Apparatus for manufacturing a resin structure, apparatus for manufacturing an electrode, and method for manufacturing a resin structure

Abstract

To provide a manufacturing device for a resin structure capable of monitoring an irradiated state by irradiation means in a configuration which does not move application means and the irradiation means.SOLUTION: A manufacturing device for a resin structure comprises: application means for applying an activation energy curable liquid composition onto a substrate; at least one piece of irradiation means for irradiating the liquid composition applied on the substrate with activation energy rays; and output means for outputting state information corresponding to an irradiated state by the irradiation means. The application means applies the liquid composition onto the substrate by discharging the liquid composition from a plurality of nozzles provided over an entire application width to apply the liquid composition to the substrate in a width direction across a conveyance direction of the substrate, and the output means is disposed in a region other than an irradiation region irradiated with the activation energy rays from the irradiation means.SELECTED DRAWING: Figure 3

Description

[Technical Field]

[0001] The present disclosure relates to an apparatus for manufacturing a resin structure, an apparatus for manufacturing an electrode, and a method for manufacturing a resin structure. [Background technology]

[0002]

[0003] Conventionally, there has been known a resin structure manufacturing apparatus including an application unit for applying an active energy ray-curable liquid composition onto a substrate. Such a resin structure manufacturing apparatus is used in various applications, such as an electrode manufacturing apparatus.

[0003] Furthermore, in an apparatus for applying a liquid composition onto a substrate, a configuration has been disclosed in which a carriage that moves an application means, such as a recording head, that ejects an ultraviolet-curable liquid composition onto a substrate and an irradiation means for active energy rays such as ultraviolet rays is moved to a predetermined position, and then the illuminance of the ultraviolet rays irradiated from the irradiation means is detected (see, for example, Patent Document 1). Summary of the Invention [Problem to be solved by the invention]

[0004] In order to improve productivity, a resin structure manufacturing apparatus is required to have a configuration in which the application means and the irradiation means are not moved.Furthermore, in the resin structure manufacturing apparatus, fluctuations in the intensity of the active energy rays irradiated onto the liquid composition applied to the substrate will deteriorate the quality of the resin structure formed on the substrate, so it is required to monitor the irradiation state by the irradiation means.

[0005] An object of the present disclosure is to provide a resin structure manufacturing apparatus that is capable of monitoring the irradiation state of the irradiation means in a configuration in which the application means and the irradiation means are not moved. [Means for solving the problem]

[0006] An apparatus for producing a resin structure according to one embodiment of the present disclosure includes: an applying means for applying an active energy ray-curable liquid composition onto a substrate; at least one irradiating means for irradiating the liquid composition applied onto the substrate with active energy rays; and an output means for outputting status information corresponding to an irradiation status by the irradiating means; the applying means and the irradiating means are fixed and do not move, The application unit applies the liquid composition onto the substrate by ejecting the liquid composition from a plurality of nozzles provided across the entire application width of the liquid composition applied to the substrate in a width direction intersecting a transport direction of the substrate, and the output unit is arranged in a region other than an irradiation region where the active energy rays are irradiated from the irradiation unit. and a resin structure is produced by applying the active energy rays to the liquid composition. . [Effects of the Invention]

[0007] According to the present disclosure, it is possible to provide a resin structure manufacturing device that is configured so that the application means and the irradiation means are not moved and that is capable of monitoring the irradiation state by the irradiation means. [Brief explanation of the drawings]

[0008] [Figure 1] 1 is a diagram illustrating an example of the overall configuration of an electrode manufacturing apparatus according to a first embodiment. [Figure 2] FIG. 2 is a plan view illustrating the configuration of an application unit according to the first embodiment. [Figure 3] 3 is a top view showing an example of the arrangement of an irradiation unit and an imaging unit according to the first embodiment. FIG. [Figure 4] 3 is a side view showing an example of the arrangement of an irradiation unit and an imaging unit according to the first embodiment. FIG. [Figure 5] FIG. 4 is a cross-sectional view taken along the VV cutting line in FIG. [Figure 6] FIG. 10 is a diagram showing an example of the arrangement of a plurality of irradiation means. [Figure 7] 7 is a diagram illustrating an example of images of the plurality of irradiation means in FIG. 6 on an imaging unit. [Figure 8] 4 is a diagram illustrating the irradiation intensity of a first irradiation means and a second irradiation means. FIG. [Figure 9]10A and 10B are diagrams illustrating an example of detection of irradiation intensity for each of a plurality of irradiation means. [Figure 10] FIG. 2 is a block diagram illustrating the functional configuration of a control means according to the first embodiment. [Figure 11] 10 is a diagram illustrating an example of the relationship between the current supplied to the irradiation means and the irradiation intensity. FIG. [Figure 12] FIG. 4 is a flowchart of an example of an abnormality detection process performed by a control unit according to the first embodiment. [Figure 13] FIG. 10 is a top view showing an example of the arrangement of an illumination unit and an imaging unit according to a first modified example. [Figure 14] FIG. 10 is a diagram illustrating a set of a plurality of irradiation means according to a second modified example. [Figure 15] FIG. 10 is a diagram illustrating an example of the overall configuration of an electrode manufacturing apparatus according to a second embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0009] DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The following describes in detail the preferred embodiments of the present invention with reference to the accompanying drawings. In the drawings, the same components are designated by the same reference numerals, and redundant explanations will be omitted where appropriate.

[0010] Furthermore, the embodiments described below exemplify a resin structure manufacturing apparatus and an electrode manufacturing apparatus for embodying the technical concepts of the present disclosure, and the present disclosure is not limited to the embodiments described below. The dimensions, materials, shapes, relative positions, etc. of the components described below are intended for illustrative purposes only, unless otherwise specified, and are not intended to limit the scope of the present disclosure. Furthermore, the sizes and positional relationships of components shown in the drawings may be exaggerated for clarity.

[0011] The resin structure manufacturing apparatus according to the embodiment includes at least an application unit for applying an active energy ray-curable liquid composition onto a substrate. First, the liquid composition, polymerizable compound, resin structure, substrate, and the like according to the embodiment will be described in detail.

[0012] <Liquid composition> The liquid composition according to the embodiment contains a polymerizable compound, a solvent, and, if necessary, other components such as a polymerization initiator, etc. When the liquid composition is cured, it forms a resin structure (hereinafter also referred to as a "porous resin") having a porous structure with a resin skeleton.

[0013] In the present disclosure, the liquid composition forms a porous resin, which not only means that a porous resin is formed in the liquid composition, but also means that a precursor of the porous resin (e.g., the skeleton of the porous resin) is formed in the liquid composition, and the porous resin is formed in a subsequent step (e.g., a heating step, etc.) Furthermore, the liquid composition forms a porous resin also means that some components in the liquid composition (e.g., a polymerizable compound) are cured (polymerized) to form the skeleton of the porous resin, but other components in the liquid composition (e.g., a solvent) are not cured to form the porous resin, and so on.

[0014] (polymerizable compound) The polymerizable compound forms a resin by polymerization, and when polymerized in a liquid composition, it forms a porous resin. The resin formed by the polymerizable compound is preferably a resin having a network structure formed by application of active energy rays (e.g., by irradiation with light or application of heat), and examples thereof include acrylate resins, methacrylate resins, urethane acrylate resins, vinyl ester resins, unsaturated polyester resins, epoxy resins, oxetane resins, vinyl ether resins, and resins formed by ene-thiol reactions are preferred. Furthermore, because highly reactive radical polymerization can be used to easily form a structure, acrylate resins, methacrylate resins, and urethane acrylate resins, which are resins formed by polymerizable compounds having a (meth)acryloyl group, and vinyl ester resins, which are resins formed by polymerizable compounds having a vinyl group, are more preferred from the viewpoint of productivity. These may be used alone or in combination of two or more. When two or more types are used in combination, the combination of polymerizable compounds is not particularly limited and can be appropriately selected depending on the purpose. However, for example, to impart flexibility, it is preferable to mix other resins with a urethane acrylate resin as the main component. In the present disclosure, a polymerizable compound having an acryloyl group or a methacryloyl group is referred to as a polymerizable compound having a (meth)acryloyl group.

[0015] The polymerizable compound preferably has at least one radically polymerizable functional group. Examples thereof include monofunctional, difunctional, trifunctional or higher functional radically polymerizable compounds, functional monomers, and radically polymerizable oligomers. Among these, difunctional or higher functional radically polymerizable compounds are preferred.

[0016] Examples of monofunctional radically polymerizable compounds include 2-(2-ethoxyethoxy)ethyl acrylate, methoxypolyethylene glycol monoacrylate, methoxypolyethylene glycol monomethacrylate, phenoxypolyethylene glycol acrylate, 2-acryloyloxyethyl succinate, 2-ethylhexyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, tetrahydrofurfuryl acrylate, 2-ethylhexyl carbitol acrylate, 3-methoxybutyl acrylate, benzyl acrylate, cyclohexyl acrylate, isoamyl acrylate, isobutyl acrylate, methoxytriethylene glycol acrylate, phenoxytetraethylene glycol acrylate, cetyl acrylate, isostearyl acrylate, stearyl acrylate, and styrene monomer. These may be used alone or in combination of two or more.

[0017] Examples of bifunctional radically polymerizable compounds include 1,3-butanediol diacrylate, 1,4-butanediol diacrylate, 1,4-butanediol dimethacrylate, 1,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, diethylene glycol diacrylate, polyethylene glycol diacrylate, neopentyl glycol diacrylate, EO-modified bisphenol A diacrylate, EO-modified bisphenol F diacrylate, neopentyl glycol diacrylate, tricyclodecane dimethanol diacrylate, etc. These may be used alone or in combination of two or more.

[0018] Examples of the trifunctional or higher radical polymerizable compound include trimethylolpropane triacrylate (TMPTA), trimethylolpropane trimethacrylate, EO-modified trimethylolpropane triacrylate, PO-modified trimethylolpropane triacrylate, caprolactone-modified trimethylolpropane triacrylate, HPA-modified trimethylolpropane trimethacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate (PETTA), glycerol triacrylate, ECH-modified glycerol triacrylate, EO-modified glycerol triacrylate, PO-modified glycerol triacrylate, trimethylolpropane ... Examples of such an alkyl acrylate include (acryloxyethyl) isocyanurate, dipentaerythritol hexaacrylate (DPHA), caprolactone-modified dipentaerythritol hexaacrylate, dipentaerythritol hydroxypentaacrylate, alkyl-modified dipentaerythritol pentaacrylate, alkyl-modified dipentaerythritol tetraacrylate, alkyl-modified dipentaerythritol triacrylate, dimethylolpropane tetraacrylate (DTMPTA), pentaerythritol ethoxy tetraacrylate, EO-modified phosphate triacrylate, and 2,2,5,5-tetrahydroxymethylcyclopentanone tetraacrylate. These may be used alone or in combination of two or more.

[0019] The content of the polymerizable compound in the liquid composition is preferably 5.0% by mass to 70.0% by mass, more preferably 10.0% by mass to 50.0% by mass, and even more preferably 20.0% by mass to 40.0% by mass, based on the total amount of the liquid composition. When the content of the polymerizable compound is 70.0% by mass or less, the pore size of the resulting porous resin is not too small, at a few nanometers or less, and the porous resin has an appropriate porosity, which is preferable because it can suppress the tendency for liquid or gas penetration to be difficult. Furthermore, when the content of the polymerizable compound is 5.0% by mass or more, a three-dimensional network structure of the resin is sufficiently formed, resulting in a sufficient porous structure, and the strength of the resulting porous structure also tends to be improved, which is preferable.

[0020] (solvent) The solvent (hereinafter also referred to as "porogen") is a liquid that is compatible with the polymerizable compound. The solvent is also a liquid that becomes incompatible (subjects to phase separation) with the polymerized product (resin) that is produced during the polymerization of the polymerizable compound in the liquid composition. By including a solvent in the liquid composition, the polymerizable compound forms a porous resin when polymerized in the liquid composition, in other words, when sequentially irradiated with a first active energy ray and a second active energy ray in the liquid composition. Furthermore, the solvent is preferably capable of dissolving a compound that generates a radical or an acid by light or heat (a polymerization initiator, described below). The solvent may be used alone or in combination of two or more. The solvent is not polymerizable.

