Reactor system with multidirectional reaction chamber

Abstract

To provide a reactor system which may comprise: multiple reaction chambers; multiple transfer chambers; and / or at least two gate valves coupled to each of the multiple reaction chambers.SOLUTION: A first gate valve of the at least two gate valves may fluidly couple a first corresponding reaction chamber of the multiple reaction chambers to a first transfer chamber of the multiple transfer chambers, and a second gate valve of the at least two gate valves may fluidly couple the first corresponding reaction chamber to a second transfer chamber of the multiple transfer chambers. In various embodiments, each of the multiple transfer chambers may comprise a transfer tool, where each transfer tool may be configured to transfer a substrate into and / or out of the multiple reaction chambers.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present disclosure generally relates to reactor systems, particularly reactor systems comprising one or more multi-directional reaction chambers.

Background Art

[0002] Reactor systems can comprise, for example, reaction chambers, substrate transfer chambers (TCs), load lock chambers (LLCs), and / or substrate various configurations of similar chambers or modules for processing. Referring to the reaction chamber configuration 90 shown in FIG. 2, a number of reaction chambers 60 may be arranged around and / or connected to a TC 80 including transfer tools 85 for transferring substrate between the reaction chambers 60. In another embodiment of the reactor system 91 shown in FIG. 3, a number of reaction chambers 61 may surround and / or be connected to one or more TCs (e.g., TCs 81 and 82). Each TC may include one or more transfer tools (e.g., transfer tool 86 included in TC 81 and transfer tool 87 included in TC 82). Such embodiments of the reactor system may comprise reaction chambers having one gate configured to enable transfer of substrate (s) into and out of each reaction chamber (e.g., a gate fluidly connecting each reaction chamber to a TC and / or an LLC such as LLCs 70 or 71).

[0003] Transfer tools within the reactor system may be configured to transfer substrate between chambers (e.g., between reaction chambers) to initiate a processing method or during a processing method. For example, substrate may be transferred between different reaction chambers within the reactor system for different steps within a processing method (e.g., for fabricating a semiconductor). However, if the transfer tool is for transfer between two or three (or more than three) substrate reaction chambers, the transfer between substrate ​​When processing methods require completion within a limited timeframe, the transport tool must meet the required time. substrate Sometimes it is not possible to keep up with the transport. In other words, the amount of material needed between reaction chambers in the reactor system during the processing method substrate If there are too many deliveries, substrate This results in a "traffic jam," substrate Desired timing in transport and subsequent processing steps (multiple possible) between reaction chambers substrate This can cause delays in transport. Therefore, in a particular reaction chamber of the reactor system (such as reactor system 90 or 91) substrate A reaction chamber may be required to remain in that reaction chamber after the process steps within it are completed, before being transferred to another reaction chamber. Such waiting can reduce the efficiency of the reactor system for producing the final product (e.g., semiconductors) and / or degrade the quality of the final product. [Overview of the Initiative] [Means for solving the problem]

[0004] This summary of the invention is provided to introduce the selection of concepts in a simplified manner. These concepts are described in more detail in the "Modes for Carrying Out the Invention" of the exemplary embodiments of the present disclosure below. This summary of the invention is not intended to identify any major or essential features of the claimed subject matter, nor is it intended to be used to limit the scope of the claimed subject matter.

[0005] In various embodiments, reactor systems are provided. The reactor systems disclosed herein may comprise a plurality of reaction chambers, a plurality of transport chambers, and / or at least two gate valves connected to each reaction chamber of the plurality of reaction chambers. The first gate valve of at least two gate valves may fluidly connect each first reaction chamber of the plurality of reaction chambers to the first transport chamber of the plurality of transport chambers, and the second gate valve of at least two gate valves may fluidly connect each first reaction chamber to the second transport chamber of the plurality of transport chambers. In various embodiments, each of the plurality of transport chambers may comprise a transport tool, each transport tool moving in and out of a plurality (e.g., at least two, or up to two) of the plurality of reaction chambers. substrate It may be configured to transport.

[0006] In various embodiments, the reactor system comprises a first reaction chamber; connected to the first reaction chamber and to the inside and / or outside of the first reaction chamber. substrate A first gate valve of a first reaction chamber configured to enable the transport of; a first transport chamber, where the first transport chamber may be in fluid communication with the first reaction chamber via the first gate valve of the first reaction chamber in response to the opening of the first gate valve of the first reaction chamber, and the reactor system is between the first reaction chamber and the first transport chamber via the first gate valve of the first reaction chamber. substrate A first transport chamber, which may be configured to allow transport of; connected to the first reaction chamber and to the inside and / or outside of the first reaction chamber substrate A second gate valve of a first reaction chamber configured to enable the transport of; and / or a second transport chamber that is in fluid communication with the first reaction chamber via the second gate valve of the first reaction chamber in response to the opening of the second gate valve of the first reaction chamber, wherein the reactor system is in fluid communication between the first reaction chamber and the second transport chamber, through the second gate valve of the first reaction chamber. substrateIt may include a second transport chamber, which can be configured to enable the transport of the material.

[0007] In various embodiments, the first and second transport chambers may be located on opposite sides of the first reaction chamber. In various embodiments, the first and second transport chambers may be arranged around the first reaction chamber at an angle of less than 180 degrees to each other.

[0008] In various embodiments, the reactor system includes a second reaction chamber and is connected to the second reaction chamber and to the inside and / or outside of the second reaction chamber. substrate The reactor system may further include a first gate valve of a second reaction chamber configured to enable the transport of the second reaction chamber. The second reaction chamber may be in fluid communication with the second transport chamber via the first gate valve of the second reaction chamber in response to the opening of the first gate valve of the second reaction chamber. In various embodiments, the reactor system may further include a second gate valve of the second reaction chamber connected to the second reaction chamber. The second reaction chamber may be in fluid communication with the first transport chamber via the second gate valve of the second reaction chamber in response to the opening of the second gate valve of the second reaction chamber.

[0009] In various embodiments, the reactor system may further include a third transport chamber and / or a second gate valve of the second reaction chamber connected to the second reaction chamber. The second reaction chamber may be in fluid communication with the third transport chamber via the second gate valve of the second reaction chamber in response to the opening of the second gate valve of the second reaction chamber.

[0010] In various embodiments, the reactor system is connected to a third reaction chamber and / or to the third reaction chamber, and to the inside and / or outside of the third reaction chamber. substrateThe system may further include a first gate valve of a third reaction chamber, configured to enable the transport of the material. The third reaction chamber may be in fluid communication with the third transport chamber via the first gate valve of the third reaction chamber in response to the opening of the first gate valve of the third reaction chamber.

[0011] In various embodiments, the reactor system may further include a second gate valve of a third reaction chamber connected to the third reaction chamber. The third reaction chamber may be in fluid communication with the first or at least one of the second conveying chambers via the second gate valve of the third reaction chamber in response to the opening of the second gate valve of the third reaction chamber. In various embodiments, the reactor system may further include a fourth conveying chamber and / or a third gate valve of a third reaction chamber connected to the third reaction chamber. The third reaction chamber may be in fluid communication with the fourth conveying chamber via the third gate valve of the third reaction chamber in response to the opening of the third gate valve of the third reaction chamber.

[0012] In various embodiments, the reactor system may further include a fourth transport chamber and / or a second gate valve of a third reaction chamber connected to the third reaction chamber. The third reaction chamber may be in fluid communication with the fourth transport chamber via the second gate valve of the third reaction chamber in response to the opening of the second gate valve of the third reaction chamber. In various embodiments, the reactor system may further include a third gate valve of a first reaction chamber connected to the first reaction chamber. The fourth reaction chamber may be in fluid communication with the first transport chamber via the third gate valve of the first reaction chamber in response to the opening of the third gate valve of the first reaction chamber.

[0013] In various embodiments, the reactor system is connected to a fourth reaction chamber and / or to the fourth reaction chamber, and to the inside and / or outside of the fourth reaction chamber. substrateThe reactor system may further include a first gate valve of a fourth reaction chamber, configured to enable the transport of the material. The fourth reaction chamber may be in fluid communication with the fourth transport chamber via the first gate valve of the fourth reaction chamber in response to the opening of the first gate valve of the fourth reaction chamber. In various embodiments, the reactor system may further include a second gate valve of the fourth reaction chamber connected to the fourth reaction chamber. The fourth reaction chamber may be in fluid communication with the first transport chamber via the second gate valve of the fourth reaction chamber in response to the opening of the second gate valve of the fourth reaction chamber.

[0014] In various embodiments, the method involves conveying, first substrate This may include conveying to the first reaction chamber via a first conveying tool contained in a first conveying chamber, through a first gate valve of the first reaction chamber connected to the first reaction chamber, where the first reaction chamber and the first conveying chamber may be in fluid communication in response to the opening of the first gate valve of the first reaction chamber, and conveying. substrate This may include transporting from a first reaction chamber through a second gate valve of the first reaction chamber connected to the first reaction chamber, via a second transport tool contained in a second transport chamber, where the second transport chamber may be in fluid communication with the first reaction chamber in response to the opening of the second gate valve of the first reaction chamber, and transporting. substrate This may include transporting to a second reaction chamber via a second transport tool through a first gate valve of the second reaction chamber connected to the second reaction chamber, where the second reaction chamber may be in fluid communication with the second transport chamber in response to the opening of the first gate valve of the second reaction chamber, and / or from the second reaction chamber. substrate This may include transporting from the second reaction chamber. In various embodiments, this may include transporting from the second reaction chamber. substrateTransporting may be completed via a first transfer tool through a second gate valve of a second reaction chamber connected to the second reaction chamber, where the second reaction chamber and the first transfer chamber may be in fluid communication in response to the opening of the second gate valve of the second reaction chamber.

