Optical system for a measurement system and a measurement system including such an optical system

Abstract

To provide an optical system for a metrology system so as to facilitate handling thereof, particularly handling with respect to object arrangement.SOLUTION: An optical system 21 for a metrology system for measuring an object has an object holder for holding the object in an object plane 13. A transmissive optical focusing component 11 is arranged in the beam path of illumination light 4 between a light source of the metrology system and an object field 12 in the object plane 13. The transmissive optical focusing component 11 has a focal length (s1) less than 5 mm. A detection device is used for detecting the illumination light 4 in the beam path downstream of the object field 12. An imaging optical unit 22 is used for imaging an illumination focus 16 generated by the transmissive optical focusing component 11 into a further illumination focus 16' in the region of the object field 12. As a result, the optical system facilitates handling thereof, particularly handling with respect to object arrangement.SELECTED DRAWING: Figure 7

Description

[Technical Field]

[0001] The contents of German Patent Application No. 102023204172.3 are incorporated herein by reference.

[0002] The present invention relates to an optical system for a metrology system for measuring an object. The present invention further relates to a metrology system for measuring an object with such an optical system. [Background technology]

[0003] A metrology system of the aforementioned type is known, for example, from U.S. Patent Application Publication No. 2012 / 0008123. Another system for measuring lithographic masks is known from expert articles by Na J. et al. "Application of actinic mask review system for the preparation of HVM EUV lithography with defect-free mask", Proc. of SPIE Vol. 10145, 101450M-1, Goldberg K. et al. "Actinic mask imaging: recent results and future directions from the SHARP EUV microscope", Proc. of SPIE Vol. 9049, 90480Y-1, and Naulleau et al. "Electro-optical system for scanning microscopy of extreme ultraviolet masks with a high harmonic generation source", Optics Express, Vol. 22, 20144, 2014. Another metrology system is known from U.S. Patent No. 9,904,060. US Patent Application Publication No. 2010 / 0294949 discloses a scanning microscope apparatus. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] U.S. Patent Application Publication No. 2012 / 0008123 [Patent Document 2] U.S. Patent No. 9,904,060 [Patent Document 3] U.S. Patent Application Publication No. 2010 / 0294949 [Non-patent literature]

[0005] [Non-Patent Document 1] Na J. et al. "Application of actinic mask review system for the preparation of HVM EUV lithography with defect free mask", Proc. of SPIE Vol. 10145, 101450M-1 [Non-patent document 2] Goldberg K. et al. "Actinic mask imaging: recent results and future directions from the SHARP EUV microscope", Proc. of SPIE Vol. 9049, 90480Y-1 [Non-patent document 3] Naulleau et al. "Electro-optical system for scanning microscopy of extreme ultraviolet masks with a high harmonic generation source", Optics Express, Vol. 22, 20144, 2014 Summary of the Invention

[0006] It is an object of the present invention to further develop the optical system for measurement systems in such a way that its handling is easier, especially with regard to object placement.

[0007] According to the invention, this object is achieved by an optical system having the features specified in claim 1.

[0008] According to the present invention, it has been discovered that the use of a transmissive optical focusing component with a short focal length does not require a correspondingly short working distance between the transmissive optical focusing component and the object. The working distance can be increased by an imaging optical unit connected therebetween to image the illumination focus generated by the transmissive optical focusing component, the function of which corresponds to that of the relay optical unit. The working distance may be greater than 20 mm, greater than 25 mm, greater than 50 mm, or even greater than 100 mm. The working distance here refers to the distance between the object field and the nearest component of the optical system, which is typically a component of the imaging optical unit that images the illumination focus generated by the transmissive optical focusing component to another illumination focus within the region of the object field. The working distance can be measured as the actual distance between the nearest point of the object field and the corresponding nearest component of the optical system, or as the pure z-distance between the object field and a component of the optical system that overlaps with the object field in the x / y directions but is separated in the z direction.

[0009] The imaging scale of the imaging optical unit for imaging the illumination focus generated by the transmissive optical focusing component to another illumination focus in the region of the illumination field may be in the region of 1. In this case, the imaging optical unit serves mainly or exclusively to increase the working distance, in particular between the object field and the nearest component of the optical system. In that case, the numerical aperture at the illumination focus generated by the optical focusing component and the numerical aperture at another illumination focus in the region of the object field are identical. Alternatively, the imaging scale may be less than 1. This can be used to reduce the required refractive power of the transmissive optical focusing component, which in turn can be used to reduce undesired chromatic aberrations of the optical system, in particular the longitudinal chromatic aberration of the transmissive optical focusing component.

