Anti-reflective hard coat film

Abstract

To provide an antireflection hard coat film having excellent wear resistance in which the reflection of an external light source is reduced to make visibility satisfactory, further, stains are less likely to be stuck owing to its high water-oil repellency, and scratches are hard to occur against repeated wiping or wiping with a hard cotton cloth or the like even when stains are stuck.SOLUTION: In an antireflection hard coat film, a hard coat film and a low refractive index layer are laminated on a base material film having light permeability in this order. The low refractive index layer comprises: a binder resin; hollow silica particles having the average particle diameter of 5 to 100 nm; alumina particles having the average particle diameter of 1 to 100 nm; and a surface conditioner, and the binder resin comprises ethylene oxide modified (meth)acrylate derived from pentaerythritol or trimethylol propane.SELECTED DRAWING: None

Description

[Technical Field]

[0001] The present invention relates to an anti-reflection hard-coated film that has excellent visibility due to reduced reflection of external light sources, and also has excellent stain resistance and abrasion resistance. [Background technology]

[0002] Anti-reflection hard coat films are widely used in image display devices, such as liquid crystal displays and organic electroluminescence (EL) displays, due to their excellent visibility and minimal reflection of external light sources such as fluorescent lights. In particular, when touching the image display surface of a touch panel or the like with a finger, the adhesion of oil and dirt can reduce visibility, creating a need for anti-fouling properties in addition to a low reflectance of external light sources. Furthermore, devices that use a touch pen for input require higher abrasion resistance and scratch resistance.

[0003] A well-known anti-reflection hard-coated film has a structure in which a hard-coat layer is provided on the surface of a film substrate and an anti-reflection layer with a low refractive index is disposed on top of that, but for example, a composition containing an ethylenically unsaturated group-containing fluoropolymer, a silicone compound having a siloxane skeleton, and a (meth)acrylate compound has been proposed as an anti-fouling anti-reflection film with excellent wiping properties (Patent Document 1). However, this anti-reflection film was not sufficient in terms of scratch resistance even when repeatedly wiped or wiped with a hard cotton cloth or the like.

[0004] On the other hand, a composition containing a silicone-grafted acrylic polymer, a compound having a methacryloyl group, and hollow colloidal silica has been proposed as a resin composition with excellent abrasion resistance and low reflectance (Patent Document 2). However, although a cured film using this composition has excellent abrasion resistance, it cannot be said to have sufficient antifouling properties. Therefore, there is room for improvement in order to create an antireflection film that has low reflection of external light sources, excellent visibility, and good abrasion resistance and antifouling properties. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] Patent Publication No. 2008-19402 [Patent Document 2] Patent Publication No. 2006-306950 Summary of the Invention [Problem to be solved by the invention]

[0006] The object of the present invention is to provide an anti-reflective hard-coated film that has excellent visibility due to minimal reflection of external light sources, is highly water- and oil-repellent, and even if soiled, is resistant to scratches even when wiped repeatedly or with a hard cotton cloth, etc., and has excellent abrasion resistance. [Means for solving the problem]

[0007] In order to solve the above problems, a hard coat layer and a low refractive index layer are laminated in this order on a light-transmitting substrate film, and the low refractive index layer comprises a binder resin (A), hollow silica fine particles (B) having an average primary particle diameter of 5 to 100 nm, alumina fine particles (C) having an average primary particle diameter of 1 to 100 nm, Fluorine-based silicone compounds with reactive functional groups (D), wherein (A) contains an ethylene oxide-modified (meth)acrylate (a1) derived from pentaerythritol or trimethylolpropane, the blending amount of (A) is 10 to 40% by weight based on the total solid content of the low refractive index layer, The present invention provides an anti-reflection hard coat film, characterized in that the blending ratio of (a1) in (A) is 50% by weight or more.

[0008] The invention of claim 2 is as follows: 2. The composition according to claim 1, wherein the amount of (C) is 2.0 to 15.0% by weight based on the total amount of solids in the low refractive index layer. The present invention provides an anti-reflective hard coat film.

