Visual field facet system and lithography apparatus

Abstract

The present invention provides a field facet system (300A, 300B, 300C, 300D, 300E) for a lithographic apparatus (100A, 100B), comprising an optical element (302) including an elastically deformable facet (306) having a light-reflective, optically active surface (308), and at least one actuating element for introducing bending moments (B1, B2) into the facet (306) to deform the facet (306) so as to change the radius of curvature (K1, K2) of the optically active surface (308). and a facet portion (306) having an arcuate curve in a plan view of the optically effective surface (308), and the stiffness of the facet portion (306) is variable when viewed along the longitudinal direction (L1, L2) of the facet portion (306) such that a normal vector (N) oriented perpendicular to the optically effective surface (308) tilts exclusively about the spatial direction (x) when a bending moment (B1, B2) is introduced into the facet portion (306).

Description

Technical Field

[0001] The present invention relates to a field facet system for a lithographic apparatus and a lithographic apparatus including the facet system.

[0002] The entire content of German Patent Application Publication No. 10 2020 214 798.1 is incorporated herein by reference.

Background Art

[0003] Micro-lithography is used for manufacturing fine-structure components such as integrated circuits. The micro-lithography process is carried out using a lithographic apparatus having an illumination system and a projection system. In this case, an image of a mask (reticle) illuminated by the illumination system is projected by the projection system onto a substrate, such as a silicon wafer, coated with a photosensitive layer (photoresist) and arranged in the image plane of the projection system, so as to transfer the mask structure to the photosensitive coating of the substrate.

[0004] Due to the desire for further miniaturization of structures in the manufacture of integrated circuits, EUV lithographic apparatuses (extreme ultraviolet, EUV) using light having a wavelength in the range of 0.1 nm to 30 nm, particularly 13.5 nm, are currently under development. In the case of such EUV lithographic apparatuses, since most materials exhibit high absorption with respect to light of this wavelength, a reflective optical unit, i.e., a mirror, must be used instead of a refractive optical unit, i.e., a lens element, as before. The mirror operates at a substantially normal incidence or an oblique incidence.

[0005] The illumination system includes, in particular, a field-view facet mirror and a pupil facet mirror. Both the field-view facet mirror and the pupil facet mirror can take the form of a so-called facet mirror, and such facet mirrors often have hundreds of facets. The facets of the field-view facet mirror are also called "field-view facets," and the facets of the pupil facet mirror are also called "pupil facets." Multiple pupil facets can be assigned to a single field-view facet. To obtain good illumination along with a high numerical aperture, it is desirable to switch between the pupil facets assigned to that single field-view facet.

[0006] Because the above-mentioned single field of view facet is switchable, the distance between the single field of view facet and the pupil facet assigned to it differs depending on the switching position. If the refractive power of the single field of view facet is fixed, the image on the corresponding pupil facet may be defocused depending on the switching position. This defocusing limits the reduction in pupil filling. In this case, "pupil filling" should be understood as the ratio of the illuminated surface area to the total optically effective area of ​​each pupil facet. However, in order to obtain high resolution of the projection system, it is necessary to further reduce the pupil filling. Therefore, it is desirable to make the field of view facet deformable depending on the switching position of the field of view facet in order to at least reduce or completely eliminate defocusing.

[0007] Patent Document 1 also describes an EUV illumination system for an EUV lithography apparatus, a lithography apparatus, and a method for generating illumination radiation using an EUV illumination system.

[0008] Patent Document 2 discloses a faceted mirror for a projection exposure apparatus, a corresponding projection exposure apparatus, and a method for operating the faceted mirror and the corresponding projection exposure apparatus.

[0009] Patent Document 3 describes an optical element having an optical axis, and an apparatus for introducing two-wave or multi-wave deformation into the optical element. [Prior art documents] [Patent Documents]

[0010] [Patent Document 1] German Patent Application Publication No. 10 2017 221 420 Specification [Patent Document 2] German Patent Application Publication No. 10 2013 206 981 Specification [Patent Document 3] German Patent Application Publication No. 101 51 919 [Overview of the Initiative] [Problems that the invention aims to solve]

[0011] Given this background, the objective of the present invention is to propose an improved visual field facet system. [Means for solving the problem]

[0012] Therefore, a field-of-view facet system for a lithography apparatus is proposed. The field-of-view facet system includes an optical element including an elastically deformable facet portion having a light-reflective optical effective surface, and at least one actuation element that introduces a bending moment to the facet portion to deform the facet portion in such a way that the radius of curvature of the optical effective surface is changed, wherein the facet portion is curved in an arc shape in a plan view of the optical effective surface, and the rigidity of the facet portion is variable such that, when viewed along the longitudinal direction of the facet portion, the normal vector perpendicular to the optical effective surface tilts exclusively around one spatial direction when a bending moment is introduced to the facet portion.

[0013] Facet section It has a cross-section of any geometric shape, and by changing the cross-section It can be advantageous that the facet portion simply bends rather than twists when a bending moment is introduced.

[0014] A field-of-view facet system is part of the beam shaping and illumination system of a lithography apparatus. In particular, a field-of-view facet system is part of a facet mirror, especially a field-of-view facet mirror. Such a facet mirror preferably includes a plurality of such field-of-view facet systems arranged linearly or in a pattern. In this case, each field-of-view facet system can independently be tilted to a plurality of different tilt positions. For this purpose, each field-of-view facet system may include yet another actuator suitable for tilting the entire field-of-view facet system as a single unit. The actuator may be a so-called Lorentz actuator.

[0015] The optical elements are preferably facets, mirror facets, or field facets, or may be referred to as such. The facet portion is particularly rod-shaped or beam-shaped and may have a rectangular, trapezoidal, or any other geometric cross-section. The facet portion has, for example, width, length, and thickness. The length-to-width ratio is preferably about 10:1. The thickness is preferably less than the width. A coordinate system having a first spatial direction or x-direction, a second spatial direction or y-direction, and a third spatial direction or z-direction is assigned to the field facet system. The spatial directions are positioned perpendicular to each other.

[0016] The width is oriented along the x-direction. Therefore, the x-direction can also be called the width direction. The length is oriented along the y-direction. Therefore, the y-direction can also be called the longitudinal direction or length direction. The thickness is oriented along the z-direction. Therefore, the z-direction can also be called the thickness direction or perpendicular direction. The "length direction" should be understood to mean the spatial direction in which the optical element extends geometrically the longest.

[0017] The optical element is manufactured from a mirror substrate or a substrate. The substrate may contain copper, copper alloys, iron-nickel alloys, such as Invar, or any other suitable material. The optically effective surface is located on the front of the facet portion, i.e., the side opposite the body. The optically effective surface may be a mirror surface. The optically effective surface is created using a coating applied to the substrate.

[0018] The optically effective surface is suitable for reflecting light, particularly EUV radiation. However, this does not preclude the introduction of heat into the facets as a result of at least some of the light being absorbed by the facets. The facets or optically effective surface have an arcuate or crescent-shaped geometric form in a plan view, i.e., in a line of sight perpendicular to the optically effective surface.

[0019] The optically effective surface is preferably a curved surface. In its simplest form, the optically effective surface is a cylindrical curved surface. However, the shape of the optically effective surface can also be a toroidal or ellipsoidal surface. If a toroidal geometric shape is given, it has vertices. Preferably, the optically effective surface includes a first radius of curvature that indicates the curvature of the optically effective surface in a plane extending in the y and z directions.

[0020] Furthermore, the optically effective surface includes a second radius of curvature, which differs from the first radius of curvature and indicates the curvature of the optically effective surface in a plane extending in the x and z directions. The first and second radii of curvature are positioned perpendicular to each other. The radii of curvature intersect, in particular, at the vertices. The first radius of curvature is preferably larger than the second radius of curvature. In particular, the first radius of curvature is modified using deformation of the facet portion. However, the second radius of curvature may also be affected depending on the arrangement of one or more actuating elements.

[0021] The actuating element can be called an actuator. Preferably, at least two actuating elements are provided. However, it is also possible to provide three, four, five, six, seven, eight, nine, ten, or eleven actuating elements. Twelve or more actuating elements are also possible. It is also possible to provide only one actuating element. In other words, in principle, the number of actuating elements is arbitrary. The actuating element is preferably a so-called displacement actuator. It should be understood that a "displacement actuator," unlike a force actuator, refers to an actuating element that pre-defines displacement rather than a fixed force. In contrast to a displacement actuator, it should be understood that a "force actuator," in contrast to a displacement actuator, refers to an actuating element that pre-defines force rather than a fixed displacement. An example of a displacement actuator is a piezoelectric element. An example of a force actuator is a Lorentz actuator, as already mentioned above. That is, the actuating element may be a piezoelectric element or a piezoelectric stack, or may include a piezoelectric element or a piezoelectric stack. However, the actuating element may also be, for example, a pneumatic or hydraulic actuator.

