Liquid supply system and wet process device having same

Abstract

A liquid supply system and a wet process device having same. The liquid supply system comprises a liquid storage tank, a circulating pipeline communicated with the liquid storage tank, a circulating pump, a nozzle communicated with the circulating pipeline, and a switch valve for opening or closing the nozzle, wherein both ends of the circulating pipeline are connected to the liquid storage tank. According to the liquid supply system of the present invention, by providing the circulating pipeline, a chemical liquid in the liquid storage tank is always in a dynamic circulation, and the flow rate and the temperature of the chemical liquid in the dynamic circulation are both in a stable state, so that the chemical liquid flowing to a wafer through the nozzle is relatively stable, thereby improving the wet processing quality of wafers.

Description

Liquid supply system and wet process device having the same

[0001] The present invention is based on and claims the priority of Chinese patent application with application number 202311141941.2 and application date September 6, 2023. The entire contents of the above patent application are hereby introduced into the present invention as a reference. Technical Field

[0002] The present invention relates to the technical field of semiconductor production, and in particular to a wet process equipment having a liquid supply system. Background Art

[0003] In the wet process of wafer processing, especially in the wet etching process, the chemical solution drips onto the rotating wafer through the nozzle of the liquid outlet pipe. However, in the early stage of the chemical solution dripping, the chemical solution flowing out of the liquid storage tank mixes with the chemical solution remaining in the liquid outlet pipe, making the flow rate and temperature of the chemical solution unstable, affecting the etching quality of the wafer; moreover, at the end of the chemical solution dripping, the residual chemical solution dripping from the nozzle drips onto the wafer, causing uneven distribution of the chemical solution on the wafer, which also affects the etching quality of the wafer. Especially in the wet etching process, the temperature of the etching solution is relatively high and the temperature accuracy requirement is also relatively high. If it drips onto the wafer, it will have a greater impact on the quality of the wafer.

[0004] The reference to any prior art in the specification is not an acknowledgement or suggestion that the prior art forms part of the common general knowledge in any jurisdiction, or that it could reasonably be expected that the person skilled in the art would understand, consider relevant and / or combine with other prior art. Summary of the Invention

[0005] The present invention provides a liquid supply system and an etching device having the same to solve one of the above problems.

[0006] In order to achieve the above object, the technical solution provided by the present invention is as follows:

[0007] The present invention provides a liquid supply system, comprising:

[0008] Liquid storage tank, including a tank body for containing liquid medicine;

[0009] a circulation pipeline and a circulation pump in communication with the liquid storage tank, wherein both ends of the circulation pipeline are connected to the liquid storage tank;

[0010] a nozzle connected to the circulation pipeline;

[0011] A switching valve opens or closes the nozzle.

[0012] Furthermore, the circulation pipeline includes a liquid supply pipeline and a liquid return pipeline, the nozzle is connected to the intersection of the liquid supply pipeline and the liquid return pipeline, and the switch valve is a three-way valve connecting the liquid supply pipeline, the liquid return pipeline and the nozzle.

[0013] Furthermore, the intersection of the liquid supply pipeline, the liquid return pipeline and the nozzle is the lowest point of the circulation pipeline.

[0014] Furthermore, the circulation pipeline also includes a connecting pipe connected to the switch valve and the nozzle.

[0015] Furthermore, the nozzle has an outlet end, and the inner diameter of the outlet end is smaller than the inner diameter of the connecting pipe.

[0016] Furthermore, the liquid supply pipeline includes a vertical section connected to the lower end of the tank body and extending vertically downward, and a horizontal section connected to the vertical section and extending horizontally. The nozzle extends downward from the end of the horizontal section, and the return liquid pipeline extends upward from the end of the horizontal section.

[0017] Furthermore, the liquid supply system also includes a buffer device provided on the liquid supply pipeline to buffer the flow of the liquid medicine.

[0018] Furthermore, the liquid supply system also includes a temperature control component for controlling the temperature of the medicine liquid, and the temperature control component includes a temperature control pipeline connected to the tank body, a heating device for heating the medicine liquid, and a cooling device spaced apart from the heating device to cool the medicine liquid.

