Multi-light-source calibration method, laser processing device, numerical control device and computing system

Abstract

A multi-light-source calibration method. The method comprises: by means of a first light source, processing a first pattern (100) on a first object, establishing a first coordinate system on the first object, and determining coordinate values of the first pattern (100) in the first coordinate system; constructing a coordinate mapping relationship between the first coordinate system and a predetermined image coordinate system; by means of a second light source, processing a second pattern (200) on a second object, and obtaining coordinate values of the second pattern (200) in the first coordinate system; according to the coordinate mapping relationship and the coordinate values of the first pattern (100) in the first coordinate system and the coordinate values of the second pattern (200) in the first coordinate system, adjusting a galvanometer parameter of the laser processing device, so that when the first light source and the second light source process the same image, the coordinate values in the same coordinate system are consistent. The present method can improve the processing effect of the multi-light source during laser processing. The present application further relates to a laser processing device, a numerical control device, and a computing system.

Description

Multi-light source calibration method, laser processing equipment, numerical control equipment and computing system

[0001] Cross-references

[0002] The present disclosure claims priority to Chinese patent application No. 2024106184746, filed on May 17, 2024, entitled “Multi-light source calibration method and laser processing equipment”, the entire contents of which are incorporated herein by reference; and claims priority to Chinese patent application No. 2024106184727, filed on May 17, 2024, entitled “Multi-light source calibration method, numerical control equipment and computing system”, the entire contents of which are incorporated herein by reference; and claims priority to Chinese patent application No. 2023105676664, filed on May 18, 2023, entitled “Multi-light source calibration method”, the entire contents of which are incorporated herein by reference. Technical Field

[0003] The present disclosure belongs to the field of laser printing technology, and in particular relates to a multi-light source calibration method, laser processing equipment, numerical control equipment, and a computing system. Background Art

[0004] Currently, most laser processing equipment uses a single light source. Limited by the inherent characteristics of the light source, such laser equipment often struggles to accommodate multiple usage scenarios. Even when two light sources are used and operated on a single focal plane, the different wavelengths of the different light sources lead to different reflection paths and angles, causing the coordinate systems of the respective light sources on the focal plane to not coincide. The coordinate systems corresponding to the respective light sources can experience various differences in rotation, distortion, scaling, and translation, resulting in poor overlay effects when images processed using different light sources are processed.

[0005] Public content

[0006] The present disclosure provides a multi-light source calibration method, laser processing equipment, numerical control equipment and computing system for improving the processing effect of multi-light source laser processing.

[0007] A multi-light source calibration method, the method comprising:

[0008] Processing a first pattern on a first object using a first light source, establishing a first coordinate system on the first object, and determining coordinate values ​​of the first pattern in the first coordinate system;

[0009] Constructing a coordinate mapping relationship between the first coordinate system and a predetermined image coordinate system;

[0010] Processing a second pattern on a second object using a second light source to obtain coordinate values ​​of the second pattern in the first coordinate system;

[0011] The galvanometer parameters of the laser processing equipment are adjusted according to the coordinate mapping relationship and the coordinate values ​​of the first pattern in the first coordinate system and the coordinate values ​​of the second pattern in the first coordinate system, so that when the first light source and the second light source process the same image, the coordinate values ​​in the same coordinate system remain consistent.

[0012] A multi-light source calibration method, the method comprising:

[0013] Determining emission positions of a first light source and a second light source, and determining reflection paths of the first light path and the second light path according to the emission positions, where the first light path is a path of the first light source and the second light path is a path of the second light source;

[0014] adjusting first optical elements on the first optical path and the second optical path so that the first optical path and the second optical path are in a first state on the reflection path, wherein the first state is used to indicate that the first optical path and the second optical path are in a parallel state;

[0015] The second optical elements on the first optical path and the second optical path are adjusted so that the first optical path and the second optical path are in a second state, where the second state is used to indicate that the focus of the outgoing light of the first optical path and the second optical path is in a first plane.

[0016] A laser processing device, comprising:

[0017] Multiple processing light sources;

[0018] A multi-light source calibration device is used to execute the multi-light source calibration method provided by any embodiment of the present disclosure.

[0019] A numerical control device, comprising:

[0020] Multiple lasers for transmitting light paths;

[0021] A plurality of beam expanders, each of which is arranged at the light outlet of the laser and is used to adjust the size of the light beam emitted by the laser;

[0022] A reflector, used to reflect the light path emitted by the laser;

[0023] a galvanometer, used for reflecting the light path reflected by the reflector to a working surface;

[0024] A field lens, located below the galvanometer, for focusing the light path reflected by the galvanometer onto a working plane;

[0025] A control system is electrically connected to the laser and is used to control the numerical control device to implement the method in any embodiment of the present disclosure.

[0026] A computing system for laser processing, wherein the computing system includes at least one numerical control device and at least one processor;

[0027] The processor is configured to execute the steps of the multi-light source calibration method provided in any embodiment of the present disclosure;

[0028] The numerical control machine is used to send out laser processing signals and change the optical path according to the instructions sent out by the processor.

[0029] A computer-readable storage medium stores program instructions, wherein the program instructions, when executed by a processor, implement the multi-light source correction method described in the above embodiment.

[0030] A computing system for laser processing, wherein the computing system comprises:

[0031] at least one processor;

[0032] computer-readable storage medium;

[0033] and program instructions stored on said computer-readable storage medium, said program instructions being executed by at least one of said processors;

[0034] The computing system is configured to execute the multi-light source correction method provided in the above embodiment.

[0035] In the technical solution provided in the embodiment of the present disclosure, a first pattern is processed on a first object by a first light source, a first coordinate system is established on the first object and the coordinate values ​​of the first pattern in the first coordinate system are determined, a coordinate mapping relationship between the first coordinate system and a predetermined image coordinate system is constructed, and the galvanometer parameters of the laser processing equipment are adjusted through the coordinate mapping relationship so that when the first light source and the second light source process the same pattern, the coordinate values ​​in the same coordinate system remain consistent. The present application uses the first coordinate system as the reference coordinate system, so that the coordinate values ​​of the first light source and the second light source are based on the first coordinate system, maintaining the consistency of the coordinate system, and ensuring the uniformity of the coordinate values ​​of each light source when switching the working light source; in the technical solution provided in the embodiment of the present disclosure, by determining the emission positions of the first light source and the second light source, determining the reflection paths of the first light path and the second light path according to the emission positions, controlling the first light path and the second light path to be in a first state on the reflection path, adjusting the second optical element on the reflection path of the first light path and the second light path so that the first light path and the second light path are in a second state, the working range of each light source is the same, and multiple light sources can be used to process the work object without ghosting. When switching different light sources, the width can be corrected according to the corresponding parameters without re-correcting the focus, thereby not affecting the processing accuracy; in the embodiment of the present disclosure, by unifying the coordinate systems of the first light source and the second light source, and correcting the working width, the processing effect of laser processing with multiple light sources is guaranteed. BRIEF DESCRIPTION OF THE DRAWINGS

[0036] In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the following briefly introduces the drawings required for use in the description of the embodiments of the present disclosure. Obviously, the drawings described below are only some embodiments of the present disclosure. For ordinary technicians in this field, other drawings can be obtained based on these drawings without any creative work.

