Gas laser device and method for manufacturing electronic device

Abstract

This gas laser apparatus comprises: a chamber device that comprises an electrode in the inside thereof in which laser gas is sealed, and that outputs, to the outside via a window, light which is produced from the laser gas by application of a voltage to the electrode; a mirror that is disposed outside of the chamber device and that reflects at least some of the light emitted via the window; a holding part that holds the mirror; a support member that supports the holding part in a moveable manner along a plane perpendicular to the optical axis of the light emitted via the window; a movement mechanism that moves the holding part with respect to the support member, along the plane; and an angle maintaining mechanism that maintains, at a prescribed angle, the angle of inclination of the holding part with respect to the support member.

Description

[Technical Field]

[0001] The present disclosure relates to gas laser apparatus and methods for manufacturing electronic devices. [Background technology]

[0002] In recent years, semiconductor exposure devices have been required to improve their resolution in response to the miniaturization and high integration of semiconductor integrated circuits. To this end, the wavelength of light emitted from exposure light sources has been shortened. For example, KrF excimer laser devices, which output laser light with a wavelength of approximately 248.0 nm, and ArF excimer laser devices, which output laser light with a wavelength of approximately 193.4 nm, are used as gas laser devices for exposure.

[0003] The spectral linewidth of the spontaneously oscillating light of KrF excimer laser devices and ArF excimer laser devices is as wide as 350 pm to 400 pm. Therefore, if a projection lens is constructed using a material that transmits ultraviolet light, such as KrF and ArF laser light, chromatic aberration may occur. As a result, resolution may decrease. Therefore, it is necessary to narrow the spectral linewidth of the laser light output from the gas laser device to a level where chromatic aberration is negligible. Therefore, a line narrowing module (LNM) containing a line narrowing element (e.g., an etalon or a grating) may be installed inside the laser resonator of the gas laser device to narrow the spectral linewidth. Hereinafter, a gas laser device with a narrowed spectral linewidth is referred to as a line narrowing gas laser device. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Publication No. 11-330592 [Patent Document 2] Japanese Utility Model Application Publication No. 3-73474 [Patent Document 3] Summary of Japanese Patent Application Publication No. 10-144987

[0005] A gas laser device according to one aspect of the present disclosure may include a chamber device having an electrode inside which laser gas is sealed, and which emits light generated from the laser gas to the outside through a window when a voltage is applied to the electrode; a mirror arranged outside the chamber device and which reflects at least a portion of the light emitted through the window; a holding unit which holds the mirror; a support member which supports the holding unit so that it can move along a plane perpendicular to the optical axis of the light emitted through the window; a moving mechanism which moves the holding unit along the plane relative to the support member; and an angle maintaining mechanism which maintains the tilt angle of the holding unit relative to the support member at a predetermined angle.

[0006] A method for manufacturing an electronic device according to one aspect of the present disclosure may include generating laser light using a gas laser apparatus including: a chamber apparatus having an electrode inside which laser gas is sealed, and which emits light generated from the laser gas to the outside through a window when a voltage is applied to the electrode; a mirror arranged outside the chamber apparatus and which reflects at least a portion of the light emitted through the window; a holding unit which holds the mirror; a support member which supports the holding unit so that it can move along a plane perpendicular to the optical axis of the light emitted through the window; a moving mechanism which moves the holding unit along the plane relative to the support member; and an angle maintaining mechanism which maintains the tilt angle of the holding unit relative to the support member at a predetermined angle; outputting the laser light to an exposure apparatus; and exposing the laser light onto a photosensitive substrate in the exposure apparatus to manufacture an electronic device. [Brief explanation of the drawings]

[0007] Some embodiments of the present disclosure will now be described, by way of example only, with reference to the accompanying drawings, in which: [Figure 1] FIG. 1 is a schematic diagram showing an example of the overall configuration of an electronic device manufacturing apparatus. [Figure 2] FIG. 2 is a schematic diagram showing an example of the overall configuration of a gas laser device of a comparative example. [Figure 3] FIG. 3 is a front view of an output-side holding unit of a comparative example. [Figure 4]4 is a side view of the output-side holding unit shown in FIG. [Figure 5] FIG. 5 is a front view of the output coupling mirror. [Figure 6] FIG. 6 is a front view of the output side holding unit according to the first embodiment. [Figure 7] 7 is a side view of the output-side holding unit shown in FIG. 6. FIG. [Figure 8] FIG. 8 is a side view of the output side holding unit of the second embodiment. [Figure 9] FIG. 9 is a diagram showing the relative positional relationship between the output coupling mirror and the irradiation spot in the second embodiment. [Figure 10] FIG. 10 is a diagram illustrating an example of a control flowchart according to the second embodiment. [Figure 11] FIG. 11 is a diagram showing the relative positional relationship between the output coupling mirror and the irradiation spot in the third embodiment. [Figure 12] FIG. 12 is a diagram illustrating a part of an example of a control flowchart according to the third embodiment. [Figure 13] FIG. 13 is a diagram showing the remaining part of an example of the control flowchart of the third embodiment. Embodiment

[0008] 1. Explanation of the electronic device manufacturing equipment used in the exposure process of electronic devices 2. Description of the gas laser device of the comparative example 2.1 Configuration 2.2 Operation 2.3 Challenges 3. Description of the gas laser device of embodiment 1 3.1 Configuration 3.2 Operation 3.3 Actions and Effects 4. Description of the gas laser device of the second embodiment 4.1 Configuration 4.2 Operation 4.3 Actions and Effects 5. Description of the gas laser device of the third embodiment 5.1 Configuration 5.2 Operation 5.3 Actions and Effects

[0009] Hereinafter, embodiments of the present disclosure will be described in detail with reference to the drawings. The embodiments described below are examples of the present disclosure and are not intended to limit the scope of the present disclosure. Furthermore, not all of the configurations and operations described in each embodiment are necessarily essential to the configurations and operations of the present disclosure. Identical components are designated by the same reference numerals, and redundant descriptions will be omitted.

[0010] 1. Explanation of the electronic device manufacturing equipment used in the exposure process of electronic devices FIG. 1 is a schematic diagram showing an example of the overall configuration of an electronic device manufacturing apparatus used in an exposure process for electronic devices. As shown in FIG. 1, the manufacturing apparatus used in the exposure process includes a gas laser apparatus 100 and an exposure apparatus 200. The exposure apparatus 200 includes an illumination optical system 210, which includes multiple mirrors 211, 212, and 213, and a projection optical system 220. The illumination optical system 210 illuminates a reticle pattern on a reticle stage RT with laser light incident from the gas laser apparatus 100. The projection optical system 220 reduces and projects the laser light transmitted through the reticle onto a workpiece (not shown) placed on a workpiece table WT. The workpiece is a photosensitive substrate such as a semiconductor wafer coated with photoresist. The exposure apparatus 200 synchronously translates the reticle stage RT and the workpiece table WT to expose the workpiece with laser light reflecting the reticle pattern. Semiconductor devices, which are electronic devices, can be manufactured by transferring a device pattern onto a semiconductor wafer using the exposure process described above.

[0011] 2. Description of the gas laser device of the comparative example 2.1 Configuration A gas laser device as a comparative example will be described. Note that the comparative example in the present disclosure is a configuration that the applicant recognizes as being known only by the applicant, and is not a publicly known example that the applicant acknowledges.

[0012] FIG. 2 is a schematic diagram showing an example of the overall configuration of gas laser device 100 of this embodiment. Gas laser apparatus 100 is, for example, an ArF excimer laser apparatus that uses a mixed gas containing argon (Ar), fluorine (F), and neon (Ne). This gas laser apparatus 100 outputs laser light with a center wavelength of approximately 193.4 nm. Note that gas laser apparatus 100 may be a gas laser apparatus other than an ArF excimer laser apparatus, such as a KrF excimer laser apparatus that uses a mixed gas containing krypton (Kr), F, and Ne. In this case, gas laser apparatus 100 emits laser light with a center wavelength of approximately 248.0 nm. A mixed gas containing Ar, F, and Ne as a laser medium, or a mixed gas containing Kr, F, and Ne as a laser medium, is sometimes called a laser gas. Note that helium (He) may be used instead of Ne in the mixed gas used in each of the ArF excimer laser apparatus and the KrF excimer laser apparatus.

[0013] The gas laser device 100 of this example mainly comprises a housing 110, a laser oscillator 130 which is a master oscillator arranged in the internal space of the housing 110, an optical transmission unit 141, an amplifier 160 which is a power oscillator, a detection unit 153, a display unit 180, a processor 190, a laser gas exhaust device 701, and a laser gas supply device 703.