[0009] The invention of claim 3 is the above (D) The blending amount is 1.0 to 25.0% by weight based on the total amount of solids in the low refractive index layer. The anti-reflection hard coat film according to claim 1, wherein

[0010] The invention of claim 4 is as follows: 4. The hard coat layer according to claim 1, wherein the hard coat layer has electrical conductivity. The present invention provides an anti-reflection hard coat film according to any one of the above. BEST MODE FOR CARRYING OUT THE INVENTION

[0012] The anti-reflective hard-coated film of the present invention is produced using two types of resins: a hard coat (hereinafter referred to as HC) resin composition for forming the HC layer, and a low refractive index resin composition for forming the low refractive index layer. The low refractive index resin composition is a composition containing a binder resin (A), hollow silica fine particles (B), alumina fine particles (C), and a surface conditioner (D). In this specification, (meth)acrylate includes both acrylate and methacrylate.

[0013] The binder resin (A) used in the present invention is the main resin that disperses the aforementioned (B) and (C) to form the low refractive index layer, and contains at least an ethylene oxide (hereinafter referred to as EO)-modified (meth)acrylate (a1) derived from pentaerythritol or trimethylolpropane. (a1) has the characteristic of being able to improve curability even in the case of a thin film, since it contains an EO chain and regenerates active radicals from peroxy radicals that have lost their polymerization activity due to oxygen inhibition.

[0014] Examples of (a1) include EO-modified pentaerythritol tri(meth)acrylate, EO-modified pentaerythritol tetra(meth)acrylate, EO-modified dipentaerythritol tetra(meth)acrylate, EO-modified dipentaerythritol penta(meth)acrylate, EO-modified dipentaerythritol hexa(meth)acrylate, EO-modified trimethylolpropane tri(meth)acrylate, and EO-modified ditrimethylolpropane tetra(meth)acrylate, and these can be used alone or in combination of two or more. Among these, tetrafunctional or higher functional groups are preferred from the viewpoint of high reactivity, and EO-modified pentaerythritol tetraacrylate represented by the following formula (1) is particularly preferred. The number of polymerizations (n) of the EO modification is preferably 3 to 10, more preferably 4 to 8, and particularly preferably 4 to 5. [ka] ····(1) (n = a + b + c + d in equation (1) ≒ 5)

[0015] As the (A), a binder other than (a1) may be used. Examples of the binder (A) other than (a1) include oligomers such as non-EO-modified urethane (meth)acrylates, epoxy (meth)acrylates, polyester (meth)acrylates, polycarbonate (meth)acrylates, acrylic (meth)acrylates, and diene (meth)acrylates, and examples of low-molecular-weight binders include aliphatic, alicyclic, and polyether-skeleton (meth)acrylates having functional groups such as hydroxyl and amino groups.

[0016] The ratio of (a1) in (A) is preferably 50% by weight or more, more preferably 60% by weight or more, and particularly preferably 90% by weight or more. By making it 50% by weight or more, it is expected that the effect of reducing polymerization inhibition by oxygen can be achieved even in thin films.

[0017] The amount of (A) is preferably 10 to 40% by weight, more preferably 12 to 35% by weight, and particularly preferably 15 to 30% by weight, based on the total solid content of the resin composition. By adjusting it to 10% by weight or more, sufficient film curing properties can be ensured, and by adjusting it to 40% by weight or less, the refractive index can be sufficiently reduced, thereby lowering the reflectance.

[0018] The hollow silica particles (B) used in the present invention are blended for the purpose of lowering the refractive index of the low refractive index layer. (B) are silica particles that have internal cavities containing air with a refractive index of 1, and have the function of lowering the refractive index of the low refractive index layer while maintaining the coating strength of the layer. While the refractive index of solid silica particles is about 1.45, the refractive index of (B) decreases as the occupancy rate of the internal cavities increases, and is about 1.15 to 1.40.

