In-line Water Scrubber Systems for Semiconductor Processing

Abstract

The semiconductor processing system includes a vacuum pump having an inlet and an outlet, the inlet of the vacuum pump configured to be in fluid communication with the outlet of the semiconductor reactor, and the vacuum pump configured to output waste gas exhaust from the reactor to the outlet of the vacuum pump. The semiconductor processing system further includes a water scrubber system at the outlet of the vacuum pump, the water scrubber system having a vertical orientation relative to the pump and having an inlet and at least one mixing chamber. The inlet is in fluid communication with the outlet of the vacuum pump and the mixing chamber. The water scrubber system is configured to maintain a temperature of the exhaust gas at an output of the pump while the exhaust gas is directed to the mixing chamber, and to inject water into the exhaust gas to remove water reaction products in the exhaust.

Description

[Background technology]

[0001] Figure 1 shows a flow diagram of a typical semiconductor processing system. Semiconductor devices are created by processing single-crystal silicon wafers through many steps using various chemical vapors under high vacuum. The utilization of these chemical vapors in semiconductor device manufacturing is inefficient. As a result, over 50% of the chemical vapors are exhausted from the processing chamber through a vacuum foreline connected to a vacuum pump. The vacuum pump exhaust gas, at 1 atmosphere, is highly diluted with nitrogen gas to prevent potential explosions if the chemical vapors are flammable. The pump exhaust line is typically heated to 100–200 °C to prevent condensation of volatile chemical vapors. The nitrogen-diluted chemical vapors are then disposed of in an abatement system using high temperatures generated by either methane combustion or an electric arc discharge.

[0002] Titanium tetrachloride is a liquid at room temperature, has a boiling point of 136.6°C, and is highly reactive with water. It is used in the chemical vapor deposition of titanium nitride thin films by reacting it with ammonia gas. When titanium tetrachloride is used in semiconductor processes, the pump exhaust gas composition consists of unreacted titanium tetrachloride, ammonia gas in nitrogen, and other chemical by-products. The pump discharge line can be 15 to 40 feet long or longer. Any cold spot in this line will cause titanium tetrachloride condensation. This can lead to a hazardous condition if any water condensation is present, either during processing or during routine maintenance, due to the accumulation of liquid chemicals that can subsequently react and cause localized corrosion in the pump discharge line.

[0003] Tungsten hexafluoride, which has a boiling point of 17°C, reacts with water and is widely used in semiconductor processing. Nitrogen dilution and heating of pump discharge lines are important for safe and continuous operation.

[0004] Ammonium nitrate, with a boiling point of 210°C and a melting point of 169.6°C, is a product of various chemical vapor-phase reactions that can occur within the process chamber or along the foreline. If the pump exhaust line is not heated to 250°C, ammonium nitrate can condense and deposit. The accumulation of this chemical in the pump exhaust line can create localized deposits that can spontaneously explode under chemical reaction with the pump exhaust gases or due to friction / vibration of the exhaust line, for example during a maintenance schedule.

[0005] State-of-the-art semiconductor processes employ atomic layer deposition of aluminum oxide. The typical chemical vapor source for such deposition is trimethylaluminum (TMA), which has a boiling point of 125-130°C and reacts violently with water. In these processes, the pump discharge lines must be heated very uniformly to at least 200°C. Any cold spots in the lines can cause condensation of TMA, resulting in dangerous and costly maintenance procedures. It has been widely reported that TMA condenses at the inlet of abatement systems, causing plug-in input tubing and significant maintenance issues that are dangerous.

