Exposure device and exposure method of exposure device

Abstract

An exposure device and an exposure method of the exposure device. The exposure device (1) comprises an upper exposure assembly (10) and a lower exposure assembly (20). The upper exposure assembly (10) comprises an upper workbench (11), upper suction members (12) and an upper exposure member (13), the upper suction members (12) are vertically movably arranged on the upper workbench (11), and the upper exposure member (13) is arranged on the upper workbench (11). The lower exposure assembly (20) comprises a lower workbench (21), lower suction members (22) and a lower exposure member (23), the lower workbench (21) and the upper workbench (11) are oppositely arranged in a vertical direction, the lower suction members (22) are vertically movably arranged on the lower workbench (21), and the lower exposure member (23) is arranged on the lower workbench (21). The lower exposure assembly (20) is located below the upper exposure assembly (10), and the lower exposure assembly (20) and the upper exposure assembly (10) can move relative to each other.

Description

Exposure device and exposure method thereof

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to the Chinese patent application filed with the State Intellectual Property Office of China on August 17, 2023, with application number 202311042610.3 and entitled “Exposure device and exposure method of exposure device”, the entire contents of which are incorporated by reference into this application. Technical Field

[0003] The present application relates to the technical field of exposure equipment, and in particular to an exposure equipment and an exposure method of the exposure equipment. Background Art

[0004] In the related art, double-sided exposure of substrates is typically achieved by placing a flipper between two single-stage exposure devices. However, this setup occupies a large area, is costly, and has low production capacity. Furthermore, there is a risk of the double-sided glass exposure device scratching the substrate, resulting in a low exposure yield.

[0005] Public content

[0006] The present application aims to solve at least one of the technical problems existing in the prior art. To this end, the present application proposes an exposure device that can reduce the area occupied by the exposure device, reduce costs, increase production capacity, and prevent the glass double-sided exposure machine from scratching the substrate, thereby improving the yield rate.

[0007] The present application further proposes an exposure method of an exposure device.

[0008] According to the exposure equipment of the present application, it includes: an upper exposure component, the upper exposure component includes: an upper workbench, an upper adsorption component and an upper exposure component, the upper adsorption component can be arranged on the upper workbench so as to be movable up and down, and the upper exposure component is arranged on the upper workbench; and a lower exposure component, the lower exposure component is located below the upper exposure component, and the lower exposure component and the upper exposure component can be moved relative to each other, the lower exposure component includes: a lower workbench, a lower adsorption component and a lower exposure component, the lower workbench and the upper workbench are arranged relative to each other up and down, the lower adsorption component can be arranged on the lower workbench so as to be movable up and down, and the lower exposure component is arranged on the lower workbench.

[0009] According to the exposure equipment of the present application, by arranging an upper exposure component and a lower exposure component on the exposure equipment, the upper and lower surfaces of the substrate can be exposed separately without flipping the substrate. There is no need to use a flip machine to flip the substrate, which can reduce the space occupied by the exposure equipment, reduce costs, and improve production capacity. It can also prevent the glass double-sided exposure machine from scratching the substrate, thereby improving the yield rate.

[0010] In some examples of the present application, the exposure device further includes: a first driving member, which is driven to cooperate with the upper exposure component; and a second driving member, which is driven to cooperate with the lower exposure component.

[0011] In some examples of the present application, a first suction cup is provided on the side of the upper workbench facing the lower workbench, and a second suction cup is provided on the side of the lower workbench facing the upper workbench, and both the first suction cup and the second suction cup are used to adsorb the substrate.

[0012] In some examples of the present application, a first through hole is opened on the upper workbench, and the upper adsorption member passes through the first through hole; and a second through hole is opened on the lower workbench, and the lower adsorption member passes through the second through hole.

[0013] In some examples of the present application, there are multiple first through holes, and the multiple first through holes are arranged at intervals on the upper workbench; and there are multiple second through holes, and the multiple second through holes are arranged at intervals on the lower workbench.

[0014] In some examples of the present application, the upper exposure member is connected to one end of the upper workbench in the left-right or front-back direction, and the lower exposure member is connected to the other end of the lower workbench in the left-right or front-back direction.

[0015] In some examples of the present application, the exposure device further includes: a first alignment member, which is arranged at an end of the upper exposure member away from the upper workbench; and a second alignment member, which is arranged at an end of the lower exposure member away from the lower workbench.

[0016] In some examples of the present application, the exposure device also includes: a first transport member, which is movably disposed at the upper workbench to transport the substrate to the upper workbench; and a second transport member, which is movably disposed at the lower workbench to transport the substrate to the lower workbench.

[0017] In some examples of the present application, the first transport member and the second transport member each include: an upper suction cup, a lower suction cup and a transport frame, the upper suction cup is arranged at the upper end of the transport frame, and the lower suction cup is arranged at the lower end of the transport frame.

[0018] In some examples of the present application, the exposure device further includes: a third driving member, wherein the third driving member is driven to cooperate with the transport frame.

[0019] The exposure method of the exposure equipment according to the present application includes: the upper workbench and / or the lower workbench move in a direction away from each other, and a substrate is placed on the upper workbench and / or the lower workbench; the upper workbench and / or the lower workbench move in a direction close to each other, and one of the upper exposure member and the lower exposure member exposes one side of the substrate; the substrate on the upper workbench is exchanged to the lower workbench, and / or the substrate on the lower workbench is exchanged to the upper workbench; the upper workbench and / or the lower workbench move in a direction away from each other, and the other of the upper exposure member and the lower exposure member exposes the other side of the substrate; and the substrate is moved away from the upper workbench and / or the lower workbench.

[0020] In some examples of the present application, there is one substrate, and the steps of exchanging the substrate on the upper workbench to the lower workbench, and / or exchanging the substrate on the lower workbench to the upper workbench include: the upper adsorption component moves downward or the lower adsorption component moves upward to adsorb the substrate on the relative workbench; and the upper adsorption component contracts upward or the lower adsorption component contracts downward, and the upper workbench or the lower workbench adsorbs the substrate.

[0021] In some examples of the present application, there are two substrates, and the two substrates are respectively arranged on the upper workbench and the lower workbench, and the steps of exchanging the substrate on the upper workbench to the lower workbench and / or exchanging the substrate on the lower workbench to the upper workbench include: temporarily moving the substrate on one of the upper workbench and the lower workbench; the adsorption component corresponding to the one of the upper workbench and the lower workbench adsorbs the substrate on the other of the upper workbench and the lower workbench, and transfers it to the one of the upper workbench and the lower workbench; transporting the temporarily moved substrate to the upper end or lower end of the other of the upper workbench and the lower workbench; and the adsorption component corresponding to the other of the upper workbench and the lower workbench adsorbs the temporarily moved substrate and transfers it to the other of the upper workbench and the lower workbench.

