The SiOx layer has a substrate.

Abstract

To provide a base material including an SiOX layer capable of preventing a defect caused by a component that seeps out of rubber or resin.SOLUTION: A base material including an SiOX layer of the invention is a base material containing an emission component. The base material is a base material made of rubber or resin containing at least a plasticizer that is an emission component. The SiOX layer is located in a surface layer including a more inner side than a surface of the base material.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to a member having various shapes such as a roll, a sheet, or a plate. More specifically, the present invention relates to a substrate having a surface layer of amorphous SiO 2 in which silicon and oxygen are combined. X A layer containing SiO X A member (hereinafter referred to as "SiO X This relates to a substrate having a coating layer. [Background technology]

[0002] Conventionally, rollers have been used in various applications, such as film production lines, semiconductor production lines, printing machines, office equipment, etc. Rollers used include rubber rolls, metal rolls, resin rolls, plated rolls, etc. (For example, Patent Document 1). [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Laid-Open No. 2015-113919 Summary of the Invention [Problem to be solved by the invention]

[0004] However, components such as siloxane may seep out from inside the rubber material serving as the base material of the rubber roll to the surface, and the seeped components may adhere to the film or printed circuit board, causing dielectric breakdown.

[0005] Furthermore, in the case of the metal roll, metal ions may leach out from inside the metal substrate, causing problems due to the leachable metal ions (for example, in the production of a positive electrode plate for a lithium-ion secondary battery, when an active material is applied to a current collector, the leachable metal ions may adhere to the current collector, causing a decrease in battery performance).In the case of a resin roll, components such as a dispersant may seep out from inside the resin substrate, and the leachable components may cause the problems.

[0006] In addition to metal rolls, resin rolls, and rubber rolls, there are also rolls (plated rolls) that have a plated layer on their surface by plating treatment. However, even in the case of plated rolls, it is not possible to prevent components from seeping out from inside the rubber or resin material or metal ions from eluting from the metal (hereinafter, these are referred to as "exposed components," and the exudation of components from rubber or resin and the elution of metal ions from metal are referred to as "exposure"), and similar problems may occur.

[0007] Furthermore, the above-mentioned problem is not limited to rolls, but can occur with any shape of member, such as a sheet-like member, a plate-like member, or a belt-like member.

[0008] The present invention has been made in view of the above circumstances, and the problem to be solved is to provide a SiO 2 coating that can prevent various problems caused by components that ooze out from rubber or resin. X The object of the present invention is to provide a substrate provided with a layer. [Means for solving the problem]

[0009] The present invention relates to SiO X The layer-containing substrate is a substrate containing an exposing component, Gago The substrate is made of rubber or resin, and the surface layer, including the inside, of the substrate is , suppressing release of components from rubber or resin substrates SiO X Equipped with layers Huh, SiO X The layer was configured to be the outermost layer with no other layers around it. It is something. [Effects of the Invention]

[0010] SiO of the present invention X The substrate having a layer is formed by coating the surface of the substrate with SiO X Because it has a layer, it is possible to suppress the seepage of components from inside the base material and the elution of metal ions, thereby eliminating various problems caused by seeped components and eluted metal ions. [Brief explanation of the drawings]

[0011] [Figure 1]FIG. 1(a) is a cross-sectional view showing an example of a substrate having an SiOX layer of the present invention, and FIG. 1(b) is an enlarged view of part Ib in FIG. [Figure 2] FIG. 1 is a schematic diagram showing an example of an apparatus used to form a SiOX layer. [Figure 3] 1(a) is a cross-sectional view showing another example of a substrate having an SiOX layer of the present invention, and FIG. 1(b) is a cross-sectional view showing another example of a substrate having an SiOX layer of the present invention. DETAILED DESCRIPTION OF THE INVENTION

[0012] (Embodiment) The present invention relates to SiO X An example of an embodiment of a substrate having a layer will be described with reference to the drawings. X As an example, the case where the layer-containing substrate is a rubber roll is taken as an example. X The layer-equipped substrate is a rubber substrate 1 having a surface layer of SiO X It has layer 2.

[0013] The rubber substrate 1 is a part that becomes the base material of the rubber roll. For the rubber substrate 1, for example, general-purpose rubbers such as ethylene propylene diene rubber (EPDM), styrene butadiene rubber (SBD), nitrile rubber (NBR), chloroprene rubber (CR), butyl rubber (IIR), urethane rubber (U), silicone rubber (Si), and fluororubber (F) can be used.

[0014] The rubber substrate 1 in this embodiment is a hollow roll, and inside thereof is provided a core metal (hard tube) 3 that prevents deformation of the rubber substrate 1. The hard tube 3 may be, for example, a metal pipe, a carbon steel pipe, or a stainless steel pipe.

[0015] As shown in Figures 1(a) and 1(b), the rubber substrate 1 and hard tube 3 in this embodiment are mounted on the outside of a shaft 5 via bearings 4. In this case, the bearings 4 are preferably provided via metal flanges 6 embedded on both ends of the rubber substrate 1. The rubber substrate 1 may be a solid material. The rubber substrate 1 may also be in a shape other than a roll, such as a cylindrical, conical, flat, sheet, spherical, polygonal, rod, or belt shape.

[0016] The SiO X Layer 2 is amorphous SiO 2, which is a compound of silicon and oxygen. X A layer containing SiO2 (amorphous silicon layer), and typical examples include SiO2. X Layer 2 is formed on the surface of rubber substrate 1. The surface layer here means the area inside the surface of rubber substrate 1, but it also includes the case where it protrudes above the surface of rubber substrate 1 (is formed on the surface as a film).