[0006] Additionally, chlorine trifluoride (ClF3), used in special processes for chamber cleaning, can be found in the pump exhaust lines. ClF3 is highly reactive with water, presenting a dangerous and costly maintenance procedure. [Brief explanation of the drawings]

[0007] [Figure 1] 1 is a schematic diagram of a prior art semiconductor processing system having an abatement system in the vacuum pump exhaust line. [Figure 2] 1 is a schematic diagram of a semiconductor processing system having a post-pump in-line water scrubber system. [Figure 2A] 1 is a schematic diagram of a vertical arrangement of a semiconductor reactor, a semiconductor processing system pump, and a post-pump in-line water scrubber system located at the pump outlet. [Figure 3] FIG. 2B is a detailed cross-sectional view of the water scrubber system of FIG. 2A. [Figure 4] FIG. 2B is a detailed cross-sectional view of the water scrubber system of FIG. 2A having an enhanced mass transfer surface area. DETAILED DESCRIPTION OF THE INVENTION

[0008] Referring to FIG. 2, numeral 10 generally designates a semiconductor processing system. The semiconductor processing system 10 includes a semiconductor reactor 12, a vacuum pump 14, an in-line water scrubber system 16 installed at the vacuum pump outlet 14b (FIG. 3), and an abatement system. To efficiently remove at least one or more, and optionally most if not all, of the water-reactive chemicals, the in-line water scrubber system 16 is positioned at the pump outlet, e.g., within 12 inches or 6 inches of the horizontal portion of the pump output elbow, and is also positioned vertically at the pump outlet. As described more fully below, the in-line water scrubber system 16 is configured to efficiently remove at least one or more, and optionally most if not all, of the water-reactive chemicals from the pump exhaust output (waste gas from the reactor 12), such as titanium tetrachloride, tungsten hexafluoride, ammonium nitrate, trimethylaluminum, chlorine trifluoride, and other vapors that readily react with or are absorbed by water. Acid gases and ammonia gas can also be removed due to their high water solubility.

[0009] 2A and 3, the in-line water scrubber system 16 includes an inlet 16a coupled to the vacuum pump output 14b of FIG. 2A and an outlet 16b for discharging the abattoirized waste gas. The in-line water scrubber system 16 includes a first mixing chamber 18 and a second mixing chamber 20. As described in more detail below, the first mixing chamber 18 retains the heat of the waste gas entering the in-line water scrubber system to mix heated nitrogen with the waste gas, and the second mixing chamber 20 mixes the heated nitrogen and waste gas mixture with water to react with the water-reactive chemical vapor in the waste gas.

[0010] As best seen in FIG. 3 , the first mixing chamber 18 is formed by three concentric conduits 18a, 18b, and 18c, e.g., cylindrical tubes. Suitable materials for conduits 18a, 18b, and 18c include metals such as stainless steel 304 or 316 or other alloys. Conduits 18a, 18b, and 18c can also be constructed from polymeric materials such as polypropylene, polyethylene, Teflon, or other plastics, provided the operating temperature is below the yield / melting point of the polymer. Conduit 18a, which is oriented perpendicular to the outlet of pump 14, is concentrically disposed within conduit 18b, which forms the inlet of conduit 18a and is in fluid communication with the pump outlet through one end forming inlet 16a of inline water scrubber system 16. Conduit 18b, therefore, also has a vertical orientation. For example, the diameter of conduit 18a can be approximately 2 to 4 inches, and typically approximately 2.5 inches. The diameter of conduit 18b is about 1 inch larger than conduit 18c, typically in the range of 3 to 5 inches, and optionally about 3.5 inches. Both conduits 18a and 18b may be cylindrical with a constant diameter along their entire length.

[0011] To help maintain the temperature of the exhaust gas from the pump, conduit 18b is configured to heat conduit 18a. For example, heated nitrogen flows through the space between conduits 18a and 18b, heating conduit 18a and the waste gas flowing therethrough, and then mixing with the waste gas flowing from conduit 18a to form a heated, nitrogen-diluted mixture. For example, conduit 18b can be in fluid communication with nitrogen supply 22 via conduit 24, with the nitrogen being heated by a nitrogen heater, such as a conventional nitrogen heater, disposed in-line with conduit 24. For example, the nitrogen is heated to a temperature ranging from room temperature to 250°C, typically in the range of 150-200°C, thereby heating conduit 18a to at least 150-200°C.