[0037] FIG1 shows a flowchart of the steps of a multi-light source calibration method proposed in an embodiment of the present application.

[0038] FIG2 shows a schematic diagram of a first image printed by a first light source and a first coordinate system.

[0039] FIG3 is a schematic diagram showing the generation of a first coordinate system on a second pattern.

[0040] FIG4 is a schematic flow chart showing a method for calibrating multiple light sources according to an embodiment of the present application.

[0041] FIG5 is a schematic diagram showing the focal positions of the first light path and the second light path provided by an embodiment of the present disclosure.

[0042] FIG6 is a schematic diagram showing the scanning ranges of the first light path and the second light path provided by an embodiment of the present disclosure.

[0043] FIG7 shows a schematic structural diagram of a numerical control device according to an embodiment of the present disclosure.

[0044] Explanation of the accompanying drawings: First pattern 100, x-axis 100-X of the first coordinate system, y-axis 100-Y of the first coordinate system, first positioning point 100-A of the first pattern, second positioning point 100-C of the first pattern, third positioning point 100-B of the first pattern; Second pattern 200, x-axis 200-X on the second pattern, y-axis 200-Y on the second pattern, first positioning point 100-A of the second pattern, second positioning point 100-C of the second pattern, third positioning point 100-B of the second pattern; Control system 400, beam expander 500, laser 410, reflector 420, color separation mirror 430, galvanometer 440, field mirror 450. DETAILED DESCRIPTION

[0045] Example embodiments will now be described more fully with reference to the accompanying drawings. However, example embodiments can be implemented in many forms and should not be construed as limited to the examples set forth herein; rather, these embodiments are provided so that this disclosure will be thorough and complete and will fully convey the concepts of the example embodiments to those skilled in the art.

[0046] In addition, the described features, structures or characteristics may be combined in any suitable manner in one or more embodiments. In the following description, many specific details are provided to provide a full understanding of the embodiments of the present disclosure. However, those skilled in the art will appreciate that the technical solutions of the present disclosure can be practiced without one or more of the specific details, or other methods, components, devices, steps, etc. can be adopted. In other cases, well-known methods, devices, implementations or operations are not shown or described in detail to avoid blurring various aspects of the present disclosure.

[0047] The block diagrams shown in the accompanying drawings are merely functional entities and do not necessarily correspond to physically separate entities. That is, these functional entities may be implemented in software, in one or more hardware modules or integrated circuits, or in different networks and / or processor devices and / or microcontroller devices.

[0048] The flowcharts shown in the accompanying drawings are for illustrative purposes only and do not necessarily include all contents and operations / steps, nor must they be executed in the order described. For example, some operations / steps may be decomposed, while others may be combined or partially combined. Therefore, the actual execution order may vary depending on the actual situation.

[0049] It should be noted that although the steps of the method of the present disclosure are described in a specific order in the drawings, this does not require or imply that the steps must be performed in this specific order, or that all steps must be performed to achieve the desired results. Additionally or alternatively, some steps may be omitted, multiple steps may be combined into one step, and / or one step may be decomposed into multiple steps.

[0050] In one embodiment, FIG1 shows a flow chart of a multi-light source calibration method provided by one embodiment of the present disclosure. As shown in FIG1 , the multi-light source calibration method includes the following steps S110 to S140.

[0051] S110: Processing a first pattern on a first object using a first light source, establishing a first coordinate system on the first object, and determining coordinate values ​​of the first pattern in the first coordinate system.

[0052] Specifically, a first pattern is processed on a first object using a first light source by a laser processing device, and marking points for establishing a first coordinate system are selected in the first pattern. After the first coordinate system is established, the coordinate values ​​of the first pattern are stored based on the first coordinate system.

[0053] The coordinate value of the first pattern refers to position information of the first pattern on the first object, and the position information is established based on the first coordinate system.

[0054] S120: Constructing a coordinate mapping relationship between the first coordinate system and a predetermined image coordinate system.

[0055] Specifically, a predetermined image coordinate system is set on the operating end of the laser processing equipment. For example, a computer, tablet or mobile phone connected to and communicating with the laser processing equipment can be used to control the laser processing equipment. The graphical user interface of the computer, tablet or mobile phone can preview the pattern to be processed. The preview image usually corresponds to a coordinate system, which is the predetermined image coordinate system. The predetermined image coordinate system can be used to display the position of the processing pattern on the processing object.

[0056] However, since the preview position displayed on the operating end may be different from the actual position during processing, in order to ensure the accuracy of the position when processing the pattern, the mapping relationship between the first coordinate system and the predetermined image coordinate system is adjusted during laser processing to ensure the processing effect.

[0057] S130: Process a second pattern on the second object using a second light source to obtain coordinate values ​​of the second pattern in the first coordinate system.

[0058] Specifically, similar to the step of processing the first pattern on the first object with the first light source, the second pattern is processed on the second object by switching the second light source, and a first coordinate system is established on the second pattern to obtain the coordinate values ​​of the second pattern in the first coordinate system.

[0059] In the above embodiment, the first pattern and the second pattern may be rectangular patterns, variable regular patterns or irregular patterns.

[0060] The first pattern and the second pattern may be patterns of the same shape, or patterns of different shapes.

[0061] The first object and the second object can be paper of various colors, wood boards, acrylic materials, etc.

[0062] S140, adjusting the galvanometer parameters of the laser processing equipment according to the coordinate mapping relationship and the coordinate values ​​of the first pattern in the first coordinate system and the coordinate values ​​of the second pattern in the first coordinate system, so that when the first light source and the second light source process the same image, the coordinate values ​​in the same coordinate system remain consistent.

[0063] Specifically, after constructing the coordinate mapping relationship between the first coordinate system and the predetermined image coordinate system, when laser processing is performed through the first light source, the galvanometer parameters of the laser processing equipment are adjusted through the coordinate mapping relationship and the coordinate values ​​of the first pattern in the first coordinate system; when laser processing is performed through the second light source, the galvanometer parameters of the laser processing equipment are adjusted through the coordinate mapping relationship and the coordinate values ​​of the second pattern in the first coordinate system.

[0064] When processing patterns on a processing object, the coordinate values ​​need to be calibrated to ensure that the coordinate positions when processing with different light sources correspond to actual requirements.

[0065] The first light source and the second light source have different wavelengths, and the coordinate positions they map to the processing object are different. Therefore, one of the light sources needs to be used as a positioning standard. In this embodiment, the marking points of the generated coordinate system are obtained based on the first light source, so as to establish a first coordinate system, and the coordinate values ​​of the first pattern and the second pattern in the first coordinate system are obtained respectively, so that the first light source and the second light source both use the first coordinate system as the reference coordinate system. When switching the first light source and the second light source for processing, the uniformity of the processing coordinates is guaranteed. Therefore, when multiple light sources are used to process the same pattern, no ghosting will occur, which guarantees the processing effect of multi-light source laser processing to a certain extent.