[0010] The object holder can be designed to be displaceable, in particular can be operably connected to an object displacement drive. The object displacement can be performed along at least one coordinate perpendicular to the object plane and / or spanning the object plane. The displacement accuracy of the object displacement drive along at least one displacement direction can be better than 1 μm, better than 0.5 μm, in particular better than 250 nm. In particular, the displacement accuracy can be better than 100 nm. The lower limit for the displacement accuracy is typically in the region of 0.1 nm.

[0011] The object to be measured may be a mask, in particular a lithography mask, or reticle.

[0012] The advantages of the optical system are particularly effective if the transmissive optical focusing component is designed as a zone plate, also called a zone lens.

[0013] The working distance as claimed in claim 3 allows for non-lethal handling of the object without the object coming into unwanted contact with components of the optical system.

[0014] An imaging optical unit according to claim 4 has proven useful in practice. The imaging optical unit can be designed as a catoptric or catadioptric object optical unit.

[0015] The imaging optical unit according to claim 5 can specifically have exactly one mirror and can then be designed with low reflection losses. Alternatively, the imaging optical unit can have two mirrors, or even three or more mirrors, thus ensuring imaging with small aberrations. In the ideal case, the imaging optical unit can correct or compensate for the aberrations introduced by the transmissive optical focusing component.

[0016] A folding mirror according to claim 6 allows adaptation of the optical system to constructional requirements.

[0017] The aspherical mirror according to claim 7 allows for good aberration control during imaging. The imaging optical unit can have at least one mirror, the mirror surface of which is designed as a freeform surface. In this way, limitations that would otherwise exist due to the axis of rotational symmetry of a spherical or aspherical mirror surface can be overcome.

[0018] The chief ray angle according to claim 8 allows illumination of the object with low shadowing effects and correspondingly high quality measurements of the object. The chief ray angle of the illumination light incident in the object field may be greater than 0°, for example greater than 0.1° or even greater than 0.5°, for all beams of illumination light.

[0019] The actuator according to claim 9 can be used to adjust the object perpendicular to the object plane. Furthermore, the object holder can be displaced by a corresponding actuator in at least one direction parallel to the object plane, in particular in two mutually independent directions parallel to the object plane. The actuator for displacing the object holder perpendicular to the object plane can be used to measure 3D aerial images, in particular by recording what are known as focal stacks. Here, the object images are measured in each case at different z-positions of the object holder, i.e., the object.

[0020] It is also possible to use corresponding actuators for displacing the object holder relative to the object plane to ensure separate focusing for different wavelength components of the irradiating light, i.e. to ensure that the object is clearly imaged in the arrangement plane or detection plane of the detection device for the corresponding wavelength components.

[0021] The advantages of the measurement system according to claim 10 correspond to those already explained above with reference to the optical system: the spectral width Δλ / λ (FWHM, full width at half maximum) of the illumination light generated by the light source is at least 5×10 -4 , at least 1 x 10 -3 , at least 3 × 10 -3 , at least 5 × 10-3 , at least 1 x 10 -2 For example, it may be in the range of 1 / 250 to 1 / 300.

[0022] An EUV light source according to claim 11 allows actinic measurement of the object, in particular of an EUV lithography mask.The EUV light source may be a plasma light source.

[0023] Exemplary embodiments of the invention are described in more detail below with reference to the drawings. [Brief explanation of the drawings]

[0024] [Figure 1] FIG. 1 shows a schematic diagram of a metrology system for measuring an object. [Figure 2] FIG. 1 illustrates a top view of a zone plate as a transmissive optical focusing component that generates an illumination focal point in the region of the object field of the optical system of a metrology system. [Figure 3] 1 shows illumination foci in the region of an object plane of an optical system for different wavelength components of illumination light from a light source of a metrology system in the beam path downstream of a zone plate; [Figure 4] FIG. 1 illustrates one embodiment of an illumination light beam path in an optical system downstream of a zone plate to a spectrally sensitive embodiment of a detection device in the optical system. [Figure 5] 5 shows a schematic representation of a variant of the use of the detection device according to FIG. 4 with the additional use of an object holder that is displaceable perpendicularly to the object plane by an actuator. [Figure 6] 5 is a view similar to FIG. 4 of another embodiment of an optical spectrally sensitive detection device in which the grating is designed as a bandpass filter for filtering at least one selected wavelight component from the illuminating light. [Figure 7]FIG. 10 shows another embodiment of the beam path of the optical system between the zone plate and the object field, using an imaging optical unit for imaging the illumination focus generated by the zone plate to another illumination focus within the region of the object field. [Figure 8] FIG. 8 is an enlarged view of detail VIII of FIG. 7; DETAILED DESCRIPTION OF THE INVENTION

