Compound, composition, surface treatment agent, article, and method for producing article

Abstract

The present invention provides: a novel compound that is useful as a surface treatment agent that can from, on a base material, a surface treatment layer having excellent fingerprint removal properties; a composition; a surface treatment agent; an article; and a method for producing an article.　Provided is a compound represented by formula (1): \{T-L1-(Si(R2)2-O)m-Si(R2)2-L2\}p-X. T is (R1)3Si- or the like. R1 is a hydrocarbon group or the like. L1 is -O- or the like. R2 is a hydrocarbon group. L2 is a single bond or the like. X is -L3-A-(Si(R)nL3-n)q or the like. L3 is -C(R4)3-p- or the like. R4 and R5 are each a hydrogen atom or the like. A is a (q+1)-valent linking group. L4 is a (p+q)-valent aromatic ring group or the like. L5 is a single bond or the like. R is a hydrocarbon group. L is a hydrolyzable group or the like. m is number of 1 or greater. n is an integer of 0-2. p is 2 or 3. q is an integer of 1 or greater.

Description

Compound, composition, surface treatment agent, article, and method for manufacturing article

[0001] The present disclosure relates to compounds, compositions, surface treatments, articles, and methods for making articles.

[0002] In recent years, in order to improve performance such as appearance and visibility, there has been a demand for technologies that make it difficult for stains such as fingerprints to adhere to the surface of an article, and technologies that make it easy to remove stains such as fingerprints. As a specific method, a method of performing a surface treatment on the surface of an article using a surface treatment agent is known.

[0003] For example, Patent Document 1 describes a silane compound having a specific siloxane group that is used in the above-mentioned surface treatment agent.

[0004] International Publication No. 2023 / 017830

[0005] The present inventors formed a surface treatment layer using the silane compound described in Patent Document 1, and found that further improvement was required in terms of fingerprint removability.

[0006] The present disclosure has been made in view of the above circumstances, and a problem to be solved by one embodiment of the present invention is to provide a novel compound and composition useful as a surface treatment agent capable of forming a surface treatment layer having excellent fingerprint removability on a substrate.A problem to be solved by one embodiment of the present invention is to provide a surface treatment agent capable of forming a surface treatment layer having excellent fingerprint removability on a substrate.A problem to be solved by one embodiment of the present invention is to provide an article having a surface treatment layer having excellent fingerprint removability, and a method for producing the article.

[0007] The present disclosure includes the following aspects: [1] A compound represented by formula (1): {T-L １ -(Si(R ２ ) ２ -O) ｍ -Si(R ２ ) ２ -L ２} ｐ -X (1) T is independently (R １ ) ３Si—, a monovalent cyclic polysiloxane residue or a monovalent cage-like polysiloxane residue, R １ are each independently a hydrocarbon group or a trialkylsilyloxy group, and L １ are each independently —O— or an alkylene group, and R ２ are each independently a hydrocarbon group; ２ are each independently a single bond, an alkylene group, or —O—, and X is —L ３ -A-(Si(R) ｎ L ３－ｎ ) ｑ , or -L ４ - (L ５ -Si(R) ｎ L ３－ｎ ) ｑ and L ３ is -C(R ４ ) ３－ｐ -, -Si(R ５ ) ３－ｐ - or (p+1)-valent aromatic or alicyclic group, R ４ and R ５ are each independently a hydrogen atom or a hydrocarbon group, A is a (q+1)-valent linking group, and L ４ is a (p+q)-valent aromatic or alicyclic group, ５ is a single bond or a divalent linking group, each R is independently a hydrocarbon group, each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, m is a number of 1 or more, n is an integer of 0 to 2, p is 2 or 3, and q is an integer of 1 or more. [2] X is -L ３ -A-(Si(R) ｎ L ３－ｎ ) ｑ [3] The compound according to [1], wherein L ３ But -Si(R ５ ) ３－ｐ-. [4] The compound according to any one of [1] to [3], wherein q is 1 to 4. [5] The compound according to any one of [1] to [4], wherein m is 2 to 600. [6] A composition comprising the compound according to any one of [1] to [5] and a liquid medium. [7] A surface treatment agent comprising the compound according to any one of [1] to [5]. [8] A surface treatment agent comprising the compound according to any one of [1] to [5] and a liquid medium. [9] A method for producing an article, comprising treating a substrate with the surface treatment agent according to [7] to produce an article having a surface treatment layer formed on the substrate.

[10] An article comprising a substrate and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent according to [7].

[11] The article according to

[10] , which is an optical member.

[12] The article according to

[11] , which is a display or a touch panel.

[13] A method for manufacturing an article, comprising: surface-treating a substrate using the surface treatment agent according to [8] to manufacture an article having a surface-treated layer formed on the substrate.

[14] An article comprising a substrate and a surface-treated layer disposed on the substrate and surface-treated with the surface treatment agent according to [8].

[15] The article according to

[14] , which is an optical member.

[16] The article according to

[15] , which is a display or a touch panel.

[0008] According to one embodiment of the present invention, there are provided novel compounds and compositions useful as surface treatment agents capable of forming a surface treatment layer having excellent fingerprint removability on a substrate. According to one embodiment of the present invention, there is provided a surface treatment agent capable of forming a surface treatment layer having excellent fingerprint removability on a substrate. According to one embodiment of the present invention, there are provided an article having a surface treatment layer having excellent fingerprint removability and a method for producing the article.

[0009] In this specification, numerical ranges indicated using "to" include the numerical values ​​before and after "to" as the minimum and maximum values, respectively. In numerical ranges described in stages in this specification, the upper or lower limit value described in one numerical range may be replaced with the upper or lower limit value of another numerical range described in stages. Furthermore, in numerical ranges described in this specification, the upper or lower limit value of that numerical range may be replaced with a value shown in the Examples. In this specification, the term "surface treatment layer" refers to a layer formed on the surface of a substrate by surface treatment. In this specification, when a compound or group is represented by a specific formula (X), the compound or group represented by the formula (X) may be referred to as compound (X) or compound X, and group (X) or group X, respectively. In this specification, Me means a methyl group.

[0010] The bonding direction of divalent groups represented in this specification is not limited unless otherwise specified. For example, when Y is -COO- in a compound represented by the formula "X-Y-Z", Y may be -CO-O- or -O-CO-. In addition, the compound may be "X-CO-O-Z" or "X-O-CO-Z".

[0011] [Compound] The compound of the present disclosure is a compound represented by formula (1) described below. When the compound of the present disclosure is used, a surface treatment layer having excellent fingerprint removal properties can be formed. The details of the reason for this are not clear, but it is presumed as follows. In formula (1) described below, T-L １ -(Si(R ２ ) ２ -O) ｍ -Si(R ２ ) ２ -L ２ It is speculated that the inclusion of multiple groups represented by the formula (1) increases the surface density of hydrocarbon groups (e.g., methyl groups) with low surface free energy, thereby exhibiting oil repellency and making fingerprints easier to remove by wiping. Furthermore, when the compound of the present disclosure is used, a surface layer with excellent abrasion resistance and water repellency can be formed. The details of the reason for this are not clear, but it is speculated as follows. The -Si(R) group included in X in formula (1) described belowｎ L ３－ｎ It is presumed that the strong chemical bond between Compound 1 and the substrate results in a surface treatment layer with excellent abrasion resistance. In addition, it is presumed that the water-repellent property of Compound 1 is excellent because Compound 1 contains a siloxane bond.

[0012] The compounds of the present disclosure will be described in detail below.

[0013] <Compound represented by formula (1)> {T-L １ -(Si(R ２ ) ２ -O) ｍ -Si(R ２ ) ２ -L ２} ｐ -X (1) In formula (1), each T is independently (R １ ) ３ Si—, a monovalent cyclic polysiloxane residue or a monovalent cage-like polysiloxane residue, R １ are each independently a hydrocarbon group or a trialkylsilyloxy group, and L １ are each independently —O— or an alkylene group, and R ２ are each independently a hydrocarbon group; ２ are each independently a single bond, an alkylene group, or —O—, and X is —L ３ -A-(Si(R) ｎ L ３－ｎ ) ｑ , or -L ４ - (L ５ -Si(R) ｎ L ３－ｎ ) ｑ and L ３ is -C(R ４ ) ３－ｐ -, -Si(R ５ ) ３－ｐ - or (p+1)-valent aromatic or alicyclic group, R ４ and R ５ are each independently a hydrogen atom or a hydrocarbon group, A is a (q+1)-valent linking group, and L ４ is a (p+q)-valent aromatic or alicyclic group, ５represents a single bond or a divalent linking group; each R is independently a hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; m is a number of 1 or more; n is an integer from 0 to 2; p is an integer of 2 or more; and q is an integer of 1 or more.

[0014] In formula (1), each T is independently １ ) ３ Si-, a monovalent cyclic polysiloxane residue, or a monovalent cage polysiloxane residue.

[0015] R １ Examples of the hydrocarbon group represented by the formula include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. R １ The hydrocarbon group represented by the formula (I) is more preferably a methyl group, an ethyl group, an n-propyl group, or an n-butyl group, and even more preferably a methyl group.

[0016] R １ The alkyl group contained in the trialkylsilyloxy group represented by the formula (R) may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. １ The number of carbon atoms in the alkyl group contained in the trialkylsilyloxy group represented by R is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. １ The alkyl group contained in the trialkylsilyloxy group represented by the formula (I) is more preferably a methyl group, an ethyl group, an n-propyl group, or an n-butyl group, and even more preferably a methyl group.

[0017] Multiple R １ may be the same or different from each other, and from the viewpoint of ease of production, it is preferable that they are the same.

[0018] (R １ )３ Examples of the group represented by Si- include a methyldiethylsilyl group, a methylethylpropylsilyl group, a methylethylbutylsilyl group, a methyldipropylsilyl group, a methylpropylbutylsilyl group, a methyldibutylsilyl group, a dimethylethylsilyl group, a dimethylpropylsilyl group, a dimethylbutylsilyl group, a trimethylsilyl group, a triethylsilyl group, a tri-n-propylsilyl group, a tri-isopropylsilyl group, and a trialkylsilyloxy group having any of these groups. １ is preferably a trialkylsilyloxy group, more preferably a trimethylsilyloxy group or a triethylsilyloxy group.

[0019] The monovalent cyclic polysiloxane residue is preferably a group represented by formula (T1).

[0020]

[0021] In formula (T1), R ３ each independently represents a hydrocarbon group, a hydrocarbon group having a substituent, or —O—SiR ５１ ３ where s is an integer of 1 to 4, and R ５１ are each independently a hydrocarbon group or a trialkylsilyloxy group, and * is a bonding position.

[0022] R ３ Examples of the hydrocarbon group represented by the formula (I) include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group.

[0023] R ３ The alkyl group as one embodiment of the hydrocarbon group represented by the formula (I) may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 8, and even more preferably 1 to 4. Specifically, R ３ The alkyl group represented by the formula (I) is preferably a methyl group, an ethyl group, an n-propyl group, an n-butyl group, an isobutyl group, or a 2-butyl group, and more preferably a methyl group.

[0024] R ３ Examples of the hydrocarbon group contained in the hydrocarbon group having a substituent represented by the formula (I) include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. The number of carbon atoms in the alkyl group contained in the substituted alkyl group is preferably 1 to 10, more preferably 1 to 8, and even more preferably 2 to 4.

[0025] R ３ Examples of the substituent in the hydrocarbon group having a substituent represented by the formula: include a halogen atom, a hydroxyl group, an alkoxy group, a trialkylsilyl ether group, a trialkylsilyl group, an amino group, a nitro group, a cyano group, a sulfonyl group, a trifluoromethyl group, and —SiR ５２ ３ Examples of the group include a group represented by the following formula: ５２ are each independently a hydrocarbon group or a trialkylsilyloxy group.

[0026] R ５２ The hydrocarbon group represented by R ３ The hydrocarbon groups represented by R ５２ The alkyl group contained in the trialkylsilyloxy group represented by the formula (I) may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. The alkyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 8, even more preferably 1 to 4, and particularly preferably 1. The three alkyl groups contained in the trialkylsilyloxy group may be the same or different from each other.

[0027] The Three Rs ５２ may be the same or different from each other, but from the viewpoint of ease of production, it is preferable that they are the same.

[0028] R ３ -O-SiR ５１ ３ In the group represented by ５１are each independently a hydrocarbon group or a trialkylsilyloxy group. ５１ The hydrocarbon group represented by R ３ The hydrocarbon groups represented by R ５１ The trialkylsilyloxy group represented by R ５２ Examples include the same as the trialkylsilyloxy group represented by the following formula:

[0029] Multiple R ３ may be the same or different from each other, but from the viewpoint of ease of production, it is preferable that they are the same.

[0030] Examples of the monovalent cyclic polysiloxane residue include the following groups: * indicates a bonding position.

[0031]

[0032]

[0033] The monovalent cage-like polysiloxane residue is preferably a group represented by formula (T2).

[0034]

[0035] In formula (T2), R ４ are each independently a hydrocarbon group or a trialkylsilyloxy group, and * indicates the bonding position.

[0036] R ４ Examples of the hydrocarbon group represented by the formula include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group or a branched alkyl group is preferred. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. R ４ The hydrocarbon group represented by the formula (I) is more preferably a methyl group, an ethyl group, an n-propyl group, an n-butyl group, or an isobutyl group, and even more preferably an isobutyl group.

[0037] R ４The alkyl group contained in the trialkylsilyloxy group represented by the formula (R) may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. ４ The number of carbon atoms in the alkyl group contained in the trialkylsilyloxy group represented by R is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. １ The hydrocarbon group represented by the formula (I) is more preferably a methyl group, an ethyl group, an n-propyl group, or an n-butyl group, and even more preferably a methyl group.

[0038] Multiple R ４ may be the same or different from each other, and from the viewpoint of ease of production, it is preferable that they are the same.

[0039] Examples of the monovalent cage-like polysiloxane residue include the following groups: * indicates a bonding site.

[0040]

[0041] In formula (1), L １ are each independently —O— or an alkylene group. １ The alkylene group in may be any of a linear alkylene group, a branched alkylene group, and a cyclic alkylene group, but is preferably a linear alkylene group or a branched alkylene group, and more preferably a linear alkylene group. １ The alkylene group in the formula (I) preferably has 1 to 20 carbon atoms, more preferably 2 to 12 carbon atoms, and even more preferably 2 to 6 carbon atoms.

[0042] In formula (1), R ２ are each independently a hydrocarbon group. ２ As for R １ Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. The alkyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, and even more preferably 1 to 4 carbon atoms. R ２R is more preferably a methyl group, an ethyl group, an n-propyl group, or an n-butyl group, and even more preferably a methyl group. ２ The number of carbon atoms is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4.

[0043] In formula (1), L ２ are each independently a single bond, an alkylene group, or —O—. ２ The alkylene group in １ Examples of the alkylene group include:

[0044] In formula (1), X is -L ３ -A-(Si(R) ｎ L ３－ｎ ) ｑ , or -L ４ - (L ５ -Si(R) ｎ L ３－ｎ ) ｑ and from the viewpoint of superior fingerprint removal property, -L ３ -A-(Si(R) ｎ L ３－ｎ ) ｑ is preferred.

[0045] L ３ is -C(R ４ ) ３－ｐ -, -Si(R ５ ) ３－ｐ -, or (p+1)-valent aromatic ring group or alicyclic group, and from the viewpoint of superior fingerprint removability, -C(R ４ ) ３－ｐ - or -Si(R ５ ) ３－ｐ - is preferred, and -Si(R ５ ) ３－ｐ - is even more preferred.

[0046] R ４ and R ５ are each independently a hydrogen atom or a hydrocarbon group. ４ and R ５ Examples of the hydrocarbon group in １ Here, when p is 2, a hydrocarbon group represented by -C(R ４ ) ３－ｐThe C (carbon atom) indicated by - has two T-L １ -(Si(R ２ ) ２ -O) ｍ -Si(R ２ ) ２ -L ２ are bonded, and one R ４ When p is 3, -C(R ４ ) ３－ｐ The C (carbon atom) indicated by - has three T-L １ -(Si(R ２ ) ２ -O) ｍ -Si(R ２ ) ２ -L ２ are combined.