[0015] In various embodiments, the method may further include applying a first duration to a first material in the first reaction chamber, and / or applying a second duration to a second material in the second reaction chamber, before transporting the first material from the first reaction chamber and before transporting the second material from the second reaction chamber. The first duration and the second duration may be the same. substrate to a first material from the first reaction chamber substrate before transporting, and / or substrate to a second material in the second reaction chamber substrate before transporting from the second reaction chamber. The first duration and the second duration may be the same.

[0016] In various embodiments, transporting from the second reaction chamber may be completed via a third transfer tool included in a third transfer chamber and through a second gate valve of the second reaction chamber connected to the second reaction chamber, where the second reaction chamber and the third transfer chamber may be in fluid communication in response to the opening of the second gate valve of the second reaction chamber. In various embodiments, the method includes applying a first duration to a first material in the first reaction chamber before transporting from the first reaction chamber, applying a second duration to a second material in the second reaction chamber before transporting from the second reaction chamber, transporting to a third reaction chamber via a third transfer tool through a first gate valve of the third reaction chamber connected to the third reaction chamber, where the third reaction chamber may be in fluid communication with the third transfer chamber in response to the opening of the first gate valve of the third reaction chamber, and / or a third material to substrate a third reaction chamber via a third transfer tool through a first gate valve of the third reaction chamber connected to the third reaction chamber, where the third reaction chamber may be in fluid communication with the third transfer chamber in response to the opening of the first gate valve of the third reaction chamber, and / or a third material to substrate before transporting from the first reaction chamber, applying a first duration to the first material in substrate the first reaction chamber, applying a second duration to the second material in substrate before transporting from the second reaction chamber, applying a second duration to the second material in substrate the second reaction chamber, substrate transporting to the third reaction chamber via a third transfer tool through a first gate valve of the third reaction chamber connected to the third reaction chamber, where the third reaction chamber may be in fluid communication with the third transfer chamber in response to the opening of the first gate valve of the third reaction chamber, and / or a third material to substrateIt may further include applying a third duration. In various embodiments, the second material and the third material may be the same, and the first duration, the second duration, and the third duration may be the same.

[0017] For the purpose of summarizing the disclosure and advantages achieved over the prior art, some specific objects and advantages of the present disclosure are described above herein. It should be understood, of course, that not all such objects or advantages may be achieved by any particular embodiment of the present disclosure. Therefore, for example, one skilled in the art will recognize that the embodiments disclosed herein may be practiced in a manner that achieves or optimizes one advantage or a group of advantages as taught or suggested herein without necessarily achieving other objects or advantages as may be taught or suggested herein.

[0018] All of these embodiments are intended to be within the scope of the present disclosure. It will be readily apparent to those skilled in the art that these and other embodiments can be easily understood from the following detailed description of certain embodiments, with reference to the accompanying drawings, and that the present disclosure is not limited to any particular embodiment discussed.

[0019] The subject matter of the present disclosure is particularly pointed out and distinctly claimed in the concluding portion of this specification. However, a more complete understanding of the present disclosure can best be obtained by reference to the detailed description and the claims when considered in connection with the drawings, in which like numerals indicate like elements.

Brief Description of the Drawings

[0020] [Figure 1] It is a schematic diagram of a reactor system according to various embodiments. [Figure 2] It is a schematic diagram of a reactor system. [Figure 3] It is another schematic diagram of a reactor system. [Figure 4] Figures 4A - 4C are schematic diagrams of a reactor system with a multi - directional reaction chamber according to various embodiments. [Figure 5] Figures 5A and 5B are schematic diagrams of other reactor systems equipped with a multidirectional reaction chamber, according to various embodiments. [Modes for carrying out the invention]

[0021] Certain embodiments and examples are disclosed below, but it will be understood by those skilled in the art that they extend beyond the embodiments and / or uses specifically disclosed herein, as well as their obvious modifications and equivalents. Therefore, the scope of this disclosure is not intended to be limited by the specific embodiments described herein.

[0022] The figures shown herein are not intended to be actual diagrams of any particular material, apparatus, structure, or device, but are merely representations used to describe embodiments of the present disclosure.

[0023] Terms used in this specification: substrate " may refer to any or more underlying materials that may be used or on which a device, circuit, or film may be formed.

[0024] As used herein, the term “atomic layer deposition” (ALD) may refer to a deposition process in which deposition cycles, preferably multiple sequential deposition cycles, are carried out within a process chamber. Between each cycle, the precursor is deposited on the deposition surface (e.g., substrateThe chemisorbed precursor may chemisorb onto a surface or a previously deposited substrate (e.g., a material deposited using a previous ALD cycle) and form a monolayer or sub-monolayer that does not readily react with additional precursors (i.e., a self-controlled reaction). Subsequently, if necessary, reactants (e.g., another precursor or reaction gas) can be introduced into the process chamber for use in converting the chemisorbed precursor into the desired material on the deposited surface. These reactants may further react with the precursor. Furthermore, purging steps during each cycle can be used to remove excess precursor from the process chamber after the conversion of the chemisorbed precursor, as well as excess reactants and / or reaction by-products from the process chamber. Furthermore, as used herein, the term “atomic layer deposition” also means processes represented by related terms, such as chemical vapor deposition atomic layer deposition, atomic layer epitaxy (ALE), molecular beam epitaxy (MBE), gas source MBE, or organometallic MBE, as well as chemical beam epitaxy when carried out with alternating pulses of precursor composition, reactive gas, and purging gas (e.g., inert carrier).

[0025] The term "chemical vapor deposition" (CVD) as used herein refers to: substrate Expose to one or more volatile precursors, and the precursors substrate This can refer to any process that reacts and / or decomposes on a surface to produce a desired deposit.

[0026] As used herein, the terms “film” and “thin film” may refer to any continuous or discontinuous structure and material deposited by the methods disclosed herein. Examples of “film” and “thin film” include 2D materials, nanorods, nanotubes or nanoparticles, or planar partial or complete molecular layers, or partial or complete atomic layers, or clusters of atoms and / or molecules. “Film” and “thin film” may include materials or layers having pinholes, but are still at least partially continuous.

[0027] As used herein, the term “contaminant” refers to a substance placed in the reaction chamber. substrate The term “contaminants” may refer to any undesirable material placed in the reaction chamber or in any component of the reactor system that could affect the purity of the layer.

[0028] As used herein, the term "gas" may include vaporized solids and / or liquids and may consist of a single gas or a mixture of gases.

[0029] Reactor systems used in ALD, CVD, and / or similar processes are substrate It can be used for a variety of applications, including the deposition and etching of materials onto surfaces. In various embodiments, referring to Figure 1, the reactor system 50 is located in the reaction chamber 4 during processing. substrate Susceptor 6 holding 30, one or more reactants substrate The system may include a gas distribution system 8 (e.g., a showerhead) for distributing to the surface of 30, one or more reactant sources 10, 12, and / or a carrier and / or purge gas source 14, which are fluidly connected to the reaction chamber 4 via lines 16-20 and valves or controllers 22-26. Reactive gases or other materials from the reactant sources 10, 12 are distributed to the reaction chamber 4. substrate This can be applied to 30. The purge gas from the purge gas source 14 flows into and through the reaction chamber 4, allowing any excess reactants or other undesirable materials to be removed from the reaction chamber 4. The system 50 may also include a vacuum source 28 fluid-coupled to the reaction chamber 4, which may be configured to suck reactants, purge gas, and / or other materials from the reaction chamber 4.

[0030] In various embodiments, substrateThe processing method may include multiple steps, and these steps may be carried out in multiple reaction chambers. For example, the first precursor may be processed in one reaction chamber. substrate The duration determined may be applied, substrate The first reaction chamber may be transferred to another reaction chamber, and then the second precursor substrate It may also be applied to: Additionally or alternatively, the first layer can be deposited in the first reaction chamber, and the additional reaction chamber can be used for etching, cleaning, and / or additional deposition processes. Timely transport of substrates between reaction chambers leads to a more efficient reactor system. substrate This may facilitate better results for the processing and / or the final product (for example, for final products prepared by processing methods that have time-constrained steps and / or contain unstable compounds that may decompose or react if the processing is not continued within a desired time frame and / or without exposure to the surrounding environment).

[0031] In various embodiments, the reactor system may comprise a plurality of reaction chambers (for example, each within each reactor). Each reactor and / or reaction chamber may have an enclosure wall. The enclosure wall contains substrate The reaction chamber space of the reaction chamber where the processing may be arranged may be enclosed. In various embodiments, the reactor system may include at least two gate valves connected to each reaction chamber (for example, connected to the enclosure wall of each reaction chamber), each gate valve may be configured to selectively allow access to the respective reaction chamber, that is, each gate valve may allow access to the inside and outside of the respective reaction chamber. substrate The reaction chambers may be opened to allow transport (by fluidly connecting each reaction chamber to another chamber in the reactor system, e.g., a transport chamber), or they may be closed to at least partially seal the reaction chambers from the surrounding environment. For example, gate valves for obtaining access to each reaction chamber may be located inside each reaction chamber. substrateIt may be closed during processing. There may be at least two gate valves connected to each reaction chamber, and each gate valve may be inside or outside each reaction chamber. substrate Such reaction chambers can be multidirectional reaction chambers because they can enable transport to different destinations within the reactor system (e.g., other chambers).

