Temperature control device, and biochemical device, analytical device, and genetic testing device equipped with the same

Abstract

Provided is a temperature control device comprising a housing, a partition plate that partitions the housing into an upper portion and a lower portion, a temperature control unit, and an exhaust fan, wherein the temperature control unit includes a temperature adjustment unit and a multiwell plate, the multiwell plate is disposed above the partition plate, the temperature adjustment unit is disposed below the partition plate, an air intake port that introduces outside air is provided at a predetermined position located above the partition plate on the side portion of the housing, an exhaust port is provided in the partition plate, an exhaust fan is disposed so as to discharge air from an exhaust path located below the partition plate to the outside of the housing, and the multiwell plate is disposed between the air intake port and the exhaust port and configured so that air flows from the air intake port into the housing, passes above the multiwell plate, and flows from the exhaust port into the exhaust path. Variations in the amount of evaporation of solutions held in each of the plurality of wells provided in the multiwell plate can be decreased in this way.

Description

[Technical Field]

[0001] The present disclosure relates to a temperature control device, and a biochemical device, an analytical device, and a genetic testing device equipped with the same. [Background technology]

[0002] Fully automated genetic testing equipment performs the extraction of samples containing DNA (deoxyribonucleic acid), mixing of reagents, amplification of DNA, and testing in a fully automated manner. Demand for these equipment has led to rapid improvements in performance, with each operation being required to be performed at a high speed and with improved analytical precision.

[0003] A fully automated genetic testing device has a temperature control device that heats the sample and reagent to a high temperature to promote their reaction.

[0004] In a temperature control device, when a solution sample is heated, the solvent evaporates and the liquid volume changes. When the liquid volume changes, the sample concentration changes and the analytical accuracy decreases.

[0005] Patent Document 1 discloses a biochemical treatment device that uses a container having multiple storage sections capable of storing liquid, with the aim of preventing liquid evaporation due to high-temperature heating and contamination of liquids in multiple containers, and that has a means for selectively sealing the storage sections.

[0006] Patent document 2 also discloses a drying prevention device used in a cell culture kit placed in an incubator where dust and dirt are suppressed, which has a configuration in which, when the lid is closed, the internal space surrounded by the liquid storage tank and the lid is connected to the outside, making it possible to suppress evaporation of water from the culture medium held in the well plate. [Prior art documents] [Patent documents]

[0007] [Patent Document 1] Japanese Patent Application Laid-Open No. 2007-97476 [Patent Document 2] Japanese Patent Publication No. 2022-2505 Summary of the Invention [Problem to be solved by the invention]

[0008] The biochemical treatment device described in Patent Document 1 has a lid member that seals the container for holding a solution, and by sealing the container, the amount of evaporation is suppressed. However, since it is necessary to add the lid member and a movable means for moving the lid member, there is a problem that the structure becomes complicated.

[0009] In Patent Document 2, a liquid is stored around a container containing a sample solution, and the container is configured so that the outside air communicates with the container through the section containing the liquid. This creates a humidified ambient air around the container, suppressing evaporation from the container. However, the need to keep the liquid around the reaction container poses a problem, requiring maintenance such as adding or replacing the liquid.

[0010] An object of the present disclosure is to reduce the variation in the amount of evaporation of a solution held in each of a plurality of wells provided in a multi-well plate. [Means for solving the problem]

[0011] The temperature control device of the present disclosure comprises a housing, a partition plate that divides the housing into upper and lower sections, a temperature control unit, and an exhaust fan, the temperature control unit including a temperature adjustment unit and a multiwell plate, the multiwell plate being arranged above the partition plate, the temperature adjustment unit being arranged below the partition plate, an air intake port for introducing outside air being provided at a predetermined position on the side of the housing located above the partition plate, an exhaust port being provided in the partition plate, the exhaust fan being arranged to exhaust air to the outside of the housing through an exhaust path located below the partition plate, the multiwell plate being arranged between the air intake port and the exhaust port, and the air is configured to flow into the housing from the air intake port, pass above the multiwell plate, and flow into the exhaust path from the exhaust port. [Effects of the Invention]

[0012] According to the present disclosure, it is possible to reduce the variation in the amount of evaporation of a solution held in each of a plurality of wells provided in a multi-well plate. [Brief explanation of the drawings]