[0017] In this embodiment, SiO X The thickness of the layer 2 is set to about 1 μm, but this thickness is an example, and the film thickness may be thicker or thinner than 1 μm. X The layer 2 penetrates into the surface of the rubber substrate 1, and the surface of the rubber substrate 1 is altered or modified.

[0018] SiO X The layer 2 can be produced, for example, using the apparatus shown in Fig. 2. In Fig. 2, 7 is a vacuum chamber, 8 is an RF high-frequency power supply, 9 is an RF electrode, 10 is a high-voltage pulse power supply, and 11 is a gas inlet. An ICP (Inductively Coupled Plasma) power supply can also be used instead of the RF high-frequency power supply 8.

[0019] The rubber substrate 1 is placed in the vacuum chamber 7, and the inside of the vacuum chamber 7 is evacuated. Next, a silicon-containing raw material gas (e.g., HMDSO, HMDS, TMS, etc.) is injected into the vacuum chamber 7 through the gas inlet 11. With the raw material gas injected into the vacuum chamber 7, a high frequency voltage is applied by the RF high frequency power supply 8, generating plasma. This causes the raw material gas in the vacuum chamber 7 to react, and the surface layer of the rubber substrate 1 is altered or modified, resulting in the formation of glassy SiO X Layer 2 is formed.

[0020] The raw materials HMDSO, HMDS, and TMS are not pure silicon (Si) gases but contain elements such as carbon (C) and hydrogen (H). X The structure may contain carbon, hydrogen, etc.

[0021] When supplying the source gas, helium (He) or argon (Ar) may be supplied at the same time to facilitate decomposition of the source gas. X To facilitate the formation of , oxygen (O2) can be supplied simultaneously with the source gas.

[0022] SiO using the apparatus shown in Figure 2 X When forming the layer 2, the RF output can be set in the range of 50 W to 3 kW with 500 W as the center.

[0023] (Other embodiments) In the above embodiment, the rubber substrate 1 is mounted on the outside of the shaft material 5 via a bearing 4 as an example, but as shown in Figure 3(a), the rubber substrate 1 can also be mounted on the outside of a core material 12 made of various materials such as metal or resin.

[0024] When a hard core material 12 is used, as shown in FIG. 3(b), the core material 12 is used as a base material, and SiO X Layer 2 can also be formed directly.

[0025] In the above embodiment, the rubber substrate 1 is in a roll shape as an example, but the rubber substrate 1 may also be in a shape other than a roll, such as a cylindrical shape, a cone shape, a flat plate shape, a sheet shape, a sphere shape, a polygonal shape, a rod shape, a belt shape, etc.

[0026] In the above embodiment, the base material 1 is a rubber base material, but the base material may be made of metal or resin. The base material may also be a metal base material, a resin base material, or a rubber base material with a plated layer on the outside (plated base material).

[0027] In the above embodiment, a silicon-containing source gas such as HMDSO, HMDS, or TMS is injected into the vacuum chamber 7 to form SiO X Although the case of forming layer 2 is taken as an example, if the substrate itself contains silicon, the source gas does not need to be injected. In this case, oxygen (O2) is used as a source gas, and argon (Ar), helium (He), or nitrogen (N) is generated as an excitation gas, and by using plasma, the silicon in the substrate reacts, and SiO X When nitrogen is used as the excitation gas, SiO X Although the structure contains nitrogen, this does not pose a problem.

[0028] As in the above embodiment, the surface layer of the substrate is made of SiO X The formation of layer 2 prevents the release of released components, thereby eliminating problems such as deterioration in quality due to release of released components (e.g., siloxane) on the film, and various other problems previously associated with released components.

[0029] In addition, conventional rubber rolls with high friction coefficients and adhesiveness have had problems such as wrinkles on thin objects such as films when they are treated. However, by using SiO X By forming the layer 2, the slipperiness and releasability are improved, and such problems are less likely to occur.

[0030] In addition, as in the above embodiment, the surface layer of the substrate is made of SiO X The formation of Layer 2 improves heat resistance, abrasion resistance, and release properties, thereby suppressing wear on the surface of the substrate due to friction. Furthermore, the generation of wear debris due to abrasion is reduced, making it less likely that electronic components such as films and printed circuit boards that come into contact with it will be soiled or damaged.

[0031] SiO in each of the above embodiments X As a substrate having a rubber layer, a SiO X By forming the layer 2, the sheet can be used as a guide roll, rolling roll, transport roll, coating roll, dry laminating roll, platen roll, etc. for films, printed circuit boards, glass substrates, etc. [Industrial Applicability]

[0032] The SiO of the surface layer of the rubber material of the present invention X The layer-provided substrate can be widely used in various production lines such as film production lines and semiconductor production lines, as well as rollers used in various office machines such as printers and multifunction machines, and various other shaped components. [Explanation of symbols]

[0033] 1. Rubber substrate 2SiO X layer (amorphous silicon layer) 3 Hard tube 4 bearings 5 Shaft material 6 flange 7. Vacuum Chamber 8 RF high frequency power supply 9 RF electrode 10 High voltage pulse power supply 11 Gas inlet 12 Core material

Claims

[Claim 1] A substrate containing an exudative component, the substrate is made of rubber or resin, The surface layer of the substrate, including the inner side of the surface, is provided with SiO that suppresses release of components released from the rubber or resin substrate. Ｘ comprising a layer, The SiO x layer is an outermost layer with no other layers present on the outside. SiO Ｘ Base material with layers.

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