[0014] The laser oscillator 130 includes a chamber device CH1, a charger 41, a pulse power module 43, a line narrowing module 60, and an output coupling mirror 70 as its main components.

[0015] 2 shows the internal configuration of the chamber apparatus CH1 as viewed from a direction substantially perpendicular to the traveling direction of the laser light. The chamber apparatus CH1 mainly comprises a housing 30, a pair of windows 31a and 31b, a pair of electrodes 32a and 32b, an insulating section 33, a feedthrough 34, and an electrode holder section 36.

[0016] The laser gas is supplied to the interior space of housing 30 from laser gas supply device 703 via piping, and the laser gas is sealed in the interior space. The interior space is where light is generated by excitation of the laser medium in the laser gas. This light travels to windows 31a and 31b.

[0017] Window 31a is arranged on the front wall of housing 30 in the traveling direction of the laser light from gas laser apparatus 100 to exposure apparatus 200, and window 31b is arranged on the rear wall of housing 30 in the traveling direction. Windows 31a and 31b are inclined to form a Brewster angle with respect to the traveling direction of the laser light so as to suppress reflection of P-polarized laser light. The exit surfaces of windows 31a and 31b are flat.

[0018] The electrodes 32a and 32b are disposed opposite each other in the internal space of the housing 30, and the longitudinal direction of the electrodes 32a and 32b is aligned with the direction of travel of light generated by a high voltage applied between the electrodes 32a and 32b. The space between the electrodes 32a and 32b in the housing 30 is sandwiched between the windows 31a and 31b. The electrodes 32a and 32b are discharge electrodes for exciting the laser medium by glow discharge. In this example, the electrode 32a is the cathode, and the electrode 32b is the anode.

[0019] The electrode 32a is supported by an insulating part 33. The insulating part 33 closes an opening formed in the housing 30. The insulating part 33 includes an insulator. A feedthrough 34 made of a conductive member is also disposed in the insulating part 33. The feedthrough 34 applies a voltage supplied from a pulse power module 43 to the electrode 32a. The electrode 32b is supported by an electrode holder part 36 and is electrically connected to the electrode holder part 36.

[0020] Charger 41 is a DC power supply device that charges a capacitor (not shown) provided inside PPM 43 at a predetermined voltage. Charger 41 is located outside housing 30 and connected to PPM 43. PPM 43 includes a switch (not shown) controlled by processor 190. When the switch is turned on by this control, PPM 43 boosts the voltage applied from charger 41 to generate a pulsed high voltage and applies this high voltage to electrodes 32a and 32b. When the high voltage is applied, a discharge occurs between electrodes 32a and 32b. The energy of this discharge excites the laser medium inside housing 30. When the excited laser gas transitions to the ground state, light is emitted. The emitted light passes through windows 31a and 31b and exits housing 30.

[0021] The line narrowing module 60 includes a housing 65, a prism 61, a grating 63, and a rotation stage (not shown) that are arranged in the internal space of the housing 65. An opening is formed in the housing 65, and the housing 65 is connected to the rear side of the housing 30 via the opening.

[0022] The prism 61 expands the beam width of light emitted from the window 31b and makes the light incident on the grating 63. The prism 61 also reduces the beam width of light reflected from the grating 63 and returns the light to the internal space of the housing 30 via the window 31b. The prism 61 is supported by a rotation stage and rotates by the rotation stage. The rotation of the prism 61 changes the angle of incidence of the light with respect to the grating 63. Therefore, by rotating the prism 61, it is possible to select the wavelength of the light returning from the grating 63 via the prism 61 to the housing 30. Although FIG. 2 shows an example in which one prism 61 is arranged, it is sufficient that at least one prism is arranged.

[0023] The surface of the grating 63 is made of a highly reflective material and has numerous grooves formed at regular intervals on the surface. The grating 63 is a dispersive optical element. The cross-sectional shape of each groove is, for example, a right-angled triangle. Light incident on the grating 63 from the prism 61 is reflected by these grooves and diffracted in a direction according to the wavelength of the light. The grating 63 is arranged in a Littrow configuration so that the angle of incidence of the light incident on the grating 63 from the prism 61 matches the angle of diffraction of the diffracted light of the desired wavelength. This allows light of a wavelength near the desired wavelength to be returned to the housing 30 via the prism 61.

[0024] The output coupling mirror 70 faces the window 31a, transmits a portion of the laser light emitted from the window 31a, and reflects the other portion back into the internal space of the housing 30 via the window 31a. The output coupling mirror 70 is fixed to a holder (not shown), and is disposed in the internal space of the housing 110.

[0025] The grating 63 and the output coupling mirror 70, which are provided on either side of the housing 30, form a Fabry-Perot resonator, and the housing 30 is disposed on the optical path of the resonator.

[0026] The optical transmission unit 141 mainly includes high-reflection mirrors 141b and 141c. The high-reflection mirrors 141b and 141c are fixed to holders (not shown) with their respective tilt angles adjusted, and are arranged in the internal space of the housing 110. The high-reflection mirrors 141b and 141c highly reflect the laser light. The high-reflection mirrors 141b and 141c are arranged on the optical path of the laser light from the output coupling mirror 70. The laser light is reflected by the high-reflection mirrors 141b and 141c and travels to the rear mirror 371 of the amplifier 160. At least a portion of this laser light is transmitted through the rear mirror 371.

[0027] The amplifier 160 amplifies the energy of the laser beam output from the laser oscillator 130. The basic configuration of the amplifier 160 is generally the same as that of the laser oscillator 130. To distinguish the components of the amplifier 160 from those of the laser oscillator 130, the chamber device, housing, pair of windows, pair of electrodes, insulator, feedthrough, electrode holder, charger, pulsed power module, and output coupling mirror of the amplifier 160 will be described as a chamber device CH3, housing 330, pair of windows 331a and 331b, pair of electrodes 332a and 332b, insulator 333, feedthrough 334, electrode holder 336, charger 341, pulsed power module 343, and output coupling mirror 370. The electrodes 332a and 332b generate a discharge for amplifying the laser beam from the laser oscillator 130. The pulsed power module 343 is a voltage application circuit similar to the pulsed power module 43.

[0028] Furthermore, amplifier 160 differs from laser oscillator 130 in that it does not include line narrowing module 60, but includes rear mirror 371, support member 400, output side holding unit 500, and rear side holding unit 600.

[0029] The rear mirror 371 is provided between the high-reflection mirror 141c and the window 331b and faces them. The rear mirror 371 transmits a portion of the laser light from the laser oscillator 130 toward the space between the electrodes 332a and 332b, and reflects a portion of the laser light amplified by the electrodes 332a and 332b toward the space between the electrodes 332a and 332b.

[0030] Output coupling mirror 370 is provided between window 331a and beam splitter 153b and faces them. Output coupling mirror 370 reflects a portion of the laser light amplified and emitted by electrodes 332a, 332b toward the space between electrodes 332a, 332b, and transmits a portion of the laser light toward detector 153. For this reason, the surface of output coupling mirror 370 facing window 331a is coated with a partially reflective film having a predetermined reflectivity. Hereinafter, the surface of output coupling mirror 370 coated with the partially reflective film will be referred to as the main surface.

[0031] The output coupling mirror 370 has a circular shape, and the surface facing the window 331a and the surface opposite thereto are flat. The rear mirror 371 and the output coupling mirror 70 have the same configuration as the output coupling mirror 370.

[0032] The rear mirror 371 and output coupling mirror 370, which are provided on either side of the housing 330, form a resonator in which the laser light amplified by the electrodes 332a and 332b resonates. The housing 330 is disposed on the optical path of the resonator, and the laser light emitted from the housing 330 travels back and forth between the rear mirror 371 and the output coupling mirror 370. The traveling laser light is amplified each time it passes through the laser gain space between the electrodes 332a and 332b. A portion of the amplified laser light passes through the output coupling mirror 370.

[0033] Support member 400 is a flat plate that is longer than housing 330 and extends in the traveling direction of the laser light. One end of support member 400 is located closer to beam splitter 153b (described later) of detector 153 than window 331a, and the other end of support member 400 is located closer to high-reflection mirror 141c than window 331b.