[0032] The reactor system may further comprise a plurality of transport chambers. Each transport chamber may comprise a transport chamber enclosure and a transport tool (e.g., a transport arm) positioned within it. The transport tool moves in and out of one or more reaction chambers, and / or in and out of each transport chamber. substrate It may be configured to transport (multiple) fluids. In various embodiments, the transport chamber may be connected to at least two gate valves, which enable fluid communication between other chambers in the reactor system (for example, between them substrate (Enables the transport of) In various embodiments, each reaction chamber in the reactor system may be connected to and / or adjacent to at least two transport chambers. Similarly, each transport chamber may be connected to and / or adjacent to at least two reaction chambers. For example, the first of at least two gate valves connected to a reaction chamber may fluidly connect the reaction chamber to the first transport chamber of a plurality of transport chambers, and as a result, substrate However, in response to the opening of each gate valve, the material may be transported between the first transport chamber and the reaction chamber. The second of at least two gate valves connected to the reaction chamber may fluidly connect the reaction chamber to the second transport chamber among a plurality of transport chambers, and as a result, substrate However, in response to the opening of each gate valve, the material may be transported between the second transport chamber and the reaction chamber.

[0033] In various embodiments, the reaction chamber may be connected to any appropriate number of gate valves, each of which may connect the reaction chamber to a transport chamber. The arrangement of reaction chambers and transport chambers in the reactor system is such that each reaction chamber can be connected to at least two gate valves, each of which is such that it fluidly connects the reaction chamber to a transport chamber (therefore, each reaction chamber is fluidly connected to at least two transport chambers, one to each gate valve), and each transport chamber is connected to and / or adjacent to two or more chambers (for example, two or three chambers, which are a reaction chamber, a load lock chamber, a buffer chamber, and / or are connected to or into the transport chamber by a transport tool in the transport chamber). substrate Any suitable configuration may be possible, which may include any other space to which the material can be transported. Examples of such reactor system configurations of reaction chambers and transport chambers are shown in Figures 4A-4C, 5A, and 5B and are discussed further herein.

[0034] This reactor system configuration of reaction chambers and transport chambers is such that each transport chamber substrate The number of transports can be reduced, and as a result, every between reaction chambers substrate Conveying delays are reduced or minimized. In other words, each conveying chamber has six or more possible configurations (as in the reactor system shown in Figures 2 and 3). substrate (Not a transport chamber with transport capabilities) substrate To minimize or prevent “traffic congestion”, substrate The number of conveyors may be reduced (e.g., to two or three). In various embodiments, to obtain such benefits, each conveyor chamber in the reactor system may be adjacent to and / or connected to up to two or three chambers (e.g., reaction chamber, load lock chamber, buffer chamber, and / or similar). Thus, in such embodiments, each conveyor chamber and / or conveyor tool(s) contained therein may perform up to two or three possible actions between chambers. substrate It may include a transport mechanism.

[0035] Referring to Figure 4A, the reactor system (e.g., reactor system 400A) may comprise a first reaction chamber (e.g., first reaction chamber 110). The first reaction chamber 110 may include a first enclosure 112. The enclosure of the reaction chamber may include any suitable design or shape. For example, the enclosure of the reaction chamber may include a number of enclosure sides (e.g., three, four, six, or eight sides), one or more of which are connected to a gate valve. The gate valve may be configured to open and close to expose or at least partially seal the reaction chamber space of the first reaction chamber 110, respectively. In response to the opening of the gate valve, the reaction chamber connected to the gate valve may be in fluid communication with another chamber in the reactor system. In response to the closing of the gate valve, the reaction chamber connected to the gate valve may be at least partially sealed from another chamber in the reactor system (e.g., an adjacent chamber). As shown in Figure 4A, the first reaction chamber 110 may be connected to the first gate valve 114 of the first reaction chamber. The first gate valve 114 of the first reaction chamber controls access to and from the first reaction chamber 110. substrate This could enable the transport of [the object].

[0036] In various embodiments, the reactor system 400A may include a first conveying chamber 210 having a first conveying chamber enclosure 212. The first conveying chamber 210 may be positioned adjacent to and / or connected to the first reaction chamber 110 and / or the first gate valve 114 of the first reaction chamber. The first gate valve 114 of the first reaction chamber can create fluid communication between the first reaction chamber 110 and the first conveying chamber 210 (for example, in response to the opening of the first gate valve 114 of the first reaction chamber). Thus, one or more first conveying tools 213 contained within the first conveying chamber 210 can be transported through the first gate valve 114 of the first reaction chamber. substrate This can be transported in and out of the first reaction chamber 110.

[0037] Another chamber of the reactor system (for example, reactor system 400A) may be adjacent to and / or connected to the first conveying chamber 210, from which the first conveying tool 213 is conveyed to the first reaction chamber 110. substrate The first conveying tool 213 may receive and / or be transferred to the first conveying chamber 210 from the first reaction chamber 110 and / or another chamber of the reactor system 400A. substrate The load lock chamber (LLC) 105 may be connected to and / or adjacent to the first transport chamber 210. The LLC 105 is waiting to be processed. substrate and / or processed substrate It can be configured to hold. Therefore, the first transport chamber 210 is waiting to be processed. substrate The final product (e.g., the processed substrate) may be transported from LLC105 to the first reaction chamber 110, and / or transported from the final reaction chamber used in the process to LLC105. The final reaction chamber in the reactor system may be the last reaction chamber used in the process, or from there substrate The reaction chamber may be one through which the substrates can be loaded into the LLC by a transport chamber after processing. In embodiments disclosed herein, the first transport chamber of the reactor system may be a transport chamber configured to recover and / or deliver substrates to and from the LLC. The first transport chamber and the LLC may be connected to a gate valve of the LLC (e.g., gate valve 107 of the LLC) through which the substrate(s) may be transported between the first transport chamber and the LLC.

[0038] In various embodiments, the reactor system 400A may include a second transport chamber 220A having a second transport chamber enclosure 222A. The second transport chamber 220A may be connected to and / or adjacent to the first reaction chamber 110. The reactor system 400A may further include a second gate valve 116A of the first reaction chamber connected to the first reaction chamber 110 and / or the second transport chamber 220A. The second transport chamber 220A may be connected to and / or adjacent to the first reaction chamber 110 and / or the second gate valve 116A of the first reaction chamber. The second gate valve 116A of the first reaction chamber can create fluid communication between the first reaction chamber 110 and the second transport chamber 220A (for example, in response to the opening of the second gate valve 116A of the first reaction chamber). Therefore, the second transport tool 223A contained within the second transport chamber 220A passes through one or more gate valves 116A of the first reaction chamber. substrate This can be transported in and out of the first reaction chamber 110.

[0039] The first transport chamber 210 and the second transport chamber 220A may be connected to the first reaction chamber 110 in any suitable configuration. In various embodiments, the first transport chamber 210 and the second transport chamber 220A may be located on opposite sides of the first reaction chamber 110. In various embodiments, the first transport chamber 210 and the second transport chamber 220A may be located at 180 degrees to each other with the first reaction chamber 110 in between. In various embodiments, the first transport chamber 210 and the second transport chamber 220A may be located at less than 180 degrees to each other (e.g., about 90 degrees, about 120 degrees, or about 60 degrees to each other). In this context, "about" means plus or minus 20 or 30 degrees. As illustrated in reactor system 400A, the first transport chamber 210 and the second transport chamber 220A may be located at 90 degrees to each other.

[0040] In various embodiments, the reactor system (e.g., reactor system 400A) may include a second reaction chamber (e.g., a second reaction chamber 120A). The second reaction chamber 120A may include a second enclosure 122A. The second reaction chamber 120A may be adjacent to and / or connected to a second transport chamber 220A.

[0041] The reactor system 400A may include a first gate valve 124A of the second reaction chamber, which is connected to a second reaction chamber 120A and / or a second transport chamber 220A. The first gate valve 124A of the second reaction chamber may, in response to being opened, fluidly connect the second transport chamber 220A and the second reaction chamber 120A, so that the transport of substrates into and out of the second reaction chamber 120A may occur through the first gate valve 124A of the second reaction chamber. substrate The transport of the material can be achieved by a second transport tool 223A.

[0042] In various embodiments, the reactor system 400A may further include a second gate valve 126A of a second reaction chamber. The second gate valve 126A of the second reaction chamber may be connected to the second reaction chamber 120A and / or the first transport chamber 210. The second gate valve 126A of the second reaction chamber may, in response to being opened, fluidly connect the second reaction chamber 120A and the first transport chamber 210, thereby enabling fluid flow into and out of the second reaction chamber 120A. substrate The transport of this can occur through the second gate valve 126A of the second reaction chamber. substrate The conveying can be achieved by the first conveying tool 213. The second reaction chamber 120A and the first conveying chamber 210 may be adjacent and / or connected.

[0043] In the chamber configuration shown in reactor system 400A, the second reaction chamber 120A may also be the final reaction chamber, and from here substrateThe LLC is transported to LLC 105 after processing. Therefore, in various embodiments, the reactor system (e.g., reactor system 400A) may comprise two reaction chambers and two transport chambers, each arranged in two columns of two chambers (i.e., a 2x2 arrangement), with LLC connected to at least one of the transport chambers (e.g., the first transport chamber). LLC may be connected to a transport chamber at any suitable position. For example, LLC may be located closer to one reaction chamber in the reactor system than to another reaction chamber. Referring to reactor system 400A, LLC 105 is located on the opposite side of the first transport chamber 210 from the first reaction chamber 110 (and therefore closer to the second reaction chamber 120A), but in various embodiments, for example, LLC 105 may be located on the opposite side of the first transport chamber 210 from the second reaction chamber 120A (and therefore closer to the first reaction chamber 110).

[0044] Each reaction chamber of reactor system 400A is connected to at least two gate valves, and therefore, the reaction chambers are transported in and out of each reaction chamber. substrate Because it has multiple inlets / outlets, it is a multidirectional reaction chamber.