[0013] [Figure 1] 1 is a schematic vertical cross-sectional view showing a temperature control device according to a first embodiment. [Figure 2] FIG. 2 is a cross-sectional view showing the inside of the temperature control device 1 of FIG. [Figure 3] FIG. 3 is a schematic perspective view showing the multiwell plate 5 and the temperature control block 6 of FIG. 2. [Figure 4] 4 is a top view showing the arrangement of wells 11 in the multiwell plate 5 of FIG. 3. FIG. [Figure 5] 5 is a cross-sectional view taken along the line K-K' in FIG. 4. [Figure 6] FIG. 10 is a cross-sectional view showing the inside of a temperature control device 1 according to a second embodiment. [Figure 7] FIG. 10 is a cross-sectional view showing the inside of a temperature control device 1 according to a third embodiment. [Figure 8] FIG. 10 is a schematic vertical cross-sectional view showing a temperature control device according to a fourth embodiment. [Figure 9] FIG. 9 is a cross-sectional view showing the inside of the temperature control device 1 of FIG. [Figure 10] FIG. 10 is a schematic vertical cross-sectional view showing a temperature control device according to a fifth embodiment. [Figure 11] FIG. 10 is a schematic vertical cross-sectional view showing a temperature control device according to a sixth embodiment. [Figure 12] FIG. 12 is a cross-sectional view showing the inside of the temperature control device 1 of FIG. DETAILED DESCRIPTION OF THE INVENTION

[0014] Hereinafter, an embodiment will be described with reference to the drawings. [Example]

[0015] FIG. 1 is a schematic vertical cross-sectional view showing a temperature control device according to a first embodiment.

[0016] In this figure, the temperature control device 1 is composed of a housing 2, a temperature control unit 3, a partition plate 25 that separates the upper and lower sections of the housing 2, and an exhaust fan 10. An air intake port 4 that introduces outside air is provided at a predetermined position on the side of the housing 2 above the partition plate 25. An exhaust port 8 is provided in the partition plate 25. The exhaust fan 10 is positioned so as to exhaust air through an exhaust path 9 below the partition plate 25.

[0017] The temperature control unit 3 includes a temperature adjustment unit 7, a temperature adjustment block 6, and a multiwell plate 5. The multiwell plate 5 is disposed above a partition plate 25. The temperature adjustment unit 7 and the temperature adjustment block 6 are disposed below the partition plate 25. In other words, the temperature control unit 3 is inserted into the partition plate 25. In this specification, "temperature adjustment" is an abbreviation for "temperature regulation."

[0018] With the above configuration, outside air introduced through intake port 4 passes over partition plate 25 and multiwell plate 5 as airflow 13, passes through exhaust port 8 and exhaust path 9, and is discharged to the outside through exhaust fan 10.

[0019] FIG. 2 is a cross-sectional view showing the inside of the temperature control device 1 of FIG.

[0020] 2, the multi-well plate 5 has a plurality of wells 11. A solution 12 is dispensed into each well 11. The solutions 12 are kept so as not to mix with each other.

[0021] In this figure, the exhaust port 8 has a long and narrow rectangular shape.

[0022] FIG. 3 is a schematic perspective view showing the multiwell plate 5 and the temperature control block 6 of FIG.

[0023] 3, the multiwell plate 5 is supported by a temperature control block 6. Each well 11 is inserted into the temperature control block 6.

[0024] FIG. 4 is a top view showing the arrangement of wells 11 in multiwell plate 5 of FIG.

[0025] 4, the arrangement of wells 11 formed in multiwell plate 5 is defined as columns in the positive direction of the X axis, represented by A, B, C, D, E, F, and G, and as rows in the positive direction of the Y axis, represented by a, b, c, and d. For example, well 11 in column A, row a is represented as "Aa," and well 11 in column G, row c is represented as "Gc."

[0026] FIG. 5 is a cross-sectional view taken along the line K-K' in FIG.

[0027] 5, wells 11 used as test tubes are formed in a multi-well plate 5. A solution 12 is poured into each well 11.

[0028] Here, the amount of evaporation of the solution 12 can be calculated by the following calculation procedure.