[0034] The output-side holding unit 500 is disposed at one end of the support member 400 and holds the output coupling mirror 370, while the rear-side holding unit 600 is disposed at the other end of the support member 400 and holds the rear mirror 371. By the support member 400, the output-side holding unit 500, and the rear-side holding unit 600, the output coupling mirror 370 is positioned between the window 331a and the beam splitter 153b, and the rear mirror 371 is positioned between the window 331b and the high-reflection mirror 141c. The output coupling mirror 370 and the rear mirror 371 are positioned relative to each other by the support member 400, the output-side holding unit 500, and the rear-side holding unit 600. The output-side holding unit 500 and the rear-side holding unit 600 will be described later. The laser light passing through the output coupling mirror 370 travels to the detection unit 153.

[0035] The detection unit 153 mainly includes a beam splitter 153b and an optical sensor 153c.

[0036] Beam splitter 153b is disposed on the optical path of the laser light passing through output coupling mirror 370. Beam splitter 153b transmits the laser light passing through output coupling mirror 370 to output window 173 with high transmittance, and also reflects a portion of the laser light toward the light receiving surface of optical sensor 153c.

[0037] Optical sensor 153c measures the pulse energy of the laser light incident on the light-receiving surface of optical sensor 153c. Optical sensor 153c is electrically connected to processor 190 and outputs a signal indicating the measured pulse energy to processor 190. Processor 190 controls the voltage applied to electrodes 32a and 32b of amplifier 160 based on the signal.

[0038] An exit window 173 is provided on the opposite side of the output coupling mirror 370 with respect to the beam splitter 153b of the detection unit 153. The exit window 173 is provided on the wall of the housing 110. The light that passes through the beam splitter 153b is emitted from the exit window 173 to the exposure device 200 outside the housing 110. This laser light is, for example, pulsed laser light with a center wavelength of 193.4 nm.

[0039] The internal space of the housing 30, 330 is filled with a purge gas. The purge gas contains an inert gas such as high-purity nitrogen in which impurities such as oxygen have been reduced. The purge gas is supplied to the internal space of the housing 30, 330 from a purge gas supply source (not shown) located outside the housing 110 through piping (not shown).

[0040] The display unit 180 is a monitor that displays the state of control by the processor 190 based on a signal from the processor 190 .

[0041] The processor 190 of the present disclosure is a processing device including a storage device in which a control program is stored and a CPU (Central Processing Unit) that executes the control program. The processor 190 is specially configured or programmed to execute various processes included in the present disclosure. The processor 190 also controls the entire gas laser apparatus 100. The processor 190 is also electrically connected to an exposure processor (not shown) of the exposure apparatus 200, and transmits and receives various signals to and from the exposure processor.

[0042] Laser gas exhaust device 701 and laser gas supply device 703 are electrically connected by processor 190. Laser gas exhaust device 701 includes an exhaust pump (not shown), and exhausts laser gas from the internal space of housing 30, 330 via piping by suction of the exhaust pump in response to a control signal from processor 190. Laser gas supply device 703 supplies laser gas from a laser gas supply source (not shown) located outside housing 110 to the internal space of housing 30, 330 via piping in response to a control signal from processor 190.

[0043] Next, the output side holding unit 500 will be described. Fig. 3 is a front view of a comparative example of an output side holding unit 500. Fig. 4 is a side view of the output side holding unit 500 shown in Fig. 3.

[0044] The output-side holding unit 500 includes a holding portion 510 that holds the output coupling mirror 370, a base member 520 on which the holding portion 510 is disposed, a support member 530 that supports the holding portion 510 via the base member 520, and an angle maintaining mechanism 540. For ease of viewing, the support member 530 is not shown in FIG. 3 .

[0045] The holding unit 510 includes a main body 511 that holds the output coupling mirror 370, and a mounting plate 513 to which the main body 511 is attached and which is disposed on the base member 520. For ease of viewing, the holding unit 510 is illustrated in a simplified manner in FIG. 2, and the main body 511 and the mounting plate 513 are not illustrated.

[0046] Main body 511 is provided with through-hole 511a. Through-hole 511a includes circular large-diameter portion 511b and circular small-diameter portion 511c, with large-diameter portion 511b being located closer to window 331a than small-diameter portion 511c and communicating with small-diameter portion 511c. Large-diameter portion 511b has a larger diameter than small-diameter portion 511c, and large-diameter portion 511b is approximately the same size as output coupling mirror 370, which is disposed in large-diameter portion 511b. Light from output coupling mirror 370 or light directed toward output coupling mirror 370 passes through small-diameter portion 511c.

[0047] 5 is a front view of output coupling mirror 370. Effective area 370a of output coupling mirror 370, which overlaps with small diameter portion 511c, is a circular area illuminated with light from window 331a. In addition, non-effective area 370b is provided outside effective area 370a of output coupling mirror 370, and non-effective area 370b is a ring-shaped area that overlaps with the step surface between large diameter portion 511b and small diameter portion 511c and does not transmit light.

[0048] The light traveling from the window 331a to the output coupling mirror 370 illuminates only a portion of the effective area 370a of the output coupling mirror 370, rather than the entire effective area 370a. Therefore, the illumination spot S of the light in the effective area 370a is smaller than the effective area 370a. The shape of the illumination spot S is formed by a mask (not shown) disposed between the window 331a and the output coupling mirror 370. The mask is, for example, a plate-shaped member having a rectangular aperture that transmits part of the laser light and blocks the other part of the laser light. The shape of the aperture is not limited. The aperture is smaller than the circular effective area 370a of the output coupling mirror 370, and the short and long sides of the rectangular aperture are smaller than the diameter of the effective area 370a. When the laser light passes through the aperture, the rectangular light travels to the output coupling mirror 370, and the illumination spot S of the light in the effective area 370a becomes rectangular due to the aperture. The short and long sides of the irradiation spot S are smaller than the diameter of the effective area 370a.

[0049] The mounting plate 513, the base member 520, and the support member 530 are flat plates. When viewed from the front, the mounting plate 513 is larger than the main body 511 and smaller than the base member 520, which is smaller than the support member 530. The main body 511 is fixed to the mounting plate 513, and the mounting plate 513 is fixed to the base member 520 with screws (not shown). The main body 511 is replaceable with respect to the mounting plate 513, and the mounting plate 513 is replaceable with respect to the base member 520.

[0050] Circular through-holes 513a, 520a, and 530a are provided in the mounting plate 513, the base member 520, and the support member 530, respectively. The through-hole 513a in the mounting plate 513 communicates with the small diameter portion 511c of the main body 511 and the through-hole 520a in the base member 520, and the through-hole 520a in the base member 520 communicates with the through-hole 530a in the support member 530. Light passes through the through-holes 513a, 520a, and 530a in the same way as through-hole 511a.

[0051] A base member 520 is disposed on one of the main surfaces of the support member 530. This main surface is approximately perpendicular to the optical axis of the laser light emitted from the window 331a and to the extension direction of the support member 400. The support member 530 is long in a direction approximately perpendicular to the extension direction of the support member 400. The holder 510 and the base member 520 are disposed on one end side of the main surface of the support member 530. The other end of the support member 530 opposite to the holder 510 side is fixed to one end of the support member 400.

[0052] The angle maintaining mechanism 540 maintains the tilt angle of the holder 510 relative to the support member 530 at a predetermined angle. The angle maintaining mechanism 540 uses, for example, a plurality of adjustment screws 541. The adjustment screws 541 are threaded into threaded holes in the base member 520, and their tips engage with the support member 530. As a result, the support member 530 supports the holder 510 via the base member 520. The tilt of the base member 520 relative to the support member 530 is adjusted by adjusting the amount of threading of each adjustment screw 541. Therefore, the tilt of the holder 510 relative to the support member 530 is adjusted, and the tilt angle of the main surface of the output coupling mirror 370 relative to the support member 530 is adjusted and maintained at a predetermined angle. The predetermined angle may be, for example, the angle at which the energy of the laser light emitted from the gas laser device 100 is highest. In this case, for example, the main surface of output coupling mirror 370 irradiated with light from window 331a and the main surfaces of mounting plate 513 and base member 520 are approximately perpendicular to the optical axis of the light.

[0053] The configuration of the angle maintaining mechanism 540 is not limited to the adjustment screw 541, and a gimbal mechanism, a kinematic mount, or the like may also be used.

[0054] As shown in FIG. 2, the base member 520 and the support member 530 are provided on the opposite side of the output coupling mirror 370 from the window 331a.

[0055] The rear side holding unit 600 has the same configuration as the output side holding unit 500 except that it holds the rear mirror 371, and therefore a description thereof will be omitted.

[0056] 2.2 Operation Next, the operation of the gas laser device 100 of the comparative example will be described.