[0045] Inside reactor system 400A substrate In order to process, substrate The LLC 105 can be transported from the LLC 105 through the first transport chamber 210 to the first reaction chamber 110 via the first transport tool 213. The first transport tool 213 is transported from the LLC 105 through the LLC gate valve 107 (in response to the opening of the LLC gate valve 107). substrate Obtain and substrate This can be transported to the first transport chamber 210. substrateAfter the LLC 105 enters and / or is positioned in the first conveying chamber 210, the gate valve 107 of the LLC may be closed and / or the first gate valve 114 of the first reaction chamber may be opened. The first conveying tool 213 enters the first reaction chamber 110 through the first gate valve 114 of the first reaction chamber (in response to the opening of the first gate valve 114 of the first reaction chamber). substrate You may send it. substrate After the first reaction chamber 110 is entered and / or positioned, the first gate valve 114 of the first reaction chamber may be closed to at least partially seal the first reaction chamber 110, and thus one or more processing steps may occur (for example, one or more gases (such as reactive gas and / or purge gas) in the first reaction chamber 110). substrate (Application to) In the first reaction chamber 110 substrate During the process, the second gate valve 116A of the first reaction chamber may also be closed to at least partially seal the first reaction chamber 110.

[0046] In the first reaction chamber 110 substrate After the processing is complete, the second gate valve 116A of the first reaction chamber may be opened, and the second transfer tool 223A will be opened from the first reaction chamber 110. substrate Obtain and substrate The contents may be transported to the second transport chamber 220A. substrate After the second conveying tool 223A enters and / or is positioned in the second conveying chamber 220A from the first reaction chamber 110, the second gate valve 116A of the first reaction chamber may be closed and / or the first gate valve 124A of the second reaction chamber may be opened. The second conveying tool 223A enters the second reaction chamber 120A through the first gate valve 124A of the second reaction chamber (in response to the opening of the first gate valve 124A of the second reaction chamber). substrate You may send it. substrateAfter the first gate valve 124A of the second reaction chamber enters and / or is positioned in the second reaction chamber 120A, the first gate valve 124A of the second reaction chamber may be closed to at least partially seal the second reaction chamber 120A, so that one or more processing steps are performed inside the second reaction chamber 120A. substrate This can occur in the second reaction chamber 120A. substrate During the process, the second gate valve 126A of the second reaction chamber may also be closed to at least partially seal the second reaction chamber 120A.

[0047] In the second reaction chamber 120A substrate After the processing is complete, the second gate valve 126A of the second reaction chamber opens, and the first conveying tool 213 is released from the second reaction chamber 120A. substrate Obtain and substrate The LLC may be transported to the first transport chamber 210 (or, for further processing, to the first reaction chamber 110). The LLC may be connected to another gate valve (e.g., gate valve 108), which is for processing. substrate Loading into LLC (e.g., by the reactor system operator) or processed from LLC substrate It may be configured to allow for the removal of the object.

[0048] The processes occurring in the first reaction chamber 110 and / or the second reaction chamber 120A are the same or different. substrate The process may include the following: That is, the first process may occur in the first reaction chamber 110 and the second process in the second reaction chamber 120A for any appropriate duration and any appropriate number of steps. For example, the process may consist of two steps (for example, the first material substrate Apply to the second material substrateThe process may include (applicable to), where one step is carried out in the first reaction chamber 110 and the other in the second reaction chamber 120A. In another embodiment, the process may include one step, which may include a processing duration. The entire processing duration may be carried out in either the first reaction chamber 110 or the second reaction chamber 120A, or half of the processing duration may occur in the first reaction chamber 110 and the remaining half of the processing duration may occur in the second reaction chamber 120A. substrate It should be noted that these can be moved between the chambers of the reactor system in any suitable order (for example, in the reverse order of the order described herein).

[0049] Referring to Figure 4B, reactor system 400B may comprise LLC 105, a gate valve 107 for LLC, a first transport chamber 210, a first reaction chamber 110, a first gate valve 114 for the first reaction chamber, and any internal components, similar to reactor system 400A in Figure 4A discussed herein. In various embodiments, reactor system 400B may comprise a second transport chamber 220B connected to and / or adjacent to the first reaction chamber 110. Unlike the second transport chamber 220A of reactor system 400A, the second transport chamber 220B may be on the opposite side of the first transport chamber 210 from the first reaction chamber 110. Reactor system 400B may comprise a second gate valve 116B for the first reaction chamber connected to the first reaction chamber 110 and / or the second transport chamber 220B. The second gate valve 116B of the first reaction chamber may fluidly connect the first reaction chamber 110 and the second conveying chamber 220B (for example, in response to the opening of the second gate valve 116B of the first reaction chamber). Thus, one or more second conveying tools 223B contained within the second conveying chamber 220B are transported in and out of the first reaction chamber 110 through the second gate valve 116B of the first reaction chamber. substrate It can transport.

[0050] In various embodiments, the reactor system (e.g., reactor system 400B) may include a second reaction chamber (e.g., a second reaction chamber 120B). The second reaction chamber 120B may include a second enclosure 122B. The second reaction chamber 120B may be adjacent to and / or connected to a second transport chamber 220A.

[0051] The reactor system 400B may include a first gate valve 124B of the second reaction chamber, which is connected to the second reaction chamber 120B and / or the second transport chamber 220B. The first gate valve 124B of the second reaction chamber may, in response to being opened, fluidly connect the second transport chamber 220B and the second reaction chamber 120B, thereby enabling fluid to enter and exit the second reaction chamber 120B. substrate The transport of this can occur through the first gate valve 124B of the second reaction chamber. substrate The transport of the object can be achieved by a second transport tool 223B.

[0052] In various embodiments, the reactor system 400B may include a third transport chamber (e.g., a third transport chamber 230B). The third transport chamber 230B may include a third enclosure 232B. The third transport chamber 230B may be adjacent to and / or connected to the second reaction chamber 120B. The third transport chamber 230B may be inside and outside the third transport chamber 230B. substrate A third conveying tool 233B configured to convey the object may also be provided.

[0053] In various embodiments, the reactor system 400B may further include a second gate valve 126B of a second reaction chamber. The second gate valve 126B of the second reaction chamber may be connected to the second reaction chamber 120B and / or the third transport chamber 230B. In response to being opened, the second gate valve 126B of the second reaction chamber may fluidly connect the second reaction chamber 120B and the third transport chamber 230B, thereby enabling fluid flow into and out of the second reaction chamber 120B. substrateThe transport of this can occur through the second gate valve 126B of the second reaction chamber. substrate The transport of the material can be achieved by a third transport tool 233B.

[0054] In various embodiments, the reactor system (e.g., reactor system 400B) may include a third reaction chamber (e.g., a third reaction chamber 130B). The third reaction chamber 130B may include a third enclosure 132B. The third reaction chamber 130B may be adjacent to and / or connected to a third transport chamber 230B.

[0055] The reactor system 400B may include a first gate valve 134B of the third reaction chamber, which is connected to the third reaction chamber 130B and / or the third transport chamber 230B. The first gate valve 134B of the third reaction chamber may, in response to being opened, fluidly connect the third transport chamber 230B and the third reaction chamber 130B, thereby enabling fluid to enter and exit the third reaction chamber 130B. substrate The transport of these can occur through the first gate valve 134B of the third reaction chamber. substrate The transport of the material can be achieved by a third transport tool 233B.

[0056] In various embodiments, the reactor system 400B may further include a second gate valve 136B of a third reaction chamber. The second gate valve 136B of the third reaction chamber may be connected to the third reaction chamber 130B and / or the first transport chamber 210. In response to being opened, the second gate valve 136B of the third reaction chamber may fluidly connect the third reaction chamber 130B and the first transport chamber 210, thereby enabling fluid flow into and out of the third reaction chamber 130B. substrate The transport of this can occur through the second gate valve 136B of the third reaction chamber. substrate The conveying can be achieved by the first conveying tool 213. The third reaction chamber 130B and the first conveying chamber 210 may be adjacent and / or connected.

[0057] In the chamber configuration shown in reactor system 400B, the third reaction chamber 130B may also be the final reaction chamber, from which substrate The LLC is then transported to LLC 105 after processing. Therefore, in various embodiments, the reactor system (e.g., reactor system 400B) may comprise three reaction chambers and three transport chambers, each arranged in two longitudinal rows of three chambers (i.e., a 2x3 arrangement) or in two transverse rows of three chambers (i.e., a 3x2 arrangement), with the LLC connected to at least one of the transport chambers (e.g., the first transport chamber). The LLC may be connected to a transport chamber at any suitable location. For example, the LLC may be located closer to one reaction chamber in the reactor system than to another reaction chamber. Referring to reactor system 400B, LLC 105 is located on the opposite side of the first reaction chamber 110 from the first transport chamber 210 (and therefore closer to the third reaction chamber 130B). However, in various embodiments, LLC 105 may be located on the opposite side of the third reaction chamber 130B from the first transport chamber 210 (and therefore closer to the first reaction chamber 110).

[0058] Each reaction chamber of reactor system 400B is connected to at least two gate valves, and therefore, the reaction is transported in and out of each reaction chamber. substrate Because it has multiple inlets / outlets, it is a multidirectional reaction chamber.