[0022] Preferably, a control unit is assigned to one or more actuators, so that they are controlled, and in particular energized, to deform the facet portion. For example, the actuators are brought from a non-flexible state to a flexible state using energization. Any number of intermediate states are provided between the non-flexible and flexible states. Preferably, the actuators automatically return from the flexible state to the non-flexible state as soon as the energization is removed. Preferably, the radius of curvature, particularly the first radius of curvature or the first and second radii of curvature, can be changed steplessly using the actuators.

[0023] In this case, the fact that the facet part is "elastically deformable" means that the facet part can be changed from a non-flexed or non-deformed state to a flexed or deformed state and back again. In the non-deformed state, the radius of curvature, particularly the first radius of curvature, may be larger than in the deformed state. To change the facet part from the non-deformed state to the deformed state, a bending moment is introduced into the facet part using an actuating element. As an example, two opposing bending moments are introduced into two end regions of the facet part. However, only one bending moment will be referred to below.

[0024] As soon as the bending moment stops being applied to the facet part, the facet part automatically changes from the deformed state to the non-deformed state. That is, the deformation of the facet part is reversible. In particular, the facet part is prestressed in the direction of the non-deformed state, particularly by a spring. In the non-deformed state, the optically effective surface can be planar or can have a cylindrical curvature.

[0025] As described above, it should be understood that the plan view means the line-of-sight direction perpendicular to the optically effective surface. In this case, "rigidity" should be understood to particularly mean the resistance of the facet part or generally the body to elastic deformation caused by a force or a moment. In particular, "rigidity" should be understood to mean the torsional rigidity of the facet part, that is, the rigidity to withstand a torsional moment that twists the facet part or applies torsion to the facet part. The rigidity of a component changes depending, firstly, on the elastic properties of the material, such as the modulus of elasticity, etc., and, secondly, on the geometric shape of the deformed component.

[0026] The variable rigidity prevents the facet from twisting when a bending moment is introduced to it, i.e., it prevents twisting around the second spatial direction. This prevents the normal vector from being tilted around the second spatial direction. In this case, "normal vector" should be understood as a vector perpendicular to the optically effective surface. The bending moment acts around the first spatial direction. In this case, "exclusively" should be understood as allowing a slight tilt of the normal vector with respect to the second spatial direction. However, since this tilt is always very small, the optical properties of the optically effective surface are not adversely affected.

[0027] The bending moment is intended to bend the facet portion only, and preferably does not twist or torment it. The longitudinal direction extends substantially along the second spatial direction. In this case, the longitudinal direction can be curved like the facet portion itself. The facet portion preferably has a first end region and a second end region, to which opposite bending moments can be introduced. The plane of symmetry of the facet portion is located in the center between the end regions. The longitudinal direction is the direction from each end region to the plane of symmetry.

[0028] Preferably, the body and the facets are embodied as a single unit, particularly as a single material unit. In this case, “single unit” or “integrated” means that the body and the facets form a common component and are not made up of different component parts. In this case, “materially as a single unit” means that the body and the facets are manufactured from the same material as a whole. Alternatively, the body and the facets may be two separate components that are connected to each other.

[0029] According to one embodiment, the elastic modulus of the facet portion is variable when viewed along the longitudinal direction.

[0030] For example, the modulus of elasticity may decrease as one moves from the end region toward the plane of symmetry. Thus, a profile or gradient of the modulus of elasticity is given. In this case, the gradient shows the profile of the change in a numerical physical variable as a function of location. The gradient of a variable indicates the degree of change in the variable and the direction in which the change is maximum, location by location. The above-described change in modulus of elasticity can be obtained by using a monolithically manufactured base body made of two or more different materials, particularly a faceted portion. In this case, the base body forms the faceted portion, or the faceted portion is manufactured from the base body. The base body may also include the main body. Such a base body can be manufactured from different materials, particularly metal powders, by welding, plating, or preferably additive manufacturing, particularly 3D printing. Additive manufacturing, in particular, can manufacture hybrid components, particularly faceted portions, that transition continuously between two different materials, for example, copper and steel. Thus, at least the faceted portion may have a hybrid configuration, particularly made of steel and copper. The main body may also have such a hybrid configuration.

[0031] In yet another embodiment, the polar section modulus of the cross-section of the facet portion is variable when viewed along the longitudinal direction.

[0032] It is also possible to provide a combination of a variable modulus of elasticity and a variable polar section modulus. The polar section modulus is a measure of the beam's resistance to the generation of internal stress under load. The polar section modulus can be affected by the geometric shape of the cross-section. For example, the polar section modulus can decrease as you move from the end region of a facet toward the plane of symmetry.

[0033] In yet another embodiment, the cross-section is trapezoidal.

[0034] The cross-section of the facet is not limited to a trapezoidal cross-section, but can have any geometric shape with at least two variable cross-sectional parameters, such as width and height. For example, a rectangle, triangle, semi-ellipse, a rectangle with truncated corners, or other more complex cross-sections are possible.

[0035] In yet another embodiment, the cross-section includes a first width facing the optically effective surface and a second width opposite to the optically effective surface, wherein the first width is greater than the second width.

[0036] In other words, the cross-section tapers from the optically effective surface. The facet portion has, in particular, an upper surface and a lower surface, on which the optically effective surface is provided. The upper surface has a first width. The lower surface has a second width.

[0037] In yet another embodiment, the first width is constant when viewed along the longitudinal direction, and the second width is variable when viewed along the longitudinal direction.

[0038] In other words, the first width is neither constant nor variable. For example, the second width decreases as you move from the edge region toward the plane of symmetry.

[0039] In yet another embodiment, the cross-section includes a height that is variable when viewed along the longitudinal direction.

[0040] The height is particularly oriented along the third spatial direction. For example, the height decreases as you move from the edge region of the facet toward the plane of symmetry.

[0041] In yet another embodiment, the facet portion includes a first end region and a second end region, and the facet portion is configured to be mirror-symmetric with respect to a plane of symmetry located in the center between the first end region and the second end region.

[0042] Mirror symmetry relates to the geometric configuration, i.e., dimensions, of the facet portion. However, mirror symmetry also relates to the rigidity of the facet portion. For example, a facet portion has the same rigidity on both sides of its plane of symmetry at a predetermined distance from the plane of symmetry.

[0043] In yet another embodiment, the cross-section is minimized in the plane of symmetry.

[0044] In particular, the cross-sectional area of ​​the cross-section is minimized on the plane of symmetry.

[0045] In yet another embodiment, the size of the cross-section increases as it moves from the plane of symmetry toward the direction of the first end region and toward the direction of the second end region.

[0046] In other words, the cross-sectional area is larger in the end region than in the plane of symmetry.

[0047] In yet another embodiment, the field of view facet system further includes at least two actuation elements configured to introduce a reverse bending moment into the edge region.

[0048] As described above, in principle, the number of actuating elements is arbitrary. It is possible to provide more or fewer than two actuating elements. Preferably, the actuating elements are linear actuating elements. In particular, the actuating elements are piezoelectric actuators.

[0049] In yet another embodiment, the field of view facet system includes a first spatial direction in which the normal vector is exclusively inclined when a bending moment is introduced to the facet portion, a second spatial direction perpendicular to the first spatial direction, and a third spatial direction perpendicular to the first and second spatial directions.

[0050] In other words, a coordinate system including the first spatial direction, the second spatial direction, and the third spatial direction is assigned to the field of view facet system. The first spatial direction corresponds to the x direction described above. The second spatial direction corresponds to the y direction described above. The third spatial direction corresponds to the z direction described above.

[0051] In yet another embodiment, the bending moment acts around a first spatial direction.

[0052] In particular, the bending moment acts exclusively around the first spatial direction. For this purpose, a lever arm can be provided connected to the facet portion, and this lever arm is deflected using an actuation element. Such a lever arm can be assigned to each actuation element.

[0053] In yet another embodiment, the facet portion deforms exclusively within a plane extending in the second and third spatial directions when a bending moment is introduced.

[0054] This is achieved by changing the rigidity of the facet portion. The plane is preferably oriented perpendicular to the plane of symmetry.

[0055] Furthermore, a lithography apparatus equipped with such a field-of-view facet system is provided.

[0056] A lithography apparatus may include multiple such field-of-view facet systems. The lithography apparatus may be an EUV lithography apparatus or a DUV lithography apparatus. EUV stands for "extreme ultraviolet" and refers to the wavelength of light used from 0.1 nm to 30 nm. DUV stands for "deep ultraviolet" and refers to the wavelength of light used from 30 nm to 250 nm.

[0057] In this case, "a (an)" should not necessarily be understood as strictly limiting to a single element. Rather, multiple elements, such as two, three, or more, can be included. The other numbers used here should not be understood as strictly limiting to the number of elements indicated. Rather, unless otherwise indicated, the number can be increased or decreased.

[0058] The embodiments and features described for the visual field facet system are also applicable to the proposed lithography apparatus, and vice versa.

[0059] Further possible embodiments of the present invention include combinations of features or embodiments not specified above or below with respect to exemplary embodiments. In this case, those skilled in the art may add individual aspects as improvements or supplements to each basic form of the present invention.