[0019] Furthermore, the temperature control component also includes a first temperature sensor respectively provided on the liquid supply pipeline and a second temperature sensor provided on the tank body to detect the temperature of the liquid in the tank body.

[0020] The present invention also provides a wet process equipment, which includes the above-mentioned liquid supply system.

[0021] Compared with the prior art, the beneficial effects of the present invention are: the liquid supply system of the present invention, by setting a circulation pipeline, makes the liquid in the liquid storage tank always in a dynamic circulation, the flow rate and temperature of the liquid in the dynamic circulation are in a stable state, and the liquid flowing to the wafer through the nozzle is relatively stable, thereby improving the wet processing quality of the wafer.

[0022] As used herein, the term "comprise" and variations of the term, such as "comprises," "comprised," "comprising," "including," and "containing" do not exclude other features, components, elements, or steps unless the context clearly requires otherwise. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] FIG1 is a schematic diagram of the three-dimensional structure of a liquid supply system according to an embodiment of the present invention.

[0024] FIG2 is a front view of a liquid supply system according to another embodiment of the present invention.

[0025] FIG3 is a front view of a liquid supply system according to another embodiment of the present invention.

[0026] Among them, 10-liquid storage tank, 11-tank body, 12-liquid replenishing pipe, 20-circulating pipeline, 21-liquid supply pipeline, 211-vertical section, 212-horizontal section, 22-return liquid pipeline, 221-first section, 222-second section, 223-third section, 23-connecting pipe, 30-nozzle, 31-outlet end, 40-switch valve, 50-circulating pump, 60-buffer device, 71-temperature control pipeline, 711-liquid outlet pipe, 712-liquid inlet pipe, 713-delivery pipe, 72-heating device, 73-cooling device, 74-first temperature sensor, 75-second temperature sensor. DETAILED DESCRIPTION

[0027] In order to enable those skilled in the art to better understand the technical solutions in the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts should fall within the scope of protection of the present invention.

[0028] It should be noted that the terms "upper" and "lower" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are intended only to simplify the description of the present invention, and do not indicate or imply that the device referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, they should not be understood as limiting the scope of protection of the present invention.

[0029] In various drawings of the present invention, for the sake of convenience, some sizes of structures or parts are exaggerated relative to other structural parts. Therefore, they are only used to illustrate the basic structure of the subject matter of the present invention.

[0030] The present invention provides a liquid supply system, as shown in Figures 1 to 3. The liquid supply system includes a liquid storage tank 10, a circulation pipeline 20 connected to the liquid storage tank 10, a circulation pump 50, a nozzle 30 connected to the circulation pipeline 20, and an on / off valve 40 for opening or closing the nozzle 30. The liquid supply system of the present invention, by providing the circulation pipeline 20, ensures that the chemical liquid in the liquid storage tank 10 is always in a dynamic circulation. The flow rate and temperature of the chemical liquid in the dynamic circulation are both stable, and the chemical liquid flowing through the nozzle 30 to the wafer is relatively stable, thereby improving the wet processing quality of the wafer.

[0031] Specifically, the liquid storage tank 10 includes a tank body 11 for containing a chemical liquid. It is understood that the chemical liquid can be an etching liquid, a developing liquid, or a wetting liquid. The liquid supply system of the present invention is applicable to all equipment involved in wet processes in semiconductor manufacturing processes. The following detailed description uses the chemical liquid as an example, using an etching liquid.

[0032] If the lid of the liquid storage tank 10 is removable, the lid can be opened to replenish the liquid medicine in the tank body 11. As shown in FIG2 , if the tank body 11 and the lid are sealed as a whole, the liquid storage tank 10 further includes a liquid replenishing tube 12 provided on the tank body 11 for replenishing the liquid medicine. Preferably, the liquid replenishing tube 12 is located at the upper portion of the tank body 11, and the newly replenished liquid medicine enters the tank body 11 from the top downward, allowing for thorough mixing within the tank body 11.

[0033] Furthermore, both ends of the circulation pipeline 20 are connected to the liquid storage tank 10 , and the liquid medicine is in dynamic equilibrium in the liquid storage tank 10 and the circulation pipeline 20 due to the circulation flow.