[0029] The amount of evaporation Q from the surface of solution 12 into the surrounding air evap [kg / m 3 / s] can be calculated using the following formula (1).

[0030]

number

[0031] Yw can be calculated using the following formula (2).

[0032]

number

[0033]

number

[0034]

number

[0035]

number

[0036]

number

[0037] From these equations, the effect of air flow velocity on the water evaporation rate can be quantitatively calculated. That is, when air with uniform temperature and humidity flows at a uniform flow rate above the wells 11 formed in the multi-well plate 5, the amount of evaporation Q in each well 11 is evap will be equal.

[0038] The amount of evaporation from the surface of the solution 12 into the surrounding air increases as the temperature of the flowing air increases and the flow rate increases. On the other hand, the amount of evaporation increases as the humidity of the flowing air decreases.

[0039] Generally, when the temperature control unit 3 is heated to a temperature higher than the ambient air temperature, an upward air current is generated, resulting in natural convection around the periphery. In the structure of this embodiment, air flows in the positive direction of the Z axis at the center of the multiwell plate 5. Air also flows from the periphery of the multiwell plate 5 toward the center.

[0040] As a result, the air around the temperature control unit 3 passes above the wells 11 arranged on the periphery of the multi-well plate 5, promoting evaporation of the solution 12. This increases the humidity of the air passing above the wells 11. The air with increased humidity flows to the center of the multi-well plate 5. Because the air flow velocity is slow above the central wells 11, the amount of evaporation in the center is less than that in the peripheral area.

[0041] Referring to Figure 4, if no countermeasures are taken, natural convection will cause the evaporation rate in row A to be higher than that in row C. Furthermore, the evaporation rate in rows a and d will be higher than that in rows b and c. Furthermore, the corners of the multiwell plate 5 experience the highest evaporation rate because unhumidified air flows in from both the X-axis and Y-axis directions. This means that the evaporation rate in the Aa, Ad, Ga, and Gd wells 11 is high, resulting in greater variation in the evaporation rate for each well 11. The evaporation rate also varies within the same row A or G.

[0042] 1 and 2, outside air flows in through an air intake 4 formed in the housing 2, generating an air current 13 above the multiwell plate 5. That is, the air current 13 is generated above the solution 12 held in the multiwell plate 5 in the positive direction of the Y axis (to the left in the figure).

[0043] 4, the amount of evaporation of solution 12 is greatest in row a, gradually decreases, and is least in row d. In this case, since no flow occurs in the X-axis direction above multiwell plate 5, the amount of evaporation of solution 12 can be made approximately uniform in each of rows a to d, from columns A to G.

[0044] By generating a uniform airflow above the containers in this way, it is possible to suppress variations in the amount of evaporation between columns, i.e., within the same row, for example, from Aa to Ga.

[0045] Here, the intake port 4 and the exhaust port 8 may each be provided in two or more separate locations. Furthermore, the multiwell plate 5 is not limited to a structure in which multiple wells 11 are integrated, but may have a structure in which multiple independent wells 11 are fixed to the temperature control block 6. Furthermore, the exhaust air volume from the exhaust fan 10 does not need to be constant, and the air volume may be changed depending on the ambient temperature and humidity. The temperature control block 6 is preferably made of a material with high thermal conductivity, such as an aluminum alloy, copper alloy, or magnesium alloy.

[0046] The temperature adjustment unit 7 may be configured by a heater, a Peltier element, or a heat pump. [Example]

[0047] In this embodiment, the width of the exhaust port 8 is narrower than the width of the multiwell plate 5. Note that the description of the components with the same reference numerals and functions as those described in Example 1 will be omitted.

[0048] FIG. 6 is a cross-sectional view showing the inside of the temperature control device 1 of the second embodiment.

[0049] In this figure, the width w2 of the exhaust port 8 in the X-axis direction and the width w1 of the multiwell plate 5 in the X-axis direction are set to be w1>w2.

[0050] By narrowing the width w2 of the exhaust port 8 in this way, the range in which the airflow 13 (see Figure 1) flowing above the multiwell plate 5 has a high flow rate is limited to the central row of the multiwell plate 5, and the flow rate above rows B to F is faster than near rows A and G. This increases the amount of evaporation from rows B to F, reducing the difference in evaporation rate between rows A and G, where evaporation rates are high not only due to the flow from the intake port 4 but also due to the influence of natural convection, and suppressing variation in the amount of evaporation in each well 11 of the multiwell plate 5.