[0066] In the present application, a first pattern is processed on a first object by a first light source, a first coordinate system is established on the first object and the coordinate values ​​of the first pattern in the first coordinate system are determined, a coordinate mapping relationship between the first coordinate system and a predetermined image coordinate system is constructed, a second pattern is processed on a second object by a second light source, and the coordinate values ​​of the second pattern in the first coordinate system are obtained, and the galvanometer parameters of the laser processing equipment are adjusted according to the coordinate mapping relationship and the coordinate values ​​of the first pattern in the first coordinate system and the coordinate values ​​of the second pattern in the first coordinate system, so that when the first light source and the second light source have the same pattern, the coordinate values ​​in the same coordinate system remain consistent. The present application uses the first coordinate system as a reference coordinate system, so that the coordinate values ​​of the first light source and the second light source are both based on the first coordinate system, and the coordinate systems are kept consistent. When switching the working light source, the uniformity of the coordinate values ​​of each light source can be guaranteed, and the processed image will not be blurred, thereby improving the processing effect when multiple light sources are used for laser processing.

[0067] Furthermore, S110, processing a first pattern on a first object by using a first light source, establishing a first coordinate system on the first object and determining coordinate values ​​of the first pattern in the first coordinate system, includes:

[0068] S111, obtaining a first positioning point and a second positioning point on the first pattern.

[0069] S113: Determine a third positioning point based on the first positioning point and the second positioning point, where the third positioning point is located on a straight line determined by the first positioning point and the second positioning point and between the first positioning point and the second positioning point.

[0070] S115: Generate a first coordinate system according to the first positioning point, the second positioning point, and the third positioning point, and determine the coordinate value of the first pattern in the first coordinate system.

[0071] In this embodiment, taking the first pattern as a rectangular pattern as an example, the first and second positioning points are both located at the edge of the first pattern. For example, if the first pattern is a rectangular pattern, the first positioning point can be at the leftmost side of the rectangular pattern, and the second positioning point can be at the rightmost side of the rectangular pattern. The x-axis of the first coordinate system is determined by the first and second positioning points.

[0072] A third positioning point is determined in the middle area of ​​the rectangular pattern and at the position of the x-axis. The third positioning point is located at the midpoint of the x-axis, so the third positioning point is the intersection of the x-axis and the y-axis. A first coordinate system is established based on the x-axis and y-axis on the first pattern.

[0073] Taking the first pattern as a circular pattern as an example, the first and second positioning points are located at the outer edge of the circular pattern. The x-axis is determined by the first and second positioning points, and the third positioning point can be determined based on the center of the circular pattern.

[0074] Further, S115, generating a first coordinate system according to the first positioning point, the second positioning point, and the third positioning point, and determining the coordinate value of the first pattern in the first coordinate system, including:

[0075] S1151: Generate a first axis of a first coordinate system based on the first positioning point and the second positioning point.

[0076] S1153: With the third positioning point as the center, generate a second axis perpendicular to the first axis, and obtain a first coordinate system through the first axis and the second axis.

[0077] S1155: Calculate the coordinate value of the first pattern in the first coordinate system according to the first coordinate system.

[0078] Taking the first pattern as a rectangular pattern as an example, FIG2 shows a schematic diagram of the first pattern and the first coordinate system.

[0079] The first positioning point 100-A and the second positioning point 100-C are located at the outer edge area of ​​the first pattern 100, and the third positioning point 100-B is located at the midpoint between the first positioning point 100-A and the second positioning point 100-C.

[0080] The line connecting the first positioning point 100 -A and the second positioning point 100 -C constitutes the x-axis, and the straight line passing through the third positioning point and intersecting the x-axis is the y-axis.

[0081] The first axis is the x-axis, and the second axis is the y-axis.

[0082] The method for calculating the coordinate value of the first pattern in the first coordinate system includes but is not limited to a visual acquisition tool, wherein the visual acquisition tool includes a sensor or a camera installed on the processing equipment.

[0083] At the same time, it can be obtained by manual measurement or measuring with a scanner.

[0084] Furthermore, S120, constructing a coordinate mapping relationship between the first coordinate system and the predetermined image coordinate system includes:

[0085] S121: Acquire coordinate values ​​of a predetermined image coordinate system, and compare differences between the coordinate values ​​of the first coordinate system and the coordinate values ​​of the predetermined image coordinate system.

[0086] S123: Construct a coordinate mapping relationship between the first coordinate system and a predetermined image coordinate system according to the difference.

[0087] Specifically, based on the coordinate values ​​of the first coordinate system and the coordinate values ​​of the predetermined image coordinate system, a corresponding relationship between the two coordinate systems is determined.

[0088] For example, a preset number of marking points are selected in a predetermined image coordinate system and a first coordinate system, the coordinate values ​​of the preset number of marking points in the predetermined image coordinate system and the coordinate values ​​of the preset number of marking points in the first coordinate system are obtained respectively, the difference between the two is calculated, and the coordinate mapping relationship between the first coordinate value and the predetermined image coordinate value is determined according to the difference.

[0089] S130, obtaining coordinate values ​​of the second pattern in the first coordinate system, including:

[0090] S131: Generate a first positioning point, a second positioning point, and a third positioning point in a second pattern using a first light source.

[0091] S133: Generate a first coordinate system on the second pattern according to the first positioning point, the second positioning point, and the third positioning point.

[0092] S135: Based on the first coordinate system, obtain coordinate values ​​of the second pattern in the first coordinate system.

[0093] In this embodiment, by obtaining the coordinate value of the second pattern at the first coordinate, the first light source and the second light source establish a position reference with the first coordinate system, and at the same time, a coordinate mapping relationship between the first coordinate system and the predetermined image coordinate system is established. The coordinates of the first light source or the second light source are corrected using a unified reference, thereby achieving the purpose of using multiple light sources for processing while ensuring the processing effect.

[0094] Taking the second pattern as a rectangular pattern as an example, FIG3 shows a schematic diagram of generating a first coordinate system on the second pattern.

[0095] The first pattern in FIG. 2 and the second pattern in FIG. 3 are for illustration only and should not limit the style or size of the first pattern or the second pattern.

[0096] Specifically, the coordinate value of the positioning point when the first light source establishes the first coordinate system is obtained, and the positioning point with the same coordinate value is generated on the second pattern by the first light source to generate the first coordinate system on the second pattern to obtain the coordinate value of the second pattern in the first coordinate system.

[0097] Furthermore, the coordinate values ​​of the second pattern in the first coordinate system are collected by a visual collection tool, including but not limited to a visual collection tool, wherein the visual collection tool includes a sensor or a camera installed on the processing equipment.

[0098] Alternatively, it can be obtained by manual measurement or measurement with a scanner.

[0099] In FIG3 , the first positioning point 200 -A and the second positioning point 200 -C are located at the outer edge region of the second pattern 200 , and the third positioning point 200 -B is located at the midpoint between the first positioning point 200 -A and the second positioning point 200 -C.

[0100] The line connecting the first positioning point 200 -A and the second positioning point 200 -C constitutes the x-axis, and the straight line passing through the third positioning point and intersecting the x-axis is the y-axis.

[0101] In the second pattern, the positions of the first positioning point, the second positioning point and the third positioning point are consistent with the first positioning point, the second positioning point and the third positioning point in the first pattern. Due to the different wavelengths of the first light source and the second light source, the size and position of the image printed on the processing object may be different.

[0102] In order to maintain consistency between the positioning points in the first pattern and the positioning points in the second pattern, the positions of the first object and the second object are kept the same.