[0021] The boiling point of the porogen alone or in combination with two or more types is preferably 50°C or higher and 250°C or lower, and more preferably 70°C or higher and 200°C or lower, at atmospheric pressure. A boiling point of 50°C or higher suppresses vaporization of the porogen at around room temperature, facilitating handling of the liquid composition and facilitating control of the porogen content in the liquid composition. A boiling point of 250°C or lower shortens the time required for the step of drying the porogen after polymerization, improving the productivity of the porous resin. Furthermore, the amount of porogen remaining inside the porous resin can be reduced, improving the quality when the porous resin is used as a functional layer, such as a substance separation layer that separates substances or a reaction layer that serves as a reaction field. The boiling point of the porogen alone or in combination with two or more types is preferably 120°C or higher at atmospheric pressure.

[0022] Examples of porogens include ethylene glycols such as diethylene glycol monomethyl ether, ethylene glycol monobutyl ether, ethylene glycol monoisopropyl ether, and dipropylene glycol monomethyl ether; esters such as γ-butyrolactone and propylene carbonate; and amides such as NN-dimethylacetamide. Other examples include liquids with relatively high molecular weights such as methyl tetradecanoate, methyl decanoate, methyl myristate, and tetradecane. Other examples include liquids such as acetone, 2-ethylhexanol, and 1-bromonaphthalene.

[0023] It should be noted that not all of the liquids exemplified above qualify as porogens. As described above, a porogen is a liquid that is compatible with a polymerizable compound and that becomes incompatible with (subjects to phase separation from) the polymerized product (resin) produced in the course of polymerization of the polymerizable compound in the liquid composition. In other words, whether a liquid is a porogen or not is determined by its relationship with the polymerizable compound and the polymerized product (resin formed by polymerization of the polymerizable compound).

[0024] Furthermore, since the liquid composition only needs to contain at least one type of porogen having the above-described specific relationship with the polymerizable compound, the range of material choices when preparing the liquid composition is broadened, making it easier to design the liquid composition. The broader range of material choices when preparing the liquid composition broadens the scope of application when there are properties required of the liquid composition from viewpoints other than the formation of a porous structure. For example, when a liquid composition is discharged by an inkjet method, the liquid composition is required to have discharge stability and the like from viewpoints other than the formation of a porous structure, and the broader range of material choices makes it easier to design the liquid composition.

[0025] As described above, the liquid composition is required to contain at least one porogen having the above-mentioned specific relationship with the polymerizable compound, and may additionally contain a liquid (liquid that is not a porogen) that does not have the above-mentioned specific relationship with the polymerizable compound. However, the content of the liquid (liquid that is not a porogen) that does not have the above-mentioned specific relationship with the polymerizable compound is preferably 10.0 mass % or less, more preferably 5.0 mass % or less, and even more preferably 1.0 mass % or less, based on the total amount of the liquid composition, and particularly preferably none is contained.

[0026] The porogen content in the liquid composition is preferably 30.0% by mass or more and 95.0% by mass or less, more preferably 50.0% by mass or more and 90.0% by mass or less, and even more preferably 60.0% by mass or more and 80.0% by mass or less, based on the total amount of the liquid composition. A porogen content of 30.0% by mass or more is preferred because the pore size of the resulting porous body is not too small, such as a few nanometers or less, and the porous body has an appropriate porosity, which prevents the tendency for liquid or gas penetration to become difficult. Furthermore, a porogen content of 95.0% by mass or less is preferred because a three-dimensional network structure of the resin is sufficiently formed, resulting in a sufficient porous structure, and the strength of the resulting porous structure also tends to be improved.

[0027] The mass ratio of the polymerizable compound content to the porogen content in the liquid composition (polymerizable compound:porogen) is preferably 1.0:0.4 to 1.0:19.0, more preferably 1.0:1.0 to 1.0:9.0, and even more preferably 1.0:1.5 to 1.0:4.0.

[0028] ((Polymerization-induced phase separation)) Porous resins are formed by polymerization-induced phase separation. Polymerization-induced phase separation refers to a state in which the polymerizable compound and porogen are compatible, but the polymer (resin) that is produced during the polymerization process of the polymerizable compound is incompatible with the porogen (phase separation occurs). While there are other methods for obtaining porous resins through phase separation, polymerization-induced phase separation can be used to form a porous body with a network structure, which is expected to be highly resistant to chemicals and heat. Compared to other methods, this method also has the advantage of shorter process time and easier surface modification.

[0029] Next, a process for forming a porous resin using polymerization-induced phase separation will be described. A polymerizable compound undergoes a polymerization reaction upon irradiation with light or the like to form a resin. During this process, the solubility of the porogen in the growing resin decreases, causing phase separation between the resin and the porogen. Ultimately, the resin forms a porous structure in which the porogen or the like fills the pores. When this is dried, the porogen or the like is removed, leaving behind a porous resin. Therefore, in order to form a porous resin with an appropriate porosity, the compatibility between the porogen and the polymerizable compound, and the compatibility between the porogen and the resin formed by polymerization of the polymerizable compound, are considered.

[0030] The compatibility between the porogen and the polymerizable compound is determined as follows. First, the liquid composition is poured into a quartz cell, and while stirring at 300 rpm using a stirrer, the transmittance of light (visible light) at a wavelength of 550 nm through the liquid composition is measured. In the present disclosure, a light transmittance of 30% or more is considered to indicate that the polymerizable compound and the porogen are in a compatible state, and a light transmittance of less than 30% is considered to indicate that the polymerizable compound and the porogen are incompatible. The conditions for measuring the light transmittance are as follows: Quartz cell: Special microcell with screw cap (product name: M25-UV-2) ·Transmittance measurement device: Ocean Optics USB4000 Stirring speed: 300 rpm ·Measurement wavelength: 550nm Reference: Obtained by measuring the transmittance of light at a wavelength of 550 nm when the quartz cell is filled with air (transmittance: 100%)

[0031] The compatibility between the porogen and the resin formed by polymerization of the polymerizable compound is judged as follows.

[0032] First, resin particles are uniformly dispersed on a non-alkali glass substrate by spin coating to form a gap agent. Next, the substrate coated with the gap agent is bonded to another non-alkali glass substrate not coated with the gap agent, with the surfaces coated with the gap agent sandwiched between them. Next, a liquid composition is filled between the bonded substrates using capillary action to create a "pre-UV haze measurement element." Next, the pre-UV haze measurement element is irradiated with UV light to harden the liquid composition. Finally, the periphery of the substrate is sealed with a sealant to create a "haze measurement element." The fabrication conditions are shown below.

[0033] Alkali-free glass substrate: Nippon Electric Glass, 40 mm, t=0.7 mm, OA-10G Gap agent: Sekisui Chemical Co., Ltd., resin microparticle Micropearl GS-L100, average particle size 100 μm Spin coating conditions: Dispersion volume 150 μL, rotation speed 1000 rpm, rotation time 30 s Filled liquid composition volume: 160 μL ·UV irradiation conditions: UV-LED used as light source, light source wavelength 365nm, irradiation intensity 30mW / cm2, irradiation time 20s Sealant: TB3035B (Three Bond) Next, the haze value (cloudiness) is measured using the fabricated pre-UV haze measurement element and haze measurement element. The measured value of the pre-UV haze measurement element is used as a reference (haze value 0), and the increase rate of the measured value (haze value) of the haze measurement element relative to the measured value of the pre-UV haze measurement element is calculated. The haze value of the haze measurement element increases as the compatibility between the resin formed by polymerization of the polymerizable compound and the porogen decreases, and decreases as the compatibility increases. Furthermore, a higher haze value indicates that the resin formed by polymerization of the polymerizable compound is more likely to form a porous structure. In the present disclosure, an increase rate of the haze value of 1.0% or more indicates that the resin and the porogen are incompatible, and an increase rate of less than 1.0% indicates that the resin and the porogen are compatible. The apparatus used for the measurement is shown below. Haze measuring device: Haze meter NDH5000 manufactured by Nippon Denshoku Industries Co., Ltd.

[0034] (Polymerization initiator) A polymerization initiator is a material that can generate active species such as radicals or cations by energy such as light or heat, thereby initiating polymerization of a polymerizable compound. As the polymerization initiator, known radical polymerization initiators, cationic polymerization initiators, base generators, etc. can be used alone or in combination of two or more, and among these, it is preferable to use a photoradical polymerization initiator.

[0035] As the photoradical polymerization initiator, a photoradical generator can be used. For example, photoradical polymerization initiators such as Michler's ketone and benzophenone, known under the trade names Irgacure and Darocure, and more specific compounds include benzophenone and acetophenone derivatives, such as α-hydroxy- or α-aminocetophenone, 4-aroyl-1,3-dioxolane, benzil ketal, 2,2-diethoxyacetophenone, p-dimethylaminoacetophenone, p-dimethylaminopropiophenone, benzophenone, 2-chlorobenzophenone, and pp'-dichlorobenzophenone. Phen, pp'-bisdiethylaminobenzophenone, Michler's ketone, benzil, benzoin, benzil dimethyl ketal, tetramethylthiuram monosulfide, thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, azobisisobutyronitrile, benzoin peroxide, di-tert-butyl peroxide, 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenyl-1-one, 1-(4-isopropylphenyl)-2-hydroxy -2-Methylpropan-1-one, methyl benzoyl formate, benzoin isopropyl ether, benzoin methyl ether, benzoin ethyl ether, benzoin ether, benzoin isobutyl ether, benzoin n-butyl ether, benzoin n-propyl, 1-hydroxy-cyclohexyl-phenyl-ketone, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone-1, 1-hydroxy-cyclohexyl-phenyl-ketone, 2,2-dimethoxy-1 ,2-Diphenylethan-1-one, bis(η5-2,4-cyclopentadien-1-yl)-bis(2,6-difluoro-3-(1H-pyrrol-1-yl)-phenyl)titanium, bis(2,4,6-trimethylbenzoyl)-phenylphosphine oxide, 2-methyl-1[4-(methylthio)phenyl]-2-morpholinopropan-1-one, 2-hydroxy-2-methyl-1-phenyl-propan-1-one (Darocur 1173), bis(2,6-dimethoxybenzoyl)-2,4,4-trimethyl-pentylphosphine oxide, 1-[4-(2-hydroxyethoxy)-phenyl]-2-hydroxy-2-methyl-1-propan-1-one monoacylphosphine oxide, bisacylphosphine oxide or titanocene, fluorescein, anthraquinone, thioxanthone or xanthone, lophine dimer, trihalomethyl compounds or dihalomethyl compounds, active ester compounds, organic boron compounds, and the like are preferably used.

[0036] Furthermore, a photocrosslinkable radical generator such as a bisazide compound may be simultaneously contained. When polymerization is carried out by heat alone, a thermal polymerization initiator such as azobisisobutyronitrile (AIBN), which is a common radical generator, can be used.

[0037] In order to obtain a sufficient curing rate, the content of the polymerization initiator is preferably 0.05% by mass or more and 10.0% by mass or less, and more preferably 0.5% by mass or more and 5.0% by mass or less, when the total mass of the polymerizable compounds is taken as 100.0% by mass.

[0038] (others) The liquid composition of the present disclosure may be a non-dispersion composition that does not contain a dispersion in the liquid composition, or a dispersion composition that contains a dispersion in the liquid composition, but is preferably a non-dispersion composition. This is because the liquid composition being a non-dispersion composition can be used in various application means. For example, it is preferred because it can be stably used in an inkjet method in which maintaining ejection stability is important.

[0039] <Method of producing liquid composition> The liquid composition is preferably prepared through a process of dissolving a polymerization initiator in a polymerizable compound, a process of further dissolving a porogen and other components, and a process of stirring to obtain a uniform solution.

[0040] <Physical properties of liquid composition> From the viewpoint of workability when applying the liquid composition, the viscosity of the liquid composition at 25°C is preferably from 1.0 mPa·s to 150.0 mPa·s, more preferably from 1.0 mPa·s to 30.0 mPa·s, and particularly preferably from 1.0 mPa·s to 25.0 mPa·s. When the viscosity of the liquid composition is from 1.0 mPa·s to 30.0 mPa·s, good ejection properties can be obtained even when the liquid composition is applied to an inkjet system. Here, the viscosity can be measured using, for example, a viscometer (device name: RE-550L, manufactured by Toki Sangyo Co., Ltd.).

[0041] <Base material> Next, the substrate according to the embodiment will be described.