[0057] Before gas laser device 100 emits laser light, laser gas is supplied to the internal space of housing 30 from laser gas supply device 703. Furthermore, angle maintaining mechanism 540 maintains the tilt angle of the main surface of output coupling mirror 370 relative to support member 530 at a predetermined angle by adjusting the amount of screwing of adjustment screw 541.

[0058] When the gas laser apparatus 100 emits laser light, the processor 190 receives a signal indicating the target energy Et and a light emission trigger signal from an exposure processor (not shown) of the exposure apparatus 200. The target energy Et is the target value of the laser light energy used in the exposure process. The processor 190 sets a predetermined charging voltage in the charger 41 so that the energy E becomes the target energy Et and turns on the pulse power module 43 in synchronization with the light emission trigger signal. This causes the pulse power module 43 to generate a pulsed high voltage from the electrical energy stored in the charger 41, and the high voltage is applied between the electrodes 32a and 32b. When the high voltage is applied, a discharge occurs between the electrodes 32a and 32b, exciting the laser medium contained in the laser gas between the electrodes 32a and 32b. The laser medium emits light when it returns to its ground state. The emitted light resonates between the grating 63 and the output coupling mirror 70 and is amplified each time it passes through a discharge space within the internal space of the housing 30, resulting in laser oscillation. A part of the laser light passes through the output coupling mirror 70, is reflected by the high-reflection mirrors 141b and 141c, passes through the rear mirror 371 and the window 31b, and travels into the housing 330.

[0059] Processor 190 turns on the switch of pulse power module 343 so that discharge occurs when laser light from laser oscillator 130 travels into the discharge space in housing 330. Processor 190 controls pulse power module 343 so that a high voltage is applied to electrodes 332a and 332b after a predetermined delay time has elapsed since the switch of pulse power module 343 was turned on.

[0060] As a result, the laser light incident on amplifier 160 is amplified and oscillates in amplifier 160. Furthermore, the laser light that has traveled into the internal space of housing 330 passes through windows 331a and 331b as described above and travels to rear mirror 371 and output coupling mirror 370. In this way, laser light of a predetermined wavelength travels back and forth between rear mirror 371 and output coupling mirror 370. The laser light is amplified each time it passes through the discharge space inside housing 330, causing laser oscillation, and part of the laser light becomes amplified laser light.

[0061] Furthermore, the amplified laser light from amplifier 160 passes through output coupling mirror 370 and travels to beam splitter 153b.

[0062] A portion of the amplified laser light that travels to the beam splitter 153b passes through the beam splitter 153b and the exit window 173 and travels to the exposure device 200, and the other portion is reflected by the beam splitter 153b and travels to the optical sensor 153c.

[0063] The optical sensor 153c receives the amplified laser beam and measures the energy E of the received amplified laser beam. The optical sensor 153c outputs a signal indicating the measured energy E to the processor 190. The processor 190 feedback-controls the charging voltage of the charger 41, 341 so that the difference ΔE between the energy E and the target energy Et falls within an allowable range. The laser beam whose difference ΔE falls within the allowable range passes through the beam splitter 153b and the exit window 173 and enters the exposure apparatus 200.

[0064] 2.3 Challenges In the amplifier 160 of the comparative example, the output coupling mirror 370 is fixed and does not move, so the irradiation spot S irradiates one point in the effective area 370a, and the light is concentrated on the output coupling mirror 370. The higher the intensity of the light, the faster the output coupling mirror 370 deteriorates. While the above description has been given using the output coupling mirror 370, the rear mirror 371 of the amplifier 160 and the output coupling mirror 70 of the laser oscillator 130 also deteriorate in the same manner as the output coupling mirror 370 of the amplifier 160. If mirrors such as the output coupling mirror 370 of the amplifier 160, the rear mirror 371 of the amplifier 160, and the output coupling mirror 70 of the laser oscillator 130 deteriorate quickly, the mirrors will need to be replaced more frequently, which may reduce the availability of the gas laser device 100.

[0065] Therefore, in the following embodiment, a gas laser device capable of suppressing a decrease in the operating rate is exemplified.

[0066] 3. Description of the gas laser device of embodiment 1 Next, a gas laser device 100 according to the first embodiment will be described. The same components as those described above are designated by the same reference numerals, and redundant descriptions will be omitted unless otherwise specified. In addition, in some of the drawings, some components are omitted or simplified for clarity.

[0067] 3.1 Configuration FIG. 6 is a front view of the output-side holding unit 500 of this embodiment. FIG. 7 is a side view of the output-side holding unit 500 shown in FIG. 6. FIG. 7 shows a cross section of a portion of the case 555. The configuration of the output-side holding unit 500 of this embodiment differs from the configuration of the output-side holding unit 500 of the comparative example in the following respects. In the output-side holding unit 500 of this embodiment, the support member 530 supports the holding part 510 so that it can move along a plane perpendicular to the optical axis of light emitted to the outside from the window 331a. The output-side holding unit 500 further includes a movement mechanism 550 that moves the holding part 510 along the plane relative to the support member 530.

[0068] The movement mechanism 550 includes a guide unit 551 , cylinders 553 a and 553 b , and a case 555 .

[0069] The guide unit 551 guides the linear movement of the holder 510 in a direction along the above-mentioned plane, i.e., in a direction along the support member 530. Here, the direction along the plane is a direction along the short side of the rectangular irradiation spot S, but it may be a direction along the long side of the irradiation spot S. The guide unit 551 is a linear guide. In this case, the guide unit 551 includes a rail provided in the groove 521 of the base member 520, and a slider that is disposed on the back surface of the mounting plate 513 so as to straddle the rail and slides on the rail. The groove 521 and the guide unit 551 are provided so as not to overlap with the through holes 513a and 520a.

[0070] The cylinders 553a and 553b sandwich the mounting plate 513 from both sides in the movement direction of the holder 510. The shafts of the cylinders 553a and 553b extend in the movement direction of the holder 510, with the tip of the shaft of the cylinder 553a connected to a side of the mounting plate 513 and the tip of the shaft of the cylinder 553b connected to the side of the mounting plate 513 opposite the side. The cylinders 553a and 553b are electrically connected to the processor 190, and the mounting plate 513 is pushed and pulled by movement of each shaft under the control of the processor 190. Specifically, the cylinders 553a and 553b are linked to each other, and each shaft moves in the longitudinal direction. In this case, the cylinder 553a pushes the mounting plate 513 via its shaft while the cylinder 553b pulls the mounting plate 513 via its shaft, or the cylinder 553a pulls the mounting plate 513 via its shaft while the cylinder 553b pushes the mounting plate 513 via its shaft. The pushing amount of cylinder 553a is the same as the pulling amount of cylinder 553b, and the pulling amount of cylinder 553a is the same as the pushing amount of cylinder 553b, and the pushing amount of cylinder 553a and the pulling amount of cylinder 553a are the movement amount of holder 510. Note that cylinders 553a and 553b are not connected to processor 190, and mounting plate 513 may be moved by an administrator of gas laser apparatus 100 operating cylinders 553a and 553b. In this case, cylinder 553a is provided with a spring (not shown) that expands and contracts in the movement direction of holder 510. When the spring expands, cylinder 553a pushes mounting plate 513, and cylinder 553b pulls mounting plate 513. When the spring contracts, cylinder 553a pulls mounting plate 513, and cylinder 553b pushes mounting plate 513. The tip of each of the shafts of the cylinders 553a and 553b may be connected to the side of the main body 511. When the holder 510 is moved by the cylinders 553a and 553b, the output coupling mirror 370 moves via the holder 510.

[0071] The case 555 is disposed on the support member 530 and encloses the main body 511, mounting plate 513, and base member 520 of the output-side holding unit 500. The top surface of the case 555 is open, and when the case 555 is viewed from the front, the opening 555a of the case 555 is arranged to overlap the output coupling mirror 370 whether the output coupling mirror 370 moves or remains stationary. Therefore, light from the window 331a passes through the output coupling mirror 370 via the opening 555a. Cylinders 553a and 553b are fixed to the side surface of the case 555, and the axes of the cylinders 553a and 553b pass through the side surface of the case 555.

[0072] The angle maintaining mechanism 540 of this embodiment maintains the tilt angle of the holder 510 relative to the support member 530 at a predetermined angle regardless of the position of the holder 510 .