[0059] In reactor system 400B substrate In order to process, substrate The LLC 105 may be transported from the LLC 105 to the first reaction chamber 110 through the first transport chamber 210 and via the first transport tool 213. The first transport tool 213 is transported from the LLC 105 through the LLC gate valve 107 (in response to the opening of the LLC gate valve 107). substrate Obtain and substrate This can be transported to the first transport chamber 210. substrateHowever, after entering and / or being positioned in the first conveying chamber 210 from the LLC, the gate valve 107 of the LLC may be closed and / or the first gate valve 114 of the first reaction chamber may be opened. The first conveying tool 213 enters the first reaction chamber 110 through the first gate valve 114 of the first reaction chamber (in response to the opening of the first gate valve 114 of the first reaction chamber). substrate You may send it. substrate After the first reaction chamber 110 is entered and / or positioned, the first gate valve 114 of the first reaction chamber may be closed to at least partially seal the first reaction chamber 110, and thus one or more processing steps may occur (for example, one or more gases (such as reactive gas and / or purge gas) in the first reaction chamber 110). substrate (Application to) In the first reaction chamber 110 substrate During the process, the second gate valve 116B of the first reaction chamber may also be closed to at least partially seal the first reaction chamber 110.

[0060] In the first reaction chamber 110 substrate After the processing is complete, the second gate valve 116B of the first reaction chamber may be opened, and the second transfer tool 223B will be opened from the first reaction chamber 110. substrate Obtain and substrate The contents may be transported to the second transport chamber 220B. substrate However, after entering and / or being positioned in the second conveying chamber 220B from the first reaction chamber 110, the second gate valve 116B of the first reaction chamber may be closed and / or the first gate valve 124B of the second reaction chamber may be opened. The second conveying tool 223B enters the second reaction chamber 120B through the first gate valve 124B of the second reaction chamber (in response to the opening of the first gate valve 124B of the second reaction chamber). substrate You may send it. substrateAfter the first gate valve 124B of the second reaction chamber enters and / or is positioned in the second reaction chamber 120B, the first gate valve 124B of the second reaction chamber may be closed to at least partially seal the second reaction chamber 120B, so that one or more processing steps are performed inside the second reaction chamber 120B. substrate This can occur in the second reaction chamber 120B. substrate During the process, the second gate valve 126B of the second reaction chamber may also be closed to at least partially seal the second reaction chamber 120B.

[0061] In the second reaction chamber 120B substrate After the processing is complete, the second gate valve 126B of the second reaction chamber may be opened, and the third transport tool 233B may be opened from the second reaction chamber 120B. substrate Obtain and substrate The contents may be transported to the third transport chamber 230B. substrate However, after entering and / or being positioned in the third conveying chamber 230B from the second reaction chamber 120B, the second gate valve 126B of the second reaction chamber may be closed and / or the first gate valve 134B of the third reaction chamber may be opened. The third conveying tool 233B enters the third reaction chamber 130B through the first gate valve 134B of the third reaction chamber (in response to the opening of the first gate valve 134B of the third reaction chamber). substrate You may send it. substrate After the first gate valve 134B of the third reaction chamber enters and / or is positioned in the third reaction chamber 130B, the first gate valve 134B of the third reaction chamber may be closed to at least partially seal the third reaction chamber 130B, so that one or more processing steps are performed inside the third reaction chamber 130B. substrate This can occur in the third reaction chamber 130B. substrate During the process, the second gate valve 136B of the third reaction chamber may also be closed to at least partially seal the third reaction chamber 130B.

[0062] In the third reaction chamber 130B substrateAfter the processing is complete, the second gate valve 136B of the third reaction chamber may be opened, and the first conveying tool 213 will be removed from the third reaction chamber 130B. substrate Obtain and substrate The material may be transported to the first transport chamber 210 (or, for further processing, it may be transported again to the first reaction chamber 110).

[0063] The processes that occur in the first reaction chamber 110, the second reaction chamber 120B, and / or the third reaction chamber 130B are as follows: substrate The process may include the same or different processes. That is, for any appropriate duration and any appropriate number of steps, the first process may occur in the first reaction chamber 110, the second process may occur in the second reaction chamber 120B, and / or the third process may occur in the third reaction chamber 130B. For example, the process may include three steps, (for example, each step having the same or different duration) one step carried out in the first reaction chamber 110, one step carried out in the second reaction chamber 120B, and the final step carried out in the third reaction chamber 130B. As another embodiment, substrate The process involves one step (for example, the first material substrate (to apply the first duration) and the second step (for example, the second material substrate This may include applying a second duration to the first duration. However, the second duration may be longer than the first duration (for example, twice as long). Thus, the first step may be carried out in the first reaction chamber 110, and the second step may be divided between the second reaction chamber 120B and the third reaction chamber 130B (for example, for half the duration of the second duration (which may be equal to the duration of the first duration), the second reaction chamber 120B substrate The second material is applied, and for the remaining half of the second duration, the third reaction chamber 130B substrate A third material is applied (which may be the same as the second material in order to complete the second step of the process). In this embodiment, the process steps may be spread across reaction chambers, and as a result, substrateIt moves continuously through the chambers of the reactor system, and as a result, between the chambers substrate Conveying delay (i.e., waiting in the reaction chamber or the next conveying chamber to complete the process step in the reaction chamber and enter the subsequent reaction chamber) substrate ) is minimized or prevented. In yet another embodiment, the process may include a single step, which may include a processing duration. The entire processing duration may take place in any of the first reaction chamber 110, the second reaction chamber 120B, and / or the third reaction chamber 130B, or one-third of the processing duration may occur in the first reaction chamber 110, the second one-third of the processing duration may occur in the second reaction chamber 120B, and the last one-third of the processing duration may occur in the third reaction chamber 130B (or processing between at least several reaction chambers and / or any other division of the processing duration). substrate It should be noted that these can be moved between the chambers of the reactor system in any suitable order (for example, in the reverse order of the order described herein).

[0064] Referring to Figure 4C, reactor system 400C may internally include LLC 105, a gate valve 107 for LLC, a first transport chamber 210, a first reaction chamber 110, a first gate valve 114 for the first reaction chamber, and any other components, similar to reactor systems 400A and 400B discussed herein. Furthermore, reactor system 400C may internally include a second gate valve 116B for the first reaction chamber and a second transport chamber 220B, and any other components, similar to reactor system 400B. In various embodiments, reactor system 400C may include a second transport chamber 220B connected to and / or adjacent to the first reaction chamber 110. Reactor system 400C may include a second gate valve 116B for the first reaction chamber connected to and / or the second transport chamber 220B. The second gate valve 116B of the first reaction chamber may fluidly connect the first reaction chamber 110 and the second conveying chamber 220B (for example, in response to the opening of the second gate valve 116B of the first reaction chamber). Thus, one or more second conveying tools 223B contained within the second conveying chamber 220B are transported in and out of the first reaction chamber 110 through the second gate valve 116B of the first reaction chamber. substrate It can transport.

[0065] In various embodiments, the reactor system (e.g., reactor system 400C) may include a second reaction chamber (e.g., a second reaction chamber 120C). The second reaction chamber 120C may include a second enclosure 122C. The second reaction chamber 120C may be connected to a second transport chamber 220B. The second reaction chamber 120C may be located on the opposite side of 110, with the second transport chamber 220B between them. As discussed herein, the chambers may be located in any suitable arrangement, and therefore the second reaction chamber 120C may be located relative to the first reaction chamber 110 in any suitable manner, with the second transport chamber 220B in between.

[0066] The reactor system 400C may include a first gate valve 124C of the second reaction chamber, which is connected to the second reaction chamber 120C and / or the second transport chamber 220B. The first gate valve 124C of the second reaction chamber may, in response to being opened, fluidly connect the second transport chamber 220B and the second reaction chamber 120C, thereby enabling fluid to enter and exit the second reaction chamber 120C. substrate The transport of this can occur through the first gate valve 124C of the second reaction chamber. substrate The transport of the object can be achieved by a second transport tool 223B.

[0067] In various embodiments, the reactor system 400C may include a third transport chamber (e.g., a third transport chamber 230C). The third transport chamber 230C may include a third enclosure 232C. The third transport chamber 230C may be adjacent to and / or connected to the second reaction chamber 120C. The third transport chamber 230C may be inside and outside the second reaction chamber 120C. substrate It may include a third transport tool 233C configured to transport the object.

[0068] In various embodiments, the 400C may further comprise a second gate valve 126C of a second reaction chamber. The second gate valve 126C of the second reaction chamber may be connected to the second reaction chamber 120C and / or the third transport chamber 230C. The second gate valve 126C of the second reaction chamber may, in response to being opened, fluidly connect the second reaction chamber 120C and the third transport chamber 230C, thereby enabling fluid to enter and exit the second reaction chamber 120C. substrate The transport of this can occur through the second gate valve 126C of the second reaction chamber. substrate The transport of the material can be achieved by a third transport tool 233C.

[0069] In various embodiments, the reactor system (e.g., reactor system 400C) may include a third reaction chamber (e.g., a third reaction chamber 130C). The third reaction chamber 130C may include a third enclosure 132C. The third reaction chamber 130C may be adjacent to and / or connected to a third transport chamber 230C. In various embodiments, the third reaction chamber 130C may be adjacent to and / or connected to a second transport chamber 230B.

[0070] The reactor system 400BC may include a first gate valve 134C of a third reaction chamber, which may be connected to a third reaction chamber 130C and / or a third transport chamber 230C. In response to being opened, the first gate valve 134C of the third reaction chamber may fluidly connect the third transport chamber 230C and the third reaction chamber 130C, thereby enabling fluid flow into and out of the third reaction chamber 130C. substrate The transport of this can occur through the first gate valve 134C of the third reaction chamber. substrate The transport of the material can be achieved by a third transport tool 233C.