[0042] Any material can be used as the substrate, regardless of whether it is transparent or opaque. Transparent substrates include glass substrates, resin film substrates such as various plastic films, and composite substrates thereof. Opaque substrates include silicon substrates, metal substrates such as stainless steel, and laminates of these. The substrate may be a recording medium such as plain paper, glossy paper, special paper, or cloth. The recording medium may also be a low-permeability substrate (low-absorbency substrate). A low-permeability substrate refers to a substrate having a surface with low water permeability, absorbency, or adsorption, and includes materials that have numerous internal cavities but are not open to the outside. Examples of low-permeability substrates include coated paper used in commercial printing and recording media such as paperboard coated with recycled paper pulp in the middle and back layers. The substrate may also be a porous resin sheet used as an insulating layer for an energy storage element or a power generation element.

[0043] Furthermore, with regard to the shape, any substrate may be used, regardless of whether it has a curved surface or an uneven shape, as long as it is applicable to the printing process section, the polymerization process section, and the polymerization process section.

[0044] <Resin structure> Next, the resin structure according to the embodiment will be described.

[0045] The film thickness of the resin structure (porous resin) having a porous structure with a resin skeleton formed from the liquid composition is not particularly limited. However, taking into consideration the uniformity of curing during polymerization, it is preferably 0.01 μm to 500 μm, more preferably 0.01 μm to 100 μm, even more preferably 1 μm to 50 μm, and particularly preferably 10 μm to 20 μm. A film thickness of 0.01 μm or more increases the surface area of ​​the resulting porous resin, allowing the functions of the porous resin to be fully achieved. Furthermore, a film thickness of 500 μm or less reduces unevenness in the light and heat used during polymerization in the film thickness direction, allowing a porous resin that is uniform in the film thickness direction to be obtained. By producing a porous resin that is uniform in the film thickness direction, structural unevenness of the porous resin can be reduced, and a decrease in liquid and gas permeability can be suppressed. The film thickness of the porous resin is appropriately adjusted depending on the application to which the porous resin is to be used. For example, when the porous resin is used as an insulating layer for an energy storage device, it is preferably 10 μm to 20 μm.

[0046] The porous resin formed is not particularly limited, but from the viewpoint of ensuring good permeability of liquids and gases, it preferably has a three-dimensional branched network structure of the cured resin as a skeleton and a co-continuous structure (also called a monolith structure) in which multiple pores in the porous resin are continuously connected. That is, it is preferable that the porous resin has a large number of pores, and each pore is connected to the other pores around it, spreading three-dimensionally. The interconnected pores allow sufficient penetration of liquids and gases, enabling efficient performance of functions such as substance separation and reaction field.

[0047] One of the physical properties obtained by having a bicontinuous structure is air permeability. The air permeability of the porous resin is measured, for example, in accordance with JIS P8117, and is preferably 500 seconds / 100 mL or less, and more preferably 300 seconds / 100 mL or less. In this case, the air permeability is measured, for example, using a Gurley densometer (manufactured by Toyo Seiki Seisakusho).

[0048] The cross-sectional shape of the pores in the porous resin formed may be various shapes and sizes, such as substantially circular, substantially elliptical, or substantially polygonal. Here, the pore size refers to the length of the longest portion in the cross-sectional shape. The pore size can be determined from a cross-sectional photograph taken with a scanning electron microscope (SEM). The size of the pores in the porous resin is not particularly limited, but is preferably 0.01 μm or more and 10 μm or less from the viewpoint of liquid and gas permeability. Furthermore, the porosity of the porous resin is preferably 30% or more, more preferably 50% or more. Methods for adjusting the pore size and porosity of the porous resin within these ranges are not particularly limited, but examples include a method of adjusting the content of the polymerizable compound in the liquid composition to fall within the above range, a method of adjusting the content of the porogen in the liquid composition to fall within the above range, and a method of adjusting the irradiation conditions of active energy rays.

[0049] (Applications of resin structures) ((For use as an energy storage element or power generation element)) The resin structure (porous resin) having a porous structure with a resin skeleton formed using the liquid composition can be used, for example, as an insulating layer for an electricity storage element or a power generation element. When used for these purposes, it is preferable to form the insulating layer (separator) by applying the liquid composition onto an active material layer previously formed on an electrode substrate.

[0050] As an insulating layer for an electric storage element or a power generating element, for example, a film-like porous insulating layer having pores of a predetermined size or porosity is known to be used. On the other hand, when the above-mentioned liquid composition is used, the pores and porosity can be appropriately changed by appropriately adjusting the content of the polymerizable compound, the content of the porogen, the irradiation conditions of the active energy rays, etc., thereby improving the design freedom in terms of the performance of the electric storage element and the power generating element. Furthermore, since the above-mentioned liquid composition can be applied by a variety of methods, it can be applied by, for example, an inkjet method, improving the design freedom in terms of the shape of the electric storage element and the power generating element.

[0051] The insulating layer is a member that separates the positive electrode from the negative electrode and ensures ionic conductivity between the positive electrode and the negative electrode. In addition, the insulating layer in the present disclosure is not limited to a layered shape.

[0052] Furthermore, the liquid composition can be applied onto an insulating layer (first insulating layer) for an electricity storage element or a power generation element to form an additional insulating layer (second insulating layer) made of a porous resin layer. By forming the second insulating layer on the first insulating layer, various functions of the insulating layer as a whole, such as heat resistance, impact resistance, and high-temperature shrinkage resistance, can be added or improved.

[0053] The electrode substrate can be any conductive substrate. Examples include aluminum foil, copper foil, stainless steel foil, titanium foil, and etched foils with fine holes, which are typically suitable for use in energy storage devices such as secondary batteries and capacitors, especially lithium-ion secondary batteries. These include perforated electrode substrates used in lithium-ion capacitors. Other examples include nonwoven or woven flat carbon paper fibrous electrodes used in power generation devices such as fuel cells, as well as perforated electrode substrates with fine holes. Furthermore, in the case of solar devices, in addition to the electrodes listed above, flat substrates such as glass or plastics can be used with a transparent semiconductor thin film, such as indium-titanium oxide or zinc oxide, or a thin, vapor-deposited conductive electrode film.

[0054] The active material layer is formed by dispersing a powdered active material or catalyst composition in a liquid, applying the liquid to the electrode substrate, fixing the liquid, and drying the liquid. Usually, printing using a spray, dispenser, die coater, or lift-up coating is used, and the active material layer is formed by applying the liquid and then drying it.

[0055] The positive electrode active material is not particularly limited as long as it can reversibly absorb and release alkali metal ions. Typically, an alkali metal-containing transition metal compound can be used as the positive electrode active material. For example, lithium-containing transition metal compounds include composite oxides containing lithium and at least one element selected from the group consisting of cobalt, manganese, nickel, chromium, iron, and vanadium. Examples include lithium-containing transition metal oxides such as lithium cobaltate, lithium nickelate, and lithium manganate; olivine-type lithium salts such as LiFePO4; chalcogen compounds such as titanium disulfide and molybdenum disulfide; and manganese dioxide. The lithium-containing transition metal oxide is a metal oxide containing lithium and a transition metal, or a metal oxide in which a portion of the transition metal in the metal oxide is replaced with a different element. Examples of the different element include Na, Mg, Sc, Y, Mn, Fe, Co, Ni, Cu, Zn, Al, Cr, Pb, Sb, and B, with Mn, Al, Co, Ni, and Mg being preferred. The different elements may be one kind or two or more kinds. These positive electrode active materials can be used alone or in combination of two or more kinds. Examples of the active material in nickel-metal hydride batteries include nickel hydroxide.

[0056] The negative electrode active material is not particularly limited as long as it is a material that can reversibly absorb and release alkali metal ions. Typically, a carbon material containing graphite having a graphite-type crystal structure can be used as the negative electrode active material. Examples of such carbon materials include natural graphite, spherical or fibrous artificial graphite, non-graphitizable carbon (hard carbon), and easily graphitizable carbon (soft carbon). Examples of materials other than carbon materials include lithium titanate. Furthermore, from the viewpoint of increasing the energy density of lithium-ion batteries, high-capacity materials such as silicon, tin, silicon alloys, tin alloys, silicon oxide, silicon nitride, and tin oxide can also be suitably used as the negative electrode active material.

[0057] An electrode manufacturing apparatus will be described below as an example of an apparatus for manufacturing a resin structure.

[0058] [First embodiment] <Overall configuration of electrode manufacturing apparatus 100> Fig. 1 is a diagram illustrating the overall configuration of an electrode manufacturing apparatus 100 according to the first embodiment. Fig. 1 shows the electrode manufacturing apparatus 100 as seen through from the side.

[0059] The electrode manufacturing apparatus 100 forms a functional layer disposed between positive and negative electrodes in, for example, battery manufacturing. The electrode manufacturing apparatus 100 is a so-called roll-to-roll type apparatus that continuously applies an ultraviolet-curable liquid composition onto a substrate that has been unwound from a roll, forms a resin structure from the liquid composition on the substrate, and then rewinds the substrate.

[0060] In this embodiment, an ultraviolet-curable liquid composition Q is exemplified as an example of an active energy ray-curable liquid composition, but the present invention is not limited to this, and the liquid composition Q may be a heat-ray-curable or electron-beam-curable liquid composition, etc.

[0061] As shown in FIG. 1, the electrode manufacturing apparatus 100 includes an unwinding roll 1, application means 3, a plurality of irradiation means 4, heating means 5, inspection means 6, winding roll 7, and control means 8.

[0062] In the electrode manufacturing apparatus 100, a liquid composition Q is applied to a substrate 2, which is unwound from a winding roll 1 and conveyed along a conveying direction 20, by an application means 3 to a predetermined thickness. In the electrode manufacturing apparatus 100, the liquid composition Q applied to the substrate 2 is irradiated with ultraviolet light from a plurality of irradiation means 4 to harden the liquid composition Q, and then heated and dried by a heating means 5 to fix the liquid composition Q on the substrate 2, thereby forming a resin structure. In the electrode manufacturing apparatus 100, the resin structure fixed on the substrate 2 is inspected by an inspection means 6, and then taken up by a take-up roll 7. After the resin structure has been formed, the substrate 2 taken up by the take-up roll 7 is sent to the next process or shipped as a finished product.

[0063] The application means 3 includes discharge sections 3a, 3b, 3c, and 3d that discharge liquid composition Q. Each of the discharge sections 3a, 3b, 3c, and 3d has a plurality of nozzles arranged along a width direction 21 that is substantially perpendicular to the transport direction 20, and discharges liquid composition Q from the plurality of nozzles. The application means 3 applies liquid composition Q discharged from the discharge sections 3a, 3b, 3c, and 3d onto the substrate 2.

[0064] The application means 3 applies, for example, the liquid composition Q to form a resin structure on the positive electrode substrate or the negative electrode substrate. Such a resin structure is, for example, a separator layer provided between a positive electrode and a negative electrode. When forming a separator layer, the thickness of the liquid composition Q applied to the substrate 2 by the application means 3 is in the range of 10 μm to 50 μm.

[0065] The application method by the application means 3 can be a die coater method, a wire bar method, a doctor blade method, a printing method, etc., and the printing method can be an offset printing method, a Carlson process method, an inkjet method, etc. In this embodiment, particularly, the liquid composition Q is applied onto the substrate 2 by ejecting the liquid composition Q by an inkjet method.

[0066] The plurality of irradiation means 4 are arranged side by side along the conveyance direction 20 and the width direction 21 so as to face the substrate 2 being conveyed, and each of the plurality of irradiation means 4 irradiates ultraviolet light onto the substrate 2. Note that, although the present embodiment illustrates an example of a plurality of irradiation means 4, at least one irradiation means 4 is sufficient.

[0067] The multiple heating means 5 evaporate the liquid components remaining inside the liquid composition Q applied onto the substrate 2. In particular, when the liquid composition Q is applied by the inkjet method, it is preferable to add a liquid such as a solvent to the liquid composition Q in addition to the UV-curable resin in order to adjust the viscosity to an appropriate level. The multiple heating means 5 can volatilize such liquids.

[0068] Heating methods using the heating means 5 include passing the substrate through a high-temperature drying oven, blowing hot air, irradiating infrared rays, wrapping the substrate 2 around a high-temperature rotating drum or the like, or a high-frequency induction method.

[0069] Inspection means 6 inspects the quality of the resin structure made of liquid composition Q formed on substrate 2. Inspection means 6 includes a high-speed camera, inspects the resin structure for defects such as uneven thickness and the presence or absence of pinholes, and stores the inspection results including information on the position of the defects on substrate 2.