[0047] L ３ Specific examples of the aromatic ring in the (p+1)-valent aromatic ring group in the above formula include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, an indene ring, an azulene ring, a fluorene ring, a pyrene ring; a furan ring, a thiophene ring, a pyrrole ring, an imidazole ring, a pyridine ring, a pyrimidine ring, a pyrazine ring, an indole ring, a purine ring, a quinoline ring, an isoquinoline ring, a chromene ring, a phenothiazine ring, a phenoxazine ring, an acridine ring, a phenazine ring, and a carbazole ring. From the viewpoint of improving water repellency and oil repellency, a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, an indene ring, an azulene ring, and a fluorene ring are preferred. From the viewpoint of easy availability of raw materials, a benzene ring, a naphthalene ring, and a pyridine ring are preferred, a benzene ring and a naphthalene ring are more preferred, and a benzene ring is even more preferred. The aromatic ring may or may not have a substituent. When the aromatic ring has a substituent, the number of the substituents is preferably 1 to 15, more preferably 1 to 9, and even more preferably 1 to 7. Examples of the substituent include a halogen atom, a hydroxyl group, an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, a haloalkyl group having 1 to 10 carbon atoms, -OCF ３ , -SF ５ , -OC(O)R ｓ , -N(R ｓ ) C(O)R ｓ , -NO ２ , -SO２ R ｓ , -NR ｓ ２ , -C(O)OR ｓ , —C(O)NR ｓ ２ , -C(O)R ｓ etc. ｓ are each independently a hydrogen atom or an alkyl group.

[0048] L ３ The ring constituting the (p+1)-valent alicyclic group in the formula (I) may be saturated or unsaturated. The ring is preferably a 3- to 20-membered ring, more preferably a 4- to 15-membered ring. The number of carbon atoms in the ring constituting the alicyclic group is preferably 3 to 20, more preferably 3 to 10, and even more preferably 4 to 6. The ring may have a heteroatom, such as a silicon atom, an oxygen atom, a nitrogen atom, or a sulfur atom. L ３ Specific examples of the ring constituting the (p+1)-valent alicyclic group in the above formula include a cyclohexane ring, a cycloheptane ring, a cyclooctane ring, a norbornane ring, an adamantane ring, and a bicyclooctane ring, with a cyclohexane ring and an adamantane ring being preferred. The ring constituting the alicyclic group may or may not have a substituent. When the ring constituting the alicyclic group has a substituent, the number of the substituents is preferably 1 to 10, more preferably 1 to 5, and even more preferably 1 or 2. Specific examples of the substituents are the same as those of the substituents in the aromatic ring described above.

[0049] Each R is independently a hydrocarbon group. Examples of the hydrocarbon group represented by R include R １ Examples of the hydrocarbon groups include those represented by the following formula:

[0050] Each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group. A hydrolyzable group is a group that becomes a hydroxyl group through a hydrolysis reaction. That is, a hydrolyzable silyl group represented by Si-L becomes a silanol group represented by Si-OH through a hydrolysis reaction. The silanol groups further react with each other to form Si-O-Si bonds. Furthermore, the silanol groups can undergo a dehydration condensation reaction with silanol groups derived from oxides present on the surface of the substrate to form Si-O-Si bonds.

[0051] Examples of hydrolyzable groups include alkoxy groups, aryloxy groups, halogen atoms, acyl groups, acyloxy groups, and isocyanato groups (-NCO). The alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms. The aryloxy group is preferably an aryloxy group having 3 to 10 carbon atoms. However, the aryl group of the aryloxy group includes a heteroaryl group. The halogen atom is preferably a chlorine atom. The acyl group is preferably an acyl group having 1 to 6 carbon atoms. The acyloxy group is preferably an acyloxy group having 1 to 6 carbon atoms.

[0052] The group having a hydrolyzable group may be, for example, any of the groups having a hydrolyzable group exemplified above. Ａ -L Ｂ is preferred. Ａ is an alkylene group, and L Ｂ is a hydrolyzable group. The alkylene group preferably has 1 to 10 carbon atoms. Ｂ The hydrolyzable group represented by the formula (I) has the same meaning as the hydrolyzable group represented by L described above, and the preferred embodiments are also the same.

[0053] Among these, from the viewpoint of ease of production of the compound, L is preferably an alkoxy group having 1 to 4 carbon atoms or a halogen atom. L is preferably an alkoxy group having 1 to 4 carbon atoms, more preferably an ethoxy group or a methoxy group, from the viewpoint of less outgassing during coating and better storage stability of the compound.

[0054] In formula (1), m is a number of 1 or more. m is preferably a number from 2 to 600, more preferably a number from 3 to 500, even more preferably a number from 9 to 50, particularly preferably a number from 11 to 30, and most preferably a number from 11 to 25. In formula (1), "(Si(R ２ ) ２ The number m of repeating units represented by (a) (—O)) is an average value calculated from data obtained by measuring the compound by nuclear magnetic resonance (NMR).

[0055] Each n is independently an integer of 0 to 2. n is preferably 0 or 1, and more preferably 0. The presence of multiple Ls strengthens the adhesion of the surface treatment layer to the substrate. When n is 1 or less, multiple Ls present in one molecule may be the same or different from each other. From the viewpoint of easy availability of raw materials and ease of production of the compound, it is preferable that multiple Ls are the same. When n is 2, multiple Rs present in one molecule may be the same or different from each other. From the viewpoint of easy availability of raw materials and ease of production of the compound, it is preferable that multiple Rs are the same.

[0056] p is 2 or 3.

[0057] q is an integer of 1 or more. In order to improve the abrasion resistance of the surface treatment layer, q is preferably an integer of 1 to 15, more preferably an integer of 1 to 6, even more preferably an integer of 1 to 4, and particularly preferably 2 or 3. When q is an integer of 2 or more, a plurality of [Si(R) ｎ L ３－ｎ ] may be the same or different from each other.

[0058] In formula (1), A is a single bond or a (q+1)-valent linking group. A may be any group as long as it does not impair the effects of the present disclosure, and examples of A include alkylene groups which may have an etheric oxygen atom or a divalent organopolysiloxane residue, carbon atoms, nitrogen atoms, silicon atoms, divalent to octavalent organopolysiloxane residues, and Si(R) from formulas (3-1A), (3-1B), and (3-1A-1) to (3-1A-7) described below. ｎ L ３－ｎ Examples of the groups include those excluding

[0059] Furthermore, A may be any of the groups (g2-1) to (g2-14) described below.

[0060] -A(Si(R) in formula (1) ｎ L ３－ｎ ) ｑ The group represented by the formula (3-1A) is preferably the group (3-1A) or the group (3-1B), and more preferably the group (3-1A).

[0061] -Q ａ -X３１ (-Q ｂ -Si(R) ｎ L ３－ｎ ) ｈ (-R ３１ ) ｉ (3-1A) -Q ｃ - [CH ２ C (R ３２ ) (-Q ｄ -Si(R) ｎ L ３－ｎ )] ｙ -R ３３ (3-1B) In the formulas (3-1A) and (3-1B), R, L, and n are defined as above.

[0062] In formula (3-1A), Q ａ is a single bond or a divalent linking group. Examples of the divalent linking group include a divalent hydrocarbon group, a divalent heterocyclic group, —O—, —S—, and —SO ２ -, -N(R ｄ )-, -C(O)-, -Si(R ａ ) ２ -, and groups formed by combining two or more of these. The divalent hydrocarbon group may be a divalent saturated hydrocarbon group or a divalent aromatic hydrocarbon group. The divalent saturated hydrocarbon group may be linear, branched, or cyclic, and examples thereof include alkylene groups. The alkylene group preferably has 1 to 60 carbon atoms, more preferably 1 to 30, even more preferably 1 to 20, particularly preferably 4 to 20, and most preferably 5 to 15. Furthermore, the divalent aromatic hydrocarbon group preferably has 5 to 20 carbon atoms, and examples thereof include a phenylene group. The R ａ is an alkyl group (preferably having 1 to 10 carbon atoms) or a phenyl group. ｄ is a hydrogen atom or an alkyl group (preferably having 1 to 10 carbon atoms). Examples of groups formed by combining two or more of these groups include -C(O)O-, -C(O)S-, and -C(O)N(R ｄ ) -, -N(R ｄ )C(O)N(R ｄ ) -, -N(R ｄ )C(O)O-,-SO ２ N (R ｄ)-, -C(O)N(R ｄ )-, an alkylene group having —OC(O)N(R ｄ an alkylene group having —C(O)O—, an alkylene group having —C(O)S—, an alkylene group having —N(R ｄ an alkylene group having —N(R ｄ )C(O)N(R ｄ an alkylene group having —SO ２ N (R ｄ )- and alkylene groups -Si(R ａ ) ２ -phenylene group -Si(R ａ ) ２ Among them, Q ａ represents a divalent hydrocarbon group (preferably an alkylene group), a divalent heterocyclic group, —O—, —S—, —SO ２ -, -N(R ｄ )-, -C(O)-, -Si(R ａ ) ２ -, -C(O)O-, -C(O)S-, -C(O)N(R ｄ ) -, -N(R ｄ )C(O)N(R ｄ ) -, -N(R ｄ )C(O)O-,-SO ２ N (R ｄ )-, -C(O)N(R ｄ )-, an alkylene group having —OC(O)N(R ｄ an alkylene group having —C(O)O—, an alkylene group having —C(O)S—, an alkylene group having —N(R ｄ an alkylene group having —N(R ｄ )C(O)N(R ｄ )- or -SO ２ N (R ｄ )- is preferred, and an alkylene group having —C(O)O—, —C(O)N(R ｄ )-, an alkylene group having —OC(O)N(R ｄan alkylene group having —C(O)O—, an alkylene group having —C(O)S—, an alkylene group having —N(R ｄ an alkylene group having —N(R ｄ )C(O)N(R ｄ An alkylene group having —C(O)O— or —C(O)N(R ｄ An alkylene group having Q is more preferred. ａ represents a divalent hydrocarbon group, a divalent heterocyclic group, —SO ２ -, -C(O)-, -Si(R ａ ) ２ -, -C(O)O-, -C(O)S-, -C(O)N(R ｄ ) -, -SO ２ N (R ｄ )-, -C(O)N(R ｄ an alkylene group having —C(O)O—; an alkylene group having —SO ２ N (R ｄ )- or an alkylene group -Si(R ａ ) ２ -phenylene group -Si(R ａ ) ２ is preferred, and —C(O)— is more preferred. ａ and R ｄ The definition of is as described above.

[0063] In formula (3-1A), X ３１ is a single bond, an alkylene group, a nitrogen atom, a carbon atom, a silicon atom, a divalent to octavalent organopolysiloxane residue, or a group having a (h+i+1)-valent ring. The alkylene group may have -O-, a silphenylene skeleton group, a divalent organopolysiloxane residue, or a dialkylsilylene group. The alkylene group may have a plurality of groups selected from the group consisting of -O-, a silphenylene skeleton group, a divalent organopolysiloxane residue, and a dialkylsilylene group. X ３１The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 20, and more preferably 1 to 10. Examples of the divalent to octavalent organopolysiloxane residue include a divalent organopolysiloxane residue and a (w+1)-valent organopolysiloxane residue described below.

[0064] In formula (3-1A), X ３１ is a group having a (h+i+1)-valent ring, Q ａ , (-Q ｂ -Si(R) ｎ L ３－ｎ ) and R ３１ is directly bonded to an atom constituting the ring, provided that the ring is a ring other than an organopolysiloxane ring. ３１ The ring in may be any of a monocycle, a fused polycycle, a bridged ring, a spiro ring, and an aggregate polycycle, and the atoms constituting the ring may be a carbocycle consisting of only carbon atoms, or a heterocycle consisting of a heteroatom having a valence of divalent or higher and a carbon atom. The bond between the atoms constituting the ring may be a single bond or a multiple bond. Furthermore, the ring may be an aromatic ring or a non-aromatic ring. The monocycle is preferably a 4- to 8-membered ring, and more preferably a 5- or 6-membered ring. The fused polycycle is preferably a fused polycycle in which two or more 4- to 8-membered rings are fused, more preferably a fused polycycle in which two or three rings selected from 5- and 6-membered rings are bonded, and more preferably a fused polycycle in which one or two rings selected from 5- and 6-membered rings are bonded to one 4-membered ring. The bridged ring is preferably a bridged ring in which the largest ring is a 5- or 6-membered ring, and the spiro ring is preferably a spiro ring consisting of two 4- to 6-membered rings. The assembled polycyclic ring is preferably an assembled polycyclic ring in which two or three rings selected from five-membered rings and six-membered rings are bonded via a single bond, 1 to 3 carbon atoms, or one heteroatom having a valence of 2 or 3. In the assembled polycyclic ring, each ring is preferably bonded via a single bond, 1 to 3 carbon atoms, or one heteroatom having a valence of 2 or 3. ａ , (-Q ｂ -Si(R) ｎ L ３－ｎ ) and R ３１(when i = 1 or more) is preferably bonded. As heteroatoms constituting the ring, nitrogen atoms, oxygen atoms, and sulfur atoms are preferred, and nitrogen atoms and oxygen atoms are more preferred. The number of heteroatoms constituting the ring is preferably 3 or less. Furthermore, when the number of heteroatoms constituting the ring is 2 or more, the heteroatoms may be different.

[0065] X ３１ In terms of ease of production of the compound and further superior abrasion resistance of the surface treatment layer, the ring in X is preferably one selected from the group consisting of a 3- to 8-membered aliphatic ring, a benzene ring, a 3- to 8-membered heterocyclic ring, a fused ring formed by condensing two or three of these rings, a bridged ring with a 5- or 6-membered ring as the largest ring, and an assembled polycyclic ring having two or more of these rings and in which the linking group is a single bond, an alkylene group having 3 or less carbon atoms, an oxygen atom, or a sulfur atom. Preferred rings are a benzene ring, a 5- or 6-membered aliphatic ring, a 5- or 6-membered heterocyclic ring having a nitrogen atom or an oxygen atom, and a fused ring of a 5- or 6-membered carbocyclic ring with a 4- to 6-membered heterocyclic ring. ３１ Examples of the ring in the formula (I) include the rings shown below, as well as a 1,3-cyclohexadiene ring, a 1,4-cyclohexadiene ring, an anthracene ring, a cyclopropane ring, a decahydronaphthalene ring, a norbornene ring, a norbornadiene ring, a furan ring, a pyrrole ring, a thiophene ring, a pyrazine ring, a morpholine ring, an aziridine ring, an isoquinoline ring, an oxazole ring, an isoxazole ring, a thiazole ring, an imidazole ring, a pyrazole ring, a pyran ring, a pyridazine ring, a pyrimidine ring, and an indene ring. Rings having an oxo group (═O) are also shown below.

[0066]

[0067] X ３１ The bond that does not constitute the ring of the atom that constitutes the ring in ａ , (-Q ｂ -Si(R) ｎ L ３－ｎ ) or R ３１When there are remaining bonds, the remaining bonds are bonded to a hydrogen atom or a substituent. Examples of the substituent include a halogen atom, an alkyl group which may contain an etheric oxygen atom between carbon atoms, a cycloalkyl group, an alkenyl group, an allyl group, an alkoxy group, and an oxo group (=O). In addition, when one of the carbon atoms constituting the ring is bonded to Q ａ , (-Q ｂ -Si(R) ｎ L ３－ｎ ) or R ３１ When there are two bonds bonded to one of the carbon atoms, Q ａ and (-Q ｂ -Si(R) ｎ L ３－ｎ ) may be bonded to two (-Q ｂ -Si(R) ｎ L ３－ｎ ) may be bonded. ａ and (-Q ｂ -Si(R) ｎ L ３－ｎ ) or R ３１ It is preferable that h (-Q ｂ -Si(R) ｎ L ３－ｎ ) may be bonded to different ring-constituting atoms, and two of them may be bonded to one ring-constituting carbon atom, and two (-Q ｂ -Si(R) ｎ L ３－ｎ There may be two or more ring-constituting carbon atoms to which i R ３１ may be bonded to different ring-constituting atoms, two of which may be bonded to one ring-constituting carbon atom, and two R ３１ There may be two or more ring-constituting carbon atoms to which is bonded.

[0068] Among them, X ３１ From the viewpoint of improving the abrasion resistance of the surface treatment layer, is preferably a nitrogen atom, a carbon atom, a silicon atom, a tetravalent to octavalent organopolysiloxane residue, or a group having a (h+i+1)-valent ring, and more preferably a carbon atom.

[0069] In formula (3-1A), Qｂ is a single bond or a divalent linking group. The definition of a divalent linking group is the same as that of Q ａ This is the same as the definition explained in

[0070] Among them, Q ｂ is preferably an alkylene group which may have an etheric oxygen atom. The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10, 2 to 6, or 2 to 5. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10.

[0071] In formula (3-1A), R ３１ is a hydrogen atom, a hydroxyl group, or an alkyl group. The alkyl group may be linear, branched, or cyclic, but is preferably linear. The alkyl group preferably has 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms, and even more preferably 1 carbon atom.