[0019] The average primary particle size of (B) is 5 to 100 nm, preferably 20 to 80 nm, and more preferably 40 to 70 nm. By setting it within this range, good dispersibility can be obtained without impairing the transparency of the low refractive index layer. In particular, a size of 40 to 70 nm can increase the void occupancy rate and lower the refractive index while ensuring a shell thickness that does not result in insufficient strength. The average particle size is the median diameter (d=50) measured by a laser diffraction / scattering method in accordance with JIS Z 8825-1.

[0020] The blending amount of (B) is preferably 40 to 70% by weight, more preferably 45 to 65% by weight, based on the total solid content of the resin composition. A blending amount of 40% by weight or more can sufficiently lower the refractive index, while a blending amount of 70% by weight or less can ensure sufficient abrasion resistance. Commercially available products include Sururia 4320 (trade name: manufactured by JGC Catalysts and Chemicals, solid content 20.5%, average primary particle size 60 nm).

[0021] The alumina fine particles (C) used in the present invention are blended to increase the hardness of the low refractive index layer and improve abrasion resistance. The average primary particle size of (C) is 1 to 100 nm, preferably 5 to 50 nm, and more preferably 10 to 30 nm. By making it 1 nm or more, improved abrasion resistance can be expected, and by making it 100 nm or less, sufficient total light transmittance can be ensured without increasing haze.

[0022] The blending amount of (C) is preferably 2.0 to 15.0 wt. % of the total solid content of the resin composition, more preferably 3.0 to 12.0 wt. %, and particularly preferably 4.0 to 10.0 wt. By adjusting it to 3.0 wt. % or more, sufficient abrasion resistance can be ensured, and by adjusting it to 15.0 wt. % or less, reflectance can be kept sufficiently low. An example of a commercially available product is ALMIBK-M47 (trade name: manufactured by CIK Nanotech Co., Ltd., solid content 15%, average particle size 20 nm).

[0023] The surface conditioner (D) used in the present invention is blended to improve the slip properties of the low refractive index layer, thereby improving abrasion resistance, and to enhance water repellency and stain resistance by increasing water repellency. Examples include silicone-based, fluorine-based, and acrylic-based compounds. Preferably, the surface conditioner has a reactive functional group capable of polymerizing with a binder resin to form a cured coating film, since the effect can be maintained for a long period of time without bleeding or other bleed-out from the cured coating. Fluorine-based silicone compounds are particularly preferred because their low surface free energy allows them to easily segregate on the coating surface after coating and drying, thereby stabilizing abrasion resistance and stain resistance over a long period of time.

[0024] The blending amount of (D) is preferably 1 to 25% by weight, more preferably 3 to 15% by weight, and particularly preferably 5 to 12% by weight, based on the total solid content of the resin composition. By adding it to 1% by weight or more, it is expected that the abrasion resistance and stain resistance will be improved, and by adding it to 25% by weight or less, sufficient curing properties will be ensured. An example of a commercially available product is X-71-1203M (trade name: manufactured by Shin-Etsu Chemical Co., Ltd., solid content 20%, fluorine-based silicone compound having reactive functional groups).

[0025] The HC resin composition for forming the HC layer located below the low refractive index layer of the present invention preferably contains a polyfunctional urethane (meth)acrylate (hereinafter referred to as polyfunctional urea) as a binder.

[0026] The polyfunctional urea preferably contained in the HC resin composition has excellent scratch resistance due to the cohesive force of hydrogen bonds derived from urethane bonds. For example, it can be obtained by reacting a polyisocyanate with a (meth)acrylate having a hydroxyl group. Examples of polyisocyanates that can be used include hexamethylene diisocyanate (hereinafter referred to as HDI), isophorone diisocyanate, diphenylmethane diisocyanate, tolylene diisocyanate, dicyclohexylmethane-4,4'-diisocyanate, hydrogenated xylylene diisocyanate, methylcyclohexylene diisocyanate, HDI isocyanurate, and IPDI isocyanurate. These may be used alone or in combination of two or more. Among these, aliphatic and alicyclic diisocyanates, which have high weather resistance and are resistant to yellowing, are preferred, and HDI, which has high stretchability, is particularly preferred.