[0070] The control means 8 is, for example, a computer that controls the operation of the electrode manufacturing apparatus 100. There are no particular restrictions on the location of the control means 8, and it can be placed in any location.

[0071] <Configuration example of granting means 3> Fig. 2 is a diagram illustrating an example of the configuration of the applying means 3. Fig. 2 shows the applying means 3 as viewed from the side from which the liquid composition Q is ejected. The substrate 2 is transported along the transport direction 20 while facing the ejection portions 3a, 3b, 3c, and 3d included in the applying means 3.

[0072] Discharge units 3a, 3b, 3c, and 3d constitute a line-type discharge unit. Here, the line-type discharge unit refers to a unit in which a plurality of nozzles are provided across the entire application width 30 over which liquid composition Q is applied onto substrate 2 in width direction 21.

[0073] 2, each of the ejection units 3a, 3b, 3c, and 3d has four heads 31 arranged along the width direction 21. The four heads 31 have a plurality of nozzles 32 arranged along the width direction 21.

[0074] The discharge units 3a, 3b, 3c, and 3d discharge the liquid composition Q from a plurality of nozzles 32 provided across the entire application width 30 for applying the liquid composition Q onto the substrate 2 in the width direction 21, thereby applying the liquid composition Q onto the substrate 2. Therefore, the application means 3 can apply the liquid composition Q across the entire application width 30 on the substrate 2 without moving. Note that while FIG. 2 illustrates a configuration in which one discharge unit has four heads 31, there is no particular limit to the number of heads that one discharge unit has, and the number can be changed as appropriate depending on the length of the application width 30 in the width direction 21.

[0075] For the four heads 31, means for applying a stimulus to the liquid composition Q to eject the liquid composition Q can be appropriately selected depending on the purpose, and for example, a pressure device, a piezoelectric element, a vibration generator, an ultrasonic oscillator, a light, etc. Specific examples include a piezoelectric actuator such as a piezoelectric element, a shape memory alloy actuator that uses a metal phase change due to a temperature change, and an electrostatic actuator that uses electrostatic force.

[0076] Of these, it is particularly preferable to use a head that applies voltage to a piezoelectric element attached to a position called a pressure chamber (also called a liquid chamber, etc.) inside the ink flow path inside the four heads 31. When a voltage is applied to these four heads 31, the piezoelectric element bends, and the volume of the pressure chamber shrinks, pressurizing the ink inside the pressure chamber and ejecting the ink as droplets from the nozzles.

[0077] Each of the ejection sections 3a, 3b, 3c, and 3d includes an ejection unit. The ejection unit is a collection of functional parts and mechanisms related to the ejection of the liquid composition Q from the ejection sections 3a, 3b, 3c, and 3d. The ejection unit includes at least one of a supply mechanism, a maintenance and recovery mechanism, and a liquid ejection head movement mechanism, which are combined with each of the ejection sections 3a, 3b, 3c, and 3d.

[0078] <Example of arrangement of multiple irradiation means 4 and imaging unit 9> 3 and 4 are diagrams illustrating the arrangement of a plurality of irradiation means 4 and imaging unit 9 of the electrode manufacturing apparatus 100. Fig. 3 is a top view, and Fig. 4 is a side view. Fig. 4 shows the electrode manufacturing apparatus 100 as seen through from the side.

[0079] 3 and 4, the multiple irradiation means 4 include multiple first irradiation means 4a arranged along the conveyance direction 20 and the width direction 21, and three second irradiation means 4b arranged along the width direction 21. The first irradiation means 4a and the second irradiation means 4b are light sources that irradiate the substrate 2 with ultraviolet light having a wavelength of, for example, 200 nm or more and 380 nm or less.

[0080] The plurality of first irradiation means 4a and three second irradiation means 4b are provided across the entire application width 30 in the width direction 21 over which the liquid composition Q is applied onto the substrate 2, and irradiate the liquid composition Q on the substrate 2 with ultraviolet light across the entire application width 30. Therefore, the plurality of irradiation means 4 can irradiate the liquid composition Q on the substrate 2 with ultraviolet light without moving. The number of each of the first irradiation means 4a and second irradiation means 4b can be determined as desired depending on the width of the substrate 2 in the width direction 21, the conveyance speed of the substrate 2, etc.

[0081] The first irradiation means 4a irradiates the liquid composition Q applied onto the substrate 2 by the application means 3 with ultraviolet light of a first irradiation intensity. A first irradiation region length 401 represents the length along the transport direction 20 along which ultraviolet light is applied by the first irradiation means 4a. The arrangement of the multiple first irradiation means 4a is determined so that ultraviolet light of a substantially uniform irradiation intensity is irradiated onto the substrate 2 within the first irradiation region length 401.

[0082] The second irradiation means 4b is provided downstream of the first irradiation means 4a in the conveying direction 20, and irradiates the liquid composition Q that has been irradiated with ultraviolet light by the first irradiation means 4a with ultraviolet light at a second irradiation intensity that is higher than the first irradiation intensity. A second irradiation region length 402 represents the length along the conveying direction 20 over which ultraviolet light is irradiated by the second irradiation means 4b. The three second irradiation means 4b are arranged so that ultraviolet light of a substantially uniform irradiation intensity is irradiated onto the substrate 2 within the second irradiation region length 402.

[0083] The curing time of the polymerizable compound contained in liquid composition Q is determined by the product of the irradiation intensity and irradiation time of the ultraviolet light. Therefore, by irradiating the liquid composition Q with ultraviolet light at a second irradiation intensity higher than the first irradiation intensity irradiated by the first irradiation means 4a, the second irradiation means 4b can cure the liquid composition Q to a state similar to that of the first irradiation means 4a in a short time. The number of second irradiation means 4b is smaller than the number of first irradiation means 4a, and the second irradiation region length 402 is shorter than the first irradiation region length 401.

[0084] For example, the first irradiation region length 401 in the transport direction 20 is 3.0 [m], and the second irradiation region length 402 is 0.2 [m]. By shortening the second irradiation region length 402, it is possible to reduce the size of the electrode manufacturing apparatus 100. However, the irradiation intensity of the second irradiation means 4b may be lower than the irradiation intensity of the first irradiation means 4a.

[0085] The electrode manufacturing apparatus 100 also has an N2 purge box 41 so as to cover the substrate 2 in an irradiation region 400 where ultraviolet light is irradiated by the first irradiation means 4a and the second irradiation means 4b.

[0086] The N2 purge box 41 is a box-shaped member that covers the base material 2 so that the base material 2 can pass through. The inside of the N2 purge box 41 is filled with nitrogen gas, and the oxygen concentration is low. The electrode manufacturing apparatus 100 transports the base material 2 in the irradiation region 400 so that the base material 2 passes through the N2 purge box 41.

[0087] When the polymerizable compound of the liquid composition Q is cured by ultraviolet light, the curing is inhibited if oxygen is present around the liquid composition Q. The electrode manufacturing apparatus 100 irradiates the liquid composition Q on the substrate 2 with ultraviolet light while passing it through the N2 purge box 41, thereby suppressing inhibition of the curing of the liquid composition Q by oxygen and promoting the curing of the liquid composition Q.

[0088] The N2 purge box 41 includes an ultraviolet-transmitting glass 410 on its upper surface on the side of the multiple irradiation means 4. The ultraviolet-transmitting glass 410 is a plate-like member that transmits light in the ultraviolet wavelength range and reflects or absorbs light in wavelength ranges other than ultraviolet. For example, the ultraviolet-transmitting glass 410 is a glass plate on which an optical thin film having wavelength selectivity that transmits light in the ultraviolet wavelength range is formed.

[0089] As shown in FIG. 4, the electrode manufacturing apparatus 100 also has a shielding means 42 that shields the ultraviolet rays emitted from the electrode manufacturing apparatus 100 to the outside, out of the ultraviolet rays irradiated by the plurality of irradiation means 4.

[0090] The shielding means 42 is a box-shaped member that is translucent to visible light, and has an optical thin film formed on each surface that reflects or absorbs ultraviolet light irradiated by the plurality of irradiation means 4. The shielding means 42 houses the plurality of irradiation means 4 inside, thereby blocking ultraviolet light emitted from the electrode manufacturing apparatus 100 to the outside.

[0091] The imaging unit 9 has pixels equal to or greater than the number of the plurality of irradiation means 4, and detects ultraviolet rays to capture images of the plurality of irradiation means 4. The imaging unit 9 is an example of an output means that outputs status information corresponding to the irradiation status of the plurality of irradiation means 4. The imaging unit 9 outputs captured images of the plurality of irradiation means 4 as status information corresponding to the irradiation status of the irradiation means 4. Note that the output means may further include components other than the imaging unit 9, such as an image processing unit that processes the captured images output by the imaging unit 9.

[0092] The imaging unit 9 is arranged in an area other than the irradiation area 400 where ultraviolet light is irradiated from the multiple irradiation means 4. The imaging unit 9 is also arranged in an area other than the transport area 500 where the substrate 2 is transported. The irradiation area 400 has approximately the same area as the area where the multiple irradiation means 4 are arranged, so in FIG. 3, the reference numerals for the irradiation area 400 are written alongside the reference numerals for the multiple irradiation means 4. The transport area 500 has approximately the same area as the area occupied by the substrate 2, so in FIG. 3, the reference numeral for the substrate 2 is written alongside the reference numeral for the transport area 500.

[0093] In this embodiment, the imaging unit 9 includes first imaging units 9a and 9b arranged on the upstream side in the conveying direction 20, and second imaging units 9c and 9d arranged on the downstream side in the conveying direction 20.

[0094] The first imaging units 9a and 9b have pixels equal to or greater than the number of first irradiation means 4a, and detect ultraviolet light focused by focusing means 91 to capture an image of the first irradiation means 4a. The second imaging units 9c and 9d have pixels equal to or greater than the number of second irradiation means 4b, and detect ultraviolet light focused by focusing means 91 to capture an image of the second irradiation means 4b. However, there are no particular limitations on the number and arrangement of the imaging units 9, and they can be selected appropriately depending on the area of ​​the irradiation region 400, etc.

[0095] 4, the imaging unit 9 is arranged in a region not included in the ultraviolet transmitting glass 410 when viewed from above. However, from the viewpoint of reducing light in wavelength regions other than ultraviolet light, such as visible light, it is preferable that the imaging unit 9 is arranged in a region included in the ultraviolet transmitting glass 410 when viewed from above and captures an image of the irradiation means 4 through the ultraviolet transmitting glass 410.

[0096] <Example of the configuration around the imaging unit 9> FIG. 5 is a diagram illustrating an example of the configuration around the imaging unit 9, and is a cross-sectional view taken along the line VV in FIG.

[0097] 5, a focusing means 91 and an ultraviolet transmission filter 92 are provided between the imaging unit 9 and the irradiation means 4. The focusing means 91, the ultraviolet transmission filter 92, and the imaging unit 9 are housed inside a housing 90.

[0098] The focusing means 91 is, for example, a lens, and focuses the ultraviolet light irradiated from the irradiation means 4. The focusing means 91 focuses the ultraviolet light irradiated from the irradiation means 4, and can approximately form an image of the irradiation means 4 on the imaging surface of the imaging unit 9. It is preferable to use a focusing means 91 that has optimized optical properties for light in the ultraviolet wavelength range. Furthermore, it is preferable that the focusing means 91 is a wide-angle lens so that a single imaging unit 9 can image a large number of irradiation means 4 arranged over a wide area.

[0099] Note that the above-mentioned approximate imaging does not require only the best focus state, but also means that out-of-focus states due to aberrations of the focusing means 91 and out-of-focus states due to the position of the imaging surface of the imaging unit 9 shifting from the best focus position in the optical axis direction of the focusing means 91 are also acceptable.

[0100] The ultraviolet transmission filter 92 is an optical filter that transmits light in the ultraviolet wavelength range irradiated by the irradiation means 4 and reflects or absorbs light in wavelength ranges other than ultraviolet. For example, U340 manufactured by HOYA Corporation can be used as the ultraviolet transmission filter 92. An infrared cut filter may be further provided between the imaging unit 9 and the irradiation means 4.