[0103] Furthermore, S140, adjusting the galvanometer parameters of the laser processing equipment according to the coordinate mapping relationship and the coordinate values ​​of the first pattern in the first coordinate system and the coordinate values ​​of the second pattern in the first coordinate system includes:

[0104] S141: Obtain a first adjustment parameter according to the coordinate mapping relationship and the coordinate value of the first pattern in the first coordinate system.

[0105] S143: Obtain a second adjustment parameter according to the coordinate mapping relationship and the coordinate value of the second pattern at the first coordinate.

[0106] S145, when using the first light source for processing, adjusting the galvanometer parameters of the laser processing equipment using the first adjustment parameters.

[0107] S147, when using the second light source for processing, adjusting the galvanometer parameters of the processing equipment using the second adjustment parameters.

[0108] S141-S143 apply to the case where the laser processing equipment uses the first light source to process the processing object. S145-S147 apply to the case where the laser processing equipment uses the second light source to process the processing object.

[0109] It should be noted that the galvanometer parameters of the laser processing equipment can be obtained based on the coordinate mapping relationship and the coordinate values ​​of each light source in the first coordinate system. The position correspondence between the actual coordinate system and the predetermined image coordinate system is obtained through the coordinate mapping relationship and the coordinate values ​​of each light source in the first coordinate system. By unifying the actual coordinate system and the predetermined image coordinate system, the coordinate values ​​of the first light source and the second light source in the same coordinate system are kept consistent when they are in the same image.

[0110] It can be understood that the galvanometer of the laser processing equipment corresponds to a predetermined image coordinate system, representing a theoretical coordinate system, and the first coordinate system represents an actual coordinate system of the first light source or the second light source.

[0111] Because the first and second light sources have different wavelengths, they need to be installed in different locations within the laser processing equipment and physically combined using optical components. However, errors in the installation of the light sources can lead to errors in the combined light from the individual light sources after passing through the optical components, causing the first and second patterns to rotate or shift relative to each other.

[0112] It can be understood that when the first pattern and the second pattern are placed in an overlapping manner, the first pattern and the second pattern do not overlap, which will result in ghosting of the processed pattern.

[0113] In this embodiment, the first light source and the second light source both use the first coordinate system as a reference coordinate system. Even if the wavelengths of different light sources are different and there are deviations between the processing patterns on the processing object, the galvanometer parameters are adjusted through the coordinate mapping relationship so that the processing position of the first light source or the second light source on the processing object is the same as the position displayed in the predetermined image coordinate system. There will be no ghosting in the processed image, thereby ensuring the laser processing effect of multiple light sources.

[0114] Furthermore, the galvanometer parameter is a deflection angle of the galvanometer, and the deflection angle of the galvanometer of the laser processing equipment is reversely corrected by the first adjustment parameter or the second adjustment parameter.

[0115] As an optional implementation, the deflection angle of the galvanometer can be adjusted in the reverse direction according to the displacement data generated by the galvanometer operation controller.

[0116] In this embodiment, by obtaining the displacement data of the galvanometer movement, the displacement data can characterize the difference in the galvanometer parameters between the first coordinate system and the predetermined image coordinate system when comparing the first coordinate system with the predetermined image coordinate system, thereby quickly obtaining the relative relationship between the first coordinate system and the predetermined image coordinate system.

[0117] Furthermore, the first pattern and the second pattern are divided into an array of multiple regions, and the unit spacing of the multiple regions has a corresponding relationship with the deflection angle increment of the galvanometer.

[0118] The first pattern / the second pattern is formed into an array consisting of a plurality of regions, and the unit spacing of each region corresponds to the deflection angle increment of the galvanometer.

[0119] It can be understood that the difference in coordinate values ​​on the first pattern is expressed as an area difference on the array, which is then converted into an adjustment parameter for calibrating the galvanometer.

[0120] S141, obtaining a first adjustment parameter according to the coordinate mapping relationship and the coordinate value of the first pattern in the first coordinate system, including:

[0121] S141a: Obtain a first coordinate difference according to the coordinate mapping relationship and the coordinate value of the first pattern in the first coordinate system. The first coordinate difference is a multiple of the unit spacing of the plurality of regions.

[0122] S141b: Obtain adjustment parameters through the first coordinate difference.

[0123] S143, obtaining a second adjustment parameter according to the coordinate mapping relationship and the coordinate value of the second pattern at the first coordinate, including:

[0124] S143a: Obtain a second coordinate difference according to the coordinate mapping relationship and the coordinate value of the second pattern in the first coordinate system. The second coordinate difference is a multiple of the unit spacing of the plurality of regions.

[0125] S143b: Obtain adjustment parameters through the second coordinate difference.

[0126] Specifically, when the first pattern is a rectangular pattern, the size of the first pattern is N*N, and the value of N is an integer in the range of [5, 50]. The value of N is determined according to the processing accuracy.

[0127] The first light source processes an N*N rectangular pattern on the first object, and the second light source processes an N*N rectangular pattern on the second object. The spacing between the rows and columns of the rectangular pattern corresponds to the increment of the deflection angle of the galvanometer of the laser processing equipment: 1 / N of the maximum deflection angle of the galvanometer. For example, the digital value of the maximum deflection angle of the galvanometer is 65536. When the laser processing equipment prints an N*N matrix pattern, the galvanometer deflects by an angle of 65536 / N for each unit of movement (for example, from the first row and first column to the first row and second column). The first row and first column of the rectangular pattern corresponds to the galvanometer's angle 0 (digital value is 0), and the last row and last column of the rectangular pattern corresponds to the galvanometer's maximum deflection angle (digital value is 65536).

[0128] The first row may be the topmost row of the rectangular pattern, the first column may be the leftmost column of the rectangular pattern, the last row may be the bottommost row of the rectangular pattern, and the last column may be the rightmost column of the rectangular pattern.

[0129] According to the above content, when the first light source is used for processing, the multiple relationship between the first coordinate difference and the unit spacing of the rectangular area is determined, thereby determining the deflection angle of the galvanometer to correct the processing position of the first light source.

[0130] When the second light source is used for processing, the multiple relationship between the second coordinate difference and the unit spacing of the rectangular area is determined, thereby determining the deflection angle of the galvanometer to correct the processing position of the second light source.

[0131] Specifically, the relative relationship between the actual coordinate system and the reference coordinate system is determined according to the relative relationship between the coordinate values ​​of the same coordinate point, and the rotation angle of the galvanometer is adjusted according to the relative relationship.

[0132] Exemplarily, the first image is a rectangular image, and the first positioning information includes the position of the positioning point for establishing a coordinate system on the rectangular image.

[0133] In one embodiment, FIG4 shows a schematic diagram of a multi-light source calibration method provided in one embodiment of the present disclosure. As shown in FIG4 , the multi-light source calibration method includes the following steps S210 to S230.

[0134] S210: Determine emission positions of a first light source and a second light source, and determine reflection paths of a first light path and a second light path according to the emission positions, where the first light path is the path of the first light source and the second light path is the path of the second light source.

[0135] Specifically, the emission positions of the first and second light sources are obtained according to the installation position of the laser emitting component. When the laser emitting component is installed, its position is stored in the controller, and the controller determines the emission positions of the first and second light sources based on its position information.

