Support ring for an interlocking process kit for a substrate processing chamber
Patent Information
- Application Number
- US29/831297
- Authority / Receiving Office
- US · United States
- Patent Type
- Designs(United States)
- Current Assignee / Owner
- Filing Date
- 2022-03-18
- Publication Date
- 2024-12-24
- Estimated Expiration
- 2039-12-24
Smart Images

Figure USD1055006-D00000_ABST
Description
[0001] FIG. 1 is a top, front, right isometric view of a support ring for an interlocking process kit for a substrate processing chamber, showing our new design.
[0002] FIG. 2 is a bottom, left, back isometric view thereof.
[0003] FIG. 3 is a top plan view thereof.
[0004] FIG. 4 is a bottom plan view thereof.
[0005] FIG. 5 is a front elevation view thereof.
[0006] FIG. 6 is a back elevation view thereof.
[0007] FIG. 7 is a right side elevation view thereof.
[0008] FIG. 8 is a left side elevation view thereof; and,
[0009] FIG. 9 is an enlarged cross-sectional view taken along line 9-9 in FIG. 3 with the enlargements taken from the dashed-dot encircled portions labeled, “FIG. 9,” in FIG. 3.
[0010] The even dashed broken lines in FIG. 9 represent unclaimed environment and form no part of the claimed design. The dash-dot lines represent the boundary lines of the enlarged portion view of FIG. 9 shown in FIGS. 3 and 9 and form no part of the claimed design.
Claims
The ornamental design for a support ring for an interlocking process kit for a substrate processing chamber, as shown and described.
Citation Information
Patent Citations
Gas ring for plasma processing equipment
CN304826214S
Deposition ring for substrate processing chamber
CN305889712S
Edge Ring
JP1644757S
Polishing head cover assembly
KR301140868S
Deposition ring for a substrate processing chamber
TWD210892S
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