[0012] Conduit 24 is in fluid communication with the lower end of conduit 18a adjacent, and optionally immediately adjacent, to the inlet of conduit 18a, which forms inlet 16a of in-line water scrubber system 16, as described above. In this manner, the temperature of the exhaust gas (waste gas) from pump 14 is maintained substantially constant. To further assist in maintaining the elevated temperature of conduit 18a and the exhaust gas therein, conduit 18a may be insulated by a layer of insulation 28. Suitable insulation may be formed from a sheath of fiberglass or quartz wool or any commercially available insulating material. Insulation may also extend above conduit 24 to help maintain the elevated temperature of the nitrogen. Heated nitrogen gas may be introduced into conduit 18b at flow rates ranging from 5 to 30 standard liters per minute or higher. Injecting heated nitrogen in this manner and at this location ensures that the pump exhaust gas (waste gas) remains at its elevated discharge temperature and prevents condensation of entrained chemical vapors therein.

[0013] To mix the heated nitrogen with the waste gas, the upper ends of both conduits 18a and 18b are open and terminate at or approximately the same height (or height, if vertical). For example, each conduit 18a, 18b can have a length or height ranging from about 24 to 48 inches or more, depending on the particular vapor being removed / reacted / absorbed. Thus, the heated nitrogen flows through conduit 18b, heating conduit 18a (and the waste gas thereon), before mixing with the waste gas flowing from the open upper end of conduit 18a. After mixing, the mixture is directed into a larger mixing area formed by conduit 18c, allowing the mixture to expand and slow down.

[0014] In the illustrated embodiment, conduit 18c surrounds conduit 18b and is spaced apart from conduit 18b. Conduit 18c is also concentrically disposed along its entire length and is formed by yet another larger diameter cylindrical tube, typically 1 to 4 inches or more larger than conduit 18b, e.g., approximately 4 to 9 inches, and optionally 7.5 inches in diameter. Thus, a larger mixing area can be formed between conduit 18c and conduit 18b. To direct the mixture into conduit 18c, mixing chamber 18 can include a deflector 30 that deflects the heated nitrogen and waste gas mixture downward (vertically as shown).

[0015] In the illustrated embodiment, deflector 30 comprises a conical surface, for example formed from a conical plate, attached to or formed on the upper closed end of conduit 18c. For example, the conical surface is angled so that as the heated nitrogen and waste gas mix (as they exit their respective conduits), they impinge on the conical surface, thereby changing the flow direction of the mixture from vertically upward to vertically downward at an angle of between about 30-60 degrees as described above, and allowing the mixture to expand.

[0016] 3, water is directed into chamber 18, and more specifically, into the larger mixing area of ​​conduit 18c, to react with the water-reactive chemical vapor in the pump exhaust waste gas. Additionally, water fills the bottom of chambers 18 and 20. In the illustrated embodiment, water is injected into conduit 18c through a venturi nozzle 32, e.g., a helical venturi nozzle, which directs and injects water into chamber 18 from a water distribution header 34 mounted above chambers 18 and 20. In the illustrated embodiment, water distribution header 34 includes a housing 48 that closes the upper side of conduit 18c, with the exception of the venturi nozzle described above, as will be described below.

[0017] The second chamber 20 may similarly be formed by another coaxial conduit 36 ​​mounted concentrically around conduit 18c below the water distribution header 34. Conduit 36 ​​may also be formed by another larger diameter cylindrical tube mounted concentrically along its entire length, typically 1 to 4 inches or more larger than conduit 18c, e.g., about 5 to 13 inches or about 11.5 inches in diameter. The space between conduit 36 ​​and conduit 18c forms the second mixing chamber 20. The second mixing chamber 20 is configured to mix water with any remaining water-reactive chemical vapors in the pump exhaust waste gas.