[0060] Further advantageous configurations and aspects of the present invention are the subject of the dependent claims and the exemplary embodiments of the invention described below. The present invention will be described in more detail below with reference to the accompanying drawings based on preferred embodiments. [Brief explanation of the drawing]

[0061] [Figure 1A] A schematic diagram of an embodiment of an EUV lithography apparatus is shown. [Figure 1B] A schematic diagram of an embodiment of a DUV lithography apparatus is shown. [Figure 2] Figure 1A or Figure 1B shows a schematic diagram of one embodiment of the optical apparatus of the lithography apparatus shown. [Figure 3] Figure 2 shows a schematic diagram of one embodiment of a field-view facet mirror in the optical device shown. [Figure 4] Figure 2 shows yet another schematic diagram of the optical device. [Figure 5] Figure 2 shows yet another schematic diagram of the optical device. [Figure 6] Figure 2 shows yet another schematic diagram of the optical device. [Figure 7] Figure 2 shows a schematic diagram of one embodiment of the pupil facet of the pupil facet mirror of the optical device shown. [Figure 8] Figure 7 shows yet another schematic diagram of the pupil facets. [Figure 9] Figure 2 shows a schematic diagram of yet another embodiment of the pupil facet of the pupil facet mirror of the optical device shown. [Figure 10] Figure 2 shows a schematic diagram of one embodiment of the optical system of the optical device shown. [Figure 11] Figure 2 shows a schematic diagram of yet another embodiment of the optical system of the optical device shown. [Figure 12] Figure 2 shows a schematic diagram of yet another embodiment of the optical system of the optical device shown. [Figure 13] Figure 2 shows a schematic diagram of yet another embodiment of the optical system of the optical device shown. [Figure 14] Figure 2 shows a schematic diagram of yet another embodiment of the optical system of the optical device shown. [Figure 15] Figure 2 shows a schematic side view of an embodiment of the facet section of the optical system of the optical device shown. [Figure 16] Figure 15 shows a schematic diagram of the facet section. [Figure 17] Figure 15 shows a schematic front view of the facet section. [Figure 18] Figure 2 shows a schematic side view of yet another embodiment of the facet section of the optical system of the optical device shown in Figure 2. [Figure 19] Figure 18 shows a schematic diagram of the facet section. [Figure 20] Figure 18 shows a schematic cross-sectional view of the facet portion following the cross-sectional line AA. [Figure 21] Figure 18 shows yet another schematic cross-sectional view of the facet portion following the cross-sectional line BB. [Figure 22] Figure 2 shows a schematic plan view of yet another embodiment of the facet portion of the optical system of the optical device shown in Figure 2. [Figure 23] Figure 22 shows a schematic cross-sectional view of the facet portion following the cross-sectional line CC. [Figure 24] Figure 22 shows yet another schematic cross-sectional view of the facet portion following the cross-sectional line DD. [Figure 25] Figure 22 shows yet another schematic cross-sectional view of the facet portion following the cross-sectional line EE. [Figure 26] Figure 18 shows a schematic graph illustrating the error profile of the normal vector over the length of the facet shown. [Figure 27] Figure 22 shows a schematic graph illustrating the error profile of the normal vector over the length of the facet shown. [Modes for carrying out the invention]

[0062] Unless otherwise specified, identical or functionally identical elements in the figures are given the same reference numeral. Please note that the figures are not necessarily drawn to a consistent scale.

[0063] Figure 1A shows a schematic diagram of an EUV lithography apparatus 100A equipped with a beam shaping / illumination system 102 and a projection system 104. In this case, EUV means "extreme ultraviolet light" and indicates the wavelength of light used from 0.1 nm to 30 nm. The beam shaping / illumination system 102 and the projection system 104 are each housed in a vacuum housing (not shown), and each vacuum housing is evacuated using an exhaust device (not shown). The vacuum housing is surrounded by a machine room (not shown) which is equipped with a drive device for mechanically moving or setting the optical elements. Furthermore, an electrical controller and the like can also be installed in the machine room.

[0064] The EUV lithography apparatus 100A is equipped with an EUV light source 106A. A plasma source (or synchrotron) that emits radiation 108A in the EUV region (extreme ultraviolet region), i.e., in the wavelength range of 5 nm to 20 nm, can be provided as, for example, the EUV light source 106A. In the beam shaping and illumination system 102, the EUV radiation 108A is focused and the desired working wavelength is filtered from the EUV radiation 108A. The EUV radiation 108A generated by the EUV light source 106A has relatively low transmittance in air, and for this reason, the light guide space of the beam shaping and illumination system 102 and the projection system 104 is evacuated.

[0065] The beam shaping and illumination system 102 shown in Figure 1A has five mirrors 110, 112, 114, 116, and 118. After passing through the beam shaping and illumination system 102, the EUV radiation 108A is directed to a photomask (referred to as a reticle) 120. The photomask 120 is similarly embodied as a reflective optical element and may be located outside of systems 102 and 104. Furthermore, the EUV radiation 108A can be directed to the reticle 120 by mirror 122. The reticle 120 has a structure that is reduced by the projection system 104 and imaged onto a wafer 124 or the like.

[0066] The projection system 104 (also referred to as the projection lens) has six mirrors M1 to M6 to image the photomask 120 onto the wafer 124. In this case, the individual mirrors M1 to M6 of the projection system 104 may be arranged symmetrically with respect to the optical axis 126 of the projection system 104. Note that the number of mirrors M1 to M6 in the EUV lithography apparatus 100A is not limited to the number shown. The number of mirrors M1 to M6 provided can be more or less. Furthermore, the front surfaces of the mirrors M1 to M6 are generally curved for beam shaping.

[0067] Figure 1B shows a schematic diagram of a DUV lithography apparatus 100B equipped with a beam shaping and illumination system 102 and a projection system 104. In this case, DUV stands for "deep ultraviolet," and indicates the wavelength of light used from 30 nm to 250 nm. As already described with reference to Figure 1A, the beam shaping and illumination system 102 and the projection system 104 may be enclosed by a machine room having corresponding drive devices.

[0068] The DUV lithography apparatus 100B has a DUV light source 106B. For example, an ArF excimer laser emitting radiation 108B in the 193 nm DUV region can be provided as the DUV light source 106B.

[0069] The beam shaping and illumination system 102 shown in Figure 1B directs the DUV radiation 108B towards the reticle 120. The photomask 120 is formed as a transmission optical element and may be placed outside systems 102 and 104. The photomask 120 has a structure that is reduced by the projection system 104 and imaged onto a wafer 124 or the like.

[0070] The projection system 104 has a plurality of lens elements 128 and / or mirrors 130 to image the reticle 120 onto the wafer 124. In this case, the individual lens elements 128 and / or mirrors 130 of the projection system 104 may be arranged symmetrically with respect to the optical axis 126 of the projection system 104. Note that the number of lens elements 128 and mirrors 130 in the DUV lithography apparatus 100B is not limited to the number shown. The number of lens elements 128 and / or mirrors 130 provided can be greater or less. Furthermore, the mirrors 130 generally have a curved front surface for beam shaping.

[0071] The gap between the final lens element 128 and the wafer 124 can be replaced with a liquid medium 132 having a refractive index greater than 1. The liquid medium 132 may be, for example, high-purity water. Such a configuration is also called immersion lithography and has high photolithographic resolution. The medium 132 can also be called the immersion liquid.

[0072] Figure 2 shows a schematic diagram of the optical device 200. The optical device 200 is the beam shaping and illumination system 102, and more specifically, the beam shaping and illumination system 102 of the EUV lithography apparatus 100A. Therefore, the optical device 200 can also be called the beam shaping and illumination system, and the beam shaping and illumination system 102 can be called the optical device. The optical device 200 may be placed upstream of the projection system 104 as described earlier.

[0073] However, the optical device 200 can also be part of the DUV lithography apparatus 100B. However, in the following, the optical device 200 will be assumed to be part of the EUV lithography apparatus 100A. In addition to the optical device 200, Figure 2 also shows the EUV light source 106A, which emits EUV radiation 108A as described above, and the photomask 120. The EUV light source 106A may be part of the optical device 200.

[0074] The optical device 200 includes a plurality of mirrors 202, 204, 206, and 208. Furthermore, an optional deflection mirror 210 can be provided. The deflection mirror 210 operates with oblique incidence and can therefore also be called an oblique incidence mirror. The deflection mirror 210 may correspond to mirror 122 shown in Figure 1A. Mirrors 202, 204, 206, and 208 may correspond to mirrors 110, 112, 114, 116, and 118 shown in Figure 1A. In particular, mirror 202 corresponds to mirror 110, and mirror 204 corresponds to mirror 112.

[0075] Mirror 202 is a so-called faceted mirror of the optical device 200, particularly a field-of-view faceted mirror. Mirror 204 is also a faceted mirror of the optical device 200, particularly a pupil faceted mirror. Mirror 202 reflects EUV radiation 108A to mirror 204. At least one of mirrors 206 and 208 may be a condenser mirror of the optical device 200. The number of mirrors 202, 204, 206, and 208 is arbitrary. For example, as shown in Figure 1A, it is possible to have five mirrors 202, 204, 206, and 208, i.e., mirrors 110, 112, 114, 116, and 118, or as shown in Figure 2, four mirrors 202, 204, 206, and 208. However, preferably, at least three mirrors 202, 204, 206, and 208, i.e., a field-of-view faceted mirror, a pupil faceted mirror, and a condenser mirror, are provided.