[0022] In some examples of the present application, the exposure equipment also includes: the first alignment member and the second alignment member, characterized in that, after the step of moving the upper work table and / or the lower work table away from each other to place the substrate on the upper work table and / or the lower work table, and before the step of moving the upper work table and / or the lower work table toward each other and one of the upper exposure member and the lower exposure member exposing one side of the substrate, it also includes: the first alignment member aligns one side of the substrate on the lower work table, and / or the second alignment member aligns one side of the substrate on the upper work table.

[0023] In some examples of the present application, after the step of exchanging the substrate on the upper workbench to the lower workbench, and / or the step of exchanging the substrate on the lower workbench to the upper workbench, and before the step of the upper workbench and / or the lower workbench moving away from each other, and the other of the upper exposure member and the lower exposure member exposing the other side of the substrate, it also includes: the upper workbench and / or the lower workbench moving away from each other, the first alignment member aligning the other side of the substrate on the lower workbench, and / or the second alignment member aligning the other side of the substrate on the upper workbench.

[0024] In some examples of the present application, the exposure device also includes: the first transport member and the second transport member, characterized in that, when the upper workbench and / or the lower workbench move in a direction away from each other, the step of placing the substrate on the upper workbench and / or the lower workbench includes: the first transport member transports the substrate to the upper workbench, and / or the second transport member transports the substrate to the lower workbench; and the step of moving the substrate away from the upper workbench and / or the lower workbench includes: the first transport member moves the substrate away from the upper workbench, and / or the second transport member moves the substrate away from the lower workbench.

[0025] Additional aspects and advantages of the present application will be given in part in the description below, and in part will become obvious from the description below, or will be learned through practice of the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] The above and / or additional aspects and advantages of the present application will become apparent and easily understood from the description of the embodiments in conjunction with the following drawings, in which:

[0027] FIG1 is a structural diagram of an exposure device according to an embodiment of the present application;

[0028] FIG2 is a flow chart of an exposure method of an exposure device according to an embodiment of the present application.

[0029] Figure numerals: exposure equipment 1, upper exposure assembly 10, upper workbench 11, first through hole 111, upper adsorption member 12, upper exposure member 13, first alignment member 14, first transport member 15, lower exposure assembly 20, lower workbench 21, second through hole 211, lower adsorption member 22, lower exposure member 23, second alignment member 24, second transport member 25, transport frame 26, upper suction cup 27, lower suction cup 28. DETAILED DESCRIPTION

[0030] The following describes in detail embodiments of the present application, and the embodiments described with reference to the accompanying drawings are exemplary.

[0031] The following describes an exposure device 1 according to an embodiment of the present application and an exposure method for a substrate using the exposure device 1 with reference to FIG1 and FIG2 , wherein the substrate may be a substrate material for manufacturing a circuit board.

[0032] As shown in FIG1 , an exposure apparatus 1 according to an embodiment of the present application includes an upper exposure assembly 10 and a lower exposure assembly 20. Both the upper exposure assembly 10 and the lower exposure assembly 20 can perform exposure operations and expose a substrate. By cooperating with the upper exposure assembly 10 and the lower exposure assembly 20, double-sided exposure of the substrate can be performed.

[0033] As shown in FIG1 , the upper exposure assembly 10 includes an upper worktable 11, an upper suction member 12, and an upper exposure member 13. The upper suction member 12 is movably mounted on the upper worktable 11, and the upper exposure member 13 is mounted on the upper worktable 11. The lower exposure assembly 20 is located below the upper exposure assembly 10 and is relatively movable relative to the upper exposure assembly 10. The lower exposure assembly 20 includes a lower worktable 21, a lower suction member 22, and a lower exposure member 23. The lower worktable 21 is disposed vertically relative to the upper worktable 11. The lower suction member 22 is movably mounted on the lower worktable 21, and the lower exposure member 23 is mounted on the lower worktable 21.

[0034] The upper workbench 11 primarily serves to hold substrates in place. When a substrate is held in place, exposure can proceed. The upper suction member 12 also holds and transfers the substrate, first securing it by suction and then transferring it to the upper workbench 11. The upper exposure member 13 primarily performs exposure operations, exposing the substrate.

[0035] The upper suction member 12 is disposed on the upper workbench 11 so as to be movable up and down. In this way, the upper suction member 12 can absorb the substrate by moving up and down, and after absorbing the substrate, it can drive the substrate to move up and down, facilitating adjustment of the position of the substrate in the up and down directions and transferring the substrate to the upper workbench 11. The upper exposure member 13 is disposed on the upper workbench 11, so that the position of the upper exposure member 13 can be fixed, making the arrangement of the upper exposure member 13 more secure and stable, allowing the upper exposure member 13 to work better, and the upper exposure member 13 can move together with the upper workbench 11, facilitating the exposure work of the upper exposure assembly 10.

[0036] Similarly, the lower worktable 21 primarily serves to hold the substrate in place. When a substrate is held in place, exposure can proceed. The lower holding member 22 also holds and transfers the substrate, first securing it by holding it in place and then transferring it to the lower worktable 21. The lower exposure member 23 primarily performs exposure, exposing the substrate.

[0037] The lower suction member 22 is disposed on the lower workbench 21 so as to be movable up and down. This allows the lower suction member 22 to absorb the substrate by moving up and down, and after absorption, it can also drive the substrate to move up and down, facilitating adjustment of the substrate's position in the up and down direction and transfer of the substrate to the lower workbench 21. The lower exposure member 23 is disposed on the lower workbench 21, which secures the position of the lower exposure member 23, making the arrangement of the lower exposure member 23 more secure and stable, allowing the lower exposure member 23 to work better. Furthermore, the lower exposure member 23 can move together with the lower workbench 21, facilitating exposure work of the lower exposure assembly 20.