[0073] 3.2 Operation First, the processor 190 stops the chargers 41 and 341 and turns off the switches of the pulse power modules 43 and 343. Therefore, light emission is stopped. Next, the processor 190 causes the cylinders 553a and 553b to push and pull the mounting plate 513, moving the holder 510 along a plane perpendicular to the optical axis of the light emitted from the window 331a. In this case, the holder 510 moves in a direction along the short side of the rectangular irradiation spot S, and the moving direction is guided by the guide unit 551. The movement of the holder 510 also moves the output coupling mirror 370. At this time, even if the holder 510 and the output coupling mirror 370 move, the irradiation spot S does not move. The holder 510 moves within a range in which the irradiation spot S is within the effective area 370a and does not overlap with the non-effective area 370b. Due to the movement of holder 510 and output coupling mirror 370, the position of irradiation spot S within effective area 370a shifts compared to before holder 510 and output coupling mirror 370 were moved. It is sufficient that at least a portion of irradiation spot S after the movement shifts compared to the irradiation spot S before the movement. The operation of gas laser device 100 after the position of irradiation spot S shifts is the same as the operation described in the comparative example, and therefore a description thereof will be omitted. Similarly, even after output coupling mirror 370 is moved, the tilt angle of the main surface of output coupling mirror 370 with respect to support member 530 can be maintained at a predetermined angle by adjusting the screwing amount of adjustment screw 541 in angle maintenance mechanism 540.

[0074] 3.3 Actions and Effects Gas laser apparatus 100 of this embodiment includes a chamber device CH3 that includes electrodes 332a and 332b inside the chamber device CH3 and that emits light generated from the laser gas through a window 331a when a voltage is applied to electrodes 332a and 332b. Gas laser apparatus 100 also includes an output coupling mirror 370 that is disposed outside chamber apparatus CH3 and reflects a portion of the light that is emitted through window 331a, and a holder 510 that holds output coupling mirror 370. Gas laser apparatus 100 also includes a support member 530 that supports holder 510 so that the holder 510 is movable along a plane perpendicular to the optical axis of the light that is emitted through window 331a, a movement mechanism 550 that moves holder 510 along the plane relative to support member 530, and an angle maintenance mechanism 540 that maintains the tilt angle of holder 510 relative to support member 530 at a predetermined angle.

[0075] In the above configuration, the holder 510 is moved by the movement mechanism 550 relative to the support member 530 along a plane perpendicular to the optical axis of the light, and therefore the output coupling mirror 370 held by the holder 510 also moves. The movement of the output coupling mirror 370 shifts the position of the light irradiation spot S on the output coupling mirror 370. When the position of the irradiation spot S shifts, localized light irradiation on the output coupling mirror 370 can be suppressed compared to when the position of the irradiation spot S does not shift and the irradiation spot S is located at one location on the output coupling mirror 370, and deterioration of the output coupling mirror 370 can be suppressed. Suppressing deterioration of the output coupling mirror 370 extends the life of the output coupling mirror 370, suppressing an increase in the frequency of replacement of the output coupling mirror 370 and suppressing a decrease in the availability of the gas laser apparatus 100 due to replacement. Furthermore, in the above configuration, the angle maintenance mechanism 540 maintains the tilt angle of the holder 510 relative to the support member 530 at a predetermined angle. Therefore, even if output coupling mirror 370 moves, it is possible to suppress changes in the tilt angle due to the movement, which can reduce the frequency of angle adjustment accompanying the movement of output coupling mirror 370, and suppress a decrease in the availability of gas laser device 100 due to angle adjustment.

[0076] 4. Description of the gas laser device of the second embodiment Next, a gas laser device 100 according to a second embodiment will be described. The same components as those described above are designated by the same reference numerals, and redundant descriptions will be omitted unless otherwise specified. In addition, some components are omitted or simplified in some of the drawings for clarity.

[0077] 4.1 Configuration 8 is a side view of the output-side holding unit 500 of this embodiment. In the output-side holding unit 500 of this embodiment, the configuration of the movement mechanism 550 is different from the configuration of the movement mechanism 550 of Embodiment 1. The movement mechanism 550 of this embodiment includes an actuator 557 that moves the holding part 510 instead of the cylinders 553a and 553b.

[0078] The shaft of actuator 557 extends in the direction of movement of holding part 510, and the tip of the shaft of actuator 557 is connected to the side of mounting plate 513. Actuator 557 is electrically connected to processor 190, and the shaft moves in the longitudinal direction under the control of processor 190, pushing and pulling mounting plate 513 via the shaft. The power source of actuator 557 can be, for example, a stepping motor, but is not particularly limited to this.

[0079] 4.2 Operation Next, the operation of the processor 190 in this embodiment will be described. 9 is a diagram showing the relative positional relationship between output coupling mirror 370 of this embodiment and illumination spot S. In this embodiment, output coupling mirror 370 moves to three positions, position coordinates P1, P2, and P3, and the description will be given assuming that the movement of output coupling mirror 370 causes illumination spot S to move to three positions within effective area 370a. Note that output coupling mirror 370 may move to positions other than three.

[0080] In Figure 9, the illumination spots S when the output coupling mirror 370 moves to position coordinates P1, P2, and P3 are shown as illumination spots S1, S2, and S3, respectively. The illumination spots S1, S2, and S3 are the same size. For ease of viewing, the illumination spots S2 and S3 are shown with dashed lines. The illumination spots S1, S2, and S3 do not overlap each other and are located apart. For example, the right side of the illumination spot S1 and the left side of the illumination spot S2, and the left side of the illumination spot S1 and the right side of the illumination spot S3 are separated by at least the length of the short side of the illumination spot S1, preferably approximately three times that length.

[0081] At position coordinate P1, the center of illumination spot S1 overlaps the center of effective area 370a. At position coordinate P2, when output coupling mirror 370 is viewed from the front in FIG. 9, output coupling mirror 370 moves to the left of position coordinate P1, and the center of illumination spot S2 is located on the right side of effective area 370a. At position coordinate P3, when output coupling mirror 370 is viewed from the front, output coupling mirror 370 moves to the right of position coordinate P1, and the center of illumination spot S3 is located on the left side of effective area 370a. Illumination spot S3 is located on the opposite side of illumination spot S2 from illumination spot S1. Note that position coordinates P1, P2, and P3 may be located anywhere as long as at least a portion of illumination spot S before movement does not overlap illumination spot S after movement.

[0082] 10 is a diagram showing an example of a control flowchart of the processor 190 of this embodiment. The control flow of this embodiment includes steps SP11 to SP19.

[0083] In this embodiment, a parameter is stored in the storage device of the processor 190. The parameter is a position number X assigned to a destination position of the output coupling mirror 370. As there are three destination positions as described above, the destination positions of the output coupling mirror 370 are assigned position numbers X=1, X=2, and X=3, respectively. The position numbers X=1, X=2, and X=3 are associated with the above-mentioned position coordinates P1, P2, and P3.

[0084] 10, similarly to the first embodiment, the processor 190 stops the chargers 41 and 341 and turns off the switches of the pulse power modules 43 and 343. Therefore, light emission is stopped.

[0085] (Step SP11) In this step, processor 190 sets position number X to position number X=1 and reads position coordinate P1 of position number X=1 from the parameters. Next, processor 190 controls actuator 557 to move output coupling mirror 370 to position coordinate P1 via holder 510. Once output coupling mirror 370 has moved to position coordinate P1, processor 190 controls actuator 557 to stop output coupling mirror 370 via holder 510, and the flow proceeds to step SP12.

[0086] (Step SP12) In this step, the processor 190 sets the number N of shots of the amplified laser light received by the optical sensor 153c to zero.

[0087] (Step SP13) In this step, as described in the comparative example, processor 190 sets a predetermined charging voltage in chargers 41, 341 and turns on the switches of pulse power modules 43, 343. A portion of the amplified laser light from amplifier 160 passes through output coupling mirror 370 and travels to beam splitter 153b. A portion of the amplified laser light traveling to beam splitter 153b is reflected by beam splitter 153b and travels to optical sensor 153c. Optical sensor 153c receives the amplified laser light and outputs a signal indicating reception to processor 190. When input of this signal begins, processor 190 begins accumulating the number of times the signal has been received and proceeds to step SP14. Alternatively, optical sensor 153c receives the amplified laser light and begins measuring the number of shots N of the received amplified laser light. Optical sensor 153c outputs a signal indicating the measured number of shots N to processor 190 each time. When the input of the signal starts, processor 190 advances the flow to step SP14.

[0088] In this step, the output coupling mirror 370 is located at the position coordinate P1, and therefore the irradiation spot S1 overlaps the output coupling mirror 370.

[0089] (Step SP14) In this step, if the number of shots N is equal to or less than the threshold value Nth, the processor 190 repeats step SP14. If the number of shots N is greater than the threshold value Nth, the processor 190 advances the flow to step SP15. The threshold value Nth is input as a parameter to the storage device of the processor 190. The threshold value Nth is, for example, 20 billion pulse shots, but can be changed as appropriate.