[0076] A faceted mirror includes multiple thin plates or facets that may be arranged in a straight line. The facets may be curved in an arc or crescent shape. The facets may also be polygonal, particularly quadrilateral. For example, a faceted mirror may have hundreds or even thousands of facets. Each facet may be individually tiltable.

[0077] Mirrors 202, 204, 206, and 208 are placed inside the housing 212. The housing 212 can be evacuated during the operation of the optical device 200, especially during exposure operations. That is, mirrors 202, 204, 206, and 208 are placed in a vacuum.

[0078] During the operation of the optical device 200, the EUV light source 106A emits EUV radiation 108A. As an example, a tin plasma can be generated for this purpose. To generate a tin plasma, a tin body, such as a tin bead or tin droplet, can be struck with laser pulses. The tin plasma emits EUV radiation 108, which is focused using a collector of the EUV light source 106A, such as an ellipsoidal mirror, and directed towards the optical device 200. The collector focuses the EUV radiation 108A to an intermediate focal point 214. The intermediate focal point 214 can also be called the intermediate focal plane, or it lies within the intermediate focal plane.

[0079] Upon passing through the optical device 200, the EUV radiation 108A is reflected by mirrors 202, 204, 206, and 208, respectively, and by the deflection mirror 210. The beam path of the EUV radiation 108A is indicated by reference numeral 216. The photomask 120 is positioned on the object surface 218 of the optical device 200. The object field of view 220 is positioned on the object surface 218.

[0080] Figure 3 shows a schematic plan view of one embodiment of the mirror 202 described above, in the form of a faceted mirror, particularly a field-view faceted mirror. Therefore, the faceted mirror or field-view faceted mirror is denoted here by reference numeral 202. The field-view faceted mirror 202 includes a plurality of linearly arranged thin plates or facets 222. The facets 222 are specifically field-view facets and will also be referred to as such hereafter.

[0081] The field facets 222 can be curved in an arc or crescent shape. The facets 222 can also be polygonal, for example, quadrilateral. In particular, each field facet 222 can have an elongated rectangular geometric shape. Figure 3 shows only a few field facets 222. As an example, a field facet mirror 202 may contain hundreds or even thousands of field facets 222. Each field facet 222 may be individually tiltable. For this purpose, a working element or actuator can be assigned to each field facet 222. The actuator may be a so-called Lorentz actuator.

[0082] Figure 4 shows an enlarged view of an excerpt from the optical device 200 shown in Figure 2. The optical device 200 includes an EUV light source 106A (not shown) that emits EUV radiation 108A, an intermediate focal point 214, a field facet mirror 202, and a mirror 204 in the form of a pupil facet mirror. Mirror 204 will be referred to as the pupil facet mirror below. Mirrors 206, 208, the deflection mirror 210, and the housing 212 are not shown in Figure 4. The pupil facet mirror 204 is positioned at least substantially on the entrance pupil plane or its conjugate plane of the projection system 104.

[0083] The intermediate focus 214 is the aperture diaphragm of the EUV light source 106A. For simplicity, in the following description, we will not distinguish between the aperture diaphragm used to create the intermediate focus 214 and the actual intermediate focus, i.e., the aperture of the aperture diaphragm.

[0084] The field facet mirror 202 includes a carrier or body 224 that supports a plurality of field facets 222A, 222B, 222C, 222D, 222E, and 222F, as described above. The field facets 222A, 222B, 222C, 222D, 222E, and 222F may have the same form, but in particular the shape of their boundaries and / or the curvature of each optical effective surface 226 may differ from one another. The optical effective surface 226 is a mirror surface. The optical effective surface 226 functions to reflect EUV radiation 108A in the direction of the pupil facet mirror 204. In Figure 4, only the optical effective surface 226 of field facet 222A is given a reference numeral. However, field facets 222B, 222C, 222D, 222E, and 222F also have such optical effective surfaces 226. The optically effective surface 226 can be called the field of view facet surface.

[0085] Only field facet 222C will be discussed below. However, all explanations regarding field facet 222C also apply to field facets 222A, 222B, 222D, 222E, and 222F. Therefore, only the portion of EUV radiation 108A corresponding to field facet 222C will be illustrated. However, the entire field facet mirror 202 is illuminated using the EUV light source 106A.

[0086] The pupil facet mirror 204 includes a carrier or body 228 that supports a plurality of pupil facets 230A, 230B, 230C, 230D, 230E, and 230F. Each of the pupil facets 230A, 230B, 230C, 230D, 230E, and 230F has an optically effective surface 232, in particular a mirror surface. In Figure 4, only the optically effective surface 232 of pupil facet 230A is given a reference numeral. The optically effective surface 232 is suitable for reflecting EUV radiation 108A. The optically effective surface 232 can be called the pupil facet surface.

[0087] For switching between different pupils, the field facet 222C can be switched between different pupil facets 230A, 230B, 230C, 230D, 230E, and 230F. In particular, for this purpose, pupil facets 230C, 230D, and 230E are assigned to the field facet 222C. This requires tilting the field facet 222C. This tilt is performed mechanically by 25 mrad to 40 mrad, and the EUV radiation 108 is deflected by 50 mrad to 80 mrad according to the condition that the angle of incidence is equal to the angle of reflection. This angle indication is in terms of half angles, i.e., measured from the center to the edge, not from one (left) edge to the other (right) edge.

[0088] As described above, the field of view facet 222C can be tilted between multiple positions or tilt positions P1, P2, and P3 using an actuator (not shown), for example, a Lorentz actuator. At the first tilt position P1, the field of view facet 222C images the intermediate focal point 214 onto the pupil facet 230C with the imaging light beam 234A (shown as a dashed line). At the second tilt position P2, the field of view facet 222C images the intermediate focal point 214 onto the pupil facet 230D with the imaging light beam 234B (shown as a solid line). At the third tilt position P3, the field of view facet 222C images the intermediate focal point 214 onto the pupil facet 230E with the imaging light beam 234C (shown as a dotted line). Each pupil facet 230C, 230D, and 230E images the field of view facet 222C onto or near the photomask 120 (not shown here).

[0089] At tilt positions P1, P2, and P3, respectively, the imaging light beams 234A, 234B, and 234C illuminate a portion of the optically effective surface 232 of the pupil facets 230C, 230D, and 230E assigned to each tilt position P1, P2, and P3. The effect of switching between tilt positions P1, P2, and P3 to illuminate the optically effective surface 232 of the pupil facets 230C, 230D, and 230E will be explained in more detail below with reference to Figures 5 and 6.

[0090] Figures 5 and 6 show further illustrations of the optical apparatus 200 shown in Figure 4. In Figures 5 and 6, the EUV light source 106A, the intermediate focal point 214, the field facet 222C, and the pupil facet 230D are shown in a row for ease of illustration. However, in practice, as shown in Figure 2, they are arranged at specific angles to each other. Figure 5 shows the field facet 222C at an inclined position P2, and the curvature of the optically effective surface 226 is not changed and is not particularly adapted to the inclined position P2. As shown in Figures 5 and 6, the EUV light source 106A includes a plasma source 236 that generates EUV radiation 108A and a collector 238 that focuses the EUV radiation 108A. The intermediate focal point 214 and the pupil facet 230D are usually circular. The pupil facet 230D may also be hexagonal.

[0091] The field facet 222C projects the image from the intermediate focal point 214 onto the pupil facet 230D using the imaging light beam 234B. However, the optically effective surface 232 of the pupil facet 230D does not precisely correspond to the imaging surface 240, where the image from the intermediate focal point 214 is in perfect focus. Instead, in Figure 5, the optically effective surface 232 of the pupil facet 230D is closer to the field facet 222C than to the imaging surface 240, and the image from the intermediate focal point 214 does not focus on the pupil facet 230D with the imaging light beam 234B. There is a distance a between the optically effective surface 232 of the pupil facet 230D and the imaging surface 240.

[0092] This defocusing limits the reduction of pupil filling. However, to achieve even higher resolution in the EUV lithography optical unit, it is necessary to further reduce the pupil filling. If there is a defocused image at the intermediate focal point 214 in one of the pupil facets 230A, 230B, 230C, 230D, 230E, or 230F, the pupil facet must be made larger than actually required, resulting in a larger area of ​​the pupil facet mirror 204, i.e., a larger illumination area being illuminated. The ratio of the illuminated area to the entire optically effective surface 232 of the pupil facets 230A, 230B, 230C, 230D, 230E, or 230F of the pupil facet mirror 204 (i.e., to the area that the EUV lithography apparatus 100A can handle to the maximum extent) is called the "pupil filling." Typically, small unfilled areas within the otherwise filled region, especially areas smaller than the area of ​​the pupil facets, are also included in the calculation of the pupil filling.