[0034] As shown in Figures 1 to 3, the circulation pipeline 20 includes a liquid supply pipeline 21 and a liquid return pipeline 22 connected to the liquid supply pipeline 21. The liquid inlet end of the liquid supply pipeline 21 is connected to the tank body 11, the liquid outlet end of the liquid supply pipeline 21 is connected to the liquid inlet end of the liquid return pipeline 22, and the liquid outlet end of the liquid return pipeline 22 is connected to the tank body 11. That is, during the flow process, the liquid medicine is separated from the intersection of the liquid supply pipeline 21 and the liquid return pipeline 22, and then enters the nozzle 30 and / or the liquid return pipeline 22 respectively.

[0035] Specifically, the liquid supply pipeline 21 includes a vertical section 211 connected to the lower end of the tank body 11 and extending vertically downward, and a horizontal section 212 connected to the end of the vertical section 211 and extending horizontally. The return liquid pipeline 22 and the nozzle 30 are connected to the horizontal section 212.

[0036] Preferably, the liquid return line 22 includes a first section 221 connected to the horizontal section 212 and extending upward, a second section 222 connected to the end of the first section 221 and extending to the top of the liquid storage tank 10, and a third section 223 connected to the end of the second section 222 and extending into the liquid storage tank 10. The liquid return line 22 returns the liquid medicine from the top of the liquid storage tank 10 to the tank body 11 through the third section 223. That is, the third section 223 and the vertical section 211 are connected to the upper and lower ends of the liquid storage tank 10, respectively, to avoid the third section 223 and the vertical section 211 being too close to each other, thereby preventing the liquid medicine returned to the liquid storage tank 10 from flowing out of the vertical section 211 without being fully mixed.

[0037] Of course, the present invention does not limit the specific shape of the liquid return pipe 22 , and any shape that can realize liquid return from the upper end of the liquid storage tank 10 is also within the scope of protection of the present invention.

[0038] As a preferred embodiment of the present invention, the nozzle 30 is connected to the intersection of the liquid supply pipeline 21 and the liquid return pipeline 22. The intersection of the liquid supply pipeline 21, the liquid return pipeline 22 and the nozzle 30 is the lowest point of the circulation pipeline 20, which is beneficial for the nozzle 30 to spray the liquid while reducing the amount of liquid remaining in the nozzle 30, thereby preventing the liquid from dripping from the nozzle 30 onto the wafer.

[0039] Preferably, the nozzle 30 extends downward from the end of the horizontal section 212 , and the liquid return line 22 extends upward from the end of the horizontal section 212 , that is, the nozzle 30 and the first section 221 are aligned vertically.

[0040] In this embodiment, the switch valve 40 is a three-way valve connecting the liquid supply line 21, the liquid return line 22, and the nozzle 23. The switch valve 40 controls the liquid to flow to the first section 221 or to the nozzle 30, respectively, to avoid the liquid in the horizontal section 212 flowing to the nozzle 30. Part of the liquid will flow to the first section 221, thereby affecting the stability of the liquid flowing to the wafer and the total amount of the liquid, thereby ensuring the etching quality of the wafer.

[0041] It is understandable that the nozzle 30 may be directly connected to the horizontal section 212 or the switch valve 40 , or may be indirectly connected to the horizontal section 212 or the switch valve 40 .

[0042] As another preferred embodiment of the present invention, as shown in Figures 1 to 3, the nozzle 30 is indirectly connected to the on-off valve 40. The circulation pipeline 20 also includes a connecting pipe 23 connected to the on-off valve 40 and the nozzle 30, which facilitates the installation of the nozzle 30 and improves the bonding strength between the nozzle 30 and the horizontal section 212. In this embodiment, the nozzle 30 has an outlet end 31, and the inner diameter of the outlet end 31 is smaller than the inner diameter of the connecting pipe 23. Preferably, the inner diameter of the nozzle 30 is smaller than the inner diameter of the connecting tube 23, so that the inner wall of the nozzle 30 and the inner wall of the connecting tube 23 are stepped. When the liquid medicine enters the nozzle 30 from the connecting tube 23, the stepped inner wall can drag part of the liquid medicine and prevent it from dripping onto the wafer. At the same time, the inner wall of the nozzle 30 with a smaller inner diameter increases the surface tension of the liquid medicine, that is, the adsorption force between the liquid medicine and the inner wall of the nozzle 30 is greater than the gravity of the liquid medicine itself, thereby preventing the liquid medicine remaining on the inner wall of the nozzle 30 from dripping onto the wafer, thereby ensuring the etching quality of the wafer.