[0072] X ３１ When X is a single bond or an alkylene group, h is 1 and i is 0; ３１ is a nitrogen atom, h is an integer of 1 to 2, i is an integer of 0 to 1, and h+i=2 is satisfied; ３１ is a carbon atom or a silicon atom, h is an integer of 1 to 3, i is an integer of 0 to 2, and h+i=3 is satisfied; ３１ When X is a divalent to octavalent organopolysiloxane residue, h is an integer of 1 to 7, i is an integer of 0 to 6, and h+i=1 to 7. ３１ is a group having a (h+i+1)-valent ring, h is an integer of 1 to 7, i is an integer of 0 to 6, and h+i=1 to 7 is satisfied. ｂ -Si(R) ｎ L ３－ｎ If there are two or more (-Q ｂ -Si(R) ｎ L ３－ｎ ) may be the same or different. ３１ If there are two or more, there are two or more (-R ３１ ) may be the same or different.

[0073] In particular, it is preferable that i is 0 from the viewpoint of improving the abrasion resistance of the surface treatment layer.

[0074] In formula (3-1A), Q ａ , X ３１ , and Q ｂ When is a single bond, [Si(R) ｎ L ３－ｎ ] is L ３ directly bonded to

[0075] In formula (3-1B), Q ｃ is a single bond or a divalent linking group. The definition of a divalent linking group is the same as that of Q ａ This is the same as the definition explained in

[0076] In formula (3-1B), R ３２ is a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and is preferably a hydrogen atom in view of ease of production of the compound. As the alkyl group, a methyl group is preferred.

[0077] In formula (3-1B), Q ｄ is a single bond or an alkylene group. The number of carbon atoms in the alkylene group is preferably 1 to 10, more preferably 1 to 6. From the viewpoint of ease of production of the compound, Q ｄ is a single bond or CH ２ It is preferable that −.

[0078] In formula (3-1B), R ３３ is a hydrogen atom or a halogen atom, and is preferably a hydrogen atom in view of ease of producing the compound.

[0079] y is an integer of 1 to 10, preferably an integer of 1 to 6. ２ C (R ３２ ) (-Q ｄ -Si(R) ｎ L ３－ｎ ) )] may be the same or different.

[0080] As the group (3-1A), groups (3-1A-1) to (3-1A-7) are preferred.

[0081] -(X ３２ ) ｓ１ -Qｂ１ -Si(R) ｎ L ３－ｎ (3-1A-1) -(X ３３ ) ｓ２ -Q ａ２ -N[-Q ｂ２ -Si(R) ｎ L ３－ｎ ] ２ (3-1A-2) -Q ａ３ -Si(R ｇ ) [-Q ｂ３ -Si(R) ｎ L ３－ｎ ] ２ (3-1A-3) -[Q ｅ ] ｓ４ -Q ａ４ -(O) ｔ４ -C[-(O) ｕ４ -Q ｂ４ -Si(R) ｎ L ３－ｎ ] ３－ｗ１ (-R ３１ ) ｗ１ (3-1A-4) -Q ａ５ -Si[-Q ｂ５ -Si(R) ｎ L ３－ｎ ] ３ (3-1A-5) -[Q ｅ ] ｖ -Q ａ６ -Z ａ [-Q ｂ６ -Si(R) ｎ L ３－ｎ ] ｗ２ (3-1A-6) -[Q ｅ ] ｓ４ -Q ａ４ -(O) ｔ４ -Z ｃ [-(O-Q ｂ４ ) ｕ４ -Si(R) ｎ L ３－ｎ ] ｗ３ (-OH) ｗ４ (3-1A-7) In the formulas (3-1A-1) to (3-1A-7), the definitions of R, L, and n are as described above.

[0082] Of these, the group (3-1A) is preferably the group (3-1A-1) or the group (3-1A-4), and the group (3-1A-4) is more preferred.

[0083] In the group (3-1A-1), X ３２ is -O-, -S-, -N(R ｄ )-, -C(O)-, -C(O)O-, -C(O)S-, -SO ２ N (R ｄ ) -, -N(R ｄ )C(O)N(R ｄ )-,-OC(O)N(R ｄ )-, or -C(O)N(R ｄ ) - (where N in the formula is Q ｂ１ (Binds to R ｄ The definition of is as described above. s1 is 0 or 1.

[0084] Among them, X ３２ is -O-, -S-, -N(R ｄ )-, -C(O)-, -C(O)O-, -C(O)S-, -SO ２ N (R ｄ ) -, -N(R ｄ )C(O)N(R ｄ )-,-OC(O)N(R ｄ )-, or -C(O)N(R ｄ )- is preferred, and —O—, —S—, —N(R ｄ )-, -C(O)O-, -C(O)S-, -N(R ｄ )C(O)N(R ｄ )-,-OC(O)N(R ｄ )-, or -C(O)N(R ｄ )- is more preferred, and -C(O)O- or -C(O)N(R ｄ )- is more preferred.

[0085] Q ｂ１is a single bond or an alkylene group. The alkylene group may have -O-, a silphenylene skeletal group, or a dialkylsilylene group. The alkylene group may have a plurality of groups selected from the group consisting of -O-, a silphenylene skeletal group, a divalent organopolysiloxane residue, and a dialkylsilylene group. When the alkylene group has -O-, a silphenylene skeletal group, a divalent organopolysiloxane residue, or a dialkylsilylene group, it is preferable that these groups be present between carbon atoms. Q ｂ１ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, still more preferably 2 to 20, and particularly preferably 2 to 6. The number of carbon atoms may also be 1 to 10.

[0086] Among them, s1 is preferably 1, and Q ｂ１ is preferably an alkylene group having 2 to 6 carbon atoms. In addition, s1 is preferably 0, and Q ｂ１ is preferably an alkylene group having 2 to 6 carbon atoms.

[0087] [-(X ３２ ) ｓ１ -Q ｂ１ -Si(R) ｎ L ３－ｎ In the following formula, * represents L ３ This is the bonding position with

[0088]

[0089]

[0090] In the group (3-1A-2), X ３３ is -O-, -S-, -N(R ｄ )-, -C(O)-, -C(O)O-, -C(O)S-, -SO ２ N (R ｄ ) -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ )-,-OC(O)N(R ｄ )-, or -C(O)N(R ｄ )-. R ｄThe definition of is as described above. s2 is 0 or 1. s2 is preferably 0 in view of ease of production of the compound.

[0091] Among them, X ３３ is -O-, -S-, -N(R ｄ )-, -C(O)-, -C(O)O-, -C(O)S-, -SO ２ N (R ｄ ) -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ )-,-OC(O)N(R ｄ )- or -C(O)N(R ｄ )- is preferred.

[0092] Q ａ２ represents a single bond, an alkylene group, -C(O)-, or an etheric oxygen atom, -C(O)-, -C(O)O-, -C(O)N(R ｄ ) -, -N(R ｄ )C(O)N(R ｄ ) -, -N(R ｄ )C(O)O-,-SO ２ N (R ｄ )-, -C(O)N(R ｄ )- or -NH-. ｄ The definition of is as described above. ａ２ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 20, more preferably 1 to 10, even more preferably 1 to 6, and particularly preferably 1 to 3. ａ２ an ether oxygen atom between carbon atoms of an alkylene group having two or more carbon atoms, represented by —C(O)—, —C(O)O—, —C(O)N(R ｄ ) -, -N(R ｄ )C(O)N(R ｄ ) -, -N(R ｄ )C(O)O-,-SO ２ N (R ｄ )-, -C(O)N(R ｄ The group having — or —NH— preferably has 2 to 10 carbon atoms, more preferably 2 to 6 carbon atoms.

[0093] Q ａ２is preferably a single bond in terms of ease of production of the compound.

[0094] Q ｂ２ is an alkylene group or a group having a divalent organopolysiloxane residue, an etheric oxygen atom, or —NH— between carbon atoms of an alkylene group having two or more carbon atoms. ｂ２ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. ｂ２ The number of carbon atoms in the divalent organopolysiloxane residue, the group having an etheric oxygen atom or an —NH— group between carbon atoms of the alkylene group having 2 or more carbon atoms, represented by the following formula (I), is preferably 2 to 10, and more preferably 2 to 6.

[0095] Q ｂ２ As the compound, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ OCH ２ CH ２ CH ２ - is preferred (where the right side is bonded to Si).

[0096] Two [-Q ｂ２ -Si(R) ｎ L ３－ｎ ] may be the same or different.

[0097] [-(X ３３ ) ｓ２ -Q ａ２ -N[-Q ｂ２ -Si(R) ｎ L ３－ｎ ] ２ In the following formula, * represents L ３ In addition, in the formula, the bond to the reactive silyl group (CH ２ ) αIn the formula, α is an integer representing the number of methylene groups, and is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20. It may be 2 to 10, or may be 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may be 1 to 10. Multiple α groups contained in the same compound may be the same or different, but are preferably the same. For example, multiple α groups contained in the same compound are all 2, 3, 8, 9, and 11. The same applies below.

[0098]

[0099]

[0100] In the group (3-1A-3), Q ａ３ is a single bond or an alkylene group which may have an etheric oxygen atom. ａ３ The alkylene group which may have an etheric oxygen atom preferably has 1 to 10 carbon atoms, more preferably 2 to 6 carbon atoms.

[0101] R ｇ is a hydrogen atom, a hydroxyl group, or an alkyl group. ｇ From the viewpoint of ease of production of the compound, a hydrogen atom or an alkyl group is preferred. The alkyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 4 carbon atoms, and further preferably is a methyl group.

[0102] Q ｂ３ is an alkylene group or a group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms of an alkylene group having two or more carbon atoms. ｂ３ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. Q ｂ３The number of carbon atoms in the group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms in the alkylene group having 2 or more carbon atoms, represented by the formula (I), is preferably 2 to 20, more preferably 2 to 10, and even more preferably 2 to 6. ｂ３ is preferably -CH ２ CH ２ -, -CH ２ CH ２ CH ２ - or -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ - is preferred.

[0103] Two [-Q ｂ３ -Si(R) ｎ L ３－ｎ ] may be the same or different.

[0104] Examples of the group (3-1A-3) include the following groups: ３ This is the bonding position with

[0105]

[0106]

[0107] In the group (3-1A-4), Q ｅ is -C(O)O-, -SO ２ N (R ｄ ) - or -N(R ｄ )C(O)-. ３１ The definition of is as described above. When w1 is 1 or 2, R ３１ is preferably a hydrogen atom. s4 is 0 or 1. Q ａ４ is a single bond or an alkylene group which may have an etheric oxygen atom. The number of carbon atoms in the alkylene group which may have an etheric oxygen atom is preferably 1 to 20, more preferably 1 to 10, still more preferably 1 to 6, and particularly preferably 1 to 3. t4 is 0 or 1 (provided that Q ａ４If -Q is a single bond, it is 0. ａ４ -(O) ｔ４ When s4 is 0, a single bond or —CH ２ O-, -CH ２ OCH ２ -, -CH ２ OCH ２ CH ２ O-, -CH ２ OCH ２ CH ２ OCH ２ - or -CH ２ OCH ２ CH ２ CH ２ CH ２ OCH ２ - is preferred (however, the left side is (XO) ｍ When s4 is 1, it is a single bond, -CH ２ - or -CH ２ CH ２ - is preferred. ａ４ -(O) ｔ４ When s4 is 0, -(CH ２ ) β It is also preferable that β is an integer representing the number of methylene groups, and the preferred range is as described below.

[0108] Q ｂ４ is an alkylene group, and the alkylene group is —O—, —C(O)N(R ｄ )-(R ｄ The definition of is as described above. ), may have a silphenylene skeleton group, a divalent organopolysiloxane residue, or a dialkylsilylene group. When the alkylene group has -O- or a silphenylene skeleton group, it is preferable that the alkylene group has -O- or a silphenylene skeleton group between carbon atoms. In addition, when the alkylene group is -C(O)N(R ｄ )-, dialkylsilylene group or divalent organopolysiloxane residue, carbon atom-carbon atom or (O) ｕ４ It is preferable that these groups are present at the end of the bond with Q. ｂ４The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 11 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 11.

[0109] u4 is 0 or 1. -(O) ｕ４ -Q ｂ４ As the -, -CH is preferred from the viewpoint of ease of production of the compound. ２ CH ２ -, -CH ２ CH ２ CH ２ -, -(CH ２ ) ｂ -, -CH ２ OCH ２ CH ２ CH ２ -, -CH ２ OCH ２ CH ２ CH ２ CH ２ CH ２ -, -OCH ２ CH ２ CH ２ -, -OSi(CH ３ ) ２ CH ２ CH ２ CH ２ -, -OSi(CH ３ ) ２ OSi(CH ３ ) ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ Si(CH ３ ) ２ PhSi(CH ３ ) ２ CH ２ CH ２ - is preferred (where the right side is bonded to Si). b is an integer of 4 to 11.

[0110] w1 is an integer of 0 to 2, preferably 0 or 1, and more preferably 0. [-(O) ｕ４ -Q ｂ４-Si(R) ｎ L ３－ｎ If there are two or more [-(O) ｕ４ -Q ｂ４ -Si(R) ｎ L ３－ｎ ] may be the same or different. ３１ If there are two or more, there are two or more (-R ３１ ) may be the same or different.

[0111] [-[Q in group (3-1A-4)] ｅ ] ｓ４ -Q ａ４ -(O) ｔ４ -C[-(O) ｕ４ -Q ｂ４ -Si(R) ｎ L ３－ｎ ] ３－ｗ１ (-R ３１ ) ｗ１ In the following formula, * represents L ３ In addition, in the formula, (CH ２ ) β In the formula, β is an integer representing the number of methylene groups, and is preferably 1 to 40, more preferably 2 to 30, even more preferably 4 to 25, and particularly preferably 10 to 22.

[0112]

[0113]

[0114]

[0115] In the group (3-1A-5), Q ａ５ is an alkylene group which may have an etheric oxygen atom. The alkylene group which may have an etheric oxygen atom preferably has 1 to 10 carbon atoms, and particularly preferably has 2 to 6 carbon atoms. ａ５ As the compound, -OCH ２ CH ２ CH ２ -, -OCH ２ CH ２ OCH ２ CH ２ CH ２-, -CH ２ CH ２ - or -CH ２ CH ２ CH ２ - is preferred (where the right side is bonded to Si).

[0116] Q ｂ５ is an alkylene group or a group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms of an alkylene group having two or more carbon atoms. ｂ５ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. Q ｂ５ The number of carbon atoms in the group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms in the alkylene group having 2 or more carbon atoms, represented by the formula (I), is preferably 2 to 20, more preferably 2 to 10, and even more preferably 2 to 6. ｂ５ As the compound, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ OCH ２ CH ２ CH ２ - is preferred (however, the right side is Si(R) ｎ L ３－ｎ Bind to. ).

[0117] Three [-Q ｂ５ -Si(R) ｎ L ３－ｎ ] may be the same or different.

[0118] [-Q in group (3-1A-5)] ａ５ -Si[-Q ｂ５ -Si(R) ｎ L ３－ｎ ] ３ In the following formula, * represents L ３ This is the bonding position with

[0119]

[0120]

[0121] Q in group (3-1A-6) ｅ is as defined in the above group (3-1A-4). v is 0 or 1.

[0122] Q ａ６ is an alkylene group which may have an etheric oxygen atom. The alkylene group which may have an etheric oxygen atom preferably has 1 to 10 carbon atoms, and particularly preferably has 2 to 6 carbon atoms. ａ６ As the compound, -CH ２ OCH ２ CH ２ CH ２ -, -CH ２ OCH ２ CH ２ OCH ２ CH ２ CH ２ -, -CH ２ CH ２ - or -CH ２ CH ２ CH ２ - is preferred (however, the right side is Z ａ Bind to. ).

[0123] Z ａ is a (w2+1)-valent organopolysiloxane residue, or a (w2+1)-valent group having an alkylene group between the organopolysiloxane residues. w2 is an integer of 2 to 7. Examples of the (w2+1)-valent organopolysiloxane residue and the (w2+1)-valent group having an alkylene group between the organopolysiloxane residues include the following groups. However, R in the following formula ａ is as described above. * is the bond position.

[0124]

[0125] Q ｂ６is an alkylene group or a group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms of an alkylene group having two or more carbon atoms. ｂ６ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. Q ｂ６ The number of carbon atoms in the group having an etheric oxygen atom or a divalent organopolysiloxane residue between carbon atoms in the alkylene group having 2 or more carbon atoms, represented by the formula (I), is preferably 2 to 20, more preferably 2 to 10, and even more preferably 2 to 6. ｂ６ As the compound, -CH ２ CH ２ -, -CH ２ CH ２ CH ２ - is preferred. w2 [-Q ｂ６ -Si(R) ｎ L ３－ｎ ] may be the same or different.