[0101] The imaging unit 9 captures an image of the irradiation unit 4 focused by the focusing unit 91. The image of the irradiation unit 4 is, for example, an image of the light emitting surface of a light source that emits ultraviolet light. The imaging unit 9 can use an imaging element such as a CCD (Charge Coupled Device) or a CMOS (Complementary Metal Oxide Semiconductor). The imaging unit 9 preferably has photosensitivity to light in the ultraviolet wavelength range irradiated by the irradiation unit 4. However, the imaging unit 9 may also have photosensitivity to light in the visible wavelength range.

[0102] <Image capture example by imaging unit 9> An example of imaging by the imaging unit 9 will be described with reference to Fig. 6 and Fig. 7. Fig. 6 is a diagram showing an example of the arrangement of a plurality of irradiation means 4. Fig. 7 is a diagram showing an example of images of the plurality of irradiation means 4 in Fig. 6 on the imaging surface of the imaging unit 9.

[0103] 6 shows a total of 15 first irradiation means 4a, of the multiple first irradiation means 4a, five of which are arranged along the conveyance direction 20 and three of which are arranged along the width direction 21. The multiple first irradiation means 4a include first irradiation means 4a11 to first irradiation means 4a35.

[0104] 6, ultraviolet rays emitted from the 15 first irradiation means 4a are focused by the focusing means 91, pass through the ultraviolet transmission filter 92, and then form an approximate image on the imaging surface of the imaging unit 9. As a result, as shown in FIG. 7, 15 first irradiation means images 4a' are obtained on the imaging surface of the imaging unit 9 corresponding to the 15 first irradiation means 4a.

[0105] In Fig. 7, first irradiation means images 4a11' to 4a35' indicate 15 first irradiation means images 4a'. Note that Fig. 7 shows the imaging surface of the imaging unit 9, but because the first irradiation means images 4a11' to 4a35' on the imaging surface are captured by the imaging unit 9, Fig. 7 can also be referred to as an image 93 captured by the imaging unit 9. For this reason, Fig. 7 also lists the reference numerals for the second imaging unit 9d and the captured image 93. Also, Fig. 7 illustrates the second imaging unit 9d, but the first imaging units 9a and 9b, and the second imaging unit 9c have the same configurations and operations as the second imaging unit 9d.

[0106] Because the imaging unit 9 is disposed in an area other than the irradiation area 400, the distance from the first irradiation unit 4a11 to the imaging unit 9 varies for each of the first irradiation units 4a35. For example, the distance to the imaging unit 9 is relatively short for the first irradiation units 4a11, 4a21, and 4a31, while the distance to the imaging unit 9 is relatively long for the first irradiation units 4a15, 4a25, and 4a35. For this reason, in the example of FIG. 7, the first irradiation unit images 4a11', 4a21', and 4a31' are relatively large, and the distance between the first irradiation unit images 4a' is also relatively long. On the other hand, the first irradiation unit images 4a15', 4a25', and 4a35' are relatively small, and the distance between the first irradiation unit images 4a' is also relatively short.

[0107] 7 represents a pixel 930 of the second imaging unit 9d. The imaging unit 9 has pixels 930 equal to or greater than the number of the illumination means 4, and therefore can capture an image of each of the illumination means 4 using at least one pixel 930.

[0108] The electrode manufacturing apparatus 100 detects and monitors the irradiation intensity of ultraviolet light irradiated from the plurality of irradiation means 4 based on the pixel brightness value of at least one pixel 930 corresponding to the images of the plurality of irradiation means 4 in the captured image 93. The electrode manufacturing apparatus 100 can also detect and monitor the irradiation intensity of ultraviolet light irradiated from the plurality of irradiation means 4 from the captured image 93 obtained by one capture by the imaging unit 9, i.e., one shot.

[0109] In this embodiment, for example, the images of the plurality of irradiation means 4 in the captured image 93 are associated in advance with the positions of the plurality of irradiation means 4. However, this association may be performed automatically by processing the captured image 93 based on peak positions in the images of the plurality of irradiation means 4 on the captured image 93 and the predetermined positions of the plurality of irradiation means 4.

[0110] Because the distance to the focusing means 91 differs for each of the first irradiation means 4a11-4a35, the focus state differs for each of the first irradiation means images 4a11'-4a35'. Depending on the focus state, the brightness of each of the first irradiation means images 4a11'-35' differs. For this reason, in the electrode manufacturing apparatus 100, as an initial operation, the irradiation intensity of the ultraviolet light irradiated from each of the multiple irradiation means 4 at the position of the imaging unit 9 is measured using an illuminometer or the like.

[0111] The illuminance meter is not particularly limited, but is preferably one that can measure and calibrate the illuminance of each of the multiple irradiation means 4 when the device is not in operation, i.e., when the substrate 2 is not present. The number of illuminance meters may be the same as the number of irradiation means 4. Alternatively, the number of illuminance meters may be fewer than the number of irradiation means 4, and the illuminance meters may be scanned to measure and calibrate all of the irradiation means 4.

[0112] After measurement by the illuminometer, the imaging unit 9 captures an image of each of the plurality of irradiation means 4, and an initial value of irradiation intensity is determined for each of the plurality of irradiation means 4 in association with a pixel brightness value according to the brightness of the image. When detecting the irradiation intensities of the plurality of irradiation means 4, the electrode manufacturing apparatus 100 detects fluctuations in irradiation intensity for each of the plurality of irradiation means 4 relative to the initial value of irradiation intensity based on the pixel brightness values ​​of the captured images of the plurality of irradiation means 4. This makes it possible to eliminate the influence of differences in focus state and brightness among the first irradiation means images 4a11' to 4a35' on irradiation intensity detection.

[0113] The electrode manufacturing apparatus 100 may reduce the difference in focus state and brightness by using a focusing means 91 with a long focal depth. The electrode manufacturing apparatus 100 can also reduce the difference in focus state and brightness by increasing the number of pairs of focusing means 91 and imaging unit 9 and reducing the number of irradiation means 4 imaged by one pair of focusing means 91 and imaging unit 9.

[0114] 8 is a diagram illustrating the irradiation intensity of the first irradiation means 4a and the second irradiation means 4b. In Fig. 8, the horizontal axis represents the position in the transport direction 20, and the vertical axis represents the irradiation intensity.

[0115] The first irradiation intensity Lt1 represents the irradiation intensity by the first irradiation means 4a at a position corresponding to the first irradiation region length 401. The second irradiation intensity Lt2 represents the irradiation intensity by the second irradiation means 4b at a position corresponding to the second irradiation region length 402. The second irradiation intensity Lt2 is higher than the first irradiation intensity Lt1.

[0116] When ultraviolet light of different irradiation intensities is detected and captured using imaging units with the same dynamic range, the detection resolution of the irradiation intensity may be reduced. For this reason, in this embodiment, the dynamic ranges of the first imaging units 9a and 9b relative to the ultraviolet irradiation intensity are different from the dynamic ranges of the second imaging units 9c and 9d relative to the ultraviolet irradiation intensity. Here, the dynamic range refers to a numerical value representing the ratio between the maximum and minimum values ​​of a processable signal. For example, an 8-bit imaging unit has a dynamic range of 1:256, and a 10-bit imaging unit has a dynamic range of 1:1028.

[0117] In this embodiment, for example, the first imaging units 9a and 9b use imaging elements that support an 8-bit first dynamic range Dr1, and the first imaging units 9a and 9b use imaging elements that support a 10-bit second dynamic range Dr2. This allows the second irradiation intensity Lt2 to be detected with the same resolution even if it is four times the first irradiation intensity Lt1. Note that in FIG. 8, the minimum and maximum values ​​of the first irradiation intensity Lt1 are shown together to indicate that they are included within the first dynamic range Dr1. Similarly, the minimum and maximum values ​​of the second irradiation intensity Lt2 are shown together to indicate that they are included within the second dynamic range Dr2.

[0118] However, imaging elements with the same dynamic range may be used between the first imaging units 9a and 9b and the second imaging units 9c and 9d. In this case, it is preferable to provide a focusing means 91 with a small aperture diameter between the second imaging units 9c and 9d and the second irradiation unit 4b, or to provide a density filter to reduce the second irradiation intensity Lt2 to the same level as the first irradiation intensity Lt1. Furthermore, the same imaging elements may be used for both the first imaging units 9a and 9b and the second imaging units 9c and 9d. In this case, it is preferable that both the first imaging units 9a and 9b and the second imaging units 9c and 9d use 10-bit imaging elements.

[0119] <Example of detection result of irradiation intensity> Fig. 9 is a diagram showing an example of the detection result of the irradiation intensity for each of the plurality of irradiation means 4 based on the image 93 captured by the imaging unit 9. Fig. 9 shows the pixel luminance values ​​of each of the first irradiation means images 4a31', 4a21', 4a11', 4a32', 4a22', and 4a12' among the plurality of irradiation means 4. The pixel luminance value on the vertical axis in Fig. 9 means a predetermined value such as the average value, representative value, or maximum value of the pixel luminance values ​​of the plurality of pixels 930 constituting each first irradiation means image.

[0120] The initial value 71 is the initial value of pixel brightness corresponding to the initial value of irradiation intensity determined in the initial operation. The pixel brightness value 72 is the pixel brightness value according to the brightness of the first irradiation means image. The difference between the initial value 71 and the pixel brightness value 72 corresponds to the amount of fluctuation in irradiation intensity.

[0121] <Configuration example of control means 8> Fig. 10 is a block diagram illustrating an example of the functional configuration of the control means 8. As shown in Fig. 10, the control means 8 has an irradiation intensity acquisition unit 81, an irradiation control unit 82, a determination unit 83, and a notification unit 84. The control means 8 realizes these functions by, for example, a CPU (Central Processing Unit) using RAM (Random Access Memory) as a work area and executing a program stored in ROM (Read Only Memory). Note that an electric circuit or an electronic circuit may realize some of the above functions. A component other than the control means 8 may realize some of the above functions. A plurality of components may realize some of the above functions through distributed processing.

[0122] The irradiation intensity acquisition unit 81 acquires, by calculation, irradiation intensity information of ultraviolet light irradiated from each of the plurality of irradiation means 4, based on images of the plurality of irradiation means 4 captured by the imaging unit 9. The irradiation intensity acquisition unit 81 can also acquire, by calculation, irradiation intensity information of ultraviolet light irradiated by each of the first irradiation means 4a and the second irradiation means 4b, based on images of the first irradiation means 4a captured by the first imaging units 9a and 9b and images of the second irradiation means 4b captured by the second imaging units 9c and 9d. The irradiation intensity acquisition unit 81 outputs the acquired results to the irradiation control unit 82 and the determination unit 83.

[0123] The irradiation control unit 82 controls the irradiation intensities of ultraviolet light emitted by the plurality of irradiation means 4 in accordance with the results acquired by the irradiation intensity acquisition unit 81. For example, when the irradiation intensity of each of the plurality of irradiation means 4 varies from its initial value, the irradiation control unit 82 controls the intensity by changing the amount of current supplied to each of the plurality of irradiation means 4 so that the intensity approaches the initial value.

[0124] The determination unit 83 determines whether or not there is an abnormality in each of the plurality of irradiation means 4 based on the results acquired by the irradiation intensity acquisition unit 81, and outputs the determination results to the notification unit 84. For example, based on the results acquired by the irradiation intensity acquisition unit 81, when the irradiation intensity of at least one irradiation means among the plurality of irradiation means 4 is equal to or less than a predetermined irradiation threshold, the determination unit 83 determines that the at least one irradiation means is abnormal.

[0125] In addition, the judgment unit 83 can judge abnormalities in the multiple irradiation means 4 based on the results acquired by the irradiation intensity acquisition unit 81 and the detection results by the current detection means 43 that detects the current flowing in each of the multiple irradiation means 4, and output the judgment result to the notification unit 84.

[0126] When the determination unit 83 determines that at least one of the plurality of irradiation means 4 is abnormal, the notification unit 84 notifies the user of the electrode manufacturing apparatus 100. For example, the notification unit 84 notifies the user of the electrode manufacturing apparatus 100 by displaying information about the irradiation means determined to be abnormal on a display or other display unit. The user here refers to a user or manager of the electrode manufacturing apparatus 100. Hereinafter, the user will be simply referred to as the user.