[0027] Examples of (meth)acrylates having a hydroxyl group used in the polyfunctional urea include, for example, bifunctional trimethylolpropane di(meth)acrylate, glycerin di(meth)acrylate, pentaerythritol di(meth)acrylate, diglycerin di(meth)acrylate, ditrimethylolpropane di(meth)acrylate, and dipentaerythritol di(meth)acrylate, and trifunctional or higher functional diglycerin tri(meth)acrylate, ditrimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol tri(meth)acrylate, dipentaerythritol tetra(meth)acrylate, and dipentaerythritol penta(meth)acrylate. Among these, trifunctional and highly curable pentaerythritol triacrylate (hereinafter referred to as PETA) is preferred.

[0028] Furthermore, by making the HC layer conductive, it is possible to impart antistatic properties to the antireflection film. To make the HC layer conductive, for example, a conductive polymer such as a π-conjugated polymer, an antistatic agent such as a quaternary ammonium salt-containing compound, or a conductive metal oxide such as indium tin oxide or antimony-doped tin oxide can be added to the HC resin. Among these, it is preferable to use a π-conjugated conductive polymer because of its excellent transparency and dispersibility.

[0029] The π-conjugated conductive polymer can be any known organic polymer as long as its main chain is composed of a π-conjugated system. Examples include polythiophenes, polypyrroles, polyanilines, polyphenylenes, polyacetylenes, polyphenylene vinylenes, polyacenes, polythiophene vinylenes, and copolymers thereof. Among these, polythiophene compounds are preferred in terms of stability and easy availability.

[0030] The polythiophene compound is a polymer of thiophene, a sulfur-containing heterocyclic compound, which becomes conductive when electrons are added to or removed from the conjugated n-orbital by doping. Poly(3,4-ethylenedioxythiophene) (hereinafter referred to as PEDOT) is particularly preferred because it improves conductivity when combined with poly(4-styrenesulfonate) (hereinafter referred to as PSS), has high environmental stability, and exhibits high optical transparency in thin films.

[0031] The content of the polythiophene compound in the HC resin is preferably 0.3 to 5.0 wt % of the total solid content, more preferably 0.5 to 3.0 wt %, and particularly preferably 0.8 to 2.0 wt %. By setting it to 0.3 wt % or more, sufficient conductivity can be imparted, and by setting it to 5.0 wt % or less, the appearance of the HC layer can be maintained good.

[0032] The HC resin composition and low refractive index resin composition of the present invention preferably contain a photopolymerization initiator to improve curability by ultraviolet irradiation. Photopolymerization initiators generate radicals when irradiated with ultraviolet light or an electron beam, and these radicals trigger a polymerization reaction. General-purpose photopolymerization initiators such as benzyl ketal, acetophenone, and phosphine oxide photopolymerization initiators can be used. By arbitrarily selecting the light absorption wavelength of the polymerization initiator, it is possible to impart curability over a wide wavelength range from the ultraviolet region to the visible light region. Specifically, benzyl ketals include 2,2-dimethoxy-1,2-diphenylethan-1-one, α-hydroxyacetophenones include 1-hydroxy-cyclohexyl-phenyl-ketone and 1-[4-(2-hydroxyethoxy)-phenyl]-2-hydroxy-2-methyl-1-propan-1-one, α-aminoacetophenones include 2-methyl-1-(4-methylthiophenyl)-2-morpholinopropan-1-one, and acylphosphine oxides include 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide and bis(2,4,6-trimethylbenzoyl)-phenylphosphine oxide, and these can be used alone or in combination of two or more.