[0043] As another preferred embodiment of the present invention, as shown in Figures 1 to 3, the liquid supply system further includes a buffer device 60 disposed on the liquid supply line 21 to buffer the flow of the liquid medicine. The buffer device 60 is disposed between the liquid storage tank 10 and the nozzle 30 to stabilize the flow of the liquid medicine within the liquid supply line 21. Preferably, the buffer device 60 is located on the horizontal section 212 near the nozzle 30. When the liquid medicine buffered by the buffer device 60 reaches the nozzle 30, its fluidity remains relatively stable.

[0044] As another preferred embodiment of the present invention, as shown in Figures 1 to 3, the liquid supply system also includes a temperature control component for controlling the temperature of the medicinal liquid. The temperature control component includes a temperature control pipeline 71 connected to the tank body 11, a heating device 72 for heating the medicinal liquid, and a cooling device 73 arranged at a distance from the heating device 72 to ensure that the medicinal liquid in the liquid storage tank 10 is at a constant temperature.

[0045] Specifically, the temperature control pipeline 71 includes a liquid outlet pipe 711 connected to the lower end of the liquid storage tank 10 and extending downward, a liquid inlet pipe 712 connected to the upper end of the liquid storage tank 10, and a delivery pipe 713 connected between the liquid outlet pipe 711 and the liquid inlet pipe 712.

[0046] In a specific embodiment, as shown in Figure 3, the temperature control pipeline 71 may not include the liquid outlet pipe 711, and the end of the delivery pipe 713 may be directly connected to the connection between the vertical section 211 and the horizontal section 212 of the liquid supply pipeline 21, that is, the temperature control pipeline 71 and the circulation pipeline 21 jointly transport the liquid medicine through the vertical section 211.

[0047] The heating device 72 is installed at the lower end of the liquid storage tank 10. The heating device 71 includes a heating element (not shown) and a control element connected to the heating element. The heating element extends from the lower end of the liquid storage tank 10 to the tank body 11. That is, the heating element directly heats the liquid medicine in the tank body 11, thereby improving the efficiency of heating the liquid medicine.

[0048] Of course, the heating device 72 can also be installed on the outside of the constant temperature pipe 71 to indirectly heat the liquid medicine in the constant temperature pipe 71 through heat transfer, which is also within the protection scope of the present invention.

[0049] The cooling device 73 is provided on the temperature control pipe 71. Preferably, the cooling device 73 is installed on the delivery pipe 713. The cooling device 73 includes a cooling box fixed to the outside of the delivery pipe 713 and a cooling material inside the cooling box. The cooling box is attached to the outside of the delivery pipe 713. In this embodiment, the specific material and state of the cooling material are not limited.

[0050] The liquid supply system also includes a first temperature sensor 74 provided on the liquid supply pipeline 21 and a second temperature sensor 75 provided on the tank body 11 to detect the temperature of the liquid in the tank body 11. The first temperature sensor 74 can detect the temperature of the liquid in the liquid storage tank 10 in real time so that the temperature control component can adjust the temperature of the liquid in time to ensure that the liquid entering the liquid supply pipeline 21 is always in a constant temperature state.

[0051] The first temperature sensor 74 is preferably disposed on the connecting pipe 23 . The first temperature sensor 74 can directly detect the temperature of the liquid medicine to be delivered to the nozzle 30 .

[0052] The second temperature sensor 75 is preferably located at the bottom of the liquid storage tank 10 to facilitate detection of the temperature of the liquid medicine in the tank body 11. Specifically, at least a portion of the second temperature sensor 75 extends from the bottom of the liquid storage tank 10 into the tank body 11, so that the detected temperature of the liquid medicine is closer to the actual temperature of the liquid medicine in the tank body 11, allowing the heating device 72 and the cooling device 73 to timely control the temperature of the liquid medicine.

