Imprinted compositions and materials having passivated nanoparticles, and methods for producing the same.

Abstract

[0002] Embodiments of the present disclosure generally relate to imprint compositions and materials, and related methods useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition is provided that includes a plurality of passivated nanoparticles, one or more solvents, a surface ligand, an additive, and an acrylate. The passivated nanoparticles have a core and one or more shells, wherein the core includes one or more metal oxides and the shell includes one or more passivation materials. The shell passivation material includes one or more atomic layer deposition (ALD) materials, one or more block copolymers, or one or more silicon-containing compounds.

Description

Technical Field

[0001]

[0001] Embodiments of the present disclosure generally relate to microelectronic processing, and more specifically, to imprint compositions and materials useful for nanoimprint lithography (NL), and methods related thereto.

Background Art

[0002]

[0002] Nano- and micro-patterning by nanoparticle imprinting provides opportunities to develop nanomaterial-based electronics, energy devices, sensors, and other types of devices with nanometer-scale resolution. Currently available imprint materials include either organic materials (high-index polymers) or inorganic-organic hybrid materials (sol-gels). Many of the imprint materials have a low refractive index (<1.7) and are associated with multiple problems related to optical transparency in the visible region, optical resolution, processability, shrinkage of the imprinted features, and cost efficiency.

[0003]

[0003] Therefore, there is a need for improved imprint compositions and materials, and related methods.

Summary of the Invention

[0004]

[0004] Embodiments of the present disclosure generally relate to imprint compositions and materials useful for nanoimprint lithography (NIL), and methods related thereto. In one or more embodiments, an imprint composition is provided, the imprint composition comprising a plurality of passivated nanoparticles, one or more solvents, surface ligands, additives, and acrylates. Each passivated nanoparticle comprises a core and one or more shells, where the core comprises one or more metal oxides and the shell comprises one or more passivating materials.

[0005]

[0005] In some embodiments, the shell passivation material comprises one or more atomic layer deposition (ALD) materials, one or more block copolymers, or one or more silicon-containing compounds. In one or more examples, the silicon-containing compound comprises one or more silanes, one or more silanols, one or more siloxanes, one or more silicones, derivatives thereof, or any combination thereof.

[0006]

[0006] In other embodiments, a method for producing an imprinted surface includes arranging, coating or otherwise arranging an imprint composition comprising a plurality of passivated nanoparticles on a substrate; contacting the imprint composition with a stamp having a pattern; converting the imprint composition into a porous nanoimprint film; and removing the stamp from the porous nanoimprint film.

[0007]

[0007] For a more detailed description of the above-described features of the Disclosure, which have been briefly summarized above, refer to the embodiments (partially illustrated in the accompanying drawings). However, it should be noted that the accompanying drawings only illustrate exemplary embodiments and are not intended to limit the scope, and other equally valid embodiments may be recognized. [Brief explanation of the drawing]

[0008] [Figure 1A-1F] The following are cross-sectional views of a workpiece processed through a series of operations during the production of a nanoimprint film containing passivated nanoparticles, according to one or more embodiments described and discussed herein. [Figure 2] This specification shows a front view of an optical device according to one or more embodiments described and discussed herein.

[0009]

[0010] For ease of understanding, the same reference numerals have been used to indicate identical elements common to the drawings whenever possible. It has been considered that elements and features of one or more embodiments may be advantageously incorporated into other embodiments. [Modes for carrying out the invention]

[0010]

[0011] Embodiments of this disclosure generally relate to imprint compositions and materials useful for nanoimprint lithography (NIL). Imprint compositions can be converted into imprint materials by applying heat and / or one or more types of radiation (e.g., light or microwaves). In one or more embodiments, the imprint composition comprises one or more types of passivated nanoparticles, one or more solvents, one or more surface ligands, one or more additives, and one or more acrylates.

[0011]

[0012] Each passivated nanoparticle (NP) may be a coated particle, for example, one, two, or more shells arranged around a core. In some examples, the passivated nanoparticles may include one or more types of surface ligands bound to the outer surface of the passivated nanoparticles (e.g., ligated NPs or stabilized NPs). The passivated nanoparticles may have one or more different shapes or geometric shapes (e.g., spherical, elliptical, rod-shaped, cubic, wire-shaped, cylindrical, rectangular, or a combination thereof).

[0012]

[0013] In one or more embodiments, each passivated nanoparticle comprises a core and one or more shells that enclose, encapsulate, or coat the core. The core comprises one or more metal oxides, and the shell comprises one or more passivation materials. The core and shell typically contain different materials. The core comprises titanium oxide, niobium oxide, zirconium oxide, hafnium oxide, dopants thereof, or combinations thereof. In some examples, the shell comprises one or more metal oxides or other materials different from the core. The passivation materials contained in the shell may be, or may include, one or more atomic layer deposition (ALD) materials, polymer materials comprising one or more block copolymers, or passivation materials comprising one or more silicon-containing compounds.

[0013]

[0014] The ALD material contained in the shell can be deposited on the core or outer shell layer by one or more ALD processes. In some examples, the particles coated with a passivation material are the core. In other examples, the particles coated with a passivation material are the outermost shell of nanoparticles, which include one or more shells arranged on the core. The ALD material may be or may include silicon oxide, silicon nitride, silicon oxynitride, one or more metal oxides, one or more metal nitrides, one or more metal oxynitrides, dopants of these, or any combination thereof. Exemplary ALD materials may be or may include silicon oxide, zirconium oxide, hafnium oxide, aluminum oxide, tantalum oxide, niobium oxide, nickel oxide, cobalt oxide, tungsten oxide, vanadium oxide, cerium oxide, tin oxide, indium oxide, hafnium zirconium oxide, hafnium titanium oxide, titanium titanium oxide, titanium silicon oxide, silicon nitride, titanium nitride, titanium aluminum oxide, one or more dopants of these, or any combination thereof. In one or more examples, the core contains titanium oxide, and the shell contains silicon oxide, zirconium oxide, niobium oxide, or any combination thereof. For example, the core contains titanium oxide, the first shell covering the core contains silicon oxide, and the second shell covering the first shell contains zirconium oxide. In other examples, the core contains niobium oxide, and the shell contains silicon oxide, zirconium oxide, or any combination thereof. In some examples, the core contains zirconium oxide, and the shell contains silicon oxide.

[0014]

[0015] In some embodiments, the particles to be coated (e.g., core particles or nanoparticles comprising one or more shells) are rotated and / or vibrated in a drum-type chamber while being sequentially exposed to chemical precursors during the ALD process. In other embodiments, the particles to be coated are placed or otherwise positioned on a substrate while being sequentially exposed to chemical precursors during the ALD process. The ALD process typically involves sequentially exposing the particles to a first precursor and a second precursor to deposit a binary compound. The first precursor may be one or more of the following: silicon precursor, zirconium precursor, hafnium precursor, aluminum precursor, tantalum precursor, niobium precursor, nickel precursor, cobalt precursor, tungsten precursor, vanadium precursor, cerium precursor, tin precursor, indium precursor, or a combination thereof, or may include one or more of these. The second precursor may be one or more of the following: oxygen precursor (or oxidizing agent), nitrogen precursor (or nitriding agent), or a combination thereof, or may include one or more of these. In other examples, the ALD process involves sequentially exposing particles to a first precursor, a second precursor, a third precursor, and a second precursor to deposit a ternary or ternary compound. The third precursor may be any of the precursors listed as the first precursor, but different from the precursor used as the first precursor.