[0071] In various embodiments, the reactor system 400C may include a fourth transport chamber (e.g., a fourth transport chamber 240C). The fourth transport chamber 240C may include a fourth enclosure 242C. The fourth transport chamber 240C may be adjacent to and / or connected to the third reaction chamber 130C. In various embodiments, the fourth transport chamber 240C may be adjacent to and / or connected to the first reaction chamber 110. The fourth transport chamber 240C may be inside and outside the third reaction chamber 130C. substrate It may include a fourth transport tool 243C configured to transport the object.

[0072] In various embodiments, 400C may further comprise a second gate valve 136C of a third reaction chamber. The second gate valve 136C of the third reaction chamber may be connected to the third reaction chamber 130C and / or a fourth transport chamber 240C. The second gate valve 136C of the third reaction chamber may, in response to being opened, fluidly connect the third reaction chamber 130C and the fourth transport chamber 240C, thereby enabling fluid flow into and out of the third reaction chamber 130C. substrate The transport of this can occur through the second gate valve 136C of the third reaction chamber. substrate The transport of the material can be achieved by a fourth transport tool 243C.

[0073] In various embodiments, the reactor system (e.g., reactor system 400C) may include a fourth reaction chamber (e.g., a fourth reaction chamber 140C). The fourth reaction chamber 140C may include a third enclosure 142C. The fourth reaction chamber 140C may be adjacent to and / or connected to a fourth transport chamber 240C. In various embodiments, the fourth reaction chamber 140C may be adjacent to and / or connected to a first transport chamber 210.

[0074] In various embodiments, the reactor system 400C may include a first gate valve 144C of a fourth reaction chamber, which may be connected to a fourth reaction chamber 140C and / or a fourth transport chamber 240C. The first gate valve 144C of the fourth reaction chamber may, in response to being opened, fluidly connect the fourth reaction chamber 140C and the fourth transport chamber 240C, thereby enabling fluid to enter and exit the fourth reaction chamber 140C. substrate The transport of this can occur through the first gate valve 144C of the fourth reaction chamber. substrate The transport of the material can be achieved by a fourth transport tool 243C.

[0075] In various embodiments, the reactor system 400C may further include a second gate valve 146C of a fourth reaction chamber. The second gate valve 146C of the fourth reaction chamber may be connected to the fourth reaction chamber 140C and / or the first transport chamber 210. The second gate valve 146C of the fourth reaction chamber may, in response to being opened, fluidly connect the fourth reaction chamber 140C and the first transport chamber 210, thereby enabling fluid to enter and exit the fourth reaction chamber 140C. substrate The transport of this can occur through the second gate valve 146C of the fourth reaction chamber. substrate The conveying can be achieved by the first conveying tool 213. The fourth reaction chamber 140C and the first conveying chamber 210 may be adjacent and / or connected.

[0076] In the chamber configuration shown in reactor system 400C, the fourth reaction chamber 140C may also be the final reaction chamber, from which substrate The LLC is then transported to LLC 105 after processing. Therefore, in various embodiments, the reactor system (e.g., reactor system 400C) may comprise four reaction chambers and four transport chambers, each with LLC connected to at least one of the transport chambers (e.g., the first transport chamber) and arranged in two longitudinal rows of four chambers (i.e., a 2x4 arrangement), or in two transverse rows of four chambers (i.e., a 4x2 arrangement). LLC may be connected to the transport chamber at any suitable location. For example, LLC may be located closer to one reaction chamber in the reactor system than to another reaction chamber. Referring to reactor system 400C, similar to the chamber arrangement in reactor system 500B in Figure 5B, LLC 105 is located on the opposite side of the first reaction chamber 110 from the first transport chamber 210 (and therefore closer to the fourth reaction chamber 140C). However, in various embodiments, LLC 105 may be located on the opposite side of the first transport chamber 210 from the fourth reaction chamber 140C (and therefore closer to the first reaction chamber 110).

[0077] Each reaction chamber of the reactor system 400C is connected to at least two gate valves, and therefore, the reaction is transported in and out of each reaction chamber. substrate Because it has multiple inlets / outlets, it is a multidirectional reaction chamber.

[0078] Reactor system 400C substrate In order to process, substrate The LLC 105 may be transported from the LLC 105 to the first reaction chamber 110 through the first transport chamber 210 and via the first transport tool 213. The first transport tool 213 is transported from the LLC 105 through the LLC gate valve 107 (in response to the opening of the LLC gate valve 107). substrate Obtain and substrate This can be transported to the first transport chamber 210. substrate After the LLC 105 enters and / or is positioned in the first conveying chamber 210, the gate valve 107 of the LLC may be closed and / or the first gate valve 114 of the first reaction chamber may be opened. The first conveying tool 213 enters the first reaction chamber 110 through the first gate valve 114 of the first reaction chamber (in response to the opening of the first gate valve 114 of the first reaction chamber). substrate The substrate may be delivered. After the substrate enters and / or is placed in the first reaction chamber 110, the first gate valve 114 of the first reaction chamber may be closed to at least partially seal the first reaction chamber 110, so that one or more processing steps may occur (for example, one or more gases (such as reactive gas and / or purge gas) in the first reaction chamber 110). substrate (Application to) In the first reaction chamber 110 substrate During the process, the second gate valve 116B of the first reaction chamber may also be closed to at least partially seal the first reaction chamber 110.

[0079] In the first reaction chamber 110 substrateAfter the processing is complete, the second gate valve 116B of the first reaction chamber may be opened, and the second transfer tool 223B will be opened from the first reaction chamber 110. substrate Obtain and substrate The contents may be transported to the second transport chamber 220B. substrate However, after entering and / or being positioned in the second conveying chamber 220B from the first reaction chamber 110, the second gate valve 116B of the first reaction chamber may be closed and / or the first gate valve 124C of the second reaction chamber may be opened. The second conveying tool 223B enters the second reaction chamber 120C through the first gate valve 124C of the second reaction chamber (in response to the opening of the first gate valve 124C of the second reaction chamber). substrate You may send it. substrate After the first gate valve 124C of the second reaction chamber enters and / or is positioned in the second reaction chamber 120C, the first gate valve 124C of the second reaction chamber may be closed to at least partially seal the second reaction chamber 120C, so that one or more processing steps are performed inside the second reaction chamber 120C. substrate This can occur in the second reaction chamber 120C. substrate During the process, the second gate valve 126C of the second reaction chamber may also be closed to at least partially seal the second reaction chamber 120C.

[0080] In the second reaction chamber 120C substrate After the processing is complete, the second gate valve 126C of the second reaction chamber may be opened, and the third transfer tool 233C may be opened from the second reaction chamber 120C. substrate Obtain and substrate The contents may be transported to the third transport chamber 230C. substrateHowever, after entering and / or being positioned in the third conveying chamber 230C from the second reaction chamber 120C, the second gate valve 126C of the second reaction chamber may be closed and / or the first gate valve 134C of the third reaction chamber may be opened. The third conveying tool 233C enters the third reaction chamber 130C through the first gate valve 134C of the third reaction chamber (in response to the opening of the first gate valve 134C of the third reaction chamber). substrate You may send it. substrate After the first gate valve 134C of the third reaction chamber 130C has entered and / or been positioned in the third reaction chamber 130C, the first gate valve 134C of the third reaction chamber may be closed to at least partially seal the third reaction chamber 130C, so that one or more processing steps are performed inside the third reaction chamber 130C. substrate This can occur in the third reaction chamber 130C. substrate During the process, the second gate valve 136C of the third reaction chamber may also be closed to at least partially seal the third reaction chamber 130C.

[0081] In the third reaction chamber 130C substrate After the processing is complete, the fourth transport tool 243C moves out of the third reaction chamber 130C. substrate Obtain and substrate The contents may be transported to the fourth transport chamber 240C. substrate However, after entering and / or positioning itself in the fourth conveying chamber 240C from the third reaction chamber 130C, the second gate valve 136C of the third reaction chamber may be closed and / or the first gate valve 144C of the fourth reaction chamber may be opened. The fourth conveying tool 243C enters the fourth reaction chamber 140C through the first gate valve 144C of the fourth reaction chamber (in response to the opening of the first gate valve 144C of the fourth reaction chamber). substrate The substrate may be delivered. After the substrate enters and / or is placed in the fourth reaction chamber 140C, the first gate valve 144C of the fourth reaction chamber may be closed to at least partially seal the fourth reaction chamber 140C, so that one or more processing steps are performed inside the fourth reaction chamber 140C. substrate This can occur in the fourth reaction chamber 140C. substrate During the process, the second gate valve 146C of the fourth reaction chamber may also be closed to at least partially seal the fourth reaction chamber 140C.

[0082] In the fourth reaction chamber 140C substrate After the processing is complete, the second gate valve 146C of the fourth reaction chamber may be opened, and the first conveying tool 213 will be released from the fourth reaction chamber 140C. substrate Obtain and substrate The material may be transported to the first transport chamber 210 (or, for further processing, it may be transported again to the first reaction chamber 110).