[0051] More specifically, as shown in this figure, it is desirable that the width w2 of the exhaust port 8 be narrower than the arrangement of the outermost wells 11 in, for example, the multiwell plate 5. In other words, by making w2 equal to the width from rows B to F, the amount of evaporation from the outermost rows A and G can be made approximately equal to the amount of evaporation from rows B to F. [Example]

[0052] In this embodiment, the shape of the exhaust port 8 is changed to a trapezoidal shape. Note that the description of the components having the same functions and having the same reference numerals as those in the first and second embodiments will be omitted.

[0053] FIG. 7 is a cross-sectional view showing the inside of the temperature control device 1 according to the third embodiment.

[0054] In this figure, the dimensions of the exhaust port 8 are trapezoidal, with the width in the X-axis direction decreasing toward the positive direction of the Y-axis (the direction of travel of the airflow 13 (see FIG. 1)). The depth h1 in the Y-axis direction at the center in the X-axis direction and the depth h2 at both ends in the X-axis direction are set such that h1 > h2.

[0055] Narrowing the depth h2 of the exhaust port 8 in this way creates a distribution in the flow velocity at the exhaust port 8, with the flow velocity being higher in the center of the exhaust port 8 and lower at both ends of the exhaust port 8. This causes the airflow 13 flowing above the multiwell plate 5 to be larger in the central row of the multiwell plate 5 and to be faster above rows B to F than near rows A and G. This increases the amount of evaporation from rows B to F, reducing the difference in evaporation rate between rows A and G, where evaporation rates are higher not only due to the flow from the air intake 4 but also due to the effects of natural convection, thereby reducing variation in the amount of evaporation in each well 11 in the multiwell plate 5.

[0056] Here, the shape of the opening is not limited to a shape that narrows linearly from h1 to h2, but may be a shape that combines three or more depths, a shape that narrows in an arc, a shape that narrows in a step-like manner, or the like. [Example]

[0057] In this embodiment, two exhaust ports are arranged on the upstream and downstream sides of the multiwell plate 5. Note that explanations of components with the same reference numerals and functions as those described in Examples 1 to 3 will be omitted.

[0058] FIG. 8 is a schematic vertical cross-sectional view showing a temperature control device according to a fourth embodiment.

[0059] In this figure, unlike FIG. 1, a front exhaust port 14 is provided between the air intake 4 and the temperature control unit 3. Also, the temperature adjustment unit 7 does not contact the bottom of the housing 2. In other words, a gap is provided below the temperature adjustment unit 7. Air drawn in from the front exhaust port 14 passes through an exhaust path 9 and is exhausted to the outside of the housing 2 by an exhaust fan 10. Other than this, the configuration is the same as in FIG. 1.

[0060] FIG. 9 is a cross-sectional view showing the inside of the temperature control device 1 of FIG.

[0061] In FIG. 9, for the depth h3 in the Y-axis direction of the front exhaust port 14 and the depth h4 in the Y-axis direction of the exhaust port 8, h3 < h4 is set.

[0062] By narrowing the depth of the front exhaust port 14 in this way, the pressure loss at the front exhaust port 14 increases and the flow velocity decreases.

[0063] On the other hand, since the depth h4 of the exhaust port 8 is large, the air volume is large and the flow velocity is large. The amount of air sucked in from the exhaust port 8 is larger than the air exhausted from the front exhaust port 14.

[0064] Therefore, the airflow 13 flowing in from the intake port 4 passes above the multi-well plate 5, and the variation in the evaporation amount of the solution in the multi-well plate 5 can be suppressed.

[0065] Also, according to this embodiment, since the amount of the airflow 13 passing above the multi-well plate 5 can be limited, the diffusion of the solution droplets can be prevented.

Embodiment

[0066] In this embodiment, a duct is provided at the exhaust port. For the components with the same reference numerals and the same functions described in Embodiments 1 to 4, the description is omitted. This is an example of a structure formed until it reaches approximately the same height as the multi-well plate 5. For the parts having the same functions as the components with the same reference numerals already described, the description is omitted.