[0015]

[0016] In some embodiments, the shell passivation material is a polymer material comprising one or more block copolymers. Exemplary block copolymers may be polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP), polystyrene-b-polyethylene oxide (PS-b-PEO), polystyrene-b-polybutadiene (PS-b-PB), polystyrene-b-polymethyl methacrylate (PS-b-PMMA), polystyrene-block-polybutadiene-block-polystyrene, one or more poloxamers, poly(isoprene-block-dimethylaminoethyl methacrylate) (PI-b-PDMAEMA), poly(ethylene oxide)-poly(propylene oxide)-poly(ethylene oxide) (PEO-PPO-PEO), polymers thereof, derivatives thereof, or combinations thereof, or may include these.

[0016]

[0017] In one or more examples, the block copolymer may be or may contain PS-b-P4VP, where the molecular weight (MW) of PS is approximately 45 kDa to approximately 320 kDa and the molecular weight (MW) of P4VP is approximately 27 kDa to approximately 70 kDa. In some examples, the poloxamer is a triblock copolymer containing a hydrophobic central block of polypropylene glycol sandwiched between two hydrophilic blocks of polyethylene glycol (PEG), such as Pluronic® F127 poloxamer (MW approximately 12 kDa to approximately 15 kDa) commercially available from BASF, SE. In other examples, the poloxamer is poly(ethylene glycol)-block-poly(propylene glycol)-block-poly(ethylene glycol), such as Synperonic® F108 poloxamer (MW approximately 14 kDa to approximately 16 kDa) commercially available from Croda International, PLC.

[0017]

[0018] Surface passivation can be performed during the synthesis of nanoparticles or after the production of base nanoparticles. In one or more examples, the nanoparticles are dispersed in one or more solvents (approximately 5 wt% to 50 wt% of NP relative to the solvent) to maintain dispersion quality. The polymer material (e.g., block copolymer) is dissolved in a miscible and compatible solvent with the nanoparticle solvent at a concentration of approximately 2 wt% to 10 wt%. In in-phase modification, the polymer material may adhere to the surface of the nanoparticles via hydrolysis, esterification, or hydrogen bonding. The density of passivation is controlled by the concentration of the polymer material.

[0018]

[0019] In other embodiments, the shell passivation material comprises one or more silicon-containing compounds. The silicon-containing compounds may be one or more of silanes, silanols, siloxanes, silicones, other silicon-containing compounds, derivatives thereof, or any combination thereof, or may include these. Exemplary silicon-containing compounds include (3-acetamidopropyl)trimethoxysilane, oc blood Lutriethoxysilane, Ok blood Trimethoxysilane, 3-(trimethoxysilyl)propyl methacrylate, propyltriethoxysilane, (3-acryloxypropyl)tris(trimethylsiloxy)silane, dimethyldiethoxysilane, polydimethylsiloxane, γ-glycidoxypropyltrimethoxysilane (GPMS), polydiphenylsiloxane, hexamethylcyclotrisiloxane, aminopropyltriethoxysilane, complexes thereof, derivatives thereof, or combinations thereof may be or may contain these.

[0019]

[0020] The entire inactivated nanoparticle can have a size or diameter of approximately 2 nm, 5 nm, 8 nm, 10 nm, 12 nm, 15 nm, 20 nm, 25 nm, 30 nm or 35 nm to approximately 40 nm, 50 nm, 60 nm, 80 nm, 100 nm, 150 nm or 200 nm. For example, the entire passivated nanoparticle can have a size or diameter of approximately 2 nm to 200 nm, approximately 2 nm to 150 nm, approximately 2 nm to 100 nm, approximately 2 nm to 80 nm, approximately 2 nm to 60 nm, approximately 2 nm to 50 nm, approximately 2 nm to 40 nm, approximately 2 nm to 30 nm, approximately 2 nm to 20 nm, approximately 2 nm to 15 nm, approximately 2 nm to 10 nm, approximately 10 nm to 200 nm, approximately 10 nm to 150 nm, and approximately 10 nm. It can have a size or diameter of approximately ~100nm, approximately 10nm~80nm, approximately 10nm~60nm, approximately 10nm~50nm, approximately 10nm~40nm, approximately 10nm~30nm, approximately 10nm~20nm, approximately 10nm~15nm, approximately 50nm~200nm, approximately 50nm~150nm, approximately 50nm~100nm, approximately 50nm~80nm, or approximately 50nm~60nm.

[0020]

[0021] The core of the passivated nanoparticles has a diameter of less than 100 nm, for example less than 80 nm or less than 50 nm, for example about 2 nm, about 3 nm, about 5 nm, about 8 nm, about 10 nm or about 12 nm to about 15 nm, about 18 nm, about 20 nm, about 25 nm, about 30 nm, about 35 nm, about 40 nm, about 45 nm or about 50 nm. The core is, for example, approximately 2nm to 50nm, approximately 2nm to 45nm, approximately 2nm to 40nm, approximately 2nm to 35nm, approximately 2nm to 30nm, approximately 2nm to 28nm, approximately 2nm to 25nm, approximately 2nm to 22nm, approximately 2nm to 20nm, approximately 2nm to 18nm, approximately 2nm to 15nm, approximately 2nm to 12nm, approximately 2nm to 10nm, approximately 2nm to 8nm, approximately 2nm to 5nm, approximately 5nm to 50nm, approximately 5nm to 45nm, approximately 5nm to 40nm, approximately 5nm to 35nm, approximately 5nm to 30nm, approximately 5nm to 28nm, approximately 5 nm ~ approx. 25 nm, approx. 5 nm ~ approx. 22 nm, approx. 5 nm ~ approx. 20 nm, approx. 5 nm ~ approx. 18 nm, approx. 5 nm ~ approx. 15 nm, approx. 12nm, about 5nm to about 10nm, about 5nm to about 8nm, about 10nm to about 50nm, about 10nm to about 45nm, about 10nm to about 40nm m, about 10 nm to about 35 nm, about 10 nm to about 30 nm, about 10 nm to about 28 nm, about 10 nm to about 25 nm, about 10 nm to about 22 nm, about 10 nm to about 20 nm, about 10 nm to about 18 nm, about 10 nm to about 15 nm, or about 10 nm to about 12 nm.

[0021]

[0022] The shells of the passivated nanoparticles have thicknesses of approximately 0.1 nm, 0.2 nm, 0.5 nm, 0.8 nm, 1 nm, 1.5 nm, 2 nm, 3 nm, 5 nm, 8 nm, or 10 nm to 12 nm, 15 nm, 18 nm, 20 nm, 25 nm, 30 nm, 35 nm, 40 nm, or 50 nm. The shells are, for example, approximately 0.1nm to 50nm, approximately 0.1nm to 40nm, approximately 0.1nm to 30nm, approximately 0.1nm to 25nm, approximately 0.1nm to 20nm, approximately 0.1nm to 18nm, approximately 0.1nm to 15nm, approximately 0.1nm to 12nm, approximately 0.1nm to 10nm, approximately 0.1nm to 8nm, approximately 0.1nm to 5nm, approximately 0.1nm to 3nm, approximately 0.1nm to 2nm, approximately 0.1nm to 1nm, approximately 0.5nm to 40nm, approximately 0.5nm to 30nm, approximately 0.5nm to 25nm, approximately 0.5nm to 20nm, approximately 0.5nm to 15nm, approximately 0.5nm to 10nm, approximately 0.5nm to 8nm, and approximately 0.5 nm~about 5nm, about 0.5nm~about 3nm, about 0.5nm~about 2nm, about 0.5nm~about 1nm, about 1nm~about 40nm, about 1nm~about 30nm, about 1nm ~about 25nm, about 1nm to about 20nm, about 1nm to about 18nm, about 1nm to about 15nm, about 1nm to about 12nm, about 1nm to about 10nm, about 1nm to about 8n m, about 1 nm to about 5 nm, about 1 nm to about 3 nm, about 5 nm to about 50 nm, about 5 nm to about 40 nm, about 5 nm to about 30 nm, about 5 nm to about 25 nm, about 5 nm It has a thickness of ~ about 20 nm, about 5 nm to about 18 nm, about 5 nm to about 15 nm, about 5 nm to about 12 nm, about 5 nm to about 10 nm, or about 5 nm to about 8 nm.

