Support ring for an interlocking process kit for a substrate processing chamber

USD1055006SActive Publication Date: 2024-12-24APPLIED MATERIALS INC

Patent Information

Application Number
US29/831297
Authority / Receiving Office
US · United States
Patent Type
Designs(United States)
Current Assignee / Owner
Filing Date
2022-03-18
Publication Date
2024-12-24
Estimated Expiration
2039-12-24

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Description

[0001] FIG. 1 is a top, front, right isometric view of a support ring for an interlocking process kit for a substrate processing chamber, showing our new design.

[0002] FIG. 2 is a bottom, left, back isometric view thereof.

[0003] FIG. 3 is a top plan view thereof.

[0004] FIG. 4 is a bottom plan view thereof.

[0005] FIG. 5 is a front elevation view thereof.

[0006] FIG. 6 is a back elevation view thereof.

[0007] FIG. 7 is a right side elevation view thereof.

[0008] FIG. 8 is a left side elevation view thereof; and,

[0009] FIG. 9 is an enlarged cross-sectional view taken along line 9-9 in FIG. 3 with the enlargements taken from the dashed-dot encircled portions labeled, “FIG. 9,” in FIG. 3.

[0010] The even dashed broken lines in FIG. 9 represent unclaimed environment and form no part of the claimed design. The dash-dot lines represent the boundary lines of the enlarged portion view of FIG. 9 shown in FIGS. 3 and 9 and form no part of the claimed design.

Claims

The ornamental design for a support ring for an interlocking process kit for a substrate processing chamber, as shown and described.

Citation Information

Patent Citations

  • Gas ring for plasma processing equipment

    CN304826214S

  • Deposition ring for substrate processing chamber

    CN305889712S

  • Edge Ring

    JP1644757S

  • Polishing head cover assembly

    KR301140868S

  • Deposition ring for a substrate processing chamber

    TWD210892S

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