[0136] After determining the emission positions of the first light source and the second light source, since the installation positions of the optical elements in the laser processing equipment are determined, after determining the emission positions of the first light source and the second light source, the reflection paths of the first light path and the second light path can be determined according to the positions of the optical elements.

[0137] The first light path is the light path formed after the first light source emits. The reflection path of the first light path refers to the path of the first light path passing through various optical elements to reach the focal plane after being emitted. It is presented in the form of a light path.

[0138] The same applies to the second optical path and the reflected path of the second optical path.

[0139] S220, adjusting the first optical elements on the first optical path and the second optical path so that the first optical path and the second optical path are in a first state on the reflection path, where the first state is used to indicate that the first optical path and the second optical path are in a parallel state.

[0140] Specifically, the states of the first optical path and the second optical path can be changed by adjusting the states of various optical elements.

[0141] The first light path or the second light path has multiple states on its reflection path, and parameters of the optical elements corresponding to different states may be different.

[0142] The first state indicates that the first and second optical paths are parallel. When the first and second optical paths are parallel, the focus paths of the first and second optical paths are consistent, reducing the variables of the first and second optical paths. This allows for rapid adjustment of the format and focus based on the parameters of the first and second optical paths, meeting the requirements of laser processing with multiple light sources.

[0143] In this embodiment, the first optical element is adjusted so that the first optical path and the second optical path are in a first state in the reflection path. The first state can indicate that the first optical path and the second optical path are in a parallel state.

[0144] When the first light source emits, the light spot state of the first light path at a certain position is confirmed, and when the second light source emits, the light spot state of the second light path at the same position is confirmed.

[0145] Whether the first light path and the second light path are in a parallel state is determined by the light spot states of the two.

[0146] S230: Adjust the second optical elements in the first optical path and the second optical path so that the first optical path and the second optical path are in a second state, where the second state is used to indicate that the focus of the outgoing light of the first optical path and the second optical path is in the first plane.

[0147] After confirming that the first light path and the second light path are in the first state on the reflection path, the second optical element is adjusted to make the first light path and the second light path in the second state on the reflection path.

[0148] When the first optical path and the second optical path are in the first state and the second state at the same time, it means that the light paths emitted by the first light source and the second light source are parallel on the reflection path, and the focal points of the two light paths are in the same plane after passing through the galvanometer.

[0149] Because the wavelength of the first light source is different from that of the second light source, and the divergence angles of the light source emitting elements are different, after the first light path and the second light path pass through the focusing element, the focal points of the first light path and the second light path are not on the same plane, that is, the processing planes of the first light path and the second light path are different, which will affect the display effect of the processed image and may cause ghosting or blurring.

[0150] Therefore, it is necessary to adjust the second optical element so that the focus of the light emitted from the first optical path and the focus of the light emitted from the second optical path are in the same plane.

[0151] Optionally, the focus of one of the optical paths is selected as the reference focus, and it is only necessary to adjust the beam parameters of the other optical path so that the focus of the optical path is in the same plane as the reference focus after passing through the focusing element.

[0152] FIG5 is a schematic diagram showing the focus positions of the first light path and the second light path.

[0153] The first light path and the second light path are respectively emitted by the laser 410 , and the light beams respectively pass through the beam expander 500 , the reflector 420 , the dichroic mirror 430 , the galvanometer 440 , and the field lens 450 and then focus on the plane.

[0154] As shown in FIG5 , the working distance of the first optical path is WD1 , and the working distance of the second optical path is WD2 , and the focal points of the two are not in the same plane.

[0155] After adjustment using the above method, as shown in the right figure of FIG5 , the working distance of the first optical path and the working distance of the second optical path are both WD3.

[0156] It should be noted that adjusting the parameters of the second optical element will not change the reflection path of each optical path, but will affect the working distance of the optical path. Due to the determinism of the reflection path, when the focus of the first optical path and the focus of the second optical path are on the same plane, they are actually located at the same position on the same plane.

[0157] Working distance refers to the distance between the focusing element and the focusing plane.

[0158] In this embodiment, by determining the emission positions of the first light source and the second light source, determining the reflection paths of the first light path and the second light path according to the emission positions, controlling the first light path and the second light path to be in a first state on the reflection path, adjusting the second optical element on the reflection path of the first light path and the second light path, so that the first light path and the second light path are in a second state, the second state indicates that the focus of the outgoing light of the first light path and the focus of the outgoing light of the second light path are in a first plane, when the focuses of the first light path and the second light path are both in the first plane, it indicates that the working planes of the first light path and the second light path are the same, in order to make the first light path and the second light path both In order to process the processing object, it is necessary to ensure that the scanning range of the first light path is the same as the scanning range of the second light path, and the scanning range of the first light path on the first plane is determined as the reference format. According to the size and position of the reference format, the scanning range of the second light path on the first plane is made the same as the reference format by adjusting the galvanometer parameters, thereby achieving the same working format as the first light path and the second light path. Therefore, multiple light sources can be used to process the processing object without ghosting, and there is no need to re-calibrate the focus when switching the light source, which will not affect the processing accuracy, thereby improving the processing effect of multi-light source processing to a certain extent.

[0159] Furthermore, the reflection path includes a galvanometer, and after controlling the first light path and the second light path to be in the first state or the second state on the reflection path, the method further includes:

[0160] The scanning range of the first light path on the first plane is determined as a reference format, and the galvanometer parameters are adjusted based on the reference format so that the scanning range of the second light path on the first plane coincides with the reference format.

[0161] Specifically, after adjusting the focus of the first optical path and the focus of the second optical path to be in the same plane, first determine the reference format, and then adjust the galvanometer parameters according to the reference format so that the scanning range of the first optical path or the second optical path coincides with the reference format.

[0162] Optionally, a scanning range of the first optical path on the first plane is determined as a reference plane.

[0163] Switch to the second light source and emit a second light path. On this basis, adjust the galvanometer parameters to match the wavelength of the second light source and the beam size of the second light path, so that the scanning range of the second light path on the first plane is the same as the reference format.

[0164] As an optional implementation, determining the scanning range of the first light path on the first plane as a reference format, and adjusting the galvanometer parameters of the galvanometer based on the reference format so that the scanning range of the second light path on the first plane coincides with the reference format, including:

[0165] The scanning range of the first light path on the first plane is determined according to the wavelength of the first light source and the current galvanometer parameters, and the scanning range is determined as the reference format.

[0166] Based on the reference format, the galvanometer parameters are adjusted according to the wavelength of the second light source so that the scanning range of the second light path on the first plane coincides with the reference format.

[0167] Specifically, the galvanometer parameters refer to the working parameters of the galvanometer, such as the swing angle or reflection angle of the galvanometer; the galvanometer is composed of two reflectors in different directions, and the reflection angles of the reflectors located on different axes determine the scanning range of the laser beam on the focal plane.

[0168] When the scanning ranges of the two light sources are the same, no image blur or ghosting will occur during image processing, which not only meets the use requirements of multi-light source processing but also ensures the processing effect of multi-light source processing.

