Resin substrates, metal-clad laminates, and wiring boards
By employing glass cloth with high SiO2 content and controlled yarn width variation and loss tangent, the challenges of drill wear and dielectric property improvement in resin substrates and metal-clad laminates are addressed, resulting in improved drilling efficiency and dielectric performance.
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- ASAHI KASEI KOGYO KABUSHIKI KAISHA
- Filing Date
- 2025-12-25
- Publication Date
- 2026-06-18
AI Technical Summary
Conventional resin substrates and metal-clad laminates face challenges in achieving high SiO2 content for improved dielectric properties while maintaining low drill wear resistance, as increased SiO2 content leads to increased drill wear and reduced drilling efficiency.
The use of glass cloth woven from glass yarn with a SiO2 content of 95-100% by mass, combined with a yarn width variation coefficient of 0.20 or less, and a loss tangent of 0.34 or less at 200°C, to suppress drill wear and improve dielectric properties.
This approach results in resin substrates and metal-clad laminates with excellent drill wear resistance and dielectric properties, suitable for high-speed communication applications.
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