[0025] 1 shows very diagrammatically a metrology system 1 for measuring an object 2. An example of an object 2 to be measured is a lithography mask for projection lithography for the production of microstructured or nanostructured semiconductor components. The beam path of the chief ray 3 of illumination light 4 between a light source 5 and a detection device 6 of the metrology system 1 is shown.

[0026] The light source 5 is an EUV light source for generating EUV radiation 4 having a central operating wavelength in the range between 5 nm and 30 nm, in particular 13.5 nm. The spectral width Δλ / λ (FWHM, full width at half maximum) of the EUV radiation 4 used for irradiating the object 2 is at least 1×10 -4 and may for example be in the range between 1 / 250 and 1 / 300. The light source 5 may be a plasma light source or an HHG light source.

[0027] An intermediate focal plane 7 is arranged in the beam path of the illumination light 4 downstream of the light source 5, and an intermediate focal stop 8 is arranged in the intermediate focal plane 7. The intermediate focal stop 8 is used to separate the used illumination light 4, in particular from undesired co-carried debris. Downstream of the intermediate focal stop 8, an external optical filter can be arranged in the beam path of the illumination light 4 to separate the used illumination light 4 from undesired co-carried wavelength components in the beam path.

[0028] Downstream of the light source 5 , the illuminating light 4 is guided by an optical system 9 of the measurement system 1 .

[0029] To clarify the positional relationships between the components of the measurement system, a Cartesian xyz coordinate system is depicted in Figure 1. The x direction points to the right in Figure 1. The y direction extends perpendicular to the plane of the drawing in Figure 1. The z direction points upward in Figure 1.

[0030] In the variant of the optical system 9 shown in Fig. 1, a folding mirror 10 for the illumination light 4 is arranged in the beam path of the illumination light 4 downstream of the intermediate focus stop 8. In the beam path downstream of the folding mirror 10, a zone plate 11 of the optical system 9 is arranged, which is shown in a top view in Fig. 2. The zone plate 11 represents a transmissive optical focusing component and is arranged in the beam path of the illumination light 4 between the light source 5 and the object field 12, in an object plane 13 of the optical system 9.

[0031] An object holder 14 of the optical system is used to hold an object 2 in an object plane 13 such that a portion of the object 2 is located within the object field 12. Via an actuator 15, the object holder 14 is displaceable perpendicular to the object plane 13, as indicated by the double displacement arrow Δz in FIG.

[0032] The zone plate 11 generates an illumination focus 16 (see also FIG. 4) in the region of the object field 12 .

[0033] The chief ray angle α (see FIG. 1) at which the illumination light 4 enters the object field 12 may be less than 6°.

[0034] The numerical aperture on the object side of the illumination light beam path may be in the range of 0.1.

[0035] The object 2 is designed as a reflective object. The illumination light 4 reflected by the object 2 is guided as detection light from the optical system 9 to the detection device 6. In the embodiment according to Fig. 1, a further folding mirror 17 is arranged in the beam path of the detection light between the object 2 and the detection device 6.

[0036] FIG. 3 illustrates the focusing conditions within the region of object plane 13 due to the dispersion of zone plate 11. For illustrative purposes, different wavelength components 41-45 are shown separated in the x-direction in FIG. 3. For example, wavelength component 41 has the longest wavelength, and wavelength component 45 has the shortest wavelength within the spectral width of the illumination light used. Due to the dispersion of zone plate 11, wavelength components 41-45 are focused at different z-positions at illumination focal point 16 within the region of object plane 13.

[0037] 4 shows an arrangement for guiding the illumination light 4 downstream of the object 2 towards the detector 6. A dispersive optical component 18 in the form of a grating is arranged in the beam path of the detection light 4 between the object field 12 and the detector 6. The grating 18 spatially separates the different wavelength components 41-45 of the detection light 4. The wavelength components 41-45 of the detection light 4 are at least partially spatially separated in the beam path following the grating 18.

