (88%). HPLC-MS purity >98%; 1 H-NMR: <2 wt% DMF, 0% diethyl ether.

[0159] Cl-DVBS

[0160] [ka]

[0161] In a double-walled reactor actively cooled to 5°C, thionyl chloride (75 mL, 123.1 g, 1.034 mol, 3 moleq) was added dropwise to a solution of divinylbenzenesulfonate sodium salt (80 g, 0.345 mol, 1 moleq) and 4OH-TEMPO (50 mg, 500 ppm) in DMF (300 mL). After the addition was complete, the solution was slowly heated to room temperature and stirred for an additional 16 h. The reaction mixture was then poured into 1 L of cold 1 M KCl in a separatory funnel. The bottom layer was removed and dissolved in 500 mL of diethyl ether. This solution was washed with 1 M KCl solution (300 mL). The organic layer was dried over sodium sulfate, filtered, and concentrated in vacuo to give a yellow oil. The crude product was used in the next step without further purification. The typical yield was 62 g (79%). HPLC-MS purity >98%; 1 H-NMR: <2 wt% DMF, 0% diethyl ether.

[0162] NH2-SS

[0163] [ka]

[0164] In a double-walled reactor actively cooled to 5°C, thionyl chloride (109 mL, 178.46 g, 1.5 mol, 3 moleq) was added dropwise to a solution of 4-vinylbenzenesulfonic acid lithium salt (95.08 g, 0.500 mol, 1 moleq) and 4OH-TEMPO (50 mg, 500 ppm) in DMF (300 mL). After the addition was complete, the solution was slowly heated to room temperature and stirred for an additional 16 h. The reaction mixture was then poured into 1 L of cold 1 M KCl via a separatory funnel. The bottom layer was removed and added dropwise to a solution of 25% ammonium hydroxide in water (250 mL, 3.67 mol, 15 moleq) and 4OH-TEMPO (50 mg, 500 ppm) in a double-walled reactor actively cooled to 5°C. After the addition was complete, the solution was stirred for 1 h. The solution was then heated to room temperature and stirred for 1 h. The reaction mixture was then cooled back to 5° C. and the product was filtered off and washed with 50 mL of cold water. The product was dried in vacuo at 30° C. overnight and used without further purification. Typical yield was 66.8 g (73%). HPLC-MS purity >95%.

[0165] Synthesis of compounds of formula (I): Example 1 XL-D

[0166] [ka]

[0167] Prior to synthesis, methanesulfonamide was dried overnight in a vacuum oven (30°C, vac). To a solution of dried methanesulfonamide (8.32 g, 0.087 mol, 1 mol eq) and 4OH-TEMPO (30 mg, 500 ppm) in THF (100 mL) was added LiH (1.53 g, 0.192 mol, 2.2 mol eq) as a solid in one portion. The reaction mixture was stirred for 30 min at room temperature. Then, a solution of Cl-DVBS (20 g, 0.087 mol, 1 mol eq) in THF (50 mL) was added to the reaction mixture. After the addition, the reaction mixture was heated to 60°C (water bath temperature). After 2 days, the reaction mixture was filtered through Celite to remove excess LiH. The filtrate was concentrated in vacuo to give a pale yellow foam. The resulting foam was dissolved in 500 mL of ethyl acetate. Celite was added, and the resulting slurry was stirred for 5 min. The Celite was then filtered off and washed with 100 mL of ethyl acetate. This Celite procedure was then repeated. The solvent was then evaporated in vacuo, and the resulting white foam was washed with 500 mL of diethyl ether overnight. The resulting white powder was filtered off and dried in a vacuum oven at 30° C. for 16 hours to obtain a hygroscopic white solid. The typical achieved yield was 15.5 g (60%). HPLC-MS purity >95%; 1 H-NMR: <3 wt% residual solvent; 2 wt% divinylbenzenesulfonate; ICP-OES: 24-30 g Li / kg product.

[0168] Example 2 XL-B Prior to synthesis, benzenesulfonamide was dried overnight in a vacuum oven (30 °C, vac). To a solution of dried benzenesulfonamide (11.12 g, 0.061 mol, 1 mol eq) and 4OH-TEMPO (30 mg, 500 ppm) in THF (100 mL) was added LiH (1.06 g, 0.134 mol, 2.2 mol eq) as a solid in one portion. The reaction mixture was stirred for 30 min at room temperature. Then, a solution of Cl-SS (12.3 g, 0.061 mol, 1 mol eq) in THF (50 mL) was added to the reaction mixture.