[0127] For example, there are cases where the irradiation intensity does not increase no matter how much current is passed through a deteriorated or broken irradiation means 4, or where the irradiation intensity does not increase even if the irradiation means 4 is emitting ultraviolet light normally because the light source of the irradiation means 4 is dirty. In particular, the electrode manufacturing apparatus 100 generates steam and mist inside the apparatus, which can cause dirt to form over time. There are also cases where the irradiation intensity according to the supplied current varies among the multiple irradiation means 4. In this way, when an abnormality such as deterioration, failure, or dirt occurs in the irradiation means 4, the abnormality is notified, and the user can be prompted to perform maintenance on the electrode manufacturing apparatus 100.

[0128] 11 is a diagram illustrating the relationship between the current supplied to the plurality of irradiation means 4 and the irradiation intensity of ultraviolet light from the plurality of irradiation means 4. In FIG. 11, the horizontal axis represents the current supplied to the plurality of irradiation means 4, and the vertical axis represents the normalized irradiation intensity of ultraviolet light from the plurality of irradiation means 4.

[0129] 11, the irradiation intensity of ultraviolet light from the irradiation means 4 increases according to a predetermined characteristic as the current supplied to the irradiation means 4 increases. However, if an abnormality such as deterioration, failure, or dirt occurs in the irradiation means 4, the irradiation intensity becomes lower than the predetermined characteristic.

[0130] For example, when the relationship curve 74 showing the relationship between the supply current and the irradiation intensity deviates from the normal curve 73 in the normal state by more than the lower threshold, that is, when the relationship curve 74 is below the lower threshold, the judgment unit 83 judges that the irradiation means 4 is abnormal. The abnormal region 75 in Fig. 11 indicates the region below the lower threshold.

[0131] <Example of Operation of Electrode Manufacturing Apparatus 100> Next, an example of the operation of the electrode manufacturing apparatus 100 will be described. (First irradiation step) The first irradiation step is a step of irradiating the liquid composition applied in the application step with first active energy rays. The first irradiation step improves the porosity of the porous resin finally produced, thereby improving the uptake of fluids such as liquids or gases into the porous resin. Specifically, by irradiating the liquid composition with first active energy rays, a porous precursor having a porous structure that serves as the basis for forming a porous resin with high porosity is formed. Note that, in the first irradiation step, as long as a porous precursor is formed, polymerizable compounds may remain as unreacted components.

[0132] The first active energy ray is not particularly limited as long as it can impart the energy necessary to promote the polymerization reaction of the polymerizable compound, and examples thereof include ultraviolet rays, electron beams, α rays, β rays, γ rays, and X-rays. Among these, ultraviolet rays are preferred. In particular, when a high-energy light source is used, the polymerization reaction can be promoted without using a polymerization initiator.

[0133] The reason for forming a porous precursor by the first irradiation step will be explained. As described above, when a porous resin is formed by polymerization-induced phase separation, the structure and properties of the porous resin change depending on the polymerization conditions. For example, when a liquid composition is irradiated with active energy rays having a high irradiation intensity to form a porous resin under conditions that promote the polymerization of the polymerizable compound, the polymerization tends to proceed before phase separation occurs sufficiently, making it difficult to produce a porous resin with a high porosity. Therefore, in the first irradiation step aimed at forming a porous precursor having a porous structure that serves as the basis for forming a porous resin with a high porosity, the irradiation intensity of the irradiated first active energy rays is set not to be too high. Specifically, the irradiation intensity of the first active energy rays is set to be lower than the irradiation intensity of the second active energy rays irradiated in the second irradiation step described below aimed at promoting the polymerization reaction of the polymerizable compound as an unreacted component.

[0134] More specifically, the irradiation intensity of the first active energy ray is preferably 1 W / cm or less, more preferably less than 300 mW / cm, and even more preferably 100 mW / cm or less. However, if the irradiation intensity of the first active energy ray is too low, excessive phase separation can easily cause variations and coarsening of the porous structure, and furthermore, the irradiation time can be extended, resulting in reduced productivity. Therefore, the irradiation intensity is preferably 10 mW / cm or more, more preferably 30 mW / cm or more. Note that when the first irradiation step is performed while the light source irradiating the first active energy ray and the liquid composition are moving relative to each other, the irradiation intensity on the surface of the liquid composition changes continuously. In such cases, the irradiation intensity represents the average value of the irradiation intensity measured at multiple locations evenly (uniformly) selected from within the area where the first irradiation step is performed.

[0135] The time for irradiating the first active energy ray in the first irradiation step is preferably equal to or longer than the structure determination time for determining the porous structure that serves as the basis for forming a porous resin with a high porosity. By irradiating the first active energy ray for a time equal to or longer than the structure determination time, it is possible to avoid performing the second irradiation step (described later) in a state where the porous structure is not yet sufficiently formed, and as a result, it is possible to produce a porous resin with a high porosity.

[0136] The structure determination time can be calculated by the following method using a liquid composition. First, resin particles are uniformly dispersed on a non-alkali glass substrate by spin coating to form a gap agent. The substrate coated with the gap agent is then bonded to another non-alkali glass substrate not coated with the gap agent, with the surfaces coated with the gap agent sandwiched between them. Next, a liquid composition is filled between the bonded elements using capillary action, and finally, the periphery of the substrate is sealed with a sealant to produce a "structure determination time measurement element." The various conditions for fabrication are shown below. Alkali-free glass substrate: Nippon Electric Glass, 40 mm, t=0.7 mm, OA-10G Gap agent: Sekisui Chemical Co., Ltd., resin microparticle Micropearl GS-L100, average particle size 100 μm Spin coating conditions: Dispersion volume 150 μL, rotation speed 1000 rpm, rotation time 30 s Filled liquid composition volume: 160 μL Sealant: TB3035B (Three Bond) Next, the fabricated structure determination time measurement element is irradiated with the first active energy ray under the same conditions as in the first irradiation step. The transmittance of the element before irradiation is used as a reference, and the attenuation of the measured value (transmittance) of the element during irradiation is measured. The attenuation rate is calculated by taking the transmittance when there is no change in attenuation due to excessive irradiation with the first active energy ray as 100%. The attenuation rate increases as a porous structure is formed by polymerization. In the present disclosure, the structure determination time is defined as the time required from the start of irradiation until the attenuation rate of the transmittance reaches 50%. The equipment used for the measurement is shown below. Transmittance measuring device: LCD-5200 manufactured by Otsuka Electronics Co., Ltd.

[0137] (Second irradiation step) The second irradiation step is a step of irradiating the liquid composition irradiated with the first active energy ray with the second active energy ray. The second irradiation step promotes the polymerization reaction of the polymerizable compound remaining as an unreacted component in the first irradiation step, thereby improving the polymerization rate of the porous resin, thereby improving, for example, the strength of the porous resin. Specifically, the polymerization rate of the porous resin is preferably 90% or higher. Furthermore, when the porous resin is used as an insulating layer (separator) for an energy storage device, the remaining unreacted polymerizable compound can be suppressed, thereby suppressing deterioration of battery characteristics (e.g., gas generation) caused by the remaining polymerizable compound. In the present disclosure, the "liquid composition irradiated with the first active energy ray" to be irradiated with the second active energy ray refers to an irradiated object, etc., generated by irradiating the liquid composition with the first active energy ray in the first irradiation step, specifically a composite of the porous precursor generated in the first irradiation step, the polymerizable compound as an unreacted component, and the solvent.

[0138] The second active energy ray is not particularly limited as long as it can impart the energy necessary to promote the polymerization reaction of the polymerizable compound, and examples thereof include ultraviolet rays, electron beams, α rays, β rays, γ rays, and X-rays. Among these, ultraviolet rays are preferred. In particular, when a high-energy light source is used, the polymerization reaction can be promoted without using a polymerization initiator.

[0139] The first and second active energy rays may be the same or different in type, but are preferably the same, and are preferably both ultraviolet rays. When the first and second active energy rays are both ultraviolet rays, their peak wavelengths may be the same or different, but are preferably the same.

[0140] The reason why the second irradiation step promotes the polymerization reaction of the polymerizable compound remaining as an unreacted component in the first irradiation step will be explained below.

[0141] As described above, when forming a porous resin by polymerization-induced phase separation, the structure and properties of the porous resin change depending on the polymerization conditions. Specifically, the first irradiation step is intended to form a porous precursor having a porous structure that serves as the basis for forming a porous resin with a high porosity, and the irradiation intensity of the irradiated first active energy ray is set not to be too high. Therefore, there is a possibility that a polymerizable compound remains as an unreacted component in the first irradiation step, which tends to make it difficult to produce a porous resin with a high polymerization rate. Therefore, in the second irradiation step intended to form a porous resin with a high polymerization rate, the irradiation intensity of the second active energy ray is set to be higher than the irradiation intensity of the first active energy ray.

[0142] Specifically, the irradiation intensity of the second active energy ray is preferably 300 mW / cm or more, more preferably 400 mW / cm or more, and even more preferably 1 W / cm or more. When the second irradiation step is performed while the light source irradiating the second active energy ray and the irradiated object (the liquid composition irradiated with the first active energy ray) are moving relative to each other, the irradiation intensity on the surface of the irradiated object changes continuously. In such a case, the irradiation intensity represents the average value of the irradiation intensities measured at multiple locations evenly (uniformly) selected from within the area where the second irradiation step is performed.

[0143] The irradiation intensity of the second active energy ray is preferably 5 times or more, more preferably 10 times or more, the irradiation intensity of the first active energy ray.

[0144] The method for measuring the polymerization rate of the porous resin is not particularly limited, but may be, for example, a method of measuring by infrared spectroscopy, etc. Specifically, the peak value at 820 to 800 cm corresponding to =CH out-of-plane bending vibration, the peak value at 1430 to 1400 cm corresponding to =CH in-plane bending vibration, or the peak value at 1640 to 1620 cm corresponding to C=C is read, and the value is calculated by comparing with the value before irradiation.

[0145] (Removal process) The removal step is a step of removing the solvent from the porous resin after the second irradiation step. The method for removing the solvent is not particularly limited, and for example, a method of removing the solvent from the porous resin by heating can be mentioned. In this case, heating under reduced pressure is preferable because it further promotes the removal of the solvent and suppresses the remaining solvent in the porous resin.

[0146] <Example of processing by the control means 8> Fig. 12 is a flowchart showing an example of an abnormality detection process performed by the control means 8. The control means 8 starts the process of Fig. 12, for example, when it receives an operation input from a user using the operation unit of the electrode manufacturing apparatus 100 to start the abnormality detection process.

[0147] First, in step S121, the control means 8 causes the irradiation control section 82 to supply the maximum current to the plurality of irradiation means 4, causing the plurality of irradiation means 4 to irradiate ultraviolet light.

[0148] Subsequently, in step S122, the control means 8 inputs the captured image 93 from the imaging unit 9 through the irradiation intensity acquisition unit 81, and acquires, by calculation, irradiation intensity information of the ultraviolet light irradiated from each of the plurality of irradiation means 4, based on the images of the plurality of irradiation means 4 included in the captured image 93. Thereafter, the irradiation intensity acquisition unit 81 outputs the acquired result to the irradiation control unit 82 and the determination unit 83.

[0149] Subsequently, in step S123, the control means 8 determines, by the determination unit 83, whether or not the irradiation intensity of the ultraviolet light irradiated from each of the plurality of irradiation means 4 is greater than the irradiation threshold value.

[0150] If it is determined in step S123 that the difference is not large (step S123, No), in step S124, the control means 8 notifies the notification unit 84 of a first abnormality. This first abnormality is information indicating that there is an abnormality in the emission of ultraviolet light by the irradiation means 4, and prompts the user to replace the irradiation means 4 or check for an abnormality in the wiring for supplying current to the irradiation means 4. The control means 8 ends the processing after notifying the first abnormality.

[0151] On the other hand, if it is determined in step S123 that the maximum current is large (step S123, Yes), in step S125, the control means 8 causes the irradiation control unit 82 to supply a current smaller than the maximum current to the multiple irradiation means 4, causing the multiple irradiation means 4 to irradiate ultraviolet light.

[0152] Subsequently, in step S126, the control means 8 inputs the captured image 93 from the imaging unit 9 through the irradiation intensity acquisition unit 81, and acquires, by calculation, irradiation intensity information of the ultraviolet light irradiated from each of the plurality of irradiation means 4, based on the images of the plurality of irradiation means 4 included in the captured image 93. Thereafter, the irradiation intensity acquisition unit 81 outputs the acquired result to the irradiation control unit 82 and the determination unit 83.