[0093] This out-of-focus image is characterized by an area 242 irradiated by the imaging light beam 234B, and the area shown by hatching in Figures 7 to 9 is relatively large. This is due to the curvature of the optically effective surface 226 of the field facet 222C not being optimized. Figure 7 shows a plan view of the optically effective surface 232 of the pupil facet 230D. The optically effective surface 232 is substantially circular or hexagonal. Therefore, the pupil facet 230D is also preferably circular or hexagonal. The area 242 of the optically effective surface 232 of the pupil facet 230D irradiated by the imaging light beam 234B is approximately the size of the optically effective surface 232 itself. Therefore, the irradiated area 242 extends to approximately the entire optically effective surface 232 of the pupil facet 230D.

[0094] Figure 6 shows the field of view facet 222C at tilt position P2 after changing the curvature of the optical effective surface 226. In Figure 6, the curvature of the optical effective surface 226 is changed so that the distance a between the optical effective surface 232 and the imaging surface 240 decreases. In Figure 6, the distance a is 0, and the optical effective surface 232 and the imaging surface 240 overlap each other. In Figure 6, the image at the intermediate focal point 214 is perfectly focused on the pupil facet 230D with the imaging light beam 234B, and the size of the illumination area 242 is significantly reduced compared to the illumination area 242 in Figure 7, as shown in Figure 8.

[0095] Figure 8 shows yet another plan view of the optically effective surface 232 of the pupil facet 230D. As shown in Figure 8, the illumination area 242 is significantly reduced compared to the illumination area 242 shown in Figure 7 before the curvature of the optically effective surface 226 of the field facet 222C was changed.

[0096] As shown in yet another plan view in Figure 9, it is possible to further refine the pupil facets 230A, 230B, 230C, 230D, 230E, and 230F by reducing their size. As a result, the resolution of the EUV lithography apparatus 100A can be increased. The reduced optical effective surface area 232 of pupil facets 230A, 230B, 230C, 230D, 230E, and 230F is circular or hexagonal. The illumination area 242, shown in hatching, is the same size as in Figure 8, but occupies most of the optical effective surface area 232 of pupil facet 230D shown in Figure 9. Therefore, by optimizing the curvature of the optical effective surface area 226 of the field facet 222C, it is possible to reduce the size of the pupil facet 230.

[0097] The following describes how the curvature of the curved optically effective surface 226 of the field facet 222C is changed in order to always achieve focusing to each pupil facet 230C, 230D, and 230E, and / or to reduce the illuminated area 242 as described above. At the same time, sufficient robustness to withstand thermal disturbances can be achieved, as described below.

[0098] Figure 10 shows a schematic diagram of one embodiment of the optical system 300A. The optical system 300A is part of the optical device 200 as described above. In particular, the optical device 200 may include multiple such optical systems 300A. The optical system 300A is also part of the field facet mirror 202 as described above. The optical system 300A is the field facets 222A, 222B, 222C, 222D, 222E, and 222F as described above. Therefore, the optical system 300A can also be called a field facet, a field facet system, or a field facet device. It is preferable that the optical system 300A is a field facet system. However, in the following, the field facet system will be referred to as the optical system 300A.

[0099] A coordinate system having a first spatial direction or x-direction x, a second spatial direction or y-direction y, and a third spatial direction or z-direction z is assigned to the optical system 300A. The spatial directions x, y, and z are positioned perpendicular to each other. The x-direction x can also be called the width direction. The y-direction y can also be called the length direction or longitudinal direction. The z-direction z can also be called the vertical direction or thickness direction.

[0100] The optical system 300A includes an optical element 302. The optical element 302 is made from a mirror substrate or a substrate. The substrate may include copper in particular, copper alloys in particular, iron-nickel alloys, such as Invar, silicon, or any other suitable material. The substrate is involved in the mechanical properties of the optical element 302.

[0101] The optical system 302 includes a main body 304 and a faceted portion 306. The faceted portion 306 may also be called a facet or optical facet. Preferably, the faceted portion 306 has an arc-shaped or crescent-shaped geometric shape in a plan view. However, the faceted portion 306 may also have an elongated rectangular geometric shape in a plan view. The main body 304 and the faceted portion 306 are embodied integrally, in particular materially as a single unit. In this case, "integrally" or "integrally" means that the main body and the faceted portion 306 form a common component and are not made of different component parts. "Materially as a single unit" means that the main body 304 and the faceted portion 306 are manufactured from the same material as a whole.

[0102] An optically effective surface 308 is provided on the front surface of the optical element 302, i.e., the facet portion 306. The optically effective surface 308 corresponds to the optically effective surface 226 shown in Figure 4. The optically effective surface 308 is a mirror surface. The optically effective surface 308 can be made using a coating. The optically effective surface 308 can be applied to the substrate as a coating. A polishing layer can be provided between the substrate and the optically effective surface 308. The optically effective surface 302 is a mirror facet, or can be referred to as such.

[0103] The optically effective surface 308 or facet portion 306 has a first radius of curvature K1. The first radius of curvature K1 indicates the curvature of the optically effective surface 308 in a plane extending in the y direction y and the z direction z. The optically effective surface 308 or facet portion 306 may further have a second radius of curvature K2. The second radius of curvature K2 is oriented perpendicular to the first radius of curvature K1. This makes the optically effective surface 308 toroidal. The second radius of curvature K2 indicates the curvature of the optically effective surface 308 in a plane extending in the x direction x and the z direction z.

[0104] A gap 310 is provided between the facet portion 306 and the main body 304. The facet portion 306 has two lever arms 312 and 314 that are integrally connected to the facet portion 306, particularly materially, via connecting regions 316 and 318. The gap 310 extends between the facet portion 306 and the lever arms 312 and 314. The connecting regions 316 and 318 each constitute a cross-sectional narrowing portion provided between the facet portion 306 and the lever arms 312 and 314.

[0105] The lever arms 312 and 314 are further connected integrally, in particular materially, to the main body 304 via joints 320 and 322. The joints 320 and 322 are embodied as so-called flexures. In this case, "flexure" should be understood as a region of a component that allows relative movement between two rigid regions by bending. The joints 320 and 322 are elastically deformable. In this case, a first joint 320 and a second joint 322 are provided. The first joint 320 allows movement of the facet 306 about an axis arranged parallel to the x-direction x. The second joint 322 similarly allows movement of the facet 306 about an axis parallel to the x-direction x.

[0106] The optical system 300A includes actuating elements 324 and 326. Actuating elements 324 and 326 can also be called actuators. Actuating elements 324 and 326 are linear actuating elements, in particular linear piezoelectric elements. That is, actuating elements 324 and 326 can be shorter or longer depending on the control. Two actuating elements 324 and 326 can be provided. However, the number of actuating elements 324 and 326 is, in principle, arbitrary. Actuating elements 324 and 326 are piezoelectric actuating elements or piezoelectric actuators. However, it is also possible to use any other actuator for actuating elements 324 and 326.

[0107] Temperature sensors 328 and 330 are assigned to each actuating element 324 and 326. The temperature of each actuating element 324 and 326 can be detected using the temperature sensors 328 and 330. The actuating elements 324 and 326 are housed in recesses 332 and 334 provided within the main body 304.

[0108] Furthermore, the optical system 300A includes temperature sensors 336, 338, 340, and 342 that can be positioned in corresponding recesses of the main body 304. Additionally, the optical system 300A may include displacement measuring sensors 344 and 346, which can be used to detect deformation of the facet portion 306.

[0109] The function of the optical system 300A is described below. The facet section 306 is connected to the main body 304 via the joint sections 320 and 322 and lever arms 312 and 314 located at both ends of the facet section 306. In order to actuate the facet section 306, the actuating elements 324 and 326 are controlled to be shortened, i.e., along the z direction z. As a result, the lever arms 312 and 314 are pulled down along the z direction z in the orientation shown in Figure 10.

[0110] To deform the facet portion 306, the lever arms 312 and 314 pivot around the joint portions 320 and 322, and two opposite bending moments B1 and B2 are applied to the facet portion 306. The first bending moment B1 is in a clockwise direction. The second bending moment B2 is in a counterclockwise direction. At this time, at least the first radius of curvature K1 changes. Depending on the arrangement of the actuation elements 324 and 326, the second radius of curvature K2 may also change.

[0111] Heat input to the optical system 300A occurs mainly through the facet section 306, and heat removal occurs through the base of the main body 304. Therefore, an uneven temperature distribution occurs in the optical system 300A. To compensate for the uneven heating of the optical elements 302, it is advantageous to detect the temperature distribution in the optical system 300A using temperature sensors 328, 330, 336, 338, 340, and 342, detect the deformation state of the optical system 300A using an external control unit 348, calculate a corresponding correction signal, and apply it to the actuators 324 and 326.