[0169] [ka]

[0170] After the addition, the reaction mixture was heated to 60°C (water bath temperature). After 2 days, the reaction mixture was filtered through Celite to remove excess LiH. Celite was added, and the resulting slurry was stirred for 5 minutes. The Celite was then filtered off and washed with 100 mL of ethyl acetate. The solvent was then evaporated in vacuo, and the resulting white foam was washed with 500 mL of diethyl ether overnight. The resulting white powder was filtered off and dried in a vacuum oven at 30°C for 16 hours to give a white solid. The typical yield was 11 g (51%). HPLC-MS purity >94%; 1 H-NMR: <1 wt% residual solvent, <5 wt% styrenesulfonate or styrenesulfonamide; ICP-OES: 21-26 g Li / kg product.

[0171] Example 3 XL-2

[0172] [ka]

[0173] Prior to synthesis, styrenesulfonamide was dried overnight in a vacuum oven (30°C, vac). To a solution of dried styrenesulfonamide (16.90 g, 0.092 mol, 2.05 mol eq) and 4OH-TEMPO (30 mg, 500 ppm) in THF (100 mL) was added LiH (1.50 g, 0.189 mol, 4.2 mol eq) as a solid in one portion. The reaction mixture was stirred for 30 min at room temperature. Then, a solution of 1,3-benzenedisulfonyl chloride (12.38 g, 0.045 mol, 1 mol eq) in THF (50 mL) was added to the reaction mixture. After the addition, the reaction mixture was heated to 60°C (water bath temperature). After 2 days, the reaction mixture was filtered through Celite to remove excess LiH. The filtrate was concentrated in vacuo to give a pale yellow foam. The resulting foam was dissolved in 500 mL of ethyl acetate. Celite was added, and the resulting slurry was stirred for 5 min. The Celite was then filtered off and washed with 100 mL of ethyl acetate. This Celite procedure was then repeated. The solvent was then evaporated in vacuo, and the resulting white foam was washed with 500 mL of diethyl ether overnight. The resulting white powder was filtered off and dried in a vacuum oven at 30° C. for 16 hours to obtain a hygroscopic white solid. The typical achieved yield was 14.5 g (54%). HPLC-MS purity >96%; 1 H-NMR: <2 wt% residual solvent; <2 wt% styrenesulfonamide; ICP-OES: 35-40 g Li / kg product.

[0174] Example 4 XL-SAS Step 1

[0175] [ka]

[0176] To a solution of bisbenzylsulfonamide in THF was added LiH. The reaction mixture was stirred for 15 minutes. Vinylbenzenesulfonyl chloride was then added in one portion, and the reaction mixture was heated to 50°C. After 20 hours at 50°C, the reaction mixture was cooled to room temperature, filtered, and the residue was washed with THF. The filtrate was concentrated in vacuo. The resulting solid was stirred in ether and filtered again. The filtrate was concentrated in vacuo and purified by column chromatography. Step 2

[0177] [ka]

[0178] Benzyl-protected LiBVBSAS was dissolved in DCM and TFA and stirred overnight at room temperature. The product was filtered off, dried in vacuo, and isolated as a white solid. The typical yield for the two steps was 45%, with an HPLC-MS purity of >96%. 1 H-NMR: <2 wt% residual solvent; <2 wt% styrenesulfonamide; ICP-OES: 35-40 g Li / kg product.

[0179] Preparation of component (b) MM-Tf, MM-A, MM-P, and MM-M (mentioned above) had the structures shown below.

[0180] [ka]

[0181] Compounds MM-Tf, MM-A, MM-P, and MM-M were synthesized according to the following general scheme and procedures.

[0182] [ka]

[0183] General Procedure Prior to synthesis, the corresponding sulfamide was dried overnight in a vacuum oven at 30°C. To a solution of the dried sulfamide (0.100 mol, 1 mol eq) and 4OH-TEMPO (30 mg, 500 ppm) in THF (100 mL) was added LiH (0.300 mol, 3 mol eq) as a solid in one portion. The reaction mixture was stirred for 30 min at room temperature. Then, a solution of vinylbenzylsulfonyl chloride (0.100 mol, 1 mol eq) in THF (50 mL) was added, and the reaction mixture was heated to 60°C (water bath temperature) for 16 h. The resulting solution was filtered through Celite, and the resulting foam was dissolved in 500 mL of ethyl acetate. Celite was added, and the resulting slurry was stirred for 5 min. The Celite was then filtered off and washed with 100 mL of ethyl acetate. The solvent was then evaporated in vacuo, and the resulting white foam was triturated with 500 mL of diethyl ether overnight. The resulting compound of formula (b) was recovered by filtration and isolated as a white, hygroscopic powder. Yield and purity data are shown in Table 5 below.

[0184] [Table 5]

[0185] Composition Examples 1 to 11, Comparative Examples CEx1 to CEx5, and Polymer Films Table 6 below sets forth the compositions of Examples 1-11 according to the second aspect of the present invention and Comparative Examples CEx1-CEx5. Each of the compositions was polymerized to form a 100 μm thick polymer film by coating the composition set forth in Table 6 below onto a PP / PE substrate using a 100 μm Meyer bar for reinforcement. The electrical resistance (ER) of the resulting polymer films was measured using 0.5 N NaCl, and the permselectivity (PS) was measured as described above, with the results shown in Table 7 below. The pH of the polymer films obtained by the above method was measured, with the results also shown in Table 7 below.