[0053] The circulation pump 50 flows the liquid medicine back into the tank body 11 through the circulation pipeline 20 and the temperature control pipeline 71. It is understandable that when the constant temperature pipeline 71 has the liquid outlet pipe 711, two circulation pumps 50 are provided, which are respectively provided on the constant temperature pipeline 71 and the liquid supply pipeline 21, and the constant temperature pipeline 71 and the circulation pipeline 20 respectively realize the transportation of liquid medicine. When the constant temperature pipeline 71 is not provided with the liquid outlet pipe 711, as shown in Figure 3, one circulation pump 50 is provided, and the circulation pump 50 is provided on the vertical section 211, and the liquid medicine in the constant temperature pipeline 71 and the circulation pipeline 20 is transported by one circulation pump 50.

[0054] The present invention also provides a wet process equipment, which includes the above-mentioned liquid supply system, and the liquid storage tube 10 is filled with liquids with different functions, wherein the liquids include but are not limited to etching liquid, developing liquid, or wetting liquid to complete wet processes such as etching, developing, or wetting of wafers.

[0055] To sum up, the liquid supply system of the present invention, by setting up a circulation pipeline 20, ensures that the liquid in the liquid storage tank 10 is always in a dynamic circulation, and the flow rate and temperature of the liquid in the dynamic circulation are in a stable state. When the wafer needs to be wet-processed, the liquid flowing to the wafer through the nozzle 30 is relatively stable, thereby improving the wet processing quality of the wafer.

[0056] It should be understood that although this specification is described according to embodiments, not every embodiment contains only one independent technical solution. This narrative style of the specification is only for the sake of clarity. Those skilled in the art should regard the specification as a whole. The technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

[0057] The series of detailed descriptions listed above are only specific descriptions of feasible embodiments of the present invention and are not intended to limit the scope of protection of the present invention. Any equivalent embodiments or changes that do not deviate from the technical spirit of the present invention should be included in the scope of protection of the present invention.

Claims

1. A liquid supply system, characterized in that: include: Liquid storage tank, including a tank body for containing liquid medicine; A circulation pipeline and a circulation pump communicated with the liquid storage tank, wherein both ends of the circulation pipeline are connected to the liquid storage tank; a nozzle connected to the circulation pipeline; A switch valve opens or closes the nozzle.

2. The liquid supply system according to claim 1, characterized in that: The circulation pipeline includes a liquid supply pipeline and a liquid return pipeline, the nozzle is connected to the junction of the liquid supply pipeline and the liquid return pipeline, and the switch valve is a three-way valve connecting the liquid supply pipeline, the liquid return pipeline and the nozzle.

3. The liquid supply system according to claim 2, characterized in that: The intersection of the liquid supply pipeline, the liquid return pipeline and the nozzle is the lowest point of the circulation pipeline.

4. The liquid supply system according to claim 1, characterized in that: The circulation pipeline also includes a connecting pipe connected to the switch valve and the nozzle.

5. The liquid supply system according to claim 4, characterized in that: The nozzle has an outlet end, and the inner diameter of the outlet end is smaller than the inner diameter of the connecting pipe.

6. The liquid supply system according to claim 2, characterized in that: The liquid supply pipeline includes a vertical section connected to the lower end of the tank body and extending vertically downward, and a horizontal section connected to the vertical section and extending horizontally. The nozzle extends downward from the end of the horizontal section, and the liquid return pipeline extends upward from the end of the horizontal section.

7. The liquid supply system according to claim 1, characterized in that: The liquid supply system also includes a buffer device arranged on the liquid supply pipeline to buffer the flow of the liquid medicine.

8. The liquid supply system according to any one of claims 2 to 7, characterized in that: The liquid supply system also includes a temperature control component for controlling the temperature of the liquid medicine. The temperature control component includes a temperature control pipeline connected to the tank body, a heating device for heating the liquid medicine, and a cooling device spaced apart from the heating device to cool the liquid medicine.

9. The liquid supply system according to claim 8, characterized in that: The temperature control component also includes a first temperature sensor which is respectively arranged on the liquid supply pipeline and a second temperature sensor which is arranged on the tank body to detect the temperature of the medicine liquid in the tank body.

10. A wet process equipment, characterized in that: The wet process equipment comprises the liquid supply system according to any one of claims 1 to 9.

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