Substrate processing apparatus and substrate processing method

Abstract

To provide a substrate processing device which can prevent a large amount of crystals from being generated at a stand-by pot or an area near the stand-by pot.SOLUTION: A substrate processing device includes: a chemical nozzle 31 which discharges a chemical solution downward toward an upper surface of a horizontal substrate; at least one actuator which moves the chemical nozzle 31 between a processing position where the chemical nozzle 31 overlaps with the substrate in a plan view and a stand-by position where the chemical nozzle 31 does not overlap with the substrate in the plan view; a stand-by pot 56 which receives the chemical solution, discharged downward from the chemical nozzle 31 in the stand-by position, with a recessed part 57; and at least one cleaning water nozzle 64 to 65 which discharges cleaning water from the outside of the stand-by pot 56 toward the stand-by pot 56 in a mist-like or shower-like form.SELECTED DRAWING: Figure 7

Claims

1. A chemical nozzle that discharges the chemical solution downwards toward the upper surface of a horizontal substrate, At least one actuator moves the chemical nozzle between a processing position in which the chemical nozzle overlaps the substrate in a plan view and a standby position in which the chemical nozzle does not overlap the substrate in a plan view. A standby pot includes a recessed area that is indented downwards, and the standby pot receives the liquid chemical discharged downwards from the liquid chemical nozzle located in the standby position in the recessed area, It comprises at least one cleaning water nozzle that discharges cleaning water in a mist or shower-like manner from outside the standby pot toward the standby pot, A substrate processing apparatus comprising at least one cleaning water nozzle, which includes an external discharge port positioned below an opening formed in the outer surface of the standby pot by the recess of the standby pot, and which discharges the cleaning water from the external discharge port toward the outer surface of the standby pot in a mist or shower manner.

2. The substrate processing apparatus according to claim 1, wherein the at least one cleaning water nozzle includes an internal discharge port positioned above the opening formed in the outer surface of the standby pot by the recess of the standby pot, and the cleaning water is discharged from the internal discharge port toward the opening of the standby pot in a mist or shower manner.

3. The substrate processing apparatus according to claim 2, further comprising an exhaust pipe for discharging gas from the recess of the standby pot.

4. The substrate processing apparatus according to claim 2 or 3, wherein the at least one cleaning water nozzle discharges the cleaning water in a mist or shower-like manner from the inner discharge port toward the opening of the standby pot when the chemical nozzle is located in the processing position.

5. The substrate processing apparatus is further equipped with a splash blocker that is positioned horizontally and directly opposite the chemical nozzle located in the standby position, and which catches splashes of the chemical when the chemical nozzle located in the standby position discharges the chemical downward toward the standby pot. The substrate processing apparatus according to claim 2 or 3, wherein the at least one cleaning water nozzle discharges the cleaning water in a mist or shower manner from the inner discharge port toward the splash blocker and the opening of the standby pot.

6. The substrate processing apparatus according to claim 5, wherein the opening of the standby pot is visible when the standby pot and splash blocker are viewed from above.

7. The substrate processing apparatus according to claim 2 or 3, further comprising a gas curtain nozzle that discharges gas from an outlet positioned above the inner outlet of at least one of the washing water nozzles, thereby forming an airflow above the standby pot that overlaps the standby pot in a plan view.

8. A liquid dispensing nozzle that discharges liquid downward toward the upper surface of a horizontal substrate is positioned in a standby position that does not overlap the substrate in a plan view, and the liquid dispensing downward from the liquid dispensing nozzle is received in a recess of a standby pot that is recessed downward, A substrate processing method comprising the step of, after the chemical solution nozzle located in the standby position begins to discharge the chemical solution downward toward the standby pot, discharging cleaning water in a mist or shower-like manner from at least one cleaning water nozzle toward the standby pot from outside the standby pot.

9. A liquid chemical nozzle that discharges the liquid chemical downward toward the upper surface of a horizontal substrate, At least one actuator moves the chemical nozzle between a processing position in which the chemical nozzle overlaps the substrate in a plan view and a standby position in which the chemical nozzle does not overlap the substrate in a plan view. A standby pot includes a recessed area that is indented downwards, and the standby pot receives the liquid chemical discharged downwards from the liquid chemical nozzle located in the standby position in the recessed area, It comprises at least one cleaning water nozzle that discharges cleaning water in a mist or shower-like manner from outside the standby pot toward the standby pot, The at least one cleaning water nozzle includes an internal discharge port positioned above an opening formed in the outer surface of the standby pot by the recess of the standby pot, and discharges the cleaning water from the internal discharge port toward the opening of the standby pot in a mist or shower form. A substrate processing apparatus further comprising an exhaust pipe for discharging gas from the recess of the standby pot.

10. A liquid chemical nozzle that discharges the liquid chemical downward toward the upper surface of a horizontal substrate, At least one actuator moves the chemical nozzle between a processing position in which the chemical nozzle overlaps the substrate in a plan view and a standby position in which the chemical nozzle does not overlap the substrate in a plan view. A standby pot includes a recessed area that is indented downwards, and the standby pot receives the liquid chemical discharged downwards from the liquid chemical nozzle located in the standby position in the recessed area, It comprises at least one cleaning water nozzle that discharges cleaning water in a mist or shower-like manner from outside the standby pot toward the standby pot, The at least one cleaning water nozzle includes an internal discharge port positioned above an opening formed in the outer surface of the standby pot by the recess of the standby pot, and discharges the cleaning water from the internal discharge port toward the opening of the standby pot in a mist or shower form. A substrate processing apparatus wherein the at least one cleaning water nozzle discharges the cleaning water in a mist or shower form from the inner discharge port toward the opening of the standby pot when the chemical nozzle is located in the processing position.

11. A liquid chemical nozzle that discharges liquid chemical downward toward the upper surface of a horizontal substrate, At least one actuator moves the chemical nozzle between a processing position in which the chemical nozzle overlaps the substrate in a plan view and a standby position in which the chemical nozzle does not overlap the substrate in a plan view. A standby pot includes a recessed area that is indented downwards, and the standby pot receives the liquid chemical discharged downwards from the liquid chemical nozzle located in the standby position in the recessed area, It comprises at least one cleaning water nozzle that discharges cleaning water in a mist or shower-like manner from outside the standby pot toward the standby pot, The at least one cleaning water nozzle includes an internal discharge port positioned above an opening formed in the outer surface of the standby pot by the recess of the standby pot, and discharges the cleaning water from the internal discharge port toward the opening of the standby pot in a mist or shower form. The system further comprises a gas curtain nozzle that discharges gas from an outlet positioned above the inner outlet of at least one of the washing water nozzles, thereby forming an airflow that overlaps the standby pot in a plan view above the standby pot. A substrate processing apparatus that discharges cleaning water from the inner discharge port while discharging gas from the gas curtain nozzle.

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