[0018] The in-line water scrubber system 16 also includes a water recirculation circuit 38 that circulates water through the mixing chamber. In the illustrated embodiment, the water recirculation circuit 38 includes a recirculation pump 38a, such as a high-capacity magnetically coupled water pump capable of pumping, for example, 10 to 25 gallons per minute. The pump's inlet is in fluid communication with the mixing chamber 20 at its lower end via conduit 38b, and the pump's output is in fluid communication with the water distribution header 34 via conduit 38c. Thus, the pump 38a can draw water from the bottom of the chamber 20 and redirect it into the water distribution header 34, which directs the water into chambers 18 and 20 via the venturi nozzles described above and additional venturi nozzles described below.

[0019] Additionally, pump 38a can maintain the water level in mixing chamber 18 and mixing chamber 20 at a given level using a level controller 40. In the illustrated embodiment, level controller 40 includes a cover 42 and a drain pipe body 44 having a side opening 44a (FIG. 3). The water height is controlled by the height of the drain pipe opening in the level controller, as shown.

[0020] 3, as described above, the water distribution header 34 includes a housing 48. The housing 48 includes two chambers 50 and 52, e.g., an upper chamber and a lower chamber, with the chamber 52 distributing water to the mixing chambers 18 and 20. Fresh water is introduced into the chamber 50 via an inlet 50a, which slightly mixes with the scrubbed waste gas from the chambers 18 and 20 for discharge to a pump discharge line upstream of the in-line water scrubber system.

[0021] Water circulation circuit 38 is in fluid communication with chamber 52, which is in fluid communication with mixing chamber 18 via venturi nozzle 32 (described above) and with mixing chamber 20 via venturi nozzle 56. Nozzle 56 may also comprise a spiral venturi nozzle, which is mounted on the lower wall of housing 48 and, similar to nozzle 32, is mounted on the open ends of conduits 18b, 18c, and 36. Nozzle 56 is spaced between conduits 36 and 18c and sprays water at a larger angle than nozzle 32, for example, in the range of about 90 to 150 degrees, optionally about 120 degrees.

[0022] Housing 48 is attached to the upper ends (as viewed in FIG. 3 ) of conduits 18 b, 18 c, and 36, thereby closing the upper ends of the conduits and forming their respective chambers. Chamber 20 is in fluid communication with chamber 50 of water distribution header 34 via outlet 58, which extends through or passes through chamber 52 to discharge the purified waste gas into chamber 50, which then discharges the purified waste gas via outlet 16 b, which may be formed by a flanged pipe 60 for connection to a pump discharge line. Fresh water is introduced into chamber 50 via inlet 50 a and slightly mixes with the scrubbed waste gas from chamber 20 before being discharged into the pump discharge line upstream of the in-line water scrubber system.

[0023] The pump 38a in the water recirculation circuit 38 recirculates water at high flow rate and pressure to the chamber 52 in the water distribution header 34. The recirculated water to chamber 18 can be injected from chamber 52 through multiple tubes 32a—four to eight, typically six, depending on the design of the particular scrubber system—each tube having a Venturi nozzle 32 attached to the end. The Venturi nozzles 32 can spray water into chamber 18 at angles between approximately 30 and 60 degrees, and typically at an angle of approximately 50 degrees. This rotating, high-velocity water flow rapidly mixes with the deflected, hot nitrogen and waste gas at a narrow angle. In this initial mixing chamber 18 of the in-line water scrubber system, the water reacts with the water-reactive chemical vapors in the pump exhaust gas.

[0024] The nitrogen and waste gases, free of reactive water chemicals, then turn upward as shown and pass at a lower flow rate as they traverse upward through the scrubber's second mixing chamber 20. These gases are further scrubbed by recycled water flowing through a venturi nozzle 56, which sprays the water at a large angle, as described above, in the range of 90 to 150 degrees, typically in the range of 120 degrees. The residual nitrogen and permanent gases in the pump waste gas then pass through four to six tubes forming an outlet 58 as shown, leading to the chamber 50 of the water distribution header 34.

[0025] Fresh water can be added continuously via the inlet 50a of the chamber 50 at the rate of water removed as wastewater.