[0022]

[0023] In some embodiments, the core has a diameter of about 2 nm to about 50 nm, and the shell has a thickness of about 0.1 nm to about 40 nm. In another embodiment, the core has a diameter of about 5 nm to about 40 nm, and the shell has a thickness of about 0.5 nm to about 30 nm. In some embodiments, the core has a diameter of about 10 nm to about 30 nm, and the shell has a thickness of about 1 nm to about 20 nm.

[0023]

[0024] In one or more embodiments, the imprint composition comprises passivated nanoparticles at a concentration of from about 0.1 weight percent (wt%), about 0.5 wt%, about 1 wt%, about 2 wt%, about 3 wt%, about 5 wt%, about 6 wt%, about 8 wt% or about 10 wt% to about 12 wt%, about 15 wt%, about 18 wt%, about 20 wt%, about 22 wt%, about 24 wt%, about 25 wt%, about 28 wt%, about 30 wt%, about 32 wt%, about 35 wt%, about 38 wt% or about 40 wt%. For example, the imprint composition comprises passivated nanoparticles at a concentration of from about 0.1 wt% to about 40 wt%, about 0.5 wt% to about 40 wt%, about 0.5 wt% to about 35 wt%, about 0.5 wt% to about 32 wt%, about 0.5 wt% to about 30 wt%, about 0.5 wt% to about 28 wt%, about 0.5 wt% to about 25 wt%, about 0.5 wt% to about 22 wt%, about 0.5 wt% to about 20 wt%, about 0.5 wt% to about 18 wt%, about 0.5 wt% to about 15 wt%, about 0.5 wt% to about 12 wt%, about 0.5 wt% to about 10 wt%, about 0.5 wt% to about 8 wt%, about 0.5 wt% to about 6 wt%, about 0.5 wt% to about 5 wt%, about 0.5 wt% to about 4 wt%, about 0.5 wt% to about 3 wt%, about 0.5 wt% to about 2 wt%, about 0.5 wt% to about 1.5 wt%, about 0.5 wt% to about 1 wt%, about 2 wt% to about 40 wt%, about 2 wt% to about 35 wt%, about 2 wt% to about 32 wt%, about 2 wt% to about 30 wt%, about 2 wt% to about 28 wt%, about 2 wt% to about 25 wt%, about 2 wt% to about 22 wt%, about 2 wt% to about 20 wt%, about 2 wt% to about 18 wt%, about 2 wt% to about 15 wt%, about 2 wt% to about 12 wt%, about 2 wt% to about 10 wt%, about 2 wt% to about 8 wt%, about 2 wt% to about 6 wt%, about 2 wt% to about 5 wt%, about 2 wt% to about 4 wt%, about 2 wt% to about 3 wt%, about 5 wt% to about 40 wt%, about 5 wt% to about 35 wt%, about 5 wt% to about 32 wt%, about 5 wt% to about 30 wt%, about 5 wt% to about 28 wt%, about 5 wt% to about 25 wt%, about 5 wt% to about 22 wt%, about 5 wt% to about 20 wt%, about 5 wt% to about 18 wt%, about 5 wt% to about 15 wt%, about 5 wt% to about 12 wt%, about 5 wt% to about 10 wt%, about 5 wt% to about 8 wt%, or about 5 wt% to about 6 wt%.

[0024] <0OO0090>

[0025] In another embodiment, the imprint composition contains passivated nanoparticles at concentrations of about 40 wt%, about 50 wt%, about 55 wt%, about 60 wt%, about 62 wt%, or about 65 wt% to about 68 wt%, about 70 wt%, about 75 wt%, about 80 wt%, about 85 wt%, about 88 wt%, about 90 wt%, about 92 wt%, about 93 wt%, about 94 wt%, about 95 wt%, about 96 wt%, about 97 wt%, about 98 wt%, or higher. The imprint composition, for example, contains passivated nanoparticles in the following proportions: approximately 40 wt% to approximately 98 wt%, approximately 50 wt% to approximately 95 wt%, approximately 50 wt% to approximately 90 wt%, approximately 50 wt% to approximately 80 wt%, approximately 50 wt% to approximately 75 wt%, approximately 50 wt% to approximately 70 wt%, approximately 50 wt% to approximately 65 wt%, approximately 50 wt% to approximately 60 wt%, and approximately 50 wt% to approximately 55 wt%. It contains at concentrations of t%, approximately 60 wt% to 95 wt%, approximately 60 wt% to 90 wt%, approximately 60 wt% to 80 wt%, approximately 60 wt% to 75 wt%, approximately 60 wt% to 70 wt%, approximately 60 wt% to 65 wt%, approximately 70 wt% to 95 wt%, approximately 70 wt% to 90 wt%, approximately 70 wt% to 80 wt%, or approximately 70 wt% to 75 wt%.

[0025]

[0026] The surface ligand may be one or more carboxylic acids, one or more esters, one or more amines, one or more alcohols, one or more silanes, salts thereof, complexes thereof, or any combination thereof, or may contain these. Exemplary surface ligands include oleic acid, stearic acid, propionic acid, benzoic acid, palmitic acid, myristic acid, methylamine, oleylamine, butylamine, benzyl alcohol, oleyl alcohol, butanol, octanol, dodecanol, oc blood Lutrimethoxysilane, oc bloodIt can be, or can include, rutriethoxysilane, octenyltrimethoxysilane, octenyltriethoxysilane, 3-(trimethoxysilyl)propyl methacrylate, propyltriethoxysilane, salts thereof, esters thereof, complexes thereof, or combinations thereof. In some examples, the surface ligand is at a concentration of about 8 wt% to about 50 wt% based on the weight of the passivated nanoparticles.

[0026]

[0027] The imprint composition includes the surface ligand at a concentration of about 0.5 wt%, about 1 wt%, about 2 wt%, about 3 wt%, about 5 wt%, about 7 wt%, about 8 wt% or about 10 wt% to about 12 wt%, about 15 wt%, about 18 wt%, about 20 wt%, about 25 wt%, about 30 wt%, about 35 wt%, about 40 wt%, about 45 wt% or about 50 wt%. The imprint composition includes, for example, the surface ligand at a concentration of about 0.5 wt% to about 50 wt%, about 1 wt% to about 50 wt%, about 3 wt% to about 50 wt%, about 5 wt% to about 50 wt%, about 5 wt% to about 40 wt%, about 5 wt% to about 35 wt%, about 5 wt% to about 30 wt%, about 5 wt% to about 25 wt%, about 5 wt% to about 20 wt%, about 5 wt% to about 15 wt%, about 5 wt% to about 10 wt%, about 10 wt% to about 50 wt%, about 10 wt% to about 40 wt%, about 10 wt% to about 35 wt%, about 10 wt% to about .....

[0027]

[0028] The solvent may be one or more nanoparticle dispersion solvents, one or more imprint solvents, other types of solvents, or any combination thereof, or may include these. The nanoparticle dispersion solvent may be one or more glycol ethers, alcohols, acetates, esters thereof, salts thereof, derivatives thereof, or any combination thereof, or may include these. In some examples, the nanoparticle dispersion solvent may be one or more p-series glycol ethers, one or more e-series glycol ethers, or any combination thereof, or may include these. In one or more examples, the nanoparticle dispersion solvent includes propylene glycol methyl ether acetate (PGMEA). The imprint solvent may be one or more alcohols, one or more esters, salts thereof, or any combination thereof, or may include these. In one or more examples, the nanoparticle dispersion solvent includes ethyl lactate.