[0038] The detector 6 is arranged in a placement or detection plane 19, in which plane this at least partial spatial separation of the wavelength components 41-45 takes place. The detector 6 is designed as a sensor line, which in the illustrated embodiment comprises five sensor elements 61-65 for the at least partially separate detection of the wavelength components 41-45 of the illumination or detection light 4 in the beam path downstream of the object field 12. Depending on the design, the detector may have two, three, five or ten or more sensor elements 6 i The detection device 6 can be designed as a sensor line or as a two-dimensional sensor array, for example in the form of a CCD or CMOS array.

[0039] Using the detection device 6 according to FIG. 4, it is possible to resolve information about the object 2 at the z position of the object 2 via the various wavelength components 41-45 from the various z heights of the object structures located there, and to detect information about the object 2 in a z-resolved form without z displacement of the object 2 (single shot) using spectrally sensitive detection by the grating 18 and the detection device 6.

[0040] Alternatively or additionally, a z-actuator 15 can be used in conjunction with spectrally sensitive detection according to FIG. 4, as shown diagrammatically with reference to FIG.

[0041] The first column of Figure 5 shows a total of five different z positions of the object 2, which can be set with the object holder 14 via the actuator 15. These z positions are numbered -2, -1, 0, +1, +2.

[0042] 5 shows, in the second column, the measurement results of the sensor line detector 6 according to FIG. 4 at these various z positions of the object 2. At z position −2, the object plane 13 coincides with the illumination focus 16 of the wavelength component 41, so that the signal at the sensor element 61 is maximum. The maximum detected intensity measured by the sensor line detector 6 is also shown for the more distant z positions −1, 0, +1, and +2, in each case in the second column of FIG. 5 for the respective sensor element 6 i As indicated by the "X" at , sensor elements 62, 63, 64, and 65 shift accordingly.

[0043] By means of the deconvolution matrix M (shown in the third column after the deconvolution operator in FIG. 5 ), which is generated in advance by calibration, the measurement result for the z-position “z=0” in the object plane 13, for example, is deconvolved into a signal that exclusively contains the signal contribution at this z-displacement position of the object 2 by the object holder 14, as shown by way of example in the last row of FIG. 5 . Via another deconvolution matrix M, adjusted detection signals for the other z-values ​​−2, −1, +1, and +2 can be generated accordingly. The characteristics of the optical system 9, in particular the sensor elements 6 of the sensor line detection device 6, are also deconvolved. i The previously measured channel crosstalk information between is contained in the deconvolution matrix M.

[0044] Figure 6 shows another use of a detection configuration according to the type of Figure 4. Here, the grating 18 is not used for single-shot detection of various z-object structure heights, but as a band-pass filter for filtering at least one selected wavelength component from the used spectral width of the illumination or detection light 4. Figure 6 shows the position of the grating 18 for use of wavelength component 44 incident on sensor element 64. The other wavelength components 41 to 43 and 45 are not incident on sensor element 64 at this position of the grating 18. i does not contribute to the exposure of

[0045] For use as a bandpass filter, the grating 18 is swiveled, as indicated by the double displacement arrow Δλ in FIG. 6, thus reducing the wavelength component 4 used for detection. i The grating 18 is operatively connected to an actuator 20 for selecting

[0046] Figure 7 shows the beam paths of a variant of the optical system 21 for the measurement system 1. Components and functions already described above in connection with Figures 1 to 6 are designated with the same reference numerals and will not be discussed in detail again.

[0047] 7 shows a variant of the beam path of the illumination light 4 based on five selected individual rays between the zone plate 11 and the object field 12. In contrast to the beam path according to Fig. 1, the beam path of the illumination light 4 passes through the zone plate 11 along the x-direction. Therefore, in this embodiment of the beam path according to Fig. 7, the folding mirror 10 is omitted.

[0048] The zone plate 11 has a focal length f1 (see FIG. 8), which is less than 5 mm, may be less than 2 mm, may be less than 1 mm, and in the illustrated embodiment is in the range of 0.5 mm.

[0049] To image the illumination focus 16 generated by the zone plate 11 to another illumination focus 16' in the region of the object field 12, an imaging optical unit 22 of the optical system 21 according to Fig. 7 is used. The imaging optical unit 22 is designed as a mirror optical unit. In the embodiment according to Fig. 7, the imaging optical unit 22 has two mirrors, in particular a first mirror M1 in the beam path of the illumination light 4 downstream of the zone plate 11 and a further downstream mirror M2.