[0038] Moreover, the lower exposure assembly 20 is located below the upper exposure assembly 10. That is, the upper exposure assembly 10 and the lower exposure assembly 20 are arranged in an upper and lower distribution. This makes the arrangement of the upper exposure assembly 10 and the lower exposure assembly 20 more reasonable, and the upper and lower exposure assemblies 10 and 20 can be used to respectively suck and expose the substrate. For example, when the upper workbench 11 sucks the substrate, the lower exposure member 23 can expose the lower surface of the substrate. After the single-sided exposure of the substrate is completed, the lower suction member 22 sucks the substrate on the upper workbench 11 and transfers it to the lower workbench 21. The substrates are exchanged. At this time, the lower workbench 21 sucks the substrate, and the upper exposure member 13 can expose the upper surface of the substrate, thereby achieving exposure of both sides of the substrate.

[0039] Moreover, the lower exposure assembly 20 and the upper exposure assembly 10 can move relative to each other, which makes it easy to adjust the relative position between the upper exposure assembly 10 and the lower exposure assembly 20, and also makes it easy to adjust the position of the substrate so that the substrate can be better exposed. In addition, when the lower exposure assembly 20 and the upper exposure assembly 10 move relative to each other, the lower exposure member 23 can fully expose the substrate on the upper workbench 11, and / or the upper exposure member 13 can fully expose the substrate on the lower workbench 21.

[0040] Thus, by arranging the upper exposure assembly 10 and the lower exposure assembly 20 on the exposure apparatus 1, the upper and lower surfaces of the substrate can be exposed separately without flipping the substrate. This arrangement eliminates the need for a flipper to flip the substrate, reduces the space occupied by the exposure apparatus 1, lowers costs, and increases production capacity. It also prevents the glass double-sided exposure machine from scratching the substrate, thereby improving the yield rate.

[0041] As shown in FIG1 , the exposure apparatus 1 further includes a first driver and a second driver. The first driver is coupled to the upper exposure assembly 10, and the second driver is coupled to the lower exposure assembly 20. Both the first driver and the second driver can function as a driver. The first driver is coupled to the upper exposure assembly 10, thereby driving the upper exposure assembly 10 to move, thereby facilitating adjustment of the position of the upper exposure assembly 10. The second driver is coupled to the lower exposure assembly 20, thereby driving the lower exposure assembly 20 to move, thereby facilitating adjustment of the position of the lower exposure assembly 20.

[0042] In addition, as shown in Figure 1, a first suction cup is provided on the side of the upper workbench 11 facing the lower workbench 21, and a second suction cup is provided on the side of the lower workbench 21 facing the upper workbench 11, and both the first suction cup and the second suction cup are used to adsorb the substrate. Among them, both the first suction cup and the second suction cup can play the role of adsorption, and can adsorb and fix the substrate. The first suction cup is set on the side of the upper workbench 11 facing the lower workbench 21, so that the first suction cup can be fixed, making the setting of the first suction cup more secure and stable, and in the process of transferring the substrate to the upper workbench 11 through the upper adsorption component 12, the first suction cup can more conveniently fix the substrate on the upper workbench 11, and it is also convenient for the lower exposure component 23 to expose the side of the substrate facing the lower workbench 21. Similarly, the second suction cup is set on the side of the lower workbench 21 facing the upper workbench 11, so that the second suction cup can be fixed, making the setting of the second suction cup more secure and stable. Moreover, in the process of transferring the substrate to the lower workbench 21 through the lower adsorption component 22, the second suction cup can more conveniently fix the substrate on the lower workbench 21, and it is also convenient for the upper exposure component 13 to expose the side of the substrate facing the upper workbench 11.

[0043] Furthermore, as shown in FIG1 , a first through hole 111 is provided on the upper workbench 11, and the upper adsorption member 12 is provided with the first through hole 111. A second through hole 211 is provided on the lower workbench 21, and the lower adsorption member 22 is provided with the second through hole 211. Among them, the first through hole 111 and the second through hole 211 can both play a role of communication. The upper adsorption member 12 is provided with the first through hole 111, which is convenient for the assembly of the upper adsorption member 12. The upper adsorption member 12 can move in the up-down direction at the first through hole 111, so that the upper adsorption member 12 can adsorb and fix the substrate by moving up and down, and adjust the position of the substrate in the up-down direction. Similarly, the lower adsorption member 22 is provided with the second through hole 211, which is convenient for the assembly of the lower adsorption member 22. The lower adsorption member 22 can move in the up-down direction at the second through hole 211, so that the lower adsorption member 22 can adsorb and fix the substrate by moving up and down, and adjust the position of the substrate in the up-down direction.

[0044] Specifically, as shown in FIG1 , there are a plurality of first through holes 111, which are spaced apart on the upper workbench 11, and a plurality of second through holes 211, which are spaced apart on the lower workbench 21. The provision of a plurality of first through holes 111, and the spacing of the plurality of first through holes 111 on the upper workbench 11, allows for a more uniform and comprehensive arrangement of the first through holes 111 on the upper workbench 11, and accordingly increases the number of upper adsorption members 12, thereby increasing the adsorption force on the substrate and making the substrate more stable and reliable when being adsorbed.

[0045] Similarly, there are multiple second through holes 211, and the multiple second through holes 211 are spaced apart on the lower workbench 21. This can make the second through holes 211 on the lower workbench 21 more uniform and comprehensive, and the number of lower adsorption parts 22 can be increased accordingly, thereby increasing the adsorption force on the substrate and making the substrate more stable and reliable when being adsorbed.

[0046] Furthermore, as shown in FIG1 , the upper exposure member 13 is connected to one end of the upper worktable 11 in the left-right or front-to-back direction. In other words, the upper exposure member 13 can be connected to one end of the upper worktable 11 in the left-right or front-to-back direction. Firstly, this allows the upper exposure member 13 to be fixed, making its placement more secure and stable. Furthermore, since the upper exposure member 13 is not positioned vertically on the upper worktable 11, interference with the lower worktable 21 is avoided. Furthermore, during relative movement between the lower exposure assembly 20 and the upper exposure assembly 10, the upper exposure member 13 can better expose the substrate on the lower worktable 21.

[0047] Similarly, the lower exposure member 23 can also be connected to one end in the left-right direction or one end in the front-back direction of the lower worktable 21. First, this can fix the lower exposure member 23, making the installation of the lower exposure member 23 more secure and stable. Moreover, the lower exposure member 23 is not arranged in the vertical direction of the lower worktable 21, which can prevent the lower exposure member 23 from interfering with the upper worktable 11. At the same time, during the relative movement of the lower exposure assembly 20 and the upper exposure assembly 10, the lower exposure member 23 can better expose the substrate on the upper worktable 11.