[0090] (Step SP15) In this step, if the position number X is smaller than the position number X=3, the processor 190 advances the flow to step SP16. If the position number X is equal to or larger than the position number X=3, the processor 190 advances the flow to step SP19.

[0091] (Step SP16) In this step, processor 190 outputs a signal indicating a request to stop emitting light to exposure apparatus 200. After processor 190 outputs the signal to exposure apparatus 200, the flow proceeds to step SP17.

[0092] (Step SP17) In this step, if a signal indicating that light emission has stopped is not input from exposure apparatus 200 to processor 190, processor 190 returns the flow to step SP16. When a signal indicating that light emission has stopped is input from exposure apparatus 200 to processor 190, processor 190 stops chargers 41, 341 and turns off the switches of pulse power modules 43, 343. This stops light emission, and processor 190 advances the flow to step SP18.

[0093] Gas laser apparatus 100 is required to stably output the desired laser light for a long period of time. Long-term laser oscillation generates impurities inside housing 330 of chamber apparatus CH3. These impurities absorb the laser light or worsen the discharge state. Therefore, if impurities accumulate inside the housing of chamber apparatus CH3, the intensity of the laser light decreases, and the gas laser apparatus 100 may be unable to emit laser light that meets the performance requirements of exposure apparatus 200. In this case, in step SP17, processor 190 may exhaust the laser gas inside housing 330 of chamber apparatus CH3 using laser gas exhaust apparatus 701, and then supply new laser gas containing the laser medium into housing 330 using laser gas supply apparatus 703. In this case, processor 190 controls the gas exhaust by laser gas exhaust apparatus 701 and the gas supply by laser gas supply apparatus 703 so that the laser gas inside housing 330 of chamber apparatus CH3 is replaced while the voltage application is stopped. By replacing the laser gas, impurities are expelled from the inside of housing 330 along with the laser gas, and are reduced inside housing 330. When processor 190 confirms the input of a signal indicating the cessation of light emission regardless of the completion of laser gas replacement, it proceeds to step SP18.

[0094] (Step SP18) In this step, processor 190 adds 1 to current position number X and sets the resulting position number X as new position number X. Next, processor 190 controls actuator 557 to move output coupling mirror 370 via holder 510 to position coordinate PX corresponding to new position number X. If the flow proceeds to step SP18 for the first time, processor 190 reads position number X=2 from the parameters and moves output coupling mirror 370 to position coordinate P2. If the flow proceeds to step SP18 for the second time, processor 190 reads position number X=3 from the parameters and moves output coupling mirror 370 to position coordinate P3. Once output coupling mirror 370 has moved to position coordinates P2 and P3, processor 190 controls actuator 557 to stop output coupling mirror 370 at position coordinates P2 and P3 via holder 510, and returns the flow to step SP12. When output coupling mirror 370 is located at position coordinate P2, and the flow advances from step SP12 to step SP13, illumination spot S2 overlaps output coupling mirror 370. When output coupling mirror 370 is located at position coordinate P3, and the flow advances from step SP12 to step SP13, illumination spot S3 overlaps output coupling mirror 370. In this way, output coupling mirror 370 moves to three locations, and illumination spot S moves to three locations.

[0095] The movement of the output coupling mirror 370 in this step may be performed during the replacement of the laser gas, which has been described as an optional step in step SP17.

[0096] (Step SP19) In this step, the processor 190 outputs a signal indicating replacement of the output coupling mirror 370 to the display unit 180, and the display unit 180 notifies the replacement of the output coupling mirror 370. After outputting the signal to the display unit 180, the processor 190 ends the flow.

[0097] 4.3 Actions and Effects In the gas laser apparatus 100 of this embodiment, as described in steps SP11, SP18, and SP13, the processor 190 controls the actuator 557 to stop the output coupling mirror 370 at a first position via the holder 510, and then moves the output coupling mirror 370 from the first position to a second position and stops the output coupling mirror 370 at the second position. For example, the first position is the position coordinate P1, and the second position in this case is the position coordinate P2 different from the first position. Alternatively, the first position is the position coordinate P2, and the second position in this case is the position coordinate P3. The processor 190 controls the pulse power module 343 to apply voltages to the electrodes 332a and 332b after the output coupling mirror 370 has stopped at the first position and the second position.

[0098] In the above configuration, when a voltage is applied to electrodes 332a and 332b, light is generated, and the light irradiates output coupling mirror 370 stopped at the first position and output coupling mirror 370 stopped at the second position. Therefore, the irradiation spot S of the light irradiating output coupling mirror 370 is located at multiple positions. Therefore, multiple positions on output coupling mirror 370 can be used to emit light from gas laser apparatus 100, compared to when irradiation spot S is located at a single position. This also broadens the scope of use of output coupling mirror 370. Furthermore, in the above configuration, output coupling mirror 370 is moved by actuator 557, which reduces the burden on the administrator of gas laser apparatus 100 compared to when the administrator manually moves output coupling mirror 370. Furthermore, in the above configuration, after output coupling mirror 370 stops, voltage is applied to electrodes 332a and 332b, and light is emitted. Therefore, compared to when a voltage is applied to electrodes 332a and 332b while output coupling mirror 370 is moving and light is emitted, the impact on the performance of the laser light, such as the divergence angle of the laser light, due to fluctuations in the alignment of output coupling mirror 370 can be suppressed.

[0099] Furthermore, in the gas laser device 100 of this embodiment, as described in steps SP13 to SP17, after the output coupling mirror 370 stops at the first position and voltage is applied to the electrodes 332a and 332b, the processor 190 controls the pulse power module 343 to stop the application of voltage to the electrodes 332a and 332b during the period from when the output coupling mirror 370 starts to move from the first position to when it stops at the second position.

[0100] In the above configuration, light emission is stopped while output coupling mirror 370 moves from the first position to the second position and stops at the second position. In this case, maintenance of gas laser apparatus 100, such as replacement of laser gas inside housing 330 of chamber apparatus CH3, may be possible during the period when light emission is stopped.

[0101] Furthermore, in the gas laser device 100 of this embodiment, the processor 190 controls the laser gas exhaust device 701 and the laser gas supply device 703 so that the laser gas inside the chamber device CH3 is replaced while the voltage application is stopped and the light emission is stopped, as described in step SP17.

[0102] In the above configuration, the laser gas can be replaced before output coupling mirror 370 stops at the second position and voltage is applied to electrodes 332 a, 332 b. In this case, by replacing the laser gas, gas laser apparatus 100 can emit light with less reduction in intensity than when the laser gas is not replaced, even when output coupling mirror 370 moves to the second position and voltage is applied to electrodes 332 a, 332 b.

[0103] In addition, in the gas laser device 100 of this embodiment, the processor 190 may control the actuator 557 to move the output coupling mirror 370 from the first position to the second position via the holding portion 510 during replacement of the laser gas, as described in steps SP17 and SP18.

[0104] In the above configuration, output coupling mirror 370 moves during laser gas replacement, which can reduce downtime of gas laser apparatus 100 compared to when output coupling mirror 370 moves after laser gas replacement.

[0105] Furthermore, in the gas laser device 100 of this embodiment, at least a portion of the irradiation spot S2 of the light that irradiates the output coupling mirror 370 when the output coupling mirror 370 is stopped at the second position does not overlap with the irradiation spot S1 of the light that irradiates the output coupling mirror 370 when the output coupling mirror 370 is stopped at the first position.

[0106] In the above configuration, deterioration can be suppressed in the portion of output coupling mirror 370 where irradiation spots S1 and S2 do not overlap, compared to the portion of output coupling mirror 370 where irradiation spots S1 and S2 overlap.

[0107] 5. Description of the gas laser device of the third embodiment Next, a gas laser device 100 according to a third embodiment will be described. The same components as those described above are designated by the same reference numerals, and redundant descriptions will be omitted unless otherwise specified. In addition, in some of the drawings, some components are omitted or simplified for clarity.

[0108] 5.1 Configuration The configuration of the gas laser device 100 of this embodiment is the same as that of the gas laser device 100 of the second embodiment, and therefore a description thereof will be omitted.

[0109] 5.2 Operation Next, the operation of the processor 190 in this embodiment will be described. 11 is a diagram showing the relative positional relationship between output coupling mirror 370 of this embodiment and irradiation spot S. Output coupling mirror 370 of this embodiment moves back and forth between position coordinates P1 and P2.