[0028]

[0029] In one or more embodiments, the imprint composition contains one or more solvents in concentrations ranging from about 50 wt%, about 55 wt%, about 60 wt%, about 62 wt%, about 65 wt%, about 68 wt%, about 70 wt%, about 72 wt%, about 75 wt%, or about 80 wt% to about 83 wt%, about 85 wt%, about 87 wt%, about 88 wt%, about 90 wt%, about 92 wt%, about 94 wt%, about 95 wt%, about 97 wt%, or about 98 wt%. The imprint composition may contain, for example, one or more solvents in concentrations of approximately 50 wt% to 98 wt%, 60 wt% to 98 wt%, 60 wt% to 95 wt%, 60 wt% to 90 wt%, 60 wt% to 88 wt%, 60 wt% to 85 wt%, 60 wt% to 83 wt%, 60 wt% to 80 wt%, 60 wt% to 78 wt%, 60 wt% to 75 wt%, 60 wt% to 72 wt%, 60 wt% to 70 wt%, 60 wt% to 68 wt%, 60 wt% to 65 wt%, 60 wt% to 63 wt%, and 70 wt%. It contains at concentrations of approximately 98 wt%, 70 wt% to 95 wt%, 70 wt% to 90 wt%, 70 wt% to 88 wt%, 70 wt% to 85 wt%, 70 wt% to 83 wt%, 70 wt% to 80 wt%, 70 wt% to 78 wt%, 70 wt% to 75 wt%, 70 wt% to 72 wt%, 80 wt% to 98 wt%, 80 wt% to 95 wt%, 80 wt% to 90 wt%, 80 wt% to 88 wt%, 80 wt% to 85 wt%, 80 wt% to 83 wt%, or 80 wt% to 82 wt%.

[0029]

[0030] In some embodiments, the imprint composition contains a nanoparticle dispersion solvent in concentrations ranging from about 0.5 wt%, about 0.8 wt%, about 1 wt%, about 1.5 wt%, about 2 wt%, about 2.5 wt%, about 3 wt%, about 3.5 wt%, about 4 wt%, about 5 wt%, or about 6 wt%, to about 7 wt%, about 8 wt%, about 10 wt%, about 12 wt%, about 14 wt%, about 15 wt%, about 18 wt%, about 20 wt%, or about 25 wt%. The imprint composition is, for example, a nanoparticle dispersion solvent containing approximately 0.5 wt% to approximately 20 wt%, approximately 1 wt% to approximately 20 wt%, approximately 1 wt% to approximately 18 wt%, approximately 1 wt% to approximately 15 wt%, approximately 1 wt% to approximately 13 wt%, approximately 1 wt% to approximately 12 wt%, approximately 1 wt% to approximately 11 wt%, approximately 1 wt% to approximately 10 wt%, approximately 1 wt% to approximately 8 wt%, approximately 1 wt% to approximately 7 wt%, approximately 1 wt% to approximately 6 wt%, approximately 1 wt% to approximately 5 wt%, approximately 1 wt% to approximately 4 wt%, approximately 1 wt% to approximately 3 wt%, approximately 5 wt% to approximately 20 wt%, and approximately 5 wt%. It contains at concentrations of approximately 18 wt%, 5 wt% to 15 wt%, 5 wt% to 13 wt%, 5 wt% to 12 wt%, 5 wt% to 11 wt%, 5 wt% to 10 wt%, 5 wt% to 8 wt%, 5 wt% to 7 wt%, 5 wt% to 6 wt%, 8 wt% to 20 wt%, 8 wt% to 18 wt%, 8 wt% to 15 wt%, 8 wt% to 13 wt%, 8 wt% to 12 wt%, 8 wt% to 11 wt%, 8 wt% to 10 wt%, or 8 wt% to 9 wt%.

[0030]

[0031] In other embodiments, the imprint composition contains the imprint solvent in concentrations ranging from about 50 wt%, about 55 wt%, about 60 wt%, about 62 wt%, about 65 wt%, about 68 wt%, or about 70 wt% to about 72 wt%, about 75 wt%, about 78 wt%, about 80 wt%, about 82 wt%, about 83 wt%, about 85 wt%, about 87 wt%, about 88 wt%, about 90 wt%, or about 95 wt%. The imprint composition is, for example, an imprint solvent with approximately 50 wt% to 95 wt%, approximately 60 wt% to 95 wt%, approximately 60 wt% to 90 wt%, approximately 60 wt% to 88 wt%, approximately 60 wt% to 85 wt%, approximately 60 wt% to 83 wt%, approximately 60 wt% to 80 wt%, approximately 60 wt% to 78 wt%, approximately 60 wt% to 75 wt%, approximately 60 wt% to 72 wt%, approximately 60 wt% to 70 wt%, approximately 60 wt% to 68 wt%, approximately 60 wt% to 65 wt%, approximately 60 wt% to 63 wt%, approximately 70 wt% to 98 wt%, and approximately 70 wt% It contains at concentrations of approximately 95 wt%, 70 wt% to 90 wt%, 70 wt% to 88 wt%, 70 wt% to 85 wt%, 70 wt% to 83 wt%, 70 wt% to 80 wt%, 70 wt% to 78 wt%, 70 wt% to 75 wt%, 70 wt% to 72 wt%, 75 wt% to 98 wt%, 75 wt% to 95 wt%, 75 wt% to 90 wt%, 75 wt% to 88 wt%, 75 wt% to 85 wt%, 75 wt% to 83 wt%, 75 wt% to 80 wt%, or approximately 75 wt% to 78 wt%.

[0031]

[0032] The additives may be or may include one or more perfluoroalkyl ethers, one or more polyglycols, one or more fatty acids, one or more silanes, one or more siloxanes, or any combination thereof. Exemplary additives may include fluorosurfactants, fluoroadditives, and / or fluorocarbons (e.g., CAPSTONE® FS-66 or FS-68 fluorosurfactants, available from DuPont), glycolic acid ethoxylate oleyl ether, polyethylene glycol, polypropylene glycol, lauric acid, myristic acid, stearic acid, palmitic acid, dimethyldiethoxysilane, polydimethylsiloxane, polydiphenylsiloxane, hexamethylcyclotrisiloxane, octamethylcyclotetrasiloxane, silanol-terminated polydimethylsiloxane, vinyl-terminated polydimethylsiloxane, 1,2-propanediol, salts thereof, esters thereof, complexes thereof, or combinations thereof. The additive may be one or more diols, one or more alcohols having three or more alcohol groups, or any combination thereof, or may include these. In one or more examples, the additive contains 1,2-propanediol. In some examples, the additive is present in a concentration of about 0.01 wt% to about 2.5 wt% based on the weight of the passivated nanoparticles.