[0048] In addition, as shown in Figure 1, the exposure device 1 also includes: a first alignment member 14 and a second alignment member 24. The first alignment member 14 is arranged at the end of the upper exposure member 13 away from the upper worktable 11, and the second alignment member 24 is arranged at the end of the lower exposure member 23 away from the lower worktable 21. Among them, the first alignment member 14 and the second alignment member 24 can both play a role in alignment and can align the position of the substrate. The first alignment member 14 is arranged at the end of the upper exposure member 13 away from the upper worktable 11. In this way, the arrangement of the first alignment member 14 is more reasonable, and the first alignment member 14 is closer to the position of the lower worktable 21, which facilitates the first alignment member 14 to align the substrate on the lower worktable 21. Similarly, the second alignment member 24 is arranged at the end of the lower exposure member 23 away from the lower worktable 21. In this way, the arrangement of the second alignment member 24 is more reasonable, and the second alignment member 24 is closer to the position of the upper worktable 11, which facilitates the second alignment member 24 to align the substrate on the upper worktable 11.

[0049] As shown in Figure 1 , the exposure apparatus 1 further includes a first transport member 15 and a second transport member 25. The first transport member 15 is movably mounted on the upper worktable 11 to transport substrates onto the upper worktable 11, while the second transport member 25 is movably mounted on the lower worktable 21 to transport substrates onto the lower worktable 21. Both the first transport member 15 and the second transport member 25 function to transport substrates. Specifically, the first transport member 15 transports substrates onto the upper worktable 11 for subsequent exposure. After double-sided exposure of a substrate on the upper worktable 11 is completed, the first transport member 15 removes the substrate from the upper worktable 11 and transfers it to the next workstation. Similarly, the second transport member 25 transports substrates onto the lower worktable 21 for subsequent exposure. After double-sided exposure of a substrate on the lower worktable 21 is completed, the second transport member 25 removes the substrate from the lower worktable 21 and transfers it to the next workstation. This completes the entire exposure process of the exposure apparatus 1.

[0050] Specifically, as shown in FIG1 , each of the first transport member 15 and the second transport member 25 includes an upper suction cup 27, a lower suction cup 28, and a transport frame 26. The upper suction cup 27 is disposed at the upper end of the transport frame 26, and the lower suction cup 28 is disposed at the lower end of the transport frame 26. The transport frame 26 is the main body of the first transport member 15 and the second transport member 25 and primarily serves as a mounting mechanism. The upper suction cup 27 and the lower suction cup 28 both serve to absorb and secure substrates. With the upper suction cup 27 disposed at the upper end of the transport frame 26 and the lower suction cup 28 disposed at the lower end of the transport frame 26, the first transport member 15 can utilize the upper suction cup 27 to securely hold the substrate, facilitating transport of the substrate to the upper workbench 11. Meanwhile, the second transport member 25 can utilize the lower suction cup 28 to securely hold the substrate, facilitating transport of the substrate to the lower workbench 21.

[0051] Furthermore, the exposure apparatus 1 further includes a third driving member that is in driving cooperation with the transport frame 26. The third driving member also primarily plays a driving role and is in driving cooperation with the transport frame 26. Thus, the third driving member can provide power to the transport frame 26, thereby driving the first transport member 15 and the second transport member 25 to move, so that the first transport member 15 and the second transport member 25 are moved to the upper workbench 11 and the lower workbench 21, respectively, and then the first transport member 15 and the second transport member 25 can be used to transport the substrate.

[0052] As shown in FIG2 , the exposure method of the exposure device 1 according to an embodiment of the present application includes:

[0053] S1 , the upper working table 11 and / or the lower working table 21 move in a direction away from each other, and a substrate is placed on the upper working table 11 and / or the lower working table 21 .

[0054] Specifically, when there is only one substrate, for example, the first drive member can be used to move the upper worktable 11 to the left and transfer the substrate onto the upper worktable 11. Of course, the second drive member can also be used to move the lower worktable 21 to the right and transfer the substrate onto the lower worktable 21. When there are two substrates, the first drive member can be used to move the upper worktable 11 to the left and the second drive member can be used to move the lower worktable 21 to the right, and the corresponding substrates can be transferred to the upper worktable 11 and the lower worktable 21, respectively. In this way, it is convenient to place the substrate on the upper worktable 11 and / or the lower worktable 21.

[0055] S2 , the upper working stage 11 and / or the lower working stage 21 move toward each other, and one of the upper exposure unit 13 and the lower exposure unit 23 exposes one side of the substrate.

[0056] That is, in the case of a single substrate, for example, after the substrate is transported onto the upper worktable 11, the first driving member can drive the upper worktable 11 to move rightward, and during the rightward movement, the lower exposure member 23 is used to perform pattern exposure on the substrate. After the exposure is completed, the upper worktable 11 is positioned directly above the lower worktable 21. Of course, after the substrate is transported onto the lower worktable 21, the second driving member can drive the lower worktable 21 to move leftward, and during the leftward movement, the upper exposure member 13 is used to perform pattern exposure on the substrate. After the exposure is completed, the lower worktable 21 is positioned directly below the upper worktable 11.

[0057] In the case where there are two substrates, that is, after the corresponding substrates are transported to the upper worktable 11 and the lower worktable 21 respectively, the first driving member can drive the upper worktable 11 to move rightward, and during this movement, the upper exposure member 13 can perform pattern exposure on the side of the substrate located below it, while the lower exposure member 23 can perform pattern exposure on the side of the substrate located above it. Alternatively, the second driving member can drive the lower worktable 21 to move leftward, and during this movement, the upper exposure member 13 can perform pattern exposure on the side of the substrate located below it, while the lower exposure member 23 can perform pattern exposure on the side of the substrate located above it. Of course, it is also possible that the first driving member drives the upper worktable 11 to move rightward while the second driving member drives the lower worktable 21 to move leftward, and as the upper and lower worktables 11 and 21 move toward each other, the upper exposure member 13 can perform pattern exposure on the side of the substrate located below it, while the lower exposure member 23 can perform pattern exposure on the side of the substrate located above it.

[0058] S3 , the substrate on the upper workbench 11 is exchanged onto the lower workbench 21 , and / or the substrate on the lower workbench 21 is exchanged onto the upper workbench 11 .