[0033] In the case of HC resin compositions, the photopolymerization initiator preferably contains an α-hydroxyacetophenone-based compound that is resistant to yellowing, and commercially available products include Omnirad 127, Omnirad 184, and Omnirad 2959 (trade name: manufactured by IGM Resins). Of these, Omnirad 2959 is particularly preferred, as it exhibits little yellowing and excellent scratch resistance. The amount of photopolymerization initiator blended per 100 parts by weight of the radically polymerizable component in the HC resin composition is preferably 1 to 15 parts by weight, more preferably 2 to 10 parts by weight.

[0034] In the case of a low refractive index resin composition, the photopolymerization initiator preferably contains an α-hydroxyacetophenone system, as in the case of an HC resin composition, and Omnirad127 (2-hydroxy-1-{4-[4-(2-hydroxy-2-methyl-propionyl)-benzyl]-phenyl}-2-methyl-propan-1-one) is particularly preferred because it is less susceptible to polymerization inhibition by oxygen. The amount of photopolymerization initiator blended per 100 parts by weight of the radically polymerizable component in the low refractive index resin composition is preferably 1 to 10 parts by weight, more preferably 2 to 8 parts by weight.

[0035] To the composition of the present invention, reactive diluents, ultraviolet absorbers, antioxidants, adhesion promoters, bluing agents, antifoaming agents, thickeners, anti-suspending agents, antistatic agents, anti-fogging agents, antibacterial agents, organic fine particles, and the like may be added as needed within limits that do not impair the performance.

[0036] When coating the HC resin composition and the low refractive index resin composition, they may be diluted with a solvent to improve coating properties. Examples of dilution solvents include alcohol-based solvents such as ethanol, n-propyl alcohol, isopropyl alcohol (hereinafter referred to as IPA), n-butyl alcohol, isobutyl alcohol, and diacetone alcohol; ketone-based solvents such as acetone, methyl ethyl ketone (hereinafter referred to as MEK), methyl isobutyl ketone, and cyclohexanone; ester-based solvents such as ethyl acetate and butyl acetate; and ether-based solvents such as PGM, diethyl ether, and diisopropyl ether. These solvents can be used alone or in combination of two or more. The solid content when diluted is, for example, 1 to 70%, but is not particularly limited and can be appropriately set to obtain a viscosity that is easy to coat.

[0037] Examples of the substrate film onto which the HC resin composition is applied include polyester film, triacetyl cellulose film, polycarbonate film, polysulfone film, nylon film, cycloolefin film, acrylic film, polyimide film, ABS film, polyolefin film, PVC film, PVA film, etc. Among these, biaxially stretched polyester film is preferably used from the viewpoints of weather resistance, processability, dimensional stability, etc. The thickness of the film may be approximately 25 μm to 500 μm.

[0038] In order to improve adhesion to the HC resin composition, the substrate film may be subjected to a surface treatment such as a primer treatment, a sandblasting method, a solvent treatment to make the surface rough, or a surface oxidation treatment such as a corona discharge treatment, a chromic acid treatment, or an ozone / ultraviolet irradiation treatment.

[0039] The method for applying the HC resin composition and the low refractive index resin composition is not particularly limited, and they can be formed by known coating methods such as spray coating, roll coating, die coating, air knife coating, blade coating, spin coating, reverse coating, gravure coating, and wire bar coating, or by printing methods such as gravure printing, screen printing, offset printing, and inkjet printing.

[0040] The thickness of the HC resin composition when dry can be, for example, 1 μm to 10 μm, but is not limited to this. The thickness of the low refractive index resin composition applied on the hard coat resin layer when dry is preferably 50 to 200 nm, more preferably 80 to 150 nm. If the thickness of the low refractive index layer is within this range, it is possible to sufficiently reduce the reflectance.