[0032]

[0033] The imprint composition contains the Additive in concentrations of approximately 0.01 wt%, 0.05 wt%, 0.1 wt%, 0.2 wt%, 0.3 wt%, 0.5 wt%, 0.8 wt%, or from approximately 1 wt% to approximately 1.2 wt%, 1.5 wt%, 1.8 wt%, 2 wt%, 2.5 wt%, 3 wt%, 3.5 wt%, 4 wt%, 5 wt%, 6 wt%, 8 wt%, or 10 wt%. The imprint composition may contain, for example, an Additive of approximately 0.01 wt% to 10 wt%, approximately 0.01 wt% to 8 wt%, approximately 0.01 wt% to 5 wt%, approximately 0.01 wt% to 4 wt%, approximately 0.01 wt% to 3 wt%, approximately 0.01 wt% to 2 wt%, approximately 0.01 wt% to 1 wt%, approximately 0.01 wt% to 0.5 wt%, approximately 0.01 wt% to 0.1 wt%, approximately 0.01 wt% to 0.05 wt%, approximately 0.1 wt% to 10 wt%, approximately 0 It contains at concentrations of approximately 0.1 wt% to 8 wt%, approximately 0.1 wt% to 5 wt%, approximately 0.1 wt% to 4 wt%, approximately 0.1 wt% to 3 wt%, approximately 0.1 wt% to 2 wt%, approximately 0.1 wt% to 1 wt%, approximately 0.1 wt% to 0.5 wt%, approximately 1 wt% to 10 wt%, approximately 1 wt% to 8 wt%, approximately 1 wt% to 5 wt%, approximately 1 wt% to 4 wt%, approximately 1 wt% to 3 wt%, approximately 1 wt% to 2 wt%, or approximately 1 wt% to 1.5 wt%.

[0033]

[0034] The acrylate may be one or more methacrylates, one or more ethyl acrylates, one or more propyl acrylates, one or more butyl acrylates, one or more monofunctional acrylates, one or more difunctional acrylates, one or more trifunctional acrylates, other polyfunctional acrylates, or any combination thereof, or may include these. Exemplary acrylates may be 3-(trimethoxysilyl)propyl methacrylate (3-MPS), 3-(trimethoxysilyl)propyl acrylate, di(ethylene glycol) methyl ether methacrylate, ethylene glycol methyl ether methacrylate, 2-ethylhexyl methacrylate, ethyl methacrylate, hexyl methacrylate, methacrylic acid, vinyl methacrylate, monomers thereof, polymers thereof, salts thereof, complexes thereof, or combinations thereof, or may include these. In some examples, the acrylate is concentrated at a concentration of about 0.05 wt% to about 10 wt% based on the weight of the passivated nanoparticles.

[0034]

[0035] The imprint composition contains acrylate at concentrations of approximately 0.1 wt%, 0.2 wt%, 0.3 wt%, 0.5 wt%, 0.8 wt%, 1 wt%, to approximately 1.2 wt%, 1.5 wt%, 1.8 wt%, or approximately 2 wt%, 2.2 wt%, 2.3 wt%, 2.5 wt%, 2.8 wt%, 3 wt%, 3.2 wt%, 3.5 wt%, 3.8 wt%, 4 wt%, 5 wt%, 6 wt%, 8 wt%, 10 wt%, 12 wt%, 15 wt%, 18 wt%, or 20 wt%. The imprint composition may contain, for example, acrylate in concentrations of approximately 0.1 wt% to 20 wt%, 0.1 wt% to 15 wt%, 0.1 wt% to 10 wt%, 0.1 wt% to 8 wt%, 0.1 wt% to 5 wt%, 0.1 wt% to 4 wt%, 0.1 wt% to 3 wt%, 0.1 wt% to 2 wt%, and 0.1 wt% to 1 wt%. , about 0.1wt%~about 0.5wt%, about 1wt%~about 20wt%, about 1wt%~about 15wt%, about 1wt%~about 10wt%, about 1wt%~about 8wt%, about 1wt%~ Approximately 5wt%, approximately 1wt% to approximately 4wt%, approximately 1wt% to approximately 3.5wt%, approximately 1wt% to approximately 3.2wt%, approximately 1wt% to approximately 3wt%, approximately 1wt% to approximately 2.8wt%, approximately 1w t%~about 2.5wt%, about 1wt%~about 2.3wt%, about 1wt%~about 2.2wt%, about 1wt%~about 2wt%, about 1wt%~about 1.8wt%, about 1wt%~about 1. 5wt%, about 1.8wt% to about 20wt%, about 1.8wt% to about 15wt%, about 1.8wt% to about 10wt%, about 1.8wt% to about 8wt%, about 1.8wt% to about 5w It contains at concentrations of t%, approximately 1.8wt% to 4wt%, approximately 1.8wt% to 3.5wt%, approximately 1.8wt% to 3.2wt%, approximately 1.8wt% to 3wt%, approximately 1.8wt% to 2.8wt%, approximately 1.8wt% to 2.5wt%, approximately 1.8wt% to 2.3wt%, approximately 1.8wt% to 2.2wt%, or approximately 1.8wt% to 2wt%.

[0035]

[0036] In one or more examples, the imprinted composition contains approximately 0.5 wt% to 40 wt% of passivated nanoparticles, approximately 50 wt% to 90 wt% of one or more solvents, approximately 5 wt% to 40 wt% of surface ligands, approximately 0.01 wt% to 5 wt% of additives, and approximately 0.1 wt% to 10 wt% of acrylate. In another example, the imprinted composition contains approximately 1 wt% to 25 wt% of passivated nanoparticles, approximately 60 wt% to 85 wt% of one or more solvents, approximately 6 wt% to 35 wt% of surface ligands, approximately 0.05 wt% to 3 wt% of additives, and approximately 0.3 wt% to 8 wt% of acrylate. In some examples, the imprinted composition contains approximately 5 wt% to 20 wt% of passivated nanoparticles, approximately 65 wt% to 80 wt% of one or more solvents, approximately 7 wt% to 31 wt% of surface ligands, approximately 0.09 wt% to 1.5 wt% of additives, and approximately 0.5 wt% to 6 wt% of acrylates.

[0036]

[0037] The imprinted composition may have a viscosity of approximately 1 cP, 2 cP, 3 cP, 5 cP, 8 cP, or 10 cP to approximately 12 cP, 15 cP, 20 cP, 25 cP, 30 cP, 40 cP, 50 cP, or 70 cP, as measured at a temperature of 23°C. The imprinted composition may have a viscosity of approximately 1 cP to 70 cP, approximately 1 cP to 50 cP, approximately 1 cP to 40 cP, approximately 1 cP to 30 cP, approximately 1 cP to 20 cP, approximately 1 cP to 10 cP, approximately 1 cP to 5 cP, approximately 10 cP to 70 cP, approximately 10 cP to 50 cP, approximately 10 cP to 40 cP, approximately 10 cP to 30 cP, approximately 10 cP to 20 cP, approximately 20 cP to 70 cP, approximately 20 cP to 50 cP, approximately 20 cP to 40 cP, approximately 20 cP to 30 cP, or approximately 20 cP to 25 cP, as measured at a temperature of 23°C.

[0037] Method for manufacturing imprinted surfaces

[0038] In one or more embodiments, a method is provided for producing an imprinted surface (e.g., a NIL film). The surface to be imprinted is one or more exposed surfaces of a nanoimprint film described and discussed herein. The method includes placing, coating, or otherwise arranging an imprint composition on one or more substrates, contacting the imprint composition with a stamp having a pattern, converting the imprint composition into an imprint material (e.g., a nanoimprint film), and removing the stamp from the imprint material. In some examples, the substrate (e.g., a wafer) may be or may include glass, quartz, silicon oxide (e.g., a glass substrate or glass wafer). In other examples, the substrate may be or may include silicon, silicon-germanium, plastic, and / or other materials. The imprint composition may have a refractive index of about 1.7 to about 2.0. The pattern on the stamp and the pattern transferred to the imprint surface may be a one-dimensional pattern, a two-dimensional pattern, or a three-dimensional pattern.