[0110] 11, the irradiation spots S when the output coupling mirror 370 moves to position coordinates P1 and P2 are shown as irradiation spots S1 and S2, respectively. For ease of viewing, the irradiation spot S2 is shown by a dashed line. The irradiation spots S1 and S2 do not overlap with each other and are positioned apart.

[0111] The position coordinate P1 of this embodiment is the position coordinate P3 of the second embodiment, and at the position coordinate P1 of this embodiment, the center of the irradiation spot S1 is located to the left of the effective area 370a. The position coordinate P2 of this embodiment is the position coordinate P2 of the second embodiment, and at the position coordinate P2 of this embodiment, the center of the irradiation spot S2 is located to the right of the effective area 370a.

[0112] FIG. 12 is a diagram showing a part of an example of a control flowchart of the processor 190 of this embodiment, and FIG. 13 is a diagram showing the remaining part of an example of a control flowchart of the processor 190 of this embodiment.

[0113] The control flow of this embodiment includes steps SP11 to SP14 and SP19 of the second embodiment, and steps SP31 to SP36.

[0114] Processor 190 advances the flow in the order of steps SP11 to SP13, and then advances the flow to step SP31. In the initial state, the number of round trips M, which will be described later, is zero.

[0115] (Step SP31) In this step, processor 190 sets position number X to position number X=2 and reads position coordinate P2 of position number X=2 from the parameters. Next, processor 190 controls actuator 557 to move output coupling mirror 370 from position coordinate P1 to position coordinate P2 via holder 510. As a result, output coupling mirror 370 starts moving to position coordinate P2. The repetition frequency of pulse oscillation is, for example, 6 kHz, and the movement speed of output coupling mirror 370 is, for example, not less than 0.1 μm / pulse and not more than 1.0 μm / pulse. Note that the movement speed may be constant regardless of the repetition frequency of pulse oscillation. As output coupling mirror 370 moves, irradiation spot S gradually shifts. In the gradually shifting irradiation spot S, a portion of the irradiation spot before the movement overlaps a portion of the irradiation spot after the movement. Processor 190 proceeds with the flow to step SP14.

[0116] (Step SP14) In this step, if the number of shots N is greater than the threshold value Nth, the processor 190 advances the flow to step SP19. If the number of shots N is equal to or less than the threshold value Nth, the processor 190 advances the flow to step SP32.

[0117] (Step SP32) In this step, if the output coupling mirror 370 has not reached the position coordinate P2, the processor 190 returns the flow to step SP14. If the output coupling mirror 370 has reached the position coordinate P2, the processor 190 advances the flow to step SP33.

[0118] (Step SP33) In this step, processor 190 sets position number X to position number X=1 and reads position number X=1 from the parameters. Next, processor 190 controls actuator 557 to move output coupling mirror 370 from position coordinate P2 to position coordinate P1 via holder 510. That is, processor 190 returns output coupling mirror 370 to position coordinate P1. As a result, output coupling mirror 370 starts moving to position coordinate P1, and processor 190 proceeds with the flow to step SP34.

[0119] (Step SP34) In this step, if the number of shots N is greater than the threshold value Nth, the processor 190 advances the flow to step SP19. If the number of shots N is equal to or less than the threshold value Nth, the processor 190 advances the flow to step SP35.

[0120] (Step SP35) In this step, if the output coupling mirror 370 has not reached the position coordinate P1, the processor 190 returns the flow to step SP34. If the output coupling mirror 370 has reached the position coordinate P1, the output coupling mirror 370 has traveled back and forth between the position coordinate P1 and the position coordinate P2, and the processor 190 advances the flow to step SP36.

[0121] (Step SP36) In this step, if the number of round trips M is greater than the threshold value Mth, the processor 190 advances the flow to step SP19. If the number of round trips M is equal to or less than the threshold value Mth, the processor 190 adds 1 to the current number of round trips M and returns the flow to step SP31. The threshold value Mth is stored as a parameter in the storage device of the processor 190, and is, for example, 1 million times, but can be changed as appropriate.

[0122] 5.3 Actions and Effects In gas laser device 100 of this embodiment, as described in the order of steps SP11 to SP13, step SP31, step SP14, and step SP32, processor 190 controls actuator 557 during voltage application to move output coupling mirror 370 from a first position to a second position different from the first position via holder 510. At this time, the repetition frequency of pulse oscillation is, for example, 6 kHz, and the moving speed of output coupling mirror 370 is, for example, not less than 0.1 μm / pulse and not more than 1.0 μm / pulse.

[0123] In the above configuration, the gas laser apparatus 100 continues to emit light while the output coupling mirror 370 is moving. Therefore, deterioration of the output coupling mirror 370 is suppressed and downtime of the gas laser apparatus 100 can be shortened compared to when light emission is stopped while the output coupling mirror 370 is moving. Furthermore, the output coupling mirror 370 moves at a movement speed of 0.1 μm / pulse or more and 1.0 μm / pulse or less for a repetition frequency of, for example, 6 kHz. In this case, it is possible to suppress an effect on the performance of the laser light, such as the divergence angle of the laser light, due to fluctuations in the alignment of the output coupling mirror 370.

[0124] In addition, in the gas laser device 100 of this embodiment, the processor 190 controls the actuator 557 during application of voltage to move the output coupling mirror 370 back and forth between the first position and the second position via the holder 510.

[0125] In the above configuration, the usage period of the output coupling mirror 370 can be longer than when the output coupling mirror 370 moves in only one direction between the first position and the second position.

[0126] Although the above embodiments have been described as examples, the present disclosure is not limited to these and can be modified as appropriate.

[0127] The gas laser device 100 of each of the above embodiments has been described using the output-side holding unit 500. However, since the configuration of the output-side holding unit 500 is the same as that of the rear-side holding unit 600, the rear-side holding unit 600 can achieve the same functions and effects as the output-side holding unit 500. The output-side holding unit 500 can also achieve the same functions and effects as the output-side holding unit 500 when used on the laser oscillator 130 side. The gas laser device 100 may also be provided with a rear mirror similar to the rear mirror 371 in place of the line-narrowing module 60. In this case, the rear mirror may be a total reflection mirror. The rear mirror may be held by the rear-side holding unit 600, in which case the rear-side holding unit 600 can achieve the same functions and effects as the output-side holding unit 500.

[0128] The movement of the output coupling mirror 370 is linear movement, but may be other movement such as rotational movement. The base member 520 does not necessarily need to be provided, and the holding portion 510 may be provided on the support member 530. In this case, the adjustment screw 541 only needs to be threadedly engaged with the base member 520.

[0129] The above description is intended to be illustrative rather than limiting. Thus, it will be apparent to one skilled in the art that modifications can be made to the disclosed embodiments without departing from the scope of the claims. It will also be apparent to one skilled in the art that the disclosed embodiments can be used in combination. Terms used throughout this specification and claims should be construed as "open ended" unless expressly stated otherwise. For example, words such as "comprise," "have," "comprise," and "equip" should be construed as meaning "without excluding the presence of elements other than those listed." In addition, the modifier "a" should be construed as meaning "at least one" or "one or more." In addition, the term "at least one of A, B, and C" should be construed as "A," "B," "C," "A+B," "A+C," "B+C," or "A+B+C," and should also be construed as including combinations other than "A," "B," and "C."

Claims

1. a chamber device that includes an electrode inside the chamber and that emits light generated from the laser gas to the outside through a window when a voltage is applied to the electrode; a mirror disposed outside the chamber apparatus and configured to reflect at least a portion of the light emitted through the window; a holder for holding the mirror; a support member that supports the holding portion so as to be movable along a plane perpendicular to the optical axis of the light emitted through the window; a moving mechanism including an actuator that moves the holding portion along the plane relative to the support member; an angle maintaining mechanism that maintains the tilt angle of the holding portion relative to the support member at a predetermined angle; a voltage application circuit that applies the voltage to the electrodes; a processor that controls the voltage application circuit to apply the voltage to the electrodes; Equipped with The processor controls the actuator to stop the mirror at a first position via the holder, and then moves the mirror from the first position to a second position different from the first position and stops the mirror at the second position, and controls the voltage application circuit to apply the voltage to the electrode after the mirror has stopped at the first position and the second position. Gas laser device.

2. 2. The gas laser device according to claim 1, After the mirror stops at the first position and the voltage is applied to the electrode, the processor controls the voltage application circuit to stop the application of the voltage to the electrode during the period from when the mirror starts to move from the first position to when the mirror stops at the second position.