[0083] The processes occurring in the first reaction chamber 110, the second reaction chamber 120C, the third reaction chamber 130C, and / or the fourth reaction chamber 140C are as follows: substrate The process may include the same or different processes. That is, for any appropriate duration and any appropriate number of steps, the first process may occur in the first reaction chamber 110, the second process may occur in the second reaction chamber 120C, the third process may occur in the third reaction chamber 130C, and / or the fourth process may occur in the fourth reaction chamber 140C. For example, the process may include four steps, (for example, each step having the same or different duration) one step carried out in the first reaction chamber 110, one step carried out in the second reaction chamber 120C, another step carried out in the third reaction chamber 130C, and the final step carried out in the fourth reaction chamber 140C. As another embodiment, substrate The process involves one step (for example, the first material substrate (to apply the first duration) and the second step (for example, the second material substrateThis may include applying a second duration to the first reaction chamber 110. However, the second duration may be longer than the first duration (for example, three times longer). Thus, the first step may be carried out in the first reaction chamber 110, and the second step may be divided between the second reaction chamber 120C, the third reaction chamber 130C, and the fourth reaction chamber 140C (for example, for 1 / 3 of the second duration, the second reaction chamber 120C substrate Then the second material is applied (one-third of the second duration may be equal to the first duration), and during another one-third of the second duration, the third reaction chamber 130C substrate The third material is applied, and for the remaining 1 / 3 of the second duration, the fourth reaction chamber 140C substrate A fourth material is applied (the first, second, and third materials may all be the same material in order to complete the second step of the process). In this embodiment, the process steps may be spread across reaction chambers, and as a result, substrate It moves continuously through the chambers of the reactor system, and as a result, between the chambers substrate Conveying delay (i.e., waiting in the reaction chamber or the next conveying chamber to complete the process step in the reaction chamber and enter the subsequent reaction chamber) substrate) is mitigated or prevented. In yet another embodiment, the process may comprise a single step, which may comprise a processing duration. The entire processing duration may take place in any of the first reaction chamber 110, the second reaction chamber 120C, the third reaction chamber 130C, and / or the fourth reaction chamber 140C, or processing for 1 / 4 of the duration may occur in each of the first reaction chamber 110, the second reaction chamber 120C, the third reaction chamber 130C, and / or the fourth reaction chamber 140C (or processing between at least some reaction chambers and / or any other division of the processing duration). In yet another embodiment, the process may comprise two steps, namely a first step having a first duration and a second step having a second duration. The first step may be carried out in the first reaction chamber 110 for half of the first duration and in the second reaction chamber 120C for the remaining half of the first duration, and the second step may be carried out in the third reaction chamber 130C for half of the second duration and in the fourth reaction chamber 140C for the remaining half of the second duration.

[0084] The arrows shown in Figures 4A-4C, 5A, and 5B are for illustrative purposes only. substrate These can be transported between chambers within the reaction chamber in any appropriate manner or order. Similarly, the designations such as "first," "second," and "third" for chambers, gate valves, etc., within the reactor system are not necessarily substrate This does not indicate the order in which the components may be transported, or the order or arrangement of the chambers or gate valves (i.e., which chambers and / or gate valves are close to or adjacent to each other).

[0085] In various embodiments, the reactor system may include additional gate valves connecting chambers other than those discussed in relation to reactor systems 400A, 400B, and 400C. For example, referring to reactor system 400B in Figure 4B, there may be gate valves connected to the first reaction chamber 110 and / or the third transport chamber 230B (this may be the third gate valve of the first reaction chamber), so that the third transport tool 233B can enter and exit the first reaction chamber 110. substrate The transport tool 243C may be transported (for example, to bypass the second reaction chamber 120B or the third reaction chamber 130B). In another embodiment, referring to the reactor system 400C of Figure 4C, there may be a gate valve connecting the first reaction chamber 110 and the fourth transport chamber 240C (this may be the third gate valve of the first reaction chamber) (and / or the first reaction chamber 110 and the fourth transport chamber 240C may be connected), and as a result the fourth transport tool 243C can move in and out of the first reaction chamber 110. substrate The materials may be transported (for example, between the first reaction chamber 110 and the fourth transport chamber 240C). substrate To transport (for example, to bypass the second reaction chamber 120C and / or the third reaction chamber 130C), and / or between the first reaction chamber 110 and the third reaction chamber 130C substrate To transport (for example, to bypass the second reaction chamber 120C and / or the fourth reaction chamber 140C). There may be a gate valve connecting the second transport chamber 220B and the third reaction chamber 130C (this may be the third gate valve of the second reaction chamber) (and / or the second transport chamber 220B and the third reaction chamber 130C may be connected), so that the second transport tool 223B can enter and exit the third reaction chamber 130C. substrate The materials may be transported (for example, between the first reaction chamber 110 and the third reaction chamber 130C). substrateTo transport (for example, to bypass the second reaction chamber 120C). Thus, in various embodiments, the chambers of the reactor system are connected to three gate valves to allow additional gases to pass through the chambers of the reactor system. substrate Route options may be provided (for example, to utilize fewer chambers than all chambers in the reactor system for the process).

[0086] In various embodiments, the gate valve may be connected to the reaction chamber and / or transport chamber within the reactor system, and / or to the enclosure of the reaction chamber and / or transport chamber (or any other chamber in the reactor system). In various embodiments, the gate valve may be a separate component of the reactor system, or it may be included in the reaction chamber and / or transport chamber (or any other chamber in the reactor system), and / or its enclosure. In various embodiments, each reaction chamber may be included in a reactor (for example, the first reaction chamber may be included in the first reactor, the second reaction chamber may be included in the second reactor, and so on). In such embodiments, each reactor may further include at least two gate valves connected to the reaction chamber, and / or at least two gate valves may be connected to the reactor, and these gate valves may be configured to selectively allow access to the reaction chamber. In various embodiments, gate valves connected to a chamber or its enclosure may be positioned around such chambers at any suitable angle with respect to other gate valves, for example, at the angles discussed herein with respect to the arrangement of the chambers relative to each other.

[0087] In various embodiments, the arrangement of chambers within the reactor system may be any suitable configuration and / or shape. For example, the reaction chambers and transport chambers of reactor system 400A may be arranged such that there is space between them. Similarly, for example, the reaction chambers and transport chambers of reactor system 400B may be arranged such that there is space between them (for example, this can be achieved by positioning the reaction chambers at an angle between 90 and 180 degrees relative to other reaction chambers, and the transport chambers at an angle between 90 and 180 degrees relative to other transport chambers). In various embodiments, the reaction chambers may be positioned at any suitable angle relative to a preceding or succeeding reaction chamber (with a transport chamber in between) within the reactor system, for example, about 90 degrees, about 120 degrees, or about 60 degrees relative to each other. Similarly, in various embodiments, the transport chambers may be positioned at any suitable angle relative to a preceding or succeeding transport chamber (with a reaction chamber in between) within the reactor system, for example, about 90 degrees, about 120 degrees, or about 60 degrees relative to each other. In this context, "approximately" means plus or minus 20 or 30 degrees. In another embodiment, a reactor system having eight chambers and LLC may be arranged as shown in Figure 4C, or with spaces between one or more chambers, as in the arrangement of chambers of reactor system 500A shown in Figure 5A. Reactor system 500A may include a transport chamber, reaction chamber, and gate valve similar to those discussed in relation to reactor system 400C shown in Figure 4C.

[0088] The process described herein also includes arranging, connecting, and / or rearranging the chambers and / or gate valves of a reactor system in any suitable arrangement or configuration, and / or connecting the chambers to each other and / or to their respective gate valves, to achieve a desired arrangement. For example, additional reaction chambers and / or transport chambers may be connected to a reactor system similar to 400A to create a reactor system similar to 400B. In a further embodiment, additional reaction chambers and / or transport chambers may be connected to a reactor system similar to 400B to create a reactor system similar to 400C. In various embodiments, chambers and / or gate valves may be added to, removed from, and / or rearranged within any existing reactor system to alter the arrangement or shape of the reactor system.

[0089] Regarding specific embodiments, benefits and other advantages are described herein. Furthermore, the connecting lines shown in the various figures contained herein are intended to represent exemplary functional relationships and / or physical connections between various elements. It should be noted that many alternative or additional functional relationships or physical connections may exist in actual systems. However, benefits, advantages, solutions to problems, and any elements that may produce or make more prominent any benefits, advantages, or solutions are not to be construed as essential, required, or necessary features or elements of this disclosure. The scope of this disclosure is therefore not limited to anything other than the appended claims, and any singular reference to an element in these appended claims is not intended to mean "one" unless expressly stated, but rather "one or more." Furthermore, wherever phrases similar to "at least one of A, B, or C" are used in the claims, it is intended that such phrases be interpreted as meaning that A alone may exist in one embodiment, B alone may exist in one embodiment, C alone may exist in one embodiment, or any combination of elements A, B, and C, such as A and B, A and C, B and C, or A, B, and C, etc., may exist in one embodiment.

[0090] Systems, methods, and apparatus are provided herein. In the detailed description herein, references to “one embodiment,” “embodiment,” and “exemplary embodiment” indicate that the embodiments described may include certain features, structures, or characteristics, but not all embodiments may necessarily include such features, structures, or characteristics. Furthermore, such phrases do not necessarily refer to the same embodiment. In addition, where certain features, structures, or characteristics are described in relation to an embodiment, it is expected that the influence of such features, structures, or characteristics on other embodiments, whether explicitly described or not, will be within the knowledge of those skilled in the art. After reading the description, it will be obvious to those skilled in the art how to implement the disclosure in alternative embodiments.

[0091] Furthermore, none of the elements, components, or method steps of this disclosure, whether expressly described in the claims or not, are intended to be made available to the public. No claim element of this specification shall be construed under Section 112(f) of the United States Patent Act unless expressly described in the phrase “means for.” As used herein, “combined” of two or more components may mean physical, mechanical, fluid, and / or electrical connection, as may be indicated by the respective context. As used herein, “comprises,” “comprising,” or any other variation thereof are intended to include non-limiting inclusion, such that a process, method, article, or apparatus containing a list of elements does not include only those elements, but may also include other elements not expressly listed or that are specific to such process, method, article, or apparatus.