[0059] In the case of a single substrate, for example, after one side of a substrate on the upper worktable 11 is exposed by the lower exposure unit 23, the substrate on the upper worktable 11 can be swapped to the lower worktable 21 to facilitate subsequent exposure of the other side of the substrate using the upper exposure unit 13. Alternatively, after one side of a substrate on the lower worktable 21 is exposed by the upper exposure unit 13, the substrate on the lower worktable 21 can be swapped to the upper worktable 11 to facilitate subsequent exposure of the other side of the substrate using the lower exposure unit 23.

[0060] Under the working condition that there are two substrates, after one side of the substrate located on the upper workbench 11 is exposed by the lower exposure unit 23, and one side of the substrate located on the lower workbench 21 is exposed by the upper exposure unit 13, the substrate located on the upper workbench 11 can be exchanged to the lower workbench 21, and the substrate located on the lower workbench 21 can be exchanged to the upper workbench 11, so that it is convenient for the subsequent upper exposure unit 13 to expose the other side of the substrate originally located on the upper workbench 11, and it is convenient for the subsequent lower exposure unit 23 to expose the other side of the substrate originally located on the lower workbench 21.

[0061] S4 , the upper working stage 11 and / or the lower working stage 21 move in a direction away from each other, and the other one of the upper exposure unit 13 and the lower exposure unit 23 exposes the other side of the substrate.

[0062] In the case of a single substrate, for example, when the substrate originally on the upper worktable 11 is exchanged onto the lower worktable 21, the lower worktable 21 moves leftward, and during this process, the upper exposure unit 13 can expose the other side of the substrate on the lower worktable 21. Alternatively, when the substrate originally on the lower worktable 21 is exchanged onto the upper worktable 11, the upper worktable 11 moves rightward, and during this process, the lower exposure unit 23 can expose the other side of the substrate on the upper worktable 11.

[0063] In the case where there are two substrates, after the substrate on the upper worktable 11 is exchanged onto the lower worktable 21, and the substrate on the lower worktable 21 is exchanged onto the upper worktable 11, the lower worktable 21 remains stationary, and the upper worktable 11 can move rightward. During the rightward movement, the lower exposure unit 23 is used to expose the other side of the substrate on the upper worktable 11, while the upper exposure unit 13 is used to expose the other side of the substrate on the lower worktable 21. Alternatively, the upper worktable 11 remains stationary, and the lower worktable 21 moves leftward. During the leftward movement, the upper exposure unit 13 is used to expose the other side of the substrate on the lower worktable 21, while the lower exposure unit 23 is used to expose the other side of the substrate on the upper worktable 11. Alternatively, while the upper workbench 11 moves to the right, the lower workbench 21 moves to the left, and while the upper workbench 11 and the lower workbench 21 move, the upper exposure member 13 is used to expose the other side of the substrate located on the lower workbench 21, and the lower exposure member 23 is used to expose the other side of the substrate located on the upper workbench 11.

[0064] S5 , moving the substrate away from the upper workbench 11 and / or the lower workbench 21 .

[0065] In the case of a single substrate, for example, after the other side of the substrate on the upper worktable 11 has been exposed, the substrate on the upper worktable 11 can be moved back to the production line. Alternatively, after the other side of the substrate on the lower worktable 21 has been exposed, the substrate on the lower worktable 21 can be moved back to the production line. In the case of two substrates, after both the substrate on the upper worktable 11 and the substrate on the lower worktable 21 have completed exposure on their other sides, the substrate on the upper worktable 11 can be moved back to the production line, and the substrate on the lower worktable 21 can also be moved back to the production line. In this way, the entire exposure process of the exposure apparatus 1 can be completed.

[0066] As shown in FIG2 , when there is only one substrate, step S3 includes:

[0067] S311, the upper adsorption member 12 moves downward or the lower adsorption member 22 moves upward to adsorb the substrate on the opposite workbench.

[0068] That is to say, in the process of exchanging the substrate on the lower workbench 21 to the upper workbench 11, the upper adsorption part 12 is first moved downward, and when it moves to contact with the substrate, the upper adsorption part 12 turns on the vacuum to adsorb the substrate. While adsorbing the substrate, the second suction cup turns off the vacuum to release the substrate, thereby completing the adsorption work of the upper adsorption part 12 on the substrate on the lower workbench 21; or, in the process of exchanging the substrate on the upper workbench 11 to the lower workbench 21, the lower adsorption part 22 is first moved upward, and when it moves to contact with the substrate, the lower adsorption part 22 turns on the vacuum to adsorb the substrate. While adsorbing the substrate, the first suction cup turns off the vacuum to release the substrate, thereby completing the adsorption work of the lower adsorption part 22 on the substrate on the upper workbench 11.

[0069] S312 , the upper suction member 12 contracts upward or the lower suction member 22 contracts downward, and the upper workbench 11 or the lower workbench 21 suctions the substrate.

[0070] That is to say, in the process of exchanging the substrate on the lower workbench 21 to the upper workbench 11, after the upper adsorption part 12 moves down to adsorb the substrate, the upper adsorption part 12 shrinks upward, and when the substrate contacts the first suction cup, the first suction cup opens the vacuum to adsorb the substrate, and then closes the vacuum of the upper adsorption part 12 to release the substrate. At this time, the upper adsorption part 12 releases the substrate, and the upper workbench 11 completes the adsorption of the substrate; or, in the process of exchanging the substrate on the upper workbench 11 to the lower workbench 21, after the lower adsorption part 22 moves up to adsorb the substrate, the lower adsorption part 22 shrinks downward, and when the substrate contacts the second suction cup, the second suction cup opens the vacuum to adsorb the substrate, and then closes the vacuum of the lower adsorption part 22 to release the substrate. At this time, the lower adsorption part 22 releases the substrate, and the lower workbench 21 completes the adsorption of the substrate.

[0071] As shown in FIG2 , when there are two substrates, the two substrates are respectively placed on the upper working table 11 and the lower working table 21 . In step S3 , the steps include:

[0072] S321, temporarily moving the substrate on one of the upper workbench 11 and the lower workbench 21 away.

[0073] For example, when exchanging the substrate on the lower workbench 21 to the upper workbench 11 , the first transport member 15 can be used to transport the substrate on the upper workbench 11 to the left and temporarily move it away from the upper workbench 11 , so that the upper workbench 11 can be used to absorb the substrate on the lower workbench 21 first.