[0169] As an optional embodiment, the wavelength of the first light source is smaller than the wavelength of the second light source, and based on the reference format, the galvanometer parameters are adjusted according to the wavelength of the second light source so that the scanning range of the second light path on the first plane coincides with the reference format, including:

[0170] Under the same galvanometer parameters, the scanning range of the first light path on the first plane and the scanning range of the second light path on the first plane are acquired.

[0171] According to the difference between the scanning range of the first light path and the scanning range of the second light path, the galvanometer parameters of the second light source are adjusted when the second light source is working, so that the scanning range of the second light path on the first plane coincides with the reference format.

[0172] When the wavelength is larger, the scanning range on the focal plane is larger. As an optional embodiment, the first light source can be blue light and the second light source can be infrared light.

[0173] Optionally, a working format with a smaller scanning range is used as a reference format. Specifically, the scanning range of the first optical path and the scanning range of the second optical path are first obtained under the same galvanometer parameters, and then according to the difference between the scanning range of the first optical path and the scanning range of the second optical path, the galvanometer parameters of the second optical path when passing through are adjusted in reverse so that the scanning range of the second optical path on the first plane coincides with the reference format.

[0174] In this embodiment, the reference format is first determined, and based on the difference between the scanning range of the first optical path and the scanning range of the second optical path, the galvanometer parameters are reversely adjusted according to the difference between the reference format and the scanning format, so that the scanning range of the other optical path is the same as the reference format. In addition, based on the relationship between the wavelength size and the band width of the scanning range, a certain optical path is directionally adjusted to achieve the effect of quickly correcting the scanning range.

[0175] FIG6 is a schematic diagram showing the scanning ranges of the first optical path and the second optical path.

[0176] As shown in the left figure of Figure 6, the wavelengths of the first and second light sources are different, so their scanning ranges are also different. The scanning range of the first light path is mat1, and the scanning range of the second light path is mat2. Using the above method, the scanning ranges of the two are adjusted to be the same, that is, the scanning range of both is mat3.

[0177] As shown in the right figure of FIG6 , after adjustment, the scanning range of the first optical path and the second optical path are both mat3.

[0178] It should be noted that the first and second light sources have different wavelengths, different deflection angles of the emitted light beams, and different scanning ranges formed by the galvanometer mirror on the focal plane. To ensure that the scanning ranges of the first and second optical paths are the same, the galvanometer mirror parameters corresponding to the first and second optical paths must be different.

[0179] As an optional implementation, the first optical element is a reflector.

[0180] Furthermore, S220, adjusting the first optical element in the first optical path and the second optical path so that the first optical path and the second optical path are in a first state on the reflection path includes:

[0181] An angle of the first reflector on the first optical path and an angle of the second reflector on the second optical path are adjusted so that the first optical path and the second optical path are in a first state at a first position and a second position of the reflection path.

[0182] On the reflection path, a distance between the first position and the emission positions of the first light source and the second light source is smaller than a distance between the second position and the emission positions of the first light source and the second light source.

[0183] The first position and the second position can be determined according to the specific positions of corresponding optical elements in the laser processing equipment.

[0184] For example, if the corresponding optical element is a galvanometer, the first position may be located at the light entrance of the galvanometer, and the second position may be located 500 mm away from the light entrance of the galvanometer.

[0185] As an optional embodiment, the second optical element is a beam expander. Further, S230, adjusting the second optical elements in the first optical path and the second optical path so that the first optical path and the second optical path are in the second state includes:

[0186] By adjusting the divergence angle of the first beam expander on the first optical path, the size of the light beam on the first optical path passing through the galvanometer is changed.

[0187] Specifically, the divergence angle of the first beam expander on the first light path is adjusted by the wavelength of the first light source, thereby changing the size of the light beam on the first light path passing through the galvanometer.

[0188] By adjusting the divergence angle of the second beam expander on the second optical path, the size of the light beam on the second optical path passing through the galvanometer is changed.

[0189] Specifically, the divergence angle of the second beam expander on the second light path is adjusted by the wavelength of the second light source, thereby changing the size of the light beam on the second light path passing through the galvanometer.

[0190] As an optional implementation, the optical parameters of the first beam expander are different from the optical parameters of the second beam expander.

[0191] Based on the correspondence between wavelength and the divergence angle of the collimator, the light beam size of the first light path and the light beam size of the second light source passing through the collimator are adjusted according to the wavelength of the first light source and the collimator, and the focal planes of the first light path and the second light path through the focusing element are changed, and the focus of the output light of the two is on the first plane.

[0192] This embodiment provides a laser processing device, including:

[0193] Multiple processing light sources;

[0194] The multi-light source calibration device is used to execute the multi-light source calibration method provided in the above embodiment.

[0195] Specifically, the processing light source is emitted by a laser, and there may be multiple processing light sources. The processing light sources are electrically connected to a multi-light source calibration device, and the multi-light source calibration device controls the switching of the processing light sources. The multi-light source calibration device is also used to perform the multi-light source calibration method provided in the above embodiment.

[0196] FIG7 shows a schematic diagram of the structure of a numerical control device provided by an embodiment of the present disclosure. As shown in FIG7 , the numerical control device includes:

[0197] Multiple lasers 410 are used for transmitting light paths.

[0198] A plurality of beam expanders 500 are provided at the light outlet of the laser 410 and are used to adjust the size of the light beam emitted by the laser 410 .

[0199] The reflector 420 is used to reflect the light emitted by the laser 410 .

[0200] The galvanometer 440 is used to reflect the light path reflected by the reflector 420 to the working surface.

[0201] The field lens 450 is located below the galvanometer mirror 440 and is used to focus the light path reflected by the galvanometer mirror 440 on the working plane.

[0202] The control system 400 is electrically connected to the laser 410 and is used to control the numerical control device to implement the above-mentioned multi-light source calibration method.

[0203] The control system 400 can control the laser 410 to emit a laser beam and implement the multi-light source calibration method provided in this embodiment.

[0204] Furthermore, the numerical control device also includes a dichroic mirror 430, which has the function of separating the light beam into a specific light path direction, allowing a light beam of a certain wavelength to pass completely, and achieving almost complete reflection of light beams of some wavelengths.

[0205] The beam expander 500 is mounted on the laser 410 and is capable of changing the beam size of the emitted laser beam.

[0206] The transmitting mirror 420 is used to reflect the light beam emitted by the laser 410 to a focusing point.

[0207] The function of the galvanometer 440 is to reflect the light beam onto the working surface. The galvanometer 440 is generally composed of an x-scanning galvanometer 440 and a y-scanning galvanometer 440. The laser beam is reflected from the x-scanning galvanometer 440 to the y-scanning galvanometer 440. The two scan along the x-axis and y-axis respectively, thereby achieving the deflection of the laser beam. The laser beam is moved according to a preset pattern to realize the transformation of the scanning pattern and finally form a processing pattern.

[0208] The field lens 450 generally refers to an F-Theta focusing lens, which focuses the light beam reflected by the galvanometer mirror 440 on a plane.

[0209] This embodiment provides a computing system for laser processing, the computing system including at least one numerical control device and at least one processor;

[0210] The processor is used to execute the steps of the multi-light source calibration method provided in the above embodiment;

[0211] The CNC machine is used to send out laser processing signals and change the optical path through instructions sent by the processor.