[0050] In the embodiment according to Fig. 7, mirror M1 is designed as a planar folding mirror. Alternatively, mirror M1 can also have an imaging effect. Mirror M2 is designed as an aspherical mirror. Alternatively, mirror M2 can also be designed as a spherical mirror. Mirror M2 can in particular be designed as a freeform surface mirror.

[0051] The working distance between the zone plate 11 and the object field 12 may be significantly longer than the focal length f1 due to the intermediate imaging optical unit 22, for example, longer than 10 mm, longer than 20 mm, longer than 50 mm, or even 100 mm or more. The working distance is the distance between the object field and the nearest component of the optical system, which is usually a component of an imaging optical unit for imaging an illumination focus generated by a transmissive optical focusing component to another illumination focus within the region of the object field. The working distance can be measured as the actual distance between the nearest point of the object field and the corresponding nearest component of the optical system, or as the pure z-distance between the object field and a component of the optical system that overlaps with the object field in the x / y directions but is separated in the z direction.

[0052] For the intermediate imaging optical unit 22, it is possible to set a desired dispersion in the design, for example, for the purpose of being particularly suitable for combination with the detector device 6, in particular regardless of the required working distance. In this case, the adjacent sensor elements 6 of the spectral detector device 6 iIt is advantageous if the dispersion between them results in an offset Δz of, for example, 50 nm to 200 nm, as this can correspond to the z-spacing within the z-stack or image stack recorded by the measurement system 1.

[0053] The imaging scale when imaging the object field 12 into an image field in the area of ​​the placement plane 19 may be, for example, greater than 10, greater than 25, greater than 50, greater than 100, greater than 250, greater than 300, or within the range of 500 or 1000.

[0054] To measure the structure of the object 2, an image of the object structure in the object field 12 is recorded by the detection device 6. Depending on the measurement method, a single image is recorded or an image stack (aerial images) at several z-positions is recorded, in which case the object 2 is displaced by the object holder 14 and the actuator 15 to the corresponding z-positions. [Explanation of symbols]

[0055] 1. Measurement system 2 objects 3 Chief ray 4. Irradiation light 5 light source 6. Detection equipment 7 Intermediate focal plane 8 Intermediate focus aperture 9 Optical system 10 Folding mirrors 11 Zone Plate 12 Object field of view 13 Object plane 14 Object holder 15 Actuators 16 Irradiation focus 17 Folding mirror 18 Dispersive optical components, gratings 19 Placement plane, detection plane 20 Actuator 21 Optical system 22 Imaging optical unit M1 mirror M2 mirror

Claims

1. An optical system (21) for a metrology system (1) for measuring an object (2), comprising: an object holder (14) for holding the object (2) in an object plane (13); a transmissive optical focusing component (11) arranged in a beam path of illumination light (4) between a light source (5) of the measurement system (1) and an object field (12) in the object plane (13) for generating an illumination focus (16) in the beam path of the illumination light (4) downstream of the transmissive optical focusing component (11), Focal length (f) less than 5 mm 1 a transmissive optical focusing element (11) having a a detector (6) for detecting the illumination light (4) in the beam path downstream of the object field (12), an optical system (21) comprising an imaging optical unit (22) for imaging the illumination focal point (16) generated by the transmissive optical focusing component (11) into another illumination focal point (16') in the region of the object field (12);

2. 2. The optical system according to claim 1, characterized in that the transmissive optical focusing component (11) is designed as a zone plate.

3. 3. The optical system according to claim 2, characterized in that the working distance between the zone plate (11) and the object field (12) is greater than 10 mm.

4. 3. The optical system according to claim 1, wherein the imaging optical unit (22) is designed as a mirror optical unit.

5. 3. Optical system according to claim 1 or 2, characterized in that the imaging optical unit comprises at least one mirror (M1, M2).

6. 6. The optical system according to claim 5, characterized in that the imaging optical unit (22) comprises at least one folding mirror (M1).

7. 6. The optical system according to claim 5, characterized in that the imaging optical unit (22) comprises at least one aspherical mirror (M2).

8. 3. The optical system according to claim 1, characterized in that the chief ray angle (α) of the illumination light (4) incident into the object field (12) is less than 6°.

9. 3. Optical system according to claim 1, characterized by an actuator (15) for displacing the object holder (14) perpendicularly to the object plane (13).

10. A metrology system (1) for measuring an object (2), comprising: An optical system (21) according to claim 1 or 2, A measurement system (1) comprising a light source (5) for generating illuminating light (4).

11. 11. The metrology system according to claim 10, characterized in that the light source (5) is an EUV light source.

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