[0074] S322 , the adsorption member corresponding to the one of the upper workbench 11 and the lower workbench 21 adsorbs the substrate on the other of the upper workbench 11 and the lower workbench 21 and transfers the substrate to the one of the upper workbench 11 and the lower workbench 21 .

[0075] For example: when exchanging the substrate on the lower workbench 21 to the upper workbench 11, the substrate on the upper workbench 11 can be temporarily moved away, and the upper adsorption member 12 on the upper workbench 11 can be moved downward. When the upper adsorption member 12 moves to contact the substrate on the lower workbench 21, the vacuum of the upper adsorption member 12 is turned on to adsorb the substrate, and then the vacuum of the second suction cup is turned off to release the substrate. Thereafter, the upper adsorption member 12 contracts upward. When the substrate contacts the first suction cup, the vacuum of the first suction cup is turned on to adsorb the substrate, and then the vacuum of the upper adsorption member 12 is turned off to release the substrate, so that the substrate on the lower workbench 21 can be exchanged to the upper workbench 11.

[0076] S323 , the temporarily moved substrate is transported to the upper end or the lower end of the other one of the upper worktable 11 and the lower worktable 21 .

[0077] For example, when the substrate on the lower workbench 21 is exchanged to the upper workbench 11, after the substrate on the lower workbench 21 is exchanged to the upper workbench 11, the substrate that was previously temporarily moved away from the upper workbench 11 can be transported to the top of the lower workbench 21, thereby facilitating the lower adsorption component 22 corresponding to the lower workbench 21 to adsorb and transfer the substrate.

[0078] S324 , the adsorption component corresponding to the other one of the upper workbench 11 and the lower workbench 21 adsorbs the temporarily moved substrate and transfers it to the other one of the upper workbench 11 and the lower workbench 21 .

[0079] For example, after the substrate on the lower workbench 21 is exchanged to the upper workbench 11, the substrate previously temporarily moved off the upper workbench 11 can be transported to the top of the lower workbench 21, and then the lower suction member 22 starts to move upward. When the lower suction member 22 moves upward to contact the substrate, the vacuum of the lower suction member 22 is turned on to adsorb the substrate, and then the vacuum of the lower suction cup 28 of the first transport member 15 is turned off to release the substrate. After that, the lower suction member 22 can drive the substrate to retract downward. When the substrate contacts the second suction cup, the vacuum of the second suction cup is turned on to adsorb the substrate, and then the vacuum of the lower suction member 22 is turned off to release the substrate, so that the substrate on the upper workbench 11 can be exchanged to the lower workbench 21. In this way, the exchange of substrates between the upper workbench 11 and the lower workbench 21 can be achieved.

[0080] In addition, as shown in FIG1 and FIG2, the exposure device 1 further includes: a first alignment member 14 and a second alignment member 24, and after step S1 and before step S2, further includes:

[0081] S10 , the first aligning member 14 aligns one side of the substrate on the lower workbench 21 , and / or the second aligning member 24 aligns one side of the substrate on the upper workbench 11 .

[0082] Among them, the first alignment member 14 and the second alignment member 24 can both play a role in alignment. It should be noted that the first alignment member 14 and the second alignment member 24 both perform their positioning function by sampling points at specially marked MARK points on the substrate and then calculating the specific position of the substrate within the system. Since the alignment process uses the first and second alignment members 14 and 24 to sample and calculate the MARK points of the substrate, the first alignment member 14 is required to sample points for alignment of the substrate on the lower workbench 21, and similarly, the second alignment member 24 is required to sample points for alignment of the substrate on the upper workbench 11.

[0083] In addition, since the substrates are transported to the upper workbench 11 and the lower workbench 21 respectively, the two workbench are at the loading and unloading stations but not at the alignment stations. Therefore, the MARK point of the substrate is not within the field of view of the first alignment member 14 or the second alignment member 24. Therefore, the substrate must be moved relatively until the MARK point is within the field of view of the first alignment member 14 or the second alignment member 24 before alignment can be performed.

[0084] In addition, under the working condition of two substrates, after the two substrates are placed on the upper workbench 11 and the lower workbench 21 respectively, the distance between the substrate on the upper workbench 11 and the second alignment member 24 is not equal to the distance between the substrate on the lower workbench 21 and the first alignment member 14. In order to achieve the first alignment member 14 and the second alignment member 24 to align the two substrates at the same time, the first alignment member 14 and the second alignment member 24 need to be able to move forward, backward, left and right independently, so that the MARK point of the substrate on the upper workbench 11 is within the field of view of the second alignment member 24, and the MARK point of the substrate on the lower workbench 21 is within the field of view of the first alignment member 14.

[0085] In the working condition of a substrate, for example: after the substrate is transported from the production line to the lower workbench 21, the first alignment member 14 can be used to align the substrate to ensure that one side of the substrate is in a preset position. After the alignment is completed, the lower workbench 21 moves to the left and the upper exposure member 10 is used to expose the substrate.

[0086] Under the working condition of two substrates, when the upper workbench 11 moves to the left and the lower workbench 21 moves to the right, the two substrates are transported to the upper workbench 11 and the lower workbench 21 respectively, and then the upper workbench 11 can be moved to the right, and the first alignment member 14 is used to align one side of the substrate located on the lower workbench 21. At the same time, the second alignment member 24 is slightly moved in the front, back, left and right directions. After adjusting to the appropriate position, one side of the substrate located on the upper workbench 11 is aligned.

[0087] In addition, as shown in FIG2 , after step S3 and before step S4, the following steps are further included:

[0088] S30, the upper workbench 11 and / or the lower workbench 21 move away from each other, the first alignment member 14 aligns the other side of the substrate on the lower workbench 21, and / or the second alignment member 24 aligns the other side of the substrate on the upper workbench 11.

[0089] In the working condition of one substrate, for example: after the substrate on the lower workbench 21 is exchanged to the upper workbench 11, the lower workbench 21 will move to the right, so that when the second alignment member 24 moves to the appropriate position, the other side of the substrate on the upper workbench 11 can be aligned to ensure that the other side of the substrate is in the preset position.

[0090] In the two-substrate operation, after the upper and lower substrates have swapped positions, the upper worktable 11 moves left to the alignment position, and the first alignment member 14 aligns the substrate on the lower worktable 21. Simultaneously, the second alignment member 24, after adjusting to the appropriate position, aligns the other side of the substrate on the upper worktable 11. This ensures that the other sides of both substrates are in the preset position, facilitating subsequent exposure of the other sides of both substrates.