[0126] [-[Q in group (3-1A-6)] ｅ ] ｖ -Q ａ６ -Z ａ [-Q ｂ６ -Si(R) ｎ L ３－ｎ ] ｗ２ In the following formula, * represents L ３ This is the bonding position with

[0127]

[0128] In the group (3-1A-7), Z ｃ is a hydrocarbon group having a valence of (w3+w4+1). w3 is an integer of 4 or more. w4 is an integer of 0 or more. Q ｅ , s4, Q ａ４ , t4, Q ｂ４ The definitions and preferred ranges of u4 and u5 are the same as those of the respective symbols in group (3-1A-4).

[0129] Z ｃ may be composed of a hydrocarbon chain, and may have an etheric oxygen atom between carbon atoms in the hydrocarbon chain, and is preferably composed of a hydrocarbon chain. ｃ The valence of Z is preferably from 5 to 20, more preferably from 5 to 10, still more preferably from 5 to 8, and particularly preferably from 5 to 6. ｃ The number of carbon atoms in [-(O-Q ｂ４ ) ｕ４ -Si(R) ｎ L ３－ｎ If there are two or more [-(O-Q ｂ４ ) ｕ４ -Si(R) ｎ L ３－ｎ ] may be the same or different.

[0130] Examples of the group (3-1A-7) include the following groups: ３ This is the bonding position with

[0131]

[0132] A in formula (1) may be a group (g2-1) (where d1+d3=1, q=d2+d4), a group (g2-2) (where q=e2), a group (g2-3) (where q=2), a group (g2-4) (where q=h2), a group (g2-5) (where q=i2), a group (g2-6) (where q=1), or a group (g2-7) (where q=1+i3). Of these, A is preferably a group (g2-2).

[0133]

[0134] -A １ -Q １２ -C(R ｅ２ ) ３－ｅ２ (-Q２２ -) ｅ２ ... (g2-2) -A １ -Q １３ -N(-Q ２３ -) ２ ... (g2-3) -A １ -Q １４ -Z １ (-Q ２４ -) ｈ２ ... (g2-4) -A １ -Q １５ -Si(R ｅ３ ) ３－ｉ２ (-Q ２５ -) ｉ２ ... (g2-5) -A １ -Q ２６ -...(g2-6) -A １ -Q １２ -CH(-Q ２２ -)-Si(R ｅ３ ) ３－ｉ３ (-Q ２５ -) ｉ３ …(g2-7)

[0135] However, in formulas (g2-1) to (g2-7), A １ Side is L ３ and Q ２２ , Q ２３ , Q ２４ , Q ２５ or Q ２６ The side is [-Si(R) ｎ L ３－ｎ ]. １ represents a single bond, -C(O)NR ６ -, -C(O)-, -OC(O)O-, -NHC(O)O-, -NHC(O)NR ６ -, -O- or SO ２ NR ６ - is. １１ represents a single bond, —O—, an alkylene group, or —C(O)NR between carbon atoms of an alkylene group having two or more carbon atoms. ６ -, -C(O)-, -NR ６ - or O- containing group. １２ represents a single bond, an alkylene group, or an alkylene group having two or more carbon atoms with —C(O)NR between carbon atoms. ６-, -C(O)-, -NR ６ - or -O-, and A is Q １２ If there are two or more, there are two or more Q １２ may be the same or different. １３ is a single bond (where A １ is —C(O)—), an alkylene group, an alkylene group having 2 or more carbon atoms having —C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６ - or -O-, or a group having -C(O)- at the N-terminal of the alkylene group. １４ Is, Q １４ Z to which １ If the atom in is a carbon atom, Q １２ and Q １４ Z to which １ When the atom in is a nitrogen atom, Q １３ and A ２ GaQ １４ If there are two or more, there are two or more Q １４ may be the same or different. １５ represents an alkylene group or an alkylene group having two or more carbon atoms with —C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６ - or -O-, and A is Q １５ If there are two or more, there are two or more Q １５ may be the same or different. ２２ represents an alkylene group, an alkylene group having 2 or more carbon atoms, and a —C(O)NR group between carbon atoms. ６ -, -C(O)-, -NR ６ a group having - or -O-, and -C(O)NR at the end of the alkylene group not connected to Si; ６ -, -C(O)-, -NR ６ or a group having —O—, or an alkylene group having 2 or more carbon atoms, wherein —C(O)NR ６ -, -C(O)-, -NR ６ - or -O- and -C(O)NR at the end not connected to Si ６ -, -C(O)-, -NR ６- or -O-, and A is Q ２２ If there are two or more, there are two or more Q ２２ may be the same or different. ２３ represents an alkylene group or an alkylene group having two or more carbon atoms with —C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６ - or O-, and two Q ２３ may be the same or different. ２４ Is, Q ２４ Z to which １ If the atom in is a carbon atom, Q ２２ and Q ２４ Z to which １ When the atom in is a nitrogen atom, Q ２３ and A is Q ２４ If there are two or more, there are two or more Q ２４ may be the same or different. ２５ represents an alkylene group or an alkylene group having two or more carbon atoms with —C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６ - or -O-, and A is Q ２５ If there are two or more, there are two or more Q ２５ may be the same or different. ２６ represents an alkylene group or an alkylene group having two or more carbon atoms with —C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６ - or -O-. ２２ , Q ２３ , Q ２４ , Q ２５ , Q ２６ When Z is an alkylene group, it preferably has 1 to 20 carbon atoms, more preferably 1 to 10 carbon atoms, and even more preferably 1 to 6 carbon atoms. １ Is, Q １４ has a carbon atom or a nitrogen atom to which Q is directly bonded, and ２４ is a group having a (1+h2)-valent ring structure having a carbon atom or nitrogen atom to which R is directly bonded. ｅ１ is a hydrogen atom or an alkyl group, and two or more R ｅ１may be the same or different. ｅ２ is a hydrogen atom, a hydroxyl group, an alkyl group, or an acyloxy group. ｅ３ is an alkyl group. ６ is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group.

[0136] d1 is 0 or 1. d3 is 0 or 1. d1+d3 is 1. d2 is an integer from 0 to 3. d4 is an integer from 0 to 3. d2+d4 is an integer from 1 to 5. d1+d2 is an integer from 1 to 3. d3+d4 is an integer from 1 to 3. e2 is an integer from 1 to 3, preferably 2 or 3. h2 is an integer of 1 or more, preferably 2 or 3. i2 is an integer from 1 to 3, preferably 2 or 3. i3 is 2 or 3.

[0137] Q １１ , Q １２ , Q １３ , Q １４ , Q １５ , Q ２２ , Q ２３ , Q ２４ , Q ２５ and Q ２６ The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, from the viewpoints of ease of production of the compound and further superior abrasion resistance of the surface treatment layer, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10, 1 to 6, or 1 to 4. However, when a specific bond is present between carbon atoms, the lower limit of the number of carbon atoms in the alkylene group is 2.

[0138] Z １ Examples of the ring structure in Z include the ring structures described above, and the preferred embodiments are also the same. １ The ring structure in １４ YaQ ２４ is directly bonded to the ring structure, for example, an alkylene group is linked to the alkylene group, and Q １４ YaQ ２４ are never connected.

[0139] R ｅ１ , R ｅ２ or R ｅ３ The number of carbon atoms in the alkyl group of R is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2, from the viewpoint of ease of production of the compound. ｅ２ From the viewpoint of ease of production of the compound, the number of carbon atoms in the alkyl group portion of the acyloxy group is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2. h2 is preferably 2 to 6, more preferably 2 to 4, and even more preferably 2 or 3, from the viewpoint of ease of production of the compound and further improved abrasion resistance of the surface treatment layer.

[0140] Other forms of A include a group (g2-8) (where d1 + d3 = 1, q = d2 × k3 + d4 × k3), a group (g2-9) (where q = e2 × k3), a group (g2-10) (where q = 2 × k3), a group (g2-11) (where q = h2 × k3), a group (g2-12) (where q = i2 × k3), a group (g2-13) (where q = k3), and a group (g2-14) (where q = i3 × k3 + k3).

[0141]

[0142] -A １ -Q １２ -C(R ｅ２ ) ３－ｅ２ (-Q ２２ -G １ ) ｅ２ ... (g2-9) -A １ -Q １３ -N(-Q ２３ -G １ ) ２ ...(g2-10) -A １ -Q １４ -Z １ (-Q ２４ -G １ ) ｈ２ ...(g2-11) -A １ -Q １５ -Si(R ｅ３ ) ３－ｉ２ (-Q ２５ -G １ )ｉ２ ...(g2-12) -A １ -Q ２６ -G １ ...(g2-13) -A １ -Q １２ -CH(-Q ２２ -G １ )-Si(R ｅ３ ) ３－ｉ３ (-Q ２５ -G １ ) ｉ３ …(g2-14)

[0143] However, in formulas (g2-9) to (g2-14), A １ Side is L ３ and binds to G １ The side is [-Si(R) ｎ L ３－ｎ ] and combine.

[0144] G １ is the following group (g3), and A has two or more G １ may be the same or different. １ The symbols other than are the same as those in formulas (g2-1) to (g2-7). ８ ) ３－ｋ３ (-Q ３ -) ｋ３ ...(g3) In the group (g3), the Si side is Q ２２ , Q ２３ , Q ２４ , Q ２５ and Q ２６ Connect to Q ３ The side is [-Si(R) ｎ L ３－ｎ ]. ８ is an alkyl group. ３ represents an alkylene group, an alkylene group having 2 or more carbon atoms, and a —C(O)NR group between carbon atoms. ６ -, -C(O)-, -NR ６ - or -O- containing group, or (OSi(R ９ ) ２ ) ｐ -O-, and two or more Q ３ may be the same or different. k3 is 2 or 3. R ６is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group. ９ is an alkyl group, a phenyl group, or an alkoxy group, and two R ９ may be the same or different. p is an integer of 0 to 5, and when p is 2 or more, there are two or more (OSi(R ９ ) ２ ) may be the same or different.

[0145] Q ３ The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, from the viewpoint of ease of production of the compound and further superior abrasion resistance of the surface treatment layer, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may be 1 to 10, 1 to 6, or 1 to 4. However, when there is a specific bond between carbon atoms, the lower limit of the number of carbon atoms in the alkylene group is 2. R ８ The number of carbon atoms in the alkyl group of R is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2, from the viewpoint of ease of production of the compound. ９ The number of carbon atoms in the alkyl group of R is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2, from the viewpoint of ease of production of the compound. ９ In view of excellent storage stability of the compound, the number of carbon atoms in the alkoxy group is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2. p is preferably 0 or 1.

[0146] Examples of the compound of the present disclosure include compounds of the following formula: The compound of the following formula is preferred because it is easy to produce industrially, easy to handle, and provides a surface treatment layer with even better water repellency and abrasion resistance. ｔ is the above-mentioned {T-L １ -(Si(R ２ ) ２ -O) ｍ -Si(R ２ ) ２ -L ２} ｐ -L ３ - and the preferred embodiments are also the same.

[0147] Examples of compounds in which A in formula (1) is group (g2-1) include compounds of the following formula:

[0148]

[0149] Examples of compounds in which A in formula (1) is group (g2-2) include compounds of the following formula: In the following formula, Ak represents an alkyl group (for example, an alkyl group having 1 to 15 carbon atoms).

[0150]

[0151]

[0152] Examples of compounds in which A in formula (1) is group (g2-3) include compounds of the following formulae.

[0153]

[0154] Examples of compounds in which A in formula (1) is group (g2-4) include compounds of the following formulae.

[0155]

[0156] Examples of compounds in which A in formula (1) is group (g2-5) include compounds of the following formulae.

[0157]

[0158] Examples of compounds in which A in formula (1) is group (g2-6) include compounds of the following formulae.

[0159]

[0160] Examples of compounds in which A in formula (1) is group (g2-7) include compounds of the following formulae.

[0161]

[0162] Examples of compounds in which A in formula (1) is group (g2-8) include compounds of the following formulae.

[0163]

[0164] Examples of compounds in which A in formula (1) is group (g2-9) include compounds of the following formulae.

[0165]

[0166] Examples of compounds in which A in formula (1) is group (g2-10) include compounds of the following formulae.

[0167]

[0168]

[0169] Examples of compounds in which A in formula (1) is group (g2-11) include compounds of the following formulae.

[0170]

[0171] Examples of compounds in which A in formula (1) is group (g2-12) include compounds of the following formulae.

[0172]

[0173] Examples of compounds in which A in formula (1) is group (g2-13) include compounds of the following formulae.

[0174]

[0175] Examples of compounds in which A in formula (1) is group (g2-14) include compounds of the following formulae.

[0176]

[0177] X is -L ４ - (L ５ -Si(R) ｎ L ３－ｎ ) ｑ wherein R, L, n, and q are as defined above.

[0178] L ４ is a (p+q)-valent aromatic ring group or alicyclic group. ４ Specific examples of the aromatic ring in the (p+q)-valent aromatic ring group in ３ The same applies to the (p+1)-valent aromatic ring group in L. ４The aromatic ring in the (p+q)-valent aromatic ring group in the formula (I) may or may not have a substituent. The number and specific examples of the substituents are as follows: ３ The substituents are the same as those of the (p+1)-valent aromatic ring group in L. ４ Specific examples of the ring constituting the (p+q)-valent alicyclic group in ３ The same applies to the (p+1)-valent alicyclic group in L. ４ The ring constituting the (p+q)-valent alicyclic group in the formula (I) may or may not have a substituent. The number and specific examples of the substituents are as follows: ３ The substituents are the same as those of the (p+1)-valent alicyclic group in the above formula (I).

[0179] L ５ is a single bond or a divalent linking group. ５ The definition of the divalent linking group in ａ This is the same as the definition explained in

[0180] Examples of compounds represented by formula (1) include the following compounds: In the following formula, Me represents a methyl group, and m representing the number of repeating units is defined as above.

[0181]

[0182]

[0183]

[0184]

[0185] The number average molecular weight (Mn) of the compound of the present disclosure is preferably 500 to 20,000, more preferably 600 to 18,000, and even more preferably 700 to 15,000. When Mn is 500 or more, the abrasion resistance of the surface treatment layer is superior. When Mn is 20,000 or less, the viscosity can be easily adjusted within an appropriate range and solubility is improved, resulting in excellent handleability during film formation.

[0186] <Compound Represented by Formula (1-1)> An example of a suitable embodiment of the compound represented by formula (1) is a compound represented by formula (1-1). When the compound represented by formula (1-1) is used, the effects of the present invention are more excellent.

[0187] {(R １ ) ３ Si-L １ -(Si(R ２ ) ２ -O) ｍ -Si(R ２ ) ２ -L ６} ｐ -C(R ４ ) ３－ｐ -A-(Si(R) ｎ L ３－ｎ ) ｑ (1-1) R １ are each independently a hydrocarbon group or a trialkylsilyloxy group, and L １ is —O— or an alkylene group, R ２ are each independently a hydrocarbon group; ６ is an alkylene group, R ４ are each independently a hydrogen atom or a hydrocarbon group, A is a (q+1)-valent linking group, R is each independently a hydrocarbon group, L is each independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, m is a number of 1 or more, n is an integer from 0 to 2, p is 2 or 3, and q is an integer of 1 or more.

[0188] In formula (1-1), R １ , L １ , R ２ , R ４ The definitions of A, R, L, m, n, p, and q are the same as those of the groups with the same symbols described in formula (1). ６ The alkylene group represented by is L in formula (1). ２ The alkylene group is the same as that in the above.

[0189] <Compound Represented by Formula (1-2)> An example of a suitable embodiment of the compound represented by formula (1) is a compound represented by formula (1-2). When the compound represented by formula (1-2) is used, the effects of the present invention are more excellent.

[0190] {(R １ ) ３ Si-L １ -(Si(R ２ ) ２ -O) ｍ -Si(R ２ ) ２ -L ７} ｐ -Si(R ５ ) ３－ｐ -A-(Si(R) ｎ L ３－ｎ ) ｑ (1-2) R １ are each independently a hydrocarbon group or a trialkylsilyloxy group, and L １ is —O— or an alkylene group, R ２ are each independently a hydrocarbon group; ７ is —O—, and R ５ are each independently a hydrogen atom or a hydrocarbon group, A is a (q+1)-valent linking group, R is each independently a hydrocarbon group, L is each independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, m is a number of 1 or more, n is an integer from 0 to 2, p is 2 or 3, and q is an integer of 1 or more.

[0191] In formula (1-2), R １ , L １ , R ２ , R ５ , A, R, L, m, n, p, and q are all defined as the same as the groups with the same symbols described in formula (1).

[0192] [Composition] The composition of the present disclosure may contain the compound of the present disclosure, and components other than the compound of the present disclosure are not particularly limited. The composition of the present disclosure preferably contains the compound of the present disclosure and a liquid medium. When a liquid medium is contained, the composition of the present disclosure may be in a liquid state, and may be a solution or a dispersion. The composition of the present disclosure may contain the compound of the present disclosure, and may contain impurities such as by-products produced in the manufacturing process of the compound of the present disclosure.