[0038]

[0039] Figures 1A–1F show cross-sectional views of a workpiece processed through several operations during the production of a nanoimprint film containing passivated nanoparticles (e.g., a nanoimprint film according to one or more embodiments described and discussed herein). The nanoimprint film is formed on a substrate by an imprint process. The imprint process includes placing an imprint composition 104 containing passivated nanoparticles on a substrate 102 and aligning a stamp 120 above or adjacent to the imprint composition 104 (Figure 1A). The imprint composition 104 is pressed or otherwise brought into contact with the stamp 120 having a pattern (Figures 1B–1C). The imprint composition 104 is converted into a nanoimprint film 106 (Figure 1D). In some examples, a curing process by heat and / or radiation (UV light) is used to convert the imprint composition 104 into a nanoimprint film 106. The stamp 120 is removed from the nanoimprint film 106, which remains placed on the substrate 102 (Figures 1E–1F).

[0039]

[0040] In some cases, the imprint composition is placed on a substrate by spin coating, drop casting, blade coating, and / or other coating processes. The imprint composition is placed on the substrate as a film or layer having a predetermined thickness. The thickness of the imprint composition is approximately 50 nm, approximately 80 nm, approximately 100 nm, approximately 120 nm, approximately 150 nm or approximately 200 nm to approximately 250 nm, approximately 300 nm, approximately 400 nm, approximately 500 nm, approximately 600 nm, approximately 800 nm, approximately 1,000 nm, approximately 1,200 nm, or thicker. The thickness of the imprint composition is, for example, approximately 50 nm to approximately 1,000 nm, approximately 100 nm to approximately 1,000 nm, approximately 200 nm to approximately 1,000 nm, approximately 400 nm to approximately 1,000 nm, approximately 500 nm to approximately 1,000 nm, approximately 600 nm to approximately 1,000 nm, approximately 800 nm to approximately 1,000 nm, approximately 50 nm to approximately 600 nm, approximately 100 nm to approximately 600 nm, approximately 200 nm to approximately 600 nm, approximately 400 nm to approximately 600 nm, approximately 500 nm to approximately 600 nm, approximately 50 nm to approximately 400 nm, approximately 100 nm to approximately 400 nm, approximately 200 nm to approximately 400 nm, or approximately 300 nm to approximately 400 nm.

[0040]

[0041] An imprinted composition is converted into an imprinted material by exposing it to heat, ultraviolet light, infrared light, visible light, microwave radiation, and / or any combination thereof. In one or more examples, when converting an imprinted composition into an imprinted material, the imprinted composition is exposed to a light source having a wavelength of about 300 nm to about 365 nm. In other examples, when converting an imprinted composition into an imprinted material, the imprinted composition is exposed to heat and maintained at a temperature of about 30°C to about 100°C for a period of about 30 seconds to about 1 hour. In some examples, the imprinted composition is exposed to heat and maintained at a temperature of about 50°C to about 60°C for a period of about 1 minute to about 15 minutes.

[0041]

[0042] In one or more embodiments, one or more acrylates in the imprint composition can be polymerized and / or oligomerized during the production of the imprint material (e.g., by curing or other means).

[0042]

[0043] In one or more embodiments described and discussed herein, the imprint material comprises or contains inorganic oxide nanoparticles (about 1 wt% to about 95 wt%), a methacrylate or acrylate or chloroacrylate binder (about 0.1 wt% to about 10 wt%), a high-boiling point component, such as a diol, fatty acid, or amine (about 0.1 wt% to about 5 wt%), and an ether or acetate solvent (about 5 wt% to about 20 wt%) with an optimal viscosity (about 1 cP to about 50 cP at about 23°C). The imprint material exhibits a high refractive index greater than 1.7, has optical transparency greater than 90% in the visible region at different weight percentages (about 1 wt% to about 50 wt%), and enables high-resolution large-area patterning with a feature shrinkage rate of about 1% to about 30% (less than 1% in some examples). Nanoimprint lithography combined with high refractive index materials provides a unique route for fabricating printable devices by directly imprinting this functional material. The patterned film ultimately possesses the desired optical properties without requiring additional etching steps. This approach combines the advantages of both a top-down lithography process for highly controllable micro / nanostructure fabrication and a bottom-up synthetic chemistry approach for designing and tuning the properties of the patterned film.

[0043]

[0044] In other embodiments described and discussed herein, passivated nanoparticle imprint compositions are prepared, having a low viscosity of about 1 cP to about 50 cP (at about 23°C), a high refractive index, being optically clear, and easily processable. The imprint compositions may or may contain passivated nanoparticles, as described and discussed herein, disposed in a high-boiling point ether or acetate-based solvent at a concentration of about 1 wt% to about 80 wt%. The imprint compositions may or may contain one or more of the following: methacrylate or acrylate binders (about 0.1 wt% to about 10 wt%), fatty acids (about 0.05 wt% to about 5 wt%), amines (about 0.05 wt% to about 5 wt%), PEG-based monomers (about 0.1 wt% to about 15 wt%), and perfluoro or siloxane dispersants acting as surfactants (about 0.05 wt% to about 5 wt%). The final imprinted composition remains optically clear for more than 6 months at room temperature (approximately 23°C) and can be used with or without filtration.

[0044]

[0045] In some embodiments, a scalable, solvent-assisted soft NIL method is used to generate large-area nanopatterned features and structures. In this form of NIL, polydimethylsiloxane (PDMS) or other silicone stamps are used, many of which can be manufactured from a single silicone master, and each stamp can be reused many times, thus minimizing costs. Thus, the area of ​​the imprinted structure is limited primarily only by the size of the original patterned master. Using PDMS, feature sizes of less than 100 nm can be replicated. Briefly, the imprint composition is filtered and orally distributed onto the surface of a substrate. This substrate is spun to produce a film with a thickness of approximately 100 nm to approximately 400 nm. The PDMS mold is placed on the surface of a span-on film and then heat-cured at approximately 50°C to approximately 60°C. UV curing is performed at a wavelength of approximately 300 nm to approximately 365 nm and an output of approximately 10 J / cm². -2 ~About 50Jcm -2 This is done using a light source. After curing the imprint composition to produce the imprint material, the PDMS stamp is removed in the direction of the diffraction grating or in the opposite direction. The removed stamp can be reused, and the imprint can be further cured by a heat and / or UV process to increase the density of the material.

[0045]

[0046] Figure 2 shows a front view of an optical device 200 including a nanoimprint film 106 (see Figure 1F) according to one or more embodiments described and discussed herein. The optical device 200 described below should be understood to be an exemplary optical device. In one or more embodiments, the optical device 200 is a waveguide combiner, e.g., an augmented reality waveguide combiner. In other embodiments, the optical device 200 is a flat optical device, e.g., a metasurface. The optical device 200 includes a plurality of device structures 204. The device structures 204 may be nanostructures having submicro dimensions (e.g., nano-size dimensions such as critical dimensions of less than 1 μm). In one or more embodiments, regions of the device structure 204 correspond to one or more diffraction gratings 202, e.g., diffraction grating regions 202a and 202b. In one or more embodiments, the optical device 200 includes a first diffraction grating region 202a and a second diffraction grating region 202b, where the first diffraction grating regions 202a and 202b each include a plurality of device structures 204.

[0046]

[0047] The depth of the diffraction grating 202 may vary across diffraction grating regions 202a and 202b in the embodiments described herein. In some embodiments, the depth of the diffraction grating 202 may vary smoothly across the first diffraction grating region 202a and the second diffraction grating region 202b. In one or more examples, this depth may range from about 10 nm to about 400 nm across either of the diffraction grating regions. The diffraction grating area 202a may range from about 20 mm to about 50 mm on a given side in some examples. Thus, in some examples, the angle of change in the depth of the diffraction grating 202 may be on the order of 0.0005 degrees.