[0186] [Table 6]

[0187] [Table 7]

[0188] extraction analysis The results of the above extraction analysis are shown in Table 8 below.

[0189] [Table 8]

[0190] Preparation of AEL An AEL composition was prepared containing N,N,N',N'-tetramethyldiaminopropane, 1,4-bis[(4-ethenylphenyl)methyl]-, chloride (46.1 wt%), 4-vinylbenzyltrimethylammonium chloride (23 wt%), water (28 wt%), 4-hydroxyTEMPO (2 wt%), and Omnirad™ 1173 (0.9 wt%). The AEL composition was coated onto a PE substrate and cured by UV to obtain an AEL.

[0191] Preparation of CEL for producing BPM and its application to AEL The CEL compositions described in Table 7 were prepared (Example 9 and Comparative Example CEx4) and coated onto the AEL prepared as described above, then a second piece of PE support was placed on the layer of CEL composition, excess CEL composition was wiped off, and the CEL composition was cured using UV light to obtain a BPM.

[0192] The electrochemical and bipolar characteristics of the so-prepared BPM were compared with a reference bipolar membrane (Fumasep from Fumatech) using the so-called current-voltage characteristics (IU curves), in which the current density was measured as a function of the applied voltage. Typically, at a given current density, i.e., 600 mA / cm 2The low voltage (U) required to generate β indicates that one or both of the AEL and CEL, as well as the BPM, have low ionic resistance. The low ionic resistance, in this case of the CEL, results in a more energy-efficient membrane. The results for Example 9 and Comparative Example CEx4 are shown in Table 9 below.

[0193] [Table 9]

Claims

1. (a) Formula (I): 【Chemical 1】 (In the formula, R' is vinyl, epoxy, or C １～３ - alkylene thiol, n has a value of 1 or 2; m has a value of 1, 2, or 3; M' ＋ is a cation, (i) When both m and n have a value of 1, X is vinylphenyl, or a group of formula (II): 【Chemistry 2】 (In formula (II), R" is vinyl, epoxy, or C １～３ - alkylene thiol, M” ＋ is a cation, n in formula (II) has a value of 1 or 2; (ii) when m has a value of 2 or 3, X is C １～６ - alkylene, C ６～１８ -arylene, or N(R''') （３－ｍ） and each R''' is independently H or C １～４ is alkyl, (iii) When m has a value of 1 and n shown in formula (I) has a value of 2, X is of formula (II) (as defined above), or C １～６ -Alkyl, C ６～１８ -aryl, or N(R''') ２ and each R''' is independently H or C １～４ 20 to 80 wt % of a compound of (b) 0 to 50 wt % of a compound containing one and only one polymerizable group and a bissulfonylimide group; (c) 10 to 40 wt % of a solvent; A polymer film obtained by curing a composition comprising: the molar fraction of the compound of formula (I) relative to all curable compounds in the composition is greater than 0.30; The polymer film does not contain perfluorinated groups.

2. 2. The polymer film of claim 1, wherein n has a value of 1 and m has a value of 2 as shown in formula (I).

3. M' ＋ and M” ＋ Is, H ＋ , Li ＋ , Na ＋ , K. ＋ , or N.L. ４ ＋ and each L is independently selected from H or C １～３ 3. The polymer film according to claim 1, wherein the aryl group is -alkyl.

4. 4. The polymer film of claim 1, wherein the one and only one polymerizable group is a vinyl group.

5. Component (b) is represented by formula (III): 【Chemistry 3】 (In the formula, R is C １ ~C ４ Alkyl, NH ２ , C ６ ~C １２ is aryl, M ＋ Is, H ＋ , Li ＋ , Na ＋ , K. ＋ , N.L. ４ ＋ and L is H or C １ ~C ３ alkyl) The polymer film according to any one of claims 1 to 4, comprising a compound of the formula:

6. A polymer film described in any one of claims 1 to 5, wherein the composition contains 5 to 30 wt% of component (b).

7. A polymer film described in any one of claims 1 to 6, wherein the composition further comprises (d) 0 to 10 wt % of a radical initiator.

8. 8. The polymer film of claim 1, which is a cation exchange membrane.

9. A bipolar membrane comprising the polymer film of any one of claims 1 to 7.

10. 9. Use of the polymer film according to claim 8 for the treatment of polar liquids, for the production of hydrogen or for the generation of electricity.

11. 10. Use of the bipolar membrane according to claim 9 for the production of acids and bases, for the separation and treatment of organic acids, for the production of amino acids or for the generation of electricity.

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