[0193] The content of the compound of the present disclosure is preferably 0.001 to 40% by mass, more preferably 0.01 to 20% by mass, and even more preferably 0.1 to 10% by mass, relative to the total amount of the composition of the present disclosure. In the case of a composition of the present disclosure used in a wet coating method, the content of the compound of the present disclosure is preferably 0.01 to 10% by mass, more preferably 0.02 to 5% by mass, even more preferably 0.03 to 3% by mass, and particularly preferably 0.05 to 2% by mass, relative to the total amount of the composition of the present disclosure. The composition of the present disclosure may contain only one type of liquid medium, or two or more types.

[0194] The liquid medium is preferably an organic solvent.

[0195] Examples of organic solvents include compounds consisting of only hydrogen atoms and carbon atoms, and compounds consisting of only hydrogen atoms, carbon atoms, and oxygen atoms, and specific examples include hydrocarbon organic solvents, ketone organic solvents, ether organic solvents, ester organic solvents, glycol organic solvents, and alcohol organic solvents. Among these, the organic solvent is preferably a hydrocarbon organic solvent or an ester organic solvent.

[0196] Specific examples of hydrocarbon organic solvents include pentane, hexane, heptane, octane, hexadecane, isohexane, isooctane, isononane, cycloheptane, cyclohexane, bicyclohexyl, benzene, toluene, ethylbenzene, o-xylene, m-xylene, p-xylene, o-diethylbenzene, m-diethylbenzene, p-diethylbenzene, n-butylbenzene, sec-butylbenzene, and tert-butylbenzene. Specific examples of ketone organic solvents include acetone, methyl ethyl ketone, methyl isobutyl ketone, diisobutyl ketone, cyclohexanone, 2-heptanone, 4-heptanone, 3,5,5-trimethyl-2-cyclohexen-1-one, 3,3,5-trimethylcyclohexanone, and isophorone. Specific examples of ether organic solvents include diethyl ether, cyclopentyl methyl ether, tetrahydrofuran, and 1,4-dioxane.Specific examples of the ester-based organic solvent include methyl acetate, ethyl acetate, propyl acetate, isopropyl acetate, butyl acetate, isobutyl acetate, tert-butyl acetate, amyl acetate, isoamyl acetate, ethyl 3-ethoxypropionate, ethyl lactate, ethylene glycol monobutyl ether acetate, diethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, dipropylene glycol methyl ether acetate, 3-methoxy-3-methylbutyl acetate, 3-methoxybutyl acetate, propylene glycol monomethyl acetate, propylene glycol dimethyl acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether ether acetate, cyclohexanol acetate, propylene glycol diacetate, propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether propionate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, propylene glycol monopropyl ether acetate, propylene glycol diacetate, dipropylene glycol methyl ether acetate, 1,3-butylene glycol diacetate, 1,4-butanediol diacetate, 1,3-butylene glycol diacetate, 1,6-hexanediol diacetate, γ-butyrolactone, triacetin, and 2,2,4-trimethyl-1,3-pentanediol monoisobutyrate.Specific examples of glycol-based organic solvents include ethylene glycol, ethylene glycol monobutyl ether, diethylene glycol monobutyl ether, triethylene glycol monobutyl ether, tetraethylene glycol monobutyl ether, ethylene glycol monohexyl ether, diethylene glycol monohexyl ether, ethylene glycol mono-2-ethylhexyl ether, diethylene glycol mono-2-ethylhexyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monopropyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-tert-butyl ether, ethylene glycol monopropyl ether, ethylene glycol monomethyl ether, diethylene glycol monoisopropyl ether, diethylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monobutyl ether, and dipropylene glycol. Examples of the glycol monopropyl ether include glycol monopropyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monobutyl ether, tripropylene glycol monomethyl ether, propylene glycol monophenyl ether, 1,3-butylene glycol, propylene glycol n-propyl ether, propylene glycol n-butyl ether, diethylene glycol monoethyl ether, dipropylene glycol n-propyl ether, dipropylene glycol n-butyl ether, tripropylene glycol methyl ether, tripropylene glycol n-butyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, dipropylene glycol dimethyl ether, diethylene glycol dibutyl ether, tetraethylene glycol dimethyl ether, dipropylene glycol dimethyl ether pentane, triethylene glycol dimethyl ether, and polyethylene glycol dimethyl ether.Specific examples of alcohol-based organic solvents include methanol, ethanol, 1-propanol, isopropyl alcohol, n-butanol, diacetone alcohol, isobutanol, sec-butanol, tert-butanol, pentanol, 3-methyl-1,3-butanediol, 1,3-butanediol, 1,3-butylene glycol, octanediol, 2,4-diethylpentanediol, butylethylpropanediol, 2-methyl-1,3-propanediol, 4-hydroxy-4-methyl-2-pentanone, 2-ethyl-1-hexanol, 3,5,5-trimethyl-1-hexanol, isodecanol, isotridecanol, 3-methoxy-3-methyl-1-butanol, 2-methoxybutanol, 3-methoxybutanol, cyclohexanol, furfuryl alcohol, tetrahydrofurfuryl alcohol, benzyl alcohol, and methylcyclohexanol.

[0197] In addition, examples of the organic solvent include halogen-based organic solvents, fluorine-containing organic solvents, nitrogen-containing compounds, sulfur-containing compounds, and siloxane compounds other than the compounds of the present disclosure.

[0198] Specific examples of halogen-containing organic solvents include dichloromethane, chloroform, carbon tetrachloride, dichloroethane, chlorobenzene, o-chlorotoluene, m-chlorotoluene, p-chlorotoluene, m-dichlorobenzene, and 1,2,3-trichloropropane. Specific examples of fluorine-containing organic solvents include polyfluoroaromatic hydrocarbons (e.g., 1,3-bis(trifluoromethyl)benzene); polyfluoroaliphatic hydrocarbons (e.g., C ６ F １３ CH ２ CH ３ (e.g., Asahiklin (registered trademark) AC-6000 manufactured by AGC Corporation), 1,1,2,2,3,3,4-heptafluorocyclopentane (e.g., Zeorora (registered trademark) H manufactured by Nippon Zeon Co., Ltd.); hydrofluoroethers (HFEs) (e.g., perfluoropropyl methyl ether (C ３ F ７ OCH ３) (e.g., Novec™ 7000 manufactured by Sumitomo 3M Co.), perfluorobutyl methyl ether (C ４ F ９ OCH ３ ) (e.g., Novec (trademark) 7100 manufactured by Sumitomo 3M Co.), perfluorobutyl ethyl ether (C ４ F ９ O.C. ２ H ５ ) (e.g., Novec™ 7200 manufactured by Sumitomo 3M Co.), perfluorohexyl methyl ether (C ２ F ５ CF (OCH ３ ) C ３ F ７ ) (e.g., Novec™ 7300 manufactured by Sumitomo 3M Co.), where the perfluoroalkyl group and the alkyl group may be linear or branched, and CF ３ CH ２ OCF ２ CHF ２ (e.g., Asahiklin (registered trademark) AE-3000 manufactured by AGC Corporation); hydrofluoroolefins (HFOs) (e.g., 1-chloro-2,3,3-trifluoro-1-propene (HCFO-1233yd) (e.g., Amorea (registered trademark) AS-300 manufactured by AGC Corporation)). Examples of nitrogen-containing compounds include nitrobenzene, acetonitrile, benzonitrile, N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, and 1,3-dimethyl-2-imidazolidinone. Examples of sulfur-containing compounds include carbon disulfide and dimethyl sulfoxide. Examples of siloxane compounds other than the compounds of the present disclosure include hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, octaethyltrisiloxane, hexamethylcyclotrisiloxane, hexaethylcyclotrisiloxane, octamethylcyclotetrasiloxane, octaethylcyclotetrasiloxane, and decamethyltetrasiloxane.

[0199] The content of the liquid medium is preferably 60 to 99.999 mass%, more preferably 80 to 99.99 mass%, and even more preferably 90 to 99.9 mass%, based on the total amount of the composition of the present disclosure. In the case of a composition of the present disclosure used in a wet coating method, the content of the liquid medium is preferably 90 to 99.99 mass%, more preferably 95 to 99.98 mass%, even more preferably 97 to 99.97 mass%, and particularly preferably 98 to 99.95 mass%, based on the total amount of the composition of the present disclosure.

[0200] The composition of the present disclosure may contain other components in addition to the compound and liquid medium of the present disclosure, as long as the effects of the present disclosure are not impaired. Examples of other components include additives, and specific examples include catalysts such as acid catalysts and base catalysts that promote the hydrolysis and condensation reaction of reactive silyl groups.

[0201] Examples of the catalyst that can be used include any appropriate acid or base, transition metals (e.g., Ti, Ni, Sn, Zr, Al, B, etc.), sulfur-containing compounds having an unshared electron pair in their molecular structure, and nitrogen-containing compounds (e.g., sulfoxide compounds, aliphatic amine compounds, aromatic amine compounds, phosphoric acid amide compounds, amide compounds, and urea compounds). Examples of acid catalysts include acetic acid, formic acid, trifluoroacetic acid, hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid, and p-toluenesulfonic acid. Examples of base catalysts include ammonia, sodium hydroxide, potassium hydroxide, and organic amines such as triethylamine and diethylamine.

[0202] Other components also include metal compounds having a hydrolyzable group (hereinafter also referred to as "specific metal compounds"). When the composition of the present disclosure contains a specific metal compound, the slip properties and antifouling properties of the surface treatment layer can be further improved. Examples of the specific metal compounds include metal compounds represented by any of formulas (M1) to (M3).

[0203] M (X ｂ１ ) ｍ１ (X ｂ２ ) ｍ２ (X ｂ３ ) ｍ３ ... (M1) Si (X ｂ４ ) (Xｂ５ ) ３ ... (M2) (X ｂ６ ) ３ Si-(Y ｂ１ )-Si(X ｂ７ ) ３ …(M3)

[0204] In formula (M1), M is a trivalent or tetravalent metal atom, and X ｂ１ are each independently a hydrolyzable group, ｂ２ are each independently a siloxane skeleton-containing group, ｂ３ are each independently a hydrocarbon chain-containing group, m1 is an integer of 2 to 4, m2 and m3 are each independently an integer of 0 to 2, and when M is a trivalent metal atom, m1 + m2 + m3 is 3, and when M is a tetravalent metal atom, m1 + m2 + m3 is 4.

[0205] In formula (M2), X ｂ４ is a hydrolyzable silane oligomer residue, and X ｂ５ are each independently a hydrolyzable group or an alkyl group having 1 to 4 carbon atoms.

[0206] In formula (M3), X ｂ６ and X ｂ７ are each independently a hydrolyzable group or a hydroxyl group, and Y ｂ１ is a divalent organic group.

[0207] In formula (M1), the metal represented by M also includes semimetals such as Si and Ge. M is preferably a trivalent metal or a tetravalent metal, more preferably Al, Fe, In, Hf, Si, Ti, Sn, or Zr, still more preferably Al, Si, Ti, or Zr, and particularly preferably Si.

[0208] In formula (M1), X ｂ１ The hydrolyzable group represented by the formula (1-1) has the same meaning as the hydrolyzable group represented by L in the formula (1-1), and the preferred embodiments are also the same.

[0209] X ｂ２The siloxane skeleton-containing group represented by the formula (I) has a siloxane unit (—Si—O—) and may be either linear or branched. Examples of the siloxane unit include a dialkylsilyloxy group, such as a dimethylsilyloxy group or a diethylsilyloxy group. The number of repeating siloxane units in the siloxane skeleton-containing group is 1 or more, preferably 1 to 5, more preferably 1 to 4, and even more preferably 1 to 3. The siloxane skeleton-containing group may contain a divalent hydrocarbon group as part of the siloxane skeleton. Specifically, some oxygen atoms in the siloxane skeleton may be replaced with a divalent hydrocarbon group. Examples of the divalent hydrocarbon group include alkylene groups such as methylene, ethylene, propylene, and butylene. A hydrolyzable group, a hydrocarbon group (preferably an alkyl group), or the like may be bonded to the terminal silicon atom of the siloxane skeleton-containing group. The number of elements in the siloxane skeleton-containing group is preferably 100 or less, more preferably 50 or less, and even more preferably 30 or less. The upper limit of the number of elements is preferably 10 or more. Examples of the siloxane skeleton-containing group include *-(O-Si(CH ３ ) ２ ) ｎ CH ３ In this case, n is an integer of 1 to 5, and * represents a bonding site with an adjacent atom.

[0210] X ｂ３ The hydrocarbon chain-containing group represented by the formula (I) may be a group consisting of only a hydrocarbon chain, or may be a group having an etheric oxygen atom between carbon atoms in the hydrocarbon chain. The hydrocarbon chain may be linear or branched, with linear being preferred. The hydrocarbon chain may be saturated or unsaturated, with saturated hydrocarbon chain being preferred. The hydrocarbon chain-containing group preferably has 1 to 3 carbon atoms, more preferably 1 to 2, and even more preferably 1. The hydrocarbon chain-containing group is preferably an alkyl group, more preferably a methyl group, an ethyl group, or a propyl group.

[0211] Preferably, m1 is 3 or 4.

[0212] The compound represented by formula (M1) is preferably a compound represented by any one of formulas (M1-1) to (M1-5) in which M is Si, and more preferably a compound represented by formula (M1-1). The compound represented by formula (M1-1) is preferably tetraethoxysilane, tetramethoxysilane, or triethoxymethylsilane.

[0213] Si(X ｂ１ ) ４ ... (M1-1) CH ３ -Si(X ｂ１ ) ３ …(M1-2) C ２ H ５ -Si(X ｂ１ ) ３ ...(M1-3) n-C ３ H ７ -Si(X ｂ１ ) ３ ...(M1-4) (CH ３ ) ２ CH—Si(X ｂ１ ) ３ …(M1-5)

[0214] In formula (M2), X ｂ４ The number of silicon atoms contained in the hydrolyzable silane oligomer residue represented by the formula (I) is preferably 3 or more, more preferably 5 or more, and even more preferably 7 or more. The number of silicon atoms is preferably 15 or less, more preferably 13 or less, and even more preferably 10 or less. The hydrolyzable silane oligomer residue may have an alkoxy group bonded to a silicon atom. Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, and a butoxy group, with a methoxy group or an ethoxy group being preferred. The hydrolyzable silane oligomer residue may have one or more of these alkoxy groups, and preferably has one type. Examples of the hydrolyzable silane oligomer residue include (C ２ H ５ O) ３ Si-(OSi(OC) ２ H ５ ) ２ ) ４ O-*, etc. Here, * represents a bonding site with an adjacent atom.

[0215] In formula (M2), X ｂ５ Examples of the hydrolyzable group represented by X include the same hydrolyzable group represented by L in the above formula (1-1), a cyano group, a hydrogen atom, and an allyl group, and an alkoxy group or an isocyanato group is preferred. The alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms. X ｂ５ As the group, a hydrolyzable group is preferred.

[0216] The compound represented by formula (M2) includes (H ５ C ２ O) ３ -Si-(OSi(OC) ２ H ５ ) ２ ) ４ O.C. ２ H ５ etc.

[0217] The compound represented by formula (M3) is a compound having reactive silyl groups at both ends of a divalent organic group, i.e., a bissilane. ｂ６ and X ｂ７ Examples of the hydrolyzable group represented by formula (M3) include an alkoxy group, an acyloxy group, a ketoxime group, an alkenyloxy group, an amino group, an aminoxy group, an amide group, an isocyanato group, and a halogen atom, and an alkoxy group or an isocyanato group is preferred. As the alkoxy group, an alkoxy group having 1 to 4 carbon atoms is preferred, and a methoxy group or an ethoxy group is more preferred. In formula (M3), X ｂ６ and X ｂ７ may be the same group or different groups. ｂ６ and X ｂ７ are preferably the same group.

[0218] In formula (M3), Y ｂ１ is a divalent organic group that connects the reactive silyl groups at both ends. ｂ１ The number of carbon atoms in Y is preferably 1 to 8, and more preferably 1 to 3. ｂ１ Examples of the alkylene group include an alkylene group, a phenylene group, and an alkylene group having an etheric oxygen atom between carbon atoms.２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ C(CH ３ ) ２ CH ２ -, -C(CH ３ ) ２ CH ２ CH ２ C(CH ３ ) ２ -, -CH ２ CH ２ OCH ２ CH ２ -, -CH ２ CH ２ CH ２ OCH ２ CH ２ CH ２ -, -CH(CH ３ ) CH ２ OCH ２ CH (CH ３ ) - and -C ６ H ４ - are listed.