[0153] Subsequently, in step S127, the control means 8 determines, by the determining unit 83, whether or not the relationship curve 74 is greater than the lower limit threshold.

[0154] If it is determined in step S127 that the difference is not large (step S127, No), the control means 8 notifies the notification unit 84 of a second abnormality. This second abnormality is information indicating that there is no abnormality in the emission of ultraviolet light by the irradiation means 4, but that the irradiation means 4 is contaminated by mist or the like, and prompts the user to clean the irradiation means 4 or the like. The control means 8 ends the processing after notifying the second abnormality.

[0155] On the other hand, if it is determined in step S127 that it is larger (step S127, Yes), the control means 8 ends the process.

[0156] In this way, the control means 8 can perform abnormality detection processing for a plurality of irradiation means 4.

[0157] <Actions and Effects of the Electrode Manufacturing Apparatus 100> The effects of the electrode manufacturing apparatus 100 will be described.

[0158] BACKGROUND ART Conventionally, there has been known an apparatus for producing a resin structure, such as an electrode production apparatus, which includes an application means for applying an active energy ray-curable liquid composition onto a substrate.

[0159] In an electrode manufacturing apparatus, a certain amount of ultraviolet irradiation area is required to irradiate the liquid composition on the substrate with ultraviolet light for a predetermined period of time. Furthermore, in the case of a roll-to-roll electrode manufacturing apparatus, the faster the substrate conveyance speed, the longer the ultraviolet irradiation time must be secured to secure ultraviolet light irradiation time. Furthermore, since ultraviolet light with a predetermined irradiation intensity is required, the ultraviolet light irradiance distribution must also be constant.

[0160] To satisfy the above conditions, it is desirable to use multiple irradiation means for irradiating ultraviolet light in an array. In this case, however, it is necessary to monitor the ultraviolet light irradiation status of each of the multiple irradiation means. This is to monitor fluctuations in irradiation intensity due to deterioration or malfunction of the irradiation means. In particular, with the roll-to-roll method, resin structures are formed on the substrate over an entire roll at once. If an abnormality occurs, such as a large fluctuation in ultraviolet light irradiation intensity or irradiation stopping midway, it becomes difficult to identify the point at which the abnormality occurred, and the entire roll may end up being wasted.

[0161] On the other hand, as a device for applying a liquid composition onto a substrate, an inkjet printer has been disclosed which moves a carriage that moves an applying means such as a recording head that ejects an ultraviolet-curable liquid composition onto a substrate and an irradiating means for active energy rays such as ultraviolet rays to a predetermined position, and then detects the illuminance of ultraviolet rays irradiated from the irradiating means (see, for example, Patent Document 1).

[0162] However, from the viewpoint of improving productivity, there is a demand for a so-called line-type electrode manufacturing apparatus that forms a resin structure on a substrate without moving the application means. In a line-type electrode manufacturing apparatus, since a carriage is not used, the irradiation means cannot be moved, and the configuration of the inkjet printer disclosed in Patent Document 1 cannot be applied.

[0163] The electrode manufacturing apparatus 100 (apparatus for manufacturing a resin structure) according to this embodiment includes an application means 3 that applies an ultraviolet (active energy ray) curable liquid composition Q onto a substrate 2, at least one irradiation means 4 that irradiates the liquid composition Q applied onto the substrate 2 with ultraviolet light, and an imaging unit 9 (output means) that outputs captured images 93 of the multiple irradiation means 4 (status information corresponding to the irradiation status by the irradiation means).

[0164] The application means 3 applies the liquid composition Q onto the substrate 2 by ejecting the liquid composition Q from a plurality of nozzles 32 provided across the entire application width 30 for applying the liquid composition Q onto the substrate 2 in a width direction 21 intersecting with the conveyance direction 20 of the substrate 2. The imaging unit 9 is arranged in an area other than the irradiation area 400 where ultraviolet light is applied from the irradiation means 4.

[0165] The electrode manufacturing apparatus 100 can acquire a captured image 93 of the multiple irradiation means 4 without moving the application means 3 and the irradiation means 4, and can monitor the irradiation states of the multiple irradiation means 4 based on the images of the multiple irradiation means 4 included in this captured image 93. Therefore, in this embodiment, it is possible to provide an electrode manufacturing apparatus 100 that can monitor the irradiation states of the multiple irradiation means 4 in a configuration in which the application means 3 and the irradiation means 4 are not moved.

[0166] In this embodiment, the imaging unit 9 is disposed in an area other than the transport area 500 through which the substrate 2 is transported. Since the transport of the substrate 2 is not hindered in the electrode manufacturing apparatus 100, the resin structure can be formed on the substrate 2 with high productivity.

[0167] Furthermore, in this embodiment, the electrode manufacturing apparatus 100 has focusing means 91 that focuses ultraviolet light irradiated from the irradiation means 4. The imaging unit 9 has pixels 930 equal to or greater than the number of irradiation means 4, and detects ultraviolet light focused by the focusing means 91 to capture an image of the irradiation means 4. The electrode manufacturing apparatus 100 can monitor the irradiation status of each of the multiple irradiation means 4 with a single image capture by the imaging unit 9, thereby improving monitoring efficiency. This also makes it possible to quickly take measures against abnormalities in the multiple irradiation means 4 without reducing the productivity of manufacturing by the electrode manufacturing apparatus 100.

[0168] Furthermore, in this embodiment, the electrode manufacturing apparatus 100 has a control means 8 that controls the irradiation of ultraviolet rays by the irradiation means 4, and the control means 8 controls the irradiation intensity of ultraviolet rays by the irradiation means 4 based on an image of the irradiation means 4 captured by the imaging unit 9. The electrode manufacturing apparatus 100 can compensate for fluctuations in the irradiation intensity by the irradiation means 4, and therefore can ensure high manufacturing quality by the electrode manufacturing apparatus 100.

[0169] Furthermore, in this embodiment, when the irradiation intensity by the irradiation means 4 is equal to or less than a predetermined irradiation threshold, the control means 8 notifies the user of an abnormality in the irradiation means 4. Since the user can quickly recognize the abnormality in the irradiation means 4, it becomes possible to take prompt measures against the abnormality in the irradiation means 4.

[0170] Furthermore, in this embodiment, the electrode manufacturing apparatus 100 has a current detection means 43 that detects the current flowing through the irradiation means 4, and the control means 8 notifies of an abnormality in the irradiation means 4 based on the irradiation intensity of the irradiation means 4 and the detection result of the current detection means 43. Since it is possible to distinguish between a serious abnormality such as a malfunction of the irradiation means 4 and a minor abnormality such as contamination by mist of the irradiation means 4 and notify of the abnormality, it becomes possible to quickly respond to the abnormality in the irradiation means 4 and take appropriate measures according to the abnormality.

[0171] In this embodiment, the irradiation means 4 includes at least one first irradiation means 4a and at least one second irradiation means 4b, and the imaging unit 9 includes first imaging units 9a and 9b and second imaging units 9c and 9d. The first irradiation means 4a irradiates the liquid composition Q applied to the substrate 2 by the application means 3 with ultraviolet light at a first irradiation intensity Lt1. The second irradiation means 4b is provided downstream of the first irradiation means 4a in the conveyance direction 20 and irradiates the liquid composition Q irradiated with ultraviolet light by the first irradiation means 4a with ultraviolet light at a second irradiation intensity Lt2 higher than the first irradiation intensity Lt1. The first imaging units 9a and 9b have pixels 930 equal to or greater than the number of the first irradiation means 4a, and detect the ultraviolet light focused by the focusing means 91 to image the first irradiation means 4a. The second imaging units 9c and 9d have pixels 930 equal to or greater than the number of the second irradiation means 4b, and detect the ultraviolet light focused by the focusing means 91 to capture an image of the second irradiation means 4b.

[0172] By irradiating ultraviolet light in two stages using the first irradiation means 4a and the second irradiation means 4b and by making the second irradiation intensity Lt2 on the downstream side higher than the first irradiation intensity Lt1, the time required for curing the liquid composition Q using ultraviolet light at the second irradiation intensity Lt2 can be shortened. In this embodiment, the second irradiation region length 402 can be shortened in accordance with the shortened curing time, allowing the electrode manufacturing apparatus 100 to be miniaturized. Furthermore, in this embodiment, by providing the first imaging units 9a and 9b and the second imaging units 9c and 9d, the irradiation states of the multiple irradiation means 4 can be monitored in the miniaturized electrode manufacturing apparatus 100.

[0173] Furthermore, in this embodiment, the first dynamic range Dr1 of the first imaging units 9a and 9b relative to the ultraviolet irradiation intensity is different from the second dynamic range Dr2 of the second imaging units 9c and 9d relative to the ultraviolet irradiation intensity. For example, the electrode manufacturing apparatus 100 detects ultraviolet light of a first irradiation intensity Lt1 using the first imaging units 9a and 9b with the first dynamic range Dr1, and detects ultraviolet light of a second irradiation intensity Lt2 higher than the first irradiation intensity using the second imaging units 9c and 9d with the second dynamic range Dr2 larger than the first dynamic range Dr1. The electrode manufacturing apparatus 100 can match the detection resolution of irradiation intensity between the first imaging units 9a and 9b and the second imaging units 9c and 9d, thereby ensuring high accuracy in monitoring the irradiation states of the multiple irradiation means 4.

[0174] In this embodiment, peaks of irradiation intensity are automatically detected based on the images 93 captured by the first imaging units 9a and 9b and the second imaging units 9c and 9d, and the detected peaks are associated with the first irradiation means 4a and the second irradiation means 4b. This makes it possible to control the first irradiation means 4a and the second irradiation means 4b according to the results of monitoring the irradiation states of the multiple irradiation means 4.

[0175] In this embodiment, the control means 8 controls the irradiation intensity of ultraviolet light by each of the first irradiation means 4a and the second irradiation means 4b based on the image of the first irradiation means 4a captured by the first imaging units 9a and 9b and the image of the second irradiation means 4b captured by the second imaging units 9c and 9d. The electrode manufacturing apparatus 100 can compensate for fluctuations in the irradiation intensity by the irradiation means 4, so that high manufacturing quality can be ensured even if it is small in size.

[0176] Furthermore, in this embodiment, the electrode manufacturing apparatus 100 has a shielding means 42 that blocks ultraviolet rays emitted from the electrode manufacturing apparatus 100 to the outside, out of the ultraviolet rays irradiated by the irradiation means 4. In this embodiment, the shielding means 42 can block ultraviolet rays, so that people and objects around the electrode manufacturing apparatus 100 can be prevented from being irradiated with ultraviolet rays.

[0177] In addition, in this embodiment, the resin structure includes a porous structure, so that a separator layer in a battery can be formed by the electrode manufacturing apparatus 100.

[0178] Furthermore, in this embodiment, the porous structure is formed on the positive electrode substrate or the negative electrode substrate, or on the positive electrode active material provided on the positive electrode substrate or the negative electrode active material provided on the negative electrode substrate, thereby allowing a separator layer or the like in a battery to be formed by the electrode manufacturing apparatus 100.

[0179] <Modification> The electrode manufacturing apparatus 100 can be modified in various ways. Modified examples will be described below. Note that the same components as those in the first embodiment are given the same reference numerals, and duplicated descriptions will be omitted as appropriate. This also applies to the other embodiments described below.

[0180] (First Modification) Fig. 13 is a top view showing an example of the arrangement of the irradiation means 4 and the imaging unit 9 according to the first modified example. As shown in Fig. 13, the second imaging units 9c and 9d in the imaging unit 9 are arranged downstream of the irradiation region 400 in the conveying direction 20, within the conveying region 500 through which the substrate 2 is conveyed. With this configuration, it is possible to obtain the same effects as those of the electrode manufacturing apparatus 100 described above.

[0181] Furthermore, in the first modified example, by arranging the imaging unit 9 downstream of the irradiation area 400, if an abnormality occurs in part of the irradiation means 4, the transport of the substrate 2 can be stopped before the liquid composition Q is cured, thereby preventing unnecessary curing of the liquid composition Q.

[0182] Furthermore, in the first variant, by placing the substrate 2 within the transport area 500 in which it is transported, the difference in distance between each of the multiple irradiation means 4 and the second imaging units 9c and 9d can be reduced, thereby improving the quality of the images of the multiple irradiation means 4.

[0183] Furthermore, in the first modified example, the degree of freedom in arranging the imaging unit 9 can be increased.