[0091] Furthermore, as shown in FIG1 and FIG2 , the exposure device 1 further includes: a first transport member 15 and a second transport member 25 , and in step S1 , includes:

[0092] The first transport member 15 transports the substrate to the upper workbench 11, and / or the second transport member 25 transports the substrate to the lower workbench 21. The first transport member 15 and the second transport member 25 can both play a role in transporting.

[0093] Under the working condition of one substrate, for example: the lower workbench 21 can be moved to the right, and then the vacuum of the lower suction cup 28 on the second transport member 25 is turned on to adsorb the substrate on the production line, and then the third driving member drives the second transport member 25 to the lower workbench 21. When the substrate reaches the position preset with the lower workbench 21, the vacuum of the second suction cup is turned on to adsorb the substrate, and at the same time, the vacuum of the lower suction cup 28 of the second transport member 25 is turned off to release the substrate, so that the substrate can be moved to the lower workbench 21.

[0094] Under the working condition of two substrates, the lower workbench 21 can be moved to the right while the upper workbench 11 is moved to the left. When the lower workbench 21 is moved to the right, the vacuum of the lower suction cup 28 on the second conveyor 25 is turned on to adsorb the substrate on the production line, and then the third driving member drives the second conveyor 25 to move to the lower workbench 21. When the substrate reaches the position preset with the lower workbench 21, the vacuum of the second suction cup is turned on to adsorb the substrate, and at the same time, the vacuum of the lower suction cup 28 of the second conveyor 25 is turned off to release the substrate, so that the substrate can be moved to the lower workbench 21.

[0095] Similarly, when the upper workbench 11 moves to the left, the vacuum of the upper suction cup 27 on the first transport member 15 is turned on to adsorb the substrate on the production line, and then the third driving member drives the first transport member 15 to the upper workbench 11. When the substrate reaches the position preset with the upper workbench 11, the vacuum of the first suction cup is turned on to adsorb the substrate, and at the same time, the vacuum of the upper suction cup 27 of the first transport member 15 is turned off to release the substrate, so that the substrate can be moved to the upper workbench 11.

[0096] Furthermore, the step S5 includes:

[0097] The first transport member 15 moves the substrate off the upper worktable 11 , and / or the second transport member 25 moves the substrate off the lower worktable 21 .

[0098] Under the working condition of one substrate, for example: after the other side of the substrate located on the upper workbench 11 is exposed, the third driving member is used to drive the first transport member 15 to a position cooperating with the substrate, and then the vacuum of the upper suction cup 27 of the first transport member 15 is turned on to adsorb the substrate, and the vacuum of the first suction cup is turned off to release the substrate, so that the substrate can be adsorbed onto the first transport member 15, and then the third driving member is used to drive the first transport member 15 to transport the substrate from the left or right to the production line.

[0099] Under the working condition of two substrates, after the other side of the substrate on the upper workbench 11 and the substrate on the lower workbench 21 are exposed, the third driving member is used to drive the first transport member 15 to a position cooperating with the substrate on the upper workbench 11, and the vacuum of the upper suction cup 27 of the first transport member 15 is turned on to adsorb the substrate on the upper workbench 11. The vacuum of the first suction cup is turned off to release the substrate on the upper workbench 11, so that the substrate on the upper workbench 11 can be adsorbed onto the first transport member 15, and then the third driving member is used to drive the first transport member 15 to transport the substrate on the upper workbench 11 from the left or right to the production line.

[0100] At the same time, the third driving member can be used to drive the second transport member 25 to a position that cooperates with the substrate on the lower workbench 21, and the vacuum of the lower suction cup 28 of the second transport member 25 is turned on to adsorb the substrate on the lower workbench 21. The vacuum of the second suction cup is turned off to release the substrate on the lower workbench 21, so that the substrate on the lower workbench 21 can be adsorbed onto the second transport member 25, and then the third driving member is used to drive the second transport member 25 to transport the substrate on the lower workbench 21 from the left or right to the production line.

[0101] In the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0102] In the description of the present application, "first feature" and "second feature" may include one or more of the features. In the description of the present application, "plurality" means two or more. In the description of the present application, the first feature being "above" or "below" the second feature may include the first and second features being in direct contact, or may include the first and second features not being in direct contact but being in contact through another feature between them. In the description of the present application, the first feature being "above", "above" and "above" the second feature includes the first feature being directly above and obliquely above the second feature, or simply means that the first feature is higher in level than the second feature.

[0103] Throughout this specification, reference to terms such as "one embodiment," "some embodiments," "illustrative embodiments," "example," "specific example," or "some examples" means that a specific feature, structure, material, or characteristic described in conjunction with the embodiment or example is included in at least one embodiment or example of the present application. In this specification, illustrative expressions of the above terms do not necessarily refer to the same embodiment or example.

[0104] Although the embodiments of the present application have been shown and described, those skilled in the art will appreciate that various changes, modifications, substitutions, and variations may be made to the embodiments without departing from the principles and intent of the present application, and that the scope of the present application is defined by the claims and their equivalents.

Claims

1. An exposure device (1), characterized in that: include: An upper exposure assembly (10), the upper exposure assembly (10) comprising an upper working table (11), an upper adsorption member (12) and an upper exposure member (13), the upper adsorption member (12) being arranged on the upper working table (11) so as to be movable up and down, and the upper exposure member (13) being arranged on the upper working table (11); and A lower exposure component (20), the lower exposure component (20) is located below the upper exposure component (10), and the lower exposure component (20) and the upper exposure component (10) are movable relative to each other, the lower exposure component (20) comprises a lower working table (21), a lower adsorption component (22) and a lower exposure component (23), the lower working table (21) and the upper working table (11) are arranged relative to each other in an upper and lower direction, the lower adsorption component (22) is arranged on the lower working table (21) in an upper and lower movable manner, and the lower exposure component (23) is arranged on the lower working table (21).

2. The exposure device (1) according to claim 1, characterized in that Also includes: A first driving member, the first driving member drivingly cooperates with the upper exposure assembly (10); and A second driving member, the second driving member is drivingly matched with the lower exposure assembly (20).

3. The exposure device (1) according to claim 1 or 2, characterized in that A first suction cup is arranged on the side of the upper workbench (11) facing the lower workbench (21), and a second suction cup is arranged on the side of the lower workbench (21) facing the upper workbench (11), and both the first suction cup and the second suction cup are used for adsorbing the substrate.