3. 3. The gas laser device according to claim 2, a gas exhaust device that exhausts the laser gas from the interior of the chamber device; a gas supply device that supplies the laser gas to the interior of the chamber device; Furthermore, The processor controls the gas exhaust device and the gas supply device so that the laser gas inside the chamber device is replaced while the application of the voltage is stopped.

4. 4. The gas laser device according to claim 3, The processor controls the actuator to move the mirror from the first position to the second position via the holder during the replacement of the laser gas.

5. 2. The gas laser device according to claim 1, At least a portion of the illumination spot of the light that illuminates the mirror when the mirror is stopped at the second position does not overlap with the illumination spot of the light that illuminates the mirror when the mirror is stopped at the first position.

6. a chamber device that includes an electrode inside the chamber and that emits light generated from the laser gas to the outside through a window when a voltage is applied to the electrode; a mirror disposed outside the chamber apparatus and configured to reflect at least a portion of the light emitted through the window; a holder for holding the mirror; a support member that supports the holding portion so as to be movable along a plane perpendicular to the optical axis of the light emitted through the window; a moving mechanism including an actuator that moves the holding portion along the plane relative to the support member; an angle maintaining mechanism that maintains the tilt angle of the holding portion relative to the support member at a predetermined angle; a voltage application circuit that applies the voltage to the electrodes; a processor that controls the voltage application circuit to apply the voltage to the electrodes; Equipped with The processor controls the actuator while the voltage is being applied to move the mirror from a first position to a second position different from the first position via the holder. Gas laser device.

7. 7. The gas laser device according to claim 6, The processor controls the actuator while the voltage is being applied to move the mirror back and forth between the first position and the second position via the holder.

8. a chamber device that includes an electrode inside the chamber and that emits light generated from the laser gas to the outside through a window when a voltage is applied to the electrode; a mirror disposed outside the chamber apparatus and configured to reflect at least a portion of the light emitted through the window; a holder for holding the mirror; a support member that supports the holding portion so as to be movable along a plane perpendicular to the optical axis of the light emitted through the window; a moving mechanism including an actuator that moves the holding portion along the plane relative to the support member; an angle maintaining mechanism that maintains the tilt angle of the holding portion relative to the support member at a predetermined angle; an optical resonator configured by a rear mirror and an output coupling mirror; a voltage application circuit that applies the voltage to the electrodes; a processor that controls the voltage application circuit to apply the voltage to the electrodes; Equipped with the chamber device is disposed between the rear mirror and the output coupling mirror; The windows are provided in pairs, the rearview mirror reflects at least a portion of the light from one of the windows; the output coupling mirror reflects a portion of the light from the other window and transmits another portion of the light from the other window; the mirror is at least one of the rear mirror and the output coupling mirror, The processor controls the actuator to stop the mirror at a first position via the holder, and then moves the mirror from the first position to a second position different from the first position and stops the mirror at the second position, and controls the voltage application circuit to apply the voltage to the electrode after the mirror has stopped at the first position and the second position. Gas laser device.

9. a chamber device that includes an electrode inside the chamber and that emits light generated from the laser gas to the outside through a window when a voltage is applied to the electrode; a mirror disposed outside the chamber apparatus and configured to reflect at least a portion of the light emitted through the window; a holder for holding the mirror; a support member that supports the holding portion so as to be movable along a plane perpendicular to the optical axis of the light emitted through the window; a moving mechanism including an actuator that moves the holding portion along the plane relative to the support member; an angle maintaining mechanism that maintains the tilt angle of the holding portion relative to the support member at a predetermined angle; an optical resonator configured by a grating and an output coupling mirror; a voltage application circuit that applies the voltage to the electrodes; a processor that controls the voltage application circuit to apply the voltage to the electrodes; Equipped with the chamber device is disposed between the grating and the output coupling mirror; The windows are provided in pairs, the grating reflects the light from one of the windows; the output coupling mirror reflects a portion of the light from the other window and transmits another portion of the light from the other window; the mirror is the output coupling mirror; The processor controls the actuator to stop the mirror at a first position via the holder, and then moves the mirror from the first position to a second position different from the first position and stops the mirror at the second position, and controls the voltage application circuit to apply the voltage to the electrode after the mirror has stopped at the first position and the second position. Gas laser device.

10. a chamber device that includes an electrode inside the chamber and that emits light generated from the laser gas to the outside through a window when a voltage is applied to the electrode; a mirror disposed outside the chamber apparatus and configured to reflect at least a portion of the light emitted through the window; a holder for holding the mirror; a support member that supports the holding portion so as to be movable along a plane perpendicular to the optical axis of the light emitted through the window; a moving mechanism including an actuator that moves the holding portion along the plane relative to the support member; an angle maintaining mechanism that maintains the tilt angle of the holding portion relative to the support member at a predetermined angle; a voltage application circuit that applies the voltage to the electrodes; a processor that controls the voltage application circuit to apply the voltage to the electrodes; Equipped with the processor controls the actuator to stop the mirror at a first position via the holder, and then moves the mirror from the first position to a second position different from the first position and stops the mirror at the second position; and controls the voltage application circuit to apply the voltage to the electrode after the mirror has stopped at the first position and the second position, respectively, to generate laser light using a gas laser device; outputting the laser light to an exposure device; exposing the laser light onto a photosensitive substrate in the exposure apparatus to manufacture an electronic device. A method for manufacturing an electronic device, comprising:

11. a chamber device that includes an electrode inside the chamber and that emits light generated from the laser gas to the outside through a window when a voltage is applied to the electrode; a mirror disposed outside the chamber apparatus and configured to reflect at least a portion of the light emitted through the window; a holder for holding the mirror; a support member that supports the holding portion so as to be movable along a plane perpendicular to the optical axis of the light emitted through the window; a moving mechanism including an actuator that moves the holding portion along the plane relative to the support member; an angle maintaining mechanism that maintains the tilt angle of the holding portion relative to the support member at a predetermined angle; an optical resonator configured by a rear mirror and an output coupling mirror; a voltage application circuit that applies the voltage to the electrodes; a processor that controls the voltage application circuit to apply the voltage to the electrodes; Equipped with the chamber device is disposed between the rear mirror and the output coupling mirror; The windows are provided in pairs, the rearview mirror reflects at least a portion of the light from one of the windows; the output coupling mirror reflects a portion of the light from the other window and transmits another portion of the light from the other window; the mirror is at least one of the rear mirror and the output coupling mirror, The processor controls the actuator while the voltage is being applied to move the mirror from a first position to a second position different from the first position via the holder. Gas laser device.

12. a chamber device that includes an electrode inside the chamber and that emits light generated from the laser gas to the outside through a window when a voltage is applied to the electrode; a mirror disposed outside the chamber apparatus and configured to reflect at least a portion of the light emitted through the window; a holder for holding the mirror; a support member that supports the holding portion so as to be movable along a plane perpendicular to the optical axis of the light emitted through the window; a moving mechanism including an actuator that moves the holding portion along the plane relative to the support member; an angle maintaining mechanism that maintains the tilt angle of the holding portion relative to the support member at a predetermined angle; an optical resonator configured by a grating and an output coupling mirror; a voltage application circuit that applies the voltage to the electrodes; a processor that controls the voltage application circuit to apply the voltage to the electrodes; Equipped with the chamber device is disposed between the grating and the output coupling mirror; The windows are provided in pairs, the grating reflects the light from one of the windows; the output coupling mirror reflects a portion of the light from the other window and transmits another portion of the light from the other window; the mirror is the output coupling mirror; The processor controls the actuator while the voltage is being applied to move the mirror from a first position to a second position different from the first position via the holder. Gas laser device.

13. a chamber device that includes an electrode inside the chamber and that emits light generated from the laser gas to the outside through a window when a voltage is applied to the electrode; a mirror disposed outside the chamber apparatus and configured to reflect at least a portion of the light emitted through the window; a holder for holding the mirror; a support member that supports the holding portion so as to be movable along a plane perpendicular to the optical axis of the light emitted through the window; a moving mechanism including an actuator that moves the holding portion along the plane relative to the support member; an angle maintaining mechanism that maintains the tilt angle of the holding portion relative to the support member at a predetermined angle; a voltage application circuit that applies the voltage to the electrodes; a processor that controls the voltage application circuit to apply the voltage to the electrodes; Equipped with the processor generates laser light using a gas laser device that controls the actuator to move the mirror from a first position to a second position different from the first position via the holder while the voltage is being applied; outputting the laser light to an exposure device; exposing the laser light onto a photosensitive substrate in the exposure apparatus to manufacture an electronic device. A method for manufacturing an electronic device, comprising:

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