[0184] (Second Modification) 14 is a diagram illustrating a group of a plurality of irradiation means 4 according to the second modified example. In this modified example, a plurality of irradiation means 4 are arranged in a line along the conveyance direction 20 and the width direction 21. The control means 8 controls the irradiation intensity of the ultraviolet light irradiated from the irradiation means 4 for each of the groups G1, G2, and G3 formed by a plurality of irradiation means 4 arranged in a line along the conveyance direction 20.

[0185] 14, for example, a total of 30 irradiation means 4 are arranged, 10 along the conveying direction 20 and 3 along the width direction 21. Each of the groups G1, G2, and G3 is composed of 10 irradiation means 4 along the conveying direction 20.

[0186] Here, when the irradiation region 400 has a large area and the electrode manufacturing apparatus 100 has a large number of irradiation means 4, the processing load on the control means 8 may increase if each irradiation means 4 is controlled individually.

[0187] On the other hand, since the hardening of the polymerizable material progresses in proportion to the product of the ultraviolet irradiation intensity and time, if the sum of the irradiation intensities of the ten irradiation means 4 arranged along the conveying direction 20 is approximately equal for each of the groups G1, G2, and G3, the accuracy of forming the resin structure on the entire substrate 2 can be guaranteed.

[0188] For example, the irradiation control unit 82 in the control means 8 detects the sum of the irradiation intensities of the 10 irradiation means 4 included in each group G1 to G3, and controls the irradiation intensity for each group G1 to G3 so that this sum falls within a predetermined range of a predetermined value.

[0189] In this modified example, the control means 8 controls the irradiation intensity of three groups, G1, G2, and G3, and does not individually control all 30 irradiation means, thereby reducing the control factors and processing load while ensuring the formation accuracy of the resin structure.

[0190] Furthermore, this modification can also handle high-speed control due to the increased processing speed.

[0191] Although the irradiation intensity of the ultraviolet light affects the properties of the resin structure, the influence may not be significant if the intensity does not vary greatly. Although the irradiation intensity of the irradiation means 4 is unlikely to fluctuate excessively, if it does fluctuate excessively, the control may be changed from group-by-group control to individual control of the irradiation means 4.

[0192] The effects other than those described above are the same as those of the first embodiment.

[0193] [Second embodiment] 15 is a diagram illustrating the overall configuration of an electrode manufacturing apparatus 100a according to the second embodiment. As shown in FIG.

[0194] The operation means 11 is, for example, a touch panel that accepts operation input by a user. The display means 12 is, for example, a display that displays a captured image 93 output from the imaging unit 9. The user can visually recognize status information of the irradiation means 4 from the captured image 93 displayed by the display means 12. Note that the operation means 11 and the display means 12 may be integrated.

[0195] The electrode manufacturing apparatus 100a has the display means 12 that displays the captured image 93, so that the user can be made aware of an abnormality in the irradiation means 4 quickly and appropriately.

[0196] In addition to the above, the following effects can be mentioned. That is, because the irradiation means 4 is housed within the shielding means 42 (see FIG. 4 ), the user cannot visually confirm whether ultraviolet light is being emitted from the irradiation means 4. Although it is possible to display via the operation means 11 or the like that ultraviolet light is being emitted from the irradiation means 4, the user will feel uneasy if he or she does not visually confirm whether ultraviolet light is actually being emitted. Even if the operation means 11 displays that ultraviolet light is being emitted, other safety devices, interlock switches, etc. may be activated and the light may not actually be emitted. In this embodiment, by displaying the image captured by the imaging unit 9 on the display means 12, the user can perform the work without feeling uneasy.

[0197] The effects other than those described above are the same as those of the first embodiment.

[0198] Although the embodiments have been described above, the present disclosure is not limited to the specifically disclosed embodiments above, and various modifications and changes are possible without departing from the scope of the claims.

[0199] All numbers such as ordinal numbers and quantities used in the description of the embodiments are provided as examples to specifically explain the technology of the present disclosure, and the present disclosure is not limited to the illustrated numbers. Furthermore, the connection relationships between components are provided as examples to specifically explain the technology of the present disclosure, and the connection relationships that realize the functions of the present disclosure are not limited to these.

[0200] The embodiments also include a method for producing a resin structure. For example, the method for producing a resin structure is a method for producing the resin structure using an apparatus for producing a resin structure, in which the apparatus for producing a resin structure applies an active energy ray-curable liquid composition onto a substrate using an application unit, irradiates the liquid composition applied onto the substrate with active energy rays using at least one irradiation unit, and outputs status information corresponding to the irradiation status by the irradiation unit using an output unit. The application unit applies the liquid composition onto the substrate by ejecting the liquid composition from multiple nozzles provided across the entire application width of the liquid composition applied to the substrate in a width direction intersecting the transport direction of the substrate, and the output unit is located in a region other than the irradiation region irradiated with the active energy rays from the irradiation unit. This method for producing a resin structure can achieve the same effects as the apparatus for producing a resin structure described above.

[0201] Each function of the above-described embodiments can be realized by one or more processing circuits. Here, the term "processing circuit" in this specification includes a processor programmed to perform each function by software, such as a processor implemented by an electronic circuit, as well as devices such as an ASIC (Application Specific Integrated Circuit), a DSP (Digital Signal Processor), an FPGA (Field Programmable Gate Array), or a conventional circuit module designed to perform each of the above-described functions. [Explanation of symbols]

[0202] 1 Unwinding roll 2 Base material 3. Means of granting 3a, 3b, 3c, 3d discharge part 4 Irradiation means 4a First irradiation means 4a' First irradiation means image 4b Second irradiation means 4b' Second irradiation means image 5 Heating means 6. Testing methods 7. Winding roll 8 Control Means 9. Imaging unit (an example of an output means) 9a, 9b First imaging unit 9c, 9d Second imaging unit 11 Operating means 12 Display means 20 Conveying direction 21 Width direction 30 Grant Range 31 head 32 nozzles 41 N2 purge box 410 UV-transmitting glass 42 Shielding means 43 Current detection means 71 initial value 72 pixel brightness values 73 Normal curve 74 Relationship Curve 75 Abnormal area 81 Irradiation intensity acquisition unit 82 Irradiation control unit 83 Judgment Department 84 Information Department 90 Case 91 Focusing means 92 UV transmission filter 93 Captured images 930 pixels 100 Electrode manufacturing equipment (resin structure manufacturing equipment) 400 irradiation area 401 Length of first irradiation area 402 Second irradiation area length 500 conveying area Dr1 First dynamic range Dr2 Second Dynamic Range Lt1 1st irradiation intensity Lt2 2nd irradiation intensity G1, G2, G3 groups Q Liquid Composition [Prior art documents] [Patent documents]

[0203] [License 1] Patent No. 4649935

Claims

1. an application means for applying an active energy ray-curable liquid composition onto a substrate; at least one irradiation means for irradiating the liquid composition applied onto the substrate with active energy rays; output means for outputting status information corresponding to the irradiation status of the irradiation means; the applying means and the irradiating means are fixed and do not move, the application unit applies the liquid composition onto the substrate by ejecting the liquid composition from a plurality of nozzles provided across an entire application width of the liquid composition onto the substrate in a width direction intersecting a transport direction of the substrate, the output means is disposed in a region other than an irradiation region irradiated with the active energy rays from the irradiation means, and a resin structure production device for producing a resin structure by applying the active energy rays to the liquid composition.

2. 2. The resin structure manufacturing apparatus according to claim 1, wherein at least a portion of the output means is disposed in an area other than a transport area in which the base material is transported.

3. 3. The resin structure manufacturing apparatus according to claim 1, wherein at least a part of the output means is disposed downstream of the irradiation region in the transport direction and within a transport region in which the base material is transported.

4. a focusing means for focusing the active energy rays irradiated from the irradiation means, 4. The apparatus for producing a resin structure according to claim 1, wherein the output means includes an imaging unit having pixels equal to or greater than the number of the irradiation means, and detecting the active energy rays focused by the focusing means to capture an image of the irradiation means.

5. a control means for controlling the irradiation of the active energy rays by the irradiation means, 5. The apparatus for producing a resin structure according to claim 4, wherein the control means controls the irradiation intensity of the active energy rays from the irradiation means based on the image of the irradiation means captured by the imaging section.

6. a plurality of the irradiation means are provided side by side along the conveyance direction and the width direction, 6. The apparatus for producing a resin structure according to claim 5, wherein the control means controls the irradiation intensity of the active energy rays irradiated from the irradiation means for each group formed by a plurality of the irradiation means arranged along the transport direction.

7. 7. The resin structure manufacturing apparatus according to claim 5, wherein the control means notifies an abnormality in the irradiating means when the irradiation intensity by the irradiating means is equal to or lower than a predetermined irradiation threshold value.

8. a current detection means for detecting a current flowing through the irradiation means; 8. The resin structure manufacturing apparatus according to claim 7, wherein the control means notifies the abnormality based on the irradiation intensity of the irradiation means and the detection result of the current detection means.

9. the irradiation means includes at least one first irradiation means and at least one second irradiation means; the output means includes a first imaging unit and a second imaging unit, the first irradiation means irradiates the liquid composition applied onto the substrate by the application means with the active energy rays at a first irradiation intensity; a second irradiation means provided downstream of the first irradiation means in the conveying direction, and irradiating the liquid composition irradiated with the active energy rays by the first irradiation means with the active energy rays at a second irradiation intensity higher than the first irradiation intensity; the first imaging unit has pixels equal to or greater than the number of the first irradiation means, detects the active energy rays focused by the focusing means, and captures an image of the first irradiation means; 9. The apparatus for manufacturing a resin structure according to claim 5, wherein the second imaging unit has pixels equal to or greater than the number of the second irradiation means, and detects the active energy rays focused by the focusing means to capture an image of the second irradiation means.

10. 10. The apparatus for manufacturing a resin structure according to claim 9, wherein a dynamic range of the first imaging unit with respect to the irradiation intensity of the active energy ray is different from a dynamic range of the second imaging unit with respect to the irradiation intensity of the active energy ray.

11. 11. The apparatus for manufacturing a resin structure according to claim 9 or 10, wherein a peak of irradiation intensity is automatically detected based on the images captured by the first imaging unit and the second imaging unit, and the detected peak is associated with the first irradiation means and the second irradiation means.

12. 12. The apparatus for manufacturing a resin structure according to claim 9, wherein the control means controls the irradiation intensities of the active energy rays by each of the first irradiating means and the second irradiating means, based on an image of the first irradiating means captured by the first imaging unit and an image of the second irradiating means captured by the second imaging unit.

13. 13. The apparatus for producing a resin structure according to claim 1, further comprising a shielding means for shielding the active energy rays emitted from the apparatus for producing a resin structure to the outside, out of the active energy rays irradiated by the irradiation means.

14. The resin structure manufacturing apparatus according to claim 1 , further comprising a display unit that displays the state information output from the output unit.

15. The apparatus for producing a resin structure according to claim 1 , wherein the resin structure includes a porous structure.

16. The apparatus for producing a resin structure according to claim 1 , wherein the substrate is on a positive electrode or a negative electrode.

17. 16. The apparatus for producing a resin structure according to claim 1, wherein the substrate is on a positive electrode active material provided on a positive electrode or on a negative electrode active material provided on a negative electrode.

18. A resin structure manufacturing apparatus described in any one of claims 1 to 17, wherein the resin structure is a resin structure for a storage element or a power generation element.

19. A resin structure manufacturing apparatus described in any one of claims 1 to 18, wherein the resin structure has a porous structure.

20. An electrode manufacturing apparatus comprising the resin structure manufacturing apparatus according to claim 1 .

21. A method for producing a resin structure by an apparatus for producing a resin structure, the apparatus for producing a resin structure comprising: applying an active energy ray-curable liquid composition onto a substrate by an application means; irradiating the liquid composition applied onto the substrate with active energy rays by at least one irradiation means; outputting status information corresponding to the irradiation status of the irradiation means by an output means; The applying means and the irradiating means can be monitored without moving, the application unit applies the liquid composition onto the substrate by ejecting the liquid composition from a plurality of nozzles provided across an entire application width of the liquid composition onto the substrate in a width direction intersecting a transport direction of the substrate, the output means is disposed in a region other than an irradiation region irradiated with the active energy rays from the irradiation means, The method for producing a resin structure includes applying the active energy rays to the liquid composition to produce a resin structure.

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