[0041] The light source for ultraviolet irradiation used to cure the HC resin composition and the low refractive index resin composition includes a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, a carbon arc lamp, a xenon lamp, a metal halide lamp, an LED lamp, an electrodeless ultraviolet lamp, etc., and the irradiation atmosphere may be air or an inert gas such as nitrogen or argon. Furthermore, the curing property can be further improved by heating the coating film during ultraviolet irradiation using a back roll or an IR heater. The irradiation conditions are an irradiation intensity of 500 mW / cm. 2 ~3000mW / cm 2 , exposure dose 50-400mJ / cm 2 The ultraviolet irradiation is carried out after the film is formed, but is not limited to this. 2 ) may also be used for semi-curing.

[0042] When the HC resin layer is made conductive, the surface resistivity of the anti-reflection film is 1 x 10 12 Ω / □ or less is preferable, 1×10 10 Ω / □ or less is more preferable. 12 By setting the resistance to Ω / □ or less, sufficient antistatic performance can be ensured.

[0043] The present invention will be described in detail below with reference to examples and comparative examples, but these are intended to be specific examples and are not intended to limit the scope of the invention. Unless otherwise specified, measurements were taken at room temperature of 25°C and a relative humidity of 65%. The blend amounts are in parts by weight.

[0044] HC resin composition The binder was hexafunctional urea A, obtained by reacting HDI and PETA, and the photopolymerization initiator was Omnirad 2959 (trade name: manufactured by IGM Resins) in the formulation shown in Table 1. The mixture was diluted with ethyl acetate and PGM to a solids content of 40%, and stirred until uniformly dissolved and dispersed to obtain an HC resin composition. Furthermore, the conductive HC agent used was Z-885-10ASL-2 (trade name: manufactured by Aica Kogyo Co., Ltd., solids content 30%), which was a urethane acrylate of the same composition blended with PEDOT / PSS at 1% of the total solids.

[0045] Low refractive index resin composition The (A) polymer was prepared by adding Miramer M4004 (trade name: manufactured by Miwon Co., Ltd., tetrafunctional EO-modified pentaerythritol tetraacrylate, n≒5) and Miramer M3130 (trade name: manufactured by Miwon Co., Ltd., trifunctional EO-modified trimethylolpropane triacrylate, n≒3), (B) polymer was added by adding Surulia 4320 (trade name: manufactured by JGC Catalysts and Chemicals Co., Ltd., solid content 20.5%, average primary particle size 60 nm, refractive index 1.3), (C) polymer was added by adding M47 (trade name: manufactured by CIK Nanotech Co., Ltd., solid content 15%, average particle size 20 nm, MIBK dilution), (D) polymer was added by adding X-71-1203M (trade name: manufactured by Shin-Etsu Chemical Co., Ltd., solid content 20%, reactive functional group-containing fluorine-based silicone compound), and (E) polymer was added by adding Omnirad127 (trade name: IGM A low refractive index resin composition was prepared using a binder containing M460 (trade name: EO-modified diglycerin tetraacrylate, manufactured by Nippon Kayaku Co., Ltd.) and DPHA (trade name: dipentaerythritol hexaacrylate, manufactured by Nippon Kayaku Co., Ltd.) in the proportions shown in Table 1. The mixture was diluted with IPA and PGM (IPA:PGM=1:1) to a solids content of 3%, and stirred until uniformly dissolved and dispersed to obtain a low refractive index resin composition.

[0046] Table 1 JPEG0007753579000002.jpg70135

[0047] The evaluation method was as follows.

[0048] Preparation of HC layer The HC resin composition was applied to a PET film U403 (product name: manufactured by Toray Industries, Inc., thickness 100 μm, with an easy-adhesion layer) to a dry film thickness of 3 μm, and dried at 80° C. for 1 minute. Thereafter, the coating was exposed to 100 mW / cm using an ultraviolet exposure device ECS-151U manufactured by iGraphics Co., Ltd. 2 ,800mJ / cm 2 The mixture was cured under the conditions described above to prepare an HC film.