[0112] The temperature sensors 328, 330, 336, 338, 340, and 342 preferably detect the temperature of the working elements 324 and 326, respectively, and the temperature of the region related to the disturbance effect of the main body 304 and the lever arms 312 and 314. Embodiments of the temperature sensors 328, 330, 336, 338, 340, and 342 may be NTC sensors (negative temperature coefficient, NTC), thermocouples, platinum sensors, or thermopiles. The thermopile allows for the positioning of the measuring element on the main body 304 using contact temperature measurement of the facet portion 306.

[0113] Alternatively or additionally, the actual deformation of the facet portion 306 can be detected using displacement measuring sensors 344 and 346, and a correction signal for the actuating elements 324 and 326 can be calculated from there using an external control unit 348. This procedure has the advantage of being able to detect and compensate for further errors such as hysteresis of the actuating elements 324 and 326, mechanical drift and creep effects of the actuating elements 324 and 326, or electrical drift of the control unit 348.

[0114] If displacement measuring sensors 344 and 346 are provided, it is advantageous to position at least two of them, 344 and 347, at the same distance from the outer edge of the facet portion 306. Furthermore, it is advantageous to select a displacement measuring system that is as unaffected as possible by temperature changes. Displacement can be measured directly by the change in distance between the facet portion 306 and the main body 304, or by the extension of the facet portion 306 or the lever arms 312 and 314.

[0115] Advantageous embodiments of the direct displacement measuring sensors 344 and 346 may be capacitive or inductive sensors due to the severe limitations of the installation space. For minimum temperature sensitivity, the use of confocal optical sensors is advantageous. For maximum error compensation, the use of actuaries 324 and 326 in a closed control loop that takes into account correction signals from displacement and temperature measurements is advantageous.

[0116] For specific applications of the optical system 300A, it may be advantageous to set different, independent radii of curvature for each length portion of the facet portion 306. This may be necessary, for example, to compensate for inaccuracies or errors during the fabrication of the optically effective surface 308. The facet portion 306 is embodied relatively thinly. As a result, during the polishing of the optically effective surface 308, the forces acting on the facet portion 306 during the polishing process may cause deformation of the facet portion 306, affecting the accuracy of the polishing process. This can result in a wavy deviation between the cylindrical or annular target contour and the actual contour that is actually fabricated.

[0117] Figure 11 shows a schematic diagram of yet another embodiment of optical system 300B. Only the differences between optical systems 300A and 300B are described below.

[0118] Optical system 300B includes actuating elements 324, 326, 350, and 352, which, unlike optical system 300A, are embodied not as linear actuating elements but as shear actuating elements, particularly as shear piezo actuators. In the orientation of Figure 12, actuating elements 324, 326, 350, and 352 can be curved vertically as indicated by the arrows. When viewed along the y-direction, actuating elements 324, 326, 350, and 352 are arranged front to back or left to right.

[0119] Lever arms 354, 356, 358, and 360 are assigned to the respective actuation elements 324, 326, 350, and 352. Each lever arm 354, 356, 358, and 360 is connected to the main body 304 and to the facet section 306 using two joints 362 and 364, as shown based on lever arm 354. The joints 362 and 364 are provided on the end sides of each lever arm 354, 356, 358, and 360, respectively. The joints 362 and 364 are flexures.

[0120] The actuating elements 324, 326, 350, and 352 are operably connected to the lever arms 354, 356, 358, and 360 via decoupling joints 366, 368, 370, and 372. Each decoupling joint 366, 368, 370, and 372 includes two interconnected leaf springs, which are flexible in the horizontal direction, i.e., along the y-direction y, and therefore cannot transmit any or almost any force along the y-direction y. However, force transmission in the vertical direction, i.e., along the z-direction z, is possible to deform the facet portion 306. The decoupling joints 366, 368, 370, and 372 also provide thermal separation. Therefore, the decoupling joints 366, 368, 370, and 372 can also be referred to as thermal decoupling. Displacement sensors 474, 476, 478, and 480 are assigned to lever arms 354, 356, 358, and 360, respectively. Temperature sensors 328, 330, 374, and 376 are assigned to actuating elements 324, 326, 350, and 352, respectively.

[0121] The function of the optical system 300B is described below. When the actuating elements 324, 326, 350, and 352 bend downward, for example in the orientation shown in Figure 11, the downward tensile force applied to the facet section 306 via the lever arms 354, 356, 358, and 360 is strengthened. The facet section 306 is supported by the main body 304 by the joints 320 and 322. The forces that can be set by each actuating element 324, 326, 350, and 352 result in a change in the curvature of the facet section 306. Multiple curvatures of the facet section 306 can be set by controlling the actuating elements 324, 326, 350, and 352 in various ways.

[0122] Figure 12 shows a schematic diagram of yet another embodiment of the optical system 300C. Only the differences between optical systems 300B and 300C are described below.

[0123] Optical system 300C includes actuarial elements 324, 326, 350, and 352 which are embodied as linear actuarial elements rather than shear actuarial elements. That is, the actuarial elements 324, 326, 350, and 352 can be shorter or longer along their longitudinal direction, i.e., along the y-direction y. As in the case of optical system 300B, lever arms 354, 356, 358, and 360 are assigned to each actuarial element 324, 326, 350, and 352, each operably connected to the main body 304 using a joint 362 and operably connected to the facet section 306 using a joint 364. The actuarial elements 324, 326, 350, and 352 can apply tensile or compressive forces to the lever arms 354, 356, 358, and 360.

[0124] Through the corresponding lever arms 354, 356, 358, and 360, changes in the length of each actuating element 324, 326, 350, and 352 are converted into a tensile or compressive force perpendicular to the facet portion 306, i.e., along the z-direction z and in the opposite direction to the z-direction z. Here again, multiple curvatures of the facet portion 306 can be set by various controls of the actuating elements 324, 326, 350, and 352. The temperature sensors 336, 338 and displacement measuring sensors 474, 476, and 478 are arranged according to the embodiment of the optical element 300B shown in Figure 11. As already described with reference to the optical element 300B, temperature sensors (not shown) can also be assigned to the actuating elements 324, 326, 350, and 352.

[0125] Figure 13 shows a schematic diagram of yet another embodiment of the optical system 300D. Only the differences between optical systems 300C and 300D are described below.

[0126] Optical system 300D corresponds to optical system 300C, but differs in that, in the case of optical system 300D, the joint portions 320 and 322 are not provided on the periphery of the facet portion 306, but rather the joint portions 320 and 322 are shifted inward when viewed along the y-direction. Optical system 300D also has a temperature sensor and a displacement measuring sensor (not shown).

[0127] Figure 14 shows a schematic diagram of yet another embodiment of the optical system 300E. Only the differences between optical systems 300D and 300E are described below.

[0128] Unlike optical system 300D, optical system 300E has only two working elements 324 and 326 instead of four. Furthermore, the joints 320 and 322 are provided on the periphery of the facet 306. Optical system 300E also has a temperature sensor and a displacement measuring sensor (not shown).

[0129] In all of the above embodiments of optical systems 300A, 300B, 300C, 300D, and 300E, the main body 304 and the facet portion 306 can be manufactured integrally or monolithically, i.e., from a single raw material without further joints. Therefore, in these embodiments of optical systems 300A, 300B, 300C, 300D, and 300E, the same material can be used for kinematics such as joint portions 320, 322 and facet portion 306. Copper, silicon, silicon carbide (SiSiC), or cordierite are suitable materials.

[0130] Alternatively, the main body 304 and the facet portion 306 may be manufactured separately and connected to each other by a suitable joining method at joints 320, 322, etc. This is particularly advantageous because different manufacturing processes are beneficial due to the different functional requirements for both components. For example, one requirement for the facet portion 306 is minimal inherent stress. This can be achieved, in particular, by milling or etching followed by heat treatment. For example, one requirement for the main body 304 is to produce microstructures as accurately as possible, such as those required for lever arms 312, 314 or joints 320, 322. It is advantageous that these structures can be obtained by etching, additive manufacturing, or different heat treatments.

[0131] Therefore, in the above case, a method of connecting the main body 304 and the facet portion 306 is necessary, for example, by joint portions 320 and 322. The facet portion 306 can be connected to the main body 304 by welding, ringing, soldering, adhesive bonding, diffusion welding, electron beam welding, laser welding, or reactive bonding, for example. In these embodiments of connection at joint portions 320 and 322, intrinsic stress or deformation at the joint point may remain on the optically effective surface 308, degrading its optical properties. Correction of surface defects on the optically effective surface 308 after the connection is established is advantageous for this purpose. This can be done by mechanical, electrochemical, or electron beam optical methods.

[0132] In all of the above embodiments of optical systems 300A, 300B, 300C, 300D, and 300E, piezo actuators are proposed as actuators 324, 326, 350, and 352. However, alternatively, the facet section 306 can also be actuated by magnetic, magnetostrictive, pneumatic, or hydraulic drive. However, the use of piezo actuators is particularly advantageous because of their excellent force-to-installation space ratio. That is, large deformations of the optically effective surface 308 can be achieved within the range of the very limited available installation space. A further advantage is that the small structural size of the piezo actuator allows for the selection of a very narrow width for the facet section 306. As a result, multiple optical systems 300A, 300B, 300C, 300D, and 300E with actuated facet sections 306 and thus optical channels can be arranged in the beam shaping and illumination system 102. This is advantageous for the optical performance of the beam shaping and illumination system 102.