[0047]

[0048] In the embodiments described herein, the device structure 204 may be fabricated using laser ablation. As used herein, laser ablation is used to fabricate a three-dimensional microstructure in the device material, or optionally, to form a variable-depth structure in a sacrificial layer overlapping the device material as part of a variable-depth structuring process. Using laser ablation to fabricate the optical structure 204 enables fewer processing steps and higher variable-depth resolution than existing methods.

[0048]

[0049] Embodiments of this disclosure further relate to one or more of the following Examples 1-24:

[0049]

[0050] Example 1 An imprinted composition comprising: a plurality of passivated nanoparticles, each passivated nanoparticle comprising a core and a shell, wherein the core comprises a metal oxide and the shell comprises a passivated material; one or more solvents; a surface ligand; an additive; and an acrylate.

[0050]

[0051] Example 2 An imprinted composition comprising: a plurality of passivated nanoparticles, each passivated nanoparticle comprising a core and a shell, wherein the core comprises a metal oxide and the shell comprises a passivation material, the passivation material comprising an atomic layer deposition (ALD) material, a block copolymer, or a silicon-containing compound; one or more solvents; a surface ligand; an additive; and an acrylate.

[0051]

[0052] Example 3 An imprint composition according to Example 1 or 2, wherein the core comprises titanium dioxide, niobium oxide, zirconium oxide, hafnium oxide, dopants thereof, or any combination thereof.

[0052]

[0053] Example 4 An imprint composition according to any one of Examples 1 to 3, wherein the shell passivation material comprises an ALD material.

[0053]

[0054] Example 5 An imprint composition according to any one of Examples 1 to 4, wherein the ALD material is selected from silicon oxide, zirconium oxide, hafnium oxide, aluminum oxide, tantalum oxide, niobium oxide, nickel oxide, cobalt oxide, tungsten oxide, vanadium oxide, cerium oxide, tin oxide, indium oxide, hafnium zirconium oxide, hafnium titanium oxide, titanium titanium oxide, titanium silicon oxide, silicon nitride, titanium nitride, titanium aluminum oxide, dopants thereof, or any combination thereof, and the core and shell are made of different materials.

[0054]

[0055] Example 6 An imprint composition according to any one of Examples 1 to 5, wherein the shell passivation material comprises a block copolymer.

[0055]

[0056] Example 7 The block copolymer is polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP), polystyrene - β-Polyethylene oxide (PS-b-PEO), polystyrene-β-polybutadiene (PS-b-PB), polystyrene - An imprint composition according to any one of Examples 1 to 6, comprising β-polymethyl methacrylate (PS-b-PMMA), polystyrene-block-polybutadiene-block-polystyrene, poloxamer, poly(isoprene-block-dimethylaminoethyl methacrylate) (PI-b-PDMAEMA), poly(ethylene oxide)-poly(propylene oxide)-poly(ethylene oxide) (PEO-PPO-PEO), these polymers, or any combination thereof.

[0056]

[0057] Example 8 An imprint composition according to any one of Examples 1 to 7, wherein the shell passivation material comprises a silicon-containing compound, and the silicon-containing compound comprises silane, silanol, siloxane, silicone, or any combination thereof.

[0057]

[0058] Example 9 Silicon-containing compounds include (3-acetamidopropyl)trimethoxysilane, oc blood Lutriethoxysilane, Ok blood An imprint composition according to any one of Examples 1 to 8, comprising trimethoxysilane, 3-(trimethoxysilyl)propyl methacrylate, propyltriethoxysilane, (3-acrylooxypropyl)tris(trimethylsiloxy)silane, dimethyldiethoxysilane, polydimethylsiloxane, γ-glycidooxypropyltrimethoxysilane (GPMS), polydiphenylsiloxane, hexamethylcyclotrisiloxane, aminopropyltriethoxysilane, complexes thereof, or any combination thereof.

[0058]

[0059] Example 10 An imprint composition according to any one of Examples 1 to 9, wherein the core has a diameter of approximately 2 nm to approximately 50 nm.

[0059]

[0060] Example 11 An imprint composition according to any one of Examples 1 to 10, wherein the shell has a thickness of about 0.1 nm to about 40 nm.

[0060]

[0061] Example 12 A method for forming a nanoimprint film, comprising: placing an imprint composition comprising a plurality of passivated nanoparticles on a substrate, wherein each passivated nanoparticle comprises a core and a shell, the core comprising a metal oxide, the shell comprising a passivation material, the passivation material comprising an ALD material, a block copolymer, or a silicon-containing compound, the silicon-containing compound comprising silane, silanol, siloxane, silicone, siloxane, derivatives thereof, or any combination thereof; contacting the imprint composition with a stamp having a pattern; converting the imprint composition into a porous nanoimprint film; and removing the stamp from the porous nanoimprint film.

[0061]

[0062] Example 13 The method according to Example 12, wherein the core comprises titanium oxide, niobium oxide, zirconium oxide, hafnium oxide, dopants thereof, or any combination thereof.

[0062]

[0063] Example 14 The method according to Example 12 or 13, wherein the shell passivation material includes an ALD material.

[0063]

[0064] Example 15 The method according to any one of Examples 12 to 14, wherein the ALD material is selected from silicon oxide, zirconium oxide, hafnium oxide, aluminum oxide, tantalum oxide, niobium oxide, nickel oxide, cobalt oxide, tungsten oxide, vanadium oxide, cerium oxide, tin oxide, indium oxide, hafnium zirconium oxide, hafnium titanium oxide, titanium titanium oxide, titanium silicon oxide, silicon nitride, titanium nitride, titanium aluminum oxide, dopants thereof, or any combination thereof, and the core and shell are made of different materials.

[0064]

[0065] Example 16 The method according to any one of Examples 12 to 15, wherein the shell passivation material comprises a block copolymer.

[0065]

[0066] Example 17 The block copolymer is polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP), polystyrene - β-Polyethylene oxide (PS-b-PEO), polystyrene-β-polybutadiene (PS-b-PB), polystyrene - The method according to any one of Examples 12 to 16, comprising β-polymethyl methacrylate (PS-b-PMMA), polystyrene-block-polybutadiene-block-polystyrene, poloxamer, poly(isoprene-block-dimethylaminoethyl methacrylate) (PI-b-PDMAEMA), poly(ethylene oxide)-poly(propylene oxide)-poly(ethylene oxide) (PEO-PPO-PEO), polymers thereof, or any combination thereof.

[0066]

[0067] Example 18 The method according to any one of Examples 12 to 17, wherein the shell passivation material comprises a silicon-containing compound.

[0067]

[0068] Example 19 Silicon-containing compounds include (3-acetamidopropyl)trimethoxysilane, oc blood Lutriethoxysilane, Ok blood The method according to any one of Examples 12 to 18, comprising trimethoxysilane, 3-(trimethoxysilyl)propyl methacrylate, propyltriethoxysilane, (3-acrylooxypropyl)tris(trimethylsiloxy)silane, dimethyldiethoxysilane, polydimethylsiloxane, γ-glycidooxypropyltrimethoxysilane (GPMS), polydiphenylsiloxane, hexamethylcyclotrisiloxane, aminopropyltriethoxysilane, complexes thereof, or any combination thereof.

[0068]

[0069] Example 20 The method according to any one of Examples 12 to 19, wherein the core has a diameter of approximately 2 nm to approximately 50 nm.

[0069]

[0070] Example 21 The method according to any one of Examples 12 to 20, wherein the shell has a thickness of approximately 0.1 nm to approximately 40 nm.