4. The exposure device (1) according to any one of claims 1 to 3, characterized in that The upper workbench (11) is provided with a first through hole (111), and the upper adsorption member (12) is penetrated by the first through hole (111); and The lower workbench (21) is provided with a second through hole (211), and the lower adsorption member (22) is penetrated by the second through hole (211).

5. The exposure device (1) according to claim 4, characterized in that There are a plurality of the first through holes (111), and the plurality of the first through holes (111) are arranged at intervals on the upper working table (11); and There are a plurality of the second through holes (211), and the plurality of the second through holes (211) are arranged at intervals on the lower workbench (21).

6. The exposure device (1) according to any one of claims 1 to 5, characterized in that The upper exposure member (13) is connected to one end of the upper working table (11) in the left-right or front-back direction, and the lower exposure member (23) is connected to the other end of the lower working table (21) in the left-right or front-back direction.

7. The exposure device (1) according to any one of claims 1 to 6, characterized in that Also includes: A first alignment member (14), the first alignment member (14) being arranged at an end of the upper exposure member (13) away from the upper working table (11); and A second alignment member (24), wherein the second alignment member (24) is arranged at an end of the lower exposure member (23) away from the lower working table (21).

8. The exposure device (1) according to any one of claims 1 to 7, characterized in that Also includes: A first transport member (15), the first transport member (15) being movably disposed at the upper workbench (11) to transport the substrate to the upper workbench (11); and A second transport member (25), the second transport member (25) is movably disposed at the lower workbench (21) to transport the substrate to the lower workbench (21).

9. The exposure device (1) according to claim 8, characterized in that The first transport member (15) and the second transport member (25) both comprise an upper suction cup (27), a lower suction cup (28) and a transport frame (26), wherein the upper suction cup (27) is arranged at the upper end of the transport frame (26), and the lower suction cup (28) is arranged at the lower end of the transport frame (26).

10. The exposure device (1) according to claim 9, characterized in that Also includes: A third driving member is drivingly matched with the transport frame (26).

11. An exposure method according to any one of claims 1 to 10, characterized in that: include: The upper working table (11) and / or the lower working table (21) move in a direction away from each other, and a substrate is placed on the upper working table (11) and / or the lower working table (21) (S1); The upper working table (11) and / or the lower working table (21) move toward each other, and the upper exposure member (13) and the lower exposure member (23) One of the substrates is exposed to light (S2); The substrate on the upper workbench (11) is exchanged onto the lower workbench (21), and / or the substrate on the lower workbench (21) is exchanged onto the upper workbench (11) (S3); The upper working table (11) and / or the lower working table (21) move in a direction away from each other, and the other of the upper exposure unit (13) and the lower exposure unit (23) exposes the other side of the substrate (S4); The substrate is moved away from the upper working table (11) and / or the lower working table (21) (S5).

12. The exposure method of the exposure device according to claim 11, characterized in that: There is one substrate, and the step of exchanging the substrate on the upper workbench (11) to the lower workbench (21) and / or exchanging the substrate on the lower workbench (21) to the upper workbench (11) (S3) comprises: The upper adsorption member (12) moves downward or the lower adsorption member (22) moves upward to adsorb the substrate on the relative workbench (S311); and the upper adsorption member (12) shrinks upward or the lower adsorption member (22) shrinks downward, and the upper workbench (11) or the lower workbench (21) adsorbs the substrate (S312).

13. The exposure method of the exposure device according to claim 11 or 12, characterized in that: There are two substrates, which are respectively arranged on the upper workbench (11) and the lower workbench (21), and the step of exchanging the substrate on the upper workbench (11) to the lower workbench (21) and / or exchanging the substrate on the lower workbench (21) to the upper workbench (11) (S3) comprises: Temporarily moving a substrate on one of the upper working table (11) and the lower working table (21) away (S321); The adsorption member corresponding to the one of the upper workbench (11) and the lower workbench (21) adsorbs the substrate on the other of the upper workbench (11) and the lower workbench (21), and transfers the substrate to the one of the upper workbench (11) and the lower workbench (21) (S322); The temporarily moved substrate is transported to the upper end or lower end of the other one of the upper workbench (11) and the lower workbench (21) (S323); and the adsorption component corresponding to the other one of the upper workbench (11) and the lower workbench (21) adsorbs the temporarily moved substrate and transfers it to the other one of the upper workbench (11) and the lower workbench (21) (S324).

14. The exposure method of the exposure device according to any one of claims 11 to 13, wherein the exposure device (1) further comprises the first alignment member (14) and the second alignment member (24), characterized in that: After the step of placing a substrate on the upper working table (11) and / or the lower working table (21) by moving the upper working table (11) and / or the lower working table (21) in a direction away from each other (S1), and before the step of exposing one side of the substrate by one of the upper exposure member (13) and the lower exposure member (23) by moving the upper working table (11) and / or the lower working table (21) in a direction close to each other (S2), the method further comprises: The first alignment member (14) aligns one side of the substrate on the lower workbench (21), and / or the second alignment member (24) aligns one side of the substrate on the upper workbench (11) (S10).

15. The exposure method according to any one of claims 11 to 14, characterized in that: After the step of exchanging the substrate on the upper workbench (11) onto the lower workbench (21), and / or exchanging the substrate on the lower workbench (21) onto the upper workbench (11) (S3), and before the step of the upper workbench (11) and / or the lower workbench (21) moving away from each other, and the other of the upper exposure unit (13) and the lower exposure unit (23) exposing the other side of the substrate (S4), the method further comprises: The upper workbench (11) and / or the lower workbench (21) move in a direction away from each other, the first alignment member (14) aligns the other side of the substrate on the lower workbench (21), and / or the second alignment member (24) aligns the other side of the substrate on the upper workbench (11) (S30).

16. The exposure method of the exposure device according to any one of claims 11 to 15, wherein the exposure device (1) further comprises the first transport member (15) and the second transport member (25), characterized in that: The step of placing a substrate on the upper working table (11) and / or the lower working table (21) (S1) while the upper working table (11) and / or the lower working table (21) are moved in a direction away from each other comprises: The first transport member (15) transports the substrate to the upper workbench (11), and / or the second transport member (25) transports the substrate to the lower workbench (21); The step of moving the substrate away from the upper workbench (11) and / or the lower workbench (21) (S5) comprises: The first transport member (15) moves the substrate off the upper workbench (11), and / or the second transport member (25) moves the substrate off the lower workbench (21). substrate.

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