[0133] Furthermore, unlike other actuators, piezo actuators require very little power during steady-state or quasi-steady-state operation. Due to their high internal resistance, the power required for a piezo actuator to maintain its position is negligibly small and is mainly determined by external wiring. Piezo actuators can retain their position after the power supply is cut off. This is advantageous for reducing power consumption, and therefore self-heating, and thus reducing the thermally induced errors mentioned above.

[0134] Figures 15 to 17 show a greatly simplified schematic diagram of one embodiment of the facet portion 306. Figure 15 shows a side view of the facet portion 306. Figure 16 shows a plan view of the facet portion 306. Figure 17 shows a front view of the facet portion 306. In simplified terms, the optical systems 300A, 300B, 300C, 300D, and 300E are based on the motion principle of a curved beam that forms the facet portion 306 and is supported on both sides, with bending moments B1 and B2 introduced on both sides. Figure 15 shows a curved beam in the form of the facet portion 306, with a solid line indicating an undeformed state and a dashed line indicating a deformed state. In the deformed state, the facet portion is indicated by reference numeral 306'.

[0135] According to a possible embodiment, a facet portion 306 that is linear in the y-direction y (the major axis of the facet portion 306) corresponds to a linear curved beam. Each facet portion 306 has a width b and a height h that are constant when viewed along the y-direction y. Such a facet portion 306 having a homogeneous cross-section Q deforms exclusively in a plane extending in the y-direction y and z-direction z when opposite bending moments B1 and B2 are introduced on both sides. As a result, the surface normal or normal vector N of the optically effective surface 308 rotates exclusively around the x-direction x (the minor axis of the facet portion 306) depending on its position in the y-direction y on the facet portion 306.

[0136] Figures 18 to 21 show greatly simplified schematic diagrams of yet another embodiment of the facet portion 306. Figure 18 shows a side view of the facet portion 306. Figure 19 shows a plan view of the facet portion 306. Figure 20 shows a cross-sectional view of the facet portion 306 following the cross-sectional line AA in Figure 18. Figure 21 shows a cross-sectional view of the facet portion 306 following the cross-sectional line BB in Figure 18. For certain applications, it may be advantageous to give the facet portion 306 a crescent or arc shape in the plan view. In this case, the facet portion 306 corresponds to a curved beam. Here again, the facet portion 306 has a homogeneous cross-section.

[0137] When the opposite bending moments B1 and B2 described above are introduced into such a crescent-shaped facet portion 306, this facet portion 306 also deforms mainly in a plane extending in the y-direction y and z-direction z. However, the facet portion 306 also twists in the y-direction y. This twist is zero at both ends of the facet portion 306 and maximum at the center of the facet portion 306.

[0138] As a result, the normal vector N of the optically effective surface 308 rotates around x in the x-direction and around y in the y-direction. At the center of the facet portion 306, the rotation around y in the y-direction is maximum, as shown in Figure 21. In contrast, the rotation around x in the x-direction is zero at the center of the facet portion 306 and maximum at both ends of the facet portion 306. Both rotations have a geometrically determined fixed relationship with respect to each other.

[0139] Figures 22 to 25 show significantly simplified schematic diagrams of yet another embodiment of the facet portion 306. In the plan view shown in Figure 22, the facet portion 306 or the optically effective surface 308 is curved in an arc or crescent shape. Figure 23 shows a cross-sectional view of the facet portion 306 following the cross-sectional line CC in Figure 22. Figure 24 shows a cross-sectional view of the facet portion 306 following the cross-sectional line DD in Figure 22. Figure 25 shows a cross-sectional view of the facet portion 306 following the cross-sectional line EE in Figure 22. In specific applications, it is advantageous to minimize the rotation of the normal vector N around the y direction y.

[0140] This can be achieved by intentionally altering the stiffness of the facet portion 306. In this case, “stiffness” should be understood as the resistance of the facet portion 306, or the object in general, to elastic deformation caused by force or moment. In particular, “stiffness” should be understood as the torsional stiffness of the facet portion 306, i.e., the stiffness to withstand torsional moments that twist the facet portion 306 or apply a twist to the facet portion. The stiffness of a component varies depending, firstly, on the elastic properties of the material, such as the modulus of elasticity, and secondly, on the geometric shape of the deformed component.

[0141] Therefore, the rigidity of the facet portion 306 can be changed by changing the elastic modulus of the material used for the facet portion 306. The above-mentioned change in elastic modulus can be obtained by using a monolithically manufactured base body made of two or more different materials. The base body forms the facet portion 306, or the facet portion 306 is manufactured from the base body. The base body may also include the main body 304. Such a base body can be manufactured from different metal powders by welding, plating, or preferably by additive manufacturing, particularly 3D printing. Additive manufacturing in particular can produce hybrid components that transition continuously between two different materials, for example, copper and steel. Therefore, the facet portion 306 may have a hybrid configuration, particularly made of steel and copper.

[0142] However, it is particularly preferable to vary the geometric shape of the facet portion 306, especially the cross-section Q. However, it is also possible to vary both the modulus of elasticity and the cross-section Q. According to an advantageous embodiment, the facet portion 306 includes a trapezoidal cross-section Q whose upper surface, i.e., the width b1 of the optically effective surface 308, is constant or variable. The width b2 of its lower surface is also variable, but it is advantageous that it is narrower than the upper surface at all points of the facet portion 306. The height h of the cross-section Q can also be selected to be variable.

[0143] For a constant cross-section Q, the polar section modulus of the facet 306 with respect to the x-direction and y-direction is constant along the entire length of the facet 306. The "polar section modulus" is a measure of the resistance of the facet 306, or more generally, the beam, to the generation of internal stress under load. For variable cross-section Q as described above, the polar section modulus can be influenced as desired. This method is not limited to trapezoidal cross-section Q but is applicable to any cross-section having at least two variable cross-sectional parameters, such as width and height. Rectangular, triangular, semi-elliptical, truncated rectangle, or other more complex cross-section Qs can be considered, for example.

[0144] The facet portion 306 includes a first end region 378 and a second end region 380. Bending moments B1 and B2 are introduced into the end regions 378 and 380. A plane of symmetry E1 is located in the center between the end regions 378 and 380, and the facet portion 306 has a mirror-symmetric structure with respect to this plane. The cross section shown in Figure 24 is positioned on the plane of symmetry E1. The plane of symmetry E1 extends in the x-direction x and the z-direction z, or is positioned parallel to a plane extending in the x-direction x and the z-direction z.

[0145] The facet portion 306 has longitudinal directions L1 and L2. The longitudinal directions L1 and L2 are oriented toward the plane of symmetry E1 from the corresponding end regions 378 and 380, respectively. Here, the longitudinal directions L1 and L2 each have an arc-shaped curved profile. For example, the modulus of elasticity of the facet portion 306 decreases along the longitudinal directions L1 and L2 as it moves toward the plane of symmetry E1 from the end regions 378 and 380.

[0146] For example, this can be achieved by having section Q or the cross-sectional area of ​​section Q be minimum at the plane of symmetry E1 and increasing toward the end regions 378, 380. However, the stiffness profile or gradient, i.e., the stiffness profile along each longitudinal direction L1, L2, is symmetric with respect to the plane of symmetry E1. That is, section Q along section line DD shown in Figure 22 is smaller than section Q along section lines CC and EE. The same applies to the polar section modulus.

[0147] Figure 26 shows the error profile of the normal vector N over the length of the facet portion 306 for a specific change in the cross section Q. In this case, the y-direction y is taken as the horizontal axis, and the error angle θ in μrad is taken as the vertical axis. As an example, consider a facet portion 306 with a length of 90 mm and a rectangular cross section Q with an overall width b and height h of 4 mm (Figure 24).

[0148] Curve 382 represents the slope of the normal vector N in the plane E2 extending in the y-direction y and the z-direction z. Curve 384 represents the slope of the normal vector N in the plane extending in the x-direction x and the z-direction z. Curve 386 shows the slope of the normal vector N obtained from curves 382 and 384. As is clear from curve 386, the error angle θ of the composite normal vector N varies from 5 μrad to 19 μrad.

[0149] Unlike Figure 26, Figure 27 shows the error profile of the normal vector M of a facet section 306 with a length of 80 mm, where the height h (Figure 23) is variable, the width b1 (Figure 23) of the upper surface of section Q is constant, and the width b2 (Figure 23) of the lower surface is variable. For a specific variable section Q selected according to the above method, the composite error of the composite normal vector N can be completely eliminated, as shown based on curve 388. That is, the deformation of the facet section 306 occurs only in the plane E2 extending in the y-direction y and the z-direction z. Plane E2 is oriented perpendicular to the plane of symmetry E1.