[0219] The compound represented by formula (M3) includes (CH ３ O) ３ Si(CH ２ ) ２ Si(OCH ３ ) ３ , (C ２ H ５ O) ３ Si(CH ２ ) ２ Si(OC ２ H ５ ) ３, (OCN) ３ Si(CH ２ ) ２ Si(NCO) ３ , Cl ３ Si(CH ２ ) ２ SiCl ３ , (CH ３ O) ３ Si(CH ２ ) ６ Si(OCH ３ ) ３ , and (C ２ H ５ O) ３ Si(CH ２ ) ６ Si(OC ２ H ５ ) ３ Examples include:

[0220] The content of other components that may be included in the composition of the present disclosure is preferably 10% by mass or less, and more preferably 1% by mass or less, relative to the total amount of the composition of the present disclosure. When the composition of the present disclosure contains a specific metal compound, the content of the specific metal compound is preferably 0.01 to 30% by mass, more preferably 0.01 to 10% by mass, and even more preferably 0.05 to 5% by mass, relative to the total amount of the composition of the present disclosure.

[0221] The total content of the compound of the present disclosure and other components (hereinafter also referred to as "solid content concentration") is preferably 0.001 to 40 mass%, more preferably 0.01 to 20 mass%, and even more preferably 0.1 to 10 mass%, relative to the total amount of the composition of the present disclosure. The solid content concentration of the composition of the present disclosure is a value calculated from the mass of the composition before heating and the mass after heating in a convection dryer at 120°C for 4 hours.

[0222] The composition of the present disclosure contains a liquid medium, and is therefore useful for coating applications and can be used as a coating liquid.

[0223] In addition to Compound 1 and the liquid medium, other components may be contained in the surface treatment agent as long as the effects of the present disclosure are not impaired. Examples of other components include known additives such as acid catalysts and basic catalysts that promote the hydrolysis and condensation reaction of hydrolyzable silyl groups. The content of other components in the surface treatment agent is preferably 10% by mass or less, more preferably 1% by mass or less.

[0224] Other components include a compound represented by the following formula (4): [Y １ ３ Y ２ -(O) ｖ１ -Y ３ ] ｖ２ Y ４ (Si(Y ５ ) ｖ３ (Y ６ ) ３－ｖ３ ) ｖ４ ...(4) In formula 1, Y ２ is Si, Sn, or Ge, and Y １ are each independently a hydrocarbon group or a trialkylsilyloxy group, v1 is 0 or 1, and Y ３ are each independently an alkylene chain or a polyalkylene oxide chain, or a combination of an alkylene chain and a divalent polysiloxane residue; Y ４ represents a single bond or a (v2+v4)-valent linking group, and Y ５ are each independently a hydrocarbon group; ６ are each independently a hydrolyzable group or a hydroxyl group; v3 is each independently an integer of 0 to 2; and v2 and v4 are each independently an integer of 1 or more.

[0225] The alkyl group (which may contain an etheric oxygen atom between carbon atoms) includes Y ３ is an alkylene chain or a polyalkylene oxide chain. Specific examples of compound (4) include the following compounds: In the formula, γ is preferably 9 to 50, more preferably 11 to 30, and particularly preferably 11 to 25.

[0226]

[0227] When the other component in the present surface treatment agent is compound (4), the content of compound (4) is preferably 50 mass % or less, more preferably 40 mass % or less.

[0228] [Surface Treatment Agent] In one embodiment, the surface treatment agent of the present disclosure contains the compound of the present disclosure. Alternatively, the surface treatment agent of the present disclosure may contain the compound of the present disclosure and a liquid medium. The surface treatment agent of the present disclosure may be the composition of the present disclosure. A preferred embodiment of the liquid medium contained in the surface treatment agent of the present disclosure is the same as a preferred embodiment of the liquid medium contained in the composition of the present disclosure.

[0229] [Article] In one embodiment, the article of the present disclosure includes a substrate and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent of the present disclosure.

[0230] The surface treatment layer may be formed on a part of the surface of the substrate, or may be formed on the entire surface of the substrate. The surface treatment layer may be spread in the form of a film on the surface of the substrate, or may be scattered in the form of dots. In the surface treatment layer, the compound of the present disclosure is contained in a state in which hydrolysis of some or all of the reactive silyl groups has progressed and dehydration condensation reaction of the silanol groups has progressed.

[0231] The thickness of the surface treatment layer is preferably 1 to 100 nm, more preferably 1 to 50 nm. If the thickness of the surface treatment layer is 1 nm or more, the effect of the surface treatment is likely to be sufficient. If the thickness of the surface treatment layer is 100 nm or less, the utilization efficiency is high. The thickness of the surface treatment layer can be calculated from the oscillation period of the interference pattern obtained by X-ray reflectivity using a thin film analysis X-ray diffractometer (product name "ATX-G", manufactured by RIGAKU Corporation).

[0232] The type of substrate is not particularly limited, and examples thereof include substrates that are required to be water-repellent. Examples of substrates include substrates that may be used by contacting other articles (e.g., stylus) or human fingers; substrates that may be held by human fingers during operation; and substrates that may be placed on other articles (e.g., a mounting table). Examples of substrate materials include metal, resin, glass, sapphire, ceramic, semiconductor, stone, fiber, nonwoven fabric, paper, wood, fur, natural leather, artificial leather, ceramics, and composite materials thereof. Glass may be chemically strengthened.

[0233] Examples of the substrate include glass or resin used for building materials, decorative building materials, interior goods, transportation equipment (e.g., automobiles), signs, bulletin boards, drinking vessels, tableware, aquariums, ornamental equipment (e.g., frames, boxes), laboratory equipment, furniture, textile products, packaging containers, art, sports, games, etc., and glass or resin used for the exterior parts (excluding display parts) of devices such as mobile phones (e.g., smartphones), personal digital assistants, game consoles, remote controls, etc. The shape of the substrate may be a plate or a film.

[0234] The substrate is preferably a substrate for a touch panel, a substrate for a display, or a lens for glasses, and is particularly preferably a substrate for a touch panel.The material of the substrate for a touch panel is preferably glass or a transparent resin.

[0235] The substrate may be a substrate whose one or both surfaces have been subjected to a surface treatment such as corona discharge treatment, plasma treatment, or plasma graft polymerization treatment. A surface-treated substrate has better adhesion to the surface treatment layer and further improved abrasion resistance of the surface treatment layer. Therefore, it is preferable to perform the surface treatment on the surface of the substrate that comes into contact with the surface treatment layer. Furthermore, when a base layer described below is provided on the surface-treated substrate, it has better adhesion to the base layer and further improved abrasion resistance of the surface treatment layer. Therefore, when a base layer is provided, it is preferable to perform the surface treatment on the surface of the substrate that comes into contact with the base layer.

[0236] The surface treatment layer may be provided directly on the surface of the substrate, or a primer layer may be provided between the substrate and the surface treatment layer. From the viewpoint of further improving the water repellency and abrasion resistance of the surface treatment layer, the article of the present disclosure preferably includes a substrate, a primer layer disposed on the substrate, and a surface treatment layer surface-treated with the surface treatment agent of the present disclosure, disposed on the primer layer.

[0237] The underlayer is preferably a layer containing an oxide containing silicon and at least one specific element selected from the group consisting of Group 1 elements, Group 2 elements, Group 4 elements, Group 5 elements, Group 13 elements, and Group 15 elements of the periodic table.

[0238] The Group 1 elements of the periodic table (hereinafter also referred to as "Group 1 elements") refer to lithium, sodium, potassium, rubidium, and cesium. As the Group 1 elements, lithium, sodium, and potassium are preferred, and sodium and potassium are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more types of Group 1 elements.

[0239] The Group 2 elements of the periodic table (hereinafter also referred to as "Group 2 elements") refer to beryllium, magnesium, calcium, strontium, and barium. As the Group 2 elements, magnesium, calcium, and barium are preferred, and magnesium and calcium are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 2 elements.

[0240] The Group 4 elements of the periodic table (hereinafter also referred to as "Group 4 elements") refer to titanium, zirconium, and hafnium. As the Group 4 elements, titanium and zirconium are preferred, and titanium is more preferred, from the viewpoint of being able to form a surface treatment layer on the underlayer more uniformly without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more types of Group 4 elements.

[0241] The Group 5 elements of the periodic table (hereinafter also referred to as "Group 5 elements") refer to vanadium, niobium, and tantalum. As the Group 5 element, vanadium is particularly preferred from the viewpoint of providing a surface treatment layer with better abrasion resistance. The underlayer may contain two or more Group 5 elements.

[0242] The Group 13 elements of the periodic table (hereinafter also referred to as "Group 13 elements") refer to boron, aluminum, gallium, and indium. As the Group 13 elements, boron, aluminum, and gallium are preferred, and boron and aluminum are more preferred, from the viewpoint of enabling the surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 13 elements.

[0243] The Group 15 elements of the periodic table (hereinafter also referred to as "Group 15 elements") refer to nitrogen, phosphorus, arsenic, antimony, and bismuth. As the Group 15 elements, phosphorus, antimony, and bismuth are preferred, and phosphorus and bismuth are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 15 elements.

[0244] As the specific element contained in the underlayer, Group 1 elements, Group 2 elements, and Group 13 elements are preferred because they provide better abrasion resistance to the surface treatment layer, and Group 1 elements and Group 2 elements are more preferred, with Group 1 elements being even more preferred. The specific element may contain only one type of element or two or more types of elements.

[0245] The oxide contained in the underlayer may be a mixture of oxides of the above elements (silicon and the specific element) alone (for example, a mixture of silicon oxide and an oxide of the specific element), a composite oxide containing two or more of the above elements, or a mixture of an oxide of the above elements alone and a composite oxide.

[0246] From the viewpoint of achieving superior abrasion resistance of the surface treatment layer, the ratio of the total molar concentration of the specific elements in the underlayer to the molar concentration of silicon in the underlayer (specific elements / silicon) is preferably 0.02 to 2.90, more preferably 0.10 to 2.00, and even more preferably 0.20 to 1.80. The molar concentrations (mol %) of each element in the underlayer can be measured, for example, by depth profile analysis by X-ray photoelectron spectroscopy (XPS) using ion sputtering.

[0247] The underlayer may be a single layer or multiple layers. The underlayer may have an uneven surface. The thickness of the underlayer is preferably 1 to 100 nm, more preferably 1 to 50 nm, and even more preferably 2 to 20 nm. When the thickness of the underlayer is equal to or greater than the above lower limit, the adhesion of the underlayer to the surface treatment layer is further improved, and the surface treatment layer has better abrasion resistance. When the thickness of the underlayer is equal to or less than the above upper limit, the underlayer itself has excellent abrasion resistance. The thickness of the underlayer is measured by observing the cross section of the underlayer using a transmission electron microscope (TEM).

[0248] The underlayer can be formed by, for example, a vapor deposition method using a vapor deposition material or a wet coating method.

[0249] The deposition material used in the deposition method preferably contains an oxide containing silicon and a specific element. Specific examples of the form of the deposition material include powder, melt, sintered body, granules, and crushed body, with melt, sintered body, and granules being preferred from the viewpoint of ease of handling. Here, the melt refers to a solid obtained by melting the powder of the deposition material at a high temperature and then cooling and solidifying it. The sintered body refers to a solid obtained by firing the powder of the deposition material. If necessary, a molded body obtained by pressing the powder may be used instead of the powder of the deposition material. The granule refers to a solid obtained by kneading the powder of the deposition material with a liquid medium (e.g., water, organic solvent) to obtain particles, and then drying the particles.

[0250] The vapor deposition material can be produced by, for example, the following methods: A method of mixing silicon oxide powder with a powder of an oxide of a specific element to obtain a vapor deposition material powder. A method of kneading the vapor deposition material powder with water to obtain particles, and then drying the particles to obtain granules of the vapor deposition material. A method of mixing a powder containing silicon (e.g., silicon oxide powder, silica sand, silica gel), a powder containing a specific element (e.g., oxide powder, carbonate, sulfate, nitrate, oxalate, hydroxide of the specific element), and water, drying the mixture, and then firing the dried mixture or a compact obtained by pressing the dried mixture to obtain a sintered body. A method of melting a powder containing silicon (e.g., silicon oxide powder, silica sand, silica gel) and a powder containing a specific element (e.g., oxide powder, carbonate, sulfate, nitrate, oxalate, hydroxide of the specific element) at a high temperature, and then cooling and solidifying the melt to obtain a melt.

[0251] A specific example of a vapor deposition method using a vapor deposition material is a vacuum vapor deposition method. The vacuum vapor deposition method is a method in which a vapor deposition material is evaporated in a vacuum chamber and attached to the surface of a substrate. The temperature during vapor deposition (for example, the temperature of the boat in which the vapor deposition material is placed when a vacuum vapor deposition apparatus is used) is preferably 100 to 3,000°C, and more preferably 500 to 3,000°C. The pressure during vapor deposition (for example, the pressure in the chamber in which the vapor deposition material is placed when a vacuum vapor deposition apparatus is used) is preferably 1 Pa or less, and more preferably 0.1 Pa or less. When forming an underlayer using a vapor deposition material, one vapor deposition material may be used, or two or more vapor deposition materials containing different elements may be used.

[0252] Specific examples of evaporation methods for the deposition material include a resistance heating method, in which the deposition material is melted and evaporated on a resistance heating boat made of a high-melting-point metal, and an electron gun method, in which the deposition material is irradiated with an electron beam to directly heat the deposition material, melting and evaporating the surface. The electron gun method is preferred as an evaporation method for the deposition material because it can evaporate high-melting-point substances due to its ability to locally heat the material, and because areas not irradiated by the electron beam are at low temperatures, eliminating the risk of reaction with the container or the inclusion of impurities. The evaporation method for the deposition material may use multiple boats, or all of the deposition materials may be placed in a single boat. The deposition method may be co-evaporation or alternating deposition. Specific examples include mixing silica and a specific source in the same boat, co-evaporating silica and a specific element source in separate boats, or similarly alternately depositing them in separate boats. The deposition conditions, order, etc., are appropriately selected depending on the composition of the underlayer.

[0253] In the wet coating method, it is preferable to form an undercoat layer on a substrate by a wet coating method using a coating liquid containing a silicon-containing compound, a compound containing a specific element, and a liquid medium.

[0254] Specific examples of the silicon compound include silicon oxide, silicic acid, partial condensates of silicic acid, alkoxysilanes, and partial hydrolysis condensates of alkoxysilanes.

[0255] Specific examples of compounds containing a specific element include oxides of the specific element, alkoxides of the specific element, carbonates of the specific element, sulfates of the specific element, nitrates of the specific element, oxalates of the specific element, and hydroxides of the specific element.

[0256] Examples of the liquid medium include the same liquid medium as that contained in the composition of the present disclosure.

[0257] The content of the liquid medium is preferably 0.01 to 20% by mass, more preferably 0.1 to 10% by mass, based on the total amount of the coating liquid used to form the underlayer.

[0258] Specific examples of wet coating methods for forming the underlayer include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet coating, flow coating, roll coating, casting, Langmuir-Blodgett coating, and gravure coating.

[0259] After wet-coating the coating liquid, it is preferable to dry the coating film. The drying temperature for the coating film is preferably 20 to 200°C, more preferably 80 to 160°C.

[0260] The article of the present disclosure may be an optical material having a surface treatment layer as the outermost layer. Examples of the optical material include optical materials related to displays and the like, as well as a wide variety of other optical materials. Examples of the optical material include displays such as cathode ray tubes (CRTs; for example, personal computer monitors), liquid crystal displays, plasma displays, organic electroluminescent displays, inorganic thin-film electroluminescent dot matrix displays, rear projection displays, fluorescent display tubes (VFDs), and field emission displays (FEDs), as well as protective plates for such displays, or displays whose surfaces have been treated with an anti-reflection film.

[0261] The article of the present disclosure is preferably an optical component. Examples of optical components include car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio systems, game consoles, eyeglass lenses, camera lenses, lens filters, sunglasses, medical equipment such as gastroscopes, copiers, PCs, displays (e.g., liquid crystal displays, organic EL displays, plasma displays, touch panel displays), touch panels, protective films, and anti-reflection films. Examples of optical components include front protective plates, anti-reflection plates, polarizing plates, and anti-glare plates for displays such as PDPs and LCDs; disc surfaces of optical discs such as Blu-ray (registered trademark) discs, DVD discs, CD-Rs, and MO discs; optical fibers; and the display surfaces of watches. In particular, the article of the present disclosure is preferably a display or a touch panel.

[0262] The article of the present disclosure may be a medical device or a medical material. The article of the present disclosure may also be an automobile interior or exterior component. Examples of exterior components include windows, light covers, and exterior camera covers. Examples of interior components include instrument panel covers, navigation system touch panels, and decorative interior components.