[0049] Creating anti-reflective film A low refractive index resin composition was applied onto the hard coat layer prepared above to a dry film thickness of 100 nm, and dried at 80°C for 1 minute. Thereafter, the composition was exposed to a UV light of 100 mW / cm using an ECS-151U ultraviolet exposure device manufactured by Eye Graphics. 2 ,800mJ / cm 2 The coating was cured under a nitrogen atmosphere to form an anti-reflective film.

[0050] Coating haze: The anti-reflection film was measured in accordance with JIS K7361-1 using Haze-GARD2 manufactured by Toyo Seiki Seisakusho Co., Ltd., with 1.0% or less being rated as ◯ and over 1.0% being rated as x.

[0051] Minimum reflectance: Using the above anti-reflection film, the side opposite the coated side was scratched with sandpaper, the scratched area was filled in with a black pigment marker, and a black PET film was then attached to set the reflectance of the opposite side to 0%.Then, the reflectance of the HC side was measured using a spectrophotometer by plotting the reflectance in 1 nm increments in the range of 300 nm to 780 nm, and the minimum reflectance was measured. A reflectance of 1.5% or less was marked as ◯, and a reflectance of more than 1.5% was marked as ×.

[0052] Abrasion resistance: A load of 200 g / cm2 was placed on steel wool #0000 and moved back and forth 10 times. Visual observation showed that no scratches were observed, △, and multiple scratches were observed.

[0053] Water contact angle: In accordance with the sessile drop method of JIS R 3257:1999, water was dropped onto a sample in its normal state at room temperature using a DMs-400 manufactured by Kyowa Interface Science Co., Ltd., and the contact angle was measured after leaving it to stand for 30 seconds. A contact angle of 115° or more was evaluated as ◎, a contact angle of 105° or more but less than 115° was evaluated as ○, and a contact angle of less than 105° was evaluated as ×.

[0054] Surface resistivity: Measured using a high-resistance resistivity meter, Hirester UX MCP-HT800, manufactured by Mitsubishi Chemical Analytical Corp., at an applied voltage of 100 V and a measurement time of 1 minute. Note that the surface resistivity was measured only in Examples 3 and 5.

[0055] Evaluation results Table 2 JPEG0007753579000003.jpg65135

[0056] The examples were satisfactory in all respects, including haze, minimum reflectance, abrasion resistance, and water contact angle. In addition, Example 5, in which the HC layer was made conductive, had a surface resistivity of 1×10 12 The value was Ω / □ or less, ensuring sufficient antistatic performance.

[0057] On the other hand, Comparative Example 1, which did not contain (C), had poor abrasion resistance and a low water contact angle, and Comparative Example 2, which did not contain (B), had a high minimum reflectance and a low water contact angle.Comparative Examples 3 and 4, which did not contain (a1), also had poor abrasion resistance, and neither was suitable for the present invention.

Claims

1. 1. An antireflective hard coat film comprising a hard coat layer and a low refractive index layer laminated in this order on a light-transmitting substrate film, the low refractive index layer comprising a binder resin (A), hollow silica fine particles (B) having an average primary particle diameter of 5 to 100 nm, alumina fine particles (C) having an average primary particle diameter of 1 to 100 nm, and a fluorine-based silicone compound (D) having a reactive functional group, the (A) comprising an ethylene oxide-modified (meth)acrylate (a1) derived from pentaerythritol or trimethylolpropane, the blending amount of the (A) being 10 to 40 wt % relative to the total solid content of the low refractive index layer, and the blending ratio of the (a1) in the (A) being 50 wt % or more.

2. 2. The anti-reflection hard coat film according to claim 1, wherein the blending amount of said (C) is 2.0 to 15.0% by weight based on the total amount of solids in the low refractive index layer.

3. 2. The anti-reflection hard coat film according to claim 1, wherein the blending amount of said (D) is 1.0 to 25.0% by weight based on the total amount of solids in the low refractive index layer.

4. 4. The anti-reflective hard-coated film according to claim 1, wherein the hard-coating layer has electrical conductivity.

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