[0150] Next, returning to Figure 4, the optical device 200 further comprises a measuring unit 244, shown in the side view (left) and top view (right) of Figure 4. The function of the measuring unit 244 is described below. A piezo actuator may exhibit various long-term creep and drift effects that cannot be recorded by the above measuring system due to its own creep behavior.

[0151] Such effects may include, for example, creep resulting from stress relaxation in the adhesive connections between each actuating element 324, 326, 350, 352 and the main body 304, drift of each actuating element 324, 326, 350, 352 due to charge loss, drift of the charge amplifier, and / or material creep of the facet portion 306 or the main body 304. These creep effects may lead to deviations in the actual curvature from a target curvature specified by the control and may occur over several hours, days, or weeks, depending on the creep effect and creep rate.

[0152] The measurement unit 244 is advantageous for measuring these effects and obtaining a correction signal. EUV radiation 108A from the beam path 216 is incident on pivotable field facets 222A, 222B, 222C, 222D, and 222E, which have variable curvature. Depending on the switching position, these reflect the EUV radiation to different pupil facets 230A, 230B, 230C, 230D, 230E, and 230F. The apparatus shown in Figure 4 includes a measurement unit 244 independent of the pupil facet mirror 204.

[0153] To measure the curvature of the field facets 222A, 222B, 222C, 222D, 222E, and 222F, one of the field facets, for example, field facet 222C, is tilted so that the EUV radiation 108 reflected therefrom enters the measurement unit 244. Subsequently, the measurement unit 244 detects the size of the light spot, preferably in multiple spatial directions, particularly in length and width. Correction signals for the actuaries 324, 326, 350, and 352 relating to the facet curvature are calculated from the light spot size by the control unit (illustrated). Using a closed control loop, it is now possible to adjust the light spot to its minimum size and thus set the best focus by iterative optimization. This calibration is performed sequentially on all field facets 222A, 222B, 222C, 222D, 222E, and 222F, and can be performed on each field facet 222A, 222B, 222C, 222D, 222E, and 222F over several hours, several days, or several weeks, depending on the creep effect and creep rate.

[0154] The measurement unit 244 can be embodied, for example, as a CCD sensor (charge-coupled element, CCD). In one embodiment, the pupil facets 230A, 230B, 230C, 230D, 230E, and 230F of the pupil facet mirror 204 are arranged in a circular region. In this case, by placing the measurement unit 244 in the center of this region, the change in the switching angle of the field facets 222A, 222B, 222C, 222D, 222E, and 222F that illuminate the measurement unit 244 is minimized, and the angle of incidence of light from all field facets to the measurement unit is made as steep as possible, which is advantageous. Alternatively, the measurement unit 244 can be placed independently next to the pupil facet mirror 204, as shown in Figure 4, or (not shown) on the edge of the pupil facet mirror 204.

[0155] Although the present invention has been described based on exemplary embodiments, it can be modified in a variety of ways. [Explanation of Symbols]

[0156] 100A EUV Lithography System 100B DUV lithography system 102 Beam shaping and lighting systems 104 Projection system 106A EUV light source 106B DUV light source 108A EUV radiation 108B DUV radiation 100 Mirror 112 Mirror 114 Mirror 116 Mirror 118 Mirror 120 Photomasks 122 Mirror 124 wafers 126 Optical axis 128 lens elements 130 Mirror 132 Medium 200 Optical equipment 202 Mirror / Field of View Faceted Mirror 204 Mirror / Eye Facet Mirror 206 Mirror 208 Mirror 210 Polarizing Mirror 212 Housing 214 intermediate focus 216 Beampaths 218 Object plane 220 Object field of view 222 Facets / Field of View Facets 222A Field of View Facet 222B Field of View Facet 222C Field of View Facets 222D Field of View Facets 222E Field of View Facet 222F Field of View Facets 224 Main Unit 226 Optically Effective Surface 228 Main Unit 230A Pupil Facet 230B Eye Facet 230C Eye Facet 230D Pupil Facet 230E Pupil Facet 230F Eye Facet 232 Optically Effective Surface 234A Imaging light beam 234B Imaging light beam 234C imaging light beam 236 Plasma source 238 Collector 240 Image plane 242 Area 244 measuring units 300A Optical System / Field of View Facet System 300B Optical System / Field of View Facet System 300C Optics / Field Facet System 300D Optical System / Field of View Facet System 300E Optical System / Field of View Facet System 302 Optical elements 304 Main Unit 306 Facet section 306' Facet section 308 Optically Effective Surface 310 void 312 Lever Arm 314 Lever Arm 316 Connection Area 318 Connection Area 320 Joint section 322 Joint section 324 Actuator 326 Actuator 328 Temperature Sensor 330 Temperature Sensor 332 recess 334 recess 336 Temperature Sensor 338 Temperature Sensor 340 Temperature Sensor 342 Temperature Sensor 344 Displacement Measurement Sensor 346 Displacement Measurement Sensor 348 Control Unit 350 Actuating elements 352 Actuator 354 Lever Arm 356 Lever Arm 358 Lever Arm 360 Lever Arm 362 Joint section 364 Joint section 366 Decoupling joint 368 Decoupling joint 370 Decoupling joint 372 Decoupling joint 374 Temperature Sensor 376 Temperature Sensor 378 End area 380 End area 382 curve 384 curve 386 curve 388 curve b Width b1 width b2 width B1 Bending moment B2 Bending moment E1 plane of symmetry E2 plane h height K1 radius of curvature K2 radius of curvature L1 Longitudinal direction L2 Longitudinal direction M1 Mirror M2 Mirror M3 Mirror M4 Mirror M5 Mirror M6 Mirror N normal vector P1 tilt position P2 tilt position P3 tilt position Q cross section xx direction yy direction zz direction θ error angle

Claims

1. A field of view facet system (300A, 300B, 300C, 300D, 300E) for lithography apparatus (100A, 100B), An optical element (302) including an elastically deformable facet portion (306) having a light-reflective optical effective surface (308), At least one actuation element (324, 326, 350, 352) introduces a bending moment (B1, B2) into the facet portion (306) in order to deform the facet portion (306) so as to change the radius of curvature (K1, K2) of the optical effective surface (308), and The facet portion (306) is curved in an arc shape in the plan view of the optically effective surface (308), The facet portion (306) has a cross-section of any geometric shape, and by changing the cross-section, when viewed along the longitudinal direction (L1, L2) of the facet portion (306), the normal vector (N) perpendicular to the optically effective surface (308) is tilted exclusively around the spatial direction (x) when the bending moment (B1, B2) is introduced to the facet portion (306), thus forming a field of view facet system.

2. A field of view facet system according to claim 1, wherein the elastic modulus of the facet portion (306) is variable when viewed along the longitudinal direction (L1, L2).

3. A field of view facet system according to claim 1 or 2, wherein the polar section modulus of the cross section (Q) of the facet portion (306) is variable when viewed along the longitudinal direction (L1, L2).

4. A field of view facet system according to claim 3, wherein the cross-section (Q) is trapezoidal.

5. A field of view facet system according to claim 4, wherein the cross section (Q) includes a first width (b1) facing the optically effective surface (308) and a second width (b2) opposite to the optically effective surface (308), and the first width (1) is greater than the second width (2b).

6. A field of view facet system according to claim 5, wherein the first width (b1) is constant when viewed along the longitudinal direction, and the second width (b2) is variable when viewed along the longitudinal directions (L1, L2).

7. A field of view facet system according to claim 5 or 6, wherein the cross section (Q) includes a height (h) that is variable when viewed along the longitudinal direction (L1, L2).

8. A field of view facet system according to any one of claims 3 to 7, wherein the facet portion (306) includes a first end region (378) and a second end region (380), and the facet portion (306) is configured to be mirror-symmetric with respect to a plane of symmetry (E1) located in the center between the first end region (378) and the second end region (380).

9. A field of view facet system according to claim 8, wherein the cross section (Q) is the smallest on the plane of symmetry (E1).

10. A field of view facet system according to claim 9, wherein the size of the cross section (Q) increases as it moves from the plane of symmetry (E1) toward the first end region (378) and toward the second end region (380).

11. A field of view facet system according to any one of claims 8 to 10, further comprising at least two actuating elements (324, 326, 350, 352) configured to introduce opposite bending moments (B1, B2) into the first end region (378) and the second end region (380).

12. In the visual field facet system according to any one of claims 1 to 11, A field of view facet system further comprising a first spatial direction (x) in which the normal vector (N) is exclusively inclined when the bending moment (B1, B2) is introduced to the facet portion (306), a second spatial direction (y) perpendicular to the first spatial direction (x), and a third spatial direction (z) perpendicular to the first spatial direction (x) and the second spatial direction (y).

13. A field of view facet system according to claim 12, wherein the bending moments (B1, B2) act around the first spatial direction (x).

14. A field of view facet system according to claim 12 or 13, wherein the facet portion (306) deforms in a plane (E2) that extends exclusively in the second spatial direction (y) and the third spatial direction (z) when the bending moment (B1, B2) is introduced.

15. A lithography apparatus (100A, 100B) comprising a field of view facet system (300A, 300B, 300C) according to any one of claims 1 to 14.

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