[0026] The exhaust gas from an in-line scrubber system consists mostly of nitrogen and permanent gases such as carbon dioxide, oxygen, ozone, hydrogen, PFCs, etc. depending on the particular semiconductor process. The exhaust gas from this scrubber system then passes through a pumped discharge line at 1 atmosphere pressure and is sent to an abatement system for final destruction of harmful gases before being released into the atmosphere.

[0027] 4, the in-line water scrubber system 16 may also include multiple rings 80, such as Raschig rings, stacked in either or both of the mixing chambers 20 and 18 to increase the mass transfer surface area. The rings may be formed from a variety of different materials that are compatible with chemical vapors in the pump exhaust, as described above, to increase the mass transfer surface area and increase the absorption of acid gases and ammonia.

[0028] This novel in-line water scrubber is ideally installed near the pump outlet (e.g., within 12 inches or within 6 inches of the horizontal section of the pump outlet elbow) so that most, if not all, of these water-reactive chemicals can be removed by water, and water-reactive by-products, such as solid oxides and acid and base solutions, can be sent to a wastewater drain before entering the pump discharge line. Thus, this in-line water scrubber assembly offers significant safety and cost advantages for continuous treatment operations with reduced maintenance intervals. [Explanation of symbols]

[0029] 12 Semiconductor reactor 14 Vacuum pump 16 In-line Water Scrubber System

Claims

1. 1. A semiconductor processing system comprising: a vacuum pump having an inlet and an outlet, the inlet of the vacuum pump configured to be in fluid communication with the outlet of a semiconductor reactor, the vacuum pump configured to output a waste gas exhaust from the semiconductor reactor at the outlet of the vacuum pump; a water scrubber system provided at the outlet of the vacuum pump, at least one mixing chamber; a first conduit forming an inlet of the water scrubber system in fluid communication with the outlet of the vacuum pump, the first conduit directing exhaust gas introduced from the inlet of the water scrubber system to the mixing chamber; a second conduit surrounding the first conduit; a water scrubber system having a supply of heated nitrogen; the water scrubber system is configured to heat exhaust gas flowing through the first conduit and the first conduit by flowing heated nitrogen supplied from the heated nitrogen supply into a space between the second conduit and the first conduit, mix the exhaust gas exiting an end of the first conduit with the heated nitrogen exiting an end of the space between the second conduit and the first conduit to form a heated nitrogen-diluted mixture, and then inject water into the heated nitrogen-diluted mixture in the mixing chamber to remove water reactive products in the exhaust gas.

2. 10. The semiconductor processing system of claim 1, wherein said water scrubber system includes a water recirculation circuit that recirculates water through said mixing chamber.

3. 3. The semiconductor processing system of claim 2, wherein the water recirculation circuit is configured to maintain a water level within the mixing chamber.

4. The semiconductor processing system of claim 1 , wherein the water scrubber system comprises a plurality of Raschig rings.

5. 2. The semiconductor processing system of claim 1, wherein the water scrubber system is configured to allow expansion of the heated nitrogen-diluted mixture in the mixing chamber and to inject the water as the heated nitrogen-diluted mixture flows into the larger portion.

6. 10. The semiconductor processing system of claim 1, wherein said mixing chamber comprises a first mixing chamber and a second mixing chamber, said first mixing chamber directing said heated nitrogen diluted mixture to said second mixing chamber.

7. 7. The semiconductor processing system of claim 6, wherein said water scrubber system is configured to inject water into said heated nitrogen diluted mixture in said first mixing chamber and said second mixing chamber.

8. 7. The semiconductor processing system of claim 6, wherein the water scrubber system is configured to inject water into the exhaust gases in the first mixing chamber using a first set of Venturi nozzles.

9. 9. The semiconductor processing system of claim 8, wherein the water scrubber system is configured to inject water into the exhaust gas in the second mixing chamber using a second set of Venturi nozzles, the first set of Venturi nozzles injecting water at a smaller angle than the second set of Venturi nozzles.