Claims

1. A reactor system for processing a substrate, A load lock chamber that transports the substrate in and out of the first transport chamber, A first reaction chamber for processing the substrate by the reaction of the first material, A first gate valve of the first reaction chamber, which is connected to the first reaction chamber and configured to transport the substrate into the first reaction chamber, A first transport chamber, which is in fluid communication with the first reaction chamber via the first gate valve of the first reaction chamber in response to the opening of the first gate valve of the first reaction chamber, wherein the first transport chamber is equipped with a first transport tool, and the reactor system is configured to transport the substrate from the first transport chamber to the first reaction chamber by the first transport tool through the opened first gate valve of the first reaction chamber in order to process the substrate in the first reaction chamber, A second gate valve of the first reaction chamber is connected to the first reaction chamber and configured to allow the substrate to be transported out of the first reaction chamber, A second transport chamber is fluidly connected to the first reaction chamber via the second gate valve of the first reaction chamber in response to the opening of the second gate valve of the first reaction chamber, the second transport chamber comprising a second transport tool, and the reactor system is configured to transport the substrate processed in the first reaction chamber from the first reaction chamber to the second transport chamber by the second transport tool through the opened second gate valve of the first reaction chamber, A second reaction chamber for further processing the substrate processed in the first reaction chamber by a reaction of a second material, A first gate valve of a second reaction chamber, connected to the second reaction chamber and configured to transport the substrate into the second reaction chamber, wherein the second reaction chamber is in fluid communication with the second transport chamber via the first gate valve of the second reaction chamber in response to the opening of the first gate valve of the second reaction chamber, and the reactor system is configured to transport the substrate from the second transport chamber to the second reaction chamber by the second transport tool through the opened first gate valve of the second reaction chamber in order to process the substrate in the second reaction chamber, A third transport chamber equipped with a third transport tool, A second gate valve of the second reaction chamber connected to the second reaction chamber, wherein the second reaction chamber is in fluid communication with the third transport chamber via the second gate valve of the second reaction chamber in response to the opening of the second gate valve of the second reaction chamber, and the reactor system is configured to transport the substrate processed in the second reaction chamber from the second reaction chamber to the third transport chamber by the third transport tool through the opened second gate valve of the second reaction chamber, A third reaction chamber for further processing the substrate processed in the second reaction chamber by a reaction of a third material, A first gate valve of a third reaction chamber, connected to the third reaction chamber and configured to transport the substrate into the third reaction chamber, wherein the third reaction chamber is in fluid communication with the third transport chamber via the first gate valve of the third reaction chamber in response to the opening of the first gate valve of the third reaction chamber, and the reactor system is configured to transport the substrate from the third transport chamber to the third reaction chamber by the third transport tool through the opened first gate valve of the third reaction chamber in order to process the substrate in the third reaction chamber, A reactor system comprising: a second gate valve of a third reaction chamber connected to the third reaction chamber, wherein the third reaction chamber is in fluid communication with the first transport chamber via the second gate valve of the third reaction chamber in response to the opening of the second gate valve of the third reaction chamber, and the reactor system is configured to transport substrates processed in the third reaction chamber from the third reaction chamber to the first transport chamber by the first transport tool through the opened second gate valve of the third reaction chamber.

2. The reactor system according to claim 1, wherein the first transport chamber and the second transport chamber are located on opposite sides of the first reaction chamber.

3. The reactor system according to claim 1, wherein the first transport chamber and the second transport chamber are arranged at an angle of less than 180 degrees with respect to the axis passing through the first reaction chamber.

4. A reactor system for processing a substrate, A load lock chamber that transports the substrate in and out of the first transport chamber, A first reaction chamber for processing the substrate by the reaction of the first material, A first gate valve of the first reaction chamber, which is connected to the first reaction chamber and configured to transport the substrate into the first reaction chamber, A first transport chamber, which is in fluid communication with the first reaction chamber via the first gate valve of the first reaction chamber in response to the opening of the first gate valve of the first reaction chamber, wherein the first transport chamber is equipped with a first transport tool, and the reactor system is configured to transport the substrate from the first transport chamber to the first reaction chamber by the first transport tool through the opened first gate valve of the first reaction chamber in order to process the substrate in the first reaction chamber, A second gate valve of the first reaction chamber is connected to the first reaction chamber and configured to allow the substrate to be transported out of the first reaction chamber, A second transport chamber is fluidly connected to the first reaction chamber via the second gate valve of the first reaction chamber in response to the opening of the second gate valve of the first reaction chamber, the second transport chamber comprising a second transport tool, and the reactor system is configured to transport the substrate processed in the first reaction chamber from the first reaction chamber to the second transport chamber by the second transport tool through the opened second gate valve of the first reaction chamber, A second reaction chamber for further processing the substrate processed in the first reaction chamber by a reaction of a second material, A first gate valve of a second reaction chamber, connected to the second reaction chamber and configured to transport the substrate into the second reaction chamber, wherein the second reaction chamber is in fluid communication with the second transport chamber via the first gate valve of the second reaction chamber in response to the opening of the first gate valve of the second reaction chamber, and the reactor system is configured to transport the substrate from the second transport chamber to the second reaction chamber by the second transport tool through the opened first gate valve of the second reaction chamber in order to process the substrate in the second reaction chamber, A third transport chamber equipped with a third transport tool, A second gate valve of the second reaction chamber connected to the second reaction chamber, wherein the second reaction chamber is in fluid communication with the third transport chamber via the second gate valve of the second reaction chamber in response to the opening of the second gate valve of the second reaction chamber, and the reactor system is configured to transport the substrate processed in the second reaction chamber from the second reaction chamber to the third transport chamber by the third transport tool through the opened second gate valve of the second reaction chamber, A third reaction chamber for further processing the substrate processed in the second reaction chamber by a reaction of a third material, A first gate valve of a third reaction chamber, connected to the third reaction chamber and configured to transport the substrate into the third reaction chamber, wherein the third reaction chamber is in fluid communication with the third transport chamber via the first gate valve of the third reaction chamber in response to the opening of the first gate valve of the third reaction chamber, and the reactor system is configured to transport the substrate from the third transport chamber to the third reaction chamber by the third transport tool through the opened first gate valve of the third reaction chamber in order to process the substrate in the third reaction chamber, A fourth transport chamber equipped with a fourth transport tool, A second gate valve of the third reaction chamber connected to the third reaction chamber, wherein the third reaction chamber is in fluid communication with the fourth transport chamber via the second gate valve of the third reaction chamber in response to the opening of the second gate valve of the third reaction chamber, and the reactor system is configured to transport the substrate processed in the third reaction chamber from the third reaction chamber to the fourth transport chamber by the fourth transport tool through the opened second gate valve of the third reaction chamber, A fourth reaction chamber for further processing the substrate processed in the third reaction chamber by a reaction of a fourth material, A first gate valve of the fourth reaction chamber, connected to the fourth reaction chamber and configured to transport the substrate into the fourth reaction chamber, wherein the fourth reaction chamber is in fluid communication with the fourth transport chamber via the first gate valve of the fourth reaction chamber in response to the opening of the first gate valve of the fourth reaction chamber, and the reactor system is configured to transport the substrate from the fourth transport chamber to the fourth reaction chamber by the fourth transport tool through the opened first gate valve of the fourth reaction chamber for processing the substrate in the fourth reaction chamber, A reactor system comprising: a second gate valve of a fourth reaction chamber connected to the fourth reaction chamber, wherein the fourth reaction chamber is in fluid communication with the first transport chamber via the second gate valve of the fourth reaction chamber in response to the opening of the second gate valve of the fourth reaction chamber, and the reactor system is configured to transport substrates processed in the fourth reaction chamber from the fourth reaction chamber to the first transport chamber by the first transport tool through the opened second gate valve of the fourth reaction chamber.

5. A method for processing a substrate, The process involves transporting a substrate from a load lock chamber to a first transport chamber equipped with a first transport tool, The substrate is transported from the first transport chamber to the first reaction chamber via the first transport tool, through the first gate valve of the first reaction chamber which is connected to the first reaction chamber, wherein the first reaction chamber and the first transport chamber are in fluid communication in response to the opening of the first gate valve of the first reaction chamber. The substrate is treated for a first duration by the reaction of the first material in the first reaction chamber, The substrate is transported from the first reaction chamber through a second transport tool contained within a second transport chamber, and through a second gate valve of the first reaction chamber connected to the first reaction chamber, wherein the second transport chamber is in fluid communication with the first reaction chamber in response to the opening of the second gate valve of the first reaction chamber. The substrate is transported to the second reaction chamber via the second transport tool, through the first gate valve of the second reaction chamber which is connected to the second reaction chamber, wherein the second reaction chamber is in fluid communication with the second transport chamber in response to the opening of the first gate valve of the second reaction chamber. Further processing of the substrate processed in the first reaction chamber over a second duration by the reaction of a second material in the second reaction chamber, The substrate is transported from the second reaction chamber through a third transport tool contained within the third transport chamber, via a second gate valve of the second reaction chamber connected to the second reaction chamber, wherein the second reaction chamber and the third transport chamber are in fluid communication in response to the opening of the second gate valve of the second reaction chamber. The substrate is transported to the third reaction chamber via the third transport tool through the first gate valve of the third reaction chamber, which is connected to the third reaction chamber, wherein the third reaction chamber is in fluid communication with the third transport chamber in response to the opening of the first gate valve of the third reaction chamber. The reaction of a third material in the third reaction chamber further processes the substrate processed in the second reaction chamber for a third duration, The substrate is transported from the third reaction chamber to the first transport chamber, A method comprising transporting the substrate from the first transport chamber to the load lock chamber.

6. The method according to claim 5, wherein the second material and the third material are the same, and the duration of the first, the duration of the second, and the duration of the third are the same.

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