[0263] When the article of the present disclosure is an optical component, the material constituting the surface of the substrate is a material for optical components, such as glass or transparent plastic. When the article of the present disclosure is an optical component, a functional layer such as a hard coat layer or an anti-reflection layer may be formed on the surface (outermost layer) of the substrate. The anti-reflection layer may be either a single-layer anti-reflection layer or a multi-layer anti-reflection layer. Examples of inorganic materials that can be used for the anti-reflection layer include SiO ２ , SiO, ZrO ２ , TiO ２ , TiO, Ti ２ O ３ , Ti ２ O ５ , Al ２ O ３ , Ta ２ O ５ , Ta ３ O ５, Nb ２ O ５ , HfO ２ , Si ３ N ４ , CeO ２ , MgO, Y ２ O ３ , SnO ２ , MgF ２ , and W.O. ３ These inorganic substances may be used alone or in combination of two or more (for example, as a mixture). When a multi-layer antireflection layer is formed, the outermost layer may contain SiO ２ and / or SiO is preferably used. When the article of the present disclosure is an optical glass component for a touch panel, a transparent electrode, for example, a thin film using indium tin oxide (ITO) or indium zinc oxide, may be provided on a portion of the surface of the substrate (glass). Furthermore, the substrate may have an insulating layer, an adhesive layer, a protective layer, a decorative frame layer (I-CON), an atomization film layer, a hard coating film layer, a polarizing film, a phase difference film, a liquid crystal display module, or the like, depending on its specific specifications.

[0264] [Method for manufacturing an article] The method for manufacturing an article according to the present disclosure is, for example, a method for manufacturing an article having a surface-treated layer formed on a substrate by performing a surface treatment on a substrate using the surface treatment agent according to the present disclosure. Examples of the surface treatment include a dry coating method and a wet coating method.

[0265] Examples of dry coating methods include vacuum deposition, CVD, and sputtering. Vacuum deposition is preferred as a dry coating method from the viewpoints of suppressing decomposition of the compound and simplicity of the equipment. For vacuum deposition, a pellet-shaped substance obtained by impregnating a metal porous body such as iron or steel with the compound of the present disclosure may be used. A composition containing the compound of the present disclosure and a liquid medium may be impregnated into a metal porous body such as iron or steel, and the liquid medium may be dried to obtain a pellet-shaped substance impregnated with the compound of the present disclosure.

[0266] Examples of wet coating methods include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet coating, flow coating, roll coating, casting, Langmuir-Blodgett coating, and gravure coating.

[0267] In order to improve the abrasion resistance of the surface treatment layer, an operation to promote the reaction between the compound of the present disclosure and the substrate may be performed as necessary. Examples of such an operation include heating, humidification, and light irradiation. For example, the substrate on which the surface treatment layer is formed can be heated in a humid atmosphere to promote reactions such as the hydrolysis reaction of hydrolyzable groups, the reaction between hydroxyl groups on the surface of the substrate and silanol groups, and the formation of siloxane bonds through the condensation reaction of silanol groups. After surface treatment, compounds in the surface treatment layer that are not chemically bonded to other compounds or the substrate may be removed as needed. Examples of removal methods include pouring a solvent over the surface treatment layer and wiping with a cloth soaked in the solvent.

[0268] The present invention will be described in more detail below using examples, but the present invention is not limited to these examples.

[0269] [Compound (A)] <Synthesis of Compound (A1)> Compound (A1) was obtained according to the method described in WO 2021 / 054413.

[0270]

[0271] Synthesis of Compound (A2) Dichloromethane (20 g) and oxalyl chloride (2.0 g) were added to compound (A1) (2.0 g) and the mixture was stirred at 25°C for 12 hours. After removing low-boiling components by distillation, dichloromethane (20 g), pentafluorophenol (2.0 g), and triethylamine (2.5 g) were added and the mixture was stirred at 25°C for 1 hour. After removing low-boiling components by distillation, flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 2.2 g of compound (A2). The structure of compound (A2) was confirmed by the following NMR data.

[0272]

[0273] 1 H-NMR (400 MHz, CDCl3) δ 5.80 (ddt, J = 17.2, 10.2, 7.0 Hz, 2H), 5.20 - 4.67 (m, 4H), 2.37 (p, J = 7.5 Hz, 1H), 2.03 (tdt, J = 7.8, 6.9, 1.1Hz, 4H), 1.81 - 0.94 (m, 32H)

[0274] <Synthesis of Compound (A3)> Tetrahydrofuran (THF) (101 g) was added to hexamethylcyclotrisiloxane (76 g) and stirred until dissolved. A solution of lithium trimethylsilanol salt (5.1 g) suspended in THF (20 g) was then added, and the mixture was stirred at 25°C for 2 hours. Chlorodimethylsilane (10.5 g) was then added, and the mixture was stirred at 25°C for 1 hour. Hexane and water were added for extraction, and the solvent and low-boiling components were distilled off under reduced pressure. Flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed, yielding 25 g of compound (A3). The average value of m in compound (A3) was 17. The structure of compound (A3) was confirmed by the following NMR data.

[0275]

[0276] 1 H-NMR (400 MHz, CDCl3) δ 4.63 (hept, J = 2.8 Hz, 1H), 0.21 - 0.08 (m, 6H), 0.07--0.12 (m, 111H).

[0277] ​​<Synthesis of Compound (A4)> Dichloromethane (20 g) and compound (A3) (15 g) were added to compound (A2) (2.0 g) and stirred until homogenous. A toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 4.1 mg) was then added and stirred at 25°C for 2 hours. Low-boiling point components were removed by distillation under reduced pressure, followed by flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) to obtain 10.5 g of compound (A4). The average value of m in compound (A4) was 17. The structure of compound (A4) was confirmed by the following NMR data.

[0278]

[0279] 1 H-NMR (400 MHz, CDCl3) δ 2.37 (p, J = 7.5 Hz, 1H), 1.63 - 1.05 (m, 40H), 0.71 (t, J = 8.3 Hz, 4H), 0.07--0.12 (m, 234H).

[0280] <Synthesis of Compound (A5)> Compound (A5) was obtained according to the method described in WO 2021 / 054413.

[0281]

[0282] <Synthesis of Compound (A6)> Dichloromethane (10 g) was added to compound (A4) (1.0 g) and homogenized, and then compound (A5) (0.40 g) was added and stirred at 25°C for 12 hours. Low boiling components were removed by distillation, and then flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) was performed to obtain 0.84 g of compound (A6). The average value of m in compound (A6) was 17. The structure of compound (A6) was confirmed by the following NMR data.

[0283]

[0284] 1 ​​H-NMR (400 MHz, CDCl3) δ 5.89 - 4.80 (m, 7H), 3.04 (dd, J = 6.2, 5.5 Hz, 2H), 2.34 (p, J = 7.0 Hz, 1H), 2.17 - 1.89 (m, 4H), 1.73 - 0.96 (m, 72H), 0.71 (t, J = 8.3 Hz, 4H), 0.07--0.12 (m, 234H).

[0285] <Synthesis of Compound (A)> A toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 4.1 mg), aniline (2.6 mg), and trimethoxysilane (0.20 g) were added to compound (A6) (0.84 g) dissolved in dichloromethane (10 g), and the mixture was stirred at 50°C for 2 hours. The solvent was distilled off under reduced pressure to obtain 0.87 g of compound (A). The average value of m in compound (A) was 17. The structure of compound (A) was confirmed from the following NMR data.

[0286]

[0287] 1 H-NMR (400 MHz, CDCl3) δ 3.58 (s, 18H), 3.04 (dd, J = 6.2, 5.5 Hz, 2H), 2.34 (p, J = 7.0 Hz, 1H), 1.83 - 1.03 (m, 80H), 0.81 - 0.52 (m, 8H), 0.07--0.12 (m, 234H).

[0288] ​[Compound (B)] <Synthesis of Compound (B1)> Dichloromethane (20 g) and oxalyl chloride (2.0 g) were added to 4-pentenoic acid, 2,2-di-2-propen-1-yl (1.8 g), and the mixture was stirred at 25°C for 12 hours. After removing low-boiling components by distillation, dichloromethane (20 g), pentafluorophenol (2.5 g), and triethylamine (2.5 g) were added and the mixture was stirred at 25°C for 1 hour. After removing low-boiling components by distillation, flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 2.0 g of Compound (B1). The structure of Compound (B1) was confirmed by the following NMR data.

[0289]

[0290] 1 H-NMR (400 MHz, CDCl3) δ 5.68 (ddt, J = 16.8, 11.3, 7.4 Hz, 3H), 5.35 - 4.86 (m, 6H), 2.36 (dt, J = 7.5, 0.9 Hz, 6H).

[0291] <Synthesis of Compound (B2)> Dichloromethane (10 g) was added to compound (B1) (0.7 g) and homogenized, followed by the addition of 1,1,3,3,5,5,7,7,9,9,11,11-dodecamethylhexasiloxane (13.4 g) and a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 4.1 mg), followed by stirring at 25°C for 12 hours. Low-boiling components were removed by distillation, and then flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) was performed to obtain 1.1 g of compound (B2). The structure of compound (B2) was confirmed by the following NMR data.

[0292]

[0293] 1 ​​H-NMR (400 MHz, CDCl3) δ 4.63 (hept, J = 2.8 Hz, 3H), 1.64 (dd, J = 8.6, 4.3 Hz, 6H), 1.27 - 1.14 (m, 6H), 0.55 - 0.44 (m, 6H), 0.15 - -0.03 (m, 108H).

[0294] <Synthesis of Compound (B3)> Dichloromethane (10 g) was added to compound (B2) (1.1 g) and homogenized, followed by the addition of tris(trimethylsiloxy)(vinyl)silane (1.7 g) and a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 4.1 mg), followed by stirring at 25°C for 12 hours. Low-boiling components were removed by distillation, and then flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) was performed to obtain 1.8 g of compound (B3). The structure of compound (B3) was confirmed by the following NMR data.

[0295]

[0296] 1 H-NMR (400 MHz, CDCl3) δ 1.68 (d, J = 8.4 Hz, 6H), 1.40 (p, J = 8.5 Hz, 6H), 0.93 - 0.30 (m, 18H), 0.16 - -0.15 (m, 189H).

[0297] <Synthesis of Compound (B4)> Dichloromethane (10 g) was added to compound (B3) (1.0 g) and homogenized, and then compound (A5) (0.40 g) was added and stirred at 25°C for 12 hours. Low boiling components were removed by distillation, and then flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) was performed to obtain 0.80 g of compound (B4). The structure of compound (B4) was confirmed by the following NMR data.

[0298]

[0299] 1 ​​H-NMR (400 MHz, CDCl3) δ 6.03 - 4.77 (m, 7H), 3.03 (dd, J = 6.2, 4.4 Hz, 2H), 2.03 (tdt, J = 7.7, 6.7, 1.0 Hz, 4H), 1.80 - 0.28 (m, 63H), 0.28 - -0.22 (m, 189H).

[0300] <Synthesis of Compound (B)> To a solution of compound (B4) (0.8 g) in dichloromethane (10 g) was added a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3 mass%, 4.1 mg), aniline (2.6 mg), and trimethoxysilane (0.20 g), and the mixture was stirred at 50°C for 2 hours. The solvent was distilled off under reduced pressure to obtain 0.83 g of compound (B). The structure of compound (B) was confirmed by the following NMR data.

[0301]

[0302] 1 H-NMR (400 MHz, CDCl3) δ 3.58 (s, 18H), 3.03 (dd, J = 6.2, 4.4 Hz, 2H), 1.79 - 0.28 (m, 75H), 0.27 - -0.12 (m, 189H).

[0303] [Synthesis of Compound (C)] <Synthesis of Compound (C1)> 11-bromo-1-undecene (2.0 g) was dissolved in dichloromethane (10 g), and a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3 mass%, 4.1 mg), aniline (2.6 mg), and trimethoxysilane (2.50 g) were added, followed by stirring at 50°C for 2 hours. Low-boiling point components were distilled off under reduced pressure to obtain 3.0 g of compound (C1). The structure of compound (C1) was confirmed by the following NMR data.

[0304]

[0305] 1 ​​H-NMR (400 MHz, CDCl3) δ 3.65 - 3.20 (m, 11H), 1.86 - 1.17 (m, 18H), 0.65 (t, J = 9.2 Hz, 2H).

[0306] <Synthesis of Compound (C2)> Compound (C2) was obtained according to the method described in JP 2017-119849 A.

[0307]

[0308] <Synthesis of Compound (C3)> THF (10 g) was added to compound (C2) (2.2 g) and homogenized, then cooled to 0°C. A butyllithium solution (4.0 mL) (1.6 M, hexane solution) was added and stirred at 0°C for 15 minutes. Hexamethylcyclotrisiloxane (1.6 g) was added and stirred at 25°C for 12 hours. Chlorodimethylsilane (1.5 g) was then added and stirred at 25°C for 1 hour. Hexane and water were added for extraction, and low-boiling components were removed by distillation. The resulting crude liquid was purified by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate), yielding 2.7 g of compound (C3). The average value of m in compound (C3) was 3. The structure of compound (C3) was confirmed by the following NMR data.

[0309]

[0310] 1 H-NMR (400 MHz, CDCl3) δ 4.68 - 4.52 (m, J = 2.9 Hz, 1H), 0.15 - 0.06 (m, 6H), 0.05 - -0.06 (m, 45H).

[0311] ​<Synthesis of Compound (C4)> Compound (C1) (0.2 g) and toluene (10 g) were added to compound (C3) (1.3 g) and homogenized, and then tris(pentafluorophenyl)borane (0.02 g) was added and stirred at 25°C for 12 hours. Thereafter, low boiling components were removed by distillation. The obtained crude liquid was purified by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate), and 0.93 g of compound (C4) was obtained. In compound (C4), the average value of m was 3. The structure of compound (C4) was confirmed by the following NMR data.

[0312]

[0313] 1 H-NMR (400 MHz, CDCl3) δ 3.29 (t, J = 6.9 Hz, 2H), 1.86 - 1.63 (m, 2H), 1.42 - 0.93 (m, 16H), 0.55 - 0.30 (m, 2H), 0.30 - -0.30 (m, 153H)

[0314] <Synthesis of Compound (C5)> Compound (C5) was obtained according to the method described in WO 2021 / 054413.

[0315]

[0316] <Synthesis of Compound (C6)] THF (10 g), copper(II) chloride (0.01 g), and compound (C5) (1.2 mL) (1.5 M, THF solution) were added to compound (C4) (0.93 g), and the mixture was stirred at 50°C for 16 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were removed by distillation. The obtained crude liquid was purified by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate), and 0.85 g of compound (C6) was obtained. The average value of m in compound (C6) was 3. The structure of compound (C6) was confirmed by the following NMR data.

[0317]

[0318] 1 ​​H-NMR (400 MHz, CDCl3) δ 5.70 (ddt, J = 16.6, 10.5, 7.4 Hz, 3H), 5.09 - 4.82 (m, 6H), 1.88 (dt, J = 7.5, 1.3 Hz, 6H), 1.56 - 0.88 (m, 22H), 0.52 - 0.31 (m, 2H), 0.25 - -0.27 (m, 153H).

[0319] <Synthesis of Compound (C)> A toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 4.1 mg), aniline (2.6 mg), and trimethoxysilane (0.45 g) were added to compound (C6) (0.85 g) dissolved in dichloromethane (10 g), and the mixture was stirred at 50°C for 2 hours. The solvent was distilled off under reduced pressure to obtain 0.93 g of compound (C). The average value of m in compound (C) was 3. The structure of compound (C) was confirmed by the following NMR data.

[0320]

[0321] 1 H-NMR (400 MHz, CDCl3) δ 3.55 - 3.38 (m, 27H), 1.29 - 0.91 (m, 34H), 0.44 (dt, J = 30.6, 7.9 Hz, 8H), 0.20 - -0.21 (m, 153H).

[0322] [Synthesis of Compound (G)] <Synthesis of Compound (G1)> THF (10 g) and magnesium (0.2 g) were added to 18-bromo-1-octadecene (1 g), and the mixture was stirred at 60°C for 2 hours. After filtering the reaction solution, compound (C4) (0.51 g) and copper(II) chloride (0.05 g) were added, and the mixture was stirred at 60°C for 24 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was then performed to obtain 0.4 g of compound (G1). The average value of m in compound (G1) was 3. The structure of compound (G1) was confirmed by the following NMR data.