10. 10. The semiconductor processing system of claim 9, wherein the first set of Venturi nozzles spray the water into the first mixing chamber at an angle between about 30 and 60 degrees, and optionally at an angle of about 50 degrees, and the second set of Venturi nozzles spray the water into the second mixing chamber at an angle between about 90 and 150 degrees, and optionally at an angle of about 120 degrees.

11. 1. An in-line water scrubber system comprising: a mixing chamber; a first conduit forming an inlet in fluid communication with an outlet of a vacuum pump of a semiconductor processing system, the first conduit directing exhaust gases introduced through the inlet into the mixing chamber; a second conduit surrounding the first conduit; a water supply configured to inject water into the mixing chamber; Equipped with the in-line water scrubber system is configured to heat exhaust gas flowing through the first conduit and the first conduit by flowing heated nitrogen supplied from a heated nitrogen supply into the space between the second conduit and the first conduit, and to mix the exhaust gas exiting an end of the first conduit with the heated nitrogen exiting an end of the space between the second conduit and the first conduit to form a heated nitrogen-diluted mixture; an in-line water scrubber system, wherein the water supply is configured to inject water into the heated nitrogen-diluted mixture in the mixing chamber to remove water-reactive products in the exhaust gas;

12. 12. The in-line water scrubber system of claim 11, wherein the in-line water scrubber system is configured to allow the heated nitrogen-diluted mixture to expand in the mixing chamber and to inject the water as the heated nitrogen-diluted mixture enters the larger portion.

13. 12. The in-line water scrubber system of claim 11, wherein the mixing chamber comprises a first mixing chamber and further comprises a second mixing chamber, the first mixing chamber directing the heated nitrogen diluted mixture into the second mixing chamber.

14. 14. The in-line water scrubber system of claim 13, wherein the water supply is configured to inject water into the heated nitrogen-diluted mixture in the first mixing chamber and the second mixing chamber.

15. 15. The in-line water scrubber system of claim 14, wherein the in-line water scrubber system is configured to inject water into the exhaust gas in the first mixing chamber with a first set of venturi nozzles and to inject water into the second mixing chamber with a second set of venturi nozzles, the first set of venturi nozzles injecting water into the first mixing chamber at a smaller angle than the second set of venturi nozzles.

16. 1. A method for scrubbing semiconductor processing waste gases from a semiconductor processing system, comprising: the semiconductor processing system comprising a reactor and a vacuum pump for pumping waste gas from the reactor, the vacuum pump having an outlet; The method comprises: providing a mixing chamber; providing a first conduit forming an inlet in fluid communication with an outlet of the vacuum pump and directing exhaust gases introduced through the inlet to the mixing chamber; providing a second conduit surrounding the first conduit; heating the first conduit and the exhaust gas flowing within the first conduit by flowing heated nitrogen through a space between the second conduit and the first conduit; mixing exhaust gases exiting an end of the first conduit with heated nitrogen exiting an end of the space between the second conduit and the first conduit to form a heated nitrogen diluted mixture; injecting water into the heated nitrogen diluted mixture in the mixing chamber to remove water reactive products in the exhaust gas; A method comprising:

17. 17. The method of claim 16, wherein the outlet of the vacuum pump has an elbow with a horizontal component, and further comprising positioning the inlet within 12 inches (304.8 mm) of the horizontal component of the elbow.

18. 17. The method of claim 16, wherein the mixing chamber comprises a first mixing chamber and further comprises a second chamber, and further comprising directing the water and the heated nitrogen diluted mixture into the second chamber.

19. 20. The method of claim 18, further comprising directing water into the second chamber, thereby removing additional water-reactive products in the exhaust gas.

20. 17. The method of claim 16, wherein the step of injecting water includes the step of injecting the water with a Venturi nozzle.

21. 17. The method of claim 16, wherein the step of removing water reaction products comprises removing water reaction products selected from the group consisting of titanium tetrachloride, tungsten hexafluoride, ammonium nitrate, trimethylaluminum, and chlorine trifluoride.

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