[0070]

[0071] Example 22 The method according to any one of Examples 12 to 21, further comprising converting the imprint composition into an imprint material by exposing the imprint composition to a light source having a wavelength of about 300 nm to about 365 nm.

[0071]

[0072] Example 23 The method according to any one of Examples 12 to 22, further comprising heating the imprint composition to a temperature of about 50°C to about 60°C for a period of time from about 1 minute to about 15 minutes.

[0072]

[0073] Example 24 An imprinted composition manufactured, prepared, or otherwise formed by the method described in any of Examples 12 to 23.

[0073]

[0074] While the foregoing is directed toward embodiments of the present disclosure, other further embodiments can be devised without departing from their basic scope, the scope of which is determined by the following claims. All documents described herein (including priority documents and / or test procedures) are incorporated herein by reference, insofar as they do not conflict with this text. While the forms of the present disclosure are illustrated and described, various modifications can be made without departing from the spirit and scope of the present disclosure, as will be apparent from the above general description and specific embodiments. Therefore, the present disclosure is not intended to be limited thereto. Similarly, the term “comprising” is deemed to be synonymous with the term “including” for the purposes of U.S. law. Similarly, whenever a composition, element, or group of elements precedes the transitional phrase “comprising,” it is understood that the same composition, element, or group of elements precedes a description of a composition or one or more elements with the transitional phrases “substantially consisting,” “consisting of,” “selected from a group consisting of,” or “is,” and vice versa.

[0074]

[0075] Specific embodiments and features are described using sets of numerical upper and lower limits. Unless otherwise specified, ranges including any combination of any two values, e.g., any combination of any lower and any upper limit, any combination of any two lower limits, and / or any combination of any two upper limits, should be considered. Specific lower limits, upper limits, and ranges appear in one or more of the following claims.

Claims

1. An imprinted composition, Passivated nanoparticles, wherein each passivated nanoparticle comprises a core and a shell, the core comprising a metal oxide, the shell comprising a passivation material, and the passivation material comprising a block copolymer, One or more solvents, surface ligands, Additives, and Acrylate An imprint composition containing the following:

2. The imprint composition according to claim 1, wherein the core comprises titanium oxide, niobium oxide, zirconium oxide, hafnium oxide, dopants thereof, or any combination thereof.

3. The imprint composition according to claim 1, wherein the passivation material further comprises an atomic layer deposition (ALD) material.

4. The imprint composition according to claim 3, wherein the ALD material is selected from silicon oxide, zirconium oxide, hafnium oxide, aluminum oxide, tantalum oxide, niobium oxide, nickel oxide, cobalt oxide, tungsten oxide, vanadium oxide, cerium oxide, tin oxide, indium oxide, hafnium zirconium oxide, hafnium titanium oxide, titanium zirconium oxide, titanium silicon oxide, silicon nitride, titanium nitride, titanium aluminum oxide, dopants thereof, or any combination thereof, and the core and the shell are made of different materials.

5. The imprint composition according to claim 1, wherein the block copolymer comprises polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP), polystyrene-b-polyethylene oxide (PS-b-PEO), polystyrene-b-polybutadiene (PS-b-PB), polystyrene-b-polymethyl methacrylate (PS-b-PMMA), polystyrene-block-polybutadiene-block-polystyrene, poloxamer, poly(isoprene-block-dimethylaminoethyl methacrylate) (PI-b-PDMAEMA), poly(ethylene oxide)-poly(propylene oxide)-poly(ethylene oxide) (PEO-PPO-PEO), these polymers, or any combination thereof.

6. The imprint composition according to claim 1, wherein the passivation material further comprises a silicon-containing compound, the silicon-containing compound comprising silane, silanol, siloxane, silicone, or any combination thereof.

7. The imprint composition according to claim 6, wherein the silicon-containing compound comprises (3-acetamidopropyl)trimethoxysilane, octyltriethoxysilane, octyltrimethoxysilane, 3-(trimethoxysilyl)propyl methacrylate, propyltriethoxysilane, (3-acrylooxypropyl)tris(trimethylsiloxy)silane, dimethyldiethoxysilane, polydimethylsiloxane, γ-glycidooxypropyltrimethoxysilane (GPMS), polydiphenylsiloxane, hexamethylcyclotrisiloxane, aminopropyltriethoxysilane, complexes thereof, or any combination thereof.

8. The imprint composition according to claim 1, wherein the core has a diameter of 2 nm to 50 nm.

9. The imprint composition according to claim 8, wherein the shell has a thickness of 0.1 nm to 40 nm.

10. A method for forming a nanoimprint film, Placing an imprint composition containing multiple passivated nanoparticles on a substrate, Each passivated nanoparticle has a core and a shell, The core contains a metal oxide, The shell comprises a passivation material, and the passivation material comprises a block copolymer. The passivation material further comprises an atomic layer deposition (ALD) material or a silicon-containing compound, wherein the silicon-containing compound includes silane, silanol, silicone, siloxane, derivatives thereof, or any combination thereof, and the imprint composition comprising a plurality of passivated nanoparticles is placed on a substrate. The imprint composition is brought into contact with a stamp having a pattern. Converting the imprint composition into a porous nanoimprint film, and To remove the stamp from the porous nanoimprint film, Methods that include...

11. The method according to claim 10, further comprising exposing the imprint composition to a light source having a wavelength of 300 nm to 365 nm in order to convert the imprint composition to the porous nanoimprint film.

12. The method according to claim 10, further comprising heating the imprint composition to a temperature of 50°C to 60°C for a period of time from 1 to 15 minutes, for which converting the imprint composition to the porous nanoimprint film is further a method according to claim 10.

13. The method according to claim 10, wherein the core comprises titanium oxide, niobium oxide, zirconium oxide, hafnium oxide, dopants thereof, or any combination thereof.

14. The method according to claim 10, wherein the passivation material comprises an ALD material, the ALD material being selected from silicon oxide, zirconium oxide, hafnium oxide, aluminum oxide, tantalum oxide, niobium oxide, nickel oxide, cobalt oxide, tungsten oxide, vanadium oxide, cerium oxide, tin oxide, indium oxide, hafnium zirconium oxide, hafnium titanium oxide, titanium zirconium oxide, titanium silicon oxide, silicon nitride, titanium nitride, titanium aluminum oxide, dopants thereof, or any combination thereof, and the core and the shell comprises different materials.

15. The method according to claim 10, wherein the block copolymer comprises polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP), polystyrene-b-polyethylene oxide (PS-b-PEO), polystyrene-b-polybutadiene (PS-b-PB), polystyrene-b-polymethyl methacrylate (PS-b-PMMA), polystyrene-block-polybutadiene-block-polystyrene, poloxamer, poly(isoprene-block-dimethylaminoethyl methacrylate) (PI-b-PDMAEMA), poly(ethylene oxide)-poly(propylene oxide)-poly(ethylene oxide) (PEO-PPO-PEO), polymers thereof, or any combination thereof.

16. The method according to claim 10, wherein the passivation material comprises a silicon-containing compound, the silicon-containing compound comprising (3-acetamidopropyl)trimethoxysilane, octyltriethoxysilane, octyltrimethoxysilane, 3-(trimethoxysilyl)propyl methacrylate, propyltriethoxysilane, (3-acrylooxypropyl)tris(trimethylsiloxy)silane, dimethyldiethoxysilane, polydimethylsiloxane, γ-glycidooxypropyltrimethoxysilane (GPMS), polydiphenylsiloxane, hexamethylcyclotrisiloxane, aminopropyltriethoxysilane, complexes thereof, or any combination thereof.

17. The method according to claim 10, wherein the core has a diameter of 2 nm to 50 nm, and the shell has a thickness of 0.1 nm to 40 nm.

Images