[0212] This embodiment provides a computer-readable storage medium having program instructions stored thereon. When the program instructions are executed by a processor of a computer, the multi-light source correction method described above is implemented.

[0213] This embodiment provides a computing system for laser processing, including:

[0214] at least one processor;

[0215] computer-readable storage medium;

[0216] and program instructions stored on a computer-readable storage medium, the program instructions being executed by at least one processor. The computing system is configured to execute the multi-light source calibration method provided by the above embodiment.

[0217] In particular, according to an embodiment of the present disclosure, the processes described in the various method flow charts can be implemented as computer software programs. For example, an embodiment of the present disclosure includes a computer program product comprising a computer program carried on a computer-readable medium, the computer program containing program code for executing the methods shown in the flow charts. In such an embodiment, the computer program can be downloaded and installed from a network via a communication portion, and / or installed from a removable medium. When the computer program is executed by a central processing unit, the various functions defined in the system of the present disclosure are performed.

[0218] It should be noted that the computer-readable storage medium shown in the embodiments of the present disclosure may be a computer-readable signal medium, etc., including but not limited to electrical, magnetic, optical, electromagnetic, infrared, or semiconductor systems, devices or devices, or any combination thereof. More specific examples of computer-readable storage media may include but are not limited to: an electrical connection with one or more wires, a portable computer disk, a hard disk, a random access memory (RAM), a read-only memory (ROM), an erasable programmable read-only memory (EPROM), a flash memory, an optical fiber, a portable compact disk read-only memory (CD-ROM), an optical storage device, a magnetic storage device, or any suitable combination thereof. In the present disclosure, a computer-readable storage medium may be any tangible medium containing or storing a program that can be used by or in conjunction with an instruction execution system, device or device. In the present disclosure, a computer-readable signal medium may include a data signal propagated in baseband or as part of a carrier wave, which carries a computer-readable program code. Such a propagated data signal may take a variety of forms, including but not limited to an electromagnetic signal, an optical signal, or any suitable combination thereof. The computer-readable signal medium may also be any computer-readable medium other than a computer-readable storage medium, which may send, propagate, or transmit a program for use by or in conjunction with an instruction execution system, device, or component. The program code contained on the computer-readable medium may be transmitted using any appropriate medium, including but not limited to wireless, wired, or the like, or any suitable combination thereof. The terms "first" and "second" in the above-mentioned modules / units are merely used to distinguish between different modules / units and are not used to define which module / unit has a higher priority or other limiting meanings. In addition, the terms "including" and "having" and any variations thereof are intended to cover non-exclusive inclusions. For example, a process, method, system, product, or device that includes a series of steps or modules need not be limited to those steps or modules clearly listed, but may include other steps or modules that are not clearly listed or that are inherent to these processes, methods, products, or devices. The division of modules that appears in this disclosure is merely a logical division, and other division methods may be used when implemented in actual applications.

[0219] Other embodiments of the present disclosure will readily occur to those skilled in the art after considering the specification and practicing the invention disclosed herein. This disclosure is intended to cover any variations, uses, or adaptations of the present disclosure that follow the general principles of the present disclosure and include common knowledge or customary techniques in the art not disclosed herein.

[0220] The above embodiments are only used to illustrate the technical solutions of the present disclosure, rather than to limit them. Although the present disclosure has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or make equivalent replacements for some of the technical features therein. These modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the various embodiments of the present disclosure, and should all be included in the scope of protection of the present disclosure.

Claims

1. A multi-light source calibration method, wherein: The method comprises: Processing a first pattern on a first object by using a first light source, establishing a first coordinate system on the first object and determining coordinate values ​​of the first pattern in the first coordinate system; Constructing a coordinate mapping relationship between the first coordinate system and a predetermined image coordinate system; Processing a second pattern on a second object by using a second light source, and acquiring coordinate values ​​of the second pattern in the first coordinate system; The galvanometer parameters of the laser processing equipment are adjusted according to the coordinate mapping relationship and the coordinate values ​​of the first pattern in the first coordinate system and the coordinate values ​​of the second pattern in the first coordinate system, so that when the first light source and the second light source process the same image, the coordinate values ​​in the same coordinate system remain consistent.

2. The multi-light source calibration method according to claim 1, wherein: The step of processing a first pattern on a first object by using a first light source, establishing a first coordinate system on the first object, and determining coordinate values ​​of the first pattern in the first coordinate system includes: Acquire a first positioning point and a second positioning point on the first pattern; Determine a third positioning point based on the first positioning point and the second positioning point, wherein the third positioning point is located on a straight line determined by the first positioning point and the second positioning point and between the first positioning point and the second positioning point; The first coordinate system is generated according to the first positioning point, the second positioning point and the third positioning point, and the coordinate value of the first pattern in the first coordinate system is determined.

3. The multi-light source calibration method according to claim 2, wherein: The generating the first coordinate system according to the first positioning point, the second positioning point and the third positioning point, and determining the coordinate value of the first pattern in the first coordinate system includes: Generate a first axis of the first coordinate system based on the first positioning point and the second positioning point; Taking the third positioning point as the center, generating a second axis perpendicular to the first axis, and obtaining the first coordinate system through the first axis and the second axis; According to the first coordinate system, coordinate values ​​of the first pattern in the first coordinate system are calculated.

4. The multi-light source calibration method according to claim 2, wherein: The step of constructing a coordinate mapping relationship between the first coordinate system and a predetermined image coordinate system includes: Acquire the coordinate value of the predetermined image coordinate system, and compare the difference between the coordinate value of the first coordinate system and the coordinate value of the predetermined image coordinate system; A coordinate mapping relationship between the first coordinate system and the predetermined image coordinate system is constructed according to the difference.

5. The multi-light source calibration method according to claim 2, wherein: The step of processing a second pattern on a second object by using a second light source to obtain coordinate values ​​of the second pattern in the first coordinate system includes: Generate the first positioning point, the second positioning point and the third positioning point in the second pattern by using the first light source; generating the first coordinate system on the second pattern according to the first positioning point, the second positioning point and the third positioning point; Based on the first coordinate system, coordinate values ​​of the second pattern in the first coordinate system are acquired.

6. The multi-light source calibration method according to claim 1, wherein: The acquiring, based on the first coordinate system, a coordinate value of the second pattern in the first coordinate system includes: The coordinate value of the second pattern in the first coordinate system is acquired by a visual acquisition tool.

7. The multi-light source calibration method according to claim 1, wherein: The adjusting the galvanometer parameters of the laser processing equipment according to the coordinate mapping relationship and the coordinate value of the first pattern in the first coordinate system and the coordinate value of the second pattern in the first coordinate system includes: Obtaining a first adjustment parameter according to the coordinate mapping relationship and a coordinate value of the first pattern in the first coordinate system; Obtaining a second adjustment parameter according to the coordinate mapping relationship and a coordinate value of the second pattern at the first coordinate; When using the first light source for processing, adjusting the galvanometer parameters of the laser processing equipment by using the first adjustment parameters; When the second light source is used for processing, the galvanometer parameters of the processing equipment are adjusted by using the second adjustment parameters.

8. The multi-light source calibration method according to claim 7, wherein: The galvanometer parameter is a deflection angle of the galvanometer, and the deflection angle of the galvanometer of the laser processing equipment is reversely corrected by using the first adjustment parameter or the second adjustment parameter.