[0067] FIG. 10 is a schematic longitudinal sectional view showing the temperature control device of Embodiment 5.

[0068] In this figure, a duct portion 15 is provided at the exhaust port 8, and the opening of the exhaust port 8 is set to approximately the same height as the upper surface of the multi-well plate 5.

[0069] This configuration eliminates the step between the exhaust port 8 and the top surface of the multiwell plate 5, allowing the airflow 13 introduced from the intake port 4 and passing above the multiwell plate 5 to be sucked into the duct portion 15 without bending, improving the uniformity of the flow above the multiwell plate 5 and reducing variation in the amount of evaporation of the solution.

[0070] The shape of the duct portion 15 is not limited to being substantially the same as the shape of the exhaust port 8, but may be a circular pipe shape or a duct shape narrower than the exhaust port 8. [Example]

[0071] In this embodiment, a movable lid is provided so that the width of the exhaust port can be changed. Note that the description of the components having the same functions and having the same reference numerals as those described in the first to fifth embodiments will be omitted.

[0072] FIG. 11 is a schematic vertical cross-sectional view showing a temperature control device according to a sixth embodiment.

[0073] In this figure, a movable lid portion 16 is provided on the exhaust port 8.

[0074] FIG. 12 is a cross-sectional view showing the inside of the temperature control device 1 of FIG.

[0075] 12, movable lid portions 16 are provided at both ends in the width direction (X-axis direction) of exhaust port 8. The width of exhaust port 8 can be changed by controlling the opening and closing of lid portion 16. Furthermore, by controlling the angle of lid portion 16, not only can it be opened and closed, but also fine adjustment of the flow path resistance can be made.

[0076] According to the above embodiment, the flow velocity at the center and the end of exhaust port 8 can be adjusted according to the ambient humidity and outside temperature, thereby adjusting the flow velocity distribution of airflow 13 above multiwell plate 5. This makes it possible to reduce variations in the amount of evaporation of solution 12 held in multiwell plate 5.

[0077] The temperature control device according to the present disclosure is applicable to biochemical devices, analytical devices, and genetic testing devices. [Explanation of symbols]

[0078] 1: Temperature control device, 2: Housing, 3: Temperature control section, 4: Air intake port, 5: Multi-well plate, 6: Temperature control block, 7: Temperature control section, 8: Air exhaust port, 9: Air exhaust path, 10: Exhaust fan, 11: Well, 12: Solution, 13: Air flow, 14: Front exhaust port, 15: Duct section, 16: Lid section, 25: Partition plate.

Claims

1. The housing and a partition plate that divides the housing into an upper section and a lower section; A temperature control unit; an exhaust fan; the temperature control unit includes a temperature adjustment unit and a multiwell plate; the multiwell plate is placed above the partition plate; the temperature control unit is disposed below the partition plate, an air intake port for introducing outside air is provided in a predetermined portion of a side surface of the housing that is located above the partition plate; The partition plate is provided with an exhaust port, the exhaust fan is disposed so as to exhaust air to the outside of the housing through an exhaust path located below the partition plate, the multiwell plate is disposed between the intake port and the exhaust port; A temperature control device configured so that the air flows into the housing through the air inlet, passes over the multiwell plate, and flows into the exhaust path through the exhaust outlet.

2. The temperature control device according to claim 1 , wherein the width of the exhaust port is narrower than the width of the multiwell plate.

3. 2. The temperature control device according to claim 1, wherein the width of the exhaust port narrows in the direction in which the air travels.

4. a front exhaust port is provided between the intake port and the multiwell plate; The temperature control device according to claim 1 , wherein the front exhaust port has a depth narrower than that of the exhaust port.

5. The exhaust port is provided with a duct portion, The temperature control device according to claim 1 , wherein the opening of the exhaust port is positioned at approximately the same height as the upper surface of the multi-well plate.

6. The temperature control device according to claim 1 , wherein the exhaust port is provided with a movable lid.

7. A biochemical device comprising the temperature control device according to any one of claims 1 to 6.

8. An analytical device comprising the temperature control device according to any one of claims 1 to 6.

9. A genetic testing device comprising the temperature control device according to any one of claims 1 to 6.

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