Self-assembled monolayer removal solution, and substrate processing method and substrate processing apparatus using the same.

A self-assembled monolayer removal solution with tailored Hansen solubility parameters addresses the inadequacies of conventional methods by ensuring high solubility and wettability, effectively removing SAMs from substrates.

JP7863463B2Active Publication Date: 2026-05-21SCREEN HOLDINGS CO LTD
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Patent Information

Application Number
JP2022106030
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Filing Date
2022-06-30
Publication Date
2026-05-21
Estimated Expiration
2042-06-30

AI Technical Summary

Technical Problem

Conventional methods for removing self-assembled monolayers (SAMs) on substrates are insufficient in terms of selective removal, particularly due to inadequate solubility and wettability of the removal solutions.

Method used

A self-assembled monolayer removal solution is formulated with Hansen solubility parameters that fall within both the first and second Hansen spheres of the SAM forming material and SAM, ensuring high affinity and solubility, along with good wettability, using solvents like 1-butanol, 2-butanol, tetrahydrofuran, and benzyl alcohol.

Benefits of technology

The solution effectively and selectively removes SAMs from substrates, providing superior performance compared to conventional methods by balancing solubility and wettability, thereby enhancing the removal process.

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Abstract

To provide a self-assembled monolayer removing liquid capable of selectively removing a self-assembled monolayer provided on a surface of a substrate, and a substrate processing method and a substrate processing apparatus using the removing liquid.SOLUTION: The present invention is a self-assembled monolayer removing liquid for selectively removing a self-assembled monolayer provided on a surface of a substrate. The self-assembled monolayer removing liquid has a Hansen solubility parameter which is positioned in a first Hansen sphere 1 of a material for forming the self-assembled monolayer, the first Hansen sphere being defined by a center value (δd1, δp1, δh1)[MPa1 / 2] and a sphere radius R1[MPa1 / 2] in a Hansen solubility parameter space, and which is also positioned in a second Hansen sphere 2 of the self-assembled monolayer, the second Hansen sphere being defined by a center value (δd2, δp2, δh2)[MPa1 / 2] and a sphere radius R2[MPa1 / 2] in the Hansen solubility parameter space.SELECTED DRAWING: Figure 1
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Citation Information

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