9. The multi-light source calibration method according to claim 8, wherein: Dividing the first pattern and the second pattern into an array of multiple regions, wherein the unit spacing of the multiple regions corresponds to the deflection angle increment of the galvanometer; The obtaining a first adjustment parameter according to the coordinate mapping relationship and the coordinate value of the first pattern in the first coordinate system includes: Obtaining a first coordinate difference value according to the coordinate mapping relationship and the coordinate value of the first pattern in the first coordinate system, wherein the first coordinate difference value has a multiple relationship with the unit spacing of the plurality of regions; The adjustment parameter is obtained through the first coordinate difference. The obtaining a second adjustment parameter according to the coordinate mapping relationship and the coordinate value of the second pattern at the first coordinate includes: Obtaining a second coordinate difference value according to the coordinate mapping relationship and the coordinate value of the second pattern in the first coordinate system, wherein the second coordinate difference value has a multiple relationship with the unit spacing of the plurality of regions; The adjustment parameter is obtained through the second coordinate difference.

10. A multi-light source calibration method, wherein: The method comprises: Determine emission positions of a first light source and a second light source, and determine reflection paths of the first light path and the second light path according to the emission positions, wherein the first light path is a path of the first light source, and the second light path is a path of the second light source; Adjusting the first optical element on the first optical path and the second optical path so that the first optical path and the second optical path are in a first state on the reflection path, wherein the first state is used to indicate that the first optical path and the second optical path are in a parallel state; The second optical elements on the first optical path and the second optical path are adjusted so that the first optical path and the second optical path are in a second state, wherein the second state is used to indicate that the focus of the outgoing light of the first optical path and the second optical path is in a first plane.

11. The multi-light source calibration method according to claim 10, wherein: The reflection path includes a galvanometer, and after controlling the first light path and the second light path to be in a first state or a second state on the reflection path, the method further includes: The scanning range of the first light path on the first plane is determined as a reference format, and the galvanometer parameters of the galvanometer are adjusted based on the reference format so that the scanning range of the second light path on the first plane coincides with the reference format.

12. The multi-light source calibration method according to claim 10, wherein: The first optical element is a reflector, and adjusting the first optical element on the first optical path and the second optical path so that the first optical path and the second optical path are in a first state on the reflection path includes: adjusting an angle of the first reflector on the first optical path and an angle of the second reflector on the second optical path so that the first optical path and the second optical path are in a first state at a first position and a second position on the reflection path.

13. The multi-light source calibration method according to claim 12, wherein: On the reflection path, a distance between the first position and an emission position of the first light source and the second light source is smaller than a distance between the second position and an emission position of the first light source and the second light source.

14. The multi-light source calibration method according to claim 10, characterized in that: The second optical element is a beam expander, and the adjusting the second optical elements on the first optical path and the second optical path so that the first optical path and the second optical path are in a second state comprises: By adjusting the divergence angle of the first beam expander on the first optical path, the size of the light beam on the first optical path passing through the galvanometer is changed; By adjusting the divergence angle of the second beam expander on the second optical path, the size of the light beam on the second optical path passing through the galvanometer is changed.

15. The multi-light source calibration method according to claim 14, wherein: The step of changing the size of the light beam passing through the galvanometer on the first light path by adjusting the divergence angle of the first beam expander on the first light path comprises: Adjusting the divergence angle of the first beam expander on the first light path by the wavelength of the first light source, thereby changing the size of the light beam on the first light path passing through the galvanometer; The step of changing the size of the light beam on the second light path passing through the galvanometer by adjusting the divergence angle of the second beam expander on the second light path comprises: The divergence angle of the second beam expander on the second light path is adjusted by the wavelength of the second light source, so as to change the size of the light beam on the second light path passing through the galvanometer.

16. The multi-light source calibration method according to any one of claims 14 to 15, wherein: The optical parameters of the first beam expander are different from the optical parameters of the second beam expander.

17. The multi-light source calibration method according to any one of claims 11, wherein: The step of determining the scanning range of the first optical path on the first plane as a reference format, and adjusting the galvanometer parameters of the galvanometer based on the reference format so that the scanning range of the second optical path on the first plane coincides with the reference format, comprises: Determine a scanning range of the first light path on the first plane according to the wavelength of the first light source and current galvanometer parameters, and determine the scanning range as a reference format; Based on the reference format, the galvanometer parameters are adjusted according to the wavelength of the second light source so that the scanning range of the second light path on the first plane coincides with the reference format.

18. The multi-light source calibration method according to claim 17, wherein: The wavelength of the first light source is smaller than the wavelength of the second light source, and the adjusting the galvanometer parameters according to the wavelength of the second light source based on the reference format so that the scanning range of the second light path on the first plane coincides with the reference format includes: Under the same galvanometer parameters, acquiring a scanning range of the first light path on the first plane and a scanning range of the second light path on the first plane; According to the difference between the scanning range of the first optical path and the scanning range of the second optical path, the galvanometer parameters of the second light source when working are adjusted so that the scanning range of the second optical path on the first plane coincides with the reference format.

19. A numerical control device, wherein: The numerical control equipment comprises: A plurality of lasers for transmitting an optical path; A plurality of beam expanders, each of which is arranged at a light outlet of the laser and is used to adjust the size of the light beam emitted by the laser; A reflector, used to reflect the light path emitted by the laser; A galvanometer, used for reflecting the light path reflected by the reflector to a working surface; A field lens, located below the galvanometer, for focusing the light path reflected by the galvanometer onto a working plane; A control system, the control system is electrically connected to the laser, and is used to control the numerical control device to implement the steps of the multi-light source calibration method of any one of claims 1-9 or the steps of the multi-light source calibration method of any one of claims 10-18.

20. A laser processing device, wherein: include: Multiple processing light sources; A multi-light source calibration device, used to execute the multi-light source calibration method according to any one of claims 1 to 9 or the multi-light source calibration method according to any one of claims 10 to 18.

21. A computing system for laser processing, wherein: The computing system includes at least one numerical control device and at least one processor; The processor is used to execute the multi-light source correction method according to any one of claims 1 to 9 or the multi-light source correction method according to any one of claims 10 to 18; The numerical control machine is used to send out laser processing signals and change the optical path through instructions sent out by the processor.

22. A computing system for laser processing, wherein: The computing system includes at least one numerical control device and at least one processor; The processor is used to execute the multi-light source calibration method according to any one of claims 1 to 9 and to execute the multi-light source calibration method according to any one of claims 10 to 18; The numerical control machine is used to send out laser processing signals and change the optical path through instructions sent out by the processor.

23. A computer-readable storage medium, wherein: The computer-readable storage medium stores program instructions, and when the program instructions are executed by the processor, the multi-light source correction method according to any one of claims 1 to 9 or the multi-light source correction method according to any one of claims 10 to 18 is implemented.

24. A computing system for laser processing, wherein: The computing system comprises: at least one processor; computer readable storage medium; and program instructions stored on said computer-readable storage medium, said program instructions being executed by at least one of said processors; The computing system is configured to: execute the multi-light source correction method according to any one of claims 1 to 9 or the multi-light source correction method according to any one of claims 10 to 18.

Images