[0323] ​

[0324] 1H-NMR (400 MHz, CDCl3) δ5.91 - 5.65(m, 1H), 5.05 - 4.77(m, 2H),2.13 - 1.85 (m, 2H), 1.53 - 1.14 (m, 50H), 0.53 (t, J = 8.1 Hz, 2H), 0.30 - -0.30 (m, 153H)

[0325] <Synthesis of Compound (G)> A toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), aniline (3 mg), and trimethoxysilane (0.60 g) were added to compound (G1) (0.4 g) dissolved in dichloromethane (10 g), and the mixture was stirred at 50°C for 2 hours. The solvent was distilled off under reduced pressure to obtain 0.4 g of compound (G). The average value of m in compound (G) was 3. The structure of compound (G) was confirmed by the following NMR data.

[0326]

[0327] 1 H-NMR (400 MHz, CDCl3) δ 3.58 (s, 9H), 1.61 - 1.11 (m, 54H), 0.72 - 0.46 (m, 4H), 0.31 - -0.21 (m, 153H).

[0328] [Compound (D)] Compound (D) was obtained according to the method described in WO 2023 / 017830.

[0329]

[0330] [Compound (E)] <Synthesis of Compound (E1)> Compound (E1) was obtained according to the method described in JP 2017-119849 A.

[0331]

[0332] ​<Synthesis of Compound (E2)> Under a nitrogen atmosphere, 2,3,4,5,6-pentafluorophenol (6.8 g), THF (42 mL), and triethylamine (5.1 g) were added to a 100 mL flask and stirred at 25°C. 10-Undecenoyl chloride (5.0 g) was added dropwise to the reaction mixture, and the mixture was stirred for 1 hour. The reaction solution was filtered, and the solvent and low-boiling components were distilled off under reduced pressure. 7.9 g of compound (E2) was obtained by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate). The structure of compound (E2) was confirmed by the following NMR data.

[0333] 1 H-NMR(400 MHz,CDCl3) δ5.74(ddt, J = 16.9, 10.2, 6.6 Hz, 1H), 5.05 - 4.77(m, 2H), 2.59(t, J = 7.4 Hz, 2H), 1.97(q, J = 7.1 Hz, 2H), 1.70(p, J = 7.4 Hz, 2H), 1.42 - 1.08(m, 10H).

[0334]

[0335] <Synthesis of Compound (E3)> Under a nitrogen atmosphere, a xylene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 0.10 mL) was added to a mixture of compound (E2) (5.6 g), THF (5.0 mL), and chlorodimethylsilane (2.3 g) in a 200 mL flask, and the mixture was stirred for 2 hours. The solvent and low-boiling components were distilled off under reduced pressure to obtain 7.2 g of compound (E3). The structure of compound (E3) was confirmed by the following NMR data.

[0336] 1 H-NMR(400 MHz,CDCl3) δ 2.63 (t,J = 7.4 Hz, 2H), 1.74(p, J = 7.4 Hz,2H), 1.46 - 1.17(m, 14H), 0.90 - 0.69(m, 2H), 0.37(s, 6H).

[0337]

[0338] ​​<Synthesis of Compound (E4)> Under a nitrogen atmosphere, compound (E1) (2.5 g) and THF (20 mL) were placed in a three-neck flask and stirred. The mixture was cooled to 0°C, and a hexane solution of n-BuLi (1.6 M, 5.0 mL) was added dropwise. A THF solution of hexamethylcyclotrisiloxane (1.0 M, 18.0 mL) was added dropwise, followed by a THF solution of hexamethylcyclotrisiloxane (1.0 M, 48 mL) and stirring for 2 hours. Thereafter, compound (E3) (3.6 g) was added and stirred for 1 hour, after which compound (A5) (3.2 g) was added and stirred for 1 hour. Hexane and ion-exchanged water were added sequentially to the reaction solution, the mixture was separated, and the organic layer was separated. After the solvent and low-boiling components were distilled off under reduced pressure, flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) was performed to obtain 1.2 g of compound (E4). The structure of compound (E4) was confirmed by the following NMR data. In compound (E4), the average value of n was 17.

[0339] 1 H-NMR (400 MHz, CDCl3) δ 5.71(ddt, J = 16.9, 10.2, 6.7 Hz, 2H), 5.24(t, J = 5.7 Hz, 1H), 4.95 - 4.78(m, 4H), 3.08(t, J = 5.9 Hz, 2H), 2.06(t, J = 7.6 Hz, 2H), 1.94(q, J = 6.9 Hz, 4H), 1.46 - 0.98(m, 49H), 0.42(t, J = 7.6 Hz, 2H), -0.06(s, 135H)

[0340]

[0341] <Synthesis of Compound (E)> A toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 4.1 mg), aniline (2.6 mg), and trimethoxysilane (0.45 g) were added to compound (E4) (0.95 g) dissolved in dichloromethane (10 g), and the mixture was stirred at 50°C for 2 hours. The solvent was distilled off under reduced pressure to obtain 0.93 g of compound (E). The structure of compound (E) was confirmed by the following NMR data. The average value of n in compound (E) was 17.​

[0342] 1 H-NMR(400 MHz, CDCl3) δ 5.26 - 5.17(m, 1H), 3.47(s, 18H), 3.08(t, J = 6.0 Hz, 2H), 2.12 - 1.98(m, 2H), 1.46 - 0.98(m, 57H), 0.63 - 0.46(m, 4H), 0.45(t, J = 7.6 Hz, 2H), -0.06(s, 135H).

[0343]

[0344] [Compound F] <Synthesis of Compound (F1)> Dichloromethane (100 g) and trichloroisocyanuric acid (14 g) were added to 1,1,1,3,5,5,5-heptamethyltrisiloxane (10 g), and the mixture was stirred at 25°C for 3 hours. The reaction mixture was then filtered to remove insoluble matter, and the filtrate was then distilled off to remove low-boiling components. Water (20 g), THF (40 g), and triethylamine (10 g) were added to the resulting crude liquid, and the mixture was stirred at 25°C for 2 hours. Hexane and water were added for extraction, and the low-boiling components were removed by distillation. The resulting crude liquid was purified by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate), yielding 8.3 g of Compound (F1). The structure of Compound (F1) was confirmed by the following NMR data.

[0345]

[0346] 1 H-NMR (400 MHz, CDCl3) δ 2.41 (q, J = 7.2 Hz, 1H), 0.20 - -0.21 (m, 21H).

[0347] ​​<Synthesis of Compound (F2)> Under a nitrogen atmosphere, compound (F1) (2.0 g) and THF (20 mL) were added to a three-neck flask and stirred. The mixture was cooled to 0°C, and a hexane solution of n-BuLi (1.6 M, 5.0 mL) was added dropwise. A THF solution of hexamethylcyclotrisiloxane (1.0 M, 18.0 mL) was added dropwise, followed by a THF solution of hexamethylcyclotrisiloxane (1.0 M, 48 mL) and stirring for 2 hours. Thereafter, compound (E3) (3.6 g) was added and stirred for 1 hour, after which compound (A5) (3.2 g) was added and stirred for 1 hour. Hexane and ion-exchanged water were added sequentially to the reaction solution, the mixture was separated, and the organic layer was separated. After the solvent and low-boiling components were distilled off under reduced pressure, flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) was performed to obtain 1.1 g of compound (F2). The structure of compound (F2) was confirmed by the following NMR data. In compound (F2), the average value of m was 17.

[0348]

[0349] 1 H-NMR (400 MHz, CDCl3) δ 5.71(ddt, J = 16.9, 10.2, 6.7 Hz, 2H), 5.24(t, J = 5.7 Hz, 1H), 4.95 - 4.78(m, 4H), 3.08(t, J = 5.9 Hz, 2H), 2.06(t, J = 7.6 Hz, 2H), 1.94(q, J = 6.9 Hz, 4H), 1.46 - 0.98(m, 49H), 0.42(t, J = 7.6 Hz, 2H), -0.06(s, 129H).

[0350] <Synthesis of Compound (F)> A toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 4.1 mg), aniline (2.6 mg), and trimethoxysilane (0.45 g) were added to compound (F2) (0.99 g) dissolved in dichloromethane (10 g), and the mixture was stirred at 50°C for 2 hours. The solvent was distilled off under reduced pressure to obtain 1.01 g of compound (F). The structure of compound (F) was confirmed by the following NMR data. The average value of n in compound (F) was 17.​

[0351] Compound (H1-3)

[0352]

[0353] 1 H-NMR (400 MHz, CDCl3) δ 3.58 (s, 18H), 3.04 (dd, J = 6.0, 5.3 Hz, 2H), 2.28 - 0.39 (m, 63H), 0.20 - -0.24 (m, 129H).

[0354] [Production of Articles] A substrate was surface-treated using each of the compounds described above. The surface treatment method was a dry coating method. Chemically strengthened glass was used as the substrate.

[0355] Dry coating was performed using a vacuum deposition apparatus (product name "VTR-350M", manufactured by ULVAC). A 20% by mass ethyl acetate solution (0.5 g) of each compound was filled into a molybdenum boat in the vacuum deposition apparatus, and the pressure in the vacuum deposition apparatus was adjusted to 1×10 －３ The boat was evacuated to a pressure of 10 Pa or less. The boat was heated at a temperature increase rate of 10°C / min or less, and when the deposition rate measured by a quartz crystal oscillator film thickness meter exceeded 1 nm / sec, the shutter was opened to start film formation on the surface of the substrate. When the film thickness reached approximately 50 nm, the shutter was closed to terminate film formation on the surface of the substrate. The substrate on which the compound had been deposited was heat-treated at 200°C for 30 minutes, yielding an article having a surface-treated layer on the surface of the substrate.

[0356] [Evaluation] The articles obtained by the dry coating method were evaluated for water repellency, abrasion resistance, and fingerprint removability. The evaluation methods were as follows.

[0357] <Water repellency> Approximately 2 μL of distilled water was dropped onto the surface treatment layer of the article, and the initial water contact angle was measured using a contact angle measuring device (product name "DM-500") manufactured by Kyowa Interface Science Co., Ltd. The average value measured at five points on the surface treatment layer was taken as the water contact angle. The 2θ method was used to calculate the water contact angle. The evaluation criteria are as follows: A: The water contact angle is 107° or more. B: The water contact angle is less than 107°. ​

[0358] <Abrasion Resistance> In accordance with JIS L0849:2013 (corresponding to ISO:105-X12:2001), the surface treatment layer of the article was subjected to a reciprocating traverse test using a reciprocating traverse tester (manufactured by KNT Corporation) with steel wool Bonstar (#0000) reciprocating 10,000 times at a pressure of 98.07 kPa and a speed of 320 cm / min, and the water contact angle after the friction test was measured. The method for measuring the water contact angle after the friction test was the same as the method for measuring the initial water contact angle in the above-mentioned water repellency evaluation method. Abrasion resistance was evaluated based on the degree of decrease in water contact angle after the friction test. The smaller the degree of decrease in water contact angle, the more excellent the abrasion resistance. The evaluation criteria were as follows: Degree of decrease in water contact angle = (initial water contact angle) - (water contact angle after friction test) A: The degree of decrease in water contact angle was 5° or less. B: The degree of decrease in water contact angle was more than 5°.

[0359] <Fingerprint Removability> A 1 kg weight equipped with a 2 cm diameter red rubber stopper to serve as the fingerprint stamp was prepared. Next, 70 μL of artificial fingerprint fluid (manufactured by Isekyu Co., Ltd.) was dropped onto a waste cloth, and the fingerprint stamp was left to adhere to the artificial fingerprint fluid for 1 minute. To remove excess artificial fingerprint fluid from the fingerprint stamp, the fingerprint stamp was left to adhere to a new waste cloth for 20 seconds. The article with the surface treatment layer formed was then placed on a hot plate adjusted to 23°C. The fingerprint stamp was stamped against the surface treatment layer. The article with the artificial fingerprint fluid attached was placed on a sliding device (product name "HHS-2000", manufactured by Shinto Scientific Co., Ltd.). A wiping cloth (Savina Minimax, manufactured by KB Seiren Co., Ltd.) was attached to a flat indenter with an area of ​​1 cm square using double-sided tape, and the article was then placed on the sliding device. The artificial fingerprint fluid attached to the surface treatment layer was wiped off in one direction with the wiping cloth under a load of 50 g. The haze of the wiped area was measured using a haze meter (product name "NDH7000SP", manufactured by Nippon Denshoku Co., Ltd.). The evaluation criteria are as follows. If the evaluation result is B or higher, it can be said that the fingerprint removal ability is excellent. A: The haze value was less than 0.05%. B: The haze value was 0.05% or more but less than 0.1%. C: The haze value was 0.1% or more.

[0360] The evaluation results are shown in Table 1. Examples 1 to 4 are working examples, and Examples 5 to 7 are comparative examples.

[0361]

[0362] As shown in Table 1, it was found that the compounds of Examples 1 to 4 were capable of forming a surface treatment layer that was superior in fingerprint removal properties compared to the compounds of Examples 5 to 7.

[0363] The compounds of the present disclosure are useful as surface treatment agents. The surface treatment agents can be used, for example, for display devices such as touch panel displays, optical elements, semiconductor elements, building materials, automotive parts, and substrates used in nanoimprint technology. The surface treatment agents can also be used for the bodies, window glass (windshields, side glass, and rear glass), mirrors, bumpers, and the like of transportation equipment such as trains, automobiles, ships, and aircraft. Furthermore, the surface treatment agents can be used for outdoor items such as building exterior walls, tents, solar power generation modules, soundproofing panels, and concrete; fishing nets, insect nets, and aquariums. The surface treatment agents can also be used for various indoor facilities such as kitchens, bathrooms, sinks, mirrors, and toilet peripherals; ceramics such as chandeliers and tiles; artificial marble, and air conditioners. The surface treatment agents can also be used for antifouling treatment of jigs, interior walls, piping, and the like in factories. The surface treatment agents can also be used for goggles, eyeglasses, helmets, pachinko machines, textiles, umbrellas, playground equipment, and soccer balls. The surface treatment agents can also be used as anti-adhesion agents for various packaging materials such as food packaging, cosmetic packaging, and the inside of pots. The surface treatment agent can also be used for optical components such as car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio equipment, game machines, eyeglass lenses, camera lenses, lens filters, sunglasses, medical devices such as gastroscopes, copiers, PCs, displays (e.g., liquid crystal displays, organic EL displays, plasma displays, touch panel displays), touch panels, protective films, and antireflection films.

[0364] This application claims priority based on Japanese Patent Application No. 2023-103355, filed on June 23, 2023, the disclosure of which is incorporated herein in its entirety by reference.

Claims

1. A compound represented by formula (1). １ -(Si(R ２ ) ２ -O) ｍ -Si(R ２ ) ２ -L ２ } ｐ -X (1) T is independently (R １ ) ３ Si-, a monovalent cyclic polysiloxane residue or a monovalent cage-shaped polysiloxane residue, R １ are each independently a hydrocarbon group or a trialkylsilyloxy group; L １ are each independently —O— or an alkylene group; R ２ are each independently a hydrocarbon group; L ２ are each independently a single bond, an alkylene group or -O-, and X is -L ３ -A-(Si(R) ｎ L ３－ｎ ) ｑ , or -L ４ - (L ５ -Si(R) ｎ L ３－ｎ ) ｑ And L ３ is -C(R ４ ) ３－ｐ -, -Si(R ５ ) ３－ｐ -, or a (p+1)-valent aromatic or alicyclic group, R ４ and R ５ are each independently a hydrogen atom or a hydrocarbon group, A is a (q+1)-valent linking group, L ４ is a (p+q)-valent aromatic or alicyclic group; L ５ represents a single bond or a divalent linking group, each R is independently a hydrocarbon group, each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, m is a number of 1 or more, n is an integer from 0 to 2, p is 2 or 3, and q is an integer of 1 or more.

2. X is -L ３ -A-(Si(R) ｎ L ３－ｎ ) ｑ 2. The compound of claim 1, 3. L ３ is -Si(R ５ ) ３－ｐ The compound according to claim 2, wherein 4. The compound of claim 1, wherein q is 1 to 4.

5. The compound according to claim 1, wherein m is 2 to 600.

6. A composition comprising a compound according to any one of claims 1 to 5 and a liquid medium.

7. A surface treatment agent comprising the compound according to any one of claims 1 to 5.

8. A surface treatment agent comprising the compound according to any one of claims 1 to 5 and a liquid medium.

9. A method for manufacturing an article, comprising: performing a surface treatment on a substrate using the surface treatment agent according to claim 7; and manufacturing an article having a surface treatment layer formed on the substrate.

10. An article comprising a substrate, and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent according to claim 7.

11. The article of claim 10 which is an optical component.

12. The article according to claim 11, which is a display or a touch panel.

13. A method for manufacturing an article, comprising: performing a surface treatment on a substrate using the surface treatment agent according to claim 8; and manufacturing an article having a surface treatment layer formed on the substrate.

14. An article comprising a substrate, and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent according to claim 8.

15. The article of claim 14 which is an optical component.

16. The article according